KR20170027362A - Transparent organic emitting display device - Google Patents

Abstract

The present invention discloses a transparent display device. The transparent display device of the present invention includes: a transparent display panel including a transparent region and an opaque region; and a driver for driving the transparent display panel. The transparent display panel includes a first sub-pixel disposed in the transparent region and a second sub-pixel disposed in the opaque region in a different column from the transparent region. The first sub-pixel emits light to both the front and rear surfaces of the transparent display panel, and the second sub-pixel emits light to the front surface of the transparent display panel, so a part of a transmissive area can be used as both a transmissive area and an emissive area. Thus, the transmittance of the transparent display panel can be improved and an aperture ratio of a light emitting area can be enlarged.

Description

TRANSPARENT ORGANIC EMITTING DISPLAY DEVICE

The present invention relates to a transparent display device.

BACKGROUND ART Demands for a display device for displaying an image have been increasing in various forms as an information society has developed. Recently, a liquid crystal display device, a plasma display device, an organic light emitting display device Organic Light Emitting Display Device) are being utilized.

There is also a demand for a transparent display device using a transparent element and a transparent display panel therefor.

However, if the panel design is changed in order to increase the transparency of the transparent display panel, the light emitting area is narrowed and the luminous efficiency is lowered. If the luminous efficiency is increased by increasing the light emitting area, transparency is reduced, The problem is that it can not be done.

An object of the present invention is to provide a transparent display device in which the transmissivity of a transparent display panel is increased and the aperture ratio of the light emitting region is increased by allowing a part of the transmissive region to be used as a transmissive region and a light emitting region.

It is another object of the present invention to increase the aperture ratio of white (W), red (R), green (G), and blue (B) subpixels by using white (W) subpixels as a transmitting portion and a light emitting portion, Another object is to provide an improved transparent display device.

According to an aspect of the present invention, there is provided a transparent display device including a transparent display panel including a transparent region and a non-transparent region, the device including a driver for driving the transparent display panel, The panel includes a first sub-pixel disposed in the transparent region and a second sub-pixel disposed in an opaque region of the column different from the transparent region, wherein the first sub- And the second subpixel makes the entire surface of the transparent display panel emit light so that a part of the transmissive area can be used as a transmissive area and an emissive area to increase the transmissivity of the transparent display panel and increase the aperture ratio of the emissive area There is a big effect.

The transparent display device according to the present invention has an effect of increasing the aperture ratio of the light emitting region while increasing the transmittance of the transparent display panel by allowing a part of the transmissive region to be used as the transmissive region and the light emitting region.

A transparent display device according to the present invention is a transparent display device in which white (W) subpixels are used as a transmissive portion and a light emitting portion to increase the aperture ratio of white (W), red (R), green (G) and blue (B) Thereby improving the lifetime of the device.

1 is a schematic system configuration diagram of a transparent display device according to the present invention.
2 is a plan view showing a pixel structure of a transparent display device according to the present invention.
3 is a cross-sectional view taken along line I-I 'and II-II' of FIG.
4 to 9 are a pixel structure and a cross-sectional view of another embodiment of the present invention.

BRIEF DESCRIPTION OF THE DRAWINGS The advantages and features of the present invention, and the manner of achieving them, will be apparent from and elucidated with reference to the embodiments described hereinafter in conjunction with the accompanying drawings. The present invention may, however, be embodied in many different forms and should not be construed as being limited to the embodiments set forth herein. Rather, these embodiments are provided so that this disclosure will be thorough and complete, and will fully convey the scope of the invention to those skilled in the art. Is provided to fully convey the scope of the invention to those skilled in the art, and the invention is only defined by the scope of the claims.

The shapes, sizes, ratios, angles, numbers, and the like disclosed in the drawings for describing the embodiments of the present invention are illustrative, and thus the present invention is not limited thereto. Like reference numerals refer to like elements throughout the specification. In the following description, well-known functions or constructions are not described in detail since they would obscure the invention in unnecessary detail.

In the case where the word 'includes', 'having', 'done', etc. are used in this specification, other parts can be added unless '~ only' is used. Unless the context clearly dictates otherwise, including the plural unless the context clearly dictates otherwise.

In interpreting the constituent elements, it is construed to include the error range even if there is no separate description.

In the case of a description of the positional relationship, for example, if the positional relationship between two parts is described as 'on', 'on top', 'under', and 'next to' Or " direct " is not used, one or more other portions may be located between the two portions.

In the case of a description of a temporal relationship, for example, if a temporal posterior relationship is described by 'after', 'after', 'after', 'before', etc., 'May not be contiguous unless it is used.

The first, second, etc. are used to describe various components, but these components are not limited by these terms. These terms are used only to distinguish one component from another. Therefore, the first component mentioned below may be the second component within the technical spirit of the present invention.

It is to be understood that each of the features of the various embodiments of the present invention may be combined or combined with each other, partially or wholly, technically various interlocking and driving, and that the embodiments may be practiced independently of each other, It is possible.

Hereinafter, embodiments of the present invention will be described in detail with reference to the drawings. In the drawings, the size and thickness of the device may be exaggerated for convenience. Like reference numerals designate like elements throughout the specification.

1 is a schematic system configuration diagram of a transparent display device according to the present invention.

1, a transparent display device 100 according to the present invention includes a plurality of data lines (DL to DLm, m is a natural number) and a plurality of gate lines GL1 to GLn (n is a natural number) A data driver 120 for driving the plurality of data lines DL to DLm and a plurality of gate lines GL1 to GLn for driving the plurality of data lines DL to DLm, A timing controller 140 for controlling the data driver 120 and the gate driver 130, and the like. Here, the data driver 120 and the gate driver 130 correspond to drivers for driving sub-pixels.

The data driver 120 drives a plurality of data lines by supplying data voltages to the plurality of data lines.

The gate driver 130 sequentially supplies the scan signals to the plurality of gate lines to sequentially drive the plurality of gate lines.

The timing controller 140 controls the data driver 120 and the gate driver 130 by supplying various control signals to the data driver 120 and the gate driver 130.

The timing controller 140 starts scanning in accordance with the timing implemented in each frame, switches the input image data input from the outside according to the data signal format used by the data driver 120, and outputs the converted image data , And controls the data driving at a suitable time according to the scan.

The gate driver 130 sequentially supplies the scan signals of the On voltage or the Off voltage to the plurality of gate lines according to the control of the timing controller 140 to sequentially drive the plurality of gate lines.

1, the gate driver 130 may be located only on one side of the transparent display panel 110, or on both sides of the transparent display panel 110, depending on the driving method and the transparent display panel designing method.

In addition, the gate driver 130 may include one or more gate driver integrated circuits.

Each gate driver integrated circuit may be connected to a bonding pad of the transparent display panel 110 by a tape automation bonding (TAB) method or a chip on glass (COG) ) Type, and may be directly disposed on the transparent display panel 110, and may be integrated and disposed on the transparent display panel 110, as the case may be.

Each gate driver integrated circuit can be implemented by a chip on film (COF) method. In this case, the gate driver chip corresponding to each gate driver integrated circuit is mounted on the flexible film, and one end of the flexible film can be bonded to the transparent display panel 110. [

When the specific gate line is opened, the data driver 120 converts the image data received from the timing controller 140 into an analog data voltage and supplies the data voltage to a plurality of data lines to drive the plurality of data lines.

The data driver 120 may include at least one source driver integrated circuit to drive a plurality of data lines.

Each source driver integrated circuit may be connected to a bonding pad of the transparent display panel 110 by a tape automated bonding (TAB) method or a chip on glass (COG) method, or may be connected to a transparent display panel 110 And may be integrated and disposed on the transparent display panel 110 as occasion demands.

In addition, each source driver integrated circuit may be implemented by a chip on film (COF) method. In this case, the source driver chip corresponding to each source driver integrated circuit is mounted on a flexible film, one end of the flexible film is bonded to at least one source printed circuit board, (110).

The source printed circuit board is connected to a control printed circuit board through a connection medium such as a flexible flat cable (FFC) or a flexible printed circuit (FPC).

On the control printed circuit board, a timing controller 140 is disposed.

A power controller (not shown) for controlling various voltages or currents to supply or supply various voltages or currents to the transparent display panel 110, the data driver 120, the gate driver 130, .

The source printed circuit board and the control printed circuit board mentioned above may be a single printed circuit board.

The transparent display device 100 according to the present embodiments may be a liquid crystal display device, an organic light emitting display device, or the like. Hereinafter, for convenience of explanation, it is assumed that the transparent display device 100 is an organic light emitting display device.

On the other hand, the transparent display panel 110 is composed of a transparent region having a plurality of transparent portions and a non-transparent opaque region.

In the transparent region, a plurality of transparent portions are arranged in a matrix type.

Here, regarding the plurality of transparent portions arranged in a matrix type, the plurality of transparent portions arranged in the same row are one transparent portion row, and the plurality of transparent portions arranged in the same column are one transparent portion It is called the column.

The opaque region is composed of a light emitting portion (EA) emitting light in each subpixel and a non-emitting portion (NEA) not emitting light.

The non-emitting portion may include a driving line disposed in each sub-pixel, and a column line area (CLA) in which a capacitor portion and column lines are disposed. The column lines are connected to the data lines Vdata1, Vdata2, Vdata3, Vdata4, Vdata5 .., voltage reference lines Vref1, Vref2, Vref3, Vref4 .. and power supply voltage lines VDD1, VDD2, , VDD4, ...).

In addition, the driving unit may include a driving circuit composed of switching elements disposed in each sub-pixel, and the capacitor unit may include storage capacitors formed in each sub-pixel.

The column wiring region includes a transparent portion, a row of light emitting portions, and a row of transparent portions and a light emitting portion. That is, in the present invention, all or a part of the plurality of transparent portions disposed in the transparent region is used as a white (W) light emitting portion to improve the aperture ratio of the subpixels. Accordingly, the light emitting portion of the white (W) sub-pixel of the present invention emits light in both the front and back directions of the transparent display panel 110 at the time of light emission, but functions as a transparent portion through which external light can pass when the light is not emitted.

Therefore, even if the white subpixel of the present invention is disposed in the transmissive region, the transparent region functions as a transmissive portion. Therefore, the transparent region may be composed of a plurality of transparent portions, or white (W) subpixels and transparent portions may alternately As shown in FIG.

Therefore, in the present invention, when referring to a light emitting portion, white (W), red (R), green (G) and blue (B) subpixels may be included, W) subpixel and a transparent portion.

Each subpixel may be, for example, a red (R) subpixel emitting red light, a green (G) subpixel emitting green light, a blue (B) subpixel emitting blue light Or may be a white (W) sub-pixel emitting white light.

Each sub-pixel includes a light emitting portion in which light of a corresponding color is emitted and a circuit portion in which a circuit element such as a transistor is disposed so that light is emitted from the light emitting portion.

For example, when there are subpixels of four colors (first color, second color, third color, and fourth color) in the transparent display panel 110 according to the present invention, The second color subpixel includes a second color light emitting portion and a second color circuit portion, and the third color subpixel includes a third color light emitting portion and a third color circuit portion And the fourth color subpixel may include a fourth color light emitting portion and a fourth color circuit portion.

The light emitting unit of each subpixel may mean a region emitting light of a corresponding color for each subpixel and may mean a pixel electrode (for example, an anode) existing for each subpixel, or an area where the pixel electrode is disposed You may.

The circuit portion of each sub-pixel includes a driving circuit including a switching element (including a driving switching element (TFT)) that supplies a voltage or a current to a pixel electrode of each sub-pixel to emit light from the emitting portion, A capacitor, or an area where such a driving circuit and a capacitor are disposed.

In the transparent display panel 110 according to the embodiments of the present invention, the light emitting portion of the at least one color subpixel among the subpixels of various colors (e.g., white, red, green, blue, etc.) can do.

For example, when four color subpixels are disposed on the transparent display panel 110 according to the present invention, the first color light emitting portion, the second color light emitting portion, the third color light emitting portion, and the fourth color light emitting portion At least one may be located in the column wiring region or overlapping the column wiring region.

As described above, since the light emitting portion of at least one color subpixel is located in the column wiring region or overlaps with the column wiring region, the viewing angle, light emitting area, and transmissive area of the transparent display panel 110 can be widened .

Meanwhile, in the transparent display panel 110 according to the present invention, a plurality of subpixels may be arranged in a WRGB structure, and a structure in which two pixels are composed of four subpixels (hereinafter referred to as " 2P-4SP structure & A plurality of sub-pixels may be arranged.

When a plurality of subpixels are arranged in the 2P-4SP structure in the transparent display panel 110 according to the present invention, the same resolution can be similarly expressed by a small number of subpixels as compared with the WRGB structure. In particular, by reducing the number of subpixels, the transparency of the transparent display panel 110 can be improved.

FIG. 2 is a plan view showing a pixel structure of a transparent display device according to the present invention, and FIG. 3 is a cross-sectional view taken along lines I-I 'and II-II' of FIG.

Referring to FIG. 2 and FIG. 3 together with FIG. 1, a transparent display panel 110 according to the present invention includes a plurality of transparent portions TA arranged in a matrix type. Further, in the transparent display panel 110 according to the present invention, subpixel rows exist between transparent portions.

Particularly, since part of the transparent region of the present invention can be used as a transparent portion TA by arranging white (W) subpixels, the transparent portion TA and the white (W) subpixel are arranged alternately along the row direction . As described above, the transparent portion TA may refer to a white (W) sub-pixel.

For example, a pair of red (R) or green (G) or blue (B) subpixels in the column direction and a transparent portion (TA) (TA) and a second white (W2) subpixel are alternately arranged. The first and second white W1, W2, R, G and B subpixels may be defined as one pixel. In the present invention, the first and second white W1, W2, White (W1, W2) subpixels are arranged. The first and second white W1 and W2 subpixels are used as a transparent portion TA when not in operation and the white W subpixel widths are used for the red (R), green (G), and blue (B) The width of the pixels may be the same or different.

Each subpixel of the transparent display panel 110 according to the present invention is divided into an Emitting Area (EA) and a Non-Emitting Area (NEA), and a circuit portion for controlling the light emitting portion (EA) (EA) and in the non-light emitting portion (NEA).

The first white (W1) subpixel includes a light emitting portion EA generating white light, a non-light emitting portion NEA composed of a first white color driving circuit WD1 and a first white color capacitor WCl, The two white (W2) subpixels include a light emitting portion EA generating white light, a non-light emitting portion NEA composed of a second white driving circuit WD2 and a second white color capacitor WC2.

The first and second white W1 and W2 subpixels are located in a transparent region and the light emitting portion EA of the first and second white W1 and W2 subpixels is used as a transparent portion TA .

The red (R) sub-pixel includes a non-emitting portion NEA formed of a red light emitting portion EA, a red driving circuit RD, and a red capacitor RC. The green sub- And a non-light emitting portion (NEA) composed of a light emitting portion (EA) generating green light, a green driving circuit (GD) and a green capacitor (GC), and the blue (B) And a non-light-emitting portion NEA formed of a blue driving circuit BD and a blue color capacitor BC.

Thus, in the present invention, the area of the red (R), green (G), and blue (B) subpixels is increased by disposing the first and second white (W1, W2) subpixels in a part of the transparent area. Also, since the first and second white (W1, W2) subpixels are disposed in a transparent region and serve as a light emitting portion (EA) emitting white light, the area of the white subpixel is also increased.

As described above, according to the present invention, the area of the electrodes of the organic light emitting diode disposed in each subpixel is increased, thereby reducing the current density J and increasing the device lifetime.

In the present invention, the first white (W1) and red (R) subpixels, the transparent portion (TA) and the green (G) subpixel and the second white (W2) Pixels are alternately arranged in the row direction.

The voltage reference lines Vref1, Vref2, Vref3, Vref4, .. and the power supply voltage lines VDD1, VDD2, VDD3, VDD4, ..., Vdata1, Vdata2, Vdata3, Vdata4, Vdata5. ... are arranged with the subpixels and the transmissive portion TA interposed therebetween.

2, by adjusting the positions of the driving circuits and the capacitors disposed in the respective sub-pixels, the first and second white (W1, W2) sub-pixels and the red R), green (G), and blue (B) sub-pixels.

3, the transparent display device of the present invention includes a first substrate 101 formed of a transparent insulating substrate, and a second substrate 101 having a first and a second white W1 and W2 ), Red (R), green (G) and blue (B) subpixels.

In the present invention, the first organic light emitting diode 164 is disposed in the first and second white (W1, W2) subpixels, and the organic light emitting diode (OLED) The second organic light emitting diode 264 is disposed in the red (R), green (G), and blue (B) subpixels.

3 is a sectional view of the first white (W1) subpixel, and II-II 'is a sectional view of a red (R) subpixel. Thus, the second white (W2) subpixel is identical to the cross-sectional structure of the first white (Wl) subpixel, and the green (G) and blue (B) subpixels are identical to the cross-sectional structure of the red .

Accordingly, the cross-sectional structure of the first white (W1) subpixel and the red (R) subpixel will be mainly described below.

The gate electrode G, the gate insulating film 102, the active layer ACT, the interlayer insulating film 104, and the gate electrode G are formed on the first white (W1) subpixel and the red (R) A drain electrode D, and a source electrode S, as shown in Fig.

A planarizing film 106 is disposed on the driving switching device TFT and a first organic light emitting diode 164 is formed on the planarizing film 106 on the first white W1 sub pixel and red (R) And a second organic light emitting diode 264 are disposed.

The first organic light emitting diode 164 includes a transparent electrode 161, an organic light emitting layer 162 and a second electrode 163. The second organic light emitting diode 264 includes a first electrode 261, A light emitting layer 162 and a second electrode 163.

Each of the subpixels is separated by the bank layer 170. A part of the edges of the transparent electrode 161 and the first electrode 261 overlap with the bank layer 170. [ Accordingly, the bank layer 170 is removed on the transparent electrode 161 and the first electrode 261 in the region corresponding to the sub-pixels.

The first and second organic light emitting diodes 164 and 162 may be formed of the same material layer and the second electrodes 163 may be formed of the same material. .

However, the transparent electrode 161 of the first organic light emitting diode 164 may be made of a transparent conductive material, and the first electrode 261 of the second organic light emitting diode 264 may be made of an opaque conductive material.

The second substrate 201 and the second substrate 201 are disposed on the first and second organic light emitting diodes 164 and 264 so as to face the first substrate 101 and the array substrate having the organic light emitting diodes, (W1-CF, W2-CF, R-CF, G-CF, B) color filter layers (W1-CF, W2- -CF), a black matrix (BM: Black Matrix) and an overcoat layer 202 are bonded together with the sealing layer 190 therebetween.

In the present invention, red (R), green (G), and blue (B) subpixels are formed by previously arranging a white (W) subpixel as a transmission region in a row in which red (R), green B) the aperture ratio of the sub-pixels is increased.

The white (W) subpixel is also arranged alternately with the transmissive portion TA in the transmissive region, so that the white (W) subpixel is arranged in the first and second subpixels on the basis of the width in which the red (R), green (W1, W2) sub-pixels.

That is, two white (W1, W2) subpixels may be arranged in one pixel unit, so that the total area of the white (W1, W2) subpixels increases and red (R), green B) Since the subpixels are arranged including the area where the white subpixel was present, the area of each subpixel increases.

Therefore, the width of the emission region EA of the red (R) subpixel is increased to D2 and the width of the emission region (EA) of the corresponding first white (Wl) subpixel is increased to D1.

Since the transparent electrode 161 and the second electrode 163 of the first organic light emitting diode 164 disposed in the first white sub-pixel W1 are formed of a transparent conductive material, the first white W1 sub- Light generated in the pixels is emitted in the direction of both surfaces of the second substrate 201 and the first substrate 101.

That is, the first and second white (W1, W2) subpixels of the present invention are arranged alternately with the transmissive portion TA in the transmissive region and used as the emissive portion EA during operation, TA), the transmittance in the transmissive region increases.

Thus, in the present invention, the aperture ratio of each of the white (W), red (R), green (G), and blue (B) subpixels is increased and the area of the transmissive portion is also increased.

In addition, the first electrode 261 of the second organic light emitting diode 264 disposed in the red (R) sub-pixel is formed of an opaque metal and the second electrode 163 is formed of a transparent conductive material, And emits light upward in the direction of the second substrate 201 formed.

That is, the green (G) and blue (B) subpixels including the red (R) subpixel are arranged in a matrix form in which the first electrode 261 is made of an opaque metal, The first and second white (W1, W2) subpixels are disposed on a first organic light emitting diode 164 (hereinafter, referred to as a first organic light emitting diode) .

Although not shown in the drawing, the structure of the transmissive portion TA of FIG. 2 is the same as that of the transmissive portion TA of FIG. 9 except that the organic light emitting layer 162 and the second electrode 163 are laminated, The first electrode constituting the first electrode is not arranged. This is to reduce the step with the adjacent sub-pixels.

In the present invention, the electrode structure of the organic light emitting diode disposed in the white (W1, W2) subpixels is changed so that the aperture ratio (light emitting portion) of each subpixel can be used as the transmissive portion TA or the light emitting portion EA. Is increased. This also has the effect of increasing the lifetime of the device.

≪ Transparent display device manufacturing method >

A method of manufacturing the transparent display device of the present invention will be described below.

First, a first substrate W1, a second substrate W2, a red (R), a green (G), and a blue (B) subpixels and a transmissive portion TA are partitioned to form an array substrate 101).

A gate metal film is formed on the first substrate 101 by a sputtering process and then patterned by a photolithograph process and an etching process to form a gate electrode G of the driving switching TFT, A gate line (not shown) connected to the electrode G, and a gate pad (not shown) connected to the end of the gate line.

The gate metal layer may include at least one of aluminum (Al), aluminum alloy (Al alloy), tungsten (W), copper (Cu), nickel (Ni), chromium (Cr), molybdenum A low resistance opaque conductive material such as molybdenum (Mo), titanium (Ti), platinum (Pt), tantalum (Ta)

In addition, a transparent conductive material such as tin oxide (TO), indium tin oxide (ITO), indium zinc oxide (IZO), indium tin zinc oxide (ITZO) And a non-transparent conductive material may be laminated.

Since a plurality of switching elements are arranged in each pixel region of the organic light emitting diode display device, when the gate electrode G of the driving TFT is formed, A gate electrode is also formed.

As described above, when the gate electrode G is formed for each sub-pixel, a gate insulating film 102 composed of silicon oxide (SiO 2) or silicon nitride (SiNX) is formed on the first substrate 101 As shown in Fig.

A semiconductor layer is formed on the entire surface of the first substrate 101 on which the gate insulating layer 102 is formed and patterned by a photolithography process and an etching process to form a semiconductor layer corresponding to the gate electrode G of the drive switching TFT An active pattern ACT is formed on the gate insulating film 102. [

The semiconductor layer may be amorphous silicon or crystalline silicon. The semiconductor layer may be formed of an oxide semiconductor layer.

The oxide semiconductor layer may be formed of an amorphous oxide including at least one of indium (In), zinc (Zn), gallium (Ga), and hafnium (Hf). For example, when a Ga-In-Zn-O oxide semiconductor is formed by a sputtering process, each target formed of In2O3, Ga3O3, and ZnO may be used, or a single target of Ga-In-Zn oxide may be used. When a hf-In-Zn-O oxide semiconductor is formed by a sputtering process, each target formed of HfO 2, In 2 O 3 and ZnO may be used or a single target of Hf-In-Zn oxide may be used .

Then, an interlayer insulating film 104 made of silicon oxide (SiO2) or silicon nitride (SiNX) is formed on the entire surface of the first substrate 101 on which the active pattern ACT is formed, and the interlayer insulating film 104 is formed by a photolithography process and an etching process A contact hole process is performed to expose a part of the active pattern ACT.

When a contact hole is formed on the interlayer insulating film 104 as described above, a source / drain metal film is formed on the entire surface of the first substrate 101, and the source and drain electrodes S and D are formed in the photolithography process and the etching process. To complete a driving switching element (TFT). The driving switching element (TFT) is formed in each subpixel.

The source electrode (S) and the drain electrode (D) are electrically connected to the active pattern (ACT) through a contact hole formed in the interlayer insulating layer (104).

The source / drain metal layer may include a first metal layer made of a transparent conductive material such as indium tin oxide (In-Zinc-Oxide), tungsten (WO) , A second low-resistance opaque conductive material such as aluminum (Al), an aluminum alloy, tungsten (W), copper (Cu), nickel (Ni), chromium (Cr), molybdenum (Mo), titanium, A metal film is formed by laminating.

Thereafter, source and drain electrodes S and D are formed by a mask process using a halftone mask or a diffraction mask.

In forming the source and drain electrodes S and D, the data lines Vdata1, Vdata2, Vdata3, Vdata4 and Vdata5 .., the voltage reference lines Vref1, Vref2, Vref3, Vref4, (VDD1, VDD2, VDD3, VDD4, ..) and pads (not shown) formed in these lines are simultaneously formed.

As described above, when the driving switching element (TFT) is formed on the first substrate 101, it is possible to use an organic insulating material such as acryl based organic compound, benzocyclobutene (BCB) or perfluorocyclobutane (PFCB) A planarizing film 106 is formed on the entire surface.

Then, a mask process is performed to form a contact hole for exposing the source electrode S of the drive switching device TFT in the planarization film 106. [

As described above, when the contact hole is formed in the planarization layer 106, a film made of a transparent conductive material is formed on the entire surface of the first substrate 101.

The transparent conductive material may be tin oxide (TO), indium tin oxide (ITO), indium zinc oxide (IZO), or indium tin zinc oxide (ITZO).

Then, a photolithography process and an etching process are performed to form a transparent electrode 161 in a region corresponding to the first and second white (W1, W2) sub-pixels.

After the transparent electrode 161 is formed, aluminum (Al), silver (Ag) or an alloy thereof is formed on the first substrate 101, and then red (R), green (G) and blue (B) sub-pixels. At this time, no electrode is formed in a region corresponding to the transparent portion TA in FIG.

In addition, the process of forming the transparent electrode 161 and the process of forming the first electrode 261 can be performed alternately.

The transparent electrode 161 is connected to a source electrode S of a driving switching element TFT disposed in a first white W1 subpixel and the first electrode 261 is connected to a red And is electrically connected to the source electrode S of the drive switching element (TFT)

As described above, when the transparent electrode 161 and the first electrode 261 are formed on the planarization layer 106, an organic layer is formed on the entire surface of the first substrate 101, and then the first and second white The bank layer 170 is formed to expose the transparent electrode 161 and the first electrode 261 disposed in the red (R), green (G), and blue (B) subpixels.

As described above, when the bank layer 170 is formed on the first substrate 101, the transparent electrodes 161 arranged in the first and second white W1 and W2 subpixels and the red (R), green An organic light emitting layer 162 is formed on the first electrode 261 of the green (G) and blue (B) sub-pixels. The organic light emitting layer 162 may be formed on the entire surface of the first substrate 101 including the bank layer 170, the transparent electrode 161, and the first electrode 261.

The organic light emitting layer 162 is formed by continuously depositing a hole injecting layer material, a hole transporting layer material, a light emitting layer material, an electron transporting layer material, and an electron injection layer material by a thermal evaporation process to form the transparent electrode 161 and the first electrode An organic light emitting layer 162 including a hole injection layer (HIL), a hole transport layer (HTL), a light emitting layer (EML), an electron transport layer (ETL), and an electron injection layer (EIL)

The light emitting layer EML may be formed as a light emitting layer that emits white light or may be formed as a light emitting layer that emits red (R), green (G), and blue (B) .

As described above, when the organic light emitting layer 162 is formed on the first substrate 101, the second electrode 163 serving as a cathode is formed on the entire surface of the first substrate 101, A first organic light emitting diode 164 is formed in two white (W1, W2) subpixels and a second organic light emitting diode 264 is formed in red (R), green (G) and blue .

At this time, the bank layer 170 is formed on the planarization layer 106 in the transparent region TA, and only the organic light-emitting layer 162 and the second electrode 163 are stacked.

The second electrode 163 is formed of a transparent conductive material layer so as to transmit light generated in the organic light emitting layer 162. The transparent conductive material layer may include at least one selected from the group consisting of tin oxide (TO), indium tin oxide (ITO) Zinc oxide (IZO), indium tin zinc oxide (ITZO).

As described above, when the array substrate composed of the driving switching element TFT and the organic light emitting diode is completed, the first and second white W1 and W2, red (R), green (G) and blue (B A color filter substrate composed of white, red, green and blue color filter layers (W-CF, R-CF, G-CF and B-CF) is formed in the regions corresponding to the sub-pixels.

The color filter substrate used in the transparent display device of the present invention is formed by forming a black matrix BM on a second substrate 201 corresponding to a non-light emitting region including a non-light emitting portion NEA, (R), green (G) and blue (B) color filter layers W-CF, R-CF, G-CF and B-CF are formed on the red (G) and blue (B) subpixels.

Then, a protective film 202 is formed on the entire surface of the second substrate 201. In a region corresponding to the first and second white (W1, W2) sub-pixels of the protective film 202, It is used as a filter layer (W-CF).

That is, the red (R), green (G) and blue (B) color filter layers R-CF, G-CF and B- The first and second white W1 and W2 color filter layers serve as first and second white W1 and W2 color filter layers without using a separate color resin. do.

As described above, when the color filter substrate is completed, the array substrate and the sealing layer 190 are sandwiched therebetween to complete the OLED display.

The transparent display device according to the present invention has an effect of increasing the aperture ratio of the light emitting region while increasing the transmittance of the transparent display panel by allowing a part of the transmissive region to be used as the transmissive region and the light emitting region.

A transparent display device according to the present invention is a transparent display device in which white (W) subpixels are used as a transmissive portion and a light emitting portion to increase the aperture ratio of white (W), red (R), green (G) and blue (B) Thereby improving the lifetime of the device.

4 to 9 are a pixel structure and a cross-sectional view of another embodiment of the present invention.

The subpixels and the transmissive portion TA of FIGS. 4 to 9 correspond to the subpixels and the transmissive portion TA shown in FIG. Therefore, the driving circuit and the capacitor region for each subpixel are not shown separately.

Therefore, the driving circuit, the capacitor and the data lines Vdata, the voltage reference lines Vref, and the power source voltage lines VDD of the subpixels shown in FIG. 2 are formed in the regions corresponding to the black matrix (BM) .

Although not shown in the drawing, the data line Vdata, the voltage reference line Vref, and the power source voltage lines VDD form an insulating layer on the array substrate depending on the structure and position of each sub-pixel, And may be connected to the driving circuits of the respective sub-pixels.

For example, the data line (Vdata), the voltage reference line (Vref), and the power source voltage line (VDD) may be bent or partially or entirely overlapped with each other according to the layout structure of the subpixels among the embodiments described below, And may be connected to a driving circuit disposed in the driving circuit.

Referring to FIGS. 4 and 5, red (R), green (G) and blue (B) subpixels are arranged in the embodiment of the present invention. (W) subpixel is formed in the entire transmission region and in a part of the light emitting region.

4, red (R), green (G), and blue (B) subpixels are arranged along a row corresponding to a light emitting region, and the white (W) (R), green (G), and blue (B) sub-pixels.

That is, in FIG. 4, the entire transmission region corresponding to the subpixels of the light emitting portion is formed as white (W) subpixels, and the white (W) subpixel can emit double- (TA) or a light emitting portion.

Thus, the width of the white (W) subpixel corresponding to the transmissive region has D3 and the width of each of the red (R), green (G) and blue (B) subpixels has D4. The widths of the red (R), green (G) and blue (B) subpixels may be different.

In addition, since the white (W) sub-pixel having the function of the transmission portion TA is bent and arranged also in the row region in which the red (R), green (G) and blue (B) subpixels are arranged, It is possible to increase the transmittance.

As described above, according to the present invention, the area of the white (W) sub-pixel is enlarged to an area corresponding to one of the transmissive area and the light emitting area, thereby increasing the aperture ratio of the light emitting part of the white (W) .

Referring to FIG. 5 and FIG. 5 together with FIG. 3, the following description will be focused.

A first organic light emitting diode 364 including a transparent electrode 361 and an organic light emitting layer 162 and a second electrode 163 is disposed on the planarization layer 106 in a region corresponding to the white W subpixel . 3, the transparent electrode 361 and the second electrode 163 may be formed of any one of tin oxide (IT), indium tin oxide (ITO), indium zinc oxide (IZO), and indium tin zinc oxide (ITZO) It can be formed into one.

Accordingly, in an embodiment of the present invention, when the white (W) sub-pixel operates as a light emitting portion, the second substrate 201 emits light in the direction of the first substrate 101, Is transmitted through the first organic light emitting diode 164 to the first substrate 101.

In the red (R), green (G) and blue (B) subpixels, a second organic layer 263 composed of a first electrode 261, an organic light emitting layer 162, A light emitting diode 264 is arranged to emit light in the upward direction.

4 differs from FIG. 2 in that the aperture ratio of the white (W) sub-pixel and the aperture ratio of the transmissive portion are made larger than the widths of the red (R), green (G) and blue Function and luminance.

6 and 7, in the embodiment of the present invention, the red (R), green (G), and blue (B) subpixels are arranged in the row direction, Pixels.

As described with reference to FIG. 2, the white (W) subpixel increases the transmittance in the transmissive region because it functions as a transmissive region and a light emitting region. This is because, in the conventional transparent display device, the black matrix is formed in the wiring region between the transmissive portions TA, but in the embodiment of the present invention, there is no black matrix in the transmissive region in which the white (W) Because.

Therefore, the width of the white (W) subpixel corresponding to the transmissive area is D5, and the red (R), green (G), and blue (B) of the light emitting portion of the width (D5) Has a length equal to the sum of the widths of the subpixels and the widths of the black matrix disposed therebetween.

As described above, in the present invention, the effect of increasing the aperture ratio of the red (R), green (G), and blue (B) subpixels in the luminescent region while increasing the area of the white have.

Referring to FIG. 3 together with FIG. 7, a transparent electrode 461, an organic light emitting layer 162, and a second electrode 163 are formed on the planarization layer 106 in a region corresponding to the white (W) A light emitting diode 464 is disposed. The transparent electrode 461 and the second electrode 163 may be formed of any one of tin oxide (IT), indium tin oxide (ITO), indium zinc oxide (IZO), and indium tin zinc oxide (ITZO) It can be formed into one.

A white color filter layer W-CF is disposed on the second substrate 201 corresponding to the organic light emitting diode 464. The white color filter layer W- Is used as a white color filter layer.

8 and 9, in the embodiment of the present invention, red (R), green (G) and blue (B) subpixels are arranged in the row direction and red (R) ) Subpixels and a white (W) subpixel (width D6) so as to correspond to the black matrix BM disposed therebetween. And the transmissive portion (TA: width D7) is arranged in the transmissive region corresponding to the blue (B) sub-pixel.

2, the white (W) subpixel functions as a transmitting portion and a light emitting portion, so that white (W), red (R), green (G) B) increased the area of subpixels.

9, a transparent electrode 561, an organic light emitting layer 162, and a second electrode 163 are formed on the planarization layer 106 in a region corresponding to the white (W) sub-pixel, A light emitting diode 564 is disposed. In the transparent portion TA, the organic emission layer 162 and the second electrode 163 are disposed on the planarization layer 106 as shown in FIG.

The transparent electrode 561 and the second electrode 163 may be formed of any one of tin oxide (TO), indium tin oxide (ITO), indium zinc oxide (IZO), and indium tin zinc oxide (ITZO) It can be formed into one.

A white color filter layer W-CF is disposed on the second substrate 201 corresponding to the organic light emitting diode 564. The white color filter layer W- Is used as a white color filter layer. A protective layer 202 is also formed on the second substrate 201 in the transparent region TA so that external light can be transmitted.

As described above, the transparent display device according to the present invention has an effect of increasing the aperture ratio of the light emitting region while increasing the transmittance of the transparent display panel by allowing a part of the transmissive region to be used as the transmissive region and the light emitting region.

In addition, the transparent display device according to the present invention can reduce the aperture ratio of white (W), red (R), green (G) and blue (B) subpixels by using a white (W) subpixel as a transmitting portion and a light emitting portion. And the lifetime of the device is improved.

It will be apparent to those skilled in the art that various modifications and variations can be made in the present invention without departing from the spirit or scope of the present invention as defined by the appended claims. , Separation, substitution, and alteration of the invention will be apparent to those skilled in the art. Therefore, the embodiments disclosed in the present invention are intended to illustrate rather than limit the scope of the present invention, and the scope of the technical idea of the present invention is not limited by these embodiments. The scope of protection of the present invention should be construed according to the following claims, and all technical ideas within the scope of equivalents should be construed as falling within the scope of the present invention.

101: first substrate
102: gate insulating film
104: Interlayer insulating film
106: planarization film
161: transparent electrode
162: organic light emitting layer
163: Second electrode
164: first organic light emitting diode
201: second substrate
202: Shield
264: second organic light emitting diode

Claims (12)

A transparent display panel including a transparent region and an opaque region; And
And a driver for driving the transparent display panel,
The transparent display panel includes:
A first sub-pixel disposed in the transparent region,
And a second sub-pixel disposed in an opaque region of the column different from the transparent region,
The first sub-pixel emits light on both sides of a front surface and a back surface of the transparent display panel,
And the second sub-pixel emits light from the front of the transparent display panel. The method according to claim 1,
Wherein the first sub-pixel is used as a transparent portion in a non-emission state. The method according to claim 1,
And a third sub-pixel that emits double-sided light in the same column as the second sub-pixel. The method of claim 3,
Wherein the third subpixel and the first subpixel are integrally formed as one subpixel. The method of claim 3,
Wherein the first and third sub-pixels are used as a transparent portion in a non-emission state. The method of claim 3,
Wherein the first and third sub-pixels are white (W) sub-pixels. The method of claim 3,
And a first organic light emitting diode including a transparent electrode, an organic light emitting layer, and a transparent second electrode is disposed in the first and third subpixels. The method according to claim 1,
Wherein the second sub-pixel comprises red (R), green (G) and blue (B) sub-pixels emitting red, green and blue light. 9. The method of claim 8,
Wherein each of the red (R), green (G), and blue (B) subpixels includes a second organic light emitting diode having an opaque first electrode, an organic light emitting layer, and a transparent second electrode. 9. The method of claim 8,
And the transparent region further includes a transparent portion disposed in the same column as the first sub-pixel. 9. The method of claim 8,
Wherein the first subpixel is one white (W) subpixel corresponding to the red (R), green (G), and blue (B) subpixels of the second subpixel. 12. The method of claim 11,
Wherein the white subpixel is used as a transparent portion in a non-emitting state and emits white light in both directions of a front surface and a back surface of the transparent display panel when emitting light.

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