JP5976750B2 - Transparent substrate surface pattern defect measuring device - Google Patents

Description

  The present invention relates to a surface pattern defect measuring apparatus for a transparent substrate, and a material having low reflectivity is patterned on the transparent substrate, and even if the difference in reflectivity between the transparent substrate and the patterned material is not large, The degree of reflection of the pattern material is relatively increased by bringing the degree close to 0, and the reflection contrast between the pattern material and the transparent substrate is increased to measure the surface pattern with increased detection accuracy, It is a device that measures the presence or absence of defects.

  FIG. 1 is a conceptual diagram of a general scanning apparatus.

  The scanning apparatus shown in FIG. 1 forms a focal point on a laser oscillation unit 10 that oscillates a laser, a beam division unit 90 that divides a beam, a scanner 20 that is rotatably provided around one vertex, and a target plane TP. For this purpose, it includes a condensing lens 7 that transmits and collects parallel laser beams whose traveling directions are adjusted by the scanner 10.

  In such a scanning method of the scanning device, a laser R1 scanned from the laser oscillation unit 1 (hereinafter, mixed with “laser beam R1”) is partially transmitted in the y-axis direction by the beam splitting unit 90 and remains. Is reflected in the positive z-axis direction. The laser R2 transmitted through the beam splitting unit 90 is reflected by the scanner 10 to the multipath beams R3, R4, and F5. The multipath beams R3, R4, and F5 are converted into parallel beams R6, R7, and R8 by the condenser lens 20, and a focal point is formed on the target plane TP. The beam reflected by the target plane forms a path up to the beam splitting unit 90 (paths R6, R7, R8, path R3, R4, F5, path R2). The light is reflected in the negative z-axis direction and reaches the detection unit 6.

  The detection unit 6 measures the image by measuring the intensity of the laser beam reflected and returned. In general, the reflectivity of glass or transparent film is not 0%, and has a low value but a low value. A material having low reflectivity (hereinafter referred to as a “pattern material”) such as ITO, graphene, carbon nanotube (CNT), and silver nanowire can be patterned on a transparent substrate such as glass or a transparent film. . Such a pattern material has a small difference in reflectivity of the transparent substrate, and the contrast between the light and the dark is greatly reduced at the time of measurement, so that the detection accuracy is lowered. Accordingly, when the difference in reflectivity is not large like the transparent substrate and the pattern material, it is necessary to relatively increase the contrast between light and dark.

  The present invention maximizes the reflectivity of a transparent substrate in order to distinguish a material such as a transparent electrode that does not have a large refractive index difference between a transparent substrate such as glass and a transparent substrate formed on the surface of the transparent substrate. An object of the present invention is to provide a device that increases the contrast between light and darkness (reflectance) between the two materials to be compared.

  The surface pattern defect measuring apparatus according to the present invention is a stage in which a transparent substrate having a pattern of a different substance is disposed on the upper surface, and the light having an electric field parallel to the transparent substrate (p-polarized light) is directed toward the transparent substrate. The irradiation unit for irradiating the p-polarized light and the p-polarized light are reflected by the transparent substrate so as to be incident at a Brewster angle based on the refractive index of the transparent substrate and the refractive index of the medium in contact with the transparent substrate. It may include a detection unit that determines whether or not to be performed.

  The apparatus for measuring a defective pattern of a transparent substrate according to the present invention can remove light reflected from any one of materials having a large difference in reflectivity, thereby increasing the contrast between the two materials. Thereby, the pattern of a transparent substrate can be imaged or a pattern defect can be measured easily.

It is a conceptual diagram of a general scanning device. It is a block diagram of the surface pattern measurement apparatus by one Embodiment of this invention. It is a perspective view of the surface pattern measurement apparatus by other embodiment of this invention. It is a perspective view of the surface pattern measurement apparatus by further another embodiment of this invention. It is a perspective view of the surface pattern measurement apparatus by further another embodiment of this invention. It is a perspective view of the surface pattern measurement apparatus by further another embodiment of this invention.

  The terms such as “first” and “second” are used to describe various components, but the components are not limited by the terms. The terms are used only for the purpose of distinguishing one component from another. For example, a first component is named a second component without departing from the scope of the present invention, and similarly, a second component is also named a first component. The term “and / or” includes any combination of a plurality of related description items or a plurality of related description items.

  When a component is referred to as being “coupled” or “connected” to another component, not only is it directly coupled or connected to the other component, but also an intermediate It must be understood that other components may exist. On the other hand, if a component is referred to as being “directly connected” or “directly connected” to another component, it must be understood that there is no other component in between. Don't be. In addition, the fact that the first component and the second component on the network are connected or connected means that data is transmitted and received between the first component and the second component by wire or wireless. It means that you can.

  In addition, the suffixes “system”, “module”, and “part” for the components used in the following description are simply given in consideration of the convenience at the time of preparing this specification, and as such, It does not give any special significance or role. Accordingly, the “system”, “module”, and “part” may be used in combination with each other. Such components can be combined into two or more components as needed, or one component can be subdivided into two or more components as needed when actual application is realized. Sometimes configured.

  In this description, the optical system can be a single optical device or a combination of a plurality of optical devices. In addition, whatever optical system belongs to any optical system, this is for convenience of description, and the certain optical apparatus can constitute an independent system separately. Thus, the following description will be made without particularly mentioning what optical system each optical apparatus belongs to.

  The transverse mode means an axis along which light travels, that is, a cross section of light that is perpendicular to the optical axis. The transverse mode component means a uniaxial light component in the light cross section. The first and second transverse mode directions are preferably perpendicular to each other. Hereinafter, the “first transverse mode direction” is an arbitrary axis perpendicular to the optical axis, and one of the first axis, the first direction, and the (x, y, z) axis, or the direction thereof, horizontal In addition, any one of the vertical axis and the vertical direction, the vertical direction, the horizontal direction, and the like will be described. In particular, in relation to the vertical direction (vertical direction) and the horizontal direction (horizontal direction), the vertical direction is the normal direction of the plane of the laser beam path, and the horizontal direction is the vertical direction and the laser beam path direction, respectively. It can mean a direction that is vertical or the direction can be determined in relation to the ground. At the same time, “first transverse mode” means that the first axis (direction) component has the largest component. The first transverse mode component can also be referred to as a first component.

  The cylinder type optical system may include a cylinder type optical device. A cylinder type optical device means an optical device having a curvature only in one direction and transmitting or reflecting an incident beam so as to be condensed or diffused only in a one-dimensional direction. The cylinder type lens means a transmission type, and the cylinder type mirror means a reflection type. The cylinder type lens may have various shapes. For example, only one side surface may have a curvature (incident surface or exit surface), or both side surfaces (incident surface and exit surface) may have curvature.

  Hereinafter, embodiments of the present invention will be described in detail with reference to the drawings.

  FIG. 2 is a block diagram of a surface pattern measuring apparatus according to an embodiment of the present invention.

  Referring to FIG. 2, the surface pattern measurement apparatus according to the present embodiment has a substrate formed with a pattern made of a different material on the upper surface, a stage 50 that moves the substrate, and an irradiation unit 1 that irradiates the stage 50 with light. , And a detector 2 that detects light emitted from the stage 50 when the light irradiated from the irradiation unit 1 is reflected.

  The substrate may be a transparent substrate made of a material such as glass or a transparent film. The material patterned on the substrate may be formed of a highly transparent material such as ITO, graphene, carbon nanotube (CNT), silver nanowire, or a combination thereof. That is, the substrate and the patterned material (pattern material) have a small difference in reflectivity and transparency (refractive index). The reflectivity of the substrate may be 5-15%, and the reflectivity of the pattern material may be 8-25%. Even if the difference in reflectance between the substrate and the pattern material is within 10%, the surface pattern measuring apparatus according to the present invention can distinguish the pattern material from the substrate. In addition, the surface pattern measuring apparatus according to the present invention can measure even if there is a difference that the reflectivity of the pattern material and the substrate is not substantially the same. In particular, the device according to the present invention can distinguish between the pattern material and the substrate even if the difference in reflectance between the two materials is 1% inside or outside. The reflectivity mentioned in the text means the reflectivity by normal incidence.

  The irradiation unit 1 can include a laser light source or an LED light source to emit light. The irradiation unit 1 may further include a line beam generation unit that shapes a point light source type laser light source into a line beam form. The line beam generator may include a scanner. The LED light source of the irradiating unit 1 may be included in the irradiating unit 1 so as to emit in the form of a line beam or to form a LED light source into a line beam. The molding unit can include a cylinder type optical system.

  The irradiation unit 1 can irradiate the stage 50 with light that is p-polarized with respect to the substrate or the stage 50. The p-polarized light means light parallel to the plane of the stage 50 on which an electric field is incident. In order to irradiate p-polarized light, the irradiating unit 1 can be provided with a polarizer that allows only p-polarized light to pass through the emitted light emitted from the light source or p-polarizes the irradiated light. The polarizer may include a polarizing film (filter) that allows only p-polarized light to pass therethrough or a wave plate that changes the polarization state of the passing light. In the case of a general light source that is not a laser light source, the polarizer preferably includes a polarizing film. The wave plate is also called a phase retarder. If the electromagnetic wave passes through the wave plate, the polarization direction becomes the sum of the component parallel to the optical axis and the component perpendicular to the optical axis, and the vector sum of the two components changes depending on the birefringence and thickness of the wave plate. Later polarization direction changes. Irradiation light may be polarized in a certain direction (laser light source), or polarized in a certain direction by a polarizing film (general light source), and then transformed into p-polarized light with respect to the substrate by a wave plate. The phase change rate of light passing through the wave plate can vary depending on the polarization direction of light incident on the wave plate and the relationship with the substrate.

  The irradiation unit 1 is a polarization angle (Brewster angle) based on the refractive index of the substrate and the refractive index of a medium (generally air) in contact with the substrate, with light parallel to the substrate (hereinafter referred to as p-polarized light). It can be incident on. The light irradiated to the substrate has a reflectivity of 0 or close to 0, and the reflection is substantially eliminated.

  The detection unit 2 is arranged in the reflection path of the light emitted from the stage 50 so as to be coupled to the reflected light, and can detect the reflected light. The detection unit 2 may include a PMT (photomultiplier tube), a photodiode, a CCD array, or the like in order to measure light.

  In this embodiment, the light irradiated on the substrate is not reflected, and the light irradiated on the pattern material is reflected. Therefore, the detection unit 2 can determine the presence / absence of reflected light to determine the presence / absence of a pattern substance or the presence / absence of a pattern defect.

The pattern material is more transparent and the intensity of the reflected light from the pattern material is small. However, since the detection unit 2 only needs to detect the presence or absence of reflected light, that is, since the contrast ratio of light and dark is high, even if the intensity of reflected light is low, it is possible to easily detect two contrasted substances. Can do. The detection unit 2 can include an amplification unit that amplifies the intensity of the detected signal.
The detection unit 2 may further include a filter that transmits only p-polarized light. Noise can be removed and improved detectability can be derived.

  In the present embodiment, it has been described that the incident angle incident on the stage 50 by the irradiating unit 1 is determined by the refractive index of the substrate and the refractive index of the medium in contact therewith, but is not limited thereto. For example, the incident angle can be a Brewster angle depending on the refractive index of the patterned material and the refractive index of the medium in contact therewith. In this case, the light irradiated to the patterned substance is not reflected.

  The surface pattern measurement apparatus according to the present embodiment is not limited to the surface measurement of a substrate on which a pattern material is formed. For example, the presence or absence of defects such as contaminants and scratches formed on the surface of the substrate can be measured.

  FIG. 3 is a perspective view of a surface pattern defect measuring apparatus according to another embodiment of the present invention. Please refer to FIG.

  Referring to FIG. 3, the surface pattern defect measuring apparatus includes a stage 50 on which a substrate having a low reflectivity is formed, a substrate having a reflectivity different from the formed material, and a laser light source that emits a laser beam. 10. Polarizer 30 for p-polarizing the laser beam with respect to the stage 50. Reflected by the scanner 20 for reflecting the incident laser beam so that the path is continuously changed at a constant radiation angle by the scanner control signal. A first target lens 110 that changes the laser beam into a parallel path beam, a first light receiving lens 210 that receives the laser beam reflected by the stage 50, and a beam detector that detects the presence or absence of the reflected beam.

  The substrate may be a transparent substrate made of a material such as glass or a transparent film. The material patterned on the substrate may be formed of a highly transparent material such as ITO, graphene, carbon nanotube (CNT), or silver nanowire. That is, the substrate and the patterned material (pattern material) have a small difference in reflectivity and transparency (refractive index).

  The laser light source 10 can oscillate a laser beam that is substantially parallel or converges. The beam emitted from the laser light source 10 is preferably linearly polarized in any one direction.

  The polarizer 30 can p-polarize the transmitted laser beam with respect to the stage 50. In general, since the laser beam emitted from the laser light source 10 is linearly polarized in one direction, the polarizer 30 preferably includes a wave plate that changes the polarization state of the incident beam. The polarizer 30 may include a p-polarizer that transmits only the p-polarized beam of the incident laser beam to the stage 50.

  In the present embodiment, the polarizer 30 is arranged on a path through which the beam emitted from the laser light source 10 enters the scanner 20, but is not limited to this. For example, you may arrange | position in the path | route where the beam which injected into the scanner 20 is reflected.

  The scanner 20 can deflect a laser beam incident by a scanner control signal provided from a control device (not shown) so that the path is continuously changed within a certain radiation angle. In FIG. 3, the number of reflection paths is three. However, although not illustrated, various reflection paths may exist. A reflected beam that is reflected by the scanner 20 and whose path is continuously changed at a constant radiation angle is referred to as a radiation multipath (laser) beam or a deflected (laser) beam.

  The scanner 20 may include a galvanometer, a polygon mirror, a resonant scanner, an acoustic-optic deflector, and the like. The scanner 20 can be turned on / off by a scanner control signal, or the deflection cycle can be changed.

  The first target lens 110 is disposed on a path along which the multipath beam from the scanner 20 travels. The first target lens 110 can change the multipath beam from the scanner 20 into a parallel multipath beam (line beam) that travels in parallel paths. For this reason, when the focal point of the first target lens 110 is f, the distance between the first target lens 110 and the scanner 20 is preferably f. The parallel multipath beam can form a scan line SL in a partial region of the target (transparent substrate and transparent pattern) on the stage 50.

  The beam path length between the first target lens 110 and the transparent substrate pattern is preferably the focal length f of the first target lens 110. This is because the intensity of the reflected light increases only when the focal point of the beam incident on the pattern is formed by the pattern. Since the height of the pattern is very small, it is desirable that the beam path length between the first target lens 110 and the transparent substrate is f. The first target lens 110 may be a spherical convex lens or a cylindrical convex lens.

  The first light receiving lens 210 can refract the incident parallel multipath beam to a specific position. The first light receiving lens 210 is a spherical convex lens or a cylindrical convex lens, and the type is preferably the same as the first target lens 110. For example, if the first target lens 110 is a spherical convex lens, the first light receiving lens 210 can also be configured by a spherical convex lens.

  The detection unit is disposed at a focal position in the transmission surface direction of the first light receiving lens. The detection unit can include a beam detector 220 that detects the presence or absence of a beam reflected from the scan line SL on the stage 50. The detection unit may further include a noise removing p-polarization filter 230 that transmits only the p-polarized beam of the beam incident on the beam detector 220 with respect to the stage 50.

  In this embodiment, the linearly polarized laser beam oscillated from the laser light source 10 is p-polarized with respect to the stage 50 through the polarizer 30. The p-polarized beam is reflected by the scanner 20 into a radiating multipath beam, which passes through the first object lens 110 and becomes a parallel multipath beam that reaches the target on the stage 50. A scan line SL can be formed. Of the scan line SL, the beam incident on the transparent substrate region is not reflected, and of the scan line SL, the beam incident on the pattern material region is reflected and proceeds to the first light receiving lens 210. The first light receiving lens 210 couples the beam incident from the scan line SL to the detection unit. The beam detector 220 can detect the presence or absence of a beam that has passed through the p-polarization filter 230 and extract a pattern image or measure the presence or absence of a pattern defect.

  4 and 5 are perspective views of a surface pattern measuring apparatus according to still another embodiment of the present invention. Please refer to FIG. 2 and FIG. Detailed description of the corresponding components is omitted.

  Referring to FIGS. 4 and 5, the surface pattern measuring apparatus includes a stage 50 on which a substrate having a pattern on which substances having different reflectivities are formed is disposed on the upper surface, a laser light source 10 that emits a laser beam, and a laser beam on the stage. Polarizer 30 for p-polarizing with respect to 50, scanner 20 for reflecting the incident laser beam so that the path is continuously changed at a constant radiation angle by the scanner control signal, and the laser beam reflected by scanner 20 in parallel A cylindrical optical system that changes to a path beam, a first light receiving lens 210 that receives a laser beam reflected by the stage 50, and beam detectors 220 and 230 that detect the presence or absence of a reflected beam may be included.

  The substrate may be a transparent substrate made of a material such as glass or a transparent film. The material patterned on the substrate may be formed of a highly transparent material such as ITO, graphene, carbon nanotube (CNT), or silver nanowire. That is, the substrate and the patterned material (pattern material) have a small difference in reflectivity and transparency (refractive index).

  The cylinder type optical system of the surface pattern measuring apparatus shown in FIG. 4 preferably includes a cylinder type concave mirror 120.

  The cylinder type optical system of the surface pattern measuring apparatus shown in FIG. 5 preferably includes a cylinder type concave mirror 120 and a flat mirror 130. The arrangement order of the cylindrical concave mirror and the flat mirror may be changed.

  The spherical lens has a central portion and a contour that are different in thickness. As a result, the degree of polarization of the laser beam passing through the spherical lens becomes non-uniform. That is, it is difficult to make the reflectivity at the scan line SL zero. However, when a cylindrical mirror is used, the polarization non-uniformity due to the difference in the thickness of the medium does not occur.

  In FIG. 4, the linearly polarized laser beam oscillated from the laser light source 10 is p-polarized with respect to the stage 50 through the polarizer 30. The p-polarized beam is reflected by the scanner 20 into a radial multipath beam. The radiating multipath beam is reflected by the cylindrical concave mirror 120 and travels to the parallel multipath beam. Therefore, it is desirable that the beam path length of the scanner 20 and the cylindrical concave mirror 120 is substantially the same as the focal length of the cylindrical concave mirror 120. The parallel multipath beam forms a scan line SL on the target on the stage 50. Of the scan line SL, the beam incident on the transparent substrate region is not reflected, and of the scan line SL, the beam incident on the pattern material region is reflected and proceeds to the first light receiving lens 210. The first light receiving lens 210 couples the beam incident from the scan line SL to the detection unit. The beam detector 220 can detect the presence or absence of a beam that has passed through the p-polarization filter 230 and extract a pattern image.

  In FIG. 5, the linearly polarized laser beam oscillated from the laser light source 10 is p-polarized with respect to the stage 50 through the polarizer 30. The p-polarized beam is reflected by the scanner 20 into a radial multipath beam. The radiating multipath beam is reflected by the cylindrical concave mirror 120 and travels to the parallel multipath beam. Therefore, it is desirable that the beam path length of the scanner 20 and the cylindrical concave mirror 120 is substantially the same as the focal length of the cylindrical concave mirror 120. The flat mirror 130 is reflected so that the beam reflected by the cylindrical concave mirror 120 is directed to the stage 50. In the cylindrical concave mirror 120, the beam is shaped better as the incident angle is smaller. However, if the incident angle is reduced, the arrangement of components will be difficult. Thereby, the arrangement | positioning of a component is further made free using the flat mirror 130. FIG. The parallel multipath beam reflected by the flat mirror 130 forms a scan line SL on the target on the stage 50. Of the scan line SL, the beam incident on the transparent substrate region is not reflected, and of the scan line SL, the beam incident on the pattern material region is reflected and proceeds to the first light receiving lens 210. The first light receiving lens 210 couples the beam incident from the scan line SL to the detection unit. The beam detector 220 can detect the presence or absence of a beam that has passed through the p-polarization filter 230 to detect a pattern image or measure the presence or absence of a pattern defect.

  FIG. 6 is a perspective view of a surface pattern measuring apparatus according to still another embodiment of the present invention. Please refer to FIG.

  Referring to FIG. 6, the surface pattern measuring apparatus includes a stage 50 on which a substrate having a pattern on which substances having different reflectivities are formed, a light source 15 that emits light, and light emitted from the light source 15. , A polarizer 35 that transmits only p-polarized light to the stage 50, a second target lens 115 that collimates the light transmitted through the polarizer 35, a second light receiving lens 215 that receives light by the stage 50, and reflected light It may include a beam detector that detects the presence or absence of.

  The substrate may be a transparent substrate made of a material such as glass or a transparent film. The material patterned on the substrate may be formed of a highly transparent material such as ITO, graphene, carbon nanotube (CNT), or silver nanowire. That is, the substrate and the patterned material (pattern material) have a small difference in reflectivity and transparency (refractive index).

  The light source 15 preferably emits a one-dimensional form of line beam or radiation. In order to emit linebum-shaped light, the light source 15 comprises a number of LEDs, which are arranged in a straight line, or one side is coupled to each of a number of LEDs and the other side is a straight line. Optical fibers arranged on top can be provided. The light source 15 may include a cylinder type optical system, particularly a cylinder type convex lens, in order to form a narrow line beam.

  The polarizer 35 can include a polarizing filter that transmits only light polarized in a certain direction among incident light. The polarizer 35 may further include a wave plate that changes the polarization direction so as to be p-polarized with respect to the stage 50.

  The second target lens 115 changes the radiant light emitted from the light source 15 into parallel light. For this reason, when the focus of the second target lens 115 is f2, the optical path length between the second target lens 115 and the light source 15 is preferably f. The parallel light can form a scan line SL in a partial region of the target (transparent substrate and transparent pattern) on the stage 50. The second target lens 115 may be a spherical convex lens or a cylindrical convex lens.

  The second light receiving lens 215 can refract the incident parallel multipath beam to a specific position. The second light receiving lens 215 may be a spherical convex lens or a cylindrical convex lens. The second light receiving lens 215 is preferably an optical device corresponding to the second target lens 115.

  The detection unit is disposed at a focal position in the transmission surface direction of the first light receiving lens. The detection unit may include a beam detector 225 that detects the presence or absence of a beam reflected from the scan line SL on the stage 50. The detection unit may further include a noise removal p-polarization filter 235 that transmits only the p-polarized beam with respect to the stage 50 among the beams incident on the beam detector 225.

  In the present embodiment, the radiation type light emitted from the light source 15 passes only the p-polarized light with respect to the stage 50 through the polarizer 35. The p-polarized light passes through the second target lens 115 and becomes parallel light, and can form a scan line SL on the target on the stage 50. In the scan line SL, light incident on the transparent substrate region is not reflected, and in the scan line SL, light incident on the pattern material region is reflected and proceeds to the second light receiving lens 215. The second light receiving lens 215 couples the light incident from the scan line SL to the detection unit. The beam detector 225 can detect the presence or absence of light that has passed through the p-polarization filter 235 and extract a pattern image.

  In the above, preferred embodiments of the present invention have been illustrated and described. However, the present invention is not limited to the specific embodiments described above, and those skilled in the art will not depart from the gist of the present invention claimed in the claims. It goes without saying that various modifications can be made according to the above, and such modifications should not be individually understood from the technical idea and perspective of the present invention.

  The present invention is applicable to a technical field related to a surface pattern defect measuring apparatus for a transparent substrate.

DESCRIPTION OF SYMBOLS 1 Irradiation part 2 Detection part 10 Laser light source 15 Light source 20 Scanner 30, 35 Polarizer 50 Stage

Claims (9)

A pattern of a different material is formed, and a substrate having a different reflectivity from the pattern material;
The light having an electric field parallel to the substrate (p-polarized light) is incident on the substrate at a Brewster angle due to a refractive index of the substrate and a refractive index of a medium in contact with the substrate. an irradiation unit for irradiating p-polarized light;
A detection unit for detecting light reflected by the substrate,
The irradiation unit is
A laser light source for emitting a laser beam;
A scanner that reflects the incident laser beam by a scanner control signal so that the path is continuously changed at a constant radiation angle;
Polarized light that is arranged in any one of a path on which the laser beam is incident on the scanner and a path on which the laser beam is reflected by the scanner, and that causes the laser beam to be p-polarized with respect to the substrate And
A cylindrical concave mirror that refracts the p-polarized laser beam in a first direction;
The angle between the first direction and the normal of the substrate is a Brewster angle due to a refractive index of the substrate and a medium in contact with the substrate,
The cylindrical concave mirror reflects the incident p-polarized laser beam so that the degree of polarization is uniform ,
The cylindrical concave mirror changes the radiation beam emitted from the focal position to a parallel beam,
The surface pattern measuring apparatus according to claim 1, wherein a path length of the beam reflected by the cylindrical concave mirror to the substrate is the same as the focal distance . A pattern of a different material is formed, and a substrate having a different reflectivity from the pattern material;
The light having an electric field parallel to the substrate (p-polarized light) is incident on the substrate at a Brewster angle due to a refractive index of the substrate and a refractive index of a medium in contact with the substrate. an irradiation unit for irradiating p-polarized light;
A detection unit for detecting light reflected by the substrate,
The irradiation unit is
A laser light source for emitting a laser beam;
A scanner that reflects the incident laser beam by a scanner control signal so that the path is continuously changed at a constant radiation angle;
Polarized light that is arranged in any one of a path on which the laser beam is incident on the scanner and a path on which the laser beam is reflected by the scanner, and that causes the laser beam to be p-polarized with respect to the substrate And
A second optical system that refracts the p-polarized laser beam in a first direction;
The angle between the first direction and the normal of the substrate is a Brewster angle due to a refractive index of the substrate and a medium in contact with the substrate,
The second optical system includes:
A first reflector that reflects the beam reflected from the scanner at a first acute angle;
A beam reflected from the first reflecting part is reflected at a second acute angle, and the direction of the beam reflected at the second acute angle is a second reflecting part that makes the first direction,
One of the first and second reflecting portions is one of a flat mirror and a cylindrical concave mirror, and the other one of the first and second reflecting portions is the flat mirror. The remaining one of the mirror and the cylindrical concave mirror,
The cylindrical concave mirror reflects the incident p-polarized laser beam so that the degree of polarization is uniform ,
The cylindrical concave mirror changes the radiation beam emitted from the focal position to a parallel beam,
The surface pattern measuring apparatus according to claim 1, wherein a path length of the beam reflected by the cylindrical concave mirror to the substrate is the same as the focal distance . The detector, the detected by analyzing the light, that to extract an image of a pattern formed on the substrate, or surface pattern measurement apparatus according to claim 1 or 2 to determine the presence or absence of defects of the pattern . The irradiation unit is
A light source that emits light in a one-dimensional form;
A polarizer for p-polarizing the one-dimensional light with respect to the substrate,
The detector is
General light having the same path as that of the p-polarized light by the polarizer is disposed in a reflection path that travels by being reflected by the substrate, and a target lens that converges the general light at a specific position;
An imaging unit for detecting p-polarized light that has passed through the target lens;
The surface pattern measuring device according to claim 1 or 2. The light source emits fan-shaped light,
5. The surface according to claim 4, wherein the irradiation unit further includes a first optical system that converts the p-polarized fan-shaped light by the polarizer into p-polarized parallel light traveling in a certain direction and irradiates the substrate. Pattern measuring device.   The surface according to claim 4, wherein the detection unit further includes a p-polarization filter that is disposed between the target lens and the imaging unit and allows the p-polarized light to pass only to the imaging unit with respect to the substrate. Pattern measuring device. Wherein the detection unit, p-polarized laser beam incident on the substrate, the surface pattern according to claim 1 or 2 comprising a beam detector for detecting whether or not the thus reflected pattern formed on the substrate measuring device. The substrate is one of glass and transparent film,
The surface pattern measurement device according to claim 1, wherein the pattern material includes at least one of ITO, graphene, carbon nanotubes (CNT), and silver nanowires. The surface pattern measuring apparatus according to claim 1, wherein a difference between the reflectance of the substrate and the reflectance of the pattern material is 1 to 10%.

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