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JPH1186770A - Scanning electron microscope - Google Patents

Scanning electron microscope

Info

Publication number
JPH1186770A
JPH1186770A JP9248142A JP24814297A JPH1186770A JP H1186770 A JPH1186770 A JP H1186770A JP 9248142 A JP9248142 A JP 9248142A JP 24814297 A JP24814297 A JP 24814297A JP H1186770 A JPH1186770 A JP H1186770A
Authority
JP
Japan
Prior art keywords
sample
objective lens
electron microscope
scanning electron
secondary signal
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP9248142A
Other languages
Japanese (ja)
Inventor
Yoichi Ose
洋一 小瀬
清美 ▲吉▼成
Kiyomi Yoshinari
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi Ltd
Original Assignee
Hitachi Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Ltd filed Critical Hitachi Ltd
Priority to JP9248142A priority Critical patent/JPH1186770A/en
Publication of JPH1186770A publication Critical patent/JPH1186770A/en
Pending legal-status Critical Current

Links

Abstract

(57)【要約】 【課題】リターディングやブースティング方式適した二
次信号電子を光軸から偏向して検出する走査電子顕微鏡
を提供する。 【解決手段】試料7と対物レンズ6間には、制御電極1
0を挿入し、試料7と制御電極10間に非軸対称分布の
電界を生成する。試料7から発生した二次信号電子9
は、対物レンズ6の上部に引き出し加速されるととも
に、光軸外に偏向される。偏向後の二次信号電子は、光
軸の周囲に設置された検出器11に取り込まれる。
[PROBLEMS] To provide a scanning electron microscope which detects secondary signal electrons suitable for retarding and boosting methods by deflecting them from the optical axis. A control electrode is provided between a sample and an objective lens.
0 is inserted to generate an electric field having a non-axisymmetric distribution between the sample 7 and the control electrode 10. Secondary signal electrons 9 generated from sample 7
Is pulled out to the upper part of the objective lens 6, accelerated, and deflected off the optical axis. The secondary signal electrons after the deflection are taken into the detector 11 installed around the optical axis.

Description

【発明の詳細な説明】DETAILED DESCRIPTION OF THE INVENTION

【0001】[0001]

【発明の属する技術分野】本発明は電子線装置に係り、
特にサブミクロンオーダー(1μm以下)のコンタクト
ホールやラインパターンを有する試料を高分解能で観察
するのに好適な走査電子顕微鏡に関する。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to an electron beam apparatus,
In particular, the present invention relates to a scanning electron microscope suitable for observing a sample having a contact hole or a line pattern on the order of submicrons (1 μm or less) at a high resolution.

【0002】[0002]

【従来の技術】走査電子顕微鏡は、電子源から放出され
た電子線を試料上で走査して2次的に得られる二次電子
および反射電子(まとめて二次信号電子という)を検出
し、この二次信号を電子線の走査と同期して走査される
ブラウン管の輝度変調入力とすることで走査像(SEM
像)を得ている。特開平5−266855 号公報で述べられて
いるように、試料を高分解能で観察する手段として、対
物レンズを通過する際の一次電子エネルギーを高くし、
対物レンズと試料間の減速電界で低エネルギーに戻して
試料に照射するリターディングやブースティングと呼ば
れる方式が提案されている。
2. Description of the Related Art A scanning electron microscope scans an electron beam emitted from an electron source on a sample and detects secondary electrons and reflected electrons (collectively referred to as secondary signal electrons) which are obtained secondarily. By using this secondary signal as a luminance modulation input of a cathode ray tube which is scanned in synchronization with the scanning of the electron beam, a scanned image (SEM
Image). As described in JP-A-5-266855, as a means for observing a sample with high resolution, the primary electron energy when passing through an objective lens is increased,
A method called retarding or boosting in which the energy is returned to a low level by the deceleration electric field between the objective lens and the sample and the sample is irradiated with the energy is proposed.

【0003】このような方式では、試料から発生した二
次信号電子は対物レンズと試料間の電界で加速されて対
物レンズ上部に引き上げられるため、対物レンズ上部で
二次信号電子を検出することになる。この場合、二次信
号電子は光軸近傍を進行するため、一次電子に影響を与
えずに二次信号電子を検出するには、二次信号電子を光
軸から偏向する必要がある。特開平7−192679 号公報で
は、ウィーンフィルター型の直交電磁界を光軸上に配置
することで、二次信号電子を光軸から偏向し、一次電子
に悪影響を及ぼさずに効率よく二次信号電子を検出可能
とした。
In such a method, secondary signal electrons generated from the sample are accelerated by an electric field between the objective lens and the sample and are lifted to the upper part of the objective lens. Therefore, the secondary signal electrons are detected at the upper part of the objective lens. Become. In this case, since the secondary signal electrons travel near the optical axis, it is necessary to deflect the secondary signal electrons from the optical axis in order to detect the secondary signal electrons without affecting the primary electrons. In Japanese Patent Application Laid-Open No. 7-192679, by arranging a Wien filter type orthogonal electromagnetic field on the optical axis, secondary signal electrons are deflected from the optical axis, and the secondary signal is efficiently emitted without adversely affecting the primary electrons. Electrons can be detected.

【0004】[0004]

【発明が解決しようとする課題】ところが、上記の直交
電磁界を光軸上に配置する従来技術では、光学系が長く
なり、装置が大型化する問題点があった。
However, the prior art in which the orthogonal electromagnetic field is arranged on the optical axis has a problem that the optical system becomes long and the device becomes large.

【0005】そこで、本発明の目的は、上述した従来技
術の欠点をなくし、二次信号電子を光軸から偏向できる
走査電子顕微鏡を提供することにある。
SUMMARY OF THE INVENTION It is an object of the present invention to provide a scanning electron microscope capable of deflecting secondary signal electrons from the optical axis while eliminating the above-mentioned disadvantages of the prior art.

【0006】[0006]

【課題を解決するための手段】上記目的を達成するため
に、本発明の走査形電子顕微鏡においては、対物レンズ
と試料との間に非軸対称分布の電界を発生し、二次信号
電子を光軸から偏向し、偏向後の二次信号電子を光軸外
に配置した検出器で検出する。
In order to achieve the above object, in the scanning electron microscope of the present invention, an electric field having a non-axisymmetric distribution is generated between an objective lens and a sample, and secondary signal electrons are generated. The light is deflected from the optical axis, and the deflected secondary signal electrons are detected by a detector arranged outside the optical axis.

【0007】即ち、上記した本発明の特徴的構成によれ
ば、次のような作用が得られる。
That is, according to the characteristic structure of the present invention, the following operation can be obtained.

【0008】すなわち、対物レンズと試料との間に試料
と対物レンズの間にリターディングやブースティングの
電界がかけてあるので、試料から放出された二次信号電
子は上方に加速される。この電界は非対称分布となって
いるので光軸上であっても半径方向の電界成分を含むた
め、二次信号電子は光軸外へ偏向される。
That is, since a retarding or boosting electric field is applied between the sample and the objective lens between the objective lens and the sample, the secondary signal electrons emitted from the sample are accelerated upward. Since this electric field has an asymmetric distribution, it includes a radial electric field component even on the optical axis, so that the secondary signal electrons are deflected off the optical axis.

【0009】[0009]

【発明の実施の形態】図1は本発明の走査形電子顕微鏡
の一実施例を示す図面である。
FIG. 1 is a drawing showing an embodiment of the scanning electron microscope of the present invention.

【0010】陰極1と第一陽極2に印加される電圧V1
により陰極1から放射された一次電子線4は、第二陽極
3に印加される電圧Vaccに加速されて後段のレンズ系に
進行する。この一次電子線4は、対物レンズ6により試
料7に微小スポットとして集束され、二段の偏向コイル
8で試料上を二次元的に走査される。
Voltage V1 applied to cathode 1 and first anode 2
As a result, the primary electron beam 4 emitted from the cathode 1 is accelerated by the voltage Vacc applied to the second anode 3 and proceeds to the subsequent lens system. The primary electron beam 4 is focused as a minute spot on the sample 7 by the objective lens 6 and is two-dimensionally scanned over the sample by the two-stage deflection coil 8.

【0011】試料7と対物レンズ6間には、制御電極1
0を挿入し、試料7と制御電極10間に非軸対称分布の
電界を生成する。試料7から発生した二次信号電子9
は、対物レンズ6の上部に引き出し加速されるととも
に、光軸外に偏向される。偏向後の二次信号電子は、光
軸の周囲に設置された検出器11に取り込まれる。
A control electrode 1 is provided between the sample 7 and the objective lens 6.
0 is inserted to generate an electric field having a non-axisymmetric distribution between the sample 7 and the control electrode 10. Secondary signal electrons 9 generated from sample 7
Is pulled out to the upper part of the objective lens 6, accelerated, and deflected off the optical axis. The secondary signal electrons after the deflection are taken into the detector 11 installed around the optical axis.

【0012】図2(a),(b)は本発明の走査電子顕微
鏡の非軸対称電界の発生法の例を2例示している。
FIGS. 2A and 2B show two examples of a method for generating a non-axisymmetric electric field in the scanning electron microscope of the present invention.

【0013】図2(a)の例では、試料7と対物レンズ
6間の制御電極10は試料に対向する面の形状が光軸に
関して非軸対称にしてある。試料7と制御電極10の電
位差Vr−Vcによる電界は等高線21で示す非軸対称
分布となる。二次信号電子9は等高線21の垂直方向に
加速されるので、図2(a)の場合には左側に偏向され
る。偏向角度は制御電極10の形状と、試料7と制御電
極10の距離に関係するが、試料7と制御電極10の電
圧Vr,Vcにはほとんど依存しない。制御電極10は
直交電磁界を発生する場合に比べ極めて薄く製作できる
ので、光学系が大型化しない。また、安価である。
In the example shown in FIG. 2A, the control electrode 10 between the sample 7 and the objective lens 6 has a non-axially symmetrical shape on the surface facing the sample. The electric field due to the potential difference Vr-Vc between the sample 7 and the control electrode 10 has a non-axisymmetric distribution indicated by the contour line 21. Since the secondary signal electrons 9 are accelerated in the vertical direction of the contour line 21, they are deflected to the left in the case of FIG. The deflection angle is related to the shape of the control electrode 10 and the distance between the sample 7 and the control electrode 10, but hardly depends on the voltages Vr and Vc between the sample 7 and the control electrode 10. Since the control electrode 10 can be manufactured to be extremely thin as compared with the case where an orthogonal electromagnetic field is generated, the optical system does not increase in size. It is also inexpensive.

【0014】図2(b)の例では、制御電極10を光軸
に関して複数に分割配置し、各部分に印加する電圧を非
軸対称にしてある。例えば、制御電極10を左右2分割
(10a,10b)し、それぞれVca,Vcbの電圧
を印加する。これらの電位差Vca−Vcbにより、半
径方向の電界が発生し、二次信号電子9は光軸外へ偏向
される。偏向角度は制御電極10aと10bの電圧Vc
a,Vcbで制御することができる。
In the example shown in FIG. 2B, the control electrode 10 is divided into a plurality of parts with respect to the optical axis, and the voltage applied to each part is made non-axially symmetric. For example, the control electrode 10 is divided into two parts (10a, 10b) on the left and right sides, and voltages of Vca and Vcb are applied respectively. Due to these potential differences Vca-Vcb, a radial electric field is generated, and the secondary signal electrons 9 are deflected off the optical axis. The deflection angle is the voltage Vc of the control electrodes 10a and 10b.
a and Vcb.

【0015】図3は試料へ入射する一次電子の角度を調
整する方法を示している。本発明の非軸対称電界は、僅
かではあるが一次電子4も偏向する。測長SEMでは測
長精度を確保するため、試料7への一次電子4の入射角
度を垂直に固定する必要がある。従って、試料ステージ
に傾斜機能を付加し、画像を観察しながら、一次電子4
が試料7に垂直入射するように試料角度を制御する。
FIG. 3 shows a method for adjusting the angle of primary electrons incident on the sample. The non-axisymmetric electric field of the present invention also deflects the primary electrons 4 to a small extent. In the length measurement SEM, the incidence angle of the primary electrons 4 on the sample 7 needs to be fixed vertically in order to secure the length measurement accuracy. Therefore, by adding a tilt function to the sample stage and observing the image, the primary electron 4
The sample angle is controlled so that the light is vertically incident on the sample 7.

【0016】[0016]

【発明の効果】本発明の走査電子顕微鏡は、二次信号電
子を光軸から偏向し、一次電子に悪影響を及ぼさずに二
次信号電子を検出できるので、高分解能かつ高感度の観
察が可能である。特に、リターディングやブースティン
グ方式のような試料と対物レンズ間に電界を発生する高
精度の測長SEMの簡単,安価に組み込むことができ
る。
According to the scanning electron microscope of the present invention, secondary signal electrons are deflected from the optical axis and secondary signal electrons can be detected without affecting the primary electrons, so that high-resolution and high-sensitivity observation is possible. It is. In particular, a high-precision length measuring SEM that generates an electric field between a sample and an objective lens, such as a retarding or boosting method, can be easily and inexpensively incorporated.

【図面の簡単な説明】[Brief description of the drawings]

【図1】本発明の一実施例として示した走査形電子顕微
鏡の説明図。
FIG. 1 is an explanatory diagram of a scanning electron microscope shown as one embodiment of the present invention.

【図2】図1の制御電極の構造と作用を説明する説明
図。
FIG. 2 is an explanatory diagram illustrating the structure and operation of a control electrode in FIG. 1;

【図3】図1の試料傾斜機能を説明する説明図。FIG. 3 is an explanatory diagram for explaining a sample tilting function of FIG. 1;

【符号の説明】[Explanation of symbols]

1…陰極、2…第一陽極、3…第二陽極、4…一次電子
線、5…集束レンズ、6…対物レンズ、7…試料、8…
偏向コイル、9…二次信号電子、10,10a,10b
…制御電極、11…検出器、21…等電位線。
DESCRIPTION OF SYMBOLS 1 ... Cathode, 2 ... First anode, 3 ... Second anode, 4 ... Primary electron beam, 5 ... Focusing lens, 6 ... Objective lens, 7 ... Sample, 8 ...
Deflection coil, 9 ... secondary signal electrons, 10, 10a, 10b
... control electrode, 11 ... detector, 21 ... equipotential lines.

Claims (5)

【特許請求の範囲】[Claims] 【請求項1】電子源から放出された一次電子線を偏向コ
イルにより試料上で走査し、前記試料からの二次信号電
子を対物レンズと試料との間の電界により引き出し像観
察する走査電子顕微鏡において、対物レンズと試料との
間の電界を非軸対称分布とすることにより、前記二次信
号電子を光軸から偏向し検出することを特徴とする走査
電子顕微鏡。
1. A scanning electron microscope for scanning a primary electron beam emitted from an electron source on a sample by a deflection coil, extracting secondary signal electrons from the sample by an electric field between an objective lens and the sample, and observing an image. 3. The scanning electron microscope according to claim 1, wherein the secondary signal electrons are deflected from the optical axis and detected by making the electric field between the objective lens and the sample non-axially symmetric.
【請求項2】請求項1の走査電子顕微鏡において、対物
レンズと試料との間に非軸対称形状の制御電極を設置す
ることにより電界を非軸対称分布としたことを特徴とす
る走査電子顕微鏡。
2. A scanning electron microscope according to claim 1, wherein a non-axisymmetric control electrode is provided between the objective lens and the sample so that the electric field has a non-axisymmetric distribution. .
【請求項3】請求項1の走査電子顕微鏡において、対物
レンズと試料との間に軸対称形状の制御電極を非軸対称
に設置することにより電界を非軸対称分布としたことを
特徴とする走査電子顕微鏡。
3. The scanning electron microscope according to claim 1, wherein the electric field has a non-axisymmetric distribution by installing a non-axisymmetric control electrode between the objective lens and the sample. Scanning electron microscope.
【請求項4】請求項1の走査電子顕微鏡において、対物
レンズと試料との間に周方向に分割した制御電極を設置
し、分割した制御電極の各部に非軸対称の電圧をするこ
とにより電界を非軸対称分布としたことを特徴とする走
査電子顕微鏡。
4. The scanning electron microscope according to claim 1, wherein a control electrode divided in a circumferential direction is provided between the objective lens and the sample, and a non-axially symmetric voltage is applied to each of the divided control electrodes. A non-axisymmetric distribution.
【請求項5】請求項1の走査電子顕微鏡において、対物
レンズと試料との間の前記非軸対称電界分布による一次
電子の偏向量に応じて試料を傾斜する手段を有する走査
電子顕微鏡。
5. The scanning electron microscope according to claim 1, further comprising means for tilting the sample in accordance with the amount of primary electron deflection caused by the non-axisymmetric electric field distribution between the objective lens and the sample.
JP9248142A 1997-09-12 1997-09-12 Scanning electron microscope Pending JPH1186770A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP9248142A JPH1186770A (en) 1997-09-12 1997-09-12 Scanning electron microscope

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP9248142A JPH1186770A (en) 1997-09-12 1997-09-12 Scanning electron microscope

Publications (1)

Publication Number Publication Date
JPH1186770A true JPH1186770A (en) 1999-03-30

Family

ID=17173857

Family Applications (1)

Application Number Title Priority Date Filing Date
JP9248142A Pending JPH1186770A (en) 1997-09-12 1997-09-12 Scanning electron microscope

Country Status (1)

Country Link
JP (1) JPH1186770A (en)

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR20030080375A (en) * 2002-04-08 2003-10-17 삼성전자주식회사 Scanning electron microscope(SEM) with a cylindrical secondary electron detecter
US6717144B2 (en) 2001-12-04 2004-04-06 Kabushiki Kaisha Topcon Scanning electron microscope system
WO2012023354A1 (en) * 2010-08-18 2012-02-23 株式会社日立ハイテクノロジーズ Electron beam apparatus
CN119314848A (en) * 2024-09-23 2025-01-14 东方晶源微电子科技(北京)股份有限公司 Electron detection device, electron signal detection method and electron microscope

Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6717144B2 (en) 2001-12-04 2004-04-06 Kabushiki Kaisha Topcon Scanning electron microscope system
KR20030080375A (en) * 2002-04-08 2003-10-17 삼성전자주식회사 Scanning electron microscope(SEM) with a cylindrical secondary electron detecter
WO2012023354A1 (en) * 2010-08-18 2012-02-23 株式会社日立ハイテクノロジーズ Electron beam apparatus
JP5676617B2 (en) * 2010-08-18 2015-02-25 株式会社日立ハイテクノロジーズ Electron beam equipment
US9208994B2 (en) 2010-08-18 2015-12-08 Hitachi High-Technologies Corporation Electron beam apparatus for visualizing a displacement of an electric field
CN119314848A (en) * 2024-09-23 2025-01-14 东方晶源微电子科技(北京)股份有限公司 Electron detection device, electron signal detection method and electron microscope

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