KR101336532B1 - 전사체 및 그의 제조방법 - Google Patents
전사체 및 그의 제조방법 Download PDFInfo
- Publication number
- KR101336532B1 KR101336532B1 KR1020117022552A KR20117022552A KR101336532B1 KR 101336532 B1 KR101336532 B1 KR 101336532B1 KR 1020117022552 A KR1020117022552 A KR 1020117022552A KR 20117022552 A KR20117022552 A KR 20117022552A KR 101336532 B1 KR101336532 B1 KR 101336532B1
- Authority
- KR
- South Korea
- Prior art keywords
- fluorine
- poly
- ethylene
- carbon atoms
- mold
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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- 238000012546 transfer Methods 0.000 title claims abstract description 140
- 238000004519 manufacturing process Methods 0.000 title claims description 33
- 229910052731 fluorine Inorganic materials 0.000 claims abstract description 265
- 239000011737 fluorine Substances 0.000 claims abstract description 236
- YCKRFDGAMUMZLT-UHFFFAOYSA-N Fluorine atom Chemical compound [F] YCKRFDGAMUMZLT-UHFFFAOYSA-N 0.000 claims abstract description 224
- 229920000089 Cyclic olefin copolymer Polymers 0.000 claims abstract description 94
- 125000001153 fluoro group Chemical group F* 0.000 claims abstract description 37
- 239000000126 substance Substances 0.000 claims abstract description 6
- 230000008859 change Effects 0.000 claims description 76
- 125000004432 carbon atom Chemical group C* 0.000 claims description 74
- 238000003860 storage Methods 0.000 claims description 71
- 238000000034 method Methods 0.000 claims description 68
- 230000009477 glass transition Effects 0.000 claims description 66
- 239000000178 monomer Substances 0.000 claims description 48
- 238000000576 coating method Methods 0.000 claims description 47
- 239000011248 coating agent Substances 0.000 claims description 42
- 125000000217 alkyl group Chemical group 0.000 claims description 36
- 239000001257 hydrogen Substances 0.000 claims description 36
- 229910052739 hydrogen Inorganic materials 0.000 claims description 36
- 239000002904 solvent Substances 0.000 claims description 35
- 125000004183 alkoxy alkyl group Chemical group 0.000 claims description 34
- 125000003545 alkoxy group Chemical group 0.000 claims description 34
- 239000000203 mixture Substances 0.000 claims description 34
- 238000005259 measurement Methods 0.000 claims description 26
- 239000007787 solid Substances 0.000 claims description 23
- 239000000463 material Substances 0.000 claims description 21
- 238000010438 heat treatment Methods 0.000 claims description 17
- 239000003960 organic solvent Substances 0.000 claims description 16
- 239000011342 resin composition Substances 0.000 claims description 14
- 238000001704 evaporation Methods 0.000 claims description 12
- 230000008569 process Effects 0.000 claims description 11
- 125000000027 (C1-C10) alkoxy group Chemical group 0.000 claims description 8
- 125000004435 hydrogen atom Chemical class [H]* 0.000 claims description 7
- 125000000008 (C1-C10) alkyl group Chemical group 0.000 claims description 5
- 230000001678 irradiating effect Effects 0.000 claims description 4
- 239000005977 Ethylene Substances 0.000 description 330
- -1 polytetrafluoroethylene Polymers 0.000 description 204
- VGGSQFUCUMXWEO-UHFFFAOYSA-N Ethene Chemical compound C=C VGGSQFUCUMXWEO-UHFFFAOYSA-N 0.000 description 133
- 229920000642 polymer Polymers 0.000 description 75
- 239000000243 solution Substances 0.000 description 71
- 239000010408 film Substances 0.000 description 70
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 56
- WYURNTSHIVDZCO-UHFFFAOYSA-N Tetrahydrofuran Chemical compound C1CCOC1 WYURNTSHIVDZCO-UHFFFAOYSA-N 0.000 description 44
- 238000005984 hydrogenation reaction Methods 0.000 description 43
- 125000002023 trifluoromethyl group Chemical group FC(F)(F)* 0.000 description 32
- 229910052757 nitrogen Inorganic materials 0.000 description 28
- YCOZIPAWZNQLMR-UHFFFAOYSA-N pentadecane Chemical compound CCCCCCCCCCCCCCC YCOZIPAWZNQLMR-UHFFFAOYSA-N 0.000 description 28
- 229920005989 resin Polymers 0.000 description 27
- 239000011347 resin Substances 0.000 description 27
- 150000001336 alkenes Chemical group 0.000 description 24
- 239000003054 catalyst Substances 0.000 description 24
- 239000004713 Cyclic olefin copolymer Substances 0.000 description 23
- OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical compound OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 description 23
- YLQBMQCUIZJEEH-UHFFFAOYSA-N tetrahydrofuran Natural products C=1C=COC=1 YLQBMQCUIZJEEH-UHFFFAOYSA-N 0.000 description 23
- JHIVVAPYMSGYDF-UHFFFAOYSA-N cyclohexanone Chemical compound O=C1CCCCC1 JHIVVAPYMSGYDF-UHFFFAOYSA-N 0.000 description 22
- JRZJOMJEPLMPRA-UHFFFAOYSA-N olefin Natural products CCCCCCCC=C JRZJOMJEPLMPRA-UHFFFAOYSA-N 0.000 description 22
- 238000009826 distribution Methods 0.000 description 19
- 238000001035 drying Methods 0.000 description 18
- 238000007152 ring opening metathesis polymerisation reaction Methods 0.000 description 18
- KDLHZDBZIXYQEI-UHFFFAOYSA-N Palladium Chemical compound [Pd] KDLHZDBZIXYQEI-UHFFFAOYSA-N 0.000 description 16
- UHOVQNZJYSORNB-UHFFFAOYSA-N Benzene Chemical compound C1=CC=CC=C1 UHOVQNZJYSORNB-UHFFFAOYSA-N 0.000 description 15
- 230000015572 biosynthetic process Effects 0.000 description 15
- 239000000843 powder Substances 0.000 description 15
- 238000003786 synthesis reaction Methods 0.000 description 15
- LIKMAJRDDDTEIG-UHFFFAOYSA-N 1-hexene Chemical compound CCCCC=C LIKMAJRDDDTEIG-UHFFFAOYSA-N 0.000 description 14
- 239000003999 initiator Substances 0.000 description 14
- 239000000758 substrate Substances 0.000 description 13
- 125000000876 trifluoromethoxy group Chemical group FC(F)(F)O* 0.000 description 13
- XEKOWRVHYACXOJ-UHFFFAOYSA-N Ethyl acetate Chemical compound CCOC(C)=O XEKOWRVHYACXOJ-UHFFFAOYSA-N 0.000 description 12
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 description 12
- 229920001038 ethylene copolymer Polymers 0.000 description 12
- 239000011521 glass Substances 0.000 description 12
- ZQBFAOFFOQMSGJ-UHFFFAOYSA-N hexafluorobenzene Chemical compound FC1=C(F)C(F)=C(F)C(F)=C1F ZQBFAOFFOQMSGJ-UHFFFAOYSA-N 0.000 description 12
- IVSZLXZYQVIEFR-UHFFFAOYSA-N m-xylene Chemical group CC1=CC=CC(C)=C1 IVSZLXZYQVIEFR-UHFFFAOYSA-N 0.000 description 12
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 description 11
- 238000001816 cooling Methods 0.000 description 11
- 230000003287 optical effect Effects 0.000 description 11
- 238000002360 preparation method Methods 0.000 description 11
- 150000001875 compounds Chemical class 0.000 description 10
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 9
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 description 9
- 150000002431 hydrogen Chemical class 0.000 description 9
- VLKZOEOYAKHREP-UHFFFAOYSA-N n-Hexane Chemical compound CCCCCC VLKZOEOYAKHREP-UHFFFAOYSA-N 0.000 description 9
- 229910052710 silicon Inorganic materials 0.000 description 9
- 239000010703 silicon Substances 0.000 description 9
- 238000006243 chemical reaction Methods 0.000 description 8
- 150000001993 dienes Chemical class 0.000 description 8
- 239000003822 epoxy resin Substances 0.000 description 8
- 229940052303 ethers for general anesthesia Drugs 0.000 description 8
- 239000010410 layer Substances 0.000 description 8
- 229910052763 palladium Inorganic materials 0.000 description 8
- 229920000647 polyepoxide Polymers 0.000 description 8
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N silicon dioxide Inorganic materials O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 8
- 150000001338 aliphatic hydrocarbons Chemical class 0.000 description 7
- 230000000052 comparative effect Effects 0.000 description 7
- 150000002170 ethers Chemical class 0.000 description 7
- 229910010272 inorganic material Inorganic materials 0.000 description 7
- 239000011147 inorganic material Substances 0.000 description 7
- 238000000465 moulding Methods 0.000 description 7
- 238000005507 spraying Methods 0.000 description 7
- GETTZEONDQJALK-UHFFFAOYSA-N (trifluoromethyl)benzene Chemical compound FC(F)(F)C1=CC=CC=C1 GETTZEONDQJALK-UHFFFAOYSA-N 0.000 description 6
- HEDRZPFGACZZDS-UHFFFAOYSA-N Chloroform Chemical compound ClC(Cl)Cl HEDRZPFGACZZDS-UHFFFAOYSA-N 0.000 description 6
- RTZKZFJDLAIYFH-UHFFFAOYSA-N Diethyl ether Chemical compound CCOCC RTZKZFJDLAIYFH-UHFFFAOYSA-N 0.000 description 6
- IMNFDUFMRHMDMM-UHFFFAOYSA-N N-Heptane Chemical compound CCCCCCC IMNFDUFMRHMDMM-UHFFFAOYSA-N 0.000 description 6
- HEDRZPFGACZZDS-MICDWDOJSA-N Trichloro(2H)methane Chemical compound [2H]C(Cl)(Cl)Cl HEDRZPFGACZZDS-MICDWDOJSA-N 0.000 description 6
- 150000004945 aromatic hydrocarbons Chemical class 0.000 description 6
- MVPPADPHJFYWMZ-UHFFFAOYSA-N chlorobenzene Chemical compound ClC1=CC=CC=C1 MVPPADPHJFYWMZ-UHFFFAOYSA-N 0.000 description 6
- DIOQZVSQGTUSAI-UHFFFAOYSA-N decane Chemical compound CCCCCCCCCC DIOQZVSQGTUSAI-UHFFFAOYSA-N 0.000 description 6
- 230000000694 effects Effects 0.000 description 6
- 125000000956 methoxy group Chemical group [H]C([H])([H])O* 0.000 description 6
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 description 6
- 238000000016 photochemical curing Methods 0.000 description 6
- 239000002685 polymerization catalyst Substances 0.000 description 6
- 238000006116 polymerization reaction Methods 0.000 description 6
- GOYDNIKZWGIXJT-UHFFFAOYSA-N 1,2-difluorobenzene Chemical compound FC1=CC=CC=C1F GOYDNIKZWGIXJT-UHFFFAOYSA-N 0.000 description 5
- DKPFZGUDAPQIHT-UHFFFAOYSA-N Butyl acetate Natural products CCCCOC(C)=O DKPFZGUDAPQIHT-UHFFFAOYSA-N 0.000 description 5
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 5
- OFBQJSOFQDEBGM-UHFFFAOYSA-N Pentane Chemical compound CCCCC OFBQJSOFQDEBGM-UHFFFAOYSA-N 0.000 description 5
- 150000002148 esters Chemical class 0.000 description 5
- FUZZWVXGSFPDMH-UHFFFAOYSA-M hexanoate Chemical compound CCCCCC([O-])=O FUZZWVXGSFPDMH-UHFFFAOYSA-M 0.000 description 5
- 150000002430 hydrocarbons Chemical group 0.000 description 5
- 125000001449 isopropyl group Chemical group [H]C([H])([H])C([H])(*)C([H])([H])[H] 0.000 description 5
- QSHDDOUJBYECFT-UHFFFAOYSA-N mercury Chemical compound [Hg] QSHDDOUJBYECFT-UHFFFAOYSA-N 0.000 description 5
- 229910052753 mercury Inorganic materials 0.000 description 5
- AHHWIHXENZJRFG-UHFFFAOYSA-N oxetane Chemical compound C1COC1 AHHWIHXENZJRFG-UHFFFAOYSA-N 0.000 description 5
- 150000003254 radicals Chemical class 0.000 description 5
- 238000004528 spin coating Methods 0.000 description 5
- 229910052723 transition metal Inorganic materials 0.000 description 5
- QPFMBZIOSGYJDE-UHFFFAOYSA-N 1,1,2,2-tetrachloroethane Chemical compound ClC(Cl)C(Cl)Cl QPFMBZIOSGYJDE-UHFFFAOYSA-N 0.000 description 4
- QEGNUYASOUJEHD-UHFFFAOYSA-N 1,1-dimethylcyclohexane Chemical compound CC1(C)CCCCC1 QEGNUYASOUJEHD-UHFFFAOYSA-N 0.000 description 4
- RGSFGYAAUTVSQA-UHFFFAOYSA-N Cyclopentane Chemical compound C1CCCC1 RGSFGYAAUTVSQA-UHFFFAOYSA-N 0.000 description 4
- YMWUJEATGCHHMB-UHFFFAOYSA-N Dichloromethane Chemical compound ClCCl YMWUJEATGCHHMB-UHFFFAOYSA-N 0.000 description 4
- XTHFKEDIFFGKHM-UHFFFAOYSA-N Dimethoxyethane Chemical compound COCCOC XTHFKEDIFFGKHM-UHFFFAOYSA-N 0.000 description 4
- YNQLUTRBYVCPMQ-UHFFFAOYSA-N Ethylbenzene Chemical compound CCC1=CC=CC=C1 YNQLUTRBYVCPMQ-UHFFFAOYSA-N 0.000 description 4
- 229920006362 Teflon® Polymers 0.000 description 4
- IISBACLAFKSPIT-UHFFFAOYSA-N bisphenol A Chemical compound C=1C=C(O)C=CC=1C(C)(C)C1=CC=C(O)C=C1 IISBACLAFKSPIT-UHFFFAOYSA-N 0.000 description 4
- 125000004106 butoxy group Chemical group [*]OC([H])([H])C([H])([H])C(C([H])([H])[H])([H])[H] 0.000 description 4
- 150000001768 cations Chemical class 0.000 description 4
- 239000003795 chemical substances by application Substances 0.000 description 4
- 229920001577 copolymer Polymers 0.000 description 4
- NNBZCPXTIHJBJL-UHFFFAOYSA-N decalin Chemical compound C1CCCC2CCCCC21 NNBZCPXTIHJBJL-UHFFFAOYSA-N 0.000 description 4
- 238000007607 die coating method Methods 0.000 description 4
- 238000003618 dip coating Methods 0.000 description 4
- 238000001914 filtration Methods 0.000 description 4
- 238000005227 gel permeation chromatography Methods 0.000 description 4
- 150000008282 halocarbons Chemical class 0.000 description 4
- OTTZHAVKAVGASB-UHFFFAOYSA-N hept-2-ene Chemical compound CCCCC=CC OTTZHAVKAVGASB-UHFFFAOYSA-N 0.000 description 4
- UAEPNZWRGJTJPN-UHFFFAOYSA-N methylcyclohexane Chemical compound CC1CCCCC1 UAEPNZWRGJTJPN-UHFFFAOYSA-N 0.000 description 4
- PYLWMHQQBFSUBP-UHFFFAOYSA-N monofluorobenzene Chemical compound FC1=CC=CC=C1 PYLWMHQQBFSUBP-UHFFFAOYSA-N 0.000 description 4
- YKYONYBAUNKHLG-UHFFFAOYSA-N n-Propyl acetate Natural products CCCOC(C)=O YKYONYBAUNKHLG-UHFFFAOYSA-N 0.000 description 4
- WYURNTSHIVDZCO-SVYQBANQSA-N oxolane-d8 Chemical compound [2H]C1([2H])OC([2H])([2H])C([2H])([2H])C1([2H])[2H] WYURNTSHIVDZCO-SVYQBANQSA-N 0.000 description 4
- 229960004624 perflexane Drugs 0.000 description 4
- FYJQJMIEZVMYSD-UHFFFAOYSA-N perfluoro-2-butyltetrahydrofuran Chemical compound FC(F)(F)C(F)(F)C(F)(F)C(F)(F)C1(F)OC(F)(F)C(F)(F)C1(F)F FYJQJMIEZVMYSD-UHFFFAOYSA-N 0.000 description 4
- ZJIJAJXFLBMLCK-UHFFFAOYSA-N perfluorohexane Chemical compound FC(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)F ZJIJAJXFLBMLCK-UHFFFAOYSA-N 0.000 description 4
- 125000005005 perfluorohexyl group Chemical group FC(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)* 0.000 description 4
- 238000003825 pressing Methods 0.000 description 4
- 229940090181 propyl acetate Drugs 0.000 description 4
- 125000001436 propyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])[H] 0.000 description 4
- 239000010453 quartz Substances 0.000 description 4
- 229920002050 silicone resin Polymers 0.000 description 4
- 238000013518 transcription Methods 0.000 description 4
- 230000035897 transcription Effects 0.000 description 4
- NQPDZGIKBAWPEJ-UHFFFAOYSA-N valeric acid Chemical compound CCCCC(O)=O NQPDZGIKBAWPEJ-UHFFFAOYSA-N 0.000 description 4
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 4
- FKTXDTWDCPTPHK-UHFFFAOYSA-N 1,1,1,2,3,3,3-heptafluoropropane Chemical group FC(F)(F)[C](F)C(F)(F)F FKTXDTWDCPTPHK-UHFFFAOYSA-N 0.000 description 3
- RELMFMZEBKVZJC-UHFFFAOYSA-N 1,2,3-trichlorobenzene Chemical compound ClC1=CC=CC(Cl)=C1Cl RELMFMZEBKVZJC-UHFFFAOYSA-N 0.000 description 3
- DURPTKYDGMDSBL-UHFFFAOYSA-N 1-butoxybutane Chemical compound CCCCOCCCC DURPTKYDGMDSBL-UHFFFAOYSA-N 0.000 description 3
- DVFVNJHIVAPTMS-UHFFFAOYSA-N 1-methyl-2-(trifluoromethyl)benzene Chemical compound CC1=CC=CC=C1C(F)(F)F DVFVNJHIVAPTMS-UHFFFAOYSA-N 0.000 description 3
- PQHHGTDOGKMDGU-UHFFFAOYSA-N 2,3-difluoro-2,3-bis(trifluoromethyl)bicyclo[2.2.1]hept-5-ene Chemical compound C1C2C=CC1C(C(F)(F)F)(F)C2(F)C(F)(F)F PQHHGTDOGKMDGU-UHFFFAOYSA-N 0.000 description 3
- 239000004593 Epoxy Substances 0.000 description 3
- CTQNGGLPUBDAKN-UHFFFAOYSA-N O-Xylene Chemical compound CC1=CC=CC=C1C CTQNGGLPUBDAKN-UHFFFAOYSA-N 0.000 description 3
- 239000004952 Polyamide Substances 0.000 description 3
- 239000004642 Polyimide Substances 0.000 description 3
- 239000004809 Teflon Substances 0.000 description 3
- 125000001931 aliphatic group Chemical group 0.000 description 3
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 3
- 238000009835 boiling Methods 0.000 description 3
- 238000010538 cationic polymerization reaction Methods 0.000 description 3
- 239000011247 coating layer Substances 0.000 description 3
- 230000007423 decrease Effects 0.000 description 3
- 230000006866 deterioration Effects 0.000 description 3
- 125000001028 difluoromethyl group Chemical group [H]C(F)(F)* 0.000 description 3
- 238000007598 dipping method Methods 0.000 description 3
- 125000001495 ethyl group Chemical group [H]C([H])([H])C([H])([H])* 0.000 description 3
- 125000004785 fluoromethoxy group Chemical group [H]C([H])(F)O* 0.000 description 3
- 125000004216 fluoromethyl group Chemical group [H]C([H])(F)* 0.000 description 3
- 238000007731 hot pressing Methods 0.000 description 3
- 150000002576 ketones Chemical class 0.000 description 3
- 239000007769 metal material Substances 0.000 description 3
- 239000006082 mold release agent Substances 0.000 description 3
- 239000001301 oxygen Substances 0.000 description 3
- 229910052760 oxygen Inorganic materials 0.000 description 3
- 125000006340 pentafluoro ethyl group Chemical group FC(F)(F)C(F)(F)* 0.000 description 3
- 125000005003 perfluorobutyl group Chemical group FC(F)(F)C(F)(F)C(F)(F)C(F)(F)* 0.000 description 3
- 125000005460 perfluorocycloalkyl group Chemical group 0.000 description 3
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 description 3
- 229920002647 polyamide Polymers 0.000 description 3
- 239000004417 polycarbonate Substances 0.000 description 3
- 229920000515 polycarbonate Polymers 0.000 description 3
- 229920000728 polyester Polymers 0.000 description 3
- 229920001721 polyimide Polymers 0.000 description 3
- 229920000193 polymethacrylate Polymers 0.000 description 3
- 229920001955 polyphenylene ether Polymers 0.000 description 3
- 125000005767 propoxymethyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])[#8]C([H])([H])* 0.000 description 3
- 238000007142 ring opening reaction Methods 0.000 description 3
- 229910001220 stainless steel Inorganic materials 0.000 description 3
- 239000010935 stainless steel Substances 0.000 description 3
- 229920001187 thermosetting polymer Polymers 0.000 description 3
- 125000004205 trifluoroethyl group Chemical group [H]C([H])(*)C(F)(F)F 0.000 description 3
- 239000008096 xylene Substances 0.000 description 3
- HJIAMFHSAAEUKR-UHFFFAOYSA-N (2-hydroxyphenyl)-phenylmethanone Chemical compound OC1=CC=CC=C1C(=O)C1=CC=CC=C1 HJIAMFHSAAEUKR-UHFFFAOYSA-N 0.000 description 2
- FPPBYJBOHUMXJN-UHFFFAOYSA-N 1,1,2-trifluorocyclohexane Chemical compound FC1CCCCC1(F)F FPPBYJBOHUMXJN-UHFFFAOYSA-N 0.000 description 2
- SCYULBFZEHDVBN-UHFFFAOYSA-N 1,1-Dichloroethane Chemical compound CC(Cl)Cl SCYULBFZEHDVBN-UHFFFAOYSA-N 0.000 description 2
- WSLDOOZREJYCGB-UHFFFAOYSA-N 1,2-Dichloroethane Chemical group ClCCCl WSLDOOZREJYCGB-UHFFFAOYSA-N 0.000 description 2
- RYHBNJHYFVUHQT-UHFFFAOYSA-N 1,4-Dioxane Chemical compound C1COCCO1 RYHBNJHYFVUHQT-UHFFFAOYSA-N 0.000 description 2
- KWKAKUADMBZCLK-UHFFFAOYSA-N 1-octene Chemical compound CCCCCCC=C KWKAKUADMBZCLK-UHFFFAOYSA-N 0.000 description 2
- RNVJDIGFTGLKCE-UHFFFAOYSA-N 2,3,3-trifluoro-2-(trifluoromethyl)bicyclo[2.2.1]hept-5-ene Chemical compound C1C2C=CC1C(C(F)(F)F)(F)C2(F)F RNVJDIGFTGLKCE-UHFFFAOYSA-N 0.000 description 2
- OZAIFHULBGXAKX-UHFFFAOYSA-N 2-(2-cyanopropan-2-yldiazenyl)-2-methylpropanenitrile Chemical compound N#CC(C)(C)N=NC(C)(C)C#N OZAIFHULBGXAKX-UHFFFAOYSA-N 0.000 description 2
- LEJBBGNFPAFPKQ-UHFFFAOYSA-N 2-(2-prop-2-enoyloxyethoxy)ethyl prop-2-enoate Chemical compound C=CC(=O)OCCOCCOC(=O)C=C LEJBBGNFPAFPKQ-UHFFFAOYSA-N 0.000 description 2
- JUXZNIDKDPLYBY-UHFFFAOYSA-N 3-ethyl-3-(phenoxymethyl)oxetane Chemical compound C=1C=CC=CC=1OCC1(CC)COC1 JUXZNIDKDPLYBY-UHFFFAOYSA-N 0.000 description 2
- LMIOYAVXLAOXJI-UHFFFAOYSA-N 3-ethyl-3-[[4-[(3-ethyloxetan-3-yl)methoxymethyl]phenyl]methoxymethyl]oxetane Chemical compound C=1C=C(COCC2(CC)COC2)C=CC=1COCC1(CC)COC1 LMIOYAVXLAOXJI-UHFFFAOYSA-N 0.000 description 2
- VVBLNCFGVYUYGU-UHFFFAOYSA-N 4,4'-Bis(dimethylamino)benzophenone Chemical compound C1=CC(N(C)C)=CC=C1C(=O)C1=CC=C(N(C)C)C=C1 VVBLNCFGVYUYGU-UHFFFAOYSA-N 0.000 description 2
- CSCPPACGZOOCGX-UHFFFAOYSA-N Acetone Chemical compound CC(C)=O CSCPPACGZOOCGX-UHFFFAOYSA-N 0.000 description 2
- KWOLFJPFCHCOCG-UHFFFAOYSA-N Acetophenone Chemical compound CC(=O)C1=CC=CC=C1 KWOLFJPFCHCOCG-UHFFFAOYSA-N 0.000 description 2
- NIXOWILDQLNWCW-UHFFFAOYSA-M Acrylate Chemical compound [O-]C(=O)C=C NIXOWILDQLNWCW-UHFFFAOYSA-M 0.000 description 2
- CIWBSHSKHKDKBQ-JLAZNSOCSA-N Ascorbic acid Chemical compound OC[C@H](O)[C@H]1OC(=O)C(O)=C1O CIWBSHSKHKDKBQ-JLAZNSOCSA-N 0.000 description 2
- 0 C*CC1C(C(CC23)*(C(*)*)=*2C=*)C3*(*)C(CCC(C)(C)*)C1 Chemical compound C*CC1C(C(CC23)*(C(*)*)=*2C=*)C3*(*)C(CCC(C)(C)*)C1 0.000 description 2
- 238000000018 DNA microarray Methods 0.000 description 2
- XEEYBQQBJWHFJM-UHFFFAOYSA-N Iron Chemical compound [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 description 2
- 239000002841 Lewis acid Substances 0.000 description 2
- CERQOIWHTDAKMF-UHFFFAOYSA-N Methacrylic acid Chemical compound CC(=C)C(O)=O CERQOIWHTDAKMF-UHFFFAOYSA-N 0.000 description 2
- NQSMEZJWJJVYOI-UHFFFAOYSA-N Methyl 2-benzoylbenzoate Chemical compound COC(=O)C1=CC=CC=C1C(=O)C1=CC=CC=C1 NQSMEZJWJJVYOI-UHFFFAOYSA-N 0.000 description 2
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- 238000000425 proton nuclear magnetic resonance spectrum Methods 0.000 description 1
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Abstract
Description
Claims (12)
- 몰드 표면의 미세 패턴이 전사된 전사체로서,
화학식 1로 표시되는 반복 구조 단위를 함유하고, 또한 불소 원자 함유율이 40∼75질량%인 불소 함유 환상 올레핀 폴리머로 이루어지는 것을 특징으로 하는 전사체.
[화학식 1]
(화학식 1 중, R1∼R4 중 적어도 하나는 불소, 불소를 함유하는 탄소수 1∼10의 알킬, 불소를 함유하는 탄소수 1∼10의 알콕시, 또는 불소를 함유하는 탄소수 2∼10의 알콕시알킬이다. R1∼R4가 불소를 함유하지 않는 기인 경우, R1∼R4는 수소, 탄소수 1∼10의 알킬, 탄소수 1∼10의 알콕시, 또는 탄소수 2∼10의 알콕시알킬로부터 선택된다. R1∼R4는 동일하거나 상이할 수 있다. R1∼R4가 서로 결합하여 환 구조를 형성하고 있더라도 좋다. ) - 제 1 항에 있어서,
주파수 1Hz, 승온 속도 3℃/분의 인장 모드 고체 점탄성 측정에 있어서의 상기 불소 함유 환상 올레핀 폴리머의 저장 탄성률 또는 손실 탄성률이, 유리 전이 온도 이상의 온도 영역에서의 온도 변화에 대하여 -1∼0MPa/℃의 범위로 변화되는 영역을 갖는 것을 특징으로 하는 전사체. - 제 2 항에 있어서,
상기 불소 함유 환상 올레핀 폴리머의 유리 전이 온도 이상의 온도 영역에서의 저장 탄성률 또는 손실 탄성률의 상기 변화 영역이, 0.1MPa 이상의 저장 탄성률 영역 또는 손실 탄성률 영역에 있는 것을 특징으로 하는 전사체. - 제 1 항에 있어서,
상기 불소 함유 환상 올레핀 폴리머가, 상기 화학식 1로 표시되는 반복 구조 단위[A]와, 화학식 2로 표시되는 반복 구조 단위[B]로 구성되고, 그의 몰비가 [A]/[B]=95/5∼25/75이며, 또한 불소 원자 함유율이 40∼75질량%인 것을 특징으로 하는 전사체.
[화학식 2]
(화학식 2 중, R5∼R8 중 적어도 하나는 불소, 불소를 함유하는 탄소수 1∼10의 알킬, 불소를 함유하는 탄소수 1∼10의 알콕시, 또는 불소를 함유하는 탄소수 2∼10의 알콕시알킬이다. R5∼R8이 불소를 함유하지 않는 기인 경우, R5∼R8은 수소, 탄소수 1∼10의 알킬, 탄소수 1∼10의 알콕시, 또는 탄소수 2∼10의 알콕시알킬로부터 선택된다. R5∼R8은 동일하거나 상이할 수 있다. R5∼R8이 서로 결합하여 환 구조를 형성하고 있더라도 좋다. n은 1 또는 2의 정수를 나타낸다.) - 제 1 항 내지 제 4 항 중 어느 한 항에 기재된 불소 함유 환상 올레핀 폴리머를 이용한 전사체의 제조방법으로서,
상기 불소 함유 환상 올레핀 폴리머 및 유기 용제로 이루어지는 용액과, 표면에 미세 패턴을 형성시킨 몰드를 접촉시키고, 용제를 증발시키는 것에 의해 몰드의 패턴을 전사시키는 것을 특징으로 하는, 전사체의 제조방법. - 제 1 항 내지 제 4 항 중 어느 한 항에 기재된, 몰드 표면의 미세 패턴이 전사된 전사체의 제조방법으로서,
미세 패턴을 갖는 몰드 표면에, 제 1 항 내지 제 4 항 중 어느 한 항에 기재된 불소 함유 환상 올레핀 폴리머 및 유기 용제로 이루어지는 용액을 도포하는 공정과,
상기 용액으로부터 용제를 증발시키는 공정
을 갖는 것을 특징으로 하는, 전사체의 제조방법. - 제 1 항 내지 제 4 항 중 어느 한 항에 기재된, 몰드 표면의 미세 패턴이 전사된 전사체의 제조방법으로서,
제 1 항 내지 제 4 항 중 어느 한 항에 기재된 불소 함유 환상 올레핀 폴리머를 함유하는 필름 표면을, 몰드의 미세 패턴을 갖는 면으로 압압(押壓)하는 것을 특징으로 하는, 전사체의 제조방법. - 제 1 항 내지 제 4 항 중 어느 한 항에 기재된 전사체를 몰드로서 이용하는, 경화체의 제조방법으로서,
상기 전사체의 미세 패턴을 갖는 면과, 광경화성 모노머 조성물을 접촉시키는 공정과,
상기 광경화성 모노머 조성물에 광을 조사하는 것에 의해 경화시켜, 경화물을 얻는 공정과,
상기 경화물을 상기 전사체로부터 이형하는 공정
을 갖는 것을 특징으로 하는 경화물의 제조방법. - 몰드 표면의 미세 패턴이 전사된 전사체를 얻기 위한 전사용 수지 조성물로서,
화학식 1로 표시되는 반복 구조 단위를 함유하고, 또한 불소 원자 함유율이 40∼75질량%인 불소 함유 환상 올레핀 폴리머를 포함하는 것을 특징으로 하는 전사용 수지 조성물.
[화학식 1]
(화학식 1 중, R1∼R4 중 적어도 하나는 불소, 불소를 함유하는 탄소수 1∼10의 알킬, 불소를 함유하는 탄소수 1∼10의 알콕시, 또는 불소를 함유하는 탄소수 2∼10의 알콕시알킬이다. R1∼R4가 불소를 함유하지 않는 기인 경우, R1∼R4는 수소, 탄소수 1∼10의 알킬, 탄소수 1∼10의 알콕시, 또는 탄소수 2∼10의 알콕시알킬로부터 선택된다. R1∼R4는 동일하거나 상이할 수 있다. R1∼R4가 서로 결합하여 환 구조를 형성하고 있더라도 좋다. ) - 제 9 항에 있어서,
상기 불소 함유 환상 올레핀 폴리머의 저장 탄성률 또는 손실 탄성률이, 유리 전이 온도 이상의 온도 영역에서의 온도 변화에 대하여 -1∼0MPa/℃의 범위로 변화되는 영역을 갖는 것을 특징으로 하는 전사용 수지 조성물. - 제 10 항에 있어서,
상기 불소 함유 환상 올레핀 폴리머의 유리 전이 온도 이상의 온도 영역에서의 저장 탄성률 또는 손실 탄성률의 상기 변화 영역이, 0.1MPa 이상의 저장 탄성률 영역 또는 손실 탄성률 영역에 있는 것을 특징으로 하는 전사용 수지 조성물. - 제 9 항 내지 제 11 항 중 어느 한 항에 있어서,
상기 불소 함유 환상 올레핀 폴리머가, 상기 화학식 1로 표시되는 반복 구조 단위[A]와, 화학식 2로 표시되는 반복 구조 단위[B]로 구성되고, 그의 몰비가 [A]/[B]=95/5∼25/75이며, 또한 불소 원자 함유율이 40∼75질량%인 것을 특징으로 하는 전사용 수지 조성물.
[화학식 2]
(화학식 2 중, R5∼R8 중 적어도 하나는 불소, 불소를 함유하는 탄소수 1∼10의 알킬, 불소를 함유하는 탄소수 1∼10의 알콕시, 또는 불소를 함유하는 탄소수 2∼10의 알콕시알킬이다. R5∼R8이 불소를 함유하지 않는 기인 경우, R5∼R8은 수소, 탄소수 1∼10의 알킬, 탄소수 1∼10의 알콕시, 또는 탄소수 2∼10의 알콕시알킬로부터 선택된다. R5∼R8은 동일하거나 상이할 수 있다. R5∼R8이 서로 결합하여 환 구조를 형성하고 있더라도 좋다. n은 1 또는 2의 정수를 나타낸다. )
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| PCT/JP2010/001271 WO2010098102A1 (ja) | 2009-02-27 | 2010-02-25 | 転写体およびその製造方法 |
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| KR101966323B1 (ko) * | 2016-03-31 | 2019-04-05 | 동우 화인켐 주식회사 | 필름 터치 센서 및 이를 포함하는 터치 스크린 패널 |
| DE102017004546B4 (de) * | 2017-05-12 | 2022-01-05 | L/N Health And Beauty Aps | Kit zur Nagelkorrektur |
| US11474429B2 (en) | 2017-06-09 | 2022-10-18 | Mitsui Chemicals, Inc. | Method of producing substrate with fine uneven pattern, resin composition, and laminate |
| KR20200096626A (ko) | 2018-01-19 | 2020-08-12 | 미쓰이 가가쿠 가부시키가이샤 | 요철 구조체의 제조 방법, 요철 구조체를 제조하는 방법에 이용되는 적층체 및 당해 적층체의 제조 방법 |
| US11415880B2 (en) * | 2018-05-09 | 2022-08-16 | Facebook Technologies, Llc | Nanoimprint lithography material with switchable mechanical properties |
| EP3998298A4 (en) * | 2019-07-12 | 2023-08-09 | Mitsui Chemicals, Inc. | PHOTOCURE COMPOSITION, METHOD FOR PRODUCING AN IRREGULAR STRUCTURAL BODY, METHOD FOR FORMING AN INSTANT IRREGULAR PATTERN, AND IRREGULAR STRUCTURAL BODY |
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| US20110301313A1 (en) | 2011-12-08 |
| TW201038615A (en) | 2010-11-01 |
| CN102334177B (zh) | 2014-01-08 |
| WO2010098102A1 (ja) | 2010-09-02 |
| KR20110129930A (ko) | 2011-12-02 |
| US9314963B2 (en) | 2016-04-19 |
| US20140021648A1 (en) | 2014-01-23 |
| CN102334177A (zh) | 2012-01-25 |
| JPWO2010098102A1 (ja) | 2012-08-30 |
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| JP5301648B2 (ja) | 2013-09-25 |
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