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JPS60175494A - Method of producing metal base circuit board - Google Patents

Method of producing metal base circuit board

Info

Publication number
JPS60175494A
JPS60175494A JP59030551A JP3055184A JPS60175494A JP S60175494 A JPS60175494 A JP S60175494A JP 59030551 A JP59030551 A JP 59030551A JP 3055184 A JP3055184 A JP 3055184A JP S60175494 A JPS60175494 A JP S60175494A
Authority
JP
Japan
Prior art keywords
insulating layer
layer
hole
circuit
circuit conductor
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP59030551A
Other languages
Japanese (ja)
Inventor
久子 森
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Panasonic Holdings Corp
Original Assignee
Matsushita Electric Industrial Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Matsushita Electric Industrial Co Ltd filed Critical Matsushita Electric Industrial Co Ltd
Priority to JP59030551A priority Critical patent/JPS60175494A/en
Publication of JPS60175494A publication Critical patent/JPS60175494A/en
Pending legal-status Critical Current

Links

Landscapes

  • Production Of Multi-Layered Print Wiring Board (AREA)
  • Printing Elements For Providing Electric Connections Between Printed Circuits (AREA)

Abstract

(57)【要約】本公報は電子出願前の出願データであるた
め要約のデータは記録されません。
(57) [Summary] This bulletin contains application data before electronic filing, so abstract data is not recorded.

Description

【発明の詳細な説明】 産業上の利用分野 本発明は電子機器に利用される金属ベース回路基板の製
造方法に関するものである。
DETAILED DESCRIPTION OF THE INVENTION Field of the Invention The present invention relates to a method of manufacturing a metal-based circuit board used in electronic equipment.

従来例の構成とその問題点 近年電子機器分野においてIC,LSI、パワートラン
ジスタ等の発熱部品を含む多種多搦の′電子部品を低コ
ストでいかに尚密度に小型に実装できるかが大きな命題
となシ、これに伴い技術的方向としては多層化、高集積
化の方向へ進んできている。ここで従来の多層基板の主
なものについて記述する。構成別にみるとアルミナ等の
基板へのセラミック多層基板、アルミニウム、鉄等の金
属ベース上に有機高分子材料からなる樹脂を絶縁層とし
て多層化する金属ベース多層基板。エポキシ。
Conventional configurations and their problems In recent years, in the field of electronic equipment, the question of how to package a wide variety of electronic components, including heat-generating components such as ICs, LSIs, and power transistors, in a compact and compact manner at low cost has become a major issue. Along with this, the technological direction is progressing toward multilayering and high integration. Here, the main types of conventional multilayer substrates will be described. By structure, there are ceramic multilayer substrates on substrates such as alumina, and metal-based multilayer substrates on which resins made of organic polymer materials are multilayered as insulating layers on metal bases such as aluminum and iron. epoxy.

フェノール等の樹脂基板上に樹脂絶線層で多層化する樹
脂多層基板がある。第1図は従来の樹脂を絶縁層とした
多層型の金属ベース基板の断面図であり、1は金属ベー
ス、2a、2bは絶縁層、3a、3bは導体層、4はス
ルーホール層である。
There is a resin multilayer board made of a resin board made of phenol or the like and multilayered with resin insulation layers. Figure 1 is a cross-sectional view of a conventional multilayer metal base board with an insulating layer made of resin, in which 1 is a metal base, 2a and 2b are insulating layers, 3a and 3b are conductor layers, and 4 is a through-hole layer. .

従来は印刷性のある絶襟材料、導体材料をシルクスクリ
ーン又はステンレススクリーンにより印刷し、乾燥、硬
化させる工程を繰り返すことにより多層化する方法であ
る。アルミニウム等の金属ベース1の上に有機高分子材
料からなる絶縁ペーストを印刷し、乾燥後、硬化させ硬
化絶縁)@2aを形成する。次に第2図に示すように低
温硬化型の銅あるいは銀ペーストを印刷後、乾燥、硬化
させ硬化導体層3aを形成する。さらに第3図に示すよ
うにスルーホール層の形成であるが、スルーホール用の
孔のあいた絶縁パターンを印刷し、乾燥硬化させ、硬化
状態の絶縁層2bを形成後、前記導体材料でスルーホー
ル4全印刷、乾燥、硬化後、前記導体形成工程と同様な
方法により、下層導体38層とスルーホールで導通のと
れたηす体層3bを形成する。以上の様な絶縁層形成工
程、スルーホール形成工程、導体形成工程を繰り返すこ
とにより多層化する方法である。しかしながら上記の製
造方法においてはパターン形成がすべて印刷によるため
、層数が増すにつれて表面の凹凸が大きく平坦性がくず
れ多層化も困難なものとなる。スルーホールパターンの
形成も困難となる。またこれらの点に関連して乾燥した
パターン上に重ねてパターンを形成したい場合、十分に
乾燥された状態でなければ下のパターンがくずれファイ
ンラインが形成できない場合もある。この乾燥工程につ
いてであるがこの時間は長く、また印刷するたびに必要
な工程となり全体として非常に長い時間となり、全体の
製造コストを大巾に増加させる。
The conventional method is to print a printable material or conductive material using a silk screen or a stainless steel screen, and repeat the steps of drying and curing to form a multilayer material. An insulating paste made of an organic polymer material is printed on a metal base 1 made of aluminum or the like, and after drying, it is cured to form a cured insulation)@2a. Next, as shown in FIG. 2, a low temperature curing type copper or silver paste is printed, dried and cured to form a cured conductor layer 3a. Furthermore, as shown in FIG. 3, a through-hole layer is formed by printing an insulating pattern with holes for through-holes, drying and hardening the insulating layer 2b, and then forming a hardened insulating layer 2b. 4. After complete printing, drying, and curing, the η-conductor layer 3b, which is electrically connected to the lower conductor layer 38 through through holes, is formed by the same method as in the conductor forming step described above. This is a method of forming multiple layers by repeating the insulating layer forming process, through hole forming process, and conductor forming process as described above. However, in the above manufacturing method, all pattern formation is done by printing, and as the number of layers increases, the surface becomes more uneven and the flatness deteriorates, making multilayering difficult. It also becomes difficult to form a through-hole pattern. In addition, in connection with these points, when it is desired to form a pattern over a dried pattern, if the pattern is not sufficiently dried, the underlying pattern may collapse and a fine line may not be formed. As for this drying process, it takes a long time, and since it is a necessary step for each printing, the overall time is very long, and the overall manufacturing cost is greatly increased.

発明の目的 本発明は、上記欠点に履み歩留り良く容易に製造できる
様にした金属ベース回路基板の製造方法る感光性有機高
分子中に金属酸化物を分散した市熱伝導性相料金金輌ベ
ースに全面塗布俊、露光し第1の硬化絶縁層を形成し、
その第1の硬化絶縁層上に導体材料を塗布後硬化され第
1の回路導体層を形成し、次に前記高熱伝尋性絶縁)W
tを準布し、露光により前記第1の回路導体層の一部が
露出するスルーホール用の孔を設けた第2の硬化絶縁層
を形成し、その第2の硬化絶縁層上に前記導体材料によ
り第2の回路導体層を形成するとともに前記孔にその害
体制料を充填しスルーホールを形成し、前記第2の回路
導体層と前記スルーホールを同時に硬化させる工程を含
み必要に応じて前記第2の硬化絶縁層と前記第2の回路
導体層およびスルーホールと同様の形成方法により、前
記第2の回路l琴体層上に硬化絶縁層1回路晦体層およ
びスルーホールを形成するものである。
OBJECTS OF THE INVENTION The present invention addresses the above-mentioned drawbacks and provides a method for manufacturing a metal-based circuit board that can be easily manufactured with high yield. Apply the entire surface to the base, expose to light to form the first hardened insulating layer,
A conductive material is coated on the first cured insulating layer and then cured to form a first circuit conductive layer, and then the high thermal conductive insulating layer) W
t, a second cured insulating layer is formed with a through-hole through which a part of the first circuit conductor layer is exposed by exposure, and the conductor is placed on the second cured insulating layer. forming a second circuit conductor layer using the material, filling the hole with the harmful material to form a through hole, and curing the second circuit conductor layer and the through hole simultaneously, as necessary. A cured insulating layer 1 circuit conductor layer and through holes are formed on the second circuit l body layer by the same forming method as for the second cured insulating layer, the second circuit conductor layer, and the through holes. It is something.

以上の方法により従来の方法に比べ製造二[稈が大幅に
簡単になる。1ず絶縁層の形成であるが、。
The above method greatly simplifies the production of culms compared to conventional methods. The first step is to form an insulating layer.

金属酸化物f:候盾性のある感光性有機高分子中に分散
した画然伝導性絶縁層を全面塗布体、露光し硬化絶縁層
を形成する方法であり、スルーホール形成も全面塗布パ
ターン上でスルーホール部分以外を露光、硬化させ形成
する方法であり、スルーホールのエツジ部をファインに
形)戊することができる。また感光性であるため、速硬
性があり従来の方法の乾燥工程がなくなり全体の製造コ
ストも大幅に低減する。次に全IFII塗布パターン上
に畳体部分を形成するので表面の平坦性も保持され多層
化も容易となる。さらに従来の熱硬化タイツに比べ、本
方法の感光性タイ1はセラミック、金属ベース等のベー
ス基板との密着性が良く基板特性の向上に寄与し得る。
Metal oxide f: A method in which a completely conductive insulating layer dispersed in a photosensitive organic polymer with weather shielding properties is coated on the entire surface and exposed to light to form a hardened insulating layer, and through holes are also formed on the entire surface coated pattern. This method involves exposing and curing the area other than the through-hole area, allowing the edges of the through-hole to be formed into fine shapes. Furthermore, since it is photosensitive, it cures quickly and eliminates the drying step of conventional methods, significantly reducing the overall manufacturing cost. Next, since the tatami body portion is formed on the entire IFII coating pattern, the flatness of the surface is maintained and multi-layering is facilitated. Furthermore, compared to conventional thermosetting tights, the photosensitive tie 1 of this method has good adhesion to a base substrate such as a ceramic or metal base, and can contribute to improving the substrate properties.

その他特性面においてもiiJ記従来の多層基板より優
れたものとなる。そして、本発明の絶縁材料は金属酸化
物を候涜性のある有機高分子中に分散させたものを用い
たものであり、従来の有機高分子材料のみのものに比べ
熱伝ηfを−がよく、このことは絶縁性および而・1屯
圧特性を良くするために絶縁層膜を厚く形成しながらか
つ放熱特性の曖れた絶縁層が得られることである。
It is also superior to the conventional multilayer substrate described in iiJ in terms of other characteristics. The insulating material of the present invention uses a metal oxide dispersed in a pollutant organic polymer, and has a -lower heat transfer ηf compared to conventional organic polymer materials alone. Often, this means that an insulating layer with vague heat dissipation characteristics can be obtained while forming a thick insulating layer film to improve insulation properties and pressure characteristics.

実捲例の説明 以下本発明の実梅例について図rfiJを参照しながら
説明する。第6図〜第11図は本発明の実tifxWI
Jを工程順にその断面図を示したものである。図におい
て、1は金属ベースsa、csbは絶縁層、ea、6b
は回路導体層、7はスルーホールである。
Description of a real plum example A real plum example of the present invention will be described below with reference to Figure rfiJ. Figures 6 to 11 show the actual tifxWI of the present invention.
3 is a cross-sectional view of J in the order of steps. In the figure, 1 is a metal base sa, csb is an insulating layer, ea, 6b
is a circuit conductor layer, and 7 is a through hole.

以上の様に形成された本実癩例の導性金属ベース回路基
板の製造方法について以下その装造方法を説明する。ま
ず第6図に示すようにアルミニウム等の金属ベース1上
に金属酸化物を接着性のある感光性有機高分子中に分散
した高熱伝導性材料の全面塗布パターンを形成後、露光
し硬化絶縁層6a(!−影形成る0次に第7図に示すよ
うに低@硬化型の銅あるいは銀ペーストを塗布後硬化さ
せ硬化状態の回路導体層6aを形成する。次に第8図。
A method of manufacturing the conductive metal base circuit board of this example formed as described above will be described below. First, as shown in FIG. 6, a coating pattern of a highly thermally conductive material in which a metal oxide is dispersed in an adhesive photosensitive organic polymer is formed on the entire surface of a metal base 1 such as aluminum, and then exposed to light to form a hardened insulating layer. 6a (!-Shadow Formation 0) Next, as shown in FIG. 7, a low @ hardening type copper or silver paste is applied and hardened to form a hardened circuit conductor layer 6a.Next, as shown in FIG.

第9図に示すように前記感光性の高熱伝導性材料月料を
全面塗布後、露光しスルーホール用の孔8のあいた硬化
絶縁層6bを形成する。さらに前記導体材料でスルーホ
ール7、回路導体層6bを同時に硬化させて形成する。
As shown in FIG. 9, after coating the entire surface of the photosensitive highly thermally conductive material, it is exposed to light to form a cured insulating layer 6b with holes 8 for through holes. Furthermore, the through holes 7 and the circuit conductor layer 6b are simultaneously cured and formed using the conductive material.

以上の様に本実施例によれば、金属酸化物を接着性のあ
る感光性有機高分子中に分散させた高熱伝導性絶縁材料
を用いることによシ従来のスクリーン印刷法における乾
燥工程はなくなり、感光性材料の速硬性により製造時間
も短くなり製造コストの大巾な低減に結がる。またスル
ーホール形成も絶縁層の全面塗布パターンを露光、硬化
させ形成するのでスルーホールのエツジ部もファインに
形成できる。その他特性面においても本発明の絶縁材料
は従来の有機高分子材料のみのものに比べ熱伝導率がよ
く、このことは絶縁性および耐電圧特性を良くするため
に絶縁層膜を厚く形成しなかかつ放熱特性の優れた絶縁
層が得られることである。
As described above, according to this embodiment, by using a highly thermally conductive insulating material in which a metal oxide is dispersed in an adhesive photosensitive organic polymer, the drying process in the conventional screen printing method is eliminated. The rapid hardening of the photosensitive material shortens the manufacturing time, leading to a significant reduction in manufacturing costs. Furthermore, since the through holes are formed by exposing and curing the entire surface coating pattern of the insulating layer, the edges of the through holes can also be formed finely. In terms of other characteristics, the insulating material of the present invention has better thermal conductivity than conventional organic polymer materials only, and this means that it is necessary to form a thick insulating layer to improve insulation and voltage resistance characteristics. Moreover, an insulating layer with excellent heat dissipation properties can be obtained.

発明の効果 以上の説明から明らかな様に、本発明は、高熱伝導性絶
縁材料を用いることにより従来のスクリーン印刷法にお
ける乾燥工程はなくなり、感光性材料の速硬性により製
造時間も短くな・シ製造コストの大巾な低減に結霧る。
Effects of the Invention As is clear from the above explanation, the present invention eliminates the drying step in the conventional screen printing method by using a highly thermally conductive insulating material, and shortens the manufacturing time due to the quick curing of the photosensitive material. This will result in a significant reduction in manufacturing costs.

またスルーホール形成も絶縁層の全面塗布パターンを露
光、硬化させ形成するのでスルーホールのエツジ部もフ
ァイン(形成できる。その他特性面においても本発明の
A縁材料は従来の有機高分子材料のみのものに比・熱伝
導率がよく、このことは絶縁性および耐電I特性を良く
するために絶縁層膜を厚く形成しがらかつ放熱特性の優
れた絶縁層が得られること゛ある。
In addition, through holes are formed by exposing and curing the entire surface coating pattern of the insulating layer, so the edges of the through holes can also be formed finely. It has a particularly good specific thermal conductivity, which means that it is possible to form an insulating layer thickly in order to improve insulation properties and dielectric strength I characteristics, and to obtain an insulating layer with excellent heat dissipation properties.

【図面の簡単な説明】[Brief explanation of drawings]

発明の一実栴例における金属ベース回路基板のl遣方法
を示す工程図である。 1・・・・・・金属基板、sa、esb・・・・・・硬
化絶縁層、ea、eb・・・・・・回路導体層、7・・
・・・・スルーホール8・・・・・・孔。 代理人の氏名 弁理士 中 尾 敏 男 ほか1名で 
イ 色 〈 第 こ゛ 財 5・)) j、l’+
FIG. 3 is a process diagram showing a method of disposing a metal-based circuit board in an embodiment of the invention. 1...metal substrate, sa, esb...cured insulating layer, ea, eb...circuit conductor layer, 7...
...Through hole 8...hole. Name of agent: Patent attorney Toshio Nakao and one other person
A color (No. 5)) j, l'+

Claims (2)

【特許請求の範囲】[Claims] (1)接層性のある感光性有機高分子中に金属酸化物を
分散した商熱伝導性相科を金属ベースの少なくとも片1
mに全面塗布後、露光し第1の硬化絶襟層を形成し、そ
の第1の硬化絶縁層上に導体材料を塗布後硬化され第1
の回路導体層を形成し、次に前記高熱伝纏性絶縁層を塗
布し、露光により前記第1の回路導体層の一部が露出す
るスルーホール用の孔を設けた第2の硬化絶縁層を形成
し、その第2の硬化絶縁層上に前記導体相料により第2
の回路導体層を形成するとともに前記孔にその導体拐科
を充填しスルーポールを形成し、前記第2の回路導体層
とMiJ記スルー水−ルを同時に硬化させる工程を含み
必要に応じて前記第2の硬化絶縁層と前記第2の回路導
体層およびスルーホールと同様の形成方法により、前記
第2の回路導体層上に硬化絶縁層1回路溝体層およびス
ルーホールを形成する金属ベース回路基板の製造方法。
(1) At least 1 piece of a metal-based commercial thermally conductive phase family in which a metal oxide is dispersed in a photosensitive organic polymer with layering properties.
After coating the entire surface of the insulating layer, a first hardened insulating layer is formed by exposing to light, and a conductive material is applied on the first hardened insulating layer and then hardened.
A second cured insulating layer is formed by forming a circuit conductor layer, and then applying the high heat conductive insulating layer, and providing a through hole through which a part of the first circuit conductor layer is exposed by exposure. A second cured insulating layer is formed on the second cured insulating layer using the conductive phase material.
The step of forming a circuit conductor layer and filling the hole with the conductor to form a through pole, and curing the second circuit conductor layer and the MiJ through hole simultaneously, if necessary. A metal base circuit in which a cured insulating layer 1, a circuit groove body layer, and a through hole are formed on the second circuit conductor layer by the same formation method as the second cured insulating layer, the second circuit conductor layer, and the through hole. Substrate manufacturing method.
(2)金属ベースとしてアルミニウムまたはアルマイト
処理を捲したアルミニウムを用いた特許請求の範囲第1
項記載の金属ベース回路基板の製造方法。
(2) Claim 1 using aluminum or alumite-treated aluminum as the metal base
A method for manufacturing a metal-based circuit board as described in Section 1.
JP59030551A 1984-02-20 1984-02-20 Method of producing metal base circuit board Pending JPS60175494A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP59030551A JPS60175494A (en) 1984-02-20 1984-02-20 Method of producing metal base circuit board

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP59030551A JPS60175494A (en) 1984-02-20 1984-02-20 Method of producing metal base circuit board

Publications (1)

Publication Number Publication Date
JPS60175494A true JPS60175494A (en) 1985-09-09

Family

ID=12306928

Family Applications (1)

Application Number Title Priority Date Filing Date
JP59030551A Pending JPS60175494A (en) 1984-02-20 1984-02-20 Method of producing metal base circuit board

Country Status (1)

Country Link
JP (1) JPS60175494A (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6427325B1 (en) 1998-09-01 2002-08-06 International Business Machines Corporation Flowable compositions and use in filling vias and plated through-holes
JPWO2016158109A1 (en) * 2015-03-27 2017-12-28 京セラ株式会社 Imaging component and imaging module including the same

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6427325B1 (en) 1998-09-01 2002-08-06 International Business Machines Corporation Flowable compositions and use in filling vias and plated through-holes
US6794040B2 (en) 1998-09-01 2004-09-21 International Business Machines Corporation Flowable compositions and use in filling vias and plated through-holes
JPWO2016158109A1 (en) * 2015-03-27 2017-12-28 京セラ株式会社 Imaging component and imaging module including the same

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