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PL1715075T3 - Magnetyczny uchwyt maski - Google Patents

Magnetyczny uchwyt maski

Info

Publication number
PL1715075T3
PL1715075T3 PL05008662T PL05008662T PL1715075T3 PL 1715075 T3 PL1715075 T3 PL 1715075T3 PL 05008662 T PL05008662 T PL 05008662T PL 05008662 T PL05008662 T PL 05008662T PL 1715075 T3 PL1715075 T3 PL 1715075T3
Authority
PL
Poland
Prior art keywords
substrate
mask holder
magnetic mask
receiving region
mask
Prior art date
Application number
PL05008662T
Other languages
English (en)
Inventor
Dieter Manz
Original Assignee
Applied Mat Gmbh & Co Kg
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Applied Mat Gmbh & Co Kg filed Critical Applied Mat Gmbh & Co Kg
Publication of PL1715075T3 publication Critical patent/PL1715075T3/pl

Links

Classifications

    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05B—ELECTRIC HEATING; ELECTRIC LIGHT SOURCES NOT OTHERWISE PROVIDED FOR; CIRCUIT ARRANGEMENTS FOR ELECTRIC LIGHT SOURCES, IN GENERAL
    • H05B33/00—Electroluminescent light sources
    • H05B33/10—Apparatus or processes specially adapted to the manufacture of electroluminescent light sources
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/04—Coating on selected surface areas, e.g. using masks
    • C23C14/042—Coating on selected surface areas, e.g. using masks using masks

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Organic Chemistry (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Manufacturing & Machinery (AREA)
  • Electroluminescent Light Sources (AREA)
  • Physical Vapour Deposition (AREA)
  • Electron Beam Exposure (AREA)
  • Adjustment Of The Magnetic Head Position Track Following On Tapes (AREA)
  • Liquid Crystal (AREA)
  • Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
PL05008662T 2005-04-20 2005-04-20 Magnetyczny uchwyt maski PL1715075T3 (pl)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
EP05008662A EP1715075B1 (de) 2005-04-20 2005-04-20 Magnetische Maskenhalterung

Publications (1)

Publication Number Publication Date
PL1715075T3 true PL1715075T3 (pl) 2008-10-31

Family

ID=34935469

Family Applications (1)

Application Number Title Priority Date Filing Date
PL05008662T PL1715075T3 (pl) 2005-04-20 2005-04-20 Magnetyczny uchwyt maski

Country Status (9)

Country Link
US (1) US8361230B2 (pl)
EP (1) EP1715075B1 (pl)
JP (1) JP4781893B2 (pl)
KR (1) KR100777534B1 (pl)
CN (1) CN1861833A (pl)
AT (1) ATE392490T1 (pl)
DE (1) DE502005003731D1 (pl)
PL (1) PL1715075T3 (pl)
TW (1) TWI354869B (pl)

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CN106688088B (zh) 2014-08-05 2020-01-10 因特瓦克公司 注入掩膜及对齐
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US10837111B2 (en) * 2015-01-12 2020-11-17 Applied Materials, Inc. Holding arrangement for supporting a substrate carrier and a mask carrier during layer deposition in a processing chamber, apparatus for depositing a layer on a substrate, and method for aligning a substrate carrier supporting a substrate and a mask carrier
KR102217794B1 (ko) 2015-01-22 2021-02-19 삼성디스플레이 주식회사 위치 가변 마그넷 플레이트
CN105018893B (zh) * 2015-07-30 2017-07-28 江苏集萃有机光电技术研究所有限公司 一种真空旋转基片承载盘
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TWI612162B (zh) * 2017-08-25 2018-01-21 友達光電股份有限公司 鍍膜設備
KR20190062380A (ko) * 2017-11-23 2019-06-05 어플라이드 머티어리얼스, 인코포레이티드 기판을 지지하기 위한 기판 캐리어, 마스크 척킹 장치, 진공 프로세싱 시스템, 및 기판 캐리어를 동작시키는 방법
CN109930107A (zh) * 2017-12-19 2019-06-25 上海和辉光电有限公司 一种张网固定结构和张网固定方法
CN112135693A (zh) * 2018-06-15 2020-12-25 应用材料公司 用于从基板升离掩模的设备、基板载体、真空处理系统和操作电永磁铁组件的方法
US20210335640A1 (en) * 2018-07-26 2021-10-28 Matthias HEYMANNS Holding device for holding a carrier or a component in a vacuum chamber, use of a holding device for holding a carrier or a component in a vacuum chamber, apparatus for handling a carrier in a vacuum chamber, and vacuum deposition system
KR102686304B1 (ko) * 2018-11-28 2024-07-19 삼성디스플레이 주식회사 마스크 프레임 조립체 및 마스크 프레임 조립체 제조 방법
WO2020164687A1 (en) * 2019-02-12 2020-08-20 Applied Materials, Inc. Holder for substrate processing in a vacuum chamber, holding arrangement, system and method
WO2020180334A1 (en) * 2019-03-07 2020-09-10 Applied Materials, Inc. Mask frame integration, carrier for mask frame and method of handling a mask
WO2020210309A1 (en) * 2019-04-11 2020-10-15 Applied Materials, Inc. Multi-depth film for optical devices
US11189516B2 (en) 2019-05-24 2021-11-30 Applied Materials, Inc. Method for mask and substrate alignment
WO2020242611A1 (en) 2019-05-24 2020-12-03 Applied Materials, Inc. System and method for aligning a mask with a substrate
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CN116219360B (zh) * 2022-12-16 2025-04-11 无锡奥夫特光学技术有限公司 一种掩模对准和固定方法及装置

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Also Published As

Publication number Publication date
TW200702937A (en) 2007-01-16
EP1715075B1 (de) 2008-04-16
US20070006807A1 (en) 2007-01-11
ATE392490T1 (de) 2008-05-15
CN1861833A (zh) 2006-11-15
EP1715075A1 (de) 2006-10-25
JP2006302897A (ja) 2006-11-02
KR100777534B1 (ko) 2007-11-20
DE502005003731D1 (de) 2008-05-29
KR20060110805A (ko) 2006-10-25
US8361230B2 (en) 2013-01-29
JP4781893B2 (ja) 2011-09-28
TWI354869B (en) 2011-12-21

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