KR20080103238A - Structure of decorative multi-layer coating film with trivalent chromium plating layer as outermost layer and not using nickel and plating method - Google Patents
Structure of decorative multi-layer coating film with trivalent chromium plating layer as outermost layer and not using nickel and plating method Download PDFInfo
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- KR20080103238A KR20080103238A KR1020070050276A KR20070050276A KR20080103238A KR 20080103238 A KR20080103238 A KR 20080103238A KR 1020070050276 A KR1020070050276 A KR 1020070050276A KR 20070050276 A KR20070050276 A KR 20070050276A KR 20080103238 A KR20080103238 A KR 20080103238A
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- plating layer
- plating
- layer
- noble metal
- nickel
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- 238000007747 plating Methods 0.000 title claims abstract description 301
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 title claims abstract description 80
- VYZAMTAEIAYCRO-UHFFFAOYSA-N Chromium Chemical compound [Cr] VYZAMTAEIAYCRO-UHFFFAOYSA-N 0.000 title claims abstract description 60
- 229910052804 chromium Inorganic materials 0.000 title claims abstract description 59
- 239000011651 chromium Substances 0.000 title claims abstract description 59
- 229910052759 nickel Inorganic materials 0.000 title claims abstract description 40
- 238000000034 method Methods 0.000 title claims abstract description 37
- 239000011248 coating agent Substances 0.000 title claims abstract description 10
- 238000000576 coating method Methods 0.000 title claims abstract description 10
- 229910000510 noble metal Inorganic materials 0.000 claims abstract description 47
- 229910052802 copper Inorganic materials 0.000 claims abstract description 37
- 239000010949 copper Substances 0.000 claims abstract description 37
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 claims abstract description 36
- BQCADISMDOOEFD-UHFFFAOYSA-N Silver Chemical compound [Ag] BQCADISMDOOEFD-UHFFFAOYSA-N 0.000 claims abstract description 33
- 229910052709 silver Inorganic materials 0.000 claims abstract description 33
- 239000004332 silver Substances 0.000 claims abstract description 33
- 229910045601 alloy Inorganic materials 0.000 claims abstract description 21
- 239000000956 alloy Substances 0.000 claims abstract description 21
- 239000010970 precious metal Substances 0.000 claims abstract description 20
- 229910002056 binary alloy Inorganic materials 0.000 claims abstract description 6
- 229910002058 ternary alloy Inorganic materials 0.000 claims abstract description 6
- 238000005034 decoration Methods 0.000 claims abstract 2
- 229910052737 gold Inorganic materials 0.000 claims description 29
- 239000010931 gold Substances 0.000 claims description 29
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 claims description 26
- 229910052751 metal Inorganic materials 0.000 claims description 24
- 239000002184 metal Substances 0.000 claims description 24
- BASFCYQUMIYNBI-UHFFFAOYSA-N platinum Chemical group [Pt] BASFCYQUMIYNBI-UHFFFAOYSA-N 0.000 claims description 14
- 238000009713 electroplating Methods 0.000 claims description 5
- 238000007772 electroless plating Methods 0.000 claims description 4
- 230000007797 corrosion Effects 0.000 abstract description 25
- 238000005260 corrosion Methods 0.000 abstract description 25
- 238000005299 abrasion Methods 0.000 abstract description 12
- KDLHZDBZIXYQEI-UHFFFAOYSA-N Palladium Chemical compound [Pd] KDLHZDBZIXYQEI-UHFFFAOYSA-N 0.000 description 25
- PDYXSJSAMVACOH-UHFFFAOYSA-N [Cu].[Zn].[Sn] Chemical compound [Cu].[Zn].[Sn] PDYXSJSAMVACOH-UHFFFAOYSA-N 0.000 description 15
- 239000002585 base Substances 0.000 description 14
- 229910052763 palladium Inorganic materials 0.000 description 12
- XFXPMWWXUTWYJX-UHFFFAOYSA-N Cyanide Chemical compound N#[C-] XFXPMWWXUTWYJX-UHFFFAOYSA-N 0.000 description 8
- 229910001297 Zn alloy Inorganic materials 0.000 description 7
- 229920000122 acrylonitrile butadiene styrene Polymers 0.000 description 7
- JOPOVCBBYLSVDA-UHFFFAOYSA-N chromium(6+) Chemical compound [Cr+6] JOPOVCBBYLSVDA-UHFFFAOYSA-N 0.000 description 7
- TVZPLCNGKSPOJA-UHFFFAOYSA-N copper zinc Chemical compound [Cu].[Zn] TVZPLCNGKSPOJA-UHFFFAOYSA-N 0.000 description 7
- 206010020751 Hypersensitivity Diseases 0.000 description 6
- 208000026935 allergic disease Diseases 0.000 description 6
- 230000007815 allergy Effects 0.000 description 6
- KUNSUQLRTQLHQQ-UHFFFAOYSA-N copper tin Chemical compound [Cu].[Sn] KUNSUQLRTQLHQQ-UHFFFAOYSA-N 0.000 description 6
- -1 platinum group metals Chemical class 0.000 description 6
- 230000000694 effects Effects 0.000 description 5
- 239000000126 substance Substances 0.000 description 4
- GZCWPZJOEIAXRU-UHFFFAOYSA-N tin zinc Chemical compound [Zn].[Sn] GZCWPZJOEIAXRU-UHFFFAOYSA-N 0.000 description 4
- 239000000919 ceramic Substances 0.000 description 3
- 230000000052 comparative effect Effects 0.000 description 3
- 239000004020 conductor Substances 0.000 description 3
- 239000000463 material Substances 0.000 description 3
- 150000002739 metals Chemical class 0.000 description 3
- 239000000088 plastic resin Substances 0.000 description 3
- NLXLAEXVIDQMFP-UHFFFAOYSA-N Ammonia chloride Chemical compound [NH4+].[Cl-] NLXLAEXVIDQMFP-UHFFFAOYSA-N 0.000 description 2
- VEXZGXHMUGYJMC-UHFFFAOYSA-M Chloride anion Chemical compound [Cl-] VEXZGXHMUGYJMC-UHFFFAOYSA-M 0.000 description 2
- 229910018487 Ni—Cr Inorganic materials 0.000 description 2
- FAPWRFPIFSIZLT-UHFFFAOYSA-M Sodium chloride Chemical compound [Na+].[Cl-] FAPWRFPIFSIZLT-UHFFFAOYSA-M 0.000 description 2
- 239000002253 acid Substances 0.000 description 2
- 230000015572 biosynthetic process Effects 0.000 description 2
- 239000003795 chemical substances by application Substances 0.000 description 2
- VNNRSPGTAMTISX-UHFFFAOYSA-N chromium nickel Chemical compound [Cr].[Ni] VNNRSPGTAMTISX-UHFFFAOYSA-N 0.000 description 2
- 238000004090 dissolution Methods 0.000 description 2
- PDHBRMFYIFYPQM-UHFFFAOYSA-N gold silver Chemical compound [Ag].[Au].[Au] PDHBRMFYIFYPQM-UHFFFAOYSA-N 0.000 description 2
- 239000007788 liquid Substances 0.000 description 2
- 238000004519 manufacturing process Methods 0.000 description 2
- 239000000615 nonconductor Substances 0.000 description 2
- 229920003023 plastic Polymers 0.000 description 2
- 239000004033 plastic Substances 0.000 description 2
- 229920000642 polymer Polymers 0.000 description 2
- 150000003839 salts Chemical class 0.000 description 2
- LFAGQMCIGQNPJG-UHFFFAOYSA-N silver cyanide Chemical compound [Ag+].N#[C-] LFAGQMCIGQNPJG-UHFFFAOYSA-N 0.000 description 2
- 229940098221 silver cyanide Drugs 0.000 description 2
- 238000005507 spraying Methods 0.000 description 2
- 238000003892 spreading Methods 0.000 description 2
- 239000000758 substrate Substances 0.000 description 2
- 241000242757 Anthozoa Species 0.000 description 1
- 235000014653 Carica parviflora Nutrition 0.000 description 1
- KJTLSVCANCCWHF-UHFFFAOYSA-N Ruthenium Chemical compound [Ru] KJTLSVCANCCWHF-UHFFFAOYSA-N 0.000 description 1
- ATJFFYVFTNAWJD-UHFFFAOYSA-N Tin Chemical compound [Sn] ATJFFYVFTNAWJD-UHFFFAOYSA-N 0.000 description 1
- HCHKCACWOHOZIP-UHFFFAOYSA-N Zinc Chemical compound [Zn] HCHKCACWOHOZIP-UHFFFAOYSA-N 0.000 description 1
- 230000002411 adverse Effects 0.000 description 1
- 239000003513 alkali Substances 0.000 description 1
- 230000000172 allergic effect Effects 0.000 description 1
- 235000019270 ammonium chloride Nutrition 0.000 description 1
- 208000010668 atopic eczema Diseases 0.000 description 1
- FLNKWZNWHZDGRT-UHFFFAOYSA-N azane;dihydrochloride Chemical compound [NH4+].[NH4+].[Cl-].[Cl-] FLNKWZNWHZDGRT-UHFFFAOYSA-N 0.000 description 1
- 229910052793 cadmium Inorganic materials 0.000 description 1
- BDOSMKKIYDKNTQ-UHFFFAOYSA-N cadmium atom Chemical compound [Cd] BDOSMKKIYDKNTQ-UHFFFAOYSA-N 0.000 description 1
- 238000007796 conventional method Methods 0.000 description 1
- 230000003247 decreasing effect Effects 0.000 description 1
- 230000032798 delamination Effects 0.000 description 1
- 230000006866 deterioration Effects 0.000 description 1
- 238000003912 environmental pollution Methods 0.000 description 1
- 238000005530 etching Methods 0.000 description 1
- 229910001385 heavy metal Inorganic materials 0.000 description 1
- 230000008595 infiltration Effects 0.000 description 1
- 238000001764 infiltration Methods 0.000 description 1
- 239000012212 insulator Substances 0.000 description 1
- 229910052741 iridium Inorganic materials 0.000 description 1
- GKOZUEZYRPOHIO-UHFFFAOYSA-N iridium atom Chemical compound [Ir] GKOZUEZYRPOHIO-UHFFFAOYSA-N 0.000 description 1
- 238000010030 laminating Methods 0.000 description 1
- 210000004185 liver Anatomy 0.000 description 1
- QSHDDOUJBYECFT-UHFFFAOYSA-N mercury Chemical compound [Hg] QSHDDOUJBYECFT-UHFFFAOYSA-N 0.000 description 1
- 229910052753 mercury Inorganic materials 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 230000007935 neutral effect Effects 0.000 description 1
- 238000010422 painting Methods 0.000 description 1
- 229910052697 platinum Inorganic materials 0.000 description 1
- 238000002203 pretreatment Methods 0.000 description 1
- 229910052703 rhodium Inorganic materials 0.000 description 1
- 239000010948 rhodium Substances 0.000 description 1
- MHOVAHRLVXNVSD-UHFFFAOYSA-N rhodium atom Chemical compound [Rh] MHOVAHRLVXNVSD-UHFFFAOYSA-N 0.000 description 1
- 229910052707 ruthenium Inorganic materials 0.000 description 1
- 239000004576 sand Substances 0.000 description 1
- 239000011780 sodium chloride Substances 0.000 description 1
- 239000000057 synthetic resin Substances 0.000 description 1
- 229920003002 synthetic resin Polymers 0.000 description 1
- 229910052718 tin Inorganic materials 0.000 description 1
- 239000011135 tin Substances 0.000 description 1
- 238000001771 vacuum deposition Methods 0.000 description 1
- 239000002966 varnish Substances 0.000 description 1
- 238000005406 washing Methods 0.000 description 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 1
- 238000004383 yellowing Methods 0.000 description 1
- 229910052725 zinc Inorganic materials 0.000 description 1
- 239000011701 zinc Substances 0.000 description 1
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Classifications
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C28/00—Coating for obtaining at least two superposed coatings either by methods not provided for in a single one of groups C23C2/00 - C23C26/00 or by combinations of methods provided for in subclasses C23C and C25C or C25D
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C18/00—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
- C23C18/16—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by reduction or substitution, e.g. electroless plating
- C23C18/31—Coating with metals
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C18/00—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
- C23C18/16—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by reduction or substitution, e.g. electroless plating
- C23C18/31—Coating with metals
- C23C18/42—Coating with noble metals
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C22/00—Chemical surface treatment of metallic material by reaction of the surface with a reactive liquid, leaving reaction products of surface material in the coating, e.g. conversion coatings, passivation of metals
- C23C22/05—Chemical surface treatment of metallic material by reaction of the surface with a reactive liquid, leaving reaction products of surface material in the coating, e.g. conversion coatings, passivation of metals using aqueous solutions
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C2222/00—Aspects relating to chemical surface treatment of metallic material by reaction of the surface with a reactive medium
- C23C2222/10—Use of solutions containing trivalent chromium but free of hexavalent chromium
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- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- General Chemical & Material Sciences (AREA)
- Electroplating Methods And Accessories (AREA)
- Other Surface Treatments For Metallic Materials (AREA)
Abstract
본 발명은 3가크롬도금층을 최외층으로 하며 니켈을 사용하지 않는 장식용 다층도금피막의 구조와 그 도금방법에 관한 것으로, 그 목적은 동 또는 합금도금층에 도금층간 밀착력과 내식성이 뛰어난 샌드위치형 3중 도금층을 형성하고, 이에 3가 크롬도금층을 형성하여, 니켈도금층 없이 우수한 내식성, 내마모성 및 기계적 물성을 구비한 3가크롬도금층을 최외층으로 하며 니켈을 사용하지 않는 장식용 다층도금피막의 구조와 그 도금방법을 제공하는 것이다.The present invention relates to a structure of a multi-layered coating film for decoration as the outermost layer of a trivalent chromium plating layer without using nickel and a plating method thereof, and an object thereof is a sandwich type triple layer having excellent adhesion and corrosion resistance between plating layers on copper or alloy plating layers. Forming a plating layer, and forming a trivalent chromium plating layer, the structure of a decorative multilayer plating film having no trivalent chromium plating layer having excellent corrosion resistance, abrasion resistance, and mechanical properties without a nickel plating layer as an outermost layer and not using nickel, and its plating To provide a way.
본 발명은 피도체에 동, 2원합금 또는 3원합금에 의해 하지도금층을 형성하고, 상기 합금도금층상에 귀금속 스트라이크 도금층, 은도금층, 귀금속 도금층을 순차적으로 적층하여 샌드위치형 귀금속 3중도금층을 형성하며, 상기 샌드위치형 귀금속 3중도금층상에 3가크롬도금층을 형성하여, 니켈을 포함하지 않는 다층 3가크롬도금피막 구조를 형성하도록 되어 있다. The present invention forms a base plating layer by copper, binary alloy or ternary alloy on the object, and sequentially stacks the precious metal strike plating layer, the silver plating layer and the precious metal plating layer on the alloy plating layer to form a sandwich type precious metal triple plating layer. The trivalent chromium plating layer is formed on the sandwich-type noble metal triple plating layer to form a multilayer trivalent chromium plating film structure containing no nickel.
Description
도 1 은 본 발명에 따른 다층 도금피막 구조를 보인 예시도1 is an exemplary view showing a multi-layer plating film structure according to the present invention
* 도면의 주요부분에 대한 부호의 설명* Explanation of symbols for main parts of the drawings
(10) : 피도체 (20) : 하지도금층(10): Substrate (20): Underplating layer
(21) : 무전해 동도금층 (22) : 전기동도금층(21): electroless copper plating layer (22): electric copper plating layer
(23) : 합금도금층(23): alloy plating layer
(30) : 샌드위치형 귀금속 3중도금층(30): sandwich type precious metal triple plating layer
(31) : 귀금속 스트라이크 도금층 (32) : 은도금층(31): Precious metal strike plating layer (32): Silver plated layer
(33) : 귀금속 도금층 (40) : 3가크롬도금층(33): Precious metal plating layer (40): Trivalent chromium plating layer
본 발명은 니켈알레르기를 일으키지 않는 다층 3가크롬도금피막 구조와 이를 형성하기 위한 무니켈 3가 크롬도금방법에 관한 것으로, 샌드위치형 3중 도금층을 형성하고, 이에 3가크롬도금층을 형성하여 니켈층을 형성하지 않고 금속층간의 밀착력을 향상시키고, 우수한 내식성, 내마모성을 구비하는 니켈알레르기를 일으키지 않는 다층 3가크롬도금피막 구조와 이를 형성하기 위한 무니켈 3가 크롬도금방법에 관한 것이다.The present invention relates to a multi-layered trivalent chromium plating film structure that does not cause nickel allergy, and to a nickel-free trivalent chromium plating method for forming the same, forming a sandwich-type triple plating layer, and forming a trivalent chromium plating layer thereon to form a nickel layer. The present invention relates to a multi-layer trivalent chromium plated film structure which does not form a metal, improves adhesion between metal layers, does not cause nickel allergy having excellent corrosion resistance and abrasion resistance, and a nickel-free trivalent chromium plating method for forming the same.
일반적으로 금속과 같은 전도체, 합성수지, 세라믹과 같은 부도체 등은 일반 가전제품이나 각종 산업분야에서 실로 방대하게 사용되고 있으며, 이와 같은 소재에 금속도금을 형성하여 평활성, 광택성 및 장식질감을 부여하고, 이를 통해 품격을 향상시키는 방안이 널리 사용되고 있다. In general, conductors such as metals, synthetic resins, and non-conductors such as ceramics are widely used in general household appliances or various industrial fields, and metal plating is formed on such materials to provide smoothness, gloss, and decorative texture. The way to improve the dignity is widely used.
최근 지구환경보호 및 인간의 생활환경 개선을 위하여 인체에 유해한 중금속의 사용을 제한하거나 금지하고 있으며, 특히, 가전제품, 액세서리 등 인체와 직접 접촉할 가능성이 큰 제품 등의 외장용도에는 납, 카드뮴, 수은, 6가크롬 등의 사용을 전면금지하는 추세이다. 이에 대응하기 위하여 6가크롬을 대신하여 3가크롬도금을 이용하는 기술도 개발되어 실용되어지고 있지만, 3가크롬도금피막은 6가크롬도금피막에 비해 내식성면에서 현저히 저하되는 경향이 있어 그 활용도가 낮아 내식성과 내마모성이 뛰어난 니켈도금피막상에서만 일부적용되어져 왔다. Recently, the use of heavy metals that are harmful to the human body is restricted or prohibited to protect the global environment and improve the human living environment.In particular, lead, cadmium, Mercury and hexavalent chromium have been banned. In order to cope with this, a technique of using trivalent chromium plating instead of hexavalent chromium has been developed and put into practice, but the trivalent chromium coating tends to be considerably lowered in corrosion resistance compared to the hexavalent chromium coating, so its utilization is It has been applied in part only to nickel plated film having excellent corrosion resistance and abrasion resistance.
그러나, 최근 북유럽을 포함한 세계 여러지역에서 니켈알레르기에 대한 피해 사례가 속속 보고되고, 실제, 인종이나 종족에 따라 니켈알레르기에 대한 반응은 인구의 절반에 가까운 빈도로 양성반응을 보이는 경우도 있어 니켈사용의 금지도 빠른 속도로 확산되어지고 있으며, 니켈과 6가크롬을 대신할 수 있는 도금법의 개발이 시급한 시점이다. However, recent cases of damage to nickel allergy have been reported one after another in many parts of the world, including Northern Europe. Actually, depending on race or race, the reaction to nickel allergy is positive in almost half of the population. The prohibition of is spreading rapidly, and it is urgent to develop a plating method that can replace nickel and hexavalent chromium.
상기 3가크롬도금법은 이미 수년전부터 6가크롬도금법을 대체하여 실용화되어 왔으나 니켈상에서만 부분적으로 이용되어졌을 뿐 빠르게 확산적용이 되어지지 않고 있었는데, 최근 니켈도금의 적용 조차 규제되어져 가는 상황이 되어 3가크롬도금의 이용마저 점차적으로 어려워지게 되어 크롬의 뛰어난 물성에도 불구하고 크롬도금을 이용한 외장품의 생산은 급격히 감소 되어왔다.The trivalent chromium plating method has been practically used to replace the hexavalent chromium plating method for many years, but it was only partially used on nickel but was not rapidly spreading. Recently, even the application of nickel plating has been restricted. Even with the use of chromium plating, the use of chromium plating has decreased dramatically despite the excellent properties of chromium.
이에 대응하여, 니켈을 사용하지 않는 여러가지 3가크롬도금법들이 속속 개발되어져 나오고는 있지만, 내식성 및 내마모성이 종래의 니켈상의 6가크롬도금법에 비해 현저히 떨어져 사실상 폭넓게 적용되어질 수 없게 되었다. Correspondingly, various trivalent chromium plating methods that do not use nickel have been developed one after another, but corrosion resistance and abrasion resistance are significantly lower than conventional hexavalent chromium plating methods on nickel, and thus cannot be widely applied.
종래에 사용되어지고 있는 니켈과 크롬을 사용하지 않는 도금방법으로는 구리-주석-아연을 이용하는 3원합금 또는 구리-주석을 이용하는 2원합금 도금 및, 귀금속 등을 이용하는 도금방법들이 개발되어져 액세서리 및 여러가지 장식목적으로 일부 이용되어지고 있으나, 니켈을 하지층으로 한 6가크롬도금에 비해 내식성이 현저히 낮고 내마모성 및 기계적 물성도 현저히 낮아 제한적으로만 이용되어지고 있었다. As a plating method that does not use nickel and chromium, which are conventionally used, ternary alloys using copper-tin-zinc or binary alloys using copper-tin and plating methods using noble metals have been developed. Although it is partially used for various decorative purposes, the corrosion resistance is significantly lower and the wear resistance and mechanical properties are significantly lower than those of hexavalent chromium plating with nickel as a base layer.
또한 상기와 같은 종래의 방법은 외관적으로 기존의 니켈/크롬도금의 색감과 동일한 장식효과를 구현하지 못하고 있어, 3가크롬을 최상층으로 하는 도금수법을 이용하기도 하지만, 3가크롬도금액의 화학적 영향으로 합금도금층의 내식성은 오히려 더 나빠져 3가크롬의 하지층으로 그대로 이용할 수는 없는 실정이다. In addition, the conventional method as described above does not realize the same decorative effect as the color of the conventional nickel / chromium plating, it may use a plating method with a trivalent chromium as the top layer, but the chemical of the trivalent chromium plating solution Corrosion resistance of the alloy plating layer is rather worse due to the effect is not used as a base layer of trivalent chromium.
또한, 니켈을 사용하지 않고 내식성을 확보하기 위한 수단으로, 구리도금 또는 상기 구리-주석-아연 합금도금 또는 구리-주석 합금도금 등으로 하지도금층을 형성한 후에 3가크롬도금을 행하기전에 파라듐 등과 같은 귀금속으로 먼저 도금한 후, 그 위에 3가크롬도금을 행하는 수법이 일부 시도되기도 했지만, 얇은 두께의 귀금속도금층은 하지도금층에 형성된 구리,주석,아연 등과 같은 보다 천한 금속들에 대해 갈바니부식을 증가시키는 악영향을 주기도 하여 현저한 내식성저하를 유발하기도 하고, 외관이 현탁되어 보이는 문제점을 갖고 있으며 또한, 두꺼운 귀금속도금층을 3가크롬도금의 하지층으로 할 경우에는 그 제조비용이 크게 증가하는 문제점을 갖고 있어서 파라듐 등과 같은 고가의 귀금속을 충분한 두께로 적용하는 것은 경제적이지도 못하여 실용될 수 없는 등 여러가지 문제점이 있었다. In addition, as a means for securing corrosion resistance without using nickel, after forming a base plating layer of copper plating or the copper-tin-zinc alloy plating or copper-tin alloy plating, and the like before performing trivalent chromium plating, Although some attempts have been made to first plate with a noble metal such as, and then trivalent chromium plating thereon, the thin noble metal plating layer has galvanic corrosion on lower metals such as copper, tin, and zinc formed in the underlying plating layer. In addition, it has an adverse effect of increasing, causing a significant decrease in corrosion resistance, has a problem that the appearance appears suspended, and when the thick noble metal plating layer as a base layer of trivalent chromium plating has a problem that greatly increases the manufacturing cost Therefore, it is not economical to apply expensive precious metals such as palladium to sufficient thickness. There were various problems such as can not be more than utilitarian.
본 발명은 상기와 같은 문제점을 해소하기 위한 것으로, 그 목적은 동 또는 합금도금층에 도금층간 밀착력과 내식성이 뛰어난 샌드위치형 3중 도금층을 형성하고, 이에 3가 크롬도금층을 형성하여, 니켈도금층 없이 우수한 내식성, 내마모성 및 기계적 물성을 구비한 3가크롬도금층을 최외층으로 하며 니켈을 사용하지 않는 장식용 다층도금피막의 구조와 그 도금방법을 제공하는 것이다.The present invention is to solve the above problems, the object is to form a sandwich-type triple plating layer having excellent adhesion between the plating layer and corrosion resistance in the copper or alloy plating layer, thereby forming a trivalent chromium plating layer, excellent without the nickel plating layer A trivalent chromium plating layer having corrosion resistance, abrasion resistance, and mechanical properties is provided as an outermost layer, and a structure of a decorative multilayer plating film using no nickel and a plating method thereof are provided.
본 발명의 또다른 목적은 니켈도금층을 형성하지 않아 니켈도금으로 인한 니켈알레르기를 미연에 방지하고, 이를 통해 인체를 보호할 수 있는 3가크롬도금층을 최외층으로 하며 니켈을 사용하지 않는 장식용 다층도금피막의 구조와 그 도금방법 을 제공하는 것이다. Another object of the present invention is to form a nickel plating layer to prevent the nickel allergy due to the nickel plating in advance, and by using the trivalent chromium plating layer that can protect the human body as the outermost layer and decorative multilayer plating without using nickel It is to provide a structure of the coating and a plating method thereof.
본 발명의 또다른 목적은 니켈도금층 없이 3가크롬도금층을 안정적으로 형성하여 투명하고 미려한 외관을 구비하는 3가크롬도금층을 최외층으로 하며 니켈을 사용하지 않는 장식용 다층도금피막의 구조와 그 도금방법을 제공하는 것이다.It is still another object of the present invention to form a trivalent chromium plating layer stably without a nickel plating layer, and to form a trivalent chromium plating layer having a transparent and beautiful appearance as an outermost layer, and a structure of a decorative multilayer plating film using no nickel and a plating method thereof. To provide.
본 발명은 피도체(10)상에 동 또는 2원/3원합금에 의해 형성된 하지도금층(20)과, 상기 하지도금층상에 형성되고, 귀금속 스트라이크 도금층(31), 은도금층(32), 귀금속도금층(33)이 순차적으로 적층된 샌드위치형 귀금속 3중도금층(30)과, 상기 샌드위치형 귀금속 3중도금층상에 형성되는 3가크롬도금층(40)을 포함하도록 되어 있다. The present invention is a base plated
상기 피도체(10)는 금속등과 같은 전도체 또는, ABS, PC 등과 같은 고분자 플라스틱 소재 또는, 세라믹 등과 같은 부도체를 포함한다. The
상기 하지도금층(20)은 무전해 동도금층(21), 전기동도금층(22) 및 합금도금층(23)이 순차적으로 적층되어 있으며, 두께 3∼20㎛ 정도 두께로 도금형성되어 내마모성을 부여한다.The
상기 합금도금층(23)은 구리-주석, 구리-아연, 구리-아연, 주석-아연 등의 2원합금 또는 구리-주석-아연 등의 3원합금에 의해 형성된다. The
상기 샌드위치형 귀금속 3중도금층(30)은 백금족금속 또는 금에 의해 형성되는 귀금속 스트라이크 도금층(31)과, 상기 귀금속 스트라이크 도금층상에 형성되는 은도금층(32)과, 상기 은도금층상에 백금족금속 또는 금에 의해 형성되는 귀금속도금층(33)을 포함한다. The sandwich type precious metal
상기 귀금속 스트라이크 도금층(31)은 은도금층(32)의 형성시 하지도금층(20)을 보호하고, 은도금층과 하지도금층의 밀착력을 향상시키기 위한 것으로, 스트라이크 도금처리되며, 약 0.01∼2㎛ 정도 두께로 도금된다. The noble metal
상기 백금족금속으로는 루테늄, 로듐, 파라듐, 오스뮤, 이리듐, 백금이 있으며, 바람직하게는 파라듐(Pd)을 사용한다. 즉, 상기 귀금속 스트라이크 도금층은 파라듐 또는 금 스트라이크 도금층으로 형성되는 것이 바람직하다. The platinum group metals include ruthenium, rhodium, palladium, osmu, iridium, and platinum, and preferably, palladium (Pd) is used. That is, the noble metal strike plating layer is preferably formed of a palladium or gold strike plating layer.
상기 은도금층(32)은 고도의 피복력 및 내식성을 확보하기 위한 것으로, 약 0.1∼10㎛ 정도의 두께로 도금된다. The
상기 귀금속 도금층(33)은 우수한 내식성을 부여하기 위한 것으로, 백금족금속 또는 금에 의해 두께 0.01∼2㎛ 정도의 두께로 도금되어 형성된다. The noble
상기와 같이 귀금속 스트라이크 도금층(31), 은도금층(32) 및 귀금속 도금층(33)으로 이루어진 샌드위치형 귀금속 3중도금층(30)은 내식성이 뛰어난 내화학층으로, 도금층간의 밀착력 향상을 부여한다. As described above, the sandwich-type noble metal
상기 3가크롬도금층(40)은 최외층에 위치하도록 형성되는 것으로, 피도체가 도금에 의해 내구성이 뛰어나며, 투명하고 미려한 외관을 구비할 수 있도록 0.1㎛ 이상의 두께를 구비한다. The trivalent
상기와 같이 구성된 본 발명은 하지도금층에 의한 내마모성, 샌드위치형 3중도금층에 의핸 내식성과 밀착성 및 내마모성, 최외층에 형성되는 3가크롬도금층에 의한 추가적인 내마모성과 장식성을 구비하게 된다. The present invention configured as described above is provided with abrasion resistance by the base plating layer, corrosion resistance and adhesion and abrasion resistance by the sandwich-type triple plating layer, additional wear resistance and decorative properties by the trivalent chromium plating layer formed on the outermost layer.
즉, 본 발명은 피도체에 동도금 또는 합금도금에 의해 하지도금층을 형성하는 단계;That is, the present invention comprises the steps of forming a base plating layer on the substrate by copper plating or alloy plating;
상기 합금도금층상에 귀금속 스트라이크 도금층, 은도금층, 귀금속 도금층을 순차적으로 적층하여 샌드위치형 귀금속 3중도금층을 형성하는 단계;Sequentially stacking a noble metal strike plating layer, a silver plating layer, and a noble metal plating layer on the alloy plating layer to form a sandwich type noble metal triple plating layer;
상기 샌드위치형 귀금속 3중도금층상에 3가크롬도금층을 형성하는 단계로 이루어져 있다. Forming a trivalent chromium plating layer on the sandwich-type noble metal triple plating layer.
즉, 본 발명은 피도체상에 하지도금층을 형성하고, 이에 귀금속 스트라이크도금층, 은도금층 및 귀금속도금층으로 이루어진 샌드위치형 귀금속 3중도금층을 적층한 후, 3중 도금층상에 3가크롬도금층을 형성하도록 되어 있다. That is, the present invention forms a base plating layer on the object, and after laminating the sandwich type precious metal triple plating layer consisting of the noble metal strike plating layer, the silver plating layer and the precious metal plating layer, to form a trivalent chromium plating layer on the triple plating layer. It is.
상기 하지도금층을 형성하는 단계는 피도체의 표면을 무전해 동도금처리하여 무전해 동도금층을 형성하는 단계와,The forming of the base plating layer may include forming an electroless copper plating layer by electroless copper plating the surface of the object;
상기 무전해 도금층상에 전기동도금처리를 하여 광택 및 질감을 형성하는 전기동도금층을 형성하는 단계와,Forming an electroplating layer on the electroless plating layer to form gloss and texture by electroplating;
상기 전기동도금층상에 3원합금 또는 2원합금에 의한 합금도금층을 형성하는 단계에 의해 이루어진다. Forming an alloy plating layer of a ternary alloy or a binary alloy on the electroplated copper layer.
이때, 상기 무전해도금층을 형성하는 단계, 전기동도금층(광택동도금층)을 형성하는 단계는 피도체상에 통상의 전처리도금을 거친 후, 평활성, 광택성 또는 가능한 장식질감을 형성하기 위한 것으로, 공지의 도금방법에 의해 이루어지며, 형성된 동도금층(무전해동도금층+전기동도금층)은 약 1∼10㎛ 정도 두께로 형성한다.At this time, the step of forming the electroless plating layer, the step of forming the electro-copper plating layer (glossy copper plating layer) is to form a smoothness, gloss or possible decorative texture after the usual pre-treatment plating on the subject, The copper plating layer (electroless copper plating layer + electrolytic copper plating layer) formed is formed to a thickness of about 1 ~ 10㎛.
즉, 고분자 플라스틱 소재 및 세라믹 등과 같은 부도체와 금속부품의 표면에 일연의 에칭, 촉매부여, 무전해도금을 행함으로써 금속전기전도층을 형성하고 통상의 전기동도금을 행하여 광택 및 질감 등을 부여한다. That is, by performing a series of etching, catalyzing, and electroless plating on the surface of the non-conductor such as a polymer plastic material and ceramics and the metal parts, a metal electroconductive layer is formed and ordinary electroplating is performed to impart gloss and texture.
상기 합금도금층 형성단계는 구리-주석, 구리-아연, 주석-아연, 구리-주석-아연 도금 또는 여타 가능한 합금 또는 금속으로 대체하여 약 2∼20㎛ 정도 두께의 내마모층을 형성한다. The alloy plating layer forming step may be replaced with copper-tin, copper-zinc, tin-zinc, copper-tin-zinc plating or other possible alloys or metals to form a wear resistant layer having a thickness of about 2 to 20㎛.
즉, 상기 합금도금층 형성단계는 40∼60℃ 온도에서 0.1∼6 A/d㎡ 의 전류밀도로 구리-주석, 구리-아연, 구리-아연, 주석-아연, 구리-주석-아연 도금 또는 기타 가능한 도금을 행하여 구리-주석, 구리-아연,구리-아연, 주석-아연, 구리-주석-아연 도금 또는 기타 가능한 합금도금층을 약 2∼20㎛ 형성한다. That is, the alloy plating layer forming step is a copper-tin, copper-zinc, copper-zinc, tin-zinc, copper-tin-zinc plating or other possible at a current density of 0.1 ~ 6 A / dm 2 at a temperature of 40 ~ 60 ℃ Plating is performed to form about 2-20 μm of copper-tin, copper-zinc, copper-zinc, tin-zinc, copper-tin-zinc plating or other possible alloy plating layers.
상기 샌드위치형 귀금속 3중도금층을 형성하는 단계는 백금족금속 또는 금에 의해 귀금속 스트라이크도금층을 형성하는 단계:Forming the sandwich-type noble metal triple plating layer is a step of forming a noble metal strike plating layer by platinum group metal or gold:
상기 형성된 귀금속 스트라이크 도금층상에 은도금층을 형성하는 단계;Forming a silver plating layer on the formed precious metal strike plating layer;
상기 은도금층상에 백금족금속 또는 금에 의해 귀금속 도금층을 형성하는 단계로 이루어져 있다. Forming a precious metal plating layer by platinum group metal or gold on the silver plating layer.
상기 귀금속 스트라이크 도금층을 형성하는 단계는 각 금속층간의 밀착력을 향상시키고, 이후 형성되는 은도금층으로부터 하지도금층을 보호하기 위한 것으로, 상온의 0.5∼10g/L 농도의 백금족금속 또는 금도금액에서 0.1∼1 A/d㎡ 의 전류밀도로 스트라이크 도금을 하여 약 0.01∼2㎛ 정도 두께의 귀금속 스트라이크 도금층을 형성한다. 이때, 상기 도금액은 산도가 pH 6∼9 정도의 중성 또는 약산, 약알칼리의 액을 사용한다. Forming the noble metal strike plating layer is to improve the adhesion between the metal layers, and to protect the underlying plating layer from the silver plating layer formed thereafter, 0.1 to 1 in a platinum group metal or gold plating solution at a concentration of 0.5 to 10 g / L at room temperature Strike plating is carried out at a current density of A / dm 2 to form a noble metal strike plating layer having a thickness of about 0.01 to 2 μm. At this time, the plating liquid is a liquid of neutral or weak acid, weak alkali acid having a pH of about 6-9.
상기와 같은 산도의 조절은 수세를 용이하게 하고, 은도금층 형성에 따라 발생될 수 있는 하지도금층의 산호를 억제하며, 도금후에 광택의 저하 및 탁한 외관의 발생을 방지한다. Adjusting the acidity as described above facilitates washing with water, suppresses the corals of the underlying plating layer which may be generated by the formation of the silver plating layer, and prevents the deterioration of gloss and the appearance of a cloudy appearance after plating.
또한, 상기와 같이 형성되는 귀금속 스트라이크 도금층은 바람직하게는 0.01∼1㎛ 정도의 두께, 가장 바람직하게는 0.05㎛ 두께를 구비하도록 도금처리한다. In addition, the noble metal strike plating layer formed as described above is preferably plated to have a thickness of about 0.01 to 1 μm, most preferably 0.05 μm.
상기 은도금층을 형성하는 단계는 상온의 30∼200g/L의 시안화은 도금액에서 전기은도금하여 0.5∼5A/d㎡ 의 전류밀도로 도금하여 두께 0.1∼10㎛, 바람직하게는 두께 0.5∼5㎛ 로, 가장 바람직하게는 두께 2∼3㎛의 광택은도금층을 형성한다. The step of forming the silver plating layer is electroplated in a silver cyanide plating solution of 30 to 200 g / L at room temperature and plated at a current density of 0.5 to 5 A / dm 2 to a thickness of 0.1 to 10 ㎛, preferably 0.5 to 5 ㎛ Most preferably, a gloss silver plating layer having a thickness of 2-3 m is formed.
상기와 같이 형성된 은도금층은 본래의 뛰어난 내식성과 피복력 및 핀홀을 매꿔주는 기능을 하게 되어, 보다 저층의 도금피막에 여러가지 부식을 유발하는 물질의 침투를 막아주는 기능을 하며, 1 미크론/분 이상의 높은 도금속도로 도금할 수 있어서 뛰어난 내식성과 더불어 좋은 양산성을 갖게 해준다The silver plated layer formed as described above has a function of tying inherent excellent corrosion resistance, coating power, and pinhole, and serves to prevent infiltration of various corrosion-causing substances into the lower layer coating film, and has a high content of 1 micron / minute or more. It can be plated at the plating speed, so it has good corrosion resistance and good mass production.
상기와 같이 본 발명은 은도금 전에 귀금속 스트라이크 도금층을 형성하도록 되어 있어, 높은 알카리성 및 고농도를 구비하는 은도금액으로 인한 하지도금층의 금속간 밀착력 저하 및 하지도금층의 용해현상을 미연에 방지할 수 있다. As described above, the present invention is to form a noble metal strike plating layer before the silver plating, it is possible to prevent the reduction in adhesion between the metal of the underlying plating layer and the dissolution of the underlying plating layer due to the silver plating solution having high alkalinity and high concentration.
상기 귀금속 도금층을 형성하는 단계는 상온의 0.5∼10g/L 농도의 귀금속전기도금액에서 0.1∼1A/d㎡ 의 전류밀도로 도금하여 두께 0.01∼2㎛, 바람직하게는 두께 0.01∼1㎛ , 가장 바람직하게는 0.05㎛ 두께로 귀금속 도금층을 형성한다. Forming the noble metal plating layer is plated at a current density of 0.1 to 1 A / dm 2 in a noble metal electroplating solution at a concentration of 0.5 to 10 g / L at room temperature to a thickness of 0.01 to 2 μm, preferably a thickness of 0.01 to 1 μm, Preferably, the noble metal plating layer is formed to a thickness of 0.05 μm.
이때, 상기 귀금속 도금층은 백금족금속 도금층 또는 금도금층으로, 바람직하게는 파라듐 도금층 또는 금도금층으로 형성한다. At this time, the noble metal plating layer is a platinum group metal plating layer or gold plating layer, preferably formed of a palladium plating layer or gold plating layer.
상기 3가크롬도금층을 형성하는 단계는 통상의 3가크롬도금욕에서 5∼20A/d㎡ 의 전류밀도로 도금하여 두께 0.1㎛ 이상의 3가크롬도금층을 형성한다. 이때, 상기 3가크롬도금층의 두께는 특별히 한정할 필요는 없으나, 경제성을 고려할 경우, 두께 0.1∼3㎛ 의 3가크롬도금층을 형성한다. In the forming of the trivalent chromium plating layer, a trivalent chromium plating layer having a thickness of 0.1 μm or more is formed by plating at a current density of 5-20 A / dm 2 in a conventional trivalent chromium plating bath. At this time, the thickness of the trivalent chromium plating layer need not be particularly limited, but in consideration of economic efficiency, a trivalent chromium plating layer having a thickness of 0.1 to 3 µm is formed.
본 발명은 상기와 같은 각 단계를 통해 피도체에 니켈도금 없이 3가크롬도금을 구비한 다층도금피막을 형성할 수 있다. The present invention can form a multi-layer plating film having trivalent chromium plating without nickel plating on the subject through each of the above steps.
상기와 같은 본발명의 방법에 의해 제조된 도금피막은 KS규격에서 정하는 통상의 염수분무환경에서 200시간 이상 백청, 적청, 녹청, 황변 등의 부식이 발생되지 않고, 500g의 하중이 부여된 모래지우개로 500회 이상의 왕복 내마모시험에도 구리도금층이 드러나지 않으며 통상의 니켈-크롬 도금과 동일한 외관적 특성을 구비한다. The plated film prepared by the method of the present invention as described above does not cause corrosion such as white blue, red blue, green blue, yellowing for over 200 hours in the normal salt spraying environment defined by the KS standard, and is given a load of 500 g. The copper plating layer is not revealed even after more than 500 reciprocating abrasion resistance tests, and has the same appearance characteristics as conventional nickel-chromium plating.
이하 본 발명을 실시예에 의해 상세히 설명하면 다음과 같다. Hereinafter, the present invention will be described in detail by way of examples.
실시예 1 Example 1
ABS 플라스틱 수지로 성형한 가로 5㎝, 세로 5㎝, 두께 5㎜의 시편에 통상의 ABS 수지상의 도금법에 따라 무전해 동 도금을 행하고 그위에 1.5A로 10분간 도금하여 통상의 광택동도금층을 형성한 뒤, 통상의 구리-주석-아연 도금을 2A의 전류로 20분간 도금하여 4미크론의 구리-주석-아연 합금도금층을 형성한 뒤, 파라듐금속이온의 농도 2g/L 의 염화암몬파라듐 도금액에서 0.3A의 전류로 30초간 도금하여 파라듐도금층을 형성한 후 청화은 85g/L, 청화칼리 190g/L를 용해한 후 청화은 도금용 주광택제 20 ㎖/ℓ의 농도로 첨가하여 건욕한 은도금액에서 15℃의 온도로 1.5A의 전류로 2분간 도금하여 은도금층을 형성한 후 다시 파라듐금속이온의 농도 2g/L 의 염화암몬파라듐 도금액에서 0.1A의 전류로 2분간 도금하여 파라듐도금층을 형성한 후 통상의 3가크롬 염화욕에서 8A의 전류로 4분간 도금하여 3가크롬도금층을 형성하였다. Electroless copper plating was carried out on a specimen 5 cm long, 5 cm long, and 5 mm thick formed from ABS plastic resin according to the conventional ABS resin plating method, and plated thereon at 1.5 A for 10 minutes to form a normal gloss copper plating layer. After that, ordinary copper-tin-zinc plating was plated at a current of 2 A for 20 minutes to form a 4 micron copper-tin-zinc alloy plating layer, followed by a 2 g / L concentration of palladium ammonium chloride plating solution. After plating for 30 seconds with a current of 0.3 A at to form a paradium plating layer, 85 g / L of cyanide and 190 g / L of cyanide were dissolved, and then, at a concentration of 20 ㎖ / l of silver cyanide as a main varnish for plating, Plating a silver plated layer for 2 minutes with a current of 1.5 A at a temperature of < RTI ID = 0.0 > C, < / RTI > After the usual 3 For 4 minutes in a chrome bath with chloride of 8A current plating to form a trivalent chromium plating layer.
이렇게 하여 제조된 도금층은 구리 7㎛, 구리-주석-아연 합금도금층 8㎛, 파라듐 0.05㎛, 은 1.5㎛, 다시 파라듐 0.05㎛, 최외층으로서 크롬 0.8㎛의 일연의 다층도금층을 형성하게 되었다. The plating layer thus prepared was formed of a copper 7-micron, a copper-tin-zinc alloy plated layer 8 μm, a palladium 0.05 μm, a silver 1.5 μm, a palladium 0.05 μm, and a chromium 0.8 μm as the outermost multilayer plated layer. .
상기 과정을 통해 파라듐-은-파라듐 샌드위치형 귀금속 3중도금층을 포함하고 최외층에 3가크롬도금층을 구비한 시편을 종래의 몇가지 니켈대용도금수법에 의해 제조된 시편과 내식성, 내마모성을 테스트하였으며, 그 결과는 [표1]과 같다. Through the above process, the test piece including the palladium-silver-palladium sandwich type noble metal triple plating layer and the trivalent chromium plating layer on the outermost layer was tested by several nickel substitute plating methods, and the corrosion resistance and wear resistance were tested. The results are shown in [Table 1].
실시예 2Example 2
ABS 플라스틱 수지로 성형한 가로 5㎝, 세로 5㎝, 두께 5㎜의 시편에 통상의 ABS 수지상의 도금법에 따라 무전해 동 도금을 행하고 그위에 1.5A로 10분간 도금하여 통상의 광택동도금층을 형성한 뒤, 통상의 구리-주석-아연 도금을 2A의 전류로 20분간 도금하여 4미크론의 구리-주석-아연 합금도금층을 형성한 뒤, 금이온의 3g/L의 통상의 스트라이크 금 도금액에서 0.3A의 전류로 30초간 도금하여 금도금층을 형성하고 청화은 852g/L, 청화칼리 1902g/L를 용해한 후 청화은 도금용 주광택제 20㎖/ℓ의 농도로 첨가하여 건욕한 은도금액에서 15℃의 온도로 1.5A의 전류로 2분간 도금하여 은도금층을 형성한 후, 파라듐금속이온의 농도 2g/L의 염화암몬파라듐 도금액에서 0.1A의 전류로 2분간 도금하여 파라듐도금층을 형성한 후 통상의 3가크롬 염화욕에서 8A의 전류로 4분간 도금하여 3가크롬도금층을 형성하였다. Electroless copper plating was carried out on a specimen 5 cm long, 5 cm long, and 5 mm thick formed from ABS plastic resin according to the conventional ABS resin plating method, and plated thereon at 1.5 A for 10 minutes to form a normal gloss copper plating layer. After that, the conventional copper-tin-zinc plating is plated at a current of 2A for 20 minutes to form a 4 micron copper-tin-zinc alloy plating layer, followed by 0.3A in a 3 g / L conventional strike gold plating solution of gold ions. After plating for 30 seconds with a current of 30 seconds to form a gold plated layer, 852 g / L of cyanide and 1902 g / L of cyanide were dissolved, and the solution was added at a concentration of 20 ml / l of the main polish agent for cyanide plating. After plating for 2 minutes with a current of A to form a silver plated layer, the plated with a current of 0.1 A in a 2 g / L ammonium ammonium chloride plating solution having a concentration of 2 g / L of palladium metal was formed for 2 minutes to form a palladium plated layer. 8 in gchrom chloride bath It plated for 4 minutes by the electric current of A, and formed the trivalent chromium plating layer.
이렇게 하여 제조된 도금층은 구리 7㎛, 구리-주석-아연 합금도금층 8㎛, 금 0.05㎛, 은 1.5㎛, 파라듐 0.05㎛, 최외층으로서 크롬 0.8㎛의 일연의 다층도금층을 형성하게 되었다. The plated layer thus prepared was formed with a copper multilayer layer of 8 µm, a copper-tin-zinc alloy plating layer 8 µm, a gold 0.05 µm, a silver 1.5 µm, a paradium 0.05 µm, and a chromium 0.8 µm as the outermost layer.
상기 과정을 통해 금-은-파라듐 샌드위치형 귀금속 3중도금층을 포함하고 최외층에 3가크롬도금층을 구비한 시편을 종래의 몇가지 니켈대용도금수법에 의해 제조된 시편과 내식성, 내마모성을 테스트하였으며, 그 결과는 [표1]과 같다. Through the above process, the specimen including the gold-silver-paradium sandwich type noble metal triple plating layer and the trivalent chromium plating layer on the outermost layer was tested by several nickel substitute plating methods, and the corrosion resistance and wear resistance were tested. The results are shown in [Table 1].
실시예 3Example 3
ABS 플라스틱 수지로 성형한 가로 5㎝, 세로 5㎝, 두께 5㎜의 시편에 통상의 ABS 수지상의 도금법에 따라 무전해 동 도금을 행하고 그위에 1.5A로 10분간 도금하여 통상의 광택동도금층을 형성한 뒤, 통상의 구리-주석-아연 도금을 2A의 전류로 20분간 도금하여 4미크론의 구리-주석-아연 합금도금층을 형성한 뒤, 금이온의 3g/L의 통상의 스트라이크 금 도금액에서 0.3A의 전류로 30초간 도금하여 금도금층을 형성하고 청화은 852g/L, 청화칼리 1902g/L를 용해한 후 청화은 도금용 주광택제 20㎖/ℓ의 농도로 첨가하여 건욕한 은도금액에서 15℃의 온도로 1.5A의 전류로 2분간 도금하여 은도금층을 형성한 후, 다시 금이온의 농도 3g/L의 플래시 금도금액에서 0.1A의 전류로 2분간 도금하여 금도금층을 형성한 후 통상의 3가크롬 염화욕에서 8A의 전류로 4분간 도금하여 3가크롬도금층을 형성하였다. Electroless copper plating was carried out on a specimen 5 cm long, 5 cm long, and 5 mm thick formed from ABS plastic resin according to the conventional ABS resin plating method, and plated thereon at 1.5 A for 10 minutes to form a normal gloss copper plating layer. After that, the conventional copper-tin-zinc plating is plated at a current of 2A for 20 minutes to form a 4 micron copper-tin-zinc alloy plating layer, followed by 0.3A in a 3 g / L conventional strike gold plating solution of gold ions. After plating for 30 seconds with a current of 30 seconds to form a gold plated layer, 852 g / L of cyanide and 1902 g / L of cyanide were dissolved, and the solution was added at a concentration of 20 ml / l of the main polish agent for cyanide plating. After plating for 2 minutes with a current of A to form a silver plating layer, the plated gold plating layer was formed by plating with a current of 0.1 A for 2 minutes in a flash gold plating solution having a gold ion concentration of 3 g / L, and then forming a gold plating layer. 4 with a current of 8 A at Liver was plated to form a trivalent chromium plating layer.
이렇게 하여 제조된 도금층은 구리 7㎛, 구리-주석-아연 합금도금층 8㎛, 금 0.05㎛, 은 1.5㎛, 금 0.05㎛, 최외층으로서 크롬 0.8㎛의 일연의 다층도금층을 형성하게 되었다. The plated layer thus prepared was formed with a 7-μm copper, 8-μm copper-tin-zinc alloy plated layer, 0.05 μm of gold, 1.5 μm of silver, 0.05 μm of gold and 0.8 μm of chromium as the outermost layer.
상기 과정을 통해 금-은-금 샌드위치형 귀금속 3중도금층을 포함하고 최외층에 3가크롬도금층을 구비한 시편을 종래의 몇가지 니켈대용도금수법에 의해 제조된 시편과 내식성, 내마모성을 테스트하였으며, 그 결과는 [표1]과 같다. Through the above process, the specimen including the gold-silver-gold sandwich type noble metal triple plating layer and the trivalent chromium plating layer on the outermost layer was tested by several nickel substitute plating methods, and the corrosion resistance and wear resistance were tested. The results are shown in [Table 1].
[표1]Table 1
상기 실시예 1 내지 실시예 3의 과정을 거쳐 제조된 시편과, 종래의 몇가지 니켈알레르기 방지 도금방법에 의해 제조된 시편(비교예 1 : 동/3원합금/3가크롬도금에 의해 제조된 시편, 비교예 2 : 동/3원합금/파라듐/크롬도금에 의해 제조된 시편, 비교예 3 : 동/파라듐/3가크롬도금에 의해 제조된 시편)에 대한 내식성은 비교는 각각 2개씩 5%의 NaCl 용액으로 분무하는 염수분무환경에서 백청, 녹청, 적청이 발생되는 시점까지의 지속시간을 측정하였고, 내마모성을 비교하기 위하여 500g의 하중을 부가한 모래지우개로 각각의 수법에 의해 도금한 시편의 도금피막에 왕복으로 마찰을 하여 동도금층의 구리색상이 노출되기까지의 왕복횟수를 측정하였으며, 도금층간의 열안정성을 비교하기 위하여 온도 85℃, 습도 90%의 고온 고습환경에서 72시간 경과후 바둑판 눈금과 같은 모양으로 문구용 칼로 1∼1.5㎜의 간격으로 서로 교차하게 그은 후 문구용 투명한 3M사의 투명테이프로 급격히 당겨 벗겨 도금 층간 박리의 여부를 확인하는 방법으로 도금층간 밀착력을 측정하였다. Specimens prepared through the process of Examples 1 to 3, and specimens prepared by some of the conventional nickel allergic plating method (Comparative Example 1: Specimen manufactured by copper / three-membered alloy / trivalent chromium plating) , Comparative Example 2: specimen prepared by copper / three-membered alloy / palladium / chromium plating, Comparative Example 3: specimen prepared by copper / palladium / trivalent chromium plating) In the salt spraying environment sprayed with 5% NaCl solution, the duration of time until white blue, green blue, and red blue occurred was measured, and the sand eraser was loaded with 500 g of load to compare the wear resistance. The number of round trips between the copper plated layer and the copper plated layer was measured by reciprocating the coated film on the specimen, and after 72 hours in a high temperature and high humidity environment with a temperature of 85 ° C and a humidity of 90% to compare the thermal stability between the plated layers. Checkerboard And then drawn to intersect each other at an interval of 1~1.5㎜ knife for phrases in the form, such as gold plating was measured for interlaminar adhesion in a way that abruptly pulled off with transparent tape, 3M Corporation transparent for phrases determine whether the coating delamination.
상기 [표1]에서와 같이, 파라듐-은-파라듐 또는, 금-은-파라듐 또는, 금-은-금 등으로 구성된 샌드위치형 귀금속 3층도금층을 포함하는 즉, 은도금층을 중심으로 그 상하에 백금족 도금층 또는 금도금층을 구비하는 샌드위치형 귀금속 3중도금층은 뛰어난 내식성과 내마모성, 열안정성을 가진 도금피막임을 알 수 있다. As shown in Table 1 above, a sandwich-type noble metal three-layer plating layer composed of palladium-silver-palladium, gold-silver-palladium, gold-silver-gold, etc. Sandwich type noble metal triple plating layer having a platinum group plating layer or a gold plating layer on the top and bottom thereof is a plating film having excellent corrosion resistance, abrasion resistance, and thermal stability.
본 발명은 상술한 특정의 바람직한 실시예에 한정되지 아니하며, 청구범위에서 청구하는 본 발명의 요지를 벗어남이 없이 당해 발명이 속하는 기술분야에서 통상의 지식을 가진 자라면 누구든지 다양한 변형실시가 가능한 것은 물론이고, 그와 같은 변경은 청구범위 기재의 범위내에 있게 된다.The present invention is not limited to the above-described specific preferred embodiments, and various modifications can be made by any person having ordinary skill in the art without departing from the gist of the present invention claimed in the claims. Of course, such changes will fall within the scope of the claims.
이와 같이 본 발명은 하지도금층과 샌드위치형 귀금속 3중도금층을 구비하도록 되어 있어, 니켈을 사용하지 않고도 내식성과 내마모성 및 열안정성을 고루 갖추고 있으며 도금후에도 투명하고 미려한 외관을 가진 장식도금을 할 수 있어, 통상적인 니켈-크롬도금을 이용하는 장식도금을 대체할 수 있을 뿐만 아니라, 전기, 전자, 기계 등에서 종종 발생하는 니켈알레르기 문제를 예방할 수 있다.As described above, the present invention is provided with a base plating layer and a sandwich type noble metal triple plating layer, and has corrosion resistance, abrasion resistance, and thermal stability even without using nickel, and after plating, decorative plating having a transparent and beautiful appearance can be performed. Not only can replace the decorative plating using the conventional nickel-chromium plating, it can also prevent the nickel allergy problem that often occurs in electrical, electronic, mechanical and the like.
또한, 본 발명은 하지도금층과 은도금층 사이에 백금족 또는 금에 의해 귀금속 스트레이트 도금층을 형성함으로써, 은도금층의 형성시 발생될 수 있는 하지도 금층의 용해를 미연에 방지하고, 하지도금층과 은도금층간의 밀착력을 증대시키는 효과가 있다. In addition, the present invention by forming a precious metal straight plating layer of the platinum group or gold between the base plated layer and the silver plated layer, thereby preventing the dissolution of the base layer gold layer that may occur during formation of the silver plated layer, and the adhesion between the base plated layer and the silver plated layer There is an effect to increase.
또한, 본 발명은 도금을 회피하여 설계 제작되어져 왔던 다양한 부품에 장식도금을 가능하게 할 수 있으며, 도장, 진공증착 등에서 흔히 문제가 되는 내마모성저하와 밀착력 저하 및 열안정성 저하를 방지할 수 있을 뿐만 아니라 자원의 회수 재활용도 용이한 도금방법에 의한 장식부품을 제조할 수 있다.In addition, the present invention can enable the decorative plating to a variety of parts that have been designed and manufactured to avoid plating, and can prevent a decrease in abrasion resistance, a decrease in adhesion and thermal stability, which are often a problem in painting, vacuum deposition, etc. The decorative part can be manufactured by the plating method which is easy to collect | recover and recycle a resource.
또한, 본 발명에 따른 도금층은 장기간 사용하더라도 금속도금층이 쉽게 벗겨지지 않으며, 인체에 유해하거나 환경오염의 요인이 되는 물질이 배출되지 않는 등 많은 효과가 있다. In addition, the plated layer according to the present invention has many effects such that the metal plated layer is not easily peeled off even if used for a long time, and substances that are harmful to the human body or cause environmental pollution are not discharged.
Claims (5)
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