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JPS54116218A - Photosensitive composition - Google Patents

Photosensitive composition

Info

Publication number
JPS54116218A
JPS54116218A JP2281678A JP2281678A JPS54116218A JP S54116218 A JPS54116218 A JP S54116218A JP 2281678 A JP2281678 A JP 2281678A JP 2281678 A JP2281678 A JP 2281678A JP S54116218 A JPS54116218 A JP S54116218A
Authority
JP
Japan
Prior art keywords
photosensitive composition
photosensitive
composition
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP2281678A
Other languages
Japanese (ja)
Inventor
Hiroshi Itou
Fumio Itou
Tsutomu Watanabe
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
New Oji Paper Co Ltd
Original Assignee
Oji Paper Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Oji Paper Co Ltd filed Critical Oji Paper Co Ltd
Priority to JP2281678A priority Critical patent/JPS54116218A/en
Publication of JPS54116218A publication Critical patent/JPS54116218A/en
Pending legal-status Critical Current

Links

Landscapes

  • Phenolic Resins Or Amino Resins (AREA)
JP2281678A 1978-03-02 1978-03-02 Photosensitive composition Pending JPS54116218A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2281678A JPS54116218A (en) 1978-03-02 1978-03-02 Photosensitive composition

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2281678A JPS54116218A (en) 1978-03-02 1978-03-02 Photosensitive composition

Publications (1)

Publication Number Publication Date
JPS54116218A true JPS54116218A (en) 1979-09-10

Family

ID=12093205

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2281678A Pending JPS54116218A (en) 1978-03-02 1978-03-02 Photosensitive composition

Country Status (1)

Country Link
JP (1) JPS54116218A (en)

Cited By (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5557841A (en) * 1978-10-20 1980-04-30 Konishiroku Photo Ind Co Ltd Photosensitive composition
JPS55123614A (en) * 1979-03-16 1980-09-24 Daicel Chem Ind Ltd Photosensitive resin and positive type-photosensitive resin composition
JPS55127553A (en) * 1979-03-27 1980-10-02 Daicel Chem Ind Ltd Photosensitive composition
JPS62136636A (en) * 1985-12-10 1987-06-19 Nec Corp Negative resist
JPS62149717A (en) * 1979-03-16 1987-07-03 Daicel Chem Ind Ltd Production of photopolymer
JPS63198046A (en) * 1987-02-13 1988-08-16 Konica Corp Photosensitive composition with excellent processing chemical resistance and ink receptivity
JPH0296164A (en) * 1988-10-03 1990-04-06 Konica Corp photosensitive composition
US5407780A (en) * 1989-12-27 1995-04-18 Sumitomo Chemical Company, Limited Radiation-sensitive positive resist composition comprising an alkali-soluble resin made from m-cresol, 2-tert-butl-5-methyl phenol and formaldehyde

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS4945325A (en) * 1972-09-08 1974-04-30
JPS5011022A (en) * 1973-05-29 1975-02-04
JPS50125806A (en) * 1974-03-25 1975-10-03

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS4945325A (en) * 1972-09-08 1974-04-30
JPS5011022A (en) * 1973-05-29 1975-02-04
JPS50125806A (en) * 1974-03-25 1975-10-03

Cited By (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5557841A (en) * 1978-10-20 1980-04-30 Konishiroku Photo Ind Co Ltd Photosensitive composition
JPS55123614A (en) * 1979-03-16 1980-09-24 Daicel Chem Ind Ltd Photosensitive resin and positive type-photosensitive resin composition
JPS62149717A (en) * 1979-03-16 1987-07-03 Daicel Chem Ind Ltd Production of photopolymer
JPS55127553A (en) * 1979-03-27 1980-10-02 Daicel Chem Ind Ltd Photosensitive composition
JPS62136636A (en) * 1985-12-10 1987-06-19 Nec Corp Negative resist
JPS63198046A (en) * 1987-02-13 1988-08-16 Konica Corp Photosensitive composition with excellent processing chemical resistance and ink receptivity
JPH0296164A (en) * 1988-10-03 1990-04-06 Konica Corp photosensitive composition
US5407780A (en) * 1989-12-27 1995-04-18 Sumitomo Chemical Company, Limited Radiation-sensitive positive resist composition comprising an alkali-soluble resin made from m-cresol, 2-tert-butl-5-methyl phenol and formaldehyde

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