KR101174949B1 - 석판 코팅을 위한 신규 물질, 이를 포함하는 석판 및 코팅,이의 제조방법 및 용도 - Google Patents
석판 코팅을 위한 신규 물질, 이를 포함하는 석판 및 코팅,이의 제조방법 및 용도 Download PDFInfo
- Publication number
- KR101174949B1 KR101174949B1 KR1020087030720A KR20087030720A KR101174949B1 KR 101174949 B1 KR101174949 B1 KR 101174949B1 KR 1020087030720 A KR1020087030720 A KR 1020087030720A KR 20087030720 A KR20087030720 A KR 20087030720A KR 101174949 B1 KR101174949 B1 KR 101174949B1
- Authority
- KR
- South Korea
- Prior art keywords
- delete delete
- functional group
- iodonium salt
- alkyl
- chain alkyl
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
- 0 C[C@](CC=*CC(CC1CCC1)(CC1C(CC(*=CC)=C)CC1)C*1CCC1)C(C(*(C)=CC)=C)=C1C(C2)CC2C1 Chemical compound C[C@](CC=*CC(CC1CCC1)(CC1C(CC(*=CC)=C)CC1)C*1CCC1)C(C(*(C)=CC)=C)=C1C(C2)CC2C1 0.000 description 3
- RUAQCSVWLWGIQP-UHFFFAOYSA-N COc1ccc(C(O)O)cc1 Chemical compound COc1ccc(C(O)O)cc1 RUAQCSVWLWGIQP-UHFFFAOYSA-N 0.000 description 1
Images
Classifications
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
- C07C275/00—Derivatives of urea, i.e. compounds containing any of the groups, the nitrogen atoms not being part of nitro or nitroso groups
- C07C275/46—Derivatives of urea, i.e. compounds containing any of the groups, the nitrogen atoms not being part of nitro or nitroso groups containing any of the groups, X being a hetero atom, Y being any atom, e.g. acylureas
- C07C275/58—Y being a hetero atom
- C07C275/62—Y being a nitrogen atom, e.g. biuret
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
- C09D159/00—Coating compositions based on polyacetals; Coating compositions based on derivatives of polyacetals
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41C—PROCESSES FOR THE MANUFACTURE OR REPRODUCTION OF PRINTING SURFACES
- B41C1/00—Forme preparation
- B41C1/10—Forme preparation for lithographic printing; Master sheets for transferring a lithographic image to the forme
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41C—PROCESSES FOR THE MANUFACTURE OR REPRODUCTION OF PRINTING SURFACES
- B41C1/00—Forme preparation
- B41C1/10—Forme preparation for lithographic printing; Master sheets for transferring a lithographic image to the forme
- B41C1/1008—Forme preparation for lithographic printing; Master sheets for transferring a lithographic image to the forme by removal or destruction of lithographic material on the lithographic support, e.g. by laser or spark ablation; by the use of materials rendered soluble or insoluble by heat exposure, e.g. by heat produced from a light to heat transforming system; by on-the-press exposure or on-the-press development, e.g. by the fountain of photolithographic materials
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41C—PROCESSES FOR THE MANUFACTURE OR REPRODUCTION OF PRINTING SURFACES
- B41C1/00—Forme preparation
- B41C1/10—Forme preparation for lithographic printing; Master sheets for transferring a lithographic image to the forme
- B41C1/1008—Forme preparation for lithographic printing; Master sheets for transferring a lithographic image to the forme by removal or destruction of lithographic material on the lithographic support, e.g. by laser or spark ablation; by the use of materials rendered soluble or insoluble by heat exposure, e.g. by heat produced from a light to heat transforming system; by on-the-press exposure or on-the-press development, e.g. by the fountain of photolithographic materials
- B41C1/1016—Forme preparation for lithographic printing; Master sheets for transferring a lithographic image to the forme by removal or destruction of lithographic material on the lithographic support, e.g. by laser or spark ablation; by the use of materials rendered soluble or insoluble by heat exposure, e.g. by heat produced from a light to heat transforming system; by on-the-press exposure or on-the-press development, e.g. by the fountain of photolithographic materials characterised by structural details, e.g. protective layers, backcoat layers or several imaging layers
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
- C07C271/00—Derivatives of carbamic acids, i.e. compounds containing any of the groups, the nitrogen atom not being part of nitro or nitroso groups
- C07C271/06—Esters of carbamic acids
- C07C271/08—Esters of carbamic acids having oxygen atoms of carbamate groups bound to acyclic carbon atoms
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
- C07C271/00—Derivatives of carbamic acids, i.e. compounds containing any of the groups, the nitrogen atom not being part of nitro or nitroso groups
- C07C271/06—Esters of carbamic acids
- C07C271/08—Esters of carbamic acids having oxygen atoms of carbamate groups bound to acyclic carbon atoms
- C07C271/10—Esters of carbamic acids having oxygen atoms of carbamate groups bound to acyclic carbon atoms with the nitrogen atoms of the carbamate groups bound to hydrogen atoms or to acyclic carbon atoms
- C07C271/16—Esters of carbamic acids having oxygen atoms of carbamate groups bound to acyclic carbon atoms with the nitrogen atoms of the carbamate groups bound to hydrogen atoms or to acyclic carbon atoms to carbon atoms of hydrocarbon radicals substituted by singly-bound oxygen atoms
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07F—ACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
- C07F5/00—Compounds containing elements of Groups 3 or 13 of the Periodic Table
- C07F5/02—Boron compounds
- C07F5/027—Organoboranes and organoborohydrides
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08B—POLYSACCHARIDES; DERIVATIVES THEREOF
- C08B11/00—Preparation of cellulose ethers
- C08B11/193—Mixed ethers, i.e. ethers with two or more different etherifying groups
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F220/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride ester, amide, imide or nitrile thereof
- C08F220/02—Monocarboxylic acids having less than ten carbon atoms; Derivatives thereof
- C08F220/10—Esters
- C08F220/22—Esters containing halogen
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G18/00—Polymeric products of isocyanates or isothiocyanates
- C08G18/06—Polymeric products of isocyanates or isothiocyanates with compounds having active hydrogen
- C08G18/28—Polymeric products of isocyanates or isothiocyanates with compounds having active hydrogen characterised by the compounds used containing active hydrogen
- C08G18/40—High-molecular-weight compounds
- C08G18/62—Polymers of compounds having carbon-to-carbon double bonds
- C08G18/6216—Polymers of alpha-beta ethylenically unsaturated carboxylic acids or of derivatives thereof
- C08G18/622—Polymers of esters of alpha-beta ethylenically unsaturated carboxylic acids
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G18/00—Polymeric products of isocyanates or isothiocyanates
- C08G18/06—Polymeric products of isocyanates or isothiocyanates with compounds having active hydrogen
- C08G18/70—Polymeric products of isocyanates or isothiocyanates with compounds having active hydrogen characterised by the isocyanates or isothiocyanates used
- C08G18/72—Polyisocyanates or polyisothiocyanates
- C08G18/77—Polyisocyanates or polyisothiocyanates having heteroatoms in addition to the isocyanate or isothiocyanate nitrogen and oxygen or sulfur
- C08G18/78—Nitrogen
- C08G18/785—Nitrogen containing tertiary amino groups
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
- C09D101/00—Coating compositions based on cellulose, modified cellulose, or cellulose derivatives
- C09D101/08—Cellulose derivatives
- C09D101/26—Cellulose ethers
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
- C09D175/00—Coating compositions based on polyureas or polyurethanes; Coating compositions based on derivatives of such polymers
- C09D175/04—Polyurethanes
- C09D175/14—Polyurethanes having carbon-to-carbon unsaturated bonds
- C09D175/16—Polyurethanes having carbon-to-carbon unsaturated bonds having terminal carbon-to-carbon unsaturated bonds
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
- G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
- G03F7/029—Inorganic compounds; Onium compounds; Organic compounds having hetero atoms other than oxygen, nitrogen or sulfur
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
- G03F7/032—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
- G03F7/032—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders
- G03F7/0325—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders the binders being polysaccharides, e.g. cellulose
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
- G03F7/032—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders
- G03F7/033—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders the binders being polymers obtained by reactions only involving carbon-to-carbon unsaturated bonds, e.g. vinyl polymers
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41C—PROCESSES FOR THE MANUFACTURE OR REPRODUCTION OF PRINTING SURFACES
- B41C2210/00—Preparation or type or constituents of the imaging layers, in relation to lithographic printing forme preparation
- B41C2210/04—Negative working, i.e. the non-exposed (non-imaged) areas are removed
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41C—PROCESSES FOR THE MANUFACTURE OR REPRODUCTION OF PRINTING SURFACES
- B41C2210/00—Preparation or type or constituents of the imaging layers, in relation to lithographic printing forme preparation
- B41C2210/22—Preparation or type or constituents of the imaging layers, in relation to lithographic printing forme preparation characterised by organic non-macromolecular additives, e.g. dyes, UV-absorbers, plasticisers
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41C—PROCESSES FOR THE MANUFACTURE OR REPRODUCTION OF PRINTING SURFACES
- B41C2210/00—Preparation or type or constituents of the imaging layers, in relation to lithographic printing forme preparation
- B41C2210/24—Preparation or type or constituents of the imaging layers, in relation to lithographic printing forme preparation characterised by a macromolecular compound or binder obtained by reactions involving carbon-to-carbon unsaturated bonds, e.g. acrylics, vinyl polymers
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
- C07C2603/00—Systems containing at least three condensed rings
- C07C2603/02—Ortho- or ortho- and peri-condensed systems
- C07C2603/04—Ortho- or ortho- and peri-condensed systems containing three rings
- C07C2603/06—Ortho- or ortho- and peri-condensed systems containing three rings containing at least one ring with less than six ring members
- C07C2603/10—Ortho- or ortho- and peri-condensed systems containing three rings containing at least one ring with less than six ring members containing five-membered rings
- C07C2603/12—Ortho- or ortho- and peri-condensed systems containing three rings containing at least one ring with less than six ring members containing five-membered rings only one five-membered ring
- C07C2603/18—Fluorenes; Hydrogenated fluorenes
Landscapes
- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- Spectroscopy & Molecular Physics (AREA)
- General Physics & Mathematics (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Materials Engineering (AREA)
- Life Sciences & Earth Sciences (AREA)
- Polymers & Plastics (AREA)
- Medicinal Chemistry (AREA)
- Health & Medical Sciences (AREA)
- Wood Science & Technology (AREA)
- Manufacturing & Machinery (AREA)
- Optics & Photonics (AREA)
- Thermal Sciences (AREA)
- Biochemistry (AREA)
- Inorganic Chemistry (AREA)
- Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
- Paints Or Removers (AREA)
- Macromonomer-Based Addition Polymer (AREA)
- Printing Plates And Materials Therefor (AREA)
- Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
- Polyurethanes Or Polyureas (AREA)
- Detergent Compositions (AREA)
Abstract
Description
본 발명의 일 실시예에 의하면, 상기 G2 는 하기 화학식일 수 있다:
또는
또한, 본 발명의 공중합체는 다음으로부터 선택되는 적어도 하나의 단량체를 공중합함으로써 얻어질 수 있다:
,
또는
| 조성 | 실시예 | %(고체중량) |
| PVA-01 | 1 | 2.00 |
| 요도늄 염 혼합물 | 9 | 5.00 |
| RPB-01 | 10 | 0.50 |
| RPB-05 | 14 | 2.15 |
| 3-메르캅토 트리아졸 | 0.25 | |
| 블루 컬러 포머(*) | 0.10 | |
| n-프로판올 | 90.0 | |
| 물 | 10.0 | |
| BYK 336 | 0.10 | |
| (*) 블루 컬러 포머는 블루-63(일본 야마모토 케미컬 인코퍼레이티드 시판) | ||
| 조성 | 실시예 | %(고체중량) |
| PVA-02 | 2 | 2.00 |
| 요도늄 염 혼합물 | 9 | 5.00 |
| RPB-01 | 10 | 0.50 |
| RPB-05 | 14 | 2.15 |
| 3-메르캅토 트리아졸 | 0.25 | |
| 블루 컬러 포머(*) | 0.10 | |
| n-프로판올 | 90.0 | |
| 물 | 10.0 | |
| BYK 336 | 0.10 | |
| (*) 블루 컬러 포머는 블루-63(일본 야마모토 케미컬 인코퍼레이티드 시판) | ||
| 조성 | 실시예 | %(고체중량) |
| PVA-01 | 1 | 2.00 |
| 요도늄 염 혼합물 | 9 | 5.00 |
| RPB-01 | 10 | 0.50 |
| RPB-06 | 15 | 2.15 |
| 3-메르캅토 트리아졸 | 0.25 | |
| 블루 컬러 포머(*) | 0.10 | |
| n-프로판올 | 90.0 | |
| 물 | 10.0 | |
| BYK 336 | 0.10 | |
| (*) 블루 컬러 포머는 블루-63(일본 야마모토 케미컬 인코퍼레이티드 시판) | ||
| 조성 | 실시예 | %(고체중량) |
| PVA-01 | 1 | 2.00 |
| 요도늄 염 혼합물 | 9 | 5.00 |
| RPB-01 | 10 | 1.00 |
| RPB-03 | 15 | 1.65 |
| 3-메르캅토 트리아졸 | 0.25 | |
| 블루 컬러 포머(*) | 0.10 | |
| n-프로판올 | 90.0 | |
| 물 | 10.0 | |
| BYK 336 | 0.10 | |
| (*) 블루 컬러 포머는 블루-63(일본 야마모토 케미컬 인코퍼레이티드 시판) | ||
| 조성 | 실시예 | %(고체중량) |
| PVA-01 | 1 | 2.00 |
| 요도늄 염 혼합물 | 9 | 5.00 |
| RPB-01 | 10 | 1.00 |
| RPB-04 | 15 | 1.65 |
| 3-메르캅토 트리아졸 | 0.25 | |
| 블루 컬러 포머(*) | 0.10 | |
| n-프로판올 | 90.0 | |
| 물 | 10.0 | |
| BYK 336 | 0.10 | |
| (*) 블루 컬러 포머는 블루-63(일본 야마모토 케미컬 인코퍼레이티드 시판) | ||
Claims (124)
- 양이온 또는 라디칼 중합을 수행할 수 있는 적어도 하나의 작용기가 부착되고, 두 개의 아릴 고리가 부착된 양으로 하전된 요오드 원자 및 음으로 하전된 반대 이온을 포함하는 중합가능한 요도늄 염이고,여기서 상기 작용기가 우레탄 또는 우레아 결합을 통하여 상기 요도늄 염의 아릴 고리에 부착된 것을 특징으로 하는 중합가능한 요도늄 염.
- 제1항에 있어서,상기 작용기가 아크릴레이트, 메타크릴레이트, 아크릴아미드, 메타크릴아미드 또는 비닐 에테르인 것을 특징으로 하는 요도늄 염.
- 제1항에 있어서,상기 요도늄 염이 하기의 일반식을 갖는 것을 특징으로 하는 요도늄 염:여기서,A1 은 토실레이트, 트리플레이트, 헥사플루오로안티모네이트, 테트라플루오로보레이트, 테트라페닐보레이트 또는 트리페닐-n-알킬보레이트 음이온성 반대 이온이고;w 는 0 내지 18 이며;R8 및 R9 는 각각 독립적으로 수소, C1-C18 의 직쇄 알킬, C1-C18 의 분지쇄 알킬, 알킬 옥시, 폴리(에틸렌 옥사이드) 또는 폴리(프로필렌옥사이드)이며;Y1 및 Y2 는 각각 독립적으로 상기 작용기가 부착된 우레탄- 또는 우레아-을 포함하는 치환기를 나타낸다.
- 제3항에 있어서,상기 R8, 또는 R9 중 적어도 하나에 상기 작용기가 부착되는 것을 특징으 하는 요도늄 염.
- 양이온 또는 라디칼 중합을 수행할 수 있는 적어도 하나의 작용기가 부착된 폴리비닐 알코올 아세탈 공중합체이고,상기 폴리비닐 알코올 아세탈 공중합체가 다음 일반식의 공중합체인 것을 특징으로 폴리비닐 알코올 아세탈 공중합체:여기서,여기서 상기 직쇄 알킬, 분지쇄 알킬 또는 아릴은 시아노, 히드록시, 디알킬아미노, 트리알킬암모늄 염, 에틸렌 옥사이드, 프로필렌 옥사이드, 메틸벤질설포닐-카바메이트, 카르복시산 또는 인산 작용기로 치환되며;G2 는 열 반응성 세그먼트이고, 직쇄 알킬, 분지쇄 알킬 또는 아릴이고, 상기 직쇄 알킬, 분지쇄 알킬 또는 아릴은 상기 작용기에 부착되며;G3 는 700 내지 1100 nm 사이에서 하나 이상의 강한 흡수 피크를 나타내는 방사-흡수 세그먼트이고, 또는 이며, 여기서, 상기 NIR 은 700 내지 1100 nm 에서 하나 이상의 강한 흡수 피크를 나타내는 근-적외선 흡수 발색단이며,a, b, c, d 및 e 는 몰비이며, 0.01 내지 0.99 이며;상기 작용기가 G2, G3 또는 둘 다에 부착된다.
- 제10항에 있어서,상기 G3 세그먼트가 400 내지 700 nm 사이에서 하나 이상의 강한 흡수 피크를 더 나타내는 것을 특징으로 하는 폴리비닐 알코올 아세탈 공중합체.
- 제10항에 있어서,상기 작용기가 비닐 에테르, 알콕시-메틸 아크릴아미드 또는 알콕시 메타크릴아미드인 것을 특징으로 폴리비닐 알코올 아세탈 공중합체.
- 제10항에 있어서,상기 근-적외선 흡수 발색단이 하기 일반식의 발색단인 것을 특징으로 하는 폴리비닐 알코올 아세탈 공중합체:여기서,D1 및 D2 는 독립적으로 -O-, -S-, -Se-, -CH=CH- 또는 -C(CH3)2 이고;Z1 및 Z2 는 각각 독립적으로 페닐 또는 나프틸이며;h 는 2 내지 8 이고;n 은 0 또는 1 이고;M 은 수소 또는 Na, K 또는 테트라알킬암모늄 염 양이온성 반대 이온이고;A1 은 브롬, 염소, 요오드, 토실레이트, 트리플레이트, 트리플루오로메탄 카보네이트, 도데실 벤조설포네이트, 테트라플루오로보레이트, 테트라페닐보레이트 및 트리페닐-n-부틸보레이트 음이온성 반대 이온이고;R3 및 R7 은 각각 독립적으로 수소 또는 알킬이고;R4, R5 및 R6 는 각각 독립적으로 알킬, 아릴 알킬, 히드록시 알킬, 아미노 알킬, 카르복시 알킬, 설포 알킬 또는 중합가능한 치환기이고, 상기 치환기는 하기 일반식의 치환기이고:여기서, 상기 m 은 0 내지 50이고, 상기 R 은 수소 또는 메틸이다.
- 양이온성 또는 라디칼 중합을 수행할 수 있는 적어도 하나의 작용기가 부착되고, 하기 일반식을 갖는 것을 특징으로 하는 석판 인쇄판 코팅용 고분자 바인더:여기서,G1 은 유기 용매에 가용성을 나타내는 프로세싱 세그먼트이고, C3H7 , , 직쇄 알킬, 분지쇄 알킬 또는 아릴이고, 상기 직쇄 알킬, 분지쇄 알킬 또는 아릴은 시아노, 히드록시, 디알킬아미노, 트리알킬암모늄염, 에틸렌 옥사이드, 프로필렌 옥사이드, 메틸벤질설포닐카바메이트, 카르복시산 또는 인산 작용기에 의해 치환되며;G2 는 상기 작용기가 부착된 열 반응성 세그먼트이고, 직쇄 알킬, 분지쇄 알킬 또는 아릴이고, 상기 직쇄 알킬, 분지쇄 알킬 또는 아릴에 상기 작용기가 부착되며,a, b, d 및 e 는 몰비이고, 0.01 내지 0.99 이고;
- 제16항에 있어서,상기 작용기가 아크릴레이트, 메타크릴레이트, 비닐 에테르, 히드록시, 알콕시-메틸 아크릴아미드, 알콕시 메타크릴아미드, N-메톡시메틸아크릴아미드 또는 N-메톡시메틸메타크릴아미드인 것을 특징으로 하는 석판 인쇄판 코팅용 고분자 바인더.
- 양이온 또는 라디칼 중합을 수행할 수 있는 적어도 하나 이상의 작용기가 부착되고, 상기 고분자 바인더가 용매-가용성 셀룰로오스 에테르, 수용성 셀룰로오스 에테르 또는 이들의 혼합물이며, 상기 셀룰로오스 에테르가 상기 작용기에 부착되는 것을 특징으로 하는 석판 인쇄 코팅용 고분자 바인더.
- 제20항에 있어서,상기 작용기가 아크릴레이트, 메타크릴레이트, 비닐 에테르, 히드록시, 알콕시-메틸 아크릴아미드, 알콕시 메타크릴아미드, N-메톡시메틸아크릴아미드 또는 N-메톡시메틸메타크릴아미드인 것을 특징으로 하는 석판 인쇄판 코팅용 고분자 바인더.
- 제1항 내지 제9항 중 어느 한 항에 따른 요도늄 염, 제10항 내지 제15항 중 어느 한 항에 따른 폴리비닐 알코올 아세탈 공중합체, 제16항 내지 제25항 중 어느 한 항에 따른 고분자 바인더, 또는 이들의 혼합물을 포함하는 석판 인쇄판 코팅 용액.
- 기판 위에 제26항의 상기 코팅 용액을 도포함으로써 생성되는 코팅을 포함하는 코팅을 갖는 네커티브 작용성 석판 인쇄판.
- 삭제
- 삭제
- 삭제
- 삭제
- 삭제
- 삭제
- 삭제
- 삭제
- 삭제
- 삭제
- 삭제
- 삭제
- 삭제
- 삭제
- 삭제
- 삭제
- 삭제
- 삭제
- 삭제
- 삭제
- 삭제
- 삭제
- 삭제
- 삭제
- 삭제
- 삭제
- 삭제
- 삭제
- 삭제
- 삭제
- 삭제
- 삭제
- 삭제
- 삭제
- 삭제
- 삭제
- 삭제
- 삭제
- 삭제
- 삭제
- 삭제
- 삭제
- 삭제
- 삭제
- 삭제
- 삭제
- 삭제
- 삭제
- 삭제
- 삭제
- 삭제
- 삭제
- 삭제
- 삭제
- 삭제
- 삭제
- 삭제
- 삭제
- 삭제
- 삭제
- 삭제
- 삭제
- 삭제
- 삭제
- 삭제
- 삭제
- 삭제
- 삭제
- 삭제
- 삭제
- 삭제
- 삭제
- 삭제
- 삭제
- 삭제
- 삭제
- 삭제
- 삭제
- 삭제
- 삭제
- 삭제
- 삭제
- 삭제
- 삭제
- 삭제
- 삭제
- 삭제
- 삭제
- 삭제
- 삭제
- 삭제
- 삭제
- 삭제
- 삭제
- 삭제
- 삭제
- 삭제
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US74747406P | 2006-05-17 | 2006-05-17 | |
| US60/747,474 | 2006-05-17 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| KR20090016588A KR20090016588A (ko) | 2009-02-16 |
| KR101174949B1 true KR101174949B1 (ko) | 2012-08-17 |
Family
ID=38693485
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| KR1020087030720A Expired - Fee Related KR101174949B1 (ko) | 2006-05-17 | 2007-05-09 | 석판 코팅을 위한 신규 물질, 이를 포함하는 석판 및 코팅,이의 제조방법 및 용도 |
Country Status (11)
| Country | Link |
|---|---|
| US (4) | US7910768B2 (ko) |
| EP (1) | EP2018365B1 (ko) |
| JP (1) | JP5254958B2 (ko) |
| KR (1) | KR101174949B1 (ko) |
| CN (1) | CN101454277B (ko) |
| BR (1) | BRPI0707574B1 (ko) |
| CA (1) | CA2652294C (ko) |
| ES (1) | ES2530792T3 (ko) |
| RU (1) | RU2443683C2 (ko) |
| UA (1) | UA98450C2 (ko) |
| WO (1) | WO2007131336A1 (ko) |
Families Citing this family (36)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| BRPI0707574B1 (pt) | 2006-05-17 | 2017-06-06 | American Dye Source Inc | novos materiais para revestimentos de placas litográficas, placas litográficas e revestimentos contendo as mesmas, métodos de preparação e uso |
| CA2661147C (en) * | 2006-08-24 | 2013-02-05 | American Dye Source Inc. | Reactive near infrared absorbing polymeric particles, methods of preparation and uses thereof |
| US7723013B2 (en) * | 2007-01-11 | 2010-05-25 | Southern Lithoplate, Inc. | Negative-acting photolithographic printing plate with improved pre-burn performance |
| EP2098367A1 (en) * | 2008-03-05 | 2009-09-09 | Eastman Kodak Company | Sensitizer/Initiator Combination for Negative-Working Thermal-Sensitive Compositions Usable for Lithographic Plates |
| US8354216B2 (en) * | 2008-07-15 | 2013-01-15 | Eastman Kodak Company | Negative-working imaging elements and methods of use |
| US8137896B2 (en) * | 2008-07-29 | 2012-03-20 | Eastman Kodak Company | Method of preparing lithographic printing plates |
| JP5622484B2 (ja) * | 2009-08-20 | 2014-11-12 | 富士フイルム株式会社 | 発色感光性組成物、平版印刷版原版及び新規シアニン色素 |
| WO2010148520A2 (en) | 2009-09-15 | 2010-12-29 | Mylan Group | Copolymers, polymeric particles comprising said copolymers and copolymeric binders for radiation-sensitive coating compositions for negative-working radiation-sensitive lithographic printing plates |
| EP2451821B1 (en) | 2009-10-29 | 2016-07-20 | Mylan Group | Gallotannic compounds for lithographic printing plate coating compositions |
| US9180719B2 (en) | 2010-04-20 | 2015-11-10 | Mylan Group | Substrate for lithographic printing plate |
| RU2559050C2 (ru) | 2010-09-14 | 2015-08-10 | Майлан Груп | Сополимеры для чувствительных в ближней инфракрасной области излучения композиций для покрытия позитивных термических литографических печатных форм |
| JP5955584B2 (ja) * | 2012-02-24 | 2016-07-20 | 株式会社Adeka | 新規化合物及び着色アルカリ現像性感光性組成物 |
| JP6312803B2 (ja) | 2013-04-10 | 2018-04-18 | マイラン・グループ | 積層基板を含む平版印刷版 |
| US10345442B2 (en) * | 2014-05-27 | 2019-07-09 | Honda Motor Co., Ltd. | Collision possibility determination device |
| US20160259243A1 (en) * | 2015-03-03 | 2016-09-08 | Eastman Kodak Company | Negative-working lithographic printing plate precursor |
| JP6817934B2 (ja) * | 2015-05-29 | 2021-01-20 | 富士フイルム株式会社 | 近赤外線吸収性色素多量体、組成物、膜、光学フィルタ、パターン形成方法および装置 |
| CN105859631B (zh) * | 2016-05-06 | 2019-04-02 | 南昌航空大学 | 一种镀锌钢板用高透明防指纹树脂的制备方法 |
| CN105732943B (zh) * | 2016-05-06 | 2019-01-22 | 南昌航空大学 | 一种聚甲基丙烯酸甲酯用高透明防指纹树脂的制备方法 |
| CN105778041B (zh) * | 2016-05-06 | 2019-01-15 | 南昌航空大学 | 一种耐磨耐指纹树脂的制备方法 |
| CN105859632B (zh) * | 2016-05-06 | 2019-04-02 | 南昌航空大学 | 一种电子束固化高透明防指纹树脂的制备方法 |
| CN105778040B (zh) * | 2016-05-06 | 2018-08-24 | 南昌航空大学 | 一种环保耐指纹树脂的制备方法 |
| CN105778042B (zh) * | 2016-05-06 | 2018-09-07 | 南昌航空大学 | 一种电子束固化耐指纹聚氨酯丙烯酸酯的制备方法 |
| WO2019013139A1 (ja) * | 2017-07-13 | 2019-01-17 | 富士フイルム株式会社 | 平版印刷版原版、平版印刷版の製版方法、発色組成物、硬化性組成物、及び、画像形成材料 |
| WO2019172006A1 (ja) * | 2018-03-05 | 2019-09-12 | 富士フイルム株式会社 | 感光性組成物 |
| WO2020026808A1 (ja) * | 2018-07-30 | 2020-02-06 | 富士フイルム株式会社 | 機上現像型平版印刷版原版、平版印刷版の作製方法、及び、平版印刷方法 |
| EP4024132B1 (en) | 2019-08-28 | 2024-11-20 | FUJIFILM Corporation | Active-light-sensitive or radiation-sensitive resin composition, resist film, pattern formation method, method for manufacturing electronic device, compound, and resin |
| US20210078350A1 (en) | 2019-09-17 | 2021-03-18 | Eastman Kodak Company | Lithographic printing plate precursor and method of use |
| US11714354B2 (en) | 2020-03-25 | 2023-08-01 | Eastman Kodak Company | Lithographic printing plate precursor and method of use |
| CN111691219B (zh) * | 2020-05-28 | 2022-02-08 | 仙鹤股份有限公司 | 一种高撕裂度ctp版衬纸及其制备方法 |
| US12436459B2 (en) | 2021-04-01 | 2025-10-07 | Eastman Kodak Company | Lithographic printing plate precursor and method of use |
| WO2022212032A1 (en) | 2021-04-01 | 2022-10-06 | Eastman Kodak Company | Lithographic printing plate precursor and method of use |
| US20230091079A1 (en) * | 2021-07-23 | 2023-03-23 | Eastman Kodak Company | Lithographic printing plate precursor and method of use |
| US12222645B2 (en) | 2022-03-03 | 2025-02-11 | Eastman Kodak Company | Lithographic printing plate precursor and method of use |
| US20240069439A1 (en) | 2022-08-12 | 2024-02-29 | Eastman Kodak Company | Lithographic printing plate precursor and method of use |
| EP4421131A1 (en) * | 2023-02-23 | 2024-08-28 | Dover Europe Sàrl | Polymeric dyes |
| CN117700586B (zh) * | 2024-02-05 | 2024-05-28 | 中国科学院理化技术研究所 | 基于聚苯乙烯类碘鎓盐及其光刻胶组合物 |
Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2000119306A (ja) | 1998-03-20 | 2000-04-25 | Nippon Soda Co Ltd | ヨ―ドニウム塩化合物を含有する光硬化性組成物 |
| JP2002207293A (ja) * | 2001-01-12 | 2002-07-26 | Fuji Photo Film Co Ltd | 平版印刷版原版 |
Family Cites Families (62)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US2929710A (en) * | 1954-10-08 | 1960-03-22 | Du Pont | Polyvinyl acetal with terminal vinylidene groups |
| US3043805A (en) * | 1958-08-05 | 1962-07-10 | Du Pont | Polymeric amides and their preparation |
| US3418295A (en) * | 1965-04-27 | 1968-12-24 | Du Pont | Polymers and their preparation |
| US3448089A (en) * | 1966-03-14 | 1969-06-03 | Du Pont | Photopolymerizable polymers containing free acid or acid anhydride groups reacted with glycidyl acrylate or glycidyl methacrylate |
| US3885964A (en) * | 1974-05-31 | 1975-05-27 | Du Pont | Photoimaging process using nitroso dimer |
| LU76471A1 (ko) * | 1976-12-24 | 1978-07-10 | ||
| US4345017A (en) | 1980-10-06 | 1982-08-17 | Polaroid Corporation | Photographic products and processes with a pH sensitive xanthene light screening dye |
| DE3144905A1 (de) * | 1981-11-12 | 1983-05-19 | Basf Ag, 6700 Ludwigshafen | Zur herstellung von druck- und reliefformen geeignetes lichtempfindliches auszeichnungsmaterial und verfahren zur herstellung von druck- und reliefformen mittels dieses aufzeichnungsmaterials |
| US4701402A (en) | 1984-02-13 | 1987-10-20 | Minnesota Mining And Manufacturing Company | Oxidative imaging |
| US4656229A (en) * | 1985-12-02 | 1987-04-07 | National Starch And Chemical Corporation | Anaerobic adhesive compositions |
| EP0646476B1 (en) | 1993-04-20 | 1998-06-24 | Asahi Kasei Kogyo Kabushiki Kaisha | Lithographic printing original plate and method for producing the same |
| WO1996018133A1 (en) * | 1994-12-06 | 1996-06-13 | Napp Systems, Inc. | High-resolution letterpress printing plates and water-soluble photopolymerizable compositions comprising a polyvinylalcohol derivative useful therefor |
| JPH11512252A (ja) | 1995-09-02 | 1999-10-19 | ニュー トランスデューサーズ リミテッド | 振動トランスジューサ |
| EP0770495B1 (en) | 1995-10-24 | 2002-06-19 | Agfa-Gevaert | A method for making a lithographic printing plate involving on press development |
| CA2187046A1 (fr) * | 1996-10-03 | 1998-04-03 | Alain Vallee | Sulfonylimidures et sulfonylmethylures, leur utilisation comme photoinitiateur |
| US6008813A (en) | 1997-08-01 | 1999-12-28 | Mitsubishi Electric Information Technology Center America, Inc. (Ita) | Real-time PC based volume rendering system |
| TW436491B (en) * | 1997-08-22 | 2001-05-28 | Ciba Sc Holding Ag | Compositions for use in base-catalysed reactions, a process for curing said compostions and a process for photochemically generating bases in base catalysed polymeriaztion reactions |
| US6261740B1 (en) | 1997-09-02 | 2001-07-17 | Kodak Polychrome Graphics, Llc | Processless, laser imageable lithographic printing plate |
| JP3770436B2 (ja) * | 1997-12-15 | 2006-04-26 | 富士写真フイルム株式会社 | 光重合性組成物 |
| US6558871B1 (en) * | 1998-03-20 | 2003-05-06 | Nippon Soda Co. Ltd. | Photocurable composition containing iodonium salt compound |
| DE19824546A1 (de) * | 1998-06-03 | 1999-12-09 | Basf Drucksysteme Gmbh | Herstellung vernetzbarer wasserlöslicher oder wasserdispergierbarer Zusammensetzungen und daraus erhältlicher strahlungsempfindlicher Gemische |
| US6884562B1 (en) | 1998-10-27 | 2005-04-26 | E. I. Du Pont De Nemours And Company | Photoresists and processes for microlithography |
| US6687402B1 (en) | 1998-12-18 | 2004-02-03 | Cognex Corporation | Machine vision methods and systems for boundary feature comparison of patterns and images |
| EP1035105A1 (de) * | 1999-03-11 | 2000-09-13 | Goldschmidt AG | Estergruppen enthaltende Iodoniumsalze und ihre Verwendung zur Strahlenhärtung kationisch härtender Massen |
| US6124425A (en) | 1999-03-18 | 2000-09-26 | American Dye Source, Inc. | Thermally reactive near infrared absorption polymer coatings, method of preparing and methods of use |
| CN1540601A (zh) * | 1999-03-30 | 2004-10-27 | 3M | 用于标志材料的增强粘合力的表面 |
| US6255033B1 (en) | 1999-07-30 | 2001-07-03 | Creo, Ltd. | Positive acting photoresist compositions and imageable element |
| AU5649400A (en) | 1999-09-21 | 2001-10-11 | Goldschmidt Ag | Photoinitiators containing urethane groups for cationic curing |
| US6566035B1 (en) | 1999-10-29 | 2003-05-20 | Fuji Photo Film Co., Ltd. | Negative-type image recording material and precursor for negative-type lithographic printing plate |
| US20020015826A1 (en) | 2000-04-11 | 2002-02-07 | Darryl Desmarteau | Zwitterionic iodonium compounds and methods of application |
| JP2002069110A (ja) * | 2000-09-01 | 2002-03-08 | Fuji Photo Film Co Ltd | 光重合性組成物 |
| US6548222B2 (en) * | 2000-09-06 | 2003-04-15 | Gary Ganghui Teng | On-press developable thermosensitive lithographic printing plates |
| US6777155B2 (en) * | 2000-10-03 | 2004-08-17 | Fuji Photo Film Co., Ltd. | Photosensitive lithographic printing plate |
| JP2002139828A (ja) * | 2000-11-06 | 2002-05-17 | Fuji Photo Film Co Ltd | 感光性平版印刷版 |
| JP4102014B2 (ja) | 2000-10-03 | 2008-06-18 | 富士フイルム株式会社 | 感光性平版印刷版 |
| JP4253432B2 (ja) | 2000-11-01 | 2009-04-15 | 富士フイルム株式会社 | 平版印刷版用原版 |
| US6899994B2 (en) * | 2001-04-04 | 2005-05-31 | Kodak Polychrome Graphics Llc | On-press developable IR sensitive printing plates using binder resins having polyethylene oxide segments |
| US7049046B2 (en) * | 2004-03-30 | 2006-05-23 | Eastman Kodak Company | Infrared absorbing compounds and their use in imageable elements |
| US6582882B2 (en) | 2001-04-04 | 2003-06-24 | Kodak Polychrome Graphics Llc | Imageable element comprising graft polymer |
| US6846614B2 (en) | 2002-02-04 | 2005-01-25 | Kodak Polychrome Graphics Llc | On-press developable IR sensitive printing plates |
| JP2003248285A (ja) * | 2001-08-07 | 2003-09-05 | Konica Corp | 熱現像銀塩写真感光材料 |
| CN1445248A (zh) * | 2002-02-15 | 2003-10-01 | 希普雷公司 | 官能化聚合物 |
| US7659046B2 (en) | 2002-04-10 | 2010-02-09 | Eastman Kodak Company | Water-developable infrared-sensitive printing plate |
| US6983694B2 (en) | 2002-04-26 | 2006-01-10 | Agfa Gevaert | Negative-working thermal lithographic printing plate precursor comprising a smooth aluminum support |
| JP2004012706A (ja) | 2002-06-05 | 2004-01-15 | Fuji Photo Film Co Ltd | 平版印刷版原版 |
| US6969575B2 (en) | 2002-08-29 | 2005-11-29 | Fuji Photo Film Co., Ltd. | On-press developable lithographic printing plate precursor |
| DE602004005904T2 (de) | 2003-01-29 | 2008-01-17 | Fujifilm Corp. | Vorsensibilisierte Flachdruckplatte mit Mikrokapseln |
| JP4070637B2 (ja) | 2003-03-05 | 2008-04-02 | 富士フイルム株式会社 | 重合性組成物、それに用いる化合物、それに用いた画像形成材料および感光性平版印刷版 |
| WO2004081662A2 (en) | 2003-03-14 | 2004-09-23 | Creo Inc. | Development enhancement of radiation-sensitive elements |
| US7368215B2 (en) | 2003-05-12 | 2008-05-06 | Eastman Kodak Company | On-press developable IR sensitive printing plates containing an onium salt initiator system |
| DE102004029501A1 (de) | 2004-06-18 | 2006-01-12 | Kodak Polychrome Graphics Gmbh | Modifizierte Polymere und ihre Verwendung bei der Herstellung von Lithographie-Druckplattenvorläufern |
| US7279263B2 (en) | 2004-06-24 | 2007-10-09 | Kodak Graphic Communications Canada Company | Dual-wavelength positive-working radiation-sensitive elements |
| US20060032390A1 (en) | 2004-07-30 | 2006-02-16 | Fuji Photo Film Co., Ltd. | Lithographic printing plate precursor and lithographic printing method |
| JP2006058430A (ja) | 2004-08-18 | 2006-03-02 | Fuji Photo Film Co Ltd | 平版印刷版原版 |
| JP2006335826A (ja) * | 2005-05-31 | 2006-12-14 | Fujifilm Holdings Corp | インクジェット記録用インク組成物およびこれを用いた平版印刷版の作製方法 |
| US7473515B2 (en) | 2005-06-03 | 2009-01-06 | American Dye Source, Inc. | Thermally reactive near-infrared absorbing acetal copolymers, methods of preparation and methods of use |
| JP5204371B2 (ja) * | 2005-06-06 | 2013-06-05 | 富士フイルム株式会社 | インクジェット記録用インク組成物およびこれを用いた平版印刷版の作製方法 |
| JP5170960B2 (ja) * | 2005-08-29 | 2013-03-27 | 富士フイルム株式会社 | 平版印刷版原版、及び平版印刷方法 |
| US7169518B1 (en) * | 2006-04-17 | 2007-01-30 | Eastman Kodak Company | Multilayer imageable element with improved chemical resistance |
| BRPI0707574B1 (pt) | 2006-05-17 | 2017-06-06 | American Dye Source Inc | novos materiais para revestimentos de placas litográficas, placas litográficas e revestimentos contendo as mesmas, métodos de preparação e uso |
| CN101269564B (zh) | 2007-03-19 | 2012-02-15 | 成都新图印刷技术有限公司 | 热敏阴图平版印刷版的制备方法 |
| DE112020004695T5 (de) | 2019-09-30 | 2022-07-28 | Robert Bosch (Australia) Pty Ltd | Verfahren und system zur verhinderung eines relaisangriffs unter einbeziehung einer kanalkohärenz |
-
2007
- 2007-05-09 BR BRPI0707574A patent/BRPI0707574B1/pt not_active IP Right Cessation
- 2007-05-09 KR KR1020087030720A patent/KR101174949B1/ko not_active Expired - Fee Related
- 2007-05-09 RU RU2008131537/05A patent/RU2443683C2/ru not_active IP Right Cessation
- 2007-05-09 JP JP2009510242A patent/JP5254958B2/ja not_active Expired - Fee Related
- 2007-05-09 CA CA2652294A patent/CA2652294C/en not_active Expired - Fee Related
- 2007-05-09 WO PCT/CA2007/000820 patent/WO2007131336A1/en not_active Ceased
- 2007-05-09 US US11/746,252 patent/US7910768B2/en not_active Expired - Fee Related
- 2007-05-09 EP EP07719744.0A patent/EP2018365B1/en not_active Not-in-force
- 2007-05-09 CN CN200780005807.2A patent/CN101454277B/zh not_active Expired - Fee Related
- 2007-05-09 ES ES07719744T patent/ES2530792T3/es active Active
- 2007-09-05 UA UAA200810363A patent/UA98450C2/uk unknown
-
2009
- 2009-10-15 US US12/579,881 patent/US8323867B2/en not_active Expired - Fee Related
- 2009-10-15 US US12/579,844 patent/US8021827B2/en not_active Expired - Fee Related
-
2011
- 2011-07-25 US US13/189,908 patent/US20120003584A1/en not_active Abandoned
Patent Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2000119306A (ja) | 1998-03-20 | 2000-04-25 | Nippon Soda Co Ltd | ヨ―ドニウム塩化合物を含有する光硬化性組成物 |
| JP2002207293A (ja) * | 2001-01-12 | 2002-07-26 | Fuji Photo Film Co Ltd | 平版印刷版原版 |
Also Published As
| Publication number | Publication date |
|---|---|
| JP2009537458A (ja) | 2009-10-29 |
| EP2018365A4 (en) | 2010-07-07 |
| US8323867B2 (en) | 2012-12-04 |
| WO2007131336A1 (en) | 2007-11-22 |
| EP2018365A1 (en) | 2009-01-28 |
| BRPI0707574A2 (pt) | 2011-05-10 |
| CA2652294C (en) | 2012-07-10 |
| US20120003584A1 (en) | 2012-01-05 |
| HK1121132A1 (en) | 2009-04-17 |
| US20100062370A1 (en) | 2010-03-11 |
| UA98450C2 (uk) | 2012-05-25 |
| JP5254958B2 (ja) | 2013-08-07 |
| RU2008131537A (ru) | 2010-02-10 |
| US20070269739A1 (en) | 2007-11-22 |
| BRPI0707574B1 (pt) | 2017-06-06 |
| CN101454277B (zh) | 2014-02-19 |
| EP2018365B1 (en) | 2014-11-19 |
| US20100035183A1 (en) | 2010-02-11 |
| RU2443683C2 (ru) | 2012-02-27 |
| US7910768B2 (en) | 2011-03-22 |
| CN101454277A (zh) | 2009-06-10 |
| ES2530792T3 (es) | 2015-03-05 |
| KR20090016588A (ko) | 2009-02-16 |
| US8021827B2 (en) | 2011-09-20 |
| CA2652294A1 (en) | 2007-11-22 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| KR101174949B1 (ko) | 석판 코팅을 위한 신규 물질, 이를 포함하는 석판 및 코팅,이의 제조방법 및 용도 | |
| KR101312760B1 (ko) | 반응성 근 적외선 흡수 중합 입자, 이를 포함하는 코팅 조성물 및 이를 포함하는 네거티브-작용성 오프셋 인쇄 평판 | |
| KR101430576B1 (ko) | 평판 인쇄판 코팅 조성물용 갈로탄닉 화합물 | |
| JP5749269B2 (ja) | ネガ型輻射線感応性リソグラフィック印刷プレートのための輻射線感応性コーティング組成物用のコポリマー、前記コポリマーを含むポリマー粒子、及びコポリマーバインダー | |
| TWI401238B (zh) | 用於微影板塗覆物之新穎材料、包含其之微影板及塗覆物、製備及使用的方法 | |
| HK1121132B (en) | New materials for lithographic plates coatings, lithographic plates and coatings containing same, methods of preparation and use | |
| HK1131630B (en) | Reactive near infrared absorbing polymeric particles, methods of preparation and uses thereof | |
| HK1168118B (en) | Copolymers, polymeric particles comprising said copolymers and copolymeric binders for radiation-sensitive coating compositions for negative-working radiation-sensitive lithographic printing plates |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| E13-X000 | Pre-grant limitation requested |
St.27 status event code: A-2-3-E10-E13-lim-X000 |
|
| PA0105 | International application |
St.27 status event code: A-0-1-A10-A15-nap-PA0105 |
|
| PG1501 | Laying open of application |
St.27 status event code: A-1-1-Q10-Q12-nap-PG1501 |
|
| A201 | Request for examination | ||
| E13-X000 | Pre-grant limitation requested |
St.27 status event code: A-2-3-E10-E13-lim-X000 |
|
| P11-X000 | Amendment of application requested |
St.27 status event code: A-2-2-P10-P11-nap-X000 |
|
| P13-X000 | Application amended |
St.27 status event code: A-2-2-P10-P13-nap-X000 |
|
| PA0201 | Request for examination |
St.27 status event code: A-1-2-D10-D11-exm-PA0201 |
|
| PE0902 | Notice of grounds for rejection |
St.27 status event code: A-1-2-D10-D21-exm-PE0902 |
|
| T11-X000 | Administrative time limit extension requested |
St.27 status event code: U-3-3-T10-T11-oth-X000 |
|
| E13-X000 | Pre-grant limitation requested |
St.27 status event code: A-2-3-E10-E13-lim-X000 |
|
| P11-X000 | Amendment of application requested |
St.27 status event code: A-2-2-P10-P11-nap-X000 |
|
| P13-X000 | Application amended |
St.27 status event code: A-2-2-P10-P13-nap-X000 |
|
| E701 | Decision to grant or registration of patent right | ||
| PE0701 | Decision of registration |
St.27 status event code: A-1-2-D10-D22-exm-PE0701 |
|
| GRNT | Written decision to grant | ||
| PR0701 | Registration of establishment |
St.27 status event code: A-2-4-F10-F11-exm-PR0701 |
|
| PR1002 | Payment of registration fee |
St.27 status event code: A-2-2-U10-U12-oth-PR1002 Fee payment year number: 1 |
|
| PG1601 | Publication of registration |
St.27 status event code: A-4-4-Q10-Q13-nap-PG1601 |
|
| FPAY | Annual fee payment |
Payment date: 20150721 Year of fee payment: 4 |
|
| PR1001 | Payment of annual fee |
St.27 status event code: A-4-4-U10-U11-oth-PR1001 Fee payment year number: 4 |
|
| FPAY | Annual fee payment |
Payment date: 20160627 Year of fee payment: 5 |
|
| PR1001 | Payment of annual fee |
St.27 status event code: A-4-4-U10-U11-oth-PR1001 Fee payment year number: 5 |
|
| FPAY | Annual fee payment |
Payment date: 20170601 Year of fee payment: 6 |
|
| PR1001 | Payment of annual fee |
St.27 status event code: A-4-4-U10-U11-oth-PR1001 Fee payment year number: 6 |
|
| FPAY | Annual fee payment |
Payment date: 20180710 Year of fee payment: 7 |
|
| PR1001 | Payment of annual fee |
St.27 status event code: A-4-4-U10-U11-oth-PR1001 Fee payment year number: 7 |
|
| PC1903 | Unpaid annual fee |
St.27 status event code: A-4-4-U10-U13-oth-PC1903 Not in force date: 20190811 Payment event data comment text: Termination Category : DEFAULT_OF_REGISTRATION_FEE |
|
| PC1903 | Unpaid annual fee |
St.27 status event code: N-4-6-H10-H13-oth-PC1903 Ip right cessation event data comment text: Termination Category : DEFAULT_OF_REGISTRATION_FEE Not in force date: 20190811 |