JPH11333354A - Rotary type substrate treatment apparatus - Google Patents

Abstract

PROBLEM TO BE SOLVED: To enhance a medicinal liquid recovery rate in the case a square substrate, such as glass substrate for liquid crystals, is subjected to a wet process treatment with a rotary type substrate treatment apparatus. SOLUTION: The circumference of a rotating mechanism 10 for rotating a rotor 11 is provided with a liquid recovering cup 20 of a two-stage system. This liquid recovering cup 20 is vertically moved relatively to the rotating mechanism 10, by which two kinds of the liquids splashed from the substrate 1 on the rotor 11 by rotation of the rotor 11 are separated and recovered. A liquid recovering auxiliary plate 13 consisting of a disk of nearly the same diameter as the diameter of the outer periphery of the rotating circle of the substrate 1 is disposed below the rotor 11. The liquid falling downward through the blanking hole of the rotor is received by the liquid recovering auxiliary plate 13 and is introduced into the liquid recovering cup 20 at the time of the low-speed rotation of the rotor 11.

Description

DETAILED DESCRIPTION OF THE INVENTION

[0001]

BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a single wafer type rotary substrate processing apparatus suitable for wet processing of a rectangular substrate such as a liquid crystal glass substrate.

[0002]

2. Description of the Related Art A single-wafer type rotary substrate processing apparatus used for manufacturing a liquid crystal panel mounts a substrate horizontally on a rotor in a processing tank and rotates the rotor at a predetermined speed while rotating the upper surface of the substrate. The upper surface is wet-processed by spraying the liquid on the upper surface. The liquid sprayed on the upper surface of the substrate scatters around due to centrifugal force. In addition, the rotor is rotated at a high speed in order to remove the liquid accumulated on the substrate after the liquid is sprayed, and the liquid also scatters around the substrate at this time. In order to collect these scattered liquids, a liquid collection cup is provided around the rotation mechanism.

In this type of rotary substrate processing apparatus, chemical processing such as etching and cleaning with pure water may be continuously performed in the same tank. In this case, it is necessary to separate and collect the used chemical solution and the used pure water (waste liquid), and the following three known separation and collection mechanisms are known.

The first is a three-way valve system shown in FIG. In this embodiment, a drain pipe 4 is provided at the bottom of a cup 3 provided around a rotation mechanism 2 for rotating a substrate 1, and a three-way valve 4a is provided in the middle of the pipe. And the three-way valve 4a
By operating, the chemical liquid and the waste liquid are separated and collected.

The second method is a cup elevating type shown in FIGS. 7 and 8. This uses a two-stage cup 3 in which an inner space is vertically divided by a partition 3a, and the cup 3 can be moved up and down by a telescopic member 5 such as a bellows or a telescoping. When recovering the chemical, the cup 3 is fixed at a height such that the partition 3a is below the substrate 1, as shown in FIG. As a result, the chemical solution is collected in the space above the partition 3 a in the cup 3, and is taken out of the cup 3 via the flexible tube 6. When collecting the waste liquid, as shown in FIG.
Fix the cup 3 at a height above the substrate 1. As a result, the waste liquid is collected in the space below the partition 3 a in the cup 3, and is led out of the cup 3 via the flexible pipe 7.

A third method is a rotor elevating type shown in FIGS. 9 and 10. In this case, a two-stage cup 3 having a partition 3a is fixed, and the rotating mechanism 2 is moved up and down by a cylinder 7 instead. Rotation mechanism 2
The chemical solution and the waste liquid are separated and collected as in the case of the cup elevating type. However, unlike the case of the cup elevating type, the cup 3 is fixed, so that the flexible pipes 6 and 7 become unnecessary, and the chemical solution and waste liquid collected in the cup 3 are transferred to the pocket 8 attached to the outer surface of the cup 3. , 9 to the outside of the cup 3.

[0007]

However, these separation and recovery mechanisms have the following problems.

In the case of the three-way valve system shown in FIG. 6, a part of the cup 3 and part of the drain pipe 4 are shared between the chemical solution and the waste liquid. The remaining pure water is mixed into the chemical. For this reason, the chemical liquid collected during this time must be used as a waste liquid, which causes a decrease in the chemical liquid collection rate.

On the other hand, in the case of the two-stage cup type shown in FIGS. 7 to 10, the two-stage cup 3 moves up and down relatively with respect to the rotating mechanism 2, so that in principle, the chemical solution becomes pure. It is efficiently collected without mixing with water. However, the actual drug solution recovery rate is considerably low. The reason is as follows.

The rotating mechanism 2 includes a rotor for supporting the substrate 1 and a driving unit for supporting and rotating the rotor. The rotor is required to have rigidity capable of reliably supporting the substrate 1 and strength enough to withstand high-speed rotation, while being required to be lightweight to reduce the load on the drive unit. To meet these requirements, instead of a disk, something like a suitably lightened wheel is used (see FIG. 3). On the other hand, the glass substrate for liquid crystal is a rectangular flat plate, and is basically placed on the rotor so that the four corners hardly protrude from the outer edge of the rotor. As a result, when the rotor rotates at a high speed such as at the time of liquid drainage, but not so much, when the rotor rotates at a low speed as at the time of spraying a chemical solution, the chemical solution scattered around the substrate 1 by centrifugal force, A large amount of the liquid falls down from a lightening hole provided in the rotor and becomes waste liquid.

That is, in the conventional two-stage cup type substrate processing apparatus, the chemical is collected in the upper part of the cup 3. Because
If the pure water is collected in the upper part of the cup 3, the pure water that has fallen downward without being collected will enter the lower part of the chemical liquid collecting part and mix with the chemical liquid. However, when the chemical scattered around the substrate 1 due to the centrifugal force drops in a large amount downward from the lightening hole provided in the rotor, a large amount of the chemical flows into the lower-stage pure water recovery section, and the recovery as the chemical is not possible. It becomes possible.

Under these circumstances, the two-stage cup-type substrate processing apparatus is excellent in principle, but is hardly practically used at present.

An object of the present invention is to provide a rotary substrate processing apparatus capable of securing a high chemical solution recovery rate.

[0014]

In order to achieve the above object, a rotary substrate processing apparatus according to the present invention comprises a rotating mechanism for supporting a substrate to be processed on a rotor and rotating the substrate, and rotating the substrate by rotating the substrate. A two-stage type is provided in two stages above and below the rotating mechanism to collect two types of liquid scattered from the liquid crystal, and separates and collects the two types of liquid by moving up and down relatively to the rotating mechanism. In a single wafer type rotary substrate processing apparatus having a liquid recovery cup, a liquid recovery auxiliary plate formed of a disk having substantially the same diameter as the outer circumference of a rotating circle of the substrate is provided below the rotor in proximity to the rotor.

[0015] According to this structure, the high strength with reduced thickness
When a rectangular substrate such as a glass substrate for liquid crystal is placed on a lightweight rotor and spun at a low speed while spraying a chemical solution on the substrate, the chemical solution that falls down through the lightening hole is Since it is received and guided to the chemical liquid recovery section in the cup, a high chemical liquid recovery rate is ensured.

Further, the liquid recovery auxiliary plate does not need to support the substrate and only needs to receive the liquid, so that high strength is not required. For this reason, the weight can be reduced lightly even if the thickness is not reduced, and the load on the rotor drive unit does not increase even when the rotor is rotated together with the rotor.

The auxiliary liquid recovery plate also rotates with the rotor,
The configuration in which the liquid is scattered around by centrifugal force is preferable from the viewpoint of increasing the chemical liquid recovery rate. In addition, a cap-shaped disk inclined downward toward the outer edge is preferable from the viewpoint of increasing the chemical solution recovery rate.

[0018]

Embodiments of the present invention will be described below with reference to the drawings.

FIG. 1 is a schematic plan view and a schematic longitudinal sectional view of a rotary substrate processing apparatus according to an embodiment of the present invention, FIG. 2 is an elevation view of a rotor portion of the rotary substrate processing apparatus, and FIG. FIG. 4 is a schematic plan view and a schematic longitudinal sectional view of a main part showing a chemical liquid collecting operation in the rotary substrate processing apparatus, and FIG. 5 is a main part showing a waste liquid collecting operation in the rotary substrate processing apparatus. It is a schematic plan view and a schematic longitudinal sectional view.

The rotary substrate processing apparatus according to the embodiment of the present invention is a two-stage cup type substrate processing apparatus used for wet processing of a liquid crystal glass substrate. This substrate processing apparatus is shown in FIG.
As shown in FIG. 1, a rotation mechanism 10 for horizontally supporting and rotating a substrate 1 to be processed, and a two-stage type provided around the rotation mechanism 10 for collecting liquid scattered from the substrate 1 by rotation of the substrate 1 And a liquid recovery cup 20. These are provided in a housing 30 which also serves as a processing tank.

The rotating mechanism 10 includes a rotor 11 that supports the substrate 1 horizontally, a drive unit 12 for the substrate 11, and a liquid recovery auxiliary plate 13 provided below the rotor 11 and close to the rotor 11. The drive section 12 is fixed in the housing 30 by a gantry 31.

As shown in FIGS. 2 and 3, the rotor 11 has a so-called wheel shape with a reduced thickness, and has a hub portion 11a provided at a central portion and an annular rim portion provided at an outer peripheral portion. 11b, and a plurality of spoke portions 11c, 11c,... Provided radially to connect the two. The outer diameter of the rotor 11 is slightly shorter than the diagonal dimension which is the outer diameter of the rotating circle of the substrate 1. Accordingly, the substrate 1 is supported on the rotor 11 with the four corners slightly protruding outside the rotor 11.

The hub 11a of the rotor 11
Is coupled concentrically to a rotating shaft head 15 vertically supported within a housing 14 to rotate the housing.
In order to position and fix the substrate 1 on the rotor 11, a plurality of support pins 11d, 11d... And positioning pins 11 are provided on the rim 11b and the spokes 11c.
e, 11e are attached.

The auxiliary liquid recovery plate 13 is a disk made of a thin plate having an outer diameter equal to or slightly larger than the diagonal size which is the outer diameter of the rotating circle of the substrate 1. Not. This disk is a hat shape that is slightly inclined downward from the center toward the outer edge, for example, at an angle of 1 to 5 °, and has a circular opening through which the head portion 15 penetrates at the center thereof. The rotor 11 is fitted around the head portion 15 and fixed thereto. Therefore, this liquid recovery auxiliary plate 1
3 rotates together with the rotor 11.

The liquid recovery cup 20 is divided into a cylindrical movable upper cup 20A and a fixed lower cup 20B for accommodating the upper cup 20A.

The fixed lower cup 20B is an annular container having a U-shaped cross section.
0 and is fixed in the housing 30. Since both portions are fixed between the inner wall portion 21 of the lower cup 20B and the drive portion 12 of the rotating mechanism 10 located inside the lower cup portion 20B, they are sealed by a fixed seal structure.
On the inner surface of the outer wall portion 22 of the lower cup 20B, a liquid receiving portion 23 having an L-shaped cross section is provided over the entire circumference.

On the outer peripheral surface of the lower cup 20B (outer surface of the wall portion 22), two first pockets 4 for discharging a chemical solution are provided.
0, 40 and two second pockets 50, 50 for discharging waste liquid are attached. 1st pocket 4
0 and 40 are at diagonal positions sandwiching the device center. The second pockets 50, 50 are at diagonal positions displaced by 90 degrees in the circumferential direction with respect to the first pockets 40, 40.

The first pocket 40 is, as shown in FIG.
It is located at the middle part of the lower cup 20B, and communicates with the inside of the lower cup 20B above the liquid receiving portion 23 provided on the inner surface of the outer wall 22 of the lower cup 20B. The second pocket 50 is located at the lower part of the lower cup 20B as shown in FIG.
It communicates with B.

The movable upper cup 20A has a double cylinder structure in which an outer cylinder 24 and an inner cylinder 25 are combined with a predetermined gap. An annular space formed between the two is vertically divided by an annular partition plate 26 also serving as a connecting member. The upper cup 20A is connected to the cylinder 60, via a pair of opposite L-shaped support members 61, 61.
It is attached to the cylinder 60 and performs a vertical movement by a synchronous operation of the cylinders 60 and 60.

The outer cylinder 24 collects a chemical solution inside the outer cylinder 24, especially above the partition plate 26. The upper part of the outer cylinder 24 is inclined inward at a predetermined angle for collecting liquid. A burr 27 that is inclined downward is provided at the upper end opening edge of the outer cylinder 24. The burrs 27 are effective for preventing the droplets from scattering.
The outer cylinder 24 has openings at two places where the first pockets 40, 40 are provided in order to guide the chemical solution collected inside the outer cylinder 24 to the first pockets 40, 40 for deriving the chemical solution. A portion 28 is provided above the partition 26. The lower portion of the outer cylinder 24 below the partition plate 26 is a skirt that fits outside the liquid receiving portion 23 of the lower cup 20B with a slight gap, and forms a movable seal portion in cooperation with the liquid receiving portion 23. I have.

The inner cylinder 25 collects waste liquid inside.
In order to perform separation and recovery from the chemical solution, the inner cylinder 25 is
Is displaced downward. The upper part of the inner cylinder 25 is inclined inward at a predetermined angle for liquid collection. The inclined portion 29 is also a partitioning portion for vertically separating an inner space of the upper cup 20A in order to separate and collect a chemical solution and a waste liquid inside the upper cup 20A. At the upper end opening edge of the inner cylinder 25, a burr 27 'inclined downward is provided in order to prevent droplets from scattering. The lower part of the inner cylinder 25 is the liquid receiving portion 23 of the lower cup 20B.
The skirt is fitted inside with a slight gap therebetween, and forms a movable seal portion in cooperation with the liquid receiving portion 23.

Next, the function of the rotary substrate processing apparatus according to the embodiment of the present invention will be described.

When collecting the chemical solution, that is, when spraying the chemical solution on the substrate 1 or draining the chemical solution, as shown in FIG. 4, the upper end of the outer cylinder 24 of the movable upper cup 20A is The upper end of the inner cylinder 25, that is, the upper end of the inclined portion 29, which is a partition that vertically partitions the inner space of the upper cup 20 </ b> A, is located above the substrate 1 placed on the rotor 11. The upper cup 20A is moved up and down to a position below the provided liquid recovery auxiliary plate 13.

When the rotor 11 is rotated at a high speed in this state, the chemical solution on the substrate 1 scatters to the outer peripheral side due to centrifugal force and is collected directly inside the outer cylinder 24, particularly, above the partition plate 26.
When the rotor 11 rotates at a low speed, most of the chemical solution on the substrate 1 passes through a lightening hole provided in the rotor 11, that is, a fan-shaped opening formed between adjacent spokes 11c, 11c. The chemical solution is received by the liquid recovery auxiliary plate 13 and is collected in the outer cylinder 24 by the centrifugal force and the inclination caused by the rotation of the liquid recovery auxiliary plate 13. The remaining chemical liquid is directly collected in the outer cylinder 24 without passing through the auxiliary liquid recovery plate 13. Therefore, a situation in which a part of the chemical solution is mixed in the inner cylinder 25 is avoided.

The chemical solution collected in the outer cylinder 24 is
Through the liquid receiving portion 23 through the opening 28 provided in the first pockets 40, 40, and further into the ducts 41, 40.
It is led to a gas-liquid separation box or the like for chemicals through 41.
At this time, since the lower end of the outer cylinder 24 is fitted to the outside of the liquid receiving portion 23, the chemical solution is supplied to the liquid receiving portion 2 in the lower cup 20B.
Do not enter below 3.

As shown in FIG. 5, when collecting the waste liquid generated by the washing treatment with pure water, the upper end of the inner cylinder 25 of the movable upper cup 20A, that is, a partition for vertically partitioning the inner space of the upper cup 20A. The upper cup 20 </ b> A rises to a position where the upper end of the inclined portion 29, which is a portion, is above the substrate 1 placed on the rotor 11.

When the rotor 21 is rotated in this state, the waste liquid on the substrate 1 is collected inside the inner cylinder 25. The waste liquid is led out into the second pockets 50, 50 via the inside of the fixed lower cup 20B, and further led to the gas-liquid separation box for waste liquid through the ducts 51, 51. At this time,
Since the lower end of the inner cylinder 25 is fitted inside the liquid receiving portion 23, the waste liquid does not enter the liquid receiving portion 23.

According to such a separating and collecting mechanism, the chemical liquid flows from the inside of the outer cylinder 24 of the movable upper cup 20A through the liquid receiving portion 23 of the lower cup 20B.
Derived within 0,40. On the other hand, the waste liquid is upper cup 20A
From the inside of the inner cylinder 25 of the lower cup 20B.
3 and is led out into the second pockets 50, 50 via a lower portion.

Further, there is no possibility that a part of the chemical solution flows into the waste liquid collecting inner cylinder 25 through the lightening hole of the rotor 11. Therefore, the chemical liquid and the waste liquid do not mix. Therefore, a high chemical solution recovery efficiency is ensured.

In addition to this, the rotary substrate processing apparatus according to the embodiment of the present invention employs a conventional two-stage processing apparatus shown in FIGS.
It has the following advantages as compared with the stepped cup type.

Since the rotation mechanism 10 is fixed, vibration is small.

Since the rotating mechanism 10 is fixed and the lower cup 20B for collecting the waste liquid is also of a fixed type, there is no need for an elastic member to seal between the two. Further, the waste liquid collected in the lower cup 20B is led out to the second pockets 50, 50 attached to the lower cup 20B, and the flexible tube is excluded from the lead-out portion. Furthermore, the flexible tube is also excluded from the outlet of the chemical solution. Therefore, even when a highly corrosive chemical is used, the apparatus cost does not increase.

Since a movable seal structure is employed in which the lower ends of the outer tube 24 and the inner tube 25 are fitted inside and outside the receiving portion 23, the flexible pipe can be excluded from each of the liquid and waste liquid outlets. Regardless, mixing of both solutions is avoided.

When the substrate 1 is rotated, a large amount of wind is generated by the rotor 11 and the pins for supporting the substrate 1 thereon. In order to prevent the liquid from being scattered by the wind, the upper part of the cup 20 (the upper part of each of the outer cylinder 24 and the inner cylinder 25) is inclined inward. Heading upward along the inner surface of the upper part,
The liquid adhering to the inner surface is scattered outside the cup 20 as droplets. Then, when this scattering occurs, there is a danger that the liquid adheres to the apparatus and the inner surface of the apparatus outside the cup 20 and falls on the substrate 1 when the substrate 1 is transported.

However, in the present substrate processing apparatus, the burrs 27, 27 'inclined downward are provided at the upper edge of the cup 20 (the upper edge of the outer cylinder 24 and the inner cylinder 25). In addition, there is no possibility that the liquid may be scattered outside the cup 20. The burrs are effective not only in the rotary substrate processing apparatus according to the present invention but also in a conventional rotary substrate processing apparatus.

The liquid recovery auxiliary plate 13 divides a cup provided around the rotation mechanism, such as the present substrate processing apparatus, into a movable upper cup and a fixed lower cup, and the upper cup is moved up and down. The present invention can be applied not only to a type in which two kinds of liquids are separated and collected inside and outside a lower cup, but also to a conventional two-stage type.

[0047]

As described above, in the rotary substrate processing apparatus according to the present invention, the liquid recovery auxiliary plate is provided below the rotor for supporting and rotating the substrate, so that the substrate can pass through the lightening hole of the rotor. Since the chemical solution that falls downward can be guided to the chemical solution collection section in the cup, a high chemical solution collection rate can be secured, thereby contributing to the practical use of the two-stage cup type substrate processing apparatus.

[Brief description of the drawings]

FIG. 1 shows the structure of a rotary substrate processing apparatus according to an embodiment of the present invention, wherein (a) is a schematic plan view and (b) is a schematic longitudinal sectional view.

FIG. 2 is an elevational view of a rotor portion of the rotary type substrate processing apparatus.

FIG. 3 is a plan view of the rotor portion.

4A and 4B show a chemical liquid collecting operation in the rotary substrate processing apparatus, wherein FIG. 4A is a schematic plan view, and FIG. 4B is a schematic longitudinal sectional view.

5A and 5B show a waste liquid collecting operation in the rotary type substrate processing apparatus, wherein FIG. 5A is a schematic plan view, and FIG. 5B is a schematic longitudinal sectional view.

FIG. 6 is a schematic vertical sectional view showing the structure of a conventional rotary substrate processing apparatus (three-way valve type).

7A and 7B show the structure of a conventional rotary substrate processing apparatus (cup elevating type) in the case of a chemical liquid collecting operation, wherein FIG. 7A is a schematic plan view, and FIG. 7B is a schematic longitudinal sectional view.

8A and 8B show the structure of a conventional rotary substrate processing apparatus (cup elevating type) in the case of a waste liquid collecting operation, wherein FIG. 8A is a schematic plan view, and FIG. 8B is a schematic longitudinal sectional view.

9A and 9B show a structure of a conventional rotary substrate processing apparatus (rotor elevating type) in a case of a chemical liquid collecting operation, in which FIG. 9A is a schematic plan view, and FIG. 9B is a schematic longitudinal sectional view.

FIG. 10 shows a conventional rotary substrate processing apparatus (rotor elevating type).
1A shows a structure of a waste liquid collecting operation, and FIG. 2A is a schematic plan view, and FIG.

[Explanation of symbols]

 DESCRIPTION OF SYMBOLS 1 Substrate 10 Rotation mechanism 11 Rotor 12 Drive part 13 Liquid recovery auxiliary plate 20 Liquid recovery cup 20A Movable upper cup 20B Fixed lower cup 23 Liquid receiver 24 Outer cylinder 25 Inner cylinder 28 Opening 29 Partitioning part 30 Housing 40 1st pocket 50 2nd pocket 60 cylinder

──────────────────────────────────────────────────の Continued on the front page (51) Int.Cl. ⁶ Identification symbol FI H05K 3/06 G03F 7/30 501 // G03F 7/30 501 H01L 21/306 J

Claims (3)

[Claims] 1. A rotating mechanism for supporting and rotating a substrate to be processed on a rotor, and provided in two stages above and below the rotating mechanism for collecting two types of liquid scattered from the substrate by the rotation of the substrate. A two-stage liquid recovery cup that separates and recovers two types of liquids by moving up and down relative to a rotation mechanism. A rotary substrate processing apparatus, wherein a liquid recovery auxiliary plate comprising a disk having substantially the same diameter as the outer circumference of the rotating circle of the substrate is provided close to the rotor. 2. The rotary substrate processing apparatus according to claim 1, wherein the auxiliary liquid recovery plate rotates together with the rotor. 3. The rotary substrate processing apparatus according to claim 1, wherein the liquid recovery auxiliary plate is inclined downward toward an outer edge portion.