KR20050073665A - 실시간 면 저항 측정 기능을 갖는 스퍼터 장치 - Google Patents
실시간 면 저항 측정 기능을 갖는 스퍼터 장치 Download PDFInfo
- Publication number
- KR20050073665A KR20050073665A KR1020040001504A KR20040001504A KR20050073665A KR 20050073665 A KR20050073665 A KR 20050073665A KR 1020040001504 A KR1020040001504 A KR 1020040001504A KR 20040001504 A KR20040001504 A KR 20040001504A KR 20050073665 A KR20050073665 A KR 20050073665A
- Authority
- KR
- South Korea
- Prior art keywords
- substrate
- surface resistance
- probe
- real
- deposition
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 239000000758 substrate Substances 0.000 claims abstract description 46
- 238000004544 sputter deposition Methods 0.000 claims abstract description 26
- 239000000523 sample Substances 0.000 claims abstract description 22
- 238000012546 transfer Methods 0.000 claims abstract description 9
- 238000000034 method Methods 0.000 claims description 15
- 239000000463 material Substances 0.000 claims description 6
- 238000010943 off-gassing Methods 0.000 claims description 4
- 229910001220 stainless steel Inorganic materials 0.000 claims description 2
- 239000010935 stainless steel Substances 0.000 claims description 2
- 238000000151 deposition Methods 0.000 abstract description 17
- 230000008021 deposition Effects 0.000 abstract description 16
- 229910052751 metal Inorganic materials 0.000 abstract description 4
- 239000002184 metal Substances 0.000 abstract description 4
- 238000005259 measurement Methods 0.000 description 19
- 238000001179 sorption measurement Methods 0.000 description 10
- 239000010409 thin film Substances 0.000 description 10
- 239000010408 film Substances 0.000 description 6
- 239000010410 layer Substances 0.000 description 5
- 229920001971 elastomer Polymers 0.000 description 4
- 238000004519 manufacturing process Methods 0.000 description 4
- 239000005060 rubber Substances 0.000 description 4
- 238000005137 deposition process Methods 0.000 description 3
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 2
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 2
- 238000005229 chemical vapour deposition Methods 0.000 description 2
- 238000012937 correction Methods 0.000 description 2
- 238000000691 measurement method Methods 0.000 description 2
- 238000005240 physical vapour deposition Methods 0.000 description 2
- 239000004033 plastic Substances 0.000 description 2
- 230000035939 shock Effects 0.000 description 2
- 239000002356 single layer Substances 0.000 description 2
- 229910052782 aluminium Inorganic materials 0.000 description 1
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 1
- 229910052786 argon Inorganic materials 0.000 description 1
- 150000001768 cations Chemical class 0.000 description 1
- 239000000919 ceramic Substances 0.000 description 1
- 239000011261 inert gas Substances 0.000 description 1
- 239000004973 liquid crystal related substance Substances 0.000 description 1
- 230000000116 mitigating effect Effects 0.000 description 1
- 239000000203 mixture Substances 0.000 description 1
- 238000012544 monitoring process Methods 0.000 description 1
- 229910052757 nitrogen Inorganic materials 0.000 description 1
- 230000000737 periodic effect Effects 0.000 description 1
- 238000003825 pressing Methods 0.000 description 1
- 230000002265 prevention Effects 0.000 description 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L22/00—Testing or measuring during manufacture or treatment; Reliability measurements, i.e. testing of parts without further processing to modify the parts as such; Structural arrangements therefor
- H01L22/10—Measuring as part of the manufacturing process
- H01L22/14—Measuring as part of the manufacturing process for electrical parameters, e.g. resistance, deep-levels, CV, diffusions by electrical means
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/683—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping
- H01L21/6838—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping with gripping and holding devices using a vacuum; Bernoulli devices
Landscapes
- Engineering & Computer Science (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Testing Or Measuring Of Semiconductors Or The Like (AREA)
- Physical Vapour Deposition (AREA)
Abstract
Description
Claims (4)
- 다수의 공정챔버와 각각의 공정챔버를 연결하는 트랜스퍼 챔버를 가지는 스퍼터링 장치에서, 트랜스퍼 챔버를 통하여 공정챔버에서 증착된 기판이 상기 기판의 하부에 위치하여 상기 기판을 이동시키는 로버트 암을 통하여 이동하는 경우, 상기 기판에 접촉하여 상기 기판의 면 저항을 측정하는 프로브; 및상기 기판의 상부에 위치하여 상기 적어도 하나의 프로브를 수납하는 흡착판을 포함하는 것을 특징으로 하는 실시간 면 저항 측정 기능을 갖는 스퍼터 장치.
- 제1 항에 있어서, 상기 흡착판은 원통형 형상을 갖는 것을 특징으로 하는 실시간 면 저항 측정 기능을 갖는 스퍼터 장치.
- 제1 항에 있어서, 상기 흡착판은 스테인레스 강 등 아웃 개싱이 적은 재질 또는 기계적인 충격을 흡수할 수 있는 재질에 의해 형성되는 것을 특징으로 하는 실시간 면 저항 측정 기능을 갖는 스퍼터 장치.
- 제1 항에 있어서, 상기 기판의 하부에 위치하여 상기 기판을 이동시키는 로버트 암이 없는 부분을 측정하여 무라가 발생하지 않도록 하는 것을 특징으로 하는 실시간 면 저항 측정 기능을 갖는 스퍼터 장치.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| KR1020040001504A KR100687345B1 (ko) | 2004-01-09 | 2004-01-09 | 실시간 면 저항 측정 기능을 갖는 스퍼터 장치 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| KR1020040001504A KR100687345B1 (ko) | 2004-01-09 | 2004-01-09 | 실시간 면 저항 측정 기능을 갖는 스퍼터 장치 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| KR20050073665A true KR20050073665A (ko) | 2005-07-18 |
| KR100687345B1 KR100687345B1 (ko) | 2007-02-27 |
Family
ID=37262578
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| KR1020040001504A Expired - Lifetime KR100687345B1 (ko) | 2004-01-09 | 2004-01-09 | 실시간 면 저항 측정 기능을 갖는 스퍼터 장치 |
Country Status (1)
| Country | Link |
|---|---|
| KR (1) | KR100687345B1 (ko) |
-
2004
- 2004-01-09 KR KR1020040001504A patent/KR100687345B1/ko not_active Expired - Lifetime
Also Published As
| Publication number | Publication date |
|---|---|
| KR100687345B1 (ko) | 2007-02-27 |
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