KR100974435B1 - 내화학성 세라믹막이 구비된 물품 - Google Patents
내화학성 세라믹막이 구비된 물품 Download PDFInfo
- Publication number
- KR100974435B1 KR100974435B1 KR1020080026855A KR20080026855A KR100974435B1 KR 100974435 B1 KR100974435 B1 KR 100974435B1 KR 1020080026855 A KR1020080026855 A KR 1020080026855A KR 20080026855 A KR20080026855 A KR 20080026855A KR 100974435 B1 KR100974435 B1 KR 100974435B1
- Authority
- KR
- South Korea
- Prior art keywords
- ceramic film
- base material
- article
- ceramic
- resistant ceramic
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
- XCIXKGXIYUWCLL-UHFFFAOYSA-N OC1CCCC1 Chemical compound OC1CCCC1 XCIXKGXIYUWCLL-UHFFFAOYSA-N 0.000 description 1
Images
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C24/00—Coating starting from inorganic powder
- C23C24/02—Coating starting from inorganic powder by application of pressure only
- C23C24/04—Impact or kinetic deposition of particles
-
- C—CHEMISTRY; METALLURGY
- C04—CEMENTS; CONCRETE; ARTIFICIAL STONE; CERAMICS; REFRACTORIES
- C04B—LIME, MAGNESIA; SLAG; CEMENTS; COMPOSITIONS THEREOF, e.g. MORTARS, CONCRETE OR LIKE BUILDING MATERIALS; ARTIFICIAL STONE; CERAMICS; REFRACTORIES; TREATMENT OF NATURAL STONE
- C04B35/00—Shaped ceramic products characterised by their composition; Ceramics compositions; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products
- C04B35/01—Shaped ceramic products characterised by their composition; Ceramics compositions; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products based on oxide ceramics
- C04B35/10—Shaped ceramic products characterised by their composition; Ceramics compositions; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products based on oxide ceramics based on aluminium oxide
-
- C—CHEMISTRY; METALLURGY
- C04—CEMENTS; CONCRETE; ARTIFICIAL STONE; CERAMICS; REFRACTORIES
- C04B—LIME, MAGNESIA; SLAG; CEMENTS; COMPOSITIONS THEREOF, e.g. MORTARS, CONCRETE OR LIKE BUILDING MATERIALS; ARTIFICIAL STONE; CERAMICS; REFRACTORIES; TREATMENT OF NATURAL STONE
- C04B35/00—Shaped ceramic products characterised by their composition; Ceramics compositions; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products
- C04B35/01—Shaped ceramic products characterised by their composition; Ceramics compositions; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products based on oxide ceramics
- C04B35/46—Shaped ceramic products characterised by their composition; Ceramics compositions; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products based on oxide ceramics based on titanium oxides or titanates
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Ceramic Engineering (AREA)
- Materials Engineering (AREA)
- Organic Chemistry (AREA)
- Manufacturing & Machinery (AREA)
- Structural Engineering (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Other Surface Treatments For Metallic Materials (AREA)
- Laminated Bodies (AREA)
Abstract
Description
Claims (6)
- 유리질을 포함한 세라믹 기판, 유리, 금속 중 어느 하나로 이루어진 모재와;상기 모재의 표면 일측에 1.9 내지 2.7㎛의 평균입경을 가지고, 이산화티타늄(TiO2)과 알루미나(Al2O3) 중 하나 이상의 세라믹소재를 상온 진공 분말 분사법 (Room Temperature Powder Spray in Vacuum)으로 앵커링(anchoring)하여 0.5 내지 20㎛의 두께로 밀착력을 갖도록 형성된 내화학성 세라믹막;을 포함하여 구성됨을 특징으로 하는 내화학성 세라믹막이 구비된 물품.
- 제 1 항에 있어서, 상기 모재는 내화학성 세라믹막보다 낮은 내화학성을 갖는 것을 특징으로 하는 내화학성 세라믹막이 구비된 물품.
- 제 1 항 또는 제 2 항에 있어서, 상기 세라믹막은 0.1 내지 10㎜/sec의 속도로 이송하는 모재에 앵커링되는 것을 특징으로 하는 내화학성 세라믹막이 구비된 물품.
- 제 3 항에 있어서,상기 세라믹막은 1torr 이하의 진공 분위기에서 형성됨을 특징으로 하는 내화학성 세라믹막이 구비된 물품.
- 제 4 항에 있어서, 상기 세라믹막의 밀도는 95% 이상인 것을 특징으로 하는 내화학성 세라믹막이 구비된 물품.
- 삭제
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| KR1020080026855A KR100974435B1 (ko) | 2008-03-24 | 2008-03-24 | 내화학성 세라믹막이 구비된 물품 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| KR1020080026855A KR100974435B1 (ko) | 2008-03-24 | 2008-03-24 | 내화학성 세라믹막이 구비된 물품 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| KR20090101610A KR20090101610A (ko) | 2009-09-29 |
| KR100974435B1 true KR100974435B1 (ko) | 2010-08-05 |
Family
ID=41359337
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| KR1020080026855A Expired - Fee Related KR100974435B1 (ko) | 2008-03-24 | 2008-03-24 | 내화학성 세라믹막이 구비된 물품 |
Country Status (1)
| Country | Link |
|---|---|
| KR (1) | KR100974435B1 (ko) |
Families Citing this family (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| KR101409295B1 (ko) * | 2011-03-24 | 2014-07-01 | 한국기계연구원 | 금속기판의 세라믹 코팅방법 및 세라믹 코팅 금속기판 |
| WO2012128592A2 (ko) * | 2011-03-24 | 2012-09-27 | 한국기계연구원 | 금속기판의 세라믹 코팅방법, 세라믹 코팅 금속기판, 촉매층 코팅기판의 제조방법, 촉매층 코팅기판 및 촉매 구조체 |
Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2001152360A (ja) | 1999-11-25 | 2001-06-05 | Ricoh Co Ltd | セラミックス誘電体膜の形成方法、セラミックス誘電体膜/基板の積層構造体、及び電気−機械変換素子 |
| JP3265481B2 (ja) * | 1999-04-23 | 2002-03-11 | 独立行政法人産業技術総合研究所 | 脆性材料超微粒子成形体の低温成形法 |
| KR20060063639A (ko) * | 2004-12-03 | 2006-06-12 | 유나이티드 테크놀로지스 코포레이션 | 진공 콜드 스프레이 방법 |
| JP2008045191A (ja) * | 2006-08-21 | 2008-02-28 | Ntn Corp | 被膜形成装置および被膜形成方法 |
-
2008
- 2008-03-24 KR KR1020080026855A patent/KR100974435B1/ko not_active Expired - Fee Related
Patent Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP3265481B2 (ja) * | 1999-04-23 | 2002-03-11 | 独立行政法人産業技術総合研究所 | 脆性材料超微粒子成形体の低温成形法 |
| JP2001152360A (ja) | 1999-11-25 | 2001-06-05 | Ricoh Co Ltd | セラミックス誘電体膜の形成方法、セラミックス誘電体膜/基板の積層構造体、及び電気−機械変換素子 |
| KR20060063639A (ko) * | 2004-12-03 | 2006-06-12 | 유나이티드 테크놀로지스 코포레이션 | 진공 콜드 스프레이 방법 |
| JP2008045191A (ja) * | 2006-08-21 | 2008-02-28 | Ntn Corp | 被膜形成装置および被膜形成方法 |
Also Published As
| Publication number | Publication date |
|---|---|
| KR20090101610A (ko) | 2009-09-29 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| US10418229B2 (en) | Aerosol deposition coating for semiconductor chamber components | |
| US6358567B2 (en) | Colloidal spray method for low cost thin coating deposition | |
| US9556507B2 (en) | Yttria-based material coated chemical vapor deposition chamber heater | |
| CN103819705B (zh) | 热喷涂的增强聚合物复合材料 | |
| US6517642B2 (en) | Method and apparatus of producing thin film of metal or metal compound | |
| CN102712529B (zh) | 具有防污表面的玻璃制品及其制造方法 | |
| Vasilev et al. | Substrate influence on the initial growth phase of plasma-deposited polymer films | |
| JP6002888B2 (ja) | 成膜方法 | |
| TW201522717A (zh) | 用於半導體製造部件之高純度金屬頂塗層 | |
| WO2006114781A2 (en) | Deposition of materials | |
| KR101591050B1 (ko) | 탄소 함유 소재에 초고온 세라믹의 코팅 방법 | |
| KR100525227B1 (ko) | 발수성 부재의 제조방법 및 잉크젯헤드의 제조방법 | |
| KR100974435B1 (ko) | 내화학성 세라믹막이 구비된 물품 | |
| KR20130102107A (ko) | 성막 방법 | |
| Bera et al. | Methodologies of application of sol-gel based solution onto substrate: A review | |
| KR100946960B1 (ko) | 세라믹막이 구비된 유연성판재 및 이의 제조방법 | |
| JP6142562B2 (ja) | 超撥水性材料の製造方法および超撥水性材料 | |
| US20090214772A1 (en) | Method and apparatus for coating powder material on substrate | |
| KR100965024B1 (ko) | 분말 도포 방법 및 장치 | |
| KR101986306B1 (ko) | 진공 서스펜션 플라즈마 용사장치 및 진공 서스펜션 플라즈마 용사방법 | |
| WO2006092614A2 (en) | Method and apparatus for producing a coating on a substrate | |
| KR20210086194A (ko) | 플라즈마 분말 증착 장치 및 그를 이용한 증착 방법 | |
| JP4963009B2 (ja) | 透明性が改良された無機質膜−基板複合材料及びその製造方法 | |
| KR20240134229A (ko) | 순수한 금속 몸체들의 확산 접합 | |
| JP2001164379A (ja) | 表面処理方法及び接合方法 |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| A201 | Request for examination | ||
| PA0109 | Patent application |
St.27 status event code: A-0-1-A10-A12-nap-PA0109 |
|
| PA0201 | Request for examination |
St.27 status event code: A-1-2-D10-D11-exm-PA0201 |
|
| D13-X000 | Search requested |
St.27 status event code: A-1-2-D10-D13-srh-X000 |
|
| D14-X000 | Search report completed |
St.27 status event code: A-1-2-D10-D14-srh-X000 |
|
| PG1501 | Laying open of application |
St.27 status event code: A-1-1-Q10-Q12-nap-PG1501 |
|
| E902 | Notification of reason for refusal | ||
| PE0902 | Notice of grounds for rejection |
St.27 status event code: A-1-2-D10-D21-exm-PE0902 |
|
| E13-X000 | Pre-grant limitation requested |
St.27 status event code: A-2-3-E10-E13-lim-X000 |
|
| P11-X000 | Amendment of application requested |
St.27 status event code: A-2-2-P10-P11-nap-X000 |
|
| P13-X000 | Application amended |
St.27 status event code: A-2-2-P10-P13-nap-X000 |
|
| E701 | Decision to grant or registration of patent right | ||
| PE0701 | Decision of registration |
St.27 status event code: A-1-2-D10-D22-exm-PE0701 |
|
| GRNT | Written decision to grant | ||
| PR0701 | Registration of establishment |
St.27 status event code: A-2-4-F10-F11-exm-PR0701 |
|
| PR1002 | Payment of registration fee |
St.27 status event code: A-2-2-U10-U11-oth-PR1002 Fee payment year number: 1 |
|
| PG1601 | Publication of registration |
St.27 status event code: A-4-4-Q10-Q13-nap-PG1601 |
|
| PN2301 | Change of applicant |
St.27 status event code: A-5-5-R10-R13-asn-PN2301 St.27 status event code: A-5-5-R10-R11-asn-PN2301 |
|
| FPAY | Annual fee payment |
Payment date: 20130801 Year of fee payment: 4 |
|
| PR1001 | Payment of annual fee |
St.27 status event code: A-4-4-U10-U11-oth-PR1001 Fee payment year number: 4 |
|
| FPAY | Annual fee payment |
Payment date: 20140626 Year of fee payment: 5 |
|
| PR1001 | Payment of annual fee |
St.27 status event code: A-4-4-U10-U11-oth-PR1001 Fee payment year number: 5 |
|
| LAPS | Lapse due to unpaid annual fee | ||
| PC1903 | Unpaid annual fee |
St.27 status event code: A-4-4-U10-U13-oth-PC1903 Not in force date: 20150801 Payment event data comment text: Termination Category : DEFAULT_OF_REGISTRATION_FEE |
|
| PC1903 | Unpaid annual fee |
St.27 status event code: N-4-6-H10-H13-oth-PC1903 Ip right cessation event data comment text: Termination Category : DEFAULT_OF_REGISTRATION_FEE Not in force date: 20150801 |
|
| P22-X000 | Classification modified |
St.27 status event code: A-4-4-P10-P22-nap-X000 |
|
| R18-X000 | Changes to party contact information recorded |
St.27 status event code: A-5-5-R10-R18-oth-X000 |
|
| R18-X000 | Changes to party contact information recorded |
St.27 status event code: A-5-5-R10-R18-oth-X000 |