JP6849971B2 - Silicone modified epoxy resin and its composition and cured product - Google Patents
Silicone modified epoxy resin and its composition and cured product Download PDFInfo
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- JP6849971B2 JP6849971B2 JP2017053932A JP2017053932A JP6849971B2 JP 6849971 B2 JP6849971 B2 JP 6849971B2 JP 2017053932 A JP2017053932 A JP 2017053932A JP 2017053932 A JP2017053932 A JP 2017053932A JP 6849971 B2 JP6849971 B2 JP 6849971B2
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- skeleton
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- epoxy resin
- formula
- carbon atoms
- Prior art date
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- 239000003822 epoxy resin Substances 0.000 title claims description 73
- 229920000647 polyepoxide Polymers 0.000 title claims description 73
- 239000000203 mixture Substances 0.000 title claims description 43
- 229920001296 polysiloxane Polymers 0.000 title claims description 7
- 125000004432 carbon atom Chemical group C* 0.000 claims description 66
- 150000001875 compounds Chemical class 0.000 claims description 34
- 239000003795 chemical substances by application Substances 0.000 claims description 32
- 125000002947 alkylene group Chemical group 0.000 claims description 26
- 229920005989 resin Polymers 0.000 claims description 24
- 239000011347 resin Substances 0.000 claims description 24
- ISWSIDIOOBJBQZ-UHFFFAOYSA-N Phenol Chemical compound OC1=CC=CC=C1 ISWSIDIOOBJBQZ-UHFFFAOYSA-N 0.000 claims description 22
- 150000008065 acid anhydrides Chemical class 0.000 claims description 22
- 125000003118 aryl group Chemical group 0.000 claims description 22
- 239000000047 product Substances 0.000 claims description 22
- 125000000623 heterocyclic group Chemical group 0.000 claims description 20
- 239000003054 catalyst Substances 0.000 claims description 19
- RTZKZFJDLAIYFH-UHFFFAOYSA-N ether Chemical group CCOCC RTZKZFJDLAIYFH-UHFFFAOYSA-N 0.000 claims description 19
- 150000001732 carboxylic acid derivatives Chemical class 0.000 claims description 18
- 125000000753 cycloalkyl group Chemical group 0.000 claims description 18
- 125000004435 hydrogen atom Chemical group [H]* 0.000 claims description 17
- 125000001931 aliphatic group Chemical group 0.000 claims description 15
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 claims description 14
- 125000003700 epoxy group Chemical group 0.000 claims description 13
- 125000000962 organic group Chemical group 0.000 claims description 13
- WYURNTSHIVDZCO-UHFFFAOYSA-N Tetrahydrofuran Chemical group C1CCOC1 WYURNTSHIVDZCO-UHFFFAOYSA-N 0.000 claims description 12
- 125000002029 aromatic hydrocarbon group Chemical group 0.000 claims description 12
- 125000003342 alkenyl group Chemical group 0.000 claims description 10
- 125000000217 alkyl group Chemical group 0.000 claims description 10
- 150000002148 esters Chemical group 0.000 claims description 10
- DHXVGJBLRPWPCS-UHFFFAOYSA-N Tetrahydropyran Chemical group C1CCOCC1 DHXVGJBLRPWPCS-UHFFFAOYSA-N 0.000 claims description 9
- 150000001412 amines Chemical class 0.000 claims description 8
- 125000000609 carbazolyl group Chemical group C1(=CC=CC=2C3=CC=CC=C3NC12)* 0.000 claims description 8
- 125000002887 hydroxy group Chemical group [H]O* 0.000 claims description 8
- BGJSXRVXTHVRSN-UHFFFAOYSA-N 1,3,5-trioxane Chemical group C1OCOCO1 BGJSXRVXTHVRSN-UHFFFAOYSA-N 0.000 claims description 6
- YNAVUWVOSKDBBP-UHFFFAOYSA-N Morpholine Chemical group C1COCCN1 YNAVUWVOSKDBBP-UHFFFAOYSA-N 0.000 claims description 6
- 125000000532 dioxanyl group Chemical group 0.000 claims description 6
- 125000001624 naphthyl group Chemical group 0.000 claims description 6
- 125000004430 oxygen atom Chemical group O* 0.000 claims description 5
- JYEUMXHLPRZUAT-UHFFFAOYSA-N 1,2,3-triazine Chemical group C1=CN=NN=C1 JYEUMXHLPRZUAT-UHFFFAOYSA-N 0.000 claims description 4
- ORILYTVJVMAKLC-UHFFFAOYSA-N adamantane Chemical group C1C(C2)CC3CC1CC2C3 ORILYTVJVMAKLC-UHFFFAOYSA-N 0.000 claims description 4
- 125000000719 pyrrolidinyl group Chemical group 0.000 claims description 4
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical group [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 claims description 3
- 239000007795 chemical reaction product Substances 0.000 claims description 3
- 125000000582 cycloheptyl group Chemical group [H]C1([H])C([H])([H])C([H])([H])C([H])([H])C([H])(*)C([H])([H])C1([H])[H] 0.000 claims description 3
- 229910052710 silicon Inorganic materials 0.000 claims description 3
- 230000004048 modification Effects 0.000 claims 1
- 238000012986 modification Methods 0.000 claims 1
- -1 2-ethylhexyl group Chemical group 0.000 description 56
- 238000006243 chemical reaction Methods 0.000 description 43
- MHAJPDPJQMAIIY-UHFFFAOYSA-N Hydrogen peroxide Chemical compound OO MHAJPDPJQMAIIY-UHFFFAOYSA-N 0.000 description 39
- 238000000034 method Methods 0.000 description 26
- KDLHZDBZIXYQEI-UHFFFAOYSA-N Palladium Chemical compound [Pd] KDLHZDBZIXYQEI-UHFFFAOYSA-N 0.000 description 21
- 125000004805 propylene group Chemical group [H]C([H])([H])C([H])([*:1])C([H])([H])[*:2] 0.000 description 18
- 239000002253 acid Substances 0.000 description 15
- LYCAIKOWRPUZTN-UHFFFAOYSA-N Ethylene glycol Chemical compound OCCO LYCAIKOWRPUZTN-UHFFFAOYSA-N 0.000 description 12
- 125000000816 ethylene group Chemical group [H]C([H])([*:1])C([H])([H])[*:2] 0.000 description 12
- UKVIEHSSVKSQBA-UHFFFAOYSA-N methane;palladium Chemical compound C.[Pd] UKVIEHSSVKSQBA-UHFFFAOYSA-N 0.000 description 12
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 description 12
- 238000002156 mixing Methods 0.000 description 12
- 239000003960 organic solvent Substances 0.000 description 12
- 150000003242 quaternary ammonium salts Chemical class 0.000 description 12
- 239000002904 solvent Substances 0.000 description 11
- 239000003963 antioxidant agent Substances 0.000 description 10
- 235000006708 antioxidants Nutrition 0.000 description 10
- 125000004185 ester group Chemical group 0.000 description 10
- 229910052763 palladium Inorganic materials 0.000 description 10
- 150000003839 salts Chemical class 0.000 description 10
- 150000005846 sugar alcohols Polymers 0.000 description 10
- 125000000383 tetramethylene group Chemical group [H]C([H])([*:1])C([H])([H])C([H])([H])C([H])([H])[*:2] 0.000 description 10
- 239000004593 Epoxy Substances 0.000 description 9
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 description 9
- 125000001570 methylene group Chemical group [H]C([H])([*:1])[*:2] 0.000 description 9
- QTBSBXVTEAMEQO-UHFFFAOYSA-N Acetic acid Chemical compound CC(O)=O QTBSBXVTEAMEQO-UHFFFAOYSA-N 0.000 description 8
- 230000003078 antioxidant effect Effects 0.000 description 8
- 150000002430 hydrocarbons Chemical group 0.000 description 8
- 239000000243 solution Substances 0.000 description 8
- FWHUTKPMCKSUCV-UHFFFAOYSA-N 1,3-dioxo-3a,4,5,6,7,7a-hexahydro-2-benzofuran-5-carboxylic acid Chemical compound C1C(C(=O)O)CCC2C(=O)OC(=O)C12 FWHUTKPMCKSUCV-UHFFFAOYSA-N 0.000 description 7
- VQTUBCCKSQIDNK-UHFFFAOYSA-N Isobutene Chemical group CC(C)=C VQTUBCCKSQIDNK-UHFFFAOYSA-N 0.000 description 7
- CTQNGGLPUBDAKN-UHFFFAOYSA-N O-Xylene Chemical compound CC1=CC=CC=C1C CTQNGGLPUBDAKN-UHFFFAOYSA-N 0.000 description 7
- 150000001298 alcohols Chemical class 0.000 description 7
- 230000015572 biosynthetic process Effects 0.000 description 7
- 230000000052 comparative effect Effects 0.000 description 7
- OTLDLKLSNZMTTA-UHFFFAOYSA-N octahydro-1h-4,7-methanoindene-1,5-diyldimethanol Chemical compound C1C2C3C(CO)CCC3C1C(CO)C2 OTLDLKLSNZMTTA-UHFFFAOYSA-N 0.000 description 7
- 239000012044 organic layer Substances 0.000 description 7
- 238000003786 synthesis reaction Methods 0.000 description 7
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 7
- 239000008096 xylene Substances 0.000 description 7
- ZWEHNKRNPOVVGH-UHFFFAOYSA-N 2-Butanone Chemical compound CCC(C)=O ZWEHNKRNPOVVGH-UHFFFAOYSA-N 0.000 description 6
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 6
- OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical compound OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 description 6
- KWYUFKZDYYNOTN-UHFFFAOYSA-M Potassium hydroxide Chemical compound [OH-].[K+] KWYUFKZDYYNOTN-UHFFFAOYSA-M 0.000 description 6
- HEMHJVSKTPXQMS-UHFFFAOYSA-M Sodium hydroxide Chemical compound [OH-].[Na+] HEMHJVSKTPXQMS-UHFFFAOYSA-M 0.000 description 6
- 239000007853 buffer solution Substances 0.000 description 6
- 125000001495 ethyl group Chemical group [H]C([H])([H])C([H])([H])* 0.000 description 6
- 238000001914 filtration Methods 0.000 description 6
- 125000003187 heptyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 6
- 239000000463 material Substances 0.000 description 6
- BDAGIHXWWSANSR-UHFFFAOYSA-N methanoic acid Natural products OC=O BDAGIHXWWSANSR-UHFFFAOYSA-N 0.000 description 6
- VYKXQOYUCMREIS-UHFFFAOYSA-N methylhexahydrophthalic anhydride Chemical compound C1CCCC2C(=O)OC(=O)C21C VYKXQOYUCMREIS-UHFFFAOYSA-N 0.000 description 6
- VLKZOEOYAKHREP-UHFFFAOYSA-N n-Hexane Chemical compound CCCCCC VLKZOEOYAKHREP-UHFFFAOYSA-N 0.000 description 6
- 125000004817 pentamethylene group Chemical group [H]C([H])([*:2])C([H])([H])C([H])([H])C([H])([H])C([H])([H])[*:1] 0.000 description 6
- WFKWXMTUELFFGS-UHFFFAOYSA-N tungsten Chemical compound [W] WFKWXMTUELFFGS-UHFFFAOYSA-N 0.000 description 6
- 229910052721 tungsten Inorganic materials 0.000 description 6
- MUTGBJKUEZFXGO-OLQVQODUSA-N (3as,7ar)-3a,4,5,6,7,7a-hexahydro-2-benzofuran-1,3-dione Chemical compound C1CCC[C@@H]2C(=O)OC(=O)[C@@H]21 MUTGBJKUEZFXGO-OLQVQODUSA-N 0.000 description 5
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 5
- KFZMGEQAYNKOFK-UHFFFAOYSA-N Isopropanol Chemical compound CC(C)O KFZMGEQAYNKOFK-UHFFFAOYSA-N 0.000 description 5
- 229910019142 PO4 Inorganic materials 0.000 description 5
- 239000007983 Tris buffer Substances 0.000 description 5
- 150000007514 bases Chemical class 0.000 description 5
- 125000004122 cyclic group Chemical group 0.000 description 5
- 125000000113 cyclohexyl group Chemical group [H]C1([H])C([H])([H])C([H])([H])C([H])(*)C([H])([H])C1([H])[H] 0.000 description 5
- VDCSGNNYCFPWFK-UHFFFAOYSA-N diphenylsilane Chemical compound C=1C=CC=CC=1[SiH2]C1=CC=CC=C1 VDCSGNNYCFPWFK-UHFFFAOYSA-N 0.000 description 5
- 238000011156 evaluation Methods 0.000 description 5
- 125000000524 functional group Chemical group 0.000 description 5
- RBBOWEDMXHTEPA-UHFFFAOYSA-N hexane;toluene Chemical compound CCCCCC.CC1=CC=CC=C1 RBBOWEDMXHTEPA-UHFFFAOYSA-N 0.000 description 5
- 239000010410 layer Substances 0.000 description 5
- 238000004519 manufacturing process Methods 0.000 description 5
- 229910052751 metal Inorganic materials 0.000 description 5
- 239000002184 metal Substances 0.000 description 5
- 230000001590 oxidative effect Effects 0.000 description 5
- 239000010452 phosphate Substances 0.000 description 5
- NBIIXXVUZAFLBC-UHFFFAOYSA-K phosphate Chemical compound [O-]P([O-])([O-])=O NBIIXXVUZAFLBC-UHFFFAOYSA-K 0.000 description 5
- 238000010791 quenching Methods 0.000 description 5
- 239000002994 raw material Substances 0.000 description 5
- 238000010992 reflux Methods 0.000 description 5
- 239000011342 resin composition Substances 0.000 description 5
- 239000007787 solid Substances 0.000 description 5
- 125000000999 tert-butyl group Chemical group [H]C([H])([H])C(*)(C([H])([H])[H])C([H])([H])[H] 0.000 description 5
- 239000010937 tungsten Substances 0.000 description 5
- LTVUCOSIZFEASK-MPXCPUAZSA-N (3ar,4s,7r,7as)-3a-methyl-3a,4,7,7a-tetrahydro-4,7-methano-2-benzofuran-1,3-dione Chemical compound C([C@H]1C=C2)[C@H]2[C@H]2[C@]1(C)C(=O)OC2=O LTVUCOSIZFEASK-MPXCPUAZSA-N 0.000 description 4
- 125000000094 2-phenylethyl group Chemical group [H]C1=C([H])C([H])=C(C([H])=C1[H])C([H])([H])C([H])([H])* 0.000 description 4
- SLJFKNONPLNAPF-UHFFFAOYSA-N 3-Vinyl-7-oxabicyclo[4.1.0]heptane Chemical compound C1C(C=C)CCC2OC21 SLJFKNONPLNAPF-UHFFFAOYSA-N 0.000 description 4
- ZOKXTWBITQBERF-UHFFFAOYSA-N Molybdenum Chemical compound [Mo] ZOKXTWBITQBERF-UHFFFAOYSA-N 0.000 description 4
- IMNFDUFMRHMDMM-UHFFFAOYSA-N N-Heptane Chemical compound CCCCCCC IMNFDUFMRHMDMM-UHFFFAOYSA-N 0.000 description 4
- XYFCBTPGUUZFHI-UHFFFAOYSA-N Phosphine Chemical compound P XYFCBTPGUUZFHI-UHFFFAOYSA-N 0.000 description 4
- NBIIXXVUZAFLBC-UHFFFAOYSA-N Phosphoric acid Chemical compound OP(O)(O)=O NBIIXXVUZAFLBC-UHFFFAOYSA-N 0.000 description 4
- OAICVXFJPJFONN-UHFFFAOYSA-N Phosphorus Chemical compound [P] OAICVXFJPJFONN-UHFFFAOYSA-N 0.000 description 4
- LGRFSURHDFAFJT-UHFFFAOYSA-N Phthalic anhydride Natural products C1=CC=C2C(=O)OC(=O)C2=C1 LGRFSURHDFAFJT-UHFFFAOYSA-N 0.000 description 4
- CDBYLPFSWZWCQE-UHFFFAOYSA-L Sodium Carbonate Chemical compound [Na+].[Na+].[O-]C([O-])=O CDBYLPFSWZWCQE-UHFFFAOYSA-L 0.000 description 4
- 150000008064 anhydrides Chemical class 0.000 description 4
- 125000001797 benzyl group Chemical group [H]C1=C([H])C([H])=C(C([H])=C1[H])C([H])([H])* 0.000 description 4
- WERYXYBDKMZEQL-UHFFFAOYSA-N butane-1,4-diol Chemical compound OCCCCO WERYXYBDKMZEQL-UHFFFAOYSA-N 0.000 description 4
- JHIWVOJDXOSYLW-UHFFFAOYSA-N butyl 2,2-difluorocyclopropane-1-carboxylate Chemical compound CCCCOC(=O)C1CC1(F)F JHIWVOJDXOSYLW-UHFFFAOYSA-N 0.000 description 4
- 125000003178 carboxy group Chemical group [H]OC(*)=O 0.000 description 4
- 239000003638 chemical reducing agent Substances 0.000 description 4
- 239000007789 gas Substances 0.000 description 4
- 229910052736 halogen Inorganic materials 0.000 description 4
- 150000002367 halogens Chemical class 0.000 description 4
- 239000011256 inorganic filler Substances 0.000 description 4
- 229910003475 inorganic filler Inorganic materials 0.000 description 4
- 125000001449 isopropyl group Chemical group [H]C([H])([H])C([H])(*)C([H])([H])[H] 0.000 description 4
- 229910052750 molybdenum Inorganic materials 0.000 description 4
- 125000004123 n-propyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])* 0.000 description 4
- 229910052757 nitrogen Inorganic materials 0.000 description 4
- 230000003287 optical effect Effects 0.000 description 4
- PIBWKRNGBLPSSY-UHFFFAOYSA-L palladium(II) chloride Chemical compound Cl[Pd]Cl PIBWKRNGBLPSSY-UHFFFAOYSA-L 0.000 description 4
- 230000035699 permeability Effects 0.000 description 4
- 150000002989 phenols Chemical class 0.000 description 4
- PARWUHTVGZSQPD-UHFFFAOYSA-N phenylsilane Chemical compound [SiH3]C1=CC=CC=C1 PARWUHTVGZSQPD-UHFFFAOYSA-N 0.000 description 4
- 229910052698 phosphorus Inorganic materials 0.000 description 4
- 239000011574 phosphorus Substances 0.000 description 4
- BWHMMNNQKKPAPP-UHFFFAOYSA-L potassium carbonate Chemical compound [K+].[K+].[O-]C([O-])=O BWHMMNNQKKPAPP-UHFFFAOYSA-L 0.000 description 4
- QBERHIJABFXGRZ-UHFFFAOYSA-M rhodium;triphenylphosphane;chloride Chemical compound [Cl-].[Rh].C1=CC=CC=C1P(C=1C=CC=CC=1)C1=CC=CC=C1.C1=CC=CC=C1P(C=1C=CC=CC=1)C1=CC=CC=C1.C1=CC=CC=C1P(C=1C=CC=CC=1)C1=CC=CC=C1 QBERHIJABFXGRZ-UHFFFAOYSA-M 0.000 description 4
- CMPGARWFYBADJI-UHFFFAOYSA-L tungstic acid Chemical compound O[W](O)(=O)=O CMPGARWFYBADJI-UHFFFAOYSA-L 0.000 description 4
- GGAUUQHSCNMCAU-ZXZARUISSA-N (2s,3r)-butane-1,2,3,4-tetracarboxylic acid Chemical compound OC(=O)C[C@H](C(O)=O)[C@H](C(O)=O)CC(O)=O GGAUUQHSCNMCAU-ZXZARUISSA-N 0.000 description 3
- RGAHHPQKNPTZEY-UHFFFAOYSA-N 2-ethyl-4-methylhexane-1,1-diol Chemical compound CCC(C)CC(CC)C(O)O RGAHHPQKNPTZEY-UHFFFAOYSA-N 0.000 description 3
- VPWNQTHUCYMVMZ-UHFFFAOYSA-N 4,4'-sulfonyldiphenol Chemical compound C1=CC(O)=CC=C1S(=O)(=O)C1=CC=C(O)C=C1 VPWNQTHUCYMVMZ-UHFFFAOYSA-N 0.000 description 3
- OSWFIVFLDKOXQC-UHFFFAOYSA-N 4-(3-methoxyphenyl)aniline Chemical compound COC1=CC=CC(C=2C=CC(N)=CC=2)=C1 OSWFIVFLDKOXQC-UHFFFAOYSA-N 0.000 description 3
- MWSKJDNQKGCKPA-UHFFFAOYSA-N 6-methyl-3a,4,5,7a-tetrahydro-2-benzofuran-1,3-dione Chemical compound C1CC(C)=CC2C(=O)OC(=O)C12 MWSKJDNQKGCKPA-UHFFFAOYSA-N 0.000 description 3
- LQOPXMZSGSTGMF-UHFFFAOYSA-N 6004-79-1 Chemical compound C1CC2C3C(=O)OC(=O)C3C1C2 LQOPXMZSGSTGMF-UHFFFAOYSA-N 0.000 description 3
- CSCPPACGZOOCGX-UHFFFAOYSA-N Acetone Chemical compound CC(C)=O CSCPPACGZOOCGX-UHFFFAOYSA-N 0.000 description 3
- WEVYAHXRMPXWCK-UHFFFAOYSA-N Acetonitrile Chemical compound CC#N WEVYAHXRMPXWCK-UHFFFAOYSA-N 0.000 description 3
- UHOVQNZJYSORNB-UHFFFAOYSA-N Benzene Chemical compound C1=CC=CC=C1 UHOVQNZJYSORNB-UHFFFAOYSA-N 0.000 description 3
- YMWUJEATGCHHMB-UHFFFAOYSA-N Dichloromethane Chemical compound ClCCl YMWUJEATGCHHMB-UHFFFAOYSA-N 0.000 description 3
- XEKOWRVHYACXOJ-UHFFFAOYSA-N Ethyl acetate Chemical compound CCOC(C)=O XEKOWRVHYACXOJ-UHFFFAOYSA-N 0.000 description 3
- 239000005977 Ethylene Substances 0.000 description 3
- IAYPIBMASNFSPL-UHFFFAOYSA-N Ethylene oxide Chemical group C1CO1 IAYPIBMASNFSPL-UHFFFAOYSA-N 0.000 description 3
- QIGBRXMKCJKVMJ-UHFFFAOYSA-N Hydroquinone Chemical compound OC1=CC=C(O)C=C1 QIGBRXMKCJKVMJ-UHFFFAOYSA-N 0.000 description 3
- MUBZPKHOEPUJKR-UHFFFAOYSA-N Oxalic acid Chemical compound OC(=O)C(O)=O MUBZPKHOEPUJKR-UHFFFAOYSA-N 0.000 description 3
- DNIAPMSPPWPWGF-UHFFFAOYSA-N Propylene glycol Chemical compound CC(O)CO DNIAPMSPPWPWGF-UHFFFAOYSA-N 0.000 description 3
- GOOHAUXETOMSMM-UHFFFAOYSA-N Propylene oxide Chemical group CC1CO1 GOOHAUXETOMSMM-UHFFFAOYSA-N 0.000 description 3
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 3
- 235000011054 acetic acid Nutrition 0.000 description 3
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 description 3
- 239000007864 aqueous solution Substances 0.000 description 3
- IIWFPIKUKKAYDT-UHFFFAOYSA-N bicyclo[2.2.1]hept-2-ene-3,4-diol Chemical compound C1CC2(O)C(O)=CC1C2 IIWFPIKUKKAYDT-UHFFFAOYSA-N 0.000 description 3
- 239000011230 binding agent Substances 0.000 description 3
- 239000002131 composite material Substances 0.000 description 3
- 238000005859 coupling reaction Methods 0.000 description 3
- OZEHOHQZIRILDX-UHFFFAOYSA-N ctk1b7797 Chemical compound O=C1OC(=O)C2C1C1(C)CC2CC1 OZEHOHQZIRILDX-UHFFFAOYSA-N 0.000 description 3
- 125000001511 cyclopentyl group Chemical group [H]C1([H])C([H])([H])C([H])([H])C([H])(*)C1([H])[H] 0.000 description 3
- 238000006356 dehydrogenation reaction Methods 0.000 description 3
- BNIILDVGGAEEIG-UHFFFAOYSA-L disodium hydrogen phosphate Chemical compound [Na+].[Na+].OP([O-])([O-])=O BNIILDVGGAEEIG-UHFFFAOYSA-L 0.000 description 3
- 238000006735 epoxidation reaction Methods 0.000 description 3
- 235000019253 formic acid Nutrition 0.000 description 3
- 229930195733 hydrocarbon Natural products 0.000 description 3
- 238000006459 hydrosilylation reaction Methods 0.000 description 3
- 239000003456 ion exchange resin Substances 0.000 description 3
- 229920003303 ion-exchange polymer Polymers 0.000 description 3
- 239000004611 light stabiliser Substances 0.000 description 3
- 230000014759 maintenance of location Effects 0.000 description 3
- 239000011733 molybdenum Substances 0.000 description 3
- 229910000403 monosodium phosphate Inorganic materials 0.000 description 3
- 235000019799 monosodium phosphate Nutrition 0.000 description 3
- 125000004108 n-butyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 description 3
- SLCVBVWXLSEKPL-UHFFFAOYSA-N neopentyl glycol Chemical compound OCC(C)(C)CO SLCVBVWXLSEKPL-UHFFFAOYSA-N 0.000 description 3
- 229940117969 neopentyl glycol Drugs 0.000 description 3
- 125000002347 octyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 3
- UHHKSVZZTYJVEG-UHFFFAOYSA-N oxepane Chemical group C1CCCOCC1 UHHKSVZZTYJVEG-UHFFFAOYSA-N 0.000 description 3
- 150000004965 peroxy acids Chemical class 0.000 description 3
- OJMIONKXNSYLSR-UHFFFAOYSA-N phosphorous acid Chemical compound OP(O)O OJMIONKXNSYLSR-UHFFFAOYSA-N 0.000 description 3
- 235000013824 polyphenols Nutrition 0.000 description 3
- QQONPFPTGQHPMA-UHFFFAOYSA-N propylene Natural products CC=C QQONPFPTGQHPMA-UHFFFAOYSA-N 0.000 description 3
- 125000001453 quaternary ammonium group Chemical group 0.000 description 3
- 230000000171 quenching effect Effects 0.000 description 3
- 230000009257 reactivity Effects 0.000 description 3
- 229920002050 silicone resin Polymers 0.000 description 3
- AJPJDKMHJJGVTQ-UHFFFAOYSA-M sodium dihydrogen phosphate Chemical compound [Na+].OP(O)([O-])=O AJPJDKMHJJGVTQ-UHFFFAOYSA-M 0.000 description 3
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- 229940093499 ethyl acetate Drugs 0.000 description 1
- 235000019439 ethyl acetate Nutrition 0.000 description 1
- 239000003063 flame retardant Substances 0.000 description 1
- 238000001879 gelation Methods 0.000 description 1
- 239000011521 glass Substances 0.000 description 1
- 230000009477 glass transition Effects 0.000 description 1
- 235000011187 glycerol Nutrition 0.000 description 1
- LHGVFZTZFXWLCP-UHFFFAOYSA-N guaiacol Chemical class COC1=CC=CC=C1O LHGVFZTZFXWLCP-UHFFFAOYSA-N 0.000 description 1
- 150000004820 halides Chemical class 0.000 description 1
- LNEPOXFFQSENCJ-UHFFFAOYSA-N haloperidol Chemical class C1CC(O)(C=2C=CC(Cl)=CC=2)CCN1CCCC(=O)C1=CC=C(F)C=C1 LNEPOXFFQSENCJ-UHFFFAOYSA-N 0.000 description 1
- 230000009931 harmful effect Effects 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- MHIBEGOZTWERHF-UHFFFAOYSA-N heptane-1,1-diol Chemical compound CCCCCCC(O)O MHIBEGOZTWERHF-UHFFFAOYSA-N 0.000 description 1
- ACCCMOQWYVYDOT-UHFFFAOYSA-N hexane-1,1-diol Chemical compound CCCCCC(O)O ACCCMOQWYVYDOT-UHFFFAOYSA-N 0.000 description 1
- FUZZWVXGSFPDMH-UHFFFAOYSA-N hexanoic acid Chemical compound CCCCCC(O)=O FUZZWVXGSFPDMH-UHFFFAOYSA-N 0.000 description 1
- ISBXAFPBXLGRIP-UHFFFAOYSA-N hexyl(methyl)silicon Chemical compound CCCCCC[Si]C ISBXAFPBXLGRIP-UHFFFAOYSA-N 0.000 description 1
- 150000004679 hydroxides Chemical class 0.000 description 1
- 150000002460 imidazoles Chemical class 0.000 description 1
- 238000009776 industrial production Methods 0.000 description 1
- 239000004615 ingredient Substances 0.000 description 1
- 239000003112 inhibitor Substances 0.000 description 1
- 235000014413 iron hydroxide Nutrition 0.000 description 1
- NCNCGGDMXMBVIA-UHFFFAOYSA-L iron(ii) hydroxide Chemical compound [OH-].[OH-].[Fe+2] NCNCGGDMXMBVIA-UHFFFAOYSA-L 0.000 description 1
- 239000002648 laminated material Substances 0.000 description 1
- 239000004850 liquid epoxy resins (LERs) Substances 0.000 description 1
- 230000007774 longterm Effects 0.000 description 1
- 229920002521 macromolecule Polymers 0.000 description 1
- 229910001425 magnesium ion Inorganic materials 0.000 description 1
- VZCYOOQTPOCHFL-UPHRSURJSA-N maleic acid Chemical compound OC(=O)\C=C/C(O)=O VZCYOOQTPOCHFL-UPHRSURJSA-N 0.000 description 1
- 239000011976 maleic acid Substances 0.000 description 1
- 238000005259 measurement Methods 0.000 description 1
- 239000000155 melt Substances 0.000 description 1
- 238000002844 melting Methods 0.000 description 1
- 230000008018 melting Effects 0.000 description 1
- 229910044991 metal oxide Inorganic materials 0.000 description 1
- 150000004706 metal oxides Chemical class 0.000 description 1
- WSFSSNUMVMOOMR-NJFSPNSNSA-N methanone Chemical compound O=[14CH2] WSFSSNUMVMOOMR-NJFSPNSNSA-N 0.000 description 1
- GQKZBCPTCWJTAS-UHFFFAOYSA-N methoxymethylbenzene Chemical compound COCC1=CC=CC=C1 GQKZBCPTCWJTAS-UHFFFAOYSA-N 0.000 description 1
- 125000004492 methyl ester group Chemical group 0.000 description 1
- ZUZLIXGTXQBUDC-UHFFFAOYSA-N methyltrioctylammonium Chemical class CCCCCCCC[N+](C)(CCCCCCCC)CCCCCCCC ZUZLIXGTXQBUDC-UHFFFAOYSA-N 0.000 description 1
- 239000012778 molding material Substances 0.000 description 1
- VLAPMBHFAWRUQP-UHFFFAOYSA-L molybdic acid Chemical compound O[Mo](O)(=O)=O VLAPMBHFAWRUQP-UHFFFAOYSA-L 0.000 description 1
- 239000000178 monomer Substances 0.000 description 1
- 229910052901 montmorillonite Inorganic materials 0.000 description 1
- IJDNQMDRQITEOD-UHFFFAOYSA-N n-butane Chemical compound CCCC IJDNQMDRQITEOD-UHFFFAOYSA-N 0.000 description 1
- FDAKZQLBIFPGSV-UHFFFAOYSA-N n-butyl-2,2,6,6-tetramethylpiperidin-4-amine Chemical compound CCCCNC1CC(C)(C)NC(C)(C)C1 FDAKZQLBIFPGSV-UHFFFAOYSA-N 0.000 description 1
- IKVDMBQGHZVMRN-UHFFFAOYSA-N n-methyldecan-1-amine Chemical class CCCCCCCCCCNC IKVDMBQGHZVMRN-UHFFFAOYSA-N 0.000 description 1
- OFBQJSOFQDEBGM-UHFFFAOYSA-N n-pentane Natural products CCCCC OFBQJSOFQDEBGM-UHFFFAOYSA-N 0.000 description 1
- 150000004780 naphthols Chemical class 0.000 description 1
- 230000003472 neutralizing effect Effects 0.000 description 1
- 150000002825 nitriles Chemical class 0.000 description 1
- 239000012299 nitrogen atmosphere Substances 0.000 description 1
- QJGQUHMNIGDVPM-UHFFFAOYSA-N nitrogen group Chemical group [N] QJGQUHMNIGDVPM-UHFFFAOYSA-N 0.000 description 1
- 229910000510 noble metal Inorganic materials 0.000 description 1
- UMRZSTCPUPJPOJ-UHFFFAOYSA-N norbornane Chemical compound C1CC2CCC1C2 UMRZSTCPUPJPOJ-UHFFFAOYSA-N 0.000 description 1
- 229920001778 nylon Polymers 0.000 description 1
- CSWFWSPPZMEYAY-UHFFFAOYSA-N octadecyl dihydrogen phosphite Chemical compound CCCCCCCCCCCCCCCCCCOP(O)O CSWFWSPPZMEYAY-UHFFFAOYSA-N 0.000 description 1
- TVMXDCGIABBOFY-UHFFFAOYSA-N octane Chemical compound CCCCCCCC TVMXDCGIABBOFY-UHFFFAOYSA-N 0.000 description 1
- OEIJHBUUFURJLI-UHFFFAOYSA-N octane-1,8-diol Chemical compound OCCCCCCCCO OEIJHBUUFURJLI-UHFFFAOYSA-N 0.000 description 1
- WWZKQHOCKIZLMA-UHFFFAOYSA-N octanoic acid Chemical compound CCCCCCCC(O)=O WWZKQHOCKIZLMA-UHFFFAOYSA-N 0.000 description 1
- 150000007524 organic acids Chemical class 0.000 description 1
- 235000005985 organic acids Nutrition 0.000 description 1
- 150000004967 organic peroxy acids Chemical class 0.000 description 1
- 150000003961 organosilicon compounds Chemical class 0.000 description 1
- 235000006408 oxalic acid Nutrition 0.000 description 1
- 239000001301 oxygen Substances 0.000 description 1
- 239000003973 paint Substances 0.000 description 1
- YJVFFLUZDVXJQI-UHFFFAOYSA-L palladium(ii) acetate Chemical compound [Pd+2].CC([O-])=O.CC([O-])=O YJVFFLUZDVXJQI-UHFFFAOYSA-L 0.000 description 1
- JKDRQYIYVJVOPF-FDGPNNRMSA-L palladium(ii) acetylacetonate Chemical compound [Pd+2].C\C([O-])=C\C(C)=O.C\C([O-])=C\C(C)=O JKDRQYIYVJVOPF-FDGPNNRMSA-L 0.000 description 1
- JGBZTJWQMWZVNX-UHFFFAOYSA-N palladium;tricyclohexylphosphane Chemical compound [Pd].C1CCCCC1P(C1CCCCC1)C1CCCCC1.C1CCCCC1P(C1CCCCC1)C1CCCCC1 JGBZTJWQMWZVNX-UHFFFAOYSA-N 0.000 description 1
- NFHFRUOZVGFOOS-UHFFFAOYSA-N palladium;triphenylphosphane Chemical compound [Pd].C1=CC=CC=C1P(C=1C=CC=CC=1)C1=CC=CC=C1.C1=CC=CC=C1P(C=1C=CC=CC=1)C1=CC=CC=C1.C1=CC=CC=C1P(C=1C=CC=CC=1)C1=CC=CC=C1.C1=CC=CC=C1P(C=1C=CC=CC=1)C1=CC=CC=C1 NFHFRUOZVGFOOS-UHFFFAOYSA-N 0.000 description 1
- QNGNSVIICDLXHT-UHFFFAOYSA-N para-ethylbenzaldehyde Natural products CCC1=CC=C(C=O)C=C1 QNGNSVIICDLXHT-UHFFFAOYSA-N 0.000 description 1
- WXZMFSXDPGVJKK-UHFFFAOYSA-N pentaerythritol Chemical compound OCC(CO)(CO)CO WXZMFSXDPGVJKK-UHFFFAOYSA-N 0.000 description 1
- UWJJYHHHVWZFEP-UHFFFAOYSA-N pentane-1,1-diol Chemical compound CCCCC(O)O UWJJYHHHVWZFEP-UHFFFAOYSA-N 0.000 description 1
- 239000002530 phenolic antioxidant Substances 0.000 description 1
- 239000005011 phenolic resin Substances 0.000 description 1
- VCAFTIGPOYBOIC-UHFFFAOYSA-N phenyl dihydrogen phosphite Chemical class OP(O)OC1=CC=CC=C1 VCAFTIGPOYBOIC-UHFFFAOYSA-N 0.000 description 1
- 229910052697 platinum Inorganic materials 0.000 description 1
- QVLTXCYWHPZMCA-UHFFFAOYSA-N po4-po4 Chemical compound OP(O)(O)=O.OP(O)(O)=O QVLTXCYWHPZMCA-UHFFFAOYSA-N 0.000 description 1
- 229920002037 poly(vinyl butyral) polymer Polymers 0.000 description 1
- 239000004848 polyfunctional curative Substances 0.000 description 1
- 229920001721 polyimide Polymers 0.000 description 1
- 239000009719 polyimide resin Substances 0.000 description 1
- 238000006116 polymerization reaction Methods 0.000 description 1
- 229920006324 polyoxymethylene Polymers 0.000 description 1
- 150000008442 polyphenolic compounds Chemical class 0.000 description 1
- 239000011591 potassium Substances 0.000 description 1
- 229910052700 potassium Inorganic materials 0.000 description 1
- 229910001414 potassium ion Inorganic materials 0.000 description 1
- 239000002243 precursor Substances 0.000 description 1
- 230000008569 process Effects 0.000 description 1
- 230000001737 promoting effect Effects 0.000 description 1
- ULWHHBHJGPPBCO-UHFFFAOYSA-N propane-1,1-diol Chemical compound CCC(O)O ULWHHBHJGPPBCO-UHFFFAOYSA-N 0.000 description 1
- 235000019260 propionic acid Nutrition 0.000 description 1
- 125000001436 propyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- 238000000746 purification Methods 0.000 description 1
- IUVKMZGDUIUOCP-BTNSXGMBSA-N quinbolone Chemical compound O([C@H]1CC[C@H]2[C@H]3[C@@H]([C@]4(C=CC(=O)C=C4CC3)C)CC[C@@]21C)C1=CCCC1 IUVKMZGDUIUOCP-BTNSXGMBSA-N 0.000 description 1
- GHMLBKRAJCXXBS-UHFFFAOYSA-N resorcinol Chemical compound OC1=CC=CC(O)=C1 GHMLBKRAJCXXBS-UHFFFAOYSA-N 0.000 description 1
- 229960001755 resorcinol Drugs 0.000 description 1
- 229910052703 rhodium Inorganic materials 0.000 description 1
- 239000010948 rhodium Substances 0.000 description 1
- MHOVAHRLVXNVSD-UHFFFAOYSA-N rhodium atom Chemical compound [Rh] MHOVAHRLVXNVSD-UHFFFAOYSA-N 0.000 description 1
- SMQUZDBALVYZAC-UHFFFAOYSA-N salicylaldehyde Chemical compound OC1=CC=CC=C1C=O SMQUZDBALVYZAC-UHFFFAOYSA-N 0.000 description 1
- 229920006395 saturated elastomer Polymers 0.000 description 1
- 229940116351 sebacate Drugs 0.000 description 1
- CXMXRPHRNRROMY-UHFFFAOYSA-L sebacate(2-) Chemical compound [O-]C(=O)CCCCCCCCC([O-])=O CXMXRPHRNRROMY-UHFFFAOYSA-L 0.000 description 1
- 229910000077 silane Inorganic materials 0.000 description 1
- 239000000741 silica gel Substances 0.000 description 1
- 229910002027 silica gel Inorganic materials 0.000 description 1
- CGFYHILWFSGVJS-UHFFFAOYSA-N silicic acid;trioxotungsten Chemical group O[Si](O)(O)O.O=[W]1(=O)O[W](=O)(=O)O[W](=O)(=O)O1.O=[W]1(=O)O[W](=O)(=O)O[W](=O)(=O)O1.O=[W]1(=O)O[W](=O)(=O)O[W](=O)(=O)O1.O=[W]1(=O)O[W](=O)(=O)O[W](=O)(=O)O1 CGFYHILWFSGVJS-UHFFFAOYSA-N 0.000 description 1
- 239000000377 silicon dioxide Substances 0.000 description 1
- HQVNEWCFYHHQES-UHFFFAOYSA-N silicon nitride Chemical compound N12[Si]34N5[Si]62N3[Si]51N64 HQVNEWCFYHHQES-UHFFFAOYSA-N 0.000 description 1
- 229920002545 silicone oil Polymers 0.000 description 1
- 239000011734 sodium Substances 0.000 description 1
- 229910052708 sodium Inorganic materials 0.000 description 1
- 229910000030 sodium bicarbonate Inorganic materials 0.000 description 1
- 235000017557 sodium bicarbonate Nutrition 0.000 description 1
- 229910001415 sodium ion Inorganic materials 0.000 description 1
- 235000010265 sodium sulphite Nutrition 0.000 description 1
- AKHNMLFCWUSKQB-UHFFFAOYSA-L sodium thiosulfate Chemical compound [Na+].[Na+].[O-]S([O-])(=O)=S AKHNMLFCWUSKQB-UHFFFAOYSA-L 0.000 description 1
- 235000019345 sodium thiosulphate Nutrition 0.000 description 1
- 235000019832 sodium triphosphate Nutrition 0.000 description 1
- 150000003505 terpenes Chemical class 0.000 description 1
- 235000007586 terpenes Nutrition 0.000 description 1
- 150000003512 tertiary amines Chemical class 0.000 description 1
- 238000012360 testing method Methods 0.000 description 1
- BJQWBACJIAKDTJ-UHFFFAOYSA-N tetrabutylphosphanium Chemical compound CCCC[P+](CCCC)(CCCC)CCCC BJQWBACJIAKDTJ-UHFFFAOYSA-N 0.000 description 1
- LVEOKSIILWWVEO-UHFFFAOYSA-N tetradecyl 3-(3-oxo-3-tetradecoxypropyl)sulfanylpropanoate Chemical compound CCCCCCCCCCCCCCOC(=O)CCSCCC(=O)OCCCCCCCCCCCCCC LVEOKSIILWWVEO-UHFFFAOYSA-N 0.000 description 1
- GJSGYPDDPQRWPK-UHFFFAOYSA-N tetrapentylammonium Chemical class CCCCC[N+](CCCCC)(CCCCC)CCCCC GJSGYPDDPQRWPK-UHFFFAOYSA-N 0.000 description 1
- 229920001169 thermoplastic Polymers 0.000 description 1
- 239000004416 thermosoftening plastic Substances 0.000 description 1
- 235000010384 tocopherol Nutrition 0.000 description 1
- 229960001295 tocopherol Drugs 0.000 description 1
- 229930003799 tocopherol Natural products 0.000 description 1
- 239000011732 tocopherol Substances 0.000 description 1
- JOXIMZWYDAKGHI-UHFFFAOYSA-N toluene-4-sulfonic acid Chemical compound CC1=CC=C(S(O)(=O)=O)C=C1 JOXIMZWYDAKGHI-UHFFFAOYSA-N 0.000 description 1
- VZCYOOQTPOCHFL-UHFFFAOYSA-N trans-butenedioic acid Natural products OC(=O)C=CC(O)=O VZCYOOQTPOCHFL-UHFFFAOYSA-N 0.000 description 1
- 238000001721 transfer moulding Methods 0.000 description 1
- SUXIKHBBPQWLHO-UHFFFAOYSA-N trihydroxy-(8-methylnonyl)-(8-methyl-1-phenylnonyl)-lambda5-phosphane Chemical compound CC(C)CCCCCCCP(O)(O)(O)C(CCCCCCC(C)C)C1=CC=CC=C1 SUXIKHBBPQWLHO-UHFFFAOYSA-N 0.000 description 1
- QXJQHYBHAIHNGG-UHFFFAOYSA-N trimethylolethane Chemical compound OCC(C)(CO)CO QXJQHYBHAIHNGG-UHFFFAOYSA-N 0.000 description 1
- 150000004072 triols Chemical class 0.000 description 1
- WGKLOLBTFWFKOD-UHFFFAOYSA-N tris(2-nonylphenyl) phosphite Chemical compound CCCCCCCCCC1=CC=CC=C1OP(OC=1C(=CC=CC=1)CCCCCCCCC)OC1=CC=CC=C1CCCCCCCCC WGKLOLBTFWFKOD-UHFFFAOYSA-N 0.000 description 1
- PBYZMCDFOULPGH-UHFFFAOYSA-N tungstate Chemical class [O-][W]([O-])(=O)=O PBYZMCDFOULPGH-UHFFFAOYSA-N 0.000 description 1
- 235000019154 vitamin C Nutrition 0.000 description 1
- 239000011718 vitamin C Substances 0.000 description 1
- 238000005406 washing Methods 0.000 description 1
- 239000003643 water by type Substances 0.000 description 1
- 229910052725 zinc Inorganic materials 0.000 description 1
- 239000011701 zinc Substances 0.000 description 1
- CHJMFFKHPHCQIJ-UHFFFAOYSA-L zinc;octanoate Chemical compound [Zn+2].CCCCCCCC([O-])=O.CCCCCCCC([O-])=O CHJMFFKHPHCQIJ-UHFFFAOYSA-L 0.000 description 1
- GVJHHUAWPYXKBD-IEOSBIPESA-N α-tocopherol Chemical compound OC1=C(C)C(C)=C2O[C@@](CCC[C@H](C)CCC[C@H](C)CCCC(C)C)(C)CCC2=C1C GVJHHUAWPYXKBD-IEOSBIPESA-N 0.000 description 1
Landscapes
- Epoxy Resins (AREA)
Description
エポキシ樹脂組成物としては、従来から光学材料用途に用いられてきた(特許文献1)。しかし、脂環式エポキシ樹脂においては、主骨格が有機の骨格で形成されていることから、十分な耐熱性、耐候性を付与することができなかった。そのため、光学材料という高い透明性が要求される分野において、厳しい環境下に曝された際や、光学材料として光学部材が発する熱や光の影響下において、耐え得る材料の提供が困難であった。 As an epoxy resin composition, it has been conventionally used for optical material applications (Patent Document 1). However, in the alicyclic epoxy resin, since the main skeleton is formed of an organic skeleton, sufficient heat resistance and weather resistance could not be imparted. Therefore, in the field of optical materials that require high transparency, it has been difficult to provide materials that can withstand exposure to harsh environments or under the influence of heat and light generated by optical members as optical materials. ..
これらの問題を解決するものとして、シリコーン骨格の間に芳香族基を導入する技術が開発されている(特許文献2、特許文献3)。しかし、特許文献2及び3に記載された骨格では着色を帯び、十分な透明性を確保することが困難である。さらに、技術の進歩に伴い、有機EL等の分野で折り曲げ可能な強靭性に優れる材料の要求も高まってきている。そのため、透明性に優れると共に、耐熱性及び強靭性にも優れるエポキシ樹脂の開発が要求されていた。 As a solution to these problems, a technique for introducing an aromatic group between the silicone skeletons has been developed (Patent Documents 2 and 3). However, the skeletons described in Patent Documents 2 and 3 are colored, and it is difficult to ensure sufficient transparency. Further, with the progress of technology, there is an increasing demand for a material having excellent bendability and toughness in the field of organic EL and the like. Therefore, there has been a demand for the development of an epoxy resin having excellent transparency as well as heat resistance and toughness.
本発明は、上記事情に鑑みてなされたもので、透明性、耐熱性及び強靭性に優れた硬化物を与えるシリコーン変性エポキシ樹脂組成物及び当該組成物を硬化することに得られるエポキシ樹脂硬化物を提供することを目的とする。 The present invention has been made in view of the above circumstances, and is a silicone-modified epoxy resin composition that gives a cured product having excellent transparency, heat resistance, and toughness, and an epoxy resin cured product obtained by curing the composition. The purpose is to provide.
本発明は、下記(1)〜(9)に関する。
(1)下記式(1)で表されるシリコーン変性エポキシ樹脂。
下記式(2B)
炭素数1〜6の一価脂肪族炭化水素基又は炭素数6〜12の一価芳香族炭化水素基を、Aは炭素数1〜20のヘテロ環骨格、環式炭化水素骨格又は芳香環骨格を有しても良い有機基を、nは平均値で0〜10をそれぞれ表す。式中、複数存在するR1〜R2はそれぞれ同一であっても異なってもよい。但し、複数存在するR2のうち少なくとも一つは上記式(2A)又は(2B)を表す。)
(2)前記ヘテロ環骨格、環式炭化水素骨格、芳香環骨格が下記から選択される(1)に記載のシリコーン変性エポキシ樹脂。
ヘテロ環骨格:モルホリン骨格、テトラヒドロフラン骨格、オキサン骨格、ジオキサン骨格、トリオキサン骨格、トリアジン骨格、カルバゾール骨格、ピロリジン骨格、ピペリジン骨格
環式炭化水素骨格:ジシクロデカン骨格、トリシクロデカン骨格、アダマンタン骨格、シクロヘキサン骨格、シクロペンタン骨格、シクロヘプタン骨格
芳香環骨格:ベンゼン骨格、ナフタレン骨格、カルバゾール骨格
(3)前記式(1)において、複数存在するR2のうち少なくとも一つは炭素数6〜12の一価芳香族炭化水素基を表すことを特徴とする(1)又は(2)に記載のシリコーン変性エポキシ樹脂。
(4)前記式(1)において、Aが炭素数1〜10のアルキレン基、下記式(3)
又は下記式(4)
のいずれかの有機基である(1)に記載のシリコーン変性エポキシ樹脂。
(5)前記シリコーン変性エポキシ樹脂が、下記式(5A)
の末端アルケニル基を含有するエポキシ基含有化合物又は下記式(5B)
の末端水酸基を含有するエポキシ基含有化合物と、下記式(6)
の反応物である(1)〜(4)のいずれか一項に記載のシリコーン変性エポキシ樹脂。
(6)(1)〜(5)のいずれか一項に記載の(A)シリコーン変性エポキシ樹脂と(B)エポキシ樹脂硬化剤を含有するエポキシ樹脂組成物。
(7)さらに、(C)エポキシ樹脂硬化触媒を含有する(1)〜(6)のいずれか一項に記載のエポキシ樹脂組成物。
(8)(6)記載のエポキシ樹脂硬化剤がアミン系硬化剤、フェノール系硬化剤、酸無水物系硬化剤、多価カルボン酸樹脂のいずれかから選ばれることを特徴とするエポキシ樹脂組成物。
(9)(6)〜(8)のいずれか一項に記載のエポキシ樹脂組成物を硬化してなる硬化物。
The present invention relates to the following (1) to (9).
(1) A silicone-modified epoxy resin represented by the following formula (1).
The following formula (2B)
A monovalent aliphatic hydrocarbon group having 1 to 6 carbon atoms or a monovalent aromatic hydrocarbon group having 6 to 12 carbon atoms, A is a heterocyclic skeleton having 1 to 20 carbon atoms, a cyclic hydrocarbon skeleton or an aromatic ring skeleton. Each of the organic groups may have an average value of 0 to 10. In the formula, a plurality of R 1 to R 2 existing may be the same or different from each other. Provided that at least one of R 2 existing in plural represents the above formula (2A) or (2B). )
(2) The silicone-modified epoxy resin according to (1), wherein the heterocyclic skeleton, the cyclic hydrocarbon skeleton, and the aromatic ring skeleton are selected from the following.
Heterocyclic skeleton: morpholin skeleton, tetrahydrofuran skeleton, oxane skeleton, dioxane skeleton, trioxane skeleton, triazine skeleton, carbazole skeleton, pyrrolidine skeleton, piperidine skeleton Cyclic hydrocarbon skeleton: dicyclodecane skeleton, tricyclodecane skeleton, adamantan skeleton, cyclohexane skeleton, Cyclopentane skeleton, cycloheptan skeleton Aromatic ring skeleton: benzene skeleton, naphthalene skeleton, carbazole skeleton (3) In the above formula (1), at least one of a plurality of R 2 is a monovalent aromatic having 6 to 12 carbon atoms. The silicone-modified epoxy resin according to (1) or (2), which represents a hydrocarbon group.
(4) In the above formula (1), A is an alkylene group having 1 to 10 carbon atoms, and the following formula (3)
Or the following formula (4)
The silicone-modified epoxy resin according to (1), which is an organic group according to any one of the above.
(5) The silicone-modified epoxy resin has the following formula (5A).
Epoxy group-containing compound containing a terminal alkenyl group or the following formula (5B)
Epoxy group-containing compound containing the terminal hydroxyl group of, and the following formula (6)
The silicone-modified epoxy resin according to any one of (1) to (4), which is a reaction product of the above.
(6) An epoxy resin composition containing (A) a silicone-modified epoxy resin and (B) an epoxy resin curing agent according to any one of (1) to (5).
(7) The epoxy resin composition according to any one of (1) to (6), which further contains (C) an epoxy resin curing catalyst.
(8) An epoxy resin composition according to (6), wherein the epoxy resin curing agent is selected from any of an amine-based curing agent, a phenol-based curing agent, an acid anhydride-based curing agent, and a polyvalent carboxylic acid resin. ..
(9) A cured product obtained by curing the epoxy resin composition according to any one of (6) to (8).
本発明のシリコーン変性エポキシ樹脂は、下記式(5A)
の末端アルケニル基を含有するエポキシ基含有化合物又は下記式(5B)
の末端水酸基を含有するエポキシ基含有化合物を、下記式(6)で表される化合物とそれぞれヒドロシリル化反応、脱水素カップリングすることで得られる。
The silicone-modified epoxy resin of the present invention has the following formula (5A).
Epoxy group-containing compound containing a terminal alkenyl group or the following formula (5B)
It is obtained by hydrosilylation reaction and dehydrogenation coupling of the epoxy group-containing compound containing the terminal hydroxyl group of the above with the compound represented by the following formula (6), respectively.
ここで、R5は直接結合又はエステル、エーテル結合を含有してもよい炭素数1〜6のアルキレン基であり、具体的には、メチレン基、エチレン基、プロピレン基、ブチレン基、イソプロピレン基、メチルエステル基、メチルエーテル基などである。
式(5A)で表される化合物としては下記式(7)〜(9)
Examples of the compound represented by the formula (5A) include the following formulas (7) to (9).
本発明のシリコーン変性エポキシ樹脂を得るには、下記式(6)の化合物を反応に用いる。
ここで、上記式(6)のRについて少なくとも1つ以上がフェニル基等の炭素数6〜12の一価芳香族炭化水素基であることが好ましい。
Aは炭素数1〜20のヘテロ環骨格、環式炭化水素骨格又は芳香環骨格を有しても良い有機基を表す。
To obtain the silicone-modified epoxy resin of the present invention, the compound of the following formula (6) is used in the reaction.
Here, it is preferable that at least one or more of R in the above formula (6) is a monovalent aromatic hydrocarbon group having 6 to 12 carbon atoms such as a phenyl group.
A represents an organic group which may have a heterocyclic skeleton, a cyclic hydrocarbon skeleton or an aromatic ring skeleton having 1 to 20 carbon atoms.
この場合、末端にSiH基を有する有機ケイ素化合物と、末端アルケニル基を有する化合物又は末端水酸基を有する化合物との反応割合としては、SiH基/(アルケニル基又は水酸基)のモル比(H/Vi)が0.1〜3.0、特に0.5〜1.5となる割合で反応させることが好ましい。なお、ヒドロシリル化反応又は脱水素カップリング反応は、従来公知の方法に従えばよい。
そして、上記式(6)で表される末端にSiH基を有する有機ケイ素化合物と、上記式(5A)で表される末端アルケニル基を有する化合物又は上記式(5B)で表される末端水酸基を有する化合物とを、白金やロジウム、パラジウムなどの貴金属触媒存在下、ヒドロシリル化反応及び脱水素カップリングによって製造することができる。
In this case, the reaction ratio between the organic silicon compound having a SiH group at the terminal and the compound having a terminal alkenyl group or the compound having a terminal hydroxyl group is the molar ratio (H / Vi) of SiH group / (alkenyl group or hydroxyl group). It is preferable to react at a ratio of 0.1 to 3.0, particularly 0.5 to 1.5. The hydrosilylation reaction or the dehydrogenation coupling reaction may be carried out according to a conventionally known method.
Then, the organosilicon compound having a SiH group at the terminal represented by the above formula (6) and the compound having a terminal alkenyl group represented by the above formula (5A) or the terminal hydroxyl group represented by the above formula (5B) are added. The compound can be produced by a hydrosilylation reaction and a dehydrogenation coupling in the presence of a noble metal catalyst such as platinum, rhodium, or palladium.
ここで、上記式(6)で表される化合物について詳細に説明する。 Here, the compound represented by the above formula (6) will be described in detail.
上記式(6)で表される化合物において、Aは炭素数1〜20のヘテロ環骨格、環式炭化水素骨格又は芳香環骨格を有しても良いアルキレン基等の有機基である。ここで、分子量を大きくする観点からヘテロ環骨格、環式炭化水素骨格又は芳香族骨格を有していることが好ましい。一方、分子量を小さく抑える観点からは、直鎖又は分岐鎖を有する鎖状の炭化水素基であることが好ましい。また、耐熱性を向上させる観点からは、環式炭化水素骨格を有していることが好ましく、強靭性を向上させる観点からはヘテロ環骨格を有するか、直鎖又は分岐鎖を有する鎖状の炭化水素基であることが好ましい。
ヘテロ環骨格としては、モルホリン骨格、テトラヒドロフラン骨格、オキサン骨格、ジオキサン骨格、トリオキサン骨格、トリアジン骨格、カルバゾール骨格、ピロリジン骨格、ピペリジン骨格等が挙げられる。中でも、オキサン骨格、ジオキサン骨格、トリオキサン骨格、モルホリン骨格が好ましい。
環式炭化水素骨格としては、ジシクロデカン骨格、トリシクロデカン骨格、アダマンタン骨格、シクロヘキサン骨格、シクロペンタン骨格、シクロヘプタン骨格等が挙げられる。中でも、トリシクロデカン骨格、シクロヘキサン骨格が好ましい。
芳香族骨格としては、ベンゼン骨格、ナフタレン骨格、カルバゾール骨格等が挙げられる。中でも、ベンゼン骨格が好ましい。
直鎖又は分岐鎖を有する鎖状の炭化水素基としては、メチレン基、エチレン基、プロピレン基、ブチレン基等を挙げることができる。中でも、エチレン基が好ましい。
Aを構成する炭素数としては、通常1〜20であり、1〜15が好ましく、2〜12がより好ましい。
より具体的に好ましいAの有機基は、炭素数1〜10のアルキレン基、下記式(3)
又は下記式(4)
のいずれかの有機基をそれぞれ表す。式中、複数存在するR1〜R3、はそれぞれ同一であっても異なってもよい。複数存在するR2のうち少なくとも一つは炭素数6〜12の一価芳香族炭化水素基を表す。)である。
In the compound represented by the above formula (6), A is an organic group such as an alkylene group which may have a heterocyclic skeleton having 1 to 20 carbon atoms, a cyclic hydrocarbon skeleton or an aromatic ring skeleton. Here, from the viewpoint of increasing the molecular weight, it is preferable to have a heterocyclic skeleton, a cyclic hydrocarbon skeleton or an aromatic skeleton. On the other hand, from the viewpoint of keeping the molecular weight small, a chain hydrocarbon group having a straight chain or a branched chain is preferable. Further, from the viewpoint of improving heat resistance, it is preferable to have a cyclic hydrocarbon skeleton, and from the viewpoint of improving toughness, it has a heterocyclic skeleton, or has a linear or branched chain. It is preferably a hydrocarbon group.
Examples of the heterocyclic skeleton include a morpholine skeleton, a tetrahydrofuran skeleton, an oxane skeleton, a dioxane skeleton, a trioxane skeleton, a triazine skeleton, a carbazole skeleton, a pyrrolidine skeleton, a piperidine skeleton and the like. Of these, an oxane skeleton, a dioxane skeleton, a trioxane skeleton, and a morpholine skeleton are preferable.
Examples of the cyclic hydrocarbon skeleton include a dicyclodecane skeleton, a tricyclodecane skeleton, an adamantane skeleton, a cyclohexane skeleton, a cyclopentane skeleton, and a cycloheptane skeleton. Of these, a tricyclodecane skeleton and a cyclohexane skeleton are preferable.
Examples of the aromatic skeleton include a benzene skeleton, a naphthalene skeleton, and a carbazole skeleton. Of these, the benzene skeleton is preferable.
Examples of the chain hydrocarbon group having a linear or branched chain include a methylene group, an ethylene group, a propylene group, a butylene group and the like. Of these, an ethylene group is preferable.
The number of carbon atoms constituting A is usually 1 to 20, preferably 1 to 15, and more preferably 2 to 12.
More specifically, the preferable organic group of A is an alkylene group having 1 to 10 carbon atoms, which is represented by the following formula (3).
Or the following formula (4)
Represents any of the organic groups of. In the formula, a plurality of R 1 to R 3 existing may be the same or different from each other. At least one of the plurality present R 2 represents a monovalent aromatic hydrocarbon group having 6 to 12 carbon atoms. ).
Rにおける炭素数1〜6の一価脂肪族炭化水素基又は炭素数6〜12の一価芳香族炭化水素基において、炭素数1〜6の一価脂肪族炭化水素基の具体例としては、メチル基、エチル基、n−プロピル基、イソプロピル基、n−ブチル基、t−ブチル基、ヘプチル基、2−エチルヘキシル基、ヘプチル基、オクチル基等のアルキル基などの飽和一価脂肪族炭化水素基、ビニル基、アリル基、イソプロペニル基、ブテニル基等のアルケニル基などの不飽和一価脂肪族炭化水素基などが挙げられ、好ましくはメチル基、エチル基、n−プロピル基、イソプロピル基、n−ブチル基、t−ブチル基、ヘプチル基であり、更に好ましくはメチル基である。また、炭素数6〜12の一価芳香族炭化水素基の具体例としては、フェニル基、トリル基、キシリル基、ナフチル基等のアリール基や、ベンジル基、2−フェニルエチル基、2−フェニルプロピル基等のアラルキル基であり、好ましくはフェニル基、ベンジル基、2−フェニルエチル基、2−フェニルプロピル基であり、更に好ましくはフェニル基である。 In the monovalent aliphatic hydrocarbon group having 1 to 6 carbon atoms or the monovalent aromatic hydrocarbon group having 6 to 12 carbon atoms in R, specific examples of the monovalent aliphatic hydrocarbon group having 1 to 6 carbon atoms include. Saturated monovalent aliphatic hydrocarbons such as alkyl groups such as methyl group, ethyl group, n-propyl group, isopropyl group, n-butyl group, t-butyl group, heptyl group, 2-ethylhexyl group, heptyl group and octyl group. Examples thereof include unsaturated monovalent aliphatic hydrocarbon groups such as alkenyl groups such as groups, vinyl groups, allyl groups, isopropenyl groups and butenyl groups, preferably methyl group, ethyl group, n-propyl group, isopropyl group and the like. It is an n-butyl group, a t-butyl group, a heptyl group, and more preferably a methyl group. Specific examples of the monovalent aromatic hydrocarbon group having 6 to 12 carbon atoms include an aryl group such as a phenyl group, a trill group, a xsilyl group and a naphthyl group, a benzyl group, a 2-phenylethyl group and a 2-phenylpropi group. It is an aralkyl group such as a ru group, preferably a phenyl group, a benzyl group, a 2-phenylethyl group, a 2-phenylpropyl group, and more preferably a phenyl group.
R3は炭素数1〜6のアルキレン基である。具体的には、メチレン基、エチレン基、プロピレン基、イソプロピレン基、ブチレン基、イソブチレン基、ペンチレン基、ヘキシル基、エチレンエステル基、プロピレンエステル基、ブチレンエステル基、ペンチレンエステル基、イソプロピレンエステル基、イソブチレンエステル基、エチレンエーテル基、プロピレンエーテル基、ブチレンエーテル基、ペンチレンエーテル基、ヘキシレンエーテル基等が挙げられる。これらアルキレン基の中でも、硬化物の低ガス透過性、強度の観点からメチレン基、イソブチレン基が特に好ましい。 R 3 is an alkylene group having 1 to 6 carbon atoms. Specifically, methylene group, ethylene group, propylene group, isopropylene group, butylene group, isobutylene group, pentylene group, hexyl group, ethylene ester group, propylene ester group, butylene ester group, pentylene ester group, isopropylene ester. Examples thereof include a group, an isobutylene ester group, an ethylene ether group, a propylene ether group, a butylene ether group, a pentylene ether group, a hexylene ether group and the like. Among these alkylene groups, a methylene group and an isobutylene group are particularly preferable from the viewpoint of low gas permeability and strength of the cured product.
R4における水素原子又は炭素数1〜3のアルキル基である。具体的にはメチル基、エチル基、プロピル基が挙げられる。中でもエチル基が好ましい。 Is a hydrogen atom or an alkyl group having 1 to 3 carbon atoms in R 4. Specific examples thereof include a methyl group, an ethyl group and a propyl group. Of these, an ethyl group is preferable.
nは平均値で0〜10であり、好ましくは0〜5、さらに好ましくは0〜2である。kは平均値で1〜10であり、硬化物の低ガス透過性の観点から好ましくは1〜2である。 n has an average value of 0 to 10, preferably 0 to 5, and more preferably 0 to 2. The average value of k is 1 to 10, and it is preferably 1 to 2 from the viewpoint of low gas permeability of the cured product.
ここで、上記式(6)で表される化合物は、多価アルコール類とシラン化合物を反応させてえることができる。
即ち、本発明によれば、一般式(10)
ここで、炭素数1〜20のヘテロ環骨格、環式炭化水素骨格又は芳香環骨格を有しても良い有機基の例として、ヘテロ環骨格、環式炭化水素骨格又は芳香環骨格としては上記骨格を挙げることができる。そして、例として、Aは炭素数1〜10のアルキレン基、下記式(3)
又は下記式(4)
のいずれかの有機基をそれぞれ表す。式中、複数存在するR3、R4、はそれぞれ同一であっても異なってもよい。)を挙げることができる。
Here, the compound represented by the above formula (6) can be obtained by reacting a polyhydric alcohol with a silane compound.
That is, according to the present invention, the general formula (10)
Here, as an example of an organic group which may have a heterocyclic skeleton, a cyclic hydrocarbon skeleton or an aromatic ring skeleton having 1 to 20 carbon atoms, the heterocyclic skeleton, the cyclic hydrocarbon skeleton or the aromatic ring skeleton is described above. The skeleton can be mentioned. Then, as an example, A is an alkylene group having 1 to 10 carbon atoms, and the following formula (3)
Or the following formula (4)
Represents any of the organic groups of. In the formula, a plurality of R 3 and R 4 may be the same or different from each other. ) Can be mentioned.
さらに、本発明に用いられる多価アルコール類は、それぞれ一種類のものである必要はなく、複数の種類の混合物を用いても良い。一般式(11)で表されるジヒドロシラン類も、一種類のものである必要はない。 Further, the polyhydric alcohols used in the present invention do not have to be one kind each, and a mixture of a plurality of kinds may be used. The dihydrosilanes represented by the general formula (11) do not have to be one type.
本発明の製造方法に用いられる多価アルコール類には、炭素数1〜20のヘテロ環骨格、環式炭化水素骨格又は芳香環骨格を有しても良いアルキレングリコール類を用いることができる。ヘテロ環骨格、環式炭化水素骨格、芳香環骨格としては上記の骨格を挙げることができる。又、炭素数1〜20の直鎖又は分岐鎖を有するアルキレングリコール類を使用することもできる。
例としては、下記式(12)
で表されるジオール化合物、下記式(13)
で表されるジオール化合物を挙げることができる。
As the polyhydric alcohols used in the production method of the present invention, alkylene glycols which may have a heterocyclic skeleton having 1 to 20 carbon atoms, a cyclic hydrocarbon skeleton or an aromatic ring skeleton can be used. Examples of the heterocyclic skeleton, the cyclic hydrocarbon skeleton, and the aromatic ring skeleton include the above-mentioned skeletons. Further, alkylene glycols having a linear or branched chain having 1 to 20 carbon atoms can also be used.
As an example, the following equation (12)
The diol compound represented by the following formula (13)
Examples of the diol compound represented by.
炭素数1〜20の直鎖又は分岐鎖を有するアルキレングリコール類としては、エチレングリコール、プロパンジオール、ブタンジオール、ペンタンジオール、ヘキサンジオール、ヘプタンジオール、オクタンジオール、デカンジオール、2,4−ジメチルペンタンジオール、1,3−プロパンジオール、1,4−ブタンジオール、1,3−ブタンジオール等を挙げることができる。 Examples of alkylene glycols having a linear or branched chain having 1 to 20 carbon atoms include ethylene glycol, propanediol, butanediol, pentanediol, hexanediol, heptanediol, octanediol, decanediol, and 2,4-dimethylpentanediol. , 1,3-Propanediol, 1,4-butanediol, 1,3-butanediol and the like.
上記式(12)で表されるジオール化合物としては、R3はメチレン基、エチレン基、プロピレン基、ブチレン基、イソブチレン基、ペンチレン基、イソペンチレン基、ヘキセン基等が挙げられるが、メチレン基であることが好ましい。
mは1であることが好ましく、R4は水素原子であることが好ましい。
特に、下記式(14)
m is preferably 1 and R 4 is preferably a hydrogen atom.
In particular, the following equation (14)
上記式(13)で表されるジオール化合物としては、R3はメチレン基、エチレン基、プロピレン基、ブチレン基、イソブチレン基、t−ブチレン基、ペンチレン基、イソペンチレン基、ヘキセン基等が挙げられるが、メチレン基、t−ブチレン基であることが好ましい。
R4は水素原子であることが好ましい。
特に、下記式(15)
R 4 is preferably a hydrogen atom.
In particular, the following equation (15)
本発明の製造方法に用いられるヒドロシラン類には特に制限はないが、これを例示すれば、ジメチルシラン、プロピルメチルシラン、ブチルメチルシラン、へキシルメチルシラン、ドデシルメチルシラン、ジブチルシラン、ジヘキシルシラン、ジシクロヘキシルシラン、フェニルシラン、フェニルメチルシラン、ナフチルメチルシラン、ベンジルメチルシラン、トリルメチルシラン、アニシルメチルシラン、トリフルオロメチルフェニルメチルシラン、ジフェニルシラン、ジトリルシラン、ジアニシルシラン、ビス(トリフルオロメチルフェニル)シラン、ジナフチルシラン、ジベンジルシラン等を挙げることができる。
中でも、フェニルシラン、ジフェニルシランが好ましい。
The hydrosilanes used in the production method of the present invention are not particularly limited, and examples thereof include dimethylsilane, propylmethylsilane, butylmethylsilane, hexylmethylsilane, dodecylmethylsilane, dibutylsilane, and dihexylsilane. Dicyclohexylsilane, phenylsilane, phenylmethylsilane, naphthylmethylsilane, benzylmethylsilane, trillmethylsilane, anisylmethylsilane, trifluoromethylphenylmethylsilane, diphenylsilane, ditrilsilane, dianicilsilane, bis (trifluoromethylphenyl) silane, Examples thereof include dinaphthylsilane and dibenzylsilane.
Of these, phenylsilane and diphenylsilane are preferable.
本発明の製造方法においては、パラジウム含有触媒を用いる。パラジウム含有触媒としては種々のものを用いることができるが、これを例示すれば、ビス(トリフェニルホスフィン)ジクロロパラジウム、ビス(トリエチルホスフィン)ジクロロパラジウム、ビス(トリシクロヘキシルホスフィン)パラジウム、テトラキス(トリフェニルホスフィン)パラジウム、トリス(トリエチルホスフィン)パラジウム、(テトラメチルエチレンジアミン)ジクロロパラジウム、アリルパラジウムクロリド二量体、ビス(ベンゾニトリル)ジクロロパラジウム、(1,5−シクロオクタジエン)ジクロロパラジウム、トリス(ジベンジリデンアセトン)ジパラジウム、ビス(アセチルアセトナト)パラジウム、酢酸パラジウム、塩化パラジウム、パラジウム黒、パラジウム炭素、、含窒素ヘテロ環カルベンパラジウム等を挙げることができる。ここで、分子量制御をしゲル化を抑制しやすいことから、パラジウム炭素を用いることが好ましい。 In the production method of the present invention, a palladium-containing catalyst is used. Various types of palladium-containing catalysts can be used. Examples thereof include bis (triphenylphosphine) dichloropalladium, bis (triethylphosphine) dichloropalladium, bis (tricyclohexylphosphine) palladium, and tetrakis (triphenyl). Phosphine) palladium, tris (triethylphosphine) palladium, (tetramethylethylenediamine) dichloropalladium, allylpalladium chloride dimer, bis (benzonitrile) dichloropalladium, (1,5-cyclooctadiene) dichloropalladium, tris (dibenziliden Examples thereof include acetone) dipalladium, bis (acetylacetonato) palladium, palladium acetate, palladium chloride, palladium black, palladium carbon, and nitrogen-containing heterocyclic carben palladium. Here, it is preferable to use palladium carbon because it is easy to control the molecular weight and suppress gelation.
本発明の製造方法は、多価アルコール類と、ヒドロシラン類とを、パラジウム含有触媒の存在下に反応させることにより達成される。有機ジオール類とヒドロシラン類とのモル比には特に制限はないが、1:5から5:1、さらに望ましくは、1:2から2:1の範囲のモル比が望ましい。ヒドロシラン類とパラジウム含有触媒におけるパラジウムとのモル比にも特に制限はないが、収率等を考慮すれば、10,000:1から2:1の範囲のモル比でこれを実施することができる。本発明における反応は、原料の一つが液体である場合には溶媒を用いずにこれを実施することができるが、ベンゼン、トルエン、ヘキサン等の炭化水素系溶媒、ジエチルエーテル、THF、ジオキサン等のエーテル系溶媒、塩化メチレン、クロロホルム等のハロゲン系溶媒を用いることができる。反応温度にも特に制限はないが、反応性と原料の安定性等を考慮すれば、0℃から150℃の範囲でこれを実施することができる。 The production method of the present invention is achieved by reacting polyhydric alcohols with hydrosilanes in the presence of a palladium-containing catalyst. The molar ratio of the organic diols to the hydrosilanes is not particularly limited, but a molar ratio in the range of 1: 5 to 5: 1, more preferably 1: 2 to 2: 1 is desirable. The molar ratio of hydrosilanes to palladium in the palladium-containing catalyst is not particularly limited, but this can be carried out at a molar ratio in the range of 10,000: 1 to 2: 1 in consideration of yield and the like. .. The reaction in the present invention can be carried out without using a solvent when one of the raw materials is a liquid, but a hydrocarbon solvent such as benzene, toluene or hexane, diethyl ether, THF, dioxane or the like can be used. A halogen-based solvent such as an ether solvent, methylene chloride, or chloroform can be used. The reaction temperature is also not particularly limited, but this can be carried out in the range of 0 ° C. to 150 ° C. in consideration of reactivity, stability of the raw material and the like.
ここで、上記式(5)で表される化合物は、上記末端アルケニル基を有する化合物を前述したジオレフィン樹脂の酸化方法で酸化することにより、得ることができる。
即ち、下記式(16)
で表されるオレフィン化合物を酸化して得ることができる。
Here, the compound represented by the above formula (5) can be obtained by oxidizing the compound having the terminal alkenyl group by the above-mentioned oxidation method of the diolefin resin.
That is, the following equation (16)
It can be obtained by oxidizing the olefin compound represented by.
上記式(16)において、R5は直接結合又はエステル、エーテル結合を含有してもよい炭素数1〜4のアルキレン基である。具体的には、エチレン基、プロピレン基、イソプロピレン基、ブチレン基、エチレンエステル基、プロピレンエステル基、エチレンエーテル基、プロピレンエーテル基、ブチレンエーテル基、ペンチレンエーテル基、ヘキシレンエーテル基等が挙げられる。これらアルキレン基の中でも、硬化物の低ガス透過性、強度の観点からエチレン基、プロピレン基が特に好ましい。 In the above formula (16), R 5 is a direct bond or an ester, an alkylene group having 1 to 4 carbon atoms which may contain an ether bond. Specific examples thereof include an ethylene group, a propylene group, an isopropylene group, a butylene group, an ethylene ester group, a propylene ester group, an ethylene ether group, a propylene ether group, a butylene ether group, a pentylene ether group and a hexylene ether group. Be done. Among these alkylene groups, an ethylene group and a propylene group are particularly preferable from the viewpoint of low gas permeability and strength of the cured product.
酸化の手法としては過酢酸等の過酸で酸化する方法、過酸化水素水で酸化する方法、空気(酸素)で酸化する方法などが挙げられるが、これらに限らない。
過酸によるエポキシ化の手法としては具体的には日本国特開2006−52187号公報に記載の手法などが挙げられる。使用できる過酸としては、例えばギ酸、酢酸、プロピオン酸、マレイン酸、安息香酸、m−クロロ安息香酸、フタル酸などの有機酸およびそれらの酸無水物が挙げられる。これらの中でも、過酸化水素と反応して有機過酸を生成する効率、反応温度、操作の簡便性、経済性などの観点からは、ギ酸、酢酸、無水フタル酸を使用するのが好ましく、特に反応操作の簡便性の観点から、ギ酸または酢酸を使用するのがより好ましい。
過酸化水素水によるエポキシ化の手法においては種々の手法が適応できるが、具体的には、日本国特開昭59−108793号公報、日本国特開昭62−234550号公報、日本国特開平5−213919号公報、日本国特開平11−349579号公報、日本国特公平1―33471号公報、日本国特開2001−17864号公報、日本国特公平3−57102号公報等に挙げられるような手法が適応できる。
他にも、非特許文献1(James V.Crivello and Ramesh Narayan、Novel Epoxynorbornane Monomers. 1. Synthesis and Characterization、Macromolecules 1996、29巻、433〜438頁)に記載されている方法も適用することができる。具体的には、オキソンを使用して、オレフィン基をエポキシ化して得ることができる。
Examples of the oxidation method include, but are not limited to, a method of oxidizing with a peracid such as peracetic acid, a method of oxidizing with a hydrogen peroxide solution, and a method of oxidizing with air (oxygen).
Specific examples of the epoxidation method using peracid include the methods described in Japanese Patent Application Laid-Open No. 2006-52187. Peracids that can be used include, for example, organic acids such as formic acid, acetic acid, propionic acid, maleic acid, benzoic acid, m-chlorobenzoic acid, phthalic acid and their acid anhydrides. Among these, formic acid, acetic acid, and phthalic anhydride are preferably used from the viewpoints of efficiency of reacting with hydrogen peroxide to generate organic peracid, reaction temperature, convenience of operation, and economy. From the viewpoint of convenience of reaction operation, it is more preferable to use formic acid or acetic acid.
Various methods can be applied to the method of epoxidation with a hydrogen peroxide solution. Specifically, Japanese Patent Application Laid-Open No. 59-108793, Japanese Patent Application Laid-Open No. 62-234550, and Japanese Patent Application Laid-Open No. As mentioned in Japanese Patent Application Laid-Open No. 5-213919, Japanese Patent Application Laid-Open No. 11-349579, Japanese Japanese Patent Application Laid-Open No. 1-33471, Japanese Japanese Patent Application Laid-Open No. 2001-17864, Japanese Japanese Patent Application Laid-Open No. 3-57102, etc. Method can be applied.
In addition, Non-Patent Document 1 (James V. Crivello and Ramesh Narayan, Novell Epoxynorborne Monomers. 1. Synthesis and characterization, Macromolecules. .. Specifically, it can be obtained by epoxidizing an olefin group using oxone.
以下、前記式(5)で表される化合物を得るのに特に好ましい方法を例示する。
まず、前記式(16)で表されるジオレフィン化合物、ポリ酸類及び4級アンモニウム塩を有機溶剤と過酸化水素水との二層で反応を行う。
Hereinafter, a particularly preferable method for obtaining the compound represented by the formula (5) will be illustrated.
First, the diolefin compound represented by the formula (16), polyacids and quaternary ammonium salt are reacted in two layers of an organic solvent and a hydrogen peroxide solution.
本発明で使用するポリ酸類は、ポリ酸構造を有する化合物であれば特に制限はないが、タングステン又はモリブデンを含むポリ酸類が好ましく、タングステンを含むポリ酸類が更に好ましく、タングステン酸塩類が特に好ましい。
ポリ酸類に含まれる具体的なポリ酸及びポリ酸塩としては、タングステン酸、12−タングストリン酸、12−タングストホウ酸、18−タングストリン酸及び12−タングストケイ酸等から選ばれるタングステン系の酸、モリブデン酸及びリンモリブデン酸等から選ばれるモリブデン系の酸、ならびにそれらの塩等が挙げられる。
これらの塩のカウンターカチオンとしては、アンモニウムイオン、アルカリ土類金属イオン、アルカリ金属イオン等が挙げられる。
具体的にはカルシウムイオン、マグネシウムイオン等のアルカリ土類金属イオン、ナトリウム、カリウム、セシウム等のアルカリ金属イオン等が挙げられるがこれらに限定されない。特に好ましいカウンターカチオンとしては、ナトリウムイオン、カリウムイオン、カルシウムイオン、アンモニウムイオンである。
The polyacids used in the present invention are not particularly limited as long as they are compounds having a polyacid structure, but polyacids containing tungsten or molybdenum are preferable, polyacids containing tungsten are more preferable, and tungstate salts are particularly preferable.
Specific polyacids and polyacidates contained in polyacids include tungsten-based acids selected from tungonic acid, 12-tangstophosphoric acid, 12-tangstoboric acid, 18-tangstophosphoric acid, 12-tangstosilicic acid and the like. Examples thereof include molybdenum-based acids selected from molybdic acid and phosphoric acid, and salts thereof.
Examples of the counter cations of these salts include ammonium ion, alkaline earth metal ion, alkali metal ion and the like.
Specific examples thereof include, but are not limited to, alkaline earth metal ions such as calcium ion and magnesium ion, and alkali metal ions such as sodium, potassium and cesium. Particularly preferable counter cations are sodium ion, potassium ion, calcium ion and ammonium ion.
ポリ酸類の使用量は本発明のジオレフィン化合物におけるオレフィン1モル(官能基当量)に対し、金属元素換算(タングテン酸ならタングステン原子、モリブデン酸ならモリブデン原子のモル数)で1.0〜20ミリモル、好ましくは2.0〜20ミリモル、さらに好ましくは2.5〜10ミリモルである。 The amount of polyacids used is 1.0 to 20 mmol in terms of metal element (tungsten atom for tangtenic acid, molar number of molybdenum atom for molybdenum acid) with respect to 1 mol (functional group equivalent) of olefin in the diolefin compound of the present invention. It is preferably 2.0 to 20 mmol, more preferably 2.5 to 10 mmol.
4級アンモニウム塩としては、総炭素数が10以上、好ましくは25〜100、より好ましくは25〜55の4級アンモニウム塩が好ましく使用でき、特にそのアルキル鎖が全て脂肪族鎖であるものが好ましい。
具体的にはトリデカニルメチルアンモニウム塩、ジラウリルジメチルアンモニウム塩、トリオクチルメチルアンモニウム塩、トリアルキルメチル(アルキル基がオクチル基である化合物とデカニル基である化合物の混合タイプ)アンモニウム塩、トリヘキサデシルメチルアンモニウム塩、トリメチルステアリルアンモニウム塩、テトラペンチルアンモニウム塩、セチルトリメチルアンモニウム塩、ベンジルトリブチルアンモニウム塩、ジセチルジメチルアンモニウム塩、トリセチルメチルアンモニウム塩、ジ硬化牛脂アルキルジメチルアンモニウム塩などが挙げられるがこれらに限定されない。
またこれら塩のアニオン種は、カルボン酸イオンを使用する。カルボン酸イオンとしては、酢酸イオン、炭酸イオン、ギ酸イオンが好ましい。また、特に酢酸イオンが好ましい。
4級アンモニウム塩の炭素数が100を上回ると、疎水性が強くなりすぎて有機層への溶解性が悪くなる場合がある。一方、4級アンモニウム塩の炭素数が10未満であると、親水性が強くなり、同様に有機層への相溶性が悪くなる場合がある。
4級アンモニウム塩には一般にハロゲンが残存する。本発明においては特に、1質量%以下、より好ましくは1000ppm以下、さらに好ましくは700ppm以下である。総ハロゲン量が1質量%を超える場合、生成物に多量にハロゲンが残存するため好ましくない。
タングステン酸類と4級アンモニウムのカルボン酸塩の使用量は使用するタングステン酸類の価数倍の0.01〜0.8倍当量、あるいは1.1〜10倍当量が好ましい。より好ましくは0.05〜0.7倍当量、あるいは1.2〜6.0倍当量であり、さらに好ましくは0.05〜0.5倍当量、あるいは1.3〜4.5倍当量である。
例えば、タングステン酸であればH2WO4で2価であるので、タングステン酸1モルに対し、4級アンモニウムのカルボン酸塩は0.02〜1.6モル、もしくは2.2〜20モルの範囲が好ましい。またタングストリン酸であれば3価であるので、同様に0.03〜2.4モル、もしくは3.3〜30モル、ケイタングステン酸であれば4価であるので0.04〜3.2モル、もしくは4.4〜40モルが好ましい。
4級アンモニウムのカルボン酸塩の量が、タングステン酸類の価数倍の1.1倍当量よりも低い場合、エポキシ化反応が進行しづらい(場合によっては反応の進行が早くなる)、また副生成物ができやすいという問題が生じる。10倍当量よりも多い場合、過剰の4級アンモニウムのカルボン酸塩の処理が大変であるばかりか、反応を抑制する働きがあり、好ましくない。
As the quaternary ammonium salt, a quaternary ammonium salt having a total carbon number of 10 or more, preferably 25 to 100, more preferably 25 to 55 can be preferably used, and particularly preferably one in which all the alkyl chains are aliphatic chains. ..
Specifically, tridecanyl methylammonium salt, dilauryldimethylammonium salt, trioctylmethylammonium salt, trialkylmethyl (mixed type of compound having an alkyl group as an octyl group and a compound having a decanyl group) ammonium salt, trihexa Examples thereof include decylmethylammonium salt, trimethylstearylammonium salt, tetrapentylammonium salt, cetyltrimethylammonium salt, benzyltributylammonium salt, disetyldimethylammonium salt, tricetylmethylammonium salt, and dihardened beef fat alkyldimethylammonium salt. Not limited to.
Moreover, carboxylic acid ion is used as an anion species of these salts. As the carboxylic acid ion, acetate ion, carbonate ion and formate ion are preferable. In addition, acetate ion is particularly preferable.
If the carbon number of the quaternary ammonium salt exceeds 100, the hydrophobicity may become too strong and the solubility in the organic layer may be deteriorated. On the other hand, when the quaternary ammonium salt has less than 10 carbon atoms, the hydrophilicity becomes strong, and the compatibility with the organic layer may also deteriorate.
Halogen generally remains in the quaternary ammonium salt. In the present invention, it is particularly 1% by mass or less, more preferably 1000 ppm or less, still more preferably 700 ppm or less. If the total amount of halogen exceeds 1% by mass, a large amount of halogen remains in the product, which is not preferable.
The amount of the tungsten acid and the quaternary ammonium carboxylate used is preferably 0.01 to 0.8 times equivalent, or 1.1 to 10 times equivalent, which is several times the valence of the tungsten acid used. More preferably, it is 0.05 to 0.7 times equivalent, or 1.2 to 6.0 times equivalent, and further preferably 0.05 to 0.5 times equivalent, or 1.3 to 4.5 times equivalent. is there.
For example, since tungstic acid is divalent in H2WO4, the quaternary ammonium carboxylate is preferably in the range of 0.02 to 1.6 mol or 2.2 to 20 mol with respect to 1 mol of tungstic acid. .. Similarly, if it is tongue tungstic acid, it is trivalent, so it is 0.03 to 2.4 mol, or 3.3 to 30 mol, and if it is silicotungstic acid, it is tetravalent, so it is 0.04 to 3.2. It is preferably mol or 4.4-40 mol.
When the amount of the quaternary ammonium carboxylate is lower than 1.1 times the equivalent of the valence of tungsten acids, the epoxidation reaction is difficult to proceed (in some cases, the reaction proceeds faster), and by-products are produced. The problem arises that things are easy to make. If it is more than 10 times equivalent, it is not preferable to treat the excess quaternary ammonium carboxylate because it has a function of suppressing the reaction.
カルボン酸イオンをアニオンとする4級アンモニウム塩は、市販品を使用してもよいし、例えば、原料4級アンモニウム塩を金属水酸化物やイオン交換樹脂で処理し、4級アンモニウムハイドロオキサイドに変換し、さらに各種カルボン酸と反応させるなどの方法により製造してもよい。原料4級アンモニウム塩としては、4級アンモニウムのハロゲン化物や各種金属塩等が挙げられる。また好適な4級アンモニウムハイドロオキサイドがあればそれを用いてもよい。 As the quaternary ammonium salt having a carboxylic acid ion as an anion, a commercially available product may be used. For example, the raw material quaternary ammonium salt is treated with a metal hydroxide or an ion exchange resin and converted into a quaternary ammonium hydroxide. Further, it may be produced by a method such as reacting with various carboxylic acids. Examples of the raw material quaternary ammonium salt include halides of quaternary ammonium and various metal salts. Further, if there is a suitable quaternary ammonium hydrooxide, it may be used.
緩衝液としてはいずれも用いることができるが、本反応においてはリン酸塩水溶液を用いるのが好ましい。そのpHとしてはpH4〜10の間に調整されたものが好ましく、より好ましくはpH5〜9である。pH4未満の場合、エポキシ基の加水分解反応、重合反応が進行しやすくなる。またpH10を超える場合、反応が極度に遅くなり、反応時間が長すぎるという問題が生じる。
特に本発明においては触媒であるタングステン酸類を溶解した際に、pH5〜9の間になるように調整された緩衝液が好ましい。
緩衝液の使用方法は、例えば好ましい緩衝液であるリン酸−リン酸塩水溶液の場合は過酸化水素に対し、0.1〜10モル%当量のリン酸(あるいはリン酸二水素ナトリウム等のリン酸塩)を使用し、塩基性化合物(たとえば水酸化ナトリウム、水酸化カリウム、炭酸ナトリウム、炭酸水素ナトリウム、炭酸カリウム等)でpH調整を行うという方法が挙げられる。ここでpHは過酸化水素を添加した際に前述のpHになるように添加することが好ましい。また、リン酸二水素ナトリウム又はリン酸水素二ナトリウム等を用いて調整することも可能である。好ましいリン酸塩の濃度は0.1〜60質量%、好ましくは5〜45質量%である。
また、本反応においては緩衝液を使用せず、pH調整無しに、リン酸水素二ナトリウム、リン酸二水素ナトリウム、リン酸ナトリウムあるいはトリポリリン酸ナトリウム等(またはその水和物)のリン酸塩を直接添加してもよい。工程の簡略化、という意味合いではpH調整のわずらわしさが無く、直接の添加が特に好ましい。この場合のリン酸塩の使用量は、過酸化水素に対し、通常0.1〜5モル%当量、好ましくは0.2〜4モル%当量、より好ましくは、0.3〜3モル%当量である。この際、過酸化水素に対し、5モル%当量を超えるとpH調整が必要となり、0.1モル%当量未満の場合、生成したエポキシ樹脂の加水分解物が進行しやすくなる、あるいは反応が遅くなる等の弊害が生じる。
Any of them can be used as a buffer solution, but it is preferable to use an aqueous phosphate solution in this reaction. The pH is preferably adjusted between pH 4 and 10, and more preferably pH 5 to 9. When the pH is less than 4, the hydrolysis reaction and polymerization reaction of the epoxy group are likely to proceed. Further, when the pH exceeds 10, the reaction becomes extremely slow, and there arises a problem that the reaction time is too long.
In particular, in the present invention, a buffer solution adjusted so that the pH is between 5 and 9 when the catalytic tungsten acids are dissolved is preferable.
As for the method of using the buffer solution, for example, in the case of a phosphoric acid-phosphate aqueous solution which is a preferable buffer solution, 0.1 to 10 mol% equivalent of phosphoric acid (or phosphorus such as sodium dihydrogen phosphate) is used with respect to hydrogen peroxide. A method of adjusting the pH with a basic compound (for example, sodium hydroxide, potassium hydroxide, sodium carbonate, sodium hydrogen carbonate, potassium carbonate, etc.) using a phosphate) can be mentioned. Here, it is preferable that the pH is adjusted to the above-mentioned pH when hydrogen peroxide is added. It is also possible to adjust using sodium dihydrogen phosphate, disodium hydrogen phosphate, or the like. The preferred phosphate concentration is 0.1 to 60% by weight, preferably 5 to 45% by weight.
In addition, in this reaction, a buffer solution is not used, and a phosphate such as disodium hydrogen phosphate, sodium dihydrogen phosphate, sodium phosphate or sodium tripolyphosphate (or its hydrate) is used without adjusting the pH. It may be added directly. In terms of simplifying the process, there is no hassle of pH adjustment, and direct addition is particularly preferable. The amount of phosphate used in this case is usually 0.1 to 5 mol% equivalent, preferably 0.2 to 4 mol% equivalent, more preferably 0.3 to 3 mol% equivalent, relative to hydrogen peroxide. Is. At this time, if the pH exceeds 5 mol% equivalent with respect to hydrogen peroxide, pH adjustment is required, and if it is less than 0.1 mol% equivalent, the hydrolyzate of the produced epoxy resin easily proceeds or the reaction is slow. There will be harmful effects such as becoming.
本反応は過酸化水素を用いてエポキシ化を行う。本反応に使用する過酸化水素としては、その取扱いの簡便さから過酸化水素濃度が10〜40質量%の濃度である水溶液が好ましい。濃度が40質量%を超える場合、取扱いが難しくなる他、生成したエポキシ樹脂の分解反応も進行しやすくなることから好ましくない。 This reaction is epoxidized with hydrogen peroxide. As the hydrogen peroxide used in this reaction, an aqueous solution having a hydrogen peroxide concentration of 10 to 40% by mass is preferable because of its ease of handling. If the concentration exceeds 40% by mass, it becomes difficult to handle and the decomposition reaction of the produced epoxy resin easily proceeds, which is not preferable.
本反応は有機溶剤を使用する。使用する有機溶剤の量としては、反応基質であるジオレフィン化合物1に対し、質量比で0.3〜10であり、好ましくは0.3〜5、より好ましくは0.5〜2.5である。質量比で10を超える場合、反応の進行が極度に遅くなることから好ましくない。使用できる有機溶剤の具体的な例としてはヘキサン、シクロヘキサン、ヘプタン等のアルカン類、トルエン、キシレン等の芳香族炭化水素化合物、メタノール、エタノール、イソプロパノール、ブタノール、ヘキサノール、シクロヘキサノール等のアルコール類が挙げられる。また、場合によっては、メチルエチルケトン、メチルイソブチルケトン、シクロペンタノン、アノン等のケトン類、ジエチルエーテル、テトラヒドロフラン、ジオキサン等のエーテル類、酢酸エチル、酢酸ブチル、蟻酸メチル等のエステル化合物、アセトニトリル等のニトリル化合物等も使用可能である。 This reaction uses an organic solvent. The amount of the organic solvent used is 0.3 to 10 by mass ratio with respect to the diolefin compound 1 which is the reaction substrate, preferably 0.3 to 5, and more preferably 0.5 to 2.5. is there. If the mass ratio exceeds 10, the reaction progresses extremely slowly, which is not preferable. Specific examples of the organic solvent that can be used include alkanes such as hexane, cyclohexane and heptane, aromatic hydrocarbon compounds such as toluene and xylene, and alcohols such as methanol, ethanol, isopropanol, butanol, hexanol and cyclohexanol. Be done. In some cases, ketones such as methyl ethyl ketone, methyl isobutyl ketone, cyclopentanone and anone, ethers such as diethyl ether, tetrahydrofuran and dioxane, ester compounds such as ethyl acetate, butyl acetate and methyl formate, and nitriles such as acetonitrile. Compounds and the like can also be used.
具体的な反応操作方法としては、例えばバッチ式の反応釜で反応を行う際は、ジオレフィン化合物、過酸化水素(水溶液)、ポリ酸類(触媒)、緩衝液、4級アンモニウム塩及び有機溶剤を加え、二層で撹拌する。撹拌速度に特に指定は無い。過酸化水素の添加時に発熱する場合が多いことから、各成分を添加した後に過酸化水素を徐々に添加する方法でもよい。 As a specific reaction operation method, for example, when the reaction is carried out in a batch type reaction vessel, a diolefin compound, hydrogen peroxide (aqueous solution), polyacids (catalyst), a buffer solution, a quaternary ammonium salt and an organic solvent are used. In addition, stir in two layers. The stirring speed is not specified. Since heat is often generated when hydrogen peroxide is added, a method of gradually adding hydrogen peroxide after adding each component may be used.
反応温度は特に限定されないが0〜90℃が好ましく、さらに好ましくは0〜75℃、特に15℃〜60℃が好ましい。反応温度が高すぎる場合、加水分解反応が進行しやすく、反応温度が低いと反応速度が極端に遅くなる。 The reaction temperature is not particularly limited, but is preferably 0 to 90 ° C, more preferably 0 to 75 ° C, and particularly preferably 15 ° C to 60 ° C. If the reaction temperature is too high, the hydrolysis reaction tends to proceed, and if the reaction temperature is low, the reaction rate becomes extremely slow.
また反応時間は反応温度、触媒量等にもよるが、工業生産という観点から、長時間の反応は多大なエネルギーを消費することになるため好ましくはない。好ましい範囲としては1〜48時間、好ましくは3〜36時間、さらに好ましくは4〜24時間である。 The reaction time depends on the reaction temperature, the amount of catalyst, and the like, but from the viewpoint of industrial production, a long-term reaction consumes a large amount of energy, which is not preferable. The preferred range is 1 to 48 hours, preferably 3 to 36 hours, and even more preferably 4 to 24 hours.
反応終了後、過剰な過酸化水素のクエンチ処理を行う。クエンチ処理は、塩基性化合物を使用して行なうことが好ましい。また、還元剤と塩基性化合物を併用することも好ましい。好ましい処理方法としては塩基性化合物でpH6〜12に中和調整後、還元剤を用い、残存する過酸化水素をクエンチする方法が挙げられる。pHが6未満の場合、過剰の過酸化水素を還元する際の発熱が大きく、分解物を生じる可能性がある。 After completion of the reaction, quench treatment with excess hydrogen peroxide is performed. The quenching treatment is preferably carried out using a basic compound. It is also preferable to use a reducing agent and a basic compound in combination. As a preferable treatment method, a method of neutralizing and adjusting the pH to 6 to 12 with a basic compound and then using a reducing agent to quench the remaining hydrogen peroxide can be mentioned. If the pH is less than 6, the heat generated when reducing excess hydrogen peroxide is large, and decomposition products may be generated.
還元剤としては亜硫酸ナトリウム、チオ硫酸ナトリウム、ヒドラジン、シュウ酸、ビタミンC等が挙げられる。還元剤の使用量としては過剰分の過酸化水素もモル数に対し、通常0.01〜20倍モル、より好ましくは0.05〜10倍モル、さらに好ましくは0.05〜3倍モルである。 Examples of the reducing agent include sodium sulfite, sodium thiosulfate, hydrazine, oxalic acid, vitamin C and the like. As for the amount of the reducing agent used, the excess amount of hydrogen peroxide is usually 0.01 to 20 times by mole, more preferably 0.05 to 10 times by mole, and further preferably 0.05 to 3 times by mole with respect to the number of moles. is there.
塩基性化合物としては、水酸化ナトリウム、水酸化カリウム、水酸化マグネシウム、水酸化カルシウム等の金属水酸化物、炭酸ナトリウム、炭酸カリウム等の金属炭酸塩、リン酸ナトリウム、リン酸水素ナトリウム等のリン酸塩、イオン交換樹脂、アルミナ等の塩基性固体が挙げられる。
その使用量としては水、あるいは有機溶剤(例えば、トルエン、キシレン等の芳香族炭化水素、メチルイソブチルケトン、メチルエチルケトン等のケトン類、シクロヘキサン、ヘプタン、オクタン等の炭化水素、メタノール、エタノール、イソプロピルアルコール等のアルコール類等の各種溶剤)に溶解するものであれば、その使用量は過剰分の過酸化水素のモル数に対し、通常0.01〜20倍モル、より好ましくは0.05〜10倍モル、さらに好ましくは0.05〜3倍モルである。これらは水、あるいは前述の有機溶剤の溶液として添加しても単体で添加してもよい。
水や有機溶剤に溶解しない固体塩基を使用する場合、系中に残存する過酸化水素の量に対し、質量比で1〜1000倍の量を使用することが好ましい。より好ましくは10〜500倍、さらに好ましくは10〜300倍である。水や有機溶剤に溶解しない固体塩基を使用する場合は、後に記載する水層と有機層の分離の後、処理を行ってもよい。
Examples of the basic compound include metal hydroxides such as sodium hydroxide, potassium hydroxide, magnesium hydroxide and calcium hydroxide, metal carbonates such as sodium carbonate and potassium carbonate, and phosphorus such as sodium phosphate and sodium hydrogen phosphate. Examples include basic solids such as carbonates, ion exchange resins, and alumina.
The amount used is water, organic solvents (for example, aromatic hydrocarbons such as toluene and xylene, ketones such as methylisobutylketone and methylethylketone, hydrocarbons such as cyclohexane, heptane and octane, methanol, ethanol, isopropyl alcohol and the like. If it is soluble in various solvents such as alcohols), the amount used is usually 0.01 to 20 times, more preferably 0.05 to 10 times, the number of moles of excess hydrogen peroxide. The amount is mol, more preferably 0.05 to 3 times the molar amount. These may be added as water or a solution of the above-mentioned organic solvent, or may be added alone.
When a solid base that is insoluble in water or an organic solvent is used, it is preferable to use an amount of 1 to 1000 times by mass ratio with respect to the amount of hydrogen peroxide remaining in the system. It is more preferably 10 to 500 times, still more preferably 10 to 300 times. When a solid base that is insoluble in water or an organic solvent is used, the treatment may be performed after the aqueous layer and the organic layer described later are separated.
過酸化水素のクエンチ後(もしくはクエンチを行う前に)、この際、有機層と水層が分離しない、もしくは有機溶剤を使用していない場合は前述の有機溶剤を添加して操作を行い、水層より反応生成物の抽出を行う。この際使用する有機溶剤は、原料ジオレフィン化合物に対して質量比で0.5〜10倍、好ましくは0.5〜5倍である。この操作を必要に応じて数回繰り返した後に有機層を分離し、必要に応じて該有機層を水洗して精製する。
得られた有機層は必要に応じてイオン交換樹脂や金属酸化物(特に、シリカゲルやアルミナ等が好ましい)、活性炭(中でも特に薬品賦活活性炭が好ましい)、複合金属塩(中でも特に塩基性複合金属塩が好ましい)、粘度鉱物(中でも特にモンモリロナイト等層状粘度鉱物が好ましい)等により、不純物を除去し、さらに水洗及びろ過等を行った後、溶剤を留去し、目的とするエポキシ化合物を得る。場合によってはさらにカラムクロマトグラフィーや蒸留により精製してもよい。
After quenching the hydrogen peroxide (or before quenching), at this time, if the organic layer and the aqueous layer are not separated, or if an organic solvent is not used, the above-mentioned organic solvent is added and the operation is performed to obtain water. The reaction product is extracted from the layer. The organic solvent used at this time is 0.5 to 10 times, preferably 0.5 to 5 times, the mass ratio of the raw material diolefin compound. After repeating this operation several times as necessary, the organic layer is separated, and if necessary, the organic layer is washed with water for purification.
The obtained organic layer may be an ion exchange resin, a metal oxide (particularly silica gel or alumina, etc.), activated carbon (particularly chemical-activated activated carbon is preferable), or a composite metal salt (particularly a basic composite metal salt), if necessary. (Preferably), viscous minerals (particularly, layered viscous minerals such as montmorillonite are preferable), and the like, and after further washing with water and filtration, the solvent is distilled off to obtain the desired epoxy compound. In some cases, it may be further purified by column chromatography or distillation.
上述した反応を経由することにより、下記式(1)で表されるシリコーン変性エポキシ樹脂を得ることができる。
、下記式(2B)
、炭素数1〜6の一価脂肪族炭化水素基又は炭素数6〜12の一価芳香族炭化水素基を、Aは炭素数1〜20のヘテロ環骨格、環式炭化水素骨格又は芳香環骨格を有しても良い有機基を、nは平均値で0〜10をそれぞれ表す。式中、複数存在するR1〜R4はそれぞれ同一であっても異なってもよい。但し、複数存在するR2のうち少なくとも一つは上記式(2A)又は(2B)を表す。)
このようにして得られた、上記シリコーン変性エポキシ樹脂において、分子量としては、各々下記の要件を満たすことが好適である。
数平均分子量(Mn)としては、200〜30000が好ましく、300〜10000が好ましく、300〜5000がより好ましい。
重量平均分子量(Mw)としては、200〜50000が好ましく、300〜30000が好ましく、300〜10000がより好ましい。この範囲にあることで、耐熱性、強靭性、操作性に優れたシリコーン変性エポキシ樹脂を得ることができる。
分子量分布(Mw/Mn)としては、1〜50が好ましく、1〜30が好ましく、1〜10がより好ましい。
By going through the above-mentioned reaction, a silicone-modified epoxy resin represented by the following formula (1) can be obtained.
, The following formula (2B)
, A monovalent aliphatic hydrocarbon group having 1 to 6 carbon atoms or a monovalent aromatic hydrocarbon group having 6 to 12 carbon atoms, and A is a heterocyclic skeleton having 1 to 20 carbon atoms, a cyclic hydrocarbon skeleton or an aromatic ring. An organic group that may have a skeleton is represented by n as an average value of 0 to 10, respectively. In the formula, a plurality of R 1 to R 4 existing may be the same or different. Provided that at least one of R 2 existing in plural represents the above formula (2A) or (2B). )
In the silicone-modified epoxy resin thus obtained, it is preferable that the molecular weights of the silicone-modified epoxy resins satisfy the following requirements.
The number average molecular weight (Mn) is preferably 200 to 30,000, preferably 300 to 10,000, and more preferably 300 to 5,000.
The weight average molecular weight (Mw) is preferably 200 to 50,000, preferably 300 to 30,000, and more preferably 300 to 10,000. Within this range, a silicone-modified epoxy resin having excellent heat resistance, toughness, and operability can be obtained.
The molecular weight distribution (Mw / Mn) is preferably 1 to 50, preferably 1 to 30, and more preferably 1 to 10.
上記R1は直接結合、エステル、エーテル結合を含有してもよい炭素数2〜6のアルキレン基である。具体的には、エチレン基、プロピレン基、イソプロピレン基、ブチレン基、イソブチレン基、ペンチレン基、ヘキシル基、エチレンエステル基、プロピレンエステル基、ブチレンエステル基、ペンチレンエステル基、イソプロピレンエステル基、イソブチレンエステル基、エチレンエーテル基、プロピレンエーテル基、ブチレンエーテル基、ペンチレンエーテル基、ヘキシレンエーテル基等が挙げられる。これらアルキレン基の中でも、硬化物の低ガス透過性、強度の観点からエチレン基、プロピレン基が特に好ましい。 The above R 1 is an alkylene group having 2 to 6 carbon atoms which may contain a direct bond, an ester or an ether bond. Specifically, ethylene group, propylene group, isopropylene group, butylene group, isobutylene group, pentylene group, hexyl group, ethylene ester group, propylene ester group, butylene ester group, pentylene ester group, isopropylene ester group, isobutylene. Examples thereof include an ester group, an ethylene ether group, a propylene ether group, a butylene ether group, a pentylene ether group and a hexylene ether group. Among these alkylene groups, an ethylene group and a propylene group are particularly preferable from the viewpoint of low gas permeability and strength of the cured product.
R2における炭素数1〜6の一価脂肪族炭化水素基又は炭素数6〜12の一価芳香族炭化水素基において、炭素数1〜12の一価脂肪族炭化水素基の具体例としては、メチル基、エチル基、n−プロピル基、イソプロピル基、n−ブチル基、t−ブチル基、ヘプチル基、2−エチルヘキシル基、ヘプチル基、オクチル基等のアルキル基などの飽和一価脂肪族炭化水素基、ビニル基、アリル基、イソプロペニル基、ブテニル基等のアルケニル基などの不飽和一価脂肪族炭化水素基などが挙げられ、好ましくはメチル基、エチル基、n−プロピル基、イソプロピル基、n−ブチル基、t−ブチル基、ヘプチル基であり、更に好ましくはメチル基である。また、炭素数6〜12の一価芳香族炭化水素基の具体例としては、フェニル基、トリル基、キシリル基、ナフチル基等のアリール基や、ベンジル基、2−フェニルエチル基、2−フェニルプロピル基等のアラルキル基であり、好ましくはフェニル基、ベンジル基、2−フェニルエチル基、2−フェニルプロピル基であり、更に好ましくはフェニル基である。 In monovalent aliphatic hydrocarbon group or a monovalent aromatic hydrocarbon group having 6 to 12 carbon atoms having 1 to 6 carbon atoms in R 2, specific examples of the monovalent aliphatic hydrocarbon group having 1 to 12 carbon atoms , Methyl group, ethyl group, n-propyl group, isopropyl group, n-butyl group, t-butyl group, heptyl group, 2-ethylhexyl group, heptyl group, octyl group and other alkyl groups. Examples thereof include unsaturated monovalent aliphatic hydrocarbon groups such as alkenyl groups such as hydrogen group, vinyl group, allyl group, isopropenyl group and butenyl group, preferably methyl group, ethyl group, n-propyl group and isopropyl group. , N-Butyl group, t-Butyl group, heptyl group, more preferably methyl group. Specific examples of the monovalent aromatic hydrocarbon group having 6 to 12 carbon atoms include an aryl group such as a phenyl group, a trill group, a xsilyl group and a naphthyl group, a benzyl group, a 2-phenylethyl group and a 2-phenylpropi group. It is an aralkyl group such as a ru group, preferably a phenyl group, a benzyl group, a 2-phenylethyl group, a 2-phenylpropyl group, and more preferably a phenyl group.
さらに、得られたシリコーン変性エポキシ樹脂として、エポキシ当量は500〜20000g/eqであることが好ましく、500〜3000g/eqであることがより好ましく、500〜2000g/eqであることが特に好ましい。エポキシ当量が好適な範囲にあることで、高い耐熱性を確保できるためである。
さらに、溶媒の残存量は5%未満であることが好ましく、2%未満であることがより好ましい。溶媒の残存量が多いと、硬化時に揮発して硬化物に凹部を生じさせる不具合が生じる恐れがあるためである。
Further, as the obtained silicone-modified epoxy resin, the epoxy equivalent is preferably 500 to 20000 g / eq, more preferably 500 to 3000 g / eq, and particularly preferably 500 to 2000 g / eq. This is because high heat resistance can be ensured when the epoxy equivalent is in a suitable range.
Further, the residual amount of the solvent is preferably less than 5%, more preferably less than 2%. This is because if the residual amount of the solvent is large, there is a possibility that the cured product may volatilize during curing to cause a recess in the cured product.
上記式(1)で表される化合物において、Aは炭素数1〜20のヘテロ環骨格、環式炭化水素骨格又は芳香環骨格を有しても良いアルキレン基等の有機基である。耐熱性を向上させる観点からは、環式炭化水素骨格を有していることが好ましく、強靭性を向上させる観点からはヘテロ環骨格を有するか、直鎖又は分岐鎖を有する鎖状の炭化水素基であることが好ましい。
ヘテロ環骨格としては、モルホリン骨格、テトラヒドロフラン骨格、オキサン骨格、ジオキサン骨格、トリオキサン骨格、トリアジン骨格、カルバゾール骨格、ピロリジン骨格、ピペリジン骨格が挙げられる。中でも、オキサン骨格、ジオキサン骨格、トリオキサン骨格、モルホリン骨格が好ましい。
環式炭化水素骨格としては、ジシクロデカン骨格、トリシクロデカン骨格、アダマンタン骨格、シクロヘキサン骨格、シクロペンタン骨格、シクロヘプタン骨格が挙げられる。中でも、トリシクロデカン骨格、シクロヘキサン骨格が好ましい。
芳香族骨格としては、ベンゼン骨格、ナフタレン骨格、カルバゾール骨格が挙げられる。中でも、ベンゼン骨格が好ましい。
直鎖又は分岐鎖を有する鎖状の炭化水素基としては、メチレン基、エチレン基、プロピレン基、ブチレン基等を挙げることができる。中でも、エチレン基が好ましい。
Aを構成する炭素数としては、通常1〜20であり、1〜15が好ましく、2〜12がより好ましい。
In the compound represented by the above formula (1), A is an organic group such as an alkylene group which may have a heterocyclic skeleton having 1 to 20 carbon atoms, a cyclic hydrocarbon skeleton or an aromatic ring skeleton. From the viewpoint of improving heat resistance, it is preferable to have a cyclic hydrocarbon skeleton, and from the viewpoint of improving toughness, a chain hydrocarbon having a heterocyclic skeleton or a straight chain or a branched chain. It is preferably a group.
Examples of the heterocyclic skeleton include a morpholine skeleton, a tetrahydrofuran skeleton, an oxane skeleton, a dioxane skeleton, a trioxane skeleton, a triazine skeleton, a carbazole skeleton, a pyrrolidine skeleton, and a piperidine skeleton. Of these, an oxane skeleton, a dioxane skeleton, a trioxane skeleton, and a morpholine skeleton are preferable.
Examples of the cyclic hydrocarbon skeleton include a dicyclodecane skeleton, a tricyclodecane skeleton, an adamantane skeleton, a cyclohexane skeleton, a cyclopentane skeleton, and a cycloheptane skeleton. Of these, a tricyclodecane skeleton and a cyclohexane skeleton are preferable.
Examples of the aromatic skeleton include a benzene skeleton, a naphthalene skeleton, and a carbazole skeleton. Of these, the benzene skeleton is preferable.
Examples of the chain hydrocarbon group having a linear or branched chain include a methylene group, an ethylene group, a propylene group, a butylene group and the like. Of these, an ethylene group is preferable.
The number of carbon atoms constituting A is usually 1 to 20, preferably 1 to 15, and more preferably 2 to 12.
<(B)硬化剤>
硬化剤としては、エポキシ基と反応性の官能基を有する硬化剤が使用される。例えば、酸無水物系硬化剤、多価カルボン酸樹脂、フェノール系硬化剤、アミン系硬化剤、が挙げられ、そのうち酸無水物系硬化剤、多価カルボン酸樹脂が好ましい。酸無水物系硬化剤としては、無水フタル酸、無水マレイン酸、無水トリメリット酸、無水ピロメリット酸、ヘキサヒドロ無水フタル酸、3−メチル−ヘキサヒドロ無水フタル酸、4−メチル−ヘキサヒドロ無水フタル酸、3−メチル−ヘキサヒドロ無水フタル酸と4−メチル−ヘキサヒドロ無水フタル酸との混合物、テトラヒドロ無水フタル酸、無水ナジック酸、無水メチルナジック酸、ノルボルナン−2,3−ジカルボン酸無水物、メチルノルボルナン−2,3−ジカルボン酸無水物、2,4−ジエチルグルタル酸無水物などを挙げることができ、これらのうち、ヘキサヒドロ無水フタル酸及びその誘導体が好ましい。
<(B) Hardener>
As the curing agent, a curing agent having a functional group reactive with an epoxy group is used. For example, an acid anhydride-based curing agent, a polyvalent carboxylic acid resin, a phenol-based curing agent, and an amine-based curing agent can be mentioned, and among them, an acid anhydride-based curing agent and a polyvalent carboxylic acid resin are preferable. Examples of the acid anhydride-based curing agent include phthalic anhydride, maleic anhydride, trimellitic anhydride, pyromellitic anhydride, phthalic anhydride, 3-methyl-hexahydrophthalic anhydride, 4-methyl-hexahydrophthalic anhydride, and the like. A mixture of 3-methyl-hexahydrophthalic anhydride and 4-methyl-hexahydrophthalic anhydride, tetrahydrophthalic anhydride, nadicic anhydride, methylnadic anhydride, norbornan-2,3-dicarboxylic acid anhydride, methylnorbornan-2 , 3-Dicarboxylic anhydride, 2,4-diethylglutaric anhydride and the like, of which hexahydrophthalic anhydride and its derivatives are preferred.
次に、多価カルボン酸樹脂について説明する。
多価カルボン酸樹脂(B)は少なくとも2つ以上のカルボキシ基を有し、脂肪族炭化水素基またはシロキサン骨格を主骨格とすることを特徴とする化合物である。本発明においては多価カルボン酸樹脂とは単一の構造を有する多価カルボン酸化合物だけでなく、置換基の位置が異なる、あるいは置換基の異なる複数の化合物の混合体、すなわち多価カルボン酸組成物も含包し、本発明においてはそれらをまとめて多価カルボン酸樹脂と称す。
多価カルボン酸樹脂(B)としては、特に2〜6官能のカルボン酸が好ましく、炭素数5以上の2〜6官能の多価アルコールまたはシロキサン構造を有する多価アルコールと酸無水物との反応により得られた化合物がより好ましい。さらには上記酸無水物が飽和脂肪族環状酸無水物であるポリカルボン酸が好ましい。
2〜6官能の多価アルコールとしてはアルコール類としては、アルコール性水酸基を有する化合物であれば特に限定されないがエチレングリコール、プロピレングリコール、1,3−プロパンジオール、1,2−ブタンジオール、1,4−ブタンジオール、1,5−ペンタンジオール、1,6−ヘキサンジオール、シクロヘキサンジメタノール、2,4−ジエチルペンタンジオール、2−エチル−2−ブチル−1.3−プロパンジオール、ネオペンチルグリコール、トリシクロデカンジメタノール、ノルボルネンジオール等のジオール類、グリセリン、トリメチロールエタン、トリメチロールプロパン、トリメチロールブタン、2−ヒドロキシメチル−1,4−ブタンジオール等のトリオール類、ペンタエリスリトール、ジトリメチロールプロパン等のテトラオール類、ジペンタエリスリトールなどのヘキサオール類等が挙げられる。
特に好ましいアルコール類としては炭素数が5以上のアルコールであり、特に1,6-ヘキサンジオール、1,4−シクロヘキサンジメタノール、1,3−シクロヘキサンジメタノール、1,2−シクロヘキサンジメタノール、2,4−ジエチルペンタンジオール、2−エチル−2−ブチル−1,3−プロパンジオール、ネオペンチルグリコール、トリシクロデカンジメタノール、ノルボルネンジオール等の化合物が挙げられ、中でも2−エチル−2−ブチル−1,3−プロパンジオール、ネオペンチルグリコール、2,4−ジエチルペンタンジオール、1,4−シクロヘキサンジメタノール、トリシクロデカンジメタノール、ノルボルネンジオール等の分岐鎖状構造や環状構造を有するアルコール類がより好ましい。高い照度保持率を付与する観点から、2,4−ジエチルペンタンジオール、トリシクロデカンジメタノールが特に好ましい。
シロキサン構造を有する多価アルコールは特に限定されないが、例えば下記式で表されるシリコーンオイルを使用することができる。
酸無水物としては特にメチルテトラヒドロ無水フタル酸、無水メチルナジック酸、無水ナジック酸、ヘキサヒドロ無水フタル酸、メチルヘキサヒドロ無水フタル酸、ブタンテトラカルボン酸無水物、ビシクロ[2,2,1]ヘプタン−2,3−ジカルボン酸無水物、メチルビシクロ[2,2,1]ヘプタン−2,3−ジカルボン酸無水物、シクロヘキサン−1,3,4−トリカルボン酸−3,4−無水物等が好ましく、中でもメチルヘキサヒドロ無水フタル酸、シクロヘキサン−1,3,4−トリカルボン酸−3,4−無水物が好ましい。ここで、硬度を上げるためには、シクロヘキサン−1,3,4−トリカルボン酸−3,4−無水物が好ましく、照度保持率を上げるためにはメチルヘキサヒドロ無水フタル酸無水物が好ましい。
付加反応の条件としては特に指定はないが、具体的な反応条件の1つとしては酸無水物、多価アルコールを無触媒、無溶剤の条件下、40〜150℃で反応させ加熱し、反応終了後、そのまま取り出す。という手法である。ただし、本反応条件に限定されない。
Next, the multivalent carboxylic acid resin will be described.
The polyvalent carboxylic acid resin (B) is a compound having at least two or more carboxy groups and having an aliphatic hydrocarbon group or a siloxane skeleton as a main skeleton. In the present invention, the polyvalent carboxylic acid resin is not only a polyvalent carboxylic acid compound having a single structure, but also a mixture of a plurality of compounds having different substituent positions or different substituents, that is, a polyvalent carboxylic acid. The compositions are also included, and in the present invention, they are collectively referred to as a polyvalent carboxylic acid resin.
The polyvalent carboxylic acid resin (B) is particularly preferably a 2 to 6-functional carboxylic acid, and is a reaction between a 2 to 6-functional polyhydric alcohol having 5 or more carbon atoms or a polyhydric alcohol having a siloxane structure and an acid anhydride. The compound obtained by the above is more preferable. Further, a polycarboxylic acid in which the acid anhydride is a saturated aliphatic cyclic acid anhydride is preferable.
The alcohols having 2 to 6 functional polyhydric alcohols are not particularly limited as long as they are compounds having an alcoholic hydroxyl group, but ethylene glycol, propylene glycol, 1,3-propanediol, 1,2-butanediol, 1, 4-butanediol, 1,5-pentanediol, 1,6-hexanediol, cyclohexanedimethanol, 2,4-diethylpentanediol, 2-ethyl-2-butyl-1.3-propanediol, neopentylglycol, Diols such as tricyclodecanedimethanol and norbornenediol, triols such as glycerin, trimethylolethane, trimethylolpropane, trimethylolbutane, 2-hydroxymethyl-1,4-butanediol, pentaerythritol, ditrimethylolpropane and the like. Tetraols, hexaols such as dipentaerythritol, etc. can be mentioned.
Particularly preferable alcohols are alcohols having 5 or more carbon atoms, and particularly 1,6-hexanediol, 1,4-cyclohexanedimethanol, 1,3-cyclohexanedimethanol, 1,2-cyclohexanedimethanol, 2, Examples thereof include compounds such as 4-diethylpentanediol, 2-ethyl-2-butyl-1,3-propanediol, neopentyl glycol, tricyclodecanedimethanol, norbornenediol, among which 2-ethyl-2-butyl-1 is used. , 3-Propanediol, neopentyl glycol, 2,4-diethylpentanediol, 1,4-cyclohexanedimethanol, tricyclodecanedimethanol, norbornenediol and other alcohols having a branched chain structure or cyclic structure are more preferable. .. From the viewpoint of imparting a high illuminance retention rate, 2,4-diethylpentanediol and tricyclodecanedimethanol are particularly preferable.
The polyhydric alcohol having a siloxane structure is not particularly limited, and for example, a silicone oil represented by the following formula can be used.
Acid anhydrides include methyltetrahydrophthalic anhydride, methylnadic anhydride, nadicic anhydride, hexahydrophthalic anhydride, methylhexahydrophthalic anhydride, butanetetracarboxylic acid anhydride, and bicyclo [2,2,1] heptane-. 2,3-Dicarboxylic acid anhydride, methylbicyclo [2,2,1] heptane-2,3-dicarboxylic acid anhydride, cyclohexane-1,3,4-tricarboxylic acid-3,4-anhydride and the like are preferable. Of these, methylhexahydrophthalic anhydride and cyclohexane-1,3,4-tricarboxylic acid-3,4-anhydride are preferable. Here, cyclohexane-1,3,4-tricarboxylic acid-3,4-anhydride is preferable in order to increase the hardness, and methylhexahydrophthalic anhydride anhydride is preferable in order to increase the illuminance retention rate.
The conditions for the addition reaction are not particularly specified, but as one of the specific reaction conditions, acid anhydride and polyhydric alcohol are reacted at 40 to 150 ° C. under the conditions of no catalyst and no solvent, and the reaction is carried out. After finishing, take it out as it is. It is a method called. However, the reaction conditions are not limited to this.
このようにして得られるポリカルボン酸として特に下記式 The polycarboxylic acid thus obtained has the following formula.
で表される化合物が好ましい。
The compound represented by is preferable.
本発明のエポキシ樹脂組成物は酸無水物を含有することが好ましい。酸無水物としては具体的には無水フタル酸、無水トリメリット酸、無水ピロメリット酸、無水マレイン酸、テトラヒドロ無水フタル酸、メチルテトラヒドロ無水フタル酸、無水メチルナジック酸、無水ナジック酸、ヘキサヒドロ無水フタル酸、メチルヘキサヒドロ無水フタル酸、ブタンテトラカルボン酸無水物、ビシクロ[2,2,1]ヘプタン−2,3−ジカルボン酸無水物、メチルビシクロ[2,2,1]ヘプタン−2,3−ジカルボン酸無水物、シクロヘキサン−1,3,4−トリカルボン酸−3,4−無水物、等の酸無水物が挙げられる。
特にメチルテトラヒドロ無水フタル酸、無水メチルナジック酸、無水ナジック酸、ヘキサヒドロ無水フタル酸、メチルヘキサヒドロ無水フタル酸、ブタンテトラカルボン酸無水物、ビシクロ[2,2,1]ヘプタン−2,3−ジカルボン酸無水物、メチルビシクロ[2,2,1]ヘプタン−2,3−ジカルボン酸無水物、シクロヘキサン−1,3,4−トリカルボン酸−3,4−無水物等が好ましい。
特に好ましくは下記式
The epoxy resin composition of the present invention preferably contains an acid anhydride. Specific examples of acid anhydrides include phthalic anhydride, trimellitic anhydride, pyromellitic anhydride, maleic anhydride, tetrahydrophthalic anhydride, methyltetrahydrophthalic anhydride, methylnadic anhydride, nadicic anhydride, and hexahydrophthalic anhydride. Acid, methylhexahydrophthalic anhydride, butanetetracarboxylic acid anhydride, bicyclo [2,2,1] heptane-2,3-dicarboxylic acid anhydride, methylbicyclo [2,2,1] heptane-2,3- Examples thereof include acid anhydrides such as dicarboxylic acid anhydride and cyclohexane-1,3,4-tricarboxylic acid-3,4-anhydride.
In particular, methyltetrahydrophthalic anhydride, methylnadic anhydride, nadicic anhydride, hexahydrophthalic anhydride, methylhexahydrophthalic anhydride, butanetetracarboxylic acid anhydride, bicyclo [2,2,1] heptane-2,3-dicarboxylic Acid anhydrides, methylbicyclo [2,2,1] heptane-2,3-dicarboxylic acid anhydrides, cyclohexane-1,3,4-tricarboxylic acid-3,4-anhydrides and the like are preferred.
Especially preferably the following formula
で表されるヘキサヒドロ無水フタル酸、メチルヘキサヒドロ無水フタル酸、シクロヘキサン−1,3,4−トリカルボン酸−3,4−無水物が好ましく、中でもメチルヘキサヒドロ無水フタル酸、シクロヘキサン−1,3,4−トリカルボン酸−3,4−無水物が好ましい。
Hexahydrophthalic anhydride, methylhexahydrophthalic anhydride, cyclohexane-1,3,4-tricarboxylic acid-3,4-anhydride represented by, are preferable, and among them, methylhexahydrophthalic anhydride, cyclohexane-1,3, 4-Tricarboxylic acid-3,4-anhydride is preferred.
多価カルボン酸樹脂(B)と酸無水物は併用することが好ましく、併用する場合、その使用比率が下記範囲であることが好ましい。
W1/(W1+W2)=0.05〜0.70
ただし、W1は多価カルボン酸樹脂(B)の配合質量部、W2は酸無水物の配合質量部を示す。W1/(W1+W2)の範囲として、より好ましくは、0.05〜0.60、さらに好ましくは0.10〜0.55、特に好ましくは0.15〜0.4である。0.05を下回ると、硬化時に酸無水物の揮発が多くなる傾向がつよく、好ましくない。0.70を越えると高い粘度となり、取り扱いが難しくなる。酸無水物を含有させない(少量残存する場合は除く)場合、その形状は固形もしくは固形に近い状態、もしくは結晶となるため、問題はない。
多価カルボン酸樹脂(B)と酸無水物を併用する場合、多価カルボン酸樹脂(B)の製造時に過剰の酸無水物の中で製造し、多価カルボン酸(B)と酸無水物の混合物を作るという手法も操作の簡便性の面から好ましい。
The polyvalent carboxylic acid resin (B) and the acid anhydride are preferably used in combination, and when used in combination, the ratio of use thereof is preferably in the following range.
W1 / (W1 + W2) = 0.05 to 0.70
However, W1 indicates the compounding mass portion of the polyvalent carboxylic acid resin (B), and W2 indicates the compounding mass portion of the acid anhydride. The range of W1 / (W1 + W2) is more preferably 0.05 to 0.60, still more preferably 0.10 to 0.55, and particularly preferably 0.15 to 0.4. If it is less than 0.05, the volatilization of the acid anhydride tends to increase during curing, which is not preferable. If it exceeds 0.70, the viscosity becomes high and handling becomes difficult. When no acid anhydride is contained (except when a small amount remains), the shape is solid or close to solid, or crystallized, so that there is no problem.
When the polyvalent carboxylic acid resin (B) and the acid anhydride are used in combination, the polyvalent carboxylic acid resin (B) is produced in excess of the acid anhydride when the polyvalent carboxylic acid resin (B) is produced, and the polyvalent carboxylic acid (B) and the acid anhydride are produced. The method of making a mixture of the above is also preferable from the viewpoint of ease of operation.
フェノール系硬化剤、アミン系硬化剤、アミド系硬化剤は以下の化合物が具体的に挙げられる。
フェノール系硬化剤;ビスフェノールA、ビスフェノールF、ビスフェノールS、フルオレンビスフェノール、テルペンジフェノール、4,4’−ビフェノール、2,2’−ビフェノール、3,3’,5,5’−テトラメチル−[1,1’−ビフェニル]−4,4’−ジオール、ハイドロキノン、レゾルシン、ナフタレンジオール、トリス−(4−ヒドロキシフェニル)メタン、1,1,2,2−テトラキス(4−ヒドロキシフェニル)エタン、フェノール類(フェノール、アルキル置換フェノール、ナフトール、アルキル置換ナフトール、ジヒドロキシベンゼン、ジヒドロキシナフタレン等)とホルムアルデヒド、アセトアルデヒド、ベンズアルデヒド、p−ヒドロキシベンズアルデヒド、o−ヒドロキシベンズアルデヒド、p−ヒドロキシアセトフェノン、o−ヒドロキシアセトフェノン、ジシクロペンタジエン、フルフラール、4,4’−ビス(クロロメチル)−1,1’−ビフェニル、4,4’−ビス(メトキシメチル)−1,1’−ビフェニル、1,4’−ビス(クロロメチル)ベンゼン、1,4’−ビス(メトキシメチル)ベンゼン等との重縮合物及びこれらの変性物、テトラブロモビスフェノールA等のハロゲン化ビスフェノール類、テルペンとフェノール類の縮合物などのポリフェノール類が挙げられるが、これらに限定されるものではない。これらは単独で用いてもよく、2種以上を用いてもよい。
アミン系硬化剤、アミド系硬化剤;ジアミノジフェニルメタン、ジエチレントリアミン、トリエチレンテトラミン、ジアミノジフェニルスルホン、イソホロンジアミン、ジシアンジアミド、リノレン酸の2量体とエチレンジアミンより合成されるポリアミド樹脂などの含窒素化合物
Specific examples of the phenol-based curing agent, amine-based curing agent, and amide-based curing agent include the following compounds.
Phenolic curing agents; bisphenol A, bisphenol F, bisphenol S, fluorene bisphenol, terpendiphenol, 4,4'-biphenol, 2,2'-biphenol, 3,3', 5,5'-tetramethyl- [1 , 1'-biphenyl] -4,4'-diol, hydroquinone, resorcin, naphthalenediol, tris- (4-hydroxyphenyl) methane, 1,1,2,2-tetrakis (4-hydroxyphenyl) ethane, phenols (Phenol, alkyl-substituted phenol, naphthol, alkyl-substituted naphthol, dihydroxybenzene, dihydroxynaphthalene, etc.) and formaldehyde, acetaldehyde, benzaldehyde, p-hydroxybenzaldehyde, o-hydroxybenzaldehyde, p-hydroxyacetophenone, o-hydroxyacetophenone, dicyclopentadiene , Furfural, 4,4'-bis (chloromethyl) -1,1'-biphenyl, 4,4'-bis (methoxymethyl) -1,1'-biphenyl, 1,4'-bis (chloromethyl) benzene , 1,4'-bis (methoxymethyl) benzene and other polycondensates and modified products thereof, halogenated bisphenols such as tetrabromobisphenol A, and polyphenols such as terpene and phenol condensates. , Not limited to these. These may be used alone or two or more kinds may be used.
Amine-based curing agents, amide-based curing agents; nitrogen-containing compounds such as polyamide resins synthesized from diaminodiphenylmethane, diethylenetriamine, triethylenetetramine, diaminodiphenylsulfone, isophoronediamine, dicyandiamide, linolenic acid dimer and ethylenediamine.
(B)成分の硬化剤の配合量は、(A)成分中のエポキシ基の合計1モルに対して、エポキシ基と反応性を有する官能基(酸無水物系硬化剤の場合には−CO−O−CO−で表される酸無水物基)が0.3〜1.0モルとなる量、好ましくは0.4〜0.8モルとなる量である。エポキシ基と反応性を有する官能基が0.3モル以上であれば、硬化物の耐熱性、透明性が向上するため、望ましく、1.0モル以下であれば硬化物の機械特性が向上するため、好ましい。ここで、「エポキシ基と反応性を有する官能基」とは、アミン系硬化剤が有するアミノ基、フェノール系硬化剤が有するフェノール性水酸基、酸無水物系硬化剤が有する酸無水物基、多価カルボン酸樹脂が有するカルボキシ基である。 The blending amount of the curing agent for the component (B) is a functional group (-CO in the case of an acid anhydride-based curing agent) that is reactive with the epoxy group with respect to a total of 1 mol of the epoxy group in the component (A). The amount of the acid anhydride group represented by —O—CO− is 0.3 to 1.0 mol, preferably 0.4 to 0.8 mol. If the functional group having reactivity with the epoxy group is 0.3 mol or more, the heat resistance and transparency of the cured product are improved. Therefore, if it is 1.0 mol or less, the mechanical properties of the cured product are improved. Therefore, it is preferable. Here, the "functional group having reactivity with an epoxy group" refers to an amino group possessed by an amine-based curing agent, a phenolic hydroxyl group possessed by a phenol-based curing agent, an acid anhydride group possessed by an acid anhydride-based curing agent, and many. It is a carboxy group contained in a valent carboxylic acid resin.
<(C)硬化触媒>
硬化触媒としては、テトラブチルホスホニウム・O,O−ジエチルホスホロジチオエート、テトラフェニルホスホニウムテトラフェニルボレートなどの第四級ホスホニウム塩、トリフェニルフォスフィン、ジフェニルフォスフィン等の有機フォスフィン系硬化触媒、1,8−ジアザビシクロ(5,4,0)ウンデセン−7、トリエタノールアミン、ベンジルジメチルアミン等の三級アミン系硬化触媒、1,8−ジアザビシクロ(5,4,0)ウンデセン−7 フェノール塩、1,8−ジアザビシクロ(5,4,0)ウンデセン−7 オクチル酸塩、1,8−ジアザビシクロ(5,4,0)ウンデセン−7 p−トルエンスルホン酸塩、1,8−ジアザビシクロ(5,4,0)ウンデセン−7 ギ酸塩等の第四級アンモニウム塩、オクチル酸亜鉛、ナフチル酸亜鉛等の有機カルボン酸塩、アルミニウムビスエチルアセトアセテート・モノアセチルアセトネート、アルミニウムエチルアセトアセテート・ジイソプロピレート等のアルミキレート化合物、2−メチルイミダゾール、2−フェニル−4−メチルイミダゾール、2−エチル−4−メチルイミダゾールなどのイミダゾール類などを挙げられ、望ましくは第四級ホスホニウム塩、第四級アンモニウム塩である。
<(C) Curing catalyst>
Examples of the curing catalyst include quaternary phosphonium salts such as tetrabutylphosphonium O, O-diethylphosphologithioate and tetraphenylphosphonium tetraphenylborate, and organic phosphine-based curing catalysts such as triphenylphosphine and diphenylphosphine, 1. , 8-diazabicyclo (5,4,5) undecene-7, tertiary amine-based curing catalysts such as triethanolamine and benzyldimethylamine, 1,8-diazabicyclo (5,4,0) undecene-7 phenol salt, 1 , 8-diazabicyclo (5,4,5) undecene-7 octylate, 1,8-diazabicyclo (5,4,5) undecene-7 p-toluenesulfonate, 1,8-diazabicyclo (5,4) 0) Quaternary ammonium salts such as undecene-7 formate, organic carboxylates such as zinc octylate and zinc naphthylate, aluminum bisethylacetate / monoacetylacetonate, aluminum ethylacetate acetate / diisopropyrate, etc. Examples thereof include imidazoles such as aluminum chelate compounds, 2-methylimidazole, 2-phenyl-4-methylimidazole and 2-ethyl-4-methylimidazole, preferably quaternary phosphonium salts and quaternary ammonium salts. ..
(C)硬化触媒の配合量は(A)成分と(B)成分の合計100質量部に対して0.01〜3質量部、好ましくは0.05〜1.5質量部である。硬化触媒の配合量が前記下限値より少ないと、エポキシ樹脂と硬化剤との反応を促進させる効果が十分ではないおそれがある。逆に、硬化触媒の配合量が前記上限値より多いと、硬化時やリフロー試験時の変色の原因となるおそれがある。 The blending amount of the curing catalyst (C) is 0.01 to 3 parts by mass, preferably 0.05 to 1.5 parts by mass, based on 100 parts by mass of the total of the components (A) and (B). If the blending amount of the curing catalyst is less than the lower limit, the effect of promoting the reaction between the epoxy resin and the curing agent may not be sufficient. On the contrary, if the blending amount of the curing catalyst is larger than the upper limit value, it may cause discoloration during curing or reflow test.
<(D)酸化防止剤>
酸化防止剤としては、亜リン酸化合物、ヒンダードフェノール系酸化防止剤、フェノール系、イオウ系、リン系酸化防止剤等があり、ヒンダードフェノール系酸化防止剤が好ましい。酸化防止剤は単独で又は2種以上を組み合わせて使用できる。
また、紫外線吸収剤としては、ヒンダードアミン系紫外線吸収剤が好ましい。
<(D) Antioxidant>
Examples of the antioxidant include a phosphorous acid compound, a hindered phenol-based antioxidant, a phenol-based, sulfur-based, and a phosphorus-based antioxidant, and a hindered phenol-based antioxidant is preferable. The antioxidants can be used alone or in combination of two or more.
Further, as the ultraviolet absorber, a hindered amine-based ultraviolet absorber is preferable.
フェノール系酸化防止剤の具体例として、2,6−ジ−t−ブチル−p−クレゾール、ブチル化ヒドロキシアニソール、2,6−ジ−t−ブチル−p−エチルフェノール、ステアリル−β−(3,5−ジ−t−ブチル−4−ヒドロキシフェニル)プロピオネート、イソオクチル−3−(3,5−ジ−t−ブチル−4−ヒドロキシフェニル)プロピオネート、2,4−ビス−(n−オクチルチオ)−6−(4−ヒドロキシ−3,5−ジ−t−ブチルアニリノ)−1,3,5−トリアジン、2,4−ビス[(オクチルチオ)メチル]−o−クレゾール、等のモノフェノール類;2,2’−メチレンビス(4−メチル−6−t−ブチルフェノール)、2,2’−メチレンビス(4−エチル−6−t−ブチルフェノール)、4,4’−チオビス(3−メチル−6−t−ブチルフェノール)、4,4’−ブチリデンビス(3−メチル−6−t−ブチルフェノール)、トリエチレングリコール−ビス[3−(3−t−ブチル−5−メチル−4−ヒドロキシフェニル)プロピオネート]、1,6−ヘキサンジオール−ビス[3−(3,5−ジ−t−ブチル−4−ヒドロキシフェニル)プロピオネート]、N,N’−ヘキサメチレンビス(3,5−ジ−t−ブチル−4−ヒドロキシ−ヒドロシンナマミド)、2,2−チオ−ジエチレンビス[3−(3,5−ジ−t−ブチル−4−ヒドロキシフェニル)プロピオネート]、3,5−ジ−t−ブチル−4−ヒドロキシベンジルフォスフォネート−ジエチルエステル、3,9−ビス[1,1−ジメチル−2−{β−(3−t−ブチル−4−ヒドロキシ−5−メチルフェニル)プロピオニルオキシ}エチル]2,4,8,10−テトラオキサスピロ[5,5]ウンデカン、ビス(3,5−ジ−t−ブチル−4−ヒドロキシベンジルスルホン酸エチル)カルシウム等のビスフェノール類;1,1,3−トリス(2−メチル−4−ヒドロキシ−5−t−ブチルフェニル)ブタン、1,3,5−トリメチル−2,4,6−トリス(3,5−ジ−t−ブチル−4−ヒドロキシベンジル)ベンゼン、テトラキス−[メチレン−3−(3’,5’−ジ−t−ブチル−4’−ヒドロキシフェニル)プロピオネート]メタン、ビス[3,3’−ビス−(4’−ヒドロキシ−3’−t−ブチルフェニル)ブチリックアシッド]グリコールエステル、トリス−(3,5−ジ−t−ブチル−4−ヒドロキシベンジル)−イソシアヌレイト、1,3,5−トリス(3’,5’−ジ−t−ブチル−4’−ヒドロキシベンジル)−S−トリアジン−2,4,6−(1H,3H,5H)トリオン、トコフェノール等の高分子型フェノール類が例示される。 Specific examples of phenolic antioxidants include 2,6-di-t-butyl-p-cresol, butylated hydroxyanisol, 2,6-di-t-butyl-p-ethylphenol, and stearyl-β- (3). , 5-Di-t-Butyl-4-hydroxyphenyl) propionate, isooctyl-3- (3,5-di-t-butyl-4-hydroxyphenyl) propionate, 2,4-bis- (n-octylthio)- Monophenols such as 6- (4-hydroxy-3,5-di-t-butylanilino) -1,3,5-triazine, 2,4-bis [(octylthio) methyl] -o-cresol; 2'-Methylenebis (4-methyl-6-t-butylphenol), 2,2'-Methylenebis (4-ethyl-6-t-butylphenol), 4,4'-thiobis (3-methyl-6-t-butylphenol) ), 4,4'-butylidenebis (3-methyl-6-t-butylphenol), triethylene glycol-bis [3- (3-t-butyl-5-methyl-4-hydroxyphenyl) propionate], 1,6 -Hexanediol-bis [3- (3,5-di-t-butyl-4-hydroxyphenyl) propionate], N, N'-hexamethylenebis (3,5-di-t-butyl-4-hydroxy-) Hydrocinnamamide), 2,2-thio-diethylenebis [3- (3,5-di-t-butyl-4-hydroxyphenyl) propionate], 3,5-di-t-butyl-4-hydroxybenzyl Phosphonate-diethyl ester, 3,9-bis [1,1-dimethyl-2-{β- (3-t-butyl-4-hydroxy-5-methylphenyl) propionyloxy} ethyl] 2,4,8 , 10-Tetraoxaspiro [5,5] undecane, bisphenols such as bis (3,5-di-t-butyl-4-hydroxybenzylsulfonate ethyl) calcium; 1,1,3-tris (2-methyl) -4-Hydroxy-5-t-butylphenyl) butane, 1,3,5-trimethyl-2,4,6-tris (3,5-di-t-butyl-4-hydroxybenzyl) benzene, tetrakis- [ Methyl-3- (3', 5'-di-t-butyl-4'-hydroxyphenyl) propionate] Methyl, bis [3,3'-bis- (4'-hydroxy-3'-t-butylphenyl) Butylic acid] glycol ester, tris- (3,5-di-t-butyl-4-hydroxybenzyl) -iso Cyanurate, 1,3,5-tris (3', 5'-di-t-butyl-4'-hydroxybenzyl) -S-triazine-2,4,6- (1H, 3H, 5H) trione, tocopherol Such as high molecular weight phenols are exemplified.
イオウ系酸化防止剤の具体例として、ジラウリル−3,3’−チオジプロピオネート、ジミリスチル−3,3’−チオジプロピオネート、ジステアリルル−3,3’−チオジプロピオネート等が例示される。 Specific examples of the sulfur-based antioxidant include dilauryl-3,3'-thiodipropionate, dimyristyl-3,3'-thiodipropionate, distearyll-3,3'-thiodipropionate and the like. ..
リン系酸化防止剤の具体例として、トリフェニルホスファイト、ジフェニルイソデシルホスファイト、フェニルジイソデシルホスファイト、トリス(ノニルフェニル)ホスファイト、ジイソデシルペンタエリスリトールホスファイト、トリス(2,4−ジ−t−ブチルフェニル)ホスファイト、サイクリックネオペンタンテトライルビス(オクタデシル)ホスファイト、サイクリックネオペンタンテトライルビ(2,4−ジ−t−ブチルフェニル)ホスファイト、サイクリックネオペンタンテトライルビ(2,4−ジ−t−ブチル−4−メチルフェニル)ホスファイト、ビス[2−t−ブチル−6−メチル−4−{2−(オクタデシルオキシカルボニル)エチル}フェニル]ヒドロゲンホスファイト等のホスファイト類;9,10−ジヒドロ−9−オキサ−10−ホスファフェナントレン−10−オキサイド、10−(3,5−ジ−t−ブチル−4−ヒドロキシベンジル)−9,10−ジヒドロ−9−オキサ−10−ホスファフェナントレン−10−オキサイド、10−デシロキシ−9,10−ジヒドロ−9−オキサ−10−ホスファフェナントレン−10−オキサイド等のオキサホスファフェナントレンオキサイド類などが例示される。 Specific examples of phosphorus-based antioxidants include triphenylphosphite, diphenylisodecylphosphite, phenyldiisodecylphosphite, tris (nonylphenyl) phosphite, diisodecylpentaerythritol phosphite, and tris (2,4-di-t-). Butylphenyl) phosphite, cyclic neopentanetetraylbis (octadecyl) phosphite, cyclic neopentanetetraylbi (2,4-di-t-butylphenyl) phosphite, cyclic neopentanetetraylbi (2,4) Phenyl phosphites such as −di-t-butyl-4-methylphenyl) phosphite, bis [2-t-butyl-6-methyl-4- {2- (octadecyloxycarbonyl) ethyl} phenyl] hydrogen phosphite 9,10-Dihydro-9-oxa-10-phosphaphenanthrene-10-oxide, 10- (3,5-di-t-butyl-4-hydroxybenzyl) -9,10-dihydro-9-oxa- Examples thereof include oxaphosphaphenanthrene oxides such as 10-phosphaphenanthrene-10-oxide, 10-decyloxy-9,10-dihydro-9-oxa-10-phosphaphenanthrene-10-oxide.
(D)成分の配合量は、(A)成分100質量部に対して、0.1〜0.5質量部、好ましくは0.1〜0.3質量部である。酸化防止剤の配合量が前期上限値を超えると、残存した酸化防止剤が硬化後の樹脂の表面に析出するため好ましくなく、前期下限値未満では耐熱性、透明性が低下する。 The blending amount of the component (D) is 0.1 to 0.5 parts by mass, preferably 0.1 to 0.3 parts by mass with respect to 100 parts by mass of the component (A). If the blending amount of the antioxidant exceeds the upper limit of the previous term, the remaining antioxidant is deposited on the surface of the cured resin, which is not preferable. If the amount is less than the lower limit of the previous term, the heat resistance and transparency are lowered.
<その他の成分>
上記各成分に加えて、慣用の添加剤、例えば、紫外線吸収剤、劣化防止剤、蛍光体、熱可塑剤、希釈剤などを必要に応じて併用してもよい。
<Other ingredients>
In addition to each of the above components, conventional additives such as ultraviolet absorbers, deterioration inhibitors, phosphors, thermoplastics, diluents and the like may be used in combination as necessary.
さらに本発明のエポキシ樹脂組成物には、必要に応じて光安定剤を添加してもよい。
光安定剤としては、ヒンダートアミン系の光安定剤、特にHALS等が好適である。HALSとしては特に限定されるものではないが、代表的なものとしては、ジブチルアミン・1,3,5−トリアジン・N,N’―ビス(2,2,6,6−テトラメチル−4−ピペリジル−1,6−ヘキサメチレンジアミンとN−(2,2,6,6−テトラメチル−4−ピペリジル)ブチルアミンの重縮合物、コハク酸ジメチル−1−(2−ヒドロキシエチル)−4−ヒドロキシ−2,2,6,6−テトラメチルピペリジン重縮合物、ポリ〔{6−(1,1,3,3−テトラメチルブチル)アミノ−1,3,5−トリアジン−2,4−ジイル}{(2,2,6,6−テトラメチル−4−ピペリジル)イミノ}ヘキサメチレン{(2,2,6,6−テトラメチル−4−ピペリジル)イミノ}〕、ビス(1,2,2,6,6−ペンタメチル−4−ピペリジル)〔〔3,5−ビス(1,1−ジメチルエチル)−4−ヒドリキシフェニル〕メチル〕ブチルマロネート、ビス(2,2,6,6−テトラメチル−4−ピペリジル)セバケート、ビス(1,2,2,6,6−ペンタメチル−4−ピペリジル)セバケート、ビス(1−オクチロキシ−2,2,6,6−テトラメチル−4−ピペリジル)セバケート、2−(3,5−ジ−t−ブチル−4−ヒドロキシベンジル)−2−n−ブチルマロン酸ビス(1,2,2,6,6−ペンタメチル−4−ピペリジル)、等が挙げられる。HALSは1種のみが用いられても良いし、2種類以上が併用されても良い。
Further, a light stabilizer may be added to the epoxy resin composition of the present invention, if necessary.
As the light stabilizer, a hindered amine-based light stabilizer, particularly HALS and the like, is suitable. The HALS is not particularly limited, but typical ones are dibutylamine, 1,3,5-triazine, N, N'-bis (2,2,6,6-tetramethyl-4-). A polycondensate of piperidyl-1,6-hexamethylenediamine and N- (2,2,6,6-tetramethyl-4-piperidyl) butylamine, dimethyl-1- (2-hydroxyethyl) -4-hydroxy succinate -2,2,6,6-tetramethylpiperidine polycondensate, poly [{6- (1,1,3,3-tetramethylbutyl) amino-1,3,5-triazine-2,4-diyl} {(2,2,6,6-tetramethyl-4-piperidyl) imino} hexamethylene {(2,2,6,6-tetramethyl-4-piperidyl) imino}], bis (1,2,2, 6,6-Pentamethyl-4-piperidyl) [[3,5-bis (1,1-dimethylethyl) -4-hydrideiphenyl] methyl] Butylmalonate, bis (2,2,6,6-tetramethyl) -4-piperidyl) sebacate, bis (1,2,2,6,6-pentamethyl-4-piperidyl) sebacate, bis (1-octyloxy-2,2,6,6-tetramethyl-4-piperidyl) sebacate, Examples thereof include 2- (3,5-di-t-butyl-4-hydroxybenzyl) -2-n-butylmalate bis (1,2,2,6,6-pentamethyl-4-piperidyl). Only one type of HALS may be used, or two or more types may be used in combination.
さらに本発明のエポキシ樹脂組成物には、必要に応じてバインダー樹脂を配合することも出来る。バインダー樹脂としてはブチラール系樹脂、アセタール系樹脂、アクリル系樹脂、エポキシ−ナイロン系樹脂、NBR−フェノール系樹脂、エポキシ−NBR系樹脂、ポリアミド系樹脂、ポリイミド系樹脂、シリコーン系樹脂などが挙げられるが、これらに限定されるものではない。バインダー樹脂の配合量は、硬化物の難燃性、耐熱性を損なわない範囲であることが好ましく、樹脂成分100質量部に対して通常0.05〜50質量部、好ましくは0.05〜20質量部が必要に応じて用いられる。 Further, a binder resin can be added to the epoxy resin composition of the present invention, if necessary. Examples of the binder resin include butyral resin, acetal resin, acrylic resin, epoxy-nylon resin, NBR-phenol resin, epoxy-NBR resin, polyamide resin, polyimide resin, silicone resin and the like. , Not limited to these. The blending amount of the binder resin is preferably in a range that does not impair the flame retardancy and heat resistance of the cured product, and is usually 0.05 to 50 parts by mass, preferably 0.05 to 20 parts by mass with respect to 100 parts by mass of the resin component. Parts by mass are used as needed.
更に、本発明のエポキシ樹脂組成物は、必要に応じ、無機充填材、顔料、離型剤、シランカップリング剤、柔軟剤等を添加することができる。特に、不燃性無機充填材の添加は、さらに本組成物の難燃性を向上させる効果があり、作業性、硬化後の物性に支障がない限り、難燃性の点では、多く添加することが望ましい。不燃性無機充填材としては、水酸化アルミ、水酸化マグネシウム、水酸化鉄等の水酸化物。錫酸亜鉛、シリカ、アルミナ、炭酸カルシウム、窒化アルミ、窒化珪素等が例示される。 Further, the epoxy resin composition of the present invention can be added with an inorganic filler, a pigment, a mold release agent, a silane coupling agent, a softening agent and the like, if necessary. In particular, the addition of a nonflammable inorganic filler has the effect of further improving the flame retardancy of the present composition, and as long as there is no problem in workability and physical properties after curing, a large amount should be added in terms of flame retardancy. Is desirable. Hydroxides such as aluminum hydroxide, magnesium hydroxide, and iron hydroxide are used as nonflammable inorganic fillers. Examples thereof include zinc nitrate, silica, alumina, calcium carbonate, aluminum nitride, silicon nitride and the like.
本発明のエポキシ樹脂組成物は、上記各成分および必要により各種の添加剤を配合して、溶解または溶融混合することで製造することができる。溶融混合は、公知の方法でよく、例えば、上記の成分をリアクターに仕込み、バッチ式にて溶融混合してもよく、また上記の各成分をニーダーや熱三本ロールなどの混練機に投入して、連続的にて溶融混合することができる。(C)硬化触媒は、(B)硬化剤に予め加熱溶解混合し、混合の最終段階で(A)成分、(D)成分等と分散混合することが好ましい。 The epoxy resin composition of the present invention can be produced by blending each of the above components and, if necessary, various additives, and dissolving or melt-mixing them. The melt-mixing may be carried out by a known method. For example, the above components may be charged into a reactor and melt-mixed in a batch manner, or each of the above components may be charged into a kneader such as a kneader or a hot triple roll. It can be continuously melt-mixed. It is preferable that the curing catalyst (C) is previously heated, dissolved and mixed with the curing agent (B), and dispersed and mixed with the components (A), (D) and the like at the final stage of mixing.
本発明のエポキシ樹脂組成物は、例えばエポキシ樹脂と硬化剤を予め、100〜200℃ に加温し、少なくともエポキシ樹脂または硬化剤のどちらか一方を溶融させ、この溶融液に他方を溶解させた後、押出機、ロール、ニーダー等で必要により無機充填材、顔料、離型剤、難燃剤、シランカップリング剤等及び硬化促進剤を添加、混合することにより得ることが出来る。また、場合により溶融工程を経ずに上記各成分を押出機、ロール、ニーダー等で混合しても良い。得られたエポキシ樹脂組成物は通常トランスファー成型機等を用いて成型し、硬化させるが、更に80〜200℃ で2〜10時間後硬化を行うと性能が向上する。また、液状封止材とする場合には液状エポキシ樹脂を用い、本発明のエポキシ樹脂組成物を室温で混合し製造できる。 In the epoxy resin composition of the present invention, for example, the epoxy resin and the curing agent are preheated to 100 to 200 ° C. to melt at least one of the epoxy resin and the curing agent, and the other is dissolved in this melt. After that, it can be obtained by adding and mixing an inorganic filler, a pigment, a mold release agent, a flame retardant, a silane coupling agent and the like and a curing accelerator, if necessary, with an extruder, a roll, a kneader or the like. Further, in some cases, each of the above components may be mixed by an extruder, roll, kneader or the like without going through the melting step. The obtained epoxy resin composition is usually molded using a transfer molding machine or the like and cured, but further curing at 80 to 200 ° C. for 2 to 10 hours improves the performance. Further, when the liquid encapsulant is used, a liquid epoxy resin can be used, and the epoxy resin composition of the present invention can be mixed and produced at room temperature.
本発明のエポキシ樹脂組成物の硬化物のガラス転移温度は、DSCで40〜100℃が好ましい。硬化した樹脂組成物の質量が10%減少した時の温度(Td10)は380℃以上であることが好ましく、400℃以上であることがより好ましく、420℃以上が特に好ましい。上限は特に限定はないが、2000℃以下が通常である。 The glass transition temperature of the cured product of the epoxy resin composition of the present invention is preferably 40 to 100 ° C. in DSC. The temperature (Td10) when the mass of the cured resin composition is reduced by 10% is preferably 380 ° C. or higher, more preferably 400 ° C. or higher, and particularly preferably 420 ° C. or higher. The upper limit is not particularly limited, but is usually 2000 ° C. or lower.
本発明の硬化物は成型材料、接着剤、複合材料、塗料など各種用途に使用できる。他にも、IC封止材料、積層材料、電気絶縁材料等などの電気・電子分野に有用である。 The cured product of the present invention can be used for various purposes such as molding materials, adhesives, composite materials, and paints. In addition, it is useful in the electrical and electronic fields such as IC encapsulation materials, laminated materials, and electrically insulating materials.
以下、本発明を合成例、実施例により更に詳細に説明する。尚、本発明はこれら合成例、実施例に限定されるものではない。なお、合成例、実施例中の各物性値は以下の方法で測定した。ここで、部は特に断りのない限り質量部を表す。
○GPC:GPCは下記条件にて測定した。
GPCの各種条件
メーカー:ウォーターズ
カラム:SHODEX GPC LF−G(ガードカラム)、KF−603、KF−602.5、KF−602、KF−601(2本)
流速:0.4ml/min.
カラム温度:40℃
使用溶剤:THF(テトラヒドロフラン)
検出器:RI(示差屈折検出器)
○NMR:日本電子株式会社製 JNM−ECS400を用いて、重クロロホルム溶媒で測定した。
○エポキシ当量:JIS K−7236に記載の方法で測定した。
Hereinafter, the present invention will be described in more detail with reference to Synthesis Examples and Examples. The present invention is not limited to these synthetic examples and examples. The physical property values in the synthetic examples and the examples were measured by the following methods. Here, the part represents a mass part unless otherwise specified.
○ GPC: GPC was measured under the following conditions.
Various conditions of GPC Manufacturer: Waters column: SHODEX GPC LF-G (guard column), KF-603, KF-602.5, KF-602, KF-601 (2)
Flow velocity: 0.4 ml / min.
Column temperature: 40 ° C
Solvent used: THF (tetrahydrofuran)
Detector: RI (Differential Refractometer)
○ NMR: Measurement was performed with a deuterated chloroform solvent using JNM-ECS400 manufactured by JEOL Ltd.
Epoxy equivalent: Measured by the method described in JIS K-7236.
実施例1:シリコーン変性エポキシ樹脂1の合成
撹拌装置、還流冷却管を備えたフラスコにトリシクロデカンジメタノール(20mmоl、3.93g)、キシレン200g、フェニルシラン(24mmоl、3.00ml)、10%担持パラジウム炭素0.51gを加え、140℃で24時間反応させた。室温まで降温させた後、1,2-エポキシ−4−ビニルシクロヘキサン(64mmоl、8.35ml)、トリス(トリフェニルホスフィン)ロジウム(I)クロリド(5μmоl、4.63mg)を加え、再び140℃に昇温させ24時間撹拌した。反応終了後、濾過により10%担持パラジウム炭素を除去し、この反応液をトルエン−ヘキサンにて再沈殿をした。さらに、濃縮することでシリコーン変性エポキシ樹脂を得た。得られたシリコーン変性エポキシ樹脂1のエポキシ当量を確認したところ、616g/eqであった。
Example 1: Synthesis of silicone-modified epoxy resin 1 Tricyclodecanedimethanol (20 mmоl, 3.93 g), xylene 200 g, phenylsilane (24 mmоl, 3.00 ml), 10% in a flask equipped with a stirrer and a reflux condenser. 0.51 g of supported palladium carbon was added, and the mixture was reacted at 140 ° C. for 24 hours. After lowering to room temperature, 1,2-epoxy-4-vinylcyclohexane (64 mmоl, 8.35 ml) and tris (triphenylphosphine) rhodium (I) chloride (5 μmоl, 4.63 mg) were added, and the temperature was raised to 140 ° C. again. The temperature was raised and the mixture was stirred for 24 hours. After completion of the reaction, 10% supported palladium carbon was removed by filtration, and the reaction solution was reprecipitated with toluene-hexane. Further, it was concentrated to obtain a silicone-modified epoxy resin. When the epoxy equivalent of the obtained silicone-modified epoxy resin 1 was confirmed, it was 616 g / eq.
実施例2:シリコーン変性エポキシ樹脂2の合成
撹拌装置、還流冷却管を備えたフラスコにトリシクロデカンジメタノール(20mmоl、3.93g)、キシレン200g、フェニルシラン(24mmоl、3.00ml)、10%担持パラジウム炭素0.51gを加え、140℃で24時間反応させた。室温まで降温させた後、グリシドール(64mmоl、4.27ml)を加え、再び140℃に昇温させ24時間撹拌した。反応終了後、濾過により10%担持パラジウム炭素を除去し、この反応液をトルエン−ヘキサンにて再沈殿をした。さらに、濃縮することでシリコーン変性エポキシ樹脂を得た。得られたシリコーン変性エポキシ樹脂2のエポキシ当量を確認したところ、705g/eqであった。
Example 2: Synthesis of silicone-modified epoxy resin 2 Tricyclodecanedimethanol (20 mmоl, 3.93 g), xylene 200 g, phenylsilane (24 mmоl, 3.00 ml), 10% in a flask equipped with a stirrer and a reflux condenser. 0.51 g of supported palladium carbon was added, and the mixture was reacted at 140 ° C. for 24 hours. After the temperature was lowered to room temperature, glycidol (64 mmоl, 4.27 ml) was added, the temperature was raised to 140 ° C. again, and the mixture was stirred for 24 hours. After completion of the reaction, 10% supported palladium carbon was removed by filtration, and the reaction solution was reprecipitated with toluene-hexane. Further, it was concentrated to obtain a silicone-modified epoxy resin. When the epoxy equivalent of the obtained silicone-modified epoxy resin 2 was confirmed, it was 705 g / eq.
実施例3:シリコーン変性エポキシ樹脂3の合成
撹拌装置、還流冷却管を備えたフラスコにトリシクロデカンジメタノール(20mmоl、3.93g)、キシレン200g、ジフェニルシラン(24mmоl、4.46ml)、10%担持パラジウム炭素0.51gを加え、140℃で24時間反応させた。室温まで降温させた後、1,2-エポキシ−4−ビニルシクロヘキサン(8mmоl、1.04ml)、トリス(トリフェニルホスフィン)ロジウム(I)クロリド(5μmоl、4.63mg)を加え、再び140℃に昇温させ24時間撹拌した。反応終了後、濾過により10%担持パラジウム炭素を除去し、この反応液をトルエン−ヘキサンにて再沈殿をした。さらに、濃縮することでシリコーン変性エポキシ樹脂を得た。得られたシリコーン変性エポキシ樹脂1のエポキシ当量を確認したところ、1531g/eqであった。
Example 3: Synthesis of Silicone Modified Epoxy Resin 3 Tricyclodecanedimethanol (20 mmоl, 3.93 g), xylene 200 g, diphenylsilane (24 mmоl, 4.46 ml), 10% in a flask equipped with a stirrer and a reflux condenser. 0.51 g of supported palladium carbon was added, and the mixture was reacted at 140 ° C. for 24 hours. After lowering to room temperature, 1,2-epoxy-4-vinylcyclohexane (8 mmоl, 1.04 ml) and tris (triphenylphosphine) rhodium (I) chloride (5 μmоl, 4.63 mg) were added, and the temperature was raised to 140 ° C. again. The temperature was raised and the mixture was stirred for 24 hours. After completion of the reaction, 10% supported palladium carbon was removed by filtration, and the reaction solution was reprecipitated with toluene-hexane. Further, it was concentrated to obtain a silicone-modified epoxy resin. When the epoxy equivalent of the obtained silicone-modified epoxy resin 1 was confirmed, it was 1531 g / eq.
実施例4:シリコーン変性エポキシ樹脂4の合成
撹拌装置、還流冷却管を備えたフラスコにジオキサングリコール(20mmоl、4.36g)、キシレン200g、ジフェニルシラン(24mmоl、4.46ml)、10%担持パラジウム炭素0.51gを加え、140℃で24時間反応させた。室温まで降温させた後、1,2-エポキシ−4−ビニルシクロヘキサン(8mmоl、1.04ml)、トリス(トリフェニルホスフィン)ロジウム(I)クロリド(5μmоl、4.63mg)を加え、再び140℃に昇温させ24時間撹拌した。反応終了後、濾過により10%担持パラジウム炭素を除去し、この反応液をトルエン−ヘキサンにて再沈殿をした。さらに、濃縮することでシリコーン変性エポキシ樹脂を得た。得られたシリコーン変性エポキシ樹脂1のエポキシ当量を確認したところ、1666g/eqであった。
Example 4: Synthesis of Silicone Modified Epoxy Resin 4 Dioxane glycol (20 mmоl, 4.36 g), xylene 200 g, diphenylsilane (24 mmоl, 4.46 ml), 10% supported palladium carbon in a flask equipped with a stirrer and a reflux condenser. 0.51 g was added and the mixture was reacted at 140 ° C. for 24 hours. After lowering to room temperature, 1,2-epoxy-4-vinylcyclohexane (8 mmоl, 1.04 ml) and tris (triphenylphosphine) rhodium (I) chloride (5 μmоl, 4.63 mg) were added, and the temperature was raised to 140 ° C. again. The temperature was raised and the mixture was stirred for 24 hours. After completion of the reaction, 10% supported palladium carbon was removed by filtration, and the reaction solution was reprecipitated with toluene-hexane. Further, it was concentrated to obtain a silicone-modified epoxy resin. When the epoxy equivalent of the obtained silicone-modified epoxy resin 1 was confirmed, it was 1666 g / eq.
実施例5:シリコーン変性エポキシ樹脂5の合成
撹拌装置、還流冷却管を備えたフラスコにエチレングリコール(20mmоl、1.24g)、キシレン200g、ジフェニルシラン(24mmоl、4.46ml)、10%担持パラジウム炭素0.51gを加え、140℃で24時間反応させた。室温まで降温させた後、1,2-エポキシ−4−ビニルシクロヘキサン(8mmоl、1.04ml)、トリス(トリフェニルホスフィン)ロジウム(I)クロリド(5μmоl、4.63mg)を加え、再び140℃に昇温させ24時間撹拌した。反応終了後、濾過により10%担持パラジウム炭素を除去し、この反応液をトルエン−ヘキサンにて再沈殿をした。さらに、濃縮することでシリコーン変性エポキシ樹脂を得た。得られたシリコーン変性エポキシ樹脂1のエポキシ当量を確認したところ、2343g/eqであった。
Example 5: Synthesis of Silicone Modified Epoxy Resin 5 Ethylene glycol (20 mmоl, 1.24 g), xylene 200 g, diphenylsilane (24 mmоl, 4.46 ml), 10% supported palladium carbon in a flask equipped with a stirrer and a reflux condenser. 0.51 g was added and the mixture was reacted at 140 ° C. for 24 hours. After lowering to room temperature, 1,2-epoxy-4-vinylcyclohexane (8 mmоl, 1.04 ml) and tris (triphenylphosphine) rhodium (I) chloride (5 μmоl, 4.63 mg) were added, and the temperature was raised to 140 ° C. again. The temperature was raised and the mixture was stirred for 24 hours. After completion of the reaction, 10% supported palladium carbon was removed by filtration, and the reaction solution was reprecipitated with toluene-hexane. Further, it was concentrated to obtain a silicone-modified epoxy resin. When the epoxy equivalent of the obtained silicone-modified epoxy resin 1 was confirmed, it was 2343 g / eq.
比較例で使用したエポキシ樹脂は以下のとおりである。
[比較例1]
・3‘−4’-エポキシシクロヘキシルメチル3,4-エポキシシクロヘキサンカルボキシレート(ダイセル化学工業(株)社製、セロキサイド2021P)
[比較例2]
エポキシ変性シリコーン樹脂(東レ・ダウコーニング(株)社製、BY16839)。
The epoxy resin used in the comparative example is as follows.
[Comparative Example 1]
3'-4'-epoxycyclohexylmethyl 3,4-epoxycyclohexanecarboxylate (manufactured by Daicel Chemical Industries, Ltd., celloxide 2021P)
[Comparative Example 2]
Epoxy-modified silicone resin (manufactured by Toray Dow Corning Co., Ltd., BY16839).
−組成物及び硬化物の特性評価−
実施例1、3〜5と比較例1、2で得られた樹脂に対し、カチオン系触媒(三新化学工業社製、サンエイドSI−150)を1質量%になるように加え、実施例2の樹脂については2−エチル−4−メチルイミダゾール)を1質量%になるように加えた。ガラス基板上に耐熱離型テープで40mm×25mm×1mmの型を作製し、本発明の硬化性樹脂組成物及び比較例の硬化性樹脂組成物をそれぞれ厚さ約800μmにまで注型し、80℃にて1時間、続いて150℃乾燥機にて3時間硬化し、本発明の硬化物を得た。得られた硬化物についてそれぞれ耐熱性、強靭性、耐着色性、寸法安定性を測定した。
得られた組成物及び硬化物の特性評価を以下の方法で行なった。硬化は、組成物を100℃で1時間、次いで150℃で4時間加熱して行なった。結果を表1に示す。
-Characteristic evaluation of composition and cured product-
A cationic catalyst (Sun Aid SI-150, manufactured by Sanshin Chemical Industry Co., Ltd.) was added to the resins obtained in Examples 1, 3 to 5 and Comparative Examples 1 and 2 so as to be 1% by mass, and Example 2 was added. 2-Ethyl-4-methylimidazole) was added in an amount of 1% by mass. A 40 mm × 25 mm × 1 mm mold was prepared on a glass substrate with a heat-resistant release tape, and the curable resin composition of the present invention and the curable resin composition of Comparative Example were cast to a thickness of about 800 μm, respectively, and 80 The cured product of the present invention was obtained by curing at ° C. for 1 hour and then in a dryer at 150 ° C. for 3 hours. Heat resistance, toughness, color resistance, and dimensional stability were measured for each of the obtained cured products.
The characteristics of the obtained composition and cured product were evaluated by the following methods. Curing was performed by heating the composition at 100 ° C. for 1 hour and then at 150 ° C. for 4 hours. The results are shown in Table 1.
脂組成物及び硬化膜についての評価方法及び評価基準は以下の通りであった。
(1)耐熱性:硬化した樹脂組成物の質量が10%減少したときの温度(Td10)を熱重量分析装置(TGADTA:メトラー(株)製)において、窒素雰囲気下10℃/minにて測定した。判定基準は以下の通りである。
◎:Td10が420℃以上
○:Td10が400℃以上419℃以下
△:Td10が380℃以上399℃以下
×:Td10が379℃以下
(2)強靭性:硬化した樹脂組成物の硬化膜の両端を手で固定し、中央部を押したときの 硬化膜の状態を観察した。判定基準は以下の通りである。
◎:強く押してもひびが入らず、割れない。
○:弱く押してもひびが入らず、割れないが、強く押すとひびが入る。
△:弱く押すとひびが入り、強く押すと割れる。
×:弱く押すと割れる。
The evaluation methods and evaluation criteria for the fat composition and the cured film were as follows.
(1) Heat resistance: The temperature (Td10) when the mass of the cured resin composition is reduced by 10% is measured at 10 ° C./min in a nitrogen atmosphere with a thermogravimetric analyzer (TGADTA: manufactured by METTLER CORPORATION). did. The judgment criteria are as follows.
⊚: Td10 is 420 ° C. or higher ◯: Td10 is 400 ° C. or higher and 419 ° C. or lower Δ: Td10 is 380 ° C. or higher and 399 ° C. or lower ×: Td10 is 379 ° C. or lower (2) Toughness: Both ends of the cured film of the cured resin composition Was fixed by hand, and the state of the cured film when the central part was pressed was observed. The judgment criteria are as follows.
◎: Even if pressed strongly, it will not crack and will not crack.
◯: Even if it is pressed lightly, it will not crack and will not crack, but if it is pressed strongly, it will crack.
Δ: When pressed lightly, it cracks, and when pressed strongly, it cracks.
×: It breaks when pressed lightly.
表1の結果から明らかなように実施例1〜5の組成物は耐熱性、強靭性に優れる。一方、比較例1の組成物は強靭性、耐熱性とも劣る。また、比較例2のエポキシ変性シリコーン樹脂は耐熱性は優れているものの、強靭性が劣る。 As is clear from the results in Table 1, the compositions of Examples 1 to 5 are excellent in heat resistance and toughness. On the other hand, the composition of Comparative Example 1 is inferior in toughness and heat resistance. Further, although the epoxy-modified silicone resin of Comparative Example 2 has excellent heat resistance, it is inferior in toughness.
また、本発明のシリコーン変性エポキシ樹脂の耐湿性について評価を行った。評価方法及び評価基準は以下の通りであった。
30℃70%RHに6時間放置した後、GPCにて放置前後のピークトップの保持時間を調べた。
In addition, the moisture resistance of the silicone-modified epoxy resin of the present invention was evaluated. The evaluation method and evaluation criteria were as follows.
After leaving at 30 ° C. and 70% RH for 6 hours, the retention time of the peak top before and after leaving was examined by GPC.
結果から明らかなように本発明のシリコーン変性エポキシ樹脂は耐湿性に優れている。 As is clear from the results, the silicone-modified epoxy resin of the present invention has excellent moisture resistance.
Claims (8)
前記シリコーン変性エポキシ樹脂が、下記式(5A)
の末端アルケニル基を含有するエポキシ基含有化合物又は下記式(5B)
の末端水酸基を含有するエポキシ基含有化合物と、下記式(6)
の反応物であるシリコーン変性エポキシ樹脂。
A silicone-modified epoxy resin represented by the following formula (1).
The silicone-modified epoxy resin has the following formula (5A).
Epoxy group-containing compound containing a terminal alkenyl group or the following formula (5B)
Epoxy group-containing compound containing the terminal hydroxyl group of, and the following formula (6)
Silicone modified epoxy resin which is a reaction product of.
ヘテロ環骨格:モルホリン骨格、テトラヒドロフラン骨格、オキサン骨格、ジオキサン骨格、トリオキサン骨格、トリアジン骨格、カルバゾール骨格、ピロリジン骨格、ピペリジン骨格
環式炭化水素骨格:ジシクロデカン骨格、トリシクロデカン骨格、アダマンタン骨格、シクロヘキサン骨格、シクロペンタン骨格、シクロヘプタン骨格
芳香環骨格:ベンゼン骨格、ナフタレン骨格、カルバゾール骨格
The silicone-modified epoxy resin according to claim 1, wherein the heterocyclic skeleton, the cyclic hydrocarbon skeleton, and the aromatic ring skeleton are selected from the following.
Heterocyclic skeleton: morpholin skeleton, tetrahydrofuran skeleton, oxane skeleton, dioxane skeleton, trioxane skeleton, triazine skeleton, carbazole skeleton, pyrrolidine skeleton, piperidine skeleton cyclic hydrocarbon skeleton: dicyclodecane skeleton, tricyclodecane skeleton, adamantan skeleton, cyclohexane skeleton Cyclopentane skeleton, cycloheptane skeleton Aromatic ring skeleton: benzene skeleton, naphthalene skeleton, carbazole skeleton
The silicone modification according to claim 1 or 2, wherein at least one of a plurality of R 2 existing in the formula (1) represents a monovalent aromatic hydrocarbon group having 6 to 12 carbon atoms. Epoxy resin.
又は下記式(4)
のいずれかの有機基を表すことを特徴とする請求項1に記載のシリコーン変性エポキシ樹脂。
In the above formula (1), A is an alkylene group having 1 to 10 carbon atoms, and the following formula (3)
Or the following formula (4)
The silicone-modified epoxy resin according to claim 1, wherein the silicone-modified epoxy resin represents any one of the organic groups.
An epoxy resin composition containing (A) a silicone-modified epoxy resin and (B) an epoxy resin curing agent according to any one of claims 1 to 4.
The epoxy resin composition according to claim 5 , further comprising (C) an epoxy resin curing catalyst.
The epoxy resin composition according to claim 5, wherein the epoxy resin curing agent is selected from any of an amine-based curing agent, a phenol-based curing agent, an acid anhydride-based curing agent, and a polyvalent carboxylic acid resin.
A cured product obtained by curing the epoxy resin composition according to any one of claims 5 to 7.
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