KR102618825B1 - 베이 내 가스 누출 방지를 위한 에어락 장치 및 제어 시스템 - Google Patents
베이 내 가스 누출 방지를 위한 에어락 장치 및 제어 시스템 Download PDFInfo
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- KR102618825B1 KR102618825B1 KR1020200001319A KR20200001319A KR102618825B1 KR 102618825 B1 KR102618825 B1 KR 102618825B1 KR 1020200001319 A KR1020200001319 A KR 1020200001319A KR 20200001319 A KR20200001319 A KR 20200001319A KR 102618825 B1 KR102618825 B1 KR 102618825B1
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- 238000001514 detection method Methods 0.000 claims abstract description 27
- 235000012431 wafers Nutrition 0.000 abstract description 5
- 230000032258 transport Effects 0.000 abstract 1
- 238000010586 diagram Methods 0.000 description 4
- 238000000034 method Methods 0.000 description 2
- 238000013459 approach Methods 0.000 description 1
- 229910052785 arsenic Inorganic materials 0.000 description 1
- RQNWIZPPADIBDY-UHFFFAOYSA-N arsenic atom Chemical compound [As] RQNWIZPPADIBDY-UHFFFAOYSA-N 0.000 description 1
- 230000000903 blocking effect Effects 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 239000004065 semiconductor Substances 0.000 description 1
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67011—Apparatus for manufacture or treatment
- H01L21/67126—Apparatus for sealing, encapsulating, glassing, decapsulating or the like
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B65—CONVEYING; PACKING; STORING; HANDLING THIN OR FILAMENTARY MATERIAL
- B65G—TRANSPORT OR STORAGE DEVICES, e.g. CONVEYORS FOR LOADING OR TIPPING, SHOP CONVEYOR SYSTEMS OR PNEUMATIC TUBE CONVEYORS
- B65G1/00—Storing articles, individually or in orderly arrangement, in warehouses or magazines
- B65G1/02—Storage devices
- B65G1/04—Storage devices mechanical
- B65G1/0457—Storage devices mechanical with suspended load carriers
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67242—Apparatus for monitoring, sorting or marking
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/677—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations
- H01L21/67703—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations between different workstations
- H01L21/67706—Mechanical details, e.g. roller, belt
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/677—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations
- H01L21/67703—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations between different workstations
- H01L21/67724—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations between different workstations by means of a cart or a vehicule
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/677—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations
- H01L21/67703—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations between different workstations
- H01L21/6773—Conveying cassettes, containers or carriers
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/677—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations
- H01L21/67703—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations between different workstations
- H01L21/67733—Overhead conveying
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B65—CONVEYING; PACKING; STORING; HANDLING THIN OR FILAMENTARY MATERIAL
- B65G—TRANSPORT OR STORAGE DEVICES, e.g. CONVEYORS FOR LOADING OR TIPPING, SHOP CONVEYOR SYSTEMS OR PNEUMATIC TUBE CONVEYORS
- B65G2201/00—Indexing codes relating to handling devices, e.g. conveyors, characterised by the type of product or load being conveyed or handled
- B65G2201/02—Articles
- B65G2201/0297—Wafer cassette
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- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Mechanical Engineering (AREA)
- Pressure Vessels And Lids Thereof (AREA)
- Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
Abstract
Description
도 2는 몇몇 실시예에 따른 에어락 장치의 측면도이다.
도 3은 몇몇 실시예에 따른 에어락 장치의 사시도이다.
도 4는 몇몇 실시예에 따른 에어락 제어 시스템의 흐름도이다.
도 5는 몇몇 실시예에 따른 에어락 장치의 측면도이다.
도 6는 몇몇 실시예에 따른 에어락 장치의 사시도이다.
도 7는 몇몇 실시예에 따른 에어락 장치의 측면도이다.
도 8은 몇몇 실시예에 따른 에어락 장치의 측면도이다.
102: 에어락 제어 시스템 130: 에어락부
140: 제1 배기부 192: 제1 베이
194: 제2 베이 200: 에어락 장치
Claims (10)
- 제1 베이 및 제2 베이 사이에서, 웨이퍼가 수납된 캐리어를 이송하는 이송체;
상기 제1 베이 및 상기 제2 베이를 연결하며, 상기 이송체가 주행하는 주행로;
상기 제1 베이 및 상기 제2 베이를 연결하며, 상기 주행로를 둘러싸면서 상기 주행로를 따라 배치되는 에어락부;
상기 에어락부 내의 공기를 배기하는 배기부;
상기 에어락부와 상기 제1 베이를 연결하는 제1 입구를 개폐하는 제1 문;
상기 에어락부와 상기 제2 베이를 연결하는 제2 입구를 개폐하는 제2 문;
상기 제1 베이에 위치한 제1 압력 감지 센서;
상기 제2 베이에 위치한 제2 압력 감지 센서;
상기 에어락부 내에 위치한 제3 압력 감지 센서;
상기 제1 베이에 위치한 제1 동작 감지 센서; 및
상기 제1 압력 감지 센서, 상기 제2 압력 감지 센서, 상기 제3 압력 감지 센서 및 상기 제1 동작 감지 센서를 통해 압력 및 동작을 감지하여, 상기 제1 문, 상기 제2 문 및 상기 배기부를 제어하는 에어락 제어 장치를 포함하는 에어락(Air lock) 제어 시스템. - 제 1항에 있어서,
상기 제1 문 및 상기 제2 문은 동시에 열리지 않는 에어락 제어 시스템. - 제 1항에 있어서,
상기 제1 동작 감지 센서에 의하여 상기 이송체가 감지되는 경우,
상기 제3 압력 감지 센서에 의해 측정된 압력이 상기 제1 압력 감지 센서에 의해 측정된 압력보다 낮은 경우, 상기 제1 문이 열리고,
상기 제3 압력 감지 센서에 의해 측정된 압력이 상기 제1 압력 감지 센서에 의해 측정된 압력 이상인 경우, 제1 배기부가 작동하여 상기 제3 압력 감지 센서에 의해 측정된 압력이 상기 제1 압력 감지 센서에 의해 측정된 압력보다 낮아진 후에 상기 제1 문이 열리는 에어락 제어 시스템. - 제 3항에 있어서,
상기 제3 압력 감지 센서에 의해 측정된 압력이 상기 제2 압력 감지 센서에 의해 측정된 압력보다 낮은 경우, 상기 제2 문이 열리고,
상기 제3 압력 감지 센서에 의해 측정된 압력이 상기 제2 압력 감지 센서에 의해 측정된 압력 이상인 경우, 제1 배기부가 작동하여 상기 제3 압력 감지 센서에 의해 측정된 압력이 상기 제2 압력 감지 센서에 의해 측정된 압력보다 낮아진 후에 상기 제2 문이 열리는 에어락 제어 시스템. - 제1 베이 및 제2 베이 사이에서, 웨이퍼가 수납된 캐리어를 이송하는 이송체;
상기 제1 베이 및 상기 제2 베이를 연결하며, 상기 이송체가 주행하는 주행로;
상기 제1 베이 및 상기 제2 베이를 연결하며, 상기 주행로를 둘러싸면서 상기 주행로를 따라 배치되는 에어락부; 및
상기 에어락부 내의 공기를 배기하는 배기부를 포함하고,
상기 배기부는, 상기 에어락부 내의 압력을 상기 제1 베이 및 상기 제2 베이의 압력보다 낮게 하도록 구성된 에어락 장치. - 제 5항에 있어서,
상기 배기부는 배기구, 배기 통로 및 배기 펌프를 포함하고, 배기구는 상기 에어락부 내에 위치하는 에어락 장치. - 제 6항에 있어서,
상기 배기구는 상기 주행로를 따라 상기 에어락부에 복수 개가 위치하는 에어락 장치. - 제 6항에 있어서,
상기 배기구는 상기 주행로를 둘러싸면서 상기 에어락부에 복수 개가 위치하는 에어락 장치. - 제 5항에 있어서,
상기 제1 베이에 위치한 제1 압력 감지 센서 및 상기 제2 베이에 위치한 제2 압력 감지 센서 및 상기 에어락부 내에 위치한 제3 압력 감지 센서를 더 포함하는 에어락 장치. - 제 9항에 있어서,
상기 배기부는, 상기 제3 압력 감지 센서에서 측정한 압력을 상기 제1 압력 감지 센서 및 상기 제2 압력 감지 센서에서 측정한 압력보다 낮게 하도록 구성된 에어락 장치.
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| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| KR1020200001319A KR102618825B1 (ko) | 2020-01-06 | 2020-01-06 | 베이 내 가스 누출 방지를 위한 에어락 장치 및 제어 시스템 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| KR1020200001319A KR102618825B1 (ko) | 2020-01-06 | 2020-01-06 | 베이 내 가스 누출 방지를 위한 에어락 장치 및 제어 시스템 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| KR20210088153A KR20210088153A (ko) | 2021-07-14 |
| KR102618825B1 true KR102618825B1 (ko) | 2023-12-27 |
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| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| KR1020200001319A Active KR102618825B1 (ko) | 2020-01-06 | 2020-01-06 | 베이 내 가스 누출 방지를 위한 에어락 장치 및 제어 시스템 |
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| Country | Link |
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| KR (1) | KR102618825B1 (ko) |
Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP3153323B2 (ja) | 1992-03-31 | 2001-04-09 | 東京エレクトロン株式会社 | 気密室の常圧復帰装置及びその常圧復帰方法 |
| JP3486821B2 (ja) | 1994-01-21 | 2004-01-13 | 東京エレクトロン株式会社 | 処理装置及び処理装置内の被処理体の搬送方法 |
| JP2009062604A (ja) | 2007-09-10 | 2009-03-26 | Tokyo Electron Ltd | 真空処理システムおよび基板搬送方法 |
Family Cites Families (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE10164175B4 (de) * | 2001-12-27 | 2004-02-12 | Infineon Technologies Ag | Prozeßgerät mit zwei Raumeinheiten und einer die zwei Raumeinheiten verbindenden dritten Raumeinheit mit jeweils einer gegenüber der Umgebung verminderten Dichte kontaminierter Teilchen und Verfahren zum Betrieb des Prozeßgerätes |
-
2020
- 2020-01-06 KR KR1020200001319A patent/KR102618825B1/ko active Active
Patent Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP3153323B2 (ja) | 1992-03-31 | 2001-04-09 | 東京エレクトロン株式会社 | 気密室の常圧復帰装置及びその常圧復帰方法 |
| JP3486821B2 (ja) | 1994-01-21 | 2004-01-13 | 東京エレクトロン株式会社 | 処理装置及び処理装置内の被処理体の搬送方法 |
| JP2009062604A (ja) | 2007-09-10 | 2009-03-26 | Tokyo Electron Ltd | 真空処理システムおよび基板搬送方法 |
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| Publication number | Publication date |
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| KR20210088153A (ko) | 2021-07-14 |
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