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JP6339361B2 - Copper alloy sheet and manufacturing method thereof - Google Patents

Copper alloy sheet and manufacturing method thereof Download PDF

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JP6339361B2
JP6339361B2 JP2013264422A JP2013264422A JP6339361B2 JP 6339361 B2 JP6339361 B2 JP 6339361B2 JP 2013264422 A JP2013264422 A JP 2013264422A JP 2013264422 A JP2013264422 A JP 2013264422A JP 6339361 B2 JP6339361 B2 JP 6339361B2
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岳己 磯松
岳己 磯松
洋 金子
洋 金子
清慈 廣瀬
清慈 廣瀬
立彦 江口
立彦 江口
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Furukawa Electric Co Ltd
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Description

本発明は、電気・電子機器用のリードフレーム、コネクタ、端子材等、自動車車載用などのコネクタや、その他の端子材、リレー、スイッチ、ソケットなどに適用される銅合金板材およびその製造方法に関する。   The present invention relates to a lead frame, a connector, a terminal material, etc. for electrical and electronic equipment, a connector for automobile use, and other terminal materials, a copper alloy plate material applied to a relay, a switch, a socket, and the like, and a method for manufacturing the same. .

電気・電子機器用途に使用される銅合金板材に要求される特性項目は、導電率、耐力(降伏応力)、引張強度、曲げ加工性、耐疲労特性、耐応力緩和特性、ヤング率などがある。近年、電気・電子機器の小型化、軽量化、高機能化、高密度実装化や、使用環境の高温化に伴って、これらの要求特性が高まっている。   Properties required for copper alloy sheets used in electrical and electronic equipment include conductivity, yield strength (yield stress), tensile strength, bending workability, fatigue resistance, stress relaxation characteristics, Young's modulus, etc. . In recent years, with the miniaturization, weight reduction, high functionality, high density mounting, and high usage environment of electric / electronic devices, these required characteristics are increasing.

特に、近年の超小型端子では、これまで以上の小さなスペースで大きな、もしくは一定の変位をとることが求められるため、これまで以上に低いヤング率を有する材料が求められている。   Particularly, in recent ultra-small terminals, it is required to take a large or constant displacement in a smaller space than before, and therefore, a material having a lower Young's modulus than ever is required.

従来、電気・電子機器用材料としては、鉄系材料の他、リン青銅、丹銅、黄銅等の銅系材料が広く用いられている。これらの銅合金は、SnやZnの固溶強化と、圧延や線引きなどの冷間加工による加工硬化の組み合わせによって強度を向上させている。しかし、この方法で強化した銅合金材料では、導電率が不十分となりがちである。また、高い加工率で冷間圧延などの加工を施すことによって高強度を得ているために、曲げ加工性が不十分な場合があった。   Conventionally, as materials for electric and electronic devices, copper-based materials such as phosphor bronze, red brass, brass and the like are widely used in addition to iron-based materials. These copper alloys have improved strength by a combination of solid solution strengthening of Sn and Zn and work hardening by cold working such as rolling and wire drawing. However, the copper alloy material reinforced by this method tends to have insufficient electrical conductivity. Moreover, since high strength is obtained by performing processing such as cold rolling at a high processing rate, bending workability may be insufficient.

そこで、固溶強化や加工硬化に替わる強化法として、銅合金中に微細な第二相を析出させる析出強化がある。この強化方法は強度が高くなることに加えて、導電率を同時に向上させるメリットがあるため、多くの合金系で行われている。   Therefore, as a strengthening method replacing solid solution strengthening or work hardening, there is precipitation strengthening in which a fine second phase is precipitated in the copper alloy. This strengthening method has a merit of improving the conductivity at the same time in addition to increasing the strength, and is therefore performed in many alloy systems.

このような中で、電気・電子機器用途としては、Cu−Ni−Si系合金(コルソン系合金)が用いられている。Cu−Ni−Si系合金は、主に析出強化や加工硬化によって強化される合金である。よって、Cu−Ni−Si系合金において、ヤング率の制御や、耐応力緩和特性と耐疲労特性の向上が求められている。   Under such circumstances, Cu—Ni—Si based alloys (Corson based alloys) are used for electrical and electronic equipment. Cu-Ni-Si-based alloys are alloys that are strengthened mainly by precipitation strengthening or work hardening. Therefore, in a Cu-Ni-Si alloy, control of Young's modulus and improvement in stress relaxation resistance and fatigue resistance are required.

しかし、昨今の電気・電子機器や自動車に使用される部品の小型化に伴って、使用される銅合金板材は、より高強度な材料により小さい半径で曲げ加工が施されるようになっており、耐力に優れた銅合金板材が強く要求されている。さらに、小さいスペースにて一定のバネ性及びへたりにくさが求められるため、一定変位で信頼性の高い接圧を発揮するためには、材料に対して低いヤング率が強く要求されている。この点、従来のCu−Ni−Si系合金においては、圧延加工率を高めて大きな加工硬化を得ることで高い強度を得ていた。しかし、この方法では、ヤング率の制御が困難であり、所望のヤング率特性が得られなかった。   However, with the recent miniaturization of parts used in electrical and electronic equipment and automobiles, the copper alloy sheet used has been bent to a higher strength material with a smaller radius. Therefore, there is a strong demand for copper alloy sheet materials having excellent proof stress. Furthermore, since a certain spring property and sag resistance are required in a small space, a low Young's modulus is strongly required for the material in order to exert a reliable contact pressure with a constant displacement. In this regard, in the conventional Cu—Ni—Si-based alloy, high strength was obtained by increasing the rolling rate and obtaining large work hardening. However, with this method, it is difficult to control the Young's modulus, and the desired Young's modulus characteristics cannot be obtained.

また、コネクタなどの電子部品の小型化の進行に伴い、端子の寸法精度やプレス加工の公差が厳しく要求されるようになっている。銅合金板材のヤング率を低減することで、コンタクト接圧に及ぼす寸法変動の影響を低減出来るため、部品の設計が容易となる。このため、銅合金部品には、ヤング率(縦弾性係数)が低いことが求められ、ヤング率が125GPa以下、たわみ係数が115GPa以下の銅合金板材が求められている。   In addition, with the progress of miniaturization of electronic components such as connectors, dimensional accuracy of terminals and tolerances for press working have been strictly demanded. By reducing the Young's modulus of the copper alloy sheet, it is possible to reduce the influence of dimensional fluctuations on the contact contact pressure, which facilitates component design. For this reason, copper alloy parts are required to have a low Young's modulus (longitudinal elastic modulus), and a copper alloy sheet material having a Young's modulus of 125 GPa or less and a deflection coefficient of 115 GPa or less is required.

さらに、大電流コネクタなどでは、部材に電流が流れることにより発生するジュール熱によって、材料自体が自己発熱し、応力緩和する問題がある。この使用中の『へたり』によって、初期の接圧を維持できない問題も挙げられる。よって、材料が耐応力緩和特性に優れることが求められている。   Further, in a high current connector or the like, there is a problem that the material itself self-heats due to Joule heat generated by current flowing through the member, and stress is relieved. There is also a problem that the initial contact pressure cannot be maintained due to the “sag” during use. Therefore, the material is required to have excellent stress relaxation resistance.

また、電子機器や自動車に使用される部品として用いられる場合、使用状況により振動が加わり、材料に繰り返しの応力が付与される。材料に一定の負荷応力を負荷し続けていると、板材にき裂が発生し、破断に至ってしまう。従って、材料が耐疲労特性に優れていることが求められる。   In addition, when used as a part used in an electronic device or an automobile, vibration is applied depending on the use situation, and repeated stress is applied to the material. If a constant load stress is continuously applied to the material, a crack is generated in the plate material, leading to a break. Therefore, the material is required to have excellent fatigue resistance.

この、圧延板の幅方向(TD;Transversal Direction)の低ヤング率、耐応力緩和特性、耐疲労特性の向上の要求に対して、合金材料の結晶方位の制御によって解決する提案がいくつかなされている。例えば、特許文献1、2では、合金中の集合組織のCube方位のX線回折強度やCube方位結晶粒の面積率を制御することによって、0.2%耐力、耐応力緩和特性や曲げ加工性を改善している。特許文献3では、板材縦断面の全結晶粒の扁平率を制御することで、強度異方性を改善している。特許文献4では、Cube方位を高め、NDRDW方位を低減することで、圧延垂直方向のたわみ係数を低下させている。   Several proposals have been made to solve this demand for improvement in low Young's modulus, stress relaxation resistance, and fatigue resistance in the width direction (TD) of the rolled sheet by controlling the crystal orientation of the alloy material. Yes. For example, in Patent Documents 1 and 2, by controlling the X-ray diffraction intensity of the Cube orientation of the texture in the alloy and the area ratio of the Cube orientation crystal grains, 0.2% proof stress, stress relaxation resistance and bending workability are controlled. Has improved. In Patent Document 3, strength anisotropy is improved by controlling the flatness of all crystal grains in the longitudinal section of the plate material. In Patent Document 4, the deflection coefficient in the vertical direction of rolling is lowered by increasing the Cube orientation and reducing the NDRDW orientation.

特許文献1に記載された技術においては、Ni−Si系の析出物の平均粒子径と、I{200}結晶面のX線回折ピーク強度とを一定以上に高めている。また、結晶粒内の双晶密度を高めることによって、0.2%耐力、曲げ加工性、耐応力緩和特性を改善しているが、ヤング率特性についての改善はなされていない。また、特許文献1に記載の製造方法では、TDに向く(100)面を集積させる為、ヤング率が低くなることが推測されるが、実際にどのようなヤング率となるかについての記載はない。   In the technique described in Patent Document 1, the average particle diameter of Ni—Si-based precipitates and the X-ray diffraction peak intensity of the I {200} crystal plane are increased above a certain level. Further, by increasing the twin density in the crystal grains, the 0.2% proof stress, bending workability, and stress relaxation resistance are improved, but the Young's modulus characteristics are not improved. In addition, in the manufacturing method described in Patent Document 1, it is presumed that the Young's modulus decreases because the (100) planes facing TD are accumulated. However, there is no description of what Young's modulus actually becomes. Absent.

特許文献2に記載された技術においては、集合組織制御によって結晶内のCube方位面積率及び双晶境界密度を高めることで、導電率、0.2%耐力、曲げ加工性と耐応力緩和特性を改善しているが、ヤング率の制御はされておらず、特性改善の効果が限定されている。   In the technique described in Patent Document 2, conductivity, 0.2% proof stress, bending workability and stress relaxation resistance are improved by increasing the Cube orientation area ratio and twin boundary density in the crystal by texture control. Although improved, Young's modulus is not controlled, and the effect of improving characteristics is limited.

特許文献3に記載された技術においては、板材縦断面の組織観察から、全結晶粒の扁平率の制御によって強度異方性を改善しているものの、その強度は700MPa以上であって上限でも820MPaと依然低く、ヤング率の制御もされていない。   In the technique described in Patent Document 3, although the strength anisotropy is improved by controlling the flatness of all crystal grains from the observation of the structure of the longitudinal section of the plate material, the strength is 700 MPa or more, and the upper limit is 820 MPa. Still, the Young's modulus is not controlled.

特許文献4に記載された技術においては、集合組織の制御により、圧延垂直方向のたわみ係数を制御しているが、特定の結晶面を配向させる集合組織制の制御であり、本発明で得られる金属組織とは大きく異なっている。   In the technique described in Patent Document 4, the deflection coefficient in the vertical direction of rolling is controlled by controlling the texture. However, this is control of the texture system that orients a specific crystal plane, and is obtained by the present invention. It is very different from the metal structure.

また、非特許文献1は、母相と第二相から構成される材料の平均的なヤング率を示している。   Non-Patent Document 1 shows an average Young's modulus of a material composed of a parent phase and a second phase.

なお、ヤング率の測定には、引張試験による応力−ひずみ線図の弾性領域の傾きから算出する方法、梁(片持ち梁)をたわませた際の応力−ひずみ線図の弾性領域の傾きから算出する方法の2つの方法がある。   The Young's modulus is measured by a method of calculating from the slope of the elastic region of the stress-strain diagram by the tensile test, the slope of the elastic region of the stress-strain diagram when the beam (cantilever) is bent. There are two methods of calculating from the above.

さらに、銅合金板材のヤング率については、特許文献5及び特許文献6にも記載がある。
特許文献5には、例えば、圧延方向(RD)に向くCube方位(100)面の面積率を30%以上と制御することによって、ヤング率が110GPa以下と小さい銅合金板材が記載されている。しかし、この特許文献5は、ヤング率を低下することを課題とするものではあるが、TD方向のヤング率に着目してこれを低く制御することについては記載がない。
Furthermore, the Young's modulus of the copper alloy sheet is also described in Patent Document 5 and Patent Document 6.
Patent Document 5 describes a copper alloy sheet material having a small Young's modulus of 110 GPa or less, for example, by controlling the area ratio of the Cube orientation (100) plane facing the rolling direction (RD) to 30% or more. However, although this patent document 5 makes it a subject to reduce a Young's modulus, it does not describe focusing on the Young's modulus of a TD direction and controlling this low.

また、特許文献6には、時効処理時に銅合金中の結晶粒界近傍に所定の幅で無析出帯(PFZ)を形成し、圧延平行方向の引張強度(TS(LD))、Ni含有量、母材の平均結晶粒径、無析出帯(PFZ)の幅、及び結晶粒界上の化合物の粒子径が所定の関係を満たすように制御することによって、その実施例にはヤング率が130GPaである銅合金板材が記載されている。しかし、この特許文献6は、TD方向のヤング率については言及がなく、TD方向のヤング率に着目してこれを低く制御することについては記載がない。   Patent Document 6 discloses that a precipitation-free zone (PFZ) having a predetermined width is formed in the vicinity of a grain boundary in a copper alloy at the time of aging treatment, tensile strength (TS (LD)) in the rolling parallel direction, and Ni content. By controlling the average crystal grain size of the base material, the width of the precipitation-free zone (PFZ), and the particle diameter of the compound on the grain boundary to satisfy a predetermined relationship, the Young's modulus is 130 GPa in the embodiment. A copper alloy sheet is described. However, this Patent Document 6 does not mention the Young's modulus in the TD direction, and does not describe controlling the Young's modulus in the TD direction to be low.

特開2011−84764号公報JP 2011-84764 A 特開2011−231393号公報JP 2011-231393 A 特開2011−17070号公報JP 2011-17070 A 特許第5117602号公報Japanese Patent No. 5117602 国際公開WO2011/068134A1号公報International Publication WO2011 / 068134A1 国際公開WO2009/104615A1号公報International Publication WO2009 / 104615A1

尾中ら:日本金属学会誌 Vol.63,No.10(1999),pp 1283−1289Onaka et al .: Journal of the Japan Institute of Metals, Vol. 63, no. 10 (1999), pp 1283-1289

このように、従来、TD方向のヤング率を低く制御した銅合金板材は知られておらず、その提供が要求されていた。
上記のような課題に鑑み、本発明の目的は、TD方向のヤング率が低く、かつ、TD方向に高い耐力を有し、耐疲労特性に優れた、電気・電子機器用のリードフレーム、コネクタ、端子材等、自動車車載用などのコネクタや、その他の端子材、リレー、スイッチ、ソケットなどに適した銅合金板材を提供することにある。
Thus, conventionally, a copper alloy sheet material in which the Young's modulus in the TD direction is controlled to be low has not been known, and the provision thereof has been required.
In view of the problems as described above, an object of the present invention is to provide a lead frame and a connector for electrical and electronic equipment that have a low Young's modulus in the TD direction, a high proof stress in the TD direction, and excellent fatigue resistance. It is intended to provide a copper alloy plate material suitable for connectors for automobiles, other terminal materials, other terminal materials, relays, switches, sockets, and the like.

本発明者らは、種々の検討を重ね、電気・電子部品用途に適した銅合金板材について研究を行った。その結果、本発明者らは、Cu−Ni−Si系の銅合金板材において、所定の方向を向いたアスペクト比0.3以下の扁平な結晶粒の密度と、さらに、隣接する結晶粒間のずれ角が30°以上である結晶粒界の単位面積あたりの長さとを適正に制御した金属組織とすることによって、圧延垂直方向(TD)のヤング率を低く制御することができることを見出した。また、本発明者らは、上記所定の金属組織を実現するための特定の工程を有してなる銅合金板材の製造方法を見出した。本発明は、これらの知見に基づき完成するに至ったものである。   The present inventors have made various studies and studied a copper alloy sheet suitable for electric / electronic component applications. As a result, the present inventors, in the Cu-Ni-Si-based copper alloy plate material, the density of flat crystal grains having an aspect ratio of 0.3 or less oriented in a predetermined direction, and further, between adjacent crystal grains It has been found that the Young's modulus in the vertical direction of rolling (TD) can be controlled to be low by using a metal structure in which the length per unit area of the crystal grain boundary having a deviation angle of 30 ° or more is appropriately controlled. In addition, the present inventors have found a method for producing a copper alloy plate material having a specific process for realizing the predetermined metal structure. The present invention has been completed based on these findings.

すなわち、本発明によれば、以下の手段が提供される。
(1)Niを1.0〜5.0質量%、Siを0.1〜2.0質量%、並びにBを0.10質量%以下、Mgを1.80質量%以下、Pを0.05質量%以下、Crを0.50質量%以下、Mnを0.16質量%以下、Feを0.05質量%以下、Coを0.05質量%以下、Znを0.51質量%以下、Zrを0.10質量%以下、Agを0.05質量%以下及びSnを0.50質量%以下からなる群から選ばれる少なくとも1種を合計で0.10〜3.0質量%含有し、残部が銅及び不可避不純物からなる銅合金板材であって、
圧延面における解析で、結晶粒の短径/長径の比で表わされるアスペクト比が0.3以下の結晶粒であり、かつ、TD方向から±30°以内を向いた結晶粒について、前記結晶粒の密度が0.030個/μm以下であり、かつ、隣接する結晶粒間のずれ角が30°以上である結晶粒界の単位面積あたりの長さが0.8μm/μm以下であることを特徴とする銅合金板材
(2)板材に一定の応力を加えた際の変位量を示す、引張試験で測定した、TD方向のヤング率が125GPa以下であり、たわみ試験で測定したTD方向のたわみ係数が115GPa以下、TD方向の耐力が600MPa以上であり、導電率が20%IACS以上であり、かつ、耐応力緩和特性として150℃で1000時間保持後の応力緩和率(SR)が20%以下である(1)に記載の銅合金板材。
)板バネ疲労試験による耐疲労特性が、負荷応力500MPa以上で、繰り返し回数が10回以上である(1)又は2)に記載の銅合金板材。
)Niを1.0〜5.0質量%、Siを0.1〜2.0質量%、並びにBを0.10質量%以下、Mgを1.80質量%以下、Pを0.05質量%以下、Crを0.50質量%以下、Mnを0.16質量%以下、Feを0.05質量%以下、Coを0.05質量%以下、Znを0.51質量%以下、Zrを0.10質量%以下、Agを0.05質量%以下及びSnを0.50質量%以下からなる群から選ばれる少なくとも1種を合計で0.1〜3.0質量%含有し、残部が銅及び不可避不純物からなる銅合金板材を製造する方法であって、前記銅合金板材を与える合金成分組成から成る銅合金素材に、
鋳造[工程1]、
加工率10%以下の冷間圧延1[工程2]、
保持温度300〜700℃で保持時間1分〜5時間の予備焼鈍[工程3]、
保持温度700℃以上で5分〜20時間の均質化熱処理[工程4]、
熱間圧延[工程5]、
水焼入れ[工程6]、
面削[工程7]、
50%以上の加工率の冷間圧延2[工程8]、
昇温速度5〜15℃/秒、保持温度300〜700℃、保持時間1秒〜10時間の中間溶体化熱処理[工程9]、
10〜99%の加工率の冷間圧延3[工程10]、
到達温度700〜1020℃、保持時間1秒〜60秒の溶体化熱処理[工程11]、
保持温度300〜600℃、保持時間10分〜20時間の時効析出熱処理[工程12]、
酸洗[工程13]、及び
圧延加工率8〜80%の仕上げ冷間圧延[工程14]
の各工程をこの順に施すことを特徴とする(1)〜()のいずれか1項に記載の銅合金板材を製造する方法
(5)前記仕上げ冷間圧延[工程14]の後で、保持温度300〜600℃、保持時間1秒〜60秒の歪取り焼鈍[工程15]を施す(4)に記載の銅合金板材の製造方法。
That is, according to the present invention, the following means are provided.
(1) Ni is 1.0 to 5.0 mass%, Si is 0.1 to 2.0 mass%, B is 0.10 mass% or less, Mg is 1.80 mass% or less, and P is 0.00. 05 mass% or less, Cr 0.50 mass% or less, Mn 0.16 mass% or less, Fe 0.05 mass% or less, Co 0.05 mass% or less, Zn 0.51 mass% or less, Zr 0.10 wt% or less, at least one selected from 0.05 wt% or less and Sn and Ag from the group consisting of 0.50 wt% or less to 0.1 0 to 3.0 wt% in total The balance is a copper alloy sheet made of copper and inevitable impurities,
In the analysis on the rolling surface, the crystal grains having an aspect ratio represented by the ratio of the minor axis / major axis of the crystal grains of 0.3 or less and oriented within ± 30 ° from the TD direction and a density of 0.030 cells / [mu] m 2 or less, and the length per unit area of the displacement angle between adjacent crystal grains is 30 ° or more grain boundaries is 0.8 [mu] m / [mu] m 2 or less A copper alloy sheet characterized by the above .
(2 ) The Young's modulus in the TD direction measured by a tensile test, which indicates the amount of displacement when a certain stress is applied to the plate material, is 125 GPa or less, the deflection coefficient in the TD direction measured by the deflection test is 115 GPa or less, TD The proof stress in the direction is 600 MPa or more, the electrical conductivity is 20% IACS or more, and the stress relaxation rate (SR) after holding at 150 ° C. for 1000 hours is 20% or less as stress relaxation characteristics (1 ) The copper alloy sheet material described.
(3) fatigue resistance of the leaf spring fatigue test, the load stress 500MPa or more, the copper alloy sheet according to the repeat count is not less than 10 6 times (1) or (2).
( 4 ) Ni is 1.0 to 5.0 mass%, Si is 0.1 to 2.0 mass%, B is 0.10 mass% or less, Mg is 1.80 mass% or less, and P is 0.00. 05 mass% or less, Cr 0.50 mass% or less, Mn 0.16 mass% or less, Fe 0.05 mass% or less, Co 0.05 mass% or less, Zn 0.51 mass% or less, Containing at least one selected from the group consisting of 0.10 mass% or less of Zr, 0.05 mass% or less of Ag, and 0.50 mass% or less of Sn in a total of 0.1 to 3.0 mass%, A method for producing a copper alloy sheet comprising copper and inevitable impurities, the copper alloy material comprising an alloy component composition giving the copper alloy sheet,
Casting [process 1],
Cold rolling 1 with a processing rate of 10% or less [Step 2],
Pre-annealing at a holding temperature of 300 to 700 ° C. and a holding time of 1 minute to 5 hours [Step 3],
Homogenization heat treatment at a holding temperature of 700 ° C. or higher for 5 minutes to 20 hours [Step 4],
Hot rolling [step 5],
Water quenching [Step 6],
Chamfering [process 7],
Cold rolling 2 with a processing rate of 50% or more [Step 8],
Intermediate solution heat treatment [Step 9] with a temperature rising rate of 5 to 15 ° C./second, a holding temperature of 300 to 700 ° C., and a holding time of 1 second to 10 hours,
Cold rolling 3 [Process 10] with a processing rate of 10 to 99%,
Solution heat treatment [step 11] having an ultimate temperature of 700 to 1020 ° C. and a holding time of 1 second to 60 seconds,
Aging precipitation heat treatment [Step 12] with a holding temperature of 300 to 600 ° C. and a holding time of 10 minutes to 20 hours,
Pickling [Step 13] and finish cold rolling with a rolling rate of 8 to 80% [Step 14]
The method of manufacturing the copper alloy sheet | seat of any one of (1)-( 3 ) characterized by performing each process of these in this order .
(5) In the following the finish cold rolling [step 14], holding temperature 300 to 600 ° C., the retention time stress relief annealing of 1 to 60 seconds [Step 15] subjecting (4) of the copper alloy sheet according to Production method.

本発明の銅合金板材は、所定の合金組成を有し、アスペクト比が0.3以下の結晶粒であり、その長軸がTD方向から±30°以内を向いた結晶粒の密度が0.3個/μm以下であり、かつ、隣接する結晶粒間のずれ角が30°以上である結晶粒界の単位面積あたりの長さが0.8μm/μm以下である金属組織を有することによって、TD方向のヤング率が低く、TD方向の耐力が高く、耐疲労特性に優れ、電気・電子機器や自動車車載用部品などの用途に好適なものである。この本発明の銅合金板材は、電気・電子機器用のリードフレーム、コネクタ、端子材等、自動車車載用などのコネクタや、その他の端子材、リレー、スイッチ、ソケットなどに特に適した性質を有する。また、本発明の製造方法によれば、上記銅合金板材を好適に製造することができる。 The copper alloy sheet of the present invention is a crystal grain having a predetermined alloy composition and an aspect ratio of 0.3 or less, and the density of crystal grains whose major axis is within ± 30 ° from the TD direction is 0. 3 / μm 2 or less, and the deviation angle between adjacent crystal grains is 30 ° or more, and the length per unit area of the crystal grain boundary is 0.8 μm / μm 2 or less. Therefore, the Young's modulus in the TD direction is low, the yield strength in the TD direction is high, the fatigue resistance is excellent, and it is suitable for applications such as electric / electronic devices and automotive parts. This copper alloy plate material of the present invention has properties particularly suitable for lead frames, connectors, terminal materials, etc. for automobiles, automobile terminals, other terminal materials, relays, switches, sockets, etc. . Moreover, according to the manufacturing method of this invention, the said copper alloy board | plate material can be manufactured suitably.

図1は、母相Mに対してそれぞれ第二相Ωを有する複相材料を模式的に示す説明図である。図1(A)にType Aとして示した複相材料は、母相Mに対して、第二相Ωの形状が、図中に上下方向の矢印で示した応力軸に垂直な板状である場合を示す。一方、図1(B)にType Bとして示した複相材料は、母相Mに対して、第二相Ωの形状が、図中に上下方向の矢印で示した応力軸に平行な連続繊維状である場合を示す。FIG. 1 is an explanatory diagram schematically showing a multiphase material having a second phase Ω with respect to the mother phase M, respectively. In the multiphase material shown as Type A in FIG. 1A, the shape of the second phase Ω with respect to the parent phase M is a plate shape perpendicular to the stress axis indicated by the up and down arrows in the figure. Show the case. On the other hand, the multiphase material shown as Type B in FIG. 1B is a continuous fiber in which the shape of the second phase Ω is parallel to the stress axis indicated by the up and down arrows in the figure with respect to the matrix M. Is shown. 図2は、圧延方向(RD)と垂直な方向(TD)に結晶粒の向きが揃うように結晶粒を制御した様子を模式的に示す説明図である。図2(A)は、結晶粒の配向制御前のランダムな状態であり、図2(B)は、結晶粒の向きが揃った状態である。FIG. 2 is an explanatory view schematically showing a state in which the crystal grains are controlled so that the crystal grains are aligned in a direction (TD) perpendicular to the rolling direction (RD). FIG. 2A shows a random state before the orientation control of crystal grains, and FIG. 2B shows a state in which the orientations of crystal grains are aligned. 図3は、実施例で用いた板バネ疲労試験装置を模式的に示す説明図である。FIG. 3 is an explanatory view schematically showing the leaf spring fatigue test apparatus used in the examples. 図4は、実施例で用いた耐応力緩和特性試験装置を模式的に示す説明図である。FIG. 4 is an explanatory view schematically showing the stress relaxation resistance test apparatus used in the examples.

本発明の銅合金板材の好ましい実施の態様について、詳細に説明する。なお、本発明における「板材」には、「条材」も含むものとする。   A preferred embodiment of the copper alloy sheet material of the present invention will be described in detail. The “plate material” in the present invention includes “strip material”.

[アスペクト比0.3以下の扁平粒の配向を制御した金属組織]
銅合金板材のTD方向(Transverse Direction。本書において、圧延垂直方向、又は単にTDともいう。)のヤング率を低下させるために、本発明者らはヤング率制御と組織の相関について詳細に調査した。その結果、板材ND方向から組織観察した際に、つまり圧延面を観察・解析した場合に、前記アスペクト比が0.3以下の比較的扁平な結晶粒の配向を制御するとともにその結晶粒の密度を低く制御することによって、TD方向のヤング率を低く制御することができることがわかった。詳細には、母相の結晶粒の長径がTD方向に向いて配列した扁平粒の密度を低く制御するとともに、粒界のずれ角が30°以上と大きい結晶粒界の単位面積あたりの長さを小さく制御することによって、TD方向のヤング率を低く制御することができることがわかった。ここで、結晶粒の長径がTD方向に向いて配列するとは、本発明で規定するところのアスペクト比が0.3以下の結晶粒がTD方向から±30°以内を向いた状態であることをいう(例えば図2(B))。
[Metal structure with controlled orientation of flat grains with aspect ratio of 0.3 or less]
In order to lower the Young's modulus of the copper alloy sheet material in the TD direction (Transverse Direction. In this document, the vertical direction of rolling, or simply referred to as TD), the present inventors investigated in detail the correlation between the Young's modulus control and the structure. . As a result, when the structure is observed from the direction of the plate ND, that is, when the rolled surface is observed and analyzed, the orientation of the relatively flat crystal grains having an aspect ratio of 0.3 or less is controlled and the density of the crystal grains is controlled. It was found that the Young's modulus in the TD direction can be controlled to be low by controlling the value low. Specifically, while controlling the density of the flat grains arranged so that the major axis of the crystal grains of the parent phase is oriented in the TD direction, the length per unit area of the grain boundaries having a large grain boundary deviation angle of 30 ° or more. It was found that the Young's modulus in the TD direction can be controlled to be low by controlling the value small. Here, the arrangement of the major axis of crystal grains in the TD direction means that crystal grains having an aspect ratio of 0.3 or less as defined in the present invention are within ± 30 ° from the TD direction. (For example, FIG. 2B).

本発明の銅合金板材においては、その金属組織について、圧延面における解析で、アスペクト比が0.3以下の結晶粒であり、TDから±30°以内を向いた結晶粒の密度を0.030個/μm以下とし、かつ、隣接する結晶粒間での結晶粒界のずれ角が30°以上である結晶粒界の単位面積あたりの長さを0.8μm/μm以下とする。以下、本書において、前記アスペクト比が0.3以下の結晶粒を、扁平な結晶粒又は扁平粒ともいう。また、前記「隣接する結晶粒間のずれ角が30°以上である結晶粒界」を「粒界のずれ角が大きい結晶粒界」ともいう。本発明によれば、このような扁平粒の密度を適正に小さく、かつ、粒界のずれ角が大きい結晶粒界の単位面積あたりの長さを適正に短く、それぞれ制御することによって、得られる銅合金板材の特性として、圧延垂直方向(TD方向)のヤング率が低い値、例えば125GPa以下、を示すものである。 In the copper alloy sheet of the present invention, the metal structure is a crystal grain having an aspect ratio of 0.3 or less, and the density of the crystal grain facing within ± 30 ° from TD is 0.030 in the analysis on the rolling surface. pieces / [mu] m and 2 or less, and the length per unit area of the deviation angle grain boundaries between adjacent crystal grains is 30 ° or more grain boundaries 0.8 [mu] m / [mu] m 2 or less. Hereinafter, in this document, the crystal grains having an aspect ratio of 0.3 or less are also referred to as flat crystal grains or flat grains. Further, the “crystal grain boundary in which the deviation angle between adjacent crystal grains is 30 ° or more” is also referred to as “a crystal grain boundary having a large grain boundary deviation angle”. According to the present invention, the density of such flat grains is appropriately reduced, and the length per unit area of the crystal grain boundary having a large grain boundary deviation angle is appropriately shortened and obtained by controlling each. As a characteristic of the copper alloy sheet, a value with a low Young's modulus in the rolling vertical direction (TD direction), for example, 125 GPa or less is shown.

本発明の銅合金板材の金属組織については、前記扁平粒の密度が0.030個/μm以下であることが好ましく、0.025個/μm以下であることがより好ましい。また、本発明の銅合金板材の金属組織については、前記粒界のずれ角が大きい結晶粒界の長さが単位面積(1μm)あたりの長さとして0.8μm/μm以下であることが好ましく、0.7μm/μm以下であることがより好ましい。さらに、本発明の銅合金板材の金属組織において、前記扁平粒の平均面積が3.0μm以下であることが好ましく、2.5μm以下であることがより好ましい。このような扁平な結晶粒は、例えば、鋳造[工程1]後の、冷間圧延1[工程2]と予備焼鈍[工程3]の各工程を適正に行うことによって形成し、かつ、その配向を制御することができる。 As for the metal structure of the copper alloy sheet material of the present invention, the density of the flat particles is preferably 0.030 particles / μm 2 or less, and more preferably 0.025 particles / μm 2 or less. Also, the metal structure of the copper alloy sheet of the present invention, the length of the grain boundary misalignment angle is large grain boundaries is 0.8 [mu] m / [mu] m 2 or less as the length per unit area (1 [mu] m 2) Is more preferable, and 0.7 μm / μm 2 or less is more preferable. Furthermore, in the metal structure of the copper alloy sheet of the present invention, the average area of the flat particles is preferably 3.0 μm 2 or less, and more preferably 2.5 μm 2 or less. Such flat crystal grains are formed, for example, by appropriately performing each step of cold rolling 1 [step 2] and pre-annealing [step 3] after casting [step 1], and the orientation thereof. Can be controlled.

本発明においては、結晶粒の平均面積と粒径(長径及び短径)、さらには結晶粒界の長さをEBSD法で観察及び解析することによって求める。所定の観察領域内において、母材の個々の結晶粒についてその最長の粒径を長径a(μm)とし、その最短の粒径を短径b(μm)とし、これらの長径aと短径bの各平均値を求める。本発明においてアスペクト比とは、それぞれ直線であるこれらの長径aと短径bについて各平均値を求め、前記の各平均値から得られる短径/長径の比、つまり比b/aの値をいう。   In the present invention, the average area and grain size (major axis and minor axis) of crystal grains, and the length of crystal grain boundaries are determined by observing and analyzing by the EBSD method. Within a predetermined observation region, the longest particle diameter of each crystal grain of the base material is defined as a major axis a (μm), the shortest particle diameter thereof is defined as a minor axis b (μm), and the major axis a and minor axis b thereof. Each average value of is obtained. In the present invention, the aspect ratio means that each average value is obtained for the major axis a and the minor axis b that are straight lines, and the ratio of the minor axis / major axis obtained from each average value, that is, the value of the ratio b / a. Say.

[平均結晶粒径(長径と短径の平均値)]
本発明において、母材の平均結晶粒径は、特に制限されるものではないが、通常10〜60μmである。ここで、平均結晶粒径とは、前記長径a(μm)の平均値である。また、短径b(μm)の平均値は、特に制限されるものではないが、通常5〜40μmである。本発明においては、長径aは短径bよりも長い。
[Average crystal grain size (average value of major axis and minor axis)]
In the present invention, the average crystal grain size of the base material is not particularly limited, but is usually 10 to 60 μm. Here, the average crystal grain size is an average value of the major axis a (μm). The average value of the minor axis b (μm) is not particularly limited, but is usually 5 to 40 μm. In the present invention, the major axis a is longer than the minor axis b.

[扁平粒の配向とヤング率の関係](非特許文献1より)
図1に、連続繊維を含む複相材料を模式的に示す。図1(A)にType Aとして示した複相材料は、母相Mに対して、第二相Ωの形状が、図中に上下方向の矢印で示した応力軸に垂直な板状である場合を示す。一方、図1(B)にType Bとして示した複相材料は、母相Mに対して、第二相Ωの形状が、図中に上下方向の矢印で示した応力軸に平行な連続繊維状である場合を示す。
[Relationship between flat grain orientation and Young's modulus] (From Non-Patent Document 1)
FIG. 1 schematically shows a multiphase material containing continuous fibers. In the multiphase material shown as Type A in FIG. 1A, the shape of the second phase Ω with respect to the parent phase M is a plate shape perpendicular to the stress axis indicated by the up and down arrows in the figure. Show the case. On the other hand, the multiphase material shown as Type B in FIG. 1B is a continuous fiber in which the shape of the second phase Ω is parallel to the stress axis indicated by the up and down arrows in the figure with respect to the matrix M. Is shown.

等ひずみ条件の仮定の下での初等的な解析では、母相Mのヤング率をE、第二相Ωのヤング率をEΩとすると、母相Mと強化相Ωにおける応力がともに外部応力σに等しいと考えてそれぞれの相内の弾性ひずみεとεΩ(応力軸方向の伸びひずみ)をそれぞれ
ε=σ/EとεΩ=σ/EΩ・・・(1)
と見積もる。これは、Reuss近似とも言われる。このReuss近似の下での板状積層材(複相材料)(Type A、図1(A))のヤング率EA(R)は、第二相Ωの体積分率をVとすると、
A(R)=σ/{VεΩ+(1−V)ε}=1/[(V/EΩ)+{(1−V)/E}]・・・(2)
となる。
In an elementary analysis under the assumption of equal strain conditions, if the Young's modulus of the parent phase M is E M and the Young's modulus of the second phase Ω is E Ω , the stresses in the parent phase M and the strengthening phase Ω are both external. of each considered equivalent stress sigma 0 Aiuchi elastic strain epsilon M and epsilon Omega (elongation strain stress axis direction), respectively ε M = σ 0 / E M and ε Ω = σ 0 / E Ω ··· (1)
Estimate. This is also called Reuss approximation. The Young's modulus EA (R) of the plate-like laminated material (multiphase material) (Type A, FIG. 1 (A)) under this Reuss approximation is expressed as follows, where the volume fraction of the second phase Ω is V f :
E A (R) = σ 0 / {V f ε Ω + (1−V f ) ε M } = 1 / [(V f / E Ω ) + {(1−V f ) / E M }]・ (2)
It becomes.

一方、等ひずみ条件の仮定の下での初等的な解析では、繊維強化材については母相Mと強化相Ωにおける応力軸方向の弾性伸びひずみがともに等しい値εになると考える。この弾性ひずみεが各相内の応力σとσΩ
σ=EεとσΩ=EΩε・・・(3)
として与える。ここで、応力の分配条件
σ=VσΩ+(1−V)σ・・・(4)
を使うと、等ひずみ条件での繊維強化材(複相材料)(Type B、図1(B))のヤング率EB(v)は、
B(v)=σ/ε=VΩ+(1−V)E・・・(5)
というヤング率の混合則の形式で与えられる。この等ひずみ条件はVoight(フォークト)近似とも呼ばれる。
On the other hand, in an elementary analysis under the assumption of an equal strain condition, it is considered that the elastic elongation strains in the stress axis direction in the matrix phase M and the reinforcement phase Ω both have the same value ε u for the fiber reinforcement. This elastic strain ε u is the stress σ M and σ Ω in each phase σ M = E M ε u and σ Ω = E Ω ε u (3)
Give as. Here, the stress distribution condition σ 0 = V f σ Ω + (1−V f ) σ M (4)
, The Young's modulus EB (v) of the fiber reinforcing material (double phase material) (Type B, FIG. 1 (B)) under equal strain conditions is
E B (v) = σ 0 / ε u = V f + (1−V f ) E M (5)
It is given in the form of a mixing rule of Young's modulus. This equal strain condition is also called a Voigt approximation.

以上の見積もりから、前記(2)と(5)のEA(R)、EB(v)の関係は
B(v)>EA(R)・・・(6)
となる。これより、EB(v)(Type B、図1(B))の方が、EA(R)(Type A、図1(A))よりも、ヤング率が高いことがわかった。
From the above estimation, the relationship between E A (R) and E B (v) in the above (2) and (5) is E B (v) > E A (R) (6)
It becomes. From this, it was found that EB (v) (Type B, FIG. 1 (B)) has a higher Young's modulus than EA (R) (Type A, FIG. 1 (A)).

そこで、本発明ではこのような知見に基づき、前記Type B、つまり図1(B)に示した結晶粒の状態を低減させるように配向制御しようとするものである。すなわち、本発明は、Type B、つまり図1(B)に示した組織が少なくなることで、ヤング率の低下を図るものである。このような配向制御をしながら、かつ、所定の低いアスペクト比を有する粒子の密度を低減させるとともにずれ角が大きい結晶粒界の単位面積あたりの長さを低減させるように制御することで、得られる銅合金板材のヤング率を低下させるものである。   Therefore, in the present invention, based on such knowledge, an attempt is made to control the orientation so as to reduce the state of the type B, that is, the crystal grains shown in FIG. That is, according to the present invention, Type B, that is, the structure shown in FIG. While controlling the orientation and reducing the density of grains having a predetermined low aspect ratio and controlling the length per unit area of the crystal grain boundary having a large deviation angle, it is obtained. The Young's modulus of the obtained copper alloy sheet is reduced.

[EBSD法]
本発明における上記扁平粒、結晶粒界の観察と解析には、EBSD法を用いる。EBSDとは、Electron BackScatter Diffractionの略で、走査電子顕微鏡(SEM)内で試料に電子線を照射したときに生じる反射電子菊池線回折を利用した結晶方位解析技術のことである。本発明ではEBSD法を、結晶方位ではなく、結晶粒の平均面積と形状(アスペクト比)とを解析するために用いる。本発明におけるEBSD測定では、結晶粒を200個以上含む、100μm×200μmの試料面積に対し、0.1μmステップでスキャンし、結晶粒の平均面積と形状、結晶粒界の長さを解析する。前記測定面積及びスキャンステップは、試料の結晶粒の大きさに応じて決定すればよく、本発明では100×200μm、0.1μmとする。測定後の結晶粒の解析には、TSL社製の解析ソフトOIM Analysis(商品名)を用いる。
[EBSD method]
The EBSD method is used for the observation and analysis of the above-described flat grains and crystal grain boundaries in the present invention. EBSD is an abbreviation for Electron BackScatter Diffraction, and is a crystal orientation analysis technique using reflected electron Kikuchi line diffraction that occurs when a sample is irradiated with an electron beam in a scanning electron microscope (SEM). In the present invention, the EBSD method is used to analyze not the crystal orientation but the average area and shape (aspect ratio) of crystal grains. In the EBSD measurement in the present invention, a 100 μm × 200 μm sample area containing 200 or more crystal grains is scanned in 0.1 μm steps, and the average area and shape of crystal grains and the length of crystal grain boundaries are analyzed. The measurement area and the scanning step may be determined according to the size of the crystal grains of the sample. In the present invention, they are 100 × 200 μm and 0.1 μm. For analysis of crystal grains after measurement, analysis software OIM Analysis (trade name) manufactured by TSL is used.

EBSD法による結晶粒の解析において得られる情報は、電子線が試料に侵入する数10nmの深さまでの情報を含んでいるが、測定している広さに対して充分に小さい為、本明細書中では結晶粒の平均面積として記載した。また、結晶粒の平均面積は板厚方向で異なる為、板厚方向で何点かを任意にとって平均を取ることが好ましい。   The information obtained in the analysis of crystal grains by the EBSD method includes information up to a depth of several tens of nanometers in which the electron beam penetrates into the sample, but is sufficiently small with respect to the measured width. In it, it described as an average area of a crystal grain. Moreover, since the average area of crystal grains differs in the plate thickness direction, it is preferable to take an average for any number of points in the plate thickness direction.

本発明においては、圧延面におけるEBSD法を用いた解析によって、前記アスペクト比や面積など各結晶粒の性状を求める。ここで、圧延面における解析とは、板厚方向(Normal Direction;ND)から板材の圧延面を観察し解析することをいう。本発明によれば、圧延方向(RD)と垂直な圧延垂直方向(TD)に結晶粒の向きが揃うように結晶粒の配向を制御する。この様子を図2に示す。図では、紙面と平行に圧延面を示した。図2(A)は、結晶粒の配向制御前のランダムな状態である。これを、所定の熱処理と加工に付すことによって、図2(B)に示すように結晶粒の向きが揃った状態とする。   In the present invention, the properties of each crystal grain such as the aspect ratio and area are obtained by analysis using the EBSD method on the rolled surface. Here, the analysis on the rolling surface refers to observing and analyzing the rolling surface of the plate material from the plate thickness direction (Normal Direction; ND). According to the present invention, the orientation of the crystal grains is controlled so that the crystal grains are aligned in the rolling vertical direction (TD) perpendicular to the rolling direction (RD). This is shown in FIG. In the figure, the rolling surface is shown parallel to the paper surface. FIG. 2A shows a random state before the crystal grain orientation control. By subjecting this to predetermined heat treatment and processing, the crystal grains are aligned as shown in FIG.

図2(B)は、圧延方向(RD)に対して垂直な圧延垂直方向(TD)から±30°以内に全ての結晶粒の向きが揃っている状態の代表例として、全ての結晶粒がTDと平行に配向した状態を模式的に示した。TDと平行とは、TDに対して結晶粒の向きのずれが0°であることをいう。
ここで、結晶粒の向きのTDに対するずれとは、個々の結晶粒の長径を通る直線を結晶の向きとする場合、その向きがTDから何度ずれているかをいう。
本発明においては、結晶粒の向きのTDに対するずれを、±30°以内とする。
FIG. 2B shows a typical example in which all the crystal grains are aligned within ± 30 ° from the rolling vertical direction (TD) perpendicular to the rolling direction (RD). The state of being aligned in parallel with TD is schematically shown. Parallel to TD means that the deviation of the orientation of the crystal grain is 0 ° with respect to TD.
Here, the deviation of the orientation of the crystal grains relative to the TD means how many times the orientation of the crystal grains is deviated from the TD when a straight line passing through the major axis of each crystal grain is taken as the orientation of the crystal.
In the present invention, the deviation of the crystal grain direction from TD is set within ± 30 °.

[必須添加元素]
本発明の銅合金への必須添加元素の含有量とその作用について示す。
[Necessary additive elements]
It shows about content of the essential addition element to the copper alloy of this invention, and its effect | action.

(Ni)
Niは、後述するSiとともに含有されて、時効析出熱処理で析出したNiSi相を形成して、銅合金板材の強度の向上に寄与する元素である。Niの含有量は1.0〜5.0質量%であり、好ましくは1.5〜4.7質量%であり、さらに好ましくは2.0〜4.5質量%である。
Niの含有量を前記範囲とすることによって、前記NiSi相を適正に形成させ、銅合金板材の引張強さを高めることができる。また、導電率も高い。また、熱間圧延加工性も良好である。
(Ni)
Ni is an element that is contained together with Si, which will be described later, and that contributes to improving the strength of the copper alloy sheet material by forming a Ni 2 Si phase precipitated by aging precipitation heat treatment. The Ni content is 1.0 to 5.0% by mass, preferably 1.5 to 4.7% by mass, and more preferably 2.0 to 4.5% by mass.
By setting the Ni content in the above range, the Ni 2 Si phase can be appropriately formed, and the tensile strength of the copper alloy sheet can be increased. Also, the conductivity is high. Moreover, hot rolling workability is also favorable.

(Si)
Siは、前記Niとともに含有されて、時効析出熱処理で析出したNiSi相を形成して、銅合金板材の強度の向上に寄与する。Siの含有量は0.1〜2.0質量%であり、好ましくは0.2〜1.8質量%であり、さらに好ましくは0.6〜1.5質量%である。Siの含有量は化学量論比でNi/Si=4.2とするのが最も導電率と強度のバランスがよい。そのためSiの含有量は、Ni/Siが2.5〜7.5の範囲となるようにするのが好ましく、より好ましくは3.0〜6.5である。
Siの含有量を前記範囲とすることによって、銅合金板材の引張強さを高くすることができる。この場合、過剰なSiが銅のマトリックス中に固溶して、銅合金板材の導電率を低下させることがない。また、鋳造時の鋳造性や、熱間及び冷間での圧延加工性も良好であり、鋳造割れや圧延割れが生じることもない。
(Si)
Si is contained together with the Ni and forms a Ni 2 Si phase precipitated by an aging precipitation heat treatment, thereby contributing to an improvement in the strength of the copper alloy sheet. Content of Si is 0.1-2.0 mass%, Preferably it is 0.2-1.8 mass%, More preferably, it is 0.6-1.5 mass%. The balance between conductivity and strength is best when the Si content is stoichiometrically Ni / Si = 4.2. Therefore, the Si content is preferably such that Ni / Si is in the range of 2.5 to 7.5, and more preferably 3.0 to 6.5.
By setting the Si content in the above range, the tensile strength of the copper alloy sheet can be increased. In this case, excess Si does not dissolve in the copper matrix and the electrical conductivity of the copper alloy sheet is not lowered. Moreover, the castability at the time of casting, and the hot and cold rolling workability are also good, and no casting cracks or rolling cracks occur.

[副添加元素]
次に本発明の銅合金への副添加元素の含有量とその作用について示す。好ましい副添加元素としては、B、Mg、P、Cr、Mn、Fe、Co、Zn、Zr、Ag、Snが挙げられる。これらの元素は総量で0.1〜3.0質量%の含有量であれば、導電率を低下させる弊害を生じることなく、以下に各元素について述べる種々の特性を改善することができるために、本発明の銅合金板材に添加・含有させてもよい。添加効果を充分に活用し、かつ導電率を低下させないための含有量としては、これらの副添加元素の少なくとも1種を総量で、0.1〜3.0質量%含有することが好ましく、0.3〜1.5質量%がさらに好ましく、0.5〜1.0質量%であることがより好ましい。以下に、各元素の添加の作用効果を示す。
[Sub-additive elements]
Next, the content of the auxiliary additive element in the copper alloy of the present invention and its action will be described. Preferable secondary additive elements include B, Mg, P, Cr, Mn, Fe, Co, Zn, Zr, Ag, and Sn. If these elements are contained in a total amount of 0.1 to 3.0 % by mass, the various characteristics described below can be improved without causing the adverse effect of lowering the conductivity. The copper alloy sheet material of the present invention may be added and contained. As a content for fully utilizing the effect of addition and not lowering the conductivity, it is preferable to contain at least one of these sub-added elements in a total amount of 0.1 to 3.0% by mass, 0 .3-1.5 mass% is further more preferable, and it is more preferable that it is 0.5-1.0 mass%. The effects of adding each element are shown below.

(Mg、Sn、Zn)
Mg、Sn、Znは、添加・含有させることで耐応力緩和特性を向上する。それぞれを単独で添加した場合よりも併せて添加した場合に相乗効果によって更に耐応力緩和特性が向上する。また、半田脆化が著しく改善する効果がある。
(Mg, Sn, Zn)
Mg, Sn, and Zn improve the stress relaxation resistance by adding and containing them. The stress relaxation resistance is further improved by the synergistic effect when each of them is added together than when they are added alone. In addition, the solder embrittlement is remarkably improved.

(Mn、Ag、B、P)
Mn、Ag、B、Pは添加・含有させると熱間加工性を向上させるとともに、強度を向上する。
(Mn, Ag, B, P)
When Mn, Ag, B, and P are added and contained, the hot workability is improved and the strength is improved.

(Cr、Zr、Fe)
Cr、Zr、Feは、化合物や単体として微細に析出し、析出硬化に寄与する。また、化合物として50〜500nmの大きさで析出し、粒成長を抑制することによって結晶粒径を微細にする効果があり、曲げ加工性を良好にする。
(Cr, Zr, Fe)
Cr, Zr, and Fe precipitate finely as a compound or a simple substance, and contribute to precipitation hardening. Moreover, it precipitates with the magnitude | size of 50-500 nm as a compound, and there exists an effect which makes a crystal grain size fine by suppressing grain growth, and makes bending workability favorable.

(Co)
Coは、合金中でSiとともに、CoSiの金属間化合物の析出物を形成して析出強化による強度向上に寄与する。
(Co)
Co forms precipitates of Co 2 Si intermetallic compounds together with Si in the alloy and contributes to strength improvement by precipitation strengthening.

[銅合金板材の製造方法]
次に、本発明の銅合金板材の好ましい製造条件について説明する。
[Method for producing copper alloy sheet]
Next, preferable production conditions for the copper alloy sheet of the present invention will be described.

まず、従来の析出型銅合金の製造方法について述べる。
従来の製造方法では、銅合金素材を溶解・鋳造[工程1−1]して鋳塊を得て、これを均質化熱処理[工程1−2]し、熱間圧延[工程1−3]、水冷[工程1−4]、酸化スケール除去のために面削[工程1−5]、冷間圧延[工程1−6]をこの順に行い薄板化し、700〜1000℃の温度範囲で中間溶体化熱処理[工程1−7]を行って溶質原子を再固溶させた後に、時効析出熱処理[工程1−8]と仕上げ冷間圧延[工程1−9]によって必要な強度(但し、低いヤング率ではない)を満足させるものである。
First, a conventional method for producing a precipitation-type copper alloy will be described.
In the conventional manufacturing method, a copper alloy material is melted and cast [Step 1-1] to obtain an ingot, which is subjected to a homogenization heat treatment [Step 1-2], and hot-rolled [Step 1-3], Water cooling [Step 1-4], chamfering [Step 1-5] and cold rolling [Step 1-6] to remove oxide scale are performed in this order to form a thin plate, and an intermediate solution is formed in a temperature range of 700 to 1000 ° C. After the heat treatment [Step 1-7] is performed to re-dissolve the solute atoms, the required strength (however, the low Young's modulus is obtained by the aging precipitation heat treatment [Step 1-8] and the finish cold rolling [Step 1-9]. Is not satisfied).

これに対して、本発明の銅合金板材の製造方法の一つの実施形態においては、所定の合金組成を与える銅合金素材を溶解、鋳造[工程1]後に、加工率10%以下で冷間圧延1[工程2]し、300〜700℃で1分〜5時間の予備焼鈍[工程3]を行った後、700℃以上で5分〜20時間の均質化熱処理[工程4]を施すことで、組織内において微細な扁平粒が形成される。その後、熱間圧延[工程5]を施して所定の板厚とした後、水焼入れ[工程6]することで、組織内において扁平粒が粒成長して所望の粒径となる。その後、酸化スケール除去の為に面削[工程7]する。その後、50%以上の加工率で冷間圧延2[工程8]を行う。その後、昇温速度5〜15℃/秒、保持温度300〜700℃、保持時間1秒〜10時間の中間溶体化熱処理(中間焼鈍ともいう)[工程9]を施した後に、10〜99%の加工率で冷間圧延3[工程10]を施すことによって、既に形成された扁平粒内で新たに結晶粒の核が生成し、部分的に再結晶し、一定の密度で分散する。また、同時に扁平粒がTD方向に配向するとともに、隣り合う結晶粒同士の粒界のずれ角度が30°以上である高角粒界の密度を維持する。その後、溶体化熱処理[工程11]、時効析出熱処理[工程12]、表面の酸化膜を落とす酸洗[工程13]、仕上げ冷間圧延[工程14]をこの順で施し、さらに必要によって、その後に歪取り焼鈍(低温焼鈍ともいう)[工程15]を施してもよい。
また、前記扁平粒の形成と配向の制御の点では、鋳造[工程1]後の、冷間圧延1[工程2]と予備焼鈍[工程3]の2つの工程によって、銅合金内の等軸晶、柱状晶それぞれの結晶内に扁平粒の核を形成させていると考えられる。
本発明においては、前記[工程1]から[工程15]の全ての工程をこの順に施すことが好ましい。
In contrast, in one embodiment of the method for producing a copper alloy sheet according to the present invention, a copper alloy material giving a predetermined alloy composition is melted and cast [Step 1], and then cold-rolled at a processing rate of 10% or less. 1 [Step 2], and after performing pre-annealing [Step 3] at 300 to 700 ° C. for 1 minute to 5 hours, then performing a homogenization heat treatment [Step 4] at 700 ° C. or higher for 5 minutes to 20 hours. Fine flat particles are formed in the tissue. Thereafter, hot rolling [Step 5] is performed to obtain a predetermined thickness, and then water quenching [Step 6] is performed, whereby flat grains grow in the structure to have a desired particle size. Then, chamfering [Step 7] is performed to remove oxide scale. Thereafter, cold rolling 2 [Step 8] is performed at a processing rate of 50% or more. Thereafter, an intermediate solution heat treatment (also referred to as intermediate annealing) [Step 9] is performed at a rate of temperature increase of 5 to 15 ° C./second, a holding temperature of 300 to 700 ° C., and a holding time of 1 second to 10 hours. By performing the cold rolling 3 [step 10] at a processing rate of, a new nucleus of crystal grains is generated in the already formed flat grains, which are partially recrystallized and dispersed at a constant density. At the same time, while the flat grains are oriented in the TD direction, the density of the high-angle grain boundaries in which the deviation angle of the grain boundaries between adjacent crystal grains is 30 ° or more is maintained. Thereafter, solution heat treatment [Step 11], aging precipitation heat treatment [Step 12], pickling to remove the oxide film on the surface [Step 13], and finish cold rolling [Step 14] are performed in this order. May be subjected to strain relief annealing (also referred to as low temperature annealing) [Step 15].
Further, in terms of controlling the formation of the flat grains and the orientation, the equiaxed in the copper alloy is obtained by two processes of cold rolling 1 [process 2] and pre-annealing [process 3] after casting [process 1]. It is considered that flat grain nuclei are formed in each crystal and columnar crystal.
In the present invention, it is preferable to perform all the steps from [Step 1] to [Step 15] in this order.

但し、必要に応じて、冷間圧延1[工程2]と予備焼鈍[工程3]を適宜(好ましくは1〜5回)各々前記条件で繰り返し行ってもよい。
また、必要に応じて、中間焼鈍[工程9]と冷間圧延3[工程10]を適宜(好ましくは1回〜5回)各々前記条件で繰り返して行ってもよい。
また、低温焼鈍[工程15]を省略してもよい。
さらに、溶体化熱処理[工程11]の後で冷間圧延4[工程11’]を行ってもよい。この冷間圧延4[工程11’]は、例えば、前記冷間圧延3[工程10]と同様の条件で行うことができる。
However, if necessary, cold rolling 1 [Step 2] and preliminary annealing [Step 3] may be repeated as appropriate (preferably 1 to 5 times) under the above-mentioned conditions.
If necessary, intermediate annealing [Step 9] and cold rolling 3 [Step 10] may be repeated as appropriate (preferably 1 to 5 times) under the above-mentioned conditions.
Further, the low temperature annealing [Step 15] may be omitted.
Further, after the solution heat treatment [Step 11], cold rolling 4 [Step 11 ′] may be performed. This cold rolling 4 [step 11 ′] can be performed, for example, under the same conditions as the cold rolling 3 [step 10].

以下に、各工程の条件をより詳細に設定した好ましい実施態様について説明する。
少なくともNiを1.0〜5.0質量%及びSiを0.1〜2.0質量%含有し、他の副添加元素については必要により適宜含有するように各元素を配合し、残部がCuと不可避不純物から成る合金素材を高周波溶解炉により溶解し、これを鋳造[工程1]して鋳塊を得る。鋳造[工程1]での鋳造条件は、0.1〜100℃/秒の冷却速度とすることが好ましい。この鋳塊を、例えば大型冷間圧延機を用いて、合計加工率10%以下となるよう冷間圧延1[工程2]を行う。この冷間圧延1[工程2]は複数回の圧延パス(好ましくは1回〜10回)で行ってもよいが、(合計)圧延率が0%を超えるように必ず1回は冷間圧延を施す。
Below, the preferable embodiment which set the conditions of each process in detail is described.
At least Ni is contained in an amount of 1.0 to 5.0% by mass and Si is contained in an amount of 0.1 to 2.0% by mass, and other sub-addition elements are blended as necessary so that the other elements are appropriately contained. An alloy material composed of unavoidable impurities is melted in a high-frequency melting furnace and casted [step 1] to obtain an ingot. The casting condition in the casting [Step 1] is preferably a cooling rate of 0.1 to 100 ° C./second. For this ingot, for example, using a large cold rolling mill, cold rolling 1 [step 2] is performed so that the total processing rate becomes 10% or less. This cold rolling 1 [step 2] may be performed in a plurality of rolling passes (preferably 1 to 10 times), but is always cold rolled once so that the (total) rolling rate exceeds 0%. Apply.

次に、保持温度300〜700℃で保持時間1分〜5時間の予備焼鈍[工程3]し、再熱して保持温度700℃以上1100℃以下で5分〜20時間保持する均質化熱処理[工程4]した後、熱間圧延[工程5]にて、所定の板厚まで加工する。なお、熱間圧延[工程5]の最終温度は400℃であり、その後は水冷[工程6]し、圧延表面の酸化スケール除去のために面削[工程7]を行う。   Next, pre-annealing at a holding temperature of 300 to 700 ° C. for a holding time of 1 minute to 5 hours [Step 3] and reheated to hold at a holding temperature of 700 ° C. to 1100 ° C. for 5 minutes to 20 hours [Step] 4] After that, in hot rolling [Step 5], it is processed to a predetermined plate thickness. Note that the final temperature of the hot rolling [Step 5] is 400 ° C., and thereafter water cooling [Step 6] is performed, and chamfering [Step 7] is performed to remove oxidized scale on the rolled surface.

次に、50%以上99%以下の加工率で冷間圧延2[工程8]を行い、昇温速度5〜15℃/秒、保持温度300〜700℃、保持時間1秒〜10時間の中間焼鈍[工程9]を行う。その後、圧延率10〜99%の加工率で加工する冷間圧延3[工程10]を行い、到達温度700〜1020℃、保持時間1秒〜60秒の溶体化熱処理[工程11]を施し、添加元素を再固溶させる。この溶体化熱処理[工程11]は、到達温度までの昇温速度、冷却速度ともに100℃/秒以上とする。   Next, cold rolling 2 [Step 8] is performed at a processing rate of 50% or more and 99% or less, and the intermediate rate is 5 to 15 ° C./second, the holding temperature is 300 to 700 ° C., and the holding time is 1 second to 10 hours. Annealing [Step 9] is performed. Thereafter, cold rolling 3 [Step 10] is performed at a processing rate of 10 to 99%, and a solution heat treatment [Step 11] is performed at an ultimate temperature of 700 to 1020 ° C. and a holding time of 1 second to 60 seconds, The added element is dissolved again. In this solution heat treatment [Step 11], the rate of temperature rise to the ultimate temperature and the rate of cooling are both 100 ° C./second or more.

次に、析出強化のため、保持温度300〜600℃、保持時間10分〜20時間の時効析出熱処理[工程12]を施す。この時効析出熱処理後の板材の表面を酸洗[工程13]する。この後、圧延加工率8〜80%にて仕上圧延[工程14]に付して、所望の板厚と強度に調整する。次に、保持温度300〜600℃、保持時間1秒〜60秒で低温焼鈍[工程15]して、目的の銅合金板材を得る。低温焼鈍[工程15]後には、最終製品の板幅(条幅)に調整するために、スリット[工程16]を行ってもよい。   Next, for precipitation strengthening, an aging precipitation heat treatment [Step 12] is performed at a holding temperature of 300 to 600 ° C. and a holding time of 10 minutes to 20 hours. The surface of the plate material after this aging precipitation heat treatment is pickled [step 13]. Thereafter, it is subjected to finish rolling [Step 14] at a rolling rate of 8 to 80% to adjust to a desired plate thickness and strength. Next, low temperature annealing is performed at a holding temperature of 300 to 600 ° C. and a holding time of 1 second to 60 seconds [Step 15] to obtain a target copper alloy sheet. After low-temperature annealing [Step 15], a slit [Step 16] may be performed in order to adjust the sheet width (strip width) of the final product.

本実施形態において、冷間圧延1[工程2]は、合計加工率10%以下の圧延加工で、粗大な鋳造組織や偏析を破壊し、均一な組織にするための加工である。ここで、圧延加工率が低すぎると、鋳塊に対して十分な加工ひずみが入らず、粗大な鋳造組織が残存してしまう。
次に、300〜700℃で1分〜5時間の予備焼鈍[工程3]では、冷間圧延1[工程2]で導入した加工ひずみを開放し、扁平な結晶粒の核を抑制する。
熱間圧延[工程5]では、均質化熱処理温度(700℃以上1100℃以下)から800℃までの温度域で、動的再結晶による結晶粒の微細化のための加工を行う。
冷間圧延2[工程8]では、所定の板厚となるまで加工を施す。
その後の中間焼鈍[工程9]では、熱間圧延[工程5]にて微細化した結晶粒と、不均一な歪を加えた組織を、部分的に再結晶させる。また、中間焼鈍[工程9]は、冷間圧延2[工程8]で導入した加工ひずみの部分的な開放により、扁平粒の核を低減しつつ、隣り合う結晶粒との角度が30°以上の高角粒界の密度を維持する、精密な熱処理である。
溶体化熱処理[工程11]では、添加元素を固溶させる。このとき、到達温度が高すぎると、扁平な結晶粒が成長してしまい、目的の組織が得られなくなるため、到達温度を精密に制御する。
In the present embodiment, the cold rolling 1 [Step 2] is a rolling process with a total processing rate of 10% or less, and is a process for breaking a coarse cast structure and segregation into a uniform structure. Here, if the rolling rate is too low, sufficient processing strain does not enter the ingot, and a coarse cast structure remains.
Next, in the pre-annealing [Step 3] at 300 to 700 ° C. for 1 minute to 5 hours, the processing strain introduced in the cold rolling 1 [Step 2] is released, and the nuclei of flat crystal grains are suppressed.
In the hot rolling [Step 5], processing for refining crystal grains by dynamic recrystallization is performed in a temperature range from a homogenization heat treatment temperature (700 ° C. to 1100 ° C.) to 800 ° C.
In cold rolling 2 [Step 8], processing is performed until a predetermined plate thickness is obtained.
In the subsequent intermediate annealing [Step 9], the crystal grains refined in the hot rolling [Step 5] and the structure to which the uneven strain is applied are partially recrystallized. Further, in the intermediate annealing [Step 9], the angle between adjacent crystal grains is 30 ° or more while reducing the nuclei of the flat grains by partially releasing the processing strain introduced in the cold rolling 2 [Step 8]. This is a precise heat treatment that maintains the density of high-angle grain boundaries.
In the solution heat treatment [step 11], the additive element is dissolved. At this time, if the ultimate temperature is too high, flat crystal grains grow and the target structure cannot be obtained. Therefore, the ultimate temperature is precisely controlled.

上記の、溶解・鋳造[工程1]後の各工程について、さらに好ましい条件を例示すると以下のとおりである。   The following are examples of more preferable conditions for each step after the above-described melting / casting [Step 1].

冷間圧延1[工程2]は好ましくは圧延加工率8%以下、より好ましくは6%以下である。
予備焼鈍[工程3]では、保持温度は好ましくは350〜650℃、より好ましくは400〜600℃である。また、その保持時間は好ましくは5分間〜4時間、より好ましくは10分〜3時間である。
熱間圧延[工程5]では、好ましくは1010℃以下、より好ましくは1000℃以下で、数〜数十パスの圧延を施す。
冷間圧延2[工程8]では、好ましくは55%以上、より好ましくは60%以上の圧延加工を施す。
Cold rolling 1 [Process 2] is preferably 8% or less, more preferably 6% or less.
In the preliminary annealing [Step 3], the holding temperature is preferably 350 to 650 ° C, more preferably 400 to 600 ° C. The holding time is preferably 5 minutes to 4 hours, more preferably 10 minutes to 3 hours.
In the hot rolling [Step 5], rolling of several to several tens of passes is preferably performed at 1010 ° C. or lower, more preferably 1000 ° C. or lower.
In the cold rolling 2 [Step 8], rolling of preferably 55% or more, more preferably 60% or more is performed.

中間焼鈍[工程9]では、保持温度は好ましくは350〜650℃、より好ましくは400〜600℃である。また、その保持時間は好ましくは1分〜8時間、より好ましくは10分〜5時間である。
溶体化熱処理[工程11]では、到達温度は好ましくは750℃〜1000℃、より好ましくは800〜980℃である。また、その保持時間は好ましくは3秒〜50秒、より好ましくは6秒〜40秒である。
時効析出熱処理[工程12]では、保持温度は好ましくは350〜600℃、より好ましくは400〜600℃である。また、その保持時間は好ましくは30分〜15時間、より好ましくは1時間〜10時間である。
時効析出熱処理[工程12]後の材料表面の酸化スケール除去には、酸洗[工程13]を施す。
In the intermediate annealing [Step 9], the holding temperature is preferably 350 to 650 ° C, more preferably 400 to 600 ° C. The holding time is preferably 1 minute to 8 hours, more preferably 10 minutes to 5 hours.
In the solution heat treatment [step 11], the ultimate temperature is preferably 750 to 1000 ° C, more preferably 800 to 980 ° C. The holding time is preferably 3 seconds to 50 seconds, more preferably 6 seconds to 40 seconds.
In the aging precipitation heat treatment [Step 12], the holding temperature is preferably 350 to 600 ° C, more preferably 400 to 600 ° C. The holding time is preferably 30 minutes to 15 hours, more preferably 1 hour to 10 hours.
In order to remove the oxide scale on the surface of the material after the aging precipitation heat treatment [Step 12], pickling [Step 13] is performed.

また、各圧延後の形状が良好でない場合には、例えばテンションレベラーなどによる矯正を、必要に応じて導入してもよい。但し、圧延後の板材の形状が良好であれば、この矯正工程は省略することができる。   Moreover, when the shape after each rolling is not favorable, for example, correction by a tension leveler or the like may be introduced as necessary. However, if the shape of the plate after rolling is good, this straightening step can be omitted.

ここで、加工率(又は圧延率、圧延加工率ともいう)は次式によって定義される値である。
加工率(%)={(t−t)/t}×100
式中、tは圧延加工前の厚さを、tは圧延加工後の厚さをそれぞれ表わす。
Here, the processing rate (or rolling rate or rolling processing rate) is a value defined by the following equation.
Processing rate (%) = {(t 1 −t 2 ) / t 1 } × 100
In the formula, t 1 represents the thickness before rolling, and t 2 represents the thickness after rolling.

[銅合金板材の板厚など]
本発明の銅合金板材の板厚は、特に制限されるものではないが、通常、0.05〜0.5mmである。
本発明の銅合金板材の板幅は、特に制限されるものではないが、通常、10〜750mmである。また、条材としては、条幅は、特に制限されるものではないが、通常、1.0〜300mmである。
[Copper alloy sheet thickness, etc.]
The thickness of the copper alloy sheet of the present invention is not particularly limited, but is usually 0.05 to 0.5 mm.
The plate width of the copper alloy sheet of the present invention is not particularly limited, but is usually 10 to 750 mm. Further, as the strip material, the strip width is not particularly limited, but is usually 1.0 to 300 mm.

[銅合金板材の特性]
上記内容を満たすことで、例えばコネクタ用銅合金板材に要求される特性を満足することができる。本発明において、銅合金板材は下記の特性を有することが好ましい。各特性の詳細な測定条件は、特に断らない限り以下の実施例に記載のとおりとする。
[Characteristics of copper alloy sheet]
By satisfy | filling the said content, the characteristic requested | required of the copper alloy board | plate material for connectors, for example can be satisfied. In the present invention, the copper alloy sheet preferably has the following characteristics. Detailed measurement conditions for each characteristic are as described in the following examples unless otherwise specified.

・TD方向のヤング率が125GPa以下であることが好ましい。より好ましくは、123GPa以下である。さらに好ましくは、120GPa以下である。
・TD方向のたわみ係数が115GPa以下であることが好ましい。より好ましくは、113GPa以下である。さらに好ましくは、110GPa以下である。
・TD方向の0.2%耐力が600MPa以上であることが好ましい。より好ましくは750MPa以上、さらに好ましくは800MPa以上である。
・耐疲労特性が、板材への負荷応力500MPa、繰り返し回数10回の条件にて破断しないことが好ましい。
・導電率が20%IACS以上であることが好ましい。さらに好ましくは25%以上である。
・耐応力緩和特性として、150℃で1000時間保持後の応力緩和率(SR)が20%以下であることが好ましい。さらに好ましくは15%以下である。
-It is preferable that the Young's modulus of a TD direction is 125 GPa or less. More preferably, it is 123 GPa or less. More preferably, it is 120 GPa or less.
-It is preferable that the deflection coefficient of a TD direction is 115 GPa or less. More preferably, it is 113 GPa or less. More preferably, it is 110 GPa or less.
-It is preferable that the 0.2% yield strength of TD direction is 600 Mpa or more. More preferably, it is 750 MPa or more, More preferably, it is 800 MPa or more.
· Fatigue properties, load stress 500MPa into plate material, it is preferred not to break at repetition count 10 6 times conditions.
-It is preferable that electrical conductivity is 20% IACS or more. More preferably, it is 25% or more.
-As a stress relaxation-resistant characteristic, it is preferable that the stress relaxation rate (SR) after 1000-hour holding | maintenance at 150 degreeC is 20% or less. More preferably, it is 15% or less.

以下に、本発明を実施例に基づきさらに詳細に説明するが、本発明はそれらに限定されるものではない。   Hereinafter, the present invention will be described in more detail based on examples, but the present invention is not limited thereto.

(実施例1〜実施例16、比較例1〜比較例21)
実施例1〜実施例16について、表1に示す組成となるように、主原料Cuと必須添加元素NiとSiに、必要により各種の副添加元素を配合し、残部がCuと不可避不純物からなる合金素材(合金原料)を得た。各合金原料を高周波溶解炉により溶解し、それぞれ0.1〜100℃/秒の冷却速度で鋳造[工程1]して鋳塊を得た。各鋳塊を、合計加工率10%以下で冷間圧延1[工程2]を施し、保持温度300〜700℃、保持時間1分〜5時間で予備焼鈍[工程3]を行った。次に、再熱して保持温度700〜1100℃で5分〜20時間保持する均質化熱処理[工程4]し、1020℃以下で熱間圧延[工程5]を行った。熱間圧延[工程5]の終了温度は400℃とした。その後、水焼入れ[工程6]と、引続いて、酸化スケールを除去するために面削[工程7]した後、加工率50%以上99%以下の冷間圧延2[工程8]を施した。この面削された加工材に、大型の焼鈍炉(例えばBEL炉)にて昇温速度5〜15℃/秒、保持温度300〜700℃、保持時間1秒〜10時間にて中間焼鈍[工程9]を行った。その後、加工率10〜99%で冷間圧延3[工程10]を行った。その後、到達温度700〜1020℃、保持時間1〜60秒で溶体化熱処理[工程11]を施した後、到達温度300〜600℃、保持時間10分〜20時間の時効析出熱処理[工程12]を行った。その後、表面の酸化膜を除去する為に、酸洗[工程13]し、加工率8〜80%の仕上冷間圧延[工程14]を行い、最後に保持温度300〜600℃で、保持時間1秒〜60秒の低温焼鈍[工程15]を施し、各供試材とした。
(Examples 1 to 16, Comparative Examples 1 to 21)
About Examples 1 to 16, various auxiliary additive elements are blended with the main raw material Cu and the essential additive elements Ni and Si as necessary so as to have the compositions shown in Table 1, and the balance consists of Cu and inevitable impurities. An alloy material (alloy material) was obtained. Each alloy raw material was melted in a high-frequency melting furnace, and casted at a cooling rate of 0.1 to 100 ° C./second [Step 1] to obtain an ingot. Each ingot was subjected to cold rolling 1 [Step 2] at a total processing rate of 10% or less, and pre-annealed [Step 3] at a holding temperature of 300 to 700 ° C. and a holding time of 1 minute to 5 hours. Next, the material was reheated and subjected to a homogenization heat treatment [Step 4] at a holding temperature of 700 to 1100 ° C. for 5 minutes to 20 hours, and hot rolled at a temperature of 1020 ° C. or less (Step 5). The end temperature of the hot rolling [Step 5] was 400 ° C. Then, after water quenching [Step 6] and subsequently chamfering [Step 7] to remove oxide scale, cold rolling 2 [Step 8] was performed at a processing rate of 50% to 99%. . This face-cut workpiece is subjected to intermediate annealing in a large annealing furnace (for example, a BEL furnace) at a heating rate of 5 to 15 ° C./second, a holding temperature of 300 to 700 ° C., and a holding time of 1 second to 10 hours [step 9]. Thereafter, cold rolling 3 [Step 10] was performed at a processing rate of 10 to 99%. Thereafter, solution heat treatment [Step 11] is performed at an ultimate temperature of 700 to 1020 ° C. and a holding time of 1 to 60 seconds, and then an aging precipitation heat treatment [Step 12] at an ultimate temperature of 300 to 600 ° C. and a holding time of 10 minutes to 20 hours. Went. Then, in order to remove the oxide film on the surface, pickling [Step 13], finish cold rolling [Step 14] with a processing rate of 8 to 80%, and finally holding temperature 300 to 600 ° C. and holding time. Each sample material was subjected to low-temperature annealing [Step 15] for 1 second to 60 seconds.

各熱処理や圧延の後に、材料表面の酸化や粗度の状態に応じて、酸洗浄や表面研磨を、形状に応じてテンションレベラーによる矯正を行った。なお、熱間圧延[工程5]での加工温度は、圧延機の入り側と出側に設置してある放射温度計により測定した。   After each heat treatment and rolling, acid cleaning and surface polishing were performed according to the state of oxidation and roughness of the material surface, and correction with a tension leveler was performed according to the shape. In addition, the processing temperature in the hot rolling [Step 5] was measured with a radiation thermometer installed on the entry side and the exit side of the rolling mill.

これとは別に、表1に示す組成の比較例1〜比較例21について、前記実施例と同様にして、各供試材を得た。但し、比較例1〜比較例21は、以下の点で前記実施例での製造条件とは異なる。   Separately from this, with respect to Comparative Examples 1 to 21 having the compositions shown in Table 1, each test material was obtained in the same manner as in the above Example. However, Comparative Example 1 to Comparative Example 21 differ from the manufacturing conditions in the above example in the following points.

比較例1、4〜6では、冷間加工での合計加工率が大きすぎて冷間圧延1[工程2]が規定の範囲外であり、また、保持温度が高すぎて予備焼鈍[工程3]も規定の範囲外であった。
比較例2では、冷間加工での合計加工率が大きすぎて冷間圧延1[工程2]が規定の範囲外であり、また、保持温度が低すぎて、かつ、保持時間も短すぎて予備焼鈍[工程3]も規定の範囲外であった。
比較例3、13では、冷間加工での合計加工率が大きすぎて冷間圧延1[工程2]が規定の範囲外であった。
比較例7では、冷間圧延1[工程2]は行わなかった。
比較例8〜11では、冷間圧延1[工程2]と予備焼鈍[工程3]のいずれも行わなかった。
比較例12では、冷間加工での合計加工率が大きすぎて冷間圧延1[工程2]が規定の範囲外であり、また、保持温度が低すぎて予備焼鈍[工程3]も規定の範囲外であった。
比較例14では、予備焼鈍[工程3]は行わなかった。
In Comparative Examples 1 and 4 to 6, the total working rate in the cold working is too large and the cold rolling 1 [Step 2] is out of the specified range, and the holding temperature is too high to perform pre-annealing [Step 3]. ] Was also outside the prescribed range.
In Comparative Example 2, the total working rate in the cold working is too large, and the cold rolling 1 [Step 2] is outside the specified range, the holding temperature is too low, and the holding time is too short. Pre-annealing [Step 3] was also outside the specified range.
In Comparative Examples 3 and 13, the total working rate in the cold working was too large, and the cold rolling 1 [Step 2] was outside the specified range.
In Comparative Example 7, cold rolling 1 [Step 2] was not performed.
In Comparative Examples 8 to 11, neither cold rolling 1 [Step 2] nor pre-annealing [Step 3] was performed.
In Comparative Example 12, the total processing rate in the cold working is too large and the cold rolling 1 [Step 2] is outside the specified range, and the holding temperature is too low and the pre-annealing [Step 3] is also specified. It was out of range.
In Comparative Example 14, the preliminary annealing [Step 3] was not performed.

比較例15では、副添加元素の合計含有量が多すぎた。
比較例16〜21では、NiとSiのそれぞれもしくはいずれも、含有量が多すぎたか又は少なすぎた。
In Comparative Example 15, the total content of the auxiliary additive elements was too large.
In Comparative Examples 16 to 21, each or both of Ni and Si contained too much or too little content.

これらの本発明に従った実施例及び比較例の供試材について下記の特性調査を行った。ここで、供試材の最終板厚は0.08mmとした。   The following property investigation was conducted on the test materials of the examples and comparative examples according to the present invention. Here, the final thickness of the test material was 0.08 mm.

a.アスペクト比0.3以下の扁平粒の密度、平均面積
各供試材の圧延面におけるEBSD測定にて、100μm×200μmの範囲で、スキャンステップ0.1μmの条件で測定を行った。測定結果の解析において、測定範囲中の全結晶粒から、アスペクト比が0.3以下の結晶粒(扁平粒)を抽出した。その扁平粒から長軸がTD方向に対して±30°以内に配向している結晶粒をさらに抽出した。その抽出した扁平粒について、密度、平均結晶粒面積を算出した。
a. Density and average area of flat grains having an aspect ratio of 0.3 or less In the EBSD measurement on the rolling surface of each specimen, measurement was performed in the range of 100 μm × 200 μm under the condition of a scan step of 0.1 μm. In analysis of the measurement results, crystal grains (flat grains) having an aspect ratio of 0.3 or less were extracted from all the crystal grains in the measurement range. Crystal grains having a major axis oriented within ± 30 ° with respect to the TD direction were further extracted from the flat grains. The density and average crystal grain area were calculated for the extracted flat grains.

b.隣接する結晶粒間のずれ角が30°以上である結晶粒界の単位面積あたりの長さ
前記EBSD測定にて、各結晶粒界の長さを測定した。測定結果の解析において、隣接する結晶粒間のずれ角が30°以上である結晶粒界の単位面積あたりの長さを求めた。表2−1〜表2−2中には、「≧30°の結晶粒界の単位面積あたりの長さ[μm/μm]」と示した。
b. Length per unit area of crystal grain boundary where the deviation angle between adjacent crystal grains is 30 ° or more The length of each crystal grain boundary was measured by the EBSD measurement. In the analysis of the measurement results, the length per unit area of the crystal grain boundary where the deviation angle between adjacent crystal grains is 30 ° or more was determined. In Tables 2-1 to 2-2, “length per unit area of grain boundaries of ≧ 30 ° [μm / μm 2 ]” is shown.

c.TD方向のヤング率
試験片は、各供試材の圧延垂直方向(圧延方向(RD)に垂直な方向(TD))から、幅20mm、長さ200mmの短冊状試験片を採取し、試験片の長さ方向(つまりTD)に引張試験機により応力を付与し、歪と応力の比例定数を求めた。降伏するときの歪量の80%の歪量を最大変位量とし、その変位量までを10分割した変位を与え、その10点での測定値から歪と応力の比例定数をTD方向のヤング率として求めた。
c. The Young's modulus test piece in the TD direction was obtained by collecting a strip-shaped test piece having a width of 20 mm and a length of 200 mm from the vertical direction of rolling of each specimen (direction perpendicular to the rolling direction (RD) (TD)). A stress was applied in the length direction (that is, TD) by a tensile tester to determine a proportional constant between strain and stress. The strain amount of 80% of the yield amount when yielding is set as the maximum displacement amount, a displacement obtained by dividing the displacement amount into 10 is given, and the proportional constant of strain and stress is determined from the measured values at the 10 points, and the Young's modulus in the TD direction As sought.

d.TD方向のたわみ係数
試験片は、各供試材の圧延方向に垂直な方向(TD)に幅0.25mm、長さ1.5mmとなるようにプレスによる打ち抜きで加工した。片持ち梁にて試験片の表裏を10回ずつ測定し、下式で計算されるたわみ係数E[GPa]を、表裏10回ずつの測定の平均値で示した。
E=4a/b×(L/t)
式中、a:変位fと応力wの傾き、b:供試材の幅、L:固定端と荷重点の距離、t:供試材の板厚である。ここで、傾きaは、変位fと応力wが比例関係にある弾性領域について傾き(接線)を求めた。
d. Deflection coefficient in the TD direction The test piece was processed by punching with a press so that the width (0.25 mm) and the length (1.5 mm) were perpendicular to the rolling direction (TD) of each specimen. The front and back surfaces of the test piece were measured 10 times each with a cantilever beam, and the deflection coefficient E [GPa] calculated by the following equation was shown as the average value of the measurement 10 times for the front and back surfaces.
E = 4a / b × (L / t) 3
In the formula, a: slope of displacement f and stress w, b: width of specimen, L: distance between fixed end and load point, t: thickness of specimen. Here, as for the inclination a, the inclination (tangent) was obtained for an elastic region in which the displacement f and the stress w are in a proportional relationship.

e.TD方向の耐力[YS]
たわみ係数測定において、各試験片の弾性限界までの押し込み量(変位)から耐力[MPa]を算出して、強度つまりTD方向の耐力とした。
耐力[MPa] YS={(3E/2)×t×(fmax/L)×1000}/L
式中、E:前記たわみ係数、t:前記板厚、L:前記固定端と荷重点の距離、fmax:弾性限界までの変位(押込み深さ)である。
e. Strength in TD direction [YS]
In the measurement of the deflection coefficient, the yield strength [MPa] was calculated from the indentation amount (displacement) up to the elastic limit of each test piece to obtain the strength, that is, the yield strength in the TD direction.
Yield strength [MPa] YS = {(3E / 2) × t × (f max / L) × 1000} / L
In the equation, E is the deflection coefficient, t is the plate thickness, L is the distance between the fixed end and the load point, and f max is the displacement (indentation depth) up to the elastic limit.

f.耐疲労特性
耐疲労特性は、JCBA T308;2001(銅及び銅合金薄板条の疲労特性試験方法)に準拠し、前記各実施例及び比較例の試料から、圧延方向に平行な方向(つまりRD)と圧延方向に垂直な方向(つまりTD)から供試材を切り出して、それら各々について測定を行った。図3に、試験片を図の上方に振幅させた状態を平面視で示した説明図を示す(板バネ疲労試験)。1は試験片、2はナイフエッジ、3は固定具である。試験片幅は、10mm±0.2mm、試験片の固定トルクは、下部2N・m、上部3N・mである。試験片の負荷応力値(σ)は、下記の式(a)にて求めた。
500MPaの負荷応力にて両振りで片振幅2.0mmで繰り返し試験を行い、材料が破断するまでの繰り返し回数を求めた。
破断までの繰り返し回数が、圧延平行方向(RD)と圧延垂直方向(TD)で切り出した各供試材のいずれも10回以上であった場合を「良」、圧延平行方向と圧延垂直方向で切り出した各供試材のいずれかもしくはいずれも10回未満であった場合を「不良」とした。
σ=(3×E×t×δ)/(2×l)・・・(a)
式中、σ:最大曲げ応力(N/mm)、E:前記たわみ係数(N/mm)、t:前記試験片厚さ(mm)、δ:たわみ量(mm)、l:試験片セット長さ(mm)である。
f. Fatigue resistance Fatigue resistance is based on JCBA T308; 2001 (Fatigue property test method for copper and copper alloy sheet strips), and the direction parallel to the rolling direction (that is, RD) from the samples of the examples and comparative examples. Specimens were cut out from the direction perpendicular to the rolling direction (ie, TD), and measurement was performed on each of them. FIG. 3 is an explanatory diagram showing the state in which the test piece is swung upward in the figure (planar spring fatigue test). 1 is a test piece, 2 is a knife edge, 3 is a fixture. The width of the test piece is 10 mm ± 0.2 mm, and the fixing torque of the test piece is 2 N · m at the bottom and 3 N · m at the top. The load stress value (σ) of the test piece was obtained by the following formula (a).
A repeated test was performed at a single amplitude of 2.0 mm by swinging under a load stress of 500 MPa, and the number of repetitions until the material broke was obtained.
The case where the number of repetitions until rupture was 10 6 times or more for each specimen cut in the rolling parallel direction (RD) and the rolling vertical direction (TD) was “good”, and the rolling parallel direction and the rolling vertical direction. The case where any one or all of the test materials cut out in (1) were less than 10 6 times was defined as “bad”.
σ = (3 × E × t × δ) / (2 × l 2 ) (a)
In the formula, σ: maximum bending stress (N / mm 2 ), E: the deflection coefficient (N / mm 2 ), t: thickness of the test piece (mm), δ: deflection amount (mm), l: test piece Set length (mm).

g.導電率[EC]
20℃(±0.5℃)に保たれた恒温槽中で四端子法により比抵抗を計測して導電率(%IACS)を算出した。なお、端子間距離は100mmとした。
g. Conductivity [EC]
The specific resistance was measured by a four-terminal method in a constant temperature bath maintained at 20 ° C. (± 0.5 ° C.) to calculate the conductivity (% IACS). In addition, the distance between terminals was 100 mm.

h.応力緩和率[SR]
旧日本電子材料工業会標準規格(EMAS−3003)に準じ、以下に示すように、150℃×1000時間の条件で測定した。片持ち梁法により耐力の80%の初期応力を負荷した。
図4は耐応力緩和特性の試験方法の説明図であり、図4(a)は熱処理前、図4(b)は熱処理後の状態である。図4(a)に示すように、試験台14に片持ちで保持した試験片11に、耐力の80%の初期応力を付与した時の試験片11の位置は、基準からδの距離である。これを150℃の恒温槽に1000時間保持し、負荷を除いた後の試験片12の位置は、図4(b)に示すように基準からHの距離である。13は応力を負荷しなかった場合の試験片であり、その位置は基準からHの距離である。この関係から、応力緩和率(%)は(H−H)/δ×100と算出した。
h. Stress relaxation rate [SR]
In accordance with the former Japan Electronic Materials Industry Association Standard (EMAS-3003), the measurement was performed under the conditions of 150 ° C. × 1000 hours as shown below. An initial stress of 80% of the proof stress was applied by the cantilever method.
4A and 4B are explanatory diagrams of a stress relaxation resistance test method. FIG. 4A shows a state before heat treatment, and FIG. 4B shows a state after heat treatment. As shown in FIG. 4A, the position of the test piece 11 when an initial stress of 80% of the proof stress is applied to the test piece 11 held in a cantilever manner on the test stand 14 is a distance of δ 0 from the reference. is there. This was held for 1000 hours in a thermostat at 0.99 ° C., the position of the test piece 12 after removal of the load is the distance from the reference H t as shown in Figure 4 (b). Reference numeral 13 denotes a test piece when no stress is applied, and its position is a distance H 1 from the reference. From this relationship, the stress relaxation rate (%) was calculated as (H t −H 1 ) / δ 0 × 100.

これらの本発明に従った実施例及び比較例の各供試材について、組成を表1に、製造条件の一部と得られた金属組織と特性を表2−1〜表2−2に、それぞれ示す。   About each test material of these Examples according to the present invention and comparative examples, the composition is shown in Table 1, the part of the manufacturing conditions, the obtained metal structure and properties are shown in Table 2-1 to Table 2-2, Each is shown.

Figure 0006339361
Figure 0006339361

Figure 0006339361
Figure 0006339361

Figure 0006339361
Figure 0006339361

表1及び表2−1に示すように、実施例1〜実施例16では、合金組成は本発明の規定の範囲内であり、また、その製造の際の製造条件は、本発明の製造方法での規定に従って、冷間圧延1[工程2]は、合計圧延加工率が10%以下で圧延加工し、かつ、予備焼鈍[工程3]は、300〜700℃で1分〜5時間の熱処理を行った。   As shown in Table 1 and Table 2-1, in Examples 1 to 16, the alloy composition is within the prescribed range of the present invention, and the manufacturing conditions for the manufacturing are the manufacturing method of the present invention. The cold rolling 1 [Step 2] is rolled at a total rolling ratio of 10% or less, and the pre-annealing [Step 3] is a heat treatment at 300 to 700 ° C. for 1 minute to 5 hours. Went.

表2−1に示すように、実施例1〜実施例16は、各特性において良好であった。すなわち、TD方向に対して長軸が±30°以内を向いた、アスペクト比が0.3以下の扁平な結晶粒の密度が0.030個/μm以下であり、かつ、隣り合う結晶粒とのずれ角が30°以上の結晶粒界の単位面積(1μm)あたりの長さが0.8μm/μm以下を示した場合、TD方向のヤング率、耐力、たわみ係数と、耐疲労特性と、導電率及び耐応力緩和特性(応力緩和率)とがいずれも良好であった。
また、その金属組織が、前記扁平な結晶粒の平均面積が3.0μm以下であった場合には、さらに良好な特性を示した。
As shown in Table 2-1, Examples 1 to 16 were good in each characteristic. That is, the density of flat crystal grains whose major axis is within ± 30 ° with respect to the TD direction and whose aspect ratio is 0.3 or less is 0.030 particles / μm 2 or less, and adjacent crystal grains When the length per unit area (1 μm 2 ) of the grain boundary with a deviation angle of 30 ° or more is 0.8 μm / μm 2 or less, the Young's modulus in the TD direction, the yield strength, the deflection coefficient, and the fatigue resistance The characteristics, conductivity, and stress relaxation resistance (stress relaxation rate) were both good.
Further, when the metal structure had an average area of the flat crystal grains of 3.0 μm 2 or less, even better characteristics were exhibited.

したがって、本発明の銅合金板材は、電気・電子機器用のリードフレーム、コネクタ、端子材等、自動車車載用などのコネクタや、その他のスイッチ、端子材、リレー、ソケットなどに適した銅合金板材として提供することができる。   Therefore, the copper alloy plate material of the present invention is suitable for use in connectors for automobiles and other switches, terminal materials, relays, sockets, etc. Can be offered as.

これに対し、表1及び表2−2に示す比較例1〜比較例21では、本発明で規定する合金組成、金属組織及び製造方法のいずれか1つ以上を満たさなかった。
その結果、表2−2に示すように、全ての比較例の試料について少なくともいずれか1つの特性が劣る結果となった。
On the other hand, in Comparative Examples 1 to 21 shown in Table 1 and Table 2-2, any one or more of the alloy composition, metal structure, and manufacturing method defined in the present invention were not satisfied.
As a result, as shown in Table 2-2, at least one of the characteristics of the samples of all the comparative examples was inferior.

すなわち、比較例1は、実施例2と同じ組成であって合金組成は本発明の規定を満たす。しかし、その製造方法は、冷間圧延1[工程2]も予備焼鈍[工程3]も本発明で規定する条件を外れていた。比較例1は、組織中の扁平粒の制御が不十分であって、組織中の扁平粒の密度と、隣接する結晶粒界のずれ角が30°以上の結晶粒界の長さ(前記粒界のずれ角が大きい結晶粒界の長さ)のいずれも制御が不十分で大きすぎたため、TD方向のヤング率、たわみ係数が劣った。比較例1は、耐応力緩和特性にも劣った。
比較例2は、実施例1、3と同じ組成であって合金組成は本発明の規定を満たす。しかし、その製造方法は、冷間圧延1[工程2]も予備焼鈍[工程3]も本発明で規定する条件を外れていた。比較例2は、組織中の扁平粒の制御が不十分であって、組織中の扁平粒の密度と、粒界のずれ角が大きい結晶粒界の長さのいずれも制御が不十分で大きすぎたため、TD方向のヤング率、たわみ係数が劣った。比較例2は、耐応力緩和特性にも劣った。
That is, Comparative Example 1 has the same composition as Example 2, and the alloy composition satisfies the provisions of the present invention. However, in the manufacturing method, neither cold rolling 1 [Step 2] nor pre-annealing [Step 3] deviated from the conditions defined in the present invention. In Comparative Example 1, the control of the flat grains in the structure is insufficient, and the density of the flat grains in the structure and the length of the grain boundaries where the deviation angle between adjacent grain boundaries is 30 ° or more (the above-mentioned grains Since all of the grain boundary lengths with large boundary deviation angles were not sufficiently controlled and too large, the Young's modulus in the TD direction and the deflection coefficient were inferior. Comparative Example 1 was also inferior in stress relaxation resistance.
Comparative Example 2 has the same composition as Examples 1 and 3, and the alloy composition satisfies the provisions of the present invention. However, in the manufacturing method, neither cold rolling 1 [Step 2] nor pre-annealing [Step 3] deviated from the conditions defined in the present invention. In Comparative Example 2, the control of the flat grains in the structure is insufficient, and the density of the flat grains in the structure and the length of the crystal grain boundary where the deviation angle of the grain boundary is large are insufficient and large. Therefore, the Young's modulus in the TD direction and the deflection coefficient were inferior. Comparative Example 2 was also inferior in stress relaxation resistance.

比較例3、13は、いずれも合金組成は本発明の規定を満たす。しかし、その製造方法は、冷間圧延1[工程2]が本発明で規定する条件を外れていた。比較例3、13は、いずれも組織中の扁平粒の制御が不十分であって、組織中の扁平粒の密度が制御が不十分で大きすぎたため、TD方向のヤング率、たわみ係数が劣った。比較例13は、耐応力緩和特性にも劣った。また、比較例3では、粒界のずれ角が大きい結晶粒界の長さも制御が不十分で大きすぎた。
比較例4〜6は、いずれも合金組成は本発明の規定を満たす。しかし、その製造方法は、冷間圧延1[工程2]も予備焼鈍[工程3]も本発明で規定する条件を外れていた。比較例4〜6は、いずれも組織中の扁平粒の制御が不十分であって、組織中の扁平粒の密度と、粒界のずれ角が大きい結晶粒界の長さのいずれも制御が不十分で大きすぎたため、TD方向のヤング率、たわみ係数が劣った。比較例4〜5は、TD方向の耐力にも劣った。比較例5、6は、耐応力緩和特性にも劣った。
比較例7は、実施例4と同じ組成であって合金組成は本発明の規定を満たす。しかし、その製造方法は、冷間圧延1[工程2]は行わなかった。比較例7は、組織中の扁平粒の制御が不十分であって、組織中の扁平粒の密度と、粒界のずれ角が大きい結晶粒界の長さのいずれも制御が不十分で大きすぎたため、TD方向のヤング率、たわみ係数、耐疲労特性が劣った。
In Comparative Examples 3 and 13, the alloy composition satisfies the provisions of the present invention. However, the manufacturing method was outside the conditions prescribed in the present invention by cold rolling 1 [step 2]. In Comparative Examples 3 and 13, since the control of the flat particles in the tissue was insufficient and the density of the flat particles in the tissue was insufficient and too large, the Young's modulus and the deflection coefficient in the TD direction were inferior. It was. Comparative Example 13 was also inferior in stress relaxation resistance. In Comparative Example 3, the length of the crystal grain boundary having a large grain boundary shift angle was too large due to insufficient control.
In Comparative Examples 4 to 6, the alloy composition satisfies the provisions of the present invention. However, in the manufacturing method, neither cold rolling 1 [Step 2] nor pre-annealing [Step 3] deviated from the conditions defined in the present invention. In each of Comparative Examples 4 to 6, the control of the flat grains in the structure is insufficient, and the density of the flat grains in the structure and the length of the crystal grain boundary where the deviation angle of the grain boundary is large are controlled. Since it was insufficient and too large, the Young's modulus in the TD direction and the deflection coefficient were inferior. Comparative Examples 4 to 5 were inferior in yield strength in the TD direction. Comparative Examples 5 and 6 were also inferior in stress relaxation resistance.
Comparative Example 7 has the same composition as Example 4, and the alloy composition satisfies the provisions of the present invention. However, the manufacturing method did not perform cold rolling 1 [step 2]. In Comparative Example 7, the control of the flat grains in the structure is insufficient, and the density of the flat grains in the structure and the length of the crystal grain boundary where the deviation angle of the grain boundary is large are insufficient and large. As a result, the Young's modulus in the TD direction, the deflection coefficient, and the fatigue resistance were inferior.

比較例8〜10は、いずれも合金組成は本発明の規定を満たす。しかし、その製造方法は、冷間圧延1[工程2]と予備焼鈍[工程3]のいずれも行わなかった。比較例8〜10は、いずれも組織中の扁平粒の制御が不十分であって、組織中の扁平粒の密度と、粒界のずれ角が大きい結晶粒界の長さのいずれも制御が不十分で大きすぎたため、TD方向のヤング率、たわみ係数が劣った。比較例8は、耐応力緩和特性にも劣った。比較例10は、耐疲労特性にも劣った。
比較例11は、実施例5と同じ組成であって合金組成は本発明の規定を満たす。しかし、その製造方法は、冷間圧延1[工程2]と予備焼鈍[工程3]のいずれも行わなかった。比較例11は、組織中の扁平粒の制御が不十分であって、組織中の扁平粒の密度と、粒界のずれ角が大きい結晶粒界の長さのいずれも制御が不十分で大きすぎたため、TD方向のヤング率、たわみ係数、耐疲労特性が劣った。比較例11は、耐応力緩和特性にも劣った。
In Comparative Examples 8 to 10, the alloy composition satisfies the provisions of the present invention. However, the manufacturing method did not perform either cold rolling 1 [Step 2] or pre-annealing [Step 3]. In each of Comparative Examples 8 to 10, the control of the flat grains in the structure is insufficient, and the density of the flat grains in the structure and the length of the crystal grain boundary where the deviation angle of the grain boundary is large are controlled. Since it was insufficient and too large, the Young's modulus in the TD direction and the deflection coefficient were inferior. Comparative Example 8 was also inferior in stress relaxation resistance. Comparative Example 10 was also inferior in fatigue resistance.
Comparative Example 11 has the same composition as Example 5, and the alloy composition satisfies the provisions of the present invention. However, the manufacturing method did not perform either cold rolling 1 [Step 2] or pre-annealing [Step 3]. In Comparative Example 11, the control of the flat grains in the structure is insufficient, and the density of the flat grains in the structure and the length of the crystal grain boundary where the deviation angle of the grain boundary is large are insufficient and large. As a result, the Young's modulus in the TD direction, the deflection coefficient, and the fatigue resistance were inferior. Comparative Example 11 was also inferior in stress relaxation resistance.

比較例12は、合金組成は本発明の規定を満たす。しかし、その製造方法は、冷間圧延1[工程2]も予備焼鈍[工程3]も本発明で規定する条件を外れていた。比較例12は、組織中の扁平粒の制御が不十分であって、組織中の扁平粒の密度と、粒界のずれ角が大きい結晶粒界の長さのいずれも制御が不十分で大きすぎたため、TD方向のヤング率、たわみ係数、耐疲労特性が劣った。
比較例14は、合金組成は本発明の規定を満たす。しかし、その製造方法は、予備焼鈍[工程3]は行わなかった。比較例14は、組織中の扁平粒の制御が不十分であって、粒界のずれ角が大きい結晶粒界の長さの制御が不十分で大きすぎたため、TD方向のヤング率、たわみ係数、耐疲労特性が劣った。比較例14は、導電性にも劣った。
In Comparative Example 12, the alloy composition satisfies the provisions of the present invention. However, in the manufacturing method, neither cold rolling 1 [Step 2] nor pre-annealing [Step 3] deviated from the conditions defined in the present invention. In Comparative Example 12, the control of the flat grains in the structure is insufficient, and the density of the flat grains in the structure and the length of the crystal grain boundary where the deviation angle of the grain boundary is large are insufficient and large. As a result, the Young's modulus in the TD direction, the deflection coefficient, and the fatigue resistance were inferior.
In Comparative Example 14, the alloy composition satisfies the provisions of the present invention. However, the manufacturing method did not perform pre-annealing [Step 3]. In Comparative Example 14, since the control of flat grains in the structure was insufficient and the control of the length of the crystal grain boundary with a large grain boundary shift angle was insufficient and too large, the Young's modulus in the TD direction, the deflection coefficient The fatigue resistance was inferior. Comparative Example 14 was also inferior in conductivity.

比較例15は、冷間圧延1[工程2]と予備焼鈍[工程3]と組織は、本発明の規定を満たしているが、副添加元素の合計含有量が多すぎて合金組成が本発明例の規定を満たさず、導電率が劣った。
比較例16〜21は、冷間圧延1[工程2]と予備焼鈍[工程3]を含む製造方法は、本発明の規定を満たしているが、NiとSiのいずれかもしくは両方の含有量が多すぎ又は少なすぎて合金組成が本発明例の規定を満たさず、得られた組織の内、扁平粒の密度が高すぎて本発明の規定を満たさず、また、TDの耐力、耐疲労特性、導電率、耐応力緩和特性の内で1つ以上の特性が劣った。
In Comparative Example 15, the cold rolling 1 [Step 2], the pre-annealing [Step 3] and the structure satisfy the provisions of the present invention, but the total content of the secondary additive elements is too large, and the alloy composition is the present invention. The regulation of the example was not satisfied and the conductivity was inferior.
In Comparative Examples 16 to 21, the manufacturing method including cold rolling 1 [Step 2] and pre-annealing [Step 3] satisfies the provisions of the present invention, but the content of either or both of Ni and Si is Too much or too little alloy composition does not satisfy the provisions of the present invention example, and the density of flat grains in the obtained structure is too high to satisfy the provisions of the present invention, and TD yield strength and fatigue resistance characteristics One or more of the conductivity and stress relaxation resistance properties were inferior.

特に、比較例13では、±TD方向30°以内を向いたアスペクト比0.3以下の扁平粒の密度が0.03個/μmを超える値であるが、一方で、隣接する結晶粒界のずれ角が30°以上の結晶粒界の単位面積あたりの長さが0.8μm/μm以下であったが、得られたTD方向のヤング率が128GPaであった。また、比較例14では、±TD方向30°以内を向いたアスペクト比0.3以下の扁平粒の密度が0.03個/μm以下であるが、一方で、隣接する結晶粒界のずれ角が30°以上の結晶粒界の単位面積あたりの長さが0.8μmを超える値であったが、得られたTD方向のヤング率が127GPaであった。これらの比較例13と14では、ヤング率の低下は認められるものの、扁平粒の密度とずれ角30°以上の結晶粒界の長さがいずれも本発明の規定内であった各実施例とは異なり、所望の低いTD方向のヤング率、125GPa以下は達成できなかった。
よって、組織中の扁平粒の密度、隣接する結晶粒界のずれ角が30°以上の結晶粒界の長さの2つを適正に制御した組織とすることで、TD方向のヤング率、耐疲労特性などの所望の特性を満たすことができることが分かる。
In particular, in Comparative Example 13, the density of flat grains having an aspect ratio of 0.3 or less oriented within 30 ° in the ± TD direction is a value exceeding 0.03 particles / μm 2. The length per unit area of the crystal grain boundary having a deviation angle of 30 ° or more was 0.8 μm / μm 2 or less, but the obtained Young's modulus in the TD direction was 128 GPa. In Comparative Example 14, the density of flat grains having an aspect ratio of 0.3 or less that face within ± TD direction of 30 ° is 0.03 particles / μm 2 or less. Although the length per unit area of the crystal grain boundary having an angle of 30 ° or more exceeded 0.8 μm, the obtained Young's modulus in the TD direction was 127 GPa. In these comparative examples 13 and 14, although a decrease in Young's modulus was observed, the density of the flat grains and the length of the crystal grain boundary with a deviation angle of 30 ° or more were all within the limits of the present invention. In contrast, the desired low Young's modulus in the TD direction, 125 GPa or less, could not be achieved.
Therefore, by making the structure in which the density of the flat grains in the structure and the length of the crystal grain boundary where the deviation angle between adjacent crystal grain boundaries is 30 ° or more are appropriately controlled, the Young's modulus in the TD direction, It can be seen that desired characteristics such as fatigue characteristics can be satisfied.

1 試験片
2 ナイフエッジ
3 固定具
11 試験片(片持ちで保持した状態)
12 試験片(除荷後の状態)
13 試験片(応力を負荷しなかった状態)
14 試験台
DESCRIPTION OF SYMBOLS 1 Test piece 2 Knife edge 3 Fixing tool 11 Test piece (The state hold | maintained by the cantilever)
12 Test piece (state after unloading)
13 Specimens (without stress)
14 Test stand

Claims (5)

Niを1.0〜5.0質量%、Siを0.1〜2.0質量%、並びにBを0.10質量%以下、Mgを1.80質量%以下、Pを0.05質量%以下、Crを0.50質量%以下、Mnを0.16質量%以下、Feを0.05質量%以下、Coを0.05質量%以下、Znを0.51質量%以下、Zrを0.10質量%以下、Agを0.05質量%以下及びSnを0.50質量%以下からなる群から選ばれる少なくとも1種を合計で0.1〜3.0質量%含有し、残部が銅及び不可避不純物からなる銅合金板材であって、
圧延面における解析で、結晶粒の短径/長径の比で表わされるアスペクト比が0.3以下の結晶粒であり、かつ、TD方向から±30°以内を向いた結晶粒について、前記結晶粒の密度が0.030個/μm以下であり、
かつ、隣接する結晶粒間のずれ角が30°以上である結晶粒界の単位面積あたりの長さが0.8μm/μm以下であることを特徴とする銅合金板材
Ni is 1.0 to 5.0 mass%, Si is 0.1 to 2.0 mass%, B is 0.10 mass% or less, Mg is 1.80 mass% or less, and P is 0.05 mass%. Hereinafter, Cr is 0.50 mass% or less, Mn is 0.16 mass% or less, Fe is 0.05 mass% or less, Co is 0.05 mass% or less, Zn is 0.51 mass% or less, and Zr is 0 .10% by mass or less, Ag is 0.05% by mass or less, and Sn is contained in a total of 0.1 to 3.0% by mass selected from the group consisting of 0.50% by mass or less, and the balance is copper. And a copper alloy sheet made of inevitable impurities,
In the analysis on the rolling surface, the crystal grains having an aspect ratio represented by the ratio of the minor axis / major axis of the crystal grains of 0.3 or less and oriented within ± 30 ° from the TD direction Density of 0.030 pieces / μm 2 or less,
And the length per unit area of the crystal grain boundary whose deviation angle | corner between adjacent crystal grains is 30 degrees or more is 0.8 micrometer / micrometer < 2 > or less, The copper alloy board | plate material characterized by the above-mentioned .
板材に一定の応力を加えた際の変位量を示す、引張試験で測定した、TD方向のヤング率が125GPa以下であり、たわみ試験で測定したTD方向のたわみ係数が115GPa以下、TD方向の耐力が600MPa以上であり、導電率が20%IACS以上であり、かつ、耐応力緩和特性として150℃で1000時間保持後の応力緩和率(SR)が20%以下である請求項1に記載の銅合金板材。 The Young's modulus in the TD direction measured by a tensile test is 125 GPa or less, the deflection coefficient measured in the deflection test is 115 GPa or less, and the yield strength in the TD direction is measured by a tensile test. 2. The copper according to claim 1, which has a stress relaxation rate (SR) of 20% or less after holding at 150 ° C. for 1000 hours as stress relaxation resistance. Alloy plate material. 板バネ疲労試験による耐疲労特性が、負荷応力500MPa以上で、繰り返し回数が10回以上である請求項1又は2に記載の銅合金板材。 3. The copper alloy sheet according to claim 1, wherein the fatigue resistance characteristic by a leaf spring fatigue test is a load stress of 500 MPa or more and a repetition count of 10 6 times or more. Niを1.0〜5.0質量%、Siを0.1〜2.0質量%、並びにBを0.10質量%以下、Mgを1.80質量%以下、Pを0.05質量%以下、Crを0.50質量%以下、Mnを0.16質量%以下、Feを0.05質量%以下、Coを0.05質量%以下、Znを0.51質量%以下、Zrを0.10質量%以下、Agを0.05質量%以下及びSnを0.50質量%以下からなる群から選ばれる少なくとも1種を合計で0.1〜3.0質量%含有し、残部が銅及び不可避不純物からなる銅合金板材を製造する方法であって、前記銅合金板材を与える合金成分組成から成る銅合金素材に、
鋳造[工程1]、
加工率10%以下の冷間圧延1[工程2]、
保持温度300〜700℃で保持時間1分〜5時間の予備焼鈍[工程3]、
保持温度700℃以上で5分〜20時間の均質化熱処理[工程4]、
熱間圧延[工程5]、
水焼入れ[工程6]、
面削[工程7]、
50%以上の加工率の冷間圧延2[工程8]、
昇温速度5〜15℃/秒、保持温度300〜700℃、保持時間1秒〜10時間の中間溶体化熱処理[工程9]、
10〜99%の加工率の冷間圧延3[工程10]、
到達温度700〜1020℃、保持時間1秒〜60秒の溶体化熱処理[工程11]、
保持温度300〜600℃、保持時間10分〜20時間の時効析出熱処理[工程12]、
酸洗[工程13]、及び
圧延加工率8〜80%の仕上げ冷間圧延[工程14]
の各工程をこの順に施すことを特徴とする請求項1〜のいずれか1項に記載の銅合金板材を製造する方法
Ni is 1.0 to 5.0 mass%, Si is 0.1 to 2.0 mass%, B is 0.10 mass% or less, Mg is 1.80 mass% or less, and P is 0.05 mass%. Hereinafter, Cr is 0.50 mass% or less, Mn is 0.16 mass% or less, Fe is 0.05 mass% or less, Co is 0.05 mass% or less, Zn is 0.51 mass% or less, and Zr is 0 .10% by mass or less, Ag is 0.05% by mass or less, and Sn is contained in a total of 0.1 to 3.0% by mass selected from the group consisting of 0.50% by mass or less, and the balance is copper. And a method for producing a copper alloy plate material made of inevitable impurities, the copper alloy material comprising an alloy component composition that gives the copper alloy plate material,
Casting [process 1],
Cold rolling 1 with a processing rate of 10% or less [Step 2],
Pre-annealing at a holding temperature of 300 to 700 ° C. and a holding time of 1 minute to 5 hours [Step 3],
Homogenization heat treatment at a holding temperature of 700 ° C. or higher for 5 minutes to 20 hours [Step 4],
Hot rolling [step 5],
Water quenching [Step 6],
Chamfering [process 7],
Cold rolling 2 with a processing rate of 50% or more [Step 8],
Intermediate solution heat treatment [Step 9] with a temperature rising rate of 5 to 15 ° C./second, a holding temperature of 300 to 700 ° C., and a holding time of 1 second to 10 hours,
Cold rolling 3 [Process 10] with a processing rate of 10 to 99%,
Solution heat treatment [step 11] having an ultimate temperature of 700 to 1020 ° C. and a holding time of 1 second to 60 seconds,
Aging precipitation heat treatment [Step 12] with a holding temperature of 300 to 600 ° C. and a holding time of 10 minutes to 20 hours,
Pickling [Step 13] and finish cold rolling with a rolling rate of 8 to 80% [Step 14]
Each method of these is performed in this order, The method of manufacturing the copper alloy board | plate material of any one of Claims 1-3 characterized by the above-mentioned .
前記仕上げ冷間圧延[工程14]の後で、保持温度300〜600℃、保持時間1秒〜60秒の歪取り焼鈍[工程15]を施す請求項に記載の銅合金板材の製造方法。
5. The method for producing a copper alloy sheet according to claim 4 , wherein after the finish cold rolling [Step 14], strain relief annealing [Step 15] is performed at a holding temperature of 300 to 600 ° C. and a holding time of 1 second to 60 seconds.
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