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KR19990001427A - Reflective plate of reflective liquid crystal display device and manufacturing method thereof - Google Patents

Reflective plate of reflective liquid crystal display device and manufacturing method thereof Download PDF

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Publication number
KR19990001427A
KR19990001427A KR1019970024742A KR19970024742A KR19990001427A KR 19990001427 A KR19990001427 A KR 19990001427A KR 1019970024742 A KR1019970024742 A KR 1019970024742A KR 19970024742 A KR19970024742 A KR 19970024742A KR 19990001427 A KR19990001427 A KR 19990001427A
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South Korea
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liquid crystal
reflective
polymer resin
crystal display
display device
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KR1019970024742A
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Korean (ko)
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김용범
문정민
배성준
전재홍
안선홍
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구자홍
엘지전자 주식회사
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Priority to KR1019970024742A priority Critical patent/KR19990001427A/en
Priority to US09/097,372 priority patent/US6459463B2/en
Publication of KR19990001427A publication Critical patent/KR19990001427A/en
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Abstract

액정표시소자의 반사판 제조방법은, 기판 위에 스핀코팅법 또는 롤코팅법에 의해 감광성의 중합체 수지로 포토레지스트막을 형성하는 단계와, 복수의 홀을 갖는 마스크로 상기 레지스트막을 블로킹한 후, 윗쪽으로부터 자외선을 조사하는 단계와, 상기 중합체 수지를 부분현상(partially development)하여 연속적인 굴곡을 형성하는 단계와, 스퍼터법 등에 의해 알루미늄 또는 은과 같은 물질로 반사전극을 형성하는 단계로 이루어진다.In the method of manufacturing a reflecting plate of a liquid crystal display device, forming a photoresist film with a photosensitive polymer resin on a substrate by spin coating or roll coating, blocking the resist film with a mask having a plurality of holes, and then applying ultraviolet light from above. Irradiating the light, and partially developing the polymer resin to form continuous bends, and forming a reflective electrode from a material such as aluminum or silver by a sputtering method.

Description

반사형 액정표시소자의 반사판 및 그것의 제조방법Reflective plate of reflective liquid crystal display device and manufacturing method thereof

본 발명은 반사형 액정표시소자에 관한 것으로, 특히 오버코트층을 필요로 하지 않는 표면이 연속적인 굴곡부로 형성된 반사형 액정표시소자의 반사판 및 그 반사판의 제조방법에 관한 것이다.BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a reflective liquid crystal display device, and more particularly, to a reflective plate of a reflective liquid crystal display device in which a surface which does not require an overcoat layer is formed of continuous curved portions, and a method of manufacturing the reflective plate.

사용자에게 높은 광효율과 우수한 시야각 특성을 제공하기 위하여, 최근에는 단순한 거울(mirror)의 형태를 벗어나 다양한 구조의 반사판에 대한 연구가 활발하게 진행되고 있으며, 이러한 연구에 부합하는 대표적인 것으로는 요철형상의 반사판을 이용하는 액정표시소자가 있다. 이러한 요철형상의 반사판을 이용하는 액정표시소자는 반사판의 경사면에 상응하여 반사되는 빛의 산란특성을 이용하여 광효율을 높이는 것에 주안점을 두고 있다.In order to provide high light efficiency and excellent viewing angle characteristics to users, researches on reflecting plates of various structures are being actively conducted beyond the form of simple mirrors. There is a liquid crystal display device using. The liquid crystal display device using the uneven reflector is focused on enhancing the light efficiency by using the scattering characteristics of light reflected on the inclined surface of the reflector.

도 1a∼ 도 1f는 상기한 액정표시소자에 사용되는 반사판의 제조방법을 나타내는 도면으로서, 먼저, 도 1a에 나타내듯이 기판(10) 위에 스핀코팅법 또는 롤코팅법에 의해 중합체 수지로 포토레지스트막(11)을 형성하고, 도 1b에 나타내듯이 복수의 홀(A, B)을 갖는 마스크(12)로 상기 레지스트막(11)을 블로킹한 후, 윗쪽으로부터 자외선(도면의 화살표)을 조사한다. 그 결과 도 1c에 나타내듯이, 기판(10) 위에는 서로 상이한 형태를 갖는 복수의 볼록부가 형성된다. 계속해서 도 1d에 나타내듯이, 열처리로 볼록부를 연화하여 각 볼록부가 서로 다른 높이를 갖도록 한다. 그 후, 도 1e에 나타내듯이 스핀코팅법에 의해 중합체 수지 등으로 오버코트층(13)을 형성한 후, 도 1f에 나타내듯이 스퍼터법에 의해 고반사율의 알루미늄 또는 은과 같은 물질로 반사판의 기능을 갖는 반사전극(14)을 형성한다.1A to 1F illustrate a method of manufacturing a reflecting plate used in the liquid crystal display device described above. First, as shown in FIG. 1A, a photoresist film is formed of a polymer resin on a substrate 10 by spin coating or roll coating. (11) is formed and the resist film 11 is blocked with the mask 12 having a plurality of holes A and B as shown in Fig. 1B, and then ultraviolet rays (arrows in the drawing) are irradiated from above. As a result, as shown in FIG. 1C, a plurality of convex portions having different shapes are formed on the substrate 10. Subsequently, as shown in Fig. 1D, the convex portions are softened by heat treatment so that the convex portions have different heights. Thereafter, the overcoat layer 13 is formed of a polymer resin or the like by spin coating as shown in FIG. 1E, and then the function of the reflector is made of a material such as aluminum or silver having a high reflectance by the sputtering method as shown in FIG. 1F. The reflective electrode 14 is formed.

그러나, 상기한 반사판의 제조방법은 중합체 수지의 현상, 볼록부 측면을 둥글게 하는 열처리 및 오버코트층 형성 등의 복잡한 공정을 포함하므로 제조가 매우 까다로울 뿐만 아니라 공정수의 증가로 인한 제조가격의 상승을 초래하였다.However, the above manufacturing method of the reflector includes complicated processes such as the development of polymer resin, heat treatment to round the convex side, and formation of an overcoat layer, which is not only difficult to manufacture, but also increases the manufacturing cost due to the increase in the number of processes. It was.

본 발명은 상기한 종래 기술의 문제점을 해결하기 위한 것으로, 기판 상에 형성된 포토레지스트막을 부분적으로 현상하여 연속적인 굴곡부를 형성하는 것에 의해 간단한 공정으로 반사형 액정표시소자의 반사판을 제공하는 것을 목적으로 한다.SUMMARY OF THE INVENTION The present invention has been made to solve the above problems of the prior art, and an object thereof is to provide a reflective plate of a reflective liquid crystal display device in a simple process by partially developing a photoresist film formed on a substrate to form a continuous bent portion. do.

본 발명의 다른 목적은, 상기한 반사판을 이용하여 고반사휘도를 갖는 액정표시소자를 제공하는 것이다.Another object of the present invention is to provide a liquid crystal display device having high reflectance using the above-described reflector.

상기한 목적을 달성하기 위하여, 본 발명에 따른 액정표시소자의 반사판은 부분현상된 중합체 수지가 연속적인 굴곡부의 형태를 갖고, 그 위에 반사전극이 형성된 구조를 갖는다.In order to achieve the above object, the reflective plate of the liquid crystal display device according to the present invention has a structure in which the partially developed polymer resin has a continuous curved portion, and a reflective electrode is formed thereon.

상기한 구조를 갖는 반사판의 제조방법은 먼저, 기판 위에 스핀코팅법 또는 롤코팅법에 의해 중합체 수지로 포토레지스트막을 형성하는 단계와, 복수의 홀(A', B')을 갖는 마스크로 상기 레지스트막을 블로킹한 후, 윗쪽으로부터 자외선을 조사하는 단계와, 상기 마스크에 의해 패턴된 레지스트막을 열처리한 후, 상기 열처리에 의해 연화된 레지스트막에 대해 부분적인 현상을 실시하여 연속적인 굴곡부를 형성하는 단계와, 스퍼터법에 의해 고반사율의 알루미늄 또는 은과 같은 물질로 반사판의 기능을 갖는 반사전극을 형성하는 단계로 이루어진다.The method of manufacturing a reflecting plate having the above structure includes first forming a photoresist film with a polymer resin on a substrate by spin coating or roll coating, and then applying the resist with a mask having a plurality of holes A 'and B'. After blocking the film, irradiating ultraviolet rays from above, heat treating the resist film patterned by the mask, and then performing partial development on the resist film softened by the heat treatment to form a continuous bent portion; And forming a reflecting electrode having a function of a reflecting plate by a material such as aluminum or silver having a high reflectance by the sputtering method.

상기한 다른 목적을 달성하기 위하여, 본 발명에 따른 액정표시소자는 한쌍의 절연성 기판 사이에 액정층을 형성하고, 한쪽 기판과 상기 액정층 사이에 본 발명에 따르는 반사판을 형성하여 완성된다.In order to achieve the above another object, the liquid crystal display device according to the present invention is completed by forming a liquid crystal layer between a pair of insulating substrates, and forming a reflective plate according to the present invention between one substrate and the liquid crystal layer.

도 1a∼도 1f는, 종래 액정표시소자에 사용되는 반사판의 제조방법을 나타내는 도면.1A to 1F are views showing a manufacturing method of a reflecting plate used in a conventional liquid crystal display element.

도 2a∼도 2b는, 본 발명에 따른 액정표시소자에 사용되는 반사판의 제조방법을 나타내는 도면.2A to 2B are views showing a manufacturing method of a reflecting plate used in the liquid crystal display device according to the present invention.

도 3은, 도 2의 반사판을 사용한 액정표시소자의 단면도.3 is a cross-sectional view of a liquid crystal display device using the reflector of FIG. 2.

- 도면의 주요 부분에 대한 부호의 설명 --Explanation of symbols for the main parts of the drawing-

110 : 하판 111 : 포토레지스트막110 lower plate 111 photoresist film

112 : 마스크 113 : 상판112: mask 113: top plate

114 : 반사전극 115 : 액정층114: reflective electrode 115: liquid crystal layer

이하, 본 발명의 바람직한 실시예를 도면을 참조하여 상세하게 설명한다.Hereinafter, preferred embodiments of the present invention will be described in detail with reference to the drawings.

도 2a∼도 2d는 본 발명을 따르는 액정표시소자에 사용되는 반사판의 제조방법을 나타내는 도면으로서, 먼저, 도 2a에 나타내듯이 기판(110) 위에 스핀코팅법 또는 롤코팅법에 의해 중합체 수지로 포토레지스트막(111)을 형성하고, 도 2b에 나타내듯이 복수의 홀(A', B')을 갖는 마스크(112)로 상기 레지스트막(111)을 블로킹한 후, 윗쪽으로부터 자외선(도면의 화살표)을 조사한다. 그 후, 도 2c에 나타내듯이, 상기 패턴(pattern)된 레지스트막(111)을 열처리한 후, 부분적인 현상을 실시하면 연속적인 굴곡이 형성된다. 계속해서 도 2d에 나타내듯이, 스퍼터법에 의해 고반사율의 알루미늄 또는 은과 같은 물질로 반사판의 기능을 갖는 반사전극(114)을 형성한다.2A to 2D illustrate a method of manufacturing a reflecting plate used in a liquid crystal display device according to the present invention. First, as shown in FIG. 2A, a photo of a polymer resin is formed on a substrate 110 by spin coating or roll coating. After forming the resist film 111 and blocking the resist film 111 with a mask 112 having a plurality of holes A 'and B', as shown in FIG. 2B, ultraviolet rays (arrows in the drawing) from above. Investigate Thereafter, as shown in Fig. 2C, after the heat treatment of the patterned resist film 111, partial development is performed to form continuous bends. Subsequently, as shown in FIG. 2D, a reflective electrode 114 having a function of a reflecting plate is formed of a material such as aluminum or silver having a high reflectance by the sputtering method.

상기한 공정에서 반사판의 각 굴곡을 서로 다른 두개 이상의 크기로 하고, 굴곡간의 거리를 균일하게 하면 입사된 빛이 반사될 때 빛의 간섭을 방지할 수 있다. 이때, 연속적인 굴곡을 형성하기 위한 공정변수로는 중합체 수지의 종류(예를 들면, JNPC수지와 같이 자외선에 의한 분해정도가 낮은 수지), 자외선의 노광량, 현상시간 등을 들수 있다.In the above process, each bending of the reflecting plate is made of two or more different sizes, and the distance between the bendings is uniform to prevent interference of light when the incident light is reflected. In this case, the process variables for forming the continuous bend may include a kind of polymer resin (for example, a resin having a low degree of decomposition by ultraviolet rays such as JNPC resin), an exposure amount of ultraviolet rays, and a developing time.

도 3은 본 발명에 따르는 반사판을 이용한 액정표시소자의 단면도를 나타내는 도면으로서, 도면에 나타내듯이, 하판(110)상에는 연속적인 굴곡부를 갖는 중합체 수지막(111')이 형성되어 있고, 상기 중합체 수지막(111')과 접하여 반사전극(114)이 형성되고, 상판(113)과 하판(110) 사이에는 액정층(115)이 형성된 구조를 갖는다.3 is a cross-sectional view of a liquid crystal display device using a reflecting plate according to the present invention. As shown in the drawing, a polymer resin film 111 ′ having a continuous bent portion is formed on the lower plate 110. The reflective electrode 114 is formed in contact with the film 111 ′, and the liquid crystal layer 115 is formed between the upper plate 113 and the lower plate 110.

또한, 상기한 반사판을 갖는 액정표시소자는 특정한 동작모드에 한정되지 않고 GH(Guest-Host)모드, TN(Twisted Nematic)모드 또는 HAN(Homeotropic Alignment Nematic)모드 등에도 적용될 수 있다.In addition, the liquid crystal display having the reflective plate is not limited to a specific operation mode, but may be applied to a GH (Guest-Host) mode, a twisted nematic (TN) mode, a homeotropic alignment nematic (HAN) mode, and the like.

본 발명을 따르는 액정표시소자는 종래 반사판의 제조공정에서 오버코트층 도포공정 및 사진식각공정을 배제하므로써 제조가 매우 간단할 뿐만 아니라 공정수의 감소로 인한 코스트의 하락을 가능하게 한다.The liquid crystal display device according to the present invention is not only very easy to manufacture but also to reduce the cost due to the reduction of the number of processes by eliminating the overcoat layer coating process and the photolithography process in the conventional manufacturing process of the reflecting plate.

Claims (13)

절연성 기판 상에 연속적인 굴곡부를 갖는 중합체 수지막과,A polymer resin film having continuous bent portions on an insulating substrate, 상기 중합체 수지막의 형상을 따라 요철형성되어 입사하는 빛을 반사하는 반사전극으로 이루어진 반사형 액정표시소자의 반사판.Reflecting plate of the reflective liquid crystal display device consisting of a reflective electrode reflecting the incident light is formed irregularities along the shape of the polymer resin film. 제1항에 있어서, 상기 연속적인 굴곡부는 상기 중합체 수지막의 표면에 대한 부분적인 현상에 의해 이루어진 것을 특징으로 하는 반사형 액정표시소자의 반사판.The reflective plate of claim 1, wherein the continuous curved portion is formed by a partial phenomenon on the surface of the polymer resin film. 제1항에 있어서, 상기 중합체 수지막이 감광성인 것을 특징으로 하는 반사형 액정표시소자의 반사판.The reflective plate of a reflective liquid crystal display device according to claim 1, wherein the polymer resin film is photosensitive. 기판을 준비하는 단계와,Preparing a substrate; 상기 기판 위에 중합체 수지로 포토레지스트막을 형성하는 단계와,Forming a photoresist film on the substrate with a polymer resin, 크기가 다른 복수의 홀을 갖는 마스크로 상기 포토레지스트막을 블로킹한 후, 자외선을 조사하여 요철을 형성하는 단계와,Blocking the photoresist film with a mask having a plurality of holes of different sizes, and then irradiating ultraviolet rays to form irregularities; 상기 요철이 서로 다른 높이를 갖도록 열처리하는 단계와,Heat-treating the irregularities to have different heights; 상기 요철 상에 반사전극을 형성하는 단계로 이루어진 액정표시소자의 반사판 제조방법.The reflective plate manufacturing method of the liquid crystal display device comprising the step of forming a reflective electrode on the irregularities. 제4항에 있어서, 상기 중합체 수지막은 감광성 수지인 것을 특징으로 하는 액정표시소자의 반사판 제조방법.The method of claim 4, wherein the polymer resin film is a photosensitive resin. 제4항에 있어서, 상기 포토레지스트막은 롤코팅 또는 스핀코팅에 의해 형성된 것을 특징으로 하는 액정표시소자의 반사판 제조방법.The method of claim 4, wherein the photoresist film is formed by roll coating or spin coating. 제4항에 있어서, 상기 열처리 단계 후, 부분현상하는 단계를 추가로 포함하는 것을 특징으로 하는 액정표시소자의 반사판 제조방법.5. The method of claim 4, further comprising partially developing the heat treatment step. 제4항에 있어서, 상기 반사전극의 형성은 스퍼터법에 의해 수행되는 것을 특징으로 하는 액정표시소자의 반사판 제조방법.The method of claim 4, wherein the reflective electrode is formed by a sputtering method. 제4항에 있어서, 상기 반사전극이 알루미늄 또는 은인 것을 특징으로 하는 액정표시소자의 반사판 제조방법.The method of claim 4, wherein the reflective electrode is made of aluminum or silver. 제1 및 제2기판과,The first and second substrates, 상기 제1기판 상에 연속적인 굴곡으로 형성된 중합체 수지막과,A polymer resin film formed by continuous bending on the first substrate, 상기 중합체 수지막과 접하여 형성된 반사전극과,A reflective electrode formed in contact with the polymer resin film; 상기 제1기판과 제2기판 사이에 형성된 액정층으로 이루어진 액정표시소자.And a liquid crystal layer formed between the first substrate and the second substrate. 제10항에 있어서, 상기 연속적인 굴곡은 부분적인 현상에 의해 형성된 것을 특징으로 하는 반사형 액정표시소자.The reflective liquid crystal display device according to claim 10, wherein the continuous bending is formed by a partial phenomenon. 제10항에 있어서, 상기 중합체 수지막은 감광성인 것을 특징으로 하는 반사형 액정표시소자.The reflective liquid crystal display device according to claim 10, wherein the polymer resin film is photosensitive. 제10항에 있어서, 상기 반사전극이 알루미늄 또는 은인 것을 특징으로 하는 액정표시소자.The liquid crystal display device according to claim 10, wherein the reflective electrode is aluminum or silver.
KR1019970024742A 1997-06-14 1997-06-14 Reflective plate of reflective liquid crystal display device and manufacturing method thereof Ceased KR19990001427A (en)

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Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR100441915B1 (en) * 2002-01-10 2004-07-27 에이유 오프트로닉스 코퍼레이션 A process for manufacturing reflective tft-lcd with rough diffuser
KR100502793B1 (en) * 1997-09-25 2005-10-21 삼성전자주식회사 Multi-zone vertical alignment twisted nematic liquid crystal display substrate using organic insulating film and liquid crystal display device including the same
KR100669097B1 (en) * 2000-05-19 2007-01-16 엘지.필립스 엘시디 주식회사 Manufacturing method of liquid crystal display device
KR100745412B1 (en) * 2001-04-17 2007-08-03 엘지.필립스 엘시디 주식회사 Liquid crystal display device having a reflecting plate and manufacturing method thereof
KR100746860B1 (en) * 2001-01-31 2007-08-07 엔이씨 엘씨디 테크놀로지스, 엘티디. Liquid crystal display device and method of fabricating the same
KR100907422B1 (en) * 2002-12-31 2009-07-10 엘지디스플레이 주식회사 Reflector used in liquid crystal display device and manufacturing method thereof

Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR100502793B1 (en) * 1997-09-25 2005-10-21 삼성전자주식회사 Multi-zone vertical alignment twisted nematic liquid crystal display substrate using organic insulating film and liquid crystal display device including the same
KR100669097B1 (en) * 2000-05-19 2007-01-16 엘지.필립스 엘시디 주식회사 Manufacturing method of liquid crystal display device
KR100746860B1 (en) * 2001-01-31 2007-08-07 엔이씨 엘씨디 테크놀로지스, 엘티디. Liquid crystal display device and method of fabricating the same
KR100745412B1 (en) * 2001-04-17 2007-08-03 엘지.필립스 엘시디 주식회사 Liquid crystal display device having a reflecting plate and manufacturing method thereof
KR100441915B1 (en) * 2002-01-10 2004-07-27 에이유 오프트로닉스 코퍼레이션 A process for manufacturing reflective tft-lcd with rough diffuser
KR100907422B1 (en) * 2002-12-31 2009-07-10 엘지디스플레이 주식회사 Reflector used in liquid crystal display device and manufacturing method thereof

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