KR20120081745A - Method for manufacturing patterned phase retardation film - Google Patents

Abstract

PURPOSE: A method for manufacturing a patterned phase retardation film is provided to simply manufacture a patterned phase retardation film using a substrate which forms alignment features. CONSTITUTION: A substrate is rubbed in one direction to form alignment features. Masks are formed at a fixed interval on the substrate. The substrate is rubbed in another direction to form alignment features. The mask is removed. Photo curable monomer compositions are coated and hardened on the substrate.

Description

Method for Manufacturing Patterned Phase Retardation Film

The present invention relates to a method of manufacturing a patterned phase retardation film, and more particularly, to a method of manufacturing a patterned phase retardation film using a substrate capable of forming an orientation by rubbing directly without forming an alignment film. It relates to a patterned phase retardation film produced by the method.

As the information society develops, the demand for display devices is increasing in various forms, and various kinds of flat panel display devices have been developed and used. Among them, the liquid crystal display is a flat panel display which is widely used for various purposes. As such, various technical advances have been made in order to serve as a screen display device in various fields, and the goal is to realize high quality images while maintaining the characteristics of light weight, thinness, and low power consumption. Edo is also developing technology. The liquid crystal display includes a twisted nematic (TN) liquid crystal display, a vertically aligned liquid crystal display (VA), an in-plane switching (IPS) liquid crystal display, and an optically compensated bend (OCB) liquid crystal display depending on the arrangement and driving method of the liquid crystal. Etc. In these liquid crystal display devices, the liquid crystals initially form a predetermined array due to the influence of the alignment layer or the properties of the liquid crystal itself, but when the electric field is applied, the arrangement of the liquid crystals is changed. The image is displayed by changing the state depending on the arrangement state of the liquid crystal and making it appear as a difference in the amount of transmitted light using the polarizing plate.

In the birefringent STN-LCD, since the cell itself is birefringent, phase delay (light distortion) occurs in light that has passed through the liquid crystal cell. For this reason, in a STN panel, a phase delay film is used in parallel as a film for color compensation. Phase delay films have been developed as optical compensation for STN-specific interference colors (coloring) called blue mode or yellow mode caused by elliptical polarization. In the case of TFT-LCD, phase film as a color compensation film is unnecessary. However, in recent years, various phase retardation films have been laminated for the purpose of expanding the viewing angle and improving image quality, and a phase retardation film having various functions has been required. In addition, with the development of 3D stereoscopic image reproduction technology, a technology for making polarization directions of left and right eyes different from each other by using a patterned phase delay film has been developed. As the manufacturing technique of the phase delay film, there are a stretching technique and an alignment technique, and in particular, an alignment technique is necessary to consider all of polarization, reflection, refraction, interference, diffraction, and scattering.

As a technique for producing a patterned phase delay film or a liquid crystal panel alignment direction, a mask is disclosed in Japanese Patent Application Laid-Open No. 194-082784, Japanese Patent No. 44468864, Japanese Patent No. 3100473, Korean Patent Publication No. 2005-0000572, and the like. Although techniques such as use, rubbing, and light irradiation twice use are disclosed, there is a problem that the process is complicated and the elaboration is inferior.

In the present invention, when the patterned phase delay film is manufactured using a substrate capable of forming the orientation by rubbing without forming the alignment film as a result of the intensive efforts to solve the above problems, the number of the alignment agent layer forming step can be reduced The present invention can be simplified, and it has been confirmed that a phase delay film having a fine pattern can be manufactured, thereby completing the present invention.

SUMMARY OF THE INVENTION An object of the present invention is to provide a method for producing a patterned phase delay film in a simple process using a substrate which can be directly rubbed without forming an alignment film to form alignment properties, and a patterned phase delay film produced by the method. To provide.

In order to achieve the above object, the present invention comprises the steps of (a) rubbing the substrate in one direction to form an orientation; (b) attaching masks formed at regular intervals on the substrate on which the alignment is formed; (c) rubbing the substrate with the mask in a direction different from the step (a) to form an orientation; (d) removing the mask; And (e) coating and curing the photocurable monomer composition on the substrate from which the mask is removed.

The present invention also provides a method for forming an orientation by rubbing a substrate in one direction; (b) forming an alignment agent layer on the substrate on which the alignment property is formed at regular intervals; (c) irradiating the alignment layer with light to form alignment in a direction different from the step (a); And (e) coating and curing the photocurable monomer composition on the substrate on which the alignment is formed.

The present invention also includes the steps of (a) forming an alignment agent layer on a substrate at regular intervals; (b) rubbing the substrate on which the alignment layer is formed to form an orientation; And (c) coating and curing the photocurable monomer composition on the substrate on which the alignment is formed.

The present invention also provides a patterned phase delay film produced by the above method.

According to the present invention, since the orientation is formed by directly rubbing without forming the alignment film on the substrate itself, the number of the alignment film forming process can be reduced, thereby simplifying the process, thereby reducing the cost, and forming a fine pattern. A phase delay film can be manufactured. In addition, since the high temperature process previously performed for the formation of the alignment layer is not performed, the choice of the substrate can be widened.

1 shows a manufacturing process of a patterned phase delay film according to an embodiment of the present invention.
Figure 2 shows the manufacturing process of the patterned phase delay film according to another embodiment of the present invention.
Figure 3 shows a process for producing a patterned phase delay film according to another embodiment of the present invention.
4 is an image taken with a polarizing microscope of a phase delay film according to an embodiment of the present invention.

Unless defined otherwise, all technical and scientific terms used herein have the same meaning as commonly understood by one of ordinary skill in the art to which this invention belongs. In general, the nomenclature used herein and the experimental methods described below are well known and commonly used in the art.

The present invention in one aspect, (a) rubbing the substrate in one direction to form an orientation; (b) attaching masks formed at regular intervals on the substrate on which the alignment is formed; (c) rubbing the substrate with the mask in a direction different from the step (a) to form an orientation; (d) removing the mask; And (e) coating and curing the photocurable monomer composition on the substrate from which the mask is removed.

In the present invention, the substrate is characterized in that the orientation can be formed even if directly rubbing without forming the alignment film. In the prior art, a step of forming an alignment layer must be included in order to form an alignment on the substrate. However, in the present invention, a method of directly forming the alignment layer through a process of directly rubbing without forming the alignment layer on the substrate is used. In order to satisfy this process, the substrate may be selected from the group consisting of polyether sulfone (PES), polyimide (PI), cyclo olefin polymer (COP), polyethylene terephthalate (PET) and triacetyl cellulose (TAC). And another substrate made of a material capable of forming an orientation by rubbing directly on the substrate without forming the alignment layer. In the present invention, the substrate preferably has a durability that can withstand the rubbing process. The substrates are transparent materials, exhibit flexible properties, and can be used only in processes below 200 ° C in the case of COP and TAC, and high heat resistance in the case of PI, PES, and PET. . The rubbing process can use a conventionally known rubbing process.

In the present invention, the patterned mask is a portion that exposes the substrate and the portion that does not expose are arranged at regular intervals so that only the exposed portions at regular intervals when the rubbing process is formed, the orientation is formed in the rubbing process The well-known mask material used can be used. Since the mask is composed of an opening and a non-opening part, the secondary partial rubbing area becomes an opening, and since the entire area of the opening is not secondary rubbed due to the thickness of the mask, the primary and secondary rubbing areas are 1: 1. In other words, the openings and the non-openings of the mask should be configured so that the openings which are not 1: 1 are slightly wider.

1 shows a manufacturing process of a patterned phase delay film according to an embodiment of the present invention. Orientation is formed in the whole surface using the board | substrate which can form orientation by rubbing directly, without forming an orientation film. After the mask is attached to the substrate on which the alignment is formed, the substrate is exposed at regular intervals, and then a second rubbing process is performed in a direction different from the formed orientation direction. When the mask is removed, the portions not exposed by the mask are maintained in the primary alignment direction, and the exposed portions have a new secondary alignment direction to form a pattern. When the photocurable monomer is coated and cured on the substrate on which the pattern is formed, a patterned phase delay film is manufactured.

In the present invention, the portion exposed to the secondary rubbing forms a new orientation direction by the secondary rubbing, and the orientation formed in the primary rubbing does not remain. In an embodiment of the present invention, it was confirmed that after forming an orientation by rubbing directly without forming an alignment agent layer on the PI film, the second rubbing in a direction different from the first rubbing to form a new orientation. In addition, it was confirmed that the primary orientation direction did not remain in the film in which the new orientation was formed.

In the present invention, the first rubbing is a front rubbing process, and the second rubbing uses a method of pattern orientation using a mask. However, when using a substrate in which the primary orientation direction remains, the mask is also subjected to the first rubbing process. It is possible to do rubbing by exposing only the portions that will not be oriented in the secondary rubbing, without exposing the portions to be oriented in the secondary rubbing.

In the present invention, a photosensitive curable monomer (RM) is coated on a pattern oriented substrate and cured by ultraviolet light or the like to form a photocurable monomer layer, wherein the photocurable monomer layer delays the phase of polarized light. It will play a role. The patterned phase delay film according to the present invention is different in the direction and size of the phase retardation according to the patterned portion, and is configured such that the phase retardation direction / size alternately at regular intervals. In the present invention, the photocurable monomer composition is a liquid crystal compound having a polymerizable group, in particular, may have a functional group of an acrylic group, a vinyl ether group or an epoxide, and the composition mixture of the photocurable monomer composition is a crosslinking of the polymer To increase, it is possible to use a mixture of two or more polymerizable functional groups, for example polymerizable mesogenic compounds having mono- and di-reactive compounds and / or non-polar to polar compounds, and change the alignment profile by changing their compositional ratio. It may be. By controlling the thickness of the photocurable monomer layer, it is possible to adjust the phase delay size, and when the magnitude of the phase delay is λ / 4, the linearly polarized light can be changed into circularly polarized light. Λ is a sign indicating a wavelength of light whose phase is to be delayed.

In the present invention, the photocurable monomer layer can be carried out by applying a known coating process such as spin, comma, gravure, dip, slot die, silk screen, inkjet printing and the like. When the process is carried out by spin coating, the coating is first rotated for 20 to 25 seconds at 400 to 1000 rpm, and then coated at a thickness of 1 to 6 μm using a method for rotating at 2500 to 3500 rpm for 70 to 80 seconds. After the coating, the curing process is performed by drying at 60 ° C. for 1 minute and irradiating with 20 mW / cm ² ultraviolet rays for 1 minute. These conditions vary depending on the characteristics of the RM material.

In the present invention, the step (c) may be characterized in that to form an orientation in a direction perpendicular to the orientation direction formed in the step (a). When the patterned orientation directions are configured to be perpendicular to each other, and the photocurable monomer layer is applied and cured on such a substrate to have a λ / 4 phase retardation effect, the prepared patterned phase delay film produces linearly polarized light with left circle polarization and right circle. Can be changed to polarized light. The phase delay film thus prepared is mounted on a panel display that separates the left eye image and the right eye image, and polarized glasses separating the left circular polarization and the right circular polarization can realize 3D stereoscopic images.

According to another aspect of the present invention, there is provided a method for forming an orientation by rubbing a substrate in one direction; (b) forming an alignment agent layer on the substrate on which the alignment property is formed at regular intervals; (c) irradiating the alignment layer with light to form alignment in a direction different from the step (a); And (e) coating and curing the photocurable monomer composition on the substrate on which the alignment is formed.

Figure 2 shows the manufacturing process of the patterned phase delay film according to an embodiment of the present invention. Orientation is formed in the whole surface using the board | substrate which can form orientation by rubbing directly, without forming an orientation film. The pattern can be formed by forming the alignment agent layer on the substrate on which the alignment property is formed at regular intervals, and irradiating light to form the alignment of the portion where the alignment agent layer is formed in a direction different from the alignment direction of the portion formed on the substrate. When the photocurable monomer is coated and cured on the substrate on which the pattern is formed, a patterned phase delay film is manufactured.

The alignment agent used in the alignment agent layer is preferably an optical alignment agent capable of forming alignment by light irradiation, and may use a polymer material having alignment force through at least one reaction of photoisomerization, photolysis, and photocuring. . Usable aligning agents include polyimide, polyamic acid, polynorbornene, phenylmaleimide copolymer, polyvinylcinamate, polyazobenzene, Polyethyleneimide, Polyvinyl Alcohol, Polyamide, Polyethylene, Polystylene, Polyphenylenephthalamide, Polyester, CMPI (chloromethylated polyimide) ), Polyvinylcinnamate (PVC) (polyvinylcinnamate) and polymethyl methacrylate (polymethyl methacrylate). , DMF (dimethylformamide), NMP (NMethyl-pyrrolidone), chloroform (CHCl ₃ ) can be used. Coating of the alignment agent layer is made of an interval of 40 ~ 1000㎛ and a thickness of 0.5 ~ 1.3㎛, the thickness can be adjusted according to the viscosity and printing speed of the alignment agent, it is important to print at a constant interval and thickness. After the printing process is finished, in order to remove the solvent (solvent) of the alignment film and to cure the alignment film, it is left for 1 to 5 minutes at 75 ~ 85 ℃, and left for 15 to 30 minutes at 210 ~ 230 ℃. Conditions for removing the solvent and curing the alignment layer may vary depending on the boiling point and volatility of the solvent used.

In order to form the alignment layer at a predetermined interval and thickness, it is possible to use a printing process such as ink jet, silk-screen, micro-gravure, and the like. In addition to the printing process, photolithography ( photolithography) can be used, and it is possible to use other known methods that can form the alignment agent layer at a predetermined interval and thickness.

In the present invention, the step (c) may be characterized in that the polarization direction of the light is set so that the orientation is formed in a direction perpendicular to the alignment direction formed in the step (a). As described above, when the alignment directions patterned on the substrate are perpendicular to each other, the completed phase delay film may convert linearly polarized light into left circularly polarized light and right circularly polarized light, and this function may be used as a configuration for realizing 3D stereoscopic images. Can be. At this time, the polarization direction is set according to the alignment agent used, and in the case of CMPI, since the alignment is formed in the direction orthogonal to the polarization direction, the polarized light is irradiated in a direction parallel to the rubbing direction, and 10 to 50 mW / cm ² . The alignment process may be performed by irradiating the polarized ultraviolet rays in a few tens of seconds (10 to 30 seconds) for a long time (5 to 15 minutes). In addition, the wavelength and the irradiation time of the irradiated light vary depending on the alignment agent, and may be largely classified according to the kind of mechanism of photoalignment (photolysis, photoduplexing, photoisomerization). In the case of the photolysis method, a light alignment process is performed by irradiating light having a wavelength of 200 to 250 nm for 15 to 25 mW / cm ² with polarized ultraviolet rays for 1 to 10 minutes.

In another aspect, the present invention, (a) forming an alignment agent layer on the substrate at regular intervals; (b) rubbing the substrate on which the alignment layer is formed to form an orientation; And (c) coating and curing the photocurable monomer composition on the substrate on which the alignment is formed.

Figure 3 shows the manufacturing process of the patterned phase delay film according to an embodiment of the present invention. The rubbing process is performed without forming an alignment film, and the alignment agent layer is formed on a board | substrate which can form an orientation at regular intervals. It is preferable that the said aligning agent layer is comprised from the material which can produce orientation in a direction different from a rubbing direction. When the substrate on which the alignment agent layer is formed is rubbed in one direction, a portion in which the alignment agent layer is formed and a portion which is not formed may form alignment in different directions, thereby forming a pattern. When the photocurable monomer is coated and cured on the substrate on which the pattern is formed, a patterned phase delay film is manufactured.

In the present invention, the alignment agent layer is preferably a material capable of forming the orientation in a rubbing process, more preferably, the orientation is formed in a direction different from the rubbing direction. By using such a material, it is possible to form a patterned orientation through a single rubbing process, which can significantly lower the manufacturing process and cost. When the alignment agent is a material in which alignment is formed perpendicular to the rubbing direction, the patterned alignment may be configured to be perpendicular to each other. In this case, as described above, the completed phase delay film may change linear polarization to left circular polarization and right circular polarization. This function can be used as a configuration for implementing a 3D stereoscopic image.

In the present invention, the alignment agent may be a polystylene compound or CBDA-FDA (poly- (4,4 '-(9,9-fluorenyl) diphenylene cyclobutanyltetracarboximide). , 4 '-(9,9-fluorenyl) diphenylene cyclobutanyltetracarboximide is a polyimide-based compound that is oriented in a direction perpendicular to the rubbing direction.

Hereinafter, the present invention will be described in more detail with reference to Examples. It is to be understood by those skilled in the art that these embodiments are only for illustrating the present invention and that the scope of the present invention is not construed as being limited by these embodiments.

On the substrate twice Rubbing Orientation  Formation and Patterned  Phase Delay Film Manufacturing

In the present embodiment, when the primary rubbing is formed on the substrate to form the orientation, and the secondary rubbing is formed on the secondary rubbing, it was intended to confirm whether the primary orientation remained.

A TAC film was prepared in a size of 5 cm X 5 cm, and the first front rubbing was performed at a rotation speed of the rubbing roll at a rubbing machine at 600 rpm. After rubbing, a washing process for removing impurities was performed to prevent defects.

Secondary partial rubbing was performed at a rotational speed of the rubbing roll at 600 rpm in a direction perpendicular to the primary alignment direction using a rubbing machine on the half portion of the substrate on which the primary orientation was formed. In order to perform secondary partial rubbing, a rubbing metal mask was used. The metal mask is composed of an opening and a non-opening part, and the secondary partial rubbing area becomes an opening, and since the entire area of the opening is not secondary rubbed due to the thickness of the mask, the primary and secondary rubbing areas have a mutual 1: 1, the opening part and the non-opening part of a mask were comprised so that opening part which is not 1: 1 can be a little wider.

After performing secondary partial rubbing, 5 ml of photocurable monomer (RMS03-013C, Merck) was added dropwise, and the photocurable monomer layer having a thickness of 3 μm was formed through spin coating which rotates 23 seconds at 600 rpm and 70 seconds at 3000 rpm. Was formed, and the photocurable monomer layer was cured by 1 minute drying at 60 ° C. and 1 minute ultraviolet irradiation at 20 mW / cm ² to prepare a patterned phase delay film.

FIG. 4 is an image taken when the phase retardation film manufactured by the present embodiment is irradiated with polarized light and rotates the film to show a light passing through a predetermined portion of the film with a polarizing microscope. As shown in FIG. 4, a patterned structure appeared at regular intervals on the substrate, and the bright and dark regions were clearly distinguished to form an orientation in a direction in which the substrates were perpendicular to each other, and the orientation of the first rubbing was the second rubbing portion. It can be confirmed that it does not remain in.

On the substrate After rubbing Photo-alignment layer  Form Patterned  Preparation of Phase Delay Film

The PI film was prepared in a size of 5 cm X 5 cm, and the first front rubbing was performed at a rotation speed of the rubbing roll at a rubbing machine at 600 rpm. After rubbing, a washing process for removing impurities was performed to prevent defects.

Chromiumtylated polyimide (CMPI) dispersed in Cyclohexanone was printed on the surface of the substrate on which the alignment was formed through a rubbing process at a speed of 20 mm / min to form an alignment film having a thickness of 1 μm at intervals of 400 μm.

In order to evaporate the solvent of the alignment film (50 nm of the first alignment film after solvent evaporation) and to cure for 1 minute at 80 ° C. and 20 minutes at 220 ° C., the alignment direction formed by rubbing on the printed alignment film was orthogonal to the orientation direction formed. The polarized light was irradiated to form an orientation. In the CMPI used in this embodiment, since orientation is formed in a direction perpendicular to the polarization direction of light, the polarized light was irradiated in a direction parallel to the rubbing direction, and the optical alignment process was performed by irradiating polarized ultraviolet rays of 20 mW / cm ² for about 5 minutes. Was performed.

After performing the photoalignment process, 5 ml of the photocurable monomer (RMS03-013C, Merck) was added dropwise, and the photocurable monomer layer having a thickness of 3 μm was formed through spin coating which rotates 23 seconds at 600 rpm and rotates 30 seconds at 3000 rpm. Was formed, and the photocurable monomer layer was cured by 1 minute drying at 60 ° C. and 1 minute ultraviolet irradiation at 20 mW / cm ² to prepare a patterned phase delay film.

On the substrate Patterned  Forming an alignment layer Rubbing Patterned  Preparation of Phase Delay Film

A PI film was prepared in a size of 5 cm X 5 cm, and the polystyrene dispersed in NMP was printed on the surface of the PI film at a speed of 20 mm / min to form an alignment film having a thickness of 1 μm at intervals of 400 μm.

After evaporating and curing the solvent of the alignment film for 1 minute at 80 ° C. and 20 minutes at 220 ° C. (the thickness of the second alignment film after solvent evaporation is 50 nm), the rotational speed of the rubbing roll on the substrate on which the patterned alignment film is formed is The rubbing process was performed in one direction at 600 rpm. The orientation direction was formed in the rubbing direction of the substrate, and the alignment layer was formed so that the orientation direction was formed in a direction perpendicular to the rubbing direction by the characteristics of the alignment agent. After rubbing, a washing process for removing impurities was performed to prevent defects.

After performing the alignment process, 5 ml of a photocurable monomer (RMS03-013C, Merck) was added dropwise, and a photocurable monomer layer having a thickness of 3 μm was formed through spin coating which rotates 23 seconds at 600 rpm and 70 seconds at 3000 rpm. The photocurable monomer layer was cured by 1 minute drying at 60 ° C. and 1 minute ultraviolet irradiation at 20 mW / cm ² to prepare a patterned phase delay film.

Claims (23)

Method for producing a patterned phase retardation film comprising the following steps:
(a) rubbing the substrate in one direction to form orientation;
(b) attaching masks formed at regular intervals on the substrate on which the alignment is formed;
(c) rubbing the substrate with the mask in a direction different from the step (a) to form an orientation;
(d) removing the mask; And
(e) coating and curing the photocurable monomer composition on the substrate from which the mask has been removed.
The method of claim 1, wherein the step (a) comprises rubbing directly without forming an alignment layer on the substrate.
The method of claim 1, wherein the substrate is selected from the group consisting of polyether sulfone (PES), polyimide (PI), cyclo olefin polymer (COP), polyethylene terephthalate (PET) and triacetyl cellulose (TAC).
The method of claim 1, wherein step (c) forms an orientation in a direction perpendicular to the orientation direction formed in step (a).
The method of claim 1, wherein the photocurable monomer composition is a liquid crystal compound having a functional group of an acrylic group, a vinyl ether group or an epoxide.
2. The method of claim 1, wherein the photocurable monomer composition coating layer of step (e) delays the phase of [lambda] / 4.
Method for producing a patterned phase delay film comprising the following steps:
(a) rubbing the substrate in one direction to form an orientation;
(b) forming an alignment agent layer on the substrate on which the alignment property is formed at regular intervals;
(c) irradiating the alignment layer with light to form alignment in a direction different from the step (a); And
(e) coating and curing the photocurable monomer composition on the substrate on which the alignment is formed.
8. The method of claim 7, wherein the step (a) directly rubs without forming an alignment layer on the substrate.
The method of claim 7, wherein the substrate is selected from the group consisting of polyether sulfone (PES), polyimide (PI), cyclo olefin polymer (COP), polyethylene terephthalate (PET) and triacetyl cellulose (TAC).
The method of claim 7, wherein the alignment layer of step (b) is formed at regular intervals by ink jet, silk-screen, micro-gravure or photolithography. Characterized in that the method.
According to claim 7, wherein the alignment agent of step (b) polyimide (polyimide), polyamic acid (polyamic acid), polynorbornene (polynorbornene), phenylmaleimide copolymer (phenylmaleimide copolymer), polyvinyl cinnamate (polyvinylcinamate), polyazobenzene, polyethyleneimide, polyvinyl alcohol, polyimide, polyethylene, polystylene, polyphenylenephthalamide, Method selected from the group consisting of polyester (polyester), chloromethylated polyimide (CMPI), polyvinylcinnamate (PVC) and polymethyl methacrylate (polymethyl methacrylate).
8. The method of claim 7, wherein the step (c) sets the polarization direction of the light such that the orientation is formed in a direction perpendicular to the orientation direction formed in the step (a).
8. The method of claim 7, wherein said light is ultraviolet polarized at 10 to 50 mW / cm ² .
8. The method of claim 7, wherein the photocurable monomer composition is a liquid crystalline compound having a functional group of an acryl group, a vinyl ether group or an epoxide.
8. The method of claim 7, wherein the photocurable monomer composition coating layer of step (e) delays the phase of [lambda] / 4.
Method for producing a patterned phase delay film comprising the following steps:
(a) forming an alignment agent layer on the substrate at regular intervals;
(b) rubbing the substrate on which the alignment layer is formed to form an orientation; And
(c) coating and curing the photocurable monomer composition on the substrate on which the alignment is formed.
The method of claim 16, wherein the step (b) is characterized in that the alignment direction of the portion where the alignment agent layer is formed is different from the alignment direction of the portion where the alignment agent layer is not formed.
17. The method of claim 16, wherein the aligning agent is a material which is oriented perpendicular to the rubbing direction.
The method of claim 16, wherein the aligning agent is a polystylene compound or CBDA-FDA (poly- (4,4 '-(9,9-fluorenyl) diphenylene cyclobutanyltetracarboximide).
The method of claim 16, wherein the substrate is selected from the group consisting of polyether sulfone (PES), polyimide (PI), cyclo olefin polymer (COP), polyethylene terephthalate (PET) and triacetyl cellulose (TAC).
17. The method of claim 16, wherein the photocurable monomer composition is a liquid crystalline compound having a functional group of an acryl group, a vinyl ether group or an epoxide.
17. The method of claim 16, wherein the photocurable monomer composition coating layer of step (e) delays the phase of [lambda] / 4.
23. A patterned phase retardation film made by the method of any one of claims 1 to 22.

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