KR20180132599A - Photosensitive compositions and novel compounds - Google Patents
Photosensitive compositions and novel compounds Download PDFInfo
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- KR20180132599A KR20180132599A KR1020187015982A KR20187015982A KR20180132599A KR 20180132599 A KR20180132599 A KR 20180132599A KR 1020187015982 A KR1020187015982 A KR 1020187015982A KR 20187015982 A KR20187015982 A KR 20187015982A KR 20180132599 A KR20180132599 A KR 20180132599A
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- South Korea
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- carbon atoms
- photosensitive composition
- represented
- compound
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- 125000001424 substituent group Chemical group 0.000 claims abstract description 107
- 125000000217 alkyl group Chemical group 0.000 claims abstract description 57
- 125000000623 heterocyclic group Chemical group 0.000 claims abstract description 53
- 125000003118 aryl group Chemical group 0.000 claims abstract description 49
- 125000003710 aryl alkyl group Chemical group 0.000 claims abstract description 30
- 125000004435 hydrogen atom Chemical group [H]* 0.000 claims abstract description 30
- 125000005843 halogen group Chemical group 0.000 claims abstract description 20
- 125000002887 hydroxy group Chemical group [H]O* 0.000 claims abstract description 18
- 125000003178 carboxy group Chemical group [H]OC(*)=O 0.000 claims abstract description 14
- 125000000449 nitro group Chemical group [O-][N+](*)=O 0.000 claims abstract description 11
- 125000004093 cyano group Chemical group *C#N 0.000 claims abstract description 9
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- 239000003795 chemical substances by application Substances 0.000 description 4
- 125000001511 cyclopentyl group Chemical group [H]C1([H])C([H])([H])C([H])([H])C([H])(*)C1([H])[H] 0.000 description 4
- 235000014113 dietary fatty acids Nutrition 0.000 description 4
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- AAAQKTZKLRYKHR-UHFFFAOYSA-N triphenylmethane Chemical compound C1=CC=CC=C1C(C=1C=CC=CC=1)C1=CC=CC=C1 AAAQKTZKLRYKHR-UHFFFAOYSA-N 0.000 description 1
- KJWHEZXBZQXVSA-UHFFFAOYSA-N tris(prop-2-enyl) phosphite Chemical compound C=CCOP(OCC=C)OCC=C KJWHEZXBZQXVSA-UHFFFAOYSA-N 0.000 description 1
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Classifications
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
- C07C43/00—Ethers; Compounds having groups, groups or groups
- C07C43/02—Ethers
- C07C43/20—Ethers having an ether-oxygen atom bound to a carbon atom of a six-membered aromatic ring
- C07C43/205—Ethers having an ether-oxygen atom bound to a carbon atom of a six-membered aromatic ring the aromatic ring being a non-condensed ring
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
- C08K5/00—Use of organic ingredients
- C08K5/0008—Organic ingredients according to more than one of the "one dot" groups of C08K5/01 - C08K5/59
- C08K5/005—Stabilisers against oxidation, heat, light, ozone
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07D—HETEROCYCLIC COMPOUNDS
- C07D249/00—Heterocyclic compounds containing five-membered rings having three nitrogen atoms as the only ring hetero atoms
- C07D249/16—Heterocyclic compounds containing five-membered rings having three nitrogen atoms as the only ring hetero atoms condensed with carbocyclic rings or ring systems
- C07D249/18—Benzotriazoles
- C07D249/20—Benzotriazoles with aryl radicals directly attached in position 2
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07D—HETEROCYCLIC COMPOUNDS
- C07D251/00—Heterocyclic compounds containing 1,3,5-triazine rings
- C07D251/02—Heterocyclic compounds containing 1,3,5-triazine rings not condensed with other rings
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Abstract
하기 일반식(1)로 나타내는 치환기를 가지는 화합물을 함유하는 감광성 조성물.
(식 중, R1 및 R2는, 각각 독립적으로 수소 원자, 할로겐 원자, 시아노기, 수산기, 니트로기, 카복실기, 치환기를 가지고 있는 경우도 있는 탄소 원자 수 1~40의 알킬기, 탄소 원자 수 6~20의 아릴기, 탄소 원자 수 7~20의 아릴알킬기, 탄소 원자 수 2~20의 복소환함유기, 또는 트리알킬실릴기를 나타내고, j는 1~3의 수를 나타내며, *는 *부분에서 인접하는 기와 결합하는 것을 의미한다.)A photosensitive composition comprising a compound having a substituent represented by the following general formula (1).
(Wherein R 1 and R 2 are each independently a hydrogen atom, a halogen atom, a cyano group, a hydroxyl group, a nitro group, a carboxyl group, an alkyl group having 1 to 40 carbon atoms, An aryl group having 6 to 20 carbon atoms, an arylalkyl group having 7 to 20 carbon atoms, a heterocyclic ring-containing group having 2 to 20 carbon atoms, or a trialkylsilyl group, j represents a number of 1 to 3, Means to combine with adjacent groups in.
Description
본 발명은, 특정 구조를 가지고, 상온에서는 불활성이며 소정 온도로 가열함으로써 활성화되어 기능을 발현하는 화합물을 함유하는 감광성 조성물, 및 신규 화합물에 관한 것이다. 또한, 본 발명은, 상기 감광성 조성물에 착색제를 첨가한 착색 감광성 조성물 및 상기 착색 감광성 조성물을 사용한 컬러 필터에 관한 것이다. The present invention relates to a photosensitive composition which has a specific structure and is inert at room temperature and which is activated by heating to a predetermined temperature to express a function, and a novel compound. The present invention also relates to a colored photosensitive composition to which a coloring agent is added to the photosensitive composition and a color filter using the colored photosensitive composition.
감광성 조성물의 내후성이나 내열성을 향상시키기 위해, 자외선 흡수제나 산화방지제를 첨가하여 안정화시키는 방법이 알려져 있다(특허문헌 1~4). In order to improve the weather resistance and heat resistance of the photosensitive composition, there is known a method of stabilizing by adding an ultraviolet absorber or an antioxidant (Patent Documents 1 to 4).
페놀계 산화방지제 및 자외선 흡수제는 폴리머의 열화(劣化)에 크게 영향을 주는 라디칼을 트랩하는 작용이 있으므로 이들을 중합계 내에 첨가하면, 일반적으로 이른바 중합 금지제로서 작용하고, 경화(硬化) 저해를 일으키는 것이 문제가 되기 때문에 잠재성 첨가제가 개발되어 왔다(특허문헌 5). Phenol-based antioxidants and ultraviolet absorbers have an action of trapping radicals that greatly affect deterioration of the polymer. Therefore, when they are added to the polymerization system, they generally act as so-called polymerization inhibitors and cause curing (inhibition) The potential additive has been developed (Patent Document 5).
그러나 종래의 잠재성 첨가제를 사용한 조성물은 아웃 가스가 많고, 그 때문에 가열 장치가 오염되거나 조성물의 물성이 저하된다는 문제가 있다. 장치의 오염이나 물성의 저감화라는 문제가 있다. 또한, 종래의 잠재성 첨가제를 사용한 조성물은 그 경화물의 내용제성(耐溶劑性)이 낮고, 그 때문에 경화물의 용출이 일어나며, 예를 들면 컬러 필터의 휘도를 저하시킨다는 문제도 있다. However, the conventional compositions using the latent additive have a problem that the outgass is large, and thus the heating device is contaminated or the physical properties of the composition are deteriorated. There is a problem of contamination of the apparatus and reduction of physical properties. In addition, the conventional composition using the latent additive has a low solvent resistance of the cured product, resulting in the elution of the cured product, for example, reducing the brightness of the color filter.
또한, 특허문헌 6에는 경화제로서 유용한 트리알릴페놀 화합물이 개시되어 있지만, 상기 트리알릴페놀 화합물을 함유하는 감광성 조성물은 시사되어 있지 않다. Patent Document 6 discloses a triallyl phenol compound useful as a curing agent, but a photosensitive composition containing the triallyl phenol compound is not suggested.
따라서 본 발명의 목적은, 상온에서는 불활성이고 소정 온도로 가열함으로써 활성화되어 산화방지제나 자외선 흡수제로서의 기능을 발현하는 화합물을 사용한, 아웃 가스가 적고 경화물의 내용제성이 높은 감광성 조성물을 제공하는 것에 있다. 또한, 본 발명의 다른 목적은, 상기 감광성 조성물에 착색제를 첨가한 착색 감광성 조성물, 특히 컬러 필터에 적합한 착색 감광성 조성물을 제공하는 것에 있다. Accordingly, an object of the present invention is to provide a photosensitive composition which is inert at room temperature and which is activated by heating at a predetermined temperature and which exhibits a function as an antioxidant or an ultraviolet absorber, and which has low outgassing and high solvent resistance of the cured product. Another object of the present invention is to provide a colored photosensitive composition to which a coloring agent is added to the photosensitive composition, particularly a colored photosensitive composition suitable for a color filter.
본 발명자들은 예의 검토를 거듭한 결과, 특정 보호기를 가지는 화합물을 사용한 감광성 조성물은 아웃 가스가 적고, 그 경화물의 내용제성이 높은 것을 지견하고, 또한 상기 감광성 조성물에 착색제를 첨가한 착색 감광성 조성물이 광학 필터(특히 컬러 필터)의 휘도를 저하시키지 않고, 액정표시패널 등의 화상표시장치용 컬러 필터에 적합한 것을 지견하여 본 발명에 도달하였다. As a result of intensive investigations, the inventors of the present invention have found that a photosensitive composition using a compound having a specific protecting group has little out-gas and has a high solvent resistance of the cured product. Further, the colored photosensitive composition, The inventors of the present invention have arrived at the present invention by knowing that they are suitable for a color filter for an image display apparatus such as a liquid crystal display panel without lowering the luminance of the filter (particularly, the color filter).
본 발명은, 상기 지견에 기초하여 이루어진 것으로, 하기 일반식(1)로 나타내는 치환기를 가지는 화합물을 함유하는 감광성 조성물을 제공하는 것이다. The present invention is based on the above finding, and provides a photosensitive composition containing a compound having a substituent represented by the following general formula (1).
(식 중, R1 및 R2는, 각각 독립적으로 수소 원자, 할로겐 원자, 시아노기, 수산기, 니트로기, 카복실기, 치환기를 가지고 있는 경우도 있는 탄소 원자 수 1~40의 알킬기, 치환기를 가지고 있는 경우도 있는 탄소 원자 수 6~20의 아릴기, 치환기를 가지고 있는 경우도 있는 탄소 원자 수 7~20의 아릴알킬기, 치환기를 가지고 있는 경우도 있는 탄소 원자 수 2~20의 복소환함유기 또는 트리알킬실릴기를 나타내고, (Wherein R 1 and R 2 each independently represent a hydrogen atom, a halogen atom, a cyano group, a hydroxyl group, a nitro group, a carboxyl group, an alkyl group having 1 to 40 carbon atoms which may have a substituent, An aryl group having 6 to 20 carbon atoms, an arylalkyl group having 7 to 20 carbon atoms, which may have a substituent, a heterocyclic ring-containing group having 2 to 20 carbon atoms, which may have a substituent, or A trialkylsilyl group,
R1 및 R2로 나타내는 알킬기 또는 아릴알킬기 중의 메틸렌기는, -O-, -S-, -CO-, -O-CO-, -CO-O-, -O-CO-O-, -S-CO-, -CO-S-, -S-CO-O-, -O-CO-S-, -CO-NH-, -NH-CO-, -NH-CO-O-, -NR'-, -S-S- 또는 -SO2-에서 선택된 기를 산소 원자가 서로 이웃하지 않는 조건으로 조합한 기로 치환되어 있는 경우도 있고, R'는 수소 원자 또는 탄소 원자 수 1~8의 알킬기를 나타내며, The methylene group in the alkyl group or arylalkyl group represented by R 1 and R 2 is preferably -O-, -S-, -CO-, -O-CO-, -CO-O-, -O- -CO-O-, -O-CO-S-, -CO-NH-, -NH-CO-, -NH-CO-O-, -NR'-, -SS- or -SO 2 - may be substituted with a group in which oxygen atoms are not adjacent to each other, and R 'represents a hydrogen atom or an alkyl group having 1 to 8 carbon atoms,
j는 1~3의 수를 나타내고, j represents a number of 1 to 3,
*는 * 부분에서 인접하는 기와 결합하는 것을 의미한다.) * Means combining with adjacent groups in the * part.)
이하, 본 발명에 대해 바람직한 실시형태에 기초하여 상세하게 설명한다. Hereinafter, the present invention will be described in detail based on preferred embodiments.
본 발명의 감광성 조성물은 상기 일반식(I)로 나타내는 치환기를 가지는 화합물을 함유한다. The photosensitive composition of the present invention contains a compound having a substituent represented by the general formula (I).
상기 일반식(I)로 나타내는 치환기를 가지는 화합물 중에서도 하기 일반식(I-A)로 나타내는 것이 특히 내열성이 높고 아웃 가스가 적으므로 바람직하다. Among the compounds having a substituent represented by the general formula (I), those represented by the following general formula (I-A) are particularly preferable because they have high heat resistance and little outgassing.
(식 중, n은 1~10의 정수를 나타내고, (Wherein n represents an integer of 1 to 10,
X1은 n가의 결합기를 나타내며, X 1 represents an n-valent coupler,
R1, R2 및 j는 상기 일반식(I)과 동일하다.) R 1 , R 2 and j are the same as in the general formula (I).)
R1 및 R2로 나타내는 할로겐 원자로는 불소, 염소, 브롬, 요오드를 들 수 있고, Examples of the halogen atom represented by R 1 and R 2 include fluorine, chlorine, bromine and iodine,
R1 및 R2로 나타내는 탄소 원자 수 1~20의 알킬기로는 메틸, 에틸, 프로필, iso-프로필, 부틸, sec-부틸, tert-부틸, iso-부틸, 아밀, iso-아밀, tert-아밀, 시클로펜틸, 헥실, 2-헥실, 3-헥실, 시클로헥실, 4-메틸시클로헥실, 헵틸, 2-헵틸, 3-헵틸, iso-헵틸, tert-헵틸, 1-옥틸, iso-옥틸, tert-옥틸, 아다만틸 등을 들 수 있으며, Examples of the alkyl group having 1 to 20 carbon atoms represented by R 1 and R 2 include methyl, ethyl, propyl, isopropyl, butyl, sec-butyl, tert-butyl, isobutyl, amyl, isoamyl, Heptyl, iso-heptyl, tert-heptyl, 1-octyl, iso-octyl, tert-butyl, tert-butyl, - octyl, adamantyl and the like,
R1 및 R2로 나타내는 탄소 원자 수 6~20의 아릴기로는 페닐, 나프틸, 안트라세닐, 페난트릴, 플루오레닐, 인데닐, 2-메틸페닐, 3-메틸페닐, 4-메틸페닐, 4-비닐페닐, 3-iso-프로필페닐, 4-iso-프로필페닐, 4-부틸페닐, 4-iso-부틸페닐, 4-tert-부틸페닐, 4-헥실페닐, 4-시클로헥실페닐, 4-옥틸페닐, 4-(2-에틸헥실)페닐, 4-스테아릴페닐, 2,3-디메틸페닐, 2,4-디메틸페닐, 2,5-디메틸페닐, 2,6-디메틸페닐, 3,4-디메틸페닐, 3,5-디메틸페닐, 2,4-디-tert-부틸페닐, 2,5-디-tert-부틸페닐, 2,6-디-tert-부틸페닐, 2,4-디-tert-펜틸페닐, 2,5-디-tert-아밀페닐, 2,5-디-tert-옥틸페닐, 2,4-디쿠밀페닐, 4-시클로헥실페닐, (1,1'-비페닐)-4-일, 2,4,5-트리메틸페닐, 페로세닐 등을 들 수 있고, Examples of the aryl group having 6 to 20 carbon atoms represented by R 1 and R 2 include phenyl, naphthyl, anthracenyl, phenanthryl, fluorenyl, indenyl, 2-methylphenyl, 3-methylphenyl, Phenyl, 4-cyclohexylphenyl, 4-cyclohexylphenyl, 4-isopropylphenyl, 4-isopropylphenyl, 4-iso-butylphenyl, , 2,4-dimethylphenyl, 2,5-dimethylphenyl, 2,6-dimethylphenyl, 3,4-dimethylphenyl, Butylphenyl, 2,4-di-tert-butylphenyl, 2,6-di-tert- Butylphenyl, 2,5-di-tert-amylphenyl, 2,5-di-tert-octylphenyl, 2,4-dicumylphenyl, 4-cyclohexylphenyl, (1,1'- -, 2,4,5-trimethylphenyl, ferrocenyl and the like,
R1 및 R2로 나타내는 탄소 원자 수 7~20의 아릴알킬기로는 벤질, 1-메틸-1-페닐에틸, 1-나프틸메틸, 9-안트라세닐메틸, 9-플루오레닐, 3-페닐프로필, 메틸-2-페닐프로판-2-일, 디페닐메틸, 트리페닐메틸, 페네틸, 스티릴, 신나밀 등을 들 수 있으며,Examples of the arylalkyl group having 7 to 20 carbon atoms represented by R 1 and R 2 include benzyl, 1-methyl-1-phenylethyl, 1-naphthylmethyl, 9-anthracenylmethyl, Propyl, methyl-2-phenylpropan-2-yl, diphenylmethyl, triphenylmethyl, phenethyl, styryl, cinnamyl,
R1 및 R2로 나타내는 탄소 원자 수 2~20의 복소환함유기로는 피리딘 환(環), 피리미딘 환, 피리다진 환, 피페리딘 환, 피란 환, 피라졸린 환, 트리아진 환, 피롤린 환, 퀴놀린 환, 이소퀴놀린 환, 이미다졸린 환, 벤조이미다졸린 환, 트리아졸린 환, 퓨란 환, 벤조퓨란 환, 티아디아졸린 환, 티아졸린 환, 벤조티아졸린 환, 티오펜 환, 옥사졸린 환, 벤조옥사졸린 환, 이소티아졸린 환, 이소옥사졸린 환, 인돌 환, 피롤리딘 환, 피페리돈 환, 디옥산 환 등의 복소환과 메틸렌 쇄를 조합한 기를 들 수 있고,Examples of the heterocyclic group having 2 to 20 carbon atoms represented by R 1 and R 2 include a pyridine ring, a pyrimidine ring, a pyridazine ring, a piperidine ring, a pyran ring, a pyrazoline ring, a triazine ring, A benzofuran ring, a thiazoline ring, a benzothiazoline ring, a thiophene ring, a thiophene ring, a thiophene ring, a thiophene ring, a thiophene ring, a thiophene ring, A group obtained by combining a methylene chain with a heterocycle such as an oxazoline ring, a benzoxazoline ring, an isothiazoline ring, an isoxazoline ring, an indole ring, a pyrrolidine ring, a piperidone ring and a dioxane ring,
R1 및 R2로 나타내는 트리알킬실릴기로는 트리메틸실란, 트리에틸실란, 에틸디메틸실란 등의 탄소 원자 수 1~6의 알킬기(3개의 알킬기는 동일하거나 다름)로 치환된 실릴기를 들 수 있다. Examples of the trialkylsilyl group represented by R 1 and R 2 include a silyl group substituted with an alkyl group having 1 to 6 carbon atoms (three alkyl groups being the same or different) such as trimethylsilane, triethylsilane, and ethyldimethylsilane.
R'로 나타내는 탄소 원자 수 1~8의 알킬기로는 R1로 나타내는 상기 알킬기 중, 소정의 탄소 원자 수를 충족하는 것을 들 수 있다. Examples of the alkyl group having 1 to 8 carbon atoms represented by R 'include those satisfying the predetermined number of carbon atoms in the alkyl group represented by R 1 .
R1 및 R2로 나타내는 탄소 원자 수 1~40의 알킬기, 탄소 원자 수 6~20의 아릴기, 탄소 원자 수 7~20의 아릴알킬기 또는 탄소 원자 수 2~20의 복소환함유기를 치환하는 치환기로는 비닐, 알릴, 아크릴, 메타크릴 등의 에틸렌성 불포화기; 불소, 염소, 브롬, 요오드 등의 할로겐 원자; 아세틸, 2-클로로아세틸, 프로피오닐, 옥탄오일, 아크릴로일, 메타크릴로일, 페닐카보닐(벤조일), 프탈로일, 4-트리플루오로메틸벤조일, 피발로일, 살리실로일, 옥살로일, 스테아로일, 메톡시카보닐, 에톡시카보닐, t-부톡시카보닐, n-옥타데실옥시카보닐, 카바모일 등의 아실기; 아세틸옥시, 벤조일옥시 등의 아실옥시기; 아미노, 에틸아미노, 디메틸아미노, 디에틸아미노, 부틸아미노, 시클로펜틸아미노, 2-에틸헥실아미노, 도데실아미노, 아닐리노, 클로로페닐아미노, 톨루이디노, 아니시디노, N-메틸-아닐리노, 디페닐아미노, 나프틸아미노, 2-피리딜아미노, 메톡시카보닐아미노, 페녹시카보닐아미노, 아세틸아미노, 벤조일아미노, 포르밀아미노, 피발로일아미노, 라우로일아미노, 카바모일아미노, N,N-디메틸아미노카보닐아미노, N,N-디에틸아미노카보닐아미노, 모르폴리노카보닐아미노, 메톡시카보닐아미노, 에톡시카보닐아미노, t-부톡시카보닐아미노, n-옥타데실옥시카보닐아미노, N-메틸-메톡시카보닐아미노, 페녹시카보닐아미노, 술파모일아미노, N,N-디메틸아미노술포닐아미노, 메틸술포닐아미노, 부틸술포닐아미노, 페닐술포닐아미노 등의 치환 아미노기; 술폰아미드기, 술포닐기, 카복실기, 시아노기, 술포기, 수산기, 니트로기, 메르캅토기, 이미드기, 카바모일기, 술폰아미드기, 포스폰산기, 인산기 또는 카복실기, 술포기, 포스폰산기, 인산기의 염 등을 들 수 있다. An alkyl group having 1 to 40 carbon atoms represented by R 1 and R 2 , an aryl group having 6 to 20 carbon atoms, an arylalkyl group having 7 to 20 carbon atoms or a heterocyclic ring-containing group having 2 to 20 carbon atoms Include ethylenic unsaturated groups such as vinyl, allyl, acryl, and methacryl; Halogen atoms such as fluorine, chlorine, bromine and iodine; Examples of the substituents are acetyl, 2-chloroacetyl, propionyl, octanoyl, acryloyl, methacryloyl, phenylcarbonyl (benzoyl), phthaloyl, 4-trifluoromethylbenzoyl, pivaloyl, salicyloyl, An acyl group such as saloyl, stearoyl, methoxycarbonyl, ethoxycarbonyl, t-butoxycarbonyl, n-octadecyloxycarbonyl or carbamoyl; Acyloxy groups such as acetyloxy and benzoyloxy; Amino, ethylamino, dimethylamino, diethylamino, butylamino, cyclopentylamino, 2-ethylhexylamino, dodecylamino, anilino, chlorophenylamino, toluidino, anisidino, Wherein the alkyl moiety is selected from the group consisting of methyl, ethyl, propyl, isopropyl, butyl, isobutyl, sec-butyl, isobutyl, N-dimethylaminocarbonylamino, N, N-diethylaminocarbonylamino, morpholinocarbonylamino, methoxycarbonylamino, ethoxycarbonylamino, t-butoxycarbonylamino, n- N-dimethylaminosulfonylamino, methylsulfonylamino, butylsulfonylamino, phenylsulfonylamino, N, N-dimethylaminosulfonylamino, N-methyl-methoxycarbonylamino, phenoxycarbonylamino, sulfamoylamino, A substituted amino group such as amino; A sulfonic acid group, a phosphoric acid group or a carboxyl group, a sulfonic acid group, a sulfonic acid group, a sulfonic acid group, a sulfonic acid group, a sulfonic acid group, a sulfonic acid group, a carboxyl group, An acid group, a salt of a phosphoric acid group, and the like.
R1 및 R2로는, 수소 원자, 탄소 원자 수 1~8의 알킬기, 탄소 원자 수 6~12의 아릴기가 아웃 가스가 적기 때문에 바람직하다. R1 및 R2가 수소 원자 또는 분기를 가지는 탄소 원자 수 1~8의 알킬기, 특히 t-부틸기 중 어느 하나인 것이 아웃 가스가 적기 때문에 더 바람직하다. As R 1 and R 2 , a hydrogen atom, an alkyl group having 1 to 8 carbon atoms, and an aryl group having 6 to 12 carbon atoms are preferable because the out gas is small. It is more preferable that R 1 and R 2 are any one of a hydrogen atom or an alkyl group having 1 to 8 carbon atoms having a branch, particularly a t-butyl group because the out gas is small.
상기 일반식(I-A)에서 X1은 n가의 결합기를 나타내고, 구체적으로는, 예를 들면 직접 결합, 수소 원자, 질소 원자, 산소 원자, 유황 원자, 인 원자, 하기 (I-a) 혹은 (I-b)로 나타내는 기, -CO-, -NH-CO-, -CO-NH-, -NR3-, -OR3, -SR3, -NR3R4, 또는 n과 동일한 수의 가수(價數)를 가지는, 치환기를 가지고 있는 경우도 있는 탄소 원자 수 1~120의 지방족 탄화수소기, 치환기를 가지고 있는 경우도 있는 탄소 원자 수 6~35의 방향환함유 탄화수소기, 혹은 치환기를 가지고 있는 경우도 있는 탄소 원자 수 2~35의 복소환함유기를 나타내고, R3 및 R4는 수소 원자, 치환기를 가지고 있는 경우도 있는 탄소 원자 수 1~35의 지방족 탄화수소기, 치환기를 가지고 있는 경우도 있는 탄소 원자 수 6~35의 방향환함유 탄화수소기 또는 치환기를 가지고 있는 경우도 있는 탄소 원자 수 2~35의 복소환함유기를 나타내며, 지방족 탄화수소기, 방향환함유 탄화수소기 및 복소환함유기는 탄소-탄소 이중결합, -O-, -S-, -CO-, -O-CO-, -CO-O-, -O-CO-O-, -S-CO-, -CO-S-, -S-CO-O-, -O-CO-S-, -CO-NH-, -NH-CO-, -NH-CO-O-, -O-CO-NH-, -NR'-, -S-S-, -SO2- 또는 질소 원자에서 선택된 기로 치환되어 있는 경우도 있다. In the general formula (IA), X 1 represents an n-valent linking group, and specific examples thereof include a direct bond, a hydrogen atom, a nitrogen atom, an oxygen atom, a sulfur atom, -CO-, -NH-CO-, -CO-NH-, -NR 3 -, -OR 3 , -SR 3 , -NR 3 R 4 or the same number of valency as n An aliphatic hydrocarbon group of 1 to 120 carbon atoms which may have a substituent, an aromatic ring-containing hydrocarbon group of 6 to 35 carbon atoms which may have a substituent, or a carbon atom which may have a substituent R 3 and R 4 each represent a hydrogen atom, an aliphatic hydrocarbon group of 1 to 35 carbon atoms which may have a substituent, an aliphatic hydrocarbon group of 6 to 30 carbon atoms which may have a substituent, An aromatic ring-containing hydrocarbon group having 35 to 35 carbon atoms or a complex having 2 to 35 carbon atoms which may have a substituent An alicyclic hydrocarbon group, an aromatic ring-containing hydrocarbon group and a heterocyclic ring-containing group may be a carbon-carbon double bond, -O-, -S-, -CO-, -O-CO-, -CO- -CO-O-, -S-CO-, -CO-S-, -S-CO-O-, -O-CO-S-, -CO-NH-, -NH- CO-O-, -O-CO-NH-, -NR'-, -SS-, -SO 2 - or a nitrogen atom.
단, X1이 질소 원자, 인 원자 또는 하기 (I-a) 혹은 (I-b)로 나타내는 결합기인 경우, n은 3이고, X1이 산소 원자 또는 유황 원자, -CO-, -NH-CO-, -CO-NH- 또는 -NR3-인 경우, n은 2이며, X1이 수소 원자, -OR3, -SR3 또는 -NR3R4인 경우, n은 1이고, X1은 벤젠 환과 하나가 되어 환을 형성하고 있는 경우도 있다. Provided that when X 1 is a nitrogen atom, a phosphorus atom or a bonding group represented by the following formula (Ia) or (Ib), n is 3 and X 1 is an oxygen atom or a sulfur atom, -CO-, -NH- CO-NH- or -NR 3 - If, wherein n is 2, when X 1 is a hydrogen atom, -OR 3, -SR 3 or -NR 3 R 4, n is 1, X 1 is a benzene ring Or the like, to form a ring.
(*는 * 부분에서 인접하는 기와 결합하는 것을 의미한다.) (* Means combining with adjacent groups in the * part.)
상기 일반식(I-A)로 나타내는 화합물은 X1로 나타내는 n가의 결합기에 n개의 특정 기가 결합한 구조를 가진다. 이 n개의 기는 서로 동일하거나 다르다. n의 값은 1~10이고, 낮은 아웃 가스의 관점에서 바람직하게는 2~6이다. The compound represented by the general formula (IA) has a structure in which n specific groups are bonded to an n-valent bond group represented by X 1 . These n groups are the same or different from each other. The value of n is 1 to 10, and preferably 2 to 6 from the viewpoint of low outgassing.
상기 일반식(I-A)에서의 X1로 나타내고, n과 동일한 수의 가수를 가지는, 치환기를 가지고 있는 경우도 있는 탄소 원자 수 1~120의 지방족 탄화수소기로는 n이 1가인 것으로서, 예를 들면 메틸, 에틸, 프로필, 이소프로필, 시클로프로필, 부틸, 제2부틸, 제3부틸, 이소부틸, 아밀, 이소아밀, 제3아밀, 시클로펜틸, 헥실, 2-헥실, 3-헥실, 시클로헥실, 비시클로헥실, 1-메틸시클로헥실, 헵틸, 2-헵틸, 3-헵틸, 이소헵틸, 제3헵틸, n-옥틸, 이소옥틸, 제3옥틸, 2-에틸헥실, 노닐, 이소노닐, 데실 등의 알킬기; 메틸옥시, 에틸옥시, 프로필옥시, 이소프로필옥시, 부틸옥시, 제2부틸옥시, 제3부틸옥시, 이소부틸옥시, 아밀옥시, 이소아밀옥시, 제3아밀옥시, 헥실옥시, 시클로헥실옥시, 헵틸옥시, 이소헵틸옥시, 제3헵틸옥시, n-옥틸옥시, 이소옥틸옥시, 제3옥틸옥시, 2-에틸헥실옥시, 노닐옥시, 데실옥시 등의 알콕시기; 메틸티오, 에틸티오, 프로필티오, 이소프로필티오, 부틸티오, 제2부틸티오, 제3부틸티오, 이소부틸티오, 아밀티오, 이소아밀티오, 제3아밀티오, 헥실티오, 시클로헥실티오, 헵틸티오, 이소헵틸티오, 제3헵틸티오, n-옥틸티오, 이소옥틸티오, 제3옥틸티오, 2-에틸헥실티오 등의 알킬티오기; 비닐, 1-메틸에테닐, 2-메틸에테닐, 2-프로페닐, 1-메틸-3-프로페닐, 3-부테닐, 1-메틸-3-부테닐, 이소부테닐, 3-펜테닐, 4-헥세닐, 시클로헥세닐, 비시클로헥세닐, 헵테닐, 옥테닐, 데세닐, 펜타데세닐, 에이코세닐(eicosenyl), 트리코세닐(tricosenyl) 등의 알케닐기; 및 이들 기가 후술하는 치환기에 의해 치환된 기 등을 들 수 있고, Examples of the aliphatic hydrocarbon group having 1 to 120 carbon atoms, which may have a substituent and have a number of the same number as n, represented by X 1 in the general formula (IA) include monovalent groups such as methyl , Ethyl, propyl, isopropyl, cyclopropyl, butyl, sec. Butyl, tert.butyl, isobutyl, amyl, isoamyl, tertiary amyl, cyclopentyl, hexyl, Cyclohexyl, 1-methylcyclohexyl, heptyl, 2heptyl, 3heptyl, isoheptyl, tertiary heptyl, n-octyl, isooctyl, tertiary octyl, 2-ethylhexyl, nonyl, isonyl, An alkyl group; But are not limited to, methyloxy, ethyloxy, propyloxy, isopropyloxy, butyloxy, sec-butyloxy, tert -butyloxy, isobutyloxy, amyloxy, isoamyloxy, tertiary amyloxy, hexyloxy, Alkoxy groups such as heptyloxy, isoheptyloxy, heptyloxy, n-octyloxy, isooctyloxy, tert-octyloxy, 2-ethylhexyloxy, nonyloxy and decyloxy; Examples of the alkylthio include methylthio, ethylthio, propylthio, isopropylthio, butylthio, tert-butylthio, tert-butylthio, isobutylthio, amylthio, isoamylthio, tertiary amylthio, hexylthio, cyclohexylthio, heptyl An alkylthio group such as thio, isoheptylthio, tert-pentylthio, n-octylthio, isooctylthio, tert-octylthio, or 2-ethylhexylthio; Propenyl, 1-methyl-3-propenyl, 3-butenyl, 1-methyl-3-butenyl, isobutenyl, 3-pentenyl, Alkenyl groups such as 4-hexenyl, cyclohexenyl, bicyclohexenyl, heptenyl, octenyl, decenyl, pentadecenyl, eicosenyl, and tricosenyl; And groups in which these groups are substituted by substituents which will be described later.
n이 2가인 것으로서, 메틸렌, 에틸렌, 프로필렌, 부틸렌, 부틸디일 등의 알킬렌; 상기 알킬렌의 메틸렌 쇄가 -O-, -S-, -CO-O-, -O-CO-로 치환된 것; 에탄디올, 프로판디올, 부탄디올, 펜탄디올, 헥산디올 등의 디올의 잔기; 에탄디티올, 프로판디티올, 부탄디티올, 펜탄디티올, 헥산디티올 등의 디티올의 잔기; 및 이들 기가 후술하는 치환기에 의해 치환된 기 등을 들 수 있고, n is divalent, and examples thereof include alkylenes such as methylene, ethylene, propylene, butylene and butyldiyl; The methylene chain of the alkylene being substituted with -O-, -S-, -CO-O-, -O-CO-; Diol residues such as ethanediol, propanediol, butanediol, pentanediol, and hexanediol; Residues of dithiol such as ethanedithiol, propanedithiol, butanedithiol, pentanedithiol, and hexanedithiol; And groups in which these groups are substituted by substituents which will be described later.
n이 3가인 것으로서, 예를 들면, 프로필리딘, 1,1,3-부틸리딘 등의 알킬리딘; 및 이들 기가 후술하는 치환기에 의해 치환된 기를 들 수 있다. n is trivalent, for example, alkylidines such as propylidene and 1,1,3-butylidine; And groups in which these groups are substituted by substituent groups described later.
n과 동일한 수의 가수를 가지는, 치환기를 가지고 있는 경우도 있는 탄소 원자 수 6~35의 방향환함유 탄화수소기로는, n이 1가인 것으로서, 벤질, 페네틸, 디페닐메틸, 트리페닐메틸, 스티릴, 신나밀 등의 아릴알킬기; 페닐, 나프틸 등의 아릴기; 페녹시, 나프틸옥시 등의 아릴옥시기; 페닐티오, 나프틸티오 등의 아릴티오기; 및 이들 기가 후술하는 치환기에 의해 치환된 기 등을 들 수 있고, Examples of the aromatic ring-containing hydrocarbon group having 6 to 35 carbon atoms, which may have a substituent and have the same number of valences as n, include monovalent groups such as benzyl, phenethyl, diphenylmethyl, triphenylmethyl, Arylalkyl groups such as reel and cinnamyl; Aryl groups such as phenyl and naphthyl; An aryloxy group such as phenoxy, naphthyloxy and the like; Arylthio groups such as phenylthio and naphthylthio; And groups in which these groups are substituted by substituents which will be described later.
n이 2가인 것으로서, 페닐렌, 나프틸렌 등의 아릴렌기; 카테콜, 비스페놀 등의 2관능 페놀의 잔기; 2,4,8,10-테트라옥사스피로[5,5]운데칸 등; 및 이들 기가 후술하는 치환기에 의해 치환된 기를 들 수 있으며, n is an arylene group such as phenylene or naphthylene; Residues of bifunctional phenols such as catechol and bisphenol; 2,4,8,10-tetraoxaspiro [5,5] undecane and the like; And groups in which these groups are substituted by substituent groups described later,
n이 3가인 것으로서, 페닐-1,3,5-트리메틸렌 및 이들 기가 후술하는 치환기에 의해 치환된 기를 들 수 있다. n is 3, phenyl-1,3,5-trimethylene, and groups in which these groups are substituted by the substituents described below.
n과 동일한 수의 가수를 가지는, 치환기를 가지고 있는 경우도 있는 탄소 원자 수 2~35의 복소환함유기로는, n이 1가인 것으로서, 피리딜, 피리미딜, 피리다질, 피페리딜, 피라닐, 피라졸릴, 트리아질, 피롤일, 퀴놀릴, 이소퀴놀릴, 이미다졸릴, 벤조이미다졸릴, 트리아졸릴, 푸릴, 퓨란일, 벤조퓨란일, 티에닐, 티오페닐, 벤조티오페닐, 티아디아졸릴, 티아졸릴, 벤조티아졸릴, 옥사졸릴, 벤조옥사졸릴, 이소티아졸릴, 이소옥사졸릴, 인돌일, 2-피롤리디논-1-일, 2-피페리돈-1-일, 2,4-디옥시이미다졸리딘-3-일, 2,4-디옥시옥사졸리딘-3-일, 벤조트리아조일 등; 및 이들 기가 후술하는 치환기에 의해 치환된 기 등을 들 수 있고, Examples of the heterocyclic ring-containing group having 2 to 35 carbon atoms, which may have a substituent and have the same number of valences as n, include those wherein n is monovalent, such as pyridyl, pyrimidyl, pyridazyl, piperidyl, Thiadiazolyl, thiazolyl, furyl, furanyl, benzofuranyl, thienyl, thiophenyl, benzothiophenyl, thiadiazole, benzothiophene, thiadiazole, 2-pyrrolidinone-1-yl, 2-piperidone-1-yl, 2,4-dichloropyridazinone, thiazolyl, benzothiazolyl, oxazolyl, benzoxazolyl, isothiazolyl, isoxazolyl, indolyl, Dioxyimidazolidin-3-yl, 2,4-dioxoxazolidin-3-yl, benzotriazolyl, etc .; And groups in which these groups are substituted by substituents which will be described later.
n이 2가인 것으로서, 피리딘 환, 피리미딘 환, 피페리딘 환, 피페라진 환, 트리아진 환, 퓨란 환, 티오펜 환, 인돌 환 등을 가지는 기; 및 이들 기가 후술하는 치환기에 의해 치환된 기를 들 수 있으며, n is a divalent group having a pyridine ring, a pyrimidine ring, a piperidine ring, a piperazine ring, a triazine ring, a furan ring, a thiophene ring, an indole ring or the like; And groups in which these groups are substituted by substituent groups described later,
n이 3가인 것으로는, 이소시아눌 환을 가지는 기, 트리아진 환을 가지는 기; 및 이들 기가 후술하는 치환기에 의해 치환된 기를 들 수 있다. Examples of the trivalent n include a group having an isocyanuric ring and a group having a triazine ring; And groups in which these groups are substituted by substituent groups described later.
R3 및 R4로 나타내는, 치환기를 가지고 있는 경우도 있는 탄소 원자 수 1~35의 지방족 탄화수소기로는, 상기 X1로 나타내는 지방족 탄화수소기 및 상기 지방족 탄화수소기와 상기 치환기의 조합 중, 소정 탄소 원자 수를 충족하는 것을 들 수 있고, Examples of the aliphatic hydrocarbon group having 1 to 35 carbon atoms which may have a substituent and represented by R 3 and R 4 include an aliphatic hydrocarbon group represented by X 1 and a combination of the aliphatic hydrocarbon group and the substituent group, , ≪ / RTI >
R3 및 R4로 나타내는, 치환기를 가지고 있는 경우도 있는 탄소 원자 수 6~35의 방향환함유 탄화수소기 및 치환기를 가지고 있는 경우도 있는 탄소 원자 수 2~35의 복소환함유기로는, 상기 X1로 나타내는 탄소 원자 수 6~35의 방향환함유 탄화수소기 및 탄소 원자 수 2~35의 복소환함유기 그리고 이들 기와 후술하는 치환기를 조합한 기 중, 소정의 탄소 원자 수를 충족하는 것을 들 수 있다. An aromatic ring-containing hydrocarbon group having 6 to 35 carbon atoms, which may have a substituent, and a heterocyclic ring-containing group having 2 to 35 carbon atoms, which may have a substituent, represented by R 3 and R 4 , An aromatic ring-containing hydrocarbon group having 6 to 35 carbon atoms and a heterocyclic ring-containing group having 2 to 35 carbon atoms represented by 1, and a group containing a combination of these groups and a substituent described below, have.
치환기로는, 비닐, 알릴, 아크릴, 메타크릴 등의 에틸렌성 불포화기; 불소, 염소, 브롬, 요오드 등의 할로겐 원자; 아세틸, 2-클로로아세틸, 프로피오닐, 옥탄오일, 아크릴로일, 메타크릴로일, 페닐카보닐(벤조일), 프탈로일, 4-트리플루오로메틸벤조일, 피발로일, 살리실로일, 옥살로일, 스테아로일, 메톡시카보닐, 에톡시카보닐, t-부톡시카보닐, n-옥타데실옥시카보닐, 카바모일 등의 아실기; 아세틸옥시, 벤조일옥시 등의 아실옥시기; 아미노, 에틸아미노, 디메틸아미노, 디에틸아미노, 부틸아미노, 시클로펜틸아미노, 2-에틸헥실아미노, 도데실아미노, 아닐리노, 클로로페닐아미노, 톨루이디노, 아니시디노, N-메틸-아닐리노, 디페닐아미노, 나프틸아미노, 2-피리딜아미노, 메톡시카보닐아미노, 페녹시카보닐아미노, 아세틸아미노, 벤조일아미노, 포르밀아미노, 피발로일아미노, 라우로일아미노, 카바모일아미노, N,N-디메틸아미노카보닐아미노, N,N-디에틸아미노카보닐아미노, 모르폴리노카보닐아미노, 메톡시카보닐아미노, 에톡시카보닐아미노, t-부톡시카보닐아미노, n-옥타데실옥시카보닐아미노, N-메틸-메톡시카보닐아미노, 페녹시카보닐아미노, 술파모일아미노, N,N-디메틸아미노술포닐아미노, 메틸술포닐아미노, 부틸술포닐아미노, 페닐술포닐아미노 등의 치환 아미노기; 술폰아미드기, 술포닐기, 카복실기, 시아노기, 술포기, 수산기, 니트로기, 메르캅토기, 이미드기, 카바모일기, 술폰아미드기, 포스폰산기, 인산기 또는 카복실기, 술포기, 포스폰산기, 인산기의 염 등을 들 수 있고, 이들 기는 더 치환되어 있는 경우도 있다. 또한, 카복실기 및 술포기는 염을 형성하고 있는 경우도 있다. Examples of the substituent include an ethylenic unsaturated group such as vinyl, allyl, acryl, and methacryl; Halogen atoms such as fluorine, chlorine, bromine and iodine; Examples of the substituents are acetyl, 2-chloroacetyl, propionyl, octanoyl, acryloyl, methacryloyl, phenylcarbonyl (benzoyl), phthaloyl, 4-trifluoromethylbenzoyl, pivaloyl, salicyloyl, An acyl group such as saloyl, stearoyl, methoxycarbonyl, ethoxycarbonyl, t-butoxycarbonyl, n-octadecyloxycarbonyl or carbamoyl; Acyloxy groups such as acetyloxy and benzoyloxy; Amino, ethylamino, dimethylamino, diethylamino, butylamino, cyclopentylamino, 2-ethylhexylamino, dodecylamino, anilino, chlorophenylamino, toluidino, anisidino, Wherein the alkyl moiety is selected from the group consisting of methyl, ethyl, propyl, isopropyl, butyl, isobutyl, sec-butyl, isobutyl, N-dimethylaminocarbonylamino, N, N-diethylaminocarbonylamino, morpholinocarbonylamino, methoxycarbonylamino, ethoxycarbonylamino, t-butoxycarbonylamino, n- N-dimethylaminosulfonylamino, methylsulfonylamino, butylsulfonylamino, phenylsulfonylamino, N, N-dimethylaminosulfonylamino, N-methyl-methoxycarbonylamino, phenoxycarbonylamino, sulfamoylamino, A substituted amino group such as amino; A sulfonic acid group, a phosphoric acid group or a carboxyl group, a sulfonic acid group, a sulfonic acid group, a sulfonic acid group, a sulfonic acid group, a sulfonic acid group, a sulfonic acid group, a carboxyl group, An acid group, a salt of a phosphoric acid group and the like, and these groups may be further substituted. Further, the carboxyl group and the sulfo group may form a salt.
상기 일반식(I-A)에서 n이 2~6일 때, X1은 각각 하기 일반식(1)~(5)와 같이 나타낼 수도 있다. When n is 2 to 6 in the general formula (IA), X 1 may be represented by the following general formulas (1) to (5), respectively.
(상기 일반식(1) 중, Y1은, 단결합, -CR5R6-, -NR7-, 2가의 탄소 원자 수 1~35의 지방족 탄화수소기, 탄소 원자 수 6~35의 방향족 탄화수소기 혹은 탄소 원자 수 2~35의 복소환함유기, 또는 하기 (1-1)~(1-3)으로 나타내는 어느 하나의 치환기를 나타내고, (Wherein Y 1 represents a single bond, -CR 5 R 6 -, -NR 7 -, an aliphatic hydrocarbon group having 1 to 35 carbon atoms, an aromatic hydrocarbon having 6 to 35 carbon atoms Or a heterocyclic ring-containing group having 2 to 35 carbon atoms or any substituent represented by any one of the following (1-1) to (1-3)
상기 지방족 탄화수소기는, -O-, -S-, -CO-, -COO-, -OCO-, -NH-, -SO2-, -CONH- 혹은 -NHCO-, 또는 산소 원자가 서로 이웃하지 않고 이들을 조합한 결합기로 치환되어 있는 경우도 있으며, The aliphatic hydrocarbon group may be substituted with -O-, -S-, -CO-, -COO-, -OCO-, -NH-, -SO 2 -, -CONH- or -NHCO-, And may be substituted with a combinator group,
Z1 및 Z2는, 각각 독립적으로 직접 결합, -O-, -S-, -CO-, -CO-O-, -O-CO-, -SO2-, -SS-, -SO-, -NR7- 또는 -PR7-을 나타내고, Z 1 and Z 2 each independently represents a direct bond, -O-, -S-, -CO-, -CO-O-, -O-CO-, -SO 2 -, -SS-, Lt; 7 > - or -PR < 7 > -,
R5, R6 및 R7은, 각각 독립적으로 수소 원자, 치환기를 가지고 있는 경우도 있는 탄소 원자 수 1~35의 지방족 탄화수소기, 치환기를 가지고 있는 경우도 있는 탄소 원자 수 6~35의 방향족 탄화수소기 또는 치환기를 가지고 있는 경우도 있는 탄소 원자 수 2~35의 복소환함유기를 나타내며, R 5 , R 6 and R 7 each independently represents a hydrogen atom, an aliphatic hydrocarbon group having 1 to 35 carbon atoms which may have a substituent, an aromatic hydrocarbon having 6 to 35 carbon atoms which may have a substituent Or a heterocyclic ring-containing group having 2 to 35 carbon atoms which may have a substituent,
*는 * 부분에서 인접하는 기와 결합하는 것을 의미한다.) * Means combining with adjacent groups in the * part.)
(상기 식 중, R8은 수소 원자, 또는 치환기를 가지고 있는 경우도 있는 페닐기 혹은 탄소 원자 수 3~10의 시클로알킬기를 나타내고, (Wherein R 8 represents a hydrogen atom or a phenyl group which may have a substituent or a cycloalkyl group of 3 to 10 carbon atoms,
R9는 탄소 원자 수 1~10의 알킬기, 탄소 원자 수 1~10의 알콕시기, 탄소 원자 수 2~10의 알케닐기 또는 할로겐 원자를 나타내며, 상기 알킬기, 알콕시기 및 알케닐기는 치환기를 가지고 있는 경우도 있고, R 9 represents an alkyl group of 1 to 10 carbon atoms, an alkoxy group of 1 to 10 carbon atoms, an alkenyl group of 2 to 10 carbon atoms, or a halogen atom, and the alkyl group, alkoxy group and alkenyl group may have a substituent In some cases,
f는 0~5의 정수이며, f is an integer of 0 to 5,
*는 * 부분에서 인접하는 기와 결합하는 것을 의미한다.) * Means combining with adjacent groups in the * part.)
(*는 * 부분에서 인접하는 기와 결합하는 것을 의미한다.) (* Means combining with adjacent groups in the * part.)
(상기 식 중, R10 및 R11은, 각각 독립적으로 치환기를 가지고 있는 경우도 있는 탄소 원자 수 1~10의 알킬기, 치환기를 가지고 있는 경우도 있는 탄소 원자 수 6~20의 아릴기, 치환기를 가지고 있는 경우도 있는 탄소 원자 수 6~20의 아릴옥시기, 치환기를 가지고 있는 경우도 있는 탄소 원자 수 6~20의 아릴티오기, 치환기를 가지고 있는 경우도 있는 탄소 원자 수 6~20의 아릴알케닐기, 치환기를 가지고 있는 경우도 있는 탄소 원자 수 7~20의 아릴알킬기, 치환기를 가지고 있는 경우도 있는 탄소 원자 수 2~20의 복소환함유기 또는 할로겐 원자를 나타내고, (Wherein R 10 and R 11 each independently represents an alkyl group of 1 to 10 carbon atoms which may have a substituent, an aryl group of 6 to 20 carbon atoms which may have a substituent, An aryloxy group having 6 to 20 carbon atoms, an arylthio group having 6 to 20 carbon atoms, which may have a substituent, an aryloxy group having 6 to 20 carbon atoms, which may have a substituent, An arylalkyl group having 7 to 20 carbon atoms which may have a substituent, a heterocyclic ring-containing group having 2 to 20 carbon atoms which may have a substituent, or a halogen atom,
상기 알킬기 및 아릴알킬기 중의 메틸렌기는 불포화 결합, -O- 또는 -S-로 치환되어 있는 경우도 있고, The methylene group in the alkyl group and the arylalkyl group may be substituted with an unsaturated bond, -O- or -S-,
R10은 인접하는 R10끼리 환을 형성하고 있는 경우도 있으며, R < 10 > may form a ring with adjacent R < 10 >
p는 0~4의 수를 나타내고, p represents a number of 0 to 4,
q는 0~8의 수를 나타내며, q represents a number of 0 to 8,
g는 0~4의 수를 나타내고, g represents a number of 0 to 4,
h는 0~4의 수를 나타내며, h represents a number of 0 to 4,
g와 h의 수의 합계는 2~4이고, the sum of the numbers of g and h is 2 to 4,
*는 * 부분에서 인접하는 기와 결합하는 것을 의미한다.) * Means combining with adjacent groups in the * part.)
(상기 일반식(2) 중, Y11은 3가의 탄소 원자 수 3~35의 지방족 탄화수소기, 탄소 원자 수 3~35의 지환족 탄화수소기, 탄소 원자 수 6~35의 방향족 탄화수소기 혹은 탄소 원자 수 2~35의 복소환함유기를 나타내고, (In the general formula (2), Y 11 represents an aliphatic hydrocarbon group having 3 to 35 carbon atoms, an alicyclic hydrocarbon group having 3 to 35 carbon atoms, an aromatic hydrocarbon group having 6 to 35 carbon atoms, Containing heterocyclic group having a number of 2 to 35,
Z1, Z2 및 Z3은, 각각 독립적으로 직접 결합, -O-, -S-, -CO-, -CO-O-, -O-CO-, -SO2-, -SS-, -SO-, -NR12- 또는 -PR12-를 나타내며, Z 1 , Z 2 and Z 3 each independently represents a direct bond, -O-, -S-, -CO-, -CO-O-, -O-CO-, -SO 2 -, -SS-, SO-, -NR 12- or -PR 12 - represents the,
R12는 수소 원자, 치환기를 가지고 있는 경우도 있는 탄소 원자 수 1~35의 지방족 탄화수소기, 치환기를 가지고 있는 경우도 있는 탄소 원자 수 6~35의 방향족 탄화수소기 또는 치환기를 가지고 있는 경우도 있는 탄소 원자 수 2~35의 복소환함유기를 나타내고, R 12 represents a hydrogen atom, an aliphatic hydrocarbon group of 1 to 35 carbon atoms which may have a substituent, an aromatic hydrocarbon group of 6 to 35 carbon atoms which may have a substituent, or a carbon which may have a substituent A heterocyclic ring-containing group having 2 to 35 atoms,
지방족 탄화수소기는 탄소-탄소 이중 결합, -O-, -S-, -CO-, -COO-, -OCO-, -NH-, -SO2-, -CONH- 혹은 -NHCO-, 또는 산소 원자가 서로 이웃하지 않고 이들을 조합한 결합기로 치환되어 있는 경우도 있으며, The aliphatic hydrocarbon group may be a carbon-carbon double bond, -O-, -S-, -CO-, -COO-, -OCO-, -NH-, -SO 2 -, -CONH- or -NHCO-, In some cases, it is substituted by a coupler which is not adjacent but is a combination of these.
*는 * 부분에서 인접하는 기와 결합하는 것을 의미한다.) * Means combining with adjacent groups in the * part.)
(상기 일반식(3) 중, Y12는 탄소 원자, 또는 4가의 탄소 원자 수 1~35의 지방족 탄화수소기, 탄소 원자 수 6~35의 방향족 탄화수소기 혹은 탄소 원자 수 2~35의 복소환함유기를 나타내고, (In the general formula (3), Y 12 represents a carbon atom or an aliphatic hydrocarbon group having 1 to 35 carbon atoms, an aromatic hydrocarbon group having 6 to 35 carbon atoms, or a heterocyclic ring containing 2 to 35 carbon atoms Lt; / RTI >
상기 지방족 탄화수소기는 탄소-탄소 이중 결합, -O-, -S-, -CO-, -COO-, -OCO-, -NH-, -SO2-, -CONH- 혹은 -NHCO-, 또는 산소 원자가 서로 이웃하지 않고 이들을 조합한 결합기로 치환되어 있는 경우도 있으며, The aliphatic hydrocarbon group may be a carbon-carbon double bond, -O-, -S-, -CO-, -COO-, -OCO-, -NH-, -SO 2 -, -CONH- or -NHCO-, In some cases, they are not adjacent to each other but are substituted by a combiner combining them.
Z1~Z4는, 각각 독립적으로 상기 일반식(2)에서의 Z1~Z3으로 나타내는 기와 동일한 범위의 기이고, Z 1 to Z 4 each independently represent a group in the same range as the group represented by Z 1 to Z 3 in the general formula (2)
*는 * 부분에서 인접하는 기와 결합하는 것을 의미한다.) * Means combining with adjacent groups in the * part.)
(상기 일반식(4) 중, Y13은 5가의 탄소 원자 수 2~35의 지방족 탄화수소기, 탄소 원자 수 6~20의 방향족 탄화수소기 또는 탄소 원자 수 2~20의 복소환함유기를 나타내고, (In the general formula (4), Y 13 represents an aliphatic hydrocarbon group of 5 to 35 carbon atoms, an aromatic hydrocarbon group of 6 to 20 carbon atoms, or a heterocyclic ring-containing group of 2 to 20 carbon atoms,
상기 지방족 탄화수소기는 탄소-탄소 이중 결합, -O-, -S-, -CO-, -COO-, -OCO-, -NH-, -SO2-, -CONH- 혹은 -NHCO-, 또는 산소 원자가 서로 이웃하지 않고 이들을 조합한 결합기로 치환되어 있는 경우도 있으며, The aliphatic hydrocarbon group may be a carbon-carbon double bond, -O-, -S-, -CO-, -COO-, -OCO-, -NH-, -SO 2 -, -CONH- or -NHCO-, In some cases, they are not adjacent to each other but are substituted by a combiner combining them.
Z1~Z5는, 각각 독립적으로 상기 일반식(2)에서의 Z1~Z3으로 나타내는 기와 동일한 범위의 기이고, Z 1 to Z 5 each independently represent a group in the same range as the group represented by Z 1 to Z 3 in the general formula (2)
*는 * 부분에서 인접하는 기와 결합하는 것을 의미한다.) * Means combining with adjacent groups in the * part.)
(상기 일반식(5) 중, Y14는 6가의 탄소 원자 수 2~35의 지방족 탄화수소기, 탄소 원자 수 6~35의 방향족 탄화수소기 또는 탄소 원자 수 2~35의 복소환함유기를 나타내고, (In the general formula (5), Y 14 represents an aliphatic hydrocarbon group of 6 to 35 carbon atoms, an aromatic hydrocarbon group of 6 to 35 carbon atoms, or a heterocyclic ring-containing group of 2 to 35 carbon atoms,
상기 지방족 탄화수소기는 탄소-탄소 이중 결합, -O-, -S-, -CO-, -COO-, -OCO-, -NH-, -SO2-, -CONH- 혹은 -NHCO-, 또는 산소 원자가 서로 이웃하지 않고 이들을 조합한 결합기로 치환되어 있는 경우도 있으며, The aliphatic hydrocarbon group may be a carbon-carbon double bond, -O-, -S-, -CO-, -COO-, -OCO-, -NH-, -SO 2 -, -CONH- or -NHCO-, In some cases, they are not adjacent to each other but are substituted by a combiner combining them.
Z1~Z6은, 각각 독립적으로 상기 일반식(2)에서의 Z1~Z3으로 나타내는 기와 동일한 범위의 기이고, Z 1 to Z 6 each independently represent a group in the same range as the group represented by Z 1 to Z 3 in the general formula (2)
*는 * 부분에서 인접하는 기와 결합하는 것을 의미한다.) * Means combining with adjacent groups in the * part.)
상기 일반식(1)에서, R5, R6 및 R7로 나타내는, 치환기를 가지고 있는 경우도 있는 탄소 원자 수 1~35의 지방족 탄화수소기로는, 상기 일반식(I-A)에서의 X1로 나타내는 n가의 결합기로서 예시한 1가의 지방족 탄화수소기, 및 이들 기가 상기 일반식(I-A)에서의 X1로 나타내는 n가의 결합기를 나타내는 기의 치환기로서 예시한 것에 의해 치환된 기 중, 소정의 탄소 원자 수를 충족하는 것 등을 들 수 있으며, Examples of the aliphatic hydrocarbon group having 1 to 35 carbon atoms which may have a substituent and represented by R 5 , R 6 and R 7 in the above general formula ( 1) include those represented by X 1 in the general formula (IA) the monovalent aliphatic hydrocarbon group exemplified as the n-valent linking group and the monovalent aliphatic hydrocarbon group represented by the formula (IA) in which the group represented by X < 1 > , And the like,
R5, R6 및 R7로 나타내는, 치환기를 가지고 있는 경우도 있는 탄소 원자 수 6~35의 방향환함유 탄화수소기로는, 상기 일반식(I-A)에서의 X1로 나타내는 n가의 결합기로서 예시한 1가의 방향환함유 탄화수소기, 및 이들 기가 상기 일반식(I-A)에서의 X1로 나타내는 n가의 결합기를 나타내는 기의 치환기로서 예시한 것에 의해 치환된 기 중, 소정의 탄소 원자 수를 충족하는 것 등을 들 수 있고, Examples of the aromatic ring-containing hydrocarbon group of 6 to 35 carbon atoms which may have a substituent, represented by R 5 , R 6 and R 7 include the same groups as exemplified for the n-valent bond group represented by X 1 in the formula (IA) Containing monovalent aromatic ring-containing hydrocarbon group, and those groups in which these groups are substituted by the groups exemplified as the substituent of the group representing the bonding group of X < 1 > represented by the general formula (IA) And the like,
R5, R6 및 R7로 나타내는, 치환기를 가지고 있는 경우도 있는 탄소 원자 수 2~35의 복소환함유기로는, 상기 일반식(I-A)에서의 X1로 나타내는 n가의 결합기로서 예시한 1가의 복소환함유기, 및 이들 기가 상기 일반식(I-A)에서의 X1로 나타내는 n가의 결합을 나타내는 기의 치환기로서 예시한 것에 의해 치환된 기 중, 소정의 탄소 원자 수를 충족하는 것 등을 들 수 있다. Examples of the heterocyclic group having 2 to 35 carbon atoms, which may have a substituent, represented by R 5 , R 6 and R 7 include 1 to 3 groups exemplified as an n-valent bond group represented by X 1 in the general formula (IA) Containing heterocyclic group, and groups satisfying the predetermined number of carbon atoms among the groups substituted with those exemplified as the substituent of the group representing the bond of X < 1 > in the formula (IA) .
또한, 상기 일반식(1)에서 Y1로 나타내는, 2가의 탄소 원자 수 1~35의 지방족 탄화수소기로는, 상기 일반식(I-A)에서의 X1로 나타내는 n가의 결합기로서 예시한 2가의 지방족 탄화수소기, 및 이들 기가 상기 일반식(I-A)에서의 X1로 나타내는 n가의 결합기를 나타내는 기의 치환기로서 예시한 것에 의해 치환된 기 중, 소정의 탄소 원자 수를 충족하는 것 등을 들 수 있고, Examples of the divalent aliphatic hydrocarbon group having 1 to 35 carbon atoms represented by Y 1 in the general formula (1) include divalent aliphatic hydrocarbons exemplified as an n-valent bond group represented by X 1 in the general formula (IA) , And those in which the number of carbon atoms of the groups substituted with those exemplified as the substituent of the group denoting the bonding group of n represented by X 1 in the general formula (IA) is satisfied,
Y1로 나타내는 2가의 탄소 원자 수 6~35의 방향환함유 탄화수소기로는, 상기 일반식(I-A)에서의 X1로 나타내는 n가의 결합기로서 예시한 2가의 방향환함유 탄화수소기, 및 이들 기가 상기 일반식(I-A)에서의 X1로 나타내는 n가의 결합기를 나타내는 기의 치환기로서 예시한 것에 의해 치환된 기 중, 소정의 탄소 원자 수를 충족하는 것 등을 들 수 있으며, Examples of the aromatic ring-containing hydrocarbon group having 6 to 35 divalent carbon atoms represented by Y 1 include a divalent aromatic ring-containing hydrocarbon group exemplified as an n-valent bond group represented by X 1 in the formula (IA) And those satisfying the predetermined number of carbon atoms among the groups substituted as exemplified as the substituent of the group representing the n-valent bonding group represented by X < 1 > in the general formula (IA)
Y1로 나타내는 2가의 탄소 원자 수 2~35의 복소환함유기로는, 상기 일반식(I-A)에서의 X1로 나타내는 n가의 결합기로서 예시한 2가의 방향환함유 탄화수소기, 및 이들 기가 상기 일반식(I-A)에서의 X1로 나타내는 n가의 결합기를 나타내는 기의 치환기로서 예시한 것에 의해 치환된 기 중, 소정의 탄소 원자 수를 충족하는 것 등을 들 수 있다. Examples of the heterocyclic ring-containing group having 2 to 35 carbon atoms represented by Y 1 include a divalent aromatic ring-containing hydrocarbon group exemplified as an n-valent bond group represented by X 1 in the general formula (IA) And those satisfying the predetermined number of carbon atoms among the groups substituted as exemplified as the substituent of the group representing the n-valent bonding group represented by X < 1 > in the formula (IA).
상기 (1-1)로 나타내는 치환기에서, R8로 나타내는 탄소 원자 수 3~10의 시클로알킬기로는, 시클로프로필, 시클로부틸, 시클로펜틸, 시클로헵틸, 시클로옥틸 등을 들 수 있고, Examples of the cycloalkyl group having 3 to 10 carbon atoms represented by R 8 in the substituent represented by the above (1-1) include cyclopropyl, cyclobutyl, cyclopentyl, cycloheptyl, cyclooctyl,
R9로 나타내는 탄소 원자 수 1~10의 알킬기로는, R1 및 R2로 나타내는 탄소 원자 수 1~40의 알킬기로서 예시한 기 중, 소정의 탄소 원자 수를 충족하는 기 등을 들 수 있으며, Examples of the alkyl group having 1 to 10 carbon atoms represented by R 9 include groups satisfying a predetermined number of carbon atoms among the groups exemplified as alkyl groups having 1 to 40 carbon atoms represented by R 1 and R 2 , ,
R9로 나타내는 탄소 원자 수 1~10의 알콕시기로는, 메틸옥시, 에틸옥시, 프로필옥시, 이소프로필옥시, 부틸옥시, 제2부틸옥시, 제3부틸옥시, 이소부틸옥시, 아밀옥시, 이소아밀옥시, 제3아밀옥시, 헥실옥시, 시클로헥실옥시, 헵틸옥시, 이소헵틸옥시, 제3헵틸옥시, n-옥틸옥시, 이소옥틸옥시, 제3옥틸옥시, 2-에틸헥실옥시, 노닐옥시, 데실옥시 등을 들 수 있고, Examples of the alkoxy group having 1 to 10 carbon atoms represented by R 9 include methyloxy, ethyloxy, propyloxy, isopropyloxy, butyloxy, sec-butyloxy, tert -butyloxy, isobutyloxy, amyloxy, isoamyl Isobutyloxy, n-octyloxy, isooctyloxy, tertiary octyloxy, 2-ethylhexyloxy, nonyl, tertiary amyloxy, heptyloxy, heptyloxy, heptyloxy, tertiary amyloxy, hexyloxy, cyclohexyloxy, heptyloxy, Oxy, decyloxy and the like,
페닐기, 시클로알킬기, 알킬기, 알콕시기 및 알케닐기의 치환기는, 상기 일반식(I-A)에서의 X1로 나타내는 n가의 결합기의 치환기로서 예시한 것과 동일하다. The substituent of the phenyl group, the cycloalkyl group, the alkyl group, the alkoxy group and the alkenyl group is the same as those exemplified as the substituent of the n-valent bond group represented by X 1 in the general formula (IA).
상기 (1-3)으로 나타내는 기에서, R10 및 R11로 나타내는, 치환기를 가지고 있는 경우도 있는 탄소 원자 수 1~10의 알킬기로는, R1 및 R2로 나타내는 탄소 원자 수 1~40의 알킬기로서 예시한 기 중, 소정의 탄소 원자 수를 충족하는 기 등을 들 수 있고, In the group represented by (1-3), the alkyl group having 1 to 10 carbon atoms, which may have a substituent, represented by R 10 and R 11 is preferably an alkyl group having 1 to 40 carbon atoms represented by R 1 and R 2 A group satisfying a predetermined number of carbon atoms among the groups exemplified as the alkyl group of
R10 및 R11로 나타내는, 치환기를 가지고 있는 경우도 있는 탄소 원자 수 6~20의 아릴기로는, R1 및 R2로 나타내는 탄소 원자 수 6~20의 아릴기로서 예시한 기 등을 들 수 있으며, Examples of the aryl group having 6 to 20 carbon atoms which may have a substituent and represented by R 10 and R 11 include groups exemplified as aryl groups having 6 to 20 carbon atoms represented by R 1 and R 2 In addition,
R10 및 R11로 나타내는, 치환기를 가지고 있는 경우도 있는 탄소 원자 수 6~20의 아릴옥시기로는, 페닐옥시, 나프틸옥시, 2-메틸페닐옥시, 3-메틸페닐옥시, 4-메틸페닐옥시, 4-비닐페닐옥시, 3-iso-프로필페닐옥시, 4-iso-프로필페닐옥시, 4-부틸페닐옥시, 4-tert-부틸페닐옥시, 4-헥실페닐옥시, 4-시클로헥실페닐옥시, 4-옥틸페닐옥시, 4-(2-에틸헥실)페닐옥시, 2,3-디메틸페닐옥시, 2,4-디메틸페닐옥시, 2,5-디메틸페닐옥시, 2.6-디메틸페닐옥시, 3.4-디메틸페닐옥시, 3.5-디메틸페닐옥시, 2,4-디-tert-부틸페닐옥시, 2,5-디-tert-부틸페닐옥시, 2,6-디-tert-부틸페닐옥시, 2.4-디-tert-펜틸페닐옥시, 2,5-tert-아밀페닐옥시, 4-시클로헥실페닐옥시, 2,4,5-트리메틸페닐옥시, 페로세닐옥시 등의 기를 들 수 있고,Examples of the aryloxy group having 6 to 20 carbon atoms which may have a substituent and represented by R 10 and R 11 include phenyloxy, naphthyloxy, 2-methylphenyloxy, 3-methylphenyloxy, 4-methylphenyloxy, 4 4-butylphenyloxy, 4-hexylphenyloxy, 4-cyclohexylphenyloxy, 4-cyclohexylphenyloxy, 4-isopropylphenyloxy, 4- Dimethylphenyloxy, 2,4-dimethylphenyloxy, 2,6-dimethylphenyloxy, 2,6-dimethylphenyloxy, 3,4-dimethylphenyloxy, Di-tert-butylphenyloxy, 2,4-di-tert-butylphenyloxy, 2,5-di-tert- Phenyloxy, 2,5-tert-amylphenyloxy, 4-cyclohexylphenyloxy, 2,4,5-trimethylphenyloxy, ferrocenyloxy and the like.
R10 및 R11로 나타내는, 치환기를 가지고 있는 경우도 있는 탄소 원자 수 6~20의 아릴티오기로는, 상기 치환기를 가지고 있는 경우도 있는 탄소 원자 수 6~20의 아릴옥시기의 산소 원자를 유황 원자로 치환한 기 등을 들 수 있고, Examples of the arylthio group having 6 to 20 carbon atoms, which may have a substituent, represented by R 10 and R 11 include an oxygen atom of an aryloxy group having 6 to 20 carbon atoms, which may have the above substituent, Substituted groups, and the like,
R10 및 R11로 나타내는, 치환기를 가지고 있는 경우도 있는 탄소 원자 수 8~20의 아릴알케닐기로는, 상기 치환기를 가지고 있는 경우도 있는 탄소 원자 수 6~20의 아릴옥시기의 산소 원자를 비닐, 알릴, 1-프로페닐, 이소프로페닐, 2-부테닐, 1,3-부타디에닐, 2-펜테닐, 2-옥테닐 등의 알케닐기로 치환한 기 등을 들 수 있으며, As the arylalkenyl group having 8 to 20 carbon atoms, which may have a substituent, represented by R 10 and R 11 , an oxygen atom of an aryloxy group having 6 to 20 carbon atoms, which may have the above substituent And groups substituted with an alkenyl group such as vinyl, allyl, 1-propenyl, isopropenyl, 2-butenyl, 1,3-butadienyl, 2-pentenyl, 2-
R10 및 R11로 나타내는, 치환기를 가지고 있는 경우도 있는 탄소 원자 수 7~20의 아릴알킬기로는 R1 및 R2로 나타내는 탄소 원자 수 7~20의 아릴알킬기로서 예시한 기 등을 들 수 있고, Examples of the arylalkyl group having 7 to 20 carbon atoms, which may have a substituent, represented by R 10 and R 11 include the groups exemplified as arylalkyl groups having 7 to 20 carbon atoms represented by R 1 and R 2 However,
R10 및 R11로 나타내는, 치환기를 가지고 있는 경우도 있는 탄소 원자 수 2~20의 복소환함유기로는 R1 및 R2로 나타내는 탄소 원자 수 2~20의 복소환함유기로서 예시한 기 등을 들 수 있다. Examples of the heterocyclic ring-containing group having 2 to 20 carbon atoms, which may have a substituent, represented by R 10 and R 11 include a group exemplified as a heterocyclic ring-containing group having 2 to 20 carbon atoms represented by R 1 and R 2 .
상기 일반식(2)에서의 Y11로 나타내는 3가의 탄소 원자 수 1~35의 지방족 탄화수소기로는, 상기 일반식(I-A)에서의 X1로 나타내는 n가의 결합기로서 예시한 3가의 지방족 탄화수소기 및 이들 기가 상기 일반식(I-A)에서의 X1로 나타내는 n가의 결합기의 치환기로서 예시한 것에 의해 치환된 기 중, 소정 탄소 원자 수를 충족하는 것 등이, Z1, Z2 및 Z3으로 치환된 3가의 기 등을 들 수 있고, Examples of the trivalent aliphatic hydrocarbon group having 1 to 35 carbon atoms represented by Y 11 in the general formula (2) include trivalent aliphatic hydrocarbon groups exemplified as an n-valent bond group represented by X 1 in the general formula (IA) those groups wherein the general formula (IA) of the group substituted by one exemplified as the substituent of the n-valent couplers represented by X 1 in, such as to meet the predetermined number of carbon atoms, substituted with Z 1, Z 2 and Z 3 Trivalent group, and the like,
상기 일반식(2)에서의 Y11로 나타내는 3가의 탄소 원자 수 3~35의 지환족 탄화수소기로는, 시클로펜틸, 시클로헥실, 시클로헵틸, 시클로옥틸, 시클로데카닐, 1-아다만틸, 2-아다만틸, 노르아다만틸, 2-메틸아다만틸, 노르보르닐, 이소노르보르닐, 퍼하이드로나프틸, 퍼하이드로안트라세닐, 비시클로[1.1.0]부틸, 비시클로[1.1.1]펜틸, 비시클로[2.1.0]펜틸, 비시클로[3.1.0]헥실, 비시클로[2.1.1]헥실, 비시클로[2.2.0]헥실, 비시클로[4.1.0]헵틸, 비시클로[3.2.0]헵틸, 비시클로[3.1.1]헵틸, 비시클로[2.2.1]헵틸, 비시클로[5.1.0]옥틸, 비시클로[4.2.0]옥틸, 비시클로[4.1.1]옥틸, 비시클로[3.3.0]옥틸, 비시클로[3.2.1]옥틸, 비시클로[2.2.2]옥틸, 스피로〔4,4〕노나닐, 스피로〔4,5〕데카닐, 데칼린, 트리시클로데카닐, 테트라시클로도데카닐, 세드롤, 시클로도데카닐 등의 기로부터 유도되는 3가의 기 등을 들 수 있으며, Examples of the trivalent alicyclic hydrocarbon group of 3 to 35 carbon atoms represented by Y 11 in the above general formula (2) include cyclopentyl, cyclohexyl, cycloheptyl, cyclooctyl, cyclodecanyl, 1-adamantyl, 2 Cyclohexyl, cyclopentyl, cyclohexyl, cycloheptyl, cyclohexyl, cyclohexyl, cyclohexyl, cyclohexyl, cyclohexyl, cyclohexyl, cyclohexyl, cyclohexyl, Bicyclo [2.1.0] pentyl, bicyclo [3.1.0] hexyl, bicyclo [2.1.1] hexyl, bicyclo [2.2.0] Bicyclo [4.2.1] heptyl, bicyclo [3.1.1] heptyl, bicyclo [2.2.1] heptyl, bicyclo [5.1.0] octyl, bicyclo [4.2.0] octyl, ] Octyl, bicyclo [3.3.0] octyl, bicyclo [3.2.1] octyl, bicyclo [2.2.2] octyl, spiro [4,4] nonanyl, spiro [4,5] decanyl, decalin, Tricyclodecanyl, tetracyclododecanyl, hethrol, cyclododecanyl, and the like. It may be made of a trivalent group, and the like,
Y11로 나타내는 3가의 탄소 원자 수 6~35의 방향환함유 탄화수소기로는, 상기 일반식(I-A)에서의 X1로 나타내는 n가의 결합기로서 예시한 3가의 방향환함유 탄화수소기 및 이들 기가 상기 일반식(I-A)에서의 X1로 나타내는 n가의 결합기의 치환기로서 예시한 것에 의해 치환된 기 중, 소정의 탄소 원자 수를 충족하는 것 등을 들 수 있고, Examples of the aromatic ring-containing hydrocarbon group having 6 to 35 carbon atoms represented by Y 11 include a trivalent aromatic ring-containing hydrocarbon group exemplified as an n-valent bond group represented by X 1 in the formula (IA) And those satisfying the predetermined number of carbon atoms among the groups substituted by the substituent of the n-valent bonding group represented by X < 1 > in the formula (IA)
Y11로 나타내는 3가의 탄소 원자 수 2~35의 복소환함유기로는, 상기 일반식(I-A)에서의 X1로 나타내는 n가의 결합기로서 예시한 3가의 복소환함유기 및 이들 기가 상기 일반식(I-A)에서의 X1로 나타내는 n가의 결합기의 치환기로서 예시한 것에 의해 치환된 기 중, 소정의 탄소 원자 수를 충족하는 것 등을 들 수 있다. Examples of the heterocyclic ring-containing group having 3 to 3 carbon atoms represented by Y 11 include a trivalent heterocyclic ring-containing group exemplified as an n-valent bond group represented by X 1 in the general formula (IA) IA) in which the number of carbon atoms specified in the group substituted by the substituent of the n-valent bond group represented by X < 1 > is satisfied.
또한, R12로 나타내는, 치환기를 가지고 있는 경우도 있는 탄소 원자 수 1~35의 지방족 탄화수소기, 치환기를 가지고 있는 경우도 있는 탄소 원자 수 6~35의 방향족 탄화수소기 및 치환기를 가지고 있는 경우도 있는 탄소 원자 수 2~35의 복소환함유기로는, 각각, 상기 일반식(1)에서의 R5, R6 및 R7의 설명에서 예시한 지방족 탄화수소기, 방향환함유 탄화수소기, 복소환함유기를 들 수 있다. Further, an aliphatic hydrocarbon group of 1 to 35 carbon atoms which may have a substituent, represented by R 12 , an aromatic hydrocarbon group of 6 to 35 carbon atoms, which may have a substituent, and an aromatic hydrocarbon group which may have a substituent Examples of the heterocyclic ring-containing group having 2 to 35 carbon atoms include aliphatic hydrocarbon groups, aromatic ring-containing hydrocarbon groups, and heterocyclic ring-containing groups exemplified in the description of R 5 , R 6 and R 7 in the general formula (1) .
상기 일반식(3)에서 Y12로 나타내는, 4가의 탄소 원자 수 1~35의 지방족 탄화수소기로는, 상기 일반식(I-A)에서의 X1로 나타내는 n가의 결합기로서 예시한 1가~3가의 지방족 탄화수소기 및 이들 기가 상기 일반식(I-A)에서의 X1로 나타내는 n가의 결합기의 치환기로서 예시한 것에 의해 치환된 기로부터 유도되는 4가의 기 중, 소정의 탄소 원자 수를 충족하는 것 등을 들 수 있고, Examples of the tetravalent aliphatic hydrocarbon group having 1 to 35 carbon atoms represented by Y 12 in the general formula (3) include monovalent to trivalent aliphatic groups exemplified as the linking group of the n-valent group represented by X 1 in the general formula (IA) A hydrocarbon group and a group satisfying the predetermined number of carbon atoms among the quaternary groups derived from groups substituted by those groups exemplified as the substituent of the n-valent bond group represented by X < 1 > in the general formula (IA) Can,
Y12로 나타내는 4가의 탄소 원자 수 6~35의 방향환함유 탄화수소기로는, 상기 일반식(I-A)에서의 X1로 나타내는 n가의 결합기로서 예시한 1가~3가의 방향환함유 탄화수소기 및 이들 기가 상기 일반식(I-A)에서의 X1로 나타내는 n가의 결합기의 치환기로서 예시한 것에 의해 치환된 기로부터 유도되는 4가의 기 중, 소정의 탄소 원자 수를 충족하는 것 등을 들 수 있으며, Examples of the aromatic ring-containing hydrocarbon group having 4 to 4 carbon atoms represented by Y 12 include a monovalent to trivalent aromatic ring-containing hydrocarbon group exemplified as an n-valent bond group represented by X 1 in the formula (IA) And the group satisfying the predetermined number of carbon atoms among the quadrivalent groups derived from the substituted group as exemplified as the substituent of the n-valent bonding group represented by X < 1 > in the general formula (IA)
Y12로 나타내는 4가의 탄소 원자 수 2~35의 복소환함유기로는, 상기 일반식(I-A)에서의 X1로 나타내는 n가의 결합기로서 예시한 1가~3가의 복소환함유기 및 이들 기가 상기 일반식(I-A)에서의 X1로 나타내는 n가의 결합기의 치환기로서 예시한 것에 의해 치환된 기로부터 유도되는 4가의 기 중, 소정의 탄소 원자 수를 충족하는 것 등을 들 수 있다. Examples of the heterocyclic ring-containing group having 4 to 4 carbon atoms represented by Y 12 include a monovalent to trivalent heterocyclic ring-containing group exemplified as an n-valent bond group represented by X 1 in the general formula (IA) And examples of the quadrivalent group derived from the substituted group as exemplified as the substituent of the n-valent bonding group represented by X < 1 > in the general formula (IA) satisfy the predetermined number of carbon atoms.
상기 일반식(4)에서의 Y13으로 나타내는 5가의 탄소 원자 수 2~35의 지방족 탄화수소기로는, 상기 일반식(I-A)에서의 X1로 나타내는 n가의 결합기로서 예시한 1가~3가의 지방족 탄화수소기 및 이들 기가 상기 일반식(I-A)에서의 X1로 나타내는 n가의 결합기의 치환기로서 예시한 것에 의해 치환된 기로부터 유도되는 5가의 기 중, 소정의 탄소 원자 수를 충족하는 것 등을 들 수 있고, Examples of the pentavalent aliphatic hydrocarbon group having 2 to 35 carbon atoms represented by Y 13 in the general formula (4) include the monovalent to trivalent aliphatic groups exemplified as the linking group of the n-valent group represented by X 1 in the general formula (IA) A hydrocarbon group, and a group which satisfies the predetermined number of carbon atoms among the pentavalent groups derived from the substituted groups as exemplified as substituent groups of the n-valent group represented by X 1 in the general formula (IA) Can,
Y14로 나타내는 5가의 탄소 원자 수 6~35의 방향환함유 탄화수소기로는, 상기 일반식(I-A)에서의 X1로 나타내는 n가의 결합기로서 예시한 1가~3가의 방향환함유 탄화수소기 및 이들 기가 상기 일반식(I-A)에서의 X1로 나타내는 n가의 결합기의 치환기로서 예시한 것에 의해 치환된 기로부터 유도되는 5가의 기 중, 소정의 탄소 원자 수를 충족하는 것 등을 들 수 있으며, Examples of the aromatic ring-containing hydrocarbon group having 5 to 5 carbon atoms represented by Y 14 include a monovalent to trivalent aromatic ring-containing hydrocarbon group exemplified as an n-valent bond group represented by X 1 in the formula (IA) And the groups satisfying the predetermined number of carbon atoms among the pentavalent groups derived from the substituted groups as exemplified as the substituent of the n-valent bonding group represented by X < 1 > in the general formula (IA)
Y14로 나타내는 5가의 탄소 원자 수 2~35의 복소환함유기로는, 상기 일반식(I-A)에서의 X1로 나타내는 n가의 결합기로서 예시한 1가~3가의 복소환함유기 및 이들 기가 상기 일반식(I-A)에서의 X1로 나타내는 n가의 결합기의 치환기로서 예시한 것에 의해 치환된 기로부터 유도되는 5가의 기 중, 소정의 탄소 원자 수를 충족하는 것 등을 들 수 있다. Examples of the heterocyclic ring-containing group having 5 to 5 carbon atoms represented by Y 14 include a monovalent to trivalent heterocyclic ring-containing group exemplified as an n-valent bond group represented by X 1 in the general formula (IA) Examples of the substituent of the n-valent bonding group represented by X < 1 > in the general formula (IA) include those satisfying the predetermined number of carbon atoms among the pentacyclic groups derived from the substituted group.
상기 일반식(5)에서의 Y14로 나타내는 6가의 탄소 원자 수 2~35의 지방족 탄화수소기로는, 상기 일반식(I-A)에서의 X1로 나타내는 n가의 결합기로서 예시한 1가~3가의 지방족 탄화수소기 및 이들 기가 상기 일반식(I-A)에서의 X1로 나타내는 n가의 결합기의 치환기로서 예시한 것에 의해 치환된 기로부터 유도되는 6가의 기 중, 소정의 탄소 원자 수를 충족하는 것 등을 들 수 있고, The general formula (5) Y 14 6-valent aliphatic hydrocarbon group of a carbon atom number of 2-35 represented by in the above general formula (IA) one monovalent ~ aliphatic trivalent illustrated as an n-valent couplers represented by X 1 in A hydrocarbon group and a group which satisfies the predetermined number of carbon atoms among the six groups represented by the substituent of the group represented by X < 1 > in the general formula (IA) Can,
Y14로 나타내는 6가의 탄소 원자 수 6~35의 방향환함유 탄화수소기로는, 상기 일반식(I-A)에서의 X1로 나타내는 n가의 결합기로서 예시한 1가~3가의 방향환함유 탄화수소기 및 이들 기가 상기 일반식(I-A)에서의 X1로 나타내는 n가의 결합기의 치환기로서 예시한 것에 의해 치환된 기로부터 유도되는 6가의 기 중, 소정의 탄소 원자 수를 충족하는 것 등을 들 수 있으며, Examples of the aromatic ring-containing hydrocarbon group having 6 to 6 carbon atoms represented by Y 14 include a monovalent to trivalent aromatic ring-containing hydrocarbon group exemplified as an n-valent bond group represented by X 1 in the formula (IA) And the groups satisfying the predetermined number of carbon atoms among the six-valent groups derived from the substituted groups exemplified as the substituent of the n-valent bonding group represented by X < 1 > in the general formula (IA)
Y14로 나타내는 6가의 탄소 원자 수 2~35의 복소환함유기로는, 상기 일반식(I-A)에서의 X1로 나타내는 n가의 결합기로서 예시한 1가~3가의 복소환함유기 및 이들 기가 상기 일반식(I-A)에서의 X1로 나타내는 n가의 결합기의 치환기로서 예시한 것에 의해 치환된 기로부터 유도되는 6가의 기 중, 소정의 탄소 원자 수를 충족하는 것 등을 들 수 있다. Examples of the heterocyclic ring-containing group having 6 to 6 carbon atoms represented by Y 14 include a monovalent to trivalent heterocyclic ring-containing group exemplified as an n-valent bond group represented by X 1 in the general formula (IA) And those having a specified number of carbon atoms among the six-valent groups derived from the substituted group as exemplified as the substituent of the n-valent bonding group represented by X 1 in the general formula (IA).
상기 일반식(I-A)로 나타내는 화합물 중에서도 하기 일반식(II-1)~(II-3)으로 나타내는 것이 내열성이 높아지므로 바람직하다. Among the compounds represented by the general formula (I-A), the compounds represented by the following general formulas (II-1) to (II-3) are preferable because they have high heat resistance.
(식 중, R82, R83 및 R84는, 각각 독립적으로 수소 원자, 할로겐 원자, 시아노기, 수산기, 니트로기, 카복실기, 또는 치환기를 가지고 있는 경우도 있는 탄소 원자 수 1~40의 알킬기, 탄소 원자 수 6~20의 아릴기, 탄소 원자 수 7~20의 아릴알킬기 혹은 탄소 원자 수 2~20의 복소환함유기를 나타내고, R1 및 R2는 상기 일반식(I)과 동일하다.) (Wherein R 82 , R 83 and R 84 each independently represents a hydrogen atom, a halogen atom, a cyano group, a hydroxyl group, a nitro group, a carboxyl group, or an alkyl group having 1 to 40 carbon atoms , An aryl group having 6 to 20 carbon atoms, an arylalkyl group having 7 to 20 carbon atoms, or a heterocyclic ring-containing group having 2 to 20 carbon atoms, and R 1 and R 2 are the same as in the general formula (I). )
(식 중, r=2~6이며, X2는, r=2일 때 상기 일반식(1)로 나타내는 기이고, r=3일 때 상기 일반식(2)로 나타내는 기이며, r=4일 때 상기 일반식(3)으로 나타내는 기이고, r=5일 때 상기 일반식(4)이며, r=6일 때 상기 일반식(5)이고, R92 및 R93은, 각각 독립적으로 수소 원자, 할로겐 원자, 시아노기, 수산기, 니트로기, 카복실기, 또는 치환기를 가지고 있는 경우도 있는 탄소 원자 수 1~40의 알킬기, 탄소 원자 수 6~20의 아릴기, 탄소 원자 수 7~20의 아릴알킬기 혹은 탄소 원자 수 2~20의 복소환함유기를 나타내고, R1 및 R2는 상기 일반식(I)과 동일하다.) (2) when r = 3 and r = 4 (2) when r = 3, wherein r = 2 to 6 and X 2 is a group represented by the general formula (5), and R 92 and R 93 are each independently a hydrogen atom or a group represented by the following formula (3) when r = 5, An alkyl group having 1 to 40 carbon atoms, an aryl group having 6 to 20 carbon atoms, an alkoxy group having 7 to 20 carbon atoms, a halogen atom, a cyano group, a hydroxyl group, a nitro group, An arylalkyl group or a heterocyclic ring-containing group having 2 to 20 carbon atoms, and R 1 and R 2 are the same as in the general formula (I).
(식 중, R201, R202, R203, R204, R205, R206, R207, R208은, 각각 독립적으로 수소 원자, 할로겐 원자, 시아노기, 수산기, 니트로기, 카복실기, 치환기를 가지고 있는 경우도 있는 탄소 원자 수 1~40의 알킬기, 탄소 원자 수 6~20의 아릴기, 탄소 원자 수 7~20의 아릴알킬기 또는 탄소 원자 수 2~20의 복소환함유기를 나타내고, Y1, Z1 및 Z2는 상기 일반식(1)과 동일하다.) (Wherein R 201 , R 202 , R 203 , R 204 , R 205 , R 206 , R 207 and R 208 each independently represents a hydrogen atom, a halogen atom, a cyano group, a hydroxyl group, a nitro group, the number is also carbon atom to which the case has 1 to 40 alkyl group, a heterocyclic ring of carbon atoms from 6 to 20 aryl group, a carbon atom number of 7-20 arylalkyl group or 2 to 20 carbon atoms of the monovalent contained, Y 1 , Z 1 and Z 2 are the same as in the general formula (1).)
상기 일반식(II-1)에서의 R82, R83 및 R84로 나타내는 할로겐 원자, 치환기를 가지고 있는 경우도 있는 탄소 원자 수 1~40의 알킬기, 탄소 원자 수 6~20의 아릴기, 탄소 원자 수 7~20의 아릴알킬기, 탄소 원자 수 2~20의 복소환함유기로는, 상기 일반식(I)에서의 R1 및 R2의 설명에서 예시한 것을 들 수 있다. A halogen atom represented by R 82 , R 83 and R 84 in the general formula (II-1), an alkyl group having 1 to 40 carbon atoms which may have a substituent, an aryl group having 6 to 20 carbon atoms, a carbon Examples of the arylalkyl group having 7 to 20 atoms and the heterocyclic ring-containing group having 2 to 20 carbon atoms include those exemplified in the description of R 1 and R 2 in the general formula (I).
상기 일반식(II-2)에서의 R92 및 R93으로 나타내는 할로겐 원자, 치환기를 가지고 있는 경우도 있는 탄소 원자 수 1~40의 알킬기, 탄소 원자 수 6~20의 아릴기, 탄소 원자 수 7~20의 아릴알킬기, 탄소 원자 수 2~20의 복소환함유기로는, 상기 일반식(I)에서의 R1 및 R2의 설명에서 예시한 것을 들 수 있다. A halogen atom represented by R 92 and R 93 in the general formula (II-2), an alkyl group having 1 to 40 carbon atoms, an aryl group having 6 to 20 carbon atoms, a carbon atom number of 7 Examples of the arylalkyl group having 1 to 20 carbon atoms and the heterocyclic ring-containing group having 2 to 20 carbon atoms include those exemplified in the description of R 1 and R 2 in the general formula (I).
상기 일반식(II-3)에서의 R201, R202, R203, R204, R205, R206, R207, R208로 나타내는 할로겐 원자, 치환기를 가지고 있는 경우도 있는 탄소 원자 수 1~40의 알킬기, 탄소 원자 수 6~20의 아릴기, 탄소 원자 수 7~20의 아릴알킬기, 탄소 원자 수 2~20의 복소환함유기로는, 상기 일반식(I)에서의 R1 및 R2의 설명에서 예시한 것을 들 수 있다. A halogen atom represented by R 201 , R 202 , R 203 , R 204 , R 205 , R 206 , R 207 and R 208 in the general formula (II-3) Examples of the alkyl group having 1 to 40 carbon atoms, the aryl group having 6 to 20 carbon atoms, the arylalkyl group having 7 to 20 carbon atoms, and the heterocyclic ring containing 2 to 20 carbon atoms include R 1 and R 2 in the general formula (I) As shown in Fig.
상기 일반식(II-1)로 나타내는 화합물 중에서는, Among the compounds represented by the general formula (II-1)
R1이 분기를 가지는 탄소 원자 수 1~8의 알킬기, 특히 t-부틸기이고, R2가 수소 원자인 것; R82, R83 및 R84가, 각각 독립적으로 수소 원자, 탄소 원자 수 1~20의 알킬기, 탄소 원자 수 6~10의 아릴기, 탄소 원자 수 7~12의 아릴알킬기, 탄소 원자 수 1~10의 복소환함유기인 것, 특히, R82, R83 및 R84 중 어느 하나가 탄소 원자 수 1~4의 알킬기 또는 탄소 원자 수 1~10의 복소환함유기인 것이 바람직하다. R 1 is an alkyl group having 1 to 8 carbon atoms, particularly a t-butyl group, and R 2 is a hydrogen atom; R 82 , R 83 and R 84 each independently represents a hydrogen atom, an alkyl group having 1 to 20 carbon atoms, an aryl group having 6 to 10 carbon atoms, an arylalkyl group having 7 to 12 carbon atoms, It is preferable that any one of R 82 , R 83 and R 84 is an alkyl group having 1 to 4 carbon atoms or a heterocyclic ring-containing group having 1 to 10 carbon atoms.
상기 일반식(II-2)로 나타내는 화합물 중에서는, Among the compounds represented by the above general formula (II-2)
R1이 분기를 가지는 탄소 원자 수 1~8의 알킬기, 특히 t-부틸기이고, R2가 수소 원자인 것; R92 및 R93이, 각각 독립적으로 수소 원자, 탄소 원자 수 1~20의 알킬기, 탄소 원자 수 6~10의 아릴기, 탄소 원자 수 7~12의 아릴알킬기, 탄소 원자 수 1~10의 복소환함유기인 것, 특히, R92 또는 R93이 탄소 원자 수 1~4의 알킬기 또는 탄소 원자 수 1~10의 복소환함유기인 것이 바람직하다. R 1 is an alkyl group having 1 to 8 carbon atoms, particularly a t-butyl group, and R 2 is a hydrogen atom; R 92 and R 93 each independently represents a hydrogen atom, an alkyl group having 1 to 20 carbon atoms, an aryl group having 6 to 10 carbon atoms, an arylalkyl group having 7 to 12 carbon atoms, It is preferable that R 92 or R 93 is an alkyl group having 1 to 4 carbon atoms or a heterocyclic ring-containing group having 1 to 10 carbon atoms.
X2가 상기 일반식(1)이 되는 경우, Y10이, 유황 원자, 탄소 원자 수 1~20의 알킬렌기, 탄소 원자 수 6~25의 2가의 방향환함유 탄화수소기, 탄소 원자 수 2~21의 2가의 복소환함유기, 2,4,8,10-테트라옥사스피로[5,5]운데칸으로부터 유도되는 2가의 기, 특히, 탄소 원자 수 1~15의 알킬렌기, 탄소 원자 수 6~15의 2가의 방향환함유 탄화수소기, 2,4,8,10-테트라옥사스피로[5,5]운데칸으로부터 유도되는 2가의 기인 것이 바람직하고, When X 2 is that the above-mentioned general formula (1), Y 10 is the sulfur atom, the number of carbon atoms of 1 to 20 of the alkylene group, containing a divalent aromatic ring of carbon atoms 6-25 hydrocarbon group, the carbon atom to two to A divalent heterocyclic containing group having 1 to 21 carbon atoms, a divalent group derived from 2,4,8,10-tetraoxaspiro [5,5] undecane, particularly an alkylene group having 1 to 15 carbon atoms, A divalent aromatic ring-containing hydrocarbon group of 1 to 15 carbon atoms, and a divalent group derived from 2,4,8,10-tetraoxaspiro [5,5] undecane,
Z1 및 Z2가 직접 결합, -CO-O-, -O-CO-, 또는 치환기를 가지고 있어도 되는 탄소 원자 수 1~20의 지방족 탄화수소기, 탄소 원자 수 6~10의 방향족 탄화수소기, 특히 치환기를 가지고 있어도 되는 탄소 원자 수 1~8의 지방족 탄화수소기인 것이 바람직하다. Z 1 and Z 2 are each a direct bond, -CO-O-, -O-CO-, or an aliphatic hydrocarbon group having 1 to 20 carbon atoms or an aromatic hydrocarbon group having 6 to 10 carbon atoms, which may have a substituent Or an aliphatic hydrocarbon group having 1 to 8 carbon atoms which may have a substituent.
X2가 상기 일반식(2)가 되는 경우, Y11이, 탄소 원자 수 1~20의 알킬기, 탄소 원자 수 6~10의 아릴기, 탄소 원자 수 7~12의 아릴알킬기 또는 탄소 원자 수 1~10의 복소환함유기로부터 유도되는 3가의 기, 특히, 탄소 원자 수 1~8의 알킬기, 탄소 원자 수 6~9의 아릴기 또는 탄소 원자 수 1~6의 복소환함유기로부터 유도되는 3가의 기인 것이 바람직하고, , Y 11 is an alkyl group having 1 to 20 carbon atoms, an aryl group having 6 to 10 carbon atoms, an arylalkyl group having 7 to 12 carbon atoms, or an arylalkyl group having 1 to 10 carbon atoms when X 2 is the general formula (2) A trivalent group derived from a heterocyclic-containing group having from 1 to 10 carbon atoms, particularly an alkyl group having from 1 to 8 carbon atoms, an aryl group having from 6 to 9 carbon atoms or a heterocyclic-containing group having from 1 to 6 carbon atoms Preferably,
Z1, Z2 및 Z3은 Z1 및 Z2와 동일한 것이 바람직하며, Z 1 , Z 2 and Z 3 are preferably the same as Z 1 and Z 2 ,
X2가 상기 일반식(3)이 되는 경우, Y12는, 바람직한 Y11로서 위에서 든 기에 대응하는 4가인 기가 바람직하고, When X 2 is the above-described general formula (3), Y 12 is preferably a quadrivalent group corresponding to the above-mentioned group as Y 11 ,
Z1~Z4는 Z1 및 Z2와 동일한 것이 바람직하며, Z 1 to Z 4 are preferably the same as Z 1 and Z 2 ,
X2가 상기 일반식(4)가 되는 경우, Y13은, 바람직한 Y11로서 위에서 든 기에 대응하는 5가의 기가 바람직하고, When X 2 is the above general formula (4), Y 13 is preferably a five-valent group corresponding to the above-mentioned group as Y 11 ,
Z1~Z5는 Z1 및 Z2와 동일한 것이 바람직하고, Z 1 to Z 5 are preferably the same as Z 1 and Z 2 ,
X2가 상기 일반식(5)가 되는 경우, Y14는, 바람직한 Y11로서 위에서 든 기에 대응하는 6가인 기가 바람직하고, When X 2 is the above-mentioned general formula (5), Y 14 is preferably a group having a hexadecane corresponding to the above-mentioned group as Y 11 ,
Z1~Z6은 Z1 및 Z2와 동일한 것이 바람직하다. Z 1 to Z 6 are preferably the same as Z 1 and Z 2 .
상기 일반식(I)로 나타내는 화합물 중, 바람직한 것으로는 하기 화학식으로 나타내는 화합물을 들 수 있는데, 본 발명은 이들 화합물에 제한되지 않는다. Among the compounds represented by the above general formula (I), preferred compounds are those represented by the following formulas, but the present invention is not limited to these compounds.
상기 일반식(I)로 나타내는 치환기를 가지는 화합물의 제조 방법은 특별히 한정되지 않지만, 예를 들면, 일본 공개특허 소57-111375호, 일본 공개특허 평3-173843호, 일본 공개특허 평6-128195호, 일본 공개특허 평7-206771호, 일본 공개특허 평7-252191호, 일본 공표특허 2004-501128의 각 공보에 기재된 방법에 의해 제조된 페놀계 화합물과, 할로겐화 알릴 화합물 등을 반응시켜 얻을 수 있다. The method for producing the compound having a substituent represented by the general formula (I) is not particularly limited, and examples thereof include compounds described in JP-A-57-111375, JP-A-3-173843, JP- Obtained by reacting a phenol compound prepared by the method described in each publication of Japanese Patent Application Laid-Open No. 7-206771, No. 7-252191 and Japanese Patent Publication No. 2004-501128 with a halogenated allyl compound or the like have.
상기 일반식(I)로 나타내는 치환기를 가지는 화합물은, 본 발명의 감광성 조성물에 있어서 잠재성 첨가제로 사용할 수 있다. The compound having a substituent represented by the general formula (I) can be used as a latent additive in the photosensitive composition of the present invention.
상기 잠재성 첨가제란, 상온 혹은 150℃ 이하, 예를 들면 150℃ 이하의 프리 베이킹(pre-baking) 공정에서는 불활성이고, 100~250℃로 가열하거나 산/염기 촉매 존재 하에서 80~200℃로 가열함으로써 보호기가 이탈하여 활성이 되는 것이다. The latent additive is inert in a pre-baking process at room temperature or below 150 ° C, for example below 150 ° C, heated to 100-250 ° C or heated to 80-200 ° C in the presence of an acid / base catalyst Whereby the protecting group is released and becomes active.
본 발명의 감광성 조성물에 있어서 잠재성 첨가제로서의 상기 일반식(I)로 나타내는 치환기를 가지는 화합물의 함유량은, 본 발명의 조성물의 고형분 중 0.001~20질량%가 바람직하고, 0.005~5질량%가 보다 바람직하다. The content of the compound having a substituent represented by the general formula (I) as a latent additive in the photosensitive composition of the present invention is preferably from 0.001 to 20 mass%, more preferably from 0.005 to 5 mass%, of the solid content of the composition of the present invention desirable.
본 발명의 감광성 조성물은 광(光) 조사(照射)에 의해 성질이 변하는 조성물이며, 화학반응에 대하여 가용(可溶)이 되는 것에 포지티브형 레지스트, 화학반응에 대하여 불용(不溶)이 되는 것에 네가티브형 레지스트가 있다. 본 발명의 감광성 조성물은, 상기 일반식(I)로 나타내는 치환기를 가지는 화합물을 잠재성 산화방지제로서 포함하는 것 외에, 산가를 가지는 에틸렌성 불포화 결합을 가지는 중합성 화합물 및 광 라디칼 중합 개시제를 필수성분으로 포함한다. The photosensitive composition of the present invention is a composition whose properties are changed by light irradiation and is a positive resist which is soluble to a chemical reaction and a negative resist which is insoluble to a chemical reaction Type resist. The photosensitive composition of the present invention contains, as a latent antioxidant, a compound having a substituent represented by the general formula (I) above, a polymerizable compound having an acidic unsaturated bond and a photoradical polymerization initiator, .
상기 산가를 가지는 에틸렌성 불포화 결합을 가지는 중합성 화합물로는, (메타)아크릴산, α-클로로아크릴산, 이타콘산, 말레산, 시트라콘산, 푸마르산, 히믹산, 크로톤산, 이소크로톤산, 비닐아세트산, 알릴아세트산, 계피산, 소르빈산, 메사콘산, 숙신산모노[2-(메타)아크릴로일옥시에틸], 프탈산모노[2-(메타)아크릴로일옥시에틸], ω-카복시폴리카프로락톤모노(메타)아크릴레이트 등의 양 말단에 카복시기와 수산기를 가지는 폴리머의 모노(메타)아크릴레이트, 하이드록시에틸(메타)아크릴레이트·말레이트(maleate), 하이드록시프로필(메타)아크릴레이트·말레이트, 디시클로펜타디엔·말레이트 혹은 1개의 카복실기와 2개 이상의 (메타)아크릴로일기를 가지는 다관능(메타)아크릴레이트 등의 불포화 다염기산; 페놀 및/또는 크레졸노볼락에폭시 수지, 비페닐 골격, 나프탈렌 골격을 가지는 노볼락에폭시 수지, 비스페놀A노볼락형 에폭시 화합물, 디시클로펜타디엔노볼락형 에폭시 화합물 등의 노볼락형 에폭시 화합물, 다관능 에폭시기를 가지는 폴리페닐메탄형 에폭시 수지, 하기 일반식(III)으로 나타내는 에폭시 화합물 등의 에폭시 수지의 에폭시기에 불포화 일염기산을 작용시킨 수지, 에폭시 수지의 에폭시기에 불포화 일염기산을 작용시키고, 또한 다염기산 무수물을 작용시켜 얻어진 수지, 펜타에리트리톨트리아크릴레이트, 디펜타에리트리톨펜타아크릴레이트 등의 수산기함유 다관능 아크릴레이트와 무수 숙신산, 무수 프탈산, 테트라하이드로 무수 프탈산 등의 이염기산 무수물의 반응물인 산가를 가지는 다관능 아크릴레이트 등을 들 수 있다. Examples of the polymerizable compound having an ethylenic unsaturated bond having an acid value include (meth) acrylic acid,? -Chloroacrylic acid, itaconic acid, maleic acid, citraconic acid, fumaric acid, hemiamic acid, crotonic acid, isocrotonic acid, (Meth) acrylate, mono [2- (meth) acryloyloxyethyl], ω-carboxypolycaprolactone mono (metha) acrylate, cinnamic acid, sorbic acid, (Meth) acrylate, hydroxyethyl (meth) acrylate, maleate, hydroxypropyl (meth) acrylate, maleate, and dicyclopentyl (meth) acrylate of a polymer having a carboxyl group and a hydroxyl group at both terminals, Unsaturated polybasic acids such as chloropentadiene maleate or polyfunctional (meth) acrylate having one carboxyl group and two or more (meth) acryloyl groups; Novolak type epoxy compounds such as phenol and / or cresol novolak epoxy resin, biphenyl skeleton, novolak epoxy resin having naphthalene skeleton, bisphenol A novolak type epoxy compound and dicyclopentadiene novolak type epoxy compound, polyfunctional A polyphenylmethane type epoxy resin having an epoxy group, an epoxy compound represented by the following general formula (III), a resin obtained by allowing an unsaturated monobasic acid to act on the epoxy group of the epoxy resin, an unsaturated monobasic acid to the epoxy group of the epoxy resin, A resin obtained by reacting a polybasic acid anhydride with a hydroxyl group-containing polyfunctional acrylate such as pentaerythritol triacrylate, dipentaerythritol pentaacrylate and the like, and acidic acid which is a reaction product of a dibasic acid anhydride such as succinic anhydride, phthalic anhydride and tetrahydrophthalic anhydride , And the like.
(식 중, X41은 직접 결합, 치환기를 가지고 있는 경우도 있는 탄소 원자 수 1~4의 알킬렌기, 치환기를 가지고 있는 경우도 있는 탄소 원자 수 3~20의 지환식 탄화수소기, -O-, -S-, -SO2-, -SS-, -SO-, -CO-, -OCO- 또는 상기 (1-1)~(1-3)으로 나타내는 치환기를 나타내고, (Wherein X 41 represents a direct bond, an alkylene group having 1 to 4 carbon atoms which may have a substituent, an alicyclic hydrocarbon group having 3 to 20 carbon atoms which may have a substituent, -O-, -S-, -SO 2 -, -SS-, -SO-, -CO-, -OCO-, or a substituent represented by the above-mentioned (1-1)
R41, R42, R43 및 R44는, 각각 독립적으로 수소 원자, 치환기를 가지고 있는 경우도 있는 탄소 원자 수 1~5의 알킬기, 치환기를 가지고 있는 경우도 있는 탄소 원자 수 1~8의 알콕시기, 치환기를 가지고 있는 경우도 있는 탄소 원자 수 2~5의 알케닐기 또는 할로겐 원자를 나타내며, R 41 , R 42 , R 43 and R 44 each independently represent a hydrogen atom, an alkyl group having 1 to 5 carbon atoms which may have a substituent, an alkoxy group having 1 to 8 carbon atoms An alkenyl group having 2 to 5 carbon atoms which may have a substituent, or a halogen atom,
m은 0~10의 정수이다.) and m is an integer of 0 to 10.)
이들 산가를 가지는 에틸렌성 불포화 결합을 가지는 중합성 화합물은, 단독으로 또는 2종 이상을 혼합하여 사용할 수 있고, 또한, 산가를 가지지 않는 에틸렌성 불포화 결합을 가지는 중합성 화합물과 조합하여 사용할 수 있다. 2종 이상을 혼합하여 사용하는 경우에는 그들을 미리 공중합하여 공중합체로 사용하여도 된다. The polymerizable compounds having an ethylenic unsaturated bond having these acid values can be used alone or in combination of two or more kinds and can be used in combination with a polymerizable compound having an ethylenically unsaturated bond having no acid value. When two or more of them are mixed and used, they may be copolymerized in advance and used as a copolymer.
본 발명의 감광성 조성물에서, 산가를 가지는 에틸렌성 불포화 결합을 가지는 중합성 화합물의 함유량은, 본 발명의 조성물의 고형분 중 20~80질량%가 바람직하고, 고형분 중의 30~70질량%가 더 바람직하다. In the photosensitive composition of the present invention, the content of the polymerizable compound having an acid value and having an ethylenically unsaturated bond is preferably from 20 to 80 mass% in the solid content of the composition of the present invention, more preferably from 30 to 70 mass% .
상기 산가를 가지지 않는 에틸렌성 불포화 결합을 가지는 중합성 화합물로는, 예를 들면, (메타)아크릴산-2-하이드록시에틸, (메타)아크릴산-2-하이드록시프로필, (메타)아크릴산글리시딜, 하기 화합물 No.A1~No.A4, (메타)아크릴산메틸, (메타)아크릴산부틸, (메타)아크릴산이소부틸, (메타)아크릴산-t-부틸, (메타)아크릴산시클로헥실, (메타)아크릴산n-옥틸, (메타)아크릴산이소옥틸, (메타)아크릴산이소노닐, (메타)아크릴산스테아릴, (메타)아크릴산라우릴, (메타)아크릴산메톡시에틸, (메타)아크릴산디메틸아미노메틸, (메타)아크릴산디메틸아미노에틸, (메타)아크릴산아미노프로필, (메타)아크릴산디메틸아미노프로필, (메타)아크릴산에톡시에틸, (메타)아크릴산폴리(에톡시)에틸, (메타)아크릴산부톡시에톡시에틸, (메타)아크릴산에틸헥실, (메타)아크릴산페녹시에틸, (메타)아크릴산테트라하이드로푸릴, (메타)아크릴산비닐, (메타)아크릴산알릴, (메타)아크릴산벤질, 에틸렌글리콜디(메타)아크릴레이트, 디에틸렌글리콜디(메타)아크릴레이트, 트리에틸렌글리콜디(메타)아크릴레이트, 폴리에틸렌글리콜디(메타)아크릴레이트, 프로필렌글리콜디(메타)아크릴레이트, 1,4-부탄디올디(메타)아크릴레이트, 1,6-헥산디올디(메타)아크릴레이트, 트리메틸올에탄트리(메타)아크릴레이트, 트리메틸올프로판트리(메타)아크릴레이트, 디펜타에리트리톨펜타(메타)아크릴레이트, 디펜타에리트리톨헥사(메타)아크릴레이트, 펜타에리트리톨테트라(메타)아크릴레이트, 펜타에리트리톨트리(메타)아크릴레이트, 트리시클로데칸디메틸올디(메타)아크릴레이트, 트리[(메타)아크릴로일에틸]이소시아누레이트, 폴리에스테르(메타)아크릴레이트 올리고머 등의 불포화 일염기산 및 다가 알코올 또는 다가 페놀의 에스테르; (메타)아크릴산아연, (메타)아크릴산마그네슘 등의 불포화 다염기산의 금속염; 말레산 무수물, 이타콘산 무수물, 시트라콘산 무수물, 메틸테트라하이드로 무수 프탈산, 테트라하이드로 무수 프탈산, 트리알킬테트라하이드로 무수 프탈산, 5-(2,5-디옥소테트라하이드로푸릴)-3-메틸-3-시클로헥센-1,2-디카복시산 무수물, 트리알킬테트라하이드로 무수 프탈산-무수 말레산 부가물, 도데세닐 무수 숙신산, 무수 메틸히믹산 등의 불포화 다염기산의 산무수물; (메타)아크릴아미드, 메틸렌비스-(메타)아크릴아미드, 디에틸렌트리아민트리스(메타)아크릴아미드, 크실릴렌비스(메타)아크릴아미드, α-클로로아크릴아미드, N-2-하이드록시에틸(메타)아크릴아미드 등의 불포화 일염기산 및 다가 아민의 아미드; 아크롤레인 등의 불포화 알데히드; (메타)아크릴로니트릴, α-클로로아크릴로니트릴, 시안화 비닐리덴, 시안화 알릴 등의 불포화 니트릴; 스티렌, 4-메틸스티렌, 4-에틸스티렌, 4-메톡시스티렌, 4-하이드록시스티렌, 4-클로로스티렌, 디비닐벤젠, 비닐톨루엔, 비닐 안식향산, 비닐페놀, 비닐술폰산, 4-비닐벤젠술폰산, 비닐벤질메틸에테르, 비닐벤질글리시딜에테르 등의 불포화 방향족 화합물; 메틸비닐케톤 등의 불포화 케톤; 비닐아민, 알릴아민, N-비닐피롤리돈, 비닐피페리딘 등의 불포화 아민 화합물; 비닐메틸에테르, 비닐에틸에테르, n-부틸비닐에테르, 이소부틸비닐에테르, 알릴글리시딜에테르 등의 비닐에테르; 말레이미드, N-페닐말레이미드, N-시클로헥실말레이미드 등의 불포화 이미드류; 인덴, 1-메틸인덴 등의 인덴류; 1,3-부타디엔, 이소프렌, 클로로프렌 등의 지방족 공역 디엔류; 폴리스티렌, 폴리메틸(메타)아크릴레이트, 폴리-n-부틸(메타)아크릴레이트, 폴리실록산 등의 중합체 분자쇄의 말단에 모노(메타)아크릴로일기를 가지는 매크로 모노머류; (메타)아크릴로니트릴, 에틸렌, 프로필렌, 부틸렌, 염화비닐, 아세트산비닐 등의 그 밖의 비닐 화합물, 및 폴리메틸메타크릴레이트 매크로 모노머, 폴리스티렌 매크로 모노머 등의 매크로 모노머류, 트리시클로데칸 골격의 모노메타크릴레이트, N-페닐말레이미드, 메타크릴로일옥시메틸-3-에틸옥세탄 등과, (메타)아크릴산의 공중합체 및 이들에 쇼와 덴코사(주) 제품 카렌즈 MOI, AOI와 같은 불포화 결합을 가지는 이소시아네이트 화합물을 반응시킨 (메타)아크릴산의 공중합체나, 비닐클로라이드, 비닐리덴클로라이드, 디비닐숙시네이트, 디알릴프탈레이트, 트리알릴포스파이트, 트리알릴이소시아누레이트, 비닐티오에테르, 비닐이미다졸, 비닐옥사졸린, 비닐카바졸, 비닐피롤리돈, 비닐피리딘, 수산기함유 비닐 모노머 및 폴리이소시아네이트 화합물의 비닐우레탄 화합물, 수산기함유 비닐 모노머 및 폴리에폭시 화합물의 비닐에폭시 화합물, 펜타에리트리톨트리아크릴레이트, 디펜타에리트리톨펜타아크릴레이트 등의 수산기함유 다관능 아크릴레이트와 톨릴렌디이소시아네이트, 헥사메틸렌디이소시아네이트 등의 다관능 이소시아네이트의 반응물 등을 들 수 있다. Examples of the polymerizable compound having an ethylenically unsaturated bond having no acid value include (meth) acrylic acid-2-hydroxyethyl, (meth) acrylic acid-2-hydroxypropyl, (meth) , The following compounds No. A1 to No. A4, methyl (meth) acrylate, butyl (meth) acrylate, isobutyl (meth) acrylate, t- butyl (meth) acrylate, cyclohexyl stearyl (meth) acrylate, lauryl (meth) acrylate, methoxyethyl (meth) acrylate, dimethylaminomethyl (meth) acrylate, isobutyl (meth) acrylate, isooctyl (Meth) acrylate, dimethylaminoethyl (meth) acrylate, aminopropyl (meth) acrylate, dimethylaminopropyl (meth) acrylate, ethoxyethyl , Ethylhexyl (meth) acrylate, (meth) acrylic acid (Meth) acrylate, diethylene glycol di (meth) acrylate, diethylene glycol di (meth) acrylate, triethylene glycol di (meth) acrylate, Propylene glycol di (meth) acrylate, 1,4-butanediol di (meth) acrylate, 1,6-hexanediol di (meth) acrylate, (Meth) acrylate, trimethylol ethane tri (meth) acrylate, trimethylol propane tri (meth) acrylate, dipentaerythritol penta (meth) acrylate, dipentaerythritol hexa (Meth) acrylate, pentaerythritol tri (meth) acrylate, tricyclodecane dimethylol di (meth) acrylate, tri [(meth) acryloylethyl] isocyanurate, Esters of unsaturated monobasic acids and polyhydric alcohols or polyhydric phenols such as acrylate oligomers; Metal salts of unsaturated polybasic acids such as zinc (meth) acrylate and magnesium (meth) acrylate; Maleic anhydride, itaconic anhydride, citraconic anhydride, methyltetrahydrophthalic anhydride, tetrahydrophthalic anhydride, trialkyltetrahydrophthalic anhydride, 5- (2,5-dioxotetrahydrofuryl) Acid anhydrides of unsaturated polybasic acids such as cyclohexene-1,2-dicarboxylic anhydride, trialkyltetrahydrophthalic anhydride-maleic anhydride adduct, dodecenyl ansuccinic acid, and anhydrous methyl hemiamic acid; (Meth) acrylamide, methylenebis- (meth) acrylamide, diethylenetriamintris (meth) acrylamide, xylylenebis (meth) acrylamide, alpha -chloroacrylamide, N-2-hydroxyethyl Amides of unsaturated monobasic acids and polyamines such as methacrylamide; Unsaturated aldehydes such as acrolein; Unsaturated nitriles such as (meth) acrylonitrile,? -Chloroacrylonitrile, vinylidene cyanide, and allyl cyanide; Vinylbenzene sulfonic acid, vinylbenzenesulfonic acid, vinylbenzenesulfonic acid, vinylbenzenesulfonic acid, vinylbenzenesulfonic acid, vinylbenzenesulfonic acid, vinylbenzenesulfonic acid, and vinylbenzenesulfonic acid. Unsaturated aromatic compounds such as vinylbenzyl methyl ether and vinyl benzyl glycidyl ether; Unsaturated ketones such as methyl vinyl ketone; Unsaturated amine compounds such as vinylamine, allylamine, N-vinylpyrrolidone and vinylpiperidine; Vinyl ethers such as vinyl methyl ether, vinyl ethyl ether, n-butyl vinyl ether, isobutyl vinyl ether and allyl glycidyl ether; Unsaturated imides such as maleimide, N-phenylmaleimide and N-cyclohexylmaleimide; Indene such as indene and 1-methylindene; Aliphatic conjugated dienes such as 1,3-butadiene, isoprene and chloroprene; Macromonomers having a mono (meth) acryloyl group at the end of a polymer molecular chain such as polystyrene, polymethyl (meth) acrylate, poly-n-butyl (meth) acrylate and polysiloxane; (Meth) acrylonitrile, other vinyl compounds such as ethylene, propylene, butylene, vinyl chloride and vinyl acetate, and macromonomers such as polymethyl methacrylate macromonomers and polystyrene macromonomers, monocarboxylic acids such as monocyclohexane Methacrylate, N-phenylmaleimide, methacryloyloxymethyl-3-ethyloxetane, etc., and copolymers of (meth) acrylic acid, and unsaturated compounds such as car lenses MOI and AOI of Showa Denko Co., A copolymer of (meth) acrylic acid in which an isocyanate compound having a bond is reacted and a copolymer of vinyl chloride, vinylidene chloride, divinyl succinate, diallyl phthalate, triallyl phosphite, triallyl isocyanurate, vinyl thioether, vinyl Imidazole, vinyl oxazoline, vinyl carbazole, vinyl pyrrolidone, vinyl pyridine, hydroxyl group-containing vinyl monomers and polyisocyanate compounds Containing vinyl monomers and vinyl epoxy compounds of polyepoxy compounds, pentaerythritol triacrylate, dipentaerythritol pentaacrylate, and other hydroxyl group-containing polyfunctional acrylates, tolylene diisocyanate, hexamethylene diisocyanate, and the like And a reaction product of a polyfunctional isocyanate.
산가 조정하여 본 발명의 감광성 조성물의 현상성을 개량하기 위해, 상기 산가를 가지는 에틸렌성 불포화 결합을 가지는 중합성 화합물과 함께, 또한 단관능 또는 다관능 에폭시 화합물을 사용할 수 있다. 상기 산가를 가지는 에틸렌성 불포화 결합을 가지는 중합성 화합물은, 고형분의 산가가 5~120㎎KOH/g의 범위인 것이 바람직하고, 단관능 또는 다관능 에폭시 화합물의 사용량은 상기 산가를 충족하도록 선택하는 것이 바람직하다. In order to improve the developability of the photosensitive composition of the present invention by adjusting the acid value, a monofunctional or polyfunctional epoxy compound may be used together with the polymerizable compound having an acid value and having an ethylenically unsaturated bond. The polymerizable compound having an acid value and having an ethylenic unsaturated bond preferably has an acid value of 5 to 120 mg KOH / g as the solid content, and the amount of the monofunctional or polyfunctional epoxy compound used is selected so as to satisfy the above acid value .
상기 단관능 에폭시 화합물로는, 글리시딜메타크릴레이트, 메틸글리시딜에테르, 에틸글리시딜에테르, 프로필글리시딜에테르, 이소프로필글리시딜에테르, 부틸글리시딜에테르, 이소부틸글리시딜에테르, t-부틸글리시딜에테르, 펜틸글리시딜에테르, 헥실글리시딜에테르, 헵틸글리시딜에테르, 옥틸글리시딜에테르, 노닐글리시딜에테르, 데실글리시딜에테르, 운데실글리시딜에테르, 도데실글리시딜에테르, 트리데실글리시딜에테르, 테트라데실글리시딜에테르, 펜타데실글리시딜에테르, 헥사데실글리시딜에테르, 2-에틸헥실글리시딜에테르, 알릴글리시딜에테르, 프로파르길글리시딜에테르, p-메톡시에틸글리시딜에테르, 페닐글리시딜에테르, p-메톡시글리시딜에테르, p-부틸페놀글리시딜에테르, 크레질글리시딜에테르, 2-메틸크레질글리시딜에테르, 4-노닐페닐글리시딜에테르, 벤질글리시딜에테르, p-쿠밀페닐글리시딜에테르, 트리틸글리시딜에테르, 2,3-에폭시프로필메타크릴레이트, 에폭시화 대두유, 에폭시화 아마인유, 글리시딜부틸레이트, 비닐시클로헥산모노옥시드, 1,2-에폭시-4-비닐시클로헥산, 스티렌옥시드, 피넨옥시드, 메틸스티렌옥시드, 시클로헥센옥시드, 프로필렌옥시드 등을 들 수 있다. Examples of the monofunctional epoxy compound include glycidyl methacrylate, methyl glycidyl ether, ethyl glycidyl ether, propyl glycidyl ether, isopropyl glycidyl ether, butyl glycidyl ether, Butyl glycidyl ether, pentyl glycidyl ether, hexyl glycidyl ether, heptyl glycidyl ether, octyl glycidyl ether, nonyl glycidyl ether, decyl glycidyl ether, undecyl glycidyl ether Ethylhexyl glycidyl ether, allyl glycidyl ether, 2-ethylhexyl glycidyl ether, 2-ethylhexyl glycidyl ether, 2-ethylhexyl glycidyl ether, Propyl glycidyl ether, p-methoxyethyl glycidyl ether, phenyl glycidyl ether, p-methoxy glycidyl ether, p-butyl phenol glycidyl ether, cresyl glycidyl ether Diester, 2-methylcresylglycidyl ether, 4 - nonylphenyl glycidyl ether, benzyl glycidyl ether, p-cumyl phenyl glycidyl ether, trityl glycidyl ether, 2,3-epoxypropyl methacrylate, epoxidized soybean oil, epoxidized linseed oil, Vinyl cyclohexane monoxide, 1,2-epoxy-4-vinylcyclohexane, styrene oxide, pinene oxide, methylstyrene oxide, cyclohexene oxide, propylene oxide and the like .
상기 다관능 에폭시 화합물로는, 비스페놀형 에폭시 화합물 및 글리시딜에테르류로 이루어지는 군에서 선택되는 1종 이상을 사용하면, 특성이 한층 양호한 감광성 조성물을 얻을 수 있으므로 바람직하다. 상기 비스페놀형 에폭시 화합물로는, 상기 일반식(III)으로 나타내는 에폭시 화합물을 사용할 수 있는 것 외에, 예를 들면, 수소첨가 비스페놀형 에폭시 화합물 등의 비스페놀형 에폭시 화합물도 사용할 수 있다. 상기 글리시딜에테르류로는, 에틸렌글리콜디글리시딜에테르, 프로필렌글리콜디글리시딜에테르, 1,4-부탄디올디글리시딜에테르, 1,6-헥산디올디글리시딜에테르, 1,8-옥탄디올디글리시딜에테르, 1,10-데칸디올디글리시딜에테르, 2,2-디메틸-1,3-프로판디올디글리시딜에테르, 디에틸렌글리콜디글리시딜에테르, 트리에틸렌글리콜디글리시딜에테르, 테트라에틸렌글리콜디글리시딜에테르, 헥사에틸렌글리콜디글리시딜에테르, 1,4-시클로헥산디메탄올디글리시딜에테르, 1,1,1-트리(글리시딜옥시메틸)프로판, 1,1,1-트리(글리시딜옥시메틸)에탄, 1,1,1-트리(글리시딜옥시메틸)메탄, 1,1,1,1-테트라(글리시딜옥시메틸)메탄을 들 수 있다. As the polyfunctional epoxy compound, use of at least one selected from the group consisting of bisphenol-type epoxy compounds and glycidyl ethers is preferable because a photosensitive composition having better characteristics can be obtained. As the bisphenol-type epoxy compound, for example, a bisphenol-type epoxy compound such as a hydrogenated bisphenol-type epoxy compound can be used besides the epoxy compound represented by the general formula (III). Examples of the glycidyl ethers include ethylene glycol diglycidyl ether, propylene glycol diglycidyl ether, 1,4-butanediol diglycidyl ether, 1,6-hexanediol diglycidyl ether, Octanediol diglycidyl ether, 1,10-decanediol diglycidyl ether, 2,2-dimethyl-1,3-propanediol diglycidyl ether, diethylene glycol diglycidyl ether, tri Ethylene glycol diglycidyl ether, tetraethylene glycol diglycidyl ether, hexaethylene glycol diglycidyl ether, 1,4-cyclohexanedimethanol diglycidyl ether, 1,1,1-tri (Glycidyloxymethyl) methane, 1,1,1,1-tetra (glycidyloxymethyl) ethane, 1,1,1- Dioxymethyl) methane.
그 외, 페놀노볼락형 에폭시 화합물, 비페닐노볼락형 에폭시 화합물, 크레졸노볼락형 에폭시 화합물, 비스페놀A노볼락형 에폭시 화합물, 디시클로펜타디엔노볼락형 에폭시 화합물 등의 노볼락형 에폭시 화합물; 3,4-에폭시-6-메틸시클로헥실메틸-3,4-에폭시-6-메틸시클로헥산카복실레이트, 3,4-에폭시시클로헥실메틸-3,4-에폭시시클로헥산카복실레이트, 1-에폭시에틸-3,4-에폭시시클로헥산 등의 지환식 에폭시 화합물; 프탈산디글리시딜에스테르, 테트라하이드로프탈산디글리시딜에스테르, 다이머산글리시딜에스테르 등의 글리시딜에스테르류; 테트라글리시딜디아미노디페닐메탄, 트리글리시딜-p-아미노페놀, N,N-디글리시딜아닐린 등의 글리시딜아민류; 1,3-디글리시딜-5,5-디메틸히단토인, 트리글리시딜이소시아누레이트 등의 복소환식 에폭시 화합물; 디시클로펜타디엔디옥시드 등의 디옥시드 화합물; 나프탈렌형 에폭시 화합물, 트리페닐메탄형 에폭시 화합물, 디시클로펜타디엔형 에폭시 화합물 등을 사용할 수도 있다. In addition, novolak type epoxy compounds such as phenol novolak type epoxy compounds, biphenyl novolac type epoxy compounds, cresol novolak type epoxy compounds, bisphenol A novolak type epoxy compounds and dicyclopentadiene novolak type epoxy compounds; Epoxy cyclohexylmethyl-3,4-epoxy-6-methylcyclohexanecarboxylate, 3,4-epoxycyclohexylmethyl-3,4-epoxycyclohexanecarboxylate, 1-epoxyethyl Alicyclic epoxy compounds such as 3,4-epoxycyclohexane; Glycidyl esters such as phthalic acid diglycidyl ester, tetrahydrophthalic acid diglycidyl ester and dimeric acid glycidyl ester; Glycidylamines such as tetraglycidyldiaminodiphenylmethane, triglycidyl-p-aminophenol and N, N-diglycidylaniline; Heterocyclic epoxy compounds such as 1,3-diglycidyl-5,5-dimethylhydantoin and triglycidyl isocyanurate; A dioxide compound such as dicyclopentadiene dioxide; Naphthalene type epoxy compounds, triphenylmethane type epoxy compounds, dicyclopentadiene type epoxy compounds, and the like.
상기 광 라디칼 중합 개시제는 광 조사를 받음으로써 라디칼 중합을 개시시키는 것이 가능해지는 화합물이면 되고, 예를 들면, 아세토페논계 화합물, 벤질계 화합물, 벤조페논계 화합물, 티옥산톤계 화합물 등의 케톤계 화합물, 옥심계 화합물 등을 바람직한 것으로서 예시할 수 있다. The photo radical polymerization initiator may be any compound which can initiate radical polymerization by being irradiated with light. For example, it may be a ketone compound such as an acetophenone compound, a benzyl compound, a benzophenone compound or a thioxanthone compound , Oxime-based compounds, and the like can be exemplified as preferable ones.
아세토페논계 화합물로는 예를 들면, 디에톡시아세토페논, 2-하이드록시-2-메틸-1-페닐프로판-1-온, 4'-이소프로필-2-하이드록시-2-메틸프로피오페논, 2-하이드록시메틸-2-메틸프로피오페논, 2,2-디메톡시-1,2-디페닐에탄-1-온, p-디메틸아미노아세토페논, p-터셔리(tertiary)부틸디클로로아세토페논, p-터셔리부틸트리클로로아세토페논, p-아지드벤잘아세토페논, 1-하이드록시시클로헥실페닐케톤, 2-메틸-1-[4-(메틸티오)페닐]-2-모르폴리노프로파논-1,2-벤질-2-디메틸아미노-1-(4-모르폴리노페닐)-부타논-1, 벤조인, 벤조인메틸에테르, 벤조인에틸에테르, 벤조인이소프로필에테르, 벤조인-n-부틸에테르, 벤조인이소부틸에테르, 1-[4-(2-하이드록시에톡시)-페닐]-2-하이드록시-2-메틸-1-프로판-1-온 등을 들 수 있다. Examples of the acetophenone compound include diethoxyacetophenone, 2-hydroxy-2-methyl-1-phenylpropan-1-one, 4'-isopropyl-2-hydroxy- , 2-hydroxymethyl-2-methylpropiophenone, 2,2-dimethoxy-1,2-diphenylethan-1-one, p-dimethylaminoacetophenone, p- tertiary butyldichloroacetone Phenocone, p-tert-butyltrichloroacetophenone, p-azidobenzalacetophenone, 1-hydroxycyclohexyl phenyl ketone, 2-methyl-1- [4- (methylthio) 1,2-benzyl-2-dimethylamino-1- (4-morpholinophenyl) -butanone-1, benzoin, benzoin methyl ether, benzoin ethyl ether, benzoin isopropyl ether, benzo Phenyl-2-hydroxy-2-methyl-1-propan-1-one, and the like can be given. have.
벤질계 화합물로는 벤질, 아니실 등을 들 수 있다. Examples of the benzyl compound include benzyl and anisyl.
벤조페논계 화합물로는, 예를 들면, 벤조페논, o-벤조일 안식향산 메틸, 미힐러케톤, 4,4'-비스디에틸아미노벤조페논, 4,4'-디클로로벤조페논, 4-벤조일-4'-메틸디페닐술피드 등을 들 수 있다. Examples of the benzophenone-based compound include benzophenone, methyl o-benzoylbenzoate, Michler's ketone, 4,4'-bisdiethylaminobenzophenone, 4,4'-dichlorobenzophenone, '-Methyldiphenyl sulfide and the like.
티옥산톤계 화합물로는 티옥산톤, 2-메틸티옥산톤, 2-에틸티옥산톤, 2-클로로티옥산톤, 2-이소프로필티옥산톤, 2,4-디에틸티옥산톤 등을 들 수 있다. Examples of the thioxanthone compound include thioxanthone, 2-methylthioxanthone, 2-ethylthioxanthone, 2-chlorothioxanthone, 2-isopropylthioxanthone and 2,4- .
옥심계 화합물로는, 특히, 하기 일반식(IV) 또는 (V)로 나타내는 화합물이 감도 및 내열성의 점에서 바람직하다. As the oxime-based compound, a compound represented by the following general formula (IV) or (V) is particularly preferable in view of sensitivity and heat resistance.
(식 중, R51 및 R52는, 각각 독립적으로 수소 원자, 시아노기, 치환기를 가지고 있는 경우도 있는 탄소 원자 수 1~20의 알킬기, 치환기를 가지고 있는 경우도 있는 탄소 원자 수 6~30의 아릴기, 치환기를 가지고 있는 경우도 있는 탄소 원자 수 7~30의 아릴알킬기 또는 치환기를 가지고 있는 경우도 있는 탄소 원자 수 2~20의 복소환함유기를 나타내고, (Wherein R 51 and R 52 each independently represents a hydrogen atom, a cyano group, an alkyl group having 1 to 20 carbon atoms which may have a substituent, an alkyl group having 6 to 30 carbon atoms An aryl group, an arylalkyl group having 7 to 30 carbon atoms which may have a substituent, or a heterocyclic ring-containing group having 2 to 20 carbon atoms, which may have a substituent,
R53 및 R54는, 각각 독립적으로 할로겐 원자, 니트로기, 시아노기, 수산기, 카복실기, R55, OR56, SR57, NR58R59, COR60, SOR61, SO2R62 또는 CONR63R64를 나타내고, R53 및 R54는 서로 결합하여 환을 형성하고 있는 경우도 있으며, R 53 and R 54 each independently represents a halogen atom, a nitro group, a cyano group, a hydroxyl group, a carboxyl group, R 55 , OR 56 , SR 57 , NR 58 R 59 , COR 60 , SOR 61 , SO 2 R 62 or CONR 63 R 64 , R 53 and R 54 may be bonded to each other to form a ring,
R55, R56, R57, R58, R59, R60, R61, R62, R63 및 R64는, 각각 독립적으로 치환기를 가지고 있는 경우도 있는 탄소 원자 수 1~20의 알킬기, 치환기를 가지고 있는 경우도 있는 탄소 원자 수 6~30의 아릴기, 치환기를 가지고 있는 경우도 있는 탄소 원자 수 7~30의 아릴알킬기 또는 치환기를 가지고 있는 경우도 있는 탄소 원자 수 2~20의 복소환함유기를 나타내고, R 55 , R 56 , R 57 , R 58 , R 59 , R 60 , R 61 , R 62 , R 63 and R 64 each independently represent an alkyl group having 1 to 20 carbon atoms, An aryl group having 6 to 30 carbon atoms which may have a substituent, an arylalkyl group having 7 to 30 carbon atoms, which may have a substituent, or a heterocyclic ring having 2 to 20 carbon atoms, which may have a substituent Containing group,
X3은 산소 원자, 유황 원자, 셀렌 원자, CR75R76, CO, NR77 또는 PR78을 나타내며, X 3 represents an oxygen atom, a sulfur atom, a selenium atom, CR 75 R 76 , CO, NR 77 or PR 78 ,
X4는 단결합 또는 CO를 나타내고, X 4 represents a single bond or CO,
R75~R78은, 탄소 원자 수 1~20의 알킬기, 탄소 원자 수 6~30의 아릴기 또는 탄소 원자 수 7~30의 아릴알킬기를 나타내고, 상기 알킬기 또는 아릴알킬기 중의 메틸렌기는, 할로겐 원자, 니트로기, 시아노기, 수산기, 카복실기 또는 복소환함유기로 치환되어 있는 경우도 있으며, -O-로 치환되어 있는 경우도 있고, R 75 to R 78 represents an alkyl group having 1 to 20 carbon atoms, an aryl group having 6 to 30 carbon atoms or an arylalkyl group having 7 to 30 carbon atoms, and the methylene group in the alkyl or arylalkyl group may be substituted with a halogen atom, A nitro group, a cyano group, a hydroxyl group, a carboxyl group or a heterocyclic ring-containing group, or may be substituted with -O-,
R53 및 R54는, 각각 독립적으로, 인접하는 어느 쪽인가의 벤젠 환과 하나가 되어 환을 형성하고 있는 경우도 있으며, R 53 and R 54 are each independently a monovalent aromatic hydrocarbon group which may be bonded to any adjacent benzene ring to form a ring,
a는 0~4의 정수를 나타내고, a represents an integer of 0 to 4,
b는 0~5의 정수를 나타낸다.) and b represents an integer of 0 to 5.)
(식 중, R101 및 R102는, 각각 독립적으로 R111, OR111, COR111, SR111, CONR112R113 또는 CN을 나타내고, (Wherein R 101 and R 102 each independently represent R 111 , OR 111 , COR 111 , SR 111 , CONR 112 R 113 or CN,
R111, R112 및 R113은, 각각 독립적으로 수소 원자, 탄소 원자 수 1~20의 알킬기, 탄소 원자 수 6~30의 아릴기, 탄소 원자 수 7~30의 아릴알킬기 또는 탄소 원자 수 2~20의 복소환함유기를 나타내며, R 111 , R 112 and R 113 are each independently a hydrogen atom, an alkyl group having 1 to 20 carbon atoms, an aryl group having 6 to 30 carbon atoms, an arylalkyl group having 7 to 30 carbon atoms, A heterocyclic ring-containing group having 1 to 20 carbon atoms,
R111, R112 및 R113으로 나타내는 기의 수소 원자는, 또한 R121, OR121, COR121, SR121, NR122R123, CONR122R123, -NR122-OR123, -NCOR122-OCOR123, NR122COR121, OCOR121, COOR121, SCOR121, OCSR121, COSR121, CSOR121, 수산기, 니트로기, CN 또는 할로겐 원자로 치환되어 있는 경우도 있고, R 111, a hydrogen atom of the group represented by R 112 and R 113 are, and R 121, OR 121, COR 121 , SR 121, NR 122 R 123, CONR 122 R 123, -NR 122 -OR 123, -NCOR 122 - OCOR 123 , NR 122 COR 121 , OCOR 121 , COOR 121 , SCOR 121 , OCSR 121 , COSR 121 , CSOR 121 , hydroxyl, nitro, CN,
R121, R122 및 R123은, 각각 독립적으로 수소 원자, 탄소 원자 수 1~20의 알킬기, 탄소 원자 수 6~30의 아릴기, 탄소 원자 수 7~30의 아릴알킬기 또는 탄소 원자 수 2~20의 복소환함유기를 나타내며, R 121 , R 122 and R 123 each independently represents a hydrogen atom, an alkyl group having 1 to 20 carbon atoms, an aryl group having 6 to 30 carbon atoms, an arylalkyl group having 7 to 30 carbon atoms, A heterocyclic ring-containing group having 1 to 20 carbon atoms,
R121, R122 및 R123으로 나타내는 기의 수소 원자는 또한 수산기, 니트로기, CN, 할로겐 원자, 수산기 또는 카복실기로 치환되어 있는 경우도 있고, The hydrogen atom of the group represented by R 121 , R 122 and R 123 may also be substituted with a hydroxyl group, a nitro group, CN, a halogen atom, a hydroxyl group or a carboxyl group,
R111, R112, R113, R121, R122 및 R123으로 나타내는 기의 알킬렌 부분은, -O-, -S-, -COO-, -OCO-, -NR124-, -NR124COO-, -OCONR124-, -SCO-, -COS-, -OCS- 또는 -CSO-에 의해 산소 원자가 서로 이웃하지 않는 조건으로 1~5회 치환되어 있는 경우도 있으며, The alkylene moiety of the group represented by R 111 , R 112 , R 113 , R 121 , R 122 and R 123 is preferably -O-, -S-, -COO-, -OCO-, -NR 124 -, -NR 124 COO-, -OCONR 124 -, -SCO-, -COS-, -OCS-, or -CSO- case by which is substituted 1-5 times under the conditions that do not neighbor each other, an oxygen atom, and also,
R124는, 수소 원자, 탄소 원자 수 1~20의 알킬기, 탄소 원자 수 6~30의 아릴기, 탄소 원자 수 7~30의 아릴알킬기 또는 탄소 원자 수 2~20의 복소환함유기를 나타내고, R 124 represents a hydrogen atom, an alkyl group having 1 to 20 carbon atoms, an aryl group having 6 to 30 carbon atoms, an arylalkyl group having 7 to 30 carbon atoms, or a heterocyclic ring-containing group having 2 to 20 carbon atoms,
R111, R112, R113, R121, R122, R123 및 R124로 나타내는 기의 알킬 부분은 분기측쇄가 있는 경우도 있고, 환상(環狀) 알킬인 경우도 있으며, The alkyl moiety of the group represented by R 111 , R 112 , R 113 , R 121 , R 122 , R 123 and R 124 may have a branched side chain or may be a cyclic alkyl,
R103은, 수소 원자, 탄소 원자 수 1~20의 알킬기, 탄소 원자 수 6~30의 아릴기, 탄소 원자 수 7~30의 아릴알킬기 또는 탄소 원자 수 2~20의 복소환함유기를 나타내고, R103으로 나타내는 기의 알킬 부분은 분기측쇄가 있는 경우도 있고, 환상 알킬인 경우도 있으며, 또한, R103과 R107, R103과 R108, R104와 R105, R105와 R106 및 R106과 R107은 각각 하나가 되어 환을 형성하고 있는 경우도 있고, R 103 represents a hydrogen atom, an alkyl group having 1 to 20 carbon atoms, an aryl group having 6 to 30 carbon atoms, an arylalkyl group having 7 to 30 carbon atoms, or a heterocyclic ring-containing group having 2 to 20 carbon atoms, R the alkyl portion of the group represented by 103 is also the case of FIG., and cyclic alkyl If a branch chain, and, R 103 and R 107, R 103 and R 108, R 104 and R 105, R 105 and R 106, and R 106 and R 107 may be a single ring to form a ring,
R103으로 나타내는 기의 수소 원자는, 또한 R121, OR121, COR121, SR121, NR122R123, CONR122R123, -NR122-OR123, -NCOR122-OCOR123, NR122COR121, OCOR121, COOR121, SCOR121, OCSR121, COSR121, CSOR121, 수산기, 니트로기, CN, 할로겐 원자, 또는 COOR121로 치환되어 있는 경우도 있으며, The hydrogen atoms of the group represented by R 103, also R 121, OR 121, COR 121 , SR 121, NR 122 R 123, CONR 122 R 123, -NR 122 -OR 123, -NCOR 122 -OCOR 123, NR 122 COR COOR 121 , OCOR 121 , COOR 121 , SCOR 121 , OCSR 121 , COSR 121 , CSOR 121 , hydroxyl, nitro, CN, halogen atoms, or COOR 121 ,
R104, R105, R106 및 R107은, 각각 독립적으로 R111, OR111, SR111, COR114, CONR151R116, NR112COR111, OCOR111, COOR114, SCOR111, OCSR111, COSR114, CSOR111, 수산기, CN 또는 할로겐 원자를 나타내고, R104와 R105, R105와 R106 및 R106과 R107은 각각 하나가 되어 환을 형성하고 있는 경우도 있으며, R 104 , R 105 , R 106 and R 107 are each independently selected from the group consisting of R 111 , OR 111 , SR 111 , COR 114 , CONR 151 R 116 , NR 112 COR 111 , OCOR 111 , COOR 114 , SCOR 111 , OCSR 111 , COSR 114 , CSOR 111 , hydroxyl group, CN or a halogen atom; R 104 and R 105 , R 105 and R 106, and R 106 and R 107 are taken together to form a ring,
R114, R115 및 R116은 수소 원자 또는 탄소 원자 수 1~20의 알킬기를 나타내고, R 114 , R 115 and R 116 each represent a hydrogen atom or an alkyl group having 1 to 20 carbon atoms,
R108은, R111, OR111, SR111, COR111, CONR112R113, NR112COR111, OCOR111, COOR111, SCOR111, OCSR111, COSR111, CSOR111, 수산기, CN 또는 할로겐 원자를 나타내며, R 108 is selected from the group consisting of R 111 , OR 111 , SR 111 , COR 111 , CONR 112 R 113 , NR 112 COR 111 , OCOR 111 , COOR 111 , SCOR 111 , OCSR 111 , COSR 111 , CSOR 111 , Lt; / RTI >
w는 0 또는 1을 나타낸다.) w represents 0 or 1.)
그 밖의 광 라디칼 중합 개시제로는, 2,4,6-트리메틸벤조일디페닐포스핀옥사이드, 비스(시클로펜타디에닐)-비스[2,6-디플루오로-3-(필-1-일)]티타늄 등을 들 수 있다. Examples of other photo radical polymerization initiators include 2,4,6-trimethylbenzoyldiphenylphosphine oxide, bis (cyclopentadienyl) -bis [2,6-difluoro-3- (1- ] Titanium and the like.
이들 광 라디칼 중합 개시제는 1종 혹은 2종 이상의 것을 원하는 성능에 따라 배합하여 사용할 수 있다. These photoradical polymerization initiators may be used alone or in combination of two or more thereof according to the desired performance.
이상과 같은 광 라디칼 중합 개시제의 함유량은, 본 발명의 감광성 조성물의 고형분 중 0.1~30질량%, 특히 0.5~10질량%가 바람직하다. 상기 광 라디칼 중합 개시제의 함유량이 0.1질량%보다 작으면 노광에 의한 경화가 불충분해지는 경우가 있고, 30질량%보다 크면 감광성 조성물 중에 개시제가 석출되는 경우가 있다. The content of the photo radical polymerization initiator is preferably 0.1 to 30% by mass, more preferably 0.5 to 10% by mass, based on the solid content of the photosensitive composition of the present invention. If the content of the photo radical polymerization initiator is less than 0.1% by mass, the curing by exposure may become insufficient, and if it is more than 30% by mass, the initiator may precipitate in the photosensitive composition.
본 발명의 감광성 조성물은, 또한 착색제를 첨가하여 착색 감광성 조성물로 할 수도 있다. 상기 착색 감광성 조성물의 경화물은 컬러 필터로서 적합하게 사용된다. The photosensitive composition of the present invention may also be made into a colored photosensitive composition by adding a colorant. The cured product of the colored photosensitive composition is suitably used as a color filter.
본 발명의 착색 감광성 조성물에서, 착색제의 첨가량은, 본 발명의 착색 감광성 조성물의 고형분 중 0.01~50질량%가 바람직하고, 0.1~30질량%가 보다 바람직하다. 상기 착색제의 함유량이 0.01질량%보다 작으면 원하는 색도를 얻을 수 없는 경우가 있고, 50질량%보다 크면 착색 감광성 조성물 중에 착색제가 석출되는 경우가 있다. In the colored photosensitive composition of the present invention, the amount of the colorant to be added is preferably 0.01 to 50% by mass, more preferably 0.1 to 30% by mass in the solid content of the colored photosensitive composition of the present invention. If the content of the coloring agent is less than 0.01% by mass, a desired chromaticity may not be obtained. If the content is more than 50% by mass, the coloring agent may be precipitated in the colored photosensitive composition.
상기 착색제로는 염료 혹은 안료를 들 수 있다. Examples of the colorant include a dye and a pigment.
염료로는, 380~1200㎚로 흡수를 가지는 화합물이면 특별히 한정되지 않지만, 예를 들면, 아조 화합물, 안트라퀴논 화합물, 인디고이드 화합물, 트리아릴메탄 화합물, 크산텐 화합물, 알리자린 화합물, 아크리딘 화합물, 스틸벤 화합물, 티아졸 화합물, 나프톨 화합물, 퀴놀린 화합물, 니트로 화합물, 인다민 화합물, 옥사진 화합물, 프탈로시아닌 화합물, 시아닌 화합물, 디임모늄 화합물, 시아노에테닐 화합물, 디시아노스티렌 화합물, 로다민 화합물, 페릴렌 화합물, 폴리엔나프토락탐 화합물, 쿠마린 화합물, 스콰리륨 화합물, 크로코늄 화합물, 스피로피란 화합물, 스피로옥사진 화합물, 메로시아닌 화합물, 옥소놀 화합물, 스티릴 화합물, 피릴륨 화합물, 로다닌 화합물, 옥사졸론 화합물, 프탈이미드 화합물, 신놀린 화합물, 나프토퀴논 화합물, 아자안트라퀴논 화합물, 포르피린 화합물, 아자포르피린 화합물, 피로메텐 화합물, 퀴나크리돈 화합물, 디케토피롤로피롤 화합물, 인디고 화합물, 아크리딘 화합물, 아진 화합물, 아조메틴 화합물, 아닐린 화합물, 퀴나크리돈 화합물, 퀴노프탈론 화합물, 퀴논이민 화합물, 이리듐 착체 화합물, 유로퓸 착체 화합물 등의 염료 등을 들 수 있고, 이들은 복수 개를 혼합하여 사용하여도 된다. The dye is not particularly limited as long as it is a compound having absorption at 380 to 1200 nm, and examples thereof include azo compounds, anthraquinone compounds, indigoid compounds, triarylmethane compounds, xanthene compounds, alizarin compounds, , Stilbene compounds, thiazole compounds, naphthol compounds, quinoline compounds, nitro compounds, indanamine compounds, oxazine compounds, phthalocyanine compounds, cyanine compounds, diimmonium compounds, cyanoethenyl compounds, dicyanostyrene compounds, rhodamine compounds , A perylene compound, a polyene naphtholactam compound, a coumarin compound, a squarylium compound, a croconium compound, a spiropyran compound, a spirooxazine compound, a merocyanine compound, an oxolin compound, a styryl compound, A compound, an oxazolone compound, a phthalimide compound, a cinnoline compound, a naphthoquinone compound, A quinacridone compound, a quinacridone compound, a diketopyrrolopyrrole compound, an indigo compound, an acridine compound, an azine compound, an azomethine compound, an aniline compound, a quinacridone compound, a quinacridone compound, A dyes such as a thallone compound, a quinone imine compound, an iridium complex compound, and a europium complex compound, and these may be used in combination.
안료로는 무기안료 혹은 유기안료를 사용할 수 있고, 예를 들면, 니트로소 화합물, 니트로 화합물, 아조 화합물, 디아조 화합물, 크산텐 화합물, 퀴놀린 화합물, 안트라퀴논 화합물, 쿠마린 화합물, 프탈로시아닌 화합물, 이소인돌리논 화합물, 이소인돌린 화합물, 퀴나크리돈 화합물, 안탄트론 화합물, 페리논 화합물, 페릴렌 화합물, 디케토피롤로피롤 화합물, 티오인디고 화합물, 디옥사진 화합물, 트리페닐메탄 화합물, 퀴노프탈론 화합물, 나프탈렌테트라카복시산; 아조 염료, 시아닌 염료의 금속착체 화합물; 레이크 안료; 퍼니스법, 채널법, 더말(thermal)법에 의해 얻어지는 카본 블랙, 혹은 아세틸렌 블랙, 케천 블랙 또는 램프 블랙 등의 카본 블랙; 상기 카본 블랙을 에폭시 수지로 조정, 피복한 것, 상기 카본 블랙을 미리 용매 안에서 수지로 분산 처리하고, 20~200㎎/g의 수지를 흡착시킨 것, 상기 카본 블랙을 산성 또는 알카리성 표면 처리한 것, 평균 입경이 8㎚ 이상이고 DBP 흡유량이 90㎖/100g 이하인 것, 950℃에서의 휘발분 중의 CO, CO2로부터 산출한 전체 산소량이, 카본 블랙의 표면적 100㎡당 9㎎ 이상인 것; 흑연, 흑연화 카본 블랙, 활성탄, 탄소섬유, 카본 나노 튜브, 카본 마이크로 코일, 카본 나노혼, 카본 에어로겔, 풀러렌; 아닐린 블랙, 피그먼트 블랙7, 티탄 블랙; 소수성(疏水性) 수지, 산화크롬그린, 밀로리블루, 코발트그린, 코발트블루, 망간계, 페로시안화물, 인산염군청, 감청, 울트라마린, 세룰리안블루, 비리디언, 에메랄드그린, 황산납, 황색납, 아연황, 벵갈라(적색산화철(III)), 카드뮴레드, 합성철흑, 앰버(amber) 등의 무기안료 또는 유기안료를 사용할 수 있다. 이들 안료는 단독으로 혹은 복수 개를 혼합하여 사용할 수 있다. As the pigment, an inorganic pigment or an organic pigment can be used. Examples of the pigment include a nitroso compound, a nitro compound, an azo compound, a diazo compound, a xanthene compound, a quinoline compound, an anthraquinone compound, a coumarin compound, a phthalocyanine compound, A quinacridone compound, an anthanthrone compound, a perinone compound, a perylene compound, a diketopyrrolopyrrole compound, a thioindigo compound, a dioxazine compound, a triphenylmethane compound, a quinophthalone compound, Naphthalene tetracarboxylic acid; Azo dyes, metal complex compounds of cyanine dyes; Lake pigment; Carbon black obtained by a furnace method, a channel method, and a thermal method, or carbon black such as acetylene black, Kechen black or lamp black; The carbon black is adjusted and coated with an epoxy resin. The carbon black is dispersed in a solvent in advance in a solvent to adsorb a resin of 20 to 200 mg / g. The carbon black is subjected to an acidic or alkaline surface treatment , An average particle diameter of 8 nm or more and a DBP oil absorption of 90 ml / 100 g or less, a total oxygen amount calculated from CO and CO 2 in a volatile fraction at 950 ° C of 9 mg or more per 100 m 2 of the surface area of carbon black; Graphite, graphitized carbon black, activated carbon, carbon fiber, carbon nanotube, carbon microcoil, carbon nanohorn, carbon airgel, fullerene; Aniline black, pigment black 7, titanium black; Cobalt blue, manganese, ferrocyanide, phosphates, tungsten, ultramarine, cerulean blue, viridian, emerald green, lead sulfate, yellow Inorganic pigments or organic pigments such as lead, zinc sulfur, spinach (red iron oxide (III)), cadmium red, synthetic iron black and amber may be used. These pigments may be used singly or in combination.
상기 무기안료 또는 유기안료로는 시판의 안료를 사용할 수도 있고, 예를 들면, 피그먼트 레드 1, 2, 3, 9, 10, 14, 17, 22, 23, 31, 38, 41, 48, 49, 88, 90, 97, 112, 119, 122, 123, 144, 149, 166, 168, 169, 170, 171, 177, 179, 180, 184, 185, 192, 200, 202, 209, 215, 216, 217, 220, 223, 224, 226, 227, 228, 240, 254; 피그먼트 오렌지 13, 31, 34, 36, 38, 43, 46, 48, 49, 51, 52, 55, 59, 60, 61, 62, 64, 65, 71; 피그먼트 옐로우 1, 3, 12, 13, 14, 16, 17, 20, 24, 55, 60, 73, 81, 83, 86, 93, 95, 97, 98, 100, 109, 110, 113, 114, 117, 120, 125, 126, 127, 129, 137, 138, 139, 147, 148, 150, 151, 152, 153, 154, 166, 168, 175, 180, 185; 피그먼트 그린 7, 10, 36; 피그먼트 블루 15, 15:1, 15:2, 15:3, 15:4, 15:5, 15:6, 22, 24, 56, 60, 61, 62, 64; 피그먼트 바이올렛 1, 19, 23, 27, 29, 30, 32, 37, 40, 50 등을 들 수 있다. As the inorganic pigment or organic pigment, commercially available pigments may be used. For example, Pigment Red 1, 2, 3, 9, 10, 14, 17, 22, 23, 31, 38, 41, 48, 49 , 88, 90, 97, 112, 119, 122, 123, 144, 149, 166, 168, 169, 170, 171, 177, 179, 180, 184, 185, 192, 200, 202, 209, 215, 216 , 217, 220, 223, 224, 226, 227, 228, 240, 254; Pigment Orange 13, 31, 34, 36, 38, 43, 46, 48, 49, 51, 52, 55, 59, 60, 61, 62, 64, 65, 71; Pigment Yellow 1, 3, 12, 13, 14, 16, 17, 20, 24, 55, 60, 73, 81, 83, 86, 93, 95, 97, 98, 100, 109, , 117, 120, 125, 126, 127, 129, 137, 138, 139, 147, 148, 150, 151, 152, 153, 154, 166, 168, 175, 180, 185; Pigment Green 7, 10, 36; Pigment Blue 15, 15: 1, 15: 2, 15: 3, 15: 4, 15: 5, 15: 6, 22, 24, 56, 60, 61, 62, 64; Pigment Violet 1, 19, 23, 27, 29, 30, 32, 37, 40, 50 and the like.
본 발명의 감광성 조성물 및 착색 감광성 조성물에는, 또한 용매를 첨가할 수 있다. 상기 용매로는, 통상, 필요에 따라 상기의 각 성분을 용해 또는 분산할 수 있는 용매, 예를 들면, 메틸에틸케톤, 메틸아밀케톤, 디에틸케톤, 아세톤, 메틸이소프로필케톤, 메틸이소부틸케톤, 시클로헥사논, 2-헵타논 등의 케톤류; 에틸에테르, 디옥산, 테트라하이드로퓨란, 1,2-디메톡시에탄, 1,2-디에톡시에탄, 디프로필렌글리콜디메틸에테르 등의 에테르계 용매; 아세트산메틸, 아세트산에틸, 아세트산-n-프로필, 아세트산이소프로필, 아세트산n-부틸, 아세트산시클로헥실, 락트산에틸, 숙신산디메틸, 텍사놀 등의 에스테르계 용매; 에틸렌글리콜모노메틸에테르, 에틸렌글리콜모노에틸에테르 등의 셀로솔브계 용매; 메탄올, 에탄올, 이소- 또는 n-프로판올, 이소- 또는 n-부탄올, 아밀알코올, 디아세톤알코올 등의 알코올계 용매; 에틸렌글리콜모노메틸아세테이트, 에틸렌글리콜모노에틸아세테이트, 프로필렌글리콜-1-모노메틸에테르-2-아세테이트(PGMEA), 디프로필렌글리콜모노메틸에테르아세테이트, 3-메톡시부틸아세테이트, 에톡시에틸프로피오네이트, 1-t-부톡시-2-프로판올, 3-메톡시부틸아세테이트, 시클로헥사놀아세테이트 등의 에테르에스테르계 용매; 벤젠, 톨루엔, 크실렌 등의 BTX계 용매; 헥산, 헵탄, 옥탄, 시클로헥산 등의 지방족 탄화수소계 용매; 테레빈유, D-리모넨, 피넨 등의 테르펜계 탄화수소유; 미네랄 스피릿, 스와졸 #310(코스모 마쓰야마 세키유(주)), 솔벳소 #100(엑손 가가쿠(주)) 등의 파라핀계 용매; 사염화탄소, 클로로포름, 트리클로로에틸렌, 염화메틸렌, 1,2-디클로로에탄 등의 할로겐화 지방족 탄화수소계 용매; 클로로벤젠 등의 할로겐화 방향족 탄화수소계 용매; 카르비톨계 용매, 아닐린, 트리에틸아민, 피리딘, 아세트산, 아세토니트릴, 이류화탄소, N,N-디메틸포름아미드, N,N-디메틸아세트아미드, N-메틸피롤리돈, 디메틸술폭시드, 물 등을 들 수 있고, 이들 용매는 1종 또는 2종 이상의 혼합 용매로 사용할 수 있다. 이들 중에서도 케톤류, 에테르에스테르계 용매 등, 특히 프로필렌글리콜-1-모노메틸에테르-2-아세테이트, 시클로헥사논 등이, 감광성 조성물에서 레지스트와 광 라디칼 중합 개시제의 상용성(相溶性)이 좋으므로 바람직하다. 용매를 사용하는 경우, 본 발명의 감광성 조성물 또는 착색 감광성 조성물의 고형분이 25~35질량%가 되는 양으로 사용하는 것이 핸들링 등의 관점에서 바람직하다. A solvent may also be added to the photosensitive composition and the colored photosensitive composition of the present invention. The solvent is usually a solvent capable of dissolving or dispersing the above components such as methyl ethyl ketone, methyl amyl ketone, diethyl ketone, acetone, methyl isopropyl ketone, methyl isobutyl ketone , Cyclohexanone, and 2-heptanone; Ether solvents such as ethyl ether, dioxane, tetrahydrofuran, 1,2-dimethoxyethane, 1,2-diethoxyethane and dipropylene glycol dimethyl ether; Esters such as methyl acetate, ethyl acetate, n-propyl acetate, isopropyl acetate, n-butyl acetate, cyclohexyl acetate, ethyl lactate, dimethyl succinate, and texanol; Cellosolve solvents such as ethylene glycol monomethyl ether and ethylene glycol monoethyl ether; Alcohol-based solvents such as methanol, ethanol, iso-or n-propanol, iso- or n-butanol, amyl alcohol and diacetone alcohol; Ethylene glycol monomethyl ether acetate, ethylene glycol monomethyl acetate, ethylene glycol monoethyl acetate, propylene glycol-1-monomethyl ether-2-acetate (PGMEA), dipropylene glycol monomethyl ether acetate, 3-methoxybutyl acetate, ethoxyethyl propionate, Ether-based solvents such as 1-t-butoxy-2-propanol, 3-methoxybutyl acetate and cyclohexanol acetate; BTX type solvents such as benzene, toluene and xylene; Aliphatic hydrocarbon solvents such as hexane, heptane, octane and cyclohexane; Terpene type hydrocarbon oils such as turpentine oil, D-limonene, and pinene; Paraffin type solvents such as Mineral Spirit, Swazor # 310 (Kosomo Matsuyama Sekiyu Co., Ltd.) and Solvesso # 100 (Exxon Kagaku Co., Ltd.); Halogenated aliphatic hydrocarbon solvents such as carbon tetrachloride, chloroform, trichlorethylene, methylene chloride, and 1,2-dichloroethane; Halogenated aromatic hydrocarbon solvents such as chlorobenzene; A solvent such as acetone, acetonitrile, carbon dioxide, N, N-dimethylformamide, N, N-dimethylacetamide, N-methylpyrrolidone, dimethylsulfoxide, water These solvents can be used singly or as a mixed solvent of two or more kinds. Of these, ketones, ether ester solvents and the like, especially propylene glycol-1-monomethyl ether-2-acetate and cyclohexanone, are preferred because they have good compatibility between the resist and the photo-radical polymerization initiator in the photosensitive composition Do. When a solvent is used, it is preferable to use the solvent in an amount such that the solid content of the photosensitive composition or colored photosensitive composition of the present invention is 25 to 35% by mass from the viewpoint of handling and the like.
본 발명의 감광성 조성물 및 착색 감광성 조성물에는 또한 무기화합물을 함유시킬 수 있다. 상기 무기화합물로는, 예를 들면, 산화니켈, 산화철, 산화이리듐, 산화티탄, 산화아연, 산화마그네슘, 산화칼슘, 산화칼륨, 실리카, 알루미나 등의 금속산화물; 층상(層狀) 점토광물, 밀로리블루, 탄산칼슘, 탄산마그네슘, 코발트계, 망간계, 유리 분말, 마이카, 탤크, 카올린, 페로시안화물, 각종 금속 황산염, 황화물, 셀렌화물, 알루미늄실리케이트, 칼슘실리케이트, 수산화알루미늄, 백금, 금, 은, 구리 등을 들 수 있다. The photosensitive composition and the colored photosensitive composition of the present invention may further contain an inorganic compound. Examples of the inorganic compound include metal oxides such as nickel oxide, iron oxide, iridium oxide, titanium oxide, zinc oxide, magnesium oxide, calcium oxide, potassium oxide, silica and alumina; The present invention relates to a method for producing a cement admixture, which comprises the steps of mixing a cement admixture with a cement admixture to form a layered clay mineral, a milky blue, a calcium carbonate, a magnesium carbonate, a cobalt, Silicate, aluminum hydroxide, platinum, gold, silver, copper and the like.
본 발명의 감광성 조성물 및 착색 감광성 조성물에서, 안료 등의 착색제 및/또는 무기화합물을 사용하는 경우, 분산제를 첨가할 수 있다. 상기 분산제로는 착색제, 무기화합물을 분산, 안정화시킬 수 있는 것이라면 특별히 제한은 없고, 시판의 분산제, 예를 들면 빗쿠케미사 제품, BYK 시리즈 등을 사용할 수 있고, 염기성 관능기를 가지는 폴리에스테르, 폴리에테르, 폴리우레탄으로 이루어지는 고분자 분산제, 염기성 관능기로서 질소 원자를 가지고, 질소 원자를 가지는 관능기가 아민, 및/또는 그 4급염이며, 아민가가 1~100㎎KOH/g인 것이 적합하게 사용된다. When a colorant such as a pigment and / or an inorganic compound is used in the photosensitive composition and the colored photosensitive composition of the present invention, a dispersant may be added. The dispersion agent is not particularly limited as long as it can disperse and stabilize the colorant and the inorganic compound. Commercial dispersants such as BYK series and BYK series can be used. Polyesters having basic functional groups, polyether , A polymeric dispersant composed of polyurethane, a functional group having a nitrogen atom as a basic functional group, a functional group having a nitrogen atom, an amine and / or a quaternary salt thereof, and an amine value of 1 to 100 mgKOH / g are suitably used.
또한, 본 발명의 감광성 조성물 및 착색 감광성 조성물에는, 필요에 따라 p-아니솔, 하이드로퀴논, 피로카테콜, t-부틸카테콜, 페노티아진 등의 열중합 억제제; 가소제; 접착촉진제; 충전제; 소포제; 레벨링제; 표면조정제; 페놀계 산화방지제, 포스파이트계 산화방지제, 티오에테르계 산화방지제 등의 산화방지제; 자외선 흡수제; 분산조제; 응집 방지제; 촉매; 효과촉진제; 가교제; 증점제 등의 관용의 첨가물을 첨가할 수 있다. The photosensitive composition and the colored photosensitive composition of the present invention may further contain, if necessary, a thermal polymerization inhibitor such as p-anisole, hydroquinone, pyrocatechol, t-butylcatechol, phenothiazine and the like; Plasticizers; Adhesion promoters; Fillers; Defoamer; Leveling agents; Surface modifiers; Antioxidants such as phenol-based antioxidants, phosphite-based antioxidants, and thioether-based antioxidants; Ultraviolet absorber; Dispersing aids; An anti-aggregation agent; catalyst; Effect promoters; A crosslinking agent; A common additive such as a thickener may be added.
또한, 상기 산가를 가지는 에틸렌성 불포화 결합을 가지는 중합성 화합물과 함께, 다른 유기중합체를 사용함으로써, 본 발명의 감광성 조성물 및 착색 감광성 조성물의 경화물의 특성을 개선할 수도 있다. 상기 유기중합체로는, 예를 들면, 폴리스티렌, 폴리메틸메타크릴레이트, 메틸메타크릴레이트-에틸아크릴레이트 공중합체, 폴리(메타)아크릴산, 스티렌-(메타)아크릴산 공중합체, (메타)아크릴산-메틸메타크릴레이트 공중합체, 에틸렌-염화비닐 공중합체, 에틸렌-비닐 공중합체, 폴리염화비닐 수지, ABS 수지, 나일론6, 나일론66, 나일론12, 우레탄 수지, 폴리카보네이트폴리비닐부티랄, 셀룰로오스에스테르, 폴리아크릴아미드, 포화 폴리에스테르, 페놀 수지, 페녹시 수지, 폴리아미드이미드 수지, 폴리아믹산 수지, 에폭시 수지 등을 들 수 있고, 이들 중에서도 폴리스티렌, (메타)아크릴산-메틸메타크릴레이트 공중합체, 에폭시 수지가 바람직하다. The properties of the cured product of the photosensitive composition and the colored photosensitive composition of the present invention may be improved by using another organic polymer together with the polymerizable compound having an acid value and having an ethylenic unsaturated bond. Examples of the organic polymer include polystyrene, polymethyl methacrylate, methyl methacrylate-ethyl acrylate copolymer, poly (meth) acrylic acid, styrene- (meth) acrylic acid copolymer, Acrylonitrile, methacrylate copolymer, ethylene-vinyl chloride copolymer, ethylene-vinyl copolymer, polyvinyl chloride resin, ABS resin, nylon 6, nylon 66, nylon 12, urethane resin, polycarbonate polyvinyl butyral, Among them, polystyrene, (meth) acrylic acid-methyl methacrylate copolymer, and epoxy resin are preferable. Among them, polyvinyl chloride resin, polyvinyl acetate resin, polyvinylidene chloride resin, desirable.
본 발명의 감광성 조성물 및 착색 감광성 조성물에는 또한 연쇄이동제, 증감제, 계면활성제, 실란커플링제, 멜라민 화합물 등을 병용할 수 있다. A chain transfer agent, a sensitizer, a surfactant, a silane coupling agent, a melamine compound, and the like may be used in combination in the photosensitive composition and the colored photosensitive composition of the present invention.
상기 연쇄이동제, 증감제로는 일반적으로 유황 원자함유 화합물이 사용된다. 예를 들면 티오글리콜산, 티오말산, 티오살리실산, 2-메르캅토프로피온산, 3-메르캅토프로피온산, 3-메르캅토부티르산, N-(2-메르캅토프로피오닐)글리신, 2-메르캅토니코틴산, 3-[N-(2-메르캅토에틸)카바모일]프로피온산, 3-[N-(2-메르캅토에틸)아미노]프로피온산, N-(3-메르캅토프로피오닐)알라닌, 2-메르캅토에탄술폰산, 3-메르캅토프로판술폰산, 4-메르캅토부탄술폰산, 도데실(4-메틸티오)페닐에테르, 2-메르캅토에탄올, 3-메르캅토-1,2-프로판디올, 1-메르캅토-2-프로판올, 3-메르캅토-2-부탄올, 메르캅토페놀, 2-메르캅토에틸아민, 2-메르캅토이미다졸, 2-메르캅토벤조이미다졸, 2-메르캅토-3-피리디놀, 2-메르캅토벤조티아졸, 메르캅토아세트산, 트리메틸올프로판트리스(3-메르캅토프로피오네이트), 펜타에리트리톨테트라키스(3-메르캅토프로피오네이트) 등의 메르캅토 화합물, 상기 메르캅토 화합물을 산화하여 얻어지는 디술피드 화합물, 요오드아세트산, 요오드프로피온산, 2-요오드에탄올, 2-요오드에탄술폰산, 3-요오드프로판술폰산 등의 요오드화 알킬 화합물, 트리메틸올프로판트리스(3-메르캅토이소부티레이트), 부탄디올비스(3-메르캅토이소부티레이트), 헥산디티올, 데칸디티올, 1,4-디메틸메르캅토벤젠, 부탄디올비스티오프로피오네이트, 부탄디올비스티오글리콜레이트, 에틸렌글리콜비스티오글리콜레이트, 트리메틸올프로판트리스티오글리콜레이트, 부탄디올비스티오프로피오네이트, 트리메틸올프로판트리스티오프로피오네이트, 트리메틸올프로판트리스티오글리콜레이트, 펜타에리트리톨테트라키스티오프로피오네이트, 펜타에리트리톨테트라키스티오글리콜레이트, 트리스하이드록시에틸트리스티오프로피오네이트, 하기 화합물 No.C1, 트리메르캅토프로피온산트리스(2-하이드록시에틸)이소시아누레이트 등의 지방족 다관능 티올 화합물, 쇼와 덴코사 제품 카렌즈 MT BD1, PE1, NR1 등을 들 수 있다. As the chain transfer agent and sensitizer, a sulfur atom-containing compound is generally used. 3-mercaptopropionic acid, N- (2-mercaptopropionyl) glycine, 2-mercapto nicotinic acid, 3-mercaptopropionic acid, 3-mercaptopropionic acid and the like are exemplified by thioglycolic acid, thiomalic acid, thiosalicylic acid, 2- mercaptopropionic acid, - [N- (2-mercaptoethyl) amino] propionic acid, N- (3-mercaptopropionyl) alanine, 2-mercaptoethanesulfonic acid , 3-mercaptopropane sulfonic acid, 4-mercaptobutane sulfonic acid, dodecyl (4-methylthio) phenyl ether, 2-mercaptoethanol, 3-mercapto- 2-mercapto-2-butanol, mercaptophenol, 2-mercaptoethylamine, 2-mercaptoimidazole, 2-mercaptobenzoimidazole, 2-mercapto-3-pyridinol, 2 -Mercapto benzothiazole, mercaptoacetic acid, trimethylolpropane tris (3-mercaptopropionate), and pentaerythritol tetrakis (3-mercaptopropionate). Mercapto compounds, disulfide compounds obtained by oxidizing the mercapto compounds, alkyl iodides such as iodoacetic acid, iodopropionic acid, 2-iodoethanol, 2-iodoethanesulfonic acid and 3-iodopropanesulfonic acid, trimethylolpropane tris (3- Mercaptoisobutyrate), butanediol bis (3-mercaptoisobutyrate), hexanedithiol, decanedithiol, 1,4-dimethylmercaptobenzene, butanediol bisstiouropionate, butanediol bisthioglycolate, ethylene Trimethylolpropane trisphosphate, glycol bistioglycolate, trimethylolpropane tristhioglycolate, butanediol bisthiouropionate, trimethylolpropane tristhiopropionate, trimethylolpropane tristhioglycolate, pentaerythritol tetrakisthiopropionate, Ritol tetrakis thioglycolate, tris hydroxyethyl tris Aliphatic polyfunctional thiol compounds such as trimethylolpropane tri (meth) acrylate, trimethylolpropane tris (2-hydroxyethyl) isocyanurate and the like, car lenses MT BD1, PE1, NR1 and the like manufactured by Showa Denko Co., .
상기 계면활성제로는, 퍼플루오로알킬인산에스테르, 퍼플루오로알킬카복실산염 등의 불소계면활성제, 고급 지방산 알칼리염, 알킬술폰산염, 알킬황산염 등의 음이온계 계면활성제, 고급 아민 할로겐산염, 제4급 암모늄염 등의 양이온계 계면활성제, 폴리에틸렌글리콜알킬에테르, 폴리에틸렌글리콜 지방산 에스테르, 소르비탄 지방산 에스테르, 지방산 모노글리세라이드 등의 비이온 계면활성제, 양성(兩性) 계면활성제, 실리콘계 계면활성제 등의 계면활성제를 사용할 수 있고, 이들은 조합하여 사용하여도 된다. Examples of the surfactant include fluorine surfactants such as perfluoroalkylphosphoric acid esters and perfluoroalkylcarboxylic acid salts, anionic surfactants such as higher fatty acid alkali salts, alkylsulfonates and alkylsulfates, higher amine halides, A surfactant such as a nonionic surfactant such as a polyethylene glycol alkyl ether, a polyethylene glycol fatty acid ester, a sorbitan fatty acid ester, a fatty acid monoglyceride, an amphoteric surfactant, or a silicone surfactant may be used as a cationic surfactant, And they may be used in combination.
상기 실란 커플링제로는, 예를 들면 신에쓰 가가꾸사 제품 실란 커플링제를 사용할 수 있고, 그 중에서도 KBE-9007, KBM-502, KBE-403 등, 이소시아네이트기, 메타크릴로일기, 에폭시기를 가지는 실란 커플링제가 적합하게 사용된다. Examples of the silane coupling agent include silane coupling agents such as KBE-9007, KBM-502 and KBE-403, which are available from Shin-Etsu Chemical Co., Ltd. Among these, silane coupling agents having an isocyanate group, a methacryloyl group, Silane coupling agents are suitably used.
상기 멜라민 화합물로는, (폴리)메틸올멜라민, (폴리)메틸올글리콜우릴, (폴리)메틸올벤조구아나민, (폴리)메틸올우레아 등의 질소 화합물 중의 활성 메틸올기(CH2OH기)의 전부 또는 일부(적어도 2개)가 알킬에테르화된 화합물을 들 수 있다. 여기서, 알킬에테르를 구성하는 알킬기로는 메틸기, 에틸기 또는 부틸기를 들 수 있고, 서로 동일한 경우도 있고 다른 경우도 있다. 또한, 알킬에테르화되어 있지 않은 메틸올기는, 1분자 내에서 자기축합되어 있는 경우도 있고, 2분자 사이에서 축합되어, 그 결과 올리고머 성분이 형성되어 있는 경우도 있다. 구체적으로는 헥사메톡시메틸멜라민, 헥사부톡시메틸멜라민, 테트라메톡시메틸글리콜우릴, 테트라부톡시메틸글리콜우릴 등을 사용할 수 있다. 이들 중에서도 헥사메톡시메틸멜라민, 헥사부톡시메틸멜라민 등의 알킬에테르화된 멜라민이 바람직하다. With the melamine compound, the (poly) methylol melamine, (poly) methylol glycoluril, (poly) methylol benzo guar active methylol group of the nitrogen compounds, such as namin, (poly) methylol urea (CH 2 OH groups) (At least two) of all or some of them are alkyl-etherified. Here, examples of the alkyl group constituting the alkyl ether include a methyl group, an ethyl group and a butyl group, and they may be the same or different. In addition, the methylol group which is not alkyl-etherified may be self-condensed in one molecule, and may be condensed between two molecules, resulting in formation of an oligomer component. Specifically, hexamethoxymethylmelamine, hexabutoxymethylmelamine, tetramethoxymethylglycoluril, tetrabutoxymethylglycoluril and the like can be used. Of these, alkyl etherified melamines such as hexamethoxymethyl melamine and hexabutoxymethyl melamine are preferred.
본 발명의 감광성 조성물 및 착색 감광성 조성물은, 스핀 코터, 롤 코터, 바 코터, 다이 코터, 커튼 코터, 각종 인쇄, 침지 등의 공지의 수단으로 소다 유리, 석영 유리, 반도체기판, 금속, 종이, 플라스틱 등의 지지체 상에 적용할 수 있다. 또한, 일단 필름 등의 지지체 상에 입힌 후, 다른 지지체 상으로 전사(轉寫)할 수도 있고, 그 적용 방법에 제한은 없다. The photosensitive composition and the colored photosensitive composition of the present invention can be suitably used in various applications such as a soda glass, a quartz glass, a semiconductor substrate, a metal, a paper, a plastic And the like. Alternatively, the film may be once transferred onto a support such as a film, and then transferred onto another support. There is no limitation on the application method.
또한, 본 발명의 감광성 조성물 및 착색 감광성 조성물을 경화시킬 때에 사용되는 활성 광의 광원으로는 파장 300~450㎚의 광을 발광하는 것을 사용할 수 있고, 예를 들면, 초고압 수은, 수은증기 아크, 카본 아크, 제논 아크 등을 사용할 수 있다. As the light source of active light used for curing the photosensitive composition and the colored photosensitive composition of the present invention, those emitting light having a wavelength of 300 to 450 nm can be used. For example, ultra violet mercury vapor, mercury vapor arc, carbon arc , Xenon arc, etc. can be used.
또한, 노광 광원에 레이저광을 사용함으로써, 마스크를 사용하지 않고, 컴퓨터 등의 디지털 정보로부터 직접 화상을 형성하는 레이저 직접 묘화법이, 생산성뿐만 아니라 해상성이나 위치 정밀도 등의 향상도 도모할 수 있기 때문에 유용하고, 그 레이저광으로는 340~430㎚의 파장의 광이 적합하게 사용되는데, 아르곤 이온 레이저, 헬륨 네온 레이저, YAG 레이저, 및 반도체 레이저 등의 가시(可視)에서 적외 영역의 광을 발하는 것도 사용된다. 이들 레이저를 사용하는 경우에는 가시에서 적외의 상기 영역을 흡수하는 증감색소가 첨가된다. Further, by using the laser light for the exposure light source, the laser direct drawing method for forming an image directly from digital information such as a computer without using a mask can improve not only productivity but also resolution and positional accuracy Light having a wavelength of 340 to 430 nm is suitably used as the laser beam, and a laser beam having a wavelength of 340 to 430 nm is suitably used. The laser beam is emitted in a visible to infrared region such as an argon ion laser, a helium neon laser, a YAG laser, Is also used. In the case of using these lasers, a sensitizing dye which absorbs the above-mentioned infrared region in visible is added.
본 발명의 감광성 조성물 및 착색 감광성 조성물은, 2개의 감광성 조성물 또는 착색 감광성 조성물을 사용하여 2회에 나누어 패터닝을 실시하는 더블 패터닝 프로세스를 거쳐 패터닝을 실시할 수도 있다. The photosensitive composition and the colored photosensitive composition of the present invention may be subjected to patterning through a double patterning process in which two photosensitive compositions or colored photosensitive compositions are used to perform patterning in two portions.
본 발명의 감광성 조성물 또는 착색 감광성 조성물을 경화시키는 방법은, 상기 스핀 코터, 롤 코터, 바 코터, 다이 코터, 커튼 코터, 각종 인쇄, 침지 등의 공지의 수단으로 소다 유리, 석영 유리, 반도체기판, 금속, 종이, 플라스틱 등의 지지체 상에 도포하여 도막을 형성하는 공정, 및 상기 도막에 상기 활성 광을 노광하여 경화시키는 공정을 포함한다. The method of curing the photosensitive composition or the colored photosensitive composition of the present invention can be carried out by a known means such as spin coater, roll coater, bar coater, die coater, curtain coater, various printing, On a support such as metal, paper or plastic to form a coating film, and a step of exposing the coating film to the active light to cure the coating film.
본 발명의 감광성 조성물 및 착색 감광성 조성물(또는 그 경화물)은, 광 경화성 도료 또는 바니시, 광 경화성 접착제 등의 접착제, 프린트 기판, 혹은 컬러 TV, PC 모니터, 휴대정보단말, 디지털 카메라 등의 컬러 표시의 액정표시패널에서의 컬러 필터, CCD 이미지 센서의 컬러 필터, 포토 스페이서, 블랙 컬럼 스페이서, 플라스마 표시 패널용 전극재료, 터치 패널, 터치 센서, 분말 코팅, 인쇄 잉크, 인쇄판, 치과용 조성물, 광 조형용 수지, 겔 코트, 전자공학용 포토레지스트, 전기도금 레지스트, 에칭 레지스트, 액상 및 건조막 쌍방, 땜납 레지스트, 다양한 표시 용도용의 컬러 필터를 제조하기 위한 혹은 플라스마 표시 패널, 전기발광 표시장치, 및 LCD의 제조 공정에서 구조를 형성하기 위한 레지스트, 전기 및 전자부품을 봉입하기 위한 조성물, 솔더 레지스트, 자기(磁氣) 기록 재료, 미소(微小)기계부품, 도파로, 광 스위치, 도금용 마스크, 에칭 마스크, 컬러 시험계, 유리섬유 케이블 코팅, 스크린 인쇄용 스텐실, 스테레오리토그래피에 의해 삼차원 물체를 제조하기 위한 재료, 홀로그래피 기록용 재료, 화상기록 재료, 미세전자회로, 탈색 재료, 화상기록 재료를 위한 탈색 재료, 마이크로캡슐을 사용하는 화상기록 재료용의 탈색 재료, 인쇄 배선판용 포토레지스트 재료, UV 및 가시 레이저 직접 화상계용의 포토레지스트 재료, 프린트 회로 기판의 축차 적층에서의 유전체층 형성에 사용하는 포토레지스트 재료, 3D 실장용 포토레지스트 재료 혹은 보호막 등의 각종 용도로 사용할 수 있고, 그 용도에 특별히 제한은 없다. The photosensitive composition and the colored photosensitive composition (or a cured product thereof) of the present invention can be used as a light-curable coating material or an adhesive such as a varnish or a photocurable adhesive, a printed substrate, or a color display such as a color TV, a PC monitor, a portable information terminal, A color filter in a liquid crystal display panel of a CCD image sensor, a color filter of a CCD image sensor, a photo spacer, a black column spacer, an electrode material for a plasma display panel, a touch panel, a touch sensor, a powder coating, a printing ink, a printing plate, The present invention relates to a method of manufacturing a color filter for a resin, a gel coat, a photoresist for electronic engineering, an electroplating resist, an etching resist, a liquid and a dried film, a solder resist and various display applications, or a plasma display panel, A resist for forming a structure in a manufacturing process, a composition for enclosing electric and electronic parts, , A magnetic recording medium, a microscopic mechanical part, a waveguide, an optical switch, a plating mask, an etching mask, a color test system, a glass fiber cable coating, a stencil for screen printing, a stereolithography Decolorizing materials for image recording materials, decolorizing materials for image recording materials using microcapsules, photoresist materials for printed wiring boards, UV and visible light materials, materials for holographic recording, image recording materials, A photoresist material for forming a dielectric layer in a laminated layer of a printed circuit board, a photoresist material for a 3D mounting, a protective film, and the like, and the use thereof is not particularly limited none.
본 발명의 감광성 조성물은, 경화시킴으로써 투명 구조체로 사용할 수 있다. 투명 구조체로는, 예를 들면, 포토 스페이서(PS), 컬럼 스페이서(CS)라고 불리는 주형물(柱形物); (나노) 임프린트의 미세 패턴; 대형광고간판 등의 제조나 액정 디스플레이용 컬러 필터나 배향막의 인쇄 등 전자 디바이스 제조에 이용하는 잉크젯 수용층 등을 들 수 있다. 본 발명의 투명 구조체는 표시 디바이스에 적합하게 사용된다. The photosensitive composition of the present invention can be used as a transparent structure by curing. As the transparent structure, for example, a photo-spacer (PS), a mold (columnar body) called a column spacer (CS); (Nano) fine pattern of imprint; A large advertising signboard and the like, and an ink-jet receiving layer used for manufacturing electronic devices such as color filters for liquid crystal displays and printing of alignment films. The transparent structure of the present invention is suitably used for a display device.
본 발명의 감광성 조성물은 투명 도전막, 반사막, 편광판, 보호막 등에 사용할 수 있고, 투명기판에 원하는 각 층을 순차 도포하고, 소정 패턴 형상을 가지는 마스크를 개재하여 활성 광을 조사하며, 노광 후의 피막을 현상액으로 현상하고, 현상 후의 피막을 가열함으로써 적층한 투명 적층체로 사용할 수 있다. 투명 적층체로는, 예를 들면, 투명 기재에, 산화인듐과 산화세륨의 복합 산화물로 이루어지는 투명 박막층과 금속 박막층이 교대로 되어 있는 것 등을 들 수 있다. 전술한 각 층 각각에 일반식(I)로 나타내는 치환기를 가지는 화합물을 잠재성 첨가제로서 함유하는 본 발명의 감광성 조성물을 사용하여도 되고, 어느 한 층에 상기 감광성 조성물을 사용하여도 된다. 또한, 상기 투명 적층체는 표시장치에 적합하게 사용된다. The photosensitive composition of the present invention can be used for a transparent conductive film, a reflective film, a polarizing plate, a protective film and the like, and it is preferable that each desired layer is sequentially coated on a transparent substrate, active light is irradiated through a mask having a predetermined pattern shape, Developing with a developing solution, and heating the film after development to form a laminated transparent laminate. As the transparent laminate, for example, a transparent thin film layer composed of a composite oxide of indium oxide and cerium oxide and a metal thin film layer alternating with each other can be cited. The photosensitive composition of the present invention containing as a latent additive a compound having a substituent represented by the general formula (I) in each of the above-mentioned respective layers may be used, or the photosensitive composition may be used in any one layer. Further, the transparent laminate is suitably used for a display device.
본 발명의 착색 감광성 조성물은 컬러 필터의 화소를 형성하는 목적으로 사용되고, 특히 액정표시패널 등의 화상표시장치용의 표시 디바이스용 컬러 필터를 형성하기 위한 감광성 조성물로서 유용하다. The colored photosensitive composition of the present invention is used for forming a pixel of a color filter, and is particularly useful as a photosensitive composition for forming a color filter for a display device for an image display device such as a liquid crystal display panel.
상기 표시 디바이스용 컬러 필터는, (1) 본 발명의 착색 감광성 조성물의 도막을 기판 위에 형성하는 공정, (2) 상기 도막에 소정 패턴 형상을 가지는 마스크를 개재하여 활성 광을 조사하는 공정, (3) 노광 후의 피막을 현상액으로 현상하는 공정, (4) 현상 후의 상기 피막을 가열하는 공정에 의해 바람직하게 형성된다. 또한, 본 발명의 착색 감광성 조성물은 현상 공정이 없는 잉크젯 방식의 착색 감광성 조성물로서도 유용하다. (1) a step of forming a coating film of the colored photosensitive composition of the present invention on a substrate, (2) a step of irradiating the coating film with active light via a mask having a predetermined pattern shape, (3) ) A step of developing the film after exposure with a developer, and (4) a step of heating the film after development. Further, the colored photosensitive composition of the present invention is also useful as an inkjet type colored photosensitive composition free from a development process.
상기 마스크로는, 하프톤 마스크 또는 그레이 스케일 마스크 등의 다계조(多階調) 마스크를 사용할 수도 있다. As the mask, a multi-gradation mask such as a halftone mask or a gray-scale mask may be used.
다음으로, 본 발명의 신규 화합물에 대해 설명한다. 본 발명의 신규 화합물은 하기 구조 중 어느 하나로 나타난다. Next, the novel compounds of the present invention will be described. The novel compounds of the present invention are represented by any one of the following structures.
본 발명의 신규 화합물의 제조 방법은 특별히 한정되지 않지만, 예를 들면, 일본 공개특허 소57-111375호, 일본 공개특허 평3-173843호, 일본 공개특허 평6-128195호, 일본 공개특허 평7-206771호, 일본 공개특허 평7-252191호, 일본 공표특허 2004-501128호의 각 공보에 기재된 방법에 의해 제조된 페놀계 화합물과, 할로겐화 알릴 화합물 등을 반응시켜 얻을 수 있다. The method for producing the novel compound of the present invention is not particularly limited, and examples thereof include compounds described in JP-A-57-111375, JP-A-3-173843, JP-A-6-128195, -206771, JP-A-7-252191, and JP-A-2004-501128, with a halogenated allyl compound or the like.
본 발명의 신규 화합물은 잠재성 산화방지제, 잠재성 자외선 흡수제, 용해 조정제 등에 사용할 수 있다. The novel compounds of the present invention can be used as latent antioxidants, latent ultraviolet absorbers, dissolution regulators, and the like.
실시예Example
이하, 실시예 등을 들어 본 발명을 더 상세하게 설명하겠지만, 본 발명은 이들 실시예 등에 한정되는 것이 아니다. Hereinafter, the present invention will be described in more detail by way of Examples and the like, but the present invention is not limited to these Examples and the like.
[실시예 1-1] 화합물 No.1의 합성 [Example 1-1] Synthesis of Compound No. 1
하기 화합물 No.1'의 페놀 화합물 1당량의 디메틸아세트아미드 용액(이론 수량(收量)의 3배량)에 탄산칼륨(하나의 페놀기에 대하여 2당량)을 첨가하고, 실온에서 30분 교반하였다. 알릴브로마이드(하나의 페놀기에 대하여 1.5당량)를 첨가하고, 60℃에서 5시간 교반하였다. 아세트산에틸을 첨가하여 1% 염산용액으로 세정한 후 유수 분리를 실시하고, 유기층을 무수황산나트륨으로 건조 후, 용매를 증류제거하고, 정석(晶析)을 실시하였다. 얻어진 고체를 60℃에서 3시간 감압 건조시켜 목적물을 얻었다. 얻어진 고체가 목적물인 것은 1H-NMR, IR로 확인하였다. 결과를 [표 1]~[표 2]에 나타낸다. Potassium carbonate (2 equivalents based on one phenol group) was added to a 1-equivalent dimethylacetamide solution (three times the theoretical yield) of the phenol compound of the following compound No. 1 ', and the mixture was stirred at room temperature for 30 minutes. Allyl bromide (1.5 equivalents based on one phenol group) was added, and the mixture was stirred at 60 占 폚 for 5 hours. Ethyl acetate was added thereto, followed by washing with a 1% hydrochloric acid solution, followed by water separation. The organic layer was dried over anhydrous sodium sulfate, the solvent was distilled off, and crystallization was carried out. The obtained solid was dried under reduced pressure at 60 DEG C for 3 hours to obtain a target product. It was confirmed by 1 H-NMR and IR that the obtained solid was the target. The results are shown in [Table 1] to [Table 2].
[실시예 1-2~1-6] 화합물 No.2~6의 합성 [Examples 1-2 to 1-6] Synthesis of Compound No. 2 to 6
실시예 1-1에서, 하기 화합물 No.1'의 페놀 화합물을 대신하여 하기 화합물 No.2'~6'의 페놀 화합물을 사용한 것 이외에는 실시예 1-1과 동일하게 하여 목적물인 화합물 No.2~6을 합성하였다. 얻어진 고체가 목적물인 것은 1H-NMR, IR로 확인하였다. 결과를 [표 1]~[표 2]에 나타낸다. The procedure of Example 1-1 was repeated except that the phenol compound of the following compound Nos. 2 'to 6' was used instead of the phenol compound of the following compound No. 1 ' ~ 6 were synthesized. It was confirmed by 1 H-NMR and IR that the obtained solid was the target. The results are shown in [Table 1] to [Table 2].
[실시예 2-1~2-2 및 비교예 2-1~2-3] 감광성 조성물 No.1~No.2 및 비교 감광성 조성물 No.1~No.3의 조제 [Examples 2-1 to 2-2 and Comparative Examples 2-1 to 2-3] Preparation of Photosensitive Composition Nos. 1 to 2 and Comparative Photosensitive Compositions No. 1 to 3
SPC-1000(쇼와 덴코사 제품, 고형분 29%의 PGMEA 용액) 50.0g, 아로닉스 M-450(도아고세이사 제품) 11.6g, NCI-930(ADEKA사 제품) 0.3g, PGMEA 34.7g, FZ2122(도레 다우코닝사 제품, 고형분 1%의 PGMEA 용액) 2.9g 및 [표 3]에 기재된 화합물 0.81g을 혼합하고, 불용물이 없어질 때까지 교반하여 감광성 조성물 No.1~No.2 및 비교 감광성 조성물 No.1~No.3을 얻었다. 50.0 g of SPC-1000 (a PGMEA solution having a solid content of 29%, manufactured by Showa Denko K.K.), 11.6 g of Aronix M-450 (manufactured by Doagosei Co., Ltd.), 0.3 g of NCI-930 (manufactured by ADEKA), 34.7 g of PGMEA, (PGMEA solution, solid content 1%) and 0.81 g of the compound described in [Table 3] were mixed and stirred until the insolubles disappeared. Thus, Photosensitive Composition No. 1 to No. 2 and Comparative Photosensitive Composition Nos. 1 to 3 were obtained.
[평가예 1-1 및 비교 평가예 1-1] 아웃 가스 평가 [Evaluation Example 1-1 and Comparative Evaluation Example 1-1] Outgassing evaluation
화합물 No.1, 화합물 No.2 및 비교 화합물 No.2를 각각 5㎎ 칭량하여 넣고, 열질량 측정장치로 실온에서 230℃까지 승온(20℃/min.)시킨 후, 230℃에서 30분간 유지한 시점에서의 중량 감소율을 측정하여, 감광성 조성물 No.1~No.2 및 비교 감광성 조성물 No.2의 아웃 가스 평가로 하였다. 중량 감소가 작을수록 아웃 가스가 적은 것을 나타낸다. 결과를 [표 4]에 나타낸다. 5 mg of each of Compound No. 1, Compound No. 2 and Comparative Compound No. 2 was weighed, and the mixture was heated to room temperature (230 ° C) (20 ° C / min.) With a thermogravimeter and maintained at 230 ° C for 30 minutes The weight loss rate at one point in time was measured to give an outgass evaluation of Photosensitive Composition Nos. 1 to 2 and Comparative Photosensitive Composition No. 2. The smaller the weight loss is, the less the outgass is. The results are shown in Table 4.
상기 결과로부터 본 발명에 따른 화합물은 아웃 가스가 적고, 본 발명에 따른 화합물을 함유하는 본 발명의 감광성 조성물은 아웃 가스가 적어지는 것이 분명하다. From the above results, it is apparent that the compound according to the present invention has little outgas, and the photosensitive composition of the present invention containing the compound according to the present invention has a small outgass.
[평가예 2-1 및 비교 평가예 2-1~2-2] 내용제성 평가 [Evaluation Example 2-1 and Comparative Evaluation Examples 2-1 to 2-2] Evaluation of solvent resistance
상기 실시예 2-1에서 얻어진 감광성 조성물 No.1 및 비교예 2-1 및 2-3에서 얻어진 비교 감광성 조성물 No.1 및 No.3을 각각 유리 기판에 410rpm×7초의 조건으로 코팅하고, 핫플레이트에서 건조(90℃×90초)시켰다. 얻어진 도막에 초고압 수은 램프로 노광(40mJ/㎠)시켰다. 노광 후의 도막을 230℃×30분의 조건으로 소성하였다. 얻어진 도막의 막 두께를 측정한 후, 실온에서 30분간, PGMEA, 시클로헥사논, N-메틸피롤리돈, N-에틸피롤리돈에 침지시키고, 침지 후의 막 두께를 측정하였다. 침지 전후에서의 막 두께 비(침지 후의 막 두께×100/침지 전의 막 두께)가 100%에 가까울수록 내용제성은 높다고 평가하였다. The photosensitive composition No. 1 obtained in Example 2-1 and the comparative photosensitive compositions No. 1 and No. 3 obtained in Comparative Examples 2-1 and 2-3 were coated on a glass substrate under the conditions of 410 rpm x 7 seconds, The plate was dried (90 DEG C x 90 seconds). The obtained coating film was exposed (40 mJ / cm 2) with an ultra-high pressure mercury lamp. The coated film after the exposure was fired at 230 캜 for 30 minutes. The film thickness of the obtained coating film was measured and then immersed in PGMEA, cyclohexanone, N-methylpyrrolidone and N-ethylpyrrolidone at room temperature for 30 minutes, and the film thickness after immersion was measured. The solvent resistance was evaluated to be higher as the film thickness ratio before and after immersion (film thickness after immersion × 100 / film thickness before immersion) was closer to 100%.
[표 5]로부터, 산화방지제를 함유하지 않은 비교 감광성 조성물 No.3의 경화물과 비교하여, 종래의 페놀계 산화방지제를 함유하는 비교 감광성 조성물 No.1의 경화물은 내용제성이 저하되지만, 본원에 따른 화합물을 잠재성 첨가제로 사용한 감광성 조성물 No.1은 산화방지제를 함유하지 않은 경우와 동일한 내용제성을 유지하고 있는 것이 분명하다. [Table 5] shows that the cured product of the comparative photosensitive composition No. 1 containing the conventional phenolic antioxidant has a lower solvent resistance than the cured product of the comparative photosensitive composition No. 3 containing no antioxidant, It is clear that the photosensitive composition No. 1 using the compound according to the present invention as a latent additive maintains the same solvent resistance as that in the case of not containing the antioxidant.
이상의 결과로부터, 본 발명의 화합물을 잠재성 첨가제로 사용한 감광성 조성물은 아웃 가스가 적고, 그 경화물이 내용제성이 뛰어난 것은 명백하다. From the above results, it is apparent that the photosensitive composition using the compound of the present invention as a latent additive has little outgas, and the cured product has excellent solvent resistance.
본 발명에 의하면, 상온에서는 불활성이고 소정 온도로 가열함으로써 활성화되어 산화방지제나 자외선 흡수제로서의 기능을 발현하는 화합물을 사용한, 아웃 가스가 적고 경화물의 내용제성이 높은 감광성 조성물을 제공할 수 있다. According to the present invention, it is possible to provide a photosensitive composition which is inert at room temperature and which is activated by heating at a predetermined temperature to produce a compound that exhibits a function as an antioxidant or an ultraviolet absorber and has low outgassing and high solvent resistance of the cured product.
Claims (9)
(식 중, R1 및 R2는, 각각 독립적으로 수소 원자, 할로겐 원자, 시아노기, 수산기, 니트로기, 카복실기, 치환기를 가지고 있는 경우도 있는 탄소 원자 수 1~40의 알킬기, 치환기를 가지고 있는 경우도 있는 탄소 원자 수 6~20의 아릴기, 치환기를 가지고 있는 경우도 있는 탄소 원자 수 7~20의 아릴알킬기, 치환기를 가지고 있는 경우도 있는 탄소 원자 수 2~20의 복소환함유기 또는 트리알킬실릴기를 나타내고,
R1 및 R2로 나타내는 알킬기 또는 아릴알킬기 중의 메틸렌기는, -O-, -S-, -CO-, -O-CO-, -CO-O-, -O-CO-O-, -S-CO-, -CO-S-, -S-CO-O-, -O-CO-S-, -CO-NH-, -NH-CO-, -NH-CO-O-, -NR'-, -S-S- 또는 -SO2-에서 선택된 기를 산소 원자가 서로 이웃하지 않는 조건으로 조합한 기로 치환되어 있는 경우도 있고, R'는 수소 원자 또는 탄소 원자 수 1~8의 알킬기를 나타내며,
j는 1~3의 수를 나타내고,
*는 * 부분에서 인접하는 기와 결합하는 것을 의미한다.)A photosensitive composition comprising a compound having a substituent represented by the following general formula (I).
(Wherein R 1 and R 2 each independently represent a hydrogen atom, a halogen atom, a cyano group, a hydroxyl group, a nitro group, a carboxyl group, an alkyl group having 1 to 40 carbon atoms which may have a substituent, An aryl group having 6 to 20 carbon atoms, an arylalkyl group having 7 to 20 carbon atoms, which may have a substituent, a heterocyclic ring-containing group having 2 to 20 carbon atoms, which may have a substituent, or A trialkylsilyl group,
The methylene group in the alkyl group or arylalkyl group represented by R 1 and R 2 is preferably -O-, -S-, -CO-, -O-CO-, -CO-O-, -O- -CO-O-, -O-CO-S-, -CO-NH-, -NH-CO-, -NH-CO-O-, -NR'-, -SS- or -SO 2 - may be substituted with a group in which oxygen atoms are not adjacent to each other, and R 'represents a hydrogen atom or an alkyl group having 1 to 8 carbon atoms,
j represents a number of 1 to 3,
* Means combining with adjacent groups in the * part.)
상기 일반식(I)로 나타내는 치환기를 가지는 화합물이 하기 일반식(I-A)로 나타내는 화합물인 감광성 조성물.
(식 중, n은 1~10의 정수를 나타내고,
X1은 n가의 결합기를 나타내며,
R1, R2 및 j는 상기 일반식(I)과 동일하다.) The method according to claim 1,
Wherein the compound having a substituent represented by the general formula (I) is a compound represented by the following general formula (IA).
(Wherein n represents an integer of 1 to 10,
X 1 represents an n-valent coupler,
R 1 , R 2 and j are the same as in the general formula (I).)
A novel compound represented by any one of the following structures (A) to (O).
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