KR20160055805A - 연마패드의 평가방법 및 웨이퍼의 연마방법 - Google Patents
연마패드의 평가방법 및 웨이퍼의 연마방법 Download PDFInfo
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- KR20160055805A KR20160055805A KR1020167006400A KR20167006400A KR20160055805A KR 20160055805 A KR20160055805 A KR 20160055805A KR 1020167006400 A KR1020167006400 A KR 1020167006400A KR 20167006400 A KR20167006400 A KR 20167006400A KR 20160055805 A KR20160055805 A KR 20160055805A
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- polishing
- polishing pad
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- 238000005498 polishing Methods 0.000 title claims abstract description 231
- 238000000034 method Methods 0.000 title claims abstract description 31
- 238000011156 evaluation Methods 0.000 title claims abstract description 15
- 235000012431 wafers Nutrition 0.000 claims description 76
- 238000002441 X-ray diffraction Methods 0.000 claims description 13
- 229910002794 Si K Inorganic materials 0.000 claims description 7
- 238000002083 X-ray spectrum Methods 0.000 claims description 7
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 28
- 229910052710 silicon Inorganic materials 0.000 description 28
- 239000010703 silicon Substances 0.000 description 28
- 238000005259 measurement Methods 0.000 description 18
- 230000006866 deterioration Effects 0.000 description 6
- 239000002699 waste material Substances 0.000 description 6
- 239000002245 particle Substances 0.000 description 5
- 230000000052 comparative effect Effects 0.000 description 4
- 230000001678 irradiating effect Effects 0.000 description 4
- 238000010586 diagram Methods 0.000 description 3
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 2
- 238000005299 abrasion Methods 0.000 description 2
- 239000003513 alkali Substances 0.000 description 2
- 239000008119 colloidal silica Substances 0.000 description 2
- 238000007689 inspection Methods 0.000 description 2
- 229920002635 polyurethane Polymers 0.000 description 2
- 239000004814 polyurethane Substances 0.000 description 2
- 239000002002 slurry Substances 0.000 description 2
- 239000004760 aramid Substances 0.000 description 1
- 229920003235 aromatic polyamide Polymers 0.000 description 1
- 238000004140 cleaning Methods 0.000 description 1
- 230000003749 cleanliness Effects 0.000 description 1
- 150000001875 compounds Chemical class 0.000 description 1
- 239000013078 crystal Substances 0.000 description 1
- 230000007547 defect Effects 0.000 description 1
- 230000002950 deficient Effects 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 230000001747 exhibiting effect Effects 0.000 description 1
- 239000004744 fabric Substances 0.000 description 1
- 238000011835 investigation Methods 0.000 description 1
- 238000005304 joining Methods 0.000 description 1
- 239000007788 liquid Substances 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 238000000691 measurement method Methods 0.000 description 1
- 238000012544 monitoring process Methods 0.000 description 1
- 238000007517 polishing process Methods 0.000 description 1
- 239000011347 resin Substances 0.000 description 1
- 229920005989 resin Polymers 0.000 description 1
- 239000004065 semiconductor Substances 0.000 description 1
Images
Classifications
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
- H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
- H01L21/30—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26
- H01L21/302—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26 to change their surface-physical characteristics or shape, e.g. etching, polishing, cutting
- H01L21/304—Mechanical treatment, e.g. grinding, polishing, cutting
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B24—GRINDING; POLISHING
- B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
- B24B37/00—Lapping machines or devices; Accessories
- B24B37/005—Control means for lapping machines or devices
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B24—GRINDING; POLISHING
- B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
- B24B37/00—Lapping machines or devices; Accessories
- B24B37/11—Lapping tools
- B24B37/20—Lapping pads for working plane surfaces
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B24—GRINDING; POLISHING
- B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
- B24B49/00—Measuring or gauging equipment for controlling the feed movement of the grinding tool or work; Arrangements of indicating or measuring equipment, e.g. for indicating the start of the grinding operation
- B24B49/12—Measuring or gauging equipment for controlling the feed movement of the grinding tool or work; Arrangements of indicating or measuring equipment, e.g. for indicating the start of the grinding operation involving optical means
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
- H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
- H01L21/30—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26
- H01L21/302—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26 to change their surface-physical characteristics or shape, e.g. etching, polishing, cutting
- H01L21/306—Chemical or electrical treatment, e.g. electrolytic etching
- H01L21/30625—With simultaneous mechanical treatment, e.g. mechanico-chemical polishing
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L22/00—Testing or measuring during manufacture or treatment; Reliability measurements, i.e. testing of parts without further processing to modify the parts as such; Structural arrangements therefor
- H01L22/10—Measuring as part of the manufacturing process
- H01L22/12—Measuring as part of the manufacturing process for structural parameters, e.g. thickness, line width, refractive index, temperature, warp, bond strength, defects, optical inspection, electrical measurement of structural dimensions, metallurgic measurement of diffusions
Landscapes
- Engineering & Computer Science (AREA)
- Mechanical Engineering (AREA)
- Finish Polishing, Edge Sharpening, And Grinding By Specific Grinding Devices (AREA)
- Mechanical Treatment Of Semiconductor (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
Abstract
Description
도 2는 실리콘웨이퍼의 양면 연마에 사용하는 양면 연마장치의 일례를 나타낸 개략단면도이다.
도 3은 실리콘웨이퍼의 양면 연마에 사용하는 양면 연마장치의 내부구조도이다.
도 4는 Si신호량과 LPD의 상관을 나타낸 도면이다.
도 5는 연마패드 상에서 Si신호량을 측정하는 장소의 일례를 나타낸 도면이다.
도 6은 본 발명의 연마패드의 평가방법에 있어서의, 1차 근사식의 일례를 나타낸 도면이다.
도 7은 실시예 1에 있어서, Si신호량으로부터 구한 1차 근사식을 나타낸 도면이다.
도 8은 연마패드의 사용시간과 LPD의 관계를 나타낸 도면이다.
Claims (6)
- 웨이퍼를 연마하기 위한 연마패드의 라이프를 평가하는 연마패드의 평가방법으로서,
상기 연마패드 상에 퇴적된 연마잔사의 양을 측정하고, 이 측정한 측정값에 기초하여 상기 연마패드의 라이프를 평가하는 것을 특징으로 하는 연마패드의 평가방법. - 제1항에 있어서,
상기 연마잔사의 양은, 형광X선 분석법에 의해 얻어지는 형광X선 스펙트럼으로부터 Si-Kα선을 포함하는 신호를 검출함으로써 측정하는 것을 특징으로 하는 연마패드의 평가방법. - 제1항 또는 제2항에 있어서,
상기 연마패드의 사용시간에 대한 상기 연마잔사의 양의 측정값으로부터 1차 근사식을 구하고, 이 1차 근사식의 값이, 미리 설정한 임계값에 도달하는 상기 사용시간을 상기 연마패드의 라이프로 하는 것을 특징으로 하는 연마패드의 평가방법. - 웨이퍼를 연마패드에 슬라이드 접촉시킴으로써 복수의 상기 웨이퍼를 연마하는 웨이퍼의 연마방법으로서,
연마전에 상기 연마패드 상에 퇴적된 연마잔사의 양을 측정하고, 이 측정한 측정값에 기초하여 상기 연마패드의 라이프를 예측하고, 상기 연마패드의 사용시간이 예측한 라이프에 도달한 시점에서 상기 연마패드를 교환하는 것을 특징으로 하는 웨이퍼의 연마방법. - 제4항에 있어서,
상기 연마잔사의 양은, 형광X선 분석법에 의해 얻어지는 형광X선 스펙트럼으로부터 Si-Kα선을 포함하는 신호를 검출함으로써 측정하는 것을 특징으로 하는 웨이퍼의 연마방법. - 제4항 또는 제5항에 있어서,
상기 연마패드의 사용시간에 대한 상기 연마잔사의 양의 측정값으로부터 1차 근사식을 구하고, 이 1차 근사식의 값이, 미리 설정한 임계값에 도달하는 상기 사용시간을 상기 연마패드의 라이프로 예측하는 것을 특징으로 하는 웨이퍼의 연마방법.
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2013194400A JP5967044B2 (ja) | 2013-09-19 | 2013-09-19 | 研磨パッドの評価方法及びウェーハの研磨方法 |
| JPJP-P-2013-194400 | 2013-09-19 | ||
| PCT/JP2014/004319 WO2015040795A1 (ja) | 2013-09-19 | 2014-08-22 | 研磨パッドの評価方法及びウェーハの研磨方法 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| KR20160055805A true KR20160055805A (ko) | 2016-05-18 |
| KR102185646B1 KR102185646B1 (ko) | 2020-12-02 |
Family
ID=52688467
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| KR1020167006400A Active KR102185646B1 (ko) | 2013-09-19 | 2014-08-22 | 연마패드의 평가방법 및 웨이퍼의 연마방법 |
Country Status (8)
| Country | Link |
|---|---|
| US (1) | US10118272B2 (ko) |
| JP (1) | JP5967044B2 (ko) |
| KR (1) | KR102185646B1 (ko) |
| CN (1) | CN105531799B (ko) |
| DE (1) | DE112014003792B4 (ko) |
| SG (1) | SG11201601568VA (ko) |
| TW (1) | TWI644351B (ko) |
| WO (1) | WO2015040795A1 (ko) |
Families Citing this family (8)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2017058769A1 (en) * | 2015-09-28 | 2017-04-06 | Saint-Gobain Abrasives, Inc. | Method and apparatus for evaluating bonded abrasive article performance during a cut-off grinding operation |
| JP6783606B2 (ja) | 2016-09-29 | 2020-11-11 | 日立オートモティブシステムズ株式会社 | 接続端子組立体、及びこの接続端子組立体を使用した回路基板 |
| CN107685288B (zh) * | 2017-09-05 | 2019-05-10 | 南京航空航天大学 | 一种游离磨粒轨迹检测方法 |
| CN108145594A (zh) * | 2017-12-21 | 2018-06-12 | 上海华力微电子有限公司 | 研磨垫使用寿命的监测方法及监测设备 |
| JP6822518B2 (ja) * | 2019-05-14 | 2021-01-27 | 株式会社Sumco | 研磨パッドの管理方法及び研磨パッドの管理システム |
| KR102795946B1 (ko) * | 2019-08-02 | 2025-04-16 | 액서스 테크놀로지, 엘엘씨 | 가공대상물 연마 중 웨이퍼 슬립 검출의 인시츄 조절을 위한 방법 및 장치 |
| US11145556B2 (en) * | 2019-11-21 | 2021-10-12 | Carl Zeiss Smt Gmbh | Method and device for inspection of semiconductor samples |
| CN114012604B (zh) * | 2021-10-27 | 2024-01-09 | 长鑫存储技术有限公司 | 一种清洗研磨垫的方法、系统、电子设备及存储介质 |
Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH11260769A (ja) | 1998-03-10 | 1999-09-24 | Komatsu Electronic Metals Co Ltd | 半導体ウェハの研磨クロスの評価方法およびそれを用いた製造方法 |
| JP2005169593A (ja) * | 2003-12-15 | 2005-06-30 | Nikon Corp | 研磨装置、研磨方法、この研磨方法を用いた半導体デバイスの製造方法及びこの半導体デバイスの製造方法により製造された半導体デバイス |
| JP2011071215A (ja) * | 2009-09-24 | 2011-04-07 | Toshiba Corp | 研磨方法および半導体装置の製造方法 |
Family Cites Families (12)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US5934974A (en) * | 1997-11-05 | 1999-08-10 | Aplex Group | In-situ monitoring of polishing pad wear |
| JP2002150547A (ja) * | 2000-11-06 | 2002-05-24 | Nippon Sheet Glass Co Ltd | 情報記録媒体用ガラス基板の製造方法 |
| JP3935757B2 (ja) * | 2002-03-28 | 2007-06-27 | 信越半導体株式会社 | ウエーハの両面研磨装置及び両面研磨方法 |
| CN100380600C (zh) | 2002-03-28 | 2008-04-09 | 信越半导体株式会社 | 晶片的两面研磨装置及两面研磨方法 |
| US6702646B1 (en) * | 2002-07-01 | 2004-03-09 | Nevmet Corporation | Method and apparatus for monitoring polishing plate condition |
| JP4597634B2 (ja) | 2004-11-01 | 2010-12-15 | 株式会社荏原製作所 | トップリング、基板の研磨装置及び研磨方法 |
| EP2838110B1 (en) | 2004-11-01 | 2016-04-27 | Ebara Corporation | Polishing apparatus |
| JP2008068338A (ja) * | 2006-09-12 | 2008-03-27 | Fujitsu Ltd | 研磨装置、研磨方法、および半導体装置の製造方法 |
| TW200914202A (en) | 2007-09-19 | 2009-04-01 | Powerchip Semiconductor Corp | Polishing pad conditioner and method for conditioning polishing pad |
| JP2011035321A (ja) * | 2009-08-05 | 2011-02-17 | Renesas Electronics Corp | Cmp装置 |
| JP5511600B2 (ja) | 2010-09-09 | 2014-06-04 | 株式会社荏原製作所 | 研磨装置 |
| JP5291746B2 (ja) * | 2011-03-22 | 2013-09-18 | 株式会社荏原製作所 | 研磨装置 |
-
2013
- 2013-09-19 JP JP2013194400A patent/JP5967044B2/ja active Active
-
2014
- 2014-08-22 SG SG11201601568VA patent/SG11201601568VA/en unknown
- 2014-08-22 WO PCT/JP2014/004319 patent/WO2015040795A1/ja not_active Ceased
- 2014-08-22 US US14/915,756 patent/US10118272B2/en active Active
- 2014-08-22 CN CN201480050581.8A patent/CN105531799B/zh active Active
- 2014-08-22 DE DE112014003792.3T patent/DE112014003792B4/de active Active
- 2014-08-22 KR KR1020167006400A patent/KR102185646B1/ko active Active
- 2014-08-28 TW TW103129732A patent/TWI644351B/zh active
Patent Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH11260769A (ja) | 1998-03-10 | 1999-09-24 | Komatsu Electronic Metals Co Ltd | 半導体ウェハの研磨クロスの評価方法およびそれを用いた製造方法 |
| JP2005169593A (ja) * | 2003-12-15 | 2005-06-30 | Nikon Corp | 研磨装置、研磨方法、この研磨方法を用いた半導体デバイスの製造方法及びこの半導体デバイスの製造方法により製造された半導体デバイス |
| JP2011071215A (ja) * | 2009-09-24 | 2011-04-07 | Toshiba Corp | 研磨方法および半導体装置の製造方法 |
Also Published As
| Publication number | Publication date |
|---|---|
| TWI644351B (zh) | 2018-12-11 |
| US20160193711A1 (en) | 2016-07-07 |
| JP2015060985A (ja) | 2015-03-30 |
| DE112014003792T5 (de) | 2016-05-19 |
| DE112014003792B4 (de) | 2024-04-25 |
| TW201528355A (zh) | 2015-07-16 |
| KR102185646B1 (ko) | 2020-12-02 |
| SG11201601568VA (en) | 2016-04-28 |
| CN105531799B (zh) | 2018-08-28 |
| WO2015040795A1 (ja) | 2015-03-26 |
| US10118272B2 (en) | 2018-11-06 |
| CN105531799A (zh) | 2016-04-27 |
| JP5967044B2 (ja) | 2016-08-10 |
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