KR20060077705A - 시모스 이미지 센서 및 그의 제조방법 - Google Patents
시모스 이미지 센서 및 그의 제조방법 Download PDFInfo
- Publication number
- KR20060077705A KR20060077705A KR1020040117223A KR20040117223A KR20060077705A KR 20060077705 A KR20060077705 A KR 20060077705A KR 1020040117223 A KR1020040117223 A KR 1020040117223A KR 20040117223 A KR20040117223 A KR 20040117223A KR 20060077705 A KR20060077705 A KR 20060077705A
- Authority
- KR
- South Korea
- Prior art keywords
- image sensor
- infrared cut
- cmos image
- cut filter
- manufacturing
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10F—INORGANIC SEMICONDUCTOR DEVICES SENSITIVE TO INFRARED RADIATION, LIGHT, ELECTROMAGNETIC RADIATION OF SHORTER WAVELENGTH OR CORPUSCULAR RADIATION
- H10F39/00—Integrated devices, or assemblies of multiple devices, comprising at least one element covered by group H10F30/00, e.g. radiation detectors comprising photodiode arrays
- H10F39/10—Integrated devices
- H10F39/12—Image sensors
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10F—INORGANIC SEMICONDUCTOR DEVICES SENSITIVE TO INFRARED RADIATION, LIGHT, ELECTROMAGNETIC RADIATION OF SHORTER WAVELENGTH OR CORPUSCULAR RADIATION
- H10F77/00—Constructional details of devices covered by this subclass
- H10F77/30—Coatings
- H10F77/306—Coatings for devices having potential barriers
- H10F77/331—Coatings for devices having potential barriers for filtering or shielding light, e.g. multicolour filters for photodetectors
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10F—INORGANIC SEMICONDUCTOR DEVICES SENSITIVE TO INFRARED RADIATION, LIGHT, ELECTROMAGNETIC RADIATION OF SHORTER WAVELENGTH OR CORPUSCULAR RADIATION
- H10F30/00—Individual radiation-sensitive semiconductor devices in which radiation controls the flow of current through the devices, e.g. photodetectors
- H10F30/20—Individual radiation-sensitive semiconductor devices in which radiation controls the flow of current through the devices, e.g. photodetectors the devices having potential barriers, e.g. phototransistors
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10F—INORGANIC SEMICONDUCTOR DEVICES SENSITIVE TO INFRARED RADIATION, LIGHT, ELECTROMAGNETIC RADIATION OF SHORTER WAVELENGTH OR CORPUSCULAR RADIATION
- H10F39/00—Integrated devices, or assemblies of multiple devices, comprising at least one element covered by group H10F30/00, e.g. radiation detectors comprising photodiode arrays
- H10F39/011—Manufacture or treatment of image sensors covered by group H10F39/12
- H10F39/024—Manufacture or treatment of image sensors covered by group H10F39/12 of coatings or optical elements
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10F—INORGANIC SEMICONDUCTOR DEVICES SENSITIVE TO INFRARED RADIATION, LIGHT, ELECTROMAGNETIC RADIATION OF SHORTER WAVELENGTH OR CORPUSCULAR RADIATION
- H10F39/00—Integrated devices, or assemblies of multiple devices, comprising at least one element covered by group H10F30/00, e.g. radiation detectors comprising photodiode arrays
- H10F39/10—Integrated devices
- H10F39/12—Image sensors
- H10F39/18—Complementary metal-oxide-semiconductor [CMOS] image sensors; Photodiode array image sensors
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10F—INORGANIC SEMICONDUCTOR DEVICES SENSITIVE TO INFRARED RADIATION, LIGHT, ELECTROMAGNETIC RADIATION OF SHORTER WAVELENGTH OR CORPUSCULAR RADIATION
- H10F39/00—Integrated devices, or assemblies of multiple devices, comprising at least one element covered by group H10F30/00, e.g. radiation detectors comprising photodiode arrays
- H10F39/80—Constructional details of image sensors
- H10F39/805—Coatings
- H10F39/8053—Colour filters
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10F—INORGANIC SEMICONDUCTOR DEVICES SENSITIVE TO INFRARED RADIATION, LIGHT, ELECTROMAGNETIC RADIATION OF SHORTER WAVELENGTH OR CORPUSCULAR RADIATION
- H10F39/00—Integrated devices, or assemblies of multiple devices, comprising at least one element covered by group H10F30/00, e.g. radiation detectors comprising photodiode arrays
- H10F39/80—Constructional details of image sensors
- H10F39/806—Optical elements or arrangements associated with the image sensors
- H10F39/8063—Microlenses
Landscapes
- Solid State Image Pick-Up Elements (AREA)
- Transforming Light Signals Into Electric Signals (AREA)
- Optical Filters (AREA)
Abstract
Description
Claims (3)
- 광감지 소자영역, 게이트전극, 층간절연막, 금속배선이 형성된 반도체 기판상의 컬러필터층;상기 컬러필터층 상의 적외선 차단필터;상기 적외선 차단필터 상의 마이크로 렌즈를 포함하는 것을 특징으로 하는 는 적외선 차단필터를 가지는 시모스 이미지 센서.
- 제 1 항에 있어서,상기 적외선 차단필터는 필터염료가 믹스된 감광막으로 형성하는 것을 특징으로 하는 적외선 차단필터를 가지는 시모스 이미지 센서.
- 광감지 소자영역, 게이트전극, 층간절연막, 금속배선이 형성된 반도체 기판상에 컬러필터층을 형성하는 단계;상기 컬러필터층 상에 적외선 차단필터를 형성하는 단계;상기 적외선 차단필터 상에 마이크로 렌즈를 형성하는 단계를 포함하는 것을 특징으로 하는 적외선 차단필터를 가지는 시모스 이미지 센서의 제조방법.
Priority Applications (5)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| KR1020040117223A KR100649016B1 (ko) | 2004-12-30 | 2004-12-30 | 시모스 이미지 센서 및 그의 제조방법 |
| CNA2005101320351A CN1815745A (zh) | 2004-12-30 | 2005-12-16 | 一种cmos图像传感器及其制造方法 |
| JP2005378039A JP2006191096A (ja) | 2004-12-30 | 2005-12-28 | Cmosイメージセンサとその製造方法 |
| US11/320,343 US20060145220A1 (en) | 2004-12-30 | 2005-12-29 | CMOS image sensor and method for fabricating the same |
| DE102005063115A DE102005063115A1 (de) | 2004-12-30 | 2005-12-30 | CMOS-Bildsensor und Herstellungsverfahren desselben |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| KR1020040117223A KR100649016B1 (ko) | 2004-12-30 | 2004-12-30 | 시모스 이미지 센서 및 그의 제조방법 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| KR20060077705A true KR20060077705A (ko) | 2006-07-05 |
| KR100649016B1 KR100649016B1 (ko) | 2006-11-27 |
Family
ID=36639400
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| KR1020040117223A Expired - Fee Related KR100649016B1 (ko) | 2004-12-30 | 2004-12-30 | 시모스 이미지 센서 및 그의 제조방법 |
Country Status (5)
| Country | Link |
|---|---|
| US (1) | US20060145220A1 (ko) |
| JP (1) | JP2006191096A (ko) |
| KR (1) | KR100649016B1 (ko) |
| CN (1) | CN1815745A (ko) |
| DE (1) | DE102005063115A1 (ko) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| KR100858034B1 (ko) * | 2007-10-18 | 2008-09-10 | (주)실리콘화일 | 단일 칩 활력 이미지 센서 |
Families Citing this family (11)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US9524439B2 (en) | 2004-05-25 | 2016-12-20 | Continental Automotive Gmbh | Monitoring unit and assistance system for motor vehicles |
| CN100444381C (zh) * | 2006-10-13 | 2008-12-17 | 中国科学院上海技术物理研究所 | 背向集成微透镜红外焦平面探测器及微透镜的制备方法 |
| US20080164551A1 (en) * | 2006-12-28 | 2008-07-10 | Young-Je Yun | Image sensor |
| KR101776955B1 (ko) * | 2009-02-10 | 2017-09-08 | 소니 주식회사 | 고체 촬상 장치와 그 제조 방법, 및 전자 기기 |
| KR101736330B1 (ko) | 2010-09-03 | 2017-05-30 | 삼성전자주식회사 | 픽셀, 이미지 센서, 및 이를 포함하는 이미지 처리 장치들 |
| US20150321644A1 (en) * | 2012-08-06 | 2015-11-12 | Conti Temic Microelectronic Gmbh | Detection of Raindrops on a Pane by Means of a Camera and Illumination |
| TW201628179A (zh) * | 2015-01-21 | 2016-08-01 | Jsr 股份有限公司 | 固體攝像裝置及紅外線吸收性組成物 |
| TWI675907B (zh) * | 2015-01-21 | 2019-11-01 | 日商Jsr股份有限公司 | 固體攝像裝置 |
| CN106454053A (zh) * | 2016-11-22 | 2017-02-22 | 宁波舜宇光电信息有限公司 | 一种用于虹膜识别的摄像头模组及其设备 |
| CN109887946A (zh) * | 2019-03-20 | 2019-06-14 | 信利光电股份有限公司 | 图像传感器及其制作方法、摄像头模组及其制作方法 |
| CN110818276B (zh) * | 2019-12-16 | 2022-04-05 | 豪威光电子科技(上海)有限公司 | 红外玻璃及其制备方法 |
Family Cites Families (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH06232379A (ja) * | 1993-02-01 | 1994-08-19 | Sharp Corp | 固体撮像素子 |
| US7084472B2 (en) * | 2002-07-09 | 2006-08-01 | Toppan Printing Co., Ltd. | Solid-state imaging device and manufacturing method therefor |
| US20040256561A1 (en) * | 2003-06-17 | 2004-12-23 | Allyson Beuhler | Wide band light sensing pixel array |
-
2004
- 2004-12-30 KR KR1020040117223A patent/KR100649016B1/ko not_active Expired - Fee Related
-
2005
- 2005-12-16 CN CNA2005101320351A patent/CN1815745A/zh active Pending
- 2005-12-28 JP JP2005378039A patent/JP2006191096A/ja active Pending
- 2005-12-29 US US11/320,343 patent/US20060145220A1/en not_active Abandoned
- 2005-12-30 DE DE102005063115A patent/DE102005063115A1/de not_active Ceased
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| KR100858034B1 (ko) * | 2007-10-18 | 2008-09-10 | (주)실리콘화일 | 단일 칩 활력 이미지 센서 |
| WO2009051363A3 (en) * | 2007-10-18 | 2009-07-16 | Siliconfile Technologies Inc | One chip image sensor for measuring vitality of subject |
| US8222603B2 (en) | 2007-10-18 | 2012-07-17 | Siliconfile Technologies Inc. | One chip image sensor for measuring vitality of subject |
Also Published As
| Publication number | Publication date |
|---|---|
| CN1815745A (zh) | 2006-08-09 |
| US20060145220A1 (en) | 2006-07-06 |
| DE102005063115A1 (de) | 2006-09-14 |
| JP2006191096A (ja) | 2006-07-20 |
| KR100649016B1 (ko) | 2006-11-27 |
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