JPH0860100A - Lustering agent composition - Google Patents

Abstract

PURPOSE: To obtain a lustering agent composition which retains the lustering effect characteristics of an organosilicon compound and imparts to a surface reduced slipperiness and a luster improved in durability and cleaning resistance by incorporating a product of the reaction of colloidal silica with a specific organosilicon compound. CONSTITUTION: The composition comprises a product of the reaction of colloidal silica with at least one member selected from among organosilicon compounds represented by the formula (wherein x is 0 or 1; R is an alkyl, vinyl, phenyl, an aminoalkyl, an acryloxyalkyl, a methacryloxyalkyl, a glycidoxyalkyl, a polyoxyalkylene, or a polyoxyalkylenealkyl; R' is an alkyl or phenyl; and R" is a lower alkyl) and hydrolyzates and partial condensates of these. It imparts an excellent luster to the coating of furniture, an internal or external finish material of a house, or an interior or exterior automotive part or to the surface of a wood, synthetic resin, metal, etc. The surface thus treated has reduced slipperiness and the luster 18 excellent in durability and cleaning resistance.

Description

Detailed Description of the Invention

[0001]

FIELD OF THE INVENTION The present invention relates to a polish composition, particularly durability on a coated surface of furniture, interior / exterior parts and interior / exterior parts of automobiles, and a surface of a base material such as wood, leather, synthetic resin and metal. The present invention relates to a glazing composition which is wash-resistant and provides a glazing effect with less slipperiness.

[0002]

2. Description of the Related Art It is well known that organosilicon compounds such as polydiorganosiloxane and polydiorganosiloxane / polyoxyalkylene copolymers give a solid surface a unique beautiful luster, and are used as a component of a polish. Came. However, these organosilicon compounds are
Since the surface to be treated becomes slippery, there is a problem that it cannot be used on the floor or stairs because it is dangerous. Therefore, it has been desired to develop a polishing agent that retains the unique luster of the organosilicon compound and does not increase the slipperiness of the surface to be treated. In order to solve this requirement, a combination of a diorganopolysiloxane oil and a silicone resin (JP-A-4-337378 and JP-A-5-32940), a polyether-modified silicone, a surfactant and a silicone oil are used. However, all of them have a drawback that the gloss durability and cleaning resistance of the surface to be treated are insufficient.

[0003]

SUMMARY OF THE INVENTION The present invention has been made in consideration of such a situation, and retains the unique polishing effect exhibited by organosilicon compounds, and suppresses the slipperiness of the surface to be treated. Moreover, it is an object to provide a polishing agent composition having improved gloss durability and cleaning resistance of the surface.

[0004]

Means for Solving the Problems As a result of intensive studies on the above problems, the present inventors have found that a reaction product obtained by reacting colloidal silica with a specific organosilicon compound in a solvent is used as a component of a polishing agent. It was found that the above problems can be solved by containing the above elements, and further studies were conducted to complete the present invention.

Accordingly, the present invention provides colloidal silica and the general formula: R-Si (R ') _x (OR ") _3-x (wherein x is 0 or 1, R is an alkyl group, a vinyl group, A phenyl group, an aminoalkyl group, an acryloxyalkyl group, a methacryloxyalkyl group, a glycidoxyalkyl group, a polyoxyalkylene group or a polyoxyalkylenealkyl group, R'is an alkyl group or a phenyl group, and R " Represents a lower alkyl group), a reaction product with at least one organosilicon compound selected from the group consisting of a hydrolyzate of the organosilicon compound and a partial condensate of the organosilicon compound. The present invention relates to a polish agent composition containing as a polish component.

The colloidal silica used in the present invention is a colloid of silicon dioxide or its hydrate obtained by subjecting silicate to dilute hydrochloric acid and then dialyzing it. 20 to 40%, sodium (soda) content as sodium oxide is 0.3 to 0.4% or less, pH 9.5 to 10.5, 25 ° C.
Viscosity of 30 cp or less, specific gravity at 20 ° C. of 1.10 to 1.40, appearance of transparent milky white, and 20 to 40% of silicic acid anhydride, soda content as sodium oxide of 0. 05% or less, pH 2
Examples thereof include those having a viscosity of 5 cp or less at 4, 25 ° C., a specific gravity of 1.10 to 1.20 at 20 ° C., and a transparent milky white appearance.

On the surface of the particles of the colloidal silica-
SiOH groups and -OH ions are present, an electric double layer is formed by alkali ions, and stabilized by repulsion between particles. The above colloidal silica is usually marketed as an aqueous dispersion, and for example, trade names such as Snowtex (manufactured by Nissan Kagaku), Ludox (manufactured by DuPont), Nalcoag (manufactured by National Aluminate), and Cytron (manufactured by Monsanto Chemical). However, the present invention is not limited to this.

The organosilicon compound used in the present invention has the general formula: R-Si (R ') _x (OR ") _3-x (wherein x is 0 or 1 and R is an alkyl group or vinyl). A group, a phenyl group, an aminoalkyl group, an acryloxyalkyl group, a methacryloxyalkyl group, a glycidoxyalkyl group, a polyoxyalkylene group or a polyoxyalkylenealkyl group, and R ′ is an alkyl group or a phenyl group, R ″ is a lower alkyl group such as a methyl group, an ethyl group or a propyl group) or a hydrolyzate or partial condensate of the compound. That is, the organosilicon compound in the present invention has two or three alkoxy groups directly bonded to a silicon atom.

Examples of the above organosilicon compound include, but are not limited to, ethyltrimethoxysilane, ethyltriethoxysilane, ethyltripropoxysilane, ethyltryptoxysilane, and the like.
Dimethyldimethoxysilane, dimethyldiethoxysilane, dimethyldipropoxysilane, dimethyldibutoxysilane, methylethyldimethoxysilane, methylethyldipropoxysilane, methyltrimethoxysilane, methyltriethoxysilane, methyltripropoxysilane,
Methyltributoxysilane, vinyltrimethoxysilane, vinyltriethoxysilane, vinyltris (β-methoxyethoxy) silane, γ-polyoxyethylenepropyltrimethoxysilane, γ-methacryloxypropyltrimethoxysilane, β- (3,4- Epoxycyclohexyl) ethyltrimethoxysilane, γ-glycidoxypropyltrimethoxysilane, γ-glycidoxypropyltriethoxysilane, N-β- (aminoethyl) -γ
-Aminopropyltrimethoxysilane, N-γ- (aminoethyl) -γ-aminopropyltriethoxysilane,
Phenyltrimethoxysilane, γ-aminopropyltriethoxysilane, γ-aminopropylmethyldiethoxysilane, γ-aminopropylethyldiethoxysilane,
γ-aminopropylethyldimethoxysilane, γ-aminopropylphenyldiethoxysilane, 2-amino-1
-Methylethyltriethoxysilane, N-methyl-γ-
Aminopropyltriethoxysilane, N-phenyl-γ
-Aminopropyltriethoxysilane, N-butyl-γ
-Aminopropylmethyldiethoxysilane, N-β-
(Aminoethyl) -γ-aminopropyltrimethoxysilane, N-β- (aminoethyl) -N-β- (aminoethyl) -γ-aminopropyltrimethoxysilane, methyltriisopropoxysilane, methyltriisobutoxysilane , Ethyltriisopropoxysilane, ethyltriisobutoxysilane, dimethyldiisopropoxysilane, dimethyldiisobutoxysilane, methylethylisopropoxysilane, methylethylisobutoxysilane.

The organosilicon compound is easily hydrolyzed in the presence of water and further reacted to form a partial condensate. These hydrolyzates and partial condensates can also be used as the organosilicon compound in the present invention. Taking ethyltrimethoxysilane as an example of the hydrolyzate, ethyltrihydroxysilane in which all three methoxy groups are hydroxy groups, two hydrolyzed ethyldihydroxymethoxysilanes, and only one hydrolyzed There may be mentioned ethylhydroxydimethoxysilane. In addition, since the rate of hydrolysis in this hydrolysis reaction varies depending on the concentration of acid or alkali, it is common to produce a mixture of hydrolysates. Examples of the partial condensate include those obtained by dehydration condensation of two molecules of the above-mentioned hydrolyzate, which may be the same or different, with each other by a hydroxy group.

Further, during the production of the polish component of the present invention,
It is preferable to use a melamine resin in combination because the durability of gloss (gloss) is further improved. Accordingly, the present invention provides colloidal silica and the general formula: R-Si (R ') _x (OR ") _3-x (wherein x is 0 or 1, R is an alkyl group, a vinyl group, a phenyl group, An aminoalkyl group, an acryloxyalkyl group, a methacryloxyalkyl group, a glycidoxyalkyl group, a polyoxyalkylene group or a polyoxyalkylenealkyl group, R'is an alkyl group or a phenyl group, and R "is a lower alkyl group. Group)), a reaction product of at least one organosilicon compound selected from the group consisting of a hydrolyzate of the organosilicon compound and a partial condensate of the organosilicon compound, and a melamine resin. A polishing agent composition containing the same.

The melamine resin in the present invention is a compound obtained by reacting the amino group of melamine with formalin to form a methylol. Further, the active group may be further blocked with alcohol or the like in order to enhance the stability in an aqueous system. It is generally commercially available as an aqueous solution of methylated methylol melamine, for example, Milben resin SM-850 (manufactured by Showa High Polymer), Beckamine MA-N (manufactured by Dainippon Ink and Chemicals), Sumitex Resin M-3 (manufactured by Sumitomo Chemical). However, it is not limited to these.

The amount of the melamine resin added is not particularly limited, but is preferably 100 solids in the polishing agent component of the present invention.
It is 0.01 to 20 parts by weight in parts by weight. The reason is that if the content exceeds 20 parts by weight, the surface to be treated after the polishing treatment becomes sticky, which is not preferable, and if it is less than 0.01 parts by weight, the effect of adding the melamine resin is insufficient. Is.

When a melamine resin is used in the production of the polish component in the present invention, it is preferable to add a buffering agent. The buffer is used for buffering the pH of the composition within a specific range and maintaining the stability of the reaction product of the colloidal silica and the organosilicon compound and the melamine resin, and is commonly used as a buffer. Is used as appropriate. The reaction product of the colloidal silica and the organosilicon compound and the melamine resin may undergo a hydrolysis reaction in an aqueous solution, which may significantly reduce the stability and performance. Therefore, it is necessary to adjust the pH of the aqueous solution to 7 or less, preferably 4 to 6 with a buffer to stabilize the reaction product of colloidal silica and an organic silicon compound and the melamine resin.
Representative examples of useful buffering agents are organic acids, inorganic acids, bases and salts thereof, preferably acetic acid, lactic acid, carbonic acid, phosphoric acid, hydrosulfuric acid, organo, mono- or polycarboxylic acid, alkaline earth metal salts. , Amine salts, ammonia, etc., or mixtures thereof. Specific compounds include acetic acid, sodium acetate, ammonium acetate, lactic acid, sodium lactate, hydrochloric acid, sodium borate and the like. The amount of buffering agent used can be varied within wide limits to achieve the above purpose, but generally it is preferably 0.01 to 5% by weight in the total composition.

In producing the polish component of the present invention, tetramethoxysilane, tetraethoxysilane, tetrabutoxysilane, tetraisopropoxysilane, tetraisobutoxysilane and the like, ethyl orthosilicate and their 3-10-mer are used. You may add a certain silicate etc.

Production of the polish component of the present invention is usually carried out in a reaction solvent, and as the solvent, water, ethanol, methanol, isopropyl alcohol, ethylene glycol monobutyl ether, acetone, ethylene glycol, propylene glycol, ethyl glycols, Butyl glycols and the like can be mentioned, but it is preferable to use water from the viewpoints of environmental problems, economical efficiency, safety and the like.

The mixing ratio of the colloidal silica and the organic silicon compound (silicic anhydride content) is not particularly limited, but is preferably 1: 100 to 1: 0.2. If the mixing ratio of the organosilicon compound to colloidal silica 1 is more than 100, the stability of the composition when water is used as the solvent is insufficient and the slipperiness becomes high, which is not preferable. In addition, 0.
When it is less than 2, gloss is deteriorated and durability is insufficient, which is not preferable.

The reaction between the colloidal silica and the organosilicon compound, or the reaction between the colloidal silica, the organosilicon compound and the melamine resin is carried out in the above reaction solvent at a temperature of 0 to 0.
It is completed within 1 to 36 hours within the range of 80 ° C. The polishing agent component thus obtained is used as it is, or the reaction mixture obtained by removing all or part of the solvent other than water as necessary is used as it is, or water or other components are further added and used.

The active ingredient (solid content) in the polish component of the present invention is not particularly limited. It is preferably 1 to 50% by weight, more preferably 5 to 25% by weight. The reason is that if the solid content is too high, the surface to be treated tends to be uneven, and if it is too low, sufficient gloss cannot be obtained, which is not preferable.

The polish composition of the present invention can be applied to the surface to be treated by a known method, for example, woven cloth, non-woven cloth, foam, hand coating with felt or brush, mechanical coating, dipping or spraying. It is usually performed by processing.
When applying, the polish composition of the present invention as it is,
Alternatively, it can be diluted with water or alcohol to an appropriate concentration before use.

The polish composition of the present invention contains an organic silicon compound such as a silicone oil or emulsion thereof and a silicone resin which are usually used, waxes, pigments, fragrances,
Preservatives, antistatic agents, cross-linking agents, anti-fog agents, viscosity modifiers, dispersion aids, surfactants, lubricants, metal powders, antioxidants, anti-UV agents and the like may be added as necessary.

[0022]

EXAMPLES The present invention will be described below based on examples, but the present invention is not limited thereto, and all embodiments utilizing the technical idea of the present invention are included in the scope of the present invention. Is. In the following examples,% means% by weight unless otherwise specified.

I. Preparation of Polishing Agent Example 1 5.0 parts by weight of colloidal silica (trade name: Snowtex-O, manufactured by Nissan Chemical Co., Ltd.), methyltriethoxysilane 5
0.0 parts by weight and 45.0 parts by weight of distilled water were placed in a glass reactor equipped with a stirrer, a reflux condenser, a thermometer, and a dropping funnel, refluxed at 70 ° C. for 4 hours to carry out a reaction, and then under reduced pressure. Then, the produced alcohol was removed, and distilled water was added to adjust the solid content to 10% to obtain a polish 1.

Examples 2 to 11 By the same experimental method as in Example 1, using colloidal silica, an organosilicon compound and distilled water in the components and blending amounts shown in Table 1, a polishing agent 2 having a solid content of 10% was prepared. To 11 were prepared.

Example 12 5.0 parts by weight of colloidal silica (trade name: Snowtex-O, manufactured by Nissan Chemical Co., Ltd.), methyltriethoxysilane 5
0.0 parts by weight and 44.0 parts by weight of distilled water were placed in a glass reactor equipped with a stirrer, a reflux condenser, a thermometer, and a dropping funnel, refluxed at 70 ° C. for 4 hours to carry out the reaction, and then under reduced pressure. Then, the produced alcohol was removed, and distilled water was further added to adjust the solid content to 35.0% to obtain a reaction solution 1. To 99.5 parts by weight of the reaction solution 1, 0.5 parts by weight of a modified melamine resin aqueous solution (trade name: milbenresin SM-850, active ingredient 80%, Showa High Polymer Co., Ltd.) was added, and 70 parts in the above reactor were added.
After refluxing for 4 hours at ℃, adjust the pH to 4.5-5.0 with concentrated hydrochloric acid.
And further diluted with distilled water to adjust the solid content to 10% to obtain a polish 12. 1.13 parts by weight of the melamine resin is contained in 100 parts by weight of the solid content in the polishing agent 12.

Examples 13 to 22 By the same experimental method as in Example 12, colloidal silica, an organosilicon compound, a melamine resin and distilled water, and a melamine resin and a buffer at the components and blending amounts shown in Table 2, were used. Polishing agents 13 to 22 having a solid content of 10% were prepared. Solid content 10 in these polishes 13 to 22
1.13 parts by weight of melamine resin is contained in 0 parts by weight.

Comparative Example A glossing agent having the following composition was prepared and designated as Comparative Example 1 (glazing agent described in JP-A-5-32940). Composition Weight% Methyl silicone resin 5.0 (trade name: K-41, manufactured by Toray Dow Corning Silicone) Dimethyl silicone oil (viscosity 1300 cst) 1.0 Nonionic surfactant 0.5 [C ₁₂ H ₂₅ O ( CH ₂ CH ₂ O) _n H (n = 6)] Diethanolamine 0.5 Propylene glycol monomethyl ether 1.0 Ethanol 3.0 Water balance

II. Evaluation test A. Evaluation of luster The surfaces of wood (lox) and vinyl chloride leather were treated with gauze impregnated with the polish of Examples 1 to 22 and Comparative Example, and dried for 12 hours. The gloss of the treated surface was visually evaluated. It was evaluated in four stages according to the following criteria. ⊚: Bright and beautiful with a deep luster ○: ◎ Beautiful luster, though slightly lower than that: △: Slightly glossy compared to the untreated surface X: Almost glossy compared to the untreated surface The evaluation results that did not exist are shown in Table 1 and Table 2. From these results, it is understood that the polishes of the present invention according to Examples 1 to 22 have the same gloss as the conventional silicone polish.

B. Evaluation of slipperiness The coefficient of static friction of the treated surface of the wood obtained in the previous section A was determined. The static friction coefficient is measured by the static friction tester (HEIDON-10
Type static friction coefficient measuring machine), the treated piece of wood is placed, and a weight of 200 g, wrapped in cloth, is placed on the piece, and 16 cm
The angle when the weight started to slide was determined by gradually inclining at a speed of / minute and calculated from the angle. The coefficient of static friction in the untreated case was 0.32. The above measurement results are shown in Table 1.
And described in Table 2. From these results, Example 1
It can be seen that the polish of the present invention according to No. 22 has a larger coefficient of static friction and is less slippery than the conventional silicone polish.

C. Durability of luster The wood pieces after the glazing treatment obtained in the item A were immersed in water for 8 hours, lightly wiped off water droplets with gauze, and then dried indoors. After repeating this operation 5 times, the gloss of the surface to be treated was evaluated according to the above criteria. The results are shown in Tables 1 and 2.
From these results, it is found that the polishes of the present invention according to Examples 1 to 22 have a smaller decrease in gloss by the above durability test than conventional silicone polishes, and are excellent in durability and wash resistance. Recognize.

[0031]

[Table 1]

[0032]

[Table 2]

[0033]

As described in detail above, the polishing composition of the present invention contains a reaction product of colloidal silica and an organosilicon compound having an alkoxy group directly bonded to a silicon atom as a polishing agent component. Furniture,
It is possible to give the same luster as the conventional silicone-based polish to the coated surfaces of interior and exterior parts of automobiles and interior and exterior parts of automobiles, and the surface of base materials such as wood, leather, synthetic resins, and metals.
In addition, the surface to be treated is less slippery and has excellent gloss durability and cleaning resistance. Further, the polishing agent composition of the present invention containing a reaction product of colloidal silica, the above-mentioned organosilicon compound and a melamine resin as a polishing agent component has further improved gloss durability and wash resistance. is there.

Claims (2)

[Claims] 1. Colloidal silica and the general formula: R—Si (R ′) _x (OR ″) _3-x (wherein x is 0 or 1 and R is an alkyl group, a vinyl group, a phenyl group or an amino group). An alkyl group, an acryloxyalkyl group, a methacryloxyalkyl group, a glycidoxyalkyl group, a polyoxyalkylene group or a polyoxyalkylenealkyl group, R'is an alkyl group or a phenyl group, and R "is a lower alkyl group. Of the organosilicon compound, a hydrolyzate of the organosilicon compound, and a reaction product of at least one organosilicon compound selected from the group consisting of partial condensates of the organosilicon compound. Polishing agent composition. 2. Colloidal silica and the general formula: R—Si (R ′) _x (OR ″) _3-x (wherein x is 0 or 1 and R is an alkyl group, a vinyl group, a phenyl group or an amino group). An alkyl group, an acryloxyalkyl group, a methacryloxyalkyl group, a glycidoxyalkyl group, a polyoxyalkylene group or a polyoxyalkylenealkyl group, R'is an alkyl group or a phenyl group, and R "is a lower alkyl group. A reaction product of at least one organosilicon compound selected from the group consisting of a hydrolyzate of the organosilicon compound and a partial condensate of the organosilicon compound with a melamine resin. A polishing agent composition formed by