JP5798155B2 - Insulating resin composition for printed circuit board having low coefficient of thermal expansion and dielectric loss, prepreg and printed circuit board using the same - Google Patents
Insulating resin composition for printed circuit board having low coefficient of thermal expansion and dielectric loss, prepreg and printed circuit board using the same Download PDFInfo
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- JP5798155B2 JP5798155B2 JP2013135112A JP2013135112A JP5798155B2 JP 5798155 B2 JP5798155 B2 JP 5798155B2 JP 2013135112 A JP2013135112 A JP 2013135112A JP 2013135112 A JP2013135112 A JP 2013135112A JP 5798155 B2 JP5798155 B2 JP 5798155B2
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- inorganic filler
- printed circuit
- resin
- epoxy resin
- circuit board
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- 239000011342 resin composition Substances 0.000 title claims description 35
- 239000011256 inorganic filler Substances 0.000 claims description 71
- 229910003475 inorganic filler Inorganic materials 0.000 claims description 71
- 239000003822 epoxy resin Substances 0.000 claims description 46
- 229920000647 polyepoxide Polymers 0.000 claims description 46
- 239000003795 chemical substances by application Substances 0.000 claims description 38
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical group O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims description 28
- JKWMSGQKBLHBQQ-UHFFFAOYSA-N diboron trioxide Chemical group O=BOB=O JKWMSGQKBLHBQQ-UHFFFAOYSA-N 0.000 claims description 28
- 239000011521 glass Substances 0.000 claims description 24
- 239000000203 mixture Substances 0.000 claims description 17
- 229920005989 resin Polymers 0.000 claims description 15
- 239000011347 resin Substances 0.000 claims description 15
- UFWIBTONFRDIAS-UHFFFAOYSA-N Naphthalene Chemical compound C1=CC=CC2=CC=CC=C21 UFWIBTONFRDIAS-UHFFFAOYSA-N 0.000 claims description 14
- 239000000377 silicon dioxide Substances 0.000 claims description 13
- ZUOUZKKEUPVFJK-UHFFFAOYSA-N diphenyl Chemical compound C1=CC=CC=C1C1=CC=CC=C1 ZUOUZKKEUPVFJK-UHFFFAOYSA-N 0.000 claims description 12
- 239000003365 glass fiber Substances 0.000 claims description 11
- 239000004843 novolac epoxy resin Substances 0.000 claims description 10
- RAXXELZNTBOGNW-UHFFFAOYSA-N imidazole Natural products C1=CNC=N1 RAXXELZNTBOGNW-UHFFFAOYSA-N 0.000 claims description 9
- 229920005992 thermoplastic resin Polymers 0.000 claims description 8
- ISWSIDIOOBJBQZ-UHFFFAOYSA-N Phenol Chemical compound OC1=CC=CC=C1 ISWSIDIOOBJBQZ-UHFFFAOYSA-N 0.000 claims description 6
- 239000004305 biphenyl Substances 0.000 claims description 6
- 235000010290 biphenyl Nutrition 0.000 claims description 6
- IISBACLAFKSPIT-UHFFFAOYSA-N bisphenol A Chemical compound C=1C=C(O)C=CC=1C(C)(C)C1=CC=C(O)C=C1 IISBACLAFKSPIT-UHFFFAOYSA-N 0.000 claims description 6
- PXKLMJQFEQBVLD-UHFFFAOYSA-N bisphenol F Chemical compound C1=CC(O)=CC=C1CC1=CC=C(O)C=C1 PXKLMJQFEQBVLD-UHFFFAOYSA-N 0.000 claims description 6
- 229920003986 novolac Polymers 0.000 claims description 4
- QTWJRLJHJPIABL-UHFFFAOYSA-N 2-methylphenol;3-methylphenol;4-methylphenol Chemical compound CC1=CC=C(O)C=C1.CC1=CC=CC(O)=C1.CC1=CC=CC=C1O QTWJRLJHJPIABL-UHFFFAOYSA-N 0.000 claims description 3
- 150000008065 acid anhydrides Chemical class 0.000 claims description 3
- 150000001408 amides Chemical class 0.000 claims description 3
- 229930003836 cresol Natural products 0.000 claims description 3
- 150000002148 esters Chemical class 0.000 claims description 3
- 229920000768 polyamine Polymers 0.000 claims description 3
- 229930182556 Polyacetal Natural products 0.000 claims description 2
- 239000004962 Polyamide-imide Substances 0.000 claims description 2
- 239000004695 Polyether sulfone Substances 0.000 claims description 2
- 239000004697 Polyetherimide Substances 0.000 claims description 2
- BHEPBYXIRTUNPN-UHFFFAOYSA-N hydridophosphorus(.) (triplet) Chemical compound [PH] BHEPBYXIRTUNPN-UHFFFAOYSA-N 0.000 claims description 2
- 229920006287 phenoxy resin Polymers 0.000 claims description 2
- 239000013034 phenoxy resin Substances 0.000 claims description 2
- 229920002492 poly(sulfone) Polymers 0.000 claims description 2
- 229920002312 polyamide-imide Polymers 0.000 claims description 2
- 229920001225 polyester resin Polymers 0.000 claims description 2
- 239000004645 polyester resin Substances 0.000 claims description 2
- 229920006393 polyether sulfone Polymers 0.000 claims description 2
- 229920001601 polyetherimide Polymers 0.000 claims description 2
- 229920001721 polyimide Polymers 0.000 claims description 2
- 239000009719 polyimide resin Substances 0.000 claims description 2
- 229920006324 polyoxymethylene Polymers 0.000 claims description 2
- 229920001955 polyphenylene ether Polymers 0.000 claims description 2
- 150000003512 tertiary amines Chemical class 0.000 claims description 2
- TZCXTZWJZNENPQ-UHFFFAOYSA-L barium sulfate Chemical compound [Ba+2].[O-]S([O-])(=O)=O TZCXTZWJZNENPQ-UHFFFAOYSA-L 0.000 description 8
- 230000000052 comparative effect Effects 0.000 description 8
- LNEPOXFFQSENCJ-UHFFFAOYSA-N haloperidol Chemical compound C1CC(O)(C=2C=CC(Cl)=CC=2)CCN1CCCC(=O)C1=CC=C(F)C=C1 LNEPOXFFQSENCJ-UHFFFAOYSA-N 0.000 description 7
- VTYYLEPIZMXCLO-UHFFFAOYSA-L Calcium carbonate Chemical compound [Ca+2].[O-]C([O-])=O VTYYLEPIZMXCLO-UHFFFAOYSA-L 0.000 description 6
- FYYHWMGAXLPEAU-UHFFFAOYSA-N Magnesium Chemical compound [Mg] FYYHWMGAXLPEAU-UHFFFAOYSA-N 0.000 description 5
- 230000007423 decrease Effects 0.000 description 5
- 229910052749 magnesium Inorganic materials 0.000 description 5
- 239000011777 magnesium Substances 0.000 description 5
- DJOYTAUERRJRAT-UHFFFAOYSA-N 2-(n-methyl-4-nitroanilino)acetonitrile Chemical compound N#CCN(C)C1=CC=C([N+]([O-])=O)C=C1 DJOYTAUERRJRAT-UHFFFAOYSA-N 0.000 description 4
- 229910052582 BN Inorganic materials 0.000 description 4
- PZNSFCLAULLKQX-UHFFFAOYSA-N Boron nitride Chemical compound N#B PZNSFCLAULLKQX-UHFFFAOYSA-N 0.000 description 4
- GWEVSGVZZGPLCZ-UHFFFAOYSA-N Titan oxide Chemical compound O=[Ti]=O GWEVSGVZZGPLCZ-UHFFFAOYSA-N 0.000 description 4
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 description 4
- WNROFYMDJYEPJX-UHFFFAOYSA-K aluminium hydroxide Chemical compound [OH-].[OH-].[OH-].[Al+3] WNROFYMDJYEPJX-UHFFFAOYSA-K 0.000 description 4
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 description 4
- 229910002113 barium titanate Inorganic materials 0.000 description 4
- JRPBQTZRNDNNOP-UHFFFAOYSA-N barium titanate Chemical compound [Ba+2].[Ba+2].[O-][Ti]([O-])([O-])[O-] JRPBQTZRNDNNOP-UHFFFAOYSA-N 0.000 description 4
- 229910021523 barium zirconate Inorganic materials 0.000 description 4
- DQBAOWPVHRWLJC-UHFFFAOYSA-N barium(2+);dioxido(oxo)zirconium Chemical compound [Ba+2].[O-][Zr]([O-])=O DQBAOWPVHRWLJC-UHFFFAOYSA-N 0.000 description 4
- 229910002115 bismuth titanate Inorganic materials 0.000 description 4
- AOWKSNWVBZGMTJ-UHFFFAOYSA-N calcium titanate Chemical compound [Ca+2].[O-][Ti]([O-])=O AOWKSNWVBZGMTJ-UHFFFAOYSA-N 0.000 description 4
- 239000004927 clay Substances 0.000 description 4
- 229910052570 clay Inorganic materials 0.000 description 4
- ZLNQQNXFFQJAID-UHFFFAOYSA-L magnesium carbonate Chemical compound [Mg+2].[O-]C([O-])=O ZLNQQNXFFQJAID-UHFFFAOYSA-L 0.000 description 4
- 239000001095 magnesium carbonate Substances 0.000 description 4
- 229910000021 magnesium carbonate Inorganic materials 0.000 description 4
- VTHJTEIRLNZDEV-UHFFFAOYSA-L magnesium dihydroxide Chemical compound [OH-].[OH-].[Mg+2] VTHJTEIRLNZDEV-UHFFFAOYSA-L 0.000 description 4
- 239000000347 magnesium hydroxide Substances 0.000 description 4
- 229910001862 magnesium hydroxide Inorganic materials 0.000 description 4
- 239000010445 mica Substances 0.000 description 4
- 229910052618 mica group Inorganic materials 0.000 description 4
- 239000000843 powder Substances 0.000 description 4
- 239000000758 substrate Substances 0.000 description 4
- 239000000454 talc Substances 0.000 description 4
- 229910052623 talc Inorganic materials 0.000 description 4
- OGIDPMRJRNCKJF-UHFFFAOYSA-N titanium oxide Inorganic materials [Ti]=O OGIDPMRJRNCKJF-UHFFFAOYSA-N 0.000 description 4
- OJMOMXZKOWKUTA-UHFFFAOYSA-N aluminum;borate Chemical compound [Al+3].[O-]B([O-])[O-] OJMOMXZKOWKUTA-UHFFFAOYSA-N 0.000 description 3
- 229910000019 calcium carbonate Inorganic materials 0.000 description 3
- 239000000945 filler Substances 0.000 description 3
- 239000000395 magnesium oxide Substances 0.000 description 3
- CPLXHLVBOLITMK-UHFFFAOYSA-N magnesium oxide Inorganic materials [Mg]=O CPLXHLVBOLITMK-UHFFFAOYSA-N 0.000 description 3
- AXZKOIWUVFPNLO-UHFFFAOYSA-N magnesium;oxygen(2-) Chemical compound [O-2].[Mg+2] AXZKOIWUVFPNLO-UHFFFAOYSA-N 0.000 description 3
- OAICVXFJPJFONN-UHFFFAOYSA-N Phosphorus Chemical compound [P] OAICVXFJPJFONN-UHFFFAOYSA-N 0.000 description 2
- 230000007547 defect Effects 0.000 description 2
- 239000012212 insulator Substances 0.000 description 2
- 238000004519 manufacturing process Methods 0.000 description 2
- 239000000463 material Substances 0.000 description 2
- 238000005259 measurement Methods 0.000 description 2
- 239000011574 phosphorus Substances 0.000 description 2
- 229910052698 phosphorus Inorganic materials 0.000 description 2
- 230000000704 physical effect Effects 0.000 description 2
- 238000007747 plating Methods 0.000 description 2
- ZOXJGFHDIHLPTG-UHFFFAOYSA-N Boron Chemical compound [B] ZOXJGFHDIHLPTG-UHFFFAOYSA-N 0.000 description 1
- 150000001412 amines Chemical class 0.000 description 1
- 229910052796 boron Inorganic materials 0.000 description 1
- FYHXNYLLNIKZMR-UHFFFAOYSA-N calcium;carbonic acid Chemical compound [Ca].OC(O)=O FYHXNYLLNIKZMR-UHFFFAOYSA-N 0.000 description 1
- 239000003990 capacitor Substances 0.000 description 1
- 230000003111 delayed effect Effects 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 230000017525 heat dissipation Effects 0.000 description 1
- 239000003999 initiator Substances 0.000 description 1
- 229910010272 inorganic material Inorganic materials 0.000 description 1
- 239000011147 inorganic material Substances 0.000 description 1
- 238000009413 insulation Methods 0.000 description 1
- 239000004973 liquid crystal related substance Substances 0.000 description 1
- 239000011159 matrix material Substances 0.000 description 1
- 238000000034 method Methods 0.000 description 1
- 230000003647 oxidation Effects 0.000 description 1
- 238000007254 oxidation reaction Methods 0.000 description 1
- TWNQGVIAIRXVLR-UHFFFAOYSA-N oxo(oxoalumanyloxy)alumane Chemical compound O=[Al]O[Al]=O TWNQGVIAIRXVLR-UHFFFAOYSA-N 0.000 description 1
- 239000002245 particle Substances 0.000 description 1
- 229920002037 poly(vinyl butyral) polymer Polymers 0.000 description 1
- 229910000679 solder Inorganic materials 0.000 description 1
- QQOWHRYOXYEMTL-UHFFFAOYSA-N triazin-4-amine Chemical compound N=C1C=CN=NN1 QQOWHRYOXYEMTL-UHFFFAOYSA-N 0.000 description 1
Images
Classifications
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- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K1/00—Printed circuits
- H05K1/02—Details
- H05K1/03—Use of materials for the substrate
- H05K1/0313—Organic insulating material
- H05K1/0353—Organic insulating material consisting of two or more materials, e.g. two or more polymers, polymer + filler, + reinforcement
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
- C08K3/00—Use of inorganic substances as compounding ingredients
- C08K3/01—Use of inorganic substances as compounding ingredients characterized by their specific function
- C08K3/013—Fillers, pigments or reinforcing additives
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
- C08L63/00—Compositions of epoxy resins; Compositions of derivatives of epoxy resins
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01B—CABLES; CONDUCTORS; INSULATORS; SELECTION OF MATERIALS FOR THEIR CONDUCTIVE, INSULATING OR DIELECTRIC PROPERTIES
- H01B3/00—Insulators or insulating bodies characterised by the insulating materials; Selection of materials for their insulating or dielectric properties
- H01B3/18—Insulators or insulating bodies characterised by the insulating materials; Selection of materials for their insulating or dielectric properties mainly consisting of organic substances
- H01B3/30—Insulators or insulating bodies characterised by the insulating materials; Selection of materials for their insulating or dielectric properties mainly consisting of organic substances plastics; resins; waxes
- H01B3/40—Insulators or insulating bodies characterised by the insulating materials; Selection of materials for their insulating or dielectric properties mainly consisting of organic substances plastics; resins; waxes epoxy resins
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01B—CABLES; CONDUCTORS; INSULATORS; SELECTION OF MATERIALS FOR THEIR CONDUCTIVE, INSULATING OR DIELECTRIC PROPERTIES
- H01B3/00—Insulators or insulating bodies characterised by the insulating materials; Selection of materials for their insulating or dielectric properties
- H01B3/18—Insulators or insulating bodies characterised by the insulating materials; Selection of materials for their insulating or dielectric properties mainly consisting of organic substances
- H01B3/30—Insulators or insulating bodies characterised by the insulating materials; Selection of materials for their insulating or dielectric properties mainly consisting of organic substances plastics; resins; waxes
- H01B3/47—Insulators or insulating bodies characterised by the insulating materials; Selection of materials for their insulating or dielectric properties mainly consisting of organic substances plastics; resins; waxes fibre-reinforced plastics, e.g. glass-reinforced plastics
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K1/00—Printed circuits
- H05K1/02—Details
- H05K1/03—Use of materials for the substrate
- H05K1/0313—Organic insulating material
- H05K1/0353—Organic insulating material consisting of two or more materials, e.g. two or more polymers, polymer + filler, + reinforcement
- H05K1/0373—Organic insulating material consisting of two or more materials, e.g. two or more polymers, polymer + filler, + reinforcement containing additives, e.g. fillers
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Medicinal Chemistry (AREA)
- Polymers & Plastics (AREA)
- Organic Chemistry (AREA)
- Health & Medical Sciences (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Physics & Mathematics (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Compositions Of Macromolecular Compounds (AREA)
- Reinforced Plastic Materials (AREA)
- Epoxy Resins (AREA)
Description
本発明は、低い熱膨張率および誘電損失率を有するプリント基板用絶縁樹脂組成物、これを用いたプリプレグおよびプリント基板に関する。 The present invention relates to an insulating resin composition for printed circuit boards having a low coefficient of thermal expansion and a dielectric loss rate, and a prepreg and a printed circuit board using the same.
最近、電子機器の小型化、高性能化が行われるにつれて、プリント基板において絶縁層の役割を果たすビルドアップ層が複層化され、配線の微細化および高密度化が求められる趨勢にある。 Recently, as electronic devices are miniaturized and performance-enhanced, a buildup layer serving as an insulating layer in a printed circuit board has been formed into multiple layers, and there is a trend for miniaturization and higher density of wiring.
一方、低熱膨張率および低誘電損失率は、従来からプリント基板の絶縁層に求められる主要特性であり、このような主要特性を充足するために多様な試みが行われている。 On the other hand, the low coefficient of thermal expansion and the low dielectric loss factor are the main characteristics conventionally required for an insulating layer of a printed circuit board, and various attempts have been made to satisfy these main characteristics.
絶縁層の熱膨張係数(CTE)が大きくなると、基板の反り(warpage)不良が発生し、誘電損失率が大きくなると、回路配線の電気的特性が低下し、不要な電力損失が発生するうえ、回路配線が短絡(short)するなどの問題が発生する。 When the thermal expansion coefficient (CTE) of the insulating layer increases, a warpage defect of the substrate occurs, and when the dielectric loss rate increases, the electrical characteristics of the circuit wiring deteriorate, and unnecessary power loss occurs. Problems such as short-circuiting of circuit wiring occur.
絶縁層の熱膨張係数を低めるために、比較的高いモジュラス(high modulus)を有するエポキシ樹脂を使用し、或いは液晶オリゴマー(liquid crystal oligomer)を添加するが、無機フィラーの種類および添加量によって熱膨張係数を低めようとする試みが最も多く行われている実情である。特に、シリカなどの無機フィラーは、80重量%以上添加する場合、絶縁層の熱膨張係数を10ppm水準まで低めることができると知られている。 In order to reduce the thermal expansion coefficient of the insulating layer, an epoxy resin having a relatively high modulus or a liquid crystal oligomer is added, but the thermal expansion depends on the type and amount of the inorganic filler. It is a fact that the most attempts are made to lower the coefficient. In particular, when an inorganic filler such as silica is added in an amount of 80% by weight or more, it is known that the thermal expansion coefficient of the insulating layer can be lowered to the 10 ppm level.
ところが、このような熱膨張率の低い無機フィラーの添加のみでは、基板のモジュラスを向上させることはできるが、絶縁層が要求する低誘電損失特性を達成することは難しいという問題があるので、基板のモジュラスを向上させるとともに、低誘電損失特性を同時に達成しなければならない必要性が強く求められている。 However, the addition of such an inorganic filler having a low coefficient of thermal expansion can improve the modulus of the substrate, but it is difficult to achieve the low dielectric loss characteristics required by the insulating layer. There is a strong need to improve the modulus of the material and to achieve low dielectric loss characteristics at the same time.
そこで、本発明者は、プリント基板の絶縁樹脂組成物に含まれる無機フィラーとして、低い熱膨張係数を有する無機フィラーと低い誘電損失率を有する無機フィラーとを同時に添加して上述の問題点を解決することができることを見出し、これに基づいて本発明を完成した。 Therefore, the present inventor solves the above-mentioned problems by simultaneously adding an inorganic filler having a low thermal expansion coefficient and an inorganic filler having a low dielectric loss factor as the inorganic filler contained in the insulating resin composition of the printed circuit board. Based on this finding, the present invention has been completed.
したがって、本発明のある観点は、エポキシ樹脂、低熱膨張係数を有する第1無機フィラー、低誘電損失率を有する第2無機フィラー、および硬化剤を含んでなるプリント基板用絶縁樹脂組成物を提供することにある。 Accordingly, one aspect of the present invention provides an insulating resin composition for a printed circuit board comprising an epoxy resin, a first inorganic filler having a low coefficient of thermal expansion, a second inorganic filler having a low dielectric loss factor, and a curing agent. There is.
本発明の他の観点は、本発明に係るプリント基板用絶縁樹脂組成物にガラス繊維が含浸されたプリプレグを提供することにある。 Another aspect of the present invention is to provide a prepreg in which the insulating resin composition for printed circuit boards according to the present invention is impregnated with glass fibers.
本発明の別の観点は、本発明に係る絶縁樹脂組成物を含むプリント基板を提供することにある。 Another aspect of the present invention is to provide a printed board including the insulating resin composition according to the present invention.
本発明の別の観点は、本発明に係るプリプレグを含むプリント基板を提供することにある。 Another aspect of the present invention is to provide a printed circuit board including the prepreg according to the present invention.
上記観点を達成するための本発明に係るプリント基板用絶縁樹脂組成物(以下「第1発明」という)は、エポキシ樹脂、低熱膨張係数を有する第1無機フィラー、低誘電損失率を有する第2無機フィラー、硬化剤、および熱可塑性樹脂を含んでなり、前記第1無機フィラーおよび前記第2無機フィラーを含む全体無機フィラーは全体組成物の50〜80重量%をなす。 In order to achieve the above aspect, an insulating resin composition for a printed circuit board (hereinafter referred to as “first invention”) according to the present invention includes an epoxy resin, a first inorganic filler having a low thermal expansion coefficient, and a second having a low dielectric loss rate. It comprises an inorganic filler, a curing agent, and a thermoplastic resin, and the total inorganic filler including the first inorganic filler and the second inorganic filler constitutes 50 to 80% by weight of the total composition.
第1発明において、前記第1無機フィラーと前記第2無機フィラーは、1:0.5〜1.5の重量比で含まれることを特徴とする。 In the first invention, the first inorganic filler and the second inorganic filler are included in a weight ratio of 1: 0.5 to 1.5.
第1発明において、前記エポキシ樹脂20〜30重量%、前記第1無機フィラー25〜40重量%、前記第2無機フィラー25〜40重量%、前記硬化剤5〜10重量%、および前記熱可塑性樹脂1〜5重量%を含むことを特徴とする。 In the first invention, the epoxy resin 20 to 30% by weight, the first inorganic filler 25 to 40% by weight, the second inorganic filler 25 to 40% by weight, the curing agent 5 to 10% by weight, and the thermoplastic resin It contains 1 to 5% by weight.
第1発明において、前記エポキシ樹脂は、ナフタレン系エポキシ樹脂、ビフェニルエポキシ樹脂、ビスフェノールA型エポキシ樹脂、ビスフェノールF型エポキシ樹脂、フェノールノボラックエポキシ樹脂、クレゾールノボラックエポキシ樹脂、ゴム変性型エポキシ樹脂、およびリン(phosphorous)系エポキシ樹脂から少なくとも1種選ばれることを特徴とする。 In the first invention, the epoxy resin includes naphthalene epoxy resin, biphenyl epoxy resin, bisphenol A type epoxy resin, bisphenol F type epoxy resin, phenol novolac epoxy resin, cresol novolac epoxy resin, rubber-modified epoxy resin, and phosphorus ( Phosphorous) type epoxy resin is selected.
第1発明において、前記エポキシ樹脂は、ノボラックエポキシ樹脂、ビフェニルエポキシ樹脂、ナフタレン系エポキシ樹脂、およびゴム変性型エポキシ樹脂の混合物であることを特徴とする。 In the first invention, the epoxy resin is a mixture of a novolac epoxy resin, a biphenyl epoxy resin, a naphthalene epoxy resin, and a rubber-modified epoxy resin.
第1発明において、前記第1無機フィラーは、シリカ、アルミナ、硫酸バリウム、タルク、クレー、雲母粉、水酸化アルミニウム、水酸化マグネシウム、炭酸カルシウム、炭酸マグネシウム、酸化マグネシウム、窒化ホウ素、ホウ酸アルミニウム、チタン酸バリウム、チタン酸カルシウム、チタン酸マグネシウム、チタン酸ビスマス、酸化チタン、ジルコン酸バリウム、およびジルコン酸カルシウムよりなる群から少なくとも1種選ばれることを特徴とする。 In the first invention, the first inorganic filler is silica, alumina, barium sulfate, talc, clay, mica powder, aluminum hydroxide, magnesium hydroxide, calcium carbonate, magnesium carbonate, magnesium oxide, boron nitride, aluminum borate, It is characterized by being selected from the group consisting of barium titanate, calcium titanate, magnesium titanate, bismuth titanate, titanium oxide, barium zirconate, and calcium zirconate.
第1発明において、前記第1無機フィラーは、5〜10ppm/℃の熱膨張係数を有することを特徴とする。 In the first invention, the first inorganic filler has a thermal expansion coefficient of 5 to 10 ppm / ° C.
第1発明において、前記第2無機フィラーは、三酸化二ホウ素、アルミナ、硫酸バリウム、タルク、クレー、雲母粉、水酸化アルミニウム、水酸化マグネシウム、炭酸カルシウム、炭酸マグネシウム、酸化マグネシウム、窒化ホウ素、ホウ酸アルミニウム、チタン酸バリウム、チタン酸カルシウム、チタン酸マグネシウム、チタン酸ビスマス、酸化チタン、ジルコン酸バリウム、およびジルコン酸カルシウムよりなる群から少なくとも1種選ばれることを特徴とする。 In the first invention, the second inorganic filler is diboron trioxide, alumina, barium sulfate, talc, clay, mica powder, aluminum hydroxide, magnesium hydroxide, calcium carbonate, magnesium carbonate, magnesium oxide, boron nitride, boron. At least one selected from the group consisting of aluminum oxide, barium titanate, calcium titanate, magnesium titanate, bismuth titanate, titanium oxide, barium zirconate, and calcium zirconate is characterized.
第1発明において、前記第2無機フィラーは、0.0001〜0.001の誘電損失率を有することを特徴とする。 In the first invention, the second inorganic filler has a dielectric loss rate of 0.0001 to 0.001.
第1発明において、前記第1無機フィラーはシリカであり、前記第2無機フィラーは三酸化二ホウ素であることを特徴とする。 In the first invention, the first inorganic filler is silica, and the second inorganic filler is diboron trioxide.
第1発明において、前記硬化剤は、活性エステル硬化剤、アミド系硬化剤、ポリアミン系硬化剤、酸無水物硬化剤、フェノールノボラック型硬化剤、ポリメルカプタン硬化剤、第3アミン硬化剤およびイミダゾール硬化剤から少なくとも1種選ばれることを特徴とする。 In the first invention, the curing agent includes an active ester curing agent, an amide curing agent, a polyamine curing agent, an acid anhydride curing agent, a phenol novolac curing agent, a polymercaptan curing agent, a third amine curing agent, and an imidazole curing agent. It is characterized by being selected from at least one agent.
第1発明において、前記熱可塑性樹脂は、フェノキシ樹脂、ポリエステル樹脂、ポリアセタール樹脂、ポリブチラール樹脂、ポリイミド樹脂、ポリアミドイミド樹脂、ポリエーテルイミド樹脂、ポリスルホン樹脂、ポリエーテルスルホン樹脂およびポリフェニレンエーテル樹脂よりなる群から少なくとも1種選ばれることを特徴とする。 In the first invention, the thermoplastic resin is a group consisting of phenoxy resin, polyester resin, polyacetal resin, polybutyral resin, polyimide resin, polyamideimide resin, polyetherimide resin, polysulfone resin, polyethersulfone resin, and polyphenylene ether resin. At least one selected from the group consisting of:
本発明の他の観点を達成するためのプリプレグ(以下「第2発明」という)は、第1発明の組成物にガラス繊維が含浸されて形成される。 A prepreg (hereinafter referred to as “second invention”) for achieving another aspect of the present invention is formed by impregnating a glass fiber into the composition of the first invention.
第2発明において、前記ガラス繊維は、E−ガラス、D−ガラス、T−ガラスおよびNE−ガラスから少なくとも1種選ばれることを特徴とする。 In the second invention, the glass fiber is at least one selected from E-glass, D-glass, T-glass and NE-glass.
本発明の別の観点を達成するためのプリント基板(以下「第3発明」という)は、第1発明の組成物を含む。 A printed circuit board (hereinafter referred to as “third invention”) for achieving another aspect of the present invention includes the composition of the first invention.
本発明の別の観点を達成するためのプリント基板(以下「第4発明」という)は、第2発明のプリプレグを含む。 A printed circuit board (hereinafter referred to as “fourth invention”) for achieving another aspect of the present invention includes the prepreg of the second invention.
本発明では、低熱膨張係数を有する第1無機フィラーを用いてプリント基板の高モジュラスを実現することができると共に、低誘電損失率を有する第2無機フィラーを用いてプリント基板の絶縁層において最も重要に求められる絶縁体としての役割を極大化することができるという利点がある。 In the present invention, a high modulus of the printed circuit board can be realized by using the first inorganic filler having a low thermal expansion coefficient, and most important in the insulating layer of the printed circuit board by using the second inorganic filler having a low dielectric loss factor. Therefore, there is an advantage that the role as an insulator required can be maximized.
また、本発明では、このような第1無機フィラーおよび第2無機フィラーの含量を調節してプリント基板の特性に合わせて最も好適な絶縁層を実現することが容易であるという長所がある。 In addition, the present invention has an advantage that it is easy to realize the most suitable insulating layer according to the characteristics of the printed circuit board by adjusting the contents of the first inorganic filler and the second inorganic filler.
本発明をさらに具体的に説明する前に、本明細書及び特許請求の範囲に使用された用語又は単語は、通常的且つ辞典的な意味に限定されてはならず、発明を最善の方法で説明するために用語の概念を適切に定義することができるという原則に立脚して、本発明の技術的思想に符合する意味と概念で解釈されなければならない。よって、本明細書に記載された実施例の構成は、本発明の好適な一例に過ぎず、本発明の技術的思想をすべて代弁するものではない。このため、本出願時点においてこれらを代替することが可能な様々な均等物及び変形例があり得ることを理解すべきである。 Before describing the present invention more specifically, the terms or words used in the specification and claims should not be limited to the ordinary and lexical meaning, and the invention is best practiced. Based on the principle that the terminology can be appropriately defined for the purpose of explanation, it should be interpreted with the meaning and concept consistent with the technical idea of the present invention. Therefore, the structure of the Example described in this specification is only a suitable example of this invention, and does not represent all the technical thoughts of this invention. Thus, it should be understood that there are various equivalents and variations that can be substituted at the time of this application.
以下、本発明の属する技術分野における通常の知識を有する者が本発明を容易に実施し得るように、本発明の好適な実施例を詳細に説明する。尚、本発明を説明するにあたり、本発明の要旨を不明瞭にする可能性がある係る公知技術についての詳細な説明は省略する。 Hereinafter, preferred embodiments of the present invention will be described in detail so that those skilled in the art to which the present invention pertains can easily carry out the present invention. In describing the present invention, detailed descriptions of known techniques that may obscure the subject matter of the present invention are omitted.
図1を参照すると、絶縁層131は、回路配線間の絶縁の役割を果たすと同時に、その上に配線を形成するための基材層の役割も果たしており、ビルドアップ層130もプリント基板100が複層からなる多層プリント配線板において絶縁層131の役割を果たしており、特に、ガラス繊維が絶縁樹脂組成物に含浸されたプリプレグとは異なり、ビルドアップ層130は、ガラス繊維なしで構成される。
Referring to FIG. 1, the
最近、このようなプリント基板は、薄膜化・小型化する趨勢にあり、基板の反りを防止し、放熱特性などを高めるために絶縁樹脂組成物に熱膨張係数が低くかつ熱伝達効率に優れる多様な無機フィラーを添加する。このような無機フィラーの中でも最も多く使用されるものがシリカであり、最近は、このようなシリカの添加量が益々増加する趨勢にある。 Recently, such printed circuit boards are in the trend of thinning and miniaturization. In order to prevent warping of the board and improve heat dissipation characteristics, etc., the insulating resin composition has a low coefficient of thermal expansion and excellent heat transfer efficiency. Add an inorganic filler. Among these inorganic fillers, silica is the most frequently used, and recently, the amount of such silica added has been increasing.
本発明では、前述したように、低熱膨張係数を有する第1無機フィラーと低誘電損失率を有する第2無機フィラーとを混合した多重フィラーシステムが導入されたプリント基板用絶縁樹脂組成物を提供するものである。 As described above, the present invention provides an insulating resin composition for a printed circuit board in which a multiple filler system in which a first inorganic filler having a low thermal expansion coefficient and a second inorganic filler having a low dielectric loss factor are mixed is introduced. Is.
以下、本発明に係る絶縁樹脂組成物、この絶縁樹脂組成物を用いたプリプレグおよびプリント基板を詳しく説明する。 Hereinafter, an insulating resin composition according to the present invention, a prepreg using the insulating resin composition, and a printed board will be described in detail.
本発明に係るプリント基板用絶縁樹脂組成物は、エポキシ樹脂および硬化剤に、低熱膨張係数を有する第1無機フィラーおよび低誘電損失率を有する第2無機フィラーが含まれ、特に前記無機フィラーの総和は全体組成物の50〜80重量%であることが好ましい。もし、全体無機フィラーの含量が50重量%未満の場合は、熱膨張係数の増加により基板の機械的強度が低下して反り(warpage)不良が発生し、80重量%を超える場合は、無機材料であるフィラーの含量があまり高いため、絶縁層の脆性(brittleness)が増加し、ビルドアップフィルムの形成時に加工性が低下するという問題が発生する。 The insulating resin composition for printed circuit boards according to the present invention includes a first inorganic filler having a low thermal expansion coefficient and a second inorganic filler having a low dielectric loss factor in the epoxy resin and the curing agent, and in particular, the sum of the inorganic fillers. Is preferably 50 to 80% by weight of the total composition. If the total inorganic filler content is less than 50% by weight, the mechanical strength of the substrate decreases due to an increase in the coefficient of thermal expansion, causing warpage defects. If the total inorganic filler content exceeds 80% by weight, the inorganic material Since the content of the filler is too high, brittleness of the insulating layer increases, and the problem arises that workability is reduced when forming a build-up film.
一方、前記第1無機フィラーと前記第2無機フィラーは、1:0.5〜1.5の重量比で本発明に係る絶縁樹脂組成物に含まれることが好ましい。前記第2無機フィラーの含量が第1無機フィラーに対して0.5未満の場合は、プリント基板絶縁層の誘電損失率が高くなって回路の電気的特性が低下するうえ、不要な電力損失を引き起こすという問題が発生し、第1無機フィラーに対して1.5を超える場合は、絶縁層の誘電損失率を効果的に低めることはできるが、熱膨張係数が相対的に高くなって、プリント基板の機械的物性が低下するという問題が発生するためである。 On the other hand, the first inorganic filler and the second inorganic filler are preferably included in the insulating resin composition according to the present invention in a weight ratio of 1: 0.5 to 1.5. When the content of the second inorganic filler is less than 0.5 with respect to the first inorganic filler, the dielectric loss rate of the printed circuit board insulating layer is increased, and the electrical characteristics of the circuit are deteriorated, and unnecessary power loss is reduced. If the first inorganic filler exceeds 1.5, the dielectric loss rate of the insulating layer can be effectively reduced, but the thermal expansion coefficient becomes relatively high, and the print This is because the problem that the mechanical properties of the substrate are lowered occurs.
次に、本発明に係る絶縁樹脂組成物の各成分の具体的な組成比を考察する。 Next, a specific composition ratio of each component of the insulating resin composition according to the present invention will be considered.
有機マトリクスの役割を果たすエポキシ樹脂は、全体組成物に対して20〜30重量%で含まれることが好ましい。すなわち、エポキシ樹脂が20重量%未満の場合は、絶縁樹脂の脆性が増加して加工性が低下し、メッキによる回路パターン形成の際に絶縁層の表面に露出する無機フィラーの含量が相対的に増加してメッキ密着力が低下するという問題が発生する。一方、エポキシ樹脂の含量が30重量%を超える場合は、絶縁層の熱膨張係数が増加してプリント基板の機械的強度が低下するという問題が発生する。 It is preferable that the epoxy resin which plays the role of an organic matrix is contained by 20 to 30 weight% with respect to the whole composition. That is, when the epoxy resin is less than 20% by weight, the brittleness of the insulating resin increases and the processability decreases, and the content of the inorganic filler that is exposed on the surface of the insulating layer when the circuit pattern is formed by plating is relatively There is a problem that the plating adhesion is reduced due to an increase. On the other hand, when the content of the epoxy resin exceeds 30% by weight, there arises a problem that the thermal expansion coefficient of the insulating layer increases and the mechanical strength of the printed circuit board decreases.
前記第1無機フィラーおよび第2無機フィラーは、それぞれ全体組成物に対して25〜40重量%で含まれることが好ましい。すなわち、第1無機フィラーが25重量%未満で含まれる場合は、熱膨張率の増加により回路の機械的物性が低下し、第2無機フィラーが25重量%未満で含まれる場合は、絶縁層の誘電損失率が増加して回路の電気的特性が良好でなく、不要な電力消耗が発生する。一方、前記第1無機フィラーの含量が40重量%を超える場合は、前記第2無機フィラーの添加量に制限を受けて回路の低誘電損失特性を達成し難いという問題が発生し、第2無機フィラーの含量が40重量%を超える場合は、第1無機フィラーの添加量に制限を受けて低熱膨張特性を達成し難いという問題が発生する。 The first inorganic filler and the second inorganic filler are each preferably contained in an amount of 25 to 40% by weight based on the entire composition. That is, when the first inorganic filler is contained at less than 25% by weight, the mechanical physical properties of the circuit are reduced due to an increase in the coefficient of thermal expansion, and when the second inorganic filler is contained at less than 25% by weight, the insulating layer The dielectric loss rate increases, the electrical characteristics of the circuit are not good, and unnecessary power consumption occurs. On the other hand, when the content of the first inorganic filler exceeds 40% by weight, there is a problem that it is difficult to achieve the low dielectric loss characteristic of the circuit due to the limitation on the addition amount of the second inorganic filler. When the filler content exceeds 40% by weight, there is a problem that it is difficult to achieve the low thermal expansion characteristics due to the limitation on the amount of the first inorganic filler added.
前記硬化剤は、全体組成物に対して5〜10重量%で含まれることが好ましい。すなわち、前記硬化剤の含量が5重量%未満の場合は、絶縁組成物の硬化速度が遅延して製造工程の所要時間が長くなり、かつ未硬化の樹脂組成物が残って回路の機械的物性が低下する原因になることもある。前記硬化剤が10重量%を超える場合は、非経済的であり、エポキシ樹脂および無機フィラーの添加量が制限されるという問題が発生する。 The curing agent is preferably included at 5 to 10% by weight with respect to the entire composition. That is, when the content of the curing agent is less than 5% by weight, the curing rate of the insulating composition is delayed to increase the time required for the manufacturing process, and the uncured resin composition remains and the mechanical physical properties of the circuit remain. May also cause a decrease. When the curing agent exceeds 10% by weight, it is uneconomical, and there is a problem that the addition amount of the epoxy resin and the inorganic filler is limited.
前記熱可塑性樹脂は、全体組成物に対して1〜5重量%で含まれることが好ましい。すなわち、前記熱可塑性樹脂の含量が1重量%未満の場合は、絶縁樹脂組成物の熱可塑性が低下する問題および脆性が増加する問題が発生し、5重量%を超える場合は、絶縁層の熱膨張係数が増加して機械的物性が低下するという問題が発生する。 The thermoplastic resin is preferably contained at 1 to 5% by weight with respect to the entire composition. That is, when the content of the thermoplastic resin is less than 1% by weight, a problem of lowering the thermoplasticity of the insulating resin composition and a problem of increasing brittleness occur, and when it exceeds 5% by weight, the heat of the insulating layer is increased. The problem arises that the expansion coefficient increases and the mechanical properties decrease.
本発明に使用されるエポキシ樹脂は、ナフタレン系エポキシ樹脂、ビフェニルエポキシ樹脂、ビスフェノールA型エポキシ樹脂、ビスフェノールF型エポキシ樹脂、フェノールノボラックエポキシ樹脂、クレゾールノボラックエポキシ樹脂、ゴム変性型エポキシ樹脂、およびリン(phosphorous)系エポキシ樹脂から少なくとも1種選ばれることが好ましいが、必ずしもこれに限定されるものではなく、プリント基板に一般に使用されるエポキシ樹脂であればいずれでも構わない。 Epoxy resins used in the present invention include naphthalene-based epoxy resins, biphenyl epoxy resins, bisphenol A type epoxy resins, bisphenol F type epoxy resins, phenol novolac epoxy resins, cresol novolac epoxy resins, rubber-modified epoxy resins, and phosphorus ( However, the present invention is not necessarily limited to this, and any epoxy resin generally used for printed circuit boards may be used.
本発明では、様々な種類のエポキシ樹脂を混合して使用してもよく、特に、ノボラックエポキシ樹脂、ビフェニルエポキシ樹脂、ナフタレン系エポキシ樹脂、およびゴム変性型エポキシ樹脂を混合して使用すると、絶縁層の誘電損失率をさらに低めることができるという利点がある。 In the present invention, various kinds of epoxy resins may be mixed and used. In particular, when a novolac epoxy resin, a biphenyl epoxy resin, a naphthalene epoxy resin, and a rubber-modified epoxy resin are used in combination, an insulating layer There is an advantage that the dielectric loss factor can be further reduced.
本発明に使用される低熱膨張係数を有する第1無機フィラーは、シリカ(SiO2)、アルミナ、硫酸バリウム、タルク、クレー、雲母粉、水酸化アルミニウム、水酸化マグネシウム、炭酸カルシウム、炭酸マグネシウム、酸化マグネシウム、窒化ホウ素、ホウ酸アルミニウム、チタン酸バリウム、チタン酸カルシウム、チタン酸マグネシウム、チタン酸ビスマス、酸化チタン、ジルコン酸バリウム、またはジルコン酸カルシウムなどが好ましく、特に、このような第1無機フィラーは、5〜10ppm/℃の熱膨張係数を有することがさらに好ましい。 The first inorganic filler having a low thermal expansion coefficient used in the present invention is silica (SiO 2 ), alumina, barium sulfate, talc, clay, mica powder, aluminum hydroxide, magnesium hydroxide, calcium carbonate, magnesium carbonate, oxidation Magnesium, boron nitride, aluminum borate, barium titanate, calcium titanate, magnesium titanate, bismuth titanate, titanium oxide, barium zirconate, or calcium zirconate are preferable. In particular, the first inorganic filler is More preferably, it has a thermal expansion coefficient of 5 to 10 ppm / ° C.
本発明に使用される低誘電損失率を有する第2無機フィラーは、三酸化二ホウ素(B2O3)、アルミナ、硫酸バリウム、タルク、クレー、雲母粉、水酸化アルミニウム、水酸化マグネシウム、炭酸カルシウム、炭酸マグネシウム、酸化マグネシウム、窒化ホウ素、ホウ酸アルミニウム、チタン酸バリウム、チタン酸カルシウム、チタン酸マグネシウム、チタン酸ビスマス、酸化チタン、ジルコン酸バリウム、またはジルコン酸カルシウムなどが好ましく、特に、このような第2無機フィラーは、0.0001〜0.001の誘電損失率を有することがさらに好ましい。 The second inorganic filler having a low dielectric loss rate used in the present invention is diboron trioxide (B 2 O 3 ), alumina, barium sulfate, talc, clay, mica powder, aluminum hydroxide, magnesium hydroxide, carbonic acid Calcium, magnesium carbonate, magnesium oxide, boron nitride, aluminum borate, barium titanate, calcium titanate, magnesium titanate, bismuth titanate, titanium oxide, barium zirconate, or calcium zirconate are preferred. More preferably, the second inorganic filler has a dielectric loss factor of 0.0001 to 0.001.
本発明に係る第1無機フィラーとして、シリカ(SiO2)を用い、同時に第2無機フィラーとして、三酸化二ホウ素(B2O3)を用いることが好ましい。 It is preferable to use silica (SiO 2 ) as the first inorganic filler according to the present invention and simultaneously use diboron trioxide (B 2 O 3 ) as the second inorganic filler.
表1に示すように、本発明者は、プリント基板のプリプレグに用いられる様々なガラス繊維の誘電損失率を研究した結果、E−ガラスまたはT−ガラスに比べてD−ガラスまたはNE−ガラスの誘電損失が著しく低いことを見出した。 As shown in Table 1, the present inventor studied the dielectric loss rate of various glass fibers used for the prepreg of a printed circuit board, and as a result, compared with E-glass or T-glass, D-glass or NE-glass. It has been found that the dielectric loss is extremely low.
このような結果に基づいて、本発明者は、表2に示すように、D−ガラスまたはNE−ガラスの組成を分析した結果、D−ガラスまたはNE−ガラスにはE−ガラスまたはT−ガラスに比べて共通に三酸化二ホウ素(B2O3)の含量が相対的に多く含有されていることを見出した。このような研究結果から、本発明者は、プリント基板のプリプレグではなくビルドアップフィルムに用いられる三酸化二ホウ素を粒子状に樹脂組成物内に均一に分散させて無機フィラーとして使用できることが分かることとなり、従来から一般に使用されているシリカと三酸化二ホウ素を適正の比率で混合して使用する場合、プリント基板の熱膨張率を低めることができるうえ、誘電損失率も画期的に低めることができることを確認することになった。 Based on such results, the present inventors analyzed the composition of D-glass or NE-glass as shown in Table 2, and as a result, D-glass or NE-glass had E-glass or T-glass. It was found that the content of diboron trioxide (B 2 O 3 ) is relatively large in common compared with the above. From such research results, it is understood that the present inventor can use diboron trioxide used for a build-up film, not a prepreg of a printed circuit board, as an inorganic filler by uniformly dispersing particles in a resin composition. Therefore, when mixing silica and diboron trioxide, which are commonly used in the past, at an appropriate ratio, the thermal expansion coefficient of the printed circuit board can be lowered, and the dielectric loss ratio can be dramatically reduced. I was able to confirm that
一方、本発明に使用される硬化剤は、活性エステル硬化剤、アミド系硬化剤、ポリアミン系硬化剤、酸無水物硬化剤、フェノールノボラック型硬化剤、ポリメルカプタン硬化剤、第3アミン硬化剤およびイミダゾール硬化剤から少なくとも1種選択して使用することが好ましい。 On the other hand, the curing agent used in the present invention includes an active ester curing agent, an amide curing agent, a polyamine curing agent, an acid anhydride curing agent, a phenol novolac curing agent, a polymercaptan curing agent, a tertiary amine curing agent and It is preferable to use at least one selected from imidazole curing agents.
本発明に係るプリント基板用絶縁樹脂組成物は、ビルドアップフィルムとして加工することができるとともに、ガラス繊維を含浸させてプリプレグを製作することに使用することもできる。プリプレグは、樹脂組成物にガラス繊維が含浸されるので、ビルドアップフィルムに比べて熱膨張係数が画期的に低いという利点があり、絶縁層の厚さを薄く製作するには限界があるという欠点がある。 The insulating resin composition for printed circuit boards according to the present invention can be processed as a build-up film and can also be used for producing a prepreg by impregnating glass fibers. Since prepreg is impregnated with glass fibers in the resin composition, it has the advantage that the coefficient of thermal expansion is significantly lower than that of build-up film, and there is a limit to manufacturing a thin insulating layer. There are drawbacks.
本発明に係る組成物に含浸してプリプレグを製作するときに使用されるガラス繊維は、E−ガラス、D−ガラス、T−ガラスまたはNE−ガラスなどが好ましく、特に、D−ガラスまたはNE−ガラスを使用する場合には、熱膨張係数および誘電損失率をさらに低めることができるという利点がある。 The glass fiber used when the prepreg is impregnated with the composition according to the present invention is preferably E-glass, D-glass, T-glass or NE-glass, and particularly D-glass or NE-. When glass is used, there is an advantage that the thermal expansion coefficient and the dielectric loss factor can be further reduced.
本発明に係る絶縁樹脂組成物を用いてプリント基板を製作することが可能であり、本発明に係る絶縁樹脂組成物を用いてビルドアップフィルムを製作する場合は、熱膨張係数が低くて機械的特性に優れているうえ、誘電損失率が低く、非常に薄い厚さに多層プリント配線板を製作することができる。 A printed circuit board can be manufactured using the insulating resin composition according to the present invention, and when a build-up film is manufactured using the insulating resin composition according to the present invention, the thermal expansion coefficient is low and mechanical. In addition to excellent characteristics, the dielectric loss factor is low, and a multilayer printed wiring board can be manufactured in a very thin thickness.
以下、実施例によって本発明をさらに詳しく説明する。但し、本発明はこれに限定されない。 Hereinafter, the present invention will be described in more detail with reference to examples. However, the present invention is not limited to this.
(実施例1)
ノボラックエポキシ樹脂40g、ナフタレン系エポキシ樹脂40g、およびゴム変性エポキシ樹脂40gを混合して混合エポキシ樹脂を準備した。ここにシリカ無機フィラー150g、三酸化二ホウ素150gおよびアミノトリアジンノボラック硬化剤47.39gを混合し、さらにポリビニルブチラール11.79g、2E4MZ開始剤0.25g、および10.08gのBYK337を添加した。このように準備された組成物を混合し、フィルムキャスティングして硬化させた後、150μm程度の均一な厚さに20×8cmの試片を製作した。このように準備された試片を用いて1〜5GHzで誘電率、誘電損失率および熱膨張係数を測定した。
Example 1
A mixed epoxy resin was prepared by mixing 40 g of a novolac epoxy resin, 40 g of a naphthalene epoxy resin, and 40 g of a rubber-modified epoxy resin. To this, 150 g of silica inorganic filler, 150 g of diboron trioxide and 47.39 g of aminotriazine novolak curing agent were mixed, and further, 11.79 g of polyvinyl butyral, 0.25 g of 2E4MZ initiator, and 10.08 g of BYK337 were added. The thus prepared composition was mixed, film casted and cured, and then a 20 × 8 cm specimen having a uniform thickness of about 150 μm was produced. Using the specimen thus prepared, the dielectric constant, dielectric loss factor, and thermal expansion coefficient were measured at 1 to 5 GHz.
(実施例2)
実施例1と同様の条件で試片を準備するが、シリカの添加量を130gに変更し、三酸化二ホウ素の添加量を170gに変更し、実施例1と同様の条件で誘電率、誘電損失率および熱膨張係数を測定した。
(Example 2)
Samples were prepared under the same conditions as in Example 1, but the addition amount of silica was changed to 130 g, the addition amount of diboron trioxide was changed to 170 g, and the dielectric constant and dielectric constant were changed under the same conditions as in Example 1. The loss rate and thermal expansion coefficient were measured.
(実施例3)
実施例1と同様の条件で試片を準備するが、シリカの添加量を170gに変更し、三酸化二ホウ素の添加量を130gに変更し、実施例1と同様の条件で誘電率、誘電損失率および熱膨張係数を測定した。
(Example 3)
Samples were prepared under the same conditions as in Example 1, but the addition amount of silica was changed to 170 g, the addition amount of diboron trioxide was changed to 130 g, and the dielectric constant and dielectric constant were changed under the same conditions as in Example 1. The loss rate and thermal expansion coefficient were measured.
(比較例1)
実施例1と同様の条件で試片を準備するが、三酸化二ホウ素150gの代わりにシリカ150gをさらに添加し、実施例1と同様の条件で誘電率、誘電損失率および熱膨張係数を測定した。
(Comparative Example 1)
A specimen is prepared under the same conditions as in Example 1, but 150 g of silica is further added instead of 150 g of diboron trioxide, and the dielectric constant, dielectric loss factor, and thermal expansion coefficient are measured under the same conditions as in Example 1. did.
(比較例2)
実施例1と同様の条件で試片を準備するが、シリカ150gの代わりに三酸化二ホウ素150gをさらに添加し、実施例1と同様の条件で誘電率、誘電損失率および熱膨張係数を測定した。
(Comparative Example 2)
Specimens were prepared under the same conditions as in Example 1, but 150 g of diboron trioxide was further added instead of 150 g of silica, and the dielectric constant, dielectric loss rate, and thermal expansion coefficient were measured under the same conditions as in Example 1. did.
表3より、実施例1〜3、比較例1および比較例2の場合、誘電率はほぼ同一に測定されたことが分かる。 From Table 3, it can be seen that in Examples 1 to 3, Comparative Example 1 and Comparative Example 2, the dielectric constant was measured substantially the same.
ところが、誘電損失率を比較すると、実施例1の場合は誘電損失率が0.008と比較的低く、実施例2の場合は0.006とさらに低く、実施例3の場合は0.009と実施例1よりは比較的高く測定された。一方、比較例1の場合は誘電損失率が0.02と非常に高かったが、比較例2の場合は0.004と誘電損失率が最も低く測定されたことが分かる。 However, when comparing the dielectric loss rate, the dielectric loss rate in Example 1 is relatively low at 0.008, 0.002 in Example 2, and 0.009 in Example 3. The measurement was relatively higher than in Example 1. On the other hand, in the case of Comparative Example 1, the dielectric loss factor was very high at 0.02, but in the case of Comparative Example 2, it was found that the dielectric loss factor was 0.004, which was the lowest.
一方、熱膨張係数を測定した結果を考察すると、低熱膨張係数を有するシリカのみを添加した場合(比較例1)は熱膨張係数が13と最も低く測定され、低誘電損失率を有する三酸化ホウ素のみを添加した比較例2の場合は30と最も高く測定された。ところが、実施例1〜3を参照すると、熱膨張係数が13〜18と比較的良好であることが分かる。 On the other hand, when the result of measuring the thermal expansion coefficient is considered, when only silica having a low thermal expansion coefficient is added (Comparative Example 1), the thermal expansion coefficient is the lowest measured at 13 and boron trioxide having a low dielectric loss rate is obtained. In the case of Comparative Example 2 to which only No was added, the highest measurement was 30. However, referring to Examples 1 to 3, it can be seen that the thermal expansion coefficient is 13 to 18 and relatively good.
前記実験結果をまとめると、プリント基板の絶縁層に要求される低熱膨張係数および低誘電損失を同時に充足させるために実施例1〜3が好ましく、その中でも実施例1が最も好ましいと分析される。これらの実験結果は、本発明に係る効果を直接示しているものと解釈される。 Summarizing the experimental results, it is analyzed that Examples 1 to 3 are preferable in order to simultaneously satisfy the low thermal expansion coefficient and low dielectric loss required for the insulating layer of the printed circuit board, and among these, Example 1 is analyzed to be most preferable. These experimental results are interpreted as directly showing the effects of the present invention.
本発明は、低い熱膨張率および誘電損失率を有するプリント基板用絶縁樹脂組成物、これを用いたプリプレグおよびプリント基板に適用可能である。 The present invention can be applied to an insulating resin composition for printed circuit boards having a low coefficient of thermal expansion and a dielectric loss rate, a prepreg using the same, and a printed circuit board.
100 プリント基板
110 絶縁体
120 電子部品
130 ビルドアップ層
131 絶縁層(ビルドアップフィルムまたはPCC)
132 回路層
140 キャパシタ
150 抵抗素子
160 半田レジスト
170 外部接続手段
180 パッド
DESCRIPTION OF
132
Claims (13)
低熱膨張係数を有する第1無機フィラーと、
低誘電損失率を有する第2無機フィラーと、
硬化剤と、
熱可塑性樹脂と、を含んでなり、
前記第1無機フィラーおよび前記第2無機フィラーを含む全体無機フィラーは全体組成物の50〜80重量%をなすとともに、
前記第1無機フィラーはシリカであり、前記第2無機フィラーは三酸化二ホウ素であることを特徴とするプリント基板用絶縁樹脂組成物。 Epoxy resin,
A first inorganic filler having a low coefficient of thermal expansion;
A second inorganic filler having a low dielectric loss factor;
A curing agent;
A thermoplastic resin,
The total inorganic filler including the first inorganic filler and the second inorganic filler constitutes 50 to 80% by weight of the total composition,
The insulating resin composition for a printed circuit board, wherein the first inorganic filler is silica and the second inorganic filler is diboron trioxide.
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| KR10-2013-0042135 | 2013-04-17 | ||
| KR1020130042135A KR101454111B1 (en) | 2013-04-17 | 2013-04-17 | Insulating resin composition having low CTE and low dielectric loss for PCB, prepreg and PCB using the same |
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| KR102078009B1 (en) * | 2015-10-06 | 2020-02-17 | 삼성전기주식회사 | Printed circuit board and manufacturing method of the same |
| KR102381986B1 (en) * | 2016-10-28 | 2022-03-31 | 삼성전기주식회사 | Photosensitization insulaton film and component comprising the same |
| JP7541809B2 (en) * | 2018-11-09 | 2024-08-29 | 住友ベークライト株式会社 | Method for manufacturing sacrificial substrate and coreless substrate |
| US12338343B2 (en) * | 2019-04-29 | 2025-06-24 | Ineos Styrolution Group Gmbh | Polymer compositions that contain a semi-crystalline polymer, and process of preparation |
| KR102256581B1 (en) * | 2019-08-09 | 2021-05-26 | 주식회사 케이씨씨 | Two-component type epoxy adhesive composition |
| US20240026118A1 (en) * | 2020-12-11 | 2024-01-25 | Resonac Corporation | Molding resin composition and electronic component device |
| JPWO2022202347A1 (en) * | 2021-03-24 | 2022-09-29 | ||
| CN115368607B (en) * | 2022-10-25 | 2023-02-24 | 乌镇实验室 | Polyether sulfone-based composite dielectric film material and preparation method thereof |
| CN116716072A (en) * | 2023-06-28 | 2023-09-08 | 深圳市纽菲斯新材料科技有限公司 | Multi-component filler build-up adhesive film for FC-BGA packaging carrier board and its preparation method and application |
| CN121128320A (en) * | 2023-11-21 | 2025-12-12 | 株式会社Lg化学 | Insulating film and printed circuit board including it |
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| KR20120038052A (en) * | 2010-10-13 | 2012-04-23 | 삼성전기주식회사 | Build-up film structrue and circuit board manufactured using the build-up film structure, and method for manufacturing circuit board using the build-up film structure |
| KR20120079402A (en) * | 2011-01-04 | 2012-07-12 | 주식회사 두산 | Prepreg and printed wiring board comprising the same |
| US20150034369A1 (en) * | 2011-07-14 | 2015-02-05 | Mitsubishi Gas Chemical Company, Inc. | Resin composition for printed wiring boards |
| KR101767691B1 (en) * | 2011-08-04 | 2017-08-14 | 심천 워트 어드밴스드 머티리얼즈 주식회사 | Composition for preparing thermosetting resin, cured product of the composition, prepreg having the cured product, and metal clad laminate and printed circuit board having the prepreg |
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