JPH0268486A - image heating device - Google Patents
image heating deviceInfo
- Publication number
- JPH0268486A JPH0268486A JP21707188A JP21707188A JPH0268486A JP H0268486 A JPH0268486 A JP H0268486A JP 21707188 A JP21707188 A JP 21707188A JP 21707188 A JP21707188 A JP 21707188A JP H0268486 A JPH0268486 A JP H0268486A
- Authority
- JP
- Japan
- Prior art keywords
- elliptical mirror
- focal point
- shielding plate
- heating device
- image heating
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C30—CRYSTAL GROWTH
- C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
- C30B13/00—Single-crystal growth by zone-melting; Refining by zone-melting
- C30B13/16—Heating of the molten zone
- C30B13/22—Heating of the molten zone by irradiation or electric discharge
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Crystallography & Structural Chemistry (AREA)
- Materials Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Control Of Resistance Heating (AREA)
- Constitution Of High-Frequency Heating (AREA)
- Crystals, And After-Treatments Of Crystals (AREA)
- Furnace Details (AREA)
Abstract
(57)【要約】本公報は電子出願前の出願データであるた
め要約のデータは記録されません。(57) [Summary] This bulletin contains application data before electronic filing, so abstract data is not recorded.
Description
【発明の詳細な説明】
〔産業上の利用分野〕
この発明は例えは半導体材料などの結晶成長などに使用
されるイメージ炉のイメージ加熱光源の改良に関するも
のである。DETAILED DESCRIPTION OF THE INVENTION [Industrial Application Field] The present invention relates to an improvement in an image heating light source for an image furnace used, for example, in crystal growth of semiconductor materials.
第4図は例えは固体物理Vop l嶋A10゜1 97
9.633ページ〜640ページに示された従来のイメ
ージ加熱装置の構成を示す断面図であ91図において(
1)は内面を回転楕円体に研磨し金メツキを施した楕円
鏡、(21は楕円鏡filの第一の焦点位置に設置され
たハロゲンランプやキセノンランプなどの光源、(3)
はこの光源に接続された電源、(4)は楕円鏡(11の
第二の焦点に置かれた供試体としての試料、(5)はこ
の試料(4)を収納する石英管である。Figure 4 is an example of solid state physics Vop lshima A10゜1 97
9. This is a sectional view showing the configuration of the conventional image heating device shown on pages 633 to 640.
1) is an elliptical mirror whose inner surface is polished into a spheroid and plated with gold; (21 is a light source such as a halogen lamp or xenon lamp installed at the first focal point of the elliptical mirror fil; (3)
is a power supply connected to this light source, (4) is a sample as a specimen placed at the second focus of the elliptical mirror (11), and (5) is a quartz tube that houses this sample (4).
従来のイメージ加熱装fILは上記のように構成され、
光源(2)が発した光は第二の焦点に集光され。The conventional image heating device fIL is configured as described above,
The light emitted by the light source (2) is focused on a second focal point.
材料棒(4)の温度が上昇する。石英管(5)はその内
部を真空にしたシ、ガスを注入したシして雰囲気制御を
行うために設けられる。The temperature of the material rod (4) increases. The quartz tube (5) is provided to control the atmosphere by evacuating the inside and injecting gas.
上記のような従来のイメージ加熱装置は光源(2)がハ
ロゲンランプやXeランプであシ、その発光部の大きさ
が直径5〜7mと小さいため材料棒(4)の表面の温度
勾配が大きく、クラックを生じてしまうなどの問題があ
った。In the conventional image heating device as described above, the light source (2) is a halogen lamp or Xe lamp, and the size of the light emitting part is small with a diameter of 5 to 7 m, so the temperature gradient on the surface of the material rod (4) is large. , there were problems such as cracks occurring.
サラにハロゲンやXeランプの寿命が各々100時間、
1500時間と短く交換の手間や費用がかかつてしまう
問題があった。The lifespan of halogen and Xe lamps is approximately 100 hours each.
There was a problem that the time required for replacement was short (1,500 hours), which increased the labor and cost of replacement.
さらに、ランプの起動時間や再起動時間が各々180秒
と300秒程度も必要とし加熱工程で非常に不便であっ
た。つまシ加熱後ある温度まで冷却し、この温度でアニ
ール処理を行うとき起動時間が長いと温度を正確にコン
トロールする事が難しい。Furthermore, the lamp startup time and restart time are approximately 180 seconds and 300 seconds, respectively, which is very inconvenient in the heating process. After heating the drum, it is cooled to a certain temperature, and when annealing is performed at this temperature, if the startup time is long, it is difficult to accurately control the temperature.
さらに、ランプの形状が大きく予備品の保管や運搬に大
きな容積を必要としていた。このことは宇宙環境利用の
材料炉などの場合非常に困難な問題となる。Furthermore, the shape of the lamp is large, requiring a large volume for storing and transporting spare parts. This becomes a very difficult problem in the case of material reactors for use in the space environment.
この発明は、かかる課題を解決するためになされたもの
で、マイクロ波放電ランプを光源として採用することで
、温度勾配を緩くシ、寿命を長くし、起動や再起動が早
く行え、ランプ形状の小さなイメージ加熱装置を得るこ
とを目的とする。This invention was made to solve these problems, and by employing a microwave discharge lamp as a light source, the temperature gradient can be reduced, the lifespan can be extended, startup and restart can be performed quickly, and the shape of the lamp can be changed. The aim is to obtain a small image heating device.
また、この発明の別の発明は上記目的に加え光源を2個
とし、試料の温度を均一にすることを目的とする。In addition to the above object, another invention of the present invention uses two light sources and aims to make the temperature of the sample uniform.
この発明に係るイメージ加熱装置は、楕円鏡の内部に金
網を張シ、これと楕円鏡との間につくられた空間、すな
わち空洞共振容重の第一の焦点にプラズマランプを置き
、を波を注入してプラズマランプを発光させるものであ
る。The image heating device according to the present invention stretches a wire mesh inside an elliptical mirror, places a plasma lamp in the space created between this and the elliptical mirror, that is, the first focal point of the cavity resonant volume, and generates waves. It is injected to cause a plasma lamp to emit light.
また、この発明の別の発明に係るイメージ加熱装置にお
いては、楕円鏡を2個組合わせて双楕円鏡としそれぞれ
の第一焦点にプラズマランプを置き、第二焦点に随かれ
た試料の温度分布を均一にするものである。In addition, in an image heating device according to another invention of the present invention, two elliptical mirrors are combined to form a bielliptic mirror, and a plasma lamp is placed at the first focus of each, and the temperature distribution of the sample following the second focus is This is to make it uniform.
この発明においては第一焦点に置かれたプラズマランプ
が電波で励起されて発光すると金網を透過した光が楕円
鏡で集光されて第二の焦点に置かれた試料に集光し試料
を加熱する。In this invention, when the plasma lamp placed at the first focal point is excited by radio waves and emits light, the light transmitted through the wire mesh is focused by an elliptical mirror and focused on the sample placed at the second focal point, heating the sample. do.
また、この発明の別の発明においては、第1の楕円鏡の
第一焦点と第2の楕円鏡の第一焦点の各々に置かれたプ
ラズマランプの光を、共通な第二焦点に置かれた試料に
集光し試料を加熱する。Further, in another invention of the present invention, the light of the plasma lamp placed at each of the first focus of the first elliptical mirror and the first focus of the second elliptical mirror is placed at a common second focus. The light is focused on the sample and heated.
第1図はこの発明の一実施例を示す断面図であ、9.(
11と(4)は上記従来の装置と全く同一のものである
。(6)は第一焦点に置かれたプラズマランプでセラミ
ックスの中空球内にXeやKなどを刺入したものである
。(7)はプラズマランプ(6)を支持する支持具で窒
化アルミなどの熱伝導性のよいセラミックスなどで構成
される。(8)は楕円鏡(1)の端部に取付られた円板
状の金網で作られ11波を遮蔽する遮蔽板で、その周辺
部は楕円鏡filの内側に接して電気的な導通が保たれ
ておシ、空洞共振器(9)を構成する。αυは空洞共振
器(9)の一部に矩形の穴顛をあけ、この穴α〔に開口
端を合わせて取付られた導波管、 (+2はこの導波管
αυの端部に取付られたクライストロン、αeはクライ
ストロンa3に接続された電源である。FIG. 1 is a sectional view showing an embodiment of the present invention. (
11 and (4) are exactly the same as the conventional device described above. (6) is a plasma lamp placed at the first focus, with Xe, K, etc. inserted into a hollow ceramic sphere. Reference numeral (7) denotes a support for supporting the plasma lamp (6), and is made of ceramics with good thermal conductivity such as aluminum nitride. (8) is a shielding plate made of a disk-shaped wire mesh attached to the end of the elliptical mirror (1) and shielding 11 waves, and its peripheral part is in contact with the inside of the elliptical mirror fil to ensure electrical continuity. When maintained, a cavity resonator (9) is formed. αυ is a waveguide that is installed by making a rectangular hole in a part of the cavity resonator (9) with its open end aligned with this hole α, (+2 is installed at the end of this waveguide αυ) The klystron αe is a power supply connected to the klystron a3.
上記のように構成されたイメージ加熱装置において、電
源Uから電力を供給してクライストロンα2を発振させ
電波を導波管(11+に注入し、穴α1から空洞共振器
(9)へ電磁エネルギーを注入してプラズマランプ(6
)に吸収させる。プラズマランプ(6)は電磁波による
プラズマ励起で発光し、遮蔽板(8)を透過して楕円鏡
(1)で集光されて第二焦点に置かれた試料(4)を加
熱する。In the image heating device configured as described above, power is supplied from the power source U to oscillate the klystron α2, injecting radio waves into the waveguide (11+), and injecting electromagnetic energy from the hole α1 into the cavity resonator (9). and plasma lamp (6
) to be absorbed. The plasma lamp (6) emits light due to plasma excitation by electromagnetic waves, passes through the shielding plate (8), is focused by the elliptical mirror (1), and heats the sample (4) placed at the second focal point.
なお、上記実施例では円板状の金網(8)を楕円鏡(1
1の内側に取付けたが、遮蔽板(8)を断面コの字状の
カップ型に形成して楕円鏡(1)の第一焦点側の端部に
取付けても同様の動作を行える。In the above embodiment, the disk-shaped wire mesh (8) is replaced with an elliptical mirror (1).
Although the shielding plate (8) is attached to the inside of the elliptical mirror (1), the same operation can be performed by forming the shielding plate (8) into a cup shape with a U-shaped cross section and attaching it to the end of the elliptical mirror (1) on the first focal point side.
第2図はカップ型の遮蔽板(8)を楕円鏡(1)に取や
つけた場合の他の実施態様を示したもので、楕円鏡(1
)の第一焦点に置かれたプラズマラング(6)を収納す
るようにコツプ型の遮蔽板(8)を取付けたもので、空
洞共振条件を遮蔽板(8)の形状によって決めることが
でき、楕円鏡(11の形状に左右されなり利点が生ずる
。Figure 2 shows another embodiment in which a cup-shaped shielding plate (8) is attached to the elliptical mirror (1).
) A cot-shaped shielding plate (8) is attached to accommodate the plasma lung (6) placed at the first focus of the cavity, and the cavity resonance conditions can be determined by the shape of the shielding plate (8). Advantages arise depending on the shape of the elliptical mirror (11).
さて、この発明は上記のように楕円鏡filの第一焦点
にプラズマランプ(6)と遮蔽板(8)を取りつけるも
のであるが、第3図の別の発明のように第2の楕円鏡α
4を楕円鏡fi+の長袖方向に第二焦点を共有して取シ
つけ、第2の楕円鏡α4の端部にプラズマランプ(6)
と支持具(7)及び遮蔽板(8)を取シつけて空洞共振
器(9)を構成する。両方のプラズマランフ(6)から
発した光は第二の焦点に置かれた試料(4)の上に集光
しこれを加熱する。光が試料(4)に全方向から照射さ
れるので、均一な温度分布となる。Now, in this invention, as mentioned above, the plasma lamp (6) and the shielding plate (8) are attached to the first focus of the elliptical mirror fil, but as in another invention shown in FIG. α
4 is installed in the long sleeve direction of the elliptical mirror fi+, sharing the second focal point, and a plasma lamp (6) is attached to the end of the second elliptical mirror α4.
A cavity resonator (9) is constructed by attaching a support (7) and a shielding plate (8). The light emitted from both plasma lamps (6) is focused onto the sample (4) placed at the second focal point and heats it. Since the sample (4) is irradiated with light from all directions, a uniform temperature distribution is achieved.
さらに、上記の別の発明において、遮蔽板(8)をコツ
プ状にしても同様の効果を生ずる。Furthermore, in the above-mentioned other invention, the same effect can be obtained even if the shielding plate (8) is made into a concave shape.
この発明は以上説明したとおp、楕円鏡の内側。 As explained above, this invention is the inside of an elliptical mirror.
第一焦点を含む端部に円板状の遮蔽板を取シっけて空洞
共振器を構成し、この中にプラズマランフを置いて発光
させ、第二焦点に置かれた試料を加熱するが、プラズマ
ランプの直径が10〜30■と大きいので試料の上に結
ばれる像が大きくかつ平均な強度で当るため試料の温度
を均一にする効果がある。A cavity resonator is constructed by placing a disc-shaped shielding plate at the end including the first focal point, and a plasma lamp is placed inside this cavity to emit light and heat the sample placed at the second focal point. Since the plasma lamp has a large diameter of 10 to 30 cm, the image formed on the sample is large and hits the sample with an average intensity, which has the effect of making the temperature of the sample uniform.
この事は宇宙における微小重力下での材料製造において
極めて重大な効果となる。それは試料の表面の熱分布が
不均一の場合、マランゴニ対流が生じ材料の結晶成長を
乱してしまって微小重力の効果を阻害するからであシ、
できる限シ均一な温度で試料を加熱する必要がある。This is an extremely important effect in material manufacturing under microgravity in space. This is because if the heat distribution on the surface of the sample is uneven, Marangoni convection occurs, disrupting the crystal growth of the material and inhibiting the effects of microgravity.
It is necessary to heat the sample at as uniform a temperature as possible.
さらに、プラズマランプが小型、軽量であり。Additionally, plasma lamps are small and lightweight.
フィラメントを使用しないので長寿命で堅ろうなため従
来のハロゲンランプを用いたイメージ加熱装置に比較し
て、極めて扱いやすく、長寿命でメインテナンスを簡単
にする効果かある。Since it does not use a filament, it has a long life and is robust, so it is extremely easy to handle, has a long life, and has the effect of simplifying maintenance compared to conventional image heating devices using halogen lamps.
また、この発明の別の発明は、プラズマランプを2個用
いて、試料を両側から加熱するので試料の熱分布をさら
に均一にできる効果かある。Another aspect of the present invention uses two plasma lamps to heat the sample from both sides, which has the effect of making the heat distribution of the sample more uniform.
第1図はこの発明の一実施例を示す断面図、第2図はこ
の発明の他の実施例を示す断面図、第3図はこの発明の
別の実施例を示す断面図、第4図は従来のイメージ加熱
装置を示す断面図である。
図において、(1)は楕円鏡、(2)は光源、(3)は
電源。
(4)は試料、(5)は石英管、(6)はプラズマラン
プ、(7)は支持具、(8)は遮蔽板、(9)は空洞共
振器、 QQは穴。
allは導波管、α2はクライストロン、ajは電源、
84は第2の楕円鏡である。
なお、各図中同一符号は同−菫たは相半部分を示す。
第1図
第2図FIG. 1 is a sectional view showing one embodiment of this invention, FIG. 2 is a sectional view showing another embodiment of this invention, FIG. 3 is a sectional view showing another embodiment of this invention, and FIG. 4 is a sectional view showing another embodiment of this invention. 1 is a sectional view showing a conventional image heating device. In the figure, (1) is an elliptical mirror, (2) is a light source, and (3) is a power source. (4) is the sample, (5) is the quartz tube, (6) is the plasma lamp, (7) is the support, (8) is the shielding plate, (9) is the cavity resonator, and QQ is the hole. all is a waveguide, α2 is a klystron, aj is a power supply,
84 is a second elliptical mirror. In addition, the same reference numerals in each figure indicate the same or different parts. Figure 1 Figure 2
Claims (2)
の第一焦点に置かれたプラズマランプと、このプラズマ
ランプを支持する支持具と、楕円鏡の第一焦点側端部に
おいて、その内面に円周状の縁が接するよう取付けられ
た円板状の遮蔽板と、この遮蔽板と楕円鏡とで形成され
た空洞共振器に電波を注入する手段を備えた事を特徴と
するイメージ加熱装置。(1) An elliptical mirror having a spheroidal reflecting surface inside, a plasma lamp placed at the first focal point, a support for supporting the plasma lamp, and an end portion on the first focal point side of the elliptical mirror, It is characterized by comprising a disc-shaped shielding plate attached so that its inner surface is in contact with a circumferential edge, and a means for injecting radio waves into a cavity resonator formed by the shielding plate and an elliptical mirror. Image heating device.
の第二焦点を共有する第2の楕円鏡と、双方の第一焦点
に置かれたプラズマランプと、双方のプラズマランプを
支持する支持具と、双方の楕円鏡の第一焦点側端部にお
いて、その内面に円周状の縁が接するよう取付られた円
板状の遮蔽板とこの遮蔽板と楕円鏡とで形成された空洞
共振器に電波を注入する手段を備えた事を特徴とするイ
メージ加熱装置。(2) An elliptical mirror with a spheroidal reflecting surface inside, a second elliptical mirror that shares this second focal point, a plasma lamp placed at the first focal point of both, and support for both plasma lamps. a disc-shaped shielding plate attached so that its inner surface is in contact with the circumferential edge of the first focal point side end of both elliptical mirrors; and the shielding plate and the elliptical mirror. An image heating device characterized by comprising means for injecting radio waves into a cavity resonator.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP21707188A JPH0676869B2 (en) | 1988-08-31 | 1988-08-31 | Image heating device |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP21707188A JPH0676869B2 (en) | 1988-08-31 | 1988-08-31 | Image heating device |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPH0268486A true JPH0268486A (en) | 1990-03-07 |
| JPH0676869B2 JPH0676869B2 (en) | 1994-09-28 |
Family
ID=16698379
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP21707188A Expired - Lifetime JPH0676869B2 (en) | 1988-08-31 | 1988-08-31 | Image heating device |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH0676869B2 (en) |
Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH03128667U (en) * | 1990-04-09 | 1991-12-25 | ||
| JPH0413088A (en) * | 1990-04-27 | 1992-01-17 | Mitsubishi Electric Corp | Ring electrode type electrostatic levitation furnace |
| EP0438179B1 (en) * | 1990-01-19 | 1994-11-09 | Mitsubishi Denki Kabushiki Kaisha | An image heating apparatus using a microwave discharge plasma lamp |
| US5420390A (en) * | 1990-01-19 | 1995-05-30 | Mitsubishi Denki Kabushiki Kaisha | Image heating apparatus using a microwave discharge plasma lamp |
-
1988
- 1988-08-31 JP JP21707188A patent/JPH0676869B2/en not_active Expired - Lifetime
Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| EP0438179B1 (en) * | 1990-01-19 | 1994-11-09 | Mitsubishi Denki Kabushiki Kaisha | An image heating apparatus using a microwave discharge plasma lamp |
| US5420390A (en) * | 1990-01-19 | 1995-05-30 | Mitsubishi Denki Kabushiki Kaisha | Image heating apparatus using a microwave discharge plasma lamp |
| JPH03128667U (en) * | 1990-04-09 | 1991-12-25 | ||
| JPH0413088A (en) * | 1990-04-27 | 1992-01-17 | Mitsubishi Electric Corp | Ring electrode type electrostatic levitation furnace |
Also Published As
| Publication number | Publication date |
|---|---|
| JPH0676869B2 (en) | 1994-09-28 |
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