PH12015502734A1 - Adhesive sheet and method of manufacturing electronic component using the same - Google Patents
Adhesive sheet and method of manufacturing electronic component using the sameInfo
- Publication number
- PH12015502734A1 PH12015502734A1 PH12015502734A PH12015502734A PH12015502734A1 PH 12015502734 A1 PH12015502734 A1 PH 12015502734A1 PH 12015502734 A PH12015502734 A PH 12015502734A PH 12015502734 A PH12015502734 A PH 12015502734A PH 12015502734 A1 PH12015502734 A1 PH 12015502734A1
- Authority
- PH
- Philippines
- Prior art keywords
- mass
- meth
- adhesive sheet
- pcnt
- same
- Prior art date
Links
- 239000000853 adhesive Substances 0.000 title abstract 5
- 230000001070 adhesive effect Effects 0.000 title abstract 5
- 238000004519 manufacturing process Methods 0.000 title abstract 2
- 101100243022 Mus musculus Pcnt gene Proteins 0.000 abstract 3
- NIXOWILDQLNWCW-UHFFFAOYSA-M acrylate group Chemical group C(C=C)(=O)[O-] NIXOWILDQLNWCW-UHFFFAOYSA-M 0.000 abstract 2
- -1 acrylic ester Chemical class 0.000 abstract 1
- 239000012790 adhesive layer Substances 0.000 abstract 1
- 125000000484 butyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 abstract 1
- 239000003795 chemical substances by application Substances 0.000 abstract 1
- 229920001577 copolymer Polymers 0.000 abstract 1
- 238000010438 heat treatment Methods 0.000 abstract 1
- 125000002887 hydroxy group Chemical group [H]O* 0.000 abstract 1
- 239000012948 isocyanate Substances 0.000 abstract 1
- 150000002513 isocyanates Chemical class 0.000 abstract 1
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 abstract 1
- 239000000178 monomer Substances 0.000 abstract 1
- 239000004014 plasticizer Substances 0.000 abstract 1
- 229920000728 polyester Polymers 0.000 abstract 1
- 229920000915 polyvinyl chloride Polymers 0.000 abstract 1
- 239000004800 polyvinyl chloride Substances 0.000 abstract 1
- 239000000758 substrate Substances 0.000 abstract 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/683—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping
- H01L21/6835—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using temporarily an auxiliary support
- H01L21/6836—Wafer tapes, e.g. grinding or dicing support tapes
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F220/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride ester, amide, imide or nitrile thereof
- C08F220/02—Monocarboxylic acids having less than ten carbon atoms; Derivatives thereof
- C08F220/10—Esters
- C08F220/12—Esters of monohydric alcohols or phenols
- C08F220/16—Esters of monohydric alcohols or phenols of phenols or of alcohols containing two or more carbon atoms
- C08F220/18—Esters of monohydric alcohols or phenols of phenols or of alcohols containing two or more carbon atoms with acrylic or methacrylic acids
- C08F220/1804—C4-(meth)acrylate, e.g. butyl (meth)acrylate, isobutyl (meth)acrylate or tert-butyl (meth)acrylate
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09J—ADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
- C09J133/00—Adhesives based on homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by only one carboxyl radical, or of salts, anhydrides, esters, amides, imides, or nitriles thereof; Adhesives based on derivatives of such polymers
- C09J133/04—Homopolymers or copolymers of esters
- C09J133/06—Homopolymers or copolymers of esters of esters containing only carbon, hydrogen and oxygen, the oxygen atom being present only as part of the carboxyl radical
- C09J133/08—Homopolymers or copolymers of acrylic acid esters
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09J—ADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
- C09J133/00—Adhesives based on homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by only one carboxyl radical, or of salts, anhydrides, esters, amides, imides, or nitriles thereof; Adhesives based on derivatives of such polymers
- C09J133/04—Homopolymers or copolymers of esters
- C09J133/06—Homopolymers or copolymers of esters of esters containing only carbon, hydrogen and oxygen, the oxygen atom being present only as part of the carboxyl radical
- C09J133/10—Homopolymers or copolymers of methacrylic acid esters
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09J—ADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
- C09J7/00—Adhesives in the form of films or foils
- C09J7/20—Adhesives in the form of films or foils characterised by their carriers
- C09J7/22—Plastics; Metallised plastics
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09J—ADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
- C09J7/00—Adhesives in the form of films or foils
- C09J7/20—Adhesives in the form of films or foils characterised by their carriers
- C09J7/22—Plastics; Metallised plastics
- C09J7/24—Plastics; Metallised plastics based on macromolecular compounds obtained by reactions involving only carbon-to-carbon unsaturated bonds
- C09J7/245—Vinyl resins, e.g. polyvinyl chloride [PVC]
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09J—ADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
- C09J7/00—Adhesives in the form of films or foils
- C09J7/30—Adhesives in the form of films or foils characterised by the adhesive composition
- C09J7/38—Pressure-sensitive adhesives [PSA]
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
- C08K5/00—Use of organic ingredients
- C08K5/0008—Organic ingredients according to more than one of the "one dot" groups of C08K5/01 - C08K5/59
- C08K5/0016—Plasticisers
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
- C08K5/00—Use of organic ingredients
- C08K5/04—Oxygen-containing compounds
- C08K5/10—Esters; Ether-esters
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
- C08K5/00—Use of organic ingredients
- C08K5/16—Nitrogen-containing compounds
- C08K5/29—Compounds containing one or more carbon-to-nitrogen double bonds
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09J—ADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
- C09J2203/00—Applications of adhesives in processes or use of adhesives in the form of films or foils
- C09J2203/326—Applications of adhesives in processes or use of adhesives in the form of films or foils for bonding electronic components such as wafers, chips or semiconductors
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09J—ADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
- C09J2301/00—Additional features of adhesives in the form of films or foils
- C09J2301/30—Additional features of adhesives in the form of films or foils characterized by the chemical, physicochemical or physical properties of the adhesive or the carrier
- C09J2301/302—Additional features of adhesives in the form of films or foils characterized by the chemical, physicochemical or physical properties of the adhesive or the carrier the adhesive being pressure-sensitive, i.e. tacky at temperatures inferior to 30°C
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09J—ADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
- C09J2301/00—Additional features of adhesives in the form of films or foils
- C09J2301/40—Additional features of adhesives in the form of films or foils characterized by the presence of essential components
- C09J2301/41—Additional features of adhesives in the form of films or foils characterized by the presence of essential components additives as essential feature of the carrier layer
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09J—ADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
- C09J2427/00—Presence of halogenated polymer
- C09J2427/006—Presence of halogenated polymer in the substrate
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09J—ADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
- C09J2433/00—Presence of (meth)acrylic polymer
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2221/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof covered by H01L21/00
- H01L2221/67—Apparatus for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components; Apparatus not specifically provided for elsewhere
- H01L2221/683—Apparatus for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components; Apparatus not specifically provided for elsewhere for supporting or gripping
- H01L2221/68304—Apparatus for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components; Apparatus not specifically provided for elsewhere for supporting or gripping using temporarily an auxiliary support
- H01L2221/68327—Apparatus for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components; Apparatus not specifically provided for elsewhere for supporting or gripping using temporarily an auxiliary support used during dicing or grinding
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2221/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof covered by H01L21/00
- H01L2221/67—Apparatus for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components; Apparatus not specifically provided for elsewhere
- H01L2221/683—Apparatus for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components; Apparatus not specifically provided for elsewhere for supporting or gripping
- H01L2221/68304—Apparatus for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components; Apparatus not specifically provided for elsewhere for supporting or gripping using temporarily an auxiliary support
- H01L2221/68327—Apparatus for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components; Apparatus not specifically provided for elsewhere for supporting or gripping using temporarily an auxiliary support used during dicing or grinding
- H01L2221/68336—Apparatus for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components; Apparatus not specifically provided for elsewhere for supporting or gripping using temporarily an auxiliary support used during dicing or grinding involving stretching of the auxiliary support post dicing
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2221/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof covered by H01L21/00
- H01L2221/67—Apparatus for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components; Apparatus not specifically provided for elsewhere
- H01L2221/683—Apparatus for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components; Apparatus not specifically provided for elsewhere for supporting or gripping
- H01L2221/68304—Apparatus for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components; Apparatus not specifically provided for elsewhere for supporting or gripping using temporarily an auxiliary support
- H01L2221/68381—Details of chemical or physical process used for separating the auxiliary support from a device or wafer
Landscapes
- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Engineering & Computer Science (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Computer Hardware Design (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Manufacturing & Machinery (AREA)
- Physics & Mathematics (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Health & Medical Sciences (AREA)
- Medicinal Chemistry (AREA)
- Polymers & Plastics (AREA)
- Adhesive Tapes (AREA)
- Adhesives Or Adhesive Processes (AREA)
- Dicing (AREA)
Abstract
Provided is an adhesive sheet such that there is no decrease over time in pickup properties of a chip during a pickup step, and that can be used in production lines both having and not having heating before dicing. The adhesive sheet has an adhesive layer comprising an adhesive composition on a substrate film containing polyvinyl chloride and a polyester plasticizer, wherein the adhesive composition contains 100 parts by mass of a (meth)acrylic ester copolymer and 0.01-5 parts by mass of an isocyanate curing agent, and the (meth)acrylic ester compolymer has a weight average molecular weight of 400,000-1,000,000 and contains 40-90 mass pcnt of a butyl(meth)acrylate unit, 5-55 mass pcnt of a methyl(meth)acrylate unit, and 0.1-10 mass pcnt of a monomer unit having a hydroxyl group.
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2013123221 | 2013-06-11 | ||
| PCT/JP2014/065369 WO2014199992A1 (en) | 2013-06-11 | 2014-06-10 | Adhesive sheet and method for producing electronic component using adhesive sheet |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| PH12015502734A1 true PH12015502734A1 (en) | 2016-03-14 |
| PH12015502734B1 PH12015502734B1 (en) | 2019-02-08 |
Family
ID=52022284
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| PH12015502734A PH12015502734B1 (en) | 2013-06-11 | 2015-12-07 | Adhesive sheet and method of manufacturing electronic component using the same |
Country Status (6)
| Country | Link |
|---|---|
| JP (1) | JP6429397B2 (en) |
| KR (1) | KR102215979B1 (en) |
| CN (1) | CN105264035B (en) |
| PH (1) | PH12015502734B1 (en) |
| TW (1) | TWI643927B (en) |
| WO (1) | WO2014199992A1 (en) |
Families Citing this family (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| EP3075805B1 (en) | 2015-04-01 | 2019-01-30 | Nitto Denko Corporation | Pressure-sensitive adhesive tape |
| JP6667212B2 (en) * | 2015-05-18 | 2020-03-18 | ロンシール工業株式会社 | Adhesive tape base film |
| KR102594220B1 (en) * | 2016-02-29 | 2023-10-25 | 린텍 가부시키가이샤 | semiconductor processing sheet |
| KR102382843B1 (en) * | 2016-11-02 | 2022-04-05 | 린텍 가부시키가이샤 | Stealth dicing adhesive sheet and method for manufacturing semiconductor device using same |
| WO2019172345A1 (en) | 2018-03-07 | 2019-09-12 | デンカ株式会社 | Temporarily bonded body composed of ceramic resin complex and metal plate and method for manufacturing same, and transporter comprising said temporarily bonded body and delivery method using same |
| WO2021033715A1 (en) * | 2019-08-22 | 2021-02-25 | 昭和電工マテリアルズ株式会社 | Electronic component processing film and electronic component processing method |
| KR102328619B1 (en) * | 2020-06-18 | 2021-11-18 | 주식회사 씨앤제이글로벌 | Eco-friendly Coating Agent for Paper Straw |
Family Cites Families (17)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP3544362B2 (en) * | 2001-03-21 | 2004-07-21 | リンテック株式会社 | Method for manufacturing semiconductor chip |
| JP4776189B2 (en) | 2004-08-03 | 2011-09-21 | 古河電気工業株式会社 | Wafer processing tape |
| JP5089895B2 (en) | 2006-03-15 | 2012-12-05 | 電気化学工業株式会社 | The multilayer adhesive sheet, the adhesive sheet for multilayer adhesive sheets, and the manufacturing method of the electronic component using a multilayer adhesive sheet. |
| JP5057697B2 (en) * | 2006-05-12 | 2012-10-24 | 日東電工株式会社 | Adhesive sheet for processing semiconductor wafers or semiconductor substrates |
| WO2008044561A1 (en) * | 2006-10-03 | 2008-04-17 | Emulsion Technology Co., Ltd. | Adhesive composition and adhesive sheet |
| JP5008999B2 (en) * | 2007-02-06 | 2012-08-22 | リンテック株式会社 | Dicing tape and method for manufacturing semiconductor device |
| JP2010065101A (en) | 2008-09-09 | 2010-03-25 | Sekisui Chem Co Ltd | Adhesive sheet for decoration |
| JP6085076B2 (en) * | 2009-03-16 | 2017-02-22 | リンテック株式会社 | Adhesive sheet, semiconductor wafer processing method, and semiconductor chip manufacturing method |
| JP4845065B2 (en) * | 2009-08-05 | 2011-12-28 | 古河電気工業株式会社 | Adhesive film and tape for semiconductor wafer processing |
| US20120258572A1 (en) * | 2009-12-21 | 2012-10-11 | Denki Kagaku Kogyo Kabushiki Kaisha | Adhesive sheet and production method for electronic component |
| JP2011202126A (en) * | 2010-03-26 | 2011-10-13 | Nippon Synthetic Chem Ind Co Ltd:The | Adhesive sheet |
| WO2012017568A1 (en) * | 2010-08-05 | 2012-02-09 | 古河電気工業株式会社 | Adhesive film and tape for semiconductor wafer processing |
| KR101385844B1 (en) * | 2010-10-20 | 2014-04-21 | 주식회사 엘지화학 | Pressure-sensitive adhesive composition for touch panel |
| TWI507499B (en) * | 2010-11-02 | 2015-11-11 | Nippon Synthetic Chem Ind | Adhesive sheet, both-sided adhesive sheet, touch panel and image display device |
| PH12013502665B1 (en) * | 2011-06-27 | 2018-11-09 | Denki Kagaku Kogyo Kk | Adhesive sheet |
| KR101591559B1 (en) * | 2011-07-19 | 2016-02-04 | 주식회사 엘지화학 | Touch panel |
| JP5947313B2 (en) | 2011-12-02 | 2016-07-06 | デンカ株式会社 | Adhesive sheet and method for producing electronic component using adhesive sheet |
-
2014
- 2014-06-10 WO PCT/JP2014/065369 patent/WO2014199992A1/en not_active Ceased
- 2014-06-10 CN CN201480031673.1A patent/CN105264035B/en active Active
- 2014-06-10 JP JP2015522795A patent/JP6429397B2/en active Active
- 2014-06-10 KR KR1020157034254A patent/KR102215979B1/en active Active
- 2014-06-11 TW TW103120124A patent/TWI643927B/en active
-
2015
- 2015-12-07 PH PH12015502734A patent/PH12015502734B1/en unknown
Also Published As
| Publication number | Publication date |
|---|---|
| JPWO2014199992A1 (en) | 2017-02-23 |
| CN105264035A (en) | 2016-01-20 |
| TW201500514A (en) | 2015-01-01 |
| JP6429397B2 (en) | 2018-11-28 |
| KR102215979B1 (en) | 2021-02-16 |
| WO2014199992A1 (en) | 2014-12-18 |
| PH12015502734B1 (en) | 2019-02-08 |
| TWI643927B (en) | 2018-12-11 |
| KR20160018505A (en) | 2016-02-17 |
| CN105264035B (en) | 2017-10-13 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| PH12015502734A1 (en) | Adhesive sheet and method of manufacturing electronic component using the same | |
| JP2015025125A5 (en) | ||
| PH12018500421A1 (en) | Adhesive agent composition and adhesive sheet | |
| JP2013064079A5 (en) | ||
| EP4389843A3 (en) | Compositions and films comprising polylactic acid polymer, polyvinyl acetate polymer and plasticizer | |
| WO2017112468A3 (en) | Acrylic films comprising a structured layer | |
| JP2010215923A5 (en) | ||
| WO2017112453A3 (en) | Acrylic polyvinyl acetal films comprising a second layer | |
| JP2016033215A5 (en) | ||
| MX2016004011A (en) | Articles and methods comprising polyacrylate primer with nitrogen-containing polymer. | |
| PH12012502529A1 (en) | Multilayer adhesive sheet and method for manufacturing electronic component | |
| MY181765A (en) | Heat-resistant adhesive sheet for semiconductor testing | |
| TW201612277A (en) | Adhesive composition, adhesive obtained by crosslinking same, adhesive for masking films, adhesive for heat-resistant adhesive films, heat-resistant adhesive film for masking, and method for using heat-resistant adhesive film for masking | |
| WO2012141723A3 (en) | Surface treated film and/or laminate | |
| WO2013154695A3 (en) | Surface treated film and/or laminate | |
| MX2016013042A (en) | Wet and dry surface adhesives. | |
| MY204845A (en) | Low outgassing clean adhesive | |
| JP2008516054A5 (en) | ||
| JP2015059133A5 (en) | ||
| PH12016500005B1 (en) | Dicing sheet | |
| JP2018515638A5 (en) | ||
| MY164532A (en) | Adhesive sheet | |
| TW201129669A (en) | Adhesive sheet and production method of electronic parts | |
| ATE497525T1 (en) | ACRYLIC HOT ADHESIVE | |
| JP2016094616A5 (en) |