JP6911390B2 - Bismuth-based lead-free glass composition - Google Patents
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- 239000011521 glass Substances 0.000 title claims description 105
- 239000000203 mixture Substances 0.000 title claims description 55
- 229910052797 bismuth Inorganic materials 0.000 title claims description 22
- JCXGWMGPZLAOME-UHFFFAOYSA-N bismuth atom Chemical compound [Bi] JCXGWMGPZLAOME-UHFFFAOYSA-N 0.000 title claims description 22
- 239000000758 substrate Substances 0.000 claims description 28
- 239000000843 powder Substances 0.000 claims description 18
- 229910052751 metal Inorganic materials 0.000 claims description 12
- 239000002184 metal Substances 0.000 claims description 12
- 229910004298 SiO 2 Inorganic materials 0.000 claims description 11
- 229910018072 Al 2 O 3 Inorganic materials 0.000 claims description 9
- 229910015902 Bi 2 O 3 Inorganic materials 0.000 claims description 6
- 239000002245 particle Substances 0.000 claims description 6
- 229910021193 La 2 O 3 Inorganic materials 0.000 claims description 4
- 229910010413 TiO 2 Inorganic materials 0.000 claims description 4
- 229910007541 Zn O Inorganic materials 0.000 claims description 3
- 239000010410 layer Substances 0.000 description 25
- 239000011230 binding agent Substances 0.000 description 13
- 238000002156 mixing Methods 0.000 description 11
- 238000010304 firing Methods 0.000 description 10
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- 230000002940 repellent Effects 0.000 description 8
- 239000005871 repellent Substances 0.000 description 8
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 7
- 239000000463 material Substances 0.000 description 7
- 239000002904 solvent Substances 0.000 description 7
- 238000002425 crystallisation Methods 0.000 description 6
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- OMIGHNLMNHATMP-UHFFFAOYSA-N 2-hydroxyethyl prop-2-enoate Chemical compound OCCOC(=O)C=C OMIGHNLMNHATMP-UHFFFAOYSA-N 0.000 description 1
- BVKZGUZCCUSVTD-UHFFFAOYSA-L Carbonate Chemical compound [O-]C([O-])=O BVKZGUZCCUSVTD-UHFFFAOYSA-L 0.000 description 1
- 229920002134 Carboxymethyl cellulose Polymers 0.000 description 1
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 1
- 239000001856 Ethyl cellulose Substances 0.000 description 1
- ZZSNKZQZMQGXPY-UHFFFAOYSA-N Ethyl cellulose Chemical compound CCOCC1OC(OC)C(OCC)C(OCC)C1OC1C(O)C(O)C(OC)C(CO)O1 ZZSNKZQZMQGXPY-UHFFFAOYSA-N 0.000 description 1
- WOBHKFSMXKNTIM-UHFFFAOYSA-N Hydroxyethyl methacrylate Chemical compound CC(=C)C(=O)OCCO WOBHKFSMXKNTIM-UHFFFAOYSA-N 0.000 description 1
- VVQNEPGJFQJSBK-UHFFFAOYSA-N Methyl methacrylate Chemical compound COC(=O)C(C)=C VVQNEPGJFQJSBK-UHFFFAOYSA-N 0.000 description 1
- 239000000020 Nitrocellulose Substances 0.000 description 1
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 description 1
- FJWGYAHXMCUOOM-QHOUIDNNSA-N [(2s,3r,4s,5r,6r)-2-[(2r,3r,4s,5r,6s)-4,5-dinitrooxy-2-(nitrooxymethyl)-6-[(2r,3r,4s,5r,6s)-4,5,6-trinitrooxy-2-(nitrooxymethyl)oxan-3-yl]oxyoxan-3-yl]oxy-3,5-dinitrooxy-6-(nitrooxymethyl)oxan-4-yl] nitrate Chemical compound O([C@@H]1O[C@@H]([C@H]([C@H](O[N+]([O-])=O)[C@H]1O[N+]([O-])=O)O[C@H]1[C@@H]([C@@H](O[N+]([O-])=O)[C@H](O[N+]([O-])=O)[C@@H](CO[N+]([O-])=O)O1)O[N+]([O-])=O)CO[N+](=O)[O-])[C@@H]1[C@@H](CO[N+]([O-])=O)O[C@@H](O[N+]([O-])=O)[C@H](O[N+]([O-])=O)[C@H]1O[N+]([O-])=O FJWGYAHXMCUOOM-QHOUIDNNSA-N 0.000 description 1
- 238000010521 absorption reaction Methods 0.000 description 1
- NIXOWILDQLNWCW-UHFFFAOYSA-N acrylic acid group Chemical group C(C=C)(=O)O NIXOWILDQLNWCW-UHFFFAOYSA-N 0.000 description 1
- 239000012790 adhesive layer Substances 0.000 description 1
- 229910052782 aluminium Inorganic materials 0.000 description 1
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 1
- 238000005452 bending Methods 0.000 description 1
- 125000001797 benzyl group Chemical group [H]C1=C([H])C([H])=C(C([H])=C1[H])C([H])([H])* 0.000 description 1
- 150000001621 bismuth Chemical class 0.000 description 1
- CQEYYJKEWSMYFG-UHFFFAOYSA-N butyl acrylate Chemical compound CCCCOC(=O)C=C CQEYYJKEWSMYFG-UHFFFAOYSA-N 0.000 description 1
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- SUPCQIBBMFXVTL-UHFFFAOYSA-N ethyl 2-methylprop-2-enoate Chemical compound CCOC(=O)C(C)=C SUPCQIBBMFXVTL-UHFFFAOYSA-N 0.000 description 1
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- KHYBPSFKEHXSLX-UHFFFAOYSA-N iminotitanium Chemical compound [Ti]=N KHYBPSFKEHXSLX-UHFFFAOYSA-N 0.000 description 1
- 238000007561 laser diffraction method Methods 0.000 description 1
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Description
本発明は、ビスマス系無鉛ガラス組成物に関するものであり、より詳細には、ブツやはじきの発生が有効に防止され、表面平滑性に優れたガラス層を形成可能なビスマス系無鉛ガラス組成物に関する。 The present invention relates to a bismuth-based lead-free glass composition, and more specifically, to a bismuth-based lead-free glass composition capable of effectively preventing the generation of lumps and repellents and forming a glass layer having excellent surface smoothness. ..
有機EL照明や有機ELディスプレイ、有機太陽電池などに用いられるフレキシブルデバイス用基板は、水分バリア性及び蒸気バリア性等のバリア性の他、平滑性及び絶縁性が要求されている。
下記特許文献1には、プラスチックフィルム基材上に、透明導電層、有機発光媒体層、陰極層を順次積層し、接着層を介して金属箔が積層された有機EL素子の構造が提案されているが、かかるプラスチックフィルム基材は水分バリア性の点で満足するものではない。
また下記特許文献2には、ステンレス基材上にポリイミド樹脂から成る平坦化層を設けたフレキシブルデバイス用基板が提案されているが、ポリイミド樹脂の吸水性が高いことから、やはり水分バリア性の点で満足するものではない。
更に下記特許文献3には、ステンレス基材上にシリカ系ガラスを製膜したフレキシブル太陽電池基板が提案されているが、シリカ系ガラスは一般にステンレスに比べて熱膨張係数が小さく、ステンレス基材に対する密着性に欠けると共に、シリカ系ガラスは曲げ加工や衝撃に弱いという問題を有している。
Substrates for flexible devices used for organic EL lighting, organic EL displays, organic solar cells, etc. are required to have smoothness and insulation properties in addition to barrier properties such as moisture barrier property and vapor barrier property.
Patent Document 1 below proposes a structure of an organic EL element in which a transparent conductive layer, an organic light emitting medium layer, and a cathode layer are sequentially laminated on a plastic film base material, and a metal foil is laminated via an adhesive layer. However, such a plastic film base material is not satisfactory in terms of moisture barrier property.
Further, Patent Document 2 below proposes a substrate for a flexible device in which a flattening layer made of a polyimide resin is provided on a stainless steel base material, but since the polyimide resin has high water absorption, it also has a moisture barrier property. I am not satisfied with it.
Further, Patent Document 3 below proposes a flexible solar cell substrate in which silica-based glass is formed on a stainless steel base material. Silica-based glass generally has a smaller coefficient of thermal expansion than stainless steel, and is compatible with stainless steel base materials. In addition to lacking adhesion, silica-based glass has the problem of being vulnerable to bending and impact.
このような問題を解決するために、本発明者等は、金属基材の表面にNiめっき層を形成し、そのNiめっき層の表面に、電気絶縁性を有するビスマス系ガラスを積層して成るフレキシブルデバイス用金属基板を提案した(特許文献4)。 In order to solve such a problem, the present inventors have formed a Ni plating layer on the surface of a metal base material, and laminated bismuth-based glass having electrical insulation on the surface of the Ni plating layer. A metal substrate for a flexible device has been proposed (Patent Document 4).
上記フレキシブルデバイス用金属基板は、水分バリア性に優れ、金属基材との密着性に優れたビスマス系ガラスを積層しており、絶縁性及び平坦性にも優れ、軽量でフレキシブル性を有しているが、焼成後のガラス層表面に、微小凸部であるブツや微小凹部であるはじきが発生する場合があり、このような微小欠陥によりガラス層の平滑性が損なわれる場合があった。
本発明者等は、ガラス層表面に形成されるこれらの微小欠陥についてその発生原因を研究した結果、ガラス層表面に形成されるこれらの微小欠陥は、ガラスからの結晶の発生や、気泡の破裂痕、樹脂の分解物等を原因として形成され、特にはじきは気泡の破裂痕やガラスの結晶化などによるガラス層の乱れを基点とした表面張力の影響により発生することが分かった。
The metal substrate for a flexible device is laminated with bismuth-based glass having excellent moisture barrier properties and excellent adhesion to a metal substrate, and has excellent insulation and flatness, and is lightweight and flexible. However, on the surface of the glass layer after firing, bumps that are minute protrusions and repelling that are minute recesses may occur, and such minute defects may impair the smoothness of the glass layer.
As a result of researching the causes of these minute defects formed on the surface of the glass layer, the present inventors have found that these minute defects formed on the surface of the glass layer cause crystals to be generated from the glass and bubbles to burst. It was found that it was formed due to scars, decomposition products of resin, etc., and in particular, repelling was caused by the influence of surface tension based on the disorder of the glass layer due to the rupture scars of bubbles and the crystallization of glass.
従って本発明の目的は、水分バリア性及び金属基板との密着性に優れていると共に、ブツやはじきの発生が有効に抑制された、表面平滑性に優れたガラス層を形成可能なビスマス系無鉛ガラス組成物を提供することである。 Therefore, an object of the present invention is a bismuth-based lead-free glass layer that is excellent in moisture barrier property and adhesion to a metal substrate, and can form a glass layer having excellent surface smoothness in which the generation of lumps and repellent is effectively suppressed. To provide a glass composition.
本発明によれば、フレキシブルデバイス用金属基板に用いられるガラス組成物であって、Bi2O3を70〜84重量%、ZnOを10〜12重量%、B2O3を6〜12重量%の量で含有することを特徴とするビスマス系無鉛ガラス組成物が提供される。
本発明のビスマス系無鉛ガラス組成物においては、
1.SiO2及び/又はAl2O3を含有し、前記SiO2の含有量が0〜2重量%、Al2O3の含有量が0〜1重量%の量(ただし、SiO2及びAl2O3の両方がゼロの場合を含まない)であること、
2.CuO及び/又はNiOを含有し、前記CuOの含有量が0〜2重量%、NiOの含有量が0〜2重量%の量(CuO及びNiOの両方がゼロの場合を含まない)であること、
3.Y2O3、ZrO2、La2O3、CeO2、TiO2、CoO、Fe2O3の何れかを1.5重量%以下(ゼロを含まない)の量で含有すること、
が好適である。
According to the present invention, it is a glass composition used for a metal substrate for a flexible device, in which Bi 2 O 3 is 70 to 84% by weight, Zn O is 10 to 12% by weight, and B 2 O 3 is 6 to 12% by weight. A bismuth-based lead-free glass composition is provided, which is characterized by being contained in an amount of.
In the bismuth-based lead-free glass composition of the present invention,
1. 1. Contains SiO 2 and / or Al 2 O 3 , the content of SiO 2 is 0 to 2% by weight, and the content of Al 2 O 3 is 0 to 1% by weight (however, SiO 2 and Al 2 O). ( Does not include the case where both of 3 are zero),
2. It contains CuO and / or NiO, and the content of CuO is 0 to 2% by weight and the content of NiO is 0 to 2% by weight (excluding the case where both CuO and NiO are zero). ,
3. 3. Containing any of Y 2 O 3 , ZrO 2 , La 2 O 3 , CeO 2 , TiO 2 , CoO, and Fe 2 O 3 in an amount of 1.5% by weight or less (not including zero).
Is preferable.
本発明によればまた、上記ガラス組成物の粉体及びビヒクルから成るビスマス系無鉛ガラス組成物ペーストであって、前記ガラス組成物粉体の平均粒径が20μm以下であることを特徴とするビスマス系無鉛ガラス組成物ペーストが提供される。 According to the present invention, a bismuth-based lead-free glass composition paste composed of the powder and vehicle of the glass composition, wherein the average particle size of the glass composition powder is 20 μm or less. A lead-free glass composition paste is provided.
本発明のビスマス系無鉛ガラス組成物は、鉛を含有せず、環境性に優れていると共に、結晶化しにくいガラス組成であることから、ガラス層表面のブツやはじきの発生が抑制され、表面平滑性に優れたガラス層を形成できる。
しかも金属基材との密着性に優れていると共に、薄層でもブツやはじきの発生がないことから、フレキシブルデバイス用基板などの有機EL関連用の基板に好適に使用できる。
また本発明のビスマス系無鉛ガラス組成物は、密な構造で水分の透過を完全に防ぐことが可能であることから、金属基板を用いた電子デバイス用の絶縁層として優れた水分バリア性を発現することが可能である。
The bismuth-based lead-free glass composition of the present invention does not contain lead, is excellent in environmental friendliness, and has a glass composition that is difficult to crystallize. A glass layer having excellent properties can be formed.
Moreover, since it has excellent adhesion to a metal base material and does not generate bumps or repellent even in a thin layer, it can be suitably used for a substrate for organic EL such as a substrate for a flexible device.
Further, since the bismuth-based lead-free glass composition of the present invention has a dense structure and can completely prevent the permeation of water, it exhibits excellent water barrier properties as an insulating layer for electronic devices using a metal substrate. It is possible to do.
(ビスマス系無鉛ガラス組成物)
本発明のビスマス系無鉛ガラス組成物は、Bi2O3を70〜84重量%、ZnOを10〜12重量%、B2O3を6〜12重量%の量で含有することが重要な特徴であり、これらの成分が上記範囲で含有され、共晶点周辺の範囲にあることにより、結晶化しにくいガラスが形成される。
(Bismuth-based lead-free glass composition)
The important feature of the bismuth-based lead-free glass composition of the present invention is that it contains Bi 2 O 3 in an amount of 70 to 84% by weight, Zn O in an amount of 10 to 12% by weight, and B 2 O 3 in an amount of 6 to 12% by weight. Therefore, when these components are contained in the above range and are in the range around the eutectic point, glass that is difficult to crystallize is formed.
本発明において、Bi2O3は、ガラスの粘性を下げるための主要成分であり、70〜84重量%、特に75〜82重量%の量で含有されていることが好適である。上記範囲よりもBi2O3の含有量が少ないと、軟化点が高くなって粘性が大きくなりすぎ、その一方上記範囲よりもBi2O3の含有量が多いと、結晶化が促進され、ブツやはじき発生のおそれがある。
また、ZnOは、ガラスを安定化し、ガラス溶融時に失透を抑制するための成分であり、10〜12重量%、特に10.5〜11重量%の量で含有されていることが好適である。上記範囲よりもZnOの含有量が少ないと、ガラスの耐久性が低下すると共に、失透しやすくなる。またガラス転移温度が高くなり、焼成されたガラスの平滑性が低下する。一方上記範囲よりもZnOの含有量が多いと、結晶化が促進され、ブツやはじき発生のおそれがあると共に、耐久性が低下する。
更にB2O3はガラスネットワークを形成する成分であり、6〜12重量%、特に6〜7重量%の量で含有されていることが好適である。上記範囲よりB2O3の含有量が少ないと、ガラスが不安定になって耐久性が低下すると共に、焼成時に結晶化しやすくなり、ブツやはじき発生のおそれがある。その一方上記範囲よりもB2O3の含有量が多いと、耐水性が低下する。
In the present invention, Bi 2 O 3 is a main component for lowering the viscosity of glass, and is preferably contained in an amount of 70 to 84% by weight, particularly 75 to 82% by weight. If the content of Bi 2 O 3 is lower than the above range, the softening point becomes high and the viscosity becomes too high, while if the content of Bi 2 O 3 is higher than the above range, crystallization is promoted. There is a risk of bumps and repelling.
Further, ZnO is a component for stabilizing the glass and suppressing devitrification when the glass is melted, and is preferably contained in an amount of 10 to 12% by weight, particularly 10.5 to 11% by weight. .. If the ZnO content is less than the above range, the durability of the glass is lowered and the glass is easily devitrified. In addition, the glass transition temperature becomes high, and the smoothness of the fired glass decreases. On the other hand, if the content of ZnO is larger than the above range, crystallization is promoted, there is a risk of lumps and repellency, and durability is lowered.
Further, B 2 O 3 is a component forming a glass network, and is preferably contained in an amount of 6 to 12% by weight, particularly 6 to 7% by weight. If the content of B 2 O 3 is less than the above range, the glass becomes unstable and its durability is lowered, and it is easy to crystallize at the time of firing, which may cause lumps and cissing. On the other hand, if the content of B 2 O 3 is larger than the above range, the water resistance is lowered.
本発明のガラス組成物においては、上記必須成分に加えて、SiO2及び/又はAl2O3を含有することが好適である。
SiO2は、B2O3と共にガラスネットワークを形成し、ガラスを更に安定化させることが可能になる。SiO2の配合量は、2重量%以下、特に1.2〜1.5重量%の範囲にあることが好適である。上記範囲よりもSiO2の配合量が多いと、上記範囲で配合した場合に比してガラスの溶融性が低下するおそれがある。
また、Al2O3を配合することにより、ガラスを更に安定化することが可能になる。Al2O3の配合量は1重量%以下、特に0.4〜0.6重量%の範囲であることが好適である。上記範囲よりもAl2O3の配合量が多いと、上記範囲で配合した場合に比してガラスの溶融性が低下するおそれがある。
In the glass composition of the present invention, it is preferable to contain SiO 2 and / or Al 2 O 3 in addition to the above essential components.
SiO 2 forms a glass network together with B 2 O 3 and makes it possible to further stabilize the glass. The blending amount of SiO 2 is preferably 2% by weight or less, particularly preferably in the range of 1.2 to 1.5% by weight. If the blending amount of SiO 2 is larger than the above range, the meltability of the glass may decrease as compared with the case where the SiO 2 is blended in the above range.
Further, by blending Al 2 O 3 , it becomes possible to further stabilize the glass. The blending amount of Al 2 O 3 is preferably 1% by weight or less, particularly preferably in the range of 0.4 to 0.6% by weight. If the blending amount of Al 2 O 3 is larger than the above range, the meltability of the glass may decrease as compared with the case of blending in the above range.
本発明のガラス組成物においては、上記必須成分に加えて、更にCuO及び/又はNiOを含有することが好適である。
CuOを2重量%以下、特に1.3〜1.6重量%の量で配合することにより、ガラスの溶融性が向上される。上記範囲よりもCuOの配合量が多いと、金属基材への密着性が低下するおそれがある。
またNiOを2重量%以下、特に1.3〜1.6重量%の量で配合することにより、CuOを配合した場合と同様に、ガラスの溶融性が向上される。上記範囲よりもNiOの配合量が多いと、金属基材への密着性が低下するおそれがある。
In the glass composition of the present invention, it is preferable to further contain CuO and / or NiO in addition to the above essential components.
By blending CuO in an amount of 2% by weight or less, particularly 1.3 to 1.6% by weight, the meltability of the glass is improved. If the amount of CuO blended is larger than the above range, the adhesion to the metal substrate may decrease.
Further, by blending NiO in an amount of 2% by weight or less, particularly 1.3 to 1.6% by weight, the meltability of the glass is improved as in the case where CuO is blended. If the amount of NiO blended is larger than the above range, the adhesion to the metal substrate may decrease.
本発明のガラス組成物においては更に、上記必須成分に加えて、Y2O3、ZrO2、La2O3、CeO2、TiO2、CoO、Fe2O3の何れかを1.5重量%以下の量で含有することが好適である。
Y2O3、ZrO2、La2O3、CeO2、TiO2、CoO、Fe2O3の何れかを上記量で含有することにより、ガラスの耐久性を向上することができるが、上記範囲よりもこれらの成分の配合量が多くなると、却ってガラスの耐久性を低下させるおそれがある。尚、これらの成分は、複数種を組み合わせで使用することも可能であるが、その場合には、合計量が1.5重量%以下であることが好ましい。
In the glass composition of the present invention, in addition to the above essential components, any one of Y 2 O 3 , ZrO 2 , La 2 O 3 , CeO 2 , TiO 2 , CoO, and Fe 2 O 3 is further added by 1.5 weight. It is preferable to contain it in an amount of% or less.
By containing any of Y 2 O 3 , ZrO 2 , La 2 O 3 , CeO 2 , TiO 2 , CoO, and Fe 2 O 3 in the above amounts, the durability of the glass can be improved. If the amount of these components blended is larger than the range, the durability of the glass may be lowered. It is possible to use a plurality of types of these components in combination, but in that case, the total amount is preferably 1.5% by weight or less.
(ビスマス系無鉛ガラス組成物ペースト)
本発明のビスマス系無鉛ガラス組成物ペーストは、上述したガラス組成物の粉体及びビヒクルから成り、ガラス組成物粉体の平均粒径は20μm以下であることが重要な特徴である。
ガラス組成物粉体と共にペーストを構成するビヒクルは、ペーストの粘性を調整するために用いられ、有機バインダを溶剤に溶解して調製される。
ガラス組成物ペーストは、上述したガラス組成物粉体を30〜80重量%、有機バインダを0〜10重量%(ゼロを含まない)、溶媒を10〜70重量%の量で含有することが好適である。上記範囲よりもガラス組成物粉体の量が少ない場合には、ペースト粘度が低くなり、所望厚みのガラス層の形成が難しくなり、その一方上記範囲よりもガラス組成物粉体の量が多い場合には、ペースト粘度が高くなりすぎて塗工性に劣るようになる。また上記範囲よりも有機バインダの量が少ない場合には、塗工性に劣るようになり、その一方上記範囲よりも有機バインダの量が多いと、焼成後に有機物の未焼成物が残留するおそれがある。更に上記範囲よりも溶媒の量が少ない場合には、ペースト粘度が高くなりすぎて塗工性に劣るようになり、その一方上記範囲よりも溶媒の量が多いと、ペースト粘度が低くなりすぎ、所望厚みのガラス層の形成が困難になる。
(Bismuth-based lead-free glass composition paste)
The bismuth-based lead-free glass composition paste of the present invention is composed of the above-mentioned powder and vehicle of the glass composition, and an important feature is that the average particle size of the glass composition powder is 20 μm or less.
The vehicle that constitutes the paste together with the glass composition powder is used to adjust the viscosity of the paste, and is prepared by dissolving an organic binder in a solvent.
The glass composition paste preferably contains the above-mentioned glass composition powder in an amount of 30 to 80% by weight, an organic binder in an amount of 0 to 10% by weight (not containing zero), and a solvent in an amount of 10 to 70% by weight. Is. When the amount of the glass composition powder is smaller than the above range, the paste viscosity becomes low and it becomes difficult to form a glass layer having a desired thickness, while the amount of the glass composition powder is larger than the above range. The paste viscosity becomes too high and the coatability becomes inferior. Further, when the amount of the organic binder is smaller than the above range, the coatability becomes inferior, while when the amount of the organic binder is larger than the above range, the unfired organic substance may remain after firing. be. Further, when the amount of the solvent is smaller than the above range, the paste viscosity becomes too high and the coatability becomes inferior, while when the amount of the solvent is larger than the above range, the paste viscosity becomes too low. It becomes difficult to form a glass layer having a desired thickness.
有機バインダとしては、これに限定されないが、メチルセルロース、エチルセルロース、カルボキシメチルセルロース、オキシエチルセルロース、ベンジルセルロース、プロピルセルロース、ニトロセルロース等のセルロース系樹脂;メチルメタクリレート、エチルメタクリレート、ブチルメタクリレート、2−ヒドロキシエチルメタクリレート、ブチルアクリレート、2−ヒドロキシエチルアクリレート等のアクリル系モノマーの1種以上を重合して得られるアクリル系樹脂等の有機樹脂;ポリプロピレンカーボネート等の脂肪族ポリオレフィン系カーボネート樹脂を例示することができる。
また溶剤は用いる有機バインダによって適宜選択され、これに限定されないが、セルロース系樹脂の場合は、水、ターピネオール、ブチルカルビトールアセテート、エチルカルビトールアセテート等;アクリル系樹脂の場合は、メチルエチルケトン、ターピネオール、ブチルカルビトールアセテート、エチルカルビトールアセテート等;脂肪族ポリオレフィン系カーボネートの場合は、炭酸プロピレン、トリアセチン等;の溶媒を用いることができる。
The organic binder is not limited to this, but is a cellulose-based resin such as methyl cellulose, ethyl cellulose, carboxymethyl cellulose, oxyethyl cellulose, benzyl cellulose, propyl cellulose, nitro cellulose; methyl methacrylate, ethyl methacrylate, butyl methacrylate, 2-hydroxyethyl methacrylate, etc. Organic resins such as acrylic resins obtained by polymerizing one or more of acrylic monomers such as butyl acrylate and 2-hydroxyethyl acrylate; aliphatic polyolefin carbonate resins such as polypropylene carbonate can be exemplified.
The solvent is appropriately selected depending on the organic binder used, and is not limited to this, but in the case of a cellulose-based resin, water, turpineol, butyl carbitol acetate, ethyl carbitol acetate, etc .; in the case of an acrylic resin, methyl ethyl ketone, turpineol, etc. Solvents such as butyl carbitol acetate and ethyl carbitol acetate; in the case of aliphatic polyolefin carbonates, propylene carbonate, triacetin and the like; can be used.
ガラス組成物ペーストは、上述したビスマス系無鉛ガラス組成物から成るガラスフリットを粉砕して得られるガラス組成物粉体とビヒクルを混合・分散することにより得られる。
ガラス組成物粉体は、上述したガラス組成物を混合し、800〜1200℃の温度で加熱して溶融ガラス化し、急冷してガラスフリットを得た後、これを粉砕することにより得られる。粉砕方法としては、JET粉砕、ラピッドミル粉砕、ボールミル粉砕等従来公知の方法を挙げることができる。
本発明においては、ガラス組成物粉体の平均粒径が20μm以下、好ましくは1〜10μm、より好ましくは1〜5μmの範囲にあることが、平滑なガラス表面を得る上で重要であり、このような微細な粉体を得るためには、上記粉砕方法の中でもJET粉砕によることが好適である。
尚、本発明においてガラス組成物粉体の平均粒径は、レーザ回折・散乱法による測定値である。
The glass composition paste is obtained by mixing and dispersing the glass composition powder obtained by crushing the glass frit made of the above-mentioned bismuth-based lead-free glass composition and the vehicle.
The glass composition powder is obtained by mixing the above-mentioned glass composition, heating at a temperature of 800 to 1200 ° C. to melt vitrify, quenching to obtain a glass frit, and then pulverizing the glass composition powder. Examples of the crushing method include conventionally known methods such as JET crushing, rapid mill crushing, and ball mill crushing.
In the present invention, it is important that the average particle size of the glass composition powder is in the range of 20 μm or less, preferably 1 to 10 μm, more preferably 1 to 5 μm in order to obtain a smooth glass surface. In order to obtain such a fine powder, it is preferable to use JET crushing among the above crushing methods.
In the present invention, the average particle size of the glass composition powder is a value measured by a laser diffraction / scattering method.
次いで得られた平均粒径20μm以下のガラス組成物粉体と、ビヒクルとを、混合・分散する。
混合・分散の方法は、撹拌翼を備えた回転式の混合機やビーズミル、ペイントシェイカー、ロールミル、メノウ乳鉢、超音波等による分散方法を例示できるが、好適には、ビーズミル、ペイントシェイカー、ロールミルによって、混合・分散することが望ましい。
また、ガラス組成物ペーストには、必要に応じて、公知の増粘剤、分散剤等を公知の処方に従って添加することもできる。
Next, the obtained glass composition powder having an average particle size of 20 μm or less and the vehicle are mixed and dispersed.
As a mixing / dispersing method, a rotary mixer equipped with a stirring blade, a bead mill, a paint shaker, a roll mill, an agate mortar, an ultrasonic wave, or the like can be exemplified, but a bead mill, a paint shaker, or a roll mill is preferable. , It is desirable to mix and disperse.
Further, if necessary, a known thickener, dispersant or the like can be added to the glass composition paste according to a known formulation.
(ガラス層の形成)
本発明のガラス組成物ペーストは、ガラス基板、セラミックス基板、アルミニウム基板、ステンレス基板、鋼板及びNiをはじめとする各種めっき鋼板、チタン基板等の基板に、例えばバーコーター、ダイコーター、ロールコーター、グラビアコーター、スクリーン印刷、オフセット印刷、アプリケーター等によって塗工することができる。
塗工されたガラスペーストは、80〜180℃の温度で乾燥する。乾燥後、必要により、脱バインダ処理を行う。脱バインダ処理は、180〜450℃の温度で10分以上加熱することが好ましい。
乾燥後、必要により脱バインダ処理に賦された塗工面を、550〜900℃、好適には650〜850℃の温度で、10〜300秒間、焼成することによりガラス層が形成される。上記範囲よりも焼成温度が低い場合には、上記範囲にある場合に比して溶融が不十分になるおそれがあり、一方上記範囲よりも焼成温度が高い場合には、上記範囲にある場合に比して基板に影響を与えるおそれがある。
(Formation of glass layer)
The glass composition paste of the present invention is applied to substrates such as glass substrates, ceramics substrates, aluminum substrates, stainless steel substrates, steel plates, various plated steel plates including Ni, and titanium substrates, for example, bar coaters, die coaters, roll coaters, and gravure. It can be coated by a coater, screen printing, offset printing, an applicator, or the like.
The coated glass paste is dried at a temperature of 80-180 ° C. After drying, if necessary, remove the binder. The binder removal treatment is preferably performed by heating at a temperature of 180 to 450 ° C. for 10 minutes or more.
After drying, the coated surface, which has been subjected to the binder removal treatment if necessary, is fired at a temperature of 550 to 900 ° C., preferably 650 to 850 ° C. for 10 to 300 seconds to form a glass layer. If the firing temperature is lower than the above range, melting may be insufficient compared to the case where it is in the above range, while if the firing temperature is higher than the above range, it is in the above range. In comparison, it may affect the substrate.
本発明のガラス組成物は、軟化点温度が300〜500℃の範囲にあることが好ましい。上記範囲よりも低温で軟化するビスマス系ガラスは、上記範囲にある場合に比して焼成時に結晶化を起こしやすいと共に、脱バインダ処理を行う必要がある場合には、脱バインダ処理の温度で軟化するおそれがあり、バインダの分解ガスがガラス中に入り込み、ピンホールの原因になるおそれがある。一方上記範囲よりも軟化点温度が高い場合には、上記範囲にある場合に比して焼成時に高い温度が必要となり、基板自体が変形あるいは変質することにより製膜が困難になるおそれがある。また比較的低温で焼成すると、ガラスの溶融が不十分となり、表面平滑性が失われるおそれがある。 The glass composition of the present invention preferably has a softening point temperature in the range of 300 to 500 ° C. Bismuth-based glass, which softens at a temperature lower than the above range, is more likely to crystallize during firing than in the above range, and when it is necessary to perform a binder removal treatment, it softens at the temperature of the binder removal treatment. The decomposition gas of the binder may enter the glass and cause pinholes. On the other hand, when the softening point temperature is higher than the above range, a higher temperature is required at the time of firing as compared with the case where it is in the above range, and the substrate itself may be deformed or deteriorated, which may make film formation difficult. Further, when firing at a relatively low temperature, the glass may be insufficiently melted and the surface smoothness may be lost.
(実施例1〜9、比較例1〜3)
ガラス組成物:表1に示す組成のビスマス系ガラス組成物を用いた。
ビヒクル:有機バインダとしてメチルセルロース、溶媒として水から成り、これらが1:99の重量比で配合されて成るビヒクルを用いた。
表1に示すガラス組成物粉体と、ビヒクルを重量比が50:50になるように乳鉢で混合し、セラミック製ロールにて分散処理を行ない、ガラス層形成用ガラスペーストを作成した。
基板として、Niめっき鋼板を用い、アルコールに浸したガーゼで表面を拭き取り、脱脂した後、熱処理されたNiめっき層上に、バーコーターで焼成後の膜厚が20μmになるようにガラスペーストを塗布し、塗膜を形成した。次いで、電気炉を用いて、乾燥(温度:120℃、時間:20分)、焼成(温度:750℃、時間:15秒)を行い、フレキシブルデバイス用基板を作成した。
(Examples 1 to 9, Comparative Examples 1 to 3)
Glass composition: A bismuth-based glass composition having the composition shown in Table 1 was used.
Vehicle: A vehicle composed of methyl cellulose as an organic binder and water as a solvent, which are blended in a weight ratio of 1:99, was used.
The glass composition powder shown in Table 1 and the vehicle were mixed in a mortar so that the weight ratio was 50:50, and dispersion treatment was performed with a ceramic roll to prepare a glass paste for forming a glass layer.
A Ni-plated steel plate is used as the substrate, the surface is wiped off with gauze soaked in alcohol, degreased, and then a glass paste is applied on the heat-treated Ni-plated layer with a bar coater so that the film thickness after firing is 20 μm. And formed a coating film. Next, using an electric furnace, drying (temperature: 120 ° C., time: 20 minutes) and firing (temperature: 750 ° C., time: 15 seconds) were performed to prepare a substrate for a flexible device.
(評価結果)
形成されたガラス層について、ガラス膜中のはじきの有無、結晶化(ブツ)の有無について、下記のように評価した。結果を表1に示す。
尚、評価基準は以下の通りである。
[はじきの判断基準]
100×100mmサイズのフレキシブルデバイス用基板につき、目視確認できるはじきの有無を以下の評価基準で評価した。
◎:はじきは皆無
○:はじき個数5個未満
△:はじき個数が5個以上10個未満
×:はじき個数が10個以上
[結晶化]
100×100mmサイズのフレキシブルデバイス用基板につき、目視で確認できる結晶化の有無で判断した。
(Evaluation results)
The formed glass layer was evaluated as follows regarding the presence or absence of repellency and the presence or absence of crystallization (bumps) in the glass film. The results are shown in Table 1.
The evaluation criteria are as follows.
[Criteria for repelling]
For a substrate for a flexible device having a size of 100 × 100 mm, the presence or absence of repellency that could be visually confirmed was evaluated according to the following evaluation criteria.
◎: No repellent ○: Number of repellents less than 5 △: Number of repellents 5 or more and less than 10 ×: Number of repellents 10 or more [Crystallization]
For a substrate for a flexible device having a size of 100 × 100 mm, it was judged by the presence or absence of crystallization that could be visually confirmed.
本発明のビスマス系無鉛ガラス組成物は、ブツやはじきの発生のない表面平滑性に優れたガラス層を形成できることから、電子デバイス用基板、特に有機EL関連のフレキシブルデバイス基板に有効に利用できる。 Since the bismuth-based lead-free glass composition of the present invention can form a glass layer having excellent surface smoothness that does not generate lumps or repellents, it can be effectively used as a substrate for electronic devices, particularly a flexible device substrate related to organic EL.
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| CN201780021275.5A CN108886847B (en) | 2016-03-28 | 2017-03-22 | Substrate for flexible device and method for producing the same |
| US16/088,273 US11101436B2 (en) | 2016-03-28 | 2017-03-22 | Substrate for flexible device and method for producing the same |
| KR1020187030958A KR102135711B1 (en) | 2016-03-28 | 2017-03-22 | Flexible device substrate and manufacturing method thereof |
| EP17774579.1A EP3439431B1 (en) | 2016-03-28 | 2017-03-22 | Substrate for flexible devices and method for producing same |
| PCT/JP2017/011448 WO2017170038A1 (en) | 2016-03-28 | 2017-03-22 | Substrate for flexible devices and method for producing same |
| TW106110063A TWI752946B (en) | 2016-03-28 | 2017-03-27 | Flexible device board and method for producing the same |
| US17/377,246 US11723262B2 (en) | 2016-03-28 | 2021-07-15 | Substrate for flexible device and method for producing the same |
| US18/334,073 US20230329079A1 (en) | 2016-03-28 | 2023-06-13 | Substrate for flexible device and method for producing the same |
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| JP2012041196A (en) * | 2010-08-12 | 2012-03-01 | Asahi Glass Co Ltd | Glass member with sealing material layer, electronic device using the same, and method for producing the electronic device |
| JP2015199620A (en) * | 2014-04-07 | 2015-11-12 | 旭硝子株式会社 | Sealing material, sealing body |
| JP2015199629A (en) * | 2014-04-08 | 2015-11-12 | 旭硝子株式会社 | Sealing material and sealed body |
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2017
- 2017-03-06 JP JP2017042160A patent/JP6911390B2/en active Active
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