JP7245093B2 - 光学キット、及び、光学装置 - Google Patents
光学キット、及び、光学装置 Download PDFInfo
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- JP7245093B2 JP7245093B2 JP2019056343A JP2019056343A JP7245093B2 JP 7245093 B2 JP7245093 B2 JP 7245093B2 JP 2019056343 A JP2019056343 A JP 2019056343A JP 2019056343 A JP2019056343 A JP 2019056343A JP 7245093 B2 JP7245093 B2 JP 7245093B2
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- 230000003287 optical effect Effects 0.000 title claims description 173
- 230000007246 mechanism Effects 0.000 claims description 30
- 210000000554 iris Anatomy 0.000 description 72
- 238000000034 method Methods 0.000 description 28
- 238000012544 monitoring process Methods 0.000 description 11
- 238000003754 machining Methods 0.000 description 7
- 230000008569 process Effects 0.000 description 7
- 230000008859 change Effects 0.000 description 4
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 description 2
- 239000010931 gold Substances 0.000 description 2
- 229910052737 gold Inorganic materials 0.000 description 2
- 238000004611 spectroscopical analysis Methods 0.000 description 2
- 230000008901 benefit Effects 0.000 description 1
- 239000011248 coating agent Substances 0.000 description 1
- 238000000576 coating method Methods 0.000 description 1
- 238000006073 displacement reaction Methods 0.000 description 1
- 238000005259 measurement Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000010355 oscillation Effects 0.000 description 1
- SBIBMFFZSBJNJF-UHFFFAOYSA-N selenium;zinc Chemical compound [Se]=[Zn] SBIBMFFZSBJNJF-UHFFFAOYSA-N 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
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Classifications
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S5/00—Semiconductor lasers
- H01S5/10—Construction or shape of the optical resonator, e.g. extended or external cavity, coupled cavities, bent-guide, varying width, thickness or composition of the active region
- H01S5/14—External cavity lasers
- H01S5/141—External cavity lasers using a wavelength selective device, e.g. a grating or etalon
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
- H01S3/05—Construction or shape of optical resonators; Accommodation of active medium therein; Shape of active medium
- H01S3/08—Construction or shape of optical resonators or components thereof
- H01S3/08018—Mode suppression
- H01S3/0804—Transverse or lateral modes
- H01S3/0805—Transverse or lateral modes by apertures, e.g. pin-holes or knife-edges
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
- H01S3/10—Controlling the intensity, frequency, phase, polarisation or direction of the emitted radiation, e.g. switching, gating, modulating or demodulating
- H01S3/105—Controlling the intensity, frequency, phase, polarisation or direction of the emitted radiation, e.g. switching, gating, modulating or demodulating by controlling the mutual position or the reflecting properties of the reflectors of the cavity, e.g. by controlling the cavity length
- H01S3/1055—Controlling the intensity, frequency, phase, polarisation or direction of the emitted radiation, e.g. switching, gating, modulating or demodulating by controlling the mutual position or the reflecting properties of the reflectors of the cavity, e.g. by controlling the cavity length one of the reflectors being constituted by a diffraction grating
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S5/00—Semiconductor lasers
- H01S5/02—Structural details or components not essential to laser action
- H01S5/022—Mountings; Housings
- H01S5/023—Mount members, e.g. sub-mount members
- H01S5/02325—Mechanically integrated components on mount members or optical micro-benches
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S5/00—Semiconductor lasers
- H01S5/30—Structure or shape of the active region; Materials used for the active region
- H01S5/34—Structure or shape of the active region; Materials used for the active region comprising quantum well or superlattice structures, e.g. single quantum well [SQW] lasers, multiple quantum well [MQW] lasers or graded index separate confinement heterostructure [GRINSCH] lasers
- H01S5/3401—Structure or shape of the active region; Materials used for the active region comprising quantum well or superlattice structures, e.g. single quantum well [SQW] lasers, multiple quantum well [MQW] lasers or graded index separate confinement heterostructure [GRINSCH] lasers having no PN junction, e.g. unipolar lasers, intersubband lasers, quantum cascade lasers
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- Physics & Mathematics (AREA)
- Electromagnetism (AREA)
- Optics & Photonics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- Plasma & Fusion (AREA)
- Semiconductor Lasers (AREA)
- Diffracting Gratings Or Hologram Optical Elements (AREA)
Description
Claims (6)
- レーザ光を出力するレーザ光源の外部共振器を含む光学系を構成するための光学キットであって、
主面を含むベースと、
前記主面に設けられ、前記光学系を前記ベースに対する所定の位置に固定可能に保持するための保持部と、を備え、
前記光学系は、
第1方向に前記レーザ光が入力されるレンズと、
前記レンズを通過した前記レーザ光の回折光を第1方向に交差する第2方向に反射する反射型回折格子、及び前記反射型回折格子からの前記回折光を前記第1方向と反対の第3方向に反射するミラーとからなるコーナーリフレクタと、
前記コーナーリフレクタがない場合に前記レンズを通過した前記レーザ光が通過する光学開口を形成するように配置された第1開口部材と、
前記コーナーリフレクタからの前記回折光が順に通過する光学開口を形成するように前記第3方向に配列される第2開口部材及び第3開口部材と、を含み、
前記保持部は、
前記レンズを保持するためのレンズ保持部、
前記コーナーリフレクタを保持するためのリフレクタ保持部と、
前記第1開口部材を保持するための第1開口部材保持部と、
前記第2開口部材を保持するための第2開口部材保持部と、
前記第3開口部材を保持するための第3開口部材保持部と、を有し、
前記リフレクタ保持部は、
前記コーナーリフレクタの全体を前記主面に沿って回動可能に保持する第1機構と、
前記反射型回折格子及び前記ミラーのそれぞれにおいて、前記回折光の光軸を調整可能とする第2機構と、含む、
光学キット。 - 前記第2機構は、前記反射型回折格子及び前記ミラーのそれぞれを、互に独立して前記主面に沿った回転軸の周りに回動可能に保持することにより、前記回折光の光軸を調整可能とする、
請求項1に記載の光学キット。 - 前記リフレクタ保持部は、前記反射型回折格子が前記主面に沿って回動しないように前記反射型回折格子を保持すると共に、前記ミラーが独立して前記主面に沿って回動するように前記ミラーを保持する第3機構をさらに含む、
請求項1又は2に記載の光学キット。 - 前記リフレクタ保持部は、前記コーナーリフレクタを前記第2方向に沿って移動可能に保持する第4機構をさらに含む、
請求項1~3のいずれか一項に記載の光学キット。 - 前記レーザ光源を保持するための光源保持部をさらに備える、
請求項1~4のいずれか一項に記載の光学キット。 - 請求項1~5のいずれか一項に記載の光学キットと、
前記レンズ保持部に保持された前記レンズと、
前記リフレクタ保持部に保持された前記コーナーリフレクタと、
前記第1開口部材保持部に保持された前記第1開口部材と、
前記第2開口部材保持部に保持された前記第2開口部材と、
前記第3開口部材保持部に保持された前記第3開口部材と、
を備える光学装置。
Priority Applications (5)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2019056343A JP7245093B2 (ja) | 2019-03-25 | 2019-03-25 | 光学キット、及び、光学装置 |
| CN202080023126.4A CN113615017B (zh) | 2019-03-25 | 2020-01-14 | 光学套件及光学装置 |
| PCT/JP2020/000929 WO2020195023A1 (ja) | 2019-03-25 | 2020-01-14 | 光学キット、及び、光学装置 |
| DE112020001501.7T DE112020001501T5 (de) | 2019-03-25 | 2020-01-14 | Optischer Bausatz und optische Vorrichtung |
| US17/439,884 US12176681B2 (en) | 2019-03-25 | 2020-01-14 | Optical kit and optical device |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2019056343A JP7245093B2 (ja) | 2019-03-25 | 2019-03-25 | 光学キット、及び、光学装置 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JP2020161527A JP2020161527A (ja) | 2020-10-01 |
| JP7245093B2 true JP7245093B2 (ja) | 2023-03-23 |
Family
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Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2019056343A Active JP7245093B2 (ja) | 2019-03-25 | 2019-03-25 | 光学キット、及び、光学装置 |
Country Status (5)
| Country | Link |
|---|---|
| US (1) | US12176681B2 (ja) |
| JP (1) | JP7245093B2 (ja) |
| CN (1) | CN113615017B (ja) |
| DE (1) | DE112020001501T5 (ja) |
| WO (1) | WO2020195023A1 (ja) |
Families Citing this family (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP7399054B2 (ja) * | 2020-09-23 | 2023-12-15 | 浜松ホトニクス株式会社 | 光学キット、及び、光学装置 |
| WO2024072664A1 (en) * | 2022-09-30 | 2024-04-04 | Innovusion, Inc. | Improvement on wavelength stability of multijunction diode laser in lidar |
| CN119354873B (zh) * | 2024-04-28 | 2025-12-09 | 上海中科飞测半导体科技有限公司 | 一种调节装置及光学设备 |
Citations (10)
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| JP2002525856A (ja) | 1998-09-11 | 2002-08-13 | ニュー・フォーカス・インコーポレイテッド | 波長可変レーザ |
| US20030231691A1 (en) | 2002-05-29 | 2003-12-18 | Marron Joseph C. | Tunable laser system having an adjustable external cavity |
| JP2005045195A (ja) | 2003-07-24 | 2005-02-17 | Northrop Grumman Corp | レーザー光学装置用鋳造ベンチ |
| JP2007150028A (ja) | 2005-11-29 | 2007-06-14 | Sony Corp | 光学装置の調整方法 |
| US20090028197A1 (en) | 2007-07-25 | 2009-01-29 | Daylight Solutions Inc | Fixed wavelength mid infrared laser source with an external cavity |
| US20090323737A1 (en) | 2008-06-12 | 2009-12-31 | Inphase Technologies, Inc. | System and devices for improving external cavity diode lasers using wavelength and mode sensors and compact optical paths |
| US20100002734A1 (en) | 2008-07-07 | 2010-01-07 | Daylight Solutions, Inc. | Continuous wavelength tunable laser source with optimum positioning of pivot axis for grating |
| JP2012178436A (ja) | 2011-02-25 | 2012-09-13 | Hamamatsu Photonics Kk | 波長可変光源 |
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| US5461635A (en) * | 1993-04-02 | 1995-10-24 | Basiev; Tasoltan T. | Solid state laser with superbroadband or control generation spectrum |
| JPH09129982A (ja) * | 1995-10-31 | 1997-05-16 | Ando Electric Co Ltd | 外部共振器型ld光源 |
| JP2006107611A (ja) * | 2004-10-05 | 2006-04-20 | Sony Corp | レーザ光源装置及びホログラム装置 |
| US7466734B1 (en) * | 2005-06-15 | 2008-12-16 | Daylight Solutions, Inc. | Compact external cavity mid-IR optical lasers |
| US7535936B2 (en) * | 2005-08-05 | 2009-05-19 | Daylight Solutions, Inc. | External cavity tunable compact Mid-IR laser |
| US8670109B2 (en) * | 2010-12-02 | 2014-03-11 | Corning Incorporated | Laser characterization system and process |
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2019
- 2019-03-25 JP JP2019056343A patent/JP7245093B2/ja active Active
-
2020
- 2020-01-14 CN CN202080023126.4A patent/CN113615017B/zh active Active
- 2020-01-14 DE DE112020001501.7T patent/DE112020001501T5/de active Pending
- 2020-01-14 WO PCT/JP2020/000929 patent/WO2020195023A1/ja not_active Ceased
- 2020-01-14 US US17/439,884 patent/US12176681B2/en active Active
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| JP2002525856A (ja) | 1998-09-11 | 2002-08-13 | ニュー・フォーカス・インコーポレイテッド | 波長可変レーザ |
| JP2001284684A (ja) | 2000-03-31 | 2001-10-12 | Komatsu Ltd | ガイドレーザ装置 |
| US20030231691A1 (en) | 2002-05-29 | 2003-12-18 | Marron Joseph C. | Tunable laser system having an adjustable external cavity |
| JP2005045195A (ja) | 2003-07-24 | 2005-02-17 | Northrop Grumman Corp | レーザー光学装置用鋳造ベンチ |
| JP2007150028A (ja) | 2005-11-29 | 2007-06-14 | Sony Corp | 光学装置の調整方法 |
| US20090028197A1 (en) | 2007-07-25 | 2009-01-29 | Daylight Solutions Inc | Fixed wavelength mid infrared laser source with an external cavity |
| US20090323737A1 (en) | 2008-06-12 | 2009-12-31 | Inphase Technologies, Inc. | System and devices for improving external cavity diode lasers using wavelength and mode sensors and compact optical paths |
| US20100002734A1 (en) | 2008-07-07 | 2010-01-07 | Daylight Solutions, Inc. | Continuous wavelength tunable laser source with optimum positioning of pivot axis for grating |
| JP2012178436A (ja) | 2011-02-25 | 2012-09-13 | Hamamatsu Photonics Kk | 波長可変光源 |
| JP2017519367A (ja) | 2014-06-05 | 2017-07-13 | レニショウ パブリック リミテッド カンパニーRenishaw Public Limited Company | レーザデバイス |
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Also Published As
| Publication number | Publication date |
|---|---|
| US20220181851A1 (en) | 2022-06-09 |
| CN113615017A (zh) | 2021-11-05 |
| JP2020161527A (ja) | 2020-10-01 |
| CN113615017B (zh) | 2024-09-24 |
| DE112020001501T5 (de) | 2022-01-05 |
| US12176681B2 (en) | 2024-12-24 |
| WO2020195023A1 (ja) | 2020-10-01 |
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