KR20070117381A - Rosatan's New Manufacturing Method - Google Patents
Rosatan's New Manufacturing Method Download PDFInfo
- Publication number
- KR20070117381A KR20070117381A KR1020060051590A KR20060051590A KR20070117381A KR 20070117381 A KR20070117381 A KR 20070117381A KR 1020060051590 A KR1020060051590 A KR 1020060051590A KR 20060051590 A KR20060051590 A KR 20060051590A KR 20070117381 A KR20070117381 A KR 20070117381A
- Authority
- KR
- South Korea
- Prior art keywords
- formula
- compound
- reaction
- group
- protecting group
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Abandoned
Links
- 238000004519 manufacturing process Methods 0.000 title description 8
- 238000000034 method Methods 0.000 claims abstract description 40
- 150000001875 compounds Chemical class 0.000 claims description 112
- 238000006243 chemical reaction Methods 0.000 claims description 68
- -1 2-tosylethyl Chemical group 0.000 claims description 52
- 125000006239 protecting group Chemical group 0.000 claims description 23
- 239000002253 acid Substances 0.000 claims description 17
- ZMXDDKWLCZADIW-UHFFFAOYSA-N N,N-Dimethylformamide Chemical compound CN(C)C=O ZMXDDKWLCZADIW-UHFFFAOYSA-N 0.000 claims description 16
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 claims description 14
- NNPPMTNAJDCUHE-UHFFFAOYSA-N isobutane Chemical compound CC(C)C NNPPMTNAJDCUHE-UHFFFAOYSA-N 0.000 claims description 12
- 229940070710 valerate Drugs 0.000 claims description 10
- 239000003638 chemical reducing agent Substances 0.000 claims description 9
- 239000012320 chlorinating reagent Substances 0.000 claims description 9
- 239000012190 activator Substances 0.000 claims description 8
- 150000001450 anions Chemical class 0.000 claims description 7
- 239000003795 chemical substances by application Substances 0.000 claims description 7
- KWYUFKZDYYNOTN-UHFFFAOYSA-M potassium hydroxide Substances [OH-].[K+] KWYUFKZDYYNOTN-UHFFFAOYSA-M 0.000 claims description 7
- FPGGTKZVZWFYPV-UHFFFAOYSA-M tetrabutylammonium fluoride Chemical compound [F-].CCCC[N+](CCCC)(CCCC)CCCC FPGGTKZVZWFYPV-UHFFFAOYSA-M 0.000 claims description 7
- PXIPVTKHYLBLMZ-UHFFFAOYSA-N Sodium azide Chemical compound [Na+].[N-]=[N+]=[N-] PXIPVTKHYLBLMZ-UHFFFAOYSA-N 0.000 claims description 6
- CZZYITDELCSZES-UHFFFAOYSA-N diphenylmethane Chemical compound C=1C=CC=CC=1CC1=CC=CC=C1 CZZYITDELCSZES-UHFFFAOYSA-N 0.000 claims description 6
- XHXFXVLFKHQFAL-UHFFFAOYSA-N phosphoryl trichloride Chemical compound ClP(Cl)(Cl)=O XHXFXVLFKHQFAL-UHFFFAOYSA-N 0.000 claims description 6
- FVSKHRXBFJPNKK-UHFFFAOYSA-N propionitrile Chemical compound CCC#N FVSKHRXBFJPNKK-UHFFFAOYSA-N 0.000 claims description 6
- AAAQKTZKLRYKHR-UHFFFAOYSA-N triphenylmethane Chemical compound C1=CC=CC=C1C(C=1C=CC=CC=1)C1=CC=CC=C1 AAAQKTZKLRYKHR-UHFFFAOYSA-N 0.000 claims description 6
- JIAARYAFYJHUJI-UHFFFAOYSA-L zinc dichloride Chemical compound [Cl-].[Cl-].[Zn+2] JIAARYAFYJHUJI-UHFFFAOYSA-L 0.000 claims description 6
- XUXVVQKJULMMKX-UHFFFAOYSA-N 1,1,1-trimethoxypentane Chemical compound CCCCC(OC)(OC)OC XUXVVQKJULMMKX-UHFFFAOYSA-N 0.000 claims description 5
- 125000000217 alkyl group Chemical group 0.000 claims description 5
- 238000003403 chloroformylation reaction Methods 0.000 claims description 5
- 238000010511 deprotection reaction Methods 0.000 claims description 5
- ATHHXGZTWNVVOU-UHFFFAOYSA-N monomethyl-formamide Natural products CNC=O ATHHXGZTWNVVOU-UHFFFAOYSA-N 0.000 claims description 5
- LCEDQNDDFOCWGG-UHFFFAOYSA-N morpholine-4-carbaldehyde Chemical compound O=CN1CCOCC1 LCEDQNDDFOCWGG-UHFFFAOYSA-N 0.000 claims description 5
- SEDZOYHHAIAQIW-UHFFFAOYSA-N trimethylsilyl azide Chemical compound C[Si](C)(C)N=[N+]=[N-] SEDZOYHHAIAQIW-UHFFFAOYSA-N 0.000 claims description 5
- FEWLNYSYJNLUOO-UHFFFAOYSA-N 1-Piperidinecarboxaldehyde Chemical compound O=CN1CCCCC1 FEWLNYSYJNLUOO-UHFFFAOYSA-N 0.000 claims description 4
- NLXLAEXVIDQMFP-UHFFFAOYSA-N Ammonia chloride Chemical compound [NH4+].[Cl-] NLXLAEXVIDQMFP-UHFFFAOYSA-N 0.000 claims description 4
- 229910052783 alkali metal Inorganic materials 0.000 claims description 4
- XJHCXCQVJFPJIK-UHFFFAOYSA-M caesium fluoride Chemical compound [F-].[Cs+] XJHCXCQVJFPJIK-UHFFFAOYSA-M 0.000 claims description 4
- CTSLXHKWHWQRSH-UHFFFAOYSA-N oxalyl chloride Chemical compound ClC(=O)C(Cl)=O CTSLXHKWHWQRSH-UHFFFAOYSA-N 0.000 claims description 4
- NROKBHXJSPEDAR-UHFFFAOYSA-M potassium fluoride Chemical compound [F-].[K+] NROKBHXJSPEDAR-UHFFFAOYSA-M 0.000 claims description 4
- VNDYJBBGRKZCSX-UHFFFAOYSA-L zinc bromide Chemical compound Br[Zn]Br VNDYJBBGRKZCSX-UHFFFAOYSA-L 0.000 claims description 4
- SUAKHGWARZSWIH-UHFFFAOYSA-N N,N‐diethylformamide Chemical compound CCN(CC)C=O SUAKHGWARZSWIH-UHFFFAOYSA-N 0.000 claims description 3
- 229910052708 sodium Inorganic materials 0.000 claims description 3
- 239000011734 sodium Substances 0.000 claims description 3
- FYSNRJHAOHDILO-UHFFFAOYSA-N thionyl chloride Chemical compound ClS(Cl)=O FYSNRJHAOHDILO-UHFFFAOYSA-N 0.000 claims description 3
- 229910052725 zinc Inorganic materials 0.000 claims description 3
- 239000011701 zinc Substances 0.000 claims description 3
- 239000011592 zinc chloride Substances 0.000 claims description 3
- 235000005074 zinc chloride Nutrition 0.000 claims description 3
- IJIBRSFAXRFPPN-UHFFFAOYSA-N 5-bromo-2-methoxybenzaldehyde Chemical compound COC1=CC=C(Br)C=C1C=O IJIBRSFAXRFPPN-UHFFFAOYSA-N 0.000 claims description 2
- YGYAWVDWMABLBF-UHFFFAOYSA-N Phosgene Chemical compound ClC(Cl)=O YGYAWVDWMABLBF-UHFFFAOYSA-N 0.000 claims description 2
- 125000003172 aldehyde group Chemical group 0.000 claims description 2
- 150000001340 alkali metals Chemical class 0.000 claims description 2
- 125000005103 alkyl silyl group Chemical group 0.000 claims description 2
- 235000019270 ammonium chloride Nutrition 0.000 claims description 2
- OSJRGDBEYARHLX-UHFFFAOYSA-N azido(trimethyl)stannane Chemical compound [N-]=[N+]=[N-].C[Sn+](C)C OSJRGDBEYARHLX-UHFFFAOYSA-N 0.000 claims description 2
- 229910010277 boron hydride Inorganic materials 0.000 claims description 2
- NZMAJUHVSZBJHL-UHFFFAOYSA-N n,n-dibutylformamide Chemical compound CCCCN(C=O)CCCC NZMAJUHVSZBJHL-UHFFFAOYSA-N 0.000 claims description 2
- UHZYTMXLRWXGPK-UHFFFAOYSA-N phosphorus pentachloride Chemical compound ClP(Cl)(Cl)(Cl)Cl UHZYTMXLRWXGPK-UHFFFAOYSA-N 0.000 claims description 2
- 239000011698 potassium fluoride Substances 0.000 claims description 2
- 235000003270 potassium fluoride Nutrition 0.000 claims description 2
- 229940102001 zinc bromide Drugs 0.000 claims description 2
- 150000001299 aldehydes Chemical class 0.000 claims 1
- 125000005210 alkyl ammonium group Chemical group 0.000 claims 1
- ATHHXGZTWNVVOU-VQEHIDDOSA-N n-methylformamide Chemical group CN[13CH]=O ATHHXGZTWNVVOU-VQEHIDDOSA-N 0.000 claims 1
- 125000003831 tetrazolyl group Chemical group 0.000 claims 1
- 238000002360 preparation method Methods 0.000 abstract description 15
- 239000002083 C09CA01 - Losartan Substances 0.000 abstract description 11
- 229960004773 losartan Drugs 0.000 abstract description 11
- 239000000543 intermediate Substances 0.000 abstract description 10
- 206010020772 Hypertension Diseases 0.000 abstract description 2
- 239000003814 drug Substances 0.000 abstract description 2
- 229940124597 therapeutic agent Drugs 0.000 abstract description 2
- KJJZZJSZUJXYEA-UHFFFAOYSA-N losartan Chemical compound CCCCC1=NC(Cl)=C(CO)N1CC1=CC=C(C=2C(=CC=CC=2)C=2[N]N=NN=2)C=C1 KJJZZJSZUJXYEA-UHFFFAOYSA-N 0.000 abstract 2
- OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical compound OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 description 19
- 239000002904 solvent Substances 0.000 description 19
- QTBSBXVTEAMEQO-UHFFFAOYSA-N Acetic acid Chemical compound CC(O)=O QTBSBXVTEAMEQO-UHFFFAOYSA-N 0.000 description 18
- YMWUJEATGCHHMB-UHFFFAOYSA-N Dichloromethane Chemical compound ClCCl YMWUJEATGCHHMB-UHFFFAOYSA-N 0.000 description 18
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 description 18
- KFZMGEQAYNKOFK-UHFFFAOYSA-N Isopropanol Chemical compound CC(C)O KFZMGEQAYNKOFK-UHFFFAOYSA-N 0.000 description 14
- PSIFNNKUMBGKDQ-UHFFFAOYSA-N losartan Chemical compound CCCCC1=NC(Cl)=C(CO)N1CC1=CC=C(C=2C(=CC=CC=2)C=2NN=NN=2)C=C1 PSIFNNKUMBGKDQ-UHFFFAOYSA-N 0.000 description 14
- RAXXELZNTBOGNW-UHFFFAOYSA-N imidazole Natural products C1=CNC=N1 RAXXELZNTBOGNW-UHFFFAOYSA-N 0.000 description 13
- SCYULBFZEHDVBN-UHFFFAOYSA-N 1,1-Dichloroethane Chemical compound CC(Cl)Cl SCYULBFZEHDVBN-UHFFFAOYSA-N 0.000 description 12
- QAOWNCQODCNURD-UHFFFAOYSA-N Sulfuric acid Chemical compound OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 description 12
- 150000003536 tetrazoles Chemical group 0.000 description 10
- WYURNTSHIVDZCO-UHFFFAOYSA-N Tetrahydrofuran Chemical compound C1CCOC1 WYURNTSHIVDZCO-UHFFFAOYSA-N 0.000 description 8
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 8
- OXCMYAYHXIHQOA-UHFFFAOYSA-N potassium;[2-butyl-5-chloro-3-[[4-[2-(1,2,4-triaza-3-azanidacyclopenta-1,4-dien-5-yl)phenyl]phenyl]methyl]imidazol-4-yl]methanol Chemical class [K+].CCCCC1=NC(Cl)=C(CO)N1CC1=CC=C(C=2C(=CC=CC=2)C2=N[N-]N=N2)C=C1 OXCMYAYHXIHQOA-UHFFFAOYSA-N 0.000 description 7
- CSCPPACGZOOCGX-UHFFFAOYSA-N Acetone Chemical compound CC(C)=O CSCPPACGZOOCGX-UHFFFAOYSA-N 0.000 description 6
- WEVYAHXRMPXWCK-UHFFFAOYSA-N Acetonitrile Chemical compound CC#N WEVYAHXRMPXWCK-UHFFFAOYSA-N 0.000 description 6
- XEKOWRVHYACXOJ-UHFFFAOYSA-N Ethyl acetate Chemical compound CCOC(C)=O XEKOWRVHYACXOJ-UHFFFAOYSA-N 0.000 description 6
- WMFOQBRAJBCJND-UHFFFAOYSA-M Lithium hydroxide Chemical compound [Li+].[OH-] WMFOQBRAJBCJND-UHFFFAOYSA-M 0.000 description 6
- AFVFQIVMOAPDHO-UHFFFAOYSA-N Methanesulfonic acid Chemical compound CS(O)(=O)=O AFVFQIVMOAPDHO-UHFFFAOYSA-N 0.000 description 6
- LRHPLDYGYMQRHN-UHFFFAOYSA-N N-Butanol Chemical compound CCCCO LRHPLDYGYMQRHN-UHFFFAOYSA-N 0.000 description 6
- DTQVDTLACAAQTR-UHFFFAOYSA-N Trifluoroacetic acid Chemical compound OC(=O)C(F)(F)F DTQVDTLACAAQTR-UHFFFAOYSA-N 0.000 description 6
- 239000002585 base Substances 0.000 description 6
- 230000015572 biosynthetic process Effects 0.000 description 6
- BDAGIHXWWSANSR-UHFFFAOYSA-N methanoic acid Natural products OC=O BDAGIHXWWSANSR-UHFFFAOYSA-N 0.000 description 6
- 239000007787 solid Substances 0.000 description 6
- 238000003786 synthesis reaction Methods 0.000 description 6
- RYHBNJHYFVUHQT-UHFFFAOYSA-N 1,4-Dioxane Chemical compound C1COCCO1 RYHBNJHYFVUHQT-UHFFFAOYSA-N 0.000 description 5
- CTQNGGLPUBDAKN-UHFFFAOYSA-N O-Xylene Chemical compound CC1=CC=CC=C1C CTQNGGLPUBDAKN-UHFFFAOYSA-N 0.000 description 5
- 230000002411 adverse Effects 0.000 description 5
- 239000012535 impurity Substances 0.000 description 5
- 239000010410 layer Substances 0.000 description 5
- 239000000047 product Substances 0.000 description 5
- 239000008096 xylene Substances 0.000 description 5
- 0 *Cc(cc1)ccc1-c1ccccc1* Chemical compound *Cc(cc1)ccc1-c1ccccc1* 0.000 description 4
- KOKHTJKIZVUTGR-UHFFFAOYSA-N 2-[[4-(2-cyanophenyl)phenyl]methylamino]acetamide Chemical compound C(#N)C1=C(C=CC=C1)C1=CC=C(C=C1)CNCC(=O)N KOKHTJKIZVUTGR-UHFFFAOYSA-N 0.000 description 4
- CAAMSDWKXXPUJR-UHFFFAOYSA-N 3,5-dihydro-4H-imidazol-4-one Chemical compound O=C1CNC=N1 CAAMSDWKXXPUJR-UHFFFAOYSA-N 0.000 description 4
- DLFVBJFMPXGRIB-UHFFFAOYSA-N Acetamide Chemical compound CC(N)=O DLFVBJFMPXGRIB-UHFFFAOYSA-N 0.000 description 4
- FXHOOIRPVKKKFG-UHFFFAOYSA-N N,N-Dimethylacetamide Chemical compound CN(C)C(C)=O FXHOOIRPVKKKFG-UHFFFAOYSA-N 0.000 description 4
- 238000007259 addition reaction Methods 0.000 description 4
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 description 4
- 239000000203 mixture Substances 0.000 description 4
- 239000012044 organic layer Substances 0.000 description 4
- 238000003756 stirring Methods 0.000 description 4
- YLQBMQCUIZJEEH-UHFFFAOYSA-N tetrahydrofuran Natural products C=1C=COC=1 YLQBMQCUIZJEEH-UHFFFAOYSA-N 0.000 description 4
- OSWFIVFLDKOXQC-UHFFFAOYSA-N 4-(3-methoxyphenyl)aniline Chemical compound COC1=CC=CC(C=2C=CC(N)=CC=2)=C1 OSWFIVFLDKOXQC-UHFFFAOYSA-N 0.000 description 3
- UHOVQNZJYSORNB-UHFFFAOYSA-N Benzene Chemical compound C1=CC=CC=C1 UHOVQNZJYSORNB-UHFFFAOYSA-N 0.000 description 3
- RTZKZFJDLAIYFH-UHFFFAOYSA-N Diethyl ether Chemical compound CCOCC RTZKZFJDLAIYFH-UHFFFAOYSA-N 0.000 description 3
- HEMHJVSKTPXQMS-UHFFFAOYSA-M Sodium hydroxide Chemical compound [OH-].[Na+] HEMHJVSKTPXQMS-UHFFFAOYSA-M 0.000 description 3
- ZMANZCXQSJIPKH-UHFFFAOYSA-N Triethylamine Chemical compound CCN(CC)CC ZMANZCXQSJIPKH-UHFFFAOYSA-N 0.000 description 3
- 239000006227 byproduct Substances 0.000 description 3
- 150000002170 ethers Chemical class 0.000 description 3
- 235000019253 formic acid Nutrition 0.000 description 3
- BEBCJVAWIBVWNZ-UHFFFAOYSA-N glycinamide Chemical compound NCC(N)=O BEBCJVAWIBVWNZ-UHFFFAOYSA-N 0.000 description 3
- 239000012442 inert solvent Substances 0.000 description 3
- 229940098779 methanesulfonic acid Drugs 0.000 description 3
- 150000007522 mineralic acids Chemical class 0.000 description 3
- 150000007524 organic acids Chemical class 0.000 description 3
- 239000003960 organic solvent Substances 0.000 description 3
- MIOPJNTWMNEORI-GMSGAONNSA-N (S)-camphorsulfonic acid Chemical compound C1C[C@@]2(CS(O)(=O)=O)C(=O)C[C@@H]1C2(C)C MIOPJNTWMNEORI-GMSGAONNSA-N 0.000 description 2
- XYHKNCXZYYTLRG-UHFFFAOYSA-N 1h-imidazole-2-carbaldehyde Chemical compound O=CC1=NC=CN1 XYHKNCXZYYTLRG-UHFFFAOYSA-N 0.000 description 2
- MEKOFIRRDATTAG-UHFFFAOYSA-N 2,2,5,8-tetramethyl-3,4-dihydrochromen-6-ol Chemical compound C1CC(C)(C)OC2=C1C(C)=C(O)C=C2C MEKOFIRRDATTAG-UHFFFAOYSA-N 0.000 description 2
- DKPFZGUDAPQIHT-UHFFFAOYSA-N Butyl acetate Natural products CCCCOC(C)=O DKPFZGUDAPQIHT-UHFFFAOYSA-N 0.000 description 2
- 239000004215 Carbon black (E152) Substances 0.000 description 2
- HEDRZPFGACZZDS-UHFFFAOYSA-N Chloroform Chemical compound ClC(Cl)Cl HEDRZPFGACZZDS-UHFFFAOYSA-N 0.000 description 2
- XDTMQSROBMDMFD-UHFFFAOYSA-N Cyclohexane Chemical compound C1CCCCC1 XDTMQSROBMDMFD-UHFFFAOYSA-N 0.000 description 2
- LCGLNKUTAGEVQW-UHFFFAOYSA-N Dimethyl ether Chemical compound COC LCGLNKUTAGEVQW-UHFFFAOYSA-N 0.000 description 2
- IAZDPXIOMUYVGZ-UHFFFAOYSA-N Dimethylsulphoxide Chemical compound CS(C)=O IAZDPXIOMUYVGZ-UHFFFAOYSA-N 0.000 description 2
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 description 2
- CSNNHWWHGAXBCP-UHFFFAOYSA-L Magnesium sulfate Chemical compound [Mg+2].[O-][S+2]([O-])([O-])[O-] CSNNHWWHGAXBCP-UHFFFAOYSA-L 0.000 description 2
- NBIIXXVUZAFLBC-UHFFFAOYSA-N Phosphoric acid Chemical compound OP(O)(O)=O NBIIXXVUZAFLBC-UHFFFAOYSA-N 0.000 description 2
- JUJWROOIHBZHMG-UHFFFAOYSA-N Pyridine Chemical compound C1=CC=NC=C1 JUJWROOIHBZHMG-UHFFFAOYSA-N 0.000 description 2
- CDBYLPFSWZWCQE-UHFFFAOYSA-L Sodium Carbonate Chemical compound [Na+].[Na+].[O-]C([O-])=O CDBYLPFSWZWCQE-UHFFFAOYSA-L 0.000 description 2
- DKGAVHZHDRPRBM-UHFFFAOYSA-N Tert-Butanol Chemical compound CC(C)(C)O DKGAVHZHDRPRBM-UHFFFAOYSA-N 0.000 description 2
- 150000007513 acids Chemical class 0.000 description 2
- 238000007792 addition Methods 0.000 description 2
- 150000001298 alcohols Chemical class 0.000 description 2
- 150000004703 alkoxides Chemical class 0.000 description 2
- 125000000852 azido group Chemical group *N=[N+]=[N-] 0.000 description 2
- XBDQKXXYIPTUBI-UHFFFAOYSA-N dimethylselenoniopropionate Natural products CCC(O)=O XBDQKXXYIPTUBI-UHFFFAOYSA-N 0.000 description 2
- 238000010438 heat treatment Methods 0.000 description 2
- FUZZWVXGSFPDMH-UHFFFAOYSA-N hexanoic acid Chemical compound CCCCCC(O)=O FUZZWVXGSFPDMH-UHFFFAOYSA-N 0.000 description 2
- 229930195733 hydrocarbon Natural products 0.000 description 2
- JMMWKPVZQRWMSS-UHFFFAOYSA-N isopropanol acetate Natural products CC(C)OC(C)=O JMMWKPVZQRWMSS-UHFFFAOYSA-N 0.000 description 2
- 229940011051 isopropyl acetate Drugs 0.000 description 2
- GWYFCOCPABKNJV-UHFFFAOYSA-N isovaleric acid Chemical compound CC(C)CC(O)=O GWYFCOCPABKNJV-UHFFFAOYSA-N 0.000 description 2
- 150000004106 losartan derivatives Chemical class 0.000 description 2
- 229910052751 metal Inorganic materials 0.000 description 2
- 239000002184 metal Substances 0.000 description 2
- 229910052987 metal hydride Inorganic materials 0.000 description 2
- 150000004681 metal hydrides Chemical class 0.000 description 2
- 239000003444 phase transfer catalyst Substances 0.000 description 2
- 150000004962 phenylmethylimidazoles Chemical class 0.000 description 2
- RLOWWWKZYUNIDI-UHFFFAOYSA-N phosphinic chloride Chemical compound ClP=O RLOWWWKZYUNIDI-UHFFFAOYSA-N 0.000 description 2
- 229910052700 potassium Inorganic materials 0.000 description 2
- 239000011591 potassium Substances 0.000 description 2
- BWHMMNNQKKPAPP-UHFFFAOYSA-L potassium carbonate Chemical compound [K+].[K+].[O-]C([O-])=O BWHMMNNQKKPAPP-UHFFFAOYSA-L 0.000 description 2
- 238000010992 reflux Methods 0.000 description 2
- 238000000926 separation method Methods 0.000 description 2
- 239000012279 sodium borohydride Substances 0.000 description 2
- 229910000033 sodium borohydride Inorganic materials 0.000 description 2
- 238000010792 warming Methods 0.000 description 2
- DIKAUBKIDNXNNW-UHFFFAOYSA-N 1,1,1-triethoxypentane Chemical compound CCCCC(OCC)(OCC)OCC DIKAUBKIDNXNNW-UHFFFAOYSA-N 0.000 description 1
- UOZXHIBZEFKZNP-UHFFFAOYSA-N 1,1,1-tripropoxypentane Chemical compound CCCCC(OCCC)(OCCC)OCCC UOZXHIBZEFKZNP-UHFFFAOYSA-N 0.000 description 1
- WSLDOOZREJYCGB-UHFFFAOYSA-N 1,2-Dichloroethane Chemical compound ClCCCl WSLDOOZREJYCGB-UHFFFAOYSA-N 0.000 description 1
- LFFIEVAMVPCZNA-UHFFFAOYSA-N 2-[4-(bromomethyl)phenyl]benzonitrile Chemical group C1=CC(CBr)=CC=C1C1=CC=CC=C1C#N LFFIEVAMVPCZNA-UHFFFAOYSA-N 0.000 description 1
- WKNMKGVLOWGGOU-UHFFFAOYSA-N 2-aminoacetamide;hydron;chloride Chemical compound Cl.NCC(N)=O WKNMKGVLOWGGOU-UHFFFAOYSA-N 0.000 description 1
- QGZKDVFQNNGYKY-UHFFFAOYSA-O Ammonium Chemical compound [NH4+] QGZKDVFQNNGYKY-UHFFFAOYSA-O 0.000 description 1
- 102000008873 Angiotensin II receptor Human genes 0.000 description 1
- 108050000824 Angiotensin II receptor Proteins 0.000 description 1
- BZTRJQCTJXAIPP-UHFFFAOYSA-N C(CCCC)(OCCCCC)(OCCCCC)OCCCCC Chemical compound C(CCCC)(OCCCCC)(OCCCCC)OCCCCC BZTRJQCTJXAIPP-UHFFFAOYSA-N 0.000 description 1
- ZCIPAUSEYZBIGA-UHFFFAOYSA-N CCNC(CNCc(cc1)ccc1-c1ccccc1C#N)=O Chemical compound CCNC(CNCc(cc1)ccc1-c1ccccc1C#N)=O ZCIPAUSEYZBIGA-UHFFFAOYSA-N 0.000 description 1
- JZUFKLXOESDKRF-UHFFFAOYSA-N Chlorothiazide Chemical compound C1=C(Cl)C(S(=O)(=O)N)=CC2=C1NCNS2(=O)=O JZUFKLXOESDKRF-UHFFFAOYSA-N 0.000 description 1
- XTHFKEDIFFGKHM-UHFFFAOYSA-N Dimethoxyethane Chemical compound COCCOC XTHFKEDIFFGKHM-UHFFFAOYSA-N 0.000 description 1
- BZLVMXJERCGZMT-UHFFFAOYSA-N Methyl tert-butyl ether Chemical compound COC(C)(C)C BZLVMXJERCGZMT-UHFFFAOYSA-N 0.000 description 1
- ZLMJMSJWJFRBEC-UHFFFAOYSA-N Potassium Chemical compound [K] ZLMJMSJWJFRBEC-UHFFFAOYSA-N 0.000 description 1
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 1
- 238000006069 Suzuki reaction reaction Methods 0.000 description 1
- FDKIDFYIEWFERB-UHFFFAOYSA-N [2-butyl-5-chloro-3-[[4-[2-(2h-tetrazol-5-yl)phenyl]phenyl]methyl]imidazol-4-yl]methanol;potassium Chemical compound [K].CCCCC1=NC(Cl)=C(CO)N1CC1=CC=C(C=2C(=CC=CC=2)C=2NN=NN=2)C=C1 FDKIDFYIEWFERB-UHFFFAOYSA-N 0.000 description 1
- 230000002378 acidificating effect Effects 0.000 description 1
- XYLMUPLGERFSHI-UHFFFAOYSA-N alpha-Methylstyrene Chemical compound CC(=C)C1=CC=CC=C1 XYLMUPLGERFSHI-UHFFFAOYSA-N 0.000 description 1
- 229910000147 aluminium phosphate Inorganic materials 0.000 description 1
- 150000001408 amides Chemical class 0.000 description 1
- 150000004945 aromatic hydrocarbons Chemical class 0.000 description 1
- 229910052794 bromium Inorganic materials 0.000 description 1
- BVKZGUZCCUSVTD-UHFFFAOYSA-N carbonic acid Chemical compound OC(O)=O BVKZGUZCCUSVTD-UHFFFAOYSA-N 0.000 description 1
- 239000003054 catalyst Substances 0.000 description 1
- 230000003197 catalytic effect Effects 0.000 description 1
- 239000007806 chemical reaction intermediate Substances 0.000 description 1
- 239000007810 chemical reaction solvent Substances 0.000 description 1
- 229910052801 chlorine Inorganic materials 0.000 description 1
- 238000004440 column chromatography Methods 0.000 description 1
- 229940125898 compound 5 Drugs 0.000 description 1
- 238000007796 conventional method Methods 0.000 description 1
- 238000001816 cooling Methods 0.000 description 1
- 238000006352 cycloaddition reaction Methods 0.000 description 1
- 238000012217 deletion Methods 0.000 description 1
- 230000037430 deletion Effects 0.000 description 1
- 238000004821 distillation Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 229910052731 fluorine Inorganic materials 0.000 description 1
- 229910052736 halogen Inorganic materials 0.000 description 1
- 125000005843 halogen group Chemical group 0.000 description 1
- 150000002430 hydrocarbons Chemical class 0.000 description 1
- 150000002460 imidazoles Chemical class 0.000 description 1
- 229910052740 iodine Inorganic materials 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 229910000000 metal hydroxide Inorganic materials 0.000 description 1
- 150000004692 metal hydroxides Chemical class 0.000 description 1
- 239000002808 molecular sieve Substances 0.000 description 1
- 235000005985 organic acids Nutrition 0.000 description 1
- 150000005331 phenylglycines Chemical class 0.000 description 1
- XAEFZNCEHLXOMS-UHFFFAOYSA-M potassium benzoate Chemical compound [K+].[O-]C(=O)C1=CC=CC=C1 XAEFZNCEHLXOMS-UHFFFAOYSA-M 0.000 description 1
- 229910000027 potassium carbonate Inorganic materials 0.000 description 1
- 238000012545 processing Methods 0.000 description 1
- 235000019260 propionic acid Nutrition 0.000 description 1
- 238000000746 purification Methods 0.000 description 1
- UMJSCPRVCHMLSP-UHFFFAOYSA-N pyridine Natural products COC1=CC=CN=C1 UMJSCPRVCHMLSP-UHFFFAOYSA-N 0.000 description 1
- IUVKMZGDUIUOCP-BTNSXGMBSA-N quinbolone Chemical compound O([C@H]1CC[C@H]2[C@H]3[C@@H]([C@]4(C=CC(=O)C=C4CC3)C)CC[C@@]21C)C1=CCCC1 IUVKMZGDUIUOCP-BTNSXGMBSA-N 0.000 description 1
- 230000009257 reactivity Effects 0.000 description 1
- 239000003087 receptor blocking agent Substances 0.000 description 1
- 238000006722 reduction reaction Methods 0.000 description 1
- 150000003839 salts Chemical class 0.000 description 1
- 229920006395 saturated elastomer Polymers 0.000 description 1
- URGAHOPLAPQHLN-UHFFFAOYSA-N sodium aluminosilicate Chemical compound [Na+].[Al+3].[O-][Si]([O-])=O.[O-][Si]([O-])=O URGAHOPLAPQHLN-UHFFFAOYSA-N 0.000 description 1
- 229910000029 sodium carbonate Inorganic materials 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
- 238000006467 substitution reaction Methods 0.000 description 1
- 150000003462 sulfoxides Chemical class 0.000 description 1
- 150000003512 tertiary amines Chemical class 0.000 description 1
- JOXIMZWYDAKGHI-UHFFFAOYSA-N toluene-4-sulfonic acid Chemical compound CC1=CC=C(S(O)(=O)=O)C=C1 JOXIMZWYDAKGHI-UHFFFAOYSA-N 0.000 description 1
- 125000002221 trityl group Chemical group [H]C1=C([H])C([H])=C([H])C([H])=C1C([*])(C1=C(C(=C(C(=C1[H])[H])[H])[H])[H])C1=C([H])C([H])=C([H])C([H])=C1[H] 0.000 description 1
- NQPDZGIKBAWPEJ-UHFFFAOYSA-N valeric acid Chemical compound CCCCC(O)=O NQPDZGIKBAWPEJ-UHFFFAOYSA-N 0.000 description 1
- 238000010626 work up procedure Methods 0.000 description 1
- QFDUTPNKBRXHTC-UHFFFAOYSA-N zinc diazide Chemical compound [Zn++].[N-]=[N+]=[N-].[N-]=[N+]=[N-] QFDUTPNKBRXHTC-UHFFFAOYSA-N 0.000 description 1
Classifications
-
- A—HUMAN NECESSITIES
- A61—MEDICAL OR VETERINARY SCIENCE; HYGIENE
- A61K—PREPARATIONS FOR MEDICAL, DENTAL OR TOILETRY PURPOSES
- A61K31/00—Medicinal preparations containing organic active ingredients
- A61K31/33—Heterocyclic compounds
- A61K31/395—Heterocyclic compounds having nitrogen as a ring hetero atom, e.g. guanethidine or rifamycins
- A61K31/41—Heterocyclic compounds having nitrogen as a ring hetero atom, e.g. guanethidine or rifamycins having five-membered rings with two or more ring hetero atoms, at least one of which being nitrogen, e.g. tetrazole
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07D—HETEROCYCLIC COMPOUNDS
- C07D257/00—Heterocyclic compounds containing rings having four nitrogen atoms as the only ring hetero atoms
- C07D257/02—Heterocyclic compounds containing rings having four nitrogen atoms as the only ring hetero atoms not condensed with other rings
- C07D257/04—Five-membered rings
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07D—HETEROCYCLIC COMPOUNDS
- C07D403/00—Heterocyclic compounds containing two or more hetero rings, having nitrogen atoms as the only ring hetero atoms, not provided for by group C07D401/00
- C07D403/02—Heterocyclic compounds containing two or more hetero rings, having nitrogen atoms as the only ring hetero atoms, not provided for by group C07D401/00 containing two hetero rings
- C07D403/10—Heterocyclic compounds containing two or more hetero rings, having nitrogen atoms as the only ring hetero atoms, not provided for by group C07D401/00 containing two hetero rings linked by a carbon chain containing aromatic rings
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02P—CLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
- Y02P20/00—Technologies relating to chemical industry
- Y02P20/50—Improvements relating to the production of bulk chemicals
- Y02P20/55—Design of synthesis routes, e.g. reducing the use of auxiliary or protecting groups
Landscapes
- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Health & Medical Sciences (AREA)
- Medicinal Chemistry (AREA)
- Pharmacology & Pharmacy (AREA)
- Epidemiology (AREA)
- Life Sciences & Earth Sciences (AREA)
- Animal Behavior & Ethology (AREA)
- General Health & Medical Sciences (AREA)
- Public Health (AREA)
- Veterinary Medicine (AREA)
- Plural Heterocyclic Compounds (AREA)
Abstract
본 발명은 고혈압 치료제인 로사탄의 제조에 중간체로서 유용한 테트라졸일-벤질-이미다졸 유도체 및 상기 유도체를 활용한 로사탄의 새로운 제조방법에 관한 것이다.The present invention relates to tetrazolyl-benzyl-imidazole derivatives useful as intermediates for the preparation of losartan, a therapeutic agent for hypertension, and a novel method for preparing losartan using the derivative.
Description
본 발명은 로사탄을 제조하는 신규 방법에 관한 것으로, 보다 구체적으로 로사탄 제조에 유용한 신규 테트라졸릴-벤질-이미다졸의 유도체 및 이를 이용한 로사탄의 제조방법에 관한 것이다.The present invention relates to a novel method for preparing losartan, and more particularly, to a derivative of novel tetrazolyl-benzyl-imidazole useful for the production of losartan and a method for producing losartan using the same.
안지오텐신 II 수용체 차단제인 로사탄 포타슘염은 하기 화학식 1로 표시되는 2-n-부틸-4-클로로-5-하이드록시메틸-1-[(2'-(1H-테트라졸-5-일)-1,1-비페닐-4-일)메틸]-1H-이미다졸 포타슘 염이며, 고혈압 치료제로 널리 사용되고 있다. Rosatan potassium salt, an angiotensin II receptor blocker, is 2-n-butyl-4-chloro-5-hydroxymethyl-1-[(2 '-(1H-tetrazol-5-yl)- 1,1-biphenyl-4-yl) methyl] -1H-imidazole potassium salt and is widely used as a therapeutic agent for hypertension.
[화학식 1][Formula 1]
로사탄은 다양한 합성경로에 의해 제조되고 있다. 예를 들어, 미국 특허 제5138069호는 하기 반응식 1에서와 같이 화학식 (a)의 이미다졸 화합물을 용매 중에 서 염기의 존재 하에 화학식 (b)의 화합물과 반응시켜 화학식 (c)의 중간체 화합물을 제조하고 이 중간체 (c)를 사용하여 [2+3] 환-부가(cyclo-addition) 반응을 통해 테트라졸기를 도입하여 로사탄을 제조하는 방법을 개시하고 있다. Rosatan is manufactured by various synthetic routes. For example, US Pat. No. 5138069 prepares an intermediate compound of Formula (c) by reacting an imidazole compound of Formula (a) with a compound of Formula (b) in the presence of a base in a solvent, as shown in Scheme 1 below. And a method of preparing losartan by introducing a tetrazole group through a [2 + 3] cyclo-addition reaction using the intermediate (c).
그러나, 반응식 1의 방법으로 화학식 (1)의 화합물을 제조하는 미국특허 제5138069호는 몇 가지 문제점이 있다.However, U. S. Patent No. 5138069, which prepares the compound of Formula (1) by the method of Scheme 1, has some problems.
첫째, 화학식 (a)의 이미다졸 화합물은 2가지의 토토머 형태로 존재한다. 따라서 화학식 (a)의 화합물과 화학식 (b)의 화합물을 반응시키면 원하는 생성물인 화학식 (c)의 화합물과 그것의 위치 이성질체인 화학식 (d)의 화합물이 부생성물로 동시에 얻어지므로, 반응식 1의 방법은 비선택적이다.First, the imidazole compound of formula (a) exists in two tautomeric forms. Thus, reacting a compound of formula (a) with a compound of formula (b) simultaneously obtains a compound of formula (c), a desired product, and a compound of formula (d), a positional isomer thereof, as a by-product; Is non-selective.
둘째, 부생성물인 화학식 (d)의 화합물은 원하는 생성물인 화학식 (c)의 화합물과 유사한 물리화학적 성질을 가지므로 반응 후 부생성물인 화학식 (d)의 화합물을 제거하기 위해서는 반복적이고 복잡한 방법을 사용하여야 한다. 이는 생산비 증가 및 수율 감소에 지대한 영향을 미친다.Second, the by-product compound of formula (d) has similar physicochemical properties as the desired product of formula (c), so iterative and complex methods are used to remove the by-product compound of formula (d) after the reaction. shall. This greatly affects production costs and yields.
한편, EP 공개공보 제1548009호는 하기 반응식 2에 의해 로사탄 포타슘염 제조의 핵심중간체로 사용되는 화학식 h의 화합물을 제조하는 방법을 개시하고 있다. 화학식 h의 화합물은 계속하여 트리페닐메틸기로 보호된 테트라졸 화합물인 화학식 i의 화합물과 스즈끼 커플링(Suzuki coupling) 반응을 하여 화학식 1의 로사탄 포타슘염이 제조된다.On the other hand, EP Publication No. 1548009 discloses a method for preparing a compound of formula h used as a key intermediate for the preparation of losartan potassium salt by the following Scheme 2. The compound of formula h is subsequently subjected to a Suzuki coupling reaction with a compound of formula i, a tetrazole compound protected with a triphenylmethyl group, to prepare a losartan potassium salt of formula 1.
하지만, EP 제1548009호에 의한 화학식 1의 로사탄 포타슘염의 제조방법은 전체적으로 반응 수율이 현저히 낮기 때문에 생산비가 증가되는 문제점이 있다. 낮은 반응 수율의 원인으로는 반응 중간체중의 하나인 화학식 f의 이미다졸리논 화합물이 다음 단계의 반응 조건인 산성 및 가온 하에서 상당히 불안정하기 때문이 다. 본 발명자들이 검토하여 본 결과 화학식 f의 중간체는 가온 하에서 매우 불안정하여 수 시간 후 40% 정도밖에 남아 있지 않았다.However, the method for preparing the losartan potassium salt of Chemical Formula 1 according to EP 1548009 has a problem in that the production cost is increased because the overall reaction yield is significantly low. The reason for the low reaction yield is that the imidazolinone compound of formula f, which is one of the reaction intermediates, is considerably unstable under the reaction conditions of acid and warming of the next step. The inventors examined and found that the intermediate of formula f was very unstable under heating, leaving only about 40% after several hours.
따라서, 상기 단점을 극복할 수 있는 유용한 중간체로서 신규한 이미다졸 유도체 및 상기 유도체를 활용한 로사탄의 신규한 제조방법이 당업계에서 요구되어 왔다. Therefore, there is a need in the art for a novel imidazole derivative and a novel method for preparing losartan using the derivative as a useful intermediate that can overcome the above disadvantages.
본 발명의 목적은 로사탄 유도체의 핵심 중간체로 사용되는 벤질이미다졸 유도체 및 상기 유도체를 활용한 로사탄의 신규한 제조방법을 제공하는 것이다. An object of the present invention is to provide a benzylimidazole derivative used as a core intermediate of a losartan derivative and a novel method for preparing losartan using the derivative.
본 발명은The present invention
1) 화학식 7의 화합물의 테트라졸환을 보호기와 반응시켜 화학식 6의 화합물을 형성시키고;1) reacting a tetrazole ring of a compound of Formula 7 with a protecting group to form a compound of Formula 6;
2) 화학식 6의 화합물과 트리C1 - 8알킬오르토발레레이트(orthovalerate)를 반응시켜 화학식 5의 화합물을 형성시키며;2) a compound of formula (6) and the tree C 1 - 8 alkyl, by reacting o-valerate (orthovalerate) thereby forming the compound of Formula 5;
3) 화학식 5의 화합물을 염소화제 및 포밀화제의 존재하에 클로로포밀화시켜 화학식 4의 화합물을 형성시키고;3) chloroformylation of the compound of formula 5 in the presence of a chlorinating agent and a formylating agent to form a compound of formula 4;
4) 화학식 4의 화합물의 알데하이드기를 알코올로 환원시켜 화학식 3의 화합 물 또는 그의 토토머를 제조하는 방법에 관한 것이다.4) A method of preparing a compound of formula 3 or a tautomer thereof by reducing an aldehyde group of a compound of formula 4 with alcohol.
[화학식 7][Formula 7]
[화학식 6][Formula 6]
[화학식 5][Formula 5]
[화학식 4][Formula 4]
[화학식 3][Formula 3]
상기 식에서, PG는 보호기이다.Wherein PG is a protecting group.
본 발명의 또한 상기 방법에 의해 제조된 화학식 3의 화합물을 이용하여 화학식 1의 로사탄 포타슘염을 제조하는 방법에 관한 것이다. The present invention also relates to a process for preparing the losartan potassium salt of formula (I) using the compound of formula (III) prepared by the above process.
화학식 3의 화합물을 제조하는 방법을 반응식 3에 예시하였으며, 반응식 3은 이해를 돕기 위해 본 발명의 바람직한 예를 나타낸 것일 뿐이고 어떠한 의미로든 본 발명을 제한하려는 의도는 아니다. 당업자라면 반응식에 관용수단의 부가, 삭제 및 치환 등이 가능함을 인지할 것이다. A method for preparing a compound of Formula 3 is illustrated in Scheme 3, which illustrates only a preferred example of the present invention for better understanding and is not intended to limit the present invention in any sense. Those skilled in the art will appreciate that additions, deletions and substitutions of conventional means to the schemes are possible.
반응식 3의 반응은 화학식 8의 화합물을 아지도 화합물인 R-N3와 반응시켜 [3+2] 환-부가 반응에 의해 신규한 화학식 7의 테트라졸 화합물을 얻고, 상기 테트라졸 화합물 7을 보호기와 반응시켜 테트라졸환이 보호된 신규한 화학식 6의 화합물을 얻을 수 있다. 그 후, 상기 화학식 6의 화합물과 트리알킬오르토발레레이트를 반응시켜 화학식 5의 이미다졸 화합물을 형성시키고, 상기 이미다졸 화합물 5를 클로로포밀화 시킴으로써 화학식 4의 이미다졸 알데하이드를 모노-아이소머로 얻을 수 있다. 계속하여 상기 알데하이드 화합물 4를 환원제로 처리하여 로사탄 제조의 핵심 중간체인 화학식 3의 화합물을 효율적인 반응공정에 의해 높은 수율로 얻을 수 있다. 상기 반응식에서 화학식 3 내지 7의 화합물의 테트라졸기는 다음과 같이 토토머로 존재할 수 있고, 는 화합물의 모핵에 테트라졸기가 결합되는 위치를 나타낸다.The reaction of Scheme 3 reacts the compound of Formula 8 with RN 3 , which is an azido compound, to obtain a novel tetrazole compound of Formula 7 by [3 + 2] ring-addition reaction, and reacts the tetrazole compound 7 with a protecting group. It is possible to obtain a novel compound of the formula (6) in which the tetrazole ring is protected. Thereafter, the imidazole aldehyde of Formula 4 may be obtained as a mono-isomer by reacting the compound of Formula 6 with trialkylorthovalerate to form the imidazole compound of Formula 5, and by chloroformylating the imidazole compound 5 have. Subsequently, the aldehyde compound 4 may be treated with a reducing agent to obtain a compound of formula 3, which is a key intermediate for the production of losartan, in high yield by an efficient reaction process. In the reaction scheme, the tetrazole group of the compound of formula 3 to 7 may exist as a tautomer as follows, Indicates the position at which the tetrazole group is bonded to the parent nucleus of the compound.
반응식 3에서 화학식 4 내지 7의 화합물은 신규 화합물이다. 따라서, 본 발명은 또한 화학식 4 내지 7의 화합물 또는 그의 토토머를 제공하는 것을 목적으로 한다. 이하, 상기 반응을 보다 구체적으로 설명한다.In Scheme 3, the compounds of formulas 4 to 7 are novel compounds. Accordingly, the present invention also aims to provide a compound of formulas 4 to 7 or tautomers thereof. Hereinafter, the reaction will be described in more detail.
화학식 8의 화합물의 제조Preparation of Compound of Formula 8
화학식 8의 화합물은 하기 반응식 4에서와 같이 화학식 j의 화합물과 글라이 신아미드를 염기의 존재하에 반응시켜 얻을 수 있다.The compound of formula 8 can be obtained by reacting the compound of formula j with glycineamide in the presence of a base as in Scheme 4 below.
반응식 4에서, 화학식 j의 화합물 중 X는 F, Cl, Br 또는 I와 같은 할로겐이고, 바람직하게는 Br이며, 화학식 j의 화합물은 미국 특허 제5138069호에 개시되어 있다. 글라이신 아미드의 사용량은 화학식 j의 화합물을 기준으로 1 내지 10 당량이고, 바람직하게는 1 내지 6 당량이다. 글라이신 아미드의 사용량이 1 당량 미만이면 반응수율이 낮아지고, 10 당량을 초과하면 후처리 과정이 복잡해 진다. 상기 반응에 사용 가능한 염기는 NaH 또는 KH와 같은 금속 하이드라이드(MH); NaOH, KOH 또는 LiOH와 같은 수산화금속(MOH); NaOR 또는 KOR과 같은 금속 알콕사이드(MOR); 탄산나트륨 또는 탄산칼륨과 같은 탄산의 금속염(MCO3); 트리에틸아민과 같은 3차 아민; 또는 피리딘과 같은 질소함유 방향족 염기이고, 바람직하게는 LiOH이다. 염기의 사용량은 화학식 j의 화합물을 기준으로 1 내지 10 당량이고, 바람직하게는 1 내지 6 당량이다. 염기의 사용량이 1 당량 미만이면 반응수율이 낮고, 10 당량을 초과하면 후처리 과정이 복잡해진다. 상기 반응에 사용되는 반응용매로 톨루엔, 벤젠 또는 크실렌과 같은 방향족 탄화수소; 클로로포름, 디클로로메탄 또는 1,2-에틸렌디클로라이드와 같은 염화탄화수소; 디메틸에테르, 디에틸에테르, 메틸 t-부틸에테르, 디메톡시에탄, 테트라하이드로푸란 또는 디옥산과 같은 에테르; 메탄올, 에탄올, 이소프로판올 또는 t-부탄올과 같은 알코올; N,N-디메틸포름아미드 또는 N,N-디메틸아세트아미드와 같은 아미드; 디메틸설폭사이드와 같은 설폭사이드; 또는 이들 중 2 이상의 혼합물을 포함하지만 이로 제한되는 것은 아니다. 바람직한 용매는 알코올, N,N-디메틸포름아미드, N,N-디메틸아세트아미드 및 이들의 혼합물로 구성된 그룹에서 선택된다. 반응온도는 약 0 내지 80℃이고, 바람직하게는 30 내지 60℃이다.In Scheme 4, X in the compound of formula j is halogen, such as F, Cl, Br or I, preferably Br, and the compound of formula j is disclosed in US Pat. The amount of glycine amide used is 1 to 10 equivalents, preferably 1 to 6 equivalents, based on the compound of formula j. If the amount of glycine amide is less than 1 equivalent, the reaction yield is low, and if it is more than 10 equivalents, the post-treatment process is complicated. Bases available for the reaction include metal hydrides (MH) such as NaH or KH; Metal hydroxides (MOH) such as NaOH, KOH or LiOH; Metal alkoxides (MOR) such as NaOR or KOR; Metal salts of carbonic acid such as sodium carbonate or potassium carbonate (MCO 3 ); Tertiary amines such as triethylamine; Or a nitrogen-containing aromatic base such as pyridine, preferably LiOH. The use amount of base is 1 to 10 equivalents, preferably 1 to 6 equivalents, based on the compound of formula j. If the amount of base used is less than 1 equivalent, the reaction yield is low, and if it exceeds 10 equivalents, the post-treatment process is complicated. As a reaction solvent used in the reaction, an aromatic hydrocarbon such as toluene, benzene or xylene; Hydrocarbon chlorides such as chloroform, dichloromethane or 1,2-ethylenedichloride; Ethers such as dimethyl ether, diethyl ether, methyl t-butyl ether, dimethoxyethane, tetrahydrofuran or dioxane; Alcohols such as methanol, ethanol, isopropanol or t-butanol; Amides such as N, N-dimethylformamide or N, N-dimethylacetamide; Sulfoxides such as dimethyl sulfoxide; Or mixtures of two or more of these, but is not limited thereto. Preferred solvents are selected from the group consisting of alcohols, N, N-dimethylformamide, N, N-dimethylacetamide and mixtures thereof. The reaction temperature is about 0 to 80 캜, preferably 30 to 60 캜.
화학식 7의 화합물의 제조Preparation of Compound of Formula 7
화학식 8의 화합물을 화학식 7의 화합물로 전환시키는 [3+2] 환-부가 반응은 화학식 8의 화합물에 아지도 화합물을 첨가하고 4시간 내지 80시간 동안, 실온 내지 150℃의 온도로 반응액을 가열함으로써 수행된다. 상기 반응에 사용되는 아지도 화합물은 화학식 R-N3로 표시되고, R은 Na, Zn, 트리C1 - 4알킬틴 또는 트리C1 - 4알킬실릴을 나타내지만 이로 제한되지는 않는다. R-N3로 표시되는 아지도 화합물의 예는 아지도트리메틸실란, 소듐 아지드, 징크 아지드, 트리메틸틴아지드 또는 트리부틸틴아지드를 포함하지만 이로 제한되지는 않으며 바람직하게는 소듐 아지드 또는 아지도트리메틸실란이다. [3+2] 환-부가 반응은 음이온 활성화제의 존재하에 수행되는 것이 반응 효율을 위해 바람직하다. 상기 반응에 사용될 수 있는 음이온 활성화제의 예는 테트라부틸 암모늄 플루오라이드, 징크 브로마이드, 징크 클로라이드, 암모늄 클로라이드, 세슘 플루오라이드 또는 포타슘 플루오라이드를 포함하지 만 이로 제한되지는 않으나, 아지도 화합물로 소듐 아지드를 선택하는 경우에는 징크클로라이드를 음이온 활성화제로 사용하고, 아지도 화합물로 아지도트리메틸실란을 선택하는 경우에는 테트라부틸 암모늄 플루오라이드를 음이온 활성화제로 사용하는 것이 바람직하다. 상기 반응에 사용되는 아지도 화합물 및 음이온 활성화제의 양은 각각 화학식 8의 화합물을 기준으로 1 내지 10 당량 및 0.1 내지 3 당량이고, 바람직하게는 1.2 내지 3 당량 및 0.3 내지 1.5 당량이다. 아지도 화합물의 양이 1 당량 미만이면 반응수율이 매우 낮고, 10 당량을 초과하면 후 처리과정이 복잡해지며, 음이온 활성화제의 양이 0.1 당량 미만이면 반응 속도가 매우 느려지고, 3 당량을 초과하면 후 처리가 복잡해 진다. 상기 반응에 사용되는 용매는 환-부가 반응에 악영향을 미치지 않는 불활성 용매 중에서 자유롭게 선택될 수 있고, 이러한 용매의 예는 부탄올, 톨루엔, 자일렌 또는 N,N-디메틸아세트아미드를 포함하지만 이로 제한되는 것은 아니다.[3 + 2] ring-addition reaction for converting the compound of Formula 8 to the compound of Formula 7 is performed by adding the azido compound to the compound of Formula 8 and then for 4 to 80 hours, at room temperature to 150 ° C. By heating. Azido compound used in the reaction is represented by the general formula RN 3, R is Na, Zn, tree, C 1 - 4 alkyl tin, or tri C 1 - represents a 4 alkylsilyl but is not limited this. Examples of azido compounds represented by RN 3 include, but are not limited to, azidotrimethylsilane, sodium azide, zinc azide, trimethyltinazide or tributyltinazide, preferably sodium azide or azidotrimethyl Silane. It is preferable for the reaction efficiency that the [3 + 2] ring-addition reaction is carried out in the presence of an anion activator. Examples of anion activators that can be used in the reaction include, but are not limited to, tetrabutyl ammonium fluoride, zinc bromide, zinc chloride, ammonium chloride, cesium fluoride or potassium fluoride, but are not limited to sodium azido compounds as azido compounds. When selecting a zide, it is preferable to use zinc chloride as an anion activator, and when selecting azidotrimethylsilane as an azido compound, tetrabutyl ammonium fluoride is used as an anion activator. The amount of the azido compound and the anion activator used in the reaction is 1 to 10 equivalents and 0.1 to 3 equivalents, preferably 1.2 to 3 equivalents and 0.3 to 1.5 equivalents, respectively, based on the compound of formula (8). If the amount of azido compound is less than 1 equivalent, the reaction yield is very low. If it is more than 10 equivalents, the post-treatment process is complicated. If the amount of anion activator is less than 0.1 equivalent, the reaction rate is very slow. Processing becomes complicated. The solvent used in the reaction can be freely selected from inert solvents that do not adversely affect ring-addition reactions, and examples of such solvents include but are not limited to butanol, toluene, xylene or N, N-dimethylacetamide. It is not.
화학식 6의 화합물의 제조Preparation of Compound of Formula 6
화학식 7의 화합물을 보호기와 반응시켜 테트라졸환이 보호된 화학식 6의 화합물을 형성시키는 반응은 통상의 보호기를 사용하여 수행될 수 있다. 보호기 반응(protection reaction)에 사용될 수 있는 보호기의 예는 트리페닐메탄, 디페닐메탄, 트리메틸메탄, 프로피오니트릴, 2-토실에틸 또는 1-메틸페닐에틸을 포함하지만 이로 제한되지는 않으며 바람직하게는 비용이 저렴한 1-메틸페닐에틸 이다. 1-메틸페닐에틸 을 사용하면 화학식 7의 화합물의 테트라졸환은 큐밀기(cumyl group)로 보호되며 반응 수율이 높고 탈보호기 반응이 간편한 이점이 있다. 보호기 반응에 사용되는 보호기의 양은 화학식 7의 화합물을 기준으로 1 내지 3 당량이고, 바람직하게는 1 내지 2 당량이다. 보호기의 양이 1 당량 미만이면 반응성이 낮아지고, 3 당량을 초과하면 불순물이 증가하여 후 처리가 복잡하다. 상기 반응은 산 존재하에 수행하는 것이 바람직하고, 통상의 산이 모두 사용될 수 있다. 상기 반응에 사용되는 산의 예는 아세트산, 트리플루오로아세트산, 파라-톨루엔설폰산, 메탄설폰산, 프로피온산, 포름산과 같은 유기산; 또는 염산, 황산 또는 인산과 같은 무기산이고, 바람직하게는 아세트산 또는 트리플루오로아세트산이다. 사용되는 산의 양은 화학식 7의 화합물을 기준으로 1 내지 5 당량이고, 바람직하게는 2 내지 5 당량이다. 상기 반응에 사용되는 보호기 반응에 악영향을 미치지 않은 일반적인 불활성 용매하에서 자유롭게 선택될 수 있고, 이러한 용매의 예는 디클로로메탄, 디클로로에탄, 디옥산, 아세토니트릴, 테트라하이드로푸란, 톨루엔 또는 자일렌 등을 포함하지만 이로 제한되는 것은 아니며, 바람직하게는 디클로로메탄 또는 디클로로에탄이다.The reaction of reacting the compound of Formula 7 with a protecting group to form the compound of Formula 6 in which the tetrazole ring is protected may be carried out using a conventional protecting group. Examples of protecting groups that can be used in the protection reaction include, but are not limited to, triphenylmethane, diphenylmethane, trimethylmethane, propionitrile, 2-tosylethyl or 1-methylphenylethyl. This is inexpensive 1-methylphenylethyl. When 1-methylphenylethyl is used, the tetrazole ring of the compound of Formula 7 is protected by a cumyl group, and the reaction yield is high and the deprotection group reaction is easy. The amount of protecting group used in the protecting group reaction is 1 to 3 equivalents, preferably 1 to 2 equivalents, based on the compound of formula (7). If the amount of the protecting group is less than 1 equivalent, the reactivity becomes low. If the amount of the protecting group is more than 3 equivalent, the impurities increase, which complicates post-treatment. The reaction is preferably carried out in the presence of an acid, and all conventional acids can be used. Examples of the acid used in the reaction include organic acids such as acetic acid, trifluoroacetic acid, para-toluenesulfonic acid, methanesulfonic acid, propionic acid and formic acid; Or inorganic acids such as hydrochloric acid, sulfuric acid or phosphoric acid, preferably acetic acid or trifluoroacetic acid. The amount of acid used is 1 to 5 equivalents, preferably 2 to 5 equivalents, based on the compound of formula 7. It can be freely selected under common inert solvents that do not adversely affect the protecting group reaction used in the reaction, examples of such solvents include dichloromethane, dichloroethane, dioxane, acetonitrile, tetrahydrofuran, toluene or xylene and the like. However, it is not limited thereto, and preferably dichloromethane or dichloroethane.
화학식 5의 화합물의 제조Preparation of Compound of Formula 5
테트라졸환이 보호된 비페닐 글라이신 아미드 유도체인 화학식 6의 화합물을 트리알킬오르토발레레이트(orthovalerate), 바람직하게는 트리C1 - 8알킬오르토발레레이트와 산 존재하에, 바람직하게는 촉매량의 산 존재하에서 용매의 존재 또는 부존 재하에 반응시켜 화학식 5의 화합물을 얻을 수 있다. 바람직한 트리C1 - 8알킬오르토발레레이트는 트리메틸오르토발레레이트(TMOV), 트리에틸오르토발레레이트, 트리프로필오르토발레레이트, 트리부틸오르토발레레이트, 트리펜틸오르토발레레이트 또는 트리헥실오르토발레레이트이고, 보다 바람직하게는 트리메틸오르토발레레이트이다. 트리알킬오르토발레레이트의 사용량은 화학식 6의 화합물의 기준으로 1 내지 2 당량이고, 바람직하게는 1.1 내지 1.5 당량이다. 트리알킬오르토발레레이트의 사용량이 1 당량 미만하면 반응수율이 낮아지고, 2 당량을 초과하면 불순물이 증가한다. 상기 반응에 사용되는 산은 황산과 같은 무기산; 또는 포름산, 아세트산, 메탄설폰산 또는 캄포설폰산과 같은 유기산이며, 바람직하게는 아세트산이다. 촉매로 사용되는 산의 사용량은 화학식 6의 화합물을 기준으로 1 내지 20 몰%이고, 바람직하게는 3 내지 10 몰%이다. 산의 사용량이 1 몰% 미만이면 반응수율이 낮고, 20 몰%를 초과하면 불순물이 증가하고 후 처리 과정이 복잡해진다. 반응과정에서 생성되는 메탄올을 제거하기 위해 반응은 65 내지 120℃의 온도범위에서 수행되고, 80 내지 110℃의 온도범위에서 수행되는 것이 바람직하다. 반응은 유기용매의 존재하에 또는 부존재하에 수행될 수 있다. 상기 반응에 사용 가능한 유기용매는 반응에 악영향을 미치지 않는 용매 중에서 자유롭게 선택될 수 있고, 이러한 용매의 예는 톨루엔, 자일렌, 디옥산 또는 디클로로에탄과 같은 탄화수소 용매를 포함하지만 이로 제한되는 것은 아니다.The tetrazole ring is protected with a non-phenylglycine derivatives, a compound of formula (6) a trialkyl ortho-valerate (orthovalerate), preferably a tree, C 1 - under 8 alkyl ortho-valerate and the acid is present, preferably the presence of an acid the presence of a catalytic amount of The compound of formula 5 can be obtained by reaction in the presence or absence of a solvent. And 8-alkyl ortho-valerate trimethyl ortho-valerate (TMOV), triethyl ortho-valerate, tripropyl ortho-valerate, tributyl o-valerate, tri-pentyl ortho-valerate or trihexyl o-valerate, - preferred tree C 1 More preferably, it is trimethyl orthovalerate. The amount of trialkylorthovalerate used is 1 to 2 equivalents, preferably 1.1 to 1.5 equivalents, based on the compound of formula 6. When the amount of the trialkyl ortho valerate is less than 1 equivalent, the reaction yield is lowered, and when it exceeds 2 equivalents, the impurities are increased. The acid used in the reaction is an inorganic acid such as sulfuric acid; Or an organic acid such as formic acid, acetic acid, methanesulfonic acid or camphorsulfonic acid, preferably acetic acid. The amount of acid used as a catalyst is 1 to 20 mol%, preferably 3 to 10 mol%, based on the compound of formula (6). If the amount of acid used is less than 1 mol%, the reaction yield is low, and if it is more than 20 mol%, impurities are increased and the post-treatment process is complicated. In order to remove methanol generated in the reaction process, the reaction is performed at a temperature range of 65 to 120 ° C, and preferably at a temperature range of 80 to 110 ° C. The reaction can be carried out in the presence or absence of an organic solvent. Organic solvents usable in the reaction can be freely selected from solvents that do not adversely affect the reaction, and examples of such solvents include, but are not limited to, hydrocarbon solvents such as toluene, xylene, dioxane or dichloroethane.
또한, EP 제1548009호에 개시된 이미다졸리논 화합물인 화학식 f의 화합물은 다음 단계의 반응 조건인 산성 및 가온 하에서 상당히 불안정하여 수 시간 후 40% 정도밖에 남아 있지 않았지만, 본 발명에 따른 화학식 (5)의 화합물은 동일조건에서 80% 정도가 남아있어 EP 제1548009호에 개시된 화합물에 비해 상당히 안정하므로 반응의 전체 수율이 개선되었다. Further, the compound of formula f, which is the imidazolinone compound disclosed in EP 1548009, was considerably unstable under acidic and warming reaction conditions of the next step, and remained only about 40% after several hours. ) Remain about 80% under the same conditions and are considerably more stable than the compounds disclosed in EP 1548009, thus improving the overall yield of the reaction.
화학식 4의 화합물의 제조Preparation of Compound of Formula 4
형성된 화학식 5의 이미다졸 화합물을 염소화제 및 ℃포밀화제의 존재하에 클로로포밀화 시킴으로써 화학식 4의 이미다졸 알데하이드를 모노-아이소머로 얻을 수 있다. 계속하여 화학식 4의 알데하이드 화합물을 특별한 정제과정 없이 수처리만 한 다음 환원제로 처리하여 로사탄 제조의 핵심 중간체인 화학식 3의 화합물을 효율적인 반응 공정에 의해 높은 수율로 얻을 수 있다. 화학식 5의 화합물을 화학식 4의 화합물로 전환시키는 클로로포밀화 반응은 -10 내지 10℃의 온도범위에서 화학식 5의 화합물에 염소화제를 첨가하고, 30분에서 2시간에 걸쳐 약 80 내지 110℃로 반응액을 가열시킨 뒤, 포밀화제를 추가로 첨가하고 약 5시간 동안 환류 반응시킴으로써 수행된다. 상기 반응에 사용 가능한 염소화제는 포스포러스옥시클로라이드(POCl3), 포스포러스펜타클로라이드(PCl5), 티오닐클로라이드(SOCl2), 포스젠(COCl2) 또는 옥살릴클로라이드(CO2Cl2)이고, 바람직하게는 포스포러스옥시클로라이드이다. 염소화제의 사용량은 화학식 5의 화합물을 기준으로 2 내지 6 당량이고, 바람직하게는 3 내지 6 당량이다. 염소화제의 사용량이 2 당량 미만이면 반응 속도 및 반응수율이 떨어지고, 6 당량을 초과하면 불순물이 증가한다. 상기 반응에 사용 가능한 포밀화제는 N-메틸포름아미드(MFA), N,N-디메틸포름아미드(DMF), N,N-디에틸포름아미드(DEF), N,N-디부틸포름아미드(DBF), N-포밀피페리딘(PIF) 또는 N-포밀모르폴린 (MOF) 등을 포함하지만 이로 제한되는 것은 아니다. 포밀화제의 사용량은 화학식 5의 화합물을 기준으로 1 내지 6 당량이고, 바람직하게는 2 내지 6 당량이다. 포밀화제의 사용량이 1 당량 미만이면 반응속도 및 반응수율이 떨어지고, 6 당량을 초과하면 불순물이 증가한다. 클로로포밀화 반응에는 통상의 불활성 용매가 사용되고, 바람직하게는 디클로로에탄, 톨루엔 또는 자일렌이 사용되며, 보다 바람직하게는 디클로로에탄이 사용된다. The imidazole aldehyde of formula 4 can be obtained as a mono-isomer by chloroformylation of the imidazole compound of formula 5 formed in the presence of a chlorinating agent and a < RTI ID = 0.0 > formylating < / RTI > Subsequently, the aldehyde compound of Formula 4 is treated with water without any special purification process and then treated with a reducing agent to obtain the compound of Formula 3, which is a key intermediate for the production of losartan, in high yield by an efficient reaction process. The chloroformylation reaction for converting the compound of Formula 5 to the compound of Formula 4 adds a chlorinating agent to the compound of Formula 5 at a temperature ranging from -10 to 10 ° C., and from about 80 to 110 ° C. over 30 minutes to 2 hours. The reaction solution is heated, followed by further addition of a formylating agent and refluxing for about 5 hours. The chlorinating agent that can be used in the reaction is phosphorus oxychloride (POCl 3 ), phosphorus pentachloride (PCl 5 ), thionyl chloride (SOCl 2 ), phosgene (COCl 2 ) or oxalyl chloride (CO 2 Cl 2 ) And preferably phosphorus oxychloride. The amount of the chlorinating agent used is 2 to 6 equivalents, preferably 3 to 6 equivalents based on the compound of formula (5). If the amount of the chlorinating agent is less than 2 equivalents, the reaction rate and the yield of the reaction are lowered. Formants that can be used in the reaction include N-methylformamide (MFA), N, N-dimethylformamide (DMF), N, N-diethylformamide (DEF), N, N-dibutylformamide (DBF ), N-formylpiperidine (PIF) or N-formylmorpholine (MOF) and the like. The amount of the formylating agent is 1 to 6 equivalents, preferably 2 to 6 equivalents, based on the compound of formula (5). If the amount of the formylating agent is less than 1 equivalent, the reaction rate and the yield of the reaction decrease, and if it exceeds 6 equivalents, the impurities increase. A conventional inert solvent is used for the chloroformylation reaction, preferably dichloroethane, toluene or xylene is used, and more preferably dichloroethane is used.
화학식 3의 화합물의 제조Preparation of Compound of Formula 3
화학식 4의 알데하이드 화합물로부터 화학식 3의 알코올 화합물로의 전환은 환원제를 이용하여 수행되며, 이러한 방법은 당업계에 잘 알려져 있다. 상기 반응에 사용되는 환원제는 수소화 붕소 나트륨 또는 수소화 붕소 칼륨과 같은 수소화 붕소 알칼리 금속; 또는 수소화 붕소 테트라C1 - 4알킬암모늄이고, 바람직하게는 NaBH4이다. 환원제의 사용량은 화학식 4의 화합물을 기준으로 0.25 내지 2 당량이고, 바람직하게는 0.5 내지 1.5 당량이다. 환원제의 사용량이 0.25 당량 미만이면 반응수율이 낮아지고, 2 당량을 초과하면 후처리 과정이 어려워진다. 반응 온도는 사용되는 환원제 및 반응조건에 따라 달라지나, 수소화 붕소 알칼리 금속을 사용하 는 경우에는 일반적으로 실온에서 반응하는 것이 바람직하다. 환원반응에 사용되는 용매는 반응에 악영향을 미치지 않는 한 알데하이드 화합물을 알코올 화합물로 환원시키는데 사용되는 통상의 용매 중에서 자유롭게 선택될 수 있다. 상기 반응에는 메탄올, 에탄올, 이소프로탄올 또는 부탄올과 같은 C1 - 6알콜; 에틸 아세테이트, 이소프로필 아세테이트, 또는 부틸 아세테이트와 같은 C1 - 6알킬 아세테이트; 테트라하이드로푸란, 또는 디옥산과 같은 에테르를 사용할 수 있으나, 용매가 이로 제한되는 것은 아니다. 또한, 상기 용매는 물과의 혼합물로 사용될 수 있고, 테트라알킬암모늄 할라이드 또는 하이드로설페이트와 같은 상전이 촉매를 임의로 포함할 수 있다. The conversion of the aldehyde compound of formula 4 to the alcohol compound of formula 3 is carried out using a reducing agent, which methods are well known in the art. Reducing agents used in the reaction include boron hydride alkali metals such as sodium borohydride or potassium borohydride; Or borohydride, tetra-C 1 - 4 alkyl, the ammonium, preferably NaBH 4. The amount of the reducing agent is 0.25 to 2 equivalents, preferably 0.5 to 1.5 equivalents, based on the compound of formula 4. If the amount of the reducing agent is less than 0.25 equivalent, the reaction yield is low, and if it exceeds 2 equivalent, the post-treatment process becomes difficult. The reaction temperature depends on the reducing agent used and the reaction conditions, but in the case of using an alkali metal borohydride, it is generally preferred to react at room temperature. The solvent used in the reduction reaction can be freely selected from conventional solvents used to reduce the aldehyde compound to the alcohol compound so long as it does not adversely affect the reaction. The reaction is C 1, such as methanol, ethanol, isopropanol or butanol, butanol-6 alcohol; 6 alkyl acetate - C 1, such as ethyl acetate, isopropyl acetate, or butyl acetate; Ethers such as tetrahydrofuran, or dioxane can be used, but the solvent is not limited thereto. In addition, the solvent may be used in a mixture with water and may optionally include a phase transfer catalyst such as tetraalkylammonium halide or hydrosulfate.
화학식 2 및 1의 화합물의 제조Preparation of Compounds of Formulas 2 and 1
또한, 본 발명은 본 발명의 신규 방법에 따라 제조된 화학식 3의 화합물을 이용하여 로사탄 포타슘염을 제조하는 방법을 제공한다. 화학식 3의 화합물로부터 로사탄 포타슘염의 제조는 EP 1555260A에 기술된 방법과 같이 제조할 수 있으며, 이를 하기 반응식 5에 예시하였다.The present invention also provides a method for preparing losartan potassium salt using the compound of formula 3 prepared according to the novel method of the present invention. The preparation of the losartan potassium salt from the compound of formula 3 can be prepared according to the method described in EP 1555260A, which is illustrated in Scheme 5 below.
상기 반응식 5에서, 화학식 3의 화합물은 탈보호되어 화학식 2의 화합물로 전환되고, 화학식 2의 화합물을 KOH로 처리하여 원하는 로사탄-포타슘 염 (1)을 제조한다. 상기 반응식에서 화학식 2의 화합물의 테트라졸기는 다음과 같이 토토머로 존재할 수 있고, 는 화합물의 모핵에 테트라졸기가 결합되는 위치를 나타낸다.In Scheme 5, the compound of formula 3 is deprotected and converted to the compound of formula 2, and the compound of formula 2 is treated with KOH to prepare the desired losartan-potassium salt (1). In the reaction scheme, the tetrazole group of the compound of formula 2 may exist as a tautomer as follows, Indicates the position at which the tetrazole group is bonded to the parent nucleus of the compound.
화학식 3의 화합물의 보호기는 통상의 방법에 의해 탈보호될 수 있고, 산 존재하에 탈보호시키는 것이 바람직하다. 탈보호 반응에 사용되는 산은 황산과 같은 무기산; 또는 포름산, 아세트산, 메탄설폰산 또는 캄포설폰산과 같은 유기산이며, 바람직하게는 황산이다. 사용되는 산의 사용량은 화학식 3의 화합물을 기준으로 1 내지 20 당량이고, 바람직하게는 1 내지 13 당량이다. 탈보호 반응에 사용되는 산의 양이 1 당량 미만이면 반응수율이 낮아지고, 20 당량을 초과하면 불순물이 증가한다. 탈보호 반응에 사용되는 용매는 반응에 악영향을 미치지 않는 통상의 용매 중에서 자유롭게 선택될 수 있다. 상기 반응에는 메탄올, 에탄올, 이소프로탄올 또는 부탄올과 같은 C1 - 6알콜; 에틸 아세테이트, 이소프로필 아세테이트, 또는 부틸 아세테이트와 같은 C1 - 6알킬 아세테이트; 테트라하이드로푸란, 또는 디옥산과 같은 에테르; 또는 디클로로메탄 또는 디클로로에탄 등의 할로겐화 용매 등을 사용할 수 있으나, 용매가 이로 제한되는 것은 아니다. 또한, 상기 용매는 물과의 혼합물로 사용될 수 있고, 테트라알킬암모늄 할라이드 또는 하이드로설페이트와 같은 상전이 촉매를 임의로 포함할 수 있다.The protecting group of the compound of formula 3 may be deprotected by conventional methods, and is preferably deprotected in the presence of an acid. Acids used in the deprotection reaction include inorganic acids such as sulfuric acid; Or an organic acid such as formic acid, acetic acid, methanesulfonic acid or camphorsulfonic acid, preferably sulfuric acid. The amount of acid used is 1 to 20 equivalents, preferably 1 to 13 equivalents, based on the compound of formula (3). If the amount of acid used in the deprotection reaction is less than 1 equivalent, the yield of the reaction is lowered, and if it exceeds 20 equivalents, impurities are increased. The solvent used in the deprotection reaction can be freely selected from conventional solvents which do not adversely affect the reaction. The reaction is C 1, such as methanol, ethanol, isopropanol or butanol, butanol-6 alcohol; 6 alkyl acetate - C 1, such as ethyl acetate, isopropyl acetate, or butyl acetate; Ethers such as tetrahydrofuran, or dioxane; Or a halogenated solvent such as dichloromethane or dichloroethane, but the solvent is not limited thereto. In addition, the solvent may be used in a mixture with water and may optionally include a phase transfer catalyst such as tetraalkylammonium halide or hydrosulfate.
이하, 본 발명을 하기 실시예에 의해 보다 구체적으로 설명하지만, 이는 본 발명의 이해를 돕기 위한 것일 뿐, 어떠한 의미로든 본 발명의 범위를 제한하고자 하는 것은 아니다.Hereinafter, the present invention will be described in more detail with reference to the following examples, which are only intended to aid the understanding of the present invention and are not intended to limit the scope of the present invention in any sense.
제조예 1: 2-[(2'-시아노-비페닐-4-일메틸)-아미노]-아세트아미드(8)의 합성Preparation Example 1 Synthesis of 2-[(2'-Cyano-biphenyl-4-ylmethyl) -amino] -acetamide (8)
4'-브로모메틸-2-시아노비페닐(13.6 g, 50 mmol), 글라이신 아미드·염산염(11.1 g, 100 mmol) 및 LiOH·1H2O(4.1 g, 100 mmol)를 메탄올(100 ㎖)에 첨가하였다. 반응물을 5시간 동안 환류 교반한 다음 층 분리하여 유기층을 감압하에서 농축하고 톨루엔(200 ㎖)으로 재결정하여 목적 화합물(10.61 g, 수율 80%)을 백색고체로 수득하였다. 4'-bromomethyl-2-cyanobiphenyl (13.6 g, 50 mmol), glycine amide hydrochloride (11.1 g, 100 mmol) and LiOH.1H 2 O (4.1 g, 100 mmol) were added to methanol (100 mL). Was added. The reaction was stirred at reflux for 5 hours, and then the layers were separated. The organic layer was concentrated under reduced pressure and recrystallized from toluene (200 mL) to obtain the target compound (10.61 g, yield 80%) as a white solid.
1H NMR (CDCl3 , 400 MHz): δ 3.36(s, 2H), 3.88(s, 2H), 5.65(bs, 1H), 7.00(bs, 1H), 7.43~7.55(m, 6H), 7.65(m, 1H), 7.78(m,1H). MS(M+1): 266 1 H NMR (CDCl 3 , 400 MHz): δ 3.36 (s, 2H), 3.88 (s, 2H), 5.65 (bs, 1H), 7.00 (bs, 1H), 7.43 ~ 7.55 (m, 6H), 7.65 (m, 1 H), 7.78 (m, 1 H). MS (M + 1): 266
실시예 1: 2-{[(2'-(2H-테트라졸-5-일)-비페닐-4-일)메틸]-아미노}-아세트아미드 (7)의 합성Example 1: Synthesis of 2-{[(2 '-(2H-tetrazol-5-yl) -biphenyl-4-yl) methyl] -amino} -acetamide (7)
제조예 1에서 합성한 2-[(2'-시아노-비페닐-4-일메틸)-아미노]-아세트아미드(8)(10.61 g, 40 mmol)와 N,N-디메틸아세트아미드 (5 ml)를 함께 플라스크에 넣고 아지도트리메틸실란 (11.1 ml, 2.1 당량)과 무수 n-테트라부틸암모늄 플루오라이드 (10.45 g, 1 당량)를 첨가하였다. 온도를 110℃로 고정하고 16시간 동안 환류 시킨 후 아세토니트릴 (20 ml)을 가하여 고체를 생성시켰다. 흰색 고체를 여과하고 건조하여 표제 화합물 (11.0g, 수율 89 %)을 얻었다.2-[(2'-cyano-biphenyl-4-ylmethyl) -amino] -acetamide (8) (10.61 g, 40 mmol) synthesized in Preparation Example 1 and N, N-dimethylacetamide (5 ml) were added together into the flask and azidotrimethylsilane (11.1 ml, 2.1 equiv) and anhydrous n-tetrabutylammonium fluoride (10.45 g, 1 equiv) were added. The temperature was fixed at 110 ° C. and refluxed for 16 hours before acetonitrile (20 ml) was added to give a solid. The white solid was filtered and dried to give the title compound (11.0 g, 89% yield).
1H NMR (DMSO-d6 ,): δ 3.37(s, 2H), 3.92(s, 2H), 7.13(d, 2H), 7.29(d, 2H), 7.41~ 7.61(m, 4H). MS(M+1): 309 1 H NMR (DMSO-d 6 , ): δ 3.37 (s, 2H), 3.92 (s, 2H), 7.13 (d, 2H), 7.29 (d, 2H), 7.41-7.61 (m, 4H). MS (M + 1): 309
실시예 2: 2-({[2'-(2-(1-메틸-1-페닐-에틸)-2H-테트라졸-5-일)-비페닐-4- 일]메틸}-아미노)-아세트아미드 (6)의 합성Example 2: 2-({[2 '-(2- (1-methyl-1-phenyl-ethyl) -2H-tetrazol-5-yl) -biphenyl-4-yl] methyl} -amino)- Synthesis of Acetamide (6)
실시예 1에서 합성한 화합물 (7) (6.17 g, 20 mmol)을 디클로로에탄(30 ml)과 섞고, 여기에 트리플루오로 아세트산 (6 ml, 4 당량)을 실온에서 적가하였다. 얻은 맑은 용액을 아이스 배스(ice bath)로 5℃ 이하로 냉각한 후 α-메틸스티렌 (3.12 ml, 1.2 당량)을 디클로로에탄 (5 ml)에 희석시킨 용액을 적가하였다. 실온에서 15 시간동안 교반한 후 용매를 감압증류로 완전히 제거하였다. 포화 NaHCO3 용액과 디클로로에탄으로 워크-업(work-up) 하고 무수 황산마그네슘으로 건조한 후 컬럼크로마토그래피(CH2Cl2/MeOH = 9:1)를 이용하여 목적 화합물 (6) (7.25 g, 수율=85%)을 얻었다.Compound (7) synthesized in Example 1 (6.17 g, 20 mmol) was mixed with dichloroethane (30 ml), and trifluoro acetic acid (6 ml, 4 equiv) was added dropwise at room temperature. The resulting clear solution was cooled to 5 ° C. or lower with an ice bath, and a solution of α-methylstyrene (3.12 ml, 1.2 equiv) diluted in dichloroethane (5 ml) was added dropwise. After stirring for 15 hours at room temperature the solvent was completely removed by distillation under reduced pressure. Work-up with saturated NaHCO 3 solution and dichloroethane, dried over anhydrous magnesium sulfate, and then purified by column chromatography (CH 2 Cl 2 / MeOH = 9: 1) to give the desired compound (6) (7.25 g, Yield = 85%).
1H NMR (CDCl3): δ 2.00(s, 6H), 3.28(s, 2H), 3.46(d, 1H, NH), 3.75(s, 2H), 5.74(bs, 1H, NH), 6.95(m, 3H), 7.12~7.15(m, 5H), 7.25(m, 4H), 7.86(m, 1H). MS(M+1) : 427, 309 1 H NMR (CDCl 3 ): δ 2.00 (s, 6H), 3.28 (s, 2H), 3.46 (d, 1H, NH), 3.75 (s, 2H), 5.74 (bs, 1H, NH), 6.95 ( m, 3H), 7.12-7.15 (m, 5H), 7.25 (m, 4H), 7.86 (m, 1H). MS (M + 1): 427, 309
실시예 3: 2-부틸-1-{[2'-(2-(1-메틸-1-페닐-에틸)-2H-테트라졸-5-일)-비페 닐-4-일]메틸}-1,5-디하이드로-이미다졸-4-온 (5)의 합성Example 3: 2-butyl-1-{[2 '-(2- (1-methyl-1-phenyl-ethyl) -2H-tetrazol-5-yl) -biphenyl-4-yl] methyl}- Synthesis of 1,5-dihydro-imidazol-4-one (5)
실시예 2에서 합성한 화합물 (6) (8.53 g, 20 mmol)을 디클로로에탄(80 ml)에 녹이고 트리메틸오르토발레레이트 (3.45 ml, 1.2 당량)를 첨가했다. 이 용액에 아세트산 3 방울을 떨어뜨린 후 5시간 동안 환류시켜 목적 화합물(9.85 g)을 얻었다. 이 물질을 별도의 분리 없이 다음 반응에 사용하였다.Compound (6) (8.53 g, 20 mmol) synthesized in Example 2 was dissolved in dichloroethane (80 ml) and trimethylorthovalerate (3.45 ml, 1.2 equiv) was added. 3 drops of acetic acid were added to the solution and refluxed for 5 hours to obtain the target compound (9.85 g). This material was used for the next reaction without any separation.
1H NMR (DMSO-d6): δ 0.87(t, 3H), 1.34(m, 2H), 1.58(m, 2H), 1.95(s, 6H), 2.58(t, 2H), 3.81(s, 2H), 4.73(s, 2H), 6.93(m, 2H), 7.11~7.19(m, 4H), 7.27~7.32(m, 3H), 7.48(m, 1H), 7.56(m, 1H), 7.62(m, 1H), 7.82(m, 1H). MS(M+1): 493 1 H NMR (DMSO-d 6 ): δ 0.87 (t, 3H), 1.34 (m, 2H), 1.58 (m, 2H), 1.95 (s, 6H), 2.58 (t, 2H), 3.81 (s, 2H), 4.73 (s, 2H), 6.93 (m, 2H), 7.11-7.19 (m, 4H), 7.27-7.32 (m, 3H), 7.48 (m, 1H), 7.56 (m, 1H), 7.62 (m, 1 H), 7.82 (m, 1 H). MS (M + 1): 493
실시예 4: 2-n-부틸-5-클로로-3-{[2'-(2-(1-메틸-1-페닐-에틸)-2H-테트라졸-5-일)-비페닐-4-일]메틸}-3H-이미다졸-4-카브알데하이드 (4)의 합성Example 4: 2-n-butyl-5-chloro-3-{[2 '-(2- (1-methyl-1-phenyl-ethyl) -2H-tetrazol-5-yl) -biphenyl-4 Synthesis of -yl] methyl} -3H-imidazole-4-carbaldehyde (4)
실시예 3에서 합성된 화합물 (5) (9.85 g, 20 mmol)의 디클로로에탄 용액에 상온에서 활성화 된 분자체(molecular sieve) 4Å(3 g)을 넣는다. POCl3 (9.3 ml, 5 당량)와 N,N-디메틸포름아미드 (7.74 ml, 5 당량)를 실온에서 가하고 5시간 동안 환류시켜 갈색 용액을 얻는다. 얻어진 용액을 셀라이트(celite)를 이용하여 여과하고, 디클로로에탄으로 세척한 다음 모은 용액을 아이스 배스로 냉각시킨 후, NaHCO3 용액을 이용하여 pH=7에 맞추었다. 유기층을 분리하고 무수 황산마그네슘으로 건조, 여과 및 감압증류하여 목적 화합물(4)을 (7.76 g, 수율= 72 %) 얻었다.Into a dichloroethane solution of Compound (5) (9.85 g, 20 mmol) synthesized in Example 3 was added 4 μg (3 g) of a molecular sieve activated at room temperature. POCl 3 (9.3 ml, 5 equiv) and N, N-dimethylformamide (7.74 ml, 5 equiv) were added at room temperature and refluxed for 5 hours to give a brown solution. The resulting solution was filtered using celite, washed with dichloroethane and the combined solutions were cooled with an ice bath and adjusted to pH = 7 with NaHCO 3 solution. The organic layer was separated, dried over anhydrous magnesium sulfate, filtered and distilled under reduced pressure to obtain the title compound (4) (7.76 g, yield = 72%).
1H NMR (CDCl3): δ 0.89(t, 3H), 1.34(m, 2H), 1.67(m, 2H), 1.98(s, 6H), 2.61(t, 2H), 5.53(s, 2H), 6.93(m, 4H), 7.12(m, 2H), 7.25(m, 3H), 7.37(m, 1H), 7.46~7.50(m, 2H), 7.90(m, 1H), 9.75(s, 1H). MS(M+1): 540 1 H NMR (CDCl 3 ): δ 0.89 (t, 3H), 1.34 (m, 2H), 1.67 (m, 2H), 1.98 (s, 6H), 2.61 (t, 2H), 5.53 (s, 2H) , 6.93 (m, 4H), 7.12 (m, 2H), 7.25 (m, 3H), 7.37 (m, 1H), 7.46 ~ 7.50 (m, 2H), 7.90 (m, 1H), 9.75 (s, 1H ). MS (M + 1): 540
실시예 5: 2-n-부틸-4-클로로-5-하이드록시메틸-1-{[2'-(2-(1-메틸-1-페닐-에틸)-2H-테트라졸-5-일)-1,1-비페닐-4-일]메틸}-1H-이미다졸 (3)의 합성Example 5: 2-n-butyl-4-chloro-5-hydroxymethyl-1-{[2 '-(2- (1-methyl-1-phenyl-ethyl) -2H-tetrazol-5-yl Synthesis of) -1,1-biphenyl-4-yl] methyl} -1H-imidazole (3)
실시예 4에서 합성한 화합물 (4) (53.91 g, 0.1 mole)과 이소프로판올(530 ml)을 플라스크에 넣고 실온에서 수소화 붕소 나트륨 (3.78 g, 1 당량)를 조금씩 첨가하였다. 2시간 정도 실온에서 교반한 후 반응이 다 진행 되었으면 물을 약간 가하고 약 0℃로 냉각하면서 시딩(seeding) 하였다. 같은 온도에서 18시간 교반한 후 생성된 고체를 여과, 세척 및 건조하여 목적 화합물(50.5 g, 수율 = 93%)을 얻었다.Compound (4) (53.91 g, 0.1 mole) and isopropanol (530 ml) synthesized in Example 4 were placed in a flask, and sodium borohydride (3.78 g, 1 equiv) was added little by little at room temperature. After stirring for 2 hours at room temperature, if the reaction was completed, a little water was added and seeded while cooling to about 0 ℃. After stirring for 18 hours at the same temperature, the resulting solid was filtered, washed and dried to obtain the target compound (50.5 g, yield = 93%).
1H NMR (CDCl3): δ 0.88(t, 3H), 1.35(m, 2H), 1.68(m, 2H), 2.00(s, 6H), 2.56(t, 2H), 4.49(s, 2H), 5.17(s, 2H), 6.86(d, 2H), 6.95(m, 2H), 7.13(m, 2H), 7.25(m, 3H), 7.38(d, 1H), 7.48(m, 2H), 7.90(d, 1H). MS(M+1): 542 1 H NMR (CDCl 3 ): δ 0.88 (t, 3H), 1.35 (m, 2H), 1.68 (m, 2H), 2.00 (s, 6H), 2.56 (t, 2H), 4.49 (s, 2H) , 5.17 (s, 2H), 6.86 (d, 2H), 6.95 (m, 2H), 7.13 (m, 2H), 7.25 (m, 3H), 7.38 (d, 1H), 7.48 (m, 2H), 7.90 (d, 1 H). MS (M + 1): 542
실시예 6: 2-n-부틸-4-클로로-5-하이드록시메틸-1-[(2'-(2H-테트라졸-5-일)-1,1-비페닐-4-일)메틸]-1H-이미다졸 (2)의 제조Example 6: 2-n-butyl-4-chloro-5-hydroxymethyl-1-[(2 '-(2H-tetrazol-5-yl) -1,1-biphenyl-4-yl) methyl ] -1H-imidazole (2) Preparation
물 100 ml와 66% 황산 (30 g, 0.2 mole)을 섞고 아세톤 400 ml를 넣은 용액에 실시예 5에서 얻은 화합물 (3), (54.11 g. 0.1 mole)을 첨가하였다. 6시간 동안 실온에서 교반시킨 후, 8.7 % KOH 용액을 가해 pH를 13 정도에 맞추었다. 이 용액을 감압 하에 증류하여 아세톤을 제거하고 디클로로메탄 200 ml를 가하여 1시간 동안 교반한 후 층분리하여 유기층을 제거하였다. 다시 물층에 디클로로메탄 200 ml를 가하여 1시간 동안 교반한 후 층분리하여 유기층을 제거하였다. 얻어진 물층에 66% 황산을 서서히 적가하여 용액의 pH를 3.4로 맞추고, 감압 하에 유기용매를 증류하자 흰색 고체가 석출되었다. 얻어진 고체를 여과하고 물로 세척 및 건조하여 목적 화합물(38.7.g, 수율 = 91 %)을 얻었다.100 ml of water and 66% sulfuric acid (30 g, 0.2 mole) were mixed and 400 ml of acetone was added to the solution (3) and (54.11 g. 0.1 mole) obtained in Example 5. After stirring for 6 hours at room temperature, 8.7% KOH solution was added to adjust the pH to about 13. The solution was distilled off under reduced pressure to remove acetone, 200 ml of dichloromethane was added and stirred for 1 hour, followed by layer separation to remove the organic layer. 200 ml of dichloromethane was further added to the water layer, stirred for 1 hour, and the layers were separated to remove the organic layer. 66% sulfuric acid was slowly added dropwise to the obtained water layer to adjust the pH of the solution to 3.4, and the organic solvent was distilled off under reduced pressure to precipitate a white solid. The obtained solid was filtered, washed with water and dried to give the target compound (38.7.g, yield = 91%).
1H NMR (DMSO-d6): δ 0.79(t, 3H), 1.23(m, 2H), 1.45(m, 2H), 2.45 (t, 2H), 4.32 (s, 2H), 5.24(s, 2H), 7.02(d, 2H), 7.09(d, 2H), 7.52(d, 1H), 7.58(t, 1H), 7.66(m, 2H). MS(M+1): 423 1 H NMR (DMSO-d 6 ): δ 0.79 (t, 3H), 1.23 (m, 2H), 1.45 (m, 2H), 2.45 (t, 2H), 4.32 (s, 2H), 5.24 (s, 2H), 7.02 (d, 2H), 7.09 (d, 2H), 7.52 (d, 1H), 7.58 (t, 1H), 7.66 (m, 2H). MS (M + 1): 423
제조예 2: 2-n-부틸-4-클로로-5-하이드록시메틸-1-[(2'(1H-테트라졸-5-일)-1,1-비페닐-4-일)메틸]-1H-이미다졸 포타슘 염 (1)의 제조Preparation Example 2 2-n-butyl-4-chloro-5-hydroxymethyl-1-[(2 '(1H-tetrazol-5-yl) -1,1-biphenyl-4-yl) methyl] Preparation of -1H-imidazole potassium salt (1)
2-n-부틸-4-클로로-5-하이드록시메틸-1-[(2'-(2H-테트라졸-5-일)-1,1-비페닐-4-일)메틸]-1H-이미다졸(12.7 g, 30 mmol)을 이소프로판올 (30 ㎖)에 넣은 후 40℃로 가열하였다. 그 후, 3.5 % KOH, 이소프로판올 용액으로 반응물의 pH를 11로 맞추고 두시간 동안 교반하였다. 이 반응물에 사이클로헥산을 넣어 실온에서 30분간 교반한 후 생성물을 감압 하에서 여과하였다. 그 후, 생성물을 사이클로헥산/이소프로판올 용액으로 세척한 후 건조시켜 원하는 생성물(12.3 g, 85 %)을 수득하였다. 2-n-butyl-4-chloro-5-hydroxymethyl-1-[(2 '-(2H-tetrazol-5-yl) -1,1-biphenyl-4-yl) methyl] -1H- Imidazole (12.7 g, 30 mmol) was added to isopropanol (30 mL) and then heated to 40 ° C. The pH of the reaction was then adjusted to 11 with 3.5% KOH, isopropanol solution and stirred for 2 hours. Cyclohexane was added to the reaction and stirred at room temperature for 30 minutes, and then the product was filtered under reduced pressure. The product was then washed with cyclohexane / isopropanol solution and dried to afford the desired product (12.3 g, 85%).
1H NMR (D2O, 500 MHz): δ 0.58(t, 3H), 0.98(m, 2H), 1.27(m, 2H), 2.29 (t, 2H), 4.27(s, 2H), 4.98(s, 2H), 6.61(d, 2H), 6.77(d, 2H), 7.00(d, 1H), 7.22(m, 1H), 7.33(m, 1H), 7.56(d, 1H). MS(M+1): 423 1 H NMR (D 2 O , 500 MHz): δ 0.58 (t, 3H), 0.98 (m, 2H), 1.27 (m, 2H), 2.29 (t, 2H), 4.27 (s, 2H), 4.98 ( s, 2H), 6.61 (d, 2H), 6.77 (d, 2H), 7.00 (d, 1H), 7.22 (m, 1H), 7.33 (m, 1H), 7.56 (d, 1H). MS (M + 1): 423
본 발명은 로사탄 유도체의 핵심 중간체로 사용되는 벤질이미다졸 유도체 및 상기 유도체를 활용한 로사탄의 신규한 제조방법을 제공하는 효과가 있다.The present invention has the effect of providing a benzylimidazole derivative used as a core intermediate of the losartan derivative and a novel method for preparing losartan using the derivative.
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