JPH04321586A - Single crystal pulling device - Google Patents
Single crystal pulling deviceInfo
- Publication number
- JPH04321586A JPH04321586A JP9033591A JP9033591A JPH04321586A JP H04321586 A JPH04321586 A JP H04321586A JP 9033591 A JP9033591 A JP 9033591A JP 9033591 A JP9033591 A JP 9033591A JP H04321586 A JPH04321586 A JP H04321586A
- Authority
- JP
- Japan
- Prior art keywords
- crucible
- melt
- single crystal
- outer crucible
- raw material
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Withdrawn
Links
Landscapes
- Crystals, And After-Treatments Of Crystals (AREA)
Abstract
Description
【0001】0001
【産業上の利用分野】本発明はチョクラルスキー法によ
る単結晶引上装置に関するものである。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a single crystal pulling apparatus using the Czochralski method.
【0002】0002
【従来の技術】チョクラルスキー法(CZ法)による単
結晶引上装置で原料を供給しながら連続的に単結晶を引
上げる連続供給装置がある。小粒の固体原料を用いて連
続供給により単結晶引上を実施する場合、供給した原料
が融解する以前に単結晶上へ析出し多結晶化を起こすこ
とを防止するために、通常の坩堝(外坩堝)の内側に原
料を供給し融解する部分と、単結晶を引上げる部分とに
融液を区分するための内坩堝を用いる。小粒状原料を用
いる連続供給装置に用いられる内坩堝には、主として次
の2つがある。
(イ)図3に示すように、上方より吊下げられ、外坩堝
1と別体の隔壁状の吊下内坩堝4であるもの。
(ロ)図4に示すように、底部において外坩堝1と一体
となり、外坩堝1とともに回転する壁体14であるもの
。2. Description of the Related Art There is a continuous feeding device that continuously pulls a single crystal while supplying raw materials using a single crystal pulling device using the Czochralski method (CZ method). When pulling a single crystal by continuous feeding using small solid raw materials, it is necessary to use a normal crucible (outside the An inner crucible is used to divide the melt into a part for supplying and melting raw materials inside the crucible and a part for pulling the single crystal. There are mainly two types of inner crucibles used in continuous feeding devices that use small particulate raw materials. (a) As shown in FIG. 3, a suspended inner crucible 4 is suspended from above and is separated from the outer crucible 1 in the form of a partition. (b) As shown in FIG. 4, the wall body 14 is integrated with the outer crucible 1 at the bottom and rotates together with the outer crucible 1.
【0003】ここで、(イ)は(ロ)と比較し次の利点
を持つ。
(1)外坩堝1と吊下内坩堝4とを合計したコストが低
い。
(2)隔壁状の吊下内坩堝4は再使用が可能である。
(3)吊下内坩堝4は上方より吊下げられているため、
自重による挫屈が少なく変形しにくい。
(4)隔壁状の吊下内坩堝4は回転しないため、原料供
給管3(石英)や単結晶20に原料粉が析出することを
防ぐ構造を設計しやすく、これらによる多結晶化を防止
し、長時間の連続引上が可能である。Here, (a) has the following advantages compared to (b). (1) The total cost of the outer crucible 1 and the suspended inner crucible 4 is low. (2) The hanging inner crucible 4 shaped like a partition wall can be reused. (3) Since the suspended inner crucible 4 is suspended from above,
Less buckling due to own weight and less deformation. (4) Since the partition wall-shaped hanging inner crucible 4 does not rotate, it is easy to design a structure that prevents raw material powder from precipitating on the raw material supply pipe 3 (quartz) and the single crystal 20, thereby preventing polycrystalization. , long-term continuous pulling is possible.
【0004】0004
【発明が解決しようとする課題】このように隔壁状の吊
下内坩堝を有する引上装置は優れた利点を有するが、次
の欠点がある。すなわち、隔壁状の吊下内坩堝は一般に
回転しないため、吊下内坩堝より内側の融液内に円周方
向に温度の不均一分布が生じやすく、回転しながら引上
げられる単結晶は、周期的な温度変動を受ける。したが
って、隔壁状の吊下内坩堝を用いて確率よく引上げられ
る単結晶は隔壁状の吊下内坩堝の内径の1/3程度以下
の直径の単結晶に制約され、比較的大径の単結晶を連続
的に引上げることは難しい。本発明は隔壁状の吊下内坩
堝を有する引上装置の前記利点を生かし、上記欠点を解
消した単結晶引上装置を提供することを目的とするもの
である。Although the pulling device having the hanging inner crucible in the form of partition walls has excellent advantages, it has the following drawbacks. In other words, since the hanging inner crucible in the shape of a partition wall does not generally rotate, non-uniform temperature distribution tends to occur in the circumferential direction within the melt inside the hanging inner crucible, and the single crystal that is pulled while rotating is periodically subject to significant temperature fluctuations. Therefore, single crystals that can be pulled with high probability using a hanging crucible with partition walls are limited to single crystals with a diameter of about 1/3 or less of the inner diameter of the hanging crucible with a partition wall, and relatively large diameter single crystals. It is difficult to raise the value continuously. An object of the present invention is to provide a single-crystal pulling apparatus that takes advantage of the advantages of a pulling apparatus having a suspended internal crucible in the form of partitions and eliminates the above-mentioned drawbacks.
【0005】[0005]
【課題を解決するための手段】本発明は外坩堝内に隔壁
状の吊下内坩堝を備えた単結晶引上装置において、この
吊下内坩堝の内方に、前記外坩堝の底部から立設した撹
拌具を備えたことを特徴とする単結晶引上装置である。
この融液撹拌具としては、融液上面まで突出した同心円
筒殻でその壁に多数の透孔を設けたものや融液上面まで
突出した複数の棒体などを用いることができる。[Means for Solving the Problems] The present invention provides a single crystal pulling apparatus having a hanging inner crucible in the shape of a partition inside an outer crucible, in which a vertical line is placed inside the hanging inner crucible from the bottom of the outer crucible. This is a single crystal pulling device characterized by being equipped with a stirring tool. As the melt stirring tool, a concentric cylindrical shell that protrudes to the upper surface of the melt and has many through holes in its wall, or a plurality of rods that protrude to the upper surface of the melt, etc. can be used.
【0006】[0006]
【作用】隔壁状の吊下内坩堝の内側に、この吊下内坩堝
の内側の融液を撹拌するための手段を設け、吊下内坩堝
の内側の融液内の円周方向の温度の不均一分布をなくし
たから、吊下内坩堝の内径と比較して、比較的大径の単
結晶を、高確率で長時間連続的に引上げることができる
ようになった。[Operation] A means for stirring the melt inside the hanging inner crucible in the shape of a partition is provided inside the hanging inner crucible, and the temperature in the circumferential direction of the melt inside the hanging inner crucible is By eliminating uneven distribution, it has become possible to continuously pull single crystals with a relatively large diameter compared to the inner diameter of the suspended inner crucible for a long time with high probability.
【0007】融液撹拌具は静止している吊下内坩堝に対
して相対移動するものでよく、外坩堝と共に回転し、融
液上面まで突出しているものであればよい。その形状は
限定されるものではなく、円筒殻状、棒状のものが好適
であるが、その他任意の形状とすることができる。The melt stirring device may be one that moves relative to the stationary suspended inner crucible, and may be one that rotates together with the outer crucible and projects to the upper surface of the melt. Its shape is not limited, and a cylindrical shell shape or a rod shape is suitable, but it can be of any other shape.
【0008】[0008]
【実施例】本発明の実施例を図1に示す。外坩堝1内に
融液2が収納され多結晶シリコン原料粉は原料供給管3
を経て供給される。この供給原料が引上中の単結晶上に
析出するのかを防止するため、隔壁状の内坩堝4が吊下
げられている。また、原料の飛散防止具5、6がこの隔
壁に取付けられている。なお、ケーシング7内にヒータ
8が設けられ、Ar流の整流筒9が設けられている。[Embodiment] An embodiment of the present invention is shown in FIG. The melt 2 is stored in the outer crucible 1, and the raw material powder of polycrystalline silicon is supplied to the raw material supply pipe 3.
It is supplied through. In order to prevent this feed material from precipitating on the single crystal being pulled, a partition-shaped inner crucible 4 is suspended. In addition, materials 5 and 6 for preventing scattering of raw materials are attached to this partition wall. Note that a heater 8 is provided within the casing 7, and an Ar flow rectifying tube 9 is provided.
【0009】本発明の融液撹拌具はこの実施例では外坩
堝1の底から立設した円筒殻状の内坩堝10が示され、
この内坩堝10には孔11が設けられている。直径18
インチの外坩堝1の内側に、直径14インチの隔壁状の
吊下内坩堝4を上方より吊下げ(固定されており、回転
しない)、その内側に、融液撹拌具10として直径12
インチの内坩堝10を配設した。この直径12インチの
内坩堝10は、自重でシリコン融液中に沈むように、浮
力及び表面張力を考慮し液面上に突出するように高さを
135mmに設計した。したがって、この直径12イン
チの内坩堝10は直径18インチの外坩堝1に予め固定
されていないが、自重でシリコン融液中に沈んでおり、
直径18インチの外坩堝1とともに回転する。また、前
記直径12インチの内坩堝10は下端より15mmのと
ころに直径15mmの貫通孔11をもち、内外の融液は
ここを通って流動できる。In this embodiment, the melt stirring device of the present invention has a cylindrical shell-shaped inner crucible 10 that stands up from the bottom of an outer crucible 1.
This inner crucible 10 is provided with a hole 11 . diameter 18
Inside the outer crucible 1 with a diameter of 14 inches, a hanging inner crucible 4 in the form of a partition wall with a diameter of 14 inches is suspended from above (fixed and does not rotate).
An inch inner crucible 10 was provided. The inner crucible 10 having a diameter of 12 inches was designed to have a height of 135 mm so that it would sink into the silicon melt under its own weight and would protrude above the liquid surface in consideration of buoyancy and surface tension. Therefore, although this inner crucible 10 with a diameter of 12 inches is not fixed in advance to the outer crucible 1 with a diameter of 18 inches, it sinks into the silicon melt due to its own weight.
It rotates together with an outer crucible 1 having a diameter of 18 inches. The inner crucible 10 with a diameter of 12 inches has a through hole 11 with a diameter of 15 mm located 15 mm from the lower end, through which the melt inside and outside can flow.
【0010】図2に他の実施例の縦断面図を示した。図
2の例では、吊下内坩堝4の内側に外坩堝1から融液上
面に達する棒体12を設けた。図1に示した装置を用い
、25kgの高純度シリコンを原料とし、引上げられる
単結晶の比抵抗目標値を3.5Ω・cmとし、ドーパン
トとしてPを添加し、単結晶の引上量に見合った量の原
料42g/min及びドーパントを供給しながら、引上
速度50mm/時で直径6インチの単結晶を引上げた。
単結晶は、多結晶化する度に取り出しを行い、再度引上
を行った。FIG. 2 shows a longitudinal sectional view of another embodiment. In the example of FIG. 2, a rod 12 is provided inside the suspended inner crucible 4 to reach the upper surface of the melt from the outer crucible 1. Using the apparatus shown in Figure 1, 25 kg of high-purity silicon is used as a raw material, the specific resistance target value of the single crystal to be pulled is set to 3.5 Ωcm, and P is added as a dopant to match the amount of pulled single crystal. A single crystal with a diameter of 6 inches was pulled at a pulling speed of 50 mm/hour while supplying raw materials and dopants in an amount of 42 g/min. Each time the single crystal became polycrystallized, it was taken out and pulled again.
【0011】本実施例によって、連続的にシリコン単結
晶を引上げたところ、連続的に操業可能な時間は、およ
そ180時間であり、総引上げ直胴部の長さ約6200
mm(10本)、一本当りの平均直胴部の長さ620m
mという良好な結果が得られた。これに対して従来の隔
壁状の吊下内坩堝のみを備えた単結晶引上装置では直径
6インチの単結晶を安定して引上げることは難しい。ま
た、従来の外坩堝と共に回転する内坩堝を備えた単結晶
引上装置を用いた場合、原料の飛散確率が高く平均引上
長さは300mm以下であり、また、この場合、内坩堝
が融液上に突出する部分の自重により内坩堝が変形し、
長時間の引上はできない。[0011] When a silicon single crystal was continuously pulled in accordance with this embodiment, the continuous operation time was approximately 180 hours, and the total length of the straight body for pulling was approximately 6200 mm.
mm (10 pieces), average straight body length per piece 620 m
A good result of m was obtained. On the other hand, it is difficult to stably pull a single crystal with a diameter of 6 inches using a conventional single crystal pulling apparatus equipped only with a suspended internal crucible in the form of partition walls. Furthermore, when using a conventional single crystal pulling device equipped with an inner crucible that rotates together with an outer crucible, the probability of scattering of raw materials is high and the average pulling length is 300 mm or less. The inner crucible deforms due to the weight of the part that protrudes above the liquid,
It cannot be pulled up for a long time.
【0012】0012
【発明の効果】隔壁状の吊下内坩堝を備えた単結晶引上
装置において生ずる円周方向の温度不均一を解消したの
で、吊下内坩堝の直径に対して比較的大径の単結晶を高
確率で連続引上可能となった。Effects of the Invention: Since the temperature non-uniformity in the circumferential direction that occurs in a single crystal pulling device equipped with a hanging inner crucible in the form of a partition has been eliminated, single crystals with a relatively large diameter compared to the diameter of the hanging inner crucible can be It has become possible to continuously raise with high probability.
【図1】本発明の実施例の単結晶引上装置の縦断面図で
ある。FIG. 1 is a longitudinal sectional view of a single crystal pulling apparatus according to an embodiment of the present invention.
【図2】他の実施例の単結晶引上装置の縦断面図である
。FIG. 2 is a longitudinal sectional view of a single crystal pulling apparatus according to another embodiment.
【図3】従来の実施例の単結晶引上装置の縦断面図であ
る。FIG. 3 is a longitudinal sectional view of a conventional single crystal pulling apparatus.
【図4】従来の実施例の単結晶引上装置の縦断面図であ
る。FIG. 4 is a longitudinal sectional view of a conventional single crystal pulling apparatus.
1 外坩堝
2 融液3 原料供給管
4 吊下内坩堝5、6
原料飛散防止具 7 ケー
シング8 ヒータ
9 整流筒10 内坩堝
11 貫通孔12
棒体
14 壁体20 引上単結晶1 Outer crucible
2 Melt 3 Raw material supply pipe
4 Hanging inner crucible 5, 6
Raw material scattering prevention device 7 Casing 8 Heater
9 Rectifier cylinder 10 Inner crucible
11 Through hole 12
rod body
14 Wall 20 Pulled single crystal
Claims (3)
た単結晶引上装置において、該吊下内坩堝の内方に、前
記外坩堝の底部から立設した融液撹拌具を備えたことを
特徴とする単結晶引上装置。1. A single crystal pulling apparatus comprising a hanging inner crucible in the form of a partition inside an outer crucible, wherein a melt stirring tool is provided inside the hanging inner crucible and stands upright from the bottom of the outer crucible. A single crystal pulling device characterized by comprising:
心円筒殻で、該円筒殻の壁に多数の透孔を設けたもので
あることを特徴とする請求項1記載の単結晶引上装置。2. The single crystal pulling device according to claim 1, wherein the melt stirring device is a concentric cylindrical shell that protrudes to the upper surface of the melt, and a large number of through holes are provided in the wall of the cylindrical shell. Upper device.
複数の棒体であることを特徴とする請求項1記載の単結
晶引上装置。3. The single crystal pulling apparatus according to claim 1, wherein the melt stirring device is a plurality of rods that protrude up to the upper surface of the melt.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP9033591A JPH04321586A (en) | 1991-04-22 | 1991-04-22 | Single crystal pulling device |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP9033591A JPH04321586A (en) | 1991-04-22 | 1991-04-22 | Single crystal pulling device |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPH04321586A true JPH04321586A (en) | 1992-11-11 |
Family
ID=13995653
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP9033591A Withdrawn JPH04321586A (en) | 1991-04-22 | 1991-04-22 | Single crystal pulling device |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH04321586A (en) |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN104685113A (en) * | 2012-09-10 | 2015-06-03 | Gtatip控股有限责任公司 | Continuous CZ method and apparatus |
| CN109112623A (en) * | 2017-06-23 | 2019-01-01 | 镇江仁德新能源科技有限公司 | A kind of casting method of solar-grade polysilicon piece |
-
1991
- 1991-04-22 JP JP9033591A patent/JPH04321586A/en not_active Withdrawn
Cited By (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN104685113A (en) * | 2012-09-10 | 2015-06-03 | Gtatip控股有限责任公司 | Continuous CZ method and apparatus |
| JP2015527295A (en) * | 2012-09-10 | 2015-09-17 | ジーティーエイティー アイピー ホールディング エルエルシーGtat Ip Holding Llc | Continuous Czochralski method and equipment |
| EP2893057A4 (en) * | 2012-09-10 | 2016-06-15 | Gtat Ip Holding Llc | Continuous czochralski method and apparatus |
| US9745666B2 (en) | 2012-09-10 | 2017-08-29 | Gtat Ip Holding Llc | Continuous czochralski method and apparatus |
| JP2018168060A (en) * | 2012-09-10 | 2018-11-01 | ジーティーエイティー アイピー ホールディング エルエルシーGtat Ip Holding Llc | Continuous Czochralski method and equipment |
| CN110714223A (en) * | 2012-09-10 | 2020-01-21 | Gtat Ip控股有限责任公司 | Continuous CZ method and apparatus |
| CN109112623A (en) * | 2017-06-23 | 2019-01-01 | 镇江仁德新能源科技有限公司 | A kind of casting method of solar-grade polysilicon piece |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| A300 | Application deemed to be withdrawn because no request for examination was validly filed |
Free format text: JAPANESE INTERMEDIATE CODE: A300 Effective date: 19980711 |