JPH04118509A - Fluorescent x-ray film thickness measuring method - Google Patents
Fluorescent x-ray film thickness measuring methodInfo
- Publication number
- JPH04118509A JPH04118509A JP23866790A JP23866790A JPH04118509A JP H04118509 A JPH04118509 A JP H04118509A JP 23866790 A JP23866790 A JP 23866790A JP 23866790 A JP23866790 A JP 23866790A JP H04118509 A JPH04118509 A JP H04118509A
- Authority
- JP
- Japan
- Prior art keywords
- film thickness
- fluorescent
- measuring
- calibration curve
- analytical
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 238000000034 method Methods 0.000 title description 9
- 238000011088 calibration curve Methods 0.000 claims description 23
- 239000010408 film Substances 0.000 claims description 23
- 238000005259 measurement Methods 0.000 claims description 5
- 239000010409 thin film Substances 0.000 claims description 4
- 239000011159 matrix material Substances 0.000 claims description 3
- 238000010521 absorption reaction Methods 0.000 description 2
- 229910002056 binary alloy Inorganic materials 0.000 description 2
- 238000000691 measurement method Methods 0.000 description 2
- 239000002356 single layer Substances 0.000 description 2
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 1
- ATJFFYVFTNAWJD-UHFFFAOYSA-N Tin Chemical compound [Sn] ATJFFYVFTNAWJD-UHFFFAOYSA-N 0.000 description 1
- 229910045601 alloy Inorganic materials 0.000 description 1
- 239000000956 alloy Substances 0.000 description 1
- 238000007796 conventional method Methods 0.000 description 1
- 229910052802 copper Inorganic materials 0.000 description 1
- 239000010949 copper Substances 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 239000002355 dual-layer Substances 0.000 description 1
- MSNOMDLPLDYDME-UHFFFAOYSA-N gold nickel Chemical compound [Ni].[Au] MSNOMDLPLDYDME-UHFFFAOYSA-N 0.000 description 1
- 239000010410 layer Substances 0.000 description 1
Landscapes
- Analysing Materials By The Use Of Radiation (AREA)
- Length-Measuring Devices Using Wave Or Particle Radiation (AREA)
Abstract
Description
【発明の詳細な説明】
〔産業上の利用分野〕
本発明は、あらかじめ膜厚既知試料によってケイ光Ｘ線
強度と膜厚の関係を検量線として用、音し、これに基づ
いて膜厚測定を実施するケイ光Ｘ線膜厚測定方法に関す
る。[Detailed Description of the Invention] [Industrial Application Field] The present invention uses the relationship between fluorescent X-ray intensity and film thickness as a calibration curve using a sample whose film thickness is known in advance, and measures the film thickness based on this. The present invention relates to a fluorescent X-ray film thickness measurement method.
ケイ光Ｘ線膜厚測定法には、装置定数等により理論的に
ケイ光Ｘ線強度のみから膜厚を求めるファンダメンタル
・パラメータ法と、あらかじめ膜厚既知試料によってケ
イ光Ｘ線強度と膜厚の関係を求めておき、これに基づい
て膜厚を求める検量線法の２ｉｊｌｌりがあるが、ケイ
光Ｘ線膜厚測定装置に広く利用されているのは検量線法
である。Fluorescent X-ray film thickness measurement methods include the fundamental parameter method, which theoretically calculates the film thickness from only the fluorescent X-ray intensity using equipment constants, etc., and the fundamental parameter method, which calculates the film thickness from only the fluorescent X-ray intensity using a known film thickness sample. There are several calibration curve methods in which the relationship is determined and the film thickness is determined based on this, but the calibration curve method is widely used in fluorescent X-ray film thickness measuring devices.
ケイ光Ｘ線の場合、マトリックス効果があり、−元素系
の薄膜でも膜厚とケイ光Ｘ線強度の関係は直線にならず
、指数関数で表現される。従って単層膜でも、第１図に
示すように膜厚既知試料を最低３種必要とし、これが二
元系ともなると８〜１０種類必要となってくる。これを
使用する装置毎に用意し、Ｘ線管球の寿命や、検出器の
寿命や、温度特性等の経時変化は特定の元素によって校
正する方法を採用している。In the case of fluorescent X-rays, there is a matrix effect, and the relationship between the film thickness and the fluorescent X-ray intensity is not a straight line, even for -element-based thin films, but is expressed by an exponential function. Therefore, even for a single layer film, at least three types of samples with known film thicknesses are required, as shown in FIG. 1, and for a binary system, eight to ten types are required. This is prepared for each device that uses it, and the lifespan of the X-ray tube, the lifespan of the detector, and changes over time in temperature characteristics are calibrated using specific elements.
従来の方法では、２層薄膜測定や２元合金薄膜測定を実
施する前に、あらかしめ８〜１０種類の標準試料を測定
する必要があり、この検量線作成の為に長時間を要して
いた。With conventional methods, it is necessary to measure 8 to 10 types of standard samples before performing dual-layer thin film measurement or binary alloy thin film measurement, and it takes a long time to create this calibration curve. Ta.
本発明はかかる事情に鑑みてなされたものであり、装置
が異なっても利用できる検量線データヘスを用意して、
数点測定するだけで複数種の正確な膜厚測定用検量線を
作成する方法であり、膜厚測定のための準備時間を短縮
し、正確な膜厚測定法を提供することを目的とする。The present invention has been made in view of such circumstances, and it provides calibration curve data that can be used even if different devices are used.
This method creates accurate calibration curves for measuring multiple types of film thickness by just measuring a few points, and aims to shorten the preparation time for film thickness measurement and provide an accurate method for measuring film thickness. .
本発明はケイ光Ｘ線のマトリックス効果で表現される吸
収係数を物理的な定数と仮定し、−度作成した検量線の
傾きは装置が異なっても同等であるとして、原器で作成
した膜厚とＸ線強度の関係をデータベース検量線とし、
装置の構造が変わらない限り、これを他の全ての装置で
利用するものとし、複数の無限厚試料を測定することに
よって校正しうろことを特徴とするケイ光Ｘ線膜厚測定
用検量線作成方法。The present invention assumes that the absorption coefficient expressed by the matrix effect of fluorescent The relationship between thickness and X-ray intensity is used as a database calibration curve,
As long as the structure of the device remains unchanged, this will be used in all other devices, and will be calibrated by measuring multiple infinitely thick samples to create a calibration curve for fluorescent X-ray film thickness measurement characterized by scales. Method.
ｒ実施例〕 以下本発明を凹面に基づき具体的に説明する。r Example] The present invention will be specifically explained below based on a concave surface.
従来は、第１図に示すような膜厚Ｘ ６． Ｘ ＋ 、
Ｘ ｓとＸ線強度１ｏ、ｒ；、Ｉｓまたは強度比Ｒ，＝
Ｏ，Ｒ，。Conventionally, the film thickness was as shown in FIG. X+,
X s and X-ray intensity 1o, r;, Is or intensity ratio R, =
O,R,.
Ｒｓ ＝１の検量線を装置毎に作成していた。本発明に
おいては、ある原器で１゜、Ｉｓおよび１１ ：ｘｌの
関係を求めデータベース検量線とし、個々の装置ではＩ
。とＩ、のみ測定するだけで校正し、その装置の検量線
とする。Ｒ１とＸｌの関係は、−次Ｘ線の照射面積（コ
リメータ・サイズ）によって限定されず、ｆｏとＩ、を
再測定するだけで検量線の傾きμ（吸収係数）を求め直
すことができる。A calibration curve with Rs = 1 was created for each device. In the present invention, the relationship between 1°, Is, and 11:xl is determined with a certain prototype and used as a database calibration curve, and the I
. Calibrate by simply measuring and I, and use it as the calibration curve for the device. The relationship between R1 and Xl is not limited by the -order X-ray irradiation area (collimator size), and the slope μ (absorption coefficient) of the calibration curve can be recalculated simply by remeasuring fo and I.
この際、測定する試料を例えば、銅、ニッケル金、錫、
鉛の５種類とすると、第２図に示す実施例のように、あ
らかしめ用意されているデータベースが単層３種、二層
２種、合金２種とすると、これら７種の検量線が作成可
能となる。At this time, the sample to be measured is, for example, copper, nickel gold, tin,
Assuming that there are 5 types of lead, and as in the example shown in Figure 2, the pre-prepared database includes 3 types of single layer, 2 types of double layer, and 2 types of alloy, then a calibration curve for these 7 types will be created. It becomes possible.
以上詳述した如く、本発明により従来の検量線法を実施
する場合に比べて、検量線作成の為の標準試料の数を凍
らすことができ、複数個の無限厚試料を測定するだけで
、予め用意されている複数種のデータベース検量線を校
正し使用できることから、検量線作成に要していた時間
を短縮でき、更に操作が簡単になる等、優れた効果を奏
する。As described in detail above, the present invention makes it possible to freeze the number of standard samples for creating a calibration curve compared to the case of implementing the conventional calibration curve method, and it is possible to freeze the number of standard samples for creating a calibration curve by simply measuring a plurality of infinitely thick samples. Since it is possible to calibrate and use a plurality of pre-prepared database calibration curves, the time required to create the calibration curve can be shortened, and furthermore, the operation can be simplified, and other excellent effects can be achieved.
第１図は検量線の概念図であり、第２図は本発明の一実
施例の校正用標準試料と、それにより校正可能なデータ
ベースの種類を示す。
以上FIG. 1 is a conceptual diagram of a calibration curve, and FIG. 2 shows a standard sample for calibration according to an embodiment of the present invention and the types of databases that can be calibrated using the standard sample. that's all
Claims (1)
るケイ光Ｘ線を検出するＸ線検出器と、得られたケイ光
Ｘ線強度から薄膜の膜厚を計算する膜厚演算部からなる
ケイ光Ｘ線膜厚測定装置において、膜厚演算手段として
、ケイ光Ｘ線のマトリックス効果を考慮した指数関数的
演算式より求められる検量線定数を、ある原器で測定し
求め、膜厚と無限厚強度比の関係は物理的な不変定数と
した検量線データベースとし、次に別の装置でこのデー
タベースと無限厚サンプルの測定のみで膜厚検量線を校
正しうる膜厚測定用検量線作成方法。An X-ray generator that irradiates the sample with X-rays, an X-ray detector that detects the fluorescent X-rays emitted from the sample, and a film thickness calculation that calculates the thickness of the thin film from the obtained fluorescent X-ray intensity. In a fluorescent X-ray film thickness measuring device consisting of a film thickness calculation means, a calibration curve constant obtained from an exponential calculation formula that takes into account the matrix effect of fluorescent X-rays is determined by measuring with a certain prototype, The relationship between the film thickness and the infinite thickness intensity ratio is set as a calibration curve database with a physically invariant constant, and then the film thickness calibration curve can be calibrated using only this database and measurements of infinite thickness samples using another device. How to create a calibration curve.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2238667A JP3018043B2 (en) | 1990-09-07 | 1990-09-07 | Calibration curve creation method for film thickness measurement |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2238667A JP3018043B2 (en) | 1990-09-07 | 1990-09-07 | Calibration curve creation method for film thickness measurement |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPH04118509A true JPH04118509A (en) | 1992-04-20 |
| JP3018043B2 JP3018043B2 (en) | 2000-03-13 |
Family
ID=17033533
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2238667A Expired - Lifetime JP3018043B2 (en) | 1990-09-07 | 1990-09-07 | Calibration curve creation method for film thickness measurement |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP3018043B2 (en) |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US7666490B1 (en) | 1999-02-10 | 2010-02-23 | Toyo Boseki Kabushiki Kaisha | Functional roll film and vacuum evaporation apparatus capable of producing the functional roll film |
| WO2022091597A1 (en) * | 2020-10-30 | 2022-05-05 | 株式会社リガク | Fluorescent x-ray analysis device |
-
1990
- 1990-09-07 JP JP2238667A patent/JP3018043B2/en not_active Expired - Lifetime
Cited By (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US7666490B1 (en) | 1999-02-10 | 2010-02-23 | Toyo Boseki Kabushiki Kaisha | Functional roll film and vacuum evaporation apparatus capable of producing the functional roll film |
| WO2022091597A1 (en) * | 2020-10-30 | 2022-05-05 | 株式会社リガク | Fluorescent x-ray analysis device |
| JP2022073174A (en) * | 2020-10-30 | 2022-05-17 | 株式会社リガク | X-ray fluorescence analyzer |
| CN114868013A (en) * | 2020-10-30 | 2022-08-05 | 株式会社理学 | Fluorescent X-ray analyzer |
| CN114868013B (en) * | 2020-10-30 | 2022-12-20 | 株式会社理学 | Fluorescent X-ray analyzer |
| US11656190B2 (en) | 2020-10-30 | 2023-05-23 | Rigaku Corporation | X-ray fluorescence spectrometer |
Also Published As
| Publication number | Publication date |
|---|---|
| JP3018043B2 (en) | 2000-03-13 |
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