KR100867610B1 - Array board for reflective transparent liquid crystal display device and manufacturing method thereof - Google Patents

Abstract

BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a reflective transmissive liquid crystal display device, and more particularly, to a structure and a manufacturing method of an array substrate for reflective transmissive liquid crystal display device capable of realizing high brightness by increasing light utilization efficiency.

In the reflective array substrate according to the present invention, a semicircular convex pattern is irregularly formed in the pixel portion, so that the convex pattern is a reflection portion, and a region where no convex pattern does not exist is defined as a transmission portion.

To this end, a reflective plate is formed on the surface of the convex pattern, and a transparent electrode is formed in an area where the convex pattern is not located.

With such a configuration, a reflective transmissive liquid crystal display device capable of realizing high luminance in both reflective and transmissive modes can be manufactured.

Description

Array substrate for reflective transmissive liquid crystal display device and manufacturing method thereof {An substrate for LCD and method for fabricating the same}             

1 is a cross-sectional view schematically illustrating a configuration of a reflective liquid crystal display device according to a first example of the related art.

2 is a cross-sectional view schematically illustrating a configuration of a reflective liquid crystal display device according to a second example of the related art.

3 is a cross-sectional view showing a part of an array substrate for a transflective liquid crystal display device according to a third example of the prior art;

4 is a cross-sectional view showing a part of an array substrate for a transflective liquid crystal display device according to a fourth example of the prior art;

5 is an enlarged plan view showing a part of an array substrate for a reflective transmissive liquid crystal display device according to a fifth example of the related art;

FIG. 6 is an enlarged plan view showing a part of an array substrate for a transflective liquid crystal display device according to a sixth example of the related art;

7 is an enlarged plan view showing a portion of an array substrate for a reflective transmissive liquid crystal display device according to the present invention;                 

8A to 8D are cross sectional views taken along the lines VII-VII and VII-VII of FIG. 7, and according to the process sequence of the present invention.

<Description of the symbols for the main parts of the drawings>

100 substrate 102 gate electrode

104: gate wiring 105: extension portion of the gate wiring

108: active layer 112: source electrode

114: drain electrode 116: data wiring

117 metal pattern 128 opaque metal pattern

130: transparent electrode

BACKGROUND OF THE INVENTION 1. Field of the Invention [0001] The present invention relates to a liquid crystal display device, and in particular, an array for a reflective liquid crystal display device having a high light utilization efficiency, which can selectively use a reflection mode and a transmission mode. A substrate and a method of manufacturing the same.

In general, the reflective transmissive liquid crystal display device has the functions of a transmissive liquid crystal display device and a reflective liquid crystal display device at the same time, and it is possible to use both a back light and an external natural light or artificial light source, thereby limiting the surrounding environment. There is an advantage that can reduce the power consumption (power consumption).

In this case, since the reflective transmission liquid crystal display device is configured to operate the reflective liquid crystal display device and the transmission liquid crystal display device, light utilization efficiency is low.

In particular, when the reflection mode is used, since the external light is used, the utilization efficiency of the light is considerably low. Therefore, this problem can be solved by applying the methods used in general reflective liquid crystal display devices.

A configuration of a conventional reflective liquid crystal display device for increasing light utilization efficiency will be described below with reference to the drawings.

1 is a cross-sectional view schematically illustrating a reflective liquid crystal display device according to a first example of the related art.

As illustrated, the reflective liquid crystal display device 9 includes a first substrate 10 and a second substrate 20 bonded together through a liquid crystal layer (not shown), and faces the second substrate 20. One surface of the first substrate 10 is defined as a plurality of pixel regions P, and a thin film transistor T is formed at one side of the pixel region P. FIG.

The thin film transistor T includes a gate electrode 12, an active layer 14, a source electrode 16, and a drain electrode 18, and a gate wiring (not shown) connected to the gate electrode 12 is a pixel. A pixel region extending beyond one side of the region P and not parallel to one side of the pixel region P through which the gate line (not shown) passes through the data line 20 connected to the source electrode 16. It extends to the other side of (P).                         

In the pixel region P, a reflective electrode 26 is formed in contact with the drain electrode 18. The surface of the reflective electrode 26 is formed with irregularities.

In this way, it is possible to minimize the specular reflection of light L1 incident from the outside by the convex-convex pattern 24 of the unevenness, and to make the diffuse reflection.

When the light is diffusely reflected, not only can a wide viewing angle be secured, but the overall luminance is improved.

For this reason, conventionally, the surface of the reflective electrode 26 is formed with irregularities.

At this time, in order to form the reflective electrode 26 with irregularities, the surface of the protective film 24 under the reflective electrode 26 is formed with irregularities, and thus the method of depositing the reflective electrode 26 on the protective film 24 is used. Alternatively, a method of fabricating a separate photosensitive organic layer on the passivation layer 26 to form an irregular shape may be used.

On one surface of the second substrate 20 facing the first substrate 10, a sub color filter 32a representing red (R), green (G), and blue (B) corresponding to the pixel region (P). A black matrix 34 is formed between the 32b and 32c and the color filters, and a transparent common electrode 36 is formed on the sub color filters 32a, 32b and 32c.

As described above, although the process of forming the protective film 24 into the unevenness is complicated, the uneven shape of the reflective electrode 26 has the advantage of increasing the external light utilization efficiency.

Hereinafter, another example of improving light utilization efficiency will be described with reference to FIG. 2.

2 is a cross-sectional view schematically showing the configuration of a reflective liquid crystal display device 9 according to a second conventional example.

Since most of the configuration is the same as that of the first example of the related art, a detailed description thereof will be omitted.

As shown, instead of forming the reflective electrode 26 formed in the pixel region P into an unevenness (convex pattern), a scattering film 50 is formed on the second substrate 20. It is.

Scattering film 50 has the advantage that can achieve a high brightness because it can obtain the diffuse reflection effect as described above.

The configuration of the reflective liquid crystal display device as described above is applicable to the reflecting portion of the reflective liquid crystal display device described below with reference to FIGS. 5 and 6.

Before explaining this, a schematic cross-sectional configuration of an array substrate for a reflective transmissive liquid crystal display device which is generally used will be described.

3 and 4 are cross-sectional views schematically showing the configuration of the reflective liquid crystal display device according to the third and fourth examples of the related art.

As shown in FIGS. 3 and 4, the first substrate 60 and the second substrate 80 are spaced apart and bonded to each other, and a plurality of pixel regions are formed on the first substrate 60 facing the second substrate 80. (P) is defined, and a gate line (not shown) and a data line 62 intersect each other vertically through one side of the pixel region P and the other side which is not parallel thereto.

On one surface of the second substrate 80 facing the first substrate 60, a red matrix, a green matrix, and a blue matrix having a black matrix 84 are formed between each sub-color filter. Transparent common electrodes 86 are formed on the sub color filters 82a and 82b and the black matrix 84.

In the above configuration, the pixel region P is further divided into a reflecting portion B and a transmitting portion D. FIG.

In general, the reflective electrode 64 is configured to correspond to the reflective portion B and the transparent electrode 66 is formed to correspond to the transmissive portion D. In general, the reflective electrode including the transmissive hole H 64 may be formed above or below the transparent electrode 66 so that the transmission part B and the reflection part D may be defined.

In this case, a part to be considered in the reflective transmissive liquid crystal display device is to reduce the color difference between the transmissive part D and the reflective part B. FIG.

In this regard, the configuration of FIG. 3 shows that the distance felt by the light passing through the portion corresponding to the transmissive portion D and the portion corresponding to the reflective portion B (the distance of the liquid crystal layer felt by the light when passing through the liquid crystal layer) Because of the different polarization characteristics of light are also different.

That is, if the light passing through the transparent part D passes through the liquid crystal layer having a thickness d, the light passing through the reflecting part B is reflected by the reflective electrode 62 once, and thus has a liquid crystal layer having a thickness of 2d. It is like passing through (not shown).

Therefore, the light passing corresponding to the transmissive portion D and the reflecting portion B has different polarization characteristics, resulting in a difference in color purity in the transmissive mode and the reflective mode.

As a method for solving this problem, as shown in FIG. 4, an etching groove 61 is formed by etching the lower insulating layer 63 corresponding to the transmission part D, and filling liquid crystals (not shown) in this portion. As a method, a configuration in which the path of light passing through the liquid crystal layer is made to correspond to the reflecting portion B and the transmitting portion D is proposed.

The planar configuration of the reflective cross-sectional liquid crystal display device to which the above-mentioned rough cross-sectional structure and the diffusion film and the unevenness described in FIGS. 1 and 2 are applied will be described below with reference to the drawings.

FIG. 5 is an enlarged plan view illustrating one pixel of an array substrate for a transflective liquid crystal display according to a fourth example of the related art.

As shown in the drawing, the gate wiring 70 spaced apart from each other in a predetermined distance in one direction on the substrate 60 and the data wiring 62 which vertically intersect with each other to define the pixel region P are constituted. The thin film transistor T including the gate electrode 71, the active layer 72, the source electrode 74, and the drain electrode 76 is formed at the intersection of the two wires 62 and 70.

In the above-described configuration, the pixel region P is defined as a reflecting portion B and a transmitting portion D as described above, and a reflecting electrode 64 is formed at a portion corresponding to the reflecting portion B, and the transmitting portion The transparent electrode 66 is comprised in the part corresponding to (D).

In this case, the transparent electrode 66 is configured to be in contact with the drain electrode 76.                         

A storage capacitor C _ST connected in parallel with the transparent electrode is formed on the portion 90 of the gate line 61, which is a portion of the gate line as the storage first electrode, and that of the storage first electrode 90. An island-shaped metal pattern 92 formed on the upper surface and in contact with the transparent electrode 66 is used as a storage second electrode.

In the case of using the reflection type liquid crystal display device having the array substrate having the above-described configuration in the reflection mode, a method of improving the brightness by configuring the scattering film as shown in FIG. 2 is not shown in order to increase the light utilization efficiency of external light. can do.

However, when the scattering film (not shown) is configured, the light reflected by the reflective electrode 62 and the polarized light (not shown) are broken in the scattering layer of the scattering film (not shown). The problem of deterioration arises.

Therefore, the process is a little complicated, but the reflection-transmissive liquid crystal display autonomous array substrate fabricated by applying the above-mentioned concave-convex shape as a method of implementing high brightness and high contrast ratio, see FIG. Will be explained.

FIG. 6 is an enlarged plan view showing one pixel of an array substrate for a transflective liquid crystal display device according to a second example of the related art. (Most configurations are the same as in FIG. 5, and thus description thereof will be omitted.)

As shown in the figure, a convex pattern A is formed on the surface of the reflective electrode 64 positioned at the portion corresponding to the reflecting portion B. As shown in FIG.

In this way, as described above, there is an effect of minimizing the specular reflection of light incident from the outside in the reflection mode B and making the diffuse reflection.

When the light is diffusely reflected, not only can a wide viewing angle be secured, but the overall luminance is improved.

However, when a pixel having a shape as shown in FIG. 6 is divided into a transmission portion and a reflection portion, it is difficult to say that the area of the pixel is effectively used.

First, when reflecting portion B, light incident on the surface of the convex pattern A reflects and scatters light at the main viewing angle of the front side desired by the slope angle of the convex pattern, but the convex pattern is not formed. The non-mirror reflector area E reflects most of the incident angle at a mirror reflection angle irrelevant to the actual user's display use.

In general, all natural reflectors consist of three components: specula reflection for incident light, Haze and Lambertian. At this time, in terms of the reflection intensity of the angle of reflection for the incident light, only the area of the part where the bump is formed eventually affects Haze, and this part is a factor that determines the specification of the reflectance of the main reflection field angle. .

On the other hand, the part of the mirror reflector is useless even if its reflectance is good because it is consumed at the mirror reflection angle irrelevant to the environment of use.

That is, in the reflection mode, the portion E other than the convex pattern B may be an area having low utilization efficiency in the pixel region P. FIG.

It is good to increase the use efficiency by minimizing such area, but due to the problem of patterning and randomization of irregularities, such an area is inevitably formed.

For this reason, there is a problem that the image quality of the liquid crystal panel is not clear.

The present invention has been proposed for the purpose of solving the above-described problems, and a convex pattern is randomly formed for one pixel, but the convex pattern is defined as a reflector, and the remaining region except the convex pattern is defined as a transmissive part.

Such a configuration can remove the mirror reflection area compared to the conventional one, and can increase the density of the reflection part by expanding the reflection part in the existing transmission part and increasing the luminance in the transmission mode by expanding it to the transmission area. There is an advantage of increasing the luminance even in the reflection mode.

An array substrate for a reflective transmissive liquid crystal display device according to the present invention for achieving the above object is an insulating substrate; A plurality of gate wires arranged in parallel on the insulating substrate and spaced apart from each other in one direction; A data line defining a pixel area crossing the gate line; A thin film transistor configured at an intersection point of the gate line and the data line; A convex pattern irregularly formed in the pixel region and having an opaque metal deposited on a surface thereof; It includes a transparent electrode connected to the thin film transistor, and configured in the remaining pixel region other than the region in which the pattern is formed.

The opaque metal formed on the surface of the convex pattern is characterized in that the aluminum (Al) or aluminum alloy.

The opaque metal is configured to contact the transparent electrode at the bottom of the convex pattern.

The thin film transistor includes a gate electrode connected to the gate line, an active layer, a source electrode connected to the data line, and a drain electrode spaced apart from the predetermined distance.

The transparent electrode is composed of one selected from the group of transparent conductive metal materials including indium tin oxide (ITO) and indium zinc oxide (IZO).

And an extension portion extending from the gate wiring, and an island-shaped metal pattern formed on the extension portion and contacting the transparent electrode, and an insulating film between the extension portion of the gate wiring and the island-shaped metal pattern. Further configured, the storage capacitor is configured.

According to an aspect of the present invention, there is provided a method of manufacturing an array substrate for a reflective transmissive liquid crystal display device, the method including: forming a plurality of gate wires parallel to each other in one direction on a insulating substrate and a gate electrode connected thereto; Forming a data line crossing the gate line to define a pixel area; Forming a thin film transistor at an intersection point of the gate line and the data line; Forming a convex pattern irregularly formed in the pixel region and having an opaque metal deposited on a surface thereof; Forming a transparent electrode connected to the thin film transistor and remaining in the pixel region except for the region in which the convex pattern is formed.

Hereinafter, exemplary embodiments will be described with reference to the accompanying drawings.

 Example

In the array substrate for a transflective liquid crystal display device according to the present invention, one pixel is defined as a reflector and a transmissive portion. It is characterized by the configuration.

7 is an enlarged plan view illustrating one pixel of the array substrate for a reflective transmissive liquid crystal display device according to the present invention.

 As shown in the drawing, a plurality of gate wirings 104 spaced apart in parallel in a direction by one direction on the substrate 100 and vertically intersect the data wirings 116 defining pixel regions P. Referring to FIG. Configure.

The thin film transistor T including the gate electrode 102, the active layer 108, the source electrode 112, and the drain electrode 114 is formed at the intersection of the two wires 104 and 116.

A plurality of convex patterns 126 are irregularly formed in the pixel region P, and a reflecting plate 128 is formed on the surface of the convex pattern 126.

The transparent electrode 130 in contact with the drain electrode 114 is formed in a region other than the convex pattern 126. Therefore, the convex pattern 128 may be defined as a reflector, and a result of defining the remaining area except the convex pattern 128 as a transmissive part may be obtained.

The storage capacitor C _ST , which is connected in parallel with the transparent electrode 130, is configured on the gate line 104, and is used as a first electrode (storage first electrode) of the storage capacitor C _ST . The storage capacitor includes an island portion metal pattern 117 patterned on the extension portion 105 and contacting the transparent electrode 130 by using the extension portion 105 extending from the gate wiring to the pixel area. It is used as the second electrode (the second storage electrode) of (C _ST).

Hereinafter, a manufacturing process of an array substrate for a reflective transmissive liquid crystal display device according to the present invention will be described with reference to FIGS. 8A to 8D.

8A to 8D are cross sectional views taken along the line VII-VII` and VII-VII` of FIG. 7 and according to the process sequence of the present invention.

First, as shown in FIG. 8A, a single metal such as aluminum (Al), aluminum alloy (AlNd), tungsten (W), chromium (Cr), molybdenum (Mo), or aluminum (Al) on the substrate 100. A gate electrode 102 having a double metal layer structure such as chromium (Cr) (or molybdenum (Mo)) and a gate wiring 104 electrically connected to the gate electrode 102 are formed.

At the same time, an extension portion 105 protruding a predetermined area from the gate wiring is formed in the pixel region P.

Since the material forming the gate electrode 102 and the gate wiring 104 is important for the operation of the liquid crystal display device, aluminum having a low resistance is mainly used to reduce the RC delay. Since corrosion resistance is weak and causes wiring defects due to hillock formation in a subsequent high temperature process, aluminum wiring is used in the form of an alloy or a laminated structure is applied as described above.

Next, an inorganic insulating material containing silicon nitride (SiN _x ), silicon oxide (SiO ₂ ), or the like, or in some cases benzocyclobutene (BCB), on the substrate 100 on which the gate wiring 104 is formed. The gate insulating layer 106 is formed by depositing or applying one of an organic insulating material containing an acrylic resin or the like.

Next, the active layer 108 formed of amorphous silicon on the gate insulating layer 106 on the gate electrode 102 and the ohmic contact layer 110 formed of amorphous silicon containing impurities (ohmic) contact layer) to form a laminate.

Successively, a selected one of the conductive metal materials as described above is deposited and patterned on the ohmic contact layer 110 to be perpendicular to the source electrode 112, the drain electrode 114, and the source electrode 112. An extended data line 116 is formed.

At the same time, an island-shaped metal pattern 117 is formed on the extension 105 of the gate wiring 104 that defines the pixel region P.

Next, as shown in FIG. 8B, silicon nitride (SiN _X ) or silicon oxide (SiO ₂ ) is included on the entire surface of the substrate 100 on which the source and drain electrodes 112 and 114 and the data line 116 are formed. One selected from the group of inorganic insulating materials is deposited to form the first passivation layer 118.

Since the first protective film 118, which is the inorganic film, has better interface characteristics with the active layer 108 than the organic film formed in a subsequent process, the first protective film 118 is preferably formed to contact the active layer before forming the organic film.

Subsequently, a second passivation layer 120 is formed by coating one selected from a group of organic insulating materials including benzocyclobutene (BCB) and an acryl-based resin on the first passivation layer 118. do.

The photosensitive organic film is deposited on the second passivation layer, and then patterned to form a convex pattern 126 irregularly corresponding to the pixel area.

At this time, the convex pattern 126 is formed in a semi-circular shape by a method of melting the organic film by applying a predetermined heat after patterning the rectangular shape.

As shown in FIG. 8C, the drain contact hole 122 exposing a portion of the drain electrode 114 by patterning the second passivation layer and the first insulating layer below the exposing layer, and exposing a portion of the metal pattern 117. The storage contact hole 124 is formed.

In a continuous process, a reflective plate 128 is formed by depositing a metal having high reflectivity such as aluminum (Al) or an aluminum alloy (for example, AlNd), silver (Ag), or a silver alloy on the convex pattern 126. .

In other words. After the above-described metal is deposited on the entire surface of the substrate 100, the metal remains only in the convex pattern 126 through a photo process.

Next, as shown in FIG. 8D, indium tin oxide (ITO) and indium zinc oxide (IZO) are formed on the entire surface of the substrate 100 having the reflector 128 formed only on the surface of the convex pattern 126. After depositing and patterning a transparent conductive metal material, the transparent electrode 130 is formed in contact with the drain electrode 114 and in contact with the island-shaped metal pattern 117 through the pixel region (P). .

In this case, the transparent electrode 130 does not cover the unevenness so as to correspond to only a region other than the uneven region. Accordingly, the reflective plate 128 and the pixel electrode 130 are in contact with each other at the lower end of the convex pattern 126.

In the above-described process, an island-shaped metal pattern 117 in contact with the transparent electrode 130 is formed as a storage first electrode, and the portion 105 protruding and extending from the gate line 104 to a part of the pixel region is formed. A storage capacitor C _ST is used as a storage second electrode and a gate insulating film 106 interposed between these two electrodes as a dielectric.

Since the convex pattern 126 in which the reflecting plate 128 is formed in the pixel region P is randomly formed, the convex pattern 128 is defined as a reflecting portion, and the region between the convex patterns 126 is defined as a transmitting portion.

Such a configuration can solve the problem of low light utilization efficiency in the region between the convex patterns 128 in the reflection mode.

That is, unlike the conventional art, the light use area of the reflection mode and the transmission mode is further increased.

According to the above-described process, a color filter substrate for a reflective transmissive color liquid crystal display device can be manufactured.

Therefore, the reflective liquid crystal display device to which the color filter substrate manufactured according to the present invention is applied has the following characteristics.

First, by constructing a convex pattern having a reflective plate formed on the entire surface of the pixel region at random, the winter reflection area is removed and the light is enlarged in the transmissive mode to increase the luminance in the transmissive mode.

Third, by forming a convex pattern in which a reflector is formed in the existing transmission region, the density per pixel of the reflector may be increased, thereby improving luminance in reflection mode.

Claims (22)

An insulating substrate; A plurality of gate wires arranged in parallel on the insulating substrate and spaced apart from each other in one direction; A data line defining a pixel area crossing the gate line; A thin film transistor configured at an intersection point of the gate line and the data line; A convex pattern irregularly formed in the pixel region and having an opaque metal deposited on a surface thereof; A transparent electrode connected to the thin film transistor and configured in the remaining pixel region except for the region having the pattern Array substrate for a transmissive liquid crystal display device comprising a. The method of claim 1, The opaque metal formed on the surface of the convex pattern is one selected from the group of metals including aluminum (Al), aluminum alloy, silver (Ag) and silver alloy. The method of claim 1, And the opaque metal is in contact with the transparent electrode at a lower end of the convex pattern. The method of claim 1, The thin film transistor may include a gate electrode connected to the gate line, an active layer, a source electrode connected to the data line, and a drain electrode spaced apart from the predetermined distance. The method of claim 1, And the transparent electrode is one selected from the group of transparent conductive metal materials including indium tin oxide (ITO) and indium zinc oxide (IZO). The method of claim 1, And an extension portion extending from the gate wiring and an island-shaped metal pattern formed on the extension portion and in contact with the transparent electrode. The method of claim 6, And a storage capacitor further comprising an insulating film between the extension portion of the gate wiring and the island-shaped metal pattern. Forming a plurality of gate wires and the gate electrodes connected to the insulating substrate in parallel to be spaced apart from each other in one direction; Forming a data line crossing the gate line to define a pixel area; Forming a thin film transistor at an intersection point of the gate line and the data line; Forming a convex pattern irregularly formed in the pixel region and having an opaque metal deposited on a surface thereof; Forming a transparent electrode connected to the thin film transistor and in the remaining pixel region except for the region in which the convex pattern is formed. Array substrate manufacturing method for a reflective transmissive liquid crystal display device comprising a. The method of claim 8, The opaque metal on the surface of the convex pattern is formed of one selected from the group of metals including aluminum (Al), aluminum alloy, silver and silver alloy. The method of claim 8, And the opaque metal is in contact with the transparent electrode at the lower end of the convex pattern. The method of claim 8, The thin film transistor includes a gate electrode connected to the gate line, an active layer, a source electrode connected to the data line, and a drain electrode spaced apart from the predetermined distance. The method of claim 8, The transparent electrode is an array substrate manufacturing method for a reflective transmissive liquid crystal display device comprising one selected from the group of transparent conductive metal materials including indium tin oxide (ITO) and indium zinc oxide (IZO). The method of claim 8, And forming an extension portion extending from the gate wiring and an island-shaped metal pattern formed on the extension portion and in contact with the transparent electrode. The method of claim 13, And a storage capacitor further formed with an insulating film between the extension portion of the gate wiring and the island-shaped metal pattern. Forming a plurality of gate wirings and gate electrodes connected thereto, the plurality of gate wirings being spaced apart from each other in one direction in parallel in a direction; Forming a gate insulating film on a front surface of the substrate on which the gate wiring and the gate electrode are formed; Stacking an active layer and an ohmic contact layer on the gate insulating layer on the gate electrode; Forming a source electrode and a drain electrode in contact with the ohmic contact layer and spaced apart from each other, and a data line connected to the source electrode and crossing the gate line to define a pixel region; Forming a second insulating film on an entire surface of the substrate on which the source and drain electrodes are formed, using an inorganic insulating material; Forming a third insulating film on the second insulating film using an organic insulating material; Forming a semicircular convex pattern on the third insulating layer by patterning the photosensitive organic layer on the third insulating layer and irregularly cross-sectioning the pixel region; Forming a reflective plate made of an opaque metal only on the surface of the convex pattern; Forming a transparent electrode in the pixel region except for the convex pattern while contacting the drain electrode Array substrate manufacturing method for a reflective transmissive liquid crystal display device comprising a. The method of claim 15, And the reflecting plate is formed of one selected from a group of metals including aluminum (Al), an aluminum alloy, and a silver and a silver alloy. The method of claim 15, And a reflecting plate is in contact with the transparent electrode at a lower end of the convex pattern. The method of claim 15, And the second insulating film is formed of one selected from the group of inorganic insulating materials including silicon nitride (SiN _x ) or silicon oxide (SiO ₂ ). The method of claim 15, The third insulating film is a method of manufacturing an array substrate for a reflective liquid crystal display device formed of one selected from the group of organic insulating materials including benzocyclobutene (BCB) and acrylic resin (resin). The method of claim 15, The transparent electrode is an array substrate manufacturing method for a reflective transmissive liquid crystal display device comprising one selected from the group of transparent conductive metal materials including indium tin oxide (ITO) and indium zinc oxide (IZO). The method of claim 15, And forming an extension portion extending from the gate wiring and an island-shaped metal pattern formed on the extension portion and in contact with the transparent electrode. The method of claim 21, And a storage capacitor further formed with an insulating film between the extension portion of the gate wiring and the island-shaped metal pattern.

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