JPH04208272A - Epoxidized tetrahydrobenzyl alcohol composition - Google Patents
Epoxidized tetrahydrobenzyl alcohol compositionInfo
- Publication number
- JPH04208272A JPH04208272A JP33499590A JP33499590A JPH04208272A JP H04208272 A JPH04208272 A JP H04208272A JP 33499590 A JP33499590 A JP 33499590A JP 33499590 A JP33499590 A JP 33499590A JP H04208272 A JPH04208272 A JP H04208272A
- Authority
- JP
- Japan
- Prior art keywords
- compound
- formula
- reaction
- tetrahydrobenzyl alcohol
- alcohol
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 239000000203 mixture Substances 0.000 title claims abstract description 33
- -1 tetrahydrobenzyl alcohol Chemical compound 0.000 title claims abstract description 28
- 150000001875 compounds Chemical class 0.000 claims abstract description 29
- 239000000126 substance Substances 0.000 claims description 5
- 239000007800 oxidant agent Substances 0.000 abstract description 20
- KFSLWBXXFJQRDL-UHFFFAOYSA-N Peracetic acid Chemical compound CC(=O)OO KFSLWBXXFJQRDL-UHFFFAOYSA-N 0.000 abstract description 16
- OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical class OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 abstract description 12
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 abstract description 9
- 229910052799 carbon Inorganic materials 0.000 abstract description 9
- 239000004593 Epoxy Substances 0.000 abstract description 7
- 125000003700 epoxy group Chemical group 0.000 abstract description 6
- 239000003085 diluting agent Substances 0.000 abstract description 3
- 239000002994 raw material Substances 0.000 abstract description 3
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 abstract description 2
- 239000001301 oxygen Substances 0.000 abstract description 2
- 229910052760 oxygen Inorganic materials 0.000 abstract description 2
- 229920000642 polymer Polymers 0.000 abstract description 2
- CBOIHMRHGLHBPB-UHFFFAOYSA-N hydroxymethyl Chemical compound O[CH2] CBOIHMRHGLHBPB-UHFFFAOYSA-N 0.000 abstract 1
- LMBFAGIMSUYTBN-MPZNNTNKSA-N teixobactin Chemical compound C([C@H](C(=O)N[C@@H]([C@@H](C)CC)C(=O)N[C@@H](CO)C(=O)N[C@H](CCC(N)=O)C(=O)N[C@H]([C@@H](C)CC)C(=O)N[C@@H]([C@@H](C)CC)C(=O)N[C@@H](CO)C(=O)N[C@H]1C(N[C@@H](C)C(=O)N[C@@H](C[C@@H]2NC(=N)NC2)C(=O)N[C@H](C(=O)O[C@H]1C)[C@@H](C)CC)=O)NC)C1=CC=CC=C1 LMBFAGIMSUYTBN-MPZNNTNKSA-N 0.000 abstract 1
- 238000006243 chemical reaction Methods 0.000 description 29
- XEKOWRVHYACXOJ-UHFFFAOYSA-N Ethyl acetate Chemical compound CCOC(C)=O XEKOWRVHYACXOJ-UHFFFAOYSA-N 0.000 description 18
- 238000009835 boiling Methods 0.000 description 18
- 239000007788 liquid Substances 0.000 description 15
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 11
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 10
- HEMHJVSKTPXQMS-UHFFFAOYSA-M Sodium hydroxide Chemical compound [OH-].[Na+] HEMHJVSKTPXQMS-UHFFFAOYSA-M 0.000 description 9
- 239000000047 product Substances 0.000 description 9
- 238000006386 neutralization reaction Methods 0.000 description 8
- 239000002904 solvent Substances 0.000 description 8
- 238000004519 manufacturing process Methods 0.000 description 7
- MHAJPDPJQMAIIY-UHFFFAOYSA-N Hydrogen peroxide Chemical compound OO MHAJPDPJQMAIIY-UHFFFAOYSA-N 0.000 description 6
- 239000007864 aqueous solution Substances 0.000 description 6
- 238000004817 gas chromatography Methods 0.000 description 6
- 150000004967 organic peroxy acids Chemical class 0.000 description 6
- 238000001644 13C nuclear magnetic resonance spectroscopy Methods 0.000 description 5
- 238000005160 1H NMR spectroscopy Methods 0.000 description 5
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 5
- 238000007664 blowing Methods 0.000 description 5
- 239000003054 catalyst Substances 0.000 description 5
- 238000010438 heat treatment Methods 0.000 description 5
- 150000007524 organic acids Chemical class 0.000 description 5
- 238000004458 analytical method Methods 0.000 description 4
- 238000006735 epoxidation reaction Methods 0.000 description 4
- RTZKZFJDLAIYFH-UHFFFAOYSA-N ether Substances CCOCC RTZKZFJDLAIYFH-UHFFFAOYSA-N 0.000 description 4
- 238000007086 side reaction Methods 0.000 description 4
- CIHOLLKRGTVIJN-UHFFFAOYSA-N tert‐butyl hydroperoxide Chemical compound CC(C)(C)OO CIHOLLKRGTVIJN-UHFFFAOYSA-N 0.000 description 4
- 238000005406 washing Methods 0.000 description 4
- MHNVXQGFSXEDIT-UHFFFAOYSA-N 7-oxabicyclo[4.1.0]hept-1(6)-ene Chemical compound C1CCCC2=C1O2 MHNVXQGFSXEDIT-UHFFFAOYSA-N 0.000 description 3
- CSCPPACGZOOCGX-UHFFFAOYSA-N Acetone Chemical compound CC(C)=O CSCPPACGZOOCGX-UHFFFAOYSA-N 0.000 description 3
- UHOVQNZJYSORNB-UHFFFAOYSA-N Benzene Chemical compound C1=CC=CC=C1 UHOVQNZJYSORNB-UHFFFAOYSA-N 0.000 description 3
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 description 3
- 230000015572 biosynthetic process Effects 0.000 description 3
- 229910001873 dinitrogen Inorganic materials 0.000 description 3
- 238000004821 distillation Methods 0.000 description 3
- 239000002360 explosive Substances 0.000 description 3
- 125000002887 hydroxy group Chemical group [H]O* 0.000 description 3
- 230000014759 maintenance of location Effects 0.000 description 3
- 238000000034 method Methods 0.000 description 3
- 235000011121 sodium hydroxide Nutrition 0.000 description 3
- 239000000243 solution Substances 0.000 description 3
- 239000010409 thin film Substances 0.000 description 3
- BVKZGUZCCUSVTD-UHFFFAOYSA-M Bicarbonate Chemical compound OC([O-])=O BVKZGUZCCUSVTD-UHFFFAOYSA-M 0.000 description 2
- HEDRZPFGACZZDS-UHFFFAOYSA-N Chloroform Chemical compound ClC(Cl)Cl HEDRZPFGACZZDS-UHFFFAOYSA-N 0.000 description 2
- XTHFKEDIFFGKHM-UHFFFAOYSA-N Dimethoxyethane Chemical compound COCCOC XTHFKEDIFFGKHM-UHFFFAOYSA-N 0.000 description 2
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 description 2
- 238000005481 NMR spectroscopy Methods 0.000 description 2
- QAOWNCQODCNURD-UHFFFAOYSA-N Sulfuric acid Chemical compound OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 description 2
- 239000003513 alkali Substances 0.000 description 2
- 230000003197 catalytic effect Effects 0.000 description 2
- MVPPADPHJFYWMZ-UHFFFAOYSA-N chlorobenzene Chemical compound ClC1=CC=CC=C1 MVPPADPHJFYWMZ-UHFFFAOYSA-N 0.000 description 2
- 238000001816 cooling Methods 0.000 description 2
- 125000004122 cyclic group Chemical group 0.000 description 2
- 125000000113 cyclohexyl group Chemical group [H]C1([H])C([H])([H])C([H])([H])C([H])(*)C([H])([H])C1([H])[H] 0.000 description 2
- 238000010790 dilution Methods 0.000 description 2
- 239000012895 dilution Substances 0.000 description 2
- 239000003822 epoxy resin Substances 0.000 description 2
- 239000007789 gas Substances 0.000 description 2
- 239000011521 glass Substances 0.000 description 2
- LNEPOXFFQSENCJ-UHFFFAOYSA-N haloperidol Chemical compound C1CC(O)(C=2C=CC(Cl)=CC=2)CCN1CCCC(=O)C1=CC=C(F)C=C1 LNEPOXFFQSENCJ-UHFFFAOYSA-N 0.000 description 2
- 239000001257 hydrogen Substances 0.000 description 2
- 229910052739 hydrogen Inorganic materials 0.000 description 2
- 229920000647 polyepoxide Polymers 0.000 description 2
- BWHMMNNQKKPAPP-UHFFFAOYSA-L potassium carbonate Chemical compound [K+].[K+].[O-]C([O-])=O BWHMMNNQKKPAPP-UHFFFAOYSA-L 0.000 description 2
- 238000011084 recovery Methods 0.000 description 2
- 238000000926 separation method Methods 0.000 description 2
- 230000000087 stabilizing effect Effects 0.000 description 2
- VZGDMQKNWNREIO-UHFFFAOYSA-N tetrachloromethane Chemical compound ClC(Cl)(Cl)Cl VZGDMQKNWNREIO-UHFFFAOYSA-N 0.000 description 2
- ULQQGOGMQRGFFR-UHFFFAOYSA-N 2-chlorobenzenecarboperoxoic acid Chemical compound OOC(=O)C1=CC=CC=C1Cl ULQQGOGMQRGFFR-UHFFFAOYSA-N 0.000 description 1
- LJGHYPLBDBRCRZ-UHFFFAOYSA-N 3-(3-aminophenyl)sulfonylaniline Chemical compound NC1=CC=CC(S(=O)(=O)C=2C=C(N)C=CC=2)=C1 LJGHYPLBDBRCRZ-UHFFFAOYSA-N 0.000 description 1
- DKPFZGUDAPQIHT-UHFFFAOYSA-N Butyl acetate Natural products CCCCOC(C)=O DKPFZGUDAPQIHT-UHFFFAOYSA-N 0.000 description 1
- BVKZGUZCCUSVTD-UHFFFAOYSA-L Carbonate Chemical compound [O-]C([O-])=O BVKZGUZCCUSVTD-UHFFFAOYSA-L 0.000 description 1
- NTIZESTWPVYFNL-UHFFFAOYSA-N Methyl isobutyl ketone Chemical compound CC(C)CC(C)=O NTIZESTWPVYFNL-UHFFFAOYSA-N 0.000 description 1
- UIHCLUNTQKBZGK-UHFFFAOYSA-N Methyl isobutyl ketone Natural products CCC(C)C(C)=O UIHCLUNTQKBZGK-UHFFFAOYSA-N 0.000 description 1
- ZOKXTWBITQBERF-UHFFFAOYSA-N Molybdenum Chemical compound [Mo] ZOKXTWBITQBERF-UHFFFAOYSA-N 0.000 description 1
- CTQNGGLPUBDAKN-UHFFFAOYSA-N O-Xylene Chemical compound CC1=CC=CC=C1C CTQNGGLPUBDAKN-UHFFFAOYSA-N 0.000 description 1
- 239000004721 Polyphenylene oxide Substances 0.000 description 1
- CDBYLPFSWZWCQE-UHFFFAOYSA-L Sodium Carbonate Chemical compound [Na+].[Na+].[O-]C([O-])=O CDBYLPFSWZWCQE-UHFFFAOYSA-L 0.000 description 1
- 239000002253 acid Substances 0.000 description 1
- 150000007513 acids Chemical class 0.000 description 1
- 239000000853 adhesive Substances 0.000 description 1
- 230000001070 adhesive effect Effects 0.000 description 1
- 239000003463 adsorbent Substances 0.000 description 1
- 150000001298 alcohols Chemical class 0.000 description 1
- 150000001491 aromatic compounds Chemical class 0.000 description 1
- 239000006227 byproduct Substances 0.000 description 1
- SPTHWAJJMLCAQF-UHFFFAOYSA-M ctk4f8481 Chemical compound [O-]O.CC(C)C1=CC=CC=C1C(C)C SPTHWAJJMLCAQF-UHFFFAOYSA-M 0.000 description 1
- YQHLDYVWEZKEOX-UHFFFAOYSA-N cumene hydroperoxide Chemical compound OOC(C)(C)C1=CC=CC=C1 YQHLDYVWEZKEOX-UHFFFAOYSA-N 0.000 description 1
- XPCJYQUUKUVAMI-UHFFFAOYSA-N cyclohex-2-ene-1-carbaldehyde Chemical compound O=CC1CCCC=C1 XPCJYQUUKUVAMI-UHFFFAOYSA-N 0.000 description 1
- 238000000354 decomposition reaction Methods 0.000 description 1
- 238000007865 diluting Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 150000002118 epoxides Chemical class 0.000 description 1
- 150000002170 ethers Chemical class 0.000 description 1
- 239000012467 final product Substances 0.000 description 1
- 150000004820 halides Chemical class 0.000 description 1
- FUZZWVXGSFPDMH-UHFFFAOYSA-N hexanoic acid Chemical compound CCCCCC(O)=O FUZZWVXGSFPDMH-UHFFFAOYSA-N 0.000 description 1
- 238000005984 hydrogenation reaction Methods 0.000 description 1
- 239000000976 ink Substances 0.000 description 1
- 239000003456 ion exchange resin Substances 0.000 description 1
- 229920003303 ion-exchange polymer Polymers 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 125000001434 methanylylidene group Chemical group [H]C#[*] 0.000 description 1
- 229910052750 molybdenum Inorganic materials 0.000 description 1
- 239000011733 molybdenum Substances 0.000 description 1
- 230000003472 neutralizing effect Effects 0.000 description 1
- 229910052757 nitrogen Inorganic materials 0.000 description 1
- 235000005985 organic acids Nutrition 0.000 description 1
- 239000003973 paint Substances 0.000 description 1
- 230000000704 physical effect Effects 0.000 description 1
- 229920000570 polyether Polymers 0.000 description 1
- 238000006116 polymerization reaction Methods 0.000 description 1
- 230000000379 polymerizing effect Effects 0.000 description 1
- 235000015320 potassium carbonate Nutrition 0.000 description 1
- 229910000027 potassium carbonate Inorganic materials 0.000 description 1
- CZPZWMPYEINMCF-UHFFFAOYSA-N propaneperoxoic acid Chemical compound CCC(=O)OO CZPZWMPYEINMCF-UHFFFAOYSA-N 0.000 description 1
- 238000000746 purification Methods 0.000 description 1
- 230000035484 reaction time Effects 0.000 description 1
- 238000007363 ring formation reaction Methods 0.000 description 1
- 238000007142 ring opening reaction Methods 0.000 description 1
- 150000003839 salts Chemical class 0.000 description 1
- 238000004904 shortening Methods 0.000 description 1
- 239000003381 stabilizer Substances 0.000 description 1
- 239000007858 starting material Substances 0.000 description 1
- 238000003756 stirring Methods 0.000 description 1
- CMPGARWFYBADJI-UHFFFAOYSA-L tungstic acid Chemical compound O[W](O)(=O)=O CMPGARWFYBADJI-UHFFFAOYSA-L 0.000 description 1
- 239000008096 xylene Substances 0.000 description 1
Landscapes
- Epoxy Compounds (AREA)
- Heterocyclic Carbon Compounds Containing A Hetero Ring Having Oxygen Or Sulfur (AREA)
- Compositions Of Macromolecular Compounds (AREA)
- Epoxy Resins (AREA)
Abstract
Description
【発明の詳細な説明】
(産業上の利用分野)
本発明はエポキシ化テトラヒドロベンジルアルコールを
主成分とする新規な組成物に関する。DETAILED DESCRIPTION OF THE INVENTION Field of the Invention The present invention relates to a novel composition based on epoxidized tetrahydrobenzyl alcohol.
さらに詳しくは、主に4種類の化合物の混合物からなる
新規な組成物に関する。More specifically, it relates to a novel composition consisting primarily of a mixture of four types of compounds.
(従来技術)
近年エポキシ化合物は広範な種々の分野で有用性を増し
ており、テトラヒドロベンジルアルコールのごときエチ
レン性不飽和化合物をエポキシ化して得られる化合物は
特に重要性を増してきた。(Prior Art) In recent years, epoxy compounds have become increasingly useful in a wide variety of fields, and compounds obtained by epoxidizing ethylenically unsaturated compounds such as tetrahydrobenzyl alcohol have become particularly important.
その具体例であるエポキシ化されたテトラヒドロヘンシ
ルアルコールは、このエポキシ基を重合させることによ
り水酸基を有するポリエーテル化合物を与えることかで
きる。Epoxidized tetrahydrohensyl alcohol, which is a specific example thereof, can provide a polyether compound having a hydroxyl group by polymerizing the epoxy group.
さらにエポキシ樹脂の希釈剤等に用いられる有用な物質
である。Furthermore, it is a useful substance used as a diluent for epoxy resins.
(発明が解決しようとする課題)
しかしながら、本発明のような主に4種類の化合物の混
合物からなるエポキシ化テトラヒドロヘンシルアルコー
ル
示されていなかった。(Problems to be Solved by the Invention) However, epoxidized tetrahydrohensyl alcohol consisting of a mixture of mainly four types of compounds as in the present invention has not been disclosed.
本発明者は鋭意検討した結果、主に4種類の化合物の混
合物からなるエポキシ化テトラヒドロヘンシルアルコー
ルの組成物か高分子原料や希釈剤として利用することか
できる重要な組成物であることを見出し、本発明を完成
させた。As a result of intensive studies, the present inventor discovered that the composition of epoxidized tetrahydrohensyl alcohol, which is mainly a mixture of four types of compounds, is an important composition that can be used as a polymer raw material or a diluent. , completed the present invention.
(発明の構成)
すなわち、本発明は
[下記−数式( + − 1)
て表される化合物主成分とし、以下の3種類の化を含有
することを特徴とするエポキン化テトラヒドロペンシル
アルコール組成物」
である。(Structure of the Invention) That is, the present invention provides an epochinated tetrahydropencyl alcohol composition comprising a compound represented by the following formula (+-1) as a main component and containing the following three types of compounds. It is.
以下に本発明の主に4種類の化合物の混合物からなるエ
ポキシ化されたテトラヒドロベンジルアルコール組成物
について詳述する。The epoxidized tetrahydrobenzyl alcohol composition of the present invention, which mainly consists of a mixture of four types of compounds, will be described in detail below.
先ず、本発明のエポキシ化テトラヒドロペンシルアルコ
ール(以後ETHBと略す)組成物の製造工程について
説明する。First, the manufacturing process of the epoxidized tetrahydropencyl alcohol (hereinafter abbreviated as ETHB) composition of the present invention will be explained.
反応出発原料となる下記の一般式(11)で表されるテ
トラヒドロベンジルアルコールは無色透明な液体であり
、エポキシ樹脂の中間原料、インキ、塗料、接着剤とし
て用いられている。Tetrahydrobenzyl alcohol represented by the following general formula (11), which is a starting material for the reaction, is a colorless and transparent liquid, and is used as an intermediate material for epoxy resins, inks, paints, and adhesives.
工業的にはテトラヒドロベンジルアルコールはテトラヒ
ドロベンズアルデヒドを触媒存在下において水素添加す
ることにより製造される。Industrially, tetrahydrobenzyl alcohol is produced by hydrogenating tetrahydrobenzaldehyde in the presence of a catalyst.
本発明のエポキシ化テトラヒドロベンジルアルコール(
以後ETHBと略す)組成物中の主成分であるETHB
は前記テトラヒドロベンジルアルコールを酸化剤存在下
エポキシ化することによって製造することかできる。Epoxidized tetrahydrobenzyl alcohol of the present invention (
ETHB, which is the main component in the composition (hereinafter abbreviated as ETHB)
can be produced by epoxidizing the tetrahydrobenzyl alcohol in the presence of an oxidizing agent.
用い得る酸化剤は、不飽和結合をエポキシ化できるもの
なら何でもよく、過ギ酸、過酢酸、過プロピオン酸、m
−クロロ過安息香酸等の有機過酸、ターシャリブチルハ
イドロパーオキシド、クミルハイドロパーオキンド、テ
トラリルハイドロパーオキシド、ジイソプロピルベンゼ
ンハイドロバーオキシド等のハイドロパーオキンド類、
過酸化水素等を例として挙げることができる。Any oxidizing agent that can be used can epoxidize unsaturated bonds, such as performic acid, peracetic acid, perpropionic acid, m
- Organic peracids such as chloroperbenzoic acid, hydroperokinds such as tert-butyl hydroperoxide, cumyl hydroperoxide, tetralyl hydroperoxide, diisopropylbenzene hydroperoxide,
Examples include hydrogen peroxide.
その中でも工業プロセス上有機過酸、中でも過酢酸か最
も好ましい。Among these, organic peracids, especially peracetic acid, are most preferred for industrial processes.
酸化剤は触媒を併用してもよく、例えば有機過酸なら、
炭酸ソーダなとのアルカリや硫酸などの酸を触媒として
用い得る。The oxidizing agent may be used in combination with a catalyst; for example, in the case of an organic peracid,
Alkali such as soda carbonate and acids such as sulfuric acid can be used as catalysts.
同しくハイドロバーオキンドの場合、モリブデンヘキサ
カルボニル等公知の触媒能を持つ化合物を、また過酸化
水素の場合、タングステン酸と苛性ソーダの混合物等公
知の触媒能をもつ化合物を併用することが出来る。Similarly, in the case of hydroburoquinde, a compound having a known catalytic ability such as molybdenum hexacarbonyl can be used in combination, and in the case of hydrogen peroxide, a compound having a known catalytic ability such as a mixture of tungstic acid and caustic soda can be used in combination.
反応は、連続あるいはバッチで行なうが、連続の場合は
ピストンフロー型、式が好ましい。The reaction may be carried out continuously or batchwise, but in the case of continuous reaction, a piston flow type reaction is preferred.
またバッチの場合は有機過酸を遂次的に仕込むセミバッ
チ方式が好ましい。In the case of a batch method, a semi-batch method in which the organic peracid is sequentially charged is preferable.
反応をバッチで行う場合は先ず、反応容器内にテトラヒ
ドロベンジルアルコールを所定量仕込み、この中に必要
に応じて触媒、安定剤を溶解させ、この中に酸化剤を滴
下して行う。When carrying out the reaction in batches, first, a predetermined amount of tetrahydrobenzyl alcohol is charged into a reaction vessel, a catalyst and a stabilizer are dissolved therein as required, and an oxidizing agent is dropped into the reaction vessel.
酸化剤とテトラヒドロベンジルアルコールとのモル比は
理論的には1であるが、本発明のような組成物を製造す
るには実際には0.1〜10の範囲、好ましくは0.5
〜2の範囲、さらに好ましくは0.8〜1.5の範囲で
ある。The molar ratio of oxidizing agent to tetrahydrobenzyl alcohol is theoretically 1, but in practice it is in the range of 0.1 to 10, preferably 0.5 for producing compositions such as the present invention.
-2, more preferably 0.8-1.5.
酸化剤とテトラヒドロベンジルアルコールとのモル比が
10より大きい場合はテトラヒドロベンジルアルコール
の転化率および反応時間短縮、重合によるロスの減少の
点て好ましいが過剰の酸化剤による副反応や酸化剤の選
択率低下および未反応の酸化剤を回収する場合回収に多
大の費用を要するので好ましくない。When the molar ratio of the oxidizing agent and tetrahydrobenzyl alcohol is greater than 10, it is preferable in terms of the conversion rate of the tetrahydrobenzyl alcohol, shortening the reaction time, and reducing losses due to polymerization, but side reactions due to excess oxidizing agent and selectivity of the oxidizing agent may be reduced. It is not preferable to recover the degraded and unreacted oxidizing agent because it requires a great deal of cost.
逆に酸化剤とテトラヒドロベンジルアルコールとのモル
比が0.1以下の場合は酸化剤の転化率、選択率は高く
、酸化剤による生成物の副反応を防ぐという点で好まし
いが、未反応のテトラヒドロベンジルアルコール、の回
収に多大の費用を要するなどの欠点がある。On the other hand, when the molar ratio of the oxidizing agent and tetrahydrobenzyl alcohol is 0.1 or less, the conversion rate and selectivity of the oxidizing agent are high, which is preferable in terms of preventing side reactions of the products caused by the oxidizing agent, but unreacted Tetrahydrobenzyl alcohol has drawbacks such as the high expense required to recover it.
反応温度は、エポキシ化反応が酸化剤の分解反応に優先
するゆうな上限値以下で行い、例えば過酢酸なら70℃
以下、ターシャリブチルハイドロパーオキシドなら15
0℃以下が好ましい。The reaction temperature is below the upper limit where the epoxidation reaction takes precedence over the decomposition reaction of the oxidizing agent, for example, 70°C for peracetic acid.
The following is 15 for tert-butyl hydroperoxide.
The temperature is preferably 0°C or lower.
反応温度が低いと、反応完結に長時間を要するので、過
酢酸なら0℃、タージャリブカルハイドロパーオキシド
なら20℃の下限値以上で行う事が好ましい。If the reaction temperature is low, it will take a long time to complete the reaction, so it is preferable to carry out the reaction at 0° C. for peracetic acid and 20° C. for tajaribucal hydroperoxide.
またエポキシ化の際には酸化剤からの副生等による有機
酸、アルコール、水でエポキシ基がつぶれる副反応が生
じるので、副反応量が少なくなるような温度を先述した
温度領域から選んで反応を実施する。Also, during epoxidation, a side reaction occurs in which the epoxy group is crushed by organic acids, alcohols, and water due to by-products from the oxidizing agent, so select a temperature from the temperature range mentioned above that will reduce the amount of side reaction. Implement.
反応圧力は一般的には常圧下で操作されるが、加圧また
は低圧下でも実施できる。The reaction pressure is generally operated at normal pressure, but it can also be carried out under elevated or low pressure.
また、反応は無溶媒下でも実施できるが溶媒存在下のほ
うが、反応粗液の粘度低下、酸化剤の希釈による安定化
等の効果があるため好ましい。Although the reaction can be carried out in the absence of a solvent, it is preferable to carry out the reaction in the presence of a solvent since this is effective in lowering the viscosity of the reaction crude liquid and stabilizing it by diluting the oxidizing agent.
使用される溶媒としては、ベンゼン、トルエン、キシレ
ン等の芳香族化合物、クロロホルム、ジメチルクロライ
ド、四塩化炭素、クロルベンゼン等のハロゲン化物、酢
酸エチル、酢酸ブチル等のエステル化合物、アセトン、
メチルイソブチルケトン等のケトン化合物、1,2−ジ
メトキシエタン等のエーテル化合物等を用いることが出
来る。Solvents used include aromatic compounds such as benzene, toluene and xylene, halides such as chloroform, dimethyl chloride, carbon tetrachloride and chlorobenzene, ester compounds such as ethyl acetate and butyl acetate, acetone,
Ketone compounds such as methyl isobutyl ketone, ether compounds such as 1,2-dimethoxyethane, etc. can be used.
テトラヒドロベンジルアルコールに対して0゜5〜6倍
量の溶媒を使用することが望ましい。It is desirable to use the solvent in an amount of 0.5 to 6 times the amount of tetrahydrobenzyl alcohol.
0.5倍量より少ない場合、酸化剤の希釈による安定化
効果が少ないため収率の低下を招く。When the amount is less than 0.5 times, the stabilizing effect due to dilution of the oxidizing agent is small, resulting in a decrease in yield.
6倍量より多くしても効果は変わらず、また溶媒の回収
に多大の費用を要するので無駄である。Even if the amount is increased by more than 6 times, the effect remains the same and recovery of the solvent requires a large amount of money, so it is wasteful.
また系内での爆発混合気形成を回避するため、系内に窒
素ガスを吹き込むのが通常である。Furthermore, in order to avoid the formation of an explosive mixture within the system, nitrogen gas is usually blown into the system.
吹き込み位置は、液中に直接吹き込んでも良いし、気相
中に吹き込んでも差しつがいない。The blowing position may be either directly into the liquid or into the gas phase.
吹き込み量は任意に選べるが、多すぎると溶媒ロスとな
る。The amount of blowing can be selected arbitrarily, but too much will result in solvent loss.
反応の終点の確認は残存する酸化剤濃度あるいはガスク
ロ分析によるものがよい。The end point of the reaction can be confirmed by the concentration of the remaining oxidizing agent or by gas chromatography.
反応で得られたエポキシ化生成物反応粗液は、溶媒、低
沸物質、未反応原料、触媒等の低沸点成分の留去、中和
、吸着剤やイオン交換樹脂処理によって精製することが
出来る。The epoxidation product reaction crude liquid obtained in the reaction can be purified by distillation of low-boiling components such as solvents, low-boiling substances, unreacted raw materials, and catalysts, neutralization, and treatment with adsorbents and ion exchange resins. .
精製処理しなくても使用に耐える品質の最終製品が得ら
れる場合は、省略することができる。If a final product of usable quality can be obtained without purification, it can be omitted.
特に、酸化剤として有機過酸を用いる場合、反応粗液を
中和せずに低沸点成分を除去すると、有機酸によるET
HBのエポキシ基の開環、あるいはメチロール基による
環化によってロスが大きくなるので低沸点成分を除去す
る前に中和する方が好ましい。In particular, when using an organic peracid as an oxidizing agent, if low boiling point components are removed without neutralizing the reaction crude liquid, ET due to the organic acid
Since loss increases due to ring opening of the epoxy group of HB or cyclization with the methylol group, it is preferable to neutralize before removing low boiling point components.
中和に用いるアルカリ水溶液としては例えば、N a
OHSK OH−、K 2 CO3、N a 2 CO
3、N a HCO3、K HCO3、N H3等のよ
うな溶液を使用することができ、その際その濃度は広い
範囲内で自由に選択できる。Examples of alkaline aqueous solutions used for neutralization include Na
OHSK OH-, K2CO3, Na2CO
3. Solutions such as N a HCO3, K HCO3, N H3, etc. can be used, the concentrations thereof being freely selectable within wide limits.
分液性あるいはロスの点からNaOH水溶液、Na2c
o、水溶液を用いるのが望ましい。From the viewpoint of liquid separation or loss, NaOH aqueous solution, Na2c
o. It is desirable to use an aqueous solution.
中和水洗工程では、次の脱低沸工程を安定に操作するた
めに有機酸の中和除去とともに、残存有機過酸を除去す
ることが重要である。In the neutralization water washing step, it is important to neutralize and remove the organic acid as well as remove the remaining organic peracid in order to stably operate the next low boiling point removal step.
そのため使用するアルカリ量は、反応粗液中の有機酸量
に対して等量比で0,5〜3倍量、好ましくは0.8〜
1.5倍量使用するのが良く、必要以上に量を増やすの
は経済的でない。Therefore, the amount of alkali used is 0.5 to 3 times, preferably 0.8 to 3 times the equivalent amount of organic acid in the reaction crude liquid.
It is best to use 1.5 times the amount, and it is not economical to increase the amount more than necessary.
また等量比を必要以上に下げた場合、有機酸を除去する
のに多量の水を要するため得策ではないし、また溶媒等
の下層水中への溶媒ロスも増加する。Further, if the equivalence ratio is lowered more than necessary, it is not a good idea because a large amount of water is required to remove the organic acid, and the loss of solvents and the like to the lower water layer also increases.
中和後水洗せずに低沸成分を除去し缶出液を製品とする
と製品中に中和塩が残存することになるので中和後水洗
することが望ましい。If the bottoms are made into a product by removing low-boiling components without washing with water after neutralization, neutralized salts will remain in the product, so it is desirable to wash with water after neutralization.
中和および水洗は、10〜90℃、好ましくは10〜5
0℃の温度範囲で行うのが良い。Neutralization and water washing are carried out at 10-90°C, preferably at 10-5°C.
It is best to carry out the process in a temperature range of 0°C.
また中和水洗時にも爆発混合気形成を回避するために窒
素ガスを吹き込むのか望ましい。It is also desirable to blow nitrogen gas during neutralization washing to avoid the formation of an explosive mixture.
中和あるいは水洗を行った反応粗液から低沸成分を除去
するには薄膜蒸発器などを用いるのかよい。A thin film evaporator or the like may be used to remove low-boiling components from the reaction crude liquid that has been neutralized or washed with water.
脱低沸工程での加熱温度は、50〜180℃、好ましく
は80〜100℃で行うのかよい。The heating temperature in the low-boiling removal step may be 50 to 180°C, preferably 80 to 100°C.
圧力は低沸成分の物性によって任意に選べるが加熱温度
との関係で減圧で操作するのが一般的である。Although the pressure can be arbitrarily selected depending on the physical properties of the low-boiling components, it is common to operate under reduced pressure depending on the heating temperature.
また系内での爆発混合気形成を回避するため、あるいは
低沸成分を留出しやすくするため系内に窒素を吹き込む
のが通常である。In addition, nitrogen is usually blown into the system in order to avoid the formation of an explosive mixture within the system or to facilitate the distillation of low-boiling components.
吹き込み位置は、任意に選べるが塔底液が留出するライ
ンから吹き込むのが普通である。The blowing position can be selected arbitrarily, but the blowing is usually carried out from the line where the bottom liquid is distilled off.
吹き込み量は任意に選べるが、上限量は真空系の能力、
あるいは塔底液が安定して流下するかどうか、あるいは
留出した低沸点成分をコンデンサーで捕集する際の回収
ロスという観点から自ずと−12=
制限される。The amount of blowing can be selected arbitrarily, but the upper limit depends on the capacity of the vacuum system,
Alternatively, -12= is naturally limited from the viewpoint of whether the bottom liquid flows down stably or the recovery loss when collecting the distilled low-boiling components with a condenser.
このようにして得られる塔底液は、4種類の組成物の純
度的に95〜96%と製品並であるか、若干濁りがあり
さらに高純度の製品を得るために高沸成分を除去する。The bottom liquid obtained in this way has a purity of 95 to 96% of the four types of composition, which is the same level as the product, or is slightly cloudy, and high-boiling components are removed to obtain a product of higher purity. .
脱高沸工程は、脱低沸工程と同様に行うが、さらに減圧
度あるいは加熱温度を増して留出液として製品を得るの
が一般的である。The high-boiling removal step is carried out in the same manner as the low-boiling removal step, but the degree of reduced pressure or heating temperature is generally increased to obtain a product as a distillate.
次に、製品化したETHB組成物について述べる。主成
分であるETHBは下記一般式(1−1)%式%
研究の結果、ETHB組成物中には、メチロール(CH
20H)酸素が分子内てエポキシ炭素を攻撃し環化した
ビシクロ化合物[下記一般式(1−2)、(1−3)で
表される]
やエポキシ基が分子内移動
した化合物[下記一般式(1−4)で表される]等が含
まれることが明らかになった。Next, the commercialized ETHB composition will be described. The main component, ETHB, has the following general formula (1-1)% Formula% As a result of research, ETHB composition contains methylol (CH
20H) Bicyclo compounds in which oxygen attacks the epoxy carbon in the molecule and cyclizes [represented by the following general formulas (1-2) and (1-3)] and compounds in which the epoxy group moves within the molecule [represented by the following general formulas] (1-4)] etc. were found to be included.
ビシクロ化合物の−っである( 1−2)は、ETHB
(+−1)に熱を加えることによって容易に形成され
ることが判明した。- of the bicyclo compound (1-2) is ETHB
It was found that it is easily formed by applying heat to (+-1).
もう一つのビシクロ化合物である( 1−3)は(I−
2)に比べて歪みエネルギーが大きく環構造として不安
定なので形成されにくいと考えられる。Another bicyclo compound (1-3) is (I-
Compared to 2), the strain energy is large and the ring structure is unstable, so it is thought that it is difficult to form.
また前記エポキシ化反応において、酢酸エチル等による
希釈倍率をさげると、ETHB組成物中に占める化合物
(+−2)、(1−4>の割合が増加する。Furthermore, in the epoxidation reaction, when the dilution ratio with ethyl acetate or the like is reduced, the proportion of compounds (+-2) and (1-4>) in the ETHB composition increases.
これらの化合物(1−2)、(1−3)および(1−4
)の中では(1−2)および(1−4)が生成しやすい
。These compounds (1-2), (1-3) and (1-4
), (1-2) and (1-4) are likely to be produced.
なお、酸化剤として有機過酸を用いた場合、中和工程を
省き、そのまま脱低沸工程を行うと、ETHB組成物中
にビシクロ化合物(+−2>が多く含まれるようになる
。In addition, when an organic peracid is used as an oxidizing agent, if the neutralization step is omitted and the low-boiling removal step is directly performed, the ETHB composition will contain a large amount of bicyclo compounds (+-2>).
なお、(+−1) 、(1−2) 、(1−3)および
(1−4)それぞれの含有量の確認はガスクロマトグラ
フィー、1H−NMRおよび13C−NMRを使用して
行なうことができる。The content of (+-1), (1-2), (1-3) and (1-4) can be confirmed using gas chromatography, 1H-NMR and 13C-NMR. can.
(1−1)はガスクロマトグラフィーのリテンションタ
イム10.9.11.2分の二本のピークより、1H−
NMRのメチロール水素および水酸基に対応する3、3
および4.2ppmのピーク、さらに、エポキシドの水
添を示す3.2ppmのピークより、”’C−NMRの
メチロール炭素を示す67.0ppmのピーク、エポキ
シ炭素を示す51.0.53.2ppmのピーク、エポ
キシ炭素以外のシクロへキシル環状炭素を示す23.8
.24.0.28.8.36.0ppmのピークにより
確認できる。(1-1) is 1H-
3,3 corresponding to NMR methylol hydrogen and hydroxyl groups
and 4.2 ppm peak, furthermore, from the 3.2 ppm peak indicating hydrogenation of epoxide, the 67.0 ppm peak indicating methylol carbon in "'C-NMR," and the 51.0 ppm peak indicating epoxy carbon. peak, 23.8 indicating cyclohexyl cyclic carbon other than epoxy carbon
.. It can be confirmed by the peak at 24.0.28.8.36.0 ppm.
(+−2)はガスクロマトグラフィーのリテンションタ
イム8.5のピークより、 ’H−NMRのエーテルメ
チレンのプロトンを示す3.80ppmのピークおよび
その他2.33.3.57ppmのピークより、”’C
−NMRのエーテルメチレンを示す71.3ppmのピ
ーク、アルコールのメチンを示す68.2ppmのピー
クにより確認できる。(+-2) is from the peak at retention time 8.5 in gas chromatography, 'H-NMR peak at 3.80 ppm indicating ether methylene protons and other peaks at 2.33, 3.57 ppm,'' C
This can be confirmed by the -NMR peak at 71.3 ppm indicating ether methylene and the peak at 68.2 ppm indicating methine alcohol.
(+−3)はガスクロマトグラフィーのリテンションタ
イム6.5のピークより、 ’H−NMRのエーテルメ
チレンのプロトンを示す3.80ppm付近のピークよ
り、13C−NMRのエーテルメチレンを示す71.0
ppmのピーク、アルコールのメチンを示す68.9p
pmのピークにより確認できる。(+-3) is from the peak at retention time 6.5 in gas chromatography, and from the peak around 3.80 ppm which indicates protons of ether methylene in H-NMR, 71.0 indicates ether methylene in 13C-NMR.
ppm peak, 68.9p indicating alcohol methine
This can be confirmed by the pm peak.
(1−4)はガスクロマトグラフィーのリテンションタ
イム8.9のピークより、 ’H−NMRのメチロール
水素および水酸基を示す3.3ppm。(1-4) is 3.3 ppm, which indicates methylol hydrogen and hydroxyl group in 'H-NMR, from the peak at retention time 8.9 in gas chromatography.
4.2ppmの二本のピークより、13C−NMRのメ
チロール炭素を示す67.2ppmのピーク、エポキシ
炭素以外のシクロヘキシル環状炭素を示す21.0.2
5,0.28.0.32.Qppmのピークにより確認
できる。From the two peaks at 4.2 ppm, the peak at 67.2 ppm indicates methylol carbon in 13C-NMR, and the peak at 21.0.2 indicates cyclohexyl cyclic carbon other than epoxy carbon.
5,0.28.0.32. This can be confirmed by the Qppm peak.
本発明のエポキシ化テトラヒドロベンジルアルコール組
成物中の各成分の生成比率は概略以下の範囲の数値内で
コントロールすることができる。The production ratio of each component in the epoxidized tetrahydrobenzyl alcohol composition of the present invention can be roughly controlled within the numerical ranges below.
(1−1) : 93〜97重量%
(1−2) : 1. 0〜2.5重量%(1−3)
: 0. 1〜2.0重量%(1−4) 20.
5〜4.0重量%〔実施例1〕
水冷用のジャケット付きの内容量8gの反応器にテトラ
ヒドロベンジルアルコール770g、酢酸エチル320
0gを加えた後、過酢酸の30%酢酸エチル溶液196
5gを4時間かけて滴下した。滴下中は反応温度が30
℃を保つようにジャケットに流す温水の温度を調節した
。(1-1): 93-97% by weight (1-2): 1. 0-2.5% by weight (1-3)
: 0. 1-2.0% by weight (1-4) 20.
5 to 4.0% by weight [Example 1] 770 g of tetrahydrobenzyl alcohol and 320 g of ethyl acetate were placed in a reactor with a capacity of 8 g and equipped with a jacket for water cooling.
After adding 0 g, 30% peracetic acid solution in ethyl acetate 196
5 g was added dropwise over 4 hours. During the dropwise addition, the reaction temperature was 30°C.
The temperature of the hot water flowing into the jacket was adjusted to maintain the temperature at ℃.
滴下終了後も反応液温度を30℃に4時間保ち反応を終
了した。Even after the dropwise addition was completed, the temperature of the reaction solution was maintained at 30° C. for 4 hours to complete the reaction.
テトラヒドロベンジルアルコール基準転化率は98%、
エポキシシクロヘキセンアルコール基準選択率は98%
、収率は96%であった。Conversion rate based on tetrahydrobenzyl alcohol is 98%,
Epoxycyclohexene alcohol standard selection rate is 98%
The yield was 96%.
反応粗液5935gを室温まで冷却後、20%NaOH
水溶液2057gを加え1時間攪拌後、30分間静置し
て分液させる。After cooling 5935 g of the reaction crude liquid to room temperature, 20% NaOH
Add 2057 g of the aqueous solution and stir for 1 hour, then leave to stand for 30 minutes to separate the liquids.
分液後、上層液の低沸成分の除去を行った。After separation, low-boiling components of the upper layer liquid were removed.
低沸成分の除去はガラス製スミス式薄膜蒸発器を用い、
圧力150To r r、加熱温度90〜95℃で、塔
底液留出ラインから窒素ガス5ONρ/Hrで仕込んだ
。A glass Smith-type thin film evaporator is used to remove low-boiling components.
At a pressure of 150 Torr and a heating temperature of 90 to 95° C., nitrogen gas was supplied from the bottom liquid distillation line at 5 ON ρ/Hr.
高沸成分の除去もガラス製スミス式薄膜蒸発器を用い圧
力2To r r、加熱温度150℃の条件で行った。High-boiling components were also removed using a glass Smith type thin film evaporator under conditions of a pressure of 2 Torr and a heating temperature of 150°C.
ガスクロマトグラフィー分析の結果、製品の純度は97
%であった。As a result of gas chromatography analysis, the purity of the product is 97.
%Met.
エポキシ化テトラヒドロベンジルアルコール組成物中の
各成分の生成比率は以下の通りであった。The production ratio of each component in the epoxidized tetrahydrobenzyl alcohol composition was as follows.
(1−1,) : 96. 5重量%(1−2)
+ 2. 5重量%
(1−3) : 0. 1重量%
(1−4) : 0.9重量%
〔実施例2〕
反応温度を25℃とした以外は、実施例コと同様の操作
を行った。(1-1,): 96. 5% by weight (1-2)
+2. 5% by weight (1-3): 0. 1% by weight (1-4): 0.9% by weight [Example 2] The same operation as in Example 2 was performed except that the reaction temperature was 25°C.
収率は89%であった。The yield was 89%.
エポキシ化テトラヒドロベンジルアルコール組成物中の
各成分の生成比率は以下の通りであった。The production ratio of each component in the epoxidized tetrahydrobenzyl alcohol composition was as follows.
(1−1) : 93. 5重量%
(+−2) ・2.0重量%
(1−3) ・2.0重量%
(+−4) : 2. 5重量%
〔実施例3〕
過酢酸の30%酢酸エチル水溶液871g以外は実施例
2と同様の操作を行った。(1-1): 93. 5% by weight (+-2) ・2.0% by weight (1-3) ・2.0% by weight (+-4): 2. 5% by weight [Example 3] The same operation as in Example 2 was performed except for using 871 g of a 30% aqueous solution of peracetic acid in ethyl acetate.
エポキシシクロヘキセンアルコール基準選択率は、95
%であった。Epoxycyclohexene alcohol standard selectivity is 95
%Met.
エポキシ化テトラヒドロヘンシルアルコール刊成物中の
各成分の生成比率は以下の通りであった。The production ratio of each component in the epoxidized tetrahydrohensyl alcohol product was as follows.
(I−1) : 95. 0重量%
(1−2) : 1. 2重量%
(1−3) : 1. 0重量%
(1−4) : 2. 8重量%
〔実施例4〕
過酢酸の30%酢酸エチル水溶液349g以外は実施例
2と同様の操作を行った。(I-1): 95. 0% by weight (1-2): 1. 2% by weight (1-3): 1. 0% by weight (1-4): 2. 8% by weight [Example 4] The same operation as in Example 2 was performed except for using 349 g of a 30% aqueous solution of peracetic acid in ethyl acetate.
エポキシシクロヘキセンアルコール基準選択率は、10
0%であった。Epoxycyclohexene alcohol standard selectivity is 10
It was 0%.
エポキシ化テトラヒドロヘンシルアルコール組成物中の
各成分の生成比率は以下の通りであった。The production ratio of each component in the epoxidized tetrahydrohensyl alcohol composition was as follows.
(1−1,): 94.0重量% (1−2) + 1.5重量% (1−3)’ : 0. 5重量% (1−4) :、4. 0重量%(1-1,): 94.0% by weight (1-2) + 1.5% by weight (1-3)’: 0. 5% by weight (1-4):, 4. 0% by weight
第1図は〔実施例1〕における組成物をガスクロマトグ
ラフで分析した結果を示すチャー1・である。第2図は
同組成物を1H−NMRで分析した結果を示すチャート
である。
第3図は同組成物を C−NMRて分析した結果を示す
チャートである。FIG. 1 is Char 1 showing the results of gas chromatograph analysis of the composition in [Example 1]. FIG. 2 is a chart showing the results of 1H-NMR analysis of the same composition. FIG. 3 is a chart showing the results of C-NMR analysis of the same composition.
Claims (1)
) で表される化合物主成分とし、以下の3種類の化合物 ▲数式、化学式、表等があります▼・・・・( I −2
) ▲数式、化学式、表等があります▼・・・・( I −3
) を含有することを特徴とするエポキシ化テトラヒドロベ
ンジルアルコール組成物。[Claims] The following general formula ( I -1) ▲ There are mathematical formulas, chemical formulas, tables, etc. ▼... ( I -1
) The main component is the compound represented by the following three types of compounds ▲ There are mathematical formulas, chemical formulas, tables, etc. ▼... ( I -2
) ▲There are mathematical formulas, chemical formulas, tables, etc.▼・・・( I -3
) An epoxidized tetrahydrobenzyl alcohol composition comprising:
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2334995A JP2990680B2 (en) | 1990-11-30 | 1990-11-30 | Method for producing epoxidized tetrahydrobenzyl alcohol composition |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2334995A JP2990680B2 (en) | 1990-11-30 | 1990-11-30 | Method for producing epoxidized tetrahydrobenzyl alcohol composition |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPH04208272A true JPH04208272A (en) | 1992-07-29 |
| JP2990680B2 JP2990680B2 (en) | 1999-12-13 |
Family
ID=18283556
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2334995A Expired - Fee Related JP2990680B2 (en) | 1990-11-30 | 1990-11-30 | Method for producing epoxidized tetrahydrobenzyl alcohol composition |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP2990680B2 (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2006328339A (en) * | 2005-04-28 | 2006-12-07 | Konica Minolta Medical & Graphic Inc | Polymerizable composition, polymerization method, polymerizable ink, image forming method using the same, inkjet printer and epoxy compound |
-
1990
- 1990-11-30 JP JP2334995A patent/JP2990680B2/en not_active Expired - Fee Related
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2006328339A (en) * | 2005-04-28 | 2006-12-07 | Konica Minolta Medical & Graphic Inc | Polymerizable composition, polymerization method, polymerizable ink, image forming method using the same, inkjet printer and epoxy compound |
Also Published As
| Publication number | Publication date |
|---|---|
| JP2990680B2 (en) | 1999-12-13 |
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