JPS5856952B2 - Sample processing equipment for scanning electron microscopes and similar equipment - Google Patents
Sample processing equipment for scanning electron microscopes and similar equipmentInfo
- Publication number
- JPS5856952B2 JPS5856952B2 JP52116742A JP11674277A JPS5856952B2 JP S5856952 B2 JPS5856952 B2 JP S5856952B2 JP 52116742 A JP52116742 A JP 52116742A JP 11674277 A JP11674277 A JP 11674277A JP S5856952 B2 JPS5856952 B2 JP S5856952B2
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- Prior art keywords
- sample
- chamber
- sample processing
- scanning electron
- cooling
- Prior art date
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Description
【発明の詳細な説明】
本発明は、荷電粒子線装置の凍結試料観察装置に係り、
特に走査電子顕微鏡に使用するに好適な試料処理装置に
関する。DETAILED DESCRIPTION OF THE INVENTION The present invention relates to a frozen sample observation device for a charged particle beam device,
In particular, the present invention relates to a sample processing device suitable for use in a scanning electron microscope.
凍結試料の観察は、特に走査電子顕微鏡にむける生物試
料研究の分野にネ・いて、生きていた時と同一の状態で
観察できると考えられるところから非常に重要視されて
いる。Observation of frozen samples is considered to be extremely important, especially in the field of biological sample research for scanning electron microscopy, as it is thought that it can be observed in the same state as when it was alive.
しかし、凍結試料の作製に当っては、温度変化による試
料変形や霜の付着に十分注意を払う必要がある。However, when preparing frozen samples, it is necessary to pay sufficient attention to sample deformation due to temperature changes and frost buildup.
このため、従来技術にあっては、走査電子顕微鏡の試料
室の一部に、真空的に連通ずる予備室を設け、この予備
室に、予め冷却された試料載せ台や、試料を切断して、
霜の付着のない新鮮な試料面を出すための冷却ナイフ等
を設けて、凍結試料作製後は直ちに、試料室内に導入し
て、観察できるようにした方法が考えられている。For this reason, in the conventional technology, a part of the sample chamber of a scanning electron microscope is provided with a preliminary chamber that communicates with the vacuum. ,
A method has been considered in which a cooling knife or the like is provided to expose a fresh sample surface free of frost, and the frozen sample is immediately introduced into the sample chamber for observation after preparation.
しかるに、このような予備室には、前述した冷却手段だ
けでなく、金属蒸着やイオンスパッタリングコーティン
グによる導電処理を試料に施すための装置を有すること
が、満足な凍結試料観察をする上でしばしば重要となる
。However, in order to observe frozen samples satisfactorily, it is often important for such a preliminary chamber to have not only the above-mentioned cooling means but also a device for applying conductive treatment to the sample by metal vapor deposition or ion sputtering coating. becomes.
しかし、予備室にそのような機能を、個々に設けようと
すると、どうしても複雑化し、試料室と予備室間で試料
を移動するための移動棒が長くなったり、予備室全体が
大きく、重くなったりして、かえって操作しにくくなる
といった欠点がある。However, if we tried to provide such a function in each preparatory chamber, it would inevitably become complicated, the moving rod for moving the sample between the sample chamber and the preparatory chamber would become long, and the entire preparatory chamber would become larger and heavier. This has the disadvantage of making it more difficult to operate.
本発明は、上述した従来技術の欠点に鑑みてなされたも
ので、凍結試料の取扱い中に霜が付着しにくく、かつ、
操作が容易な試料処理装置を提供することを目的とする
。The present invention has been made in view of the above-mentioned shortcomings of the prior art, and is designed to prevent frost from forming during handling of frozen samples, and
The purpose is to provide a sample processing device that is easy to operate.
第1図は、本発明にかける一実施例を示す構成概略図で
ある。FIG. 1 is a schematic diagram showing an embodiment of the present invention.
同図に訃いて、試料室1に隣接して設けられた試料処理
室2は真空封止用のOリング3とエアーロック弁4等か
ら成るエアーロック手段によって真空的に連通したり、
遮断したりできるようになっている。As shown in the figure, a sample processing chamber 2 provided adjacent to a sample chamber 1 is in vacuum communication with an air lock means consisting of an O-ring 3 for vacuum sealing, an air lock valve 4, etc.
It is now possible to block it.
試料処理室2には、試別5と試料を保持する試別台6を
載置するための試料載せ台7が設けられている。The sample processing chamber 2 is provided with a sample stage 7 on which a sample 5 and a sample table 6 for holding a sample are placed.
該試料載せ台の一端は真空外でジュワーびん等の冷媒容
器8に入れられた液体窒素等の冷媒9、に浸漬され、試
料処理中も試別5が凍結状態に維持できるようになって
いる。One end of the sample stage is immersed outside a vacuum in a refrigerant 9 such as liquid nitrogen contained in a refrigerant container 8 such as a dewar bottle, so that the sample 5 can be maintained in a frozen state even during sample processing. .
試別5ば、凍結状態にあれば生物試料に導電処理しなく
ても生きていたときと同様の状態で二次電子像観察を行
うことはできる。Test 5: If the biological sample is in a frozen state, it is possible to observe secondary electron images in the same state as when it was alive, even without conductive treatment.
しかし、一般に観察倍率が数千倍以上の高倍率になると
、二次電子信号を得に〈〈なり、良好な試料表面の形態
観察が難しくなってくる。However, in general, when the observation magnification increases to several thousand times or more, it becomes difficult to obtain secondary electron signals, making it difficult to observe the morphology of the sample surface well.
そのような場合、試料表面に導電処理を施すと、試別か
らの二次電子信号が増えて、高倍率、高分解能観察も可
能となる。In such cases, if the sample surface is subjected to conductive treatment, the secondary electron signal from the sample will increase, making it possible to perform high-magnification, high-resolution observation.
従って、本実施例では、前記試料処理室2、との間を、
真空封止用Oリング10,11と、エアーロック弁12
、エアーロック軸13、等から成るエアーロック手段に
よって真空的に連通したり、遮断したりする予備室14
を設け、該予備室に、乾燥気体を導入できるガス導入弁
15、と、ロータリーポンプ等(図示せず)で予備排気
しうる排気弁16と、試別5に導電処理を行なう手段と
を設けている。Therefore, in this embodiment, between the sample processing chamber 2 and the sample processing chamber 2,
O-rings 10 and 11 for vacuum sealing and air lock valve 12
, an air lock shaft 13, etc. A preliminary chamber 14 that is communicated with or shut off by vacuum means
The preparatory chamber is provided with a gas introduction valve 15 capable of introducing dry gas, an exhaust valve 16 capable of preliminary evacuation with a rotary pump or the like (not shown), and means for performing conductive treatment on the sample 5. ing.
第1図は、その導電処理手段としてイオンスパッタリン
グによるイオンコーティング装置を設けた例である。FIG. 1 shows an example in which an ion coating device using ion sputtering is provided as the conductive treatment means.
該イオンコーティング装置は、例えば金などのコーテイ
ング材でできた電極17とその電極支持棒18と、これ
らを電気的に絶縁し、支持する絶縁材(例えばアクリル
材)19と、真空封止用Oリング20.21と、イオン
スパッタリングを生じさせるためのイオンスパッタリン
グ用電源装置22とから構成され、予備室14に対し、
脱着自在に取付けられるようになっている。The ion coating device includes an electrode 17 made of a coating material such as gold, an electrode support rod 18 for the electrode, an insulating material (for example, acrylic material) 19 that electrically insulates and supports these, and an O for vacuum sealing. It is composed of a ring 20, 21 and an ion sputtering power supply device 22 for producing ion sputtering, and for the preliminary chamber 14,
It can be installed removably.
電源装置22は電極17の極性を■、eあるいは交流高
電圧のいずれにも切りかえられ、導電処理だけでなく、
イオンエツチングや親水処理等の試料処理も行えるよう
になっている。The power supply device 22 can switch the polarity of the electrode 17 to either ■, e, or AC high voltage, and can be used not only for conductive treatment but also for
Sample processing such as ion etching and hydrophilic treatment can also be performed.
該イオンコーティング装置によって導電処理を終えた試
料5は、試別処理室2に設けた試料移動棒23と、該試
料移動棒を支持し、試別処理室内を見透せる材質で作ら
れた支持軸24と真空封止用のOリング25,26とか
ら成る試料交換手段によって試料室1内に移送され、同
室内の対物レンズ27の下方に取付けられた試別ステー
ジ28に載置される。The sample 5 that has been subjected to the conductive treatment by the ion coating device is moved between a sample moving rod 23 provided in the separation processing chamber 2 and a support made of a material that supports the sample movement rod and allows the inside of the separation processing chamber to be seen through. The sample is transferred into the sample chamber 1 by a sample exchange means consisting of a shaft 24 and O-rings 25 and 26 for vacuum sealing, and placed on a sampling stage 28 attached below the objective lens 27 in the same chamber.
試別ステージ28の試料を受ける部分は、試別室の別の
部分に設けられた冷却手段(図示せず)によって冷却さ
れて耘す、試料を凍結状態に維持した11、対物レンズ
27の下方に収束された照射電子線(図示せず)を走査
して、生物試別等の二次電子像観察が行われる。The sample-receiving part of the sorting stage 28 is cooled by cooling means (not shown) provided in another part of the sorting chamber, and the sample is maintained in a frozen state 11 below the objective lens 27. A focused electron beam (not shown) is scanned to perform secondary electron image observation such as biological identification.
試別処理室2と予備室14はエアーロック手段によって
真空的に遮断できるようになっているため、前述したよ
うな導電処理の終ったあとは、前記試料処理室を大気に
さらすことなく、他の試料処理手段を予備室14で交換
し、取付けることができる。Since the sample processing chamber 2 and the preparatory chamber 14 can be vacuum isolated by an air lock means, after the conductive treatment described above is completed, the sample processing chamber 2 and the preliminary chamber 14 can be isolated from each other without being exposed to the atmosphere. Sample processing means can be replaced and installed in the preliminary chamber 14.
第2図は、他の試料処理手段として、冷却ナイフ装置を
予備室14に取付けた状態について示した一実施例の構
成概略図である。FIG. 2 is a schematic diagram of an embodiment of the present invention in which a cooling knife device is installed in the preliminary chamber 14 as another sample processing means.
以下の説明において、第1図と同一部材を意味するもの
は、同一符号でもって示すものとする。In the following description, the same members as those in FIG. 1 are indicated by the same reference numerals.
予備室14には、大気中であらかじめ冷媒に浸漬して冷
却された冷却ナイフ29と、冷却ナイフ移動棒30とそ
の支持体31と、Oリング20,21から戒る冷却ナイ
フ装置が脱着自在に設けられている。In the preliminary chamber 14, a cooling knife 29 which has been pre-cooled by being immersed in a refrigerant in the atmosphere, a cooling knife moving rod 30 and its support 31, and a cooling knife device which is connected to O-rings 20 and 21 can be detachably attached. It is provided.
予備室を排気弁16を通じて予備排気の後、エアーロッ
ク弁12を開き、前記移動棒30を押し込んで、冷却ナ
イフ29を試別処理室2の内部に挿入し、ナイフ29を
回転して試別面を切断すれば、霜の付いていない新鮮な
試料面を出すことができる。After preliminary evacuation of the preliminary chamber through the exhaust valve 16, the air lock valve 12 is opened, the moving rod 30 is pushed in, the cooling knife 29 is inserted into the separation processing chamber 2, and the knife 29 is rotated to perform the separation. By cutting the surface, a fresh, frost-free sample surface can be exposed.
従来技術では、この冷却ナイフ手段は、試料処理室に固
定して設ける方法が考えられていたが、本実施例では、
大気中で冷却後直ちに予備室に装着して使用するので取
扱いが極めて容易であり、試料処理室によけいなスペー
スをとらなくてもよいという利点がある。In the prior art, a method was considered in which the cooling knife means was fixedly provided in the sample processing chamber, but in this embodiment,
It is extremely easy to handle because it is installed in the preliminary chamber and used immediately after being cooled in the atmosphere, and has the advantage that it does not require a large space in the sample processing chamber.
第3図は、本発明における他の一実施例について示した
構成概略図である。FIG. 3 is a schematic configuration diagram showing another embodiment of the present invention.
本実施例では、予備室14に例えばバスケット状のタン
グステンフィラメント32とその支持電極33 、33
’と、これらを電気的に絶縁するための絶縁体34と、
真空封止用のOリング21と、蒸着用電源35と、フィ
ラメント32に取付けた蒸着材(図示せず)が、試別5
以外に蒸着されるのを防止するシールド板36とから成
る蒸着装置が脱着自在に設けられた状態について示しで
ある。In this embodiment, the preliminary chamber 14 includes, for example, a basket-shaped tungsten filament 32 and its supporting electrodes 33, 33.
', an insulator 34 for electrically insulating these,
The O-ring 21 for vacuum sealing, the evaporation power source 35, and the evaporation material (not shown) attached to the filament 32 are
This figure shows a state in which a vapor deposition device including a shield plate 36 for preventing vapor deposition on other surfaces is detachably provided.
昔た、予備室のエアーロック弁を動かすエアーロック軸
13は図示されていないが、紙面に垂直の方向に設けら
れて3す、開閉自由に構成されている。Although the air lock shaft 13 that moves the air lock valve in the preliminary chamber is not shown, it is provided in a direction perpendicular to the plane of the drawing and is configured to be able to open and close freely.
さらに、本実施例では、試料載せ台7は、該試料載せ台
ごと、試料室1と試別処理室2との間を自在に移動しう
る冷却装置の上に立設している。Furthermore, in this embodiment, the sample mounting table 7 is installed upright on a cooling device that can freely move the sample mounting table between the sample chamber 1 and the sample processing chamber 2.
該冷却装置は、試料5及び試別台6を立設している試料
載せ台7に連結した冷却体37と、その他端を冷却して
いる冷媒9と、該冷媒を熱絶縁する断熱材38とその外
側をカバーし、冷却装置全体を移動できるように移動軸
構造を有する外カバー39と、これらを保持する保持台
40及び真空封止用Oリング41,42とから構成され
ている。The cooling device includes a cooling body 37 connected to a sample mounting table 7 on which a sample 5 and a sampling table 6 are erected, a refrigerant 9 cooling the other end, and a heat insulating material 38 thermally insulating the refrigerant. and an outer cover 39 having a movable shaft structure so that the entire cooling device can be moved, a holding table 40 for holding these, and O-rings 41 and 42 for vacuum sealing.
本実施例では、前記蒸着装置による試別の導電処理等の
試料処理後、直ちに、試料を冷却装置ごと試別室側へ移
動して、凍結試別観察を行うことができるので、前述し
た試料室内の試別ステージや冷却手段を特に設けなくて
もすむようになり、試料室1わりを簡素化できるだけで
なく、試料をいちいち移しかえる必要もないので高い冷
却効率が得られる利点がある。In this embodiment, after sample processing such as electrical conductivity treatment for sampling using the evaporation device, the sample can be immediately moved to the sampling chamber together with the cooling device and frozen sample observation can be performed. This eliminates the need to provide a special separation stage or cooling means, which not only simplifies the size of the sample chamber, but also has the advantage of providing high cooling efficiency since there is no need to transfer samples each time.
また、前記蒸着装置は予備室14から脱着自在であるか
ら、試料処理室を大気にさらすことなく簡単にフィラメ
ント32を取換えることができ、試別処理中にわずかに
付着した試料面上の霜をフィラメントからの輻射熱で昇
華させたり、試料面の温度コントロールをするのにも利
用することができる。In addition, since the vapor deposition device is detachable from the preparatory chamber 14, the filament 32 can be easily replaced without exposing the sample processing chamber to the atmosphere, and a slight amount of frost on the sample surface during the sampling process can be removed. It can also be used to sublimate using radiant heat from a filament and to control the temperature of the sample surface.
第4図は、本発明に於ける他の一実施例について示した
構成概略図である。FIG. 4 is a schematic configuration diagram showing another embodiment of the present invention.
本実施例は、予備室14に試料をえぐったり、引っかい
たりして、試料内面を露出させるための試料マニピュレ
ーター装置を取り付けた状態について示したものである
。This embodiment shows a state in which a sample manipulator device for gouging or scratching the sample to expose the inner surface of the sample is attached to the preliminary chamber 14.
該マニピュレーター装置は、大気中であらかじめ冷媒に
浸漬して冷却したマニピュレーター針43と、マニピュ
レーター移動軸44と、これらの支持体45および真空
封止用Oリング20,21とから構成されている。The manipulator device includes a manipulator needle 43 that has been cooled by immersing it in a refrigerant in the atmosphere, a manipulator moving shaft 44, a support 45 for these, and O-rings 20 and 21 for vacuum sealing.
また、試料を冷却するための冷却装置は、第3図の実施
例と類似した移動可能タイプであるが、縦長形の金属の
冷却槽46を有する。The cooling device for cooling the sample is of a movable type similar to the embodiment shown in FIG. 3, but has a vertically elongated metal cooling tank 46.
また、その外部の外カバー39′も縦長であり、内側の
冷却槽46と溶接されて、断熱及び真空封止できるよう
構成されている。Further, the outer cover 39' is also vertically elongated and is welded to the inner cooling tank 46, so that it can be heat-insulated and vacuum-sealed.
このような縦長とすることにより冷却装置と試別室間の
距離を短かくすることができる利点がある。By making it vertically long, there is an advantage that the distance between the cooling device and the sorting chamber can be shortened.
以上述べたごとく、本発明によれば、凍結試料の取扱い
中に霜が付着しにりく、かつコンパクトにして操作が容
易な試料処理装置を提供することができる。As described above, according to the present invention, it is possible to provide a sample processing device that is resistant to frost buildup during handling of frozen samples and is compact and easy to operate.
また、本発明の内容は、走査電子顕微鏡だけでなく、透
過形電子顕微鏡およびその付属装置としての走査像観察
装置、さらには、イオンマイクロアナライザの凍結試別
分析装置等にも適用して同様の効果を奏する。Furthermore, the content of the present invention can be applied not only to a scanning electron microscope, but also to a transmission electron microscope and a scanning image observation device as an auxiliary device therefor, as well as a freezing sample analysis device for an ion microanalyzer. be effective.
第1図は、本発明の一実施例を示す縦断面図、第2図、
第3図、第4図は、それぞれ他の一実施例を示す縦断面
図である。
1・・・試別室、2・・・試料処理室、4・・・エアー
ロック弁、5・・・試料、9・・・冷媒、12・・・エ
アーロック弁、13・・・エアーロック軸、14・・・
予備室、17・・・電極、18・・・電極支持棒、19
・・・絶縁材、22・・・イオンスパッタリング用電源
装置、29・・・冷却ナイフ、32・・・タングステン
フィラメント、35・・・蒸着用電源、37・・・冷却
体、43・・・マニピュレーター針、44・・・マニピ
ュレーター移動軸、46・・・冷却槽。FIG. 1 is a longitudinal sectional view showing an embodiment of the present invention, FIG.
FIGS. 3 and 4 are longitudinal cross-sectional views showing other embodiments, respectively. DESCRIPTION OF SYMBOLS 1... Trial chamber, 2... Sample processing chamber, 4... Air lock valve, 5... Sample, 9... Refrigerant, 12... Air lock valve, 13... Air lock shaft , 14...
Preparation chamber, 17... Electrode, 18... Electrode support rod, 19
... Insulating material, 22 ... Power supply device for ion sputtering, 29 ... Cooling knife, 32 ... Tungsten filament, 35 ... Power supply for vapor deposition, 37 ... Cooling body, 43 ... Manipulator Needle, 44... Manipulator movement axis, 46... Cooling tank.
Claims (1)
トいて、前記試料室とエアーロック手段を介して真空的
に連通し、試料の処理を行ないうる試料処理室と、該試
料処理室とは他のエアーロック手段を介して真空的に連
通しつる予備室とを備え、前記試料処理室内で前記試料
の処理を行なうための手段を前記予備室に設けたことを
特徴とする走査電子顕微鏡およびその類似装置の試料処
理装置。 2 前記試料処理手段は前記試料に導電処理を施こすも
のからなっていることを特徴とする特許請求の範囲第1
項に記載の走査電子顕微鏡およびその類似装置の試料処
理装置。 3 前記試料処理手段は前記試料を切断するための冷却
ナイフを含んでいることを特徴とする特許請求の範囲第
1項に記載の走査電子顕微鏡むよびその類似装置の試料
処理装置。 4 前記試料処理手段は前記試料をひつかいたり、えぐ
り取ったりする試料マニピュレータを含んでいることを
特徴とする特許請求の範囲第1項記載の走査電子顕微鏡
むよびその類似装置の試料処理装置。[Scope of Claims] 1. A sample processing chamber that is in vacuum communication with the sample chamber via an air lock means and is capable of processing the sample, including an apparatus for introducing a frozen sample into a sample chamber for observation. and a vine preparatory chamber which is in vacuum communication with the sample processing chamber via another air lock means, and means for processing the sample within the sample processing chamber is provided in the preparatory chamber. A sample processing device for a scanning electron microscope and similar devices. 2. Claim 1, wherein the sample processing means is configured to perform conductive treatment on the sample.
A sample processing device for a scanning electron microscope and similar devices described in Section 1. 3. A sample processing device for a scanning electron microscope or similar device as claimed in claim 1, wherein the sample processing means includes a cooling knife for cutting the sample. 4. A sample processing device for a scanning electron microscope or similar device as claimed in claim 1, wherein the sample processing means includes a sample manipulator for picking up or gouging out the sample.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP52116742A JPS5856952B2 (en) | 1977-09-30 | 1977-09-30 | Sample processing equipment for scanning electron microscopes and similar equipment |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP52116742A JPS5856952B2 (en) | 1977-09-30 | 1977-09-30 | Sample processing equipment for scanning electron microscopes and similar equipment |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS5451373A JPS5451373A (en) | 1979-04-23 |
| JPS5856952B2 true JPS5856952B2 (en) | 1983-12-17 |
Family
ID=14694652
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP52116742A Expired JPS5856952B2 (en) | 1977-09-30 | 1977-09-30 | Sample processing equipment for scanning electron microscopes and similar equipment |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS5856952B2 (en) |
Families Citing this family (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP6272384B2 (en) * | 2016-04-06 | 2018-01-31 | 株式会社日立ハイテクノロジーズ | Charged particle beam equipment |
-
1977
- 1977-09-30 JP JP52116742A patent/JPS5856952B2/en not_active Expired
Also Published As
| Publication number | Publication date |
|---|---|
| JPS5451373A (en) | 1979-04-23 |
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