KR20080023649A - Photosensitive Paste and Plasma Display Panel - Google Patents
Photosensitive Paste and Plasma Display Panel Download PDFInfo
- Publication number
- KR20080023649A KR20080023649A KR1020070091461A KR20070091461A KR20080023649A KR 20080023649 A KR20080023649 A KR 20080023649A KR 1020070091461 A KR1020070091461 A KR 1020070091461A KR 20070091461 A KR20070091461 A KR 20070091461A KR 20080023649 A KR20080023649 A KR 20080023649A
- Authority
- KR
- South Korea
- Prior art keywords
- photosensitive paste
- organic solvent
- boiling point
- acid
- plasma display
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 239000003960 organic solvent Substances 0.000 claims abstract description 24
- 238000009835 boiling Methods 0.000 claims abstract description 21
- 239000002270 dispersing agent Substances 0.000 claims abstract description 16
- 239000010419 fine particle Substances 0.000 claims abstract description 15
- OAICVXFJPJFONN-UHFFFAOYSA-N Phosphorus Chemical compound [P] OAICVXFJPJFONN-UHFFFAOYSA-N 0.000 claims abstract description 10
- 239000003795 chemical substances by application Substances 0.000 claims abstract description 10
- 239000000178 monomer Substances 0.000 claims abstract description 10
- 239000000654 additive Substances 0.000 claims abstract description 9
- 230000000996 additive effect Effects 0.000 claims abstract description 9
- 239000011230 binding agent Substances 0.000 claims abstract description 9
- 150000001412 amines Chemical class 0.000 claims abstract description 8
- 150000001732 carboxylic acid derivatives Chemical class 0.000 claims abstract description 6
- 229910052698 phosphorus Inorganic materials 0.000 claims abstract description 6
- 239000011574 phosphorus Substances 0.000 claims abstract description 6
- FPZWZCWUIYYYBU-UHFFFAOYSA-N 2-(2-ethoxyethoxy)ethyl acetate Chemical compound CCOCCOCCOC(C)=O FPZWZCWUIYYYBU-UHFFFAOYSA-N 0.000 claims description 5
- 239000000758 substrate Substances 0.000 abstract description 26
- 238000007639 printing Methods 0.000 abstract description 17
- 238000000034 method Methods 0.000 abstract description 9
- 238000001035 drying Methods 0.000 abstract description 7
- 239000000463 material Substances 0.000 abstract description 6
- NIXOWILDQLNWCW-UHFFFAOYSA-N acrylic acid group Chemical group C(C=C)(=O)O NIXOWILDQLNWCW-UHFFFAOYSA-N 0.000 abstract description 5
- 239000011347 resin Substances 0.000 description 27
- 229920005989 resin Polymers 0.000 description 27
- 125000003178 carboxy group Chemical group [H]OC(*)=O 0.000 description 25
- 239000011521 glass Substances 0.000 description 21
- 239000000203 mixture Substances 0.000 description 19
- 239000000843 powder Substances 0.000 description 14
- NIXOWILDQLNWCW-UHFFFAOYSA-M Acrylate Chemical compound [O-]C(=O)C=C NIXOWILDQLNWCW-UHFFFAOYSA-M 0.000 description 12
- 238000013329 compounding Methods 0.000 description 11
- 230000018109 developmental process Effects 0.000 description 11
- -1 (meth) acrylic acid Chemical class 0.000 description 9
- 239000011248 coating agent Substances 0.000 description 9
- 238000000576 coating method Methods 0.000 description 9
- 150000001875 compounds Chemical class 0.000 description 9
- 229910052751 metal Inorganic materials 0.000 description 8
- 239000002184 metal Substances 0.000 description 8
- 230000007547 defect Effects 0.000 description 7
- 229910044991 metal oxide Inorganic materials 0.000 description 7
- 150000004706 metal oxides Chemical class 0.000 description 7
- NBIIXXVUZAFLBC-UHFFFAOYSA-N Phosphoric acid Chemical compound OP(O)(O)=O NBIIXXVUZAFLBC-UHFFFAOYSA-N 0.000 description 6
- 239000002253 acid Substances 0.000 description 6
- 150000008065 acid anhydrides Chemical class 0.000 description 6
- 125000002887 hydroxy group Chemical group [H]O* 0.000 description 6
- 238000000016 photochemical curing Methods 0.000 description 6
- 150000007519 polyprotic acids Polymers 0.000 description 6
- CERQOIWHTDAKMF-UHFFFAOYSA-N Methacrylic acid Chemical compound CC(=C)C(O)=O CERQOIWHTDAKMF-UHFFFAOYSA-N 0.000 description 5
- ISAOCJYIOMOJEB-UHFFFAOYSA-N benzoin Chemical compound C=1C=CC=CC=1C(O)C(=O)C1=CC=CC=C1 ISAOCJYIOMOJEB-UHFFFAOYSA-N 0.000 description 5
- 229920001577 copolymer Polymers 0.000 description 5
- LYCAIKOWRPUZTN-UHFFFAOYSA-N ethylene glycol Natural products OCCO LYCAIKOWRPUZTN-UHFFFAOYSA-N 0.000 description 5
- PXHVJJICTQNCMI-UHFFFAOYSA-N nickel Substances [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 5
- 238000005192 partition Methods 0.000 description 5
- 239000000049 pigment Substances 0.000 description 5
- 238000000926 separation method Methods 0.000 description 5
- OFOBLEOULBTSOW-UHFFFAOYSA-N Propanedioic acid Natural products OC(=O)CC(O)=O OFOBLEOULBTSOW-UHFFFAOYSA-N 0.000 description 4
- XLOMVQKBTHCTTD-UHFFFAOYSA-N Zinc monoxide Chemical compound [Zn]=O XLOMVQKBTHCTTD-UHFFFAOYSA-N 0.000 description 4
- 238000010304 firing Methods 0.000 description 4
- 125000003055 glycidyl group Chemical group C(C1CO1)* 0.000 description 4
- 239000011256 inorganic filler Substances 0.000 description 4
- 229910003475 inorganic filler Inorganic materials 0.000 description 4
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 description 4
- 239000002245 particle Substances 0.000 description 4
- 239000003208 petroleum Substances 0.000 description 4
- XNGIFLGASWRNHJ-UHFFFAOYSA-N phthalic acid Chemical compound OC(=O)C1=CC=CC=C1C(O)=O XNGIFLGASWRNHJ-UHFFFAOYSA-N 0.000 description 4
- 239000000243 solution Substances 0.000 description 4
- KMOUUZVZFBCRAM-OLQVQODUSA-N (3as,7ar)-3a,4,7,7a-tetrahydro-2-benzofuran-1,3-dione Chemical compound C1C=CC[C@@H]2C(=O)OC(=O)[C@@H]21 KMOUUZVZFBCRAM-OLQVQODUSA-N 0.000 description 3
- ZWEHNKRNPOVVGH-UHFFFAOYSA-N 2-Butanone Chemical compound CCC(C)=O ZWEHNKRNPOVVGH-UHFFFAOYSA-N 0.000 description 3
- QTBSBXVTEAMEQO-UHFFFAOYSA-N Acetic acid Chemical compound CC(O)=O QTBSBXVTEAMEQO-UHFFFAOYSA-N 0.000 description 3
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 3
- XEKOWRVHYACXOJ-UHFFFAOYSA-N Ethyl acetate Chemical compound CCOC(C)=O XEKOWRVHYACXOJ-UHFFFAOYSA-N 0.000 description 3
- KDLHZDBZIXYQEI-UHFFFAOYSA-N Palladium Chemical compound [Pd] KDLHZDBZIXYQEI-UHFFFAOYSA-N 0.000 description 3
- KWYUFKZDYYNOTN-UHFFFAOYSA-M Potassium hydroxide Chemical compound [OH-].[K+] KWYUFKZDYYNOTN-UHFFFAOYSA-M 0.000 description 3
- DNIAPMSPPWPWGF-UHFFFAOYSA-N Propylene glycol Chemical compound CC(O)CO DNIAPMSPPWPWGF-UHFFFAOYSA-N 0.000 description 3
- HEMHJVSKTPXQMS-UHFFFAOYSA-M Sodium hydroxide Chemical compound [OH-].[Na+] HEMHJVSKTPXQMS-UHFFFAOYSA-M 0.000 description 3
- 244000028419 Styrax benzoin Species 0.000 description 3
- 235000000126 Styrax benzoin Nutrition 0.000 description 3
- 235000008411 Sumatra benzointree Nutrition 0.000 description 3
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 description 3
- ZMANZCXQSJIPKH-UHFFFAOYSA-N Triethylamine Chemical compound CCN(CC)CC ZMANZCXQSJIPKH-UHFFFAOYSA-N 0.000 description 3
- 239000003513 alkali Substances 0.000 description 3
- 229910052782 aluminium Inorganic materials 0.000 description 3
- 229910000147 aluminium phosphate Inorganic materials 0.000 description 3
- 229960002130 benzoin Drugs 0.000 description 3
- 230000015572 biosynthetic process Effects 0.000 description 3
- KRKNYBCHXYNGOX-UHFFFAOYSA-N citric acid Chemical compound OC(=O)CC(O)(C(O)=O)CC(O)=O KRKNYBCHXYNGOX-UHFFFAOYSA-N 0.000 description 3
- 239000003086 colorant Substances 0.000 description 3
- 239000010949 copper Substances 0.000 description 3
- MTHSVFCYNBDYFN-UHFFFAOYSA-N diethylene glycol Chemical compound OCCOCCO MTHSVFCYNBDYFN-UHFFFAOYSA-N 0.000 description 3
- 235000019382 gum benzoic Nutrition 0.000 description 3
- 239000010410 layer Substances 0.000 description 3
- 229910052759 nickel Inorganic materials 0.000 description 3
- BASFCYQUMIYNBI-UHFFFAOYSA-N platinum Chemical compound [Pt] BASFCYQUMIYNBI-UHFFFAOYSA-N 0.000 description 3
- 229920000642 polymer Polymers 0.000 description 3
- 239000011241 protective layer Substances 0.000 description 3
- 229910052709 silver Inorganic materials 0.000 description 3
- 239000002904 solvent Substances 0.000 description 3
- 238000003860 storage Methods 0.000 description 3
- 238000012719 thermal polymerization Methods 0.000 description 3
- VZCYOOQTPOCHFL-UHFFFAOYSA-N trans-butenedioic acid Natural products OC(=O)C=CC(O)=O VZCYOOQTPOCHFL-UHFFFAOYSA-N 0.000 description 3
- OZAIFHULBGXAKX-UHFFFAOYSA-N 2-(2-cyanopropan-2-yldiazenyl)-2-methylpropanenitrile Chemical compound N#CC(C)(C)N=NC(C)(C)C#N OZAIFHULBGXAKX-UHFFFAOYSA-N 0.000 description 2
- LEJBBGNFPAFPKQ-UHFFFAOYSA-N 2-(2-prop-2-enoyloxyethoxy)ethyl prop-2-enoate Chemical compound C=CC(=O)OCCOCCOC(=O)C=C LEJBBGNFPAFPKQ-UHFFFAOYSA-N 0.000 description 2
- INQDDHNZXOAFFD-UHFFFAOYSA-N 2-[2-(2-prop-2-enoyloxyethoxy)ethoxy]ethyl prop-2-enoate Chemical compound C=CC(=O)OCCOCCOCCOC(=O)C=C INQDDHNZXOAFFD-UHFFFAOYSA-N 0.000 description 2
- XLLIQLLCWZCATF-UHFFFAOYSA-N 2-methoxyethyl acetate Chemical compound COCCOC(C)=O XLLIQLLCWZCATF-UHFFFAOYSA-N 0.000 description 2
- NJWGQARXZDRHCD-UHFFFAOYSA-N 2-methylanthraquinone Chemical compound C1=CC=C2C(=O)C3=CC(C)=CC=C3C(=O)C2=C1 NJWGQARXZDRHCD-UHFFFAOYSA-N 0.000 description 2
- DLTXRGFRPZKYNS-UHFFFAOYSA-N 2-methylpropan-1-ol;2,2,4-trimethylpentane-1,3-diol Chemical compound CC(C)CO.CC(C)C(O)C(C)(C)CO DLTXRGFRPZKYNS-UHFFFAOYSA-N 0.000 description 2
- SEILKFZTLVMHRR-UHFFFAOYSA-N 2-phosphonooxyethyl 2-methylprop-2-enoate Chemical compound CC(=C)C(=O)OCCOP(O)(O)=O SEILKFZTLVMHRR-UHFFFAOYSA-N 0.000 description 2
- YEJRWHAVMIAJKC-UHFFFAOYSA-N 4-Butyrolactone Chemical compound O=C1CCCO1 YEJRWHAVMIAJKC-UHFFFAOYSA-N 0.000 description 2
- KWOLFJPFCHCOCG-UHFFFAOYSA-N Acetophenone Chemical compound CC(=O)C1=CC=CC=C1 KWOLFJPFCHCOCG-UHFFFAOYSA-N 0.000 description 2
- RTZKZFJDLAIYFH-UHFFFAOYSA-N Diethyl ether Chemical compound CCOCC RTZKZFJDLAIYFH-UHFFFAOYSA-N 0.000 description 2
- VZCYOOQTPOCHFL-OWOJBTEDSA-N Fumaric acid Chemical compound OC(=O)\C=C\C(O)=O VZCYOOQTPOCHFL-OWOJBTEDSA-N 0.000 description 2
- CERQOIWHTDAKMF-UHFFFAOYSA-M Methacrylate Chemical compound CC(=C)C([O-])=O CERQOIWHTDAKMF-UHFFFAOYSA-M 0.000 description 2
- BAPJBEWLBFYGME-UHFFFAOYSA-N Methyl acrylate Chemical compound COC(=O)C=C BAPJBEWLBFYGME-UHFFFAOYSA-N 0.000 description 2
- 239000004372 Polyvinyl alcohol Substances 0.000 description 2
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 2
- BQCADISMDOOEFD-UHFFFAOYSA-N Silver Chemical compound [Ag] BQCADISMDOOEFD-UHFFFAOYSA-N 0.000 description 2
- CDBYLPFSWZWCQE-UHFFFAOYSA-L Sodium Carbonate Chemical compound [Na+].[Na+].[O-]C([O-])=O CDBYLPFSWZWCQE-UHFFFAOYSA-L 0.000 description 2
- 235000021355 Stearic acid Nutrition 0.000 description 2
- PPBRXRYQALVLMV-UHFFFAOYSA-N Styrene Chemical compound C=CC1=CC=CC=C1 PPBRXRYQALVLMV-UHFFFAOYSA-N 0.000 description 2
- KKEYFWRCBNTPAC-UHFFFAOYSA-N Terephthalic acid Chemical compound OC(=O)C1=CC=C(C(O)=O)C=C1 KKEYFWRCBNTPAC-UHFFFAOYSA-N 0.000 description 2
- WNLRTRBMVRJNCN-UHFFFAOYSA-N adipic acid Chemical compound OC(=O)CCCCC(O)=O WNLRTRBMVRJNCN-UHFFFAOYSA-N 0.000 description 2
- 150000001298 alcohols Chemical class 0.000 description 2
- 239000012965 benzophenone Substances 0.000 description 2
- WERYXYBDKMZEQL-UHFFFAOYSA-N butane-1,4-diol Chemical compound OCCCCO WERYXYBDKMZEQL-UHFFFAOYSA-N 0.000 description 2
- 150000001735 carboxylic acids Chemical class 0.000 description 2
- 230000000052 comparative effect Effects 0.000 description 2
- 229910052802 copper Inorganic materials 0.000 description 2
- JHIVVAPYMSGYDF-UHFFFAOYSA-N cyclohexanone Chemical compound O=C1CCCCC1 JHIVVAPYMSGYDF-UHFFFAOYSA-N 0.000 description 2
- DIOQZVSQGTUSAI-UHFFFAOYSA-N decane Chemical compound CCCCCCCCCC DIOQZVSQGTUSAI-UHFFFAOYSA-N 0.000 description 2
- 230000006866 deterioration Effects 0.000 description 2
- 125000004386 diacrylate group Chemical group 0.000 description 2
- 235000014113 dietary fatty acids Nutrition 0.000 description 2
- 125000003700 epoxy group Chemical group 0.000 description 2
- 238000011156 evaluation Methods 0.000 description 2
- 239000000194 fatty acid Substances 0.000 description 2
- 229930195729 fatty acid Natural products 0.000 description 2
- 150000004665 fatty acids Chemical class 0.000 description 2
- 230000002349 favourable effect Effects 0.000 description 2
- 239000010931 gold Substances 0.000 description 2
- 150000002367 halogens Chemical group 0.000 description 2
- WGCNASOHLSPBMP-UHFFFAOYSA-N hydroxyacetaldehyde Natural products OCC=O WGCNASOHLSPBMP-UHFFFAOYSA-N 0.000 description 2
- 239000003999 initiator Substances 0.000 description 2
- XEEYBQQBJWHFJM-UHFFFAOYSA-N iron Substances [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 description 2
- VZCYOOQTPOCHFL-UPHRSURJSA-N maleic acid Chemical compound OC(=O)\C=C/C(O)=O VZCYOOQTPOCHFL-UPHRSURJSA-N 0.000 description 2
- 239000011976 maleic acid Substances 0.000 description 2
- 239000011159 matrix material Substances 0.000 description 2
- BDAGIHXWWSANSR-UHFFFAOYSA-N methanoic acid Natural products OC=O BDAGIHXWWSANSR-UHFFFAOYSA-N 0.000 description 2
- 238000002156 mixing Methods 0.000 description 2
- QIQXTHQIDYTFRH-UHFFFAOYSA-N octadecanoic acid Chemical compound CCCCCCCCCCCCCCCCCC(O)=O QIQXTHQIDYTFRH-UHFFFAOYSA-N 0.000 description 2
- OQCDKBAXFALNLD-UHFFFAOYSA-N octadecanoic acid Natural products CCCCCCCC(C)CCCCCCCCC(O)=O OQCDKBAXFALNLD-UHFFFAOYSA-N 0.000 description 2
- 150000007524 organic acids Chemical class 0.000 description 2
- 238000000059 patterning Methods 0.000 description 2
- 150000002978 peroxides Chemical class 0.000 description 2
- 229920000728 polyester Polymers 0.000 description 2
- 239000002685 polymerization catalyst Substances 0.000 description 2
- 229920002451 polyvinyl alcohol Polymers 0.000 description 2
- BWHMMNNQKKPAPP-UHFFFAOYSA-L potassium carbonate Chemical compound [K+].[K+].[O-]C([O-])=O BWHMMNNQKKPAPP-UHFFFAOYSA-L 0.000 description 2
- UOHMMEJUHBCKEE-UHFFFAOYSA-N prehnitene Chemical compound CC1=CC=C(C)C(C)=C1C UOHMMEJUHBCKEE-UHFFFAOYSA-N 0.000 description 2
- 239000010948 rhodium Substances 0.000 description 2
- 238000007650 screen-printing Methods 0.000 description 2
- 239000004332 silver Substances 0.000 description 2
- 239000003381 stabilizer Substances 0.000 description 2
- 239000008117 stearic acid Substances 0.000 description 2
- ARCGXLSVLAOJQL-UHFFFAOYSA-N trimellitic acid Chemical compound OC(=O)C1=CC=C(C(O)=O)C(C(O)=O)=C1 ARCGXLSVLAOJQL-UHFFFAOYSA-N 0.000 description 2
- 239000011787 zinc oxide Substances 0.000 description 2
- QGZHYFIQDSBZCB-UHFFFAOYSA-N (2-ethylphenyl)-(2,4,6-trimethylbenzoyl)phosphinic acid Chemical compound CCC1=CC=CC=C1P(O)(=O)C(=O)C1=C(C)C=C(C)C=C1C QGZHYFIQDSBZCB-UHFFFAOYSA-N 0.000 description 1
- OYHQOLUKZRVURQ-NTGFUMLPSA-N (9Z,12Z)-9,10,12,13-tetratritiooctadeca-9,12-dienoic acid Chemical compound C(CCCCCCC\C(=C(/C\C(=C(/CCCCC)\[3H])\[3H])\[3H])\[3H])(=O)O OYHQOLUKZRVURQ-NTGFUMLPSA-N 0.000 description 1
- WRIDQFICGBMAFQ-UHFFFAOYSA-N (E)-8-Octadecenoic acid Natural products CCCCCCCCCC=CCCCCCCC(O)=O WRIDQFICGBMAFQ-UHFFFAOYSA-N 0.000 description 1
- BJEPYKJPYRNKOW-REOHCLBHSA-N (S)-malic acid Chemical compound OC(=O)[C@@H](O)CC(O)=O BJEPYKJPYRNKOW-REOHCLBHSA-N 0.000 description 1
- XKSUVRWJZCEYQQ-UHFFFAOYSA-N 1,1-dimethoxyethylbenzene Chemical compound COC(C)(OC)C1=CC=CC=C1 XKSUVRWJZCEYQQ-UHFFFAOYSA-N 0.000 description 1
- MYWOJODOMFBVCB-UHFFFAOYSA-N 1,2,6-trimethylphenanthrene Chemical compound CC1=CC=C2C3=CC(C)=CC=C3C=CC2=C1C MYWOJODOMFBVCB-UHFFFAOYSA-N 0.000 description 1
- MSAHTMIQULFMRG-UHFFFAOYSA-N 1,2-diphenyl-2-propan-2-yloxyethanone Chemical compound C=1C=CC=CC=1C(OC(C)C)C(=O)C1=CC=CC=C1 MSAHTMIQULFMRG-UHFFFAOYSA-N 0.000 description 1
- CUVLMZNMSPJDON-UHFFFAOYSA-N 1-(1-butoxypropan-2-yloxy)propan-2-ol Chemical compound CCCCOCC(C)OCC(C)O CUVLMZNMSPJDON-UHFFFAOYSA-N 0.000 description 1
- QUMXDOLUJCHOAY-UHFFFAOYSA-N 1-Phenylethyl acetate Chemical compound CC(=O)OC(C)C1=CC=CC=C1 QUMXDOLUJCHOAY-UHFFFAOYSA-N 0.000 description 1
- DURPTKYDGMDSBL-UHFFFAOYSA-N 1-butoxybutane Chemical compound CCCCOCCCC DURPTKYDGMDSBL-UHFFFAOYSA-N 0.000 description 1
- BOCJQSFSGAZAPQ-UHFFFAOYSA-N 1-chloroanthracene-9,10-dione Chemical compound O=C1C2=CC=CC=C2C(=O)C2=C1C=CC=C2Cl BOCJQSFSGAZAPQ-UHFFFAOYSA-N 0.000 description 1
- CDDDRVNOHLVEED-UHFFFAOYSA-N 1-cyclohexyl-3-[1-[[1-(cyclohexylcarbamoylamino)cyclohexyl]diazenyl]cyclohexyl]urea Chemical compound C1CCCCC1(N=NC1(CCCCC1)NC(=O)NC1CCCCC1)NC(=O)NC1CCCCC1 CDDDRVNOHLVEED-UHFFFAOYSA-N 0.000 description 1
- ARXJGSRGQADJSQ-UHFFFAOYSA-N 1-methoxypropan-2-ol Chemical compound COCC(C)O ARXJGSRGQADJSQ-UHFFFAOYSA-N 0.000 description 1
- CERJZAHSUZVMCH-UHFFFAOYSA-N 2,2-dichloro-1-phenylethanone Chemical compound ClC(Cl)C(=O)C1=CC=CC=C1 CERJZAHSUZVMCH-UHFFFAOYSA-N 0.000 description 1
- GIMQKKFOOYOQGB-UHFFFAOYSA-N 2,2-diethoxy-1,2-diphenylethanone Chemical compound C=1C=CC=CC=1C(OCC)(OCC)C(=O)C1=CC=CC=C1 GIMQKKFOOYOQGB-UHFFFAOYSA-N 0.000 description 1
- KWVGIHKZDCUPEU-UHFFFAOYSA-N 2,2-dimethoxy-2-phenylacetophenone Chemical compound C=1C=CC=CC=1C(OC)(OC)C(=O)C1=CC=CC=C1 KWVGIHKZDCUPEU-UHFFFAOYSA-N 0.000 description 1
- BRKORVYTKKLNKX-UHFFFAOYSA-N 2,4-di(propan-2-yl)thioxanthen-9-one Chemical compound C1=CC=C2C(=O)C3=CC(C(C)C)=CC(C(C)C)=C3SC2=C1 BRKORVYTKKLNKX-UHFFFAOYSA-N 0.000 description 1
- BTJPUDCSZVCXFQ-UHFFFAOYSA-N 2,4-diethylthioxanthen-9-one Chemical compound C1=CC=C2C(=O)C3=CC(CC)=CC(CC)=C3SC2=C1 BTJPUDCSZVCXFQ-UHFFFAOYSA-N 0.000 description 1
- LCHAFMWSFCONOO-UHFFFAOYSA-N 2,4-dimethylthioxanthen-9-one Chemical compound C1=CC=C2C(=O)C3=CC(C)=CC(C)=C3SC2=C1 LCHAFMWSFCONOO-UHFFFAOYSA-N 0.000 description 1
- GNKPXNIWNNKLAA-UHFFFAOYSA-N 2-(1-cyanoethyldiazenyl)-2-methylpropanenitrile Chemical compound N#CC(C)N=NC(C)(C)C#N GNKPXNIWNNKLAA-UHFFFAOYSA-N 0.000 description 1
- OAYXUHPQHDHDDZ-UHFFFAOYSA-N 2-(2-butoxyethoxy)ethanol Chemical compound CCCCOCCOCCO OAYXUHPQHDHDDZ-UHFFFAOYSA-N 0.000 description 1
- VXQBJTKSVGFQOL-UHFFFAOYSA-N 2-(2-butoxyethoxy)ethyl acetate Chemical compound CCCCOCCOCCOC(C)=O VXQBJTKSVGFQOL-UHFFFAOYSA-N 0.000 description 1
- WMDZKDKPYCNCDZ-UHFFFAOYSA-N 2-(2-butoxypropoxy)propan-1-ol Chemical compound CCCCOC(C)COC(C)CO WMDZKDKPYCNCDZ-UHFFFAOYSA-N 0.000 description 1
- OHJYHAOODFPJOD-UHFFFAOYSA-N 2-(2-ethylhexoxy)ethanol Chemical compound CCCCC(CC)COCCO OHJYHAOODFPJOD-UHFFFAOYSA-N 0.000 description 1
- GZMAAYIALGURDQ-UHFFFAOYSA-N 2-(2-hexoxyethoxy)ethanol Chemical compound CCCCCCOCCOCCO GZMAAYIALGURDQ-UHFFFAOYSA-N 0.000 description 1
- SBASXUCJHJRPEV-UHFFFAOYSA-N 2-(2-methoxyethoxy)ethanol Chemical compound COCCOCCO SBASXUCJHJRPEV-UHFFFAOYSA-N 0.000 description 1
- JAHNSTQSQJOJLO-UHFFFAOYSA-N 2-(3-fluorophenyl)-1h-imidazole Chemical compound FC1=CC=CC(C=2NC=CN=2)=C1 JAHNSTQSQJOJLO-UHFFFAOYSA-N 0.000 description 1
- HZAXFHJVJLSVMW-UHFFFAOYSA-N 2-Aminoethan-1-ol Chemical compound NCCO HZAXFHJVJLSVMW-UHFFFAOYSA-N 0.000 description 1
- XNWFRZJHXBZDAG-UHFFFAOYSA-N 2-METHOXYETHANOL Chemical compound COCCO XNWFRZJHXBZDAG-UHFFFAOYSA-N 0.000 description 1
- COBPKKZHLDDMTB-UHFFFAOYSA-N 2-[2-(2-butoxyethoxy)ethoxy]ethanol Chemical compound CCCCOCCOCCOCCO COBPKKZHLDDMTB-UHFFFAOYSA-N 0.000 description 1
- LFPXUOVEKSBGIL-UHFFFAOYSA-N 2-[2-(2-ethoxyethoxy)ethoxy]ethanol 2-[2-(2-hydroxyethoxy)ethoxy]ethanol Chemical compound C(COCCOCCO)O.C(C)OCCOCCOCCO LFPXUOVEKSBGIL-UHFFFAOYSA-N 0.000 description 1
- OADIZUFHUPTFAG-UHFFFAOYSA-N 2-[2-(2-ethylhexoxy)ethoxy]ethanol Chemical compound CCCCC(CC)COCCOCCO OADIZUFHUPTFAG-UHFFFAOYSA-N 0.000 description 1
- OQCUHCVHLRVRSF-UHFFFAOYSA-N 2-[2-(2-hydroxypropoxy)propoxy]propan-1-ol Chemical compound CC(COC(C)COC(C)CO)O.CC(COC(C)COC(C)CO)O OQCUHCVHLRVRSF-UHFFFAOYSA-N 0.000 description 1
- WAEVWDZKMBQDEJ-UHFFFAOYSA-N 2-[2-(2-methoxypropoxy)propoxy]propan-1-ol Chemical compound COC(C)COC(C)COC(C)CO WAEVWDZKMBQDEJ-UHFFFAOYSA-N 0.000 description 1
- FDSUVTROAWLVJA-UHFFFAOYSA-N 2-[[3-hydroxy-2,2-bis(hydroxymethyl)propoxy]methyl]-2-(hydroxymethyl)propane-1,3-diol;prop-2-enoic acid Chemical compound OC(=O)C=C.OC(=O)C=C.OC(=O)C=C.OC(=O)C=C.OC(=O)C=C.OCC(CO)(CO)COCC(CO)(CO)CO FDSUVTROAWLVJA-UHFFFAOYSA-N 0.000 description 1
- NQBXSWAWVZHKBZ-UHFFFAOYSA-N 2-butoxyethyl acetate Chemical compound CCCCOCCOC(C)=O NQBXSWAWVZHKBZ-UHFFFAOYSA-N 0.000 description 1
- ZCDADJXRUCOCJE-UHFFFAOYSA-N 2-chlorothioxanthen-9-one Chemical compound C1=CC=C2C(=O)C3=CC(Cl)=CC=C3SC2=C1 ZCDADJXRUCOCJE-UHFFFAOYSA-N 0.000 description 1
- KMNCBSZOIQAUFX-UHFFFAOYSA-N 2-ethoxy-1,2-diphenylethanone Chemical compound C=1C=CC=CC=1C(OCC)C(=O)C1=CC=CC=C1 KMNCBSZOIQAUFX-UHFFFAOYSA-N 0.000 description 1
- ZNQVEEAIQZEUHB-UHFFFAOYSA-N 2-ethoxyethanol Chemical compound CCOCCO ZNQVEEAIQZEUHB-UHFFFAOYSA-N 0.000 description 1
- SVONRAPFKPVNKG-UHFFFAOYSA-N 2-ethoxyethyl acetate Chemical compound CCOCCOC(C)=O SVONRAPFKPVNKG-UHFFFAOYSA-N 0.000 description 1
- RSROEZYGRKHVMN-UHFFFAOYSA-N 2-ethyl-2-(hydroxymethyl)propane-1,3-diol;oxirane Chemical compound C1CO1.CCC(CO)(CO)CO RSROEZYGRKHVMN-UHFFFAOYSA-N 0.000 description 1
- FUQUBWCLBBUXCM-UHFFFAOYSA-N 2-ethyl-2-(hydroxymethyl)propane-1,3-diol;prop-1-ene Chemical group CC=C.CCC(CO)(CO)CO FUQUBWCLBBUXCM-UHFFFAOYSA-N 0.000 description 1
- SJEBAWHUJDUKQK-UHFFFAOYSA-N 2-ethylanthraquinone Chemical compound C1=CC=C2C(=O)C3=CC(CC)=CC=C3C(=O)C2=C1 SJEBAWHUJDUKQK-UHFFFAOYSA-N 0.000 description 1
- 125000000954 2-hydroxyethyl group Chemical group [H]C([*])([H])C([H])([H])O[H] 0.000 description 1
- OMIGHNLMNHATMP-UHFFFAOYSA-N 2-hydroxyethyl prop-2-enoate Chemical compound OCCOC(=O)C=C OMIGHNLMNHATMP-UHFFFAOYSA-N 0.000 description 1
- GWZMWHWAWHPNHN-UHFFFAOYSA-N 2-hydroxypropyl prop-2-enoate Chemical compound CC(O)COC(=O)C=C GWZMWHWAWHPNHN-UHFFFAOYSA-N 0.000 description 1
- BQZJOQXSCSZQPS-UHFFFAOYSA-N 2-methoxy-1,2-diphenylethanone Chemical compound C=1C=CC=CC=1C(OC)C(=O)C1=CC=CC=C1 BQZJOQXSCSZQPS-UHFFFAOYSA-N 0.000 description 1
- LWRBVKNFOYUCNP-UHFFFAOYSA-N 2-methyl-1-(4-methylsulfanylphenyl)-2-morpholin-4-ylpropan-1-one Chemical compound C1=CC(SC)=CC=C1C(=O)C(C)(C)N1CCOCC1 LWRBVKNFOYUCNP-UHFFFAOYSA-N 0.000 description 1
- CFVWNXQPGQOHRJ-UHFFFAOYSA-N 2-methylpropyl prop-2-enoate Chemical compound CC(C)COC(=O)C=C CFVWNXQPGQOHRJ-UHFFFAOYSA-N 0.000 description 1
- QCDWFXQBSFUVSP-UHFFFAOYSA-N 2-phenoxyethanol Chemical compound OCCOC1=CC=CC=C1 QCDWFXQBSFUVSP-UHFFFAOYSA-N 0.000 description 1
- YTPSFXZMJKMUJE-UHFFFAOYSA-N 2-tert-butylanthracene-9,10-dione Chemical compound C1=CC=C2C(=O)C3=CC(C(C)(C)C)=CC=C3C(=O)C2=C1 YTPSFXZMJKMUJE-UHFFFAOYSA-N 0.000 description 1
- LQJBNNIYVWPHFW-UHFFFAOYSA-N 20:1omega9c fatty acid Natural products CCCCCCCCCCC=CCCCCCCCC(O)=O LQJBNNIYVWPHFW-UHFFFAOYSA-N 0.000 description 1
- QCAHUFWKIQLBNB-UHFFFAOYSA-N 3-(3-methoxypropoxy)propan-1-ol Chemical compound COCCCOCCCO QCAHUFWKIQLBNB-UHFFFAOYSA-N 0.000 description 1
- ARXVXVOLXMVYIT-UHFFFAOYSA-N 3-methylbutyl 2-(dimethylamino)benzoate Chemical compound CC(C)CCOC(=O)C1=CC=CC=C1N(C)C ARXVXVOLXMVYIT-UHFFFAOYSA-N 0.000 description 1
- VFXXTYGQYWRHJP-UHFFFAOYSA-N 4,4'-azobis(4-cyanopentanoic acid) Chemical compound OC(=O)CCC(C)(C#N)N=NC(C)(CCC(O)=O)C#N VFXXTYGQYWRHJP-UHFFFAOYSA-N 0.000 description 1
- OSWFIVFLDKOXQC-UHFFFAOYSA-N 4-(3-methoxyphenyl)aniline Chemical compound COC1=CC=CC(C=2C=CC(N)=CC=2)=C1 OSWFIVFLDKOXQC-UHFFFAOYSA-N 0.000 description 1
- QSBYPNXLFMSGKH-UHFFFAOYSA-N 9-Heptadecensaeure Natural products CCCCCCCC=CCCCCCCCC(O)=O QSBYPNXLFMSGKH-UHFFFAOYSA-N 0.000 description 1
- WDJHALXBUFZDSR-UHFFFAOYSA-N Acetoacetic acid Natural products CC(=O)CC(O)=O WDJHALXBUFZDSR-UHFFFAOYSA-N 0.000 description 1
- 239000004342 Benzoyl peroxide Substances 0.000 description 1
- OMPJBNCRMGITSC-UHFFFAOYSA-N Benzoylperoxide Chemical compound C=1C=CC=CC=1C(=O)OOC(=O)C1=CC=CC=C1 OMPJBNCRMGITSC-UHFFFAOYSA-N 0.000 description 1
- 229910015902 Bi 2 O 3 Inorganic materials 0.000 description 1
- DKPFZGUDAPQIHT-UHFFFAOYSA-N Butyl acetate Natural products CCCCOC(C)=O DKPFZGUDAPQIHT-UHFFFAOYSA-N 0.000 description 1
- WFXRYFVVPWTUHP-UHFFFAOYSA-N C(C=C)(=O)O.C(C=C)(=O)OC1CCCCC1.C(C=C)(=O)OC(C)(C)C Chemical class C(C=C)(=O)O.C(C=C)(=O)OC1CCCCC1.C(C=C)(=O)OC(C)(C)C WFXRYFVVPWTUHP-UHFFFAOYSA-N 0.000 description 1
- XLYLLXFSWDOCNJ-UHFFFAOYSA-N CC(C)CO.CC(C)CO.CC(C)C(C(C)(C)CO)O Chemical compound CC(C)CO.CC(C)CO.CC(C)C(C(C)(C)CO)O XLYLLXFSWDOCNJ-UHFFFAOYSA-N 0.000 description 1
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 1
- 229910017813 Cu—Cr Inorganic materials 0.000 description 1
- 239000004593 Epoxy Substances 0.000 description 1
- VGGSQFUCUMXWEO-UHFFFAOYSA-N Ethene Chemical compound C=C VGGSQFUCUMXWEO-UHFFFAOYSA-N 0.000 description 1
- JIGUQPWFLRLWPJ-UHFFFAOYSA-N Ethyl acrylate Chemical compound CCOC(=O)C=C JIGUQPWFLRLWPJ-UHFFFAOYSA-N 0.000 description 1
- 239000005977 Ethylene Substances 0.000 description 1
- ZOKXTWBITQBERF-UHFFFAOYSA-N Molybdenum Chemical compound [Mo] ZOKXTWBITQBERF-UHFFFAOYSA-N 0.000 description 1
- CTQNGGLPUBDAKN-UHFFFAOYSA-N O-Xylene Chemical compound CC1=CC=CC=C1C CTQNGGLPUBDAKN-UHFFFAOYSA-N 0.000 description 1
- 239000005642 Oleic acid Substances 0.000 description 1
- ZQPPMHVWECSIRJ-UHFFFAOYSA-N Oleic acid Natural products CCCCCCCCC=CCCCCCCCC(O)=O ZQPPMHVWECSIRJ-UHFFFAOYSA-N 0.000 description 1
- 239000002202 Polyethylene glycol Substances 0.000 description 1
- KJTLSVCANCCWHF-UHFFFAOYSA-N Ruthenium Chemical compound [Ru] KJTLSVCANCCWHF-UHFFFAOYSA-N 0.000 description 1
- 229910004298 SiO 2 Inorganic materials 0.000 description 1
- 229910006404 SnO 2 Inorganic materials 0.000 description 1
- 239000004115 Sodium Silicate Substances 0.000 description 1
- KDYFGRWQOYBRFD-UHFFFAOYSA-N Succinic acid Natural products OC(=O)CCC(O)=O KDYFGRWQOYBRFD-UHFFFAOYSA-N 0.000 description 1
- ATJFFYVFTNAWJD-UHFFFAOYSA-N Tin Chemical compound [Sn] ATJFFYVFTNAWJD-UHFFFAOYSA-N 0.000 description 1
- GWEVSGVZZGPLCZ-UHFFFAOYSA-N Titan oxide Chemical compound O=[Ti]=O GWEVSGVZZGPLCZ-UHFFFAOYSA-N 0.000 description 1
- GSEJCLTVZPLZKY-UHFFFAOYSA-N Triethanolamine Chemical compound OCCN(CCO)CCO GSEJCLTVZPLZKY-UHFFFAOYSA-N 0.000 description 1
- ZJCCRDAZUWHFQH-UHFFFAOYSA-N Trimethylolpropane Chemical compound CCC(CO)(CO)CO ZJCCRDAZUWHFQH-UHFFFAOYSA-N 0.000 description 1
- ALBJGICXDBJZGK-UHFFFAOYSA-N [1-[(1-acetyloxy-1-phenylethyl)diazenyl]-1-phenylethyl] acetate Chemical compound C=1C=CC=CC=1C(C)(OC(=O)C)N=NC(C)(OC(C)=O)C1=CC=CC=C1 ALBJGICXDBJZGK-UHFFFAOYSA-N 0.000 description 1
- HVVWZTWDBSEWIH-UHFFFAOYSA-N [2-(hydroxymethyl)-3-prop-2-enoyloxy-2-(prop-2-enoyloxymethyl)propyl] prop-2-enoate Chemical compound C=CC(=O)OCC(CO)(COC(=O)C=C)COC(=O)C=C HVVWZTWDBSEWIH-UHFFFAOYSA-N 0.000 description 1
- PIRAJFSIUUNUPY-UHFFFAOYSA-N [Sn]=O.[In].[Sn]=O.[In] Chemical compound [Sn]=O.[In].[Sn]=O.[In] PIRAJFSIUUNUPY-UHFFFAOYSA-N 0.000 description 1
- GUCYFKSBFREPBC-UHFFFAOYSA-N [phenyl-(2,4,6-trimethylbenzoyl)phosphoryl]-(2,4,6-trimethylphenyl)methanone Chemical compound CC1=CC(C)=CC(C)=C1C(=O)P(=O)(C=1C=CC=CC=1)C(=O)C1=C(C)C=C(C)C=C1C GUCYFKSBFREPBC-UHFFFAOYSA-N 0.000 description 1
- 235000011054 acetic acid Nutrition 0.000 description 1
- 150000008062 acetophenones Chemical class 0.000 description 1
- 150000007513 acids Chemical class 0.000 description 1
- 150000001252 acrylic acid derivatives Chemical class 0.000 description 1
- 125000003647 acryloyl group Chemical group O=C([*])C([H])=C([H])[H] 0.000 description 1
- 239000001361 adipic acid Substances 0.000 description 1
- 235000011037 adipic acid Nutrition 0.000 description 1
- 230000002411 adverse Effects 0.000 description 1
- 230000032683 aging Effects 0.000 description 1
- 150000001338 aliphatic hydrocarbons Chemical class 0.000 description 1
- 239000000956 alloy Substances 0.000 description 1
- 229910045601 alloy Inorganic materials 0.000 description 1
- BJEPYKJPYRNKOW-UHFFFAOYSA-N alpha-hydroxysuccinic acid Natural products OC(=O)C(O)CC(O)=O BJEPYKJPYRNKOW-UHFFFAOYSA-N 0.000 description 1
- DTOSIQBPPRVQHS-PDBXOOCHSA-N alpha-linolenic acid Chemical compound CC\C=C/C\C=C/C\C=C/CCCCCCCC(O)=O DTOSIQBPPRVQHS-PDBXOOCHSA-N 0.000 description 1
- 235000020661 alpha-linolenic acid Nutrition 0.000 description 1
- WUOACPNHFRMFPN-UHFFFAOYSA-N alpha-terpineol Chemical compound CC1=CCC(C(C)(C)O)CC1 WUOACPNHFRMFPN-UHFFFAOYSA-N 0.000 description 1
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 1
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 description 1
- 150000004056 anthraquinones Chemical class 0.000 description 1
- 239000003963 antioxidant agent Substances 0.000 description 1
- 239000007864 aqueous solution Substances 0.000 description 1
- 150000004945 aromatic hydrocarbons Chemical class 0.000 description 1
- 239000012298 atmosphere Substances 0.000 description 1
- QVQLCTNNEUAWMS-UHFFFAOYSA-N barium oxide Inorganic materials [Ba]=O QVQLCTNNEUAWMS-UHFFFAOYSA-N 0.000 description 1
- 239000002585 base Substances 0.000 description 1
- SRSXLGNVWSONIS-UHFFFAOYSA-N benzenesulfonic acid Chemical compound OS(=O)(=O)C1=CC=CC=C1 SRSXLGNVWSONIS-UHFFFAOYSA-N 0.000 description 1
- 229940092714 benzenesulfonic acid Drugs 0.000 description 1
- RWCCWEUUXYIKHB-UHFFFAOYSA-N benzophenone Chemical compound C=1C=CC=CC=1C(=O)C1=CC=CC=C1 RWCCWEUUXYIKHB-UHFFFAOYSA-N 0.000 description 1
- 150000008366 benzophenones Chemical class 0.000 description 1
- 235000019400 benzoyl peroxide Nutrition 0.000 description 1
- 229910000416 bismuth oxide Inorganic materials 0.000 description 1
- KGBXLFKZBHKPEV-UHFFFAOYSA-N boric acid Chemical compound OB(O)O KGBXLFKZBHKPEV-UHFFFAOYSA-N 0.000 description 1
- 239000004327 boric acid Substances 0.000 description 1
- 229910052810 boron oxide Inorganic materials 0.000 description 1
- KDYFGRWQOYBRFD-NUQCWPJISA-N butanedioic acid Chemical compound O[14C](=O)CC[14C](O)=O KDYFGRWQOYBRFD-NUQCWPJISA-N 0.000 description 1
- CQEYYJKEWSMYFG-UHFFFAOYSA-N butyl acrylate Chemical compound CCCCOC(=O)C=C CQEYYJKEWSMYFG-UHFFFAOYSA-N 0.000 description 1
- 230000000536 complexating effect Effects 0.000 description 1
- 239000004020 conductor Substances 0.000 description 1
- 238000001723 curing Methods 0.000 description 1
- PESYEWKSBIWTAK-UHFFFAOYSA-N cyclopenta-1,3-diene;titanium(2+) Chemical compound [Ti+2].C=1C=C[CH-]C=1.C=1C=C[CH-]C=1 PESYEWKSBIWTAK-UHFFFAOYSA-N 0.000 description 1
- 230000002950 deficient Effects 0.000 description 1
- 239000013530 defoamer Substances 0.000 description 1
- SQIFACVGCPWBQZ-UHFFFAOYSA-N delta-terpineol Natural products CC(C)(O)C1CCC(=C)CC1 SQIFACVGCPWBQZ-UHFFFAOYSA-N 0.000 description 1
- 238000000151 deposition Methods 0.000 description 1
- WOWBFOBYOAGEEA-UHFFFAOYSA-N diafenthiuron Chemical compound CC(C)C1=C(NC(=S)NC(C)(C)C)C(C(C)C)=CC(OC=2C=CC=CC=2)=C1 WOWBFOBYOAGEEA-UHFFFAOYSA-N 0.000 description 1
- TYIXMATWDRGMPF-UHFFFAOYSA-N dibismuth;oxygen(2-) Chemical compound [O-2].[O-2].[O-2].[Bi+3].[Bi+3] TYIXMATWDRGMPF-UHFFFAOYSA-N 0.000 description 1
- ZBCBWPMODOFKDW-UHFFFAOYSA-N diethanolamine Chemical compound OCCNCCO ZBCBWPMODOFKDW-UHFFFAOYSA-N 0.000 description 1
- 229940028356 diethylene glycol monobutyl ether Drugs 0.000 description 1
- KUMNEOGIHFCNQW-UHFFFAOYSA-N diphenyl phosphite Chemical compound C=1C=CC=CC=1OP([O-])OC1=CC=CC=C1 KUMNEOGIHFCNQW-UHFFFAOYSA-N 0.000 description 1
- DKKXSNXGIOPYGQ-UHFFFAOYSA-N diphenylphosphanyl-(2,4,6-trimethylphenyl)methanone Chemical compound CC1=CC(C)=CC(C)=C1C(=O)P(C=1C=CC=CC=1)C1=CC=CC=C1 DKKXSNXGIOPYGQ-UHFFFAOYSA-N 0.000 description 1
- 238000007598 dipping method Methods 0.000 description 1
- 238000004090 dissolution Methods 0.000 description 1
- 238000009826 distribution Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 230000007613 environmental effect Effects 0.000 description 1
- 150000002148 esters Chemical class 0.000 description 1
- ZUNGGJHBMLMRFJ-UHFFFAOYSA-O ethoxy-hydroxy-oxophosphanium Chemical compound CCO[P+](O)=O ZUNGGJHBMLMRFJ-UHFFFAOYSA-O 0.000 description 1
- ORBFAMHUKZLWSD-UHFFFAOYSA-N ethyl 2-(dimethylamino)benzoate Chemical compound CCOC(=O)C1=CC=CC=C1N(C)C ORBFAMHUKZLWSD-UHFFFAOYSA-N 0.000 description 1
- ZJXZSIYSNXKHEA-UHFFFAOYSA-N ethyl dihydrogen phosphate Chemical compound CCOP(O)(O)=O ZJXZSIYSNXKHEA-UHFFFAOYSA-N 0.000 description 1
- 235000019253 formic acid Nutrition 0.000 description 1
- 239000001530 fumaric acid Substances 0.000 description 1
- 239000007789 gas Substances 0.000 description 1
- 230000014509 gene expression Effects 0.000 description 1
- 230000009477 glass transition Effects 0.000 description 1
- 150000002334 glycols Chemical class 0.000 description 1
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 description 1
- 229910052737 gold Inorganic materials 0.000 description 1
- 229910052736 halogen Inorganic materials 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- FUZZWVXGSFPDMH-UHFFFAOYSA-N hexanoic acid Chemical compound CCCCCC(O)=O FUZZWVXGSFPDMH-UHFFFAOYSA-N 0.000 description 1
- 229930195733 hydrocarbon Natural products 0.000 description 1
- 150000002430 hydrocarbons Chemical class 0.000 description 1
- 125000002768 hydroxyalkyl group Chemical group 0.000 description 1
- 229910003437 indium oxide Inorganic materials 0.000 description 1
- PJXISJQVUVHSOJ-UHFFFAOYSA-N indium(iii) oxide Chemical compound [O-2].[O-2].[O-2].[In+3].[In+3] PJXISJQVUVHSOJ-UHFFFAOYSA-N 0.000 description 1
- 238000007603 infrared drying Methods 0.000 description 1
- 239000003112 inhibitor Substances 0.000 description 1
- 229910052741 iridium Inorganic materials 0.000 description 1
- GKOZUEZYRPOHIO-UHFFFAOYSA-N iridium atom Chemical compound [Ir] GKOZUEZYRPOHIO-UHFFFAOYSA-N 0.000 description 1
- 229910052742 iron Inorganic materials 0.000 description 1
- QXJSBBXBKPUZAA-UHFFFAOYSA-N isooleic acid Natural products CCCCCCCC=CCCCCCCCCC(O)=O QXJSBBXBKPUZAA-UHFFFAOYSA-N 0.000 description 1
- 239000010977 jade Substances 0.000 description 1
- 150000002576 ketones Chemical class 0.000 description 1
- 229910000464 lead oxide Inorganic materials 0.000 description 1
- 229960004488 linolenic acid Drugs 0.000 description 1
- KQQKGWQCNNTQJW-UHFFFAOYSA-N linolenic acid Natural products CC=CCCC=CCC=CCCCCCCCC(O)=O KQQKGWQCNNTQJW-UHFFFAOYSA-N 0.000 description 1
- 238000001459 lithography Methods 0.000 description 1
- FPYJFEHAWHCUMM-UHFFFAOYSA-N maleic anhydride Chemical compound O=C1OC(=O)C=C1 FPYJFEHAWHCUMM-UHFFFAOYSA-N 0.000 description 1
- 239000001630 malic acid Substances 0.000 description 1
- 235000011090 malic acid Nutrition 0.000 description 1
- 229910052748 manganese Inorganic materials 0.000 description 1
- 239000011572 manganese Substances 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 238000000691 measurement method Methods 0.000 description 1
- 238000002844 melting Methods 0.000 description 1
- 230000008018 melting Effects 0.000 description 1
- QSHDDOUJBYECFT-UHFFFAOYSA-N mercury Chemical compound [Hg] QSHDDOUJBYECFT-UHFFFAOYSA-N 0.000 description 1
- 229910052753 mercury Inorganic materials 0.000 description 1
- 150000002734 metacrylic acid derivatives Chemical class 0.000 description 1
- 229910001507 metal halide Inorganic materials 0.000 description 1
- 150000005309 metal halides Chemical class 0.000 description 1
- ZQMHJBXHRFJKOT-UHFFFAOYSA-N methyl 2-[(1-methoxy-2-methyl-1-oxopropan-2-yl)diazenyl]-2-methylpropanoate Chemical compound COC(=O)C(C)(C)N=NC(C)(C)C(=O)OC ZQMHJBXHRFJKOT-UHFFFAOYSA-N 0.000 description 1
- CAAULPUQFIIOTL-UHFFFAOYSA-N methyl dihydrogen phosphate Chemical compound COP(O)(O)=O CAAULPUQFIIOTL-UHFFFAOYSA-N 0.000 description 1
- LVHBHZANLOWSRM-UHFFFAOYSA-N methylenebutanedioic acid Natural products OC(=O)CC(=C)C(O)=O LVHBHZANLOWSRM-UHFFFAOYSA-N 0.000 description 1
- 239000011859 microparticle Substances 0.000 description 1
- 150000007522 mineralic acids Chemical class 0.000 description 1
- 239000011812 mixed powder Substances 0.000 description 1
- 229910052750 molybdenum Inorganic materials 0.000 description 1
- 239000011733 molybdenum Substances 0.000 description 1
- 150000002763 monocarboxylic acids Chemical class 0.000 description 1
- ZFGUAQSDWQIVMM-UHFFFAOYSA-N n'-hydroxy-2-methylbutanimidamide Chemical compound CCC(C)C(N)=NO ZFGUAQSDWQIVMM-UHFFFAOYSA-N 0.000 description 1
- LNOPIUAQISRISI-UHFFFAOYSA-N n'-hydroxy-2-propan-2-ylsulfonylethanimidamide Chemical compound CC(C)S(=O)(=O)CC(N)=NO LNOPIUAQISRISI-UHFFFAOYSA-N 0.000 description 1
- 238000006386 neutralization reaction Methods 0.000 description 1
- 150000002825 nitriles Chemical class 0.000 description 1
- 239000012299 nitrogen atmosphere Substances 0.000 description 1
- TVMXDCGIABBOFY-UHFFFAOYSA-N octane Chemical compound CCCCCCCC TVMXDCGIABBOFY-UHFFFAOYSA-N 0.000 description 1
- OEIJHBUUFURJLI-UHFFFAOYSA-N octane-1,8-diol Chemical compound OCCCCCCCCO OEIJHBUUFURJLI-UHFFFAOYSA-N 0.000 description 1
- ZQPPMHVWECSIRJ-KTKRTIGZSA-N oleic acid Chemical compound CCCCCCCC\C=C/CCCCCCCC(O)=O ZQPPMHVWECSIRJ-KTKRTIGZSA-N 0.000 description 1
- 235000021313 oleic acid Nutrition 0.000 description 1
- 230000003287 optical effect Effects 0.000 description 1
- 229910052762 osmium Inorganic materials 0.000 description 1
- SYQBFIAQOQZEGI-UHFFFAOYSA-N osmium atom Chemical compound [Os] SYQBFIAQOQZEGI-UHFFFAOYSA-N 0.000 description 1
- 230000003647 oxidation Effects 0.000 description 1
- 238000007254 oxidation reaction Methods 0.000 description 1
- MOWNZPNSYMGTMD-UHFFFAOYSA-N oxidoboron Chemical class O=[B] MOWNZPNSYMGTMD-UHFFFAOYSA-N 0.000 description 1
- MPQXHAGKBWFSNV-UHFFFAOYSA-N oxidophosphanium Chemical class [PH3]=O MPQXHAGKBWFSNV-UHFFFAOYSA-N 0.000 description 1
- JCGNDDUYTRNOFT-UHFFFAOYSA-N oxolane-2,4-dione Chemical compound O=C1COC(=O)C1 JCGNDDUYTRNOFT-UHFFFAOYSA-N 0.000 description 1
- YEXPOXQUZXUXJW-UHFFFAOYSA-N oxolead Chemical compound [Pb]=O YEXPOXQUZXUXJW-UHFFFAOYSA-N 0.000 description 1
- LXTZRIBXKVRLOA-UHFFFAOYSA-N padimate a Chemical compound CCCCCOC(=O)C1=CC=C(N(C)C)C=C1 LXTZRIBXKVRLOA-UHFFFAOYSA-N 0.000 description 1
- 229910052763 palladium Inorganic materials 0.000 description 1
- PNJWIWWMYCMZRO-UHFFFAOYSA-N pent‐4‐en‐2‐one Natural products CC(=O)CC=C PNJWIWWMYCMZRO-UHFFFAOYSA-N 0.000 description 1
- CMPQUABWPXYYSH-UHFFFAOYSA-N phenyl phosphate Chemical compound OP(O)(=O)OC1=CC=CC=C1 CMPQUABWPXYYSH-UHFFFAOYSA-N 0.000 description 1
- ACVYVLVWPXVTIT-UHFFFAOYSA-N phosphinic acid Chemical compound O[PH2]=O ACVYVLVWPXVTIT-UHFFFAOYSA-N 0.000 description 1
- 150000003016 phosphoric acids Chemical class 0.000 description 1
- 239000003504 photosensitizing agent Substances 0.000 description 1
- 229910052697 platinum Inorganic materials 0.000 description 1
- 229920001223 polyethylene glycol Polymers 0.000 description 1
- 229920001296 polysiloxane Polymers 0.000 description 1
- 229920002635 polyurethane Polymers 0.000 description 1
- 239000004814 polyurethane Substances 0.000 description 1
- 229910000027 potassium carbonate Inorganic materials 0.000 description 1
- BDERNNFJNOPAEC-UHFFFAOYSA-N propan-1-ol Chemical compound CCCO BDERNNFJNOPAEC-UHFFFAOYSA-N 0.000 description 1
- LYBIZMNPXTXVMV-UHFFFAOYSA-N propan-2-yl prop-2-enoate Chemical compound CC(C)OC(=O)C=C LYBIZMNPXTXVMV-UHFFFAOYSA-N 0.000 description 1
- PNXMTCDJUBJHQJ-UHFFFAOYSA-N propyl prop-2-enoate Chemical compound CCCOC(=O)C=C PNXMTCDJUBJHQJ-UHFFFAOYSA-N 0.000 description 1
- LLHKCFNBLRBOGN-UHFFFAOYSA-N propylene glycol methyl ether acetate Chemical compound COCC(C)OC(C)=O LLHKCFNBLRBOGN-UHFFFAOYSA-N 0.000 description 1
- 238000010526 radical polymerization reaction Methods 0.000 description 1
- 230000007261 regionalization Effects 0.000 description 1
- 239000011342 resin composition Substances 0.000 description 1
- 229910052703 rhodium Inorganic materials 0.000 description 1
- MHOVAHRLVXNVSD-UHFFFAOYSA-N rhodium atom Chemical compound [Rh] MHOVAHRLVXNVSD-UHFFFAOYSA-N 0.000 description 1
- 229910052707 ruthenium Inorganic materials 0.000 description 1
- WOCIAKWEIIZHES-UHFFFAOYSA-N ruthenium(iv) oxide Chemical compound O=[Ru]=O WOCIAKWEIIZHES-UHFFFAOYSA-N 0.000 description 1
- 238000007665 sagging Methods 0.000 description 1
- 150000003839 salts Chemical class 0.000 description 1
- 239000000377 silicon dioxide Substances 0.000 description 1
- LIVNPJMFVYWSIS-UHFFFAOYSA-N silicon monoxide Chemical class [Si-]#[O+] LIVNPJMFVYWSIS-UHFFFAOYSA-N 0.000 description 1
- 229910052814 silicon oxide Inorganic materials 0.000 description 1
- 229910000029 sodium carbonate Inorganic materials 0.000 description 1
- NTHWMYGWWRZVTN-UHFFFAOYSA-N sodium silicate Chemical compound [Na+].[Na+].[O-][Si]([O-])=O NTHWMYGWWRZVTN-UHFFFAOYSA-N 0.000 description 1
- 229910052911 sodium silicate Inorganic materials 0.000 description 1
- 238000005507 spraying Methods 0.000 description 1
- 238000004544 sputter deposition Methods 0.000 description 1
- 238000003756 stirring Methods 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
- JBQYATWDVHIOAR-UHFFFAOYSA-N tellanylidenegermanium Chemical compound [Te]=[Ge] JBQYATWDVHIOAR-UHFFFAOYSA-N 0.000 description 1
- 229940116411 terpineol Drugs 0.000 description 1
- ISIJQEHRDSCQIU-UHFFFAOYSA-N tert-butyl 2,7-diazaspiro[4.5]decane-7-carboxylate Chemical compound C1N(C(=O)OC(C)(C)C)CCCC11CNCC1 ISIJQEHRDSCQIU-UHFFFAOYSA-N 0.000 description 1
- 150000003512 tertiary amines Chemical class 0.000 description 1
- XOLBLPGZBRYERU-UHFFFAOYSA-N tin dioxide Chemical compound O=[Sn]=O XOLBLPGZBRYERU-UHFFFAOYSA-N 0.000 description 1
- 229910001887 tin oxide Inorganic materials 0.000 description 1
- OGIDPMRJRNCKJF-UHFFFAOYSA-N titanium oxide Inorganic materials [Ti]=O OGIDPMRJRNCKJF-UHFFFAOYSA-N 0.000 description 1
- STCOOQWBFONSKY-UHFFFAOYSA-N tributyl phosphate Chemical compound CCCCOP(=O)(OCCCC)OCCCC STCOOQWBFONSKY-UHFFFAOYSA-N 0.000 description 1
- ZIBGPFATKBEMQZ-UHFFFAOYSA-N triethylene glycol Chemical compound OCCOCCOCCO ZIBGPFATKBEMQZ-UHFFFAOYSA-N 0.000 description 1
- JLGLQAWTXXGVEM-UHFFFAOYSA-N triethylene glycol monomethyl ether Chemical compound COCCOCCOCCO JLGLQAWTXXGVEM-UHFFFAOYSA-N 0.000 description 1
- WFKWXMTUELFFGS-UHFFFAOYSA-N tungsten Chemical compound [W] WFKWXMTUELFFGS-UHFFFAOYSA-N 0.000 description 1
- 229910052721 tungsten Inorganic materials 0.000 description 1
- 239000010937 tungsten Substances 0.000 description 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 1
- 150000007964 xanthones Chemical class 0.000 description 1
- 239000008096 xylene Substances 0.000 description 1
- 229910052845 zircon Inorganic materials 0.000 description 1
- GFQYVLUOOAAOGM-UHFFFAOYSA-N zirconium(iv) silicate Chemical compound [Zr+4].[O-][Si]([O-])([O-])[O-] GFQYVLUOOAAOGM-UHFFFAOYSA-N 0.000 description 1
Images
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/0005—Production of optical devices or components in so far as characterised by the lithographic processes or materials used therefor
- G03F7/0007—Filters, e.g. additive colour filters; Components for display devices
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/0047—Photosensitive materials characterised by additives for obtaining a metallic or ceramic pattern, e.g. by firing
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
- G03F7/032—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders
- G03F7/033—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders the binders being polymers obtained by reactions only involving carbon-to-carbon unsaturated bonds, e.g. vinyl polymers
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
- G03F7/0388—Macromolecular compounds which are rendered insoluble or differentially wettable with ethylenic or acetylenic bands in the side chains of the photopolymer
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J11/00—Gas-filled discharge tubes with alternating current induction of the discharge, e.g. alternating current plasma display panels [AC-PDP]; Gas-filled discharge tubes without any main electrode inside the vessel; Gas-filled discharge tubes with at least one main electrode outside the vessel
- H01J11/10—AC-PDPs with at least one main electrode being out of contact with the plasma
- H01J11/12—AC-PDPs with at least one main electrode being out of contact with the plasma with main electrodes provided on both sides of the discharge space
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J9/00—Apparatus or processes specially adapted for the manufacture, installation, removal, maintenance of electric discharge tubes, discharge lamps, or parts thereof; Recovery of material from discharge tubes or lamps
- H01J9/02—Manufacture of electrodes or electrode systems
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Abstract
본 발명은, 핀홀이나 인쇄 불균일 없이 인쇄가 가능한, 플라즈마 디스플레이 패널의 고정밀 미세 전극을 형성하기 위해 사용되는 감광성 페이스트이며, 건조, 노광, 현상, 소성의 각 공정에서 기판에 대한 우수한 밀착성, 해상성, 소성성을 손상시키지 않고, 소성 피막을 형성할 수 있는 감광성 페이스트를 제공한다. 또한, 이러한 감광성 페이스트로 고정밀 미세한 소성물 패턴을 형성한 플라즈마 디스플레이 패널을 제공한다.The present invention is a photosensitive paste used for forming a high precision microelectrode of a plasma display panel that can be printed without pinholes or printing irregularities, and has excellent adhesion to a substrate, resolution, and the like in each process of drying, exposure, development, and baking. Provided is a photosensitive paste capable of forming a fired film without impairing plasticity. In addition, the present invention provides a plasma display panel in which a high-precision fine fired material pattern is formed of the photosensitive paste.
본 발명의 감광성 페이스트는 (A) 유기 결합제, (B) 광 중합성 단량체, (C) 광 중합 개시제, (D) 무기 미립자, (E) 유기 용제 및 (F) 첨가제를 함유하는 감광성 페이스트이며, 유기 용제 (E) 중에 비점이 210 ℃ 이상인 고비점 유기 용제를 함유하고, 첨가제 (F)로서 아크릴계 레벨링제와 함께 아민계, 인계 및 카르복실산계 분산제로부터 선택되는 1종 또는 2종 이상의 분산제를 함유한다.The photosensitive paste of this invention is a photosensitive paste containing (A) organic binder, (B) photopolymerizable monomer, (C) photoinitiator, (D) inorganic fine particle, (E) organic solvent, and (F) additive, A high boiling point organic solvent having a boiling point of 210 ° C. or higher is contained in the organic solvent (E), and one or two or more types of dispersants selected from amine-based, phosphorus-based and carboxylic acid-based dispersants together with an acrylic leveling agent as an additive (F). do.
Description
본 발명은, 플라즈마 디스플레이 패널(이하, PDP로 약칭함)의 격벽 패턴, 유전체 패턴, 전극 패턴 및 블랙 매트릭스 패턴의 형성에 유용한 감광성 페이스트에 관한 것이다. 더욱 상세하게는, 안정적인 인쇄성을 갖는 PDP용의 상기 소성물 패턴을 형성하기 위해 바람직하게 사용될 수 있으며, 건조, 노광, 현상, 소성의 각 공정에서 기판에 대한 우수한 밀착성, 해상성, 소성성을 손상시키지 않고, 소성 피막을 형성할 수 있는 감광성 페이스트에 관한 것이다.BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a photosensitive paste useful for forming partition patterns, dielectric patterns, electrode patterns, and black matrix patterns of plasma display panels (hereinafter, abbreviated as PDPs). More specifically, it can be preferably used to form the fired material pattern for PDP having stable printability, and excellent adhesion to the substrate, resolution, plasticity in each process of drying, exposure, development, firing It is related with the photosensitive paste which can form a baking film, without damaging.
PDP는, 플라즈마 방전에 의한 발광을 이용하여 영상이나 정보의 표시를 행하는 평면 디스플레이이며, 패널 구조ㆍ구동 방법에 따라 DC형과 AC형으로 분류된다. PDP에 의한 컬러 표시의 원리는, 리브(격벽)에 의해 이격된 전면 유리 기판과 배면 유리 기판에 형성된 대향하는 양 전극 간의 셀 공간(방전 공간) 내에서 플라즈마 방전을 발생시키고, 각 셀 공간 내에 봉입되어 있는 He, Xe 등의 가스의 방전에 의해 발생하는 자외선으로 배면 유리 기판 내면에 형성된 형광체를 여기하여, 3원색의 가시광을 발생시키는 것이다. 각 셀 공간은, DC형 PDP에서는 격자상의 리브에 의해 구획되고, 한편 AC형 PDP에서는 기판면에 평행하게 배열 설치된 리브에 의해 구획되지만, 셀 공간의 구획은 모두 리브에 의해 이루어지고 있다. 이하, 첨부 도면을 참조하면서 간단히 설명한다.PDPs are flat displays which display images and information using light emission by plasma discharge, and are classified into DC type and AC type according to the panel structure and driving method. The principle of color display by the PDP is to generate a plasma discharge in a cell space (discharge space) between opposite electrodes formed on the front glass substrate and the rear glass substrate spaced by ribs, and to enclose in each cell space. The phosphor formed on the inner surface of the back glass substrate is excited by ultraviolet rays generated by the discharge of gases such as He and Xe to generate visible light of three primary colors. Each cell space is partitioned by lattice ribs in the DC-type PDP, while the cell space is partitioned by ribs arranged in parallel with the substrate surface in the AC-type PDP. A brief description will be given below with reference to the accompanying drawings.
도 1은, 풀컬러 표시의 3 전극 구조의 면방전 방식 AC형 PDP의 구조예를 부분적으로 나타내고 있다. 전면 유리 기판 (1)의 하면에는, 방전을 위한 투명 전극 (3a), (3b)와 상기 투명 전극의 라인 저항을 낮추기 위한 버스 전극 (4a), (4b)를 포함하는 한 쌍의 표시 전극 (2a), (2b)가 소정의 피치로 다수 배열 설치되어 있다. 이들 표시 전극 (2a), (2b) 위에는, 전하를 축적하기 위한 투명 유전체층 (5)(저융점 유리)가 인쇄, 소성에 의해 형성되어 있고, 그 위에 보호층(MgO) (6)이 증착되어 있다. 보호층 (6)은, 표시 전극의 보호, 방전 상태의 유지 등의 역할을 행하고 있다. 한편, 배면 유리 기판 (11)의 위에는, 방전 공간을 구획하는 스트라이프상의 리브(격벽) (12)와 각 방전 공간 내에 배치된 어드레스 전극(데이터 전극) (13)이 소정의 피치로 다수 배열 설치되어 있다. 또한, 각 방전 공간의 내면에는, 적색 (14a), 청색 (14b), 녹색 (14c)의 3색의 형광체막이 규칙적으로 배치되며, 풀컬러 표시에서는, 상기한 바와 같이 적색, 청색, 녹색의 3원색의 형광체막 (14a), (14b), (14c) 중 1개의 화소가 구성된다.Fig. 1 partially shows a structural example of a surface discharge type AC PDP with a three-electrode structure in full color display. On the lower surface of the front glass substrate 1, a pair of display electrodes including
또한, 방전 공간을 형성하는 한 쌍의 표시 전극 (2a), (2b)의 양측부에는, 화상의 콘트라스트를 더욱 높이기 위해, 마찬가지로 스트라이프상의 블랙 패턴 (10), (10)이 형성되어 있다.Further, in order to further increase the contrast of the image, stripe-like
또한, 상기 구조의 PDP에서는, 한 쌍의 표시 전극 (2a)와 (2b) 사이에 교류 의 펄스 전압을 인가하여, 동일한 기판 위의 전극 사이에서 방전시키기 때문에, "면방전 방식"이라고 불리고 있다.In the PDP having the above structure, an alternating pulse voltage is applied between the pair of
또한, 상기 구조의 PDP에서는, 방전에 의해 발생한 자외선이 배면 기판 (11)의 형광체막 (14a), (14b), (14c)를 여기하고, 발생된 가시광을 전면 기판 (1)의 투명 전극 (3a), (3b)를 투과시켜 보는 구조로 되어 있다.Further, in the PDP having the above structure, ultraviolet rays generated by the discharge excite the
이러한 구조의 PDP에서, 상기 버스 전극 (4a), (4b)나 어드레스 전극 (2a), (2b)의 형성은, 종래 Cr-Cu-Cr의 3층을 증착이나 스퍼터링에 의해 성막한 후, 포토리소그래피법으로 패터닝을 행하였다.In the PDP having such a structure, the
그러나, 공정수가 많고, 고비용이 되기 때문에, 최근에는 은 페이스트 등의 도전성 페이스트를 스크린 인쇄한 후 소성하는 방법, 또는 150 ㎛ 이하의 선폭으로 하기 위해서는, 감광성 도전성 페이스트를 도포하고, 패턴 마스크를 통해 노광한 후 현상하며, 이어서 소성하는 방법이 행해지고 있다.However, since the number of steps is large and the cost is high, in recent years, a method of baking a conductive paste such as silver paste and then baking it, or for forming a line width of 150 μm or less, is applied to a photosensitive conductive paste and exposed through a pattern mask. After the development, the method is then fired.
이와 같이 하여 전극이 형성되는 PDP의 기판에서는, 최근 대화면화, 저비용화를 위해 대형의 1장의 기판으로부터 수매의 기판을 제조하는 다면취가 행해지고 있다. 그러나, 스크린 인쇄로 기판에 페이스트의 도포를 행한 경우, 핀홀이나 인쇄 불균일이 발생하기 쉽다는 문제점이 있었다.In this way, in the substrate of the PDP in which the electrode is formed, multifaceted fabrication of several substrates is performed from one large substrate for large screen size and cost reduction. However, when paste is applied to a substrate by screen printing, there is a problem that pinholes and printing irregularities are likely to occur.
따라서 본 발명은, 이러한 종래 기술이 가진 과제를 해결하기 위해 이루어진 것이며, 그 주된 목적은 핀홀이나 인쇄 불균일 없이 인쇄가 가능한, 플라즈마 디스플레이 패널의 고정밀 미세 전극 패턴 등을 형성하기 위해 사용되는 감광성 페이스트이며, 건조, 노광, 현상, 소성의 각 공정에서 기판에 대한 우수한 밀착성, 해상성, 소성성을 손상시키지 않고, 소성 피막을 형성할 수 있는 감광성 페이스트를 제공하는 것에 있다.Accordingly, the present invention has been made to solve the problems of the prior art, the main object of which is a photosensitive paste used to form a high-precision fine electrode pattern of the plasma display panel, which can be printed without pinholes or printing irregularities, It is providing the photosensitive paste which can form a baking film, without impairing the outstanding adhesiveness, resolution, and plasticity with respect to a board | substrate in each process of drying, exposure, image development, and baking.
본 발명의 다른 목적은, 이러한 감광성 페이스트로 고정밀 미세한 소성물 패턴을 형성한 플라즈마 디스플레이 패널을 제공하는 것에 있다.Another object of the present invention is to provide a plasma display panel in which a high-precision fine baked material pattern is formed of such a photosensitive paste.
상기 목적을 달성하기 위해 본 발명의 제1 양태에 따르면, (A) 유기 결합제, (B) 광 중합성 단량체, (C) 광 중합 개시제, (D) 무기 미립자, (E) 유기 용제 및 (F) 첨가제를 함유하는 감광성 페이스트이며, 유기 용제 (E) 중에 비점이 210 ℃ 이상인 고비점 유기 용제를 함유하고, 첨가제 (F)로서 아크릴계 레벨링제와 함께 아민계, 인계 및 카르복실산계 분산제로부터 선택되는 1종 또는 2종 이상의 분산제를 함유하는 감광성 페이스트가 제공된다.According to the first aspect of the present invention for achieving the above object, (A) an organic binder, (B) a photopolymerizable monomer, (C) a photoinitiator, (D) inorganic fine particles, (E) an organic solvent, and (F ) A photosensitive paste containing an additive, which contains a high boiling point organic solvent having a boiling point of 210 ° C. or higher in the organic solvent (E), and is selected from an amine-based, phosphorus-based and carboxylic acid-based dispersant with an acrylic leveling agent as the additive (F). There is provided a photosensitive paste containing one or two or more dispersants.
본 발명의 한 형태에서는, 상기 유기 용제 (E) 중에 비점 210 ℃ 이상의 고비점 유기 용제로서 디에틸렌글리콜모노에틸에테르아세테이트를 함유하고, 그 함유율이 감광성 페이스트 전체량에 대하여 5 질량% 이상이다.In one aspect of the present invention, diethylene glycol monoethyl ether acetate is contained as the high boiling point organic solvent having a boiling point of 210 ° C. or higher in the organic solvent (E), and its content is 5% by mass or more with respect to the total amount of the photosensitive paste.
본 발명의 다른 양태에 따르면, 상기 감광성 페이스트의 소성물로 형성된 전극을 구비하는 플라즈마 디스플레이 패널이 제공된다.According to another aspect of the present invention, there is provided a plasma display panel having an electrode formed of a fired product of the photosensitive paste.
본 발명의 감광성 페이스트를 사용하여 핀홀이 적은 도막을 형성함으로써, 전극의 결손이나 형상 불량이 없는 패널을 안정적으로 제조할 수 있기 때문에, PDP의 양산성, 저비용화에 있어서 매우 유용하다.By forming the coating film with few pinholes using the photosensitive paste of this invention, since the panel which does not have an electrode defect and a shape defect can be manufactured stably, it is very useful for mass productivity of PDP and cost reduction.
본 발명자들은 상기 목적의 실현을 위해 예의 연구한 결과, (A) 유기 결합제, (B) 광 중합성 단량체, (C) 광 중합 개시제, (D) 무기 미립자, (E) 유기 용제, 및 (F) 첨가제를 함유하는 감광성 페이스트이며, 유기 용제 (E) 중에 비점이 210 ℃ 이상인 고비점 유기 용제를 함유하고, 첨가제 (F)로서 아크릴계 레벨링제와 함께 아민계, 인계 및 카르복실산계 분산제로부터 선택되는 1종 또는 2종 이상의 분산제를 함유하는 감광성 페이스트는, 유리 기판 인쇄 후의 도막이 균일하고, 핀홀이 줄어들어, 그 결과 전극의 결손이나 형상 불량이 없는 패널을 안정적으로 제조할 수 있다는 것을 발견하여, 본 발명을 완성하기에 이른 것이다.MEANS TO SOLVE THE PROBLEM The present inventors earnestly researched for the said objective, As a result, (A) organic binder, (B) photopolymerizable monomer, (C) photoinitiator, (D) inorganic fine particle, (E) organic solvent, and (F) ) A photosensitive paste containing an additive, which contains a high boiling point organic solvent having a boiling point of 210 ° C. or higher in the organic solvent (E), and is selected from an amine-based, phosphorus-based and carboxylic acid-based dispersant with an acrylic leveling agent as the additive (F). The photosensitive paste containing one type or two or more types of dispersants finds that the coating film after glass substrate printing is uniform, pinholes are reduced, and as a result, it is possible to stably produce a panel free of electrode defects and shape defects. It is time to complete.
본 발명의 감광성 페이스트에 사용되는 유기 결합제 (A)로서는, 카르복실기를 갖는 수지, 구체적으로는 그 자체가 에틸렌성 불포화 이중 결합을 갖는 카르복실기 함유 감광성 수지 및 에틸렌성 불포화 이중 결합을 갖지 않는 카르복실기 함유 수지 모두 사용 가능하다. 구체적으로는, 이하와 같은 것을 들 수 있다.As the organic binder (A) used in the photosensitive paste of the present invention, both a resin having a carboxyl group, specifically, a carboxyl group-containing photosensitive resin having an ethylenically unsaturated double bond and a carboxyl group-containing resin not having an ethylenically unsaturated double bond Can be used Specifically, the following are mentioned.
(1) (메트)아크릴산 등의 불포화 카르복실산과, 메틸(메트)아크릴레이트 등 의 불포화 이중 결합을 갖는 화합물을 공중합시킴으로써 얻어지는 카르복실기 함유 수지, (1) carboxyl group-containing resin obtained by copolymerizing unsaturated carboxylic acids, such as (meth) acrylic acid, and compounds which have unsaturated double bonds, such as methyl (meth) acrylate,
(2) (메트)아크릴산 등의 불포화 카르복실산과, 메틸(메트)아크릴레이트 등의 불포화 이중 결합을 갖는 화합물의 공중합체에, 글리시딜(메트)아크릴레이트나 (메트)아크릴산클로라이드 등에 의해 에틸렌성 불포화기를 팬던트로서 부가시킴으로써 얻어지는 카르복실기 함유 감광성 수지, (2) Ethylene by glycidyl (meth) acrylate, (meth) acrylic acid chloride, etc. in a copolymer of unsaturated carboxylic acids such as (meth) acrylic acid and unsaturated double bonds such as methyl (meth) acrylate Carboxyl group-containing photosensitive resin obtained by adding a unsaturated unsaturated group as a pendant,
(3) 글리시딜(메트)아크릴레이트 등의 에폭시기와 불포화 이중 결합을 갖는 화합물과, 메틸(메트)아크릴레이트 등의 불포화 이중 결합을 갖는 화합물의 공중합체에 (메트)아크릴산 등의 불포화 카르복실산을 반응시키고, 생성된 2급의 수산기에 테트라히드로프탈산 무수물 등의 다염기산 무수물을 반응시켜 얻어지는 카르복실기 함유 감광성 수지, (3) unsaturated carboxyl such as (meth) acrylic acid in a copolymer of a compound having an unsaturated double bond such as methyl (meth) acrylate with an epoxy group such as glycidyl (meth) acrylate; Carboxyl group-containing photosensitive resin obtained by making an acid react and making polybasic acid anhydrides, such as tetrahydrophthalic anhydride, react with the produced | generated secondary hydroxyl group,
(4) 말레산 무수물 등의 불포화 이중 결합을 갖는 산 무수물과, 스티렌 등의 불포화 이중 결합을 갖는 화합물의 공중합체에, 2-히드록시에틸(메트)아크릴레이트 등의 수산기와 불포화 이중 결합을 갖는 화합물을 반응시켜 얻어지는 카르복실기 함유 감광성 수지, (4) In the copolymer of an acid anhydride having an unsaturated double bond such as maleic anhydride and a compound having an unsaturated double bond such as styrene, a hydroxyl group such as 2-hydroxyethyl (meth) acrylate has an unsaturated double bond Carboxyl group-containing photosensitive resin obtained by making a compound react,
(5) 다관능 에폭시 화합물과(메트)아크릴산 등의 불포화 모노카르복실산을 반응시키고, 생성된 2급의 수산기에 테트라히드로프탈산 무수물 등의 다염기산 무수물을 반응시켜 얻어지는 카르복실기 함유 감광성 수지, (5) a carboxyl group-containing photosensitive resin obtained by reacting a polyfunctional epoxy compound with unsaturated monocarboxylic acids such as (meth) acrylic acid and reacting the resulting secondary hydroxyl group with a polybasic acid anhydride such as tetrahydrophthalic anhydride;
(6) 메틸(메트)아크릴레이트 등의 불포화 이중 결합을 갖는 화합물과 글리시딜(메트)아크릴레이트의 공중합체의 에폭시기에, 1 분자 중에 1개의 카르복실기를 가지며, 에틸렌성 불포화 결합을 갖지 않는 유기산을 반응시키고, 생성된 2급의 수산기에 다염기산 무수물을 반응시켜 얻어지는 카르복실기 함유 수지, (6) An organic acid having one carboxyl group in one molecule and having no ethylenically unsaturated bond in the epoxy group of the copolymer of a compound having an unsaturated double bond such as methyl (meth) acrylate and glycidyl (meth) acrylate. Carboxyl group-containing resin obtained by reacting and reacting a polybasic acid anhydride with the produced | generated secondary hydroxyl group,
(7) 폴리비닐알코올 등의 수산기 함유 중합체에 다염기산 무수물을 반응시켜 얻어지는 카르복실기 함유 수지, 및 (7) carboxyl group-containing resin obtained by making polybasic acid anhydride react with hydroxyl-containing polymers, such as polyvinyl alcohol, and
(8) 폴리비닐알코올 등의 수산기 함유 중합체에, 테트라히드로프탈산 무수물 등의 다염기산 무수물을 반응시켜 얻어지는 카르복실기 함유 수지에, 글리시딜(메트)아크릴레이트 등의 에폭시기와 불포화 이중 결합을 갖는 화합물을 추가로 반응시켜 얻어지는 카르복실기 함유 감광성 수지 등을 들 수 있으며, 특히 (1), (2), (3), (6)의 수지가 바람직하게 사용된다.(8) A compound having an unsaturated double bond such as glycidyl (meth) acrylate is added to a carboxyl group-containing resin obtained by reacting a polybasic acid anhydride such as tetrahydrophthalic anhydride with a hydroxyl group-containing polymer such as polyvinyl alcohol. Carboxyl group-containing photosensitive resin etc. which are obtained by making it react, and especially resin of (1), (2), (3), (6) are used preferably.
또한, 본 명세서에서 (메트)아크릴레이트란, 아크릴레이트, 메타크릴레이트 및 이들의 혼합물을 총칭하는 용어이며, 다른 유사한 표현에 대해서도 마찬가지이다.In addition, in this specification, a (meth) acrylate is a term used generically for acrylate, methacrylate, and mixtures thereof, and the same also about other similar expressions.
이 카르복실기 함유 수지 및 카르복실기 함유 감광성 수지는, 단독으로 또는 혼합하여 사용할 수 있지만, 어떠한 경우에도 이들은 합계로 조성물 전체 질량의 10 내지 80 질량%의 비율로 배합하는 것이 바람직하다. 이들 중합체의 배합량이 상기 범위보다 지나치게 적은 경우, 형성하는 피막 중의 상기 수지의 분포가 불균일해지기 쉽고, 충분한 광 경화성 및 광 경화 심도가 얻어지기 어려우며, 선택적 노광, 현상에 의한 패터닝이 곤란해진다. 한편, 상기 범위보다 지나치게 많으면, 소성시의 패턴의 뒤틀림이나 선폭 수축이 발생하기 쉽기 때문에 바람직하지 않다.Although this carboxyl group-containing resin and carboxyl group-containing photosensitive resin can be used individually or in mixture, in any case, it is preferable to mix these in the ratio of 10-80 mass% of the total mass of a composition in total. When the compounding quantity of these polymers is too small than the said range, distribution of the said resin in the film to form easily becomes easy, sufficient photocurability and photocuring depth are hard to be obtained, and patterning by selective exposure and image development becomes difficult. On the other hand, when it exceeds too much, it is unpreferable since distortion of a pattern at the time of baking and line shrinkage easily occur.
또한, 상기 카르복실기 함유 수지 및 카르복실기 함유 감광성 수지로서는, 각각 중량 평균 분자량 1,000 내지 100,000, 보다 바람직하게는 5,000 내지 70,000, 및 산가 50 내지 250 mgKOH/g, 카르복실기 함유 감광성 수지의 경우, 그 이중 결합 당량이 350 내지 2,000, 보다 바람직하게는 400 내지 1,500인 것을 바람직하게 사용할 수 있다. 상기 수지의 분자량이 1,000보다 낮은 경우, 현상시의 피막의 밀착성에 악영향을 주며, 한편 100,000보다 높은 경우, 현상 불량이 발생하기 쉽기 때문에 바람직하지 않다. 또한, 산가가 50 mgKOH/g보다 낮은 경우, 알칼리 수용액에 대한 용해성이 불충분하여 현상 불량이 발생하기 쉽고, 한편 250 mgKOH/g보다 높은 경우, 현상시에 피막의 밀착성의 열화나 광 경화부(노광부)의 용해가 발생하기 때문에 바람직하지 않다. 또한, 카르복실기 함유 감광성 수지의 경우, 감광성 수지의 이중 결합 당량이 350보다 작으면, 소성시에 잔사가 남기 쉬워지며, 한편 2,000보다 크면 현상시의 작업 여유도가 좁고, 광 경화시에 높은 노광량을 필요로 하기 때문에 바람직하지 않다.Moreover, as said carboxyl group-containing resin and carboxyl group-containing photosensitive resin, the weight average molecular weights 1,000-100,000, More preferably, 5,000-70,000, and acid value 50-250 mgKOH / g, In the case of the carboxyl group-containing photosensitive resin, the double bond equivalent weight It is preferably 350 to 2,000, more preferably 400 to 1,500. When the molecular weight of the said resin is lower than 1,000, it adversely affects the adhesiveness of the film at the time of image development, and when it is higher than 100,000, it is unpreferable because developing defects are easy to occur. In addition, when the acid value is lower than 50 mgKOH / g, the solubility in an aqueous alkali solution is insufficient, and development defects are likely to occur. On the other hand, when the acid value is higher than 250 mgKOH / g, deterioration of the adhesion of the film at the time of development or a photocuring part (furnace) It is not preferable because dissolution of the miner) occurs. In addition, in the case of the carboxyl group-containing photosensitive resin, when the double bond equivalent of the photosensitive resin is less than 350, the residue is likely to remain at the time of firing, while if it is larger than 2,000, the work margin at development is narrow and a high exposure amount at the time of photocuring is obtained. It is not preferable because it is necessary.
본 발명의 감광성 페이스트에 사용되는 광 중합성 단량체 (B)는, 조성물의 광 경화성의 촉진 및 현상성을 향상시키기 위해 사용한다. 예를 들면, 2-히드록시에틸아크릴레이트, 2-히드록시프로필아크릴레이트, 디에틸렌글리콜디아크릴레이트, 트리에틸렌글리콜디아크릴레이트, 폴리에틸렌글리콜디아크릴레이트, 폴리우레탄디아크릴레이트, 트리메틸올프로판트리아크릴레이트, 펜타에리트리톨트리아크릴레이트, 펜타에리트리톨테트라아크릴레이트, 트리메틸올프로판에틸렌옥시드 변성 트리아크릴레이트, 트리메틸올프로판프로필렌옥시드 변성 트리아크릴레이트, 디펜타에리트리톨펜타아크릴레이트, 디펜타에리트리톨헥사아크릴레이트 및 상기 아크릴레이 트에 대응하는 각 메타크릴레이트류; 프탈산, 아디프산, 말레산, 이타콘산, 숙신산, 트리멜리트산, 테레프탈산 등의 다염기산과 히드록시알킬(메트)아크릴레이트의 모노-, 디-, 트리- 또는 그 이상의 폴리에스테르 등을 들 수 있지만, 특별히 한정되지 않으며, 이들을 단독으로 또는 2종 이상을 조합하여 사용할 수 있다. 이들 광 중합성 단량체 중에서도, 1 분자 중에 2개 이상의 아크릴로일기 또는 메타크릴로일기를 갖는 다관능 단량체가 바람직하다.The photopolymerizable monomer (B) used for the photosensitive paste of this invention is used in order to promote the photocurability of a composition, and to improve developability. For example, 2-hydroxyethyl acrylate, 2-hydroxypropyl acrylate, diethylene glycol diacrylate, triethylene glycol diacrylate, polyethylene glycol diacrylate, polyurethane diacrylate, trimethylol propane tree Acrylate, pentaerythritol triacrylate, pentaerythritol tetraacrylate, trimethylolpropane ethylene oxide modified triacrylate, trimethylolpropanepropylene oxide modified triacrylate, dipentaerythritol pentaacrylate, dipentaerythrate Lithol hexaacrylate and each methacrylate corresponding to the said acrylate; Mono-, di-, tri- or more polyesters of polybasic acids such as phthalic acid, adipic acid, maleic acid, itaconic acid, succinic acid, trimellitic acid and terephthalic acid with hydroxyalkyl (meth) acrylates It does not specifically limit, These can be used individually or in combination of 2 or more types. Among these photopolymerizable monomers, the polyfunctional monomer which has a 2 or more acryloyl group or a methacryloyl group in 1 molecule is preferable.
이러한 광 중합성 단량체 (B)의 배합 비율은, 상기 유기 결합제(카르복실기 함유 감광성 수지 및/또는 카르복실기 함유 수지) (A) 100 질량부당, 20 내지 100 질량부가 바람직하다. 광 중합성 단량체 (B)의 배합량이 상기 범위보다 적은 경우, 조성물의 충분한 광 경화성이 얻어지기 어렵고, 한편 상기 범위를 초과하여 다량이 되면, 피막의 심부에 비해 표면부의 광 경화가 빨라지기 때문에 경화 불균일이 발생하기 쉽다.As for the compounding ratio of such a photopolymerizable monomer (B), 20-100 mass parts is preferable per 100 mass parts of said organic binders (carboxyl group-containing photosensitive resin and / or carboxyl group-containing resin) (A). When the compounding quantity of a photopolymerizable monomer (B) is less than the said range, sufficient photocurability of a composition is hard to be acquired, and when it exceeds the said range, when it becomes a large quantity, photocuring of the surface part will become quick compared with the core part of a film, and it hardens | cures Nonuniformity is likely to occur.
본 발명의 감광성 페이스트에 사용되는 광 중합 개시제 (C)의 구체적인 것으로서는, 벤조인, 벤조인메틸에테르, 벤조인에틸에테르, 벤조인이소프로필에테르 등의 벤조인과 벤조인알킬에테르류; 아세토페논, 2,2-디메톡시-2-페닐아세토페논, 2,2-디에톡시-2-페닐아세토페논, 1,1-디클로로아세토페논 등의 아세토페논류; 2-메틸-1-[4-(메틸티오)페닐]-2-모르폴리노프로판-1-온, 2-벤질-2-디메틸아미노-1-(4-모르폴리노페닐)-부타논-1,2-(디메틸아미노)-2-[(4-메틸페닐)메틸]-1-[4-(4-모르폴리닐)페닐]-1-부타논 등의 아미노아세토페논류; 2-메틸안트라퀴논, 2-에틸안트라퀴논, 2-t-부틸안트라퀴논, 1-클로로안트라퀴논 등의 안트라퀴논류; 2,4-디메틸티옥 산톤, 2,4-디에틸티옥산톤, 2-클로로티옥산톤, 2,4-디이소프로필티옥산톤 등의 티옥산톤류; 아세토페논디메틸케탈, 벤질디메틸케탈 등의 케탈류; 벤조페논 등의 벤조페논류; 또는 크산톤류; (2,6-디메톡시벤조일)-2,4,4-펜틸포스핀옥시드, 비스(2,4,6-트리메틸벤조일)-페닐포스핀옥시드, 2,4,6-트리메틸벤조일디페닐포스핀옥시드, 에틸-2,4,6-트리메틸벤조일페닐포스피네이트 등의 포스핀옥시드류; 각종 퍼옥시드류 등을 들 수 있으며, 이들 공지된 관용의 광 중합 개시제를 단독으로 또는 2종 이상을 조합하여 사용할 수 있다.Specific examples of the photopolymerization initiator (C) used in the photosensitive paste of the present invention include benzoin and benzoin alkyl ethers such as benzoin, benzoin methyl ether, benzoin ethyl ether, and benzoin isopropyl ether; Acetophenones such as acetophenone, 2,2-dimethoxy-2-phenylacetophenone, 2,2-diethoxy-2-phenylacetophenone, and 1,1-dichloroacetophenone; 2-methyl-1- [4- (methylthio) phenyl] -2-morpholinopropane-1-one, 2-benzyl-2-dimethylamino-1- (4-morpholinophenyl) -butanone- Aminoacetophenones such as 1,2- (dimethylamino) -2-[(4-methylphenyl) methyl] -1- [4- (4-morpholinyl) phenyl] -1-butanone; Anthraquinones such as 2-methylanthraquinone, 2-ethylanthraquinone, 2-t-butylanthraquinone and 1-chloroanthraquinone; Thioxanthones such as 2,4-dimethyl thioxanthone, 2,4-diethyl thioxanthone, 2-chlorothioxanthone, and 2,4-diisopropyl thioxanthone; Ketals such as acetophenone dimethyl ketal and benzyl dimethyl ketal; Benzophenones such as benzophenone; Or xanthones; (2,6-dimethoxybenzoyl) -2,4,4-pentylphosphineoxide, bis (2,4,6-trimethylbenzoyl) -phenylphosphine oxide, 2,4,6-trimethylbenzoyldiphenylphosphine jade Phosphine oxides such as seeds and ethyl-2,4,6-trimethylbenzoylphenylphosphinate; Various peroxides etc. are mentioned, These known conventional photoinitiators can be used individually or in combination of 2 or more types.
이들 광 중합 개시제 (C)의 배합 비율은, 상기 유기 결합제(카르복실기 함유 감광성 수지 및/또는 카르복실기 함유 수지) (A) 100 질량부당, 1 내지 30 질량부가 바람직하며, 더욱 바람직하게는 5 내지 20 질량부이다.As for the compounding ratio of these photoinitiators (C), 1-30 mass parts is preferable per 100 mass parts of said organic binders (carboxyl group-containing photosensitive resin and / or carboxyl group-containing resin) (A), More preferably, it is 5-20 mass It is wealth.
또한, 상기한 바와 같은 광 중합 개시제 (C)는, N,N-디메틸아미노벤조산에틸에스테르, N,N-디메틸아미노벤조산이소아밀에스테르, 펜틸-4-디메틸아미노벤조에이트, 트리에틸아민, 트리에탄올아민 등의 3급 아민류와 같은 광 증감제의 1종 또는 2종 이상과 조합하여 사용할 수 있다.Moreover, as above-mentioned photoinitiator (C), N, N- dimethylamino benzoic acid ethyl ester, N, N- dimethylamino benzoic acid isoamyl ester, pentyl-4- dimethylamino benzoate, triethylamine, triethanol It can be used in combination with 1 type, or 2 or more types of photosensitizers, such as tertiary amines, such as an amine.
또한, 보다 깊은 광 경화 심도가 요구되는 경우, 필요에 따라 가시 영역에서 라디칼 중합을 개시하는 시바ㆍ스페셜티ㆍ케미컬즈사 제조 이르가큐어-784 등의 티타노센계 광 중합 개시제, 로이코 염료 등을 경화 보조제로서 조합하여 사용할 수 있다.In addition, when a deeper photocuring depth is required, titanocene-based photopolymerization initiators such as Ciba-Specialty Chemicals, Irgacure-784, etc., which initiate radical polymerization in the visible region as necessary, may be used as curing aids. It can be used in combination.
또한, 보다 깊은 광 경화 심도가 요구되는 경우, 필요에 따라 열 중합 촉매를 상기 광 중합 개시제 (C)와 병용하여 사용할 수 있다. 이 열 중합 촉매는, 수 분 내지 1 시간 정도에 걸쳐서 고온에서의 에이징에 의해 미경화된 광 중합성 단량체를 반응시킬 수 있는 것이며, 구체적으로 과산화벤조일 등의 과산화물, 아조이소부티로니트릴 등의 아조 화합물 등이 있고, 바람직하게는 2,2'-아조비스이소부티로니트릴, 2,2'-아조비스-2-메틸부티로니트릴, 2,2'-아조비스-2,4-디발레로니트릴, 1'-아조비스-1-시클로헥산카르보니트릴, 디메틸-2,2'-아조비스이소부틸레이트, 4,4'-아조비스-4-시아노발레릭산, 2-메틸-2,2'-아조비스프로판니트릴, 2,4-디메틸-2,2,2',2'-아조비스펜탄니트릴, 1,1'-아조비스(1-아세톡시-1-페닐에탄), 2,2,2',2'-아조비스(2-메틸부탄아미드옥심)디히드로클로라이드 등을 들 수 있으며, 보다 바람직한 것으로서는 칙환경적인 논시안, 비할로겐 형태의 1,1'-아조비스(1-아세톡시-1-페닐에탄)을 들 수 있다.Moreover, when deeper photocuring depth is calculated | required, a thermal polymerization catalyst can be used together with the said photoinitiator (C) as needed. This thermal polymerization catalyst is capable of reacting the uncured photopolymerizable monomer by aging at a high temperature for several minutes to about 1 hour, and specifically, azo such as peroxides such as benzoyl peroxide and azoisobutyronitrile. Compounds and the like, and preferably 2,2'-azobisisobutyronitrile, 2,2'-azobis-2-methylbutyronitrile, 2,2'-azobis-2,4-divalero Nitrile, 1'-azobis-1-cyclohexanecarbonitrile, dimethyl-2,2'-azobisisobutyrate, 4,4'-azobis-4-cyanovaleric acid, 2-methyl-2,2 '-Azobispropanenitrile, 2,4-dimethyl-2,2,2', 2'-azobispentanenitrile, 1,1'-azobis (1-acetoxy-1-phenylethane), 2,2 , 2 ', 2'-azobis (2-methylbutanamide oxime) dihydrochloride, and the like, and more preferably 1,1'-azobis in a non-environmental, non-halogen form. Acetoxy-1-phenylethane) Can be mentioned.
본 발명의 감광성 페이스트는 무기 미립자 (D)를 함유하며, 상기 무기 미립자 (D)로서 유리 미립자, 안료, 도전성 금속 분말 또는 금속 산화물, 및 무기 충전제 중 1종 또는 2종 이상을 함유하는 것이 바람직하다.The photosensitive paste of the present invention contains the inorganic fine particles (D), and preferably contains one or two or more of the glass fine particles, the pigment, the conductive metal powder or the metal oxide, and the inorganic filler as the inorganic fine particles (D). .
무기 성분의 내용은, 목적으로 하는 소성물 패턴에 따라 상이하다. 우선, 격벽 패턴 및 유전체 패턴의 형성의 경우에는 유리 미립자가 사용되며, 블랙 매트릭스 패턴의 경우에는 유리 미립자와 흑색 안료가 사용된다. 한편, 전극 패턴 형성의 경우에는 도전성 분말(도전성 금속 분말 또는/및 금속 산화물)이 사용되지만, 후술하는 바와 같이 소성성을 향상시키기 위해 적절한 양의 유리 미립자를 병용하는 것이 바람직하고, 흑색 전극 패턴을 형성하는 경우에는 추가로 흑색 안료도 사용된다. 그 이외에, 목적에 따라 골재(무기 충전제)를 감광성 페이스트 조성물에 첨가할 수 있다.The content of the inorganic component is different depending on the desired fired material pattern. First, glass fine particles are used in the case of formation of a partition pattern and a dielectric pattern, and glass fine particles and a black pigment are used in the case of a black matrix pattern. On the other hand, in the case of electrode pattern formation, although conductive powder (conductive metal powder or / and metal oxide) is used, in order to improve plasticity as mentioned later, it is preferable to use an appropriate amount of glass fine particles together, and a black electrode pattern is used. In the case of forming, a black pigment is further used. In addition, aggregate (inorganic filler) can be added to the photosensitive paste composition according to the purpose.
유리 미립자로서는, 유리 전이점(Tg) 300 내지 500 ℃, 유리 연화점(Ts) 400 내지 600 ℃를 갖는 것, 예를 들면 산화연, 산화비스무트 또는 산화아연을 주성분으로 하는 것을 바람직하게 사용할 수 있다. 또한, 해상도의 면에서는 평균 입경 10 ㎛ 이하, 바람직하게는 3 ㎛ 이하의 유리 미립자가 사용된다.As glass microparticles | fine-particles, what has a glass transition point (Tg) 300-500 degreeC and glass softening point (Ts) 400-600 degreeC, for example, what has a lead oxide, bismuth oxide, or zinc oxide as a main component can be used preferably. In terms of resolution, glass particles having an average particle diameter of 10 m or less, preferably 3 m or less are used.
무기 미립자 (D)에서의 흑색 안료는, 소성물 패턴에 흑색이 요구되는 경우 사용되며, Fe, Co, Ni, Cu, Mn, Al 등의 1종 또는 2종 이상의 금속 산화물을 포함하는 흑색 안료를 첨가할 수 있다.The black pigment in the inorganic fine particles (D) is used when black is required for the fired product pattern, and includes a black pigment containing one or two or more metal oxides such as Fe, Co, Ni, Cu, Mn, and Al. Can be added.
무기 미립자 (D)에서의 도전성 금속 분말 또는 금속 산화물로서는, 비저항값이 1×103 Ωㆍ㎝ 이하인 도전성 분말이면 폭넓게 사용할 수 있으며, 은(Ag), 금(Au), 니켈(Ni), 구리(Cu), 알루미늄(Al), 주석(Sn), 납(Pb), 아연(Zn), 철(Fe), 백금(Pt), 이리듐(Ir), 오스뮴(Os), 팔라듐(Pd), 로듐(Rh), 루테늄(Ru), 텅스텐(W), 몰리브덴(Mo) 등의 단체와 그 합금 이외에, 산화주석(SnO2), 산화인듐(In2O3), ITO(인듐 주석 옥시드(Indium Tin Oxide)), 산화루테늄(RuO2) 등을 사용할 수 있다. 이들은 단독으로 또는 2종 이상의 혼합 분말로서 사용할 수 있다.As the conductive metal powder or the metal oxide in the inorganic fine particles (D), any conductive powder having a specific resistance of 1 × 10 3 Ω · cm or less can be widely used. Silver (Ag), gold (Au), nickel (Ni), copper (Cu), aluminum (Al), tin (Sn), lead (Pb), zinc (Zn), iron (Fe), platinum (Pt), iridium (Ir), osmium (Os), palladium (Pd), rhodium (Rh), ruthenium (Ru), tungsten (W), molybdenum (Mo) and the like, as well as alloys thereof, tin oxide (SnO 2 ), indium oxide (In 2 O 3 ), and ITO (indium tin oxide (Indium) Tin Oxide)), ruthenium oxide (RuO 2 ), and the like. These may be used alone or as mixed powders of two or more thereof.
상기 도전성 금속 분말 또는 금속 산화물의 형상은 구상, 플레이크상, 수지상 등 다양한 것을 사용할 수 있지만, 광 특성, 분산성을 고려하면 구상의 것을 사용하는 것이 바람직하다. 또한, 평균 입경으로서는 해상도의 면에서 10 ㎛ 이하인 것, 바람직하게는 5 ㎛ 이하인 것을 사용한다. 또한, 도전성 금속 분말의 산화 방 지, 조성물 내에서의 분산성 향상, 현상성의 안정화를 위해, 특히 Ag, Ni, Al에 대해서는 지방산에 의한 처리를 행하는 것이 바람직하다. 지방산으로서는 올레산, 리놀레산, 리놀렌산, 스테아르산 등을 들 수 있다.Although the thing of spherical shape, a flake shape, a dendritic shape, etc. can be used for the shape of the said electroconductive metal powder or a metal oxide, it is preferable to use a spherical thing in consideration of optical characteristics and dispersibility. In addition, as an average particle diameter, the thing of 10 micrometers or less in terms of the resolution, Preferably the thing of 5 micrometers or less is used. In addition, in order to prevent oxidation of the conductive metal powder, to improve dispersibility in the composition, and to stabilize developability, it is preferable to perform treatment with fatty acids, particularly for Ag, Ni, and Al. Examples of the fatty acid include oleic acid, linoleic acid, linolenic acid, stearic acid, and the like.
이러한 도전성 금속 분말 또는 금속 산화물의 배합량의 배합 비율로서는, 상기 감광성 페이스트 전체량에 대하여 50 내지 80 질량%가 바람직하다. 도전성 분말의 배합량이 상기 범위보다 적은 경우, 이러한 페이스트로부터 얻어지는 도전체 패턴의 충분한 도전성이 얻어지지 않고, 한편 상기 범위를 초과하여 다량이 되면, 기재와의 밀착성이 악화되기 때문에 바람직하지 않다.As a compounding ratio of the compounding quantity of such electroconductive metal powder or a metal oxide, 50-80 mass% is preferable with respect to the said photosensitive paste whole quantity. When the compounding quantity of electroconductive powder is less than the said range, since sufficient electroconductivity of the conductor pattern obtained from such a paste is not obtained, and a large amount exceeds the said range, since adhesiveness with a base material will deteriorate, it is unpreferable.
무기 미립자 (D)에서의 무기 충전제로서는, 알루미나, 실리카, 지르콘, 산화티탄 등, 격벽 등의 소성물 패턴 내부의 조밀성 향상에 기여할 수 있는 것은 모두 사용할 수 있다. 즉, 유리 성분은 소성시에 수축되지만, 무기 충전제의 배합량에 따라 수축률과 내부 조밀성을 조정할 수 있다.As the inorganic filler in the inorganic fine particles (D), any that can contribute to the improvement of the denseness inside the fired material pattern such as the partition wall such as alumina, silica, zircon, titanium oxide, or the like can be used. That is, although a glass component shrinks at the time of baking, a shrinkage rate and internal density can be adjusted according to the compounding quantity of an inorganic filler.
본 발명의 감광성 페이스트에 사용되는 유기 용제 (E)로서는, 특히 비점이 210 ℃ 이상인 고비점 유기 용제를 사용하는 것이 바람직하며, 글리콜에스테르류(예를 들면, 디에틸렌글리콜모노에틸에테르아세테이트, 디프로필렌글리콜모노메틸에테르아세테이트, 부틸카르비톨아세테이트, 2,2,4-트리메틸-1,3-펜탄디올디이소부틸레이트 등); 글리콜에테르류(예를 들면, 에틸렌글리콜 2-에틸헥실에테르, 에틸렌글리콜페닐에테르, 디에틸렌글리콜모노부틸에테르, 디에틸렌글리콜 n-헥실에테르, 디에틸렌글리콜 2-에틸헥실에테르, 트리에틸렌글리콜모노메틸에테르, 트리에틸렌글리콜모노트리에틸렌글리콜모노에틸에테르, 트리에틸렌글리콜모노부틸에테르, 디프 로필렌글리콜모노부틸에테르, 디프로필렌글리콜 n-부틸에테르, 트리프로필렌글리콜모노메틸에테르, 트리프로필렌글리콜트리프로필렌글리콜 n-부틸에테르 등); 알코올류(예를 들면 디에틸렌글리콜, 트리에틸렌글리콜, 1,4-부탄디올, 옥탄디올, 부틸카르비톨 등); 탄화수소류(예를 들면, 상품명 솔베소 #150, 솔베소 #200) 등을 들 수 있으며, 이들을 단독으로 또는 2종 이상을 혼합하여 사용할 수 있다. 이 중에서도 디에틸렌글리콜모노에틸에테르아세테이트가 건조성, 작업성, 인쇄성의 균형이 양호하다는 점에서 바람직하다. 또한, 비점의 상한은 특별히 한정되지 않지만, 건조 등의 관점에서 300 ℃ 이하인 것이 바람직하다. 여기서, 본 발명에서 비점은 1 기압 중의 비점이다.As an organic solvent (E) used for the photosensitive paste of this invention, it is preferable to use especially the high boiling point organic solvent whose boiling point is 210 degreeC or more, and glycol esters (for example, diethylene glycol monoethyl ether acetate, dipropylene) Glycol monomethyl ether acetate, butyl carbitol acetate, 2,2,4-trimethyl-1,3-pentanediol diisobutylate, and the like); Glycol ethers (for example, ethylene glycol 2-ethylhexyl ether, ethylene glycol phenyl ether, diethylene glycol monobutyl ether, diethylene glycol n-hexyl ether, diethylene glycol 2-ethylhexyl ether, triethylene glycol monomethyl Ether, triethylene glycol monotriethylene glycol monoethyl ether, triethylene glycol monobutyl ether, dipropylene glycol monobutyl ether, dipropylene glycol n-butyl ether, tripropylene glycol monomethyl ether, tripropylene glycol tripropylene glycol n Butyl ether, etc.); Alcohols (for example, diethylene glycol, triethylene glycol, 1,4-butanediol, octanediol, butyl carbitol and the like); Hydrocarbons (for example, brand name Solvesso # 150, Solvesso # 200), etc. are mentioned, These can be used individually or in mixture of 2 or more types. Among these, diethylene glycol monoethyl ether acetate is preferable at the point that the balance of dryness, workability, and printability is favorable. In addition, the upper limit of a boiling point is not specifically limited, It is preferable that it is 300 degrees C or less from a viewpoint of drying. Here, in this invention, a boiling point is a boiling point in 1 atmosphere.
이러한 유기 용제 (E)의 바람직한 배합 비율은, 페이스트 전체량에 대하여 바람직하게는 5 질량% 이상, 보다 바람직하게는 5 질량% 이상 30 질량% 이하이다. 5 질량%보다 적으면 인쇄시에 판 분리 불량이 발생하기 때문에 바람직하지 않다. 또한 30 질량%를 초과하여 함유하면 페이스트의 점도가 저하되고, 인쇄 후의 도막이 건조되기 어려워지기 때문에 바람직하지 않다.Preferably the compounding ratio of such an organic solvent (E) is 5 mass% or more with respect to paste whole quantity, More preferably, it is 5 mass% or more and 30 mass% or less. When it is less than 5 mass%, it is not preferable because defective plate separation occurs during printing. Moreover, when it contains exceeding 30 mass%, since the viscosity of a paste falls and it becomes difficult to dry the coating film after printing, it is not preferable.
또한, 디에틸렌글리콜모노에틸에테르아세테이트 등, 비점이 210 ℃ 이상인 고비점 유기 용제 이외의 용제로서, 적절한 양의 유기 용제를 배합할 수 있다. 구체적으로는 메틸에틸케톤, 시클로헥사논 등의 케톤류; 톨루엔, 크실렌, 테트라메틸벤젠 등의 방향족 탄화수소류; 셀로솔브, 메틸셀로솔브, 카르비톨, 메틸카르비톨, 프로필렌글리콜모노메틸에테르, 디프로필렌글리콜모노메틸에테르 등의 글리콜에테르류; 아세트산에틸, 아세트산부틸, 셀로솔브아세테이트, 부틸셀로솔브아세테이트, 프로필렌글리콜모노메틸에테르아세테이트, 2,2,4-트리메틸-1,3-펜탄디올모노이소부틸레이트, γ-부티로락톤 등의 에스테르류; 에탄올, 프로판올, 에틸렌글리콜, 프로필렌글리콜, 테르피네올 등의 알코올류; 옥탄, 데칸 등의 지방족 탄화수소; 석유 에테르, 석유 나프타, 수소 첨가 석유 나프타, 용매 나프타 등의 석유계 용제, 2,2,4-트리메틸-1,3-펜탄디올모노이소부틸레이트 등을 들 수 있으며, 이들을 단독으로 또는 2종 이상을 조합하여 사용할 수 있다.Moreover, an appropriate amount of organic solvent can be mix | blended as solvents other than the high boiling point organic solvent whose boiling point is 210 degreeC or more, such as diethylene glycol monoethyl ether acetate. Specifically, Ketones, such as methyl ethyl ketone and cyclohexanone; Aromatic hydrocarbons such as toluene, xylene and tetramethylbenzene; Glycol ethers such as cellosolve, methyl cellosolve, carbitol, methyl carbitol, propylene glycol monomethyl ether and dipropylene glycol monomethyl ether; Esters such as ethyl acetate, butyl acetate, cellosolve acetate, butyl cellosolve acetate, propylene glycol monomethyl ether acetate, 2,2,4-trimethyl-1,3-pentanediol monoisobutylate, γ-butyrolactone Ryu; Alcohols such as ethanol, propanol, ethylene glycol, propylene glycol and terpineol; Aliphatic hydrocarbons such as octane and decane; Petroleum solvents such as petroleum ether, petroleum naphtha, hydrogenated petroleum naphtha, solvent naphtha, 2,2,4-trimethyl-1,3-pentanediol monoisobutylate, and the like. Can be used in combination.
본 발명의 감광성 페이스트에서는, 광 경화성 수지 조성물에 다량의 무기 분말을 배합한 경우, 얻어지는 조성물의 보존 안정성이 악화되고, 겔화나 유동성의 저하에 의해 도포 작업성이 악화되는 경향이 있다. 따라서, 본 발명의 조성물에서는 조성물의 보존 안정성 향상을 위해, 무기 분말의 성분인 금속 또는 산화물 분말과의 착체화 또는 염 형성 등의 효과가 있는 화합물을 안정제로서 첨가할 수 있다. 안정제로서는, 무기산으로서 붕산, 유기산으로서는; 포름산, 아세트산, 말산, 말론산, 아세토아세트산, 시트르산, 스테아르산, 말레산, 푸마르산, 프탈산, 벤젠술폰산, 술파민산; 그 이외에 인산, 아인산, 차아인산, 인산메틸, 인산에틸, 인산부틸, 인산페닐, 아인산에틸, 아인산디페닐, 모노(2-메타크릴로일옥시에틸)산포스페이트 등의 각종 인산 화합물(무기 인산, 유기 인산) 등의 산을 들 수 있으며, 단독으로 또는 2종 이상을 조합하여 사용할 수 있다.In the photosensitive paste of this invention, when mix | blending a large amount of inorganic powder with a photocurable resin composition, the storage stability of the composition obtained will deteriorate, and it exists in the tendency for coating workability to deteriorate by gelatinization and fluidity fall. Therefore, in the composition of this invention, in order to improve the storage stability of a composition, the compound which has an effect, such as complexing with metal or oxide powder which is a component of an inorganic powder, or salt formation, can be added as a stabilizer. As a stabilizer, As an inorganic acid, As boric acid, As an organic acid; Formic acid, acetic acid, malic acid, malonic acid, acetoacetic acid, citric acid, stearic acid, maleic acid, fumaric acid, phthalic acid, benzenesulfonic acid, sulfamic acid; In addition, various phosphoric acid compounds such as phosphoric acid, phosphorous acid, hypophosphorous acid, methyl phosphate, ethyl phosphate, butyl phosphate, phenyl phosphate, ethyl phosphite, diphenyl phosphite, and mono (2-methacryloyloxyethyl) phosphate (inorganic phosphoric acid, Acids, such as organic phosphoric acid), and can be used individually or in combination of 2 or more types.
본 발명의 감광성 페이스트는, 첨가제 (F)로서 아크릴계 레벨링제와 함께 아민계, 인계 및 카르복실산계 분산제로부터 선택되는 1종 또는 2종 이상의 분산제를 함유한다.The photosensitive paste of this invention contains 1 type, or 2 or more types of dispersing agent chosen from an amine type, phosphorus type, and carboxylic acid type dispersing agent with an acryl-type leveling agent as an additive (F).
아크릴계 레벨링제(소포제)로서, 구체적으로는 메틸아크릴레이트, 에틸아크릴레이트, n-프로필아크릴레이트, 이소프로필아크릴레이트, n-부틸아크릴레이트, 이소부틸아크릴레이트, tert-부틸아크릴레이트시클로헥실아크릴레이트 등의 아크릴레이트 및 그에 대응하는 메타크릴레이트 등을 단독으로, 또는 2종 이상을 공중합한 공중합물로서 사용할 수 있다. 시중에서 입수 가능한 상품으로서는, 예를 들면 모다플로우(서피스ㆍ스페셜리티즈사 제조), 폴리플로우 No.75, No.77, No.85, No.90, No.95, 폴리플로우 S(모두 교에이샤 가가꾸가부시끼가이샤 제조), BYK-354, -350, -352, -355, -356(모두 BYK Chemie사 제조) 등을 사용할 수 있다. 아크릴계 레벨링제는, 아크릴계 유기 결합제에 대하여 적절한 상용성을 갖고 있기 때문에, 레벨링제로서 실리콘계를 사용한 경우 관찰되는 상용성의 악화에 의한 크레이터링 등의 결점을 방지할 수 있다.As an acrylic leveling agent (defoamer), specifically methyl acrylate, ethyl acrylate, n-propyl acrylate, isopropyl acrylate, n-butyl acrylate, isobutyl acrylate, tert- butyl acrylate cyclohexyl acrylate Acrylates and the like methacrylates and the like can be used alone or as copolymers obtained by copolymerizing two or more kinds. Examples of commercially available products include Modaflow (Surface Specialties Co., Ltd.), Polyflow Nos. 75, No. 77, No. 85, No. 90, No. 95, and Polyflow S (all Kyocera Co., Ltd.). Kagaku Co., Ltd.), BYK-354, -350, -352, -355, -356 (all are manufactured by BYK Chemie), etc. can be used. Since an acryl-type leveling agent has a suitable compatibility with an acryl-type organic binder, it can prevent defects, such as cratering by the deterioration of the compatibility observed when silicone type is used as a leveling agent.
분산제로서 시중에서 입수 가능한 상품으로서는, 예를 들면 아민계 분산제로서 Disperbyk(등록 상표)-112, -161, -182, -191(모두 BYK Chemie사 제조); 인계 분산제로서 라이트에스테르 P-1M(오사까 유끼 가가꾸 고교가부시끼가이샤 제조), JPA-514(죠호꾸 가가꾸 고교 가부시끼가이샤 제조), Disperbyk-110, -111, -142, -180(모두 BYK Chemie사 제조), DA-325(구스모또 가세이 가부시끼가이샤 제조); 카르복실산계 분산제로서 BYK-P105(BYK Chemie사 제조), 플로렌 G-700(교에이샤 가가꾸 가부시끼가이샤 제조) 등을 사용할 수 있다.Examples of commercially available products as dispersants include Disperbyk (registered trademark) -112, -161, -182, and -191 (all manufactured by BYK Chemie) as amine dispersants; As a phosphorus dispersant, light ester P-1M (manufactured by Osaka Yuki Kagaku Kogyo Co., Ltd.), JPA-514 (manufactured by Johoku Kagaku Kogyo Co., Ltd.), Disperbyk-110, -111, -142, -180 (all BYK Chemie Co., Ltd.), DA-325 (manufactured by Kusumoto Kasei Co., Ltd.); As the carboxylic acid-based dispersant, BYK-P105 (manufactured by BYK Chemie), Floren G-700 (manufactured by Kyoeisha Chemical Co., Ltd.), and the like can be used.
본 발명에서 아크릴계 레벨링제 및 분산제의 바람직한 배합 비율은, 상기 유기 결합제 (A) 100 질량부당 각각 1 내지 10 질량부이다. 또한, 아크릴계 레벨링 제와 분산제 상호의 배합 비율은 1:10 내지 10:1이 바람직하다.In this invention, the preferable compounding ratio of an acryl-type leveling agent and a dispersing agent is 1-10 mass parts, respectively, per 100 mass parts of said organic binders (A). Moreover, as for the compounding ratio of an acrylic leveling agent and a dispersing agent, 1: 10-10: 1 are preferable.
또한, 필요에 따라 공지된 관용의 산화 방지제나, 보존시의 열적 안정성을 향상시키기 위한 열 중합 금지제, 소성시 기판과의 결합 성분으로서의 금속 산화물, 규소 산화물, 붕소 산화물 등의 미립자를 첨가할 수 있다.In addition, fine particles such as known conventional antioxidants, thermal polymerization inhibitors for improving thermal stability during storage, and metal oxides, silicon oxides, and boron oxides as bonding components with the substrate during firing may be added as necessary. have.
본 발명의 감광성 페이스트는, 25 ℃에서의 점도가 바람직하게는 50 내지 200 dPaㆍs이고, 보다 바람직하게는 80 내지 180 dPaㆍs이다. 점도가 50 dPaㆍs보다 낮으면 인쇄 후에 늘어짐이나 크레이터링이 발생하기 쉽고, 한편 200 dPaㆍs보다 높으면 작업성이 저하되어 바람직하지 않다.The photosensitive paste of the present invention preferably has a viscosity at 25 ° C. of 50 to 200 dPa · s, more preferably 80 to 180 dPa · s. If the viscosity is lower than 50 dPa · s, sagging or cratering tends to occur after printing, while if it is higher than 200 dPa · s, workability is lowered, which is not preferable.
본 발명의 감광성 페이스트는 스크린 인쇄법으로 기판, 예를 들면 PDP의 배면 기판이 되는 유리 기판에 도포하고, 이어서 지촉 건조성을 얻기 위해 열풍 순환식 건조로, 원적외선 건조로 등에서 예를 들면 약 60 내지 120 ℃로 5 내지 40분 정도 건조시켜 유기 용제를 증발시켜, 점착감이 없는 도막을 얻는다. 그 후, 선택적 노광, 현상, 소성을 행하여 소정의 패턴을 형성한다.The photosensitive paste of the present invention is applied to a substrate, for example, a glass substrate that is a back substrate of a PDP by screen printing, and then, for example, in a hot air circulation drying furnace, a far infrared ray drying furnace, or the like, for example, to obtain a touch-drying property. It dries at 5 degreeC about 5 to 40 minutes, and the organic solvent is evaporated and the coating film without adhesiveness is obtained. Thereafter, selective exposure, development, and baking are performed to form a predetermined pattern.
노광 공정으로서는, 소정의 노광 패턴을 갖는 네가티브 마스크를 사용한 접촉 노광 및 비접촉 노광이 가능하다. 노광 광원으로서는 할로겐 램프, 고압 수은등, 레이저광, 메탈 할라이드 램프, 무전극 램프 등이 사용된다. 노광량으로서는 50 내지 1000 mJ/㎠ 정도가 바람직하다.As an exposure process, contact exposure and non-contact exposure using the negative mask which has a predetermined exposure pattern are possible. As the exposure light source, a halogen lamp, a high pressure mercury lamp, a laser light, a metal halide lamp, an electrodeless lamp and the like are used. As an exposure amount, about 50-1000 mJ / cm <2> is preferable.
현상 공정으로서는 분무법, 침지법 등이 이용된다. 현상액으로서는 수산화나트륨, 수산화칼륨, 탄산나트륨, 탄산칼륨, 규산나트륨 등의 금속 알칼리 수용액이나, 모노에탄올아민, 디에탄올아민, 트리에탄올아민 등의 아민 수용액, 특히 약 1.5 질량% 이하의 농도의 묽은 알칼리 수용액이 바람직하게 사용되지만, 조성물 중의 카르복실기 함유 수지의 카르복실기가 비누화되어, 미경화부(미노광부)가 제거되는 것이 바람직하고, 상기한 바와 같은 현상액으로 한정되지 않는다. 또한, 현상 후에 불필요한 현상액의 제거를 위해, 물로 세척하거나 산 중화를 행하는 것이 바람직하다.As the developing step, a spraying method, a dipping method, or the like is used. As a developing solution, aqueous metal alkali solutions, such as sodium hydroxide, potassium hydroxide, sodium carbonate, potassium carbonate, and sodium silicate, aqueous amine solutions, such as monoethanolamine, diethanolamine, and triethanolamine, especially the dilute alkali aqueous solution of the density | concentration of about 1.5 mass% or less is used. Although preferably used, it is preferable that the carboxyl group of the carboxyl group-containing resin in the composition is saponified and the uncured portion (unexposed portion) is removed, and is not limited to the developer as described above. In addition, in order to remove unnecessary developer after development, it is preferable to wash with water or perform acid neutralization.
소성 공정에서는, 현상 후의 기판을 공기 중 또는 질소 분위기하에서 약 500 내지 600 ℃의 가열 처리를 행하여, 원하는 패턴을 형성한다.In the firing step, the substrate after development is subjected to heat treatment at about 500 to 600 ° C. in air or in a nitrogen atmosphere to form a desired pattern.
<실시예><Example>
이하, 본 발명을 실시예에 기초하여 구체적으로 설명하지만, 본 발명은 하기 실시예로 한정되지 않는다. 또한, 이하에서 "부"는 특별히 언급하지 않는 한 모두 질량부이다.Hereinafter, although this invention is demonstrated concretely based on an Example, this invention is not limited to the following Example. In addition, below, all "parts" are mass parts unless there is particular notice.
유리 분말로서는 Bi2O3, B2O3, ZnO, SiO2, BaO를 포함하는 무연 유리 분말을 분쇄하여, 평균 입경 1.6 ㎛로 한 것을 사용하였다.As the glass powder was used in a pulverized lead-free glass powder containing Bi 2 O 3, B 2 O 3, ZnO, SiO 2, BaO, average particle size 1.6 ㎛.
표 1에 나타낸 조성비로 배합하여 교반기에 의해 교반한 후, 3축 롤밀에 의해 연육(練肉)하여 페이스트화를 행하였다. 얻어진 페이스트(조성물예 1 내지 3, 비교예 1 내지 5)의 점도(dPaㆍs)를 측정한 결과, 각각 158, 171, 165, 162, 177, 150, 162, 151이었다.After mix | blending with the composition ratio shown in Table 1, stirring with a stirrer, it was ground by the triaxial roll mill and pasteurized. The viscosity (dPa * s) of the obtained paste (Composition Examples 1-3 and Comparative Examples 1-5) was measured, and it was 158, 171, 165, 162, 177, 150, 162, and 151, respectively.
점도 측정 방법Viscosity Measurement Method
E형 점도계를 사용하여, 25 ℃에서 5 회전시켰을 때의 점도를 측정하였다.The viscosity at the time of 5 rotations at 25 degreeC was measured using the E-type viscosity meter.
얻어진 감광성 페이스트의 인쇄 특성은 이하의 평가 방법에 의해 조사하였다. 결과를 하기의 표 2에 나타낸다.The printing characteristic of the obtained photosensitive paste was investigated by the following evaluation methods. The results are shown in Table 2 below.
유리 기판 위에 평가용 페이스트를 300메쉬의 폴리에스테르 스크린을 사용하여 전체면에 도포하였다. 이때, 스크린의 판 분리를 관찰하였다. 이어서, 원적외선 건조로로 90 ℃에서 15분간 건조하여 피막을 형성하였다. 이어서, 라이트 테이블 위에서 건조 도막을 관찰하여, 인쇄 불균일, 핀홀, 크레이터링의 상태를 관찰하였다.The evaluation paste was applied to the entire surface on a glass substrate using a 300 mesh polyester screen. At this time, the separation of the plates was observed. Subsequently, it dried for 15 minutes at 90 degreeC by the far-infrared drying furnace, and formed the film. Next, the dry coating film was observed on the light table, and the printing nonuniformity, the pinhole, and the state of cratering were observed.
판 분리의 상태를 ○ 내지 ×로 평가하였다.The state of plate separation was evaluated by (circle)-x.
○: 판 분리 양호.○: Good separation of the plate.
△: 인쇄시에 일부 스크린과 도막이 달라붙지만 인쇄 후 분리됨.(Triangle | delta): Some screens and a coating film stick together at the time of printing, but are separated after printing.
×: 인쇄시에 일부 스크린과 도막이 달라붙어, 인쇄 후에도 박리되지 않음,X: Some screens and a coating film adhere at the time of printing, and do not peel even after printing,
인쇄 불균일의 여부를 ○ 내지 ×로 평가하였다.The presence or absence of printing nonuniformity was evaluated by (circle)-x.
○: 인쇄 불균일 없음.○: No printing unevenness.
△: 일부 있음.△: partly present.
×: 인쇄 불균일 큼.X: Printing nonuniformity is large.
핀홀의 여부를 ○, ×로 평가하였다.The presence or absence of a pinhole was evaluated by (circle) and (x).
○: 핀홀이 거의 없음.○: almost no pinholes.
×: 핀홀이 많음×: many pinholes
크레이터링의 여부를 ○, ×로 평가하였다.Whether cratering was evaluated by (circle) or (x).
○: 크레이터링이 거의 없음.○: almost no cratering.
×: 크레이터링이 많음.X: Many craters.
표 2에 나타낸 결과로부터 분명한 바와 같이, 본 발명의 조성물에 따른 페이스트는 비교 조성물의 페이스트에 비해 인쇄성이 우수하며, 균일하고 핀홀 없이 도막 형성이 가능하기 때문에, 비점 210 ℃ 이상의 고비점 유기 용제가 5 질량% 이상 주입됨으로써 판 분리가 양호해지고, 대화면이면서도 고정밀한 전극 형성에 유용하다는 것을 알 수 있었다. As is apparent from the results shown in Table 2, the paste according to the composition of the present invention has excellent printability compared to the paste of the comparative composition, and can form a coating film without a pinhole. By injecting 5 mass% or more, it became clear that plate | board separation became favorable and it is useful for formation of a highly precise electrode while being a large screen.
[도 1] 면방전 방식의 AC형 PDP의 부분 분해 사시도.1 is a partially exploded perspective view of an AC type PDP of a surface discharge method.
<도면의 주요 부분에 대한 부호의 간단한 설명><Brief description of symbols for the main parts of the drawings>
1: 전면 유리 기판1: front glass substrate
2a, 2b: 표시 전극2a, 2b: display electrode
3a, 3b: 투명 전극3a, 3b: transparent electrode
4a, 4b: 버스 전극4a, 4b: bus electrode
5: 투명 유전체층5: transparent dielectric layer
6: 보호층6: protective layer
10: 블랙 패턴10: black pattern
11: 배면 유리 기판11: back glass substrate
12: 리브12: rib
13: 어드레스 전극13: address electrode
14a, 14b, 14c: 형광체막14a, 14b, 14c: phosphor film
100: PDP용 전면 기판 100100: front substrate for
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| JP2006245954A JP4954647B2 (en) | 2006-09-11 | 2006-09-11 | Plasma display panel having photosensitive paste and fired product pattern formed from the photosensitive paste |
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| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| KR101040593B1 (en) * | 2008-09-26 | 2011-06-10 | 주식회사 엘지화학 | Black Matrix Photosensitive Resin Composition |
| CN102741964A (en) * | 2008-04-24 | 2012-10-17 | 松下电器产业株式会社 | Method for producing plasma display panel |
Families Citing this family (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2012073600A (en) * | 2010-08-31 | 2012-04-12 | Fujifilm Corp | Photosensitive composition, as well as photosensitive film, permanent pattern, method for forming permanent pattern, and printed substrate |
Family Cites Families (9)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2003160608A (en) * | 2001-11-26 | 2003-06-03 | Sumitomo Bakelite Co Ltd | Photosensitive silver paste and image display apparatus using the same |
| JP3938375B2 (en) * | 2003-03-12 | 2007-06-27 | 三菱化学株式会社 | Photosensitive coloring composition, color filter, and liquid crystal display device |
| TWI361948B (en) * | 2003-05-23 | 2012-04-11 | Sumitomo Chemical Co | Coloring photosensitive resin composition |
| JP2005234045A (en) * | 2004-02-17 | 2005-09-02 | Fujifilm Electronic Materials Co Ltd | Color resin composition |
| JP2005300623A (en) * | 2004-04-07 | 2005-10-27 | Fuji Photo Film Co Ltd | Photosensitive composition and film, and permanent pattern and method for forming same |
| JP2006070226A (en) * | 2004-09-06 | 2006-03-16 | Jsr Corp | Inorganic powder-containing resin composition, transfer film, and method for producing plasma display panel |
| US20090163615A1 (en) * | 2005-08-31 | 2009-06-25 | Izhar Halahmi | Uv curable hybridcuring ink jet ink composition and solder mask using the same |
| JP2007219499A (en) | 2006-01-18 | 2007-08-30 | Fujifilm Electronic Materials Co Ltd | Photosetting composition, color filter using the same and method for producing the color filter |
| KR20070080619A (en) * | 2007-07-26 | 2007-08-10 | 주식회사 엘지화학 | Photosensitive resin composition and color liquid crystal display device using the same |
-
2006
- 2006-09-11 JP JP2006245954A patent/JP4954647B2/en not_active Expired - Fee Related
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2007
- 2007-08-28 TW TW096131840A patent/TWI406092B/en active
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Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN102741964A (en) * | 2008-04-24 | 2012-10-17 | 松下电器产业株式会社 | Method for producing plasma display panel |
| KR101040593B1 (en) * | 2008-09-26 | 2011-06-10 | 주식회사 엘지화학 | Black Matrix Photosensitive Resin Composition |
| US8822127B2 (en) | 2008-09-26 | 2014-09-02 | Lg Chem, Ltd. | Photosensitive resin composition for black matrix |
Also Published As
| Publication number | Publication date |
|---|---|
| TWI406092B (en) | 2013-08-21 |
| KR100899505B1 (en) | 2009-05-26 |
| TW200834237A (en) | 2008-08-16 |
| JP2008065267A (en) | 2008-03-21 |
| JP4954647B2 (en) | 2012-06-20 |
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