KR20020015214A - Semiconductor package - Google Patents
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- KR20020015214A KR20020015214A KR1020000048405A KR20000048405A KR20020015214A KR 20020015214 A KR20020015214 A KR 20020015214A KR 1020000048405 A KR1020000048405 A KR 1020000048405A KR 20000048405 A KR20000048405 A KR 20000048405A KR 20020015214 A KR20020015214 A KR 20020015214A
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- H01L25/00—Assemblies consisting of a plurality of semiconductor or other solid state devices
- H01L25/03—Assemblies consisting of a plurality of semiconductor or other solid state devices all the devices being of a type provided for in a single subclass of subclasses H10B, H10D, H10F, H10H, H10K or H10N, e.g. assemblies of rectifier diodes
- H01L25/04—Assemblies consisting of a plurality of semiconductor or other solid state devices all the devices being of a type provided for in a single subclass of subclasses H10B, H10D, H10F, H10H, H10K or H10N, e.g. assemblies of rectifier diodes the devices not having separate containers
- H01L25/065—Assemblies consisting of a plurality of semiconductor or other solid state devices all the devices being of a type provided for in a single subclass of subclasses H10B, H10D, H10F, H10H, H10K or H10N, e.g. assemblies of rectifier diodes the devices not having separate containers the devices being of a type provided for in group H10D89/00
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- H01L23/31—Encapsulations, e.g. encapsulating layers, coatings, e.g. for protection characterised by the arrangement or shape
- H01L23/3107—Encapsulations, e.g. encapsulating layers, coatings, e.g. for protection characterised by the arrangement or shape the device being completely enclosed
- H01L23/3121—Encapsulations, e.g. encapsulating layers, coatings, e.g. for protection characterised by the arrangement or shape the device being completely enclosed a substrate forming part of the encapsulation
- H01L23/3128—Encapsulations, e.g. encapsulating layers, coatings, e.g. for protection characterised by the arrangement or shape the device being completely enclosed a substrate forming part of the encapsulation the substrate having spherical bumps for external connection
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- H01L2224/32145—Disposition the layer connector connecting between different semiconductor or solid-state bodies, i.e. chip-to-chip the bodies being stacked
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- H01L2224/42—Wire connectors; Manufacturing methods related thereto
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- H01L2224/4847—Connecting portions the connecting portion on the bonding area of the semiconductor or solid-state body being a wedge bond
- H01L2224/48471—Connecting portions the connecting portion on the bonding area of the semiconductor or solid-state body being a wedge bond the other connecting portion not on the bonding area being a ball bond, i.e. wedge-to-ball, reverse stitch
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- H—ELECTRICITY
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- H01L2224/48475—Connecting portions connected to auxiliary connecting means on the bonding areas, e.g. pre-ball, wedge-on-ball, ball-on-ball
- H01L2224/48476—Connecting portions connected to auxiliary connecting means on the bonding areas, e.g. pre-ball, wedge-on-ball, ball-on-ball between the wire connector and the bonding area
- H01L2224/48477—Connecting portions connected to auxiliary connecting means on the bonding areas, e.g. pre-ball, wedge-on-ball, ball-on-ball between the wire connector and the bonding area being a pre-ball (i.e. a ball formed by capillary bonding)
- H01L2224/48478—Connecting portions connected to auxiliary connecting means on the bonding areas, e.g. pre-ball, wedge-on-ball, ball-on-ball between the wire connector and the bonding area being a pre-ball (i.e. a ball formed by capillary bonding) the connecting portion being a wedge bond, i.e. wedge on pre-ball
- H01L2224/48479—Connecting portions connected to auxiliary connecting means on the bonding areas, e.g. pre-ball, wedge-on-ball, ball-on-ball between the wire connector and the bonding area being a pre-ball (i.e. a ball formed by capillary bonding) the connecting portion being a wedge bond, i.e. wedge on pre-ball on the semiconductor or solid-state body
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- H01L2924/1531—Connection portion the connection portion being formed only on the surface of the substrate opposite to the die mounting surface
- H01L2924/15311—Connection portion the connection portion being formed only on the surface of the substrate opposite to the die mounting surface being a ball array, e.g. BGA
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Abstract
이 발명은 반도체패키지에 관한 것으로, 반도체칩을 그 크기에 제한받지 않고 적층가능하며, 또한 반도체칩 적층시 도전성와이어에는 어떠한 손상도 가지 않토록, 제1면과 제2면을 가지고, 상기 제2면에는 다수의 입출력패드가 형성된 제1반도체칩과; 제1면과 제2면을 가지고, 상기 제2면에는 다수의 입출력패드가 형성되어 있으며, 상기 제1면이 상기 제1반도체칩의 제2면과 마주하여 위치된 제2반도체칩과; 상기 제1반도체칩의 제1면에 접착되어 있으며, 제1면과 제2면을 가지는 수지층을 중심으로 상기 제1면 및 제2면에는 다수의 회로패턴이 형성된 섭스트레이트와; 상기 제1반도체칩 및 제2반도체칩의 입출력패드와 섭스트레이트의 회로패턴을 상호 전기적으로 접속하는 다수의 도전성와이어와; 상기 제1반도체칩의 제2면과 상기 제2반도체칩의 제1면 사이에 접착되고, 두께는 상기 제1반도체칩의 입출력패드에 연결된 도전성와이어의 루프 하이트보다 두껍게 형성된 접착층과; 상기 제1반도체칩, 제2반도체칩, 도전성와이어 및 섭스트레이트의 일면을 봉지하는 봉지재와; 상기 섭스트레이트의 각 볼랜드에 접속된 도전성볼을 포함하여 이루어진 것을 특징으로 함.The present invention relates to a semiconductor package, in which semiconductor chips can be stacked without being limited in size, and also have a first surface and a second surface so as not to cause any damage to conductive wires when the semiconductor chips are stacked. A first semiconductor chip having a plurality of input / output pads formed on a surface thereof; A second semiconductor chip having a first surface and a second surface, wherein a plurality of input / output pads are formed on the second surface, the first surface facing the second surface of the first semiconductor chip; A substrate that is bonded to the first surface of the first semiconductor chip and has a plurality of circuit patterns formed on the first and second surfaces of the resin layer having a first surface and a second surface; A plurality of conductive wires electrically connecting the input / output pads of the first semiconductor chip and the second semiconductor chip and the circuit patterns of the substrate; An adhesive layer bonded between the second surface of the first semiconductor chip and the first surface of the second semiconductor chip, the adhesive layer being thicker than the loop height of the conductive wire connected to the input / output pad of the first semiconductor chip; An encapsulant for encapsulating one surface of the first semiconductor chip, the second semiconductor chip, the conductive wire, and the substrate; It characterized in that it comprises a conductive ball connected to each borland of the substrate.
Description
본 발명은 반도체패키지에 관한 것으로, 더욱 상세하게 설명하면 다수의 반도체칩을 상호 적층한 적층형 반도체패키지에 관한 것이다.The present invention relates to a semiconductor package, and more particularly, to a stacked semiconductor package in which a plurality of semiconductor chips are stacked on each other.
통상 반도체패키지는 반도체칩을 외부 환경으로부터 안전하게 보호함은 물론, 그 반도체칩과 마더보드(Mother Board)와의 전기적 신호가 용이하게 교환되도록 한 것을 말한다.In general, the semiconductor package not only protects the semiconductor chip from the external environment, but also means that the electrical signal between the semiconductor chip and the motherboard is easily exchanged.
최근에는 상기한 반도체패키지 내부에 다수의 반도체칩을 적층함으로써 고기능화를 구현한 적층형 반도체패키지가 출시되고 있으며, 이러한 종래의 통상적인 적층형 반도체패키지(100')를 도1에 도시하였다.Recently, a multilayer semiconductor package having high functionality by stacking a plurality of semiconductor chips inside the semiconductor package has been released. Such a conventional multilayer semiconductor package 100 'is shown in FIG.
도시된 바와 같이 통상 수지층(18')을 중심으로 상,하면에 본드핑거(20a') 및 볼랜드(20b')를 갖는 회로패턴(20')이 형성되어 있고, 상기 회로패턴(20')의 표면은 커버코트(23')로 코팅된 회로기판(16')이 구비되어 있다. 또한, 상기 회로기판(16')의 상면 중앙부에는 제1반도체칩(2')이 접착층으로 접착되어 있고, 상기 제1반도체칩(2')의 상면에는 제2반도체칩(6')이 접착층으로 접착되어 있다. 물론, 상기 제1반도체칩(2') 및 제2반도체칩(6')의 상면에는 다수의 입출력패드(4',8')가 형성되어 있다. 상기 제1반도체칩(2') 및 제2반도체칩(6')의 입출력패드(4',8')는 각각 회로기판(16')에 형성된 회로패턴(20')중 본드핑거(20a')에 도전성와이어(60')로 접속되어 있다. 또한, 제1반도체칩(2'), 제2반도체칩(6'), 도전성와이어(60') 및 회로기판(16')의 상면은 봉지재(40')로 봉지되어 있다. 상기 회로기판(16')의 하면에 형성된 회로패턴(20')중 볼랜드(20b')에는 다수의 도전성볼(50')이 융착되어 있으며, 이 도전성볼(50')이 차후 마더보드의 소정 패턴에 접속된다. 도면중 미설명 부호 20c'는 도전성 비아홀이다.As shown, a circuit pattern 20 'having a bond finger 20a' and a borland 20b 'is formed on the upper and lower surfaces of the resin layer 18', and the circuit pattern 20 'is formed. The surface of the circuit board 16 'is coated with a cover coat 23'. In addition, the first semiconductor chip 2 'is bonded to the center of the upper surface of the circuit board 16' by the adhesive layer, and the second semiconductor chip 6 'is bonded to the upper surface of the first semiconductor chip 2'. It is bonded together. Of course, a plurality of input / output pads 4 'and 8' are formed on the upper surfaces of the first semiconductor chip 2 'and the second semiconductor chip 6'. The I / O pads 4 'and 8' of the first semiconductor chip 2 'and the second semiconductor chip 6' are bonded fingers 20a 'of the circuit patterns 20' formed on the circuit board 16 ', respectively. ) Is connected to the conductive wire 60 '. In addition, the upper surface of the first semiconductor chip 2 ', the second semiconductor chip 6', the conductive wire 60 ', and the circuit board 16' is sealed with an encapsulant 40 '. A plurality of conductive balls 50 'are fused to the ball lands 20b' among the circuit patterns 20 'formed on the bottom surface of the circuit board 16', and the conductive balls 50 'are subsequently fixed on the motherboard. Is connected to the pattern. In the figure, reference numeral 20c 'denotes a conductive via hole.
이러한 반도체패키지(100')는 제1반도체칩(2') 및 제2반도체칩(6')의 전기적 신호가 도전성와이어(60'), 회로기판(16')의 본드핑거(20a'), 도전성 비아홀(20c'), 볼랜드 (20b') 및 도전성볼(50')을 통해서 마더보드와 교환되며, 두개의 반도체칩이 적층된 상태이므로 반도체패키지가 고용량, 고기능화되고 또한 실장밀도를 높일 수 있는 장점이 있다.In the semiconductor package 100 ', the electrical signals of the first semiconductor chip 2' and the second semiconductor chip 6 'are transmitted to the conductive wire 60', the bond finger 20a 'of the circuit board 16', It is exchanged with the motherboard through the conductive via hole 20c ', the borland 20b', and the conductive ball 50 ', and since the two semiconductor chips are stacked, the semiconductor package can have high capacity, high functionality, and high mounting density. There is an advantage.
그러나, 상기 제1반도체칩의 입출력패드에 접속되는 도전성와이어와의 접촉을 피하기 위해, 상기 제2반도체칩의 넓이 또는 부피가 상기 제1반도체칩의 넓이 또는 부피보다 반듯이 작아야 하는 단점이 있다. 즉, 상기 제2반도체칩의 부피가 제1반도체칩의 부피와 같거나 클 경우에는 그 제2반도체칩의 저면과 도전성와이어가 상호 쇼트됨으로써 제1반도체칩의 전기적 기능이 마비되는 문제가 있어, 반듯이 그 제2반도체칩의 크기가 제1반도체칩의 크기보다 작아야 한다.However, in order to avoid contact with conductive wires connected to the input / output pads of the first semiconductor chip, an area or volume of the second semiconductor chip must be smaller than the width or volume of the first semiconductor chip. That is, when the volume of the second semiconductor chip is equal to or larger than the volume of the first semiconductor chip, the bottom surface of the second semiconductor chip and the conductive wire are shorted to each other, thereby causing paralysis of the electrical function of the first semiconductor chip. On the contrary, the size of the second semiconductor chip should be smaller than that of the first semiconductor chip.
이러한 문제는 동일한 크기의 반도체칩을 다수 적층하여야 하는 메모리 반도체패키지(예를 들면 다수의 DRAM을 적층한 반도체패키지)에 적용할This problem is applicable to a memory semiconductor package (for example, a semiconductor package in which a plurality of DRAMs are stacked) in which a plurality of semiconductor chips of the same size must be stacked.
수 없고, 또한 설계상 제2반도체칩의 크기가 제1반도체칩의 크기보다 더 큰 경우에는 전혀 적용할 수 없어, 패키징할 수 있는 반도체칩의 종류를 극히 제한시키고 있다.If the size of the second semiconductor chip is larger than the size of the first semiconductor chip, it cannot be applied at all, and the type of semiconductor chips that can be packaged is extremely limited.
따라서 본 발명은 상기와 같은 종래의 문제점을 해결하기 위해 안출한 것으로, 반도체칩의 크기에 제한 받지 않고 적층할 수 있는 반도체패키지의 제공에 있다.Accordingly, the present invention has been made to solve the above-mentioned conventional problems, and to provide a semiconductor package that can be stacked without being limited to the size of the semiconductor chip.
본 발명의 또다른 목적은 반도체칩의 크기가 동일하거나 또는 어느 한쪽이 더 크더라도 도전성와이어에는 어떠한 손상도 발생하지 않는 반도체패키지의 제공에 있다.It is another object of the present invention to provide a semiconductor package in which no damage occurs to the conductive wires even if the size of the semiconductor chip is the same or larger.
도1은 종래의 반도체패키지를 도시한 단면도이다.1 is a cross-sectional view showing a conventional semiconductor package.
도2 내지 도6은 본 발명의 제1 내지 제5실시예에 의한 반도체패키지를 도시한 단면도이다.2 to 6 are cross-sectional views showing semiconductor packages according to the first to fifth embodiments of the present invention.
- 도면중 주요 부호에 대한 설명 --Description of the main symbols in the drawings-
101~105; 본 발명에 의한 반도체패키지101-105; Semiconductor package according to the present invention
1; 제1반도체칩 1a,2a,11a; 제1면One; First semiconductor chip 1a, 2a, 11a; Front page
1b,2b,11b; 제2면 1c,2c; 입출력패드1b, 2b, 11b; Second page 1c, 2c; I / O pad
2; 제2반도체칩 3; 스터드범프2; Second semiconductor chip 3; Stud bump
10; 섭스트레이트 11; 수지층10; Suprate 11; Resin layer
12; 회로패턴 12a; 본드핑거12; Circuit pattern 12a; Bondfinger
12b; 볼랜드 13; 비아홀12b; Borland 13; Via Hole
14; 커버코트 20; 접착층14; Covercoat 20; Adhesive layer
30; 코팅층 40; 도전성와이어30; Coating layer 40; Conductive Wire
50; 봉지재 60; 도전성볼50; Encapsulant 60; Conductive ball
상기한 목적을 달성하기 위해 본 발명에 의한 반도체패키지는 제1면과 제2면을 가지고, 상기 제2면에는 다수의 입출력패드가 형성된 제1반도체칩과; 제1면과 제2면을 가지고, 상기 제2면에는 다수의 입출력패드가 형성되어 있으며, 상기 제1면이 상기 제1반도체칩의 제2면과 마주하여 위치된 제2반도체칩과; 상기 제1반도체칩의 제1면에 접착되어 있으며, 제1면과 제2면을 가지는 수지층을 중심으로 상기 제1면 및 제2면에는 다수의 회로패턴이 형성된 섭스트레이트와; 상기 제1반도체칩 및 제2반도체칩의 입출력패드와 섭스트레이트의 회로패턴을 상호 전기적으로 접속하는 다수의 도전성와이어와; 상기 제1반도체칩의 제2면과 상기 제2반도체칩의 제1면 사이에 접착되고, 두께는 상기 제1반도체칩의 입출력패드에 연결된 도전성와이어의 루프 하이트보다 두껍게 형성된 접착층과; 상기 제1반도체칩, 제2반도체칩, 도전성와이어 및 섭스트레이트의 일면을 봉지하는 봉지재와; 상기 섭스트레이트의 각 볼랜드에 접속된 도전성볼을 포함하여 이루어진 것을 특징으로 한다.In order to achieve the above object, the semiconductor package according to the present invention includes a first semiconductor chip having a first surface and a second surface, and a plurality of input / output pads formed on the second surface; A second semiconductor chip having a first surface and a second surface, wherein a plurality of input / output pads are formed on the second surface, the first surface facing the second surface of the first semiconductor chip; A substrate that is bonded to the first surface of the first semiconductor chip and has a plurality of circuit patterns formed on the first and second surfaces of the resin layer having a first surface and a second surface; A plurality of conductive wires electrically connecting the input / output pads of the first semiconductor chip and the second semiconductor chip and the circuit patterns of the substrate; An adhesive layer bonded between the second surface of the first semiconductor chip and the first surface of the second semiconductor chip, the adhesive layer being thicker than the loop height of the conductive wire connected to the input / output pad of the first semiconductor chip; An encapsulant for encapsulating one surface of the first semiconductor chip, the second semiconductor chip, the conductive wire, and the substrate; It characterized in that it comprises a conductive ball connected to each borland of the substrate.
또한, 상기한 목적을 달성하기 위해 본 발명에 의한 또다른 반도체패키지는 제1면과 제2면을 가지고, 상기 제2면에는 다수의 입출력패드가 형성된 제1반도체칩과; 제1면과 제2면을 가지고, 상기 제2면에는 다수의 입출력패드가 형성되어 있으며, 상기 제1면이 상기 제1반도체칩의 제2면과 마주하여 위치된 제2반도체칩과; 상기 제1반도체칩의 제1면에 접착되어 있으며, 제1면과 제2면을 가지는 수지층을 중심으로 상기 제1면 및 제2면에는 다수의 회로패턴이 형성된 섭스트레이트와; 상기 제1반도체칩 및 제2반도체칩의 입출력패드와 섭스트레이트의 회로패턴을 상호 전기적으로 접속하는 다수의 도전성와이어와; 상기 제1반도체칩의 제2면에 코팅된 코팅층과; 상기 제1반도체칩, 제2반도체칩, 도전성와이어 및 섭스트레이트의 일면을 봉지하는 봉지재와; 상기 섭스트레이트의 각 볼랜드에 접속된 도전성볼을 포함하여 이루어진 것을 특징으로 한다.In addition, another semiconductor package according to the present invention to achieve the above object has a first surface and a second surface, the second surface and the first semiconductor chip is formed with a plurality of input and output pads; A second semiconductor chip having a first surface and a second surface, wherein a plurality of input / output pads are formed on the second surface, the first surface facing the second surface of the first semiconductor chip; A substrate that is bonded to the first surface of the first semiconductor chip and has a plurality of circuit patterns formed on the first and second surfaces of the resin layer having a first surface and a second surface; A plurality of conductive wires electrically connecting the input / output pads of the first semiconductor chip and the second semiconductor chip and the circuit patterns of the substrate; A coating layer coated on a second surface of the first semiconductor chip; An encapsulant for encapsulating one surface of the first semiconductor chip, the second semiconductor chip, the conductive wire, and the substrate; It characterized in that it comprises a conductive ball connected to each borland of the substrate.
여기서, 상기 제2반도체칩의 크기는 제1반도체칩의 크기보다 작거나, 같거나 또는 큰 것중 어느 하나에 해당될 수 있다.Here, the size of the second semiconductor chip may correspond to any one of smaller, equal, or larger than the size of the first semiconductor chip.
상기 두번째 목적을 달성하기 위한 반도체패키지는 제1반도체칩의 제2면에 코팅된 코팅층 표면에 접착층이 개재되어 제2반도체칩의 제1면이 접착될 수 있다.The semiconductor package for achieving the second object may be the adhesive layer is interposed on the surface of the coating layer coated on the second surface of the first semiconductor chip may be bonded to the first surface of the second semiconductor chip.
상기 도전성와이어는 표면에 수지가 코팅된 코티드 와이어(Coated Wire)일 수 있다.The conductive wire may be a coated wire coated with a resin.
상기 섭스트레이트는 인쇄회로기판, 써킷테이프 또는 써킷필름중 어느 하나일 수 있다.The substrate may be one of a printed circuit board, a circuit tape, and a circuit film.
상기 접착층은 에폭시 수지, 필름 접착제 또는 양면 접착제중 어느 하나일 수 있다.The adhesive layer may be any one of an epoxy resin, a film adhesive, or a double-sided adhesive.
상기 접착층은 제1반도체칩의 제2면과 제2반도체칩의 제1면 사이에 대략 사각 격자형으로 형성될 수 있다.The adhesive layer may be formed in a substantially rectangular lattice form between the second surface of the first semiconductor chip and the first surface of the second semiconductor chip.
상기 두번째 목적을 달성하기 위한 반도체패키지는 상기 코팅층이 제1반도체칩 및 상기 제1반도체칩의 입출력패드에 접속된 도전성와이어 전체에 코팅되어 형성될 수 있으며, 상기 코팅층은 액상봉지재가 형성함이 바람직하다.The semiconductor package for achieving the second object may be formed by coating the coating layer on the entire conductive wire connected to the first semiconductor chip and the input and output pads of the first semiconductor chip, the coating layer is preferably formed of a liquid encapsulation material Do.
상기와 같이 하여 본 발명에 의한 반도체패키지는 제1반도체칩과 제2반도체칩 사이에 도전성와이어의 루프 하이트보다 큰 접착층 또는 코팅층이 형성되어 있음으로 도전성와이어의 손상을 최소화하게 되는 효과가 있다.As described above, the semiconductor package according to the present invention has an effect of minimizing damage to the conductive wire because an adhesive layer or coating layer larger than the loop height of the conductive wire is formed between the first semiconductor chip and the second semiconductor chip.
또한, 반도체칩의 크기에 관계하지 않고 여러 크기의 반도체칩을 다양하게 적층가능하므로 반도체칩 배치상의 어떠한 곤란함도 없고, 또한 섭스트레이트의 패턴 설계 자유도도 높아진다.In addition, since various sizes of semiconductor chips can be stacked regardless of the size of the semiconductor chips, there is no difficulty in the arrangement of semiconductor chips, and the degree of freedom in designing the patterns is increased.
이하 본 발명이 속한 기술분야에서 통상의 지식을 가진 자가 본 발명을 용이하게 실시할 수 있을 정도로 본 발명의 바람직한 실시예를 첨부된 도면을 참조하여 상세하게 설명하면 다음과 같다.Hereinafter, preferred embodiments of the present invention will be described in detail with reference to the accompanying drawings such that those skilled in the art can easily implement the present invention.
먼저 도2 및 도3을 참조하여 본 발명의 제1,2실시예에 의한 반도체패키지(101,102)를 설명한다.First, the semiconductor packages 101 and 102 according to the first and second embodiments of the present invention will be described with reference to FIGS. 2 and 3.
도시된 바와 같이 대략 평면인 제1면(1a)과 제2면(1b)을 갖고, 상기 제2면(1b)의 내주연 근처에는 다수의 입출력패드(1c)가 형성된 제1반도체칩(1)이 구비되어 있다.As illustrated, the first semiconductor chip 1 has a first plane 1a and a second plane 1b that are substantially planar, and a plurality of input / output pads 1c are formed near the inner circumference of the second surface 1b. ) Is provided.
상기 제1반도체칩(1)의 제2면(1b)에는 일정두께(5mil 이하)의 접착층(20)이 형성되어 있으며, 상기 접착층(20)은 하기 설명할 도전성와이어(40)의 루프하이트(Loop Height, 제1반도체칩(1)의 제2면(1b)에서부터 도전성와이어(40)의 가장 높은 만곡 지점까지의 높이)보다 두껍게 형성되어 있다.An adhesive layer 20 having a predetermined thickness (5 mil or less) is formed on the second surface 1b of the first semiconductor chip 1, and the adhesive layer 20 may include a loop height of a conductive wire 40 to be described below. Loop Height, the height from the second surface 1b of the first semiconductor chip 1 to the highest bending point of the conductive wire 40).
상기 접착층(20)은 도2에 도시된 바와 같이 제1반도체칩(1)의 제2면(1b) 전체 즉, 입출력패드(1c)를 포함하는 제2면(1b) 전체에 접착됨으로써 상기 입출력패드(1c)가 상기 접착층(20) 내측에 위치하게 된다. 물론, 상기 입출력패드(1c)에 접속된 도전성와이어(40) 역시 접착층(20) 내측에 위치하게 된다.As shown in FIG. 2, the adhesive layer 20 is bonded to the entire second surface 1b of the first semiconductor chip 1, that is, the entire second surface 1b including the input / output pad 1c. The pad 1c is positioned inside the adhesive layer 20. Of course, the conductive wire 40 connected to the input / output pad 1c is also positioned inside the adhesive layer 20.
또한 상기 접착층(20)은 도3에 도시된 바와 같이 제1반도체칩(1)의 입출력패드(1c)가 형성된 영역 부근에만 형성될 수도 있다. 즉, 상기 제1반도체칩(1)의 입출력패드(1c)를 따라서만 형성될 수도 있다.In addition, the adhesive layer 20 may be formed only near the region where the input / output pad 1c of the first semiconductor chip 1 is formed. That is, it may be formed only along the input / output pad 1c of the first semiconductor chip 1.
상기 접착층(20)으로서는 통상적인 에폭시 접착제, 필름 접착제 또는 양면 접착제 등이 사용될 수 있으며, 여기서 접착층(20)의 재질을 한정하는 것은 아니다.As the adhesive layer 20, a conventional epoxy adhesive, a film adhesive, or a double-sided adhesive may be used, but the material of the adhesive layer 20 is not limited thereto.
또한, 대략 평면인 제1면(2a)과 제2면(2b)을 가지고, 상기 제2면(2b)의 내주연 근처에는 다수의 입출력패드(2c)가 형성되어 있으며, 상기 제1면(2a)이 상기 접착층(20)에 접착된 제2반도체칩(2)이 구비되어 있다.In addition, the first surface 2a and the second surface 2b are substantially planar, and a plurality of input / output pads 2c are formed near the inner circumference of the second surface 2b, and the first surface ( 2a) is provided with a second semiconductor chip (2) bonded to the adhesive layer (20).
여기서 상기 제1반도체칩(1)과 제2반도체칩(2)을 상호 접착시키는 상기 접착층(20)에는 비전도성으로서 작은 알갱이 모양인 다수의 스페이서(Spacer)를 충진하여 사용할 수도 있다.(도시되지 않음) 상기와 같이 다수의 스페이서를 접착층(20)에 충진하였을 경우에는, 상기 제2반도체칩(2)이 제1반도체칩(1)과 수평하게 접착되는 장점이 있다. 즉, 상기 접착층(20) 자체에는 어느 정도의 탄성이 있기 때문에제2반도체칩(2)이 비뚤어진채 제1반도체칩(1)에 접착될 수 있는데 상기 스페이서가 충진된 접착층(20)은 이를 방지해준다.Here, the adhesive layer 20 which bonds the first semiconductor chip 1 and the second semiconductor chip 2 to each other may be filled with a plurality of non-conductive, granular spacers. When the plurality of spacers are filled in the adhesive layer 20 as described above, the second semiconductor chip 2 may be horizontally bonded to the first semiconductor chip 1. That is, since the adhesive layer 20 has a certain degree of elasticity, the second semiconductor chip 2 may be attached to the first semiconductor chip 1 while being skewed, but the adhesive layer 20 filled with the spacer prevents the same. Do it.
한편, 상기 제2반도체칩(2)의 크기 또는 부피는 제1반도체칩(1)의 크기 또는 부피보다 작거나, 같거나 또는 클 수 있다. 이와 같이 다양한 크기의 제2반도체칩(2)을 제1반도체칩(1)에 적층 가능한 이유는 전술한 바와 같이 접착층(20)의 두께가 도전성와이어(40)의 루프 하이트보다 크기 때문에, 상기 도전성와이어(40)와 상기 제2반도체칩(2)의 제1면(2a)이 상호 쇼트(Short)될 염려가 없기 때문이다.Meanwhile, the size or volume of the second semiconductor chip 2 may be smaller than, equal to, or larger than the size or volume of the first semiconductor chip 1. The reason for stacking the second semiconductor chip 2 of various sizes on the first semiconductor chip 1 is because the thickness of the adhesive layer 20 is larger than the loop height of the conductive wire 40 as described above. This is because the wire 40 and the first surface 2a of the second semiconductor chip 2 are not shorted to each other.
계속해서, 상기 제1반도체칩(1)의 제1면(1a)에는, 제1면(11a)과 제2면(11b)을 갖는 수지층(11)을 중심으로 그 양면에는 회로패턴(12)이 형성된 섭스트레이트(10)가 접착되어 있다.Subsequently, on the first surface 1a of the first semiconductor chip 1, the circuit pattern 12 is formed on both surfaces of the resin layer 11 having the first surface 11a and the second surface 11b. Is formed, and the substrate 10 is bonded.
상기 섭스트레이트(10)는 통상적인 인쇄회로기판(Printed Circuit Board), 써킷필름(Circuit Film), 써킷테이프(Circuit Tape) 또는 리드프레임(Lead Frame) 등이 사용될 수 있으며, 여기서는 상기 인쇄회로기판을 예로 하여 설명한다. 그러나 여기서 상기 섭스트레이트(10)를 상기 인쇄회로기판으로만 한정하는 것은 아니다.The substrate 10 may include a conventional printed circuit board, a circuit film, a circuit tape, a lead frame, or the like. Here, the printed circuit board may be used. It demonstrates as an example. However, the substrate 10 is not limited to the printed circuit board.
상기 섭스트레이트(10)는 제1면(11a)과 제2면(11b)을 갖는 수지층(11)을 중심으로 제1면(11a)에는 도전성 볼랜드(12b)를 포함하는 회로패턴(12)이 형성되어 있고, 제2면(11b)에는 본드핑거(12a)를 포함하는 회로패턴(12)이 형성되어 있다. 물론, 상기 본드핑거(12a) 및 볼랜드(12b)를 제외한 전 표면은 절연성커버코트(14)에 의해 코팅되어 있으며, 상기 본드핑거(12a)와 볼랜드(12b)는 수지층(11)을 관통하는 도전성비아홀(13)에 의해 상호 접속되어 있다.The substrate 10 includes a circuit pattern 12 including conductive ball lands 12b on the first surface 11a around the resin layer 11 having the first surface 11a and the second surface 11b. Is formed, and the circuit pattern 12 including the bond finger 12a is formed on the second surface 11b. Of course, all surfaces except for the bond finger 12a and the ball land 12b are coated by an insulating cover coat 14, and the bond finger 12a and the ball land 12b penetrate the resin layer 11. The conductive via holes 13 are connected to each other.
상기 제1반도체칩(1) 및 제2반도체칩(2)의 입출력패드(1c,2c)와 섭스트레이트(10)의 회로패턴(12)중 본드핑거(12a)는 골드와이어(Au Wire) 또는 알루미늄와이어(Al Wire)와 같은 도전성와이어(40)에 의해 상호 접속되어 있다.Bond fingers 12a of the circuit patterns 12 of the input / output pads 1c and 2c of the first semiconductor chip 1 and the second semiconductor chip 2 and the substrate 10 may be formed of gold wire or au wire. They are interconnected by conductive wires 40 such as aluminum wires.
또한, 상기 도전성와이어(40)는 표면에 절연성 고분자 수지(예를 들면, 폴리이미드)가 코팅된 코티드 와이어를 사용함으로써(도시되지 않음), 도전성와이어(40)와 반도체칩(1,2) 또는 도전성와이어(40) 상호간의 쇼트 문제를 완전히 해결할 수도 있다.In addition, the conductive wire 40 is a conductive wire 40 and the semiconductor chip (1, 2) by using a coated wire coated with an insulating polymer resin (eg, polyimide) on the surface (not shown) Alternatively, the shorting problem between the conductive wires 40 may be completely solved.
한편, 도2 및 도3에 도시된 바와 같이 상기 도전성와이어(40)의 루프 하이트는 각 제1반도체칩(1) 및 제2반도체칩(2)의 표면으로부터 매우 가깝게 형성함이 바람직하다.2 and 3, the loop height of the conductive wire 40 is preferably formed very close to the surfaces of the first semiconductor chip 1 and the second semiconductor chip 2.
이와 같이 도전성와이어(40)의 루프 하이트를 작게 형성하는 방법은 통상적인 리버스 와이어 본딩(Reverse Wire Bonding), 엣지 본딩(Wedge Bonding) 방법 등을 사용함으로써 가능하다.Thus, the method of forming the loop height of the conductive wire 40 small can be performed by using a conventional reverse wire bonding, edge bonding, or the like.
상기 리버스 와이어 본딩 방법의 일례를 간단히 설명하면 다음과 같다.An example of the reverse wire bonding method is briefly described as follows.
먼저, 제1반도체칩(1) 또는 제2반도체칩(2)의 입출력패드(1c,2c)상에 먼저 도전성와이어(40)로 스터드범프(3)(Stud Bump, 대략 볼(Ball) 모양)를 형성한 후, 도전성와이어(40)의 단부를 끊는다. 이어서 도전성와이어(40)의 일단을 섭스트레이트(10)의 본드핑거(12a)에 접속(First Bonding)하고, 그 타단을 제1반도체칩(1) 또는 제2반도체칩(2)의 입출력패드(2c)상에 형성된 스터드범프(3)에 스티치 본딩(Stitch bonding, Second Bonding이라고도 함)한다. 이러한 리버스 와이어 본딩은 종래와 마찬가지로 써모소닉 Au 볼 본딩(Thermosonic Au Ball Bonding, 본딩시 초음파 에너지와 동시에 본딩하고자 하는 영역에 열을 주어 본딩하는 방법)시 사용되는 캐필러리를 이용한다.First, on the input / output pads 1c and 2c of the first semiconductor chip 1 or the second semiconductor chip 2, the stud bump 3 (Stud Bump) is formed with the conductive wire 40 first. After forming, the end of the conductive wire 40 is cut off. Next, one end of the conductive wire 40 is first bonded to the bond finger 12a of the substrate 10, and the other end thereof is an input / output pad of the first semiconductor chip 1 or the second semiconductor chip 2. Stitch bonding (also called Stitch bonding, Second Bonding) is performed on the stud bump 3 formed on 2c). The reverse wire bonding uses a capillary used during thermosonic Au ball bonding (a method of bonding heat by bonding heat to an area to be bonded simultaneously with ultrasonic energy during bonding).
또한, 상기 리버스 와이어 본딩 대신에 상기 도전성와이어(40)의 단부를 제1반도체칩(1) 또는 제2반도체칩(2)의 입출력패드(1c,2c)상에 엣지(Wedge) 또는 리본(Ribbon) 본딩하여 접속하는 방법도 있다. 상기 엣지 또는 리본 본딩 방법은 주지된 바와 같이 종래의 울트라소닉 Al 엣지 본딩(Ultrasonic Al Wedge Bonding, 엣지에 초음파 진동 에너지만을 주어 그 마찰열로 본딩하는 방법으로서 제1,2본딩 영역 모두 엣지 형태로 형성됨)에 사용되는 엣지를 이용한다.In addition, instead of the reverse wire bonding, an end of the conductive wire 40 is edged or ribboned on the input / output pads 1c and 2c of the first semiconductor chip 1 or the second semiconductor chip 2. ) There is also a method of bonding and connecting. The edge or ribbon bonding method is conventionally known as Ultrasonic Al Wedge Bonding (Ultrasonic Al Wedge Bonding, a method of bonding only the ultrasonic vibration energy to the edge and bonding the frictional heat to the first and second bonding areas are formed in the edge shape) Use the edge used for.
이러한 본딩 방법에 의해 상기 도전성와이어(40)의 루프 하이트는 최대 5mil에서 최소 1mil(1mil=0.0254mm)까지 형성 가능하다.By this bonding method, the loop height of the conductive wire 40 can be formed from a maximum of 5 mils to a minimum of 1 mil (1 mil = 0.0254 mm).
물론, 상기 리버스 와이어 본딩, 엣지 본딩, 리본 본딩 방법 외에 종래의 노말 와이어 본딩(Normal Wire Bonding) 방법도 사용할 수 있는데, 상기와 같은 노말 와이어 본딩 방법을 이용했을 경우에는 상기 접착층(20)의 두께를 더욱 두껍게 해야 한다.Of course, in addition to the reverse wire bonding, edge bonding, and ribbon bonding methods, a conventional normal wire bonding method may also be used. When the normal wire bonding method is used as described above, the thickness of the adhesive layer 20 may be changed. It should be thicker.
계속해서, 상기 제1반도체칩(1), 제2반도체칩(2), 도전성와이어(40) 및 섭스트레이트(10)의 제2면(11b) 전체는 에폭시 몰딩 컴파운드(Epoxy Molding Compound) 또는 액상봉지재(Glop Top)와 같은 봉지재(50)로 봉지되어 외부 환경으로부터 보호가능하게 되어 있다.Subsequently, the whole of the first semiconductor chip 1, the second semiconductor chip 2, the conductive wire 40 and the second surface 11b of the substrate 10 may be formed of an epoxy molding compound or a liquid phase. It is encapsulated with an encapsulant 50 such as an encapsulant (Glop Top) to be protected from the external environment.
또한, 상기 섭스트레이트(10)의 제1면(11a)에 형성된 회로패턴(12)중 볼랜드(12b)에는 솔더볼(Solder Ball)과 같은 도전성볼(60)이 융착되어 마더보드(Mother Board)의 소정 패턴에 실장 가능하게 되어 있다.In addition, conductive balls 60 such as solder balls are welded to the ball lands 12b of the circuit patterns 12 formed on the first surface 11a of the substrate 10 so that the mother boards are connected to each other. It is possible to mount on a predetermined pattern.
도4 내지 도6은 본 발명의 제3 내지 제5실시예에 의한 반도체패키지(103,104,105)를 도시한 단면도이다.4 to 6 are cross-sectional views showing semiconductor packages 103, 104, and 105 according to the third to fifth embodiments of the present invention.
상기 제3 내지 제5실시예는 전술한 제1 및 제2실시에 의한 반도체패키지(101,102)와 유사하므로, 본 발명의 요지를 흐리지 않토록 그 차이점만을 설명하기로 한다.Since the third to fifth embodiments are similar to the semiconductor packages 101 and 102 according to the first and second embodiments described above, only the differences will be described so as not to obscure the subject matter of the present invention.
먼저 도4 및 도5를 참조하면, 제1반도체칩(1)과 제2반도체칩(2) 사이에는 코팅층(30) 및 접착층(20)이 형성되어 있다. 상기 코팅층(30)은 도4에 도시된 바와 같이 제1반도체칩(1)의 입출력패드(1c)에 접속된 도전성와이어(40)의 루프 하이트보다 충분히 크게 하거나 또는 도5에 도시된 바와 같이 입출력패드(1c)만을 덮을 정도의 두께(5mil 이하)로 할 수도 있다.4 and 5, a coating layer 30 and an adhesive layer 20 are formed between the first semiconductor chip 1 and the second semiconductor chip 2. The coating layer 30 is larger than the loop height of the conductive wire 40 connected to the input / output pad 1c of the first semiconductor chip 1 as shown in FIG. 4 or as shown in FIG. 5. It may be set to a thickness (5 mil or less) that covers only the pad 1c.
계속해서, 상기 코팅층(30)에는 접착층(20)을 개재하여 제2반도체칩(2)을 적층할 수 있다.Subsequently, the second semiconductor chip 2 may be stacked on the coating layer 30 via the adhesive layer 20.
한편, 상기와 같은 코팅층(30)은 통상적인 절연성 고분자 수지 예를 들면, 폴리이미드와 같은 수지로 할 수 있고, 또한 통상적인 액상 봉지재를 이용할 수도 있다.On the other hand, the coating layer 30 as described above may be made of a conventional insulating polymer resin, for example, a resin such as polyimide, and may also use a conventional liquid sealing material.
상기와 같이 코팅층(30)을 사용했을 경우에는 상기 제2반도체칩(2)을 제1반도체칩(1)의 제2면(1b) 상에 접착시 제1반도체칩(1)의 크랙(Crack)이나 충격에 의한 깨짐 현상을 방지할 수 있다.When the coating layer 30 is used as described above, the crack of the first semiconductor chip 1 when the second semiconductor chip 2 is adhered to the second surface 1b of the first semiconductor chip 1. ) And cracks due to impact can be prevented.
더불어, 도6에 도시된 본 발명의 제5실시예에 의한 반도체패키지(105)에 의하면 상기 코팅층(30)은 제1반도체칩(1) 및 제1반도체칩(1)의 입출력패드(1c)에 접속된 도전성와이어(40) 전체에 형성될 수도 있다. 이때, 상기 코팅층(30)은 액상 봉지재를 이용함이 바람직하다. 상기와 같이 액상 봉지재를 이용하여 코팅층(30)을 형성했을 경우에는 상기 코팅층(30)에 어느 정도의 점성이 있으므로, 상기 코팅층(30)에 제2반도체칩(2)을 접착시키고, 와이어 본딩하여 적층된 구조의 반도체패키지를 구비할 수도 있다. 물론, 상기 코팅층(30), 제2반도체칩(2) 및 그것의 입출력패드(2c)에 접속된 도전성와이어(40)는 에폭시 몰딩 컴파운드와 같은 봉지재(50)에 의해 봉지되어 있다.In addition, according to the semiconductor package 105 according to the fifth embodiment of the present invention shown in FIG. 6, the coating layer 30 may include the first semiconductor chip 1 and the input / output pad 1c of the first semiconductor chip 1. It may also be formed on the entire conductive wire 40 connected to it. At this time, it is preferable that the coating layer 30 uses a liquid encapsulant. When the coating layer 30 is formed using the liquid encapsulant as described above, since the coating layer 30 has some viscosity, the second semiconductor chip 2 is adhered to the coating layer 30, and wire bonding is performed. The semiconductor package may be provided in a stacked structure. Of course, the conductive wire 40 connected to the coating layer 30, the second semiconductor chip 2, and its input / output pad 2c is encapsulated by an encapsulant 50 such as an epoxy molding compound.
이상에서와 같이 본 발명은 비록 상기의 실시예에 한하여 설명하였지만 여기예만 한정되지 않으며, 본 발명의 범주 및 사상을 벗어나지 않는 범위내에서 여러가지로 변형된 실시예도 가능할 것이다.As described above, although the present invention has been described with reference to the above embodiments, the present invention is not limited thereto, and various modifications may be made without departing from the scope and spirit of the present invention.
따라서 본 발명에 의한 반도체패키지는 제1반도체칩과 제2반도체칩 사이에 도전성와이어의 루프 하이트보다 큰 접착층 또는 코팅층이 형성되어 있음으로 도전성와이어의 손상을 최소화하게 되는 효과가 있다.Therefore, the semiconductor package according to the present invention has an effect of minimizing damage to the conductive wire because an adhesive layer or coating layer larger than the loop height of the conductive wire is formed between the first semiconductor chip and the second semiconductor chip.
또한, 반도체칩의 크기에 관계하지 않고 여러 크기의 반도체칩을 다양하게 적층가능하므로 반도체칩 배치상의 어떠한 곤란함도 없고, 또한 섭스트레이트의 패턴 설계 자유도도 높아지는 효과가 있다.In addition, since various sizes of semiconductor chips can be stacked regardless of the size of the semiconductor chips, there is no difficulty in arranging semiconductor chips, and the degree of freedom in designing the pattern of the substrate is also increased.
또한, 액상봉지재로 이루어진 코팅층을 사용했을 경우, 그 코팅층 자체에 점성이 있으므로, 별도의 접착층 없이 제2반도체칩을 상기 코팅층에 직접 적층할 수 있는 효과도 있다.In addition, when a coating layer made of a liquid encapsulant is used, since the coating layer itself is viscous, there is an effect that the second semiconductor chip can be directly stacked on the coating layer without a separate adhesive layer.
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| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| KR20030075860A (en) * | 2002-03-21 | 2003-09-26 | 삼성전자주식회사 | Structure for stacking semiconductor chip and stacking method |
| KR20030095035A (en) * | 2002-06-11 | 2003-12-18 | 주식회사 칩팩코리아 | Chip size stack package using resin-spacer |
| KR100472286B1 (en) * | 2002-09-13 | 2005-03-10 | 삼성전자주식회사 | Semiconductor chip package that adhesive tape is attached on the bonding wire |
| KR100520602B1 (en) * | 2001-05-19 | 2005-10-10 | 앰코 테크놀로지 코리아 주식회사 | Stacking structure of semiconductor chip |
| KR100698527B1 (en) * | 2005-08-11 | 2007-03-22 | 삼성전자주식회사 | Chip stack package having pillar bumps using metal bumps and method for manufacturing same |
| US7633144B1 (en) | 2006-05-24 | 2009-12-15 | Amkor Technology, Inc. | Semiconductor package |
| US7675180B1 (en) | 2006-02-17 | 2010-03-09 | Amkor Technology, Inc. | Stacked electronic component package having film-on-wire spacer |
| US7863723B2 (en) | 2001-03-09 | 2011-01-04 | Amkor Technology, Inc. | Adhesive on wire stacked semiconductor package |
| KR101046251B1 (en) * | 2009-05-19 | 2011-07-04 | 앰코 테크놀로지 코리아 주식회사 | Stacked Semiconductor Packages |
| KR20160034655A (en) * | 2014-09-22 | 2016-03-30 | 에스티에스반도체통신 주식회사 | Wire bonding structure and method thereof |
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Cited By (12)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US7863723B2 (en) | 2001-03-09 | 2011-01-04 | Amkor Technology, Inc. | Adhesive on wire stacked semiconductor package |
| US8143727B2 (en) | 2001-03-09 | 2012-03-27 | Amkor Technology, Inc. | Adhesive on wire stacked semiconductor package |
| KR100520602B1 (en) * | 2001-05-19 | 2005-10-10 | 앰코 테크놀로지 코리아 주식회사 | Stacking structure of semiconductor chip |
| KR20030075860A (en) * | 2002-03-21 | 2003-09-26 | 삼성전자주식회사 | Structure for stacking semiconductor chip and stacking method |
| KR20030095035A (en) * | 2002-06-11 | 2003-12-18 | 주식회사 칩팩코리아 | Chip size stack package using resin-spacer |
| KR100472286B1 (en) * | 2002-09-13 | 2005-03-10 | 삼성전자주식회사 | Semiconductor chip package that adhesive tape is attached on the bonding wire |
| KR100698527B1 (en) * | 2005-08-11 | 2007-03-22 | 삼성전자주식회사 | Chip stack package having pillar bumps using metal bumps and method for manufacturing same |
| US7675180B1 (en) | 2006-02-17 | 2010-03-09 | Amkor Technology, Inc. | Stacked electronic component package having film-on-wire spacer |
| US7633144B1 (en) | 2006-05-24 | 2009-12-15 | Amkor Technology, Inc. | Semiconductor package |
| US8129849B1 (en) | 2006-05-24 | 2012-03-06 | Amkor Technology, Inc. | Method of making semiconductor package with adhering portion |
| KR101046251B1 (en) * | 2009-05-19 | 2011-07-04 | 앰코 테크놀로지 코리아 주식회사 | Stacked Semiconductor Packages |
| KR20160034655A (en) * | 2014-09-22 | 2016-03-30 | 에스티에스반도체통신 주식회사 | Wire bonding structure and method thereof |
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