KR20080047816A - Brush cleaning unit and substrate cleaning method using the same - Google Patents

Abstract

The present invention discloses a brush cleaning unit and a substrate cleaning method using the same, and characterized in that the brush shaft is prevented from sagging in a non-contact manner using repulsive force (repulsive force) between magnetic members.

According to this feature, wear and driving noise due to contact support of the rotating brush shaft can be eliminated, and the efficiency of the cleaning process using the brush can be improved.

Description

Brush cleaning unit and substrate cleaning method using the same {CLEANING BRUSH UNIT AND METHOD FOR CLEANING SUBSTRATES USING THE SAME}

1 is a cross-sectional view showing an example of a substrate processing apparatus to which a brush cleaning unit according to the present invention is applied;

2 and 3 are a plan view and a cross-sectional view of a process chamber in which a cleaning process is performed;

4 and 5 are perspective views of the brush cleaning unit and the deflection prevention mechanism according to the present invention;

6 is a cross-sectional view of the deflection prevention mechanism according to the present invention;

7 is a schematic exploded perspective view of the first magnetic member;

8 is a cross-sectional view of the deflection prevention mechanism according to another embodiment of the present invention.

<Description of Symbols for Main Parts of Drawings>

100: process chamber 200: substrate transfer unit

300: steam cleaning unit 400: brush cleaning unit

422,442 Brush 424,444 Brush Shaft

426,446: Motor 500: Deflection mechanism

520: First magnetic member 540, 540 ': Second magnetic member

550: support bracket

The present invention relates to a substrate processing apparatus and method, and more particularly, to a brush cleaning unit for cleaning a substrate used in the manufacture of a flat panel display element and a substrate cleaning method using the same.

Recently, information processing devices have been rapidly developed to have various types of functions and faster information processing speeds. This information processing apparatus has a display panel for displaying the operated information. Until now, a cathode ray tube (CRT) monitor has been mainly used as a display panel, but recently, with the rapid development of technology, the use of flat panel display panels such as liquid crystal displays (LCDs), which are light and occupy small space, is rapidly increasing.

Various processes are required for manufacturing a flat panel display panel. Among these processes, a cleaning process is a process of removing contaminants such as particles deposited on a substrate and is performed to improve device yield by minimizing device losses such as thin film transistors. Generally, cleaning processes supply water to the substrate to remove contaminants from the substrate or use a brush to physically remove contaminants from the substrate.

In the brush cleaning apparatus which wash | cleans a board | substrate using a brush, a board | substrate is wash | cleaned by the brush cleaning unit, while conveying in a direction in a process chamber by a conveyance unit. The brush cleaning unit has a brush and a brush shaft that provides rotational force to the brush, and both ends of the brush shaft are supported by a bearing member or the like.

However, the length of the brush and brush shaft becomes longer as the substrate is enlarged. If the length of the brush shaft becomes longer, deflection of the brush shaft occurs due to the self weight of the brush and the brush shaft and the load of the enlarged substrate.

In order to prevent sagging of the brush shaft, a method of supporting the brush shaft by three or four points using a bearing member has been proposed. .

Therefore, the present invention has been created to solve the problem in view of the conventional brush cleaning apparatus as described above, the object of the present invention is a brush cleaning that can eliminate the wear of the brush shaft and thus driving noise It is to provide a unit and a substrate cleaning method using the same.

In order to achieve the above object, a brush cleaning unit according to the present invention includes a brush for cleaning a substrate; A brush shaft for providing rotational force to the brush; And a sag preventing mechanism for preventing sag of the brush shaft, wherein the sag preventing mechanism includes: a first magnetic member installed at the brush shaft; And a second magnetic member disposed below the first magnetic member and having magnetic poles arranged such that a repulsive force acts between the first magnetic member.

In the brush cleaning unit according to the present invention having the configuration as described above, the first magnetic member is preferably provided on both sides of the brush on the brush shaft.

According to another aspect of the invention, the first magnetic member is preferably provided on any one of both sides of the brush on the brush shaft.

According to one feature of the invention, the first magnetic member comprises a hollow first magnetic body installed to surround the brush shaft; It is preferable to include; a protection member surrounding the first magnetic material to prevent contamination of the first magnetic material.

In addition, the first magnetic body and the protective member are preferably separated into at least two or more parts extending in the longitudinal direction and joined by the fastening member.

According to another feature of the invention, the second magnetic member is provided in a plate shape corresponding to the first magnetic member, and the second magnetic body disposed in a V shape below the first magnetic member; desirable.

According to another feature of the invention, the second magnetic member is provided with an arc-shaped curved plate corresponding to the first magnetic member, and includes a second magnetic body disposed below the first magnetic member; desirable.

In order to achieve the above object, the substrate cleaning method according to the present invention is a method for cleaning a substrate, the brush shaft for providing a rotational force to the brush by using a magnetic force to prevent sag, and transfer the substrate while transferring the substrate It is characterized in that for cleaning the substrate by rotating.

In the substrate cleaning method according to the present invention having the configuration as described above, the method preferably supports the brush shaft by the repulsive force between the brush shaft and the magnetic material provided below it to prevent sagging.

Hereinafter, a brush cleaning unit and a substrate cleaning method using the same according to a preferred embodiment of the present invention with reference to the accompanying drawings will be described in detail. First, in adding reference numerals to the components of each drawing, it should be noted that the same reference numerals are assigned to the same components as much as possible, even if shown on different drawings. In addition, in describing the present invention, when it is determined that the detailed description of the related well-known configuration or function may obscure the gist of the present invention, the detailed description thereof will be omitted.

(Example)

In the present embodiment, the substrate S will be described taking as an example a substrate S used for manufacturing a flat panel display panel. Alternatively, the substrate S may be a wafer used for manufacturing a semiconductor chip.

1 is a cross-sectional view illustrating an example of a substrate processing apparatus to which a brush cleaning unit according to the present invention is applied, and FIGS. 2 and 3 are plan and cross-sectional views of a process chamber in which a cleaning process is performed.

1 to 3, the substrate processing apparatus 10 of the present embodiment includes process chambers 100, 100 ′, 100 ″, and substrate transfer units 200, 200 ′, 200 ″.

The process chambers 100, 100 ′, 100 ″ provide a space for the substrate S processing process. The substrate transfer units 200, 200 ′, 200 ″ are installed in the process chambers 100, 100 ′, 100 ″, respectively. The substrate transfer unit 200, 200 ′, 200 ″ moves the substrate S in one direction between the process chambers 100, 100 ′, 100 ″ or within the process chambers 100, 100 ′, 100 ″.

The process chambers 100, 100 ', 100 "have a generally rectangular parallelepiped shape and are disposed adjacent to each other. One sidewall of the process chambers 100, 100', 100" has a substrate S formed by the process chambers 100, 100 ', 100 ". Inflow inlets 110a and 110a "are provided, and opposite sidewalls thereof are provided with outlets 110b and 110b 'through which the substrate S flows out from the process chambers 100, 100' and 100".

In each process chamber 100, 100 ′, 100 ″, a predetermined process is performed on the substrate S. A cleaning process is performed in the process chamber 100 among the process chambers 100, 100 ′, 100 ″. In the process chamber 100 ′ positioned in front of the process chamber 100 where the cleaning process is performed, an etching process is performed, and in the process chamber 100 ″ positioned behind the process chamber 100 where the cleaning process is performed. The drying process may proceed.

The cleaning members 300 and 400 are installed in the process chamber 100 where the cleaning process is performed, and the cleaning members 300 and 400 clean the substrate S being moved by the substrate transfer unit 200.

The substrate transfer unit 200 includes transfer shafts 210, a power transmission member 220, and a driving member 230.

The transfer shafts 210 are arranged side by side at heights corresponding to the inlet 110a and the oil outlet 110b formed on the sidewall of the process chamber 100. The conveying shafts 210 may be arranged horizontally, or may be inclined so that one end is positioned higher than the other end. Both ends of the transfer shafts 210 are supported by a rotation support member (not shown) such as a bearing. Rollers 212 are installed at a plurality of points in the longitudinal direction of the transfer shafts 210. The rollers 212 are installed to insert the transfer shaft 210 and rotate together with the transfer shaft 210.

The power transmission member 220 is connected to the transfer shafts 210. The power transmission member 220 transmits the rotational force of the driving member 230 to the transfer shaft 210. The power transmission member 220 includes pulleys 222 and belts 224. The pulleys 222 may be installed at both ends of the transfer shafts 210, and may be installed at either end of both ends of the transfer shafts 210. Pulleys 222 are connected by a belt 224. Pulleys 222 installed on adjacent transfer shafts 210 are connected in pairs by belts 224. Alternatively, a gear may be used as the power transmission member 220. Gears may be connected to both ends or one end of the transfer shafts 210, and the transfer shafts 210 may be arranged to engage the gears. Also, in order to selectively prevent particle generation due to mechanical friction, a magnet member (not shown) that transmits rotational force by using magnetic force may be used as the power transmission member 220.

The drive member 230 is connected to any one of the pulleys 222 to provide rotational force to at least one of the power transmission members 220. A motor may be used as the driving member 230.

When the rotational force of the driving member 230 is transmitted to the transfer shafts 210 by the power transmission member 220, the substrate S placed above the rollers 212 of the transfer shafts 210 is formed of the rollers 212. It is moved in one direction by rotation.

The substrate S is cleaned by the cleaning members 300 and 400 while being moved by the substrate transfer unit 200 in the process chamber 100. The cleaning members 300 and 400 include a steam cleaning unit 300 and a brush cleaning unit 400.

The steam cleaning unit 300 primarily cleans the substrate S by spraying high temperature and high pressure steam onto the substrate S. Contaminants, such as particles attached to the substrate S by steam, are removed from the substrate S or the adhesion to the substrate S is lowered.

The brush cleaning unit 400 secondaryly cleans the substrate S cleaned by the steam cleaning unit 300 using the physical contact force of the brush 410. The contaminants remaining on the substrate S are removed from the substrate S by the brush 410. Particles having a size of several micrometers or less are degraded in adhesion to the substrate S by cleaning with steam and then removed from the substrate S by cleaning with the brush 410.

The brush cleaning unit 400 includes an upper brush cleaning unit 420 for cleaning the upper surface of the substrate S and a lower brush cleaning unit 440 for cleaning the lower surface of the substrate S. The upper and lower brush cleaning units 420 and 440 have brushes 422 and 442, brush shafts 424 and 444, and motors 426 and 446, respectively. Brushes 422 and 442 contact the substrate S to physically remove contaminants from the substrate S. Brushes 422 and 442 have a length corresponding to the width of the substrate S, and are disposed on the upper and lower portions of the substrate S in the process chamber 100 in parallel with the longitudinal direction of the transfer shaft 210. The brush shaft 424 is fixedly coupled to the brush 422 disposed on the substrate S, and both ends thereof are supported by the bearing members 425a and 425b. The brush shaft 444 is fixedly coupled to the brush 442 disposed below the substrate S, and both ends thereof are supported by the bearing members 445a and 445b. Motors 426 and 446 are respectively connected to the brush shafts 424 and 444 supported by the bearing members.

As described above, the brush shafts 424 and 444 transmit the rotational force of the motors 426 and 446 to the brushes 422 and 424 while being rotated while being supported at both ends. The brushes 422 and 424 and the brush shafts 424 and 444 are longer in length as the substrate is enlarged, and the brush shafts are caused by the weight of the brushes 422 and 424 and the brush shafts 424 and 444 and the load of the substrate S being enlarged. (424,444) deflection occurs. Accordingly, the present invention discloses a non-contact sag prevention mechanism 500 using a repulsive force of a magnetic body as a means for preventing sagging of the brush shafts 424 and 444.

4 and 5 are perspective views of the brush cleaning unit and the deflection prevention mechanism according to the present invention, Fig. 6 is a sectional view of the deflection prevention mechanism according to the present invention, and Fig. 7 is a schematic exploded perspective view of the first magnetic member.

4 to 7, the deflection prevention mechanism 500 supports the brush shafts 424 and 444 in a non-contact manner by using the repulsive force (repulsive force) between the magnetic bodies to prevent the brush shafts 424 and 444 from sagging. 4 and 5, the deflection prevention mechanism 500 may be provided on either side of the brushes 422 and 424 on the brush shafts 424 and 444, and the brushes 422 and 424 on the brush shafts 424 and 444. It may be provided on both sides.

The deflection prevention mechanism 500 includes a first magnetic member 520 and a second magnetic member 520 in which magnetic poles are arranged so that a repulsive force (repulsive force) acts on each other. The first magnetic member 520 is installed on the brush shaft 424. The second magnetic member 540 is disposed below the first magnetic member 520 and is supported by the support bracket 550.

The first magnetic member 520 has a hollow first magnetic body 522 that is installed to surround the brush shaft 424. The first magnetic body 522 may be contaminated by the chemical liquid during the process, and a protection member 524 surrounding the first magnetic body 522 is installed to prevent the first magnetic body 522 from being processed. The protection member 524 includes a shell-type side protection member 525 provided on the outer side of the first magnetic body 522 and annular cap members 527a and 527b respectively provided on both end surfaces of the first magnetic body 522. It may include.

The first magnetic body 522 and the side protection member 525 may be provided in a structure separated into at least two or more parts extending in the longitudinal direction. The first magnetic body 522 and the side protection member 525 are detachably coupled using a fastening member such as a screw 529. As a result, the first magnetic body 522 and the side protection member 525 may be easily installed / disassembled.

The second magnetic member 540 has a plate-shaped second magnetic body 542 corresponding to the first magnetic member 520. The second magnetic body 542 is disposed under the first magnetic member 520 in a V shape and is supported by the support bracket 550. The second magnetic body 542 may be contaminated by the chemical liquid during the process, and in order to prevent this, the protection member 544 for preventing contamination is installed on the surface of the second magnetic body 542.

The protective members 524 and 544 provided on the first magnetic member 520 and the second magnetic member 540 may be formed of various materials. For example, the protective members 524 and 544 may be made of synthetic resin such as polyvinyl chloride (PVC) or polyether ether ketone (PEEK), or stainless steel (SUS).

The magnetic poles of the first magnetic body 522 and the second magnetic body 544 may be disposed such that a repulsive force (repulsive force) acts on each other. As shown in FIG. 6, in the case of the first magnetic body 522 having a cylindrical shape, S poles may be disposed inside and N poles paired with the outside may be disposed outside. In the case of the second magnetic body 544 having a plate shape, N poles may be disposed on the upper surface side, and S poles may be disposed on the lower surface side. Alternatively, the magnetic pole arrangement of the first magnetic body 522 may be reversed, and the magnetic pole arrangement of the second magnetic body 544 may also be reversed. Of course, the repulsive force (repulsive force) also acts between the first magnetic body 522 and the second magnetic body 544 in which the magnetic poles are disposed in the opposite direction to the arrangement direction described above.

The repulsive force (repulsive force) acts between the first magnetic member 520 and the second magnetic member 540 by the arrangement of the magnetic poles as described above. The brush shaft 424 is supported by the repulsive force (repulsive force) between the first magnetic member 520 and the second magnetic member 540 to prevent sagging. In addition, since the brush shaft 424 is supported in a non-contact manner by using the repulsive force (repulsive force) of the magnetic members 520 and 540, there is an effect of eliminating abrasion and driving noise that may occur in the contact support method.

8 is a cross-sectional view of the deflection prevention mechanism according to another embodiment of the present invention.

As illustrated in FIG. 8, the second magnetic member 540 ′ may be provided as an arc-shaped curved plate corresponding to the first magnetic member 520. Since the outer side surface of the first magnetic member 520 and the upper surface of the second magnetic member 540 'are curved surfaces and are spaced apart from each other by a uniform distance along the circumferential direction, the first magnetic member 520 Repulsive force (repulsive force) between the second magnetic member 540 ′ may act uniformly around the lower side of the brush shaft 424.

The above description is merely illustrative of the technical idea of the present invention, and those skilled in the art to which the present invention pertains may make various modifications and changes without departing from the essential characteristics of the present invention. Therefore, the embodiments disclosed in the present invention are not intended to limit the technical idea of the present invention but to describe the present invention, and the scope of the technical idea of the present invention is not limited by these embodiments. The protection scope of the present invention should be interpreted by the following claims, and all technical ideas within the equivalent scope should be interpreted as being included in the scope of the present invention.

As described above, according to the present invention, the brush shaft can be prevented by supporting the brush shaft in a non-contact manner using the repulsive force between the magnetic members.

In addition, according to the present invention, it is possible to eliminate the wear of the brush shaft and thereby driving noise.

Moreover, according to this invention, the efficiency of the washing | cleaning process using a brush can be improved.

Claims (9)

A brush for cleaning the substrate; A brush shaft for providing rotational force to the brush; Includes; sag prevention mechanism for preventing sag of the brush shaft, The sag prevention mechanism, A first magnetic member mounted to the brush shaft; A second magnetic member disposed below the first magnetic member and having magnetic poles arranged such that a repulsive force acts between the first magnetic member; Brush cleaning unit comprising a. The method of claim 1, And the first magnetic member is provided at both sides of the brush on the brush shaft. The method of claim 1, And the first magnetic member is provided on any one of both sides of the brush on the brush shaft. The method of claim 2 or 3, The first magnetic member, A hollow first magnetic body installed to surround the brush shaft; And a protection member surrounding the first magnetic material to prevent contamination of the first magnetic material. The method of claim 4, wherein And the first magnetic body and the protective member are separated into at least two or more parts extending in a longitudinal direction and coupled by a fastening member. The method of claim 1, The second magnetic member, And a second magnetic body provided in a plate shape corresponding to the first magnetic member and disposed in a V shape under the first magnetic member. The method of claim 1, The second magnetic member, And a second magnetic material provided as an arc-shaped curved plate corresponding to the first magnetic member, and disposed below the first magnetic member. In the method of cleaning a substrate, A method of cleaning a substrate, comprising: supporting a brush shaft providing a rotational force to a brush by using magnetic force to prevent sag, and cleaning the substrate by rotating the brush while transferring the substrate. The method of claim 8, The method, And cleaning the substrate by preventing the deflection by supporting the brush shaft with a repulsive force between the brush shaft and the magnetic bodies installed below the brush shaft.

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