KR20080030687A - 액정표시소자용 감광성 수지조성물, 그를 이용한컬러필터와 그 제조방법 및 액정표시소자 - Google Patents

액정표시소자용 감광성 수지조성물, 그를 이용한컬러필터와 그 제조방법 및 액정표시소자 Download PDF

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Publication number: KR20080030687A
Authority: KR; South Korea
Prior art keywords: group; liquid crystal; exposure; meth; crystal display
Prior art date: 2005-07-29
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.): Ceased

Application number

KR1020087004703A

Other languages

English (en)

Korean (ko)

Inventor

다이스케 카시와기

미츠토시 타나카

히로타카 마츠모토

Original Assignee

후지필름 가부시키가이샤

Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)

2005-07-29

Filing date

2006-06-16

Publication date

2008-04-04

2006-06-16 Application filed by 후지필름 가부시키가이샤 filed Critical 후지필름 가부시키가이샤

2008-04-04 Publication of KR20080030687A publication Critical patent/KR20080030687A/ko

Status Ceased legal-status Critical Current

Links

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MCPKSFINULVDNX-UHFFFAOYSA-N drometrizole Chemical compound CC1=CC=C(O)C(N2N=C3C=CC=CC3=N2)=C1 MCPKSFINULVDNX-UHFFFAOYSA-N 0.000 description 1
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230000005684 electric field Effects 0.000 description 1
238000010894 electron beam technology Methods 0.000 description 1
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150000002148 esters Chemical class 0.000 description 1
UIWXSTHGICQLQT-UHFFFAOYSA-N ethenyl propanoate Chemical compound CCC(=O)OC=C UIWXSTHGICQLQT-UHFFFAOYSA-N 0.000 description 1
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CGWFVEFHQWJOKI-UHFFFAOYSA-N ethyl 2-benzoylbenzoate Chemical compound CCOC(=O)C1=CC=CC=C1C(=O)C1=CC=CC=C1 CGWFVEFHQWJOKI-UHFFFAOYSA-N 0.000 description 1
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238000007765 extrusion coating Methods 0.000 description 1
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YQEMORVAKMFKLG-UHFFFAOYSA-N glycerine monostearate Natural products CCCCCCCCCCCCCCCCCC(=O)OC(CO)CO YQEMORVAKMFKLG-UHFFFAOYSA-N 0.000 description 1
235000011187 glycerol Nutrition 0.000 description 1
SVUQHVRAGMNPLW-UHFFFAOYSA-N glycerol monostearate Natural products CCCCCCCCCCCCCCCCC(=O)OCC(O)CO SVUQHVRAGMNPLW-UHFFFAOYSA-N 0.000 description 1
238000007756 gravure coating Methods 0.000 description 1
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LNEPOXFFQSENCJ-UHFFFAOYSA-N haloperidol Chemical compound C1CC(O)(C=2C=CC(Cl)=CC=2)CCN1CCCC(=O)C1=CC=C(F)C=C1 LNEPOXFFQSENCJ-UHFFFAOYSA-N 0.000 description 1
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238000007761 roller coating Methods 0.000 description 1
239000005060 rubber Substances 0.000 description 1
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238000004781 supercooling Methods 0.000 description 1
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238000004381 surface treatment Methods 0.000 description 1
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DLFVBJFMPXGRIB-UHFFFAOYSA-N thioacetamide Natural products CC(N)=O DLFVBJFMPXGRIB-UHFFFAOYSA-N 0.000 description 1
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XOLBLPGZBRYERU-UHFFFAOYSA-N tin dioxide Chemical compound O=[Sn]=O XOLBLPGZBRYERU-UHFFFAOYSA-N 0.000 description 1
229910001887 tin oxide Inorganic materials 0.000 description 1
OGIDPMRJRNCKJF-UHFFFAOYSA-N titanium oxide Inorganic materials [Ti]=O OGIDPMRJRNCKJF-UHFFFAOYSA-N 0.000 description 1
238000011282 treatment Methods 0.000 description 1
125000004953 trihalomethyl group Chemical group 0.000 description 1
239000013638 trimer Substances 0.000 description 1
RYFMWSXOAZQYPI-UHFFFAOYSA-K trisodium phosphate Chemical compound [Na+].[Na+].[Na+].[O-]P([O-])([O-])=O RYFMWSXOAZQYPI-UHFFFAOYSA-K 0.000 description 1
229910000406 trisodium phosphate Inorganic materials 0.000 description 1
235000019801 trisodium phosphate Nutrition 0.000 description 1
238000004506 ultrasonic cleaning Methods 0.000 description 1
150000003673 urethanes Chemical class 0.000 description 1
ROVRRJSRRSGUOL-UHFFFAOYSA-N victoria blue bo Chemical compound [Cl-].C12=CC=CC=C2C(NCC)=CC=C1C(C=1C=CC(=CC=1)N(CC)CC)=C1C=CC(=[N+](CC)CC)C=C1 ROVRRJSRRSGUOL-UHFFFAOYSA-N 0.000 description 1
230000000007 visual effect Effects 0.000 description 1
229920003169 water-soluble polymer Polymers 0.000 description 1
238000004383 yellowing Methods 0.000 description 1
BOXSVZNGTQTENJ-UHFFFAOYSA-L zinc dibutyldithiocarbamate Chemical compound [Zn+2].CCCCN(C([S-])=S)CCCC.CCCCN(C([S-])=S)CCCC BOXSVZNGTQTENJ-UHFFFAOYSA-L 0.000 description 1
PAPBSGBWRJIAAV-UHFFFAOYSA-N ε-Caprolactone Chemical compound O=C1CCCCCO1 PAPBSGBWRJIAAV-UHFFFAOYSA-N 0.000 description 1

Images

Classifications

- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B5/00—Optical elements other than lenses
- G02B5/20—Filters
- G02B5/201—Filters in the form of arrays
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B5/00—Optical elements other than lenses
- G02B5/20—Filters
- G02B5/22—Absorbing filters
- G02B5/223—Absorbing filters containing organic substances, e.g. dyes, inks or pigments
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/0005—Production of optical devices or components in so far as characterised by the lithographic processes or materials used therefor
- G03F7/0007—Filters, e.g. additive colour filters; Components for display devices
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
- G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
- G03F7/031—Organic compounds not covered by group G03F7/029
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
- G03F7/032—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders
- G03F7/033—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders the binders being polymers obtained by reactions only involving carbon-to-carbon unsaturated bonds, e.g. vinyl polymers
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable

Landscapes

Physics & Mathematics (AREA)
General Physics & Mathematics (AREA)
Spectroscopy & Molecular Physics (AREA)
Optics & Photonics (AREA)
Chemical & Material Sciences (AREA)
Chemical Kinetics & Catalysis (AREA)
Optical Filters (AREA)
Materials For Photolithography (AREA)
Liquid Crystal (AREA)

KR1020087004703A 2005-07-29 2006-06-16 액정표시소자용 감광성 수지조성물, 그를 이용한컬러필터와 그 제조방법 및 액정표시소자 Ceased KR20080030687A (ko)

Applications Claiming Priority (4)

Application Number	Priority Date	Filing Date	Title
JPJP-P-2005-00222261		2005-07-29
JP2005222261		2005-07-29
JPJP-P-2005-00368716		2005-12-21
JP2005368716		2005-12-21

Publications (1)

Publication Number	Publication Date
KR20080030687A true KR20080030687A (ko)	2008-04-04

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KR1020087004703A Ceased KR20080030687A (ko)	2005-07-29	2006-06-16	액정표시소자용 감광성 수지조성물, 그를 이용한컬러필터와 그 제조방법 및 액정표시소자

Country Status (4)

Country	Link
JP (1)	JPWO2007013233A1 (fr)
KR (1)	KR20080030687A (fr)
TW (1)	TW200712770A (fr)
WO (1)	WO2007013233A1 (fr)

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JP5213436B2 (ja) *	2007-04-27	2013-06-19	富士フイルム株式会社	感光性樹脂組成物、感光性樹脂転写フイルム及びフォトスペーサーの製造方法、並びに液晶表示装置用基板及び液晶表示装置
JP5387894B2 (ja) *	2009-04-17	2014-01-15	日立化成株式会社	導電性転写フィルム及びそれを用いた導電性パターンの形成方法
KR20120021488A (ko) *	2010-08-03	2012-03-09	주식회사 동진쎄미켐	네가티브 감광성 수지 조성물
TW202330643A (zh) *	2022-01-14	2023-08-01	日商旭化成股份有限公司	感光性樹脂組成物、感光性樹脂積層體、及光阻圖案之形成方法

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US3549367A (en) *	1968-05-24	1970-12-22	Du Pont	Photopolymerizable compositions containing triarylimidazolyl dimers and p-aminophenyl ketones
JP3893553B2 (ja) *	1998-09-22	2007-03-14	富士フイルム株式会社	感光性転写材料
JP4096857B2 (ja) *	2003-09-30	2008-06-04	三菱化学株式会社	青紫色レーザー感光性画像形成材料、青紫色レーザー感光性画像形成材及び画像形成方法

2006
- 2006-06-16 WO PCT/JP2006/312094 patent/WO2007013233A1/fr not_active Ceased
- 2006-06-16 JP JP2007528371A patent/JPWO2007013233A1/ja not_active Abandoned
- 2006-06-16 KR KR1020087004703A patent/KR20080030687A/ko not_active Ceased
- 2006-07-19 TW TW095126317A patent/TW200712770A/zh unknown

Also Published As

Publication number	Publication date
JPWO2007013233A1 (ja)	2009-02-05
WO2007013233A1 (fr)	2007-02-01
TW200712770A (en)	2007-04-01

Publication	Publication Date	Title
KR101802093B1 (ko)	2017-11-27	착색 조성물, 컬러 필터 및 컬러 액정 표시 소자
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JP4904869B2 (ja)	2012-03-28	着色層形成用感放射線性組成物およびカラーフィルタ
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