KR20090009801A - 두께 모드 변환기의 주파수 스윕핑을 구비한 메가소닉 처리장치 - Google Patents
두께 모드 변환기의 주파수 스윕핑을 구비한 메가소닉 처리장치 Download PDFInfo
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- KR20090009801A KR20090009801A KR1020087024727A KR20087024727A KR20090009801A KR 20090009801 A KR20090009801 A KR 20090009801A KR 1020087024727 A KR1020087024727 A KR 1020087024727A KR 20087024727 A KR20087024727 A KR 20087024727A KR 20090009801 A KR20090009801 A KR 20090009801A
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- transducers
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- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10N—ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10N30/00—Piezoelectric or electrostrictive devices
- H10N30/20—Piezoelectric or electrostrictive devices with electrical input and mechanical output, e.g. functioning as actuators or vibrators
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B06—GENERATING OR TRANSMITTING MECHANICAL VIBRATIONS IN GENERAL
- B06B—METHODS OR APPARATUS FOR GENERATING OR TRANSMITTING MECHANICAL VIBRATIONS OF INFRASONIC, SONIC, OR ULTRASONIC FREQUENCY, e.g. FOR PERFORMING MECHANICAL WORK IN GENERAL
- B06B1/00—Methods or apparatus for generating mechanical vibrations of infrasonic, sonic, or ultrasonic frequency
- B06B1/02—Methods or apparatus for generating mechanical vibrations of infrasonic, sonic, or ultrasonic frequency making use of electrical energy
- B06B1/0207—Driving circuits
- B06B1/0223—Driving circuits for generating signals continuous in time
- B06B1/0269—Driving circuits for generating signals continuous in time for generating multiple frequencies
- B06B1/0284—Driving circuits for generating signals continuous in time for generating multiple frequencies with consecutive, i.e. sequential generation, e.g. with frequency sweep
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B08—CLEANING
- B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
- B08B3/00—Cleaning by methods involving the use or presence of liquid or steam
- B08B3/04—Cleaning involving contact with liquid
- B08B3/10—Cleaning involving contact with liquid with additional treatment of the liquid or of the object being cleaned, e.g. by heat, by electricity or by vibration
- B08B3/12—Cleaning involving contact with liquid with additional treatment of the liquid or of the object being cleaned, e.g. by heat, by electricity or by vibration by sonic or ultrasonic vibrations
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
- H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
- H01L21/30—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26
- H01L21/302—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26 to change their surface-physical characteristics or shape, e.g. etching, polishing, cutting
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67011—Apparatus for manufacture or treatment
- H01L21/67017—Apparatus for fluid treatment
- H01L21/67028—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like
- H01L21/6704—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like for wet cleaning or washing
- H01L21/67057—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like for wet cleaning or washing with the semiconductor substrates being dipped in baths or vessels
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- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10N—ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10N30/00—Piezoelectric or electrostrictive devices
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- Microelectronics & Electronic Packaging (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Physics & Mathematics (AREA)
- Power Engineering (AREA)
- Mechanical Engineering (AREA)
- Cleaning By Liquid Or Steam (AREA)
- Apparatuses For Generation Of Mechanical Vibrations (AREA)
- Cleaning Or Drying Semiconductors (AREA)
- Oscillators With Electromechanical Resonators (AREA)
- Piezo-Electric Or Mechanical Vibrators, Or Delay Or Filter Circuits (AREA)
- Surface Acoustic Wave Elements And Circuit Networks Thereof (AREA)
Abstract
Description
Claims (8)
- 각각 적어도 300 KHz 의 기본 공진 주파수를 갖는 하나 이상의 압전식 변환기;처리되어야 하는 하나 이상의 부품과 유체를 담도록 적합화된 탱크로서, 상기 하나 이상의 변환기는 탱크와 그 내용물에 진동을 제공하도록 적합화되는, 탱크; 및모든 변환기들의 공진 주파수들을 포함하는 주파수 범위에 걸쳐서 가변적 주파수로 구동신호를 공급하기 위하여 변환기에 연결되는 발생기;를 포함하는, 메가소닉 처리 장치.
- 제 1 항에 있어서,발생기는 조정가능한 스윕핑 속도(sweep rate) 및 조정가능한 주파수 범위를 갖는, 메가소닉 처리 장치.
- 제 2 항에 있어서,스윕핑 속도는 50 내지 1200 의 초당 스윕핑(sweeps per second) 범위 내에 있는, 메가소닉 처리 장치.
- 제 1 항에 있어서,메가소닉 처리 장치는 적어도 네 개의 변환기들과 두 개의 발생기들을 구비하고, 변환기들은 유사한 공진 주파수들끼리 그룹화되며, 각 변환기 그룹은 가변적 주파수를 갖는 구동신호를 발생시키는 개별의 발생기로부터 동력을 받고, 상기 가변적 주파수는 관련된 그룹의 변환기들 모두의 공진 주파수들을 포함하는 주파수 범위 내에서 변화하는, 메가소닉 처리 장치.
- 제 1 항에 있어서,상기 압전식 변환기들은 두께 모드로 작동하는, 메가소닉 처리 장치.
- 처리되어야 하는 하나 이상의 부품 및 유체를 담도록 각각 적합화된 두 개 이상의 탱크들;각 탱크에 연결된 하나 이상의 압전식 변환기들로서, 각각 적어도 300 KHz 의 기본 공진 주파수를 가지며, 탱크 및 그 내용물에 진동을 제공할 수 있는, 변환기들;변환기들에 구동신호를 공급하기 위하여 변환기들에 연결된 둘 이상의 발생기들로서, 변환기들은 유사한 공진 주파수들끼리 그룹화되고, 변환기 그룹 각각은 가변적 주파수를 갖는 구동신호를 발생시키는 개별의 발생기에 의하여 동력을 받으며, 상기 가변적 주파수는 관련된 그룹의 변환기들 모두의 공진 주파수들을 포함하는 주파수 범위 내에서 변화하는, 발생기들;을 포함하는, 메가소닉 처리 시스템.
- 두께 모드 진동으로 적어도 300 KHz 의 주파수에서 기본 공진 주파수를 각각 갖는 하나 이상의 압전식 변환기;세정되어야 하는 하나 이상의 부품 및 세정용 유체를 담도록 적합화된 탱크로서, 상기 하나 이상의 변환기들은 탱크 내의 부품들 및 세정용 유체에 진동을 제공하도록 적합화되는, 탱크;미리 정해진 주파수 범위 및 스윕핑 속도로 구동신호를 공급하기 위하여 상기 하나 이상의 변환기에 연결된 발생기로서, 상기 주파수 범위는 상기 하나 이상의 변환기 모두의 공진 주파수를 포함하고, 발생기는 구동신호에 관한 스윕핑 속도 및 스윕핑 주파수 범위를 정의하기 위한 프로그램가능한 수단을 포함하는, 발생기;를 포함하는, 메가소닉 세정 장치.
- 적어도 300 KHz 의 기본 공진 주파수를 각각 갖는 하나 이상의 압전식 변환기를 제공하는, 압전식 변환기 제공단계;처리되어야 하는 하나 이상의 부품들 및 유체를 담도록 적합화된 탱크를 제공하는 단계로서, 상기 하나 이상의 변환기는 탱크에 연결되고 또한 탱크 및 그 내용물에 진동을 제공하도록 적합화된, 탱크 제공단계;구동신호를 발생시키고 구동신호를 변환기들에 공급하는 단계로서, 구동신호는 모든 변환기들의 공진 주파수들을 포함하는 주파수 범위에 걸쳐 있는 가변적 주파수를 갖는, 구동신호 공급단계;를 포함하는, 메가소닉 처리 방법.
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US78321306P | 2006-03-17 | 2006-03-17 | |
| US60/783,213 | 2006-03-17 | ||
| PCT/US2007/006885 WO2007109255A2 (en) | 2006-03-17 | 2007-03-18 | Megasonic processing apparatus with frequency sweeping of thickness mode transducers |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| KR20090009801A true KR20090009801A (ko) | 2009-01-23 |
| KR101095912B1 KR101095912B1 (ko) | 2011-12-21 |
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Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| KR1020087024727A Active KR101095912B1 (ko) | 2006-03-17 | 2007-03-18 | 두께 모드 변환기의 주파수 스윕핑을 구비한 메가소닉 처리장치 |
Country Status (13)
| Country | Link |
|---|---|
| US (2) | US7598654B2 (ko) |
| EP (1) | EP1997159B1 (ko) |
| JP (1) | JP5328044B2 (ko) |
| KR (1) | KR101095912B1 (ko) |
| CN (1) | CN101517766B (ko) |
| AU (1) | AU2007227293B2 (ko) |
| CA (1) | CA2645933C (ko) |
| DK (1) | DK1997159T3 (ko) |
| ES (1) | ES2527092T3 (ko) |
| MX (1) | MX2008011778A (ko) |
| MY (1) | MY157699A (ko) |
| TW (1) | TWI393595B (ko) |
| WO (1) | WO2007109255A2 (ko) |
Cited By (1)
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| WO2015190734A1 (ko) * | 2014-06-12 | 2015-12-17 | 한국세라믹기술원 | 스위핑 구동신호를 이용한 배관 내부 부산물 부착 방지 장치 |
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2007
- 2007-03-16 TW TW096109171A patent/TWI393595B/zh active
- 2007-03-18 JP JP2009501502A patent/JP5328044B2/ja active Active
- 2007-03-18 CN CN200780017619.1A patent/CN101517766B/zh active Active
- 2007-03-18 DK DK07753508T patent/DK1997159T3/en active
- 2007-03-18 MX MX2008011778A patent/MX2008011778A/es active IP Right Grant
- 2007-03-18 AU AU2007227293A patent/AU2007227293B2/en active Active
- 2007-03-18 KR KR1020087024727A patent/KR101095912B1/ko active Active
- 2007-03-18 EP EP07753508.6A patent/EP1997159B1/en not_active Revoked
- 2007-03-18 US US11/725,331 patent/US7598654B2/en not_active Expired - Lifetime
- 2007-03-18 MY MYPI20083626A patent/MY157699A/en unknown
- 2007-03-18 WO PCT/US2007/006885 patent/WO2007109255A2/en not_active Ceased
- 2007-03-18 CA CA2645933A patent/CA2645933C/en active Active
- 2007-03-18 ES ES07753508.6T patent/ES2527092T3/es active Active
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Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2015190734A1 (ko) * | 2014-06-12 | 2015-12-17 | 한국세라믹기술원 | 스위핑 구동신호를 이용한 배관 내부 부산물 부착 방지 장치 |
Also Published As
| Publication number | Publication date |
|---|---|
| WO2007109255A3 (en) | 2007-12-21 |
| DK1997159T3 (en) | 2015-03-30 |
| AU2007227293A1 (en) | 2007-09-27 |
| WO2007109255A2 (en) | 2007-09-27 |
| CA2645933C (en) | 2012-01-03 |
| TW200810849A (en) | 2008-03-01 |
| TWI393595B (zh) | 2013-04-21 |
| CA2645933A1 (en) | 2007-09-27 |
| US8310131B2 (en) | 2012-11-13 |
| US20070182285A1 (en) | 2007-08-09 |
| ES2527092T3 (es) | 2015-01-20 |
| US20100012148A1 (en) | 2010-01-21 |
| KR101095912B1 (ko) | 2011-12-21 |
| AU2007227293B2 (en) | 2011-09-15 |
| US7598654B2 (en) | 2009-10-06 |
| EP1997159B1 (en) | 2014-12-17 |
| CN101517766A (zh) | 2009-08-26 |
| MY157699A (en) | 2016-07-15 |
| JP2009530856A (ja) | 2009-08-27 |
| EP1997159A4 (en) | 2010-11-03 |
| HK1127438A1 (en) | 2009-09-25 |
| EP1997159A2 (en) | 2008-12-03 |
| JP5328044B2 (ja) | 2013-10-30 |
| CN101517766B (zh) | 2015-11-25 |
| MX2008011778A (es) | 2009-01-14 |
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