KR20060083261A - Liquid crystal display device with anti-static dummy pattern - Google Patents

Abstract

A liquid crystal display device having a dummy pattern for preventing static electricity is provided. The liquid crystal display device includes an insulating substrate, a gate wiring formed on the substrate, an antistatic dummy pattern formed on the same layer as the gate wiring, a gate insulating film formed on the gate wiring and an antistatic dummy pattern, and a gate insulating film. The data wiring formed above and the common electrode wiring formed on the same layer as the data wiring and at least partially overlapping the gate wiring are included.

Liquid crystal display, dummy pattern, common electrode wiring

Description

Liquid crystal display device having electrostatic protective dummy pattern}

1 is a layout view illustrating a thin film transistor substrate of a typical transflective liquid crystal display device.

FIG. 2 is a cross-sectional view taken along the line II-II 'of FIG. 1.

3 is a layout view illustrating a partial region of a liquid crystal display according to an exemplary embodiment of the present invention including a dummy pattern for preventing static electricity.

4 is a cross-sectional view taken along the line IV-IV 'of FIG. 3.

5 is a layout view illustrating a partial region of a liquid crystal display according to another exemplary embodiment of the present invention including a dummy pattern for preventing static electricity.

FIG. 6 is a cross-sectional view taken along the line VI-VI 'of FIG. 5.

The present invention relates to a liquid crystal display device, and more particularly, to a liquid crystal display device having a dummy pattern for preventing static electricity.

In general, liquid crystal displays inject a liquid crystal material between a color filter substrate on which a common electrode and a color filter are formed, and a thin film transistor substrate on which a thin film transistor and a pixel electrode are formed. By applying different potentials to the electrodes to form an electric field to change the arrangement of the liquid crystal molecules, thereby adjusting the light transmittance through which the device to represent the image.

The liquid crystal display is a transmissive liquid crystal display device that displays an image using a light source such as a backlight, a reflective liquid crystal display device using natural light, and a light source of the display element itself in a dark place where an indoor or external light source does not exist. The display device may be classified into a transflective liquid crystal display device which operates in a transmissive display mode and operates in a reflective display mode in which an external incident light is reflected and displayed in an outdoor high-light environment.

In the case of the reflective liquid crystal display and the transflective liquid crystal display, in order to maximize the reflection efficiency of the external light source, the reflective electrode formed on the thin film transistor substrate is embossed on the reflective electrode and intentionally diffused reflection from the direct light coming from the front. To maximize the reflection efficiency.

As described above, unlike the conventional transmissive liquid crystal display, a method of forming an uneven pattern on the reflective electrode using an organic film, forming the organic film in an uneven pattern, and stacking the reflective electrode thereon is applied.

In this case, the organic film is formed to have a relatively thicker thickness than other insulating films or conductive films in consideration of the height of the uneven pattern.

In the case of a liquid crystal display device including such an organic film, when the storage capacitor wiring for forming the storage capacity in each pixel region is formed together with the gate wiring, sufficient storage capacitance cannot be formed. The method of forming in the same layer as the wiring is adopted.

On the other hand, the common electrode wirings for applying the common voltage to the common electrode located on the upper substrate are also generally formed in the same layer as the above-mentioned storage capacitor wiring.

In addition, the common voltage applied to the common electrode wiring may also be applied to the storage capacitor wiring. In this case, the common electrode wiring and the storage capacitor wiring may be electrically connected and may be separately formed.

The common electrode wiring formed on the same layer as the data wiring includes contact means for electrically connecting to the common electrode on the upper substrate, and has a structure vulnerable to static electricity flowing from the outside.

Therefore, in the structure overlapping with the gate wiring under the common electrode wiring formed on the same layer as the data wiring, an insulation breakdown phenomenon occurs between the common electrode wiring and the gate wiring due to static electricity flowing into the outside, resulting from a shorting of the gate line. It can cause a failure.

SUMMARY OF THE INVENTION The present invention has been made in an effort to provide a liquid crystal display device which prevents a short circuit of a gate wiring due to external static electricity flowing into a common electrode wiring.

Technical problems to be achieved by the present invention are not limited to the above-mentioned technical problems, and other technical problems not mentioned will be clearly understood by those skilled in the art from the following description.

According to an aspect of the present invention, a liquid crystal display device includes an insulating substrate, a gate wiring formed on the substrate, an antistatic dummy pattern formed on the same layer as the gate wiring, A common electrode formed on the gate wiring and the gate insulating film formed on the antistatic dummy pattern, a data wiring formed on the gate insulating film, and the same layer as the data wiring, and at least a portion of which is overlapped with the gate wiring It includes wiring.

The semiconductor device may further include a layer made of at least amorphous silicon between the gate insulating layer and the common electrode wiring.

In addition, the antistatic dummy pattern may be formed to have a first width at a portion overlapping with the common electrode wiring, and may be formed at a second width that is wider than the first width at a portion that does not overlap.

In addition, the anti-static dummy pattern may be formed in a region before the first gate line of the gate line.

Specific details of other embodiments are included in the detailed description and the drawings.

Advantages and features of the present invention and methods for achieving them will be apparent with reference to the embodiments described below in detail with the accompanying drawings. However, the present invention is not limited to the embodiments disclosed below, but will be implemented in various forms, and only the present embodiments are intended to complete the disclosure of the present invention, and the general knowledge in the art to which the present invention pertains. It is provided to fully convey the scope of the invention to those skilled in the art, and the present invention is defined only by the scope of the claims. Like reference numerals refer to like elements throughout.

First, a structure of a typical liquid crystal display will be described with reference to FIGS. 1 and 2.

FIG. 1 is a layout view illustrating a thin film transistor substrate of a typical liquid crystal display, and FIG. 2 is a cross-sectional view taken along the line II-II ′ of FIG. 1.

The gate line 22 and the gate line 22 which are formed at one end of the gate line 22 and the gate line 22 extending in the horizontal direction on the insulating substrate 10 to transfer the scanning signal to the gate line 22. Gate wirings 22, 24, and 26 are formed including the gate electrode 26 protruding from the top.

The gate lines 22, 24, and 26 may be formed in a single layer structure or a double layer or more structure. When the gate wirings 22, 24, and 26 are formed in a single layer structure, chromium or chromium alloys, molybdenum or molybdenum alloys, aluminum or aluminum alloys, or silver or silver alloys are used. On the other hand, when the gate wirings 22, 24, and 26 are formed in a double layer structure, at least one of the double layers is preferably formed of a low resistance metal material.                     

The gate insulating film 30 made of silicon nitride or the like covers the gate wirings 22, 24, and 26 on the insulating substrate 10.

A semiconductor pattern 42 made of a semiconductor such as amorphous silicon is formed on the gate insulating layer 30, and an amorphous silicon or the like doped with a high concentration of impurities is formed on the semiconductor pattern 42. Resistive contact patterns 45 and 46 are formed, respectively.

In addition, the data pad 52 is formed on one end of the data line 52 and the data line 52 crossing the gate line 22 to define the pixel area, and transmits an image signal to the data line 52. 54 and the other ohmic contact layer 46 corresponding to the source electrode 55 and the source electrode 55 which are extended to the data line 52 and in contact with the one ohmic contact layer 45, Data wirings 52, 54, 55 and 56 including the drain electrode 56 present are formed.

The data lines 52, 54, 55, and 56 may also be formed in a single layer structure, or may be formed in a double layer or the same structure as the gate lines 22, 24, and 26.

Here, the gate electrode 26, the semiconductor pattern 42, the source electrode 55, and the drain electrode 56 constitute a thin film transistor TFT.

The passivation film 60 made of silicon nitride or silicon oxide covers the data wirings 52, 54, 55, 56 and the thin film transistor TFT.

An organic film 70 having an uneven portion is formed on the protective film 60. In the passivation layer 60 and the organic layer 70, the gate pad 24 is formed together with the contact hole 72 exposing the drain electrode 56, the contact hole 74 exposing the data pad 54, and the gate insulating layer 30. An exposed contact hole 76 is formed.

The transparent electrode 82 and the reflective electrode 92, which are electrically connected to the drain electrode 56 through the contact hole 72, are sequentially formed on the organic layer 70 in the pixel region. In this case, an opening is formed in the reflective electrode 92 to expose the transparent electrode 82 in a portion of the pixel region, thereby forming a transmission window for the transflective liquid crystal display.

The transparent electrode 82 and the reflective electrode 92 have a concave-convex shape according to the concave-convex shape patterned on the surface of the organic film 70. The reflective electrode 92 may be formed of a metal material having excellent reflective properties, for example, aluminum or aluminum alloy, or silver or silver alloy.

In addition, an auxiliary data pad formed of a double layer of a transparent film 84 and a reflective film 94 connected to the data pad 54 through the contact hole 74 is formed on the organic film 70. An auxiliary gate pad formed of a double layer of the transparent film 86 and the reflective film 96 connected to the gate pad 24 is formed.

In the liquid crystal display device having the organic layer 70, common electrode wirings for applying a common voltage on the common electrode of the upper substrate formed to face the insulating substrate 10 may include the data lines 52 and 54. 55, 56) is usually formed in the same layer.

In this case, although not shown in FIGS. 1 and 2, a region overlapping the gate wiring 22 exists under the common electrode wiring, and when the static electricity flows into the common electrode wiring from the outside, the gate wiring 22 In order to prevent the problem of dielectric breakdown with the present invention, the present invention is provided with an antistatic dummy pattern to be described later.

Meanwhile, although the transflective liquid crystal display device has been described as an example of the structure of the typical liquid crystal display device, the structure of the liquid crystal display device having the antistatic derby pattern according to the embodiments of the present invention described below is limited thereto. no.

Next, a liquid crystal display according to an exemplary embodiment of the present invention having a dummy pattern for preventing static electricity will be described with reference to FIGS. 3 and 4, which partially enlarge an area where an overlapping portion of the common electrode wiring and the gate wiring exist. do.

3 is a layout view illustrating a partial region of a liquid crystal display according to an exemplary embodiment including a dummy pattern for preventing static electricity, and FIG. 4 is a cross-sectional view taken along the line IV-IV ′ of FIG. 3.

As shown in FIGS. 3 and 4, the liquid crystal display according to the exemplary embodiment of the present invention has an antistatic dummy pattern 29 formed on the same layer as the gate line 22 extending in the horizontal direction on the insulating substrate 10. ) Is formed.

The gate wiring 22 and the antistatic dummy pattern 29 may be formed in a single layer structure or a double layer or more structure. When the gate wiring 22 and the antistatic dummy pattern 29 are formed in a single layer structure, chromium or chromium alloy, molybdenum or molybdenum alloy, aluminum or aluminum alloy, or silver or silver alloy is used. Meanwhile, when the gate wiring 22 and the antistatic dummy pattern 29 are formed in a double layer structure, at least one of the double layers may be formed of a low resistance metal material.

In addition, on the insulating substrate 10, a gate insulating film 30 made of silicon nitride or the like covers the gate wiring 22 and the antistatic dummy pattern 29.

The common electrode wire 59 formed on the same layer as the data wires 52, 54, 55, and 56 described above is formed in the vertical direction of the display panel.

The common electrode wiring 59 is a wiring for applying a common voltage to a common electrode formed on an upper insulating substrate (not shown) facing the insulating substrate 10, and is formed in a direction perpendicular to the display panel. .

The common electrode wire 59 includes a pad portion 58 and is electrically connected to a common electrode on an upper insulating substrate (not shown).

On the other hand, the dummy pattern 59 for preventing static electricity is provided to prevent the short circuit by the inflow of static electricity from the outside at the portion where the common electrode wiring 59 overlaps the gate wiring 22. In this case, a short circuit occurs first in the dummy pattern 59 to prevent a short circuit between the gate wiring 22 and the common electrode wiring 59.

Specifically, the antistatic dummy pattern 29 is formed to overlap the common electrode wiring 59 in a region before the first gate line 22 overlaps the common electrode wiring 59.                     

In this case, the antistatic dummy pattern 29 may be formed to have a structure in which insulation breakdown due to static electricity is more vulnerable than a portion where the common electrode wiring 59 and the gate wiring 22 overlap.

Specifically, the antistatic dummy pattern 29 includes a first pattern 29a having a narrow wiring width at a portion overlapping with the common electrode wiring 59, and a second pattern having a relatively wide portion at a portion not overlapping the common electrode wiring 59. 29b is provided. In addition, at least one first pattern 29a overlapping the common electrode wiring 59 may be formed.

In addition, in one embodiment of the present invention, but only one anti-static dummy pattern 29 is shown, one or more may be formed. In addition, it may be formed in various regions according to the position of the region having a structure susceptible to breakdown due to the inflow of static electricity.

Next, a liquid crystal display according to another exemplary embodiment of the present invention having a dummy pattern for preventing static electricity will be described with reference to FIGS. 5 and 6.

FIG. 5 is a layout view illustrating a partial region of a liquid crystal display according to another exemplary embodiment having a dummy pattern for preventing static electricity. FIG. 6 is a cross-sectional view taken along line VI-VI ′ of FIG. 5.

5 and 6, the liquid crystal display according to another exemplary embodiment of the present invention has an antistatic dummy pattern 29 formed on the same layer as the gate wiring 22 extending in the horizontal direction on the insulating substrate 10. ) Is formed.

In this case, the antistatic dummy pattern 29 includes a first pattern 29a having a narrow wiring width at a portion overlapping with the common electrode wiring 59, and a second pattern 29b having a relatively wide portion at a portion not overlapping with the common electrode wiring 59. ) Is provided.

Meanwhile, the liquid crystal display according to another exemplary embodiment of the present invention except that the semiconductor layer 49 and the ohmic contact layer 48 are formed under the common electrode wire 59 overlapping the first pattern 29a. All structures are substantially the same as the above-described embodiment of the present invention.

Specifically, a semiconductor layer 49 made of a semiconductor such as amorphous silicon is formed on the gate insulating layer 30 corresponding to the common electrode wiring 59 overlapping the first pattern 29a. On the upper portion of 49, an ohmic contact layer 48 made of amorphous silicon or the like doped with a high concentration of impurities is formed.

Therefore, according to embodiments of the present invention, a dummy pattern for preventing static electricity formed in the same layer as the gate wiring may be provided in a region where the common electrode wiring and the gate wiring overlap with each other, thereby preventing a short circuit caused by the inflow of static electricity. Can be.

Although the embodiments of the present invention have been described above with reference to the accompanying drawings, the present invention is not limited to the above embodiments and can be variously modified and implemented by those skilled in the art without departing from the technical scope of the present invention.

As described above, according to the present invention, it is possible to prevent the occurrence of a short circuit in the gate wiring due to external static electricity flowing into the common electrode wiring of the liquid crystal display.

Claims (5)

Insulating substrate; A gate wiring formed on the substrate; An antistatic dummy pattern formed on the same layer as the gate wiring; A gate insulating film formed on the gate wiring and the antistatic dummy pattern; A data line formed on the gate insulating film; And And a common electrode wiring formed on the same layer as the data wiring and at least partially overlapping the gate wiring. In claim 1, And a layer made of at least amorphous silicon between the gate insulating film and the common electrode wiring. In claim 1, The antistatic dummy pattern is, And a second width wider than the first width in a portion not overlapping the common electrode wiring. In claim 1, The antistatic dummy pattern is, And a liquid crystal display formed in a region before the first gate line of the gate line. In claim 1, The common electrode wiring is, And a liquid crystal display electrically connected to a common electrode on another insulating substrate formed to face the insulating substrate.

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