KR100606179B1 - 솔더 페이스트 및 그 납땜 방법 - Google Patents
솔더 페이스트 및 그 납땜 방법 Download PDFInfo
- Publication number
- KR100606179B1 KR100606179B1 KR1020000036151A KR20000036151A KR100606179B1 KR 100606179 B1 KR100606179 B1 KR 100606179B1 KR 1020000036151 A KR1020000036151 A KR 1020000036151A KR 20000036151 A KR20000036151 A KR 20000036151A KR 100606179 B1 KR100606179 B1 KR 100606179B1
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- Prior art keywords
- solder
- solder paste
- acid anhydride
- flux
- soldering
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- 229910000679 solder Inorganic materials 0.000 title claims abstract description 196
- 238000005476 soldering Methods 0.000 title claims abstract description 33
- 238000000034 method Methods 0.000 title claims description 25
- 150000008065 acid anhydrides Chemical class 0.000 claims abstract description 43
- 230000004907 flux Effects 0.000 claims abstract description 43
- 239000000843 powder Substances 0.000 claims abstract description 27
- 150000007933 aliphatic carboxylic acids Chemical class 0.000 claims abstract description 11
- 238000006297 dehydration reaction Methods 0.000 claims abstract description 11
- 125000004432 carbon atom Chemical group C* 0.000 claims abstract description 10
- 230000018044 dehydration Effects 0.000 claims abstract description 10
- 230000003213 activating effect Effects 0.000 claims abstract description 3
- 239000003795 chemical substances by application Substances 0.000 claims abstract 2
- WFDIJRYMOXRFFG-UHFFFAOYSA-N Acetic anhydride Chemical compound CC(=O)OC(C)=O WFDIJRYMOXRFFG-UHFFFAOYSA-N 0.000 claims description 30
- 229910045601 alloy Inorganic materials 0.000 claims description 23
- 239000000956 alloy Substances 0.000 claims description 23
- 239000013543 active substance Substances 0.000 claims description 14
- 230000008569 process Effects 0.000 claims description 13
- 238000002844 melting Methods 0.000 claims description 12
- 230000008018 melting Effects 0.000 claims description 12
- 229910020830 Sn-Bi Inorganic materials 0.000 claims description 11
- 229910018728 Sn—Bi Inorganic materials 0.000 claims description 11
- 150000001412 amines Chemical class 0.000 claims description 11
- 229910020816 Sn Pb Inorganic materials 0.000 claims description 8
- 229910020922 Sn-Pb Inorganic materials 0.000 claims description 8
- 229910008783 Sn—Pb Inorganic materials 0.000 claims description 8
- 230000005496 eutectics Effects 0.000 claims description 5
- 150000007524 organic acids Chemical class 0.000 abstract description 21
- 230000007797 corrosion Effects 0.000 abstract description 8
- 238000005260 corrosion Methods 0.000 abstract description 8
- 239000012190 activator Substances 0.000 description 11
- QTBSBXVTEAMEQO-UHFFFAOYSA-N Acetic acid Chemical compound CC(O)=O QTBSBXVTEAMEQO-UHFFFAOYSA-N 0.000 description 9
- FERIUCNNQQJTOY-UHFFFAOYSA-N Butyric acid Chemical compound CCCC(O)=O FERIUCNNQQJTOY-UHFFFAOYSA-N 0.000 description 8
- XBDQKXXYIPTUBI-UHFFFAOYSA-N dimethylselenoniopropionate Natural products CCC(O)=O XBDQKXXYIPTUBI-UHFFFAOYSA-N 0.000 description 8
- 239000000203 mixture Substances 0.000 description 8
- 239000003981 vehicle Substances 0.000 description 8
- 238000002474 experimental method Methods 0.000 description 7
- RSWGJHLUYNHPMX-UHFFFAOYSA-N Abietic-Saeure Natural products C12CCC(C(C)C)=CC2=CCC2C1(C)CCCC2(C)C(O)=O RSWGJHLUYNHPMX-UHFFFAOYSA-N 0.000 description 6
- KHPCPRHQVVSZAH-HUOMCSJISA-N Rosin Natural products O(C/C=C/c1ccccc1)[C@H]1[C@H](O)[C@@H](O)[C@@H](O)[C@@H](CO)O1 KHPCPRHQVVSZAH-HUOMCSJISA-N 0.000 description 6
- 230000000694 effects Effects 0.000 description 6
- 235000005985 organic acids Nutrition 0.000 description 6
- 239000002245 particle Substances 0.000 description 6
- KHPCPRHQVVSZAH-UHFFFAOYSA-N trans-cinnamyl beta-D-glucopyranoside Natural products OC1C(O)C(O)C(CO)OC1OCC=CC1=CC=CC=C1 KHPCPRHQVVSZAH-UHFFFAOYSA-N 0.000 description 6
- 238000005516 engineering process Methods 0.000 description 5
- 239000002184 metal Substances 0.000 description 5
- 229910052751 metal Inorganic materials 0.000 description 5
- 235000019260 propionic acid Nutrition 0.000 description 4
- IUVKMZGDUIUOCP-BTNSXGMBSA-N quinbolone Chemical compound O([C@H]1CC[C@H]2[C@H]3[C@@H]([C@]4(C=CC(=O)C=C4CC3)C)CC[C@@]21C)C1=CCCC1 IUVKMZGDUIUOCP-BTNSXGMBSA-N 0.000 description 4
- 229910020994 Sn-Zn Inorganic materials 0.000 description 3
- 229910009069 Sn—Zn Inorganic materials 0.000 description 3
- 230000008901 benefit Effects 0.000 description 3
- 230000006866 deterioration Effects 0.000 description 3
- -1 halide hydrochloride Chemical class 0.000 description 3
- REOJLIXKJWXUGB-UHFFFAOYSA-N mofebutazone Chemical group O=C1C(CCCC)C(=O)NN1C1=CC=CC=C1 REOJLIXKJWXUGB-UHFFFAOYSA-N 0.000 description 3
- 238000009736 wetting Methods 0.000 description 3
- 239000002253 acid Substances 0.000 description 2
- 229910052797 bismuth Inorganic materials 0.000 description 2
- YHASWHZGWUONAO-UHFFFAOYSA-N butanoyl butanoate Chemical compound CCCC(=O)OC(=O)CCC YHASWHZGWUONAO-UHFFFAOYSA-N 0.000 description 2
- 230000015556 catabolic process Effects 0.000 description 2
- 238000006731 degradation reaction Methods 0.000 description 2
- 230000001419 dependent effect Effects 0.000 description 2
- 238000011161 development Methods 0.000 description 2
- 150000004820 halides Chemical class 0.000 description 2
- WYVAMUWZEOHJOQ-UHFFFAOYSA-N propionic anhydride Chemical compound CCC(=O)OC(=O)CC WYVAMUWZEOHJOQ-UHFFFAOYSA-N 0.000 description 2
- 230000009257 reactivity Effects 0.000 description 2
- 238000007650 screen-printing Methods 0.000 description 2
- 239000002904 solvent Substances 0.000 description 2
- 238000003860 storage Methods 0.000 description 2
- 239000013008 thixotropic agent Substances 0.000 description 2
- 229910052718 tin Inorganic materials 0.000 description 2
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 2
- QCQCHGYLTSGIGX-GHXANHINSA-N 4-[[(3ar,5ar,5br,7ar,9s,11ar,11br,13as)-5a,5b,8,8,11a-pentamethyl-3a-[(5-methylpyridine-3-carbonyl)amino]-2-oxo-1-propan-2-yl-4,5,6,7,7a,9,10,11,11b,12,13,13a-dodecahydro-3h-cyclopenta[a]chrysen-9-yl]oxy]-2,2-dimethyl-4-oxobutanoic acid Chemical compound N([C@@]12CC[C@@]3(C)[C@]4(C)CC[C@H]5C(C)(C)[C@@H](OC(=O)CC(C)(C)C(O)=O)CC[C@]5(C)[C@H]4CC[C@@H]3C1=C(C(C2)=O)C(C)C)C(=O)C1=CN=CC(C)=C1 QCQCHGYLTSGIGX-GHXANHINSA-N 0.000 description 1
- 206010022998 Irritability Diseases 0.000 description 1
- 229910020836 Sn-Ag Inorganic materials 0.000 description 1
- 229910020988 Sn—Ag Inorganic materials 0.000 description 1
- 230000033228 biological regulation Effects 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 238000005219 brazing Methods 0.000 description 1
- 150000001735 carboxylic acids Chemical class 0.000 description 1
- 239000004359 castor oil Substances 0.000 description 1
- 235000019438 castor oil Nutrition 0.000 description 1
- 238000006243 chemical reaction Methods 0.000 description 1
- 239000002131 composite material Substances 0.000 description 1
- 238000000354 decomposition reaction Methods 0.000 description 1
- 230000002950 deficient Effects 0.000 description 1
- 230000002542 deteriorative effect Effects 0.000 description 1
- 238000009792 diffusion process Methods 0.000 description 1
- 238000010494 dissociation reaction Methods 0.000 description 1
- 230000005593 dissociations Effects 0.000 description 1
- 238000009826 distribution Methods 0.000 description 1
- 230000007613 environmental effect Effects 0.000 description 1
- 230000001747 exhibiting effect Effects 0.000 description 1
- ZEMPKEQAKRGZGQ-XOQCFJPHSA-N glycerol triricinoleate Natural products CCCCCC[C@@H](O)CC=CCCCCCCCC(=O)OC[C@@H](COC(=O)CCCCCCCC=CC[C@@H](O)CCCCCC)OC(=O)CCCCCCCC=CC[C@H](O)CCCCCC ZEMPKEQAKRGZGQ-XOQCFJPHSA-N 0.000 description 1
- 229910052736 halogen Inorganic materials 0.000 description 1
- 150000003840 hydrochlorides Chemical class 0.000 description 1
- 239000012433 hydrogen halide Substances 0.000 description 1
- 229910000039 hydrogen halide Inorganic materials 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 238000004321 preservation Methods 0.000 description 1
- 230000009467 reduction Effects 0.000 description 1
- 238000010405 reoxidation reaction Methods 0.000 description 1
- 238000011160 research Methods 0.000 description 1
- 150000003839 salts Chemical class 0.000 description 1
- 238000003892 spreading Methods 0.000 description 1
- 230000007480 spreading Effects 0.000 description 1
- 239000000758 substrate Substances 0.000 description 1
- 230000001629 suppression Effects 0.000 description 1
- 238000012360 testing method Methods 0.000 description 1
- 230000009974 thixotropic effect Effects 0.000 description 1
Images
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
- B23K35/00—Rods, electrodes, materials, or media, for use in soldering, welding, or cutting
- B23K35/22—Rods, electrodes, materials, or media, for use in soldering, welding, or cutting characterised by the composition or nature of the material
- B23K35/36—Selection of non-metallic compositions, e.g. coatings, fluxes; Selection of soldering or welding materials, conjoint with selection of non-metallic compositions, both selections being of interest
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
- B23K35/00—Rods, electrodes, materials, or media, for use in soldering, welding, or cutting
- B23K35/22—Rods, electrodes, materials, or media, for use in soldering, welding, or cutting characterised by the composition or nature of the material
- B23K35/36—Selection of non-metallic compositions, e.g. coatings, fluxes; Selection of soldering or welding materials, conjoint with selection of non-metallic compositions, both selections being of interest
- B23K35/3612—Selection of non-metallic compositions, e.g. coatings, fluxes; Selection of soldering or welding materials, conjoint with selection of non-metallic compositions, both selections being of interest with organic compounds as principal constituents
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
- B23K35/00—Rods, electrodes, materials, or media, for use in soldering, welding, or cutting
- B23K35/02—Rods, electrodes, materials, or media, for use in soldering, welding, or cutting characterised by mechanical features, e.g. shape
- B23K35/0222—Rods, electrodes, materials, or media, for use in soldering, welding, or cutting characterised by mechanical features, e.g. shape for use in soldering, brazing
- B23K35/0244—Powders, particles or spheres; Preforms made therefrom
- B23K35/025—Pastes, creams, slurries
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
- B23K35/00—Rods, electrodes, materials, or media, for use in soldering, welding, or cutting
- B23K35/22—Rods, electrodes, materials, or media, for use in soldering, welding, or cutting characterised by the composition or nature of the material
- B23K35/24—Selection of soldering or welding materials proper
- B23K35/26—Selection of soldering or welding materials proper with the principal constituent melting at less than 400 degrees C
- B23K35/264—Bi as the principal constituent
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
- B23K35/00—Rods, electrodes, materials, or media, for use in soldering, welding, or cutting
- B23K35/22—Rods, electrodes, materials, or media, for use in soldering, welding, or cutting characterised by the composition or nature of the material
- B23K35/36—Selection of non-metallic compositions, e.g. coatings, fluxes; Selection of soldering or welding materials, conjoint with selection of non-metallic compositions, both selections being of interest
- B23K35/3612—Selection of non-metallic compositions, e.g. coatings, fluxes; Selection of soldering or welding materials, conjoint with selection of non-metallic compositions, both selections being of interest with organic compounds as principal constituents
- B23K35/3613—Polymers, e.g. resins
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
- B23K35/00—Rods, electrodes, materials, or media, for use in soldering, welding, or cutting
- B23K35/22—Rods, electrodes, materials, or media, for use in soldering, welding, or cutting characterised by the composition or nature of the material
- B23K35/36—Selection of non-metallic compositions, e.g. coatings, fluxes; Selection of soldering or welding materials, conjoint with selection of non-metallic compositions, both selections being of interest
- B23K35/3612—Selection of non-metallic compositions, e.g. coatings, fluxes; Selection of soldering or welding materials, conjoint with selection of non-metallic compositions, both selections being of interest with organic compounds as principal constituents
- B23K35/3618—Carboxylic acids or salts
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- Engineering & Computer Science (AREA)
- Mechanical Engineering (AREA)
- Electric Connection Of Electric Components To Printed Circuits (AREA)
Abstract
Description
Claims (17)
- Sn-Bi 솔더 분말(solder powder), 및적어도 하나의 활성제(activating agent)와, 탄소 원자가 7 개 이하인 지방족 카르복시산(aliphatic carboxylic acid)의 탈수 반응에 의해 얻어지는 산 무수물(acid anhydride)을 함유하는 플럭스(flux)로 이루어지는 솔더 페이스트로서,상기 솔더 페이스트는 Sn-Pb 공정 솔더보다 녹는점이 낮은 솔더 합금의 납땜에 사용하는 것을 특징으로 하는 솔더 페이스트(solder paste).
- Sn-Bi 솔더 분말, 및적어도 하나의 활성제와, 하기 화학식을 갖는 산 무수물을 함유하는 플럭스로 이루어지는 것을 특징으로 하는 솔더 페이스트.[화학식](CH3(CH2)nCO)2O(화학식 중 n은 0 내지 2인 정수임)
- 제 2 항에 있어서,상기 산 무수물로서 무수초산(acetic anhydride)이 0.5 내지 3.0 중량%의 양으로 상기 플럭스에 함유되는 것을 특징으로 하는 솔더 페이스트.
- 제 2 항에 있어서,아민(amine)이 상기 플럭스에 더 함유되는 것을 특징으로 하는 솔더 페이스트.
- 삭제
- 적어도 하나의 활성제, 및 탄소 원자가 7 개 이하인 지방족 카르복시산의 탈수 반응에 의해 얻어지는 산 무수물을 함유하는 플럭스와, Sn-Bi 솔더 분말을 혼합하여 솔더 페이스트를 형성하는 단계,상기 산 무수물로, 상기 플럭스 내에 무수초산이 0.5 내지 3.0 중량%의 양으로 함유되도록 선택하는 단계,상기 솔더 페이스트를 소정의 위치에 배치시키는 단계, 및상기 솔더 페이스트와 솔더 합금을 납땜하는 단계를 구비하며,상기 솔더 합금은 녹는점이 Sn-Pb 공정(eutectic) 솔더보다 낮은 것을 특징으로 하는 납땜 방법.
- 적어도 하나의 활성제, 및 하기 화학식을 갖는 산 무수물을 함유하는 플럭스와, Sn-Bi 솔더 분말을 혼합하여 솔더 페이스트를 형성하는 단계,[화학식](CH3(CH2)nCO)2O(화학식 중 n은 0 내지 2인 정수임)상기 산 무수물로, 상기 플럭스 내에 무수초산이 0.5 내지 3.0 중량%의 양으로 함유되도록 선택하는 단계,상기 솔더 페이스트를 소정의 위치에 배치시키는 단계, 및상기 솔더 페이스트와 솔더 합금을 납땜하는 단계를 구비하며,상기 솔더 합금은 녹는점이 Sn-Pb 공정 솔더보다 낮은 것을 특징으로 하는 납땜 방법.
- 삭제
- 삭제
- 삭제
- 적어도 하나의 활성제, 및 탄소 원자가 7 개 이하인 지방족 카르복시산의 탈수 반응에 의해 얻어지는 산 무수물을 함유하는 플럭스와, Sn-Bi 솔더 분말을 혼합하여 솔더 페이스트를 형성하는 단계,상기 산 무수물로, 상기 플럭스 내에 무수초산이 0.5 내지 3.0 중량%의 양으로 함유되도록 선택하는 단계,상기 솔더 페이스트를 소정의 위치에 배치시키는 단계, 및상기 솔더 페이스트와 솔더 합금을 납땜하는 단계를 구비하며,상기 솔더 합금은 40 내지 60 중량%의 Sn과 60 내지 40 중량%의 Bi로 이루어지는 것을 특징으로 하는 납땜 방법.
- 적어도 하나의 활성제, 및 하기 화학식을 갖는 지방족 카르복시산의 탈수 반응에 의해 얻어지는 산 무수물을 함유하는 플럭스와, Sn-Bi 솔더 분말을 혼합하여 솔더 페이스트를 형성하는 단계,[화학식](CH3(CH2)nCO)2O(화학식 중 n은 0 내지 2인 정수임)상기 산 무수물로, 상기 플럭스 내에 무수초산이 0.5 내지 3.0 중량%의 양으로 함유되도록 선택하는 단계,상기 솔더 페이스트를 소정의 위치에 배치시키는 단계, 및상기 솔더 페이스트와 솔더 합금을 납땜하는 단계를 구비하며,상기 솔더 합금은 40 내지 60 중량%의 Sn과 60 내지 40 중량%의 Bi로 이루어지는 것을 특징으로 하는 납땜 방법.
- 삭제
- 삭제
- 삭제
- 솔더 분말, 및적어도 하나의 활성제와, 탄소 원자가 7 개 이하인 지방족 카르복시산의 탈수 반응에 의해 얻어지는 산 무수물을 함유하는 플럭스로 이루어지는 솔더 페이스트로서,상기 솔더 페이스트가, Sn-Pb 공정 솔더보다 녹는점이 낮은 솔더 합금을 납땜하는데 사용되고,상기 산 무수물이 하기 화학식을 갖고,[화학식](CH3(CH2)nCO)2O(화학식 중 n은 0 내지 2인 정수임)상기 산 무수물이 무수초산이며, 상기 플럭스 내에 무수초산이 0.5 내지 3.0 중량%의 양으로 함유되는 것을 특징으로 하는 솔더 페이스트.
- 적어도 하나의 활성제, 및 산 무수물을 함유하는 플럭스와, Sn-Bi 솔더 분말을 혼합하여 솔더 페이스트를 형성하는 단계,상기 솔더 페이스트를 소정의 위치에 배치시키는 단계, 및상기 솔더 페이스트와 솔더 합금을 납땜하는 단계를 구비하며,상기 솔더 합금은 40 내지 60 중량%의 Sn과 60 내지 40 중량%의 Bi로 이루어지는 것을 특징으로 하는 납땜 방법.
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP99-186569 | 1999-06-30 | ||
| JP18656999A JP4315527B2 (ja) | 1999-06-30 | 1999-06-30 | はんだペースト |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| KR20010049653A KR20010049653A (ko) | 2001-06-15 |
| KR100606179B1 true KR100606179B1 (ko) | 2006-07-31 |
Family
ID=16190835
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| KR1020000036151A Expired - Lifetime KR100606179B1 (ko) | 1999-06-30 | 2000-06-28 | 솔더 페이스트 및 그 납땜 방법 |
Country Status (4)
| Country | Link |
|---|---|
| US (1) | US6656291B1 (ko) |
| JP (1) | JP4315527B2 (ko) |
| KR (1) | KR100606179B1 (ko) |
| TW (1) | TW458840B (ko) |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US8420722B2 (en) | 2008-07-10 | 2013-04-16 | Electronics And Telecommunications Research Institute | Composition and methods of forming solder bump and flip chip using the same |
| US9006037B2 (en) | 2013-03-20 | 2015-04-14 | Electronics And Telecommunications Research Institute | Methods of forming bump and semiconductor device with the same |
Families Citing this family (8)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2004017093A (ja) * | 2002-06-17 | 2004-01-22 | Toshiba Corp | 鉛フリーはんだ合金、及びこれを用いた鉛フリーはんだペースト |
| US20050077502A1 (en) * | 2003-10-09 | 2005-04-14 | Munie Gregory C. | Surface reactive preservative for use with solder preforms |
| KR100927610B1 (ko) * | 2005-01-05 | 2009-11-23 | 삼성에스디아이 주식회사 | 감광성 페이스트 조성물, 및 이를 이용하여 제조된플라즈마 디스플레이 패널 |
| JP2011096900A (ja) * | 2009-10-30 | 2011-05-12 | Fujitsu Ltd | 導電体およびプリント配線板並びにそれらの製造方法 |
| KR101140462B1 (ko) * | 2010-07-02 | 2012-04-30 | 김성균 | 알루미늄용 솔더 페이스트 및 플럭스 |
| RU2463143C2 (ru) * | 2010-12-13 | 2012-10-10 | Открытое акционерное общество "Авангард" | Флюс для низкотемпературной пайки |
| CN103842126A (zh) * | 2011-08-02 | 2014-06-04 | 阿尔法金属公司 | 焊料组合物 |
| EP2763515A4 (en) * | 2011-09-30 | 2015-07-15 | Murata Manufacturing Co | ELECTRONIC DEVICE, JUNCTION MATERIAL, AND METHOD FOR PRODUCING ELECTRONIC DEVICE |
Family Cites Families (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4216035A (en) * | 1977-12-23 | 1980-08-05 | International Business Machines Corporation | Removable protective coating and process of using same |
| US4557767A (en) * | 1983-10-31 | 1985-12-10 | Scm Corporation | Fusible powdered metal paste |
| JP3722501B2 (ja) | 1994-09-19 | 2005-11-30 | 日本テルペン化学株式会社 | ハンダ付け用フラックス |
-
1999
- 1999-06-30 JP JP18656999A patent/JP4315527B2/ja not_active Expired - Lifetime
-
2000
- 2000-06-26 TW TW089112512A patent/TW458840B/zh not_active IP Right Cessation
- 2000-06-27 US US09/604,255 patent/US6656291B1/en not_active Expired - Lifetime
- 2000-06-28 KR KR1020000036151A patent/KR100606179B1/ko not_active Expired - Lifetime
Cited By (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US8420722B2 (en) | 2008-07-10 | 2013-04-16 | Electronics And Telecommunications Research Institute | Composition and methods of forming solder bump and flip chip using the same |
| US8802760B2 (en) | 2008-07-10 | 2014-08-12 | Electronics And Telecommunications Research Institute | Composition and methods of forming solder bump and flip chip using the same |
| US9155236B2 (en) | 2008-07-10 | 2015-10-06 | Electronics And Telecommunications Research Institute | Composition and methods of forming solder bump and flip chip using the same |
| US9462736B2 (en) | 2008-07-10 | 2016-10-04 | Electronics And Telecommunications Research Institute | Composition and methods of forming solder bump and flip chip using the same |
| US9006037B2 (en) | 2013-03-20 | 2015-04-14 | Electronics And Telecommunications Research Institute | Methods of forming bump and semiconductor device with the same |
Also Published As
| Publication number | Publication date |
|---|---|
| KR20010049653A (ko) | 2001-06-15 |
| JP4315527B2 (ja) | 2009-08-19 |
| US6656291B1 (en) | 2003-12-02 |
| TW458840B (en) | 2001-10-11 |
| JP2001018090A (ja) | 2001-01-23 |
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