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JPH0812474A - Production of carbon-sic composite material - Google Patents

Production of carbon-sic composite material

Info

Publication number
JPH0812474A
JPH0812474A JP25060292A JP25060292A JPH0812474A JP H0812474 A JPH0812474 A JP H0812474A JP 25060292 A JP25060292 A JP 25060292A JP 25060292 A JP25060292 A JP 25060292A JP H0812474 A JPH0812474 A JP H0812474A
Authority
JP
Japan
Prior art keywords
carbon
resin
base material
silicon carbide
silicon
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP25060292A
Other languages
Japanese (ja)
Inventor
Takashi Matsumoto
喬 松本
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Toyo Tanso Co Ltd
Original Assignee
Toyo Tanso Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Toyo Tanso Co Ltd filed Critical Toyo Tanso Co Ltd
Priority to JP25060292A priority Critical patent/JPH0812474A/en
Publication of JPH0812474A publication Critical patent/JPH0812474A/en
Pending legal-status Critical Current

Links

Classifications

    • CCHEMISTRY; METALLURGY
    • C04CEMENTS; CONCRETE; ARTIFICIAL STONE; CERAMICS; REFRACTORIES
    • C04BLIME, MAGNESIA; SLAG; CEMENTS; COMPOSITIONS THEREOF, e.g. MORTARS, CONCRETE OR LIKE BUILDING MATERIALS; ARTIFICIAL STONE; CERAMICS; REFRACTORIES; TREATMENT OF NATURAL STONE
    • C04B41/00After-treatment of mortars, concrete, artificial stone or ceramics; Treatment of natural stone
    • C04B41/009After-treatment of mortars, concrete, artificial stone or ceramics; Treatment of natural stone characterised by the material treated
    • CCHEMISTRY; METALLURGY
    • C04CEMENTS; CONCRETE; ARTIFICIAL STONE; CERAMICS; REFRACTORIES
    • C04BLIME, MAGNESIA; SLAG; CEMENTS; COMPOSITIONS THEREOF, e.g. MORTARS, CONCRETE OR LIKE BUILDING MATERIALS; ARTIFICIAL STONE; CERAMICS; REFRACTORIES; TREATMENT OF NATURAL STONE
    • C04B41/00After-treatment of mortars, concrete, artificial stone or ceramics; Treatment of natural stone
    • C04B41/45Coating or impregnating, e.g. injection in masonry, partial coating of green or fired ceramics, organic coating compositions for adhering together two concrete elements
    • C04B41/50Coating or impregnating, e.g. injection in masonry, partial coating of green or fired ceramics, organic coating compositions for adhering together two concrete elements with inorganic materials
    • C04B41/5053Coating or impregnating, e.g. injection in masonry, partial coating of green or fired ceramics, organic coating compositions for adhering together two concrete elements with inorganic materials non-oxide ceramics
    • C04B41/5057Carbides
    • C04B41/5059Silicon carbide
    • CCHEMISTRY; METALLURGY
    • C04CEMENTS; CONCRETE; ARTIFICIAL STONE; CERAMICS; REFRACTORIES
    • C04BLIME, MAGNESIA; SLAG; CEMENTS; COMPOSITIONS THEREOF, e.g. MORTARS, CONCRETE OR LIKE BUILDING MATERIALS; ARTIFICIAL STONE; CERAMICS; REFRACTORIES; TREATMENT OF NATURAL STONE
    • C04B41/00After-treatment of mortars, concrete, artificial stone or ceramics; Treatment of natural stone
    • C04B41/45Coating or impregnating, e.g. injection in masonry, partial coating of green or fired ceramics, organic coating compositions for adhering together two concrete elements
    • C04B41/50Coating or impregnating, e.g. injection in masonry, partial coating of green or fired ceramics, organic coating compositions for adhering together two concrete elements with inorganic materials
    • C04B41/5093Coating or impregnating, e.g. injection in masonry, partial coating of green or fired ceramics, organic coating compositions for adhering together two concrete elements with inorganic materials with elements other than metals or carbon
    • C04B41/5096Silicon

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Ceramic Engineering (AREA)
  • Materials Engineering (AREA)
  • Structural Engineering (AREA)
  • Organic Chemistry (AREA)
  • Inorganic Chemistry (AREA)
  • Sliding-Contact Bearings (AREA)
  • Ceramic Products (AREA)

Abstract

PURPOSE:To provide a new, simple and low-cost production method for the subject composite material excellent in heat resistance, non-infiltrativity and wear resistance, and also adaptable to complicated design. CONSTITUTION:A material prepared by processing a carbonaceous base material >=0.5mum in average pore radius to a product form is coated, only on specified portion(s) thereof, with a slurry prepared by mixedly suspending metallic Si powder in a resin or its solvent solution, followed by drying, curing, and baking at >=1500 deg.C.

Description

【発明の詳細な説明】Detailed Description of the Invention

【0001】[0001]

【産業上の利用分野】本発明は、炭素基材の表面の所定
部位のみが、炭素と炭化珪素が混合する複合材料に変
成、転換された複合材料の新規な製造方法に関する。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a novel method for producing a composite material in which only a predetermined portion of the surface of a carbon substrate has been transformed and converted into a composite material in which carbon and silicon carbide are mixed.

【0002】このような炭素−SiC複合材料は、耐摩
耗性が要求される摺動部材、例えば軸受、シャフト軸、
ピストンシリンダー内壁、ピストンリング、スラスト
板、バルブ摺動部構成部品、ベーン等に適用される。
Such a carbon-SiC composite material is used for sliding members such as bearings, shaft shafts, which are required to have wear resistance.
It is applied to the inner wall of piston cylinders, piston rings, thrust plates, valve sliding parts, vanes, etc.

【0003】[0003]

【従来の技術】機械用炭素製品の利用面で主なものは、
大別すると軸受け、ピストンリング、シール、及びベー
ン等であり、全て相手材料との手動接触の状態で使用さ
れるものである。したがってこれらの目的には、潤滑性
を含めた摺動性が、極めて重要な要素となる。金属材料
の場合には、手動摩擦による発熱、焼付き、動力損失等
の障害を防止するために、通常潤滑油が使用される。
2. Description of the Related Art The main uses of carbon products for machinery are:
The bearings are roughly classified into bearings, piston rings, seals, vanes, etc., all of which are used in a state of manual contact with a mating material. Therefore, slidability including lubricity is a very important factor for these purposes. In the case of a metal material, a lubricating oil is usually used in order to prevent obstacles such as heat generation, seizure, and power loss due to manual friction.

【0004】しかし、潤滑油は高温になると流出、蒸
発、分解が起こり、低温では流動性を失って凝固し、ま
た液体中で使用する場合は、液中に分散、溶解するなど
により、いずれもその機能を損失することが多い。
However, when the lubricating oil is heated to a high temperature, it flows out, evaporates and decomposes, loses fluidity at a low temperature and solidifies, and when it is used in a liquid, it is dispersed and dissolved in the liquid. It often loses its function.

【0005】更に用途によっては液体中への油分の混入
を嫌う場合もあり、あるいは機械構造上、給油の不可能
なこともある。
Further, depending on the application, there are cases where the oil content is disliked from being mixed into the liquid, or there is a case where the oil supply is impossible due to the mechanical structure.

【0006】炭素材料は、構造上C軸方向の結合力が弱
いため、結晶の六角網面の滑りによって自己潤滑性があ
り、上記のような通常の潤滑性が使えないか、あるいは
給油が困難な場合には特に好適である。
Since the carbon material has a weak binding force in the C-axis direction due to its structure, it has a self-lubricating property due to the sliding of the hexagonal mesh surface of the crystal, and the normal lubricating property as described above cannot be used, or oil supply is difficult. In this case, it is particularly suitable.

【0007】また炭素材料は、自己潤滑性に加えて耐食
性、耐熱性にも優れ、強度的に金属材料に及ばない点を
除いて、機械用材料としての要求をほとんど満足でき
る。
Further, the carbon material is excellent in corrosion resistance and heat resistance in addition to self-lubricating property, and almost satisfies the requirements as a mechanical material except that it is not as strong as a metal material.

【0008】主な特徴を要約すると次のようである。 (1)自己潤滑性があり、給油の必要が無い。 (2)熱伝導性が良好で、局部的に昇温しない。 (3)熱膨張係数が小さい。 (4)耐熱性に優れている。 (5)耐蝕性に優れている。 (6)加工が容易で、各種形状の物が製造可能である。The main features are summarized as follows. (1) It has self-lubricating properties and does not require lubrication. (2) The thermal conductivity is good and the temperature does not rise locally. (3) The coefficient of thermal expansion is small. (4) It has excellent heat resistance. (5) Excellent corrosion resistance. (6) Processing is easy, and various shapes can be manufactured.

【0009】したがって摺動材料としては、炭素材料と
セラミックス、超硬合金などと組み合わせて使用するこ
とが多い。更に近年では、炭化珪素を主成分とする焼結
体からなる硬質材料が使われるようになってきた。
Therefore, the sliding material is often used in combination with a carbon material, ceramics, cemented carbide or the like. Further, in recent years, hard materials made of a sintered body containing silicon carbide as a main component have come to be used.

【0010】これは炭化珪素質焼結体が極めて高い硬
度、優れた耐熱性及び耐食性、さらにはセラミックスと
しては異例の高い熱衝撃性を有しているからである。
This is because the silicon carbide-based sintered body has extremely high hardness, excellent heat resistance and corrosion resistance, and further has high thermal shock resistance which is unusual for ceramics.

【0011】しかしながら、一方では逆に超高硬質材料
であるために、ダイヤモンド砥石による切削でしか加工
できないため、複雑な形状の摺動材料を製造することが
難しく、また摩擦係数が大きいので、相手材の摩擦を早
めるという欠点がある。
On the other hand, on the other hand, since it is an ultra-high hardness material, it can only be processed by cutting with a diamond grindstone, making it difficult to manufacture a sliding material having a complicated shape and having a large friction coefficient. It has the drawback of accelerating the friction of the material.

【0012】優れた特性を持ちながら、上記のような欠
点がある炭化珪素質材料を複雑な形状の摺動材料として
利用し易くするために考えられた方法としては、これを
焼結体単体(バルク材)として使わずに、他の基材の表
面に被覆層として形成させて利用するコーティング法が
ある。
As a method conceived for facilitating the use of the silicon carbide material having the above-mentioned drawbacks but having the above-mentioned drawbacks as a sliding material having a complicated shape, a sintered body alone ( There is a coating method in which it is used as a coating layer on the surface of another substrate instead of being used as a bulk material.

【0013】コーティング法には、化学蒸着法と転換法
の二つがあり、いずれの方法においても基材としては一
般に炭素材料が使われる。
There are two coating methods, a chemical vapor deposition method and a conversion method. In either method, a carbon material is generally used as a base material.

【0014】化学蒸着法は、珪素化合物の熱分解と化学
反応を利用して炭化珪素を生成させ、これを炭素質基材
の表面に蒸着させる方法である。この方法は、切削加工
が容易な炭素材料が基材なので、複雑形状の摺動材料の
製造が容易であり、得られた炭化珪素質被覆層も高純度
で緻密なものではあるが、被覆層と基材との結合が弱
く、機械的または熱的な繰り返し応力の作用を受ると、
被覆層が剥離し易いという重大な欠点を持つ。
The chemical vapor deposition method is a method of producing silicon carbide by utilizing thermal decomposition and chemical reaction of a silicon compound and depositing this on the surface of a carbonaceous substrate. Since this method uses a carbon material that is easy to cut as a base material, it is easy to manufacture a sliding material having a complicated shape, and the obtained silicon carbide coating layer is highly pure and dense. When the bond between the base material and the base material is weak and subjected to the action of repeated mechanical or thermal stress,
It has a serious drawback that the coating layer is easily peeled off.

【0015】一方転換法は、二酸化珪素と炭素または珪
素との反応により生成させた一酸化珪素ガスを、炭素基
材表面の炭素と直接反応させて、炭化珪素からなる被覆
層を形成する方法であり、例えば特開平1−26496
9号に開示されている。この方法で得られた炭化珪素質
被覆層は、炭素基材との結合は強固であるが、緻密さの
点で劣るものである。
On the other hand, the conversion method is a method in which a silicon monoxide gas generated by the reaction of silicon dioxide with carbon or silicon is directly reacted with carbon on the surface of a carbon substrate to form a coating layer made of silicon carbide. Yes, for example, Japanese Patent Laid-Open No. 1-26496
No. 9 is disclosed. The silicon carbide coating layer obtained by this method has a strong bond with the carbon substrate, but is inferior in terms of denseness.

【0016】これは[化1]及び[化2]の反応によっ
て炭素原子の半分が一酸化炭素ガスになって飛散してし
まい、その結果被覆層は炭素基材とほぼ同じくらいに気
孔率が大きくなる。したがって、気密性、不浸透性が要
求される部分に使用するためには熱硬化性樹脂等を含浸
して基材の気密性を向上させる必要がある。
This is because half of the carbon atoms become carbon monoxide gas and scatter due to the reactions of [Chemical Formula 1] and [Chemical Formula 2], and as a result, the coating layer has a porosity almost equal to that of the carbon substrate. growing. Therefore, in order to use it in a portion where airtightness and impermeability are required, it is necessary to impregnate a thermosetting resin or the like to improve the airtightness of the base material.

【0017】[0017]

【化1】 Embedded image

【0018】[0018]

【化2】 Embedded image

【0019】しかし乍ら上記方法は、非常に特殊な装置
を必要とし、炭化珪素は難加工性材料であり、加工に手
間がかかり、不必要部分もコートされるため、コスト的
にも高い材料となる。そこで炭素基材のうち、炭化珪素
に転化する必要の無い部分は特殊な治具、または不活性
な粉体を用い覆いをして転化する方法が特開昭56−1
20584号または特開昭57−7880号で提案され
ている。また炭素基材の表面に溝を設け、その部分にS
iをのせて熱処理し、炭化珪素に転化させる方法も特開
昭61−136961号で提案されているが、操作が繁
雑であり、作業性も悪く、コスト的にも高くなる欠点が
あった。
However, the above method requires a very special device, silicon carbide is a difficult-to-process material, it takes time to process, and unnecessary parts are coated. Therefore, the cost is high. Becomes Therefore, there is a method in which a portion of the carbon base material that does not need to be converted to silicon carbide is covered with a special jig or an inert powder and converted.
20584 or JP-A-57-7880. Moreover, a groove is provided on the surface of the carbon base material, and S
Although a method of heat-treating i and converting it to silicon carbide is also proposed in JP-A-61-136961, it has the drawbacks of complicated operations, poor workability, and high cost.

【0020】[0020]

【発明が解決しようとする問題点】そこで本発明は、従
来の摺動材料における上記諸問題を解決し、耐熱性、不
浸透性及び耐摩耗性に優れており、製造も簡単でコスト
も低く、しかも複雑な形状にも適用できる炭素−炭化珪
素複合材料の新たな製造方法を提供しようとするもので
ある。
Therefore, the present invention solves the above-mentioned problems in conventional sliding materials, is excellent in heat resistance, impermeability and wear resistance, is easy to manufacture, and is low in cost. Moreover, it is intended to provide a new method for producing a carbon-silicon carbide composite material which can be applied to a complicated shape.

【0021】更に換言すればすでに上記で述べた通り、
炭素基材の硬度、耐摩耗性を改質するために、その表面
をより硬く、より耐摩耗性の高い炭化珪素質に転換、改
質することが行われているが、このような場合、必ずし
も炭素部材の表面全体を炭化珪素質に改質する必要はな
く、特に摩耗の激しい摺動部分のみ、即ち所定部分のみ
を選択的、部分的に改質すれば事足りることが多い。
In other words, as already mentioned above,
In order to modify the hardness and wear resistance of the carbon base material, the surface of the carbon base material is converted into silicon carbide that is harder and has higher wear resistance, and is modified. It is not always necessary to modify the entire surface of the carbon member to a silicon carbide material, and it is often sufficient to selectively and partially modify only the sliding portion with particularly heavy wear, that is, only a predetermined portion.

【0022】本発明は、上記の主旨に基づき、炭素基材
の所定部位の表面のみを選択的に極めて簡便かつ効率良
く炭化珪素質に部分的に改質、変成する新規なる手段を
提供しようとするものである。
Based on the above-mentioned gist, the present invention intends to provide a novel means for selectively reforming and modifying only the surface of a predetermined portion of a carbon base material into a silicon carbide material very easily and efficiently. To do.

【0023】[0023]

【課題を解決するための手段】本発明者は、様々な条件
を実験した結果、平均細孔半径が0.5μm以上の炭素
基材を製品形状に加工し、必要な部分にのみ珪素粉末と
樹脂、中でも造膜性が高く、一旦硬化したあとは流動性
がなく、残炭率の低い樹脂、たとえばポリアミドイミ
ド、ポリビニールアルコール、ポリアミド樹脂等より選
ばれた1以上の樹脂の溶液を混合してスラリーとし、こ
れを塗布し、乾燥、硬化、さらに1500℃以上の高温
で炭素基材と溶融珪素を反応させ、部分的に炭化珪素に
転化させることにより、従来の摺動材料の問題点をこと
ごとく解決することができ、本発明を完成したものであ
る。
Means for Solving the Problems As a result of experiments under various conditions, the present inventor processed a carbon base material having an average pore radius of 0.5 μm or more into a product shape, and formed silicon powder only in necessary portions. A resin, especially a resin having a high film-forming property, having no fluidity once cured, and having a low residual carbon rate, for example, a solution of one or more resins selected from polyamide imide, polyvinyl alcohol, polyamide resin, etc. is mixed. To form a slurry, dry it, cure it, and further react the carbon base material with molten silicon at a high temperature of 1500 ° C. or higher to partially convert it into silicon carbide. All the problems can be solved and the present invention has been completed.

【0024】[0024]

【発明の作用並びに構成】本発明を更に詳しく説明す
る。
The function and structure of the present invention will be described in more detail.

【0025】(1)製造方法自体は通常の炭素基材の製
造方法を用いて行えば良いが、ここで用いる炭素基材
は、一般黒鉛材、等方性材料等があげられる。なかでも
平均細孔半径が0.5μm以上の基材を製品形状に加工
したものを用いることが望ましい。平均細孔半径が0.
5μm未満であると、珪素と樹脂を混合したスラリーを
塗布した時に気孔に浸透しにくくなる。
(1) The manufacturing method itself may be carried out by using the usual carbon substrate manufacturing method, and the carbon substrate used here includes general graphite materials, isotropic materials and the like. Above all, it is desirable to use a base material having an average pore radius of 0.5 μm or more processed into a product shape. The average pore radius is 0.
When it is less than 5 μm, it becomes difficult for the slurry to penetrate into the pores when the slurry mixed with silicon and resin is applied.

【0026】(2)使用する樹脂は、造膜性が高く残炭
率が低い樹脂、例えば好ましくはポリアミドイミド、ポ
リビニールアルコール、ポリアミドイミド樹脂等が例示
出来、その他芳香族ポリイミド、芳香族ポリアミド、ポ
リフェニレンベンゾイミダゾール、ポリフェニレンベン
ゾビスイミダゾール、ポリチアゾール、ポリp−フェニ
レンビニレン、ポリオキサジアゾール、ポリベンゾチア
ゾール、等も使用出来る。これ等は1種又は2種以上で
使用される。特にポリアミドイミド樹脂が更に望まし
い。溶媒としてはジメチルアセトアミド、ジメチルホル
ムアミド、ジメチルスルホキサイド、Nメチル−2ピロ
リドン等の溶媒に溶解して使用する。残炭率が高い樹
脂、例えばフルフリルアルコール、、フェノール樹脂等
を使用すると、後の工程で高温熱処理を行ったときに、
炭素基材の表面に樹脂の炭化物及びそれと珪素との反応
生成物が固着して、容易に除去できなくなることがあ
り、あまり望ましくない。
(2) Examples of the resin used include resins having a high film-forming property and a low residual carbon ratio, such as polyamide imide, polyvinyl alcohol, polyamide imide resin, etc., and other aromatic polyimides, aromatic polyamides, Polyphenylenebenzimidazole, polyphenylenebenzobisimidazole, polythiazole, poly p-phenylenevinylene, polyoxadiazole, polybenzothiazole, etc. can also be used. These are used alone or in combination of two or more. Polyamide-imide resin is particularly desirable. As a solvent, it is used after being dissolved in a solvent such as dimethylacetamide, dimethylformamide, dimethylsulfoxide, N-methyl-2pyrrolidone. When a resin with a high residual carbon ratio, such as furfuryl alcohol, or a phenol resin, is used, when high-temperature heat treatment is performed in a later step,
Resin carbide and the reaction product of silicon and silicon may stick to the surface of the carbon substrate and may not be easily removed, which is not desirable.

【0027】(3)この溶液に珪素粉末を混合分散して
スラリーとする。
(3) Silicon powder is mixed and dispersed in this solution to form a slurry.

【0028】(4)このスラリーを炭素基材にはけ塗
り、スプレー等の適宜な手段で珪化を望む部分にのみ塗
布する。
(4) The slurry is applied to a carbon base material by a suitable means such as spraying or spraying, and applied only to a portion where silicidation is desired.

【0029】スラリーの溶剤部分は、一部蒸発、一部は
基材に浸透し、主として樹脂とこれに微細にくるまわれ
たSi粉から成る層が基材上に残る。
The solvent part of the slurry partially evaporates and partly penetrates into the base material, and a layer mainly composed of the resin and Si powder finely wrapped around the resin remains on the base material.

【0030】(5)この後、約300℃で2時間乾燥、
硬化する。この操作により、溶剤は蒸散し、樹脂は完全
に硬化する。
(5) After that, dry at about 300 ° C. for 2 hours,
To cure. By this operation, the solvent evaporates and the resin is completely cured.

【0031】(6)(1)〜(5)のようにして得られ
た材料を、不活性ガスによる置換等の非酸化的雰囲気
下、又は10Torr以下の真空中で高温熱処理する。
昇温速度は約800℃/hrで、約1550〜1600
℃で20分間保持する。加熱手段は特に限定されるもの
でなく、適当な手段で行えば良い。この操作によってS
i成分は溶融し樹脂の炭化層を通って、炭素基材の細孔
内に侵入し、炭素と反応してSiCとなる。
(6) The material obtained as described in (1) to (5) is subjected to high temperature heat treatment in a non-oxidizing atmosphere such as substitution with an inert gas or in a vacuum of 10 Torr or less.
The heating rate is about 800 ° C / hr, about 1550 to 1600
Hold at 20 ° C for 20 minutes. The heating means is not particularly limited, and any suitable means may be used. This operation causes S
The i component melts and penetrates into the pores of the carbon substrate through the carbonized layer of the resin and reacts with carbon to become SiC.

【0032】(7)こうして得られた炭素−SiC複合
材料は、Siと樹脂の炭化物が基材の表層に若干残存、
付着している場合には、これを取り除く。
(7) In the carbon-SiC composite material thus obtained, some carbides of Si and resin remain on the surface layer of the base material,
If it is attached, remove it.

【0033】本発明方法による場合、炭素基材(細孔半
径)、Si粉(粒度)、樹脂の選択等の相乗効果によっ
て、炭素基材の珪化加工後に表面に残る残渣物は非常に
少なく、かつ軟質であるので、これを容易に取り除くこ
とができ、用途に応じた表面の精密加工を直ちに施すこ
とができる。このことも大きな特徴の一つである。
According to the method of the present invention, due to the synergistic effect of the carbon base material (pore radius), Si powder (particle size), selection of resin, etc., very little residue remains on the surface after silicidation of the carbon base material, Moreover, since it is soft, it can be easily removed, and the surface can be precisely processed according to the intended use. This is also one of the major characteristics.

【0034】(8)炭素基材の珪化された部分の厚さは
通常0.5〜3.5mmであり、この層の厚さは(樹脂+S
i粉)混合物の塗布量の増減によって調節できる。
(8) The thickness of the silicified portion of the carbon substrate is usually 0.5 to 3.5 mm, and the thickness of this layer is (resin + S).
i powder) It can be adjusted by increasing or decreasing the coating amount of the mixture.

【0035】(9)このような方法で得られた、珪化さ
れた層の面分析写真の結果を図1に示す。これは炭素質
の部分(黒色)とSiC質の部分(灰色)との面積積算
値の比率から、それ等両成分の比率を求める方法である
が、若干条件を変えて調製した試料では、C/SiC比
率は70/30〜30/70の範囲であり、平均して炭
素基材の表層部分の約50%が炭化珪素質に改質されて
いることが判る。但し熱処理部分は炭素質100%のま
まであることは勿論である。
(9) The result of the surface analysis photograph of the silicified layer obtained by the above method is shown in FIG. This is a method of obtaining the ratio of both of these components from the ratio of the area integrated values of the carbonaceous part (black) and the SiCaceous part (gray), but in the sample prepared by slightly changing the conditions, C The / SiC ratio is in the range of 70/30 to 30/70, and it can be seen that, on average, about 50% of the surface layer portion of the carbon base material has been modified into silicon carbide. However, it goes without saying that the heat-treated portion remains 100% carbonaceous.

【0036】[0036]

【実施例】以下に本発明を実施例で示す。EXAMPLES The present invention will be described below with reference to examples.

【0037】[0037]

【実施例1】嵩密度が1.77、平均細孔半径が1.8μ
mの等方性黒鉛材料(東洋炭素(株)製グレード名「Si
C−12」)をφ52.5/φ42.5に加工し、一方ポ
リアミドイミド樹脂(「Al−10」、小原化工製)を
Nメチル−2ピロリドンに溶解し、20%溶液とした。
この溶液に珪素粉末(和光純薬工業製:粒度30〜50
μ)60重量部を混合しスラリーとした。
Example 1 Bulk density 1.77, average pore radius 1.8 μ
m isotropic graphite material (made by Toyo Tanso Co., Ltd. grade name "Si
C-12 ″) was processed to φ52.5 / φ42.5, while polyamideimide resin (“Al-10”, manufactured by Ohara Kako) was dissolved in N-methyl-2pyrrolidone to give a 20% solution.
Silicon powder (made by Wako Pure Chemical Industries: particle size 30 to 50) was added to this solution.
μ) 60 parts by weight were mixed to form a slurry.

【0038】このスラリーを基材の内周部分に約3mm厚
さで塗布した後、乾燥機中300℃で硬化した。
This slurry was applied to the inner peripheral portion of the base material in a thickness of about 3 mm and then cured at 300 ° C. in a dryer.

【0039】更に真空炉にて1600℃まで昇温、30
分保持した後、冷却し取りだした。製品は塗布した部分
よりSiが溶融、基材に浸透し黒鉛と反応し、SiC化
しており、表面より2.5mmの深さまでSiC層が形成
されていた。このものの定性分析結果を以下に示す。
Further, the temperature was raised to 1600 ° C. in a vacuum furnace, and 30
After holding for a minute, it was cooled and taken out. In the product, Si was melted from the applied portion, penetrated into the base material, reacted with graphite and turned into SiC, and the SiC layer was formed to a depth of 2.5 mm from the surface. The qualitative analysis results of this product are shown below.

【0040】1 定性分析(面分析) (1)前処理 資料をMMA(メチルメタアクリレート)にて包埋後研
磨し、次いで研磨表面にC蒸着を施した。
1 Qualitative Analysis (Area Analysis) (1) Pretreatment The material was embedded in MMA (methyl methacrylate) and then polished, and then C vapor deposition was performed on the polished surface.

【0041】(2)測定条件 加速電圧 20KV 試料電流 0.6nA 測定時間 200sec 使用装置 EMAX−2700(堀場製)(2) Measurement conditions Acceleration voltage 20 KV Sample current 0.6 nA Measurement time 200 sec Equipment used EMAX-2700 (manufactured by Horiba)

【0042】(3)結果 Siの面分析写真を図1に示す。(3) Results FIG. 1 shows a surface analysis photograph of Si.

【0043】2 面積比率 (1)結果 表1に示す。2 Area Ratio (1) Results Table 1 shows.

【0044】[0044]

【表1】 [Table 1]

【0045】[0045]

【実施例2】嵩密度1.70g/cm2、平均細孔半径1.5
μmの等方性黒鉛材料(東洋炭素(株)製、「ISEM−
1」グレード名)を用い、以下製造方法は実施例1と同
様にして、SiC層を2.0mm形成させた。ただし使用
樹脂はポリアミド(小原化工(株)製)をN−メチルピロ
リドン20%溶液にして用いた。
Example 2 Bulk density 1.70 g / cm 2 , average pore radius 1.5
μm isotropic graphite material (manufactured by Toyo Tanso Co., Ltd., “ISEM-
1 "grade name) and the manufacturing method was the same as in Example 1 to form a SiC layer of 2.0 mm. However, the resin used was polyamide (Ohara Kako Co., Ltd.) in a 20% N-methylpyrrolidone solution.

【0046】[0046]

【実施例3】嵩密度1.85g/cm2、平均細孔半径0.8
μmの等方性黒鉛材料(東洋炭素(株)製「ISO−5
0」、グレード名)に、SiC層を1.0mm部分的に形
成させた。
Example 3 Bulk density 1.85 g / cm 2 , average pore radius 0.8
μm isotropic graphite material (“ISO-5” manufactured by Toyo Tanso Co., Ltd.)
0 ", grade name), a SiC layer was partially formed by 1.0 mm.

【0047】ただし、使用樹脂はポリビニールアルコー
ル20%水溶液にして用いた。
However, the resin used was a 20% aqueous solution of polyvinyl alcohol.

【0048】[0048]

【実施例4】嵩密度1.86g/cm2、平均細孔半径0.2
5μmの等方性黒鉛材料(東洋炭素(株)製「ISO−8
6」グレード名)を用いて、同様にSiC層を0.2mm
形成した。
Example 4 Bulk density 1.86 g / cm 2 , average pore radius 0.2
5 μm isotropic graphite material (“ISO-8” manufactured by Toyo Tanso Co., Ltd.)
6 "grade name) and similarly, the SiC layer is 0.2 mm
Formed.

【0049】ただし使用樹脂は実施例1と同じくポリア
ミドイミド樹脂の20%溶液として用いた。
However, the resin used was a 20% solution of the polyamide-imide resin as in Example 1.

【0050】[0050]

【比較例1】嵩密度1.90g/cm2、平均細孔半径0.2
μmの等方性黒鉛材料(東洋炭素(株)製「ISO−8
8」グレード名)を用いて前記実施例1と同様の製造方
法にて珪化処理を行った。炭素珪素の珪化層が認められ
なかった。
[Comparative Example 1] Bulk density 1.90 g / cm 2 , average pore radius 0.2
μm isotropic graphite material (“ISO-8” manufactured by Toyo Tanso Co., Ltd.)
8 ”grade name) was used for silicidation by the same manufacturing method as in Example 1. No silicon silicon carbon layer was observed.

【0051】[0051]

【比較例2】嵩密度1.70g/cm2、平均細孔半径1.5
μmの等方性黒鉛材料(東洋炭素(株)「ISEM−1」
グレード名)を用い、液状フェノール樹脂(住友デュレ
ズ(株)製「PQ−50273」)と珪素粉末を混合しス
ラリー状として、塗布、以下前記比較例1の製造方法に
て珪化した。処理後、塗布部に硬い固着物(珪素−ガラ
ス状炭化物)が付着し、それを取り除くのが困難であっ
た。又珪化処理部の表層にクラックが発生していて、良
好な炭化珪素の層が形成されていなかった。実施例1〜
4及び比較例1〜2の複合材料の物性を表2に示す。
[Comparative Example 2] Bulk density 1.70 g / cm 2 , average pore radius 1.5
μm isotropic graphite material (Toyo Tanso Co., Ltd. “ISEM-1”)
A liquid phenol resin (“PQ-50273” manufactured by Sumitomo Durez Co., Ltd.) and silicon powder were mixed using a grade name) to form a slurry, which was applied and then silicified by the production method of Comparative Example 1 described above. After the treatment, a hard adhered substance (silicon-glassy carbide) adhered to the coated part, and it was difficult to remove it. Further, cracks were generated in the surface layer of the silicidation portion, and a good silicon carbide layer was not formed. Example 1
Table 2 shows the physical properties of the composite materials of No. 4 and Comparative Examples 1 and 2.

【0052】[0052]

【表2】 [Table 2]

【0053】[0053]

【発明の効果】炭素材の特定部位の表面のみを選択的に
珪化する簡便かつ経済的な新しい方法を見出した。
EFFECTS OF THE INVENTION A simple and economical new method for selectively silicifying only the surface of a specific portion of a carbon material has been found.

【0054】この方法によって得られた材料は摺動部材
として好適である。
The material obtained by this method is suitable as a sliding member.

【0055】[0055]

【図面の簡単な説明】[Brief description of drawings]

【0056】[0056]

【図1】[Figure 1]

【0057】面分析写真Surface analysis photograph

─────────────────────────────────────────────────────
─────────────────────────────────────────────────── ───

【手続補正書】[Procedure amendment]

【提出日】平成5年4月13日[Submission date] April 13, 1993

【手続補正1】[Procedure Amendment 1]

【補正対象書類名】図面[Document name to be corrected] Drawing

【補正対象項目名】図1[Name of item to be corrected] Figure 1

【補正方法】変更[Correction method] Change

【補正内容】[Correction content]

【図1】 ─────────────────────────────────────────────────────
FIG. ─────────────────────────────────────────────────── ───

【手続補正書】[Procedure amendment]

【提出日】平成5年11月25日[Submission date] November 25, 1993

【手続補正1】[Procedure Amendment 1]

【補正対象書類名】明細書[Document name to be amended] Statement

【補正対象項目名】0035[Correction target item name] 0035

【補正方法】変更[Correction method] Change

【補正内容】[Correction content]

【0035】(9)このような方法で得られた、珪化さ
れた層の面分析写真の結果を図1に示す。これは炭素質
の部分(斜線の部分)とSiC質の部分(白い部分)と
の面積積算値の比率から、それ等両成分の比率を求める
方法であるが、若干条件を変えて調製した試料では、C
/SiC比率は70/30〜30/70の範囲であり、
平均して炭素基材の表層部分の約50%が炭化珪素質に
改質されていることが判る。但し熱処理部分は炭素質1
00%のままであることは勿論である。
(9) The result of the surface analysis photograph of the silicified layer obtained by the above method is shown in FIG. This is a method of obtaining the ratio of both of these components from the ratio of the area integrated values of the carbonaceous part ( shaded part ) and the SiC part ( white part ), but the sample prepared by slightly changing the conditions Then C
/ SiC ratio is in the range of 70/30 to 30/70,
It can be seen that, on average, about 50% of the surface layer portion of the carbon base material has been modified into silicon carbide. However, the heat treated part is carbonaceous 1
Needless to say, it remains 00%.

【手続補正2】[Procedure Amendment 2]

【補正対象書類名】図面[Document name to be corrected] Drawing

【補正対象項目名】図1[Name of item to be corrected] Figure 1

【補正方法】変更[Correction method] Change

【補正内容】[Correction content]

【図1】 ─────────────────────────────────────────────────────
FIG. ─────────────────────────────────────────────────── ───

【手続補正書】[Procedure amendment]

【提出日】平成7年2月23日[Submission date] February 23, 1995

【手続補正1】[Procedure Amendment 1]

【補正対象書類名】明細書[Document name to be amended] Statement

【補正対象項目名】発明の詳細な説明[Name of item to be amended] Detailed explanation of the invention

【補正方法】変更[Correction method] Change

【補正内容】[Correction content]

【発明の詳細な説明】Detailed Description of the Invention

【0001】[0001]

【産業上の利用分野】本発明は、炭素基材の表面の所定
部位のみが、炭素と炭化珪素が混合する複合材料に変
成、転換された複合材料の新規な製造方法に関する。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a novel method for producing a composite material in which only a predetermined portion of the surface of a carbon substrate has been transformed and converted into a composite material in which carbon and silicon carbide are mixed.

【0002】このような炭素−SiC複合材料は、耐摩
耗性が要求される摺動部材、例えば軸受、シャフト軸、
ピストンシリンダー内壁、ピストンリング、スラスト
板、バルブ摺動部構成部品、ベーン等に適用される。
Such a carbon-SiC composite material is used for sliding members such as bearings, shaft shafts, which are required to have wear resistance.
It is applied to the inner wall of piston cylinders, piston rings, thrust plates, valve sliding parts, vanes, etc.

【0003】[0003]

【従来の技術】機械用炭素製品の利用面で主なものは、
大別すると軸受け、ピストンリング、シール、及びベー
ン等であり、全て相手材料との手動接触の状態で使用さ
れるものである。したがってこれらの目的には、潤滑性
を含めた摺動性が、極めて重要な要素となる。金属材料
の場合には、手動摩擦による発熱、焼付き、動力損失等
の障害を防止するために、通常潤滑油が使用される。
2. Description of the Related Art The main uses of carbon products for machinery are:
The bearings are roughly classified into bearings, piston rings, seals, vanes, etc., all of which are used in a state of manual contact with a mating material. Therefore, slidability including lubricity is a very important factor for these purposes. In the case of a metal material, a lubricating oil is usually used in order to prevent obstacles such as heat generation, seizure, and power loss due to manual friction.

【0004】しかし、潤滑油は高温になると流出、蒸
発、分解が起こり、低温では流動性を失って凝固し、ま
た液体中で使用する場合は、液中に分散、溶解するなど
により、いずれもその機能を損失することが多い。
However, when the lubricating oil is heated to a high temperature, it flows out, evaporates and decomposes, loses fluidity at a low temperature and solidifies, and when it is used in a liquid, it is dispersed and dissolved in the liquid. It often loses its function.

【0005】更に用途によっては液体中への油分の混入
を嫌う場合もあり、あるいは機械構造上、給油の不可能
なこともある。
Further, depending on the application, there are cases where the oil content is disliked from being mixed into the liquid, or there is a case where the oil supply is impossible due to the mechanical structure.

【0006】炭素材料は、構造上C軸方向の結合力が弱
いため、結晶の六角網面の滑りによって自己潤滑性があ
り、上記のような通常の潤滑性が使えないか、あるいは
給油が困難な場合には特に好適である。
Since the carbon material has a weak binding force in the C-axis direction due to its structure, it has a self-lubricating property due to the sliding of the hexagonal mesh surface of the crystal, and the normal lubricating property as described above cannot be used, or oil supply is difficult. In this case, it is particularly suitable.

【0007】また炭素材料は、自己潤滑性に加えて耐食
性、耐熱性にも優れ、強度的に金属材料に及ばない点を
除いて、機械用材料としての要求をほとんど満足でき
る。
Further, the carbon material is excellent in corrosion resistance and heat resistance in addition to self-lubricating property, and almost satisfies the requirements as a mechanical material except that it is not as strong as a metal material.

【0008】主な特徴を要約すると次のようである。 (1)自己潤滑性があり、給油の必要が無い。 (2)熱伝導性が良好で、局部的に昇温しない。 (3)熱膨張係数が小さい。 (4)耐熱性に優れている。 (5)耐蝕性に優れている。 (6)加工が容易で、各種形状の物が製造可能である。The main features are summarized as follows. (1) It has self-lubricating properties and does not require lubrication. (2) The thermal conductivity is good and the temperature does not rise locally. (3) The coefficient of thermal expansion is small. (4) It has excellent heat resistance. (5) Excellent corrosion resistance. (6) Processing is easy, and various shapes can be manufactured.

【0009】したがって摺動材料としては、炭素材料と
セラミックス、超硬合金などと組み合わせて使用するこ
とが多い。更に近年では、炭化珪素を主成分とする焼結
体からなる硬質材料が使われるようになってきた。
Therefore, the sliding material is often used in combination with a carbon material, ceramics, cemented carbide or the like. Further, in recent years, hard materials made of a sintered body containing silicon carbide as a main component have come to be used.

【0010】これは炭化珪素質焼結体が極めて高い硬
度、優れた耐熱性及び耐食性、さらにはセラミックスと
しては異例の高い熱衝撃性を有しているからである。
This is because the silicon carbide-based sintered body has extremely high hardness, excellent heat resistance and corrosion resistance, and further has high thermal shock resistance which is unusual for ceramics.

【0011】しかしながら、一方では逆に超高硬質材料
であるために、ダイヤモンド砥石による切削でしか加工
できないため、複雑な形状の摺動材料を製造することが
難しく、また摩擦係数が大きいので、相手材の摩擦を早
めるという欠点がある。
On the other hand, on the other hand, since it is an ultra-high hardness material, it can only be processed by cutting with a diamond grindstone, making it difficult to manufacture a sliding material having a complicated shape and having a large friction coefficient. It has the drawback of accelerating the friction of the material.

【0012】優れた特性を持ちながら、上記のような欠
点がある炭化珪素質材料を複雑な形状の摺動材料として
利用し易くするために考えられた方法としては、これを
焼結体単体(バルク材)として使わずに、他の基材の表
面に被覆層として形成させて利用するコーティング法が
ある。
As a method conceived for facilitating the use of the silicon carbide material having the above-mentioned drawbacks but having the above-mentioned drawbacks as a sliding material having a complicated shape, a sintered body alone ( There is a coating method in which it is used as a coating layer on the surface of another substrate instead of being used as a bulk material.

【0013】コーティング法には、化学蒸着法と転換法
の二つがあり、いずれの方法においても基材としては一
般に炭素材料が使われる。
There are two coating methods, a chemical vapor deposition method and a conversion method. In either method, a carbon material is generally used as a base material.

【0014】化学蒸着法は、珪素化合物の熱分解と化学
反応を利用して炭化珪素を生成させ、これを炭素質基材
の表面に蒸着させる方法である。この方法は、切削加工
が容易な炭素材料が基材なので、複雑形状の摺動材料の
製造が容易であり、得られた炭化珪素質被覆層も高純度
で緻密なものではあるが、被覆層と基材との結合が弱
く、機械的または熱的な繰り返し応力の作用を受ると、
被覆層が剥離し易いという重大な欠点を持つ。
The chemical vapor deposition method is a method of producing silicon carbide by utilizing thermal decomposition and chemical reaction of a silicon compound and depositing this on the surface of a carbonaceous substrate. Since this method uses a carbon material that is easy to cut as a base material, it is easy to manufacture a sliding material having a complicated shape, and the obtained silicon carbide coating layer is highly pure and dense. When the bond between the base material and the base material is weak and subjected to the action of repeated mechanical or thermal stress,
It has a serious drawback that the coating layer is easily peeled off.

【0015】一方転換法は、二酸化珪素と炭素または珪
素との反応により生成させた一酸化珪素ガスを、炭素基
材表面の炭素と直接反応させて、炭化珪素からなる被覆
層を形成する方法であり、例えば特開平1−26496
9号に開示されている。この方法で得られた炭化珪素質
被覆層は、炭素基材との結合は強固であるが、緻密さの
点で劣るものである。
On the other hand, the conversion method is a method in which a silicon monoxide gas generated by the reaction of silicon dioxide with carbon or silicon is directly reacted with carbon on the surface of a carbon substrate to form a coating layer made of silicon carbide. Yes, for example, Japanese Patent Laid-Open No. 1-26496
No. 9 is disclosed. The silicon carbide coating layer obtained by this method has a strong bond with the carbon substrate, but is inferior in terms of denseness.

【0016】これは[化1]及び[化2]の反応によっ
て炭素原子の半分が一酸化炭素ガスになって飛散してし
まい、その結果被覆層は炭素基材とほぼ同じくらいに気
孔率が大きくなる。したがって、気密性、不浸透性が要
求される部分に使用するためには熱硬化性樹脂等を含浸
して基材の気密性を向上させる必要がある。
This is because half of the carbon atoms become carbon monoxide gas and scatter due to the reactions of [Chemical Formula 1] and [Chemical Formula 2], and as a result, the coating layer has a porosity almost equal to that of the carbon substrate. growing. Therefore, in order to use it in a portion where airtightness and impermeability are required, it is necessary to impregnate a thermosetting resin or the like to improve the airtightness of the base material.

【0017】[0017]

【化1】 Embedded image

【0018】[0018]

【化2】 Embedded image

【0019】しかし乍ら上記方法は、非常に特殊な装置
を必要とし、炭化珪素は難加工性材料であり、加工に手
間がかかり、不必要部分もコートされるため、コスト的
にも高い材料となる。そこで炭素基材のうち、炭化珪素
に転化する必要の無い部分は特殊な治具、または不活性
な粉体を用い覆いをして転化する方法が特開昭56−1
20584号または特開昭57−7880号で提案され
ている。また炭素基材の表面に溝を設け、その部分にS
iをのせて熱処理し、炭化珪素に転化させる方法も特開
昭61−136961号で提案されているが、操作が繁
雑であり、作業性も悪く、コスト的にも高くなる欠点が
あった。
However, the above method requires a very special device, silicon carbide is a difficult-to-process material, it takes time to process, and unnecessary parts are coated. Therefore, the cost is high. Becomes Therefore, there is a method in which a portion of the carbon base material that does not need to be converted to silicon carbide is covered with a special jig or an inert powder and converted.
20584 or JP-A-57-7880. Moreover, a groove is provided on the surface of the carbon base material, and S
Although a method of heat-treating i and converting it to silicon carbide is also proposed in JP-A-61-136961, it has the drawbacks of complicated operations, poor workability, and high cost.

【0020】[0020]

【発明が解決しようとする問題点】そこで本発明は、従
来の摺動材料における上記諸問題を解決し、耐熱性、不
浸透性及び耐摩耗性に優れており、製造も簡単でコスト
も低く、しかも複雑な形状にも適用できる炭素−炭化珪
素複合材料の新たな製造方法を提供しようとするもので
ある。
Therefore, the present invention solves the above-mentioned problems in conventional sliding materials, is excellent in heat resistance, impermeability and wear resistance, is easy to manufacture, and is low in cost. Moreover, it is intended to provide a new method for producing a carbon-silicon carbide composite material which can be applied to a complicated shape.

【0021】更に換言すればすでに上記で述べた通り、
炭素基材の硬度、耐摩耗性を改質するために、その表面
をより硬く、より耐摩耗性の高い炭化珪素質に転換、改
質することが行われているが、このような場合、必ずし
も炭素部材の表面全体を炭化珪素質に改質する必要はな
く、特に摩耗の激しい摺動部分のみ、即ち所定部分のみ
を選択的、部分的に改質すれば事足りることが多い。
In other words, as already mentioned above,
In order to modify the hardness and wear resistance of the carbon base material, the surface of the carbon base material is converted into silicon carbide that is harder and has higher wear resistance, and is modified. It is not always necessary to modify the entire surface of the carbon member to a silicon carbide material, and it is often sufficient to selectively and partially modify only the sliding portion with particularly heavy wear, that is, only a predetermined portion.

【0022】本発明は、上記の主旨に基づき、炭素基材
の所定部位の表面のみを選択的に極めて簡便かつ効率良
く炭化珪素質に部分的に改質、変成する新規なる手段を
提供しようとするものである。
Based on the above-mentioned gist, the present invention intends to provide a novel means for selectively reforming and modifying only the surface of a predetermined portion of a carbon base material into a silicon carbide material very easily and efficiently. To do.

【0023】[0023]

【課題を解決するための手段】本発明者は、様々な条件
を実験した結果、平均細孔半径が0.5μm以上の炭素
基材を製品形状に加工し、必要な部分にのみ珪素粉末と
樹脂、中でも造膜性が高く、一旦硬化したあとは流動性
がなく、残炭率の低い樹脂、たとえばポリアミドイミ
ド、ポリビニールアルコール、ポリアミド樹脂等より選
ばれた1以上の樹脂の溶液を混合してスラリーとし、こ
れを塗布し、乾燥、硬化、さらに1500℃以上の高温
で炭素基材と溶融珪素を反応させ、部分的に炭化珪素に
転化させることにより、従来の摺動材料の問題点をこと
ごとく解決することができ、本発明を完成したものであ
る。
Means for Solving the Problems As a result of experiments under various conditions, the present inventor processed a carbon base material having an average pore radius of 0.5 μm or more into a product shape, and formed silicon powder only in necessary portions. A resin, especially a resin having a high film-forming property, having no fluidity once cured, and having a low residual carbon rate, for example, a solution of one or more resins selected from polyamide imide, polyvinyl alcohol, polyamide resin, etc. is mixed. To form a slurry, dry it, cure it, and further react the carbon base material with molten silicon at a high temperature of 1500 ° C. or higher to partially convert it into silicon carbide. All the problems can be solved and the present invention has been completed.

【0024】[0024]

【発明の作用並びに構成】本発明を更に詳しく説明す
る。
The function and structure of the present invention will be described in more detail.

【0025】(1)製造方法自体は通常の炭素基材の製
造方法を用いて行えば良いが、ここで用いる炭素基材
は、一般黒鉛材、等方性材料等があげられる。なかでも
平均細孔半径が0.5μm以上の基材を製品形状に加工
したものを用いることが望ましい。平均細孔半径が0.
5μm未満であると、珪素と樹脂を混合したスラリーを
塗布した時に気孔に浸透しにくくなる。
(1) The manufacturing method itself may be carried out by using the usual carbon substrate manufacturing method, and the carbon substrate used here includes general graphite materials, isotropic materials and the like. Above all, it is desirable to use a base material having an average pore radius of 0.5 μm or more processed into a product shape. The average pore radius is 0.
When it is less than 5 μm, it becomes difficult for the slurry to penetrate into the pores when the slurry mixed with silicon and resin is applied.

【0026】(2)使用する樹脂は、造膜性が高く残炭
率が低い樹脂、例えば好ましくはポリアミドイミド、ポ
リビニールアルコール、ポリアミドイミド樹脂等が例示
出来、その他芳香族ポリイミド、芳香族ポリアミド、ポ
リフェニレンベンゾイミダゾール、ポリフェニレンベン
ゾビスイミダゾール、ポリチアゾール、ポリp−フェニ
レンビニレン、ポリオキサジアゾール、ポリベンゾチア
ゾール、等も使用出来る。これ等は1種又は2種以上で
使用される。特にポリアミドイミド樹脂が更に望まし
い。溶媒としてはジメチルアセトアミド、ジメチルホル
ムアミド、ジメチルスルホキサイド、Nメチル−2ピロ
リドン等の溶媒に溶解して使用する。残炭率が高い樹
脂、例えばフルフリルアルコール、、フェノール樹脂等
を使用すると、後の工程で高温熱処理を行ったときに、
炭素基材の表面に樹脂の炭化物及びそれと珪素との反応
生成物が固着して、容易に除去できなくなることがあ
り、あまり望ましくない。
(2) Examples of the resin used include resins having a high film-forming property and a low residual carbon ratio, such as polyamide imide, polyvinyl alcohol, polyamide imide resin, etc., and other aromatic polyimides, aromatic polyamides, Polyphenylenebenzimidazole, polyphenylenebenzobisimidazole, polythiazole, poly p-phenylenevinylene, polyoxadiazole, polybenzothiazole, etc. can also be used. These are used alone or in combination of two or more. Polyamide-imide resin is particularly desirable. As a solvent, it is used after being dissolved in a solvent such as dimethylacetamide, dimethylformamide, dimethylsulfoxide, N-methyl-2pyrrolidone. When a resin with a high residual carbon ratio, such as furfuryl alcohol, or a phenol resin, is used, when high-temperature heat treatment is performed in a later step,
Resin carbide and the reaction product of silicon and silicon may stick to the surface of the carbon substrate and may not be easily removed, which is not desirable.

【0027】(3)この溶液に珪素粉末を混合分散して
スラリーとする。
(3) Silicon powder is mixed and dispersed in this solution to form a slurry.

【0028】(4)このスラリーを炭素基材にはけ塗
り、スプレー等の適宜な手段で珪化を望む部分にのみ塗
布する。
(4) The slurry is applied to a carbon base material by a suitable means such as spraying or spraying, and applied only to a portion where silicidation is desired.

【0029】スラリーの溶剤部分は、一部蒸発、一部は
基材に浸透し、主として樹脂とこれに微細にくるまわれ
たSi粉から成る層が基材上に残る。
The solvent part of the slurry partially evaporates and partly penetrates into the base material, and a layer mainly composed of the resin and Si powder finely wrapped around the resin remains on the base material.

【0030】(5)この後、約300℃で2時間乾燥、
硬化する。この操作により、溶剤は蒸散し、樹脂は完全
に硬化する。
(5) After that, dry at about 300 ° C. for 2 hours,
To cure. By this operation, the solvent evaporates and the resin is completely cured.

【0031】(6)(1)〜(5)のようにして得られ
た材料を、不活性ガスによる置換等の非酸化的雰囲気
下、又は10Torr以下の真空中で高温熱処理する。
昇温速度は約800℃/hrで、約1550〜1600
℃で20分間保持する。加熱手段は特に限定されるもの
でなく、適当な手段で行えば良い。この操作によってS
i成分は溶融し樹脂の炭化層を通って、炭素基材の細孔
内に侵入し、炭素と反応してSiCとなる。
(6) The material obtained as described in (1) to (5) is subjected to high temperature heat treatment in a non-oxidizing atmosphere such as substitution with an inert gas or in a vacuum of 10 Torr or less.
The heating rate is about 800 ° C / hr, about 1550 to 1600
Hold at 20 ° C for 20 minutes. The heating means is not particularly limited, and any suitable means may be used. This operation causes S
The i component melts and penetrates into the pores of the carbon substrate through the carbonized layer of the resin and reacts with carbon to become SiC.

【0032】(7)こうして得られた炭素−SiC複合
材料は、Siと樹脂の炭化物が基材の表層に若干残存、
付着している場合には、これを取り除く。
(7) In the carbon-SiC composite material thus obtained, some carbides of Si and resin remain on the surface layer of the base material,
If it is attached, remove it.

【0033】本発明方法による場合、炭素基材(細孔半
径)、Si粉(粒度)、樹脂の選択等の相乗効果によっ
て、炭素基材の珪化加工後に表面に残る残渣物は非常に
少なく、かつ軟質であるので、これを容易に取り除くこ
とができ、用途に応じた表面の精密加工を直ちに施すこ
とができる。このことも大きな特徴の一つである。
According to the method of the present invention, due to the synergistic effect of the carbon base material (pore radius), Si powder (particle size), selection of resin, etc., very little residue remains on the surface after silicidation of the carbon base material, Moreover, since it is soft, it can be easily removed, and the surface can be precisely processed according to the intended use. This is also one of the major characteristics.

【0034】(8)炭素基材の珪化された部分の厚さは
通常0.5〜3.5mmであり、この層の厚さは(樹脂
+Si粉)混合物の塗布量の増減によって調節できる。
(8) The thickness of the silicified portion of the carbon substrate is usually 0.5 to 3.5 mm, and the thickness of this layer can be adjusted by increasing or decreasing the coating amount of the (resin + Si powder) mixture.

【0035】(9)このような方法で得られた、珪化さ
れた層の面分析写真の結果を図1に示す。これは炭素質
の部分(斜線の部分)とSiC質の部分(白い部分)と
の面積積算値の比率から、それ等両成分の比率を求める
方法であるが、若干条件を変えて調製した試料では、C
/SiC比率は70/30〜30/70の範囲であり、
平均して炭素基材の表層部分の約50%が炭化珪素質に
改質されていることが判る。但し熱処理部分は炭素質1
00%のままであることは勿論である。
(9) The result of the surface analysis photograph of the silicified layer obtained by the above method is shown in FIG. This is a method of obtaining the ratio of both of these components from the ratio of the area integrated values of the carbonaceous part ( shaded part ) and the SiC part ( white part ), but the sample prepared by slightly changing the conditions Then C
/ SiC ratio is in the range of 70/30 to 30/70,
It can be seen that, on average, about 50% of the surface layer portion of the carbon base material has been modified into silicon carbide. However, the heat treated part is carbonaceous 1
Needless to say, it remains 00%.

【0036】[0036]

【実施例】以下に本発明を実施例で示す。EXAMPLES The present invention will be described below with reference to examples.

【0037】[0037]

【実施例1】嵩密度が1.77、平均細孔半径が1.8
μmの等方性黒鉛材料(東洋炭素(株)製グレード名
「SiC−12」)をφ52.5/φ42.5に加工
し、一方ポリアミドイミド樹脂(「Al−10」、小原
化工製)をNメチル−2ピロリドンに溶解し、20%溶
液とした。この溶液に珪素粉末(和光純薬工業製:粒度
30〜50μ)60重量部を混合しスラリーとした。
Example 1 Bulk density is 1.77 and average pore radius is 1.8.
A μm isotropic graphite material (grade name “SiC-12” manufactured by Toyo Tanso Co., Ltd.) was processed into φ52.5 / φ42.5, while polyamideimide resin (“Al-10”, manufactured by Ohara Kako) was used. It was dissolved in N-methyl-2pyrrolidone to give a 20% solution. 60 parts by weight of silicon powder (manufactured by Wako Pure Chemical Industries: particle size 30 to 50 μ) was mixed with this solution to form a slurry.

【0038】このスラリーを基材の内周部分に約3mm
厚さで塗布した後、乾燥機中300℃で硬化した。
About 3 mm of this slurry was applied to the inner peripheral portion of the base material.
After being applied in a thickness, it was cured in a dryer at 300 ° C.

【0039】更に真空炉にて1600℃まで昇温、30
分保持した後、冷却し取りだした。製品は塗布した部分
よりSiが溶融、基材に浸透し黒鉛と反応し、SiC化
しており、表面より2.5mmの深さまでSiC層が形
成されていた。このものの定性分析結果を以下に示す。
Further, the temperature was raised to 1600 ° C. in a vacuum furnace, and 30
After holding for a minute, it was cooled and taken out. In the product, Si melted from the coated part, penetrated into the base material, reacted with graphite, and turned into SiC, and a SiC layer was formed to a depth of 2.5 mm from the surface. The qualitative analysis results of this product are shown below.

【0040】1 定性分析(面分析) (1)前処理 資料をMMA(メチルメタアクリレート)にて包埋後研
磨し、次いで研磨表面にC蒸着を施した。
1 Qualitative Analysis (Area Analysis) (1) Pretreatment The material was embedded in MMA (methyl methacrylate) and then polished, and then C vapor deposition was performed on the polished surface.

【0041】(2)測定条件 加速電圧 20KV 試料電流 0.6nA 測定時間 200sec 使用装置 EMAX−2700(堀場製)(2) Measurement conditions Acceleration voltage 20KV Sample current 0.6nA Measurement time 200sec Equipment used EMAX-2700 (manufactured by Horiba)

【0042】(3)結果 Siの面分析写真を図1に示す。(3) Results FIG. 1 shows a surface analysis photograph of Si.

【0043】2 面積比率 (1)結果 表1に示す。2 Area Ratio (1) Results Table 1 shows.

【0044】[0044]

【表1】 [Table 1]

【0045】[0045]

【実施例2】嵩密度1.70g/cm、平均細孔半径
1.5μmの等方性黒鉛材料(東洋炭素(株)製、「I
SEM−1」グレード名)を用い、以下製造方法は実施
例1と同様にして、SiC層を2.0mm形成させた。
ただし使用樹脂はポリアミド(小原化工(株)製)をN
−メチルピロリドン20%溶液にして用いた。
Example 2 An isotropic graphite material having a bulk density of 1.70 g / cm 2 and an average pore radius of 1.5 μm (manufactured by Toyo Tanso Co., Ltd., “I”)
SEM-1 "grade name) was used, and the following manufacturing method was performed in the same manner as in Example 1 to form a SiC layer of 2.0 mm.
However, the resin used is polyamide (Ohara Kako Co., Ltd.)
-Methylpyrrolidone used as a 20% solution.

【0046】[0046]

【実施例3】嵩密度1.85g/cm、平均細孔半径
0.8μmの等方性黒鉛材料(東洋炭素(株)製「IS
O−50」、グレード名)に、SiC層を1.0mm部
分的に形成させた。
Example 3 An isotropic graphite material having a bulk density of 1.85 g / cm 2 and an average pore radius of 0.8 μm (“IS” manufactured by Toyo Tanso Co., Ltd.)
O-50 ", grade name) was partially formed with a SiC layer of 1.0 mm.

【0047】ただし、使用樹脂はポリビニールアルコー
ル20%水溶液にして用いた。
However, the resin used was a 20% aqueous solution of polyvinyl alcohol.

【0048】[0048]

【実施例4】嵩密度1.86g/cm、平均細孔半径
0.25μmの等方性黒鉛材料(東洋炭素(株)製「I
SO−86」グレード名)を用いて、同様にSiC層を
0.2mm形成した。
Example 4 An isotropic graphite material having a bulk density of 1.86 g / cm 2 and an average pore radius of 0.25 μm (“I” manufactured by Toyo Tanso Co., Ltd.)
A SiC layer of 0.2 mm was similarly formed using "SO-86" grade name).

【0049】ただし使用樹脂は実施例1と同じくポリア
ミドイミド樹脂の20%溶液として用いた。
However, the resin used was a 20% solution of the polyamide-imide resin as in Example 1.

【0050】[0050]

【比較例1】嵩密度1.90g/cm、平均細孔半径
0.2μmの等方性黒鉛材料(東洋炭素(株)製「IS
O−88」グレード名)を用いて前記実施例1と同様の
製造方法にて珪化処理を行った。炭素珪素の珪化層が認
められなかった。
Comparative Example 1 An isotropic graphite material having a bulk density of 1.90 g / cm 2 and an average pore radius of 0.2 μm (“IS” manufactured by Toyo Tanso Co., Ltd.)
O-88 "grade name) was used for silicidation by the same manufacturing method as in Example 1. No silicon silicon carbon layer was observed.

【0051】[0051]

【比較例2】嵩密度1.70g/cm、平均細孔半径
1.5μmの等方性黒鉛材料(東洋炭素(株)「ISE
M−1」グレード名)を用い、液状フェノール樹脂(住
友デュレズ(株)製「PQ−50273」)と珪素粉末
を混合しスラリー状として、塗布、以下前記比較例1の
製造方法にて珪化した。処理後、塗布部に硬い固着物
(珪素−ガラス状炭化物)が付着し、それを取り除くの
が困難であった。又珪化処理部の表層にクラックが発生
していて、良好な炭化珪素の層が形成されていなかっ
た。実施例1〜4及び比較例1〜2の複合材料の物性を
表2に示す。
[Comparative Example 2] An isotropic graphite material having a bulk density of 1.70 g / cm 2 and an average pore radius of 1.5 μm (“ISE” manufactured by Toyo Tanso Co., Ltd.)
M-1 "grade name), liquid phenolic resin (" PQ-50273 "manufactured by Sumitomo Durez Co., Ltd.) and silicon powder were mixed to form a slurry, which was applied and then silicified by the production method of Comparative Example 1 described above. . After the treatment, a hard adhered substance (silicon-glassy carbide) adhered to the coated part, and it was difficult to remove it. Further, cracks were generated in the surface layer of the silicidation portion, and a good silicon carbide layer was not formed. Table 2 shows the physical properties of the composite materials of Examples 1 to 4 and Comparative Examples 1 and 2.

【0052】[0052]

【表2】 [Table 2]

【0053】[0053]

【発明の効果】炭素材の特定部位の表面のみを選択的に
珪化する簡便かつ経済的な新しい方法を見出した。
EFFECTS OF THE INVENTION A simple and economical new method for selectively silicifying only the surface of a specific portion of a carbon material has been found.

【0054】この方法によって得られた材料は摺動部材
として好適である。
The material obtained by this method is suitable as a sliding member.

【手続補正2】[Procedure Amendment 2]

【補正対象書類名】明細書[Document name to be amended] Statement

【補正対象項目名】図面の簡単な説明[Name of item to be corrected] Brief description of the drawing

【補正方法】変更[Correction method] Change

【補正内容】[Correction content]

【図面の簡単な説明】[Brief description of drawings]

【図1】面分析 [Figure 1] Surface analysis diagram

Claims (2)

【特許請求の範囲】[Claims] 【請求項1】平均細孔半径が0.5μm以上の炭素基材
を製品形状に加工した素材に、樹脂或いはその溶媒液に
金属Si粉を混合懸濁したスラリーを、所定の部分にの
み塗布、乾燥、硬化し、さらに1500℃以上で焼成す
ることを特徴とする炭素−炭化珪素複合材料の製造方
法。
1. A slurry obtained by mixing and suspending metal Si powder in a resin or a solvent solution thereof is applied to only a predetermined portion of a material obtained by processing a carbon base material having an average pore radius of 0.5 μm or more into a product shape. A method for producing a carbon-silicon carbide composite material, which comprises drying, curing, and calcining at 1500 ° C. or higher.
【請求項2】上記樹脂がポリイミドアミド、ポリビニー
ルアルコール、ポリアミド樹脂の少なくとも1種以上で
あることを特徴とする請求項1に記載の複合材料の製造
方法。
2. The method for producing a composite material according to claim 1, wherein the resin is at least one of polyimide amide, polyvinyl alcohol, and polyamide resin.
JP25060292A 1992-08-25 1992-08-25 Production of carbon-sic composite material Pending JPH0812474A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP25060292A JPH0812474A (en) 1992-08-25 1992-08-25 Production of carbon-sic composite material

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP25060292A JPH0812474A (en) 1992-08-25 1992-08-25 Production of carbon-sic composite material

Publications (1)

Publication Number Publication Date
JPH0812474A true JPH0812474A (en) 1996-01-16

Family

ID=17210318

Family Applications (1)

Application Number Title Priority Date Filing Date
JP25060292A Pending JPH0812474A (en) 1992-08-25 1992-08-25 Production of carbon-sic composite material

Country Status (1)

Country Link
JP (1) JPH0812474A (en)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0983981A4 (en) * 1997-03-31 2000-12-27 Toyo Tanso Co Carbon/silicon carbide composite material
JP2008063222A (en) * 2007-10-09 2008-03-21 Toyo Tanso Kk Carbon-silicon carbide composite material
WO2014007406A1 (en) 2012-07-06 2014-01-09 トーカロ株式会社 Carbon material having thermal sprayed coating layer

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0983981A4 (en) * 1997-03-31 2000-12-27 Toyo Tanso Co Carbon/silicon carbide composite material
JP2008063222A (en) * 2007-10-09 2008-03-21 Toyo Tanso Kk Carbon-silicon carbide composite material
WO2014007406A1 (en) 2012-07-06 2014-01-09 トーカロ株式会社 Carbon material having thermal sprayed coating layer

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