JPH0763683A - Fluorescence analyzer - Google Patents
Fluorescence analyzerInfo
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- JPH0763683A JPH0763683A JP21306793A JP21306793A JPH0763683A JP H0763683 A JPH0763683 A JP H0763683A JP 21306793 A JP21306793 A JP 21306793A JP 21306793 A JP21306793 A JP 21306793A JP H0763683 A JPH0763683 A JP H0763683A
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- Prior art keywords
- gas
- fluorescence
- fluorescent
- chamber
- analyzed
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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- Investigating, Analyzing Materials By Fluorescence Or Luminescence (AREA)
Abstract
(57)【要約】
【目的】 干渉成分の影響を除去した分析対象ガスのみ
の蛍光量を得ることを目的とする。
【構成】 分析対象ガスを含む試料ガスを導入する蛍光
室(A)と、分析対象ガスのみを除去する機構を経由し
て試料ガスを導入する蛍光室(B)とを設け、蛍光室
(B)から検出された蛍光量を蛍光室(A)から検出さ
れる蛍光量より減ずることで分析対象ガスのみから発生
する蛍光量を得る。
(57) [Summary] [Purpose] The purpose is to obtain the fluorescence amount of only the gas to be analyzed from which the influence of interference components has been removed. [Composition] A fluorescence chamber (A) for introducing a sample gas containing a gas to be analyzed and a fluorescence chamber (B) for introducing the sample gas via a mechanism for removing only the gas to be analyzed are provided. The amount of fluorescence generated from only the gas to be analyzed is obtained by subtracting the amount of fluorescence detected from (1) from the amount of fluorescence detected from the fluorescence chamber (A).
Description
【0001】[0001]
【産業上の利用分野】本発明はガス試料、例えば大気や
工場排気中のSO2 (硫黄酸化物)の濃度を測定するた
めに用いられる紫外線蛍光分析計に関するものである。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to an ultraviolet fluorescence analyzer used for measuring the concentration of SO 2 (sulfur oxide) in a gas sample such as air or factory exhaust.
【0002】[0002]
【従来の技術】大気や工場排気中のSO2 などのガス試
料分析計については紫外線蛍光分析法、つまりガス試料
に紫外線を照射してそれに含まれるSO2 ガスなどに蛍
光を発生させ、その蛍光強度を測定するという手法が用
いられている。2. Description of the Related Art A gas sample analyzer for SO 2 or the like in the atmosphere or factory exhaust is an ultraviolet fluorescence analysis method, that is, when a gas sample is irradiated with ultraviolet rays and SO 2 gas contained in the gas sample is caused to emit fluorescence. A method of measuring intensity is used.
【0003】しかし、前記したようなガス試料中には、
測定対象がSO2 ガスである場合、SO2 ガスと同様に
蛍光を発する性質を有するガス(例えば一酸化窒素、二
酸化窒素といった窒素酸化物やエチルベンゼン,キシレ
ン,ナフタレン等の芳香族炭化水素類)が含まれている
ことが多い。そのため、測定の際は、これらのガスがS
O2 ガスに対する干渉成分として作用し、測定精度が大
きく低下していた。However, in the gas sample as described above,
When the measurement target is SO 2 gas, a gas having a property of emitting fluorescence similarly to SO 2 gas (for example, nitrogen oxides such as nitric oxide and nitrogen dioxide and aromatic hydrocarbons such as ethylbenzene, xylene, naphthalene) is used. Often included. Therefore, when measuring, these gases contain S
It acts as an interference component with respect to the O 2 gas, and the measurement accuracy is greatly reduced.
【0004】そこで、従来はガス試料をSO2 ガス分析
の蛍光室に導入する以前に、干渉ガス成分と反応する触
媒や干渉ガス成分を吸着する物質などにより試料ガスか
ら前記干渉ガスをあらかじめ除去する機構や、あるいは
励起光源の照射前や蛍光の検出の入力部分に狭帯域のバ
ンドパスフィルタを挿入して、干渉成分が励起光源によ
って励起されることや干渉成分から発せられる蛍光の検
出を防ぐ機構を採用していた。Therefore, conventionally, before the gas sample is introduced into the fluorescence chamber for SO 2 gas analysis, the interference gas is previously removed from the sample gas by a catalyst that reacts with the interference gas component or a substance that adsorbs the interference gas component. A mechanism or a mechanism that inserts a narrow-band bandpass filter before irradiation of the excitation light source or at the input part of fluorescence detection to prevent the excitation of the interference component by the excitation light source or the detection of fluorescence emitted from the interference component. Was adopted.
【0005】[0005]
【発明が解決しようとする課題】しかしながら、従来の
干渉ガス除去機構においては、一つの触媒や吸着材では
単一の干渉成分のみしか除去出来ない場合が多く、複数
の干渉成分に対応することは装置を複雑かつ高価なもの
にしてしまった。しかも吸着材、触媒は消耗品であるた
め定期的なメンテナンスを必要としコストの増加をまね
いた。However, in the conventional interference gas removing mechanism, it is often the case that one catalyst or adsorbent can remove only a single interference component, and it is not possible to deal with a plurality of interference components. It made the device complicated and expensive. Moreover, since the adsorbent and the catalyst are consumable items, regular maintenance is required, resulting in an increase in cost.
【0006】また、バンドパスフィルタによる干渉成分
の励起、蛍光の検出の防止はSO2ガスの励起、蛍光発
生波長域に対し、干渉成分のそれが異なっていることが
条件であり、励起、蛍光発生波長域のどちらか、あるい
は両方が同じである干渉成分の場合はバンドパスフィル
タによる除去は困難となった。The excitation of the interference component and the detection of the fluorescence by the bandpass filter are required to prevent the detection of the fluorescence, because the interference component is different from the excitation wavelength of the SO 2 gas and the fluorescence emission wavelength range. In the case of an interference component in which either or both of the generated wavelength regions are the same, it is difficult to remove with a bandpass filter.
【0007】そこで、本発明は、上記干渉ガス除去機構
に代わる新規な機構で、分析対象ガスのみを測定できる
装置を提供することを目的とする。Therefore, an object of the present invention is to provide an apparatus capable of measuring only a gas to be analyzed by a novel mechanism that replaces the interference gas removing mechanism.
【0008】[0008]
【課題を解決するための手段】上記の目的を達成するた
めに本発明は、分析対象ガスを含む試料ガスを導入する
蛍光室(A)と、分析対象ガスのみを除去する機構を経
由して試料ガスを導入する蛍光室(B)と、その両者に
紫外線を照射する光源部と、前記蛍光室A,Bのそれぞ
れの蛍光を検出する検出部と、蛍光室(A)から検出さ
れた蛍光量と蛍光室(B)から検出された蛍光量との間
で演算を行い、分析対象ガスの蛍光量のみを算出する演
算部とを備えてなる。In order to achieve the above object, the present invention uses a fluorescent chamber (A) for introducing a sample gas containing a gas to be analyzed and a mechanism for removing only the gas to be analyzed. A fluorescence chamber (B) for introducing a sample gas, a light source unit for irradiating both of them with ultraviolet rays, a detection unit for detecting the fluorescence of each of the fluorescence chambers A and B, and a fluorescence detected from the fluorescence chamber (A). And a calculation unit that calculates only the fluorescence amount of the analysis target gas by performing a calculation between the amount and the fluorescence amount detected from the fluorescence chamber (B).
【0009】なお、本発明の分析対象ガスは、例えばS
O2 ガスを挙げることができるが、これに限定されず、
紫外線照射により蛍光を発する全てのガス、例えば一酸
化窒素、二酸化窒素といった窒素酸化物やエチルベンゼ
ン,キシレン,ナフタレン等の芳香族炭化水素類もが測
定対象となり得る。The gas to be analyzed according to the present invention is, for example, S
O 2 gas may be mentioned, but not limited thereto.
All gases that emit fluorescence upon irradiation with ultraviolet rays, for example, nitrogen oxides such as nitric oxide and nitrogen dioxide, and aromatic hydrocarbons such as ethylbenzene, xylene, and naphthalene can be measured.
【0010】また、分析対象ガスのみを除去する機構と
しては、例えば、活性炭充填カラムを挙げることができ
るが、これに限定されない。The mechanism for removing only the gas to be analyzed may be, for example, an activated carbon packed column, but is not limited to this.
【0011】光源部は、分析対象ガスを励起できるもの
ならば何でも良く、励起光源の種類は連続光、パルス
光、連続光をチヨッパにてパルス化するなどその手法を
問わない。例えば、紫外線を発するランプ(キセノン、
亜鉛、重水素等)あるいはレーザーを使用できる。The light source section may be any as long as it can excite the gas to be analyzed, and the type of the excitation light source is not limited to continuous light, pulsed light, continuous pulsed light with a hopper. For example, a lamp that emits ultraviolet rays (xenon,
Zinc, deuterium, etc.) or laser can be used.
【0012】演算部は、2種の形態のガス試料から得ら
れた蛍光量を減算して分析対象ガスの蛍光量を求めるの
が代表的である、蛍光量間の除算等の演算や励起光モニ
タ部から得られた値を加えて励起光の光量変化の補正を
加えながらの演算を行っても良い。The operation unit typically calculates the fluorescence amount of the gas to be analyzed by subtracting the fluorescence amounts obtained from the two types of gas samples. Calculations such as division between fluorescence amounts and excitation light The calculation may be performed while adding the value obtained from the monitor unit and correcting the change in the light amount of the excitation light.
【0013】[0013]
【作用】本発明によれば、蛍光室(B)から検出された
蛍光量は分析対象ガスを除いた干渉成分を含む試料ガス
から発生する蛍光量であり、これを分析対象ガス及び干
渉成分から発生する蛍光量を含む蛍光室(A)から検出
される蛍光量より減ずることで分析対象ガスのみから発
生する蛍光量が得られる。蛍光室(A)(B)から発生
する蛍光量を同時あるいは時系列的に切り換えて単一あ
るいは特性のそろった複数の検出系で測定することによ
り、干渉成分や検出系の時間変化に依存することなく分
析対象ガスの蛍光量を得ることができる。According to the present invention, the amount of fluorescence detected from the fluorescent chamber (B) is the amount of fluorescence generated from the sample gas containing the interference component excluding the gas to be analyzed, which is calculated from the gas to be analyzed and the interference component. The amount of fluorescence generated from only the gas to be analyzed can be obtained by reducing the amount of fluorescence generated from the fluorescence chamber (A) containing the amount of fluorescence generated. The amount of fluorescence emitted from the fluorescent chambers (A) and (B) is switched simultaneously or in time series and measured by a single detection system or a plurality of detection systems with uniform characteristics, thereby depending on the interference component and the time change of the detection system. It is possible to obtain the fluorescence amount of the gas to be analyzed without using it.
【0014】[0014]
【実施例】以下、本発明の実施例を図面に基づいて説明
する。図1はSO2 ガス分析用紫外線蛍光分析計の構成
を示したものである。1は励起光源であり、紫外線を発
するランプあるいはレーザー、励起光選択のバンドパス
フィルタ、集光用レンズ等で構成される。Embodiments of the present invention will be described below with reference to the drawings. FIG. 1 shows the structure of an ultraviolet fluorescence analyzer for SO 2 gas analysis. Reference numeral 1 denotes an excitation light source, which includes a lamp or laser that emits ultraviolet rays, a bandpass filter for selecting excitation light, a condenser lens, and the like.
【0015】4は蛍光検出部であり、蛍光選択バンドパ
スフィルタ、集光用レンズ、光電子増倍管やフォトダイ
オード等の光検出器、電気信号変換、増幅部などからな
る。5の励起光モニタ部は主としてフォトダイオードや
光電管等の光検出器と電気信号変換、増幅部から構成さ
れ光源の電気的、機械的変動を監視する。13は演算回
路であり、蛍光検出部4や励起光モニタ部5から得られ
た電気信号から演算処理によりSO2 ガスの濃度を算出
する。Reference numeral 4 denotes a fluorescence detection section, which comprises a fluorescence selection bandpass filter, a condenser lens, a photodetector such as a photomultiplier tube or a photodiode, an electric signal conversion section, and an amplification section. The excitation light monitor unit 5 is mainly composed of a photodetector such as a photodiode or a photoelectric tube and an electric signal conversion / amplification unit, and monitors the electric and mechanical fluctuations of the light source. Reference numeral 13 denotes an arithmetic circuit, which calculates the concentration of SO 2 gas from the electric signals obtained from the fluorescence detection unit 4 and the excitation light monitor unit 5 by arithmetic processing.
【0016】2は蛍光室(A)であり、試料ガス導入部
6、試料ガス排出部12、励起光源1、蛍光検出部4、
励起光モニタ部5と接続されている。3の蛍光室(B)
はほぼ同様に試料ガス導入部9、試料ガス排出部10、
励起光源1、蛍光検出部4、励起光モニタ部5と接続さ
れているが、蛍光室(A)との相違点はSO2 ガス除去
装置8(例えば活性炭等)が常に試料ガス導入部9の経
路に挿入されていることである。Reference numeral 2 denotes a fluorescent chamber (A), which comprises a sample gas introducing section 6, a sample gas discharging section 12, an excitation light source 1, a fluorescence detecting section 4,
It is connected to the excitation light monitor unit 5. 3 fluorescent chambers (B)
Are almost the same as the sample gas introduction part 9, the sample gas discharge part 10,
The excitation light source 1, the fluorescence detection unit 4, and the excitation light monitor unit 5 are connected, but the difference from the fluorescence chamber (A) is that the SO 2 gas removal device 8 (for example, activated carbon) is always connected to the sample gas introduction unit 9. It is inserted in the route.
【0017】蛍光室(A)と蛍光室(B)は幾何学的形
状は同一である。また、11−1〜3は光学経路の切り
換え装置であり(例えば反射鏡の角度を変化させること
による手法など)、11−1は励起光源と蛍光室(A)
及び(B)、11−2は蛍光検出部4と蛍光室(A)及
び(B)、11−3は励起光モニタ部と蛍光室(A)及
び(B)をそれぞれ切り換える。尚11−1〜3は同時
に蛍光室(A)または(B)への切り換えを行う。The fluorescent chamber (A) and the fluorescent chamber (B) have the same geometric shape. Further, 11-1 to 3 are optical path switching devices (for example, a method by changing the angle of a reflecting mirror), and 11-1 is an excitation light source and a fluorescent chamber (A).
And (B) and 11-2 switch the fluorescence detection unit 4 and the fluorescence chambers (A) and (B), and 11-3 switches the excitation light monitor unit and the fluorescence chambers (A) and (B), respectively. Note that 11-1 to 3 simultaneously switch to the fluorescent chamber (A) or (B).
【0018】ガス導入部6から蛍光室(A)2に導入さ
れたSO2 ガスを含む試料ガスは蛍光室内にて励起光源
1から紫外線の照射を受ける。紫外線の照射によって試
料ガスからは蛍光が発生する。これには目的とするSO
2 ガスによる蛍光の他、干渉成分によるそれも含まれ
る。この蛍光を励起光検出部4にて検出し、検出信号は
演算回路13にて記憶、保持される。これを検出信号
(A)とする。The sample gas containing SO 2 gas introduced into the fluorescent chamber (A) 2 from the gas introducing section 6 is irradiated with ultraviolet rays from the excitation light source 1 in the fluorescent chamber. Fluorescence is generated from the sample gas by the irradiation of ultraviolet rays. This is the target SO
In addition to fluorescence due to the two gases, that due to interference components is also included. The fluorescence is detected by the excitation light detector 4, and the detection signal is stored and held by the arithmetic circuit 13. This is a detection signal (A).
【0019】励起光源1からの照射から一定時間が経過
し、演算回路13に検出信号(A)が記憶保持された時
点で光学経路切り換え装置11−1〜3を同時に動作さ
せ、励起光源1、蛍光検出部4、励起光モニタ部5の接
続を蛍光室(A)から蛍光室(B)へ切り換える。When a certain period of time has elapsed from the irradiation from the excitation light source 1 and the detection signal (A) is stored and held in the arithmetic circuit 13, the optical path switching devices 11-1 to 3-3 are simultaneously operated to generate the excitation light source 1, The connection between the fluorescence detection unit 4 and the excitation light monitor unit 5 is switched from the fluorescence chamber (A) to the fluorescence chamber (B).
【0020】蛍光室(B)内部へ紫外線が照射されるこ
とにより試料ガス導入部から導入されたSO2 ガス除去
装置8によってSO2 ガスが除去された試料ガスから蛍
光が発生する。こちらからは干渉成分による蛍光のみ含
まれる。この蛍光を励起光検出部4にて検出し、検出信
号は演算回路13にて記憶、保持される。これを検出信
号(B)とする。By irradiating the inside of the fluorescent chamber (B) with ultraviolet rays, fluorescence is generated from the sample gas from which the SO 2 gas has been removed by the SO 2 gas removing device 8 introduced from the sample gas introducing section. From here, only fluorescence due to interference components is included. The fluorescence is detected by the excitation light detector 4, and the detection signal is stored and held by the arithmetic circuit 13. This is a detection signal (B).
【0021】演算回路13にて検出信号(A)の値から
検出信号(B)の値を減ずることにより、SO2 ガスの
みの蛍光による信号が得られ、正確なSO2 ガスの濃度
測定が可能となる。By subtracting the value of the detection signal (B) from the value of the detection signal (A) in the arithmetic circuit 13, a signal due to fluorescence of only SO 2 gas can be obtained, and the concentration of SO 2 gas can be accurately measured. Becomes
【0022】(他の実施例)上記実施例においては同一
の励起、検出系で測定を行うために単一の励起、検出系
を二つの蛍光室に対して切り換えて用いたが、励起、検
出系の機械的、電気的特性が同一であれば二つの励起、
検出系を二つの蛍光室に対応しそれぞれから得られた電
気信号を演算回路にて比較させてもよい。(Other Embodiments) In the above embodiment, a single excitation / detection system was used by switching between two fluorescence chambers to perform measurement with the same excitation / detection system. Two excitations if the mechanical and electrical properties of the system are the same,
The detection system may correspond to two fluorescent chambers, and the electric signals obtained from the two fluorescent chambers may be compared by an arithmetic circuit.
【0023】あるいは蛍光室(A)2、SO2 除去装置
8、蛍光室(B)3を図2に示すように直列に接続し、
総体的には試料ガスの導入、排出経路をまとめても本発
明の効果を得る事ができる。なお、図2中、15は蛍光
室間接続用経路であり、図1と同じものには同じ番号が
付してある。Alternatively, the fluorescent chamber (A) 2, the SO 2 removing device 8 and the fluorescent chamber (B) 3 are connected in series as shown in FIG.
Overall, the effects of the present invention can be obtained even if the introduction and discharge routes of the sample gas are combined. In FIG. 2, reference numeral 15 is a path for connecting fluorescent chambers, and the same parts as those in FIG. 1 are denoted by the same reference numerals.
【0024】さらには図3に示すように蛍光室を単一に
し、SO2 ガスを含む試料経路19とSO2 除去装置8
を通した経路20を経路切り換え機構17によってガス
試料導入部18と蛍光室16に接続しても良い。この例
では、ガス試料排気部21より蛍光室16内のガス試料
を強制排気したのち、経路切り換え機構17を切り換え
ることによってSO2 ガスを含むガス試料、含まないガ
ス試料の双方を蛍光室16に交互に導入してそれらから
得られる蛍光量を演算回路13に記憶し、上記実施例と
同様の演算を行うことも可能である。この図3の装置で
は、特に装置のコスト減、設備の簡易化が容易になる。Further, as shown in FIG. 3, a single fluorescent chamber is used, and a sample path 19 containing SO 2 gas and an SO 2 removing device 8 are provided.
The path 20 passing through may be connected to the gas sample introduction unit 18 and the fluorescent chamber 16 by the path switching mechanism 17. In this example, the gas sample in the fluorescent chamber 16 is forcibly exhausted from the gas sample exhaust unit 21, and then the path switching mechanism 17 is switched so that both the gas sample containing SO 2 gas and the gas sample not containing SO 2 gas are introduced into the fluorescent chamber 16. It is also possible to alternately introduce and store the fluorescence amount obtained from them in the arithmetic circuit 13 and perform the same arithmetic operation as in the above-mentioned embodiment. In the device of FIG. 3, it is easy to reduce the cost of the device and simplify the equipment.
【0025】なお、連続モニタの場合は上記の動作を一
定周期で繰り返せばよい。In the case of continuous monitoring, the above operation may be repeated at regular intervals.
【0026】[0026]
【発明の効果】本発明によれば、干渉成分の影響を除去
した分析対象ガスのみの蛍光量を得ることができる。According to the present invention, it is possible to obtain the fluorescence amount of only the gas to be analyzed from which the influence of the interference component is removed.
【0027】また、分析対象ガスを含むあるいは含まな
い試料ガスの蛍光を連続して比較しながら濃度測定を行
うので、干渉成分や励起光源1の時間変化による測定値
の誤差を防ぐことができる。Further, since the concentration is measured while continuously comparing the fluorescence of the sample gas containing or not containing the gas to be analyzed, it is possible to prevent an error in the measurement value due to the interference component or the change over time of the excitation light source 1.
【図1】本発明の一実施例にかかる蛍光光度計の基本的
な構成図。FIG. 1 is a basic configuration diagram of a fluorometer according to an embodiment of the present invention.
【図2】本発明の変形例。FIG. 2 is a modified example of the present invention.
【図3】本発明の変形例。FIG. 3 is a modified example of the present invention.
1…励起光源 2、3、16…蛍光室 8…SO2 除去装置 4…蛍光検出部 13…演算回路1 ... pumping light source 2,3,16 ... fluorescent chamber 8 ... SO 2 removal unit 4 ... fluorescence detector 13 ... computing circuit
Claims (1)
蛍光室(A)と、分析対象ガスのみを除去する機構を経
由して試料ガスを導入する蛍光室(B)と、その両者に
紫外線を照射する光源部と、前記蛍光室A,Bのそれぞ
れの蛍光を検出する検出部と、蛍光室(A)から検出さ
れた蛍光量と蛍光室(B)から検出された蛍光量との間
で演算を行い、分析対象ガスの蛍光量のみを算出する演
算部とを備えた蛍光分析計。1. A fluorescent chamber (A) for introducing a sample gas containing a gas to be analyzed, a fluorescent chamber (B) for introducing the sample gas via a mechanism for removing only the gas to be analyzed, and ultraviolet rays to both of them. Between a light source unit that irradiates the fluorescent chamber, a detection unit that detects the fluorescence of each of the fluorescent chambers A and B, and a fluorescent amount detected from the fluorescent chamber (A) and a fluorescent amount detected from the fluorescent chamber (B). And a calculation unit that calculates only the fluorescence amount of the gas to be analyzed.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP21306793A JPH0763683A (en) | 1993-08-27 | 1993-08-27 | Fluorescence analyzer |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP21306793A JPH0763683A (en) | 1993-08-27 | 1993-08-27 | Fluorescence analyzer |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPH0763683A true JPH0763683A (en) | 1995-03-10 |
Family
ID=16632993
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP21306793A Pending JPH0763683A (en) | 1993-08-27 | 1993-08-27 | Fluorescence analyzer |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH0763683A (en) |
Cited By (8)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2002286641A (en) * | 2001-03-23 | 2002-10-03 | Olympus Optical Co Ltd | Microscope |
| WO2003023378A1 (en) * | 2001-09-06 | 2003-03-20 | Japan Science And Technology Agency | Method for estimating concentration of generating hotochemical ozone by the use of pump-probe method, and apparatus for estimating concentration of generating photochemical ozone utilizing the method |
| WO2003040707A1 (en) * | 2001-11-05 | 2003-05-15 | Japan Science And Technology Agency | Method for measuring concentration of nitrogen dioxide in air by single-wavelength laser induced fluorescence method, and apparatus for measuring concentration of nitrogen dioxide by the method |
| JP2005207793A (en) * | 2004-01-21 | 2005-08-04 | Hitachi Zosen Corp | Gas component measuring apparatus and exhaust gas discharge equipment |
| JP2008292220A (en) * | 2007-05-23 | 2008-12-04 | Tokyo Metropolitan Univ | Method and apparatus for measuring nitrogen oxide concentration in the atmosphere by laser-induced fluorescence |
| EP2182344A1 (en) | 2003-08-13 | 2010-05-05 | HORIBA, Ltd. | Analysis method and apparatus for measuring concentrations of sulfur components using ultraviolet fluorescence |
| JP2012508890A (en) * | 2008-11-13 | 2012-04-12 | ペトローリアム アナライザー カンパニー,エルピー | Sample or sample component analysis system and methods for making and using the system |
| CN114509417A (en) * | 2022-02-15 | 2022-05-17 | 南京浦光芯片科技有限公司 | An integrated gas chamber fluorescent gas detection device |
-
1993
- 1993-08-27 JP JP21306793A patent/JPH0763683A/en active Pending
Cited By (10)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2002286641A (en) * | 2001-03-23 | 2002-10-03 | Olympus Optical Co Ltd | Microscope |
| WO2003023378A1 (en) * | 2001-09-06 | 2003-03-20 | Japan Science And Technology Agency | Method for estimating concentration of generating hotochemical ozone by the use of pump-probe method, and apparatus for estimating concentration of generating photochemical ozone utilizing the method |
| US7425452B2 (en) | 2001-09-06 | 2008-09-16 | Japan Science And Technology Agency | Pump-and-probe method for estimating strength of forming photochemical ozone and apparatus therefor |
| WO2003040707A1 (en) * | 2001-11-05 | 2003-05-15 | Japan Science And Technology Agency | Method for measuring concentration of nitrogen dioxide in air by single-wavelength laser induced fluorescence method, and apparatus for measuring concentration of nitrogen dioxide by the method |
| US7295319B2 (en) | 2001-11-05 | 2007-11-13 | Japan Science And Technology Agency | Method for measuring concentration of nitrogen dioxide in air by single-wavelength laser induced fluorescence method, and apparatus for measuring concentration of nitrogen dioxide by the method |
| EP2182344A1 (en) | 2003-08-13 | 2010-05-05 | HORIBA, Ltd. | Analysis method and apparatus for measuring concentrations of sulfur components using ultraviolet fluorescence |
| JP2005207793A (en) * | 2004-01-21 | 2005-08-04 | Hitachi Zosen Corp | Gas component measuring apparatus and exhaust gas discharge equipment |
| JP2008292220A (en) * | 2007-05-23 | 2008-12-04 | Tokyo Metropolitan Univ | Method and apparatus for measuring nitrogen oxide concentration in the atmosphere by laser-induced fluorescence |
| JP2012508890A (en) * | 2008-11-13 | 2012-04-12 | ペトローリアム アナライザー カンパニー,エルピー | Sample or sample component analysis system and methods for making and using the system |
| CN114509417A (en) * | 2022-02-15 | 2022-05-17 | 南京浦光芯片科技有限公司 | An integrated gas chamber fluorescent gas detection device |
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