KR20070087852A - Antistatic hard coating composition, coating method thereof and antistatic transparent panel using same - Google Patents

Abstract

An antistatic hard coating composition for use on a transparent plastic substrate is provided.

The antistatic hard coating composition includes a mixed solvent of (a) a conductive filler, (b) an organic binder, (c) a photopolymerization initiator, and (d) a low boiling organic solvent and a high boiling organic solvent.

Description

Antistatic hard coating composition, coating method thereof and antistatic transparent panel using the same {ANTISTATIC HARD COATING COMPOSITION, ITS COATING METHOD AND ANTISTATIC TRANSPARENT PANEL USING IT}

The present invention relates to an antistatic hard coating composition, a coating method thereof and an antistatic transparent panel using the same. More specifically, the present invention has excellent antistatic properties, surface resistance properties, transparency, abrasion resistance, scratch resistance, etc., in the long term there is little change in these properties, antistatic hard coating does not generate various contaminants It relates to a composition, a coating method thereof and an antistatic transparent panel using the same.

In general, functional hard coatings for protecting them are widely applied in the fields of various plastic products such as building materials, automobile exterior parts, paper, wood, furniture, soundproof walls, optical materials, cosmetic containers, and various display devices. In particular, with the recent development of various display devices such as LCD, PDP or projection TV, the demand for functional hard coating, for example, antistatic hard coating, to protect the surface of the display device and to prevent scratches, etc. Is increasing significantly.

In addition, in recent years, as semiconductor devices have been miniaturized and highly integrated, it has become necessary to form fine patterns of, for example, 45 nm through photolithography processes and the like. Due to such ultrafineness, the fine particles have a great influence on the yield of the semiconductor device manufacturing process. For example, by applying an antistatic hard coating to a clean room in which the semiconductor device manufacturing process is performed, the antistatic function is provided. As a result, it has been known that the number of fine particles remaining in a clean room can be reduced.

Accordingly, the need for an antistatic hard coating composition suitable for use in various display devices or clean rooms and hard coating using the same is continuously increasing.

However, the hard coating composition used in the prior art does not have an antistatic function, or even when there is an antistatic function, the component that exhibits an antistatic function does not combine with the matrix and is simply added, so that the antistatic function does not last for a long time. Most of them were. In addition, in some cases, there is a problem in that the transparency is reduced, or dust or outgassed organic matters of metals or inorganics are released as pollutants.

On the other hand, in the following will be outlined the conventional hard coating composition and its problems.

First, Japanese Patent Laid-Open No. 58-91777 discloses a conductive transparent coating liquid in which a conductive fine powder made of tin oxide containing antimony is mixed with a synthetic resin. However, such a transparent coating liquid contains a metal or an inorganic material. For example, after a long time after applying the same to a clean room, the metal or inorganic material is released and remains as a pollutant, thereby affecting the semiconductor process yield.

In addition, JP-A-5-214045 discloses a polyfunctional monomer having three or more methacryloyl groups, polyethylene glycol methyl methacrylate, polyethylene glycol dimethacrylate, polyethylene trimethacrylate, and polyethylene glycol trimethacrylate. Coating liquid compositions containing acrylic monomers such as these have been disclosed. However, when applying such a coating liquid composition, the surface resistance reaches about 10 ¹² Ω / □, it is difficult to apply to various display devices or clean rooms.

Next, Japanese Patent Laid-Open No. 5-186534 discloses a phosphate ester having an acryloyl group or a methacryloyl group, an organic compound having at least one ultraviolet curable functional group and at least one tertiary amine group in the molecule, and at least 2 in the molecule. An antistatic hard coating composition comprising an organic compound having two active ethylene groups has been disclosed. However, such a hard coating composition has a problem that the antistatic function cannot be sustained for a long time.

In addition, Japanese Patent Application Laid-Open No. 5-109132 discloses a predetermined antistatic hard coating applied to an optical disc, etc., which imparts an antistatic function using a lithium (Li) salt of a predetermined compound. There is a risk of release, and there is a fear that the durability is lowered by the salt. Moreover, such a hard coating has a surface resistance of about 10 ¹³ Ω / □, which is also difficult to apply to various display devices or clean rooms.

On the other hand, in consideration of the above-described problems of the prior art, there has been developed an antistatic hard coating composition to give an antistatic function using a metal oxide such as ITO or ATO. However, even when such a composition is applied, after a long time, a crack or the like occurs on the surface of the hard coating to release inorganic matters. In particular, when such a composition is applied to a clean room or the like, the released inorganic material may be adsorbed onto the surface of a semiconductor wafer or LCD liquid crystal cell, which is in progress, to affect the process yield or reduce workability.

In addition, a method of imparting antistatic function by adding a hydrophilic monomer using a quaternary ammonium salt in order to prevent the release of such inorganic materials has also been considered, but this also decreases the antistatic function after a long time after the application of hard coating Or high surface resistance. Moreover, since the hydrophilic monomers and the like do not react with the binder component or the like of the hard coating composition and are simply added, the outgassed organic substance is released. Such organic substances may adversely affect process yield or reliability by, for example, increasing the degree of contamination in the clean room and contaminating the reaction organic materials used in semiconductor manufacturing processes and the like in the clean room.

Japanese Patent Laid-Open No. 2002-60736 discloses an antistatic hard coating composition comprising a conductive polymer such as a polythiophene polymer, a water-soluble compound having an amide bond or a hydroxyl group in the molecule, and a self-emulsifying polyester resin water dispersion. There is a bar. However, this is due to the use of the self-emulsifying polyester resin water dispersion, the viscosity of the solution is high, the thickness of the coating surface is uneven, the reaction temperature is high by using the polyester resin, the characteristics of the hard coating depending on the drying time or conditions There is a problem in the hard coating forming process that varies.

Accordingly, the present invention has excellent antistatic properties, surface resistance properties, transparency, abrasion resistance, scratch resistance, and the like, there are few changes in these properties in the long term, and do not generate various contaminants, and thus display devices or clean rooms. It is to provide an antistatic hard coating composition suitable for application to the back.

In addition, another object of the present invention is to provide a coating method for coating the antistatic hard coating composition preferably on a transparent plastic substrate.

Still another object of the present invention is to provide an antistatic transparent panel having an outgas discharge amount of 50 ppm or less by applying the antistatic hard coating composition to the transparent plastic substrate.

Technical problems to be achieved by the present invention are not limited to the technical problems mentioned above, and other technical problems not mentioned will be clearly understood by those skilled in the art from the following description.

MEANS TO SOLVE THE PROBLEM In order to solve the said subject, this invention contains the mixed solvent of (a) conductive filler, (b) organic binder, (c) photoinitiator, (d) low boiling point organic solvent, and high boiling point organic solvent. It provides an antistatic hard coating composition.

The present invention also comprises the steps of applying the antistatic hard coating composition to a transparent plastic substrate; Drying the transparent plastic substrate; And it provides a coating method of the antistatic hard coating composition comprising the step of irradiating the ultraviolet light to the transparent plastic substrate.

In addition, the present invention provides an antistatic transparent panel manufactured by the coating method of the antistatic hard coating composition.

Other specific details of the embodiments of the present invention are included in the following detailed description.

Hereinafter, specific embodiments of the present invention will be described in detail to enable those skilled in the art to clearly appreciate. However, this is presented as an example of the present invention, whereby the present invention is not limited and the present invention is defined only by the scope of the claims to be described later.

The present invention basically provides an antistatic hard coating composition comprising (a) a conductive filler, (b) an organic binder, (c) a photopolymerization initiator, and (d) a mixed solvent of a low boiling point organic solvent and a high boiling point organic solvent. to provide.

According to the test results of the present inventors, the application of such an antistatic hard coating composition has excellent antistatic properties, surface resistance properties, transparency, abrasion resistance, scratch resistance, and the like, and each of these properties is uniform in overall, and various display devices Or it has been found that an antistatic hard coating suitable for a clean room or the like can be obtained.

In addition, the antistatic hard coating composition may include a conductive filler to make the hard coating have an antistatic function, and the conductive filler may be combined with a binder or the like in the hard coating. Therefore, if the antistatic hard coating composition comprising the same is applied, there is almost no deterioration of the antistatic function even after a long time, and there is little fear that inorganic or metal may be released or organic substances may be released in the form of outgas.

Furthermore, the antistatic hard coating composition may include a predetermined acrylic monomer as a binder and use a mixture of a low boiling point organic solvent and a high boiling point organic solvent to increase a reaction temperature at the time of forming a hard coat, or to dry or to form a condition. As a result, problems such as changes in the properties of the hard coating may be minimized, and various characteristics such as thickness or surface resistance of the hard coating may be uniformized as a whole.

Such an antistatic hard coating composition, first, (a) comprises a conductive filler. This (a) conductive filler is added to give an antistatic function to the hard coating formed using the antistatic hard coating composition.

In the present invention, (a) any conductive material can be used as long as it is a conductive material except a metal component. Preferably, a polymer such as polyaniline, polypyrrole, or polythiophene is used as the conductive filler, and more preferably. Preferably, a polythiophene polymer can be used.

In the case where the hard coating is applied to, for example, a transparent panel for partitioning a clean room included in a manufacturing line of a semiconductor device or a display device or the like, in order to improve the yield of each manufacturing process performed in the clean room, It is necessary to prevent metals, inorganic substances, organic substances in the form of outgas, and the like from being released as impurities. Thus, in the antistatic hard coating composition, unlike ITO or ATO, including a conductive filler that is combined with a binder and the like in the hard coating without containing a metal component, the antistatic function of the hard coating is deteriorated with time or Outgassing of organic matters is minimized as impurities.

In addition, it is stably present in an aqueous solution, and can exhibit stable electrical conductivity under acidity.

In the present invention, a polymer solution having a solid content concentration of 1.3-1.5% by weight in which the conductive filler is previously dispersed in an organic solvent is used for ease of dispersion. Do not exceed 0.01-15% by weight of the conductive filler.

On the other hand, the antistatic hard coating composition also includes (b) an organic binder. At this time, the (b) organic binder may contain at least one kind of a bifunctional or more than one acrylic monomer. Such an organic binder (b) is added to catalyze the photopolymerization initiator to break the double bond of the acrylic monomer contained therein so that a crosslinking reaction can occur, so that a hardened hard coating can be formed.

By the way, it is preferable that such (b) organic binder contains 2 or more types of bifunctional or more than one acrylic monomer, and it is more preferable that it contains at least 1 sort (s) of bifunctional acrylic monomers and at least 1 sort (s) of tetrafunctional or more acrylic monomers. . For example, the use of only tetrafunctional or more than one acrylic monomer can obtain a fast curing speed and high hardness characteristics of the hard coating, but has a disadvantage in that the impact resistance of the hard coating is lowered and peeling is easy. On the other hand, when only bifunctional acrylic monomer is used, the impact resistance of the hard coating is improved and peeling is not easy, while the hardening speed of the hard coating is slow and the hardness characteristics are deteriorated. The (b) organic binder and the bifunctional acrylic monomer and the bifunctional acrylic monomer may be contained together, thereby optimizing various properties such as impact resistance, peelability, hardness characteristics and curing characteristics of the hard coating. This action is due to the coexistence of high-density crosslinks and low-density crosslinks after the hard coat is formed so that the hard coat can have durability and flexibility at the same time.

In addition, as said bifunctional acrylic monomer, bisphenol A-ethylene glycol diacrylate can be used, for example, In addition, the arbitrary bifunctional acrylic monomer can be used without a restriction | limiting. Moreover, as said tetrafunctional or more than trifunctional acrylic monomer, dipentaerythritol hexaacrylate can be used, for example, and other arbitrary tetrafunctional acrylic monomer can be used without a restriction | limiting.

The antistatic hard coating composition also includes (c) a photopolymerization initiator. The photopolymerization initiator (c) receives ultraviolet rays to generate free radicals, and is added to cause a crosslinking reaction by breaking the double bond of the acrylic monomer included in the organic binder (b) by the action of the free radicals.

As the photopolymerization initiator (c), any conventionally known photopolymerization initiator may be used without limitation, and for example, a benzophenone-based compound such as 1-hydroxy cyclohexylphenyl ketone may be used.

In addition, the antistatic hard coating composition includes an organic solvent for dissolving each component described above. In particular, the antistatic hard coating composition is used by mixing (d) a low boiling point organic solvent and a high boiling point organic solvent. Here, the criterion for distinguishing between the low boiling point organic solvent and the boiling point organic solvent is 100 ° C. which is the boiling point of water, as will be apparent to those skilled in the art. That is, an organic solvent having a boiling point of 100 ° C. or less may be classified into a low boiling organic solvent, and an organic solvent having a boiling point of more than that may be classified into a high boiling organic solvent.

On the other hand, the reason for using the mixed solvent of the (d) low boiling point organic solvent and high boiling point organic solvent is as follows.

If only low-boiling organic solvent is used, the flowability during hard coating formation is good and the drying speed is fast, so there is an advantage in the hard coating formation process.But the phase separation of the binder occurs due to the rapid volatilization of the organic solvent, so that between the start and end surfaces of the hard coating It causes a difference in physical properties. On the contrary, when only the high boiling point solvent is used, the flowability is low, the drying speed is slow, the volatilization of the organic solvent is low, and the viscosity is high, thereby ensuring uniform physical properties of the hard coating. There is a disadvantage that the surface resistance characteristics are uneven due to compatibility with the filler. Therefore, by using the organic solvent containing (d) a mixed solvent of a low boiling point organic solvent and a high boiling point organic solvent, it is possible to uniformize various characteristics of the hard coating and to improve the difficulty in the hard coating forming process.

Meanwhile, as the low boiling point organic solvent and the high boiling point organic solvent, an organic solvent that does not affect the dispersion of the conductive filler in consideration of the pH value, the charge value, etc. together with the boiling point of the organic solvent can be obviously selected and used by those skilled in the art.

For example, as the low boiling point organic solvent, a mixed solvent of methanol and isopropanol or a mixed solvent of ethanol and ethyl acetate may be used. In addition, any organic solvent that satisfies the conditions described above in boiling point may be used.

In addition, as the high boiling point organic solvent, for example, methyl cell solution or ethyl cell solution may be used, and any other organic solvent satisfying the above-described conditions may be used.

On the other hand, the antistatic hard coating composition preferably further comprises (e) a leveling agent. When the (e) leveling agent is added, the flowability at the time of forming the hard coating is improved, and the overall characteristics of the hard coating such as thickness, surface resistance or wear resistance are more uniform. In addition, it is possible to overcome the different coating properties according to the substrate so that the same properties can be expressed regardless of the transparent plastic substrate to which the hard coating is applied.

As the (e) leveling agent, any material conventionally used as a leveling agent in a hard coating composition may be used. For example, a fluorine compound or a nonionic polyacryl copolymer can be used.

In addition, the antistatic hard coating composition preferably further comprises a (f) light stabilizer. Such a light stabilizer (f) stabilizes the respective components included in the composition to minimize the decomposition of the respective components by the ultraviolet rays irradiated at the time of forming the hard coating.

As such a (f) light stabilizer, a light stabilizer suitable for this according to the type of the (c) photopolymerization initiator can be obviously used by those skilled in the art. For example, when the (c) photopolymerization initiator is a benzophenone compound such as 1-hydroxy cyclohexylphenyl ketone, the (f) light stabilizer may be a brand name Disperbyk-106 (manufactured by BYK; main component-acidic group). Branched polymer salt) and the like, and in addition, any of the conventionally used light stabilizers may be selected according to the type of photopolymerization initiator.

However, depending on the photopolymerization initiator, the photopolymerization agent may exhibit both a function as a light stabilizer and a light stabilizer. However, when such a photopolymerization initiator is used, there is no difference in function depending on the addition of the light stabilizer. Light stabilizers do not need to be added.

On the other hand, the antistatic hard coating composition may further comprise a (g) surfactant. When (g) the antistatic hard coating composition in which the above-mentioned components are mixed in the state of not containing the surfactant is coated on the transparent plastic substrate, the affinity between the transparent plastic substrate having hydrophobicity and the composition having hydrophilicity is low and leveling is performed. This is difficult and it is difficult to uniformly secure properties such as surface resistance or hardness of the hard coating. This (g) by adding a surfactant to lower the surface tension during coating of the composition, it is possible to make the characteristics of the hard coating more uniform.

It is preferable to use cationic surfactant as said (g) surfactant, and arbitrary cationic surfactant can be used without a restriction | limiting.

On the other hand, the antistatic hard coating composition, (a) 0.01-15% by weight of the conductive filler, (b) 10-80% by weight of the organic binder, (c) 0.3-10% by weight of the photopolymerization initiator, (d) It is preferred to include 10-70% by weight of mixed organic solvents. In addition, (a) 0.03-10% by weight of the conductive filler, (b) 5-10% by weight of the bifunctional acrylic monomer and 10-40% by weight of the tetrafunctional or higher functional monomer, and (c) 0.5-5 of the photopolymerization initiator. More preferably 40% to 70% by weight of (d) the organic solvent.

In addition, the antistatic hard coating composition may further include (e) 0.01-5% by weight of the leveling agent, and (f) 0.01-5% by weight of the light stabilizer, based on the weight of the total composition, preferably Preferably, (e) may further comprise 2-5% by weight of the leveling agent, and (f) 0.5-5% by weight of the light stabilizer.

Since the antistatic hard coating composition includes each component in such a content ratio, various properties such as antistatic properties, surface resistance, hardness, and abrasion resistance of the hard coating are optimized, and these properties are uniform, while the organic material is in an outgas form. Can be minimized. In addition, hardly any unreacted photopolymerization initiator remains, and most of the photopolymerization initiators react with the acrylic monomer of the binder to optimize the electrical properties and the wear resistance of the hard coating.

The antistatic hard coating composition described above may be prepared by mixing each component in a predetermined content ratio as described above.

The present invention also comprises the steps of applying the above-mentioned antistatic hard coating composition to a transparent plastic substrate; Drying the transparent plastic substrate; And it provides a coating method of the antistatic hard coating composition comprising the step of irradiating the ultraviolet light to the transparent plastic substrate.

This coating method can be applied to any transparent plastic substrate made of polycarbonate resin, polymethmethylacrylate resin, polyvinylchloride resin or ABS resin.

On the other hand, in the coating method, in the applying step of the composition, the antistatic hard coating composition may be applied to a transparent plastic substrate by a method such as flow coating, dip coating or roller coating, and in the case of using the flow coating method , By spraying the antistatic hard coating composition through a 10mm nozzle under a temperature of 20-30 ℃ and 10-40% humidity can be applied.

In addition, in the drying step, the transparent plastic substrate can be dried for 5-10 minutes at a temperature of 50-80 ℃ using a hot air dryer.

And, in the ultraviolet irradiation step, the amount of light using a UV lamp or the ^like, 200-600mJ / cm ^3, preferably 200-500mJ / cm ³ may be irradiated with ultraviolet rays for about 5 minutes.

In addition, after the ultraviolet irradiation step, optionally, the transparent plastic substrate is precipitated in an alcohol solution for about 10 minutes, and then unreacted material (eg, unreacted oligomer) from the transparent plastic substrate using ultrasonic waves. Remove or extract residual solvents (e.g., high boiling point organic solvents), various additives and foreign matters, and use a dryer equipped with a vacuum facility, etc., under a pressure of 100-700 torr and a temperature of about 60 ° C. The substrate may be further dried, for example.

Through the above-described coating method, (c) the photopolymerization initiator receives ultraviolet rays to generate free radicals, and these ultraviolet radicals break the double bonds contained in each functional group of the acrylic monomer to cause a crosslinking reaction. Accordingly, the antistatic hard coating composition is cured on the surface of the transparent plastic substrate to form a hard coating.

On the other hand, the present invention also provides an antistatic transparent panel prepared by the coating method of the antistatic hard coating composition described above.

The antistatic transparent panel may be a transparent panel used in any industrial field, including various display devices such as LCD panels or PDP panels, transparent panels for partitions of clean rooms used in semiconductor device manufacturing processes, and the like.

Hereinafter, the configuration and operation of the present invention through the preferred embodiment of the present invention will be described in more detail. However, this is presented as a preferred example of the present invention and in no sense can be construed as limiting the present invention.

Example  One

Each component described below was mixed in the content ratio shown in Table 1 below to prepare an antistatic hard coating composition.

* Photoinitiator: Irg # 500 (mixture of 1-hydroxy cyclohexylphenyl ketone; Shiva kaigi company)

* 4-functional or higher acrylic monomer: DPHA (dipentaerythritol hexaacrylate (6-functional))

* Bifunctional acrylic monomer: R-551 (bisphenol A-ethylene glycol diacrylate (bifunctional); Japanese Chemical)

* Leveling agent: BYK-380 (BYK), a nonionic polyacrylic copolymer

* Light stabilizer: Disperbyk-106 (BYK)

* Conductive filler: Baytron PH (poly (3,4-ethylenedioxythiophene) -poly (styrenesulfonate); Bayer)

* Low boiling organic solvent: mixed solvent of methanol / isopropanol 30/70

* High boiling organic solvent: Methyl Cellulsolve

The mixing method of each component and the specific manufacturing method of the antistatic hard coating composition through this were as follows.

First, the photopolymerization initiator was completely dissolved in the mixed solvent of the low boiling point organic solvent and the high boiling point organic solvent, and then a bifunctional acrylic monomer and a tetrafunctional or higher acrylic monomer were added and stirred for 1 hour. Subsequently, the leveling agent was added dropwise little by little, and then a light stabilizer was added in the same manner. Finally, the conductive filler was added and then stirred for 30 minutes to prepare an antistatic hard coating composition.

According to the flow coating method, the above antistatic hard coating composition was applied by spraying onto the polymethmethylacrylate transparent plastic substrate through a 10 mm nozzle in the vertical direction. At this time, the temperature was maintained at 25 ° C. and humidity 30%. After drying for 5 minutes at the temperature of 60 degreeC using the transparent plastic base material apply | coated with the composition as a hot air dryer, the ultraviolet-ray of 300mJ / cm <^3> light quantity was irradiated for 5 minutes with the UV lamp. Thereafter, the transparent plastic substrate was precipitated in an ethanol solution for 10 minutes, and then unreacted oligomers, foreign substances, and various additives were removed using ultrasonic waves, and the residual high boiling point organic solvent was extracted. Subsequently, the vacuum pressure was fixed at 300 Torr using the dryer equipped with a vacuum installation, and further drying at 60 degreeC was obtained, and the antistatic transparent panel was obtained.

TABLE 1

Composition Example 1 Example 2 Example 3 Example 4 Photopolymerization initiator Irg # 500 (1.5%) Irg # 500 (1.5%) Irg # 500 (2.0%) Irg # 500 (2.5%) 4-functional or higher acrylic monomer DPHA (10%) DPHA (20%) DPHA (20%) DPHA (20%) Bifunctional acrylic monomer R-551 (15.5%) R-551 (10%) R-551 (20%) R-551 (20%) Leveling agent BYK-380 (3.5%) BYK-380 (3.0%) BYK-380 (4.0%) BYK-380 (4.0%) Light stabilizer Disperbyk-106 (0.5%) Disperbyk-106 (1.0%) Disperbyk-106 (1.5%) Disperbyk-106 (1.5%) Conductive filler Baytron PH (5%) Baytron PH (10%) Baytron PH (20%) Baytron PH (20%) Low boiling organic solvent Methanol / Isopropanol (35%) Methanol / Isopropanol (20%) Ethanol / Ethyl Acetate (10%) Ethanol / Ethyl Acetate (25%) High boiling organic solvent Methyl Cellulsolve (29%) Methyl Cellulsolve (34.5%) Ethyl cellulsolve (22.5%) Ethylcellosolve (7%)

Example  2

An antistatic hard coating composition and an antistatic transparent panel were prepared in the same manner as in Example 1 except that the components and the content ratios shown in Table 1 were applied.

Example  3

An antistatic hard coating composition and an antistatic transparent panel were prepared in the same manner as in Example 1 except that the components and the content ratios shown in Table 1 were applied.

Example  4

An antistatic hard coating composition and an antistatic transparent panel were prepared in the same manner as in Example 1 except that the components and the content ratios shown in Table 1 were applied.

Comparative example  One

An antistatic hard coating composition and an antistatic transparent panel were prepared in the same manner as in Example 1 except for applying the components and the content ratios shown in Table 2 below.

TABLE 2

Composition Comparative Example 1 Comparative Example 2 Comparative Example 3 Comparative Example 4 Photopolymerization initiator Irg # 500 (1.5%) Irg # 500 (1.5%) Irg # 500 (2.5%) Irg # 500 (2.5%) 4-functional or higher acrylic monomer DPHA (25.5%) - DPHA (27%) DPHA (27%) Bifunctional acrylic monomer - R-551 (25%) R-551 (13%) R-551 (13%) Leveling agent BYK-380 (3.5%) BYK-380 (3.5%) BYK-380 (3.5%) BYK-380 (3.5%) Light stabilizer Disperbyk-106 (0.5%) Disperbyk-106 (1.0%) Disperbyk-106 (1.0%) Disperbyk-106 (1.0%) Conductive filler Baytron PH (5%) Baytron PH (35%) Baytron PH (20%) Baytron PH (20%) Low boiling organic solvent Methanol / Isopropanol (27%) Methanol / Isopropanol (20%) - Ethanol / Ethyl Acetate (33%) High boiling organic solvent Methyl Cellulsolve (27%) Methyl Cellulsolve (14%) Ethyl cellulsolve (33%) -

Comparative example  2

An antistatic hard coating composition and an antistatic transparent panel were prepared in the same manner as in Example 1 except that the components and the content ratios shown in Table 2 were applied.

Comparative example  3

An antistatic hard coating composition and an antistatic transparent panel were prepared in the same manner as in Example 1 except that the components and the content ratios shown in Table 2 were applied.

Comparative example  4

An antistatic hard coating composition and an antistatic transparent panel were prepared in the same manner as in Example 1 except that the components and the content ratios shown in Table 2 were applied.

Comparative example  5

An antistatic hard coating composition and an antistatic transparent panel were prepared in the same constituents, content ratios, and methods as in Example 1, except that ATO was used instead of the conductive filler.

Test Example

The physical properties of the hard coating on the surface of the antistatic transparent panel prepared in Examples 1 to 4 and Comparative Examples 1 to 5, respectively, were evaluated by the following method. These physical property evaluation results are shown in Table 3 below.

[Property evaluation method]

* Surface resistance: Ultrahigh resitance machine

* Pencil Hardness: ASTM D3502 (Pencil Hardness Tester)

* Scratch: Steel Wool # 0000

* Chemical resistance: Measurement of surface state change after immersing the sample in each solution of alcohols (ethanol, methanol, propanol), ketones (acetone), acidic (10% HCl aqueous solution), basic (10% NaOH aqueous solution) for 1 hour

* Outgas: GC / MS, HSS-Sampler, 280 ℃ 10min

* Transmittance: UV-vis Spectrum (DARSA PRO-5000 SYSTEM)

Ion extraction: EDS

TABLE 3

Composition Surface resistance Pencil hardness scratch Chemical resistance Outgas Transmittance Ion extraction Example 1 10 ^{7Ω / □} 5H ◎ ◎ 20 ppm 94% 0.3 Example 2 10 ^{7Ω / □} 6H ◎ ◎ 18 ppm 94% 0.1 Example 3 10 ^{6Ω / □} 5H ◎ ◎ 23 ppm 94% 0.4 Example 4 10 ^{6Ω / □} 6H ◎ △ 27 ppm 94% 0.7 Comparative Example 1 10 ^{6Ω / □} 4H × △ 105 ppm 94% 0.8 Comparative Example 2 10 ^{7Ω / □} 2H △ ◎ 50 ppm 86% 1.2 Comparative Example 3 10 ^{8Ω / □} 5H ◎ × 60 ppm 88% 2.3 Comparative Example 4 10 ^{9Ω / □} 6H △ △ 120 ppm 85% 1.5 Comparative Example 5 10 ^{6Ω / □} 5H △ ◎ 150 ppm 84% 14.0

      * Scratch evaluation: ◎ -excellent, △ -normal, × -defective

      * Chemical resistance evaluation: ◎ -excellent, △ -normal, × -defective

As is apparent from Table 3, when the antistatic hard coating composition according to the present invention is used, various properties such as antistatic properties, transparency, surface resistance, scratch resistance, chemical resistance, hardness, etc. on the surface of the transparent plastic substrate Excellent hard coating can be formed. In addition, the release of metal or inorganic materials or the like or the outgassing of organic materials in the hard coating may be minimized.

According to the present invention, it is excellent in various properties such as antistatic properties, surface resistance, transparency, chemical resistance, abrasion resistance, hardness and scratch resistance, there is little change in these characteristics in the long term, and does not generate various pollutants An anti-hard coating composition can be provided.

Accordingly, the antistatic hard coating composition may be applied as a protective filter for various display devices to further improve the function of the display device, and may be applied to a clean room used during the manufacturing process of a semiconductor device or a display device, and thus overall process yield. Can greatly improve.

Claims (11)

(a) a conductive filler, (b) an organic binder, (c) a photopolymerization initiator, (d) An antistatic hard coating composition comprising a mixed solvent of a low boiling organic solvent and a high boiling organic solvent. The antistatic hard coating composition of claim 1, wherein the conductive filler is at least one selected from the group consisting of polyaniline-based, polypyrrole-based, and polythiophene-based polymers. The antistatic hard coating composition of claim 1, wherein the organic binder comprises at least one of a bifunctional or more than one acrylic monomer. The antistatic hard coating composition of claim 1, wherein the organic binder comprises at least one kind of a bifunctional acrylic monomer and at least one kind of a tetrafunctional or higher functionality acrylic monomer. The antistatic hard coating composition of claim 1, further comprising at least one additive of (e) leveling agent, (f) light stabilizer or (g) surfactant. The method of claim 1, (a) 0.01-15% by weight of a conductive filler, (b) 5 to 80% by weight of an organic binder, (c) 0.3-10% by weight of the photopolymerization initiator, (d) An antistatic hard coating composition comprising 10-70% by weight of a mixed solvent. Applying the composition of claim 1 to a transparent plastic substrate; Drying the transparent plastic substrate; And Coating method of the antistatic hard coating composition comprising the step of irradiating the ultraviolet light to the transparent plastic substrate. 8. The method of claim 7, wherein the transparent plastic substrate is made of a polycarbonate resin, a polymethmethylacrylate resin, a polyvinyl chloride resin, or an ABS resin. The method of claim 7, wherein the applying of the composition is performed by a flow coating method at a temperature of 20-30 ° C. and a humidity of 10-40%. 8. The method of claim 7, further comprising removing unreacted material, residual solvent, and foreign matter from the transparent plastic substrate. An antistatic transparent panel manufactured by the coating method according to claim 7.