JPS59208790A - Solar cell - Google Patents
Solar cellInfo
- Publication number
- JPS59208790A JPS59208790A JP58083345A JP8334583A JPS59208790A JP S59208790 A JPS59208790 A JP S59208790A JP 58083345 A JP58083345 A JP 58083345A JP 8334583 A JP8334583 A JP 8334583A JP S59208790 A JPS59208790 A JP S59208790A
- Authority
- JP
- Japan
- Prior art keywords
- solar cell
- electrode
- metal
- layer
- metal substrate
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Classifications
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10F—INORGANIC SEMICONDUCTOR DEVICES SENSITIVE TO INFRARED RADIATION, LIGHT, ELECTROMAGNETIC RADIATION OF SHORTER WAVELENGTH OR CORPUSCULAR RADIATION
- H10F77/00—Constructional details of devices covered by this subclass
- H10F77/20—Electrodes
- H10F77/206—Electrodes for devices having potential barriers
- H10F77/211—Electrodes for devices having potential barriers for photovoltaic cells
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02E—REDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
- Y02E10/00—Energy generation through renewable energy sources
- Y02E10/50—Photovoltaic [PV] energy
Landscapes
- Photovoltaic Devices (AREA)
Abstract
(57)【要約】本公報は電子出願前の出願データであるた
め要約のデータは記録されません。(57) [Summary] This bulletin contains application data before electronic filing, so abstract data is not recorded.
Description
【発明の詳細な説明】
(発明の属する技術分野〕
この発明は金属基板に支持される半導体層に反基板側か
ら入射する光によって発生する光起電力を半導体層上の
透明電極およびその上に部分的に設けられる金属電極を
一方の電極として取シ出ず太陽電池に関する。DETAILED DESCRIPTION OF THE INVENTION (Technical Field to which the Invention Pertains) The present invention utilizes a photovoltaic force generated by light incident on a semiconductor layer supported by a metal substrate from the opposite side of the substrate to a transparent electrode on the semiconductor layer and a transparent electrode on the semiconductor layer. The present invention relates to a solar cell in which a partially provided metal electrode is removed as one electrode.
太陽電池としては半導体層を支持する基板として透明絶
縁板を用い、その上に下部電極としての透明導電膜を介
して半導体層を備え、さらにその上に全面に金属電極を
設けたものも知られているが、金属基板を用いるものと
しては、之・1図の断面図に示すように金属基板lの上
に例えば非晶質シリコン(以下a siと記す)膜2
、透明導電膜3を積層し、さらにその上に金属からなる
上部集電電極4を設けた構造が知られている。上部集電
電極4は、透明導電膜3のシート抵抗が5Ω以上あるた
め、この抵抗による電力損失を低減するために第2図の
平面図に示すように狭い間隔で配置される分枝部41と
主幹部42とからなるパターンを有する4、このような
太陽電池セルのモジー−ル化は、主幹部42の端部と隣
接セルの基板とをリード線で接続することによって行わ
れる。しかし、このような太陽電池においては、上部集
電電極4が光5の入射をさえぎるので、入射光に対する
太陽電池の受光有効面積を大きくするために上部集電電
極4の面積を小さくすると、透明導電膜3および集電電
極4における抵抗成分による電力損失が大きくなり、出
力特性が低下する欠点があった。Solar cells are also known in which a transparent insulating plate is used as a substrate to support a semiconductor layer, a semiconductor layer is provided on the transparent insulating plate with a transparent conductive film as a lower electrode interposed therebetween, and a metal electrode is further provided on the entire surface of the transparent insulating plate. However, in cases where a metal substrate is used, for example, an amorphous silicon (hereinafter referred to as ASI) film 2 is placed on a metal substrate l as shown in the cross-sectional view of Figure 1.
, a structure in which transparent conductive films 3 are laminated and an upper current collecting electrode 4 made of metal is further provided thereon is known. Since the sheet resistance of the transparent conductive film 3 is 5Ω or more, the upper current collecting electrode 4 has branch portions 41 arranged at narrow intervals as shown in the plan view of FIG. 2 in order to reduce power loss due to this resistance. 4 having a pattern consisting of a main body 42 and a main body 42. Modification of such a solar cell is carried out by connecting the end of the main body 42 and the substrate of an adjacent cell with a lead wire. However, in such a solar cell, the upper current collecting electrode 4 blocks the incidence of light 5, so if the area of the upper current collecting electrode 4 is reduced in order to increase the effective light receiving area of the solar cell for incident light, the transparent There was a drawback that power loss due to resistance components in the conductive film 3 and the current collecting electrode 4 increased, resulting in a decrease in output characteristics.
このような電力損失を少なくするためには、特に流れる
電流の大きい主幹部420幅を太きくしなければならず
、その受光有効面積に及ぼす影響が大きかった。In order to reduce such power loss, it is necessary to increase the width of the main section 420 where a particularly large current flows, which has a large effect on the effective light receiving area.
(発明の目的〕
この発明は、受光有効面積を出力特性を低下することな
く大きくし得る構造を有する太陽電池を提供する仁とを
目的とする0
〔発明の要点〕
この発明は、半導体層が金属基板上に絶縁層および開口
部を有する金属電極層を介して支持され、半導体層上に
被着する透明導電膜に接触する金属層が透明導電膜、半
導体層、金属電極層の開口部および絶縁層を貫通して金
属基板に達することにより上記の目的を達成する0
〔発明の実施例〕
第3図、第4図、第5図はこの発明の実施例を示すもの
で、A−3図は本発明によるa −si太陽電池セルの
光の入射側からみた平面図であり第4図はその断面構造
図、第5図はその一部の拡大図である。各図において、
牙1図、第2図と共通の部分には同一の符号が付されて
いる。金属基板1上に絶縁膜6を介して太陽電池の下部
電極を形成する金属電極7が形成される。さらにこの上
に太陽電池を形成するp、 t、 n 3層のa−si
がSiH4や5i21(6のプラズマグロー放電分解法
などによシ連続的に形成される。勿論、a−si膜2は
p −i −n構造でも11−i −p構造でもあるい
は微結晶化膜を用いた構造でも、また場合によっては半
導体単結晶板でも本発明の適用に影響を及はさない。さ
らにa−si膜2の上に透明導電膜3が形成される。5
の各薄膜6,7,2.3は、それぞれがa−si太陽電
池の形成に悪影響を及ぼさない範囲で分離帯によってバ
ターニングされ、その分離帯を埋めて金属からなる上部
電極8が形成される。第4図A部の拡大図である第5図
から明らかなように、この上部1L極8は、分離された
太陽電池の透明導電膜5上にオーバーラツプすると共に
分離帯を貫通して金属基板1と接続している。この構成
において上部電極8は金属基板1に接続しているため、
入射光によってa −si層2の内部で発電した電気は
、金属電極()と金属基板1とから取り出されるっこの
構造を牙1図、第2図に示した構造と比較すると、土部
′rも、&8を分校部41と同じ間隔で設けたと仮定し
/c 場合、透明4電膜3のノート抵抗分は同一である
が、上部電極4に↓る/−ト抵抗分(・;」、力tq
<ムリ、上部′、L極8の抵抗分はほとんど零であり、
1だ主幹部41による受光面積の無効分も除かれる1、
従って同一面積の太陽電池において出力か壇人うる。(Objective of the Invention) An object of the present invention is to provide a solar cell having a structure in which the effective light-receiving area can be increased without deteriorating the output characteristics. The metal layer is supported on a metal substrate via an insulating layer and a metal electrode layer having an opening, and is in contact with a transparent conductive film deposited on a semiconductor layer. [Embodiments of the Invention] FIGS. 3, 4, and 5 show embodiments of the present invention, and A-3 The figure is a plan view of the a-si solar cell according to the present invention as seen from the light incident side, FIG. 4 is a cross-sectional structural diagram thereof, and FIG. 5 is an enlarged view of a part thereof. In each figure,
The same parts as in Figs. 1 and 2 are given the same reference numerals. A metal electrode 7 that forms a lower electrode of a solar cell is formed on a metal substrate 1 with an insulating film 6 interposed therebetween. Furthermore, on top of this, there is a p, t, n three layer A-Si that forms the solar cell.
is continuously formed using SiH4 or 5i21 (6) plasma glow discharge decomposition method.Of course, the a-si film 2 may have a p-i-n structure, an 11-i-p structure, or a microcrystalline film. The application of the present invention will not be affected even if the structure uses a semiconductor single crystal plate or, depending on the case, a semiconductor single crystal plate.Furthermore, a transparent conductive film 3 is formed on the A-Si film 2.5
Each of the thin films 6, 7, 2.3 is patterned with a separation band to the extent that it does not adversely affect the formation of the A-SI solar cell, and the upper electrode 8 made of metal is formed by filling the separation band. Ru. As is clear from FIG. 5, which is an enlarged view of part A in FIG. is connected to. In this configuration, since the upper electrode 8 is connected to the metal substrate 1,
The electricity generated inside the a-Si layer 2 by the incident light is extracted from the metal electrode ( ) and the metal substrate 1. Comparing this structure with the structures shown in Figs. Assuming that &8 is provided at the same spacing as the branch section 41, the note resistance of the transparent 4-electrode film 3 is the same, but the upper electrode 4 has a ↓/-t resistance (・;'' , force tq
<Unreasonably, the resistance of the upper part' and L pole 8 is almost zero,
1. The invalid portion of the light receiving area by the main body 41 is also removed.
Therefore, the output can be increased by a solar cell of the same area.
第6図は別の実施例を示1′もので、第3図のものと相
違する点は上部電極8を帯状から円状にしだもので、こ
れにより太陽電池の受光有効面積を変換効率を低下する
ことなくさらに大きく出来るΔ″u点か得られる、。FIG. 6 shows another embodiment 1', which differs from the one in FIG. 3 in that the upper electrode 8 is changed from a strip shape to a circle shape, thereby increasing the conversion efficiency of the effective light-receiving area of the solar cell. It is possible to obtain a Δ″u point that can be further increased without decreasing.
さらに、第3図、第6図に示される金属電極の!N、1
部61をIIA接して配置された同様の太陽電池セルの
金属基板1の端部址で延長させれは、モジ7−ル化に際
しての太陽電池セルの直列接続が従来のようなリード線
を介することなく行うことができる。:l
透明導電膜3と金属基板1との間において、上部重積8
(伐下部金属電極7と接触し欧いように形成されればよ
(、a−si膜2.絶縁膜6と接触することは差支えガ
い。従って第5図に示したように、金属電極7の分離帯
を太きく形成し、a−si膜成長の際VCその分離部を
a−si膜で坤めるようにするととも有効である。Furthermore, the metal electrodes shown in FIGS. 3 and 6! N, 1
If the portion 61 is extended at the end portion of the metal substrate 1 of a similar solar cell placed in contact with the IIA, the series connection of the solar cells when modularized is done through lead wires as in the conventional case. It can be done without. :l Between the transparent conductive film 3 and the metal substrate 1, an upper stack 8
(If it is formed in such a way that it contacts the metal electrode 7 of the felled part, there is no problem in contacting the A-Si film 2 and the insulating film 6. Therefore, as shown in FIG. 5, the metal electrode It is also effective to form the separation zone 7 thick so that the VC separation part is covered with the A-Si film during the growth of the A-Si film.
この発明によれば、金属基板に支持される太陽電油1の
光の入射側に位置する上部電極を、半導体層を貫う)h
させて金属基板と接続したので、」−都電極面積を小さ
くl−て受光有効面積を太きくシ、ても上部電極の抵抗
成分による電力損失を小さく出来るようにがり、太陽電
池の出力を大きくすることが可能となる。また光起電先
取シ出[2の7こめの両@極が基板側にのみ存在するの
で、太陽電池セル側の接続が半導体層の上側から下側に
渡って行う必要がなく、簡単に行うことができるので、
接続のコストの低減と共に信頼性の向上につながり、実
用性の高い太陽電池モジュールの製作に極めて有効であ
る。According to this invention, the upper electrode located on the light incident side of the solar cell 1 supported by the metal substrate is passed through the semiconductor layer)h
Since the upper electrode is connected to a metal substrate, it is possible to reduce the area of the electrode and increase the effective light-receiving area, thereby reducing the power loss due to the resistance component of the upper electrode and increasing the output of the solar cell. becomes possible. In addition, since both poles of the photovoltaic pre-emption [2. Because you can
This reduces connection costs and improves reliability, making it extremely effective in producing highly practical solar cell modules.
第1図は従来のa−si太陽電池の断面図、第2図(仕
上の平面図、第3図は本発明の一実施例の平面図、第4
図は第3図のX−X線断面図、オ、〕図は第4図A部拡
大図、第6図は別の実施例の平面図である。
l 金属基板、2・・a−sij摸、3 透明導電膜、
6・絶縁膜、7 下部電極、8 上部電極。
ヤ1(2)
才2に)Fig. 1 is a sectional view of a conventional A-SI solar cell, Fig. 2 is a plan view of the finished product, Fig. 3 is a plan view of an embodiment of the present invention, and Fig. 4 is a plan view of an embodiment of the present invention.
The figures are a sectional view taken along the line X--X of FIG. 3, E and E are an enlarged view of part A in FIG. 4, and FIG. 6 is a plan view of another embodiment. l metal substrate, 2... a-sij model, 3 transparent conductive film,
6. Insulating film, 7 lower electrode, 8 upper electrode. 1 (2) (2 years old)
Claims (1)
する金属電極層を介して支持され、半導体層上に被着す
る透明導電膜に接触する金属層が透明導電膜、半導体層
、金属電極層の開口部および絶縁層を貫通して金属基板
に達したことを特徴とする太陽電池。■) A semiconductor layer is supported on a metal substrate via an insulating layer and a metal electrode layer with equal openings, and the metal layer in contact with the transparent conductive film deposited on the semiconductor layer is the transparent conductive film, the semiconductor layer, and the metal A solar cell characterized in that a metal substrate is reached through an opening in an electrode layer and an insulating layer.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP58083345A JPS59208790A (en) | 1983-05-12 | 1983-05-12 | Solar cell |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP58083345A JPS59208790A (en) | 1983-05-12 | 1983-05-12 | Solar cell |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPS59208790A true JPS59208790A (en) | 1984-11-27 |
Family
ID=13799845
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP58083345A Pending JPS59208790A (en) | 1983-05-12 | 1983-05-12 | Solar cell |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS59208790A (en) |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO1995024058A1 (en) * | 1994-03-04 | 1995-09-08 | United Solar Systems Corporation | Large area, through-hole, parallel-connected photovoltaic device |
| US6011215A (en) * | 1997-12-18 | 2000-01-04 | United Solar Systems Corporation | Point contact photovoltaic module and method for its manufacture |
-
1983
- 1983-05-12 JP JP58083345A patent/JPS59208790A/en active Pending
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO1995024058A1 (en) * | 1994-03-04 | 1995-09-08 | United Solar Systems Corporation | Large area, through-hole, parallel-connected photovoltaic device |
| US5468988A (en) * | 1994-03-04 | 1995-11-21 | United Solar Systems Corporation | Large area, through-hole, parallel-connected photovoltaic device |
| US6011215A (en) * | 1997-12-18 | 2000-01-04 | United Solar Systems Corporation | Point contact photovoltaic module and method for its manufacture |
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