KR20120088646A - Liquid crystal display device and the manufacturing method thereof - Google Patents

Abstract

A liquid crystal display device having a short prevention function in a cutting region is disclosed. The disclosed liquid crystal display includes: a plurality of cell regions including a first substrate having a pixel electrode, a second substrate having a common electrode, and a liquid crystal layer interposed between the first and second substrates; And a cutting region positioned between the plurality of cell regions, the cutting region having the first substrate extending from the cell region, the second substrate, and a peripheral spacer interposed between the first and second substrates. According to this structure, the liquid crystal domain can be formed without forming a pattern on the common electrode, and the risk of occurrence of short in the cut region can be prevented.

Description

Liquid crystal display device and its manufacturing method

The present invention relates to a liquid crystal display device and a method of manufacturing the same.

In general, a liquid crystal display includes a first substrate on which switching elements for driving each pixel region are formed, a second substrate facing the first substrate, and a liquid crystal layer interposed between the first and second substrates. . The liquid crystal display displays an image by applying a voltage to the liquid crystal layer to control the transmittance of light.

Meanwhile, the patterned vertical alignment mode (PVA) liquid crystal display, which is a kind of a vertical alignment (VA) mode liquid crystal display, forms a liquid crystal domain by arranging liquid crystal molecules in different directions by using a patterned transparent electrode. It has a structure to improve the viewing angle of the device. Therefore, in order to manufacture the liquid crystal display of the PVA mode, a process of forming the patterned transparent electrode must be involved.

As described above, in order to form the liquid crystal domain of the liquid crystal display, a process of patterning the transparent electrode must be further performed, thereby increasing the number of manufacturing processes of the liquid crystal display. In addition, in the assembly process of the first substrate and the second substrate, the misalignment of the first and second substrates leads to a misalignment of the patterns of the pixel electrodes of the first substrate and the common electrode of the second substrate, thereby causing normal liquid crystals. It acts as a cause of failure to form a domain. Therefore, there is a need for a method capable of forming the liquid crystal domain without forming a pattern on the electrode as much as possible.

In addition, recently, in order to improve the productivity of such a liquid crystal display device, instead of manufacturing a product cell unit such as one mobile phone screen, instead of manufacturing a unit substrate having a plurality of product cells first, and later cutting each product cell unit How to do it is the preferred trend. However, when manufactured in the unit substrate unit including a plurality of product cells, a short may occur in the cutting region between each product cell. That is, since the cutting region is a region to be cut later, but there is no liquid crystal layer, the pixel electrode layer and the common electrode layer are formed in the same manner as the cell region. . If a short occurs in any one cut region, all of the surrounding product cells may be defective, so a countermeasure is required.

An embodiment of the present invention provides an improved liquid crystal display device and a method of manufacturing the same, which can form a liquid crystal domain without forming a pattern on an electrode, and can also suppress a risk of occurrence of a short in a cutting region.

According to an exemplary embodiment of the present invention, a liquid crystal display device includes a first substrate having a pixel electrode and an embedded pattern, a second substrate provided with a common electrode, and a first substrate disposed between the first and second substrates. A plurality of cell regions comprising a liquid crystal layer comprising liquid crystal molecules forming a liquid crystal domain and a reactive mesogenic polymer fixing the liquid crystal molecules; And a cutting region positioned between the plurality of cell regions, the cutting region including the first and second substrates extending from the cell region and at least one peripheral spacer interposed between the first and second substrates. A first alignment layer connected to the pixel electrode and a second alignment layer connected to the common electrode extend from the cell region to the cutting region to face each other, and the peripheral spacer is disposed on the first substrate and the first substrate in the cutting region; A cell gap between two substrates is maintained to prevent electrical short between the pixel electrode and the common electrode, and the reactive mesogen polymer is applied to the pixel electrode and the common electrode in a state where a voltage is applied and a voltage is not applied. Each is polymerized by exposing the reactive mesogen monomer to ultraviolet light.

The peripheral spacer may contact at least one of the first substrate and the second substrate.

The common electrode may not have a pattern for forming the liquid crystal domain.

Cell spacers may be formed in the cell region.

The cell spacer may have the same shape as the peripheral spacer and may include the same material.

The cell spacer and the peripheral spacer may be insulation.

In addition, a method of manufacturing a liquid crystal display according to an exemplary embodiment of the present invention may include manufacturing a first substrate including a pixel electrode and an embedding pattern; Manufacturing a second substrate including a common electrode facing the pixel electrode; Forming a plurality of cell regions sealed with a sealant between the first substrate and the second substrate and forming a liquid crystal layer therein; Forming at least one peripheral spacer interposed between the first substrate and the second substrate in the cutting region between the plurality of cell regions; And arranging the first alignment layer connected to the pixel electrode and the second alignment layer connected to the common electrode to extend from the cell region to the cutting region so as to face each other. Preventing an electrical short between an electrode and the common electrode, and forming the liquid crystal layer, interposing a liquid crystal composition containing liquid crystal molecules and a reactive mesogen monomer in the cell region, and the liquid crystal composition is exposed to ultraviolet light Thereby causing the mesogenic monomers to polymerize into mesogenic polymers and the liquid crystal molecules are arranged to form and form a liquid crystal domain along the embedding pattern, wherein the exposing step is performed on the pixel electrode and the common electrode. The electric field exposure step of exposing and applying the voltage while the voltage is applied In that state includes electroless exposure step of exposing.

The peripheral spacer may contact at least one of the first substrate and the second substrate.

The common electrode may have no pattern for forming the liquid crystal domain.

Cell spacers may be formed in the cell region.

The cell spacer and the peripheral spacer may be simultaneously formed.

The cell spacer may have the same shape as the peripheral spacer and may include the same material.

The cell spacer and the peripheral spacer may be insulation.

According to the liquid crystal display of the present invention as described above, the liquid crystal domain can be formed without forming a pattern on the common electrode, and the risk of occurrence of short in the cutting region can be prevented during the manufacturing process.

1 is a plan view of a liquid crystal display according to an exemplary embodiment of the present invention.
FIG. 2A is a cross-sectional view taken along the line II ′ of FIG. 1, and FIG. 2B is a cross-sectional view taken along the line II-II ′ of FIG. 1.
FIG. 2C is a cross-sectional view of a state where a voltage is applied to the liquid crystal display shown in FIG. 2B.
3A to 3E are cross-sectional views illustrating a manufacturing process of the liquid crystal display shown in FIG. 2B.
4 is a cross-sectional view illustrating a deformable example of the spacer illustrated in FIG. 2A.

Hereinafter, preferred embodiments of the present invention will be described in detail with reference to the accompanying drawings.

First, a cell region structure of a liquid crystal display device capable of forming a liquid crystal domain without forming a pattern on a common electrode will be described first, and then a structure that can prevent a short in the cut region will be described.

1 is a plan view illustrating a portion of a cell area of a liquid crystal display according to an exemplary embodiment of the present invention. 2A is a cross-sectional view taken along the line II ′ of FIG. 1, and FIG. 2B is a cross-sectional view taken along the line II-II ′ of FIG. 1.

The liquid crystal layer in FIGS. 2A and 2B shows states of non-electric liquid crystal molecules and reactive mesogen (RM) without a voltage applied between the pixel electrode and the common electrode. The reactive mesogen is an example of an ultraviolet reactive material or a combination thereof, and when exposed to ultraviolet light, a polymerization reaction occurs. In addition, in FIG. 2A, the cell region 10 forming the pixel and the cut region 20 adjacent thereto are also illustrated. It is assumed that there is a cutting region 20 between each of the cell regions 10. 2A illustrates another cell region adjacent to the cell region 10 with the cutting region 20 interposed therebetween. Later, when finally making a product cell, the cut region 20 is cut out, so that a plurality of product cells, that is, a liquid crystal display, are separated from the mother substrate.

The cell region 10 will be described first, and the cut region 20 will be described later.

1, 2A, and 2B, the cell region 10 of the liquid crystal display according to the present exemplary embodiment includes a first substrate 100, a second substrate 200, and a liquid crystal layer 300.

The first substrate 100 may include a first base substrate 110, first and second gate lines GL1 and GL2, a storage line STL, a gate insulating layer 120, and first and second data lines. (DL1, DL2), a thin film transistor (SW) which is a switching element, the passivation layer 140, the domain forming layer 150, the pixel electrode (PE) and the first alignment layer (AL1).

The first and second gate lines GL1 and GL2 may extend along the first direction D1 on the first base substrate 110. The first and second gate lines GL1 and GL2 may be arranged in parallel to each other in a second direction D2 different from the first direction D1. The second direction D2 may be, for example, a direction perpendicular to the first direction D1. The storage line STL may be disposed between the first and second gate lines GL1 and GL2 and may extend along the first direction D1. The gate insulating layer 120 is formed on the first base substrate 110 to cover the first and second gate lines GL1 and GL2 and the storage line STL. The first and second data lines DL1 and DL2 may extend along the second direction D2 on the gate insulating layer 120 and may be arranged in parallel to each other in the first direction D1. have. The first and second data lines DL1 and DL2 may cross the first and second gate lines GL1 and GL2 and the storage line STL, respectively. In the first substrate 100, the pixel area P is partitioned by the first and second gate lines GL1 and GL2 and the first and second data lines DL1 and DL2. The pixel electrode PE may be formed in an area P.

The thin film transistor SW includes a gate electrode GE connected to the first gate line GL1, an active pattern AP formed on the gate insulating layer 120 so as to correspond to the gate electrode GE, and the first pattern line. A source electrode SE connected to the first data line DL1 and overlapping the active pattern AP, a drain electrode DE spaced apart from the source electrode SE and overlapping the active pattern AP, and the The contact electrode CNT may extend from the drain electrode DE and extend into the pixel region P. The active pattern AP may include a semiconductor layer 130a and an ohmic contact layer 130b sequentially formed on the gate insulating layer 120. The contact electrode CNT extends from the drain electrode DE to the storage line STL, and overlaps the storage line STL.

The passivation layer 140 may cover the first and second data lines DL1 and DL2, the source electrode SE, the drain electrode DE, and the contact electrode CNT. 120).

The domain forming layer 150 may be formed on the passivation layer 140. The domain forming layer 150 may planarize the first substrate 100. The domain forming layer 150 includes a recess pattern 152 formed by being recessed downward from the surface of the domain forming layer 150. The embedding pattern 152 may be formed in the pixel region P, and form a liquid crystal domain of the pixel region P. FIG. The embedding pattern 152 may be formed in the domain forming layer 150 in a dot type. The embedding pattern 152 may be formed on the contact electrode CNT to correspond to the contact electrode CNT. The embedding pattern 152 may be formed as a dot-shaped hole exposing a part of the contact electrode CNT. Even when the recessed pattern 152 is formed in the hole shape, light leakage in a region where the recessed pattern 152 is formed by the storage line STL and the contact electrode CNT formed under the recessed pattern 152. Can be prevented. The domain forming layer 150 may be formed of an organic material or an inorganic material. Alternatively, the domain forming layer may include both an organic layer and an inorganic layer, and the embedding pattern 152 may be formed on the organic layer or the inorganic layer.

The pixel electrode PE is formed on the domain forming layer 150 of the pixel region P. The pixel electrode PE may be formed of a transparent and conductive material. The pixel electrode PE may be formed to entirely cover the embedding pattern 152. The pixel electrode PE may be electrically connected to the thin film transistor SW by contacting the contact electrode CNT through the embedding pattern 152. In an area having the same area in plan view, the area of the pixel electrode PE on the embedding pattern 152 is relatively larger than the area of the pixel electrode PE formed on the flat area of the domain forming layer 150. wide. Accordingly, when an electric field is formed between the first substrate 100 and the second substrate 200, the intensity of the electric field in the region adjacent to the embedding pattern 152 does not include the embedding pattern 152. It may be relatively large compared to the strength of the electric field of the flat area.

The first alignment layer AL1 may be formed on the entire surface of the first substrate 100 including the pixel electrode PE.

The second substrate 200 may include a second base substrate 210, a black matrix 220, first, second and third color filters 232, 234, and 236 facing the first substrate 100. , An overcoat layer 240, a common electrode 250, and a second alignment layer AL2. The second substrate 200 may not include the overcoating layer 240.

The black matrix 220 corresponds to a non-pixel region in which the first and second gate lines GL1 and GL2, the first and second data lines DL1 and DL2, and the thin film transistor SW are formed. May be formed on the second base substrate 210. The first, second and third color filters 232, 234, and 236 may be formed in regions of the second base substrate 210 partitioned by the black matrix 220. For example, the first color filter 232 may be formed on the second base substrate 210 in a region corresponding to the pixel region P in which the pixel electrode PE is formed. The second color filter 234 may be formed in the first direction D1 of the first color filter 232, and is opposite to the first direction D1 of the first color filter 232. The third color filter 236 may be formed in the second color filter 236. The overcoat layer 240 is formed on the second base substrate 210 on which the black matrix 220 and the first, second and third color filters 232, 234, and 236 are formed. 2 The substrate 200 may be planarized.

The common electrode 250 may be formed on the overcoat layer 240. The common electrode 250 may be formed of a transparent and conductive material. The common electrode 250 may be formed on the entire surface of the second substrate 200 without a separate pattern. That is, the liquid crystal domain of the liquid crystal layer 300 may be formed by the pixel electrode PE which may change the intensity of the electric field by the embedding pattern 152 and the patternless common electrode 250. Can be.

Reference numeral 260a of FIG. 2A denotes a cell spacer made of an organic layer insulating material and may be formed on the common electrode 250 through a photolithography process. The cell spacer 260a may be directly positioned on the common electrode 250, and another member may be interposed between the cell spacer 260a and the common electrode 250. The cell spacer 260a serves to maintain a gap between the two substrates 100 and 200. Reference numeral 260b denotes a peripheral spacer formed in the cutting region 20 with an organic film insulating material, and may be simultaneously formed through a photolithography process like the cell spacer 260a of the cell region 10. The cell spacer 260a and the peripheral spacer 260b may have substantially the same shape. The peripheral spacer 260b of the cut region 20 performs a function of preventing a short in the cut region 20 during the manufacturing process, which will be described later.

The second alignment layer AL2 is formed on the second base substrate 210 on which the common electrode 250 is formed, and is formed on the entire surface of the second substrate 200 facing the first substrate 100. Can be.

The liquid crystal layer 300 is interposed in a space sealed with a sealant 350 (see FIG. 2A) between the first substrate 100 and the second substrate 200, and the liquid crystal molecules 310 and the reactive meso It consists of a liquid crystal composition comprising a Reactive Mesogen polymer (320, hereinafter referred to as RM polymer).

The liquid crystal molecules 310 may adjust the transmittance of light by changing an arrangement of the liquid crystal molecules by an electric field formed between the pixel electrode PE and the common electrode 250. The liquid crystal molecules 310 may have, for example, negative dielectric anisotropy.

In a state where no voltage is applied between the pixel electrode PE and the common electrode 250, the liquid crystal molecules 310 adjacent to the first substrate 100 and / or the second substrate 200 may be formed. The long axis of the liquid crystal molecules 310 may be arranged in a vertical state with respect to surfaces of the first base substrate 110 and / or the second base substrate 210. The major axis of the liquid crystal molecules 310 adjacent to the embedded pattern 152 is in a direction perpendicular to the surface of the sidewall with respect to the surface of the sidewall of the domain forming layer 150 forming the embedded pattern 152. Can be arranged.

The RM polymer 320 may be interposed between the liquid crystal molecules 310. The RM polymer 320 may be interposed between the pixel electrode PE and / or the common electrode 250 and adjacent liquid crystal molecules 310. More specifically, the RM polymer 320 may be interposed between the first alignment layer AL1 and adjacent liquid crystal molecules 310. In addition, the RM polymer 320 may be interposed between the second alignment layer AL2 and adjacent liquid crystal molecules 310.

The RM polymer 320 is adjacent to the first substrate 100 and / or the second substrate 200 even when no electric field is applied between the pixel electrode PE and the common electrode 250. The liquid crystal molecules 310 may be maintained in a pretilted state based on surfaces of the first base substrate 110 and / or the second base substrate 210. The RM polymer 320 may be formed by polymerizing RM monomers 330 (see FIG. 3E) into RM polymers by ultraviolet exposure in a process of manufacturing a liquid crystal display.

That is, when the ultraviolet light is irradiated, the RM monomer 330 is polymerized into the RM polymer, and thus, the RM monomer 330 is attached to the pixel electrode PE side and the common electrode 250 side together with the liquid crystal molecules 310. ) Will remain pretilted. The ultraviolet irradiation proceeds with an electric field exposure step of irradiating the two electrodes (PE) 250 in a state where a voltage difference is generated, and an electroless field exposure step of irradiating higher energy ultraviolet rays without applying a voltage. However, since the voltage is applied to the two electrodes PE 250 in the field exposure step, a short may occur when the two electrodes PE 250 contact. In particular, since the cell region 10 is a region made of a liquid crystal display device, which is a final product, a cell spacer 260a is generally installed to stably maintain the gap between the two substrates 100 and 200, but the cutting region ( In the case of 20), it is considered that the peripheral spacer 260b does not need to be provided because it is a region to be cut later. However, when the substrate is manufactured in the unit substrate as described above, since the cutting region 20 and the cell region 10 are both stuck until the cutting region 20 is finally cut, the cutting region 20 is shorted. Is generated, all adjacent cell regions 10 may be damaged. Therefore, the peripheral spacer 260b is also installed in the cutting region 20 to prevent an accidental short accident during the manufacturing process. The effects of the cell spacer 260a and the peripheral spacer 260b will be described later.

2C is a cross-sectional view of a state where a voltage is applied to the display device shown in FIG. 2B.

Referring to FIG. 2C, when an electric field is formed between the pixel electrode PE and the common electrode 250, the direction of the electric field in the pixel area P is the first substrate 100 and / or The direction is perpendicular to the surface of the second substrate 200.

The direction of the electric field is bent between the end of the pixel electrode PE and the common electrode 250. The direction of the electric field is also bent between an end of another pixel electrode adjacent to the pixel electrode PE and the common electrode 250. Accordingly, the liquid crystal molecules 310 are arranged to diverge toward different points of the common electrode 250 between the pixel electrodes PE adjacent to each other, thereby splitting the liquid crystal domain between the pixel areas P adjacent to each other. Can be.

The electric field shape of the region adjacent to the recessed pattern 152 corresponds to a point of the common electrode 250, for example, the recessed pattern 152 due to pretilt caused by sidewalls of the recessed pattern 152. It has a shape that converges toward the common electrode 250 in the region. As a result, the cell region 10 having the liquid crystal domain is formed without forming a pattern on the common electrode 250.

Next, the cutting | disconnection area | region 20 is demonstrated. As described above, the cutting region 20 is not a unit of a product cell, but a unit of a mother substrate including a plurality of product cells, so that the temporary connection region is positioned between each cell region 10. Say Naturally, the cut zone 20 is cut off later when the product cells are separated. However, the problem is that when the voltage is applied to the pixel electrode PE and the common electrode 250 for the electric field exposure step as described above during the manufacturing process, a short occurs in the cutting region 20 to the cell region 10. The damage can go. That is, as shown in FIG. 2A, the first and second substrates 100 and 200 extend in the cutting region 20, similar to the cell region 10, and the common electrode 250 in the second substrate 200. The first substrate 100 is provided with the pixel electrode PE. Of course, the pixel electrode PE is formed in the pixel region in the cell region 10, but since the alignment film AL1 formed thereon is a conductive member, the pixel electrode PE in the cut region 20 when a voltage is applied. The side and the common electrode 250 side can be in direct contact. Moreover, in the cell region 10, the liquid crystal layer 300 is between the two substrates 100 and 200, so it is unlikely to directly contact each other. However, in the cutting region 20, the two substrates 100 and 200 are separated. Since it is empty, the possibility of short generation by direct contact between the pixel electrode PE side and the common electrode 250 side is very high. If a short occurs, the electrical structure of all the cell regions 10 adjacent to the short occurrence site may be damaged, and the damaged cell region 10 becomes a defective product which cannot be used as a product cell until later cut out.

Therefore, in order to prevent such a problem, an insulating cell spacer 260a and a peripheral spacer 260b are interposed between the first and second substrates 100 and 200 as shown in FIG. 2A. The cell spacer 260a and the peripheral spacer 260b may be formed on the common electrode 250 through a photolithography process.

The cell spacer 260a and the peripheral spacer 260b may be formed in both the cell region 10 and the cut region 20, and maintain the cell gap between the two substrates 100 and 200. Short in the area 20 can also be prevented.

Therefore, disposing the insulating peripheral spacer 260b in the cut region 20 prevents a short during the manufacturing process and consequently reduces the defective rate of the product.

3A to 3E are cross-sectional views illustrating a manufacturing process of the liquid crystal display shown in FIG. 2B.

3A through 3E are cross-sectional views taken along the line II-II 'of FIG. 1 in each manufacturing process of the display device, but referring to FIGS. 3A through 3E, FIGS. This will be described.

3A to 3C are cross-sectional views illustrating a method of manufacturing the first substrate 100 illustrated in FIG. 2B.

Referring to FIG. 3A, a gate metal layer (not shown) is formed on the first base substrate 110, and the gate metal layer is patterned through a photolithography process to form the first and second gate lines GL1 and GL2. ), A gate pattern including the gate electrode GE and the storage line STL is formed.

The gate insulating layer 120 is formed on the first base substrate 110 on which the gate pattern is formed. Examples of the material for forming the gate insulating layer 120 include silicon oxide, silicon nitride, and the like.

The active pattern AP is formed on the first base substrate 110 on which the gate insulating layer 120 is formed. The semiconductor layer 130a and the ohmic contact layer 130b may be sequentially formed on the gate insulating layer 120. For example, the semiconductor layer 130a may include amorphous silicon, and the ohmic contact layer 130b may include amorphous silicon doped with a high concentration of n-type impurities.

A data metal layer (not shown) is formed on the first base substrate 110 on which the active pattern AP is formed, and the data metal layer is patterned through a photolithography process to form the first and second data lines DL1. , A source pattern including the DL2, the source electrode SE, the drain electrode DE, and the contact electrode CNT may be formed.

The passivation layer 140 and the domain forming layer 150 are sequentially formed on the first base substrate 110 on which the source pattern is formed. Examples of the material for forming the passivation layer 140 include silicon oxide, silicon nitride, and the like. Examples of the material for forming the domain forming layer 150 include organic materials such as positive type photoresist compositions and negative type photoresist compositions, and inorganic materials such as silicon oxide and silicon nitride.

Referring to FIG. 3B, the domain forming layer 150 is patterned to form the indentation pattern 152. The embedding pattern 152 may be formed on the contact electrode CNT. The contact electrode CNT may overlap the storage line STL. The embedding pattern 152 may be formed in a hole shape exposing the passivation layer 140 on the contact electrode CNT.

Subsequently, the passivation layer 140 exposed through the indentation pattern 152 is removed to form a passivation hole 142. The passivation hole 142 is formed on the contact electrode CNT. A portion of the contact electrode CNT may be exposed through the passivation hole 142 and the recess pattern 152.

Referring to FIG. 3C, a transparent electrode layer (not shown) is formed on the first base substrate 110 including the domain forming layer 150 on which the embedding pattern 152 is formed, and the transparent electrode layer is patterned. The pixel electrode PE is formed. Examples of the material for forming the transparent electrode layer include indium tin oxide (ITO), indium zinc oxide (IZO), and the like.

The first alignment layer AL1 is formed on the first base substrate 110 on which the pixel electrode PE is formed. The first alignment layer AL1 may include a vertical alignment material capable of vertically aligning the liquid crystal molecules 310.

Accordingly, the domain forming layer 150 including the gate pattern, the gate insulating layer 120, the active pattern AP, the source pattern, the passivation layer 140, and the embedding pattern 152. The first substrate 100 according to the present exemplary embodiment including the pixel electrode PE and the first alignment layer AL1 may be manufactured.

3D is a cross-sectional view for describing a method of manufacturing the second substrate 200 illustrated in FIG. 2B.

Referring to FIG. 3D, the black matrix 220 is formed on the second base substrate 210. The black matrix 220 may be formed by spraying an organic ink, or may be formed by patterning a metal layer through a photolithography process. The black matrix 220 is formed between the color filters 232, 234, and 236 to be described below, and an edge portion corresponding to the edge of the screen.

The first, second and third color filters 232, 234, and 236 are formed on the second base substrate 210 on which the black matrix 220 is formed. For example, the first color filter 232 is formed, and the second color filter 234 is formed on the second base substrate 210 including the first color filter 232. A third color filter 236 may be formed on the second base substrate 210 including the first and second color filters 232 and 234. The first to third color filters 232, 234, and 236 may be formed by patterning a color photoresist layer through a photolithography process, or by spraying color ink.

The overcoat layer 240 may be formed on the second base substrate 210 including the black matrix 220 and the first to third color filters 232, 234, and 236. An example of the material for forming the overcoat layer 240 may be an acrylic resin.

The common electrode 250 may be formed by forming a transparent electrode layer (not shown) on the second base substrate 210 on which the overcoat layer 240 is formed. The common electrode 250 may be formed to cover the entire surface of the second base substrate 210 without the process of patterning the transparent electrode layer. As an example of the material which forms the said common electrode 250, ITO, IZO, etc. are mentioned.

The cell spacer 260a of the above insulating material may be formed on the common electrode 250 through a photolithography process. Peripheral spacers 260b of the cut region 20 may also be formed simultaneously in the same shape of the same material.

The second alignment layer AL2 may be formed on the second base substrate 210 on which the common electrode 250 is formed. The second alignment layer AL2 may cover the entire surface of the second base substrate 210 on which the common electrode 250 is formed.

Accordingly, the black matrix 220, the first to third color filters 232, 234, and 236, the overcoat layer 240, the common electrode 250, and the second alignment layer AL2 are included. The second substrate 200 according to the present embodiment may be manufactured.

3E is a cross-sectional view for describing an exposure step of forming the liquid crystal layer shown in FIG. 2B.

Referring to FIG. 3E, the first substrate 100 and the second substrate 200 are assembled. The liquid crystal molecules 310 and the RM monomer 330 may be interposed between the first substrate 100 and the second substrate 200. The liquid crystal molecules 310 and the RM monomer 330 may be randomly interposed between the first substrate 100 and the second substrate 200.

Subsequently, a first voltage Vcom is applied to the common electrode 250, and a second voltage Vdata different from the first voltage Vcom is applied to the pixel electrode PE. When the first voltage Vcom is applied to the common electrode 250 and the second voltage Vdata is applied to the pixel electrode PE, between the pixel electrode PE and the common electrode 250. An electric field is formed. When the electric field is formed, the liquid crystal molecules 310 are inclined in a direction in which their major axis is perpendicular to the direction of the electric field.

The first voltage Vcom may have a level higher than the second voltage Vdata. In detail, the first voltage Vcom may be about 0V, and the second voltage Vdata may have a negative value. The second voltage Vdata may be, for example, about −5V.

In the state where an electric field is formed between the first substrate 100 and the second substrate 200 and the liquid crystal molecules 310 are pretilted, the first substrate 100 and the second substrate 200 are formed. Irradiate light. That is, electric field exposure is performed. The light may be, for example, ultra violet ray (UV). The RM monomer 330 is photoreacted by the light, and the RM monomer 330 is polymerized to form the RM polymer 320 interposed between the liquid crystal molecules 310. In addition, the polymerized RM polymer 320 is attached to the pixel electrode PE side and the common electrode 250 side together with the liquid crystal molecules 310, and thus the liquid crystal molecules 310 are pretilted. Will be maintained. In this case, since a voltage is applied to the two electrodes PE 250, if the two electrodes PE 250 contact each other, a short may occur. However, the cell spacer 260a and the peripheral spacer 260b may occur. Since a) maintains a gap between the two substrates 100 and 200 in both the cell region 10 and the cut region 20, the short is prevented at the source. Then, non-field exposure is performed without applying an electric field to completely settle the liquid crystal domain. Accordingly, the liquid crystal layer 300 according to the present exemplary embodiment may be formed between the first substrate 100 and the second substrate 200.

As described above, the gap between the two substrates 100 and 200 is maintained by the cell spacer 260a and the peripheral spacer 260b while applying the voltage to the electrode. Possible short-circuit accidents are prevented, thus reducing product defects.

Therefore, according to the present exemplary embodiment, the liquid crystal domain may be formed by the embedding pattern 152 of the domain forming layer 150 without forming a separate pattern on the common electrode 250. Therefore, since there is no separate pattern in the common electrode 250, the cause of the misalignment between the first substrate 100 and the second substrate 200 can be eliminated, and the common electrode 250 The manufacturing process can be simplified by omitting a separate patterning process for patterning.

In addition, by providing a peripheral spacer 260b in the cut region 20 to prevent a short, the product defective rate can be reduced.

Meanwhile, in the above-described embodiment, the peripheral spacer 260b of the cutting region 20 is formed in the same shape as the cell spacer 260a of the cell region 10 so that both ends of the spacer spacer 260b are in contact with both substrates 100 and 200. As illustrated in FIG. 4, the peripheral spacer 260c may be configured to be in contact with only the second substrate 200 side as shown in FIG. 4. That is, since the peripheral spacer 260c of the cutting region 20 only needs to perform a function of preventing contact between the two substrates 100 and 200 in the electric field exposure step and cuts off the final product afterwards, the cell region is dared. Like the cell spacer 260a of (10), it is not necessary to maintain a constant gap between the two substrates 100 and 200. Therefore, as shown in FIG. 4, even if the length is shorter than the cell spacer 260a of the cell region 10, only the contact between the two substrates 100 and 200 may be prevented in the cutting region 20.

While the present invention has been particularly shown and described with reference to exemplary embodiments thereof, it is clearly understood that the same is by way of illustration and example only and is not to be taken by way of limitation and that those skilled in the art will recognize that various modifications and equivalent arrangements may be made therein. It will be possible.

Accordingly, the true scope of protection of the present invention should be determined only by the appended claims.

10 ... cell area 20 ... cutting area
100 .. First substrate 110 .. First base substrate
120 .. gate insulating layer 130a ..semiconductor layer
130b ... omic contact layer 140 ... passivation layer
150 ..domain forming layer 152 ..embedded pattern
200 ..Second substrate 210 ..Second base substrate
220 ..black matrix 232,234,236 .. 1st, 2nd, 3rd color filter
240 ..overcoat layer 250 ..common electrode
260a, b, c ... spacer 300 ... liquid crystal layer
310 ..liquid crystal molecules 320 ..RM polymer
330 ..RM monomer 350 ... sealant
GL ..gate line DL ..data line
STL ..Storage Line SW ..Thin Film Transistor
PE ..pixel electrode SE ..source electrode
DE ..Drain electrode CNT ..Contact electrode
AL ..Alignment Film AP ..Active Pattern

Claims (13)

Liquid crystal molecules and liquid crystal molecules interposed between the first substrate having a pixel electrode and the embedded pattern, the second substrate provided with the common electrode, and the first and second substrates to form a liquid crystal domain according to the embedded pattern. A plurality of cell regions having a liquid crystal layer comprising a reactive mesogen polymer for fixing the ions; And a cutting region positioned between the plurality of cell regions, the cutting region including the first and second substrates extending from the cell region and at least one peripheral spacer interposed between the first and second substrates. ,
A first alignment layer connected to the pixel electrode and a second alignment layer connected to the common electrode extend from the cell region to the cutting region to face each other;
The peripheral spacers maintain a cell gap between the first substrate and the second substrate in the cutting region to prevent electrical short between the pixel electrode and the common electrode.
And the reactive mesogenic polymer is polymerized by exposing the reactive mesogen monomer to ultraviolet light in a state where a voltage is applied to the pixel electrode and the common electrode and a voltage is not applied. The liquid crystal display of claim 1, wherein the peripheral spacer is in contact with at least one of the first substrate and the second substrate. The method of claim 1,
The common electrode has no pattern for forming the liquid crystal domain. The method of claim 1,
And a cell spacer in the cell region. The method of claim 4, wherein
The cell spacer has the same shape as the peripheral spacer and includes the same material. The method of claim 4, wherein
And the cell spacer and the peripheral spacer are insulating materials. Manufacturing a first substrate including a pixel electrode and an embedding pattern; Manufacturing a second substrate including a common electrode facing the pixel electrode; Forming a plurality of cell regions sealed with a sealant between the first substrate and the second substrate and forming a liquid crystal layer therein; Forming at least one peripheral spacer interposed between the first substrate and the second substrate in the cutting region between the plurality of cell regions; And arranging the first alignment layer connected to the pixel electrode and the second alignment layer connected to the common electrode to extend from the cell region to the cutting region so as to face each other. To prevent electrical short between the electrode and the common electrode,
The forming of the liquid crystal layer may include interposing a liquid crystal composition including liquid crystal molecules and a reactive mesogenic monomer in the cell region, and exposing the liquid crystal composition to ultraviolet light to polymerize the mesogenic monomers into mesogenic polymers. And the liquid crystal molecules are arranged to form and form liquid crystal domains along the embedding pattern,
And the exposing step includes an electric field exposure step of exposing the pixel electrode and the common electrode in a state where a voltage is applied, and an electroless field exposure step of exposing it without a voltage. The method of claim 7, wherein the peripheral spacer is in contact with at least one of the first substrate and the second substrate. The method of claim 7, wherein
And a pattern for forming a liquid crystal domain on the common electrode. The method of claim 7, wherein
And forming a cell spacer in the cell region. The method of claim 10,
And forming the cell spacer and the peripheral spacer at the same time. The method of claim 10,
The cell spacer has the same shape as the peripheral spacer and includes the same material. The method of claim 12,
And the cell spacer and the peripheral spacer are insulating materials.

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