JP6423137B2 - Manufacturing method of substrate for surface enhanced spectroscopy - Google Patents
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- 239000000758 substrate Substances 0.000 title claims description 43
- 238000004519 manufacturing process Methods 0.000 title claims description 21
- 238000004611 spectroscopical analysis Methods 0.000 title claims description 16
- 239000010953 base metal Substances 0.000 claims description 67
- BQCADISMDOOEFD-UHFFFAOYSA-N Silver Chemical compound [Ag] BQCADISMDOOEFD-UHFFFAOYSA-N 0.000 claims description 55
- 239000002105 nanoparticle Substances 0.000 claims description 55
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- 239000004332 silver Substances 0.000 claims description 55
- 239000002086 nanomaterial Substances 0.000 claims description 52
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims description 47
- SQGYOTSLMSWVJD-UHFFFAOYSA-N silver(1+) nitrate Chemical compound [Ag+].[O-]N(=O)=O SQGYOTSLMSWVJD-UHFFFAOYSA-N 0.000 claims description 40
- 238000000034 method Methods 0.000 claims description 23
- 239000002245 particle Substances 0.000 claims description 23
- 239000000377 silicon dioxide Substances 0.000 claims description 23
- 229910001961 silver nitrate Inorganic materials 0.000 claims description 20
- 238000001771 vacuum deposition Methods 0.000 claims description 8
- 238000004544 sputter deposition Methods 0.000 claims description 5
- 239000004793 Polystyrene Substances 0.000 claims description 2
- GWEVSGVZZGPLCZ-UHFFFAOYSA-N Titan oxide Chemical compound O=[Ti]=O GWEVSGVZZGPLCZ-UHFFFAOYSA-N 0.000 claims description 2
- 239000003989 dielectric material Substances 0.000 claims description 2
- 229920002223 polystyrene Polymers 0.000 claims description 2
- OGIDPMRJRNCKJF-UHFFFAOYSA-N titanium oxide Inorganic materials [Ti]=O OGIDPMRJRNCKJF-UHFFFAOYSA-N 0.000 claims description 2
- 229910000510 noble metal Inorganic materials 0.000 description 21
- 239000010949 copper Substances 0.000 description 18
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 17
- 229910052802 copper Inorganic materials 0.000 description 17
- 229910052782 aluminium Inorganic materials 0.000 description 14
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 14
- 239000000243 solution Substances 0.000 description 14
- 238000000151 deposition Methods 0.000 description 13
- 239000011521 glass Substances 0.000 description 13
- 230000008021 deposition Effects 0.000 description 10
- XEEYBQQBJWHFJM-UHFFFAOYSA-N Iron Chemical compound [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 description 9
- 230000035484 reaction time Effects 0.000 description 7
- 238000007740 vapor deposition Methods 0.000 description 7
- 238000001069 Raman spectroscopy Methods 0.000 description 4
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- 238000004566 IR spectroscopy Methods 0.000 description 3
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- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Chemical compound O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 3
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- OAICVXFJPJFONN-UHFFFAOYSA-N Phosphorus Chemical compound [P] OAICVXFJPJFONN-UHFFFAOYSA-N 0.000 description 2
- 238000000137 annealing Methods 0.000 description 2
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- 239000011651 chromium Substances 0.000 description 2
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- WYTZZXDRDKSJID-UHFFFAOYSA-N (3-aminopropyl)triethoxysilane Chemical compound CCO[Si](OCC)(OCC)CCCN WYTZZXDRDKSJID-UHFFFAOYSA-N 0.000 description 1
- SJECZPVISLOESU-UHFFFAOYSA-N 3-trimethoxysilylpropan-1-amine Chemical compound CO[Si](OC)(OC)CCCN SJECZPVISLOESU-UHFFFAOYSA-N 0.000 description 1
- VYZAMTAEIAYCRO-UHFFFAOYSA-N Chromium Chemical compound [Cr] VYZAMTAEIAYCRO-UHFFFAOYSA-N 0.000 description 1
- PWHULOQIROXLJO-UHFFFAOYSA-N Manganese Chemical compound [Mn] PWHULOQIROXLJO-UHFFFAOYSA-N 0.000 description 1
- BLRPTPMANUNPDV-UHFFFAOYSA-N Silane Chemical compound [SiH4] BLRPTPMANUNPDV-UHFFFAOYSA-N 0.000 description 1
- FOIXSVOLVBLSDH-UHFFFAOYSA-N Silver ion Chemical compound [Ag+] FOIXSVOLVBLSDH-UHFFFAOYSA-N 0.000 description 1
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 description 1
- 238000003486 chemical etching Methods 0.000 description 1
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- 229910052804 chromium Inorganic materials 0.000 description 1
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- GNBHRKFJIUUOQI-UHFFFAOYSA-N fluorescein Chemical compound O1C(=O)C2=CC=CC=C2C21C1=CC=C(O)C=C1OC1=CC(O)=CC=C21 GNBHRKFJIUUOQI-UHFFFAOYSA-N 0.000 description 1
- 239000007850 fluorescent dye Substances 0.000 description 1
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- 150000002500 ions Chemical class 0.000 description 1
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- 229910052748 manganese Inorganic materials 0.000 description 1
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- 239000002184 metal Substances 0.000 description 1
- 238000001465 metallisation Methods 0.000 description 1
- 238000012544 monitoring process Methods 0.000 description 1
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- 238000002360 preparation method Methods 0.000 description 1
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- 239000010453 quartz Substances 0.000 description 1
- 230000000630 rising effect Effects 0.000 description 1
- 229910000077 silane Inorganic materials 0.000 description 1
- 229910052710 silicon Inorganic materials 0.000 description 1
- 239000010703 silicon Substances 0.000 description 1
- 238000004416 surface enhanced Raman spectroscopy Methods 0.000 description 1
- 239000000725 suspension Substances 0.000 description 1
- JBQYATWDVHIOAR-UHFFFAOYSA-N tellanylidenegermanium Chemical compound [Te]=[Ge] JBQYATWDVHIOAR-UHFFFAOYSA-N 0.000 description 1
- 229910052719 titanium Inorganic materials 0.000 description 1
- 238000007738 vacuum evaporation Methods 0.000 description 1
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Description
本発明は、ラマン分光や赤外分光等の分光測定に有効な表面増強分光用基板の製造方法に関する。 The present invention relates to a method for producing a substrate for surface-enhanced spectroscopy that is effective for spectroscopic measurements such as Raman spectroscopy and infrared spectroscopy.
ラマン分光や赤外分光等を始めとする光学的分析方法において、貴金属ナノ構造を利用した表面増強法が広く研究されている。表面増強法を利用するための表面増強分光用基板は、基板上に固相化された貴金属ナノ構造体を形成するものである。 In optical analysis methods such as Raman spectroscopy and infrared spectroscopy, surface enhancement methods using noble metal nanostructures are widely studied. A surface-enhanced spectroscopic substrate for using the surface-enhancement method forms a noble metal nanostructure solid-phased on the substrate.
従来の表面増強分光用基板の製造方法の代表例としては、貴金属である銀の表面を化学エッチングさせる方法がある。その他にも、例えば、図9(a)は、基板50の表面に、真空蒸着により貴金属粒子52から貴金属薄膜51aを形成し、加熱によりアニーリングして貴金属ナノ構造体51bを構成する方法である。図9(b)は、貴金属コロイド53を基板50の表面に吸着させる方法である。 A typical example of a conventional method for producing a substrate for surface-enhanced spectroscopy is a method of chemically etching the surface of silver which is a noble metal. In addition, for example, FIG. 9A is a method of forming a noble metal nanostructure 51b by forming a noble metal thin film 51a from noble metal particles 52 on the surface of a substrate 50 by vacuum deposition and annealing by heating. FIG. 9B shows a method in which the noble metal colloid 53 is adsorbed on the surface of the substrate 50.
図9(c)は、電子線描画システムを含む微細加工技術を駆使することにより、ナノサイズの様々な形状の貴金属54、55を基板50上にパターニングする方法である。また、図9(d)は、近年において行われている方法であり、基板50の表面に形成された単層のナノ粒子57上に、真空蒸着により貴金属粒子56を堆積させて貴金属58を形成する方法である。 FIG. 9C shows a method of patterning noble metals 54 and 55 having various nano-sized shapes on the substrate 50 by making full use of a fine processing technique including an electron beam drawing system. FIG. 9D shows a method performed in recent years, in which the noble metal particles 56 are deposited on the single-layered nanoparticles 57 formed on the surface of the substrate 50 by vacuum evaporation to form the noble metal 58. It is a method to do.
ところで、表面増強分光用基板の作製において重要な点は、望ましい構造を有しており増強率を発揮できること、増強率が均一であること、経時変化が小さいこと、汎用的な製造装置で安価に作製可能であること等が挙げられる。 By the way, the important points in the production of the substrate for surface-enhanced spectroscopy are that it has a desirable structure and can exhibit the enhancement rate, that the enhancement rate is uniform, that the change over time is small, and that a general-purpose manufacturing apparatus is inexpensive. It can be prepared.
しかし、上記従来の製造方法の代表例である化学エッチング法は、簡便ではあるが、制御性に乏しく、高い増強率が期待できない。図9(a)のアニーリング法は、制御性の問題を有し、作製された貴金属ナノ構造体の形態は容易に変化し、経時変化が顕著である。さらに、真空蒸着において消費される貴金属の大半が蒸着装置の内部に付着するため無駄が非常に大きく、コストが高くつくという問題もある。図9(b)のコロイド吸着法も、増強率がさほど大きくなく、高価なコロイド液が大量に必要でありコストが高い。 However, the chemical etching method, which is a typical example of the conventional manufacturing method, is simple but has poor controllability and cannot be expected to have a high enhancement rate. The annealing method of FIG. 9A has a controllability problem, the form of the produced noble metal nanostructure easily changes, and the change with time is remarkable. Furthermore, since most of the precious metals consumed in vacuum deposition adhere to the inside of the deposition apparatus, there is a problem that waste is very large and the cost is high. The colloidal adsorption method of FIG. 9B also has a high enhancement rate, requires a large amount of expensive colloidal liquid, and is expensive.
図9(c)の電子描画システムにおいては、貴金属ナノ構造体の作製可能な形状の自由度は非常に大きいが、製造装置が高価であり、スループットが極めて低い。図9(d)のナノ粒子蒸着法は、性能及び均一性に優れ、また製造工程は簡便であるが、真空蒸着において消費される貴金属の大半が蒸着装置の内部に付着するため無駄が非常に大きく、コストが高くつくという問題がある。 In the electronic drawing system of FIG. 9 (c), the degree of freedom of the shape capable of producing the noble metal nanostructure is very large, but the manufacturing apparatus is expensive and the throughput is extremely low. The nanoparticle deposition method of FIG. 9 (d) is excellent in performance and uniformity, and the manufacturing process is simple, but most of the precious metals consumed in vacuum deposition adhere to the inside of the deposition apparatus, which is very wasteful. There is a problem that it is large and expensive.
本発明は、上述した課題を解決するために創案されたものであり、増強率の性能及び均一性に優れるとともに、簡単な工程により作製することができ、貴金属を無駄にすることなく全体のコストを抑制することができる表面増強分光用基板の製造方法を提供することを目的とする。 The present invention was devised to solve the above-described problems, and is excellent in performance and uniformity of the enhancement rate, and can be manufactured by a simple process, so that the entire cost can be obtained without wasting precious metals. It is an object of the present invention to provide a method for manufacturing a substrate for surface enhanced spectroscopy that can suppress the above.
上記目的を達成するために、本発明の表面増強分光用基板の製造方法は、基板上に卑金属のナノ構造体を形成する工程と、前記卑金属のナノ構造体に硝酸銀溶液を加える工程とを備えたことを主要な特徴とする。 In order to achieve the above object, a method for producing a substrate for surface enhanced spectroscopy according to the present invention comprises a step of forming a base metal nanostructure on a substrate and a step of adding a silver nitrate solution to the base metal nanostructure. This is the main feature.
本発明によれば、増強率の性能及び均一性に優れ、簡単な工程により、表面増強分光用基板を作製することができるとともに、貴金属を無駄にすることなくコストを抑制することができる。 According to the present invention, a substrate for surface enhanced spectroscopy can be produced by a simple process with excellent performance and uniformity of enhancement rate, and cost can be suppressed without wasting precious metals.
まず、最初の工程で、卑金属のナノ構造体を形成しているので、この工程で卑金属が多く使用されることになっても、コストは安く済む。また、卑金属のイオン化傾向は銀よりも大きいので、次の工程における卑金属のナノ構造体と硝酸銀溶液との化学反応によって、銀が卑金属に置き換わって形成される。このように、卑金属をシードとすることにより、必要な量だけ銀を使用することができるので、この点からもコストを抑制することができる。 First, since the base metal nanostructure is formed in the first step, even if a large amount of base metal is used in this step, the cost is low. In addition, since the ionization tendency of the base metal is larger than that of silver, silver is replaced with the base metal by a chemical reaction between the base metal nanostructure and the silver nitrate solution in the next step. In this way, by using a base metal as a seed, silver can be used in a necessary amount, so that the cost can also be suppressed from this point.
また、異なる種類の卑金属を用いることにより、さまざまな形態の銀ナノ構造体を作製することができるので、特定の応用に最適化した銀ナノ構造体を選択することができる。 Further, by using different types of base metals, various forms of silver nanostructures can be produced, so that silver nanostructures optimized for a specific application can be selected.
以下、図面を参照して本発明の一実施形態を説明する。構造に関する図面は模式的なものであり、現実のものとは異なる。また、図面相互間においても互いの寸法の関係や比率が異なる部分が含まれている。 Hereinafter, an embodiment of the present invention will be described with reference to the drawings. The drawings relating to the structure are schematic and different from the actual ones. Moreover, the part from which the relationship and ratio of a mutual dimension differ also in between drawings is contained.
本発明の表面増強分光用基板の製造方法では、まず、図1(a)のように、基板1上に吸着させて固相化されたナノ粒子2上に、真空蒸着又はスパッタリングにより卑金属粒子4を堆積させ、帽子形状の卑金属層3を形成する。 In the method for producing a substrate for surface-enhanced spectroscopy of the present invention, first, as shown in FIG. 1A, base metal particles 4 are deposited on the nanoparticles 2 adsorbed on the substrate 1 and solidified by vacuum deposition or sputtering. To form a hat-shaped base metal layer 3.
次に、図1(b)に示すように、図1(a)の構造体に硝酸銀溶液5を添加する。硝酸銀溶液5が添加されると、卑金属3のイオン化傾向は、銀のイオン化傾向よりも高いので、卑金属は+イオンとして溶液中に溶け出すと同時に、銀がナノ粒子2の表面に析出する。このようにして、ナノ粒子2上に帽子形状の銀層6aだけでなく、例えばフィラメント形状の銀層6bが形成される。 Next, as shown in FIG. 1B, a silver nitrate solution 5 is added to the structure of FIG. When the silver nitrate solution 5 is added, the ionization tendency of the base metal 3 is higher than the ionization tendency of silver, so that the base metal dissolves into the solution as + ions, and at the same time, silver is deposited on the surfaces of the nanoparticles 2. In this manner, not only the hat-shaped silver layer 6a but also the filament-shaped silver layer 6b is formed on the nanoparticle 2.
ここで、基板1は、ガラス、プラスティック、石英、シリコン等の材料が用いられる。また、ナノ粒子2には、シリカ、ポリスチレン、酸化チタン等の誘電体によるナノ粒子が用いられる。 Here, the substrate 1 is made of a material such as glass, plastic, quartz, or silicon. The nanoparticles 2 are made of a dielectric material such as silica, polystyrene, titanium oxide, or the like.
また、用いる卑金属の種類により、銀は様々な結晶構造を取る。図1(a)で、卑金属の種類を変えてナノ粒子2上に、他の卑金属層を形成した場合には、硝酸銀溶液5が添加されると、例えば、図1(c)に示されるように、ナノ粒子2上に帽子形状の銀層7aと板状の銀層7bが形成される。 Silver has various crystal structures depending on the type of base metal used. In FIG. 1A, when another base metal layer is formed on the nanoparticles 2 by changing the type of base metal, when the silver nitrate solution 5 is added, for example, as shown in FIG. In addition, a hat-shaped silver layer 7 a and a plate-shaped silver layer 7 b are formed on the nanoparticles 2.
このように、従来の図9(d)に示すナノ粒子蒸着法では、ナノ粒子上に帽子形状の銀層しか得られなかったのに対して、本発明の図1の方法では、帽子形状の銀層に加えて、フィラメント状、板状等の形状の銀層を形成することが可能となり、表面増強分光法に適している様々な形状の銀ナノ構造体の作製が可能となる。 Thus, in the conventional nanoparticle deposition method shown in FIG. 9D, only a hat-shaped silver layer was obtained on the nanoparticles, whereas in the method of FIG. In addition to the silver layer, a silver layer having a filament shape, a plate shape, or the like can be formed, and various shapes of silver nanostructures suitable for surface-enhanced spectroscopy can be produced.
後述するように、卑金属の種類以外にも、卑金属の蒸着厚、粒径等を変えることにより、様々な銀ナノ構造体の作製が可能である。 As will be described later, various silver nanostructures can be produced by changing the base metal deposition thickness, particle size, etc., in addition to the base metal type.
また、従来の図9(a)、(d)と比較した場合、本発明では、蒸着やスパッタリング等の方法により銀を直接ナノ粒子上又は基板上に形成せず、まず、シード又はダミーとなる卑金属層を形成した後、ナノ粒子上に銀を析出させている。このように、従来法とは異なり、貴金属である銀の無駄が顕著に抑制されるので、コストを低減することができる。図9(b)のコロイド吸着法と比較しても、銀の使用量が抑制されるため、コストを低減することができる。 In addition, when compared with the conventional FIGS. 9A and 9D, in the present invention, silver is not directly formed on the nanoparticles or the substrate by a method such as vapor deposition or sputtering, but first becomes a seed or a dummy. After the base metal layer is formed, silver is deposited on the nanoparticles. Thus, unlike the conventional method, the waste of silver, which is a noble metal, is remarkably suppressed, so that the cost can be reduced. Compared with the colloidal adsorption method of FIG. 9B, the amount of silver used is suppressed, so that the cost can be reduced.
図1の説明では、基板上に形成された卑金属のナノ構造体は、真空蒸着又はスパッタリングにより作製されたナノ粒子2上に卑金属層3が形成された構造であったが、例えば、図9(a)〜(c)の方法を用いて基板上に、まず、卑金属のナノ構造体を形成するようにしても良い。この工程の後、卑金属のナノ構造体に硝酸銀溶液を添加して銀ナノ構造体を作製するようにしても良い。 In the description of FIG. 1, the base metal nanostructure formed on the substrate has a structure in which the base metal layer 3 is formed on the nanoparticles 2 produced by vacuum deposition or sputtering. For example, FIG. First, a base metal nanostructure may be formed on a substrate using the methods a) to (c). After this step, a silver nitrate solution may be added to the base metal nanostructure to produce a silver nanostructure.
上記作製例の一つとして、卑金属である銅コロイドを基板の上に吸着して、硝酸銀の処理により銀ナノ構造体を作製する方法も考えられる。しかし、真空蒸着又はスパッタリングにより卑金属のナノ構造体を形成し、最終的に銀ナノ構造体を作製する場合と比較して、銀ナノ粒子作製において制御可能なパラメータの数は極めて限られてしまう。また、ガラス表面を銀鏡反応で処理することによっても銀ナノ粒子が形成されるが、この場合も作製の自由度は極めて限定される。 As one of the above production examples, a method in which a copper colloid that is a base metal is adsorbed on a substrate and a silver nanostructure is produced by treatment with silver nitrate is also conceivable. However, the number of parameters that can be controlled in silver nanoparticle production is extremely limited as compared with the case where a base metal nanostructure is formed by vacuum deposition or sputtering and finally a silver nanostructure is produced. Silver nanoparticles are also formed by treating the glass surface with a silver mirror reaction, but in this case as well, the degree of freedom in production is extremely limited.
ここで、表面増強法において望ましい貴金属ナノ構造は、数nmから数100nm程度の凹凸、コロイド粒子、突起であり、また隣り合う複数の構造体が10nm未満の間隔で配置されていることが好ましい。図2(a)は、平面図を示しており、表面増強効果において望ましいと思われる貴金属ナノ構造体12、13、14、15、16を示す。 Here, desirable noble metal nanostructures in the surface enhancement method are irregularities, colloidal particles, and protrusions of about several nm to several hundred nm, and it is preferable that a plurality of adjacent structures are arranged at intervals of less than 10 nm. FIG. 2 (a) shows a plan view and shows noble metal nanostructures 12, 13, 14, 15, 16 that may be desirable for surface enhancement effects.
この貴金属ナノ構造体12〜16の表面に吸着している蛍光体20からの蛍光信号及びラマン散乱光が増強されると考えられている。図2(b)は、図2(a)の貴金属ナノ構造体12〜16がそれぞれ複数個集まった構造を示しており、貴金属ナノ構造体間に蛍光体20が存在すると、増強率がさらに向上することが期待される。 It is considered that the fluorescence signal and the Raman scattered light from the phosphor 20 adsorbed on the surfaces of the noble metal nanostructures 12 to 16 are enhanced. FIG. 2B shows a structure in which a plurality of the noble metal nanostructures 12 to 16 in FIG. 2A are gathered. When the phosphor 20 is present between the noble metal nanostructures, the enhancement rate is further improved. Is expected to do.
(実施例)
基板1としてスライドガラスを用い、ナノ粒子2としてシリカナノ粒子を用いる。スライドガラスの上にシリカナノ粒子を吸着するために、スライドガラス表面の化学修飾を行う。3−アミノプロピルトリメトキシシランもしくは3−アミノプロピルトリエトキシシラン等のシランカップリング試薬の水溶液を重量比で0.1から10%のものを用意し、スライドガラスを水溶液中に10秒から1分の間浸漬する。次にスライドガラスを精製水で洗浄し乾燥させる。
(Example)
A slide glass is used as the substrate 1, and silica nanoparticles are used as the nanoparticles 2. In order to adsorb the silica nanoparticles on the slide glass, the surface of the slide glass is chemically modified. Prepare an aqueous solution of a silane coupling reagent such as 3-aminopropyltrimethoxysilane or 3-aminopropyltriethoxysilane in a weight ratio of 0.1 to 10%, and place the slide glass in the aqueous solution for 10 seconds to 1 minute. Soak between. Next, the slide glass is washed with purified water and dried.
重量比で0.1〜5%の粒径20nm〜1000nm(20nm以上、1000nm以下)のシリカナノ粒子の懸濁液から精製水に移し、スライドガラス表面から過剰量のシリカナノ粒子を洗い流す。スライドガラスを室温で十分に乾燥させたら、真空蒸着装置内に基板を配置する。 A suspension of silica nanoparticles having a particle size of 20 to 1000 nm (20 nm or more and 1000 nm or less) having a weight ratio of 0.1 to 5% is transferred to purified water, and excess silica nanoparticles are washed away from the surface of the slide glass. When the slide glass is sufficiently dried at room temperature, the substrate is placed in a vacuum deposition apparatus.
卑金属は、貴金属の銀よりもイオン化傾向が大きい。このため、卑金属である銅(Cu)、アルミニウム(Al)、鉄(Fe)、ニッケル(Ni)、クロム(Cr)、チタン(Ti)、亜鉛(Zn)、マンガン(Mn)、鉛(Pb)等を厚さ5nm〜1000nm(5nm以上、1000nm以下)蒸着する。次に、蒸着により帽子形状の卑金属層が形成されたナノ粒子を硝酸銀溶液に浸水する。濃度は、0.01〜0.1モルが適しており、反応時間は30秒から1時間が望ましい。最後に純水に浸漬して反応を終了させる。 Base metals have a greater tendency to ionize than the noble metal silver. For this reason, copper (Cu), aluminum (Al), iron (Fe), nickel (Ni), chromium (Cr), titanium (Ti), zinc (Zn), manganese (Mn), lead (Pb) which are base metals And the like are deposited in a thickness of 5 nm to 1000 nm (5 nm or more and 1000 nm or less). Next, the nanoparticles on which the cap-shaped base metal layer is formed by vapor deposition are immersed in a silver nitrate solution. The concentration is suitably from 0.01 to 0.1 mol, and the reaction time is preferably from 30 seconds to 1 hour. Finally, the reaction is terminated by immersing in pure water.
図3(a)は、ナノ粒子上に形成する卑金属を銅にした場合に、構成される銀ナノ構造体を示すSEM写真である。同様に、図3(b)はナノ粒子上に形成する卑金属をアルミニウムとした場合の銀ナノ構造体を示すSEM写真である。 FIG. 3A is an SEM photograph showing a silver nanostructure formed when the base metal formed on the nanoparticles is copper. Similarly, FIG. 3B is an SEM photograph showing a silver nanostructure when the base metal formed on the nanoparticles is aluminum.
図3(a)及び(b)ともに、ナノ粒子2としてシリカナノ粒子を用い、シリカナノ粒子の粒径は100nm、硝酸銀の濃度は0.1モル、反応時間は30分である。また、図3(a)の場合は卑金属が銅であり、その蒸着厚は30nmである。図3(b)の場合は卑金属がアルミニウムであり、その蒸着厚は20nmである。図3(c)は、卑金属が形成されていないナノ粒子に対して硝酸銀を反応させた場合であり、銀ナノ構造体は形成されておらず、シリカナノ粒子の形状が撮影されているだけである。 3 (a) and 3 (b), silica nanoparticles are used as the nanoparticles 2, the silica nanoparticles have a particle size of 100 nm, a silver nitrate concentration of 0.1 mol, and a reaction time of 30 minutes. In the case of FIG. 3A, the base metal is copper, and the vapor deposition thickness is 30 nm. In the case of FIG.3 (b), a base metal is aluminum and the vapor deposition thickness is 20 nm. FIG.3 (c) is a case where silver nitrate is made to react with the nanoparticle in which a base metal is not formed, the silver nanostructure is not formed, but only the shape of the silica nanoparticle is image | photographed. .
図4のSEM写真は、卑金属の銅の厚さを変えて作製した銀ナノ構造体を示す。シリカナノ粒子の粒径は100nm、硝酸銀の濃度は0.1モル、反応時間は5分である。また、銅の蒸着厚は、図4(a)の場合が10nm、図4(b)の場合が30nm、図4(c)の場合が100nmである。図4(a)〜(c)からわかるように、卑金属の厚みによって、得られた銀ナノ構造が大幅に異なる。 The SEM photograph of FIG. 4 shows silver nanostructures produced by changing the thickness of the base metal copper. The particle diameter of the silica nanoparticles is 100 nm, the concentration of silver nitrate is 0.1 mol, and the reaction time is 5 minutes. Moreover, the vapor deposition thickness of copper is 10 nm in the case of FIG. 4A, 30 nm in the case of FIG. 4B, and 100 nm in the case of FIG. 4C. As can be seen from FIGS. 4A to 4C, the obtained silver nanostructures vary greatly depending on the thickness of the base metal.
図5は、図1(b)、(c)における卑金属と硝酸銀溶液との反応時間を変えて作製した銀ナノ構造体を示す。シリカナノ粒子の粒径は100nm、硝酸銀の濃度は0.1モル、銅の蒸着厚は30nmである。また、反応時間は、図5(a)の場合が5分、図5(b)の場合が10分、図5(c)の場合が60分である。図5(a)〜(c)からわかるように、反応時間は、銀ナノ構造に大きな影響を与えない。 FIG. 5 shows a silver nanostructure produced by changing the reaction time between the base metal and the silver nitrate solution in FIGS. 1 (b) and 1 (c). The particle diameter of the silica nanoparticles is 100 nm, the concentration of silver nitrate is 0.1 mol, and the deposition thickness of copper is 30 nm. Further, the reaction time is 5 minutes in the case of FIG. 5 (a), 10 minutes in the case of FIG. 5 (b), and 60 minutes in the case of FIG. 5 (c). As can be seen from FIGS. 5A to 5C , the reaction time does not significantly affect the silver nanostructure.
また、図6は、シリカナノ粒子を用いた場合(図6(a))と用いない場合(図6(b))の比較を示すSEM写真である。図6(a)は、粒径100nmのシリカナノ粒子上に卑金属としてアルミニウムを蒸着した後、硝酸銀溶液と反応させた。図6(b)は、ガラス基板に厚さ20nmのアルミニウムを直接蒸着した後に、硝酸銀溶液と反応させた。図6(a)で見られる六角形状のナノ構造体は図6(b)では観察することができない。このように、銀ナノ構造体を作製するためには、卑金属で覆われたシリカナノ粒子が有効であることがわかる。 FIG. 6 is an SEM photograph showing a comparison between the case where silica nanoparticles are used (FIG. 6A) and the case where silica nanoparticles are not used (FIG. 6B). In FIG. 6 (a), aluminum was deposited as a base metal on silica nanoparticles having a particle size of 100 nm, and then reacted with a silver nitrate solution. In FIG. 6B, aluminum having a thickness of 20 nm was directly deposited on a glass substrate and then reacted with a silver nitrate solution. The hexagonal nanostructure seen in FIG. 6 (a) cannot be observed in FIG. 6 (b). Thus, it can be seen that silica nanoparticles covered with a base metal are effective for producing silver nanostructures.
次に、これらの銀ナノ構造体を1ミリモルのフルオレセインのエタノール溶液に10分浸漬して、日本板硝子社製の蛍光装置FLE−1000(青色励起)で蛍光強度を測定した結果を図7に示す。 Next, these silver nanostructures were immersed in an ethanol solution of 1 mmol of fluorescein for 10 minutes, and the fluorescence intensity was measured with a fluorescent device FLE-1000 (blue excitation) manufactured by Nippon Sheet Glass Co., Ltd. FIG. .
図7(a)、(b)に示される「金属粒子」は、本発明により作製された銀ナノ構造体よる表面増強分光用基板である。「ガラス」はガラスのみでガラス上には何も形成されていない基板、「粒子」は金属に被覆されていないシリカナノ粒子を用いた基板、「薄膜」は卑金属を直接スライドガラスに蒸着させ硝酸銀反応を行った基板を示す。 The “metal particles” shown in FIGS. 7A and 7B are surface-enhanced spectroscopy substrates made of silver nanostructures produced according to the present invention. "Glass" is a glass-only substrate with nothing formed on it, "particles" is a substrate using silica nanoparticles that are not coated with metal, and "thin film" is a silver nitrate reaction by depositing base metal directly on a slide glass The board | substrate which performed is shown.
また、図7(a)、(b)ともに、それぞれシリカナノ粒子の粒径を100nm,粒径200nmと変化させて蛍光強度を測定した。図7の白抜きの棒グラフが粒径100nmを、右肩上がりの斜線が粒径200nmを示す。また、図7(a)では卑金属として銅を用い、厚さ20nmの銅を蒸着し、図7(b)では卑金属としてアルミニウムを用い、厚さ20nmのアルミニウムを蒸着して蛍光強度の測定を行った。図7(a)及び(b)ともに、縦軸は蛍光強度(任意単位)を示す。 7A and 7B, the fluorescence intensity was measured by changing the particle diameter of the silica nanoparticles to 100 nm and 200 nm, respectively. A white bar graph in FIG. 7 indicates a particle size of 100 nm, and a diagonal line rising to the right indicates a particle size of 200 nm. In FIG. 7A, copper is used as the base metal and 20 nm thick copper is vapor-deposited. In FIG. 7B, aluminum is used as the base metal and aluminum 20 nm thick is vapor-deposited to measure fluorescence intensity. It was. In both FIGS. 7A and 7B, the vertical axis indicates the fluorescence intensity (arbitrary unit).
図7(a)及び(b)ともに、シリカナノ粒子上に銀層が形成された銀ナノ構造体を有する「金属粒子」からの蛍光信号強度が最も強いことがわかる。すなわち、本発明の表面増強分光用基板の製造方法により作製された表面増強分光用基板の増強率が最も優れていることがわかる。 7A and 7B show that the fluorescence signal intensity from the “metal particle” having the silver nanostructure in which the silver layer is formed on the silica nanoparticle is strongest. That is, it can be seen that the enhancement factor of the surface-enhanced spectroscopic substrate produced by the method for producing a surface-enhanced spectroscopic substrate of the present invention is the best.
図8は、シリカナノ粒子上に蒸着される卑金属の種類を銅、アルミニウム、鉄と変化させ、それぞれの種類の卑金属の蒸着厚を変え、シリカナノ粒子の粒径も変化させた場合の蛍光強度測定結果を示す。図8(a)〜(c)の縦軸は蛍光強度を示す。 FIG. 8 shows the results of fluorescence intensity measurement when the type of base metal deposited on silica nanoparticles is changed to copper, aluminum, and iron, the deposition thickness of each type of base metal is changed, and the particle size of silica nanoparticles is also changed. Indicates. The vertical axis | shaft of Fig.8 (a)-(c) shows a fluorescence intensity.
図8(a)、(b)、(c)ともに、白抜きの棒グラフは卑金属が銅の場合を、右肩上がりの斜線の棒グラフは卑金属がアルミニウムの場合を、左肩上がりの斜線の棒グラフは卑金属が鉄の場合を示す。また、シリカナノ粒子の粒径を変えて測定しており、粒径100nm及び粒径200nmはそれぞれシリカナノ粒子の粒径を示す。 8 (a), (b), and (c), the open bar graph indicates the case where the base metal is copper, the slanted bar graph that rises to the right indicates that the base metal is aluminum, and the slanted bar graph that increases the left shoulder indicates the base metal. Shows the case where is iron. Moreover, the particle diameter of the silica nanoparticle is changed and measured, and the particle diameter of 100 nm and the particle diameter of 200 nm indicate the particle diameter of the silica nanoparticle.
さらに、図8(a)は、銅、アルミニウム、鉄のそれぞれの卑金属の蒸着厚が10nmの場合を、図8(b)は、それぞれの卑金属の蒸着厚が20nmの場合を、図8(c)は、それぞれの卑金属の蒸着厚が40nmの場合を示している。 Further, FIG. 8A shows the case where the deposition thickness of each base metal of copper, aluminum and iron is 10 nm, and FIG. 8B shows the case where the deposition thickness of each base metal is 20 nm. ) Shows the case where the deposition thickness of each base metal is 40 nm.
図8からわかるように、蒸着厚が20nm以下の場合は、卑金属としてアルミニウムが最も効果的であるが、蒸着厚が40nmの場合には銅もアルミニウムと同様に効果的である。一方、卑金属として鉄を用いた場合は、その蒸着厚やシリカナノ粒子の粒径にかかわらず、蛍光強度が低い状態となっており、銅やアルミニウムと比較して効果が劣ることがわかる。 As can be seen from FIG. 8, aluminum is the most effective base metal when the deposition thickness is 20 nm or less, but copper is as effective as aluminum when the deposition thickness is 40 nm. On the other hand, when iron is used as the base metal, the fluorescence intensity is low regardless of the deposition thickness or the particle size of the silica nanoparticles, and it is understood that the effect is inferior compared to copper or aluminum.
本発明の表面増強分光用基板の製造方法に係る表面増強分光用基板は、ラマン分光法、赤外分光法等の分光分析方法に幅広く適用することができ、例えば、臨床検査、環境モニタリング、品質管理等の分野に適用することができる。 The surface-enhanced spectroscopic substrate according to the method for producing a surface-enhanced spectroscopic substrate of the present invention can be widely applied to spectroscopic analysis methods such as Raman spectroscopy and infrared spectroscopy, for example, clinical examination, environmental monitoring, quality It can be applied to fields such as management.
1 基板
2 ナノ粒子
3 卑金属層
4 卑金属粒子
5 硝酸銀溶液
6a 銀層
6b 銀層
7a 銀層
7b 銀層
10 銀ナノ構造体
11 銀ナノ構造体
DESCRIPTION OF SYMBOLS 1 Substrate 2 Nanoparticle 3 Base metal layer 4 Base metal particle 5 Silver nitrate solution 6a Silver layer 6b Silver layer 7a Silver layer 7b Silver layer 10 Silver nanostructure 11 Silver nanostructure
Claims (5)
前記卑金属のナノ構造体に硝酸銀溶液を加えて、銀よりもイオン化傾向の高い卑金属を硝酸銀溶液中に溶け出させるとともに銀を前記ナノ粒子の表面に析出させることで卑金属を完全に銀に置換することで、前記誘電体が前記基板上に接触している銀ナノ構造体を形成する工程と、
を備えたことを特徴とする表面増強分光用基板の製造方法。 A base metal nanostructure comprising a nanoparticle having a uniform particle diameter made of a dielectric material and solidified on a substrate and in contact with the substrate, and a base metal layer formed on the nanoparticle , Forming on top;
A silver nitrate solution is added to the base metal nanostructure so that the base metal having a higher ionization tendency than silver is dissolved in the silver nitrate solution and silver is deposited on the surface of the nanoparticles to completely replace the base metal with silver. Forming a silver nanostructure in which the dielectric is in contact with the substrate;
A method for producing a surface-enhanced spectroscopic substrate, comprising:
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