[go: up one dir, main page]

JP5109791B2 - Insulating resin adhesive sheet and multilayer printed wiring board - Google Patents

Insulating resin adhesive sheet and multilayer printed wiring board Download PDF

Info

Publication number
JP5109791B2
JP5109791B2 JP2008123398A JP2008123398A JP5109791B2 JP 5109791 B2 JP5109791 B2 JP 5109791B2 JP 2008123398 A JP2008123398 A JP 2008123398A JP 2008123398 A JP2008123398 A JP 2008123398A JP 5109791 B2 JP5109791 B2 JP 5109791B2
Authority
JP
Japan
Prior art keywords
insulating resin
adhesive sheet
mass
content
resin adhesive
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
JP2008123398A
Other languages
Japanese (ja)
Other versions
JP2009272532A (en
Inventor
広明 藤田
弘之 深井
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Resonac Corp
Original Assignee
Hitachi Chemical Co Ltd
Showa Denko Materials Co Ltd
Resonac Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Chemical Co Ltd, Showa Denko Materials Co Ltd, Resonac Corp filed Critical Hitachi Chemical Co Ltd
Priority to JP2008123398A priority Critical patent/JP5109791B2/en
Publication of JP2009272532A publication Critical patent/JP2009272532A/en
Application granted granted Critical
Publication of JP5109791B2 publication Critical patent/JP5109791B2/en
Expired - Fee Related legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Landscapes

  • Laminated Bodies (AREA)

Description

本発明は、多層プリント配線板を製造する際に用いられる絶縁樹脂接着シート及び多層プリント配線板に関する。   The present invention relates to an insulating resin adhesive sheet and a multilayer printed wiring board used when manufacturing a multilayer printed wiring board.

近年、車載用各種センサー、カーナビゲーションシステム、ハイブリッドエンジンシステム等の車載機器に使用される基板の需要の高まりから、高温、高湿環境下においても従来のセラミック基板と同等の接続信頼性が有機樹脂系の多層プリント配線板に要求されている。このため、多層プリント配線板用の絶縁樹脂接着シートには、温度サイクル試験や吸湿リフロー試験等での高い接続信頼性が求められるようになってきている。   In recent years, due to the increasing demand for substrates used in in-vehicle devices such as various in-vehicle sensors, car navigation systems, and hybrid engine systems, organic resins have the same connection reliability as conventional ceramic substrates even in high-temperature and high-humidity environments. It is required for multi-layer printed wiring boards. For this reason, high connection reliability in a temperature cycle test, a moisture absorption reflow test, or the like has been demanded for insulating resin adhesive sheets for multilayer printed wiring boards.

上記、温度サイクル試験で問題となるのは、銅と有機基板との熱膨張率差に起因して発生したストレスによるスルーホールクラック、インナービア接続間の剥離、あるいは電子部品の実装後、部品と有機基板との熱膨張率差に起因して発生したストレスによるはんだクラックである。   The above-mentioned problem in the temperature cycle test is that through-hole cracks due to stress caused by the difference in thermal expansion coefficient between copper and organic substrate, peeling between inner via connections, or mounting of electronic components, This is a solder crack due to stress generated due to the difference in thermal expansion coefficient with the organic substrate.

このような課題を解決する手段としては、有機基板の樹脂組成物中に多量の無機充填材を配合して有機基板の熱膨張係数を低下させ、クラックの発生を予防する方法(例えば、特許文献1参照)がある。しかし、無機充填材を多量に配合すると、積層時の樹脂流動性の低下から回路埋め込み性が不足したり、密着性が低下したりする。さらには、絶縁樹脂接着シートが脆くなり、粉落ち量の増大や柔軟性の欠如から作業性が著しく低下する等の課題があった。
特公平2−45348号公報
As a means for solving such a problem, a method for reducing the thermal expansion coefficient of the organic substrate by blending a large amount of an inorganic filler in the resin composition of the organic substrate and preventing the occurrence of cracks (for example, patent document) 1). However, when a large amount of the inorganic filler is blended, the circuit embedding property is insufficient due to a decrease in resin fluidity at the time of lamination, and the adhesion is deteriorated. Furthermore, the insulating resin adhesive sheet becomes brittle, and there are problems such as a significant decrease in workability due to an increase in the amount of powder fall and lack of flexibility.
Japanese Examined Patent Publication No. 2-45348

本発明は以上の問題点を解決することを目的とする。すなわち、本発明は、低熱膨張化による高い接続信頼性の確保と、柔軟性を有することによる高い作業性を実現する多層プリント配線板用の絶縁樹脂接着シート、及び該絶縁樹脂接着シートを用いた多層プリント配線板を提供することを目的とする。   An object of the present invention is to solve the above problems. That is, the present invention uses an insulating resin adhesive sheet for a multilayer printed wiring board that achieves high connection reliability by low thermal expansion and high workability by having flexibility, and the insulating resin adhesive sheet. An object is to provide a multilayer printed wiring board.

上記の目的を達成するために、本発明者らは鋭意研究を重ねた結果、エポキシ樹脂を含む樹脂組成物中に、熱膨張係数が小さく寸法安定性、耐薬品性に優れるシリカファイバー、及び柔軟性を付与する特定のゴム成分を配合することによって、当該目的を達成できることを見出した。   In order to achieve the above object, the present inventors have conducted intensive research, and as a result, in a resin composition containing an epoxy resin, a silica fiber having a small coefficient of thermal expansion and excellent dimensional stability and chemical resistance, and flexible It discovered that the said objective can be achieved by mix | blending the specific rubber component which provides property.

すなわち、本発明は、キャリアフィルム上に半硬化状態の樹脂組成物からなる半硬化膜が形成されてなり、樹脂組成物が、エポキシ樹脂、硬化剤、無機充填剤、ゴム成分、及びシリカファイバーを含有し、ゴム成分が、重量平均分子量30万以上の線状ゴム成分であり、シリカファイバーの平均繊維長が3〜10μm、平均繊維径が0.1〜1.0μmであり、樹脂組成物の固形分中の含有量として、エポキシ樹脂の含有量が2.0〜15.0質量%、無機充填剤の含有量が10〜80質量%、シリカファイバーの含有量が0.5〜5.0質量%、ゴム成分の含有量が無機充填剤を除いた樹脂組成物の固形分中10〜60質量%である絶縁樹脂接着シートある。 That is, in the present invention, a semi-cured film made of a semi-cured resin composition is formed on a carrier film, and the resin composition comprises an epoxy resin, a curing agent, an inorganic filler, a rubber component, and silica fiber. containing, rubber component, a weight average molecular weight of 300,000 or more linear rubber component, the average fiber length of silica fiber 3 to 10 [mu] m, an average fiber diameter of 0.1 to 1.0 [mu] m, the resin composition As content in solid content, content of an epoxy resin is 2.0-15.0 mass%, content of an inorganic filler is 10-80 mass%, content of silica fiber is 0.5-5.0. The insulating resin adhesive sheet is 10% by mass to 10% by mass in the solid content of the resin composition excluding the inorganic filler .

また、本発明は、外層回路と内層回路とが絶縁樹脂層を介して電気的に接続されてなり、絶縁樹脂層が、既述の本発明の絶縁樹脂接着シートを単独で、又は積層した状態で硬化させて形成された多層プリント配線板である。   Further, in the present invention, the outer layer circuit and the inner layer circuit are electrically connected via the insulating resin layer, and the insulating resin layer is a state in which the insulating resin adhesive sheet of the present invention described above is singly or laminated. It is a multilayer printed wiring board formed by curing with.

本発明によれば、低熱膨張化による高い接続信頼性の確保と、柔軟性を有することによる高い作業性を実現する多層プリント配線板用の絶縁樹脂接着シート、及び該絶縁樹脂接着シートを用いた多層プリント配線板を提供することができる。   According to the present invention, an insulating resin adhesive sheet for multilayer printed wiring boards that achieves high connection reliability by low thermal expansion and high workability by having flexibility, and the insulating resin adhesive sheet are used. A multilayer printed wiring board can be provided.

(絶縁樹脂接着シート)
本発明の絶縁樹脂接着シートは、キャリアフィルムと、該キャリアフィルム上に形成された半硬化状態の樹脂組成物からなる半硬化膜とを有する。樹脂組成物は、エポキシ樹脂、硬化剤、無機充填剤、ゴム成分、及びシリカファイバーを含有している。
(Insulating resin adhesive sheet)
The insulating resin adhesive sheet of the present invention has a carrier film and a semi-cured film made of a semi-cured resin composition formed on the carrier film. The resin composition contains an epoxy resin, a curing agent, an inorganic filler, a rubber component, and silica fiber.

樹脂組成物に含有されるエポキシ樹脂としては、ビスフェノールA型、ビスフェノールF型、ビフェニル系、ノボラック系、多官能フェノール系、ナフタレン系、脂環式及びアルコール系等のグリシジルエーテル及びこれらのハロゲン化物、グリシジルアミン系並びにグリシジルエステル系等が挙げられ、単独で又は2種類以上を混合して使用することができる。
なかでも、エポキシ当量250以下、かつ、室温で液状のエポキシ樹脂が好ましい。当該樹脂を使用することにより、シートの柔軟性の向上が図れ、さらに樹脂流動性の確保に有利である。
Examples of the epoxy resin contained in the resin composition include bisphenol A type, bisphenol F type, biphenyl type, novolac type, polyfunctional phenol type, naphthalene type, alicyclic and alcohol type glycidyl ethers and their halides, A glycidylamine type | system | group, a glycidyl ester type | system | group, etc. are mentioned, It can use individually or in mixture of 2 or more types.
Among these, an epoxy resin having an epoxy equivalent of 250 or less and liquid at room temperature is preferable. By using the resin, the flexibility of the sheet can be improved and it is advantageous for ensuring the resin fluidity.

樹脂組成物の固形分中のエポキシ樹脂の含有量は、2.0〜15.0質量%であることが好ましく、5.0〜10.0質量%であることがより好ましい。   The content of the epoxy resin in the solid content of the resin composition is preferably 2.0 to 15.0 mass%, and more preferably 5.0 to 10.0 mass%.

エポキシ樹脂の硬化成分としては、硬化剤と硬化促進剤とに分けることができる。硬化剤は、特に制限される物はなく、通常用いられるアミン系、酸無水物、及びフェノール系等が使用できる。半硬化時の加工性からフェノール系硬化剤が好ましく、エポキシ成分のエポキシ当量とフェノール樹脂の水酸基当量とが1:0.5〜1.5の当量比で添加することが好ましい。0.5当量以上の場合は外層の銅との接着性が低下するのを防ぐことができる。また、1.5当量以下の場合はTgや絶縁性が低下するのを防ぐことができる。   The curing component of the epoxy resin can be divided into a curing agent and a curing accelerator. There are no particular limitations on the curing agent, and commonly used amines, acid anhydrides, phenols, and the like can be used. A phenol-based curing agent is preferable from the viewpoint of workability during semi-curing, and it is preferable to add the epoxy equivalent of the epoxy component and the hydroxyl equivalent of the phenol resin at an equivalent ratio of 1: 0.5 to 1.5. In the case of 0.5 equivalents or more, it is possible to prevent the adhesion with copper of the outer layer from being lowered. Moreover, when 1.5 equivalent or less, it can prevent that Tg and insulation fall.

硬化促進剤としては、各種イミダゾール類を使用することが好ましい。イミダゾール類としては、2−メチルイミダゾール、2−エチル−4−メチルイミダゾール、1−シアノエチル−4−フェニルイミダゾール等が挙げられる。硬化促進剤の含有量は、0.02〜0.12質量%であることが好ましく、0.05〜0.10質量%であることがより好ましい。   As the curing accelerator, various imidazoles are preferably used. Examples of imidazoles include 2-methylimidazole, 2-ethyl-4-methylimidazole, 1-cyanoethyl-4-phenylimidazole and the like. It is preferable that content of a hardening accelerator is 0.02-0.12 mass%, and it is more preferable that it is 0.05-0.10 mass%.

無機充填剤としては、シリカ、溶融シリカ、タルク、アルミナ、水酸化アルミニウム、硫酸バリウム、水酸化カルシウム、アエロジル、炭酸カルシウムの中から選ばれるものが使用可能であり、これらは単独あるいは混合して用いてもよい。
なお、難燃性や低熱膨張の点から、水酸化アルミニウムやシリカを単独で又は2種以上を組み合わせて用いるのが良い。また、その含有量は、樹脂組成物の固形分中10〜80質量%にすることが好ましい。10質量%以上とすることで、熱膨脹係数が大きくなるのを防ぐことができる。また、80質量%以下とすることで、積層時の回路埋め込み性の低下を防ぐことができる。
As the inorganic filler, those selected from silica, fused silica, talc, alumina, aluminum hydroxide, barium sulfate, calcium hydroxide, aerosil, calcium carbonate can be used, and these can be used alone or in combination. May be.
In view of flame retardancy and low thermal expansion, aluminum hydroxide or silica may be used alone or in combination of two or more. Moreover, it is preferable that the content shall be 10-80 mass% in solid content of a resin composition. By setting it as 10 mass% or more, it can prevent that a thermal expansion coefficient becomes large. Moreover, the fall of the circuit embedding property at the time of lamination | stacking can be prevented by setting it as 80 mass% or less.

本発明に係るゴム成分としては、重量平均分子量30万以上の線状ゴム成分を使用する。当該ゴム成分により、硬化時の密着性や耐湿性を向上させ、さらには半硬化状態での膜特性(加工性)や柔軟性の確保を容易にすることができる。ゴム成分の含有量は、無機充填剤を除いた樹脂組成物の固形分中10〜60質量%が好ましい。10質量%以上であることで、半硬化時に基材フィルム(キャリアフィルム)から剥離する時に割れ等の現象が発生するのを防ぐことができるので取り扱いがしやすくなる。また、60質量%以下であることで、硬化物の熱特性が急激に低下し、はんだ耐熱性が低下するのを防ぐことができる。   As the rubber component according to the present invention, a linear rubber component having a weight average molecular weight of 300,000 or more is used. With the rubber component, adhesion and moisture resistance during curing can be improved, and film properties (workability) and flexibility in a semi-cured state can be easily ensured. The content of the rubber component is preferably 10 to 60% by mass in the solid content of the resin composition excluding the inorganic filler. By being 10% by mass or more, it is possible to prevent the occurrence of a phenomenon such as a crack when peeling from the base film (carrier film) at the time of semi-curing, so that handling becomes easy. Moreover, it can prevent that the heat characteristic of hardened | cured material falls rapidly and solder heat resistance falls because it is 60 mass% or less.

この重量平均分子量30万以上の線状ゴム成分としては、天然ゴム、ブタジエンゴム、スチレン−ブタジエンゴム、アクリルニトリル−ブタジエンゴム、エチレン−プロピレンゴム、アクリル−メタクリル系ゴム等の合成ゴム;ポリスチレン系、ポリオレフィン系、ポリ塩化ビニル系、ポリウレタン系等の熱可塑性エラストマ;等が使用できる。
上記合成ゴムの中でも、特にエポキシ基を導入したエポキシ変性アクリルニトリル−ブタジエンゴムがエポキシ樹脂との相溶性の面から好ましい。
添加されるゴム成分は、粘度1000〜10000mPa・sが好ましい。
なお、線状ゴム成分とは、少なくともその配合時に架橋構造が形成されていないゴム成分をいう。
Synthetic rubbers such as natural rubber, butadiene rubber, styrene-butadiene rubber, acrylonitrile-butadiene rubber, ethylene-propylene rubber, and acrylic-methacrylic rubber; Thermoplastic elastomers such as polyolefin, polyvinyl chloride and polyurethane can be used.
Among the above synthetic rubbers, epoxy-modified acrylonitrile-butadiene rubber introduced with an epoxy group is particularly preferable from the viewpoint of compatibility with the epoxy resin.
The added rubber component preferably has a viscosity of 1000 to 10000 mPa · s.
The linear rubber component refers to a rubber component in which a crosslinked structure is not formed at least when blended.

シリカファイバーの材質としては、SiO2純度96%以上の石英ガラスが好ましい。シリカファイバーの平均繊維長は3〜10μm、平均繊維径は0.1〜1.0μmとする。シリカファイバーが上記条件を満たさない場合、熱膨張係数が増大したり、耐電食性が低下してしまう。シリカファイバーの平均繊維長は2〜8μmであることが好ましく、平均繊維径は0.2〜0.9μmであることが好ましい。 As a material of the silica fiber, quartz glass having a SiO 2 purity of 96% or more is preferable. The average fiber length of the silica fiber is 3 to 10 μm, and the average fiber diameter is 0.1 to 1.0 μm. When silica fiber does not satisfy the above conditions, the coefficient of thermal expansion increases or the resistance to electric corrosion decreases. The average fiber length of the silica fiber is preferably 2 to 8 μm, and the average fiber diameter is preferably 0.2 to 0.9 μm.

また、シリカファイバーの含有量は、樹脂組成物の固形分中0.5〜5.0質量%とする。含有量が0.5質量%未満では、熱膨張係数の低下が得られない。また、5.0質量%を超えると樹脂流動性の低下による回路埋め込み性の低下や接着シートの切断時の粉落ち量が増大する。
なお、シリカファイバーについては、分散性向上を目的に、シランカップリング剤等による表面改質品を使用してもよい。
Moreover, content of a silica fiber shall be 0.5-5.0 mass% in solid content of a resin composition. When the content is less than 0.5% by mass, the thermal expansion coefficient cannot be reduced. On the other hand, if it exceeds 5.0% by mass, the circuit embeddability decreases due to a decrease in resin fluidity, and the amount of powder falling when cutting the adhesive sheet increases.
In addition, about silica fiber, you may use the surface modification goods by a silane coupling agent etc. for the purpose of a dispersibility improvement.

樹脂組成物には、上記各成分以外に必要に応じて各種成分を配合することができる。各種成分としては、シランカップリング剤、潤滑剤等が挙げられる。なお、シランカップリング剤を使用することによって、接着シートの密着性を向上させることができる。   In addition to the above components, various components can be blended in the resin composition as necessary. Examples of various components include silane coupling agents and lubricants. In addition, the adhesiveness of an adhesive sheet can be improved by using a silane coupling agent.

樹脂組成物をキャリアフィルムに塗布するには、樹脂組成物を有機溶媒に溶解・分散した塗布液を用いるのが好ましい。有機溶剤としては、トルエン、メチルエチルケトン(MEK)、ジメチルホルムアミド(DMF)、ジメチルアセトアミド(DMAC)等が使用できる。これらの溶剤は、単独あるいは混合系でもよい。   In order to apply the resin composition to the carrier film, it is preferable to use a coating solution in which the resin composition is dissolved and dispersed in an organic solvent. As the organic solvent, toluene, methyl ethyl ketone (MEK), dimethylformamide (DMF), dimethylacetamide (DMAC) and the like can be used. These solvents may be used alone or in a mixed system.

上記、配合により得られた塗布液をキャリアフィルムに塗布後、乾燥炉中で80℃〜180℃の範囲で溶剤除去し、半硬化させることにより本発明の絶縁樹脂接着シートが得られる。
ここでいうキャリアフィルムとは、PET、PBT、PPO、PENなどの乾燥温度に耐えうる有機フィルムや、銅、アルミニウム、ニッケル、金、銀の金属箔等があり、これらは単独もしくは組み合わせて用いることができる。
また、「半硬化」とは、膜の硬化・ゲル化が若干進んだ、いわゆるBステージの状態をいう。
After the coating liquid obtained by the above blending is applied to a carrier film, the solvent is removed in the range of 80 ° C. to 180 ° C. in a drying oven and semi-cured to obtain the insulating resin adhesive sheet of the present invention.
Carrier films here include organic films that can withstand drying temperatures such as PET, PBT, PPO, and PEN, and metal foils of copper, aluminum, nickel, gold, silver, etc., which should be used alone or in combination. Can do.
“Semi-cured” means a so-called B-stage state in which the film has been slightly cured and gelled.

乾燥条件は、特に制限されないが、絶縁樹脂接着シートを170℃15分乾燥させたときの揮発分が2.0%以下になるようにするのが好ましい。揮発分の調整は、上記熱処理条件を調整することにより行うことができる。揮発分を2.0%以下とすることで、絶縁樹脂接着シートのタック性が過剰となるのを防ぎ、作業性が良好なものとすることができる。   The drying conditions are not particularly limited, but it is preferable that the volatile content when the insulating resin adhesive sheet is dried at 170 ° C. for 15 minutes is 2.0% or less. The volatile matter can be adjusted by adjusting the heat treatment conditions. By setting the volatile content to 2.0% or less, it is possible to prevent the tackiness of the insulating resin adhesive sheet from becoming excessive and to improve the workability.

(多層プリント配線板)
本発明の多層プリント配線板は、その外層回路と内層回路とが絶縁樹脂層を介して電気的に接続されてなり、当該絶縁樹脂層が、既述の本発明の絶縁樹脂接着シートを単独で、又は積層した状態で硬化させて形成されてなる。当該多層プリント配線板の製造には、上記構成をとれば特に制限なく、種々の方法を適用することができる。
(Multilayer printed wiring board)
In the multilayer printed wiring board of the present invention, the outer layer circuit and the inner layer circuit are electrically connected via an insulating resin layer, and the insulating resin layer alone is the insulating resin adhesive sheet of the present invention described above. Or formed by curing in a laminated state. Various methods can be applied to the production of the multilayer printed wiring board without particular limitation as long as the above configuration is adopted.

次に、実施例により本発明の絶縁樹脂接着シートを説明するが、本発明はこの実施例に限定されるものではない。   Next, although the insulating resin adhesive sheet of this invention is demonstrated by an Example, this invention is not limited to this Example.

(実施例1)
・エポキシ樹脂(エピコート828、DIC製:70質量部)
・硬化剤(LF2882、DIC製:40質量部)
・エポキシ変性の線状ゴム成分(HTR−708、ナガセケムテックス製:重量平均分子量50万、60質量部)
・硬化促進剤(2PZ−CNS、四国化成工業製:0.5質量部)
・シリカ(SC2050、アドマテックス製:500質量部)
・シランカップリング剤(A−187、日本ユニカー製:5質量部)
・シリカファイバー(平均繊維長5.0μm、平均繊維径0.5μm:15質量部、日本バイリーン社製)
Example 1
・ Epoxy resin (Epicoat 828, manufactured by DIC: 70 parts by mass)
・ Curing agent (LF2882, manufactured by DIC: 40 parts by mass)
Epoxy-modified linear rubber component (HTR-708, manufactured by Nagase ChemteX: weight average molecular weight 500,000, 60 parts by mass)
・ Curing accelerator (2PZ-CNS, manufactured by Shikoku Chemicals: 0.5 parts by mass)
Silica (SC2050, manufactured by Admatex: 500 parts by mass)
Silane coupling agent (A-187, manufactured by Nihon Unicar: 5 parts by mass)
Silica fiber (average fiber length: 5.0 μm, average fiber diameter: 0.5 μm: 15 parts by mass, manufactured by Japan Vilene)

上記、各成分を溶媒であるMEK中に混合し、固形分55%、シリカファイバーの添加量が絶縁樹脂組成物の固形分中2.2質量%の樹脂組成物を含む塗布液を調製した。これを、離型処理したPETフィルム上に塗布し、130℃で乾燥して膜厚50μm、揮発分1.0%となるように樹脂組成物からなる半硬化膜を形成し、絶縁樹脂接着シートを作製した。   The above components were mixed in MEK as a solvent to prepare a coating solution containing a resin composition having a solid content of 55% and a silica fiber addition amount of 2.2% by mass in the solid content of the insulating resin composition. This was coated on a release-treated PET film and dried at 130 ° C. to form a semi-cured film made of a resin composition so that the film thickness was 50 μm and the volatile content was 1.0%, and an insulating resin adhesive sheet Was made.

絶縁樹脂接着シートの半硬化膜上に、PETフィルムを剥がした4枚の絶縁樹脂接着シートを重ね、170℃、3.0MPa、1時間の加熱加圧を行って樹脂硬化物を作製した。当該樹脂硬化物を用いて後述する熱膨張係数を求めた。   On the semi-cured film of the insulating resin adhesive sheet, four insulating resin adhesive sheets from which the PET film was peeled were stacked, and heated and pressurized at 170 ° C., 3.0 MPa for 1 hour to prepare a cured resin. The thermal expansion coefficient mentioned later was calculated | required using the said resin cured material.

また、作製した絶縁樹脂接着シートからPETフィルムを剥がしこれを、全面エッチングした基板(日立化成工業製MCL−E−679、0.8t)に載置し、その上に一般銅箔(日本電解製;YGP−35)を載せて、170℃、3.0MPa、1時間加熱加圧により評価用基板を作製した。当該評価用基板を用いて後述するピール強度、はんだ耐熱性、耐電食性、シートの粉落ち量を評価した。   Moreover, the PET film was peeled off from the produced insulating resin adhesive sheet, and this was placed on the substrate (Hitachi Kasei Kogyo MCL-E-679, 0.8t) which was etched on the entire surface. YGP-35) was mounted, and a substrate for evaluation was produced by heating and pressing at 170 ° C., 3.0 MPa for 1 hour. Using the evaluation substrate, the peel strength, solder heat resistance, electric corrosion resistance, and amount of powder fall of the sheet, which will be described later, were evaluated.

(実施例2)
シリカファイバーの添加量を絶縁樹脂組成物の0.5質量%となるように変更した以外は実施例1と同様の方法で絶縁樹脂接着シートを作製した。当該絶縁樹脂接着シートを用いて、実施例1と同様に樹脂硬化物及び評価用基板を作製し各評価を行った。
(Example 2)
An insulating resin adhesive sheet was produced in the same manner as in Example 1 except that the amount of silica fiber added was changed to 0.5% by mass of the insulating resin composition. Using the insulating resin adhesive sheet, a cured resin and a substrate for evaluation were produced in the same manner as in Example 1, and each evaluation was performed.

(実施例3)
シリカファイバーの添加量を絶縁樹脂組成物の5.0質量%となるように変更した以外は実施例1と同様の方法で絶縁樹脂接着シートを作製した。当該絶縁樹脂接着シートを用いて、実施例1と同様に樹脂硬化物及び評価用基板を作製し各評価を行った。
(Example 3)
An insulating resin adhesive sheet was produced in the same manner as in Example 1 except that the amount of silica fiber added was changed to 5.0 mass% of the insulating resin composition. Using the insulating resin adhesive sheet, a cured resin and a substrate for evaluation were produced in the same manner as in Example 1, and each evaluation was performed.

(実施例4)
ゴム成分として、エポキシ変性の線状ゴム成分(SG−80H、ナガセケムテックス製:重量平均分子量35万、60質量部)を使用した以外は実施例1と同様の方法で絶縁樹脂接着シートを作製した。当該絶縁樹脂接着シートを用いて、実施例1と同様に樹脂硬化物及び評価用基板を作製し各評価を行った。
Example 4
An insulating resin adhesive sheet was prepared in the same manner as in Example 1 except that an epoxy-modified linear rubber component (SG-80H, manufactured by Nagase ChemteX: weight average molecular weight 350,000, 60 parts by mass) was used as the rubber component. did. Using the insulating resin adhesive sheet, a cured resin and a substrate for evaluation were produced in the same manner as in Example 1, and each evaluation was performed.

(実施例5)
ゴム成分として、エポキシ変性の線状ゴム成分(HTR−280、ナガセケムテックス製:重量平均分子量90万、60質量部)を使用した以外は実施例1と同様の方法で絶縁樹脂接着シートを作製した。当該絶縁樹脂接着シートを用いて、実施例1と同様に樹脂硬化物及び評価用基板を作製し各評価を行った。
(Example 5)
An insulating resin adhesive sheet was prepared in the same manner as in Example 1 except that an epoxy-modified linear rubber component (HTR-280, manufactured by Nagase ChemteX: weight average molecular weight 900,000, 60 parts by mass) was used as the rubber component. did. Using the insulating resin adhesive sheet, a cured resin and a substrate for evaluation were produced in the same manner as in Example 1, and each evaluation was performed.

(比較例1)
シリカファイバーを全く加えなかった以外は実施例1と同様の方法で絶縁樹脂接着シートを作製した。当該絶縁樹脂接着シートを用いて、実施例1と同様に樹脂硬化物及び評価用基板を作製し各評価を行った。
(Comparative Example 1)
An insulating resin adhesive sheet was produced in the same manner as in Example 1 except that no silica fiber was added. Using the insulating resin adhesive sheet, a cured resin and a substrate for evaluation were produced in the same manner as in Example 1, and each evaluation was performed.

(比較例2)
シリカファイバーの含有量が絶縁樹脂組成物の7.0質量%となるように調整した以外は実施例1と同様の方法で絶縁樹脂接着シートを作製した。当該絶縁樹脂接着シートを用いて、実施例1と同様に樹脂硬化物及び評価用基板を作製し各評価を行った。
(Comparative Example 2)
An insulating resin adhesive sheet was produced in the same manner as in Example 1 except that the silica fiber content was adjusted to 7.0 mass% of the insulating resin composition. Using the insulating resin adhesive sheet, a cured resin and a substrate for evaluation were produced in the same manner as in Example 1, and each evaluation was performed.

(比較例3)
平均繊維長20μmのシリカファイバーの含有量が絶縁樹脂組成物の2.0質量%となるように調整した以外は実施例1と同様の方法で絶縁樹脂シートを作製した。当該絶縁樹脂接着シートを用いて、実施例1と同様に樹脂硬化物及び評価用基板を作製し各評価を行った。
(Comparative Example 3)
An insulating resin sheet was produced in the same manner as in Example 1 except that the content of silica fibers having an average fiber length of 20 μm was adjusted to 2.0 mass% of the insulating resin composition. Using the insulating resin adhesive sheet, a cured resin and a substrate for evaluation were produced in the same manner as in Example 1, and each evaluation was performed.

(比較例4)
ゴム成分として、架橋ゴム成分(PNR−1H、JSR製:重量平均分子量10万、60質量部)を使用した以外は実施例1と同様の方法で絶縁樹脂接着シートを作製した。当該絶縁樹脂接着シートを用いて、実施例1と同様に樹脂硬化物及び評価用基板を作製し各評価を行った。
(Comparative Example 4)
An insulating resin adhesive sheet was produced in the same manner as in Example 1 except that a crosslinked rubber component (PNR-1H, manufactured by JSR: weight average molecular weight 100,000, 60 parts by mass) was used as the rubber component. Using the insulating resin adhesive sheet, a cured resin and a substrate for evaluation were produced in the same manner as in Example 1, and each evaluation was performed.

各実施例及び比較例で作製した絶縁樹脂接着シート、樹脂硬化物、評価基板について下記評価を行った。結果を下記表1に示す。   The following evaluation was performed about the insulation resin adhesive sheet, resin cured material, and evaluation board | substrate produced by each Example and the comparative example. The results are shown in Table 1 below.

[熱膨張係数]
各実施例及び比較例で作製した樹脂硬化物について、熱機械分析装置(TMA)の引っ張りモードにて30〜100℃までの平均線膨張係数を算出した。
[Thermal expansion coefficient]
About the resin cured material produced by each Example and the comparative example, the average linear expansion coefficient to 30-100 degreeC was computed in the tension mode of the thermomechanical analyzer (TMA).

[ピール強度]
最外層の銅箔の一部に幅10mm、長さ100mmの部分を形成し、この一端を剥がしてつかみ具でつかみ、垂直方向に約50mm室温中で引き剥がした時の荷重を測定した。
[Peel strength]
A portion having a width of 10 mm and a length of 100 mm was formed on a part of the outermost copper foil. One end of the copper foil was peeled off and gripped with a gripper, and the load when peeled off at room temperature in the vertical direction by about 50 mm was measured.

[はんだ耐熱性]
各実施例及び比較例で作製した評価基板を、25mm角に切断し、288℃±2℃のはんだ漕にフロートし、ふくれが発生するまでの時間を調べた。
[Solder heat resistance]
The evaluation substrates produced in each of the examples and comparative examples were cut into 25 mm squares, floated on a soldering iron at 288 ° C. ± 2 ° C., and the time until blistering was examined.

[耐電食性]
予めライン/スペース間30/30μmの内層銅厚12μmのクシ歯パターンを形成した絶縁基板上に当該絶縁樹脂接着シートをラミネートし、実施例1に示す方法にて最外層に導体層を形成した。最外層の導体パターンをエッチング除去した後、テストパターンを85℃,85%RHに調整した恒温恒湿槽に入れ、直流5.0Vの電圧を連続的に印加し、内層クシ型パターンの絶縁劣化が発生するまでの時間を測定した。
[Electrical corrosion resistance]
The insulating resin adhesive sheet was laminated on an insulating substrate on which an inner layer copper thickness of 12 μm was formed 30/30 μm between lines / spaces in advance, and a conductor layer was formed as the outermost layer by the method shown in Example 1. After the outermost conductor pattern is removed by etching, the test pattern is placed in a constant temperature and humidity chamber adjusted to 85 ° C. and 85% RH, and a voltage of DC 5.0 V is continuously applied to deteriorate the insulation pattern of the inner layer comb pattern. The time until occurrence of was measured.

[シートの粉落ち量]
Bステージ状態にある絶縁樹脂接着シートの室温における切断加工時の粉落ち発生の有無を評価した。
[Amount of powder fallen from sheet]
The presence or absence of occurrence of powder falling during the cutting process at room temperature of the insulating resin adhesive sheet in the B stage state was evaluated.

Figure 0005109791
Figure 0005109791

表1より、本発明の接着シートを用いた樹脂硬化物及び評価基板は、実施例1〜5に示したようにめっき銅との接着強度及び288℃はんだ耐熱性、耐電食性等の多層プリント配線板用途としての諸特性を満足しつつ低熱膨張係数を示すことを確認した。   From Table 1, the resin cured product and the evaluation substrate using the adhesive sheet of the present invention are multilayer printed wiring such as adhesive strength with plated copper, 288 ° C. solder heat resistance, and electric corrosion resistance as shown in Examples 1 to 5. It was confirmed that a low coefficient of thermal expansion was exhibited while satisfying various properties as a plate application.

一方、シリカフィラーを必須に含んでいない比較例1では、実施例と比較して熱膨張係数が増加した。また、シリカファイバーの過剰添加した場合(比較例2)、及び、架橋ゴム成分を使用した場合(比較例4)では、絶縁樹脂接着シートの粉落ち量が顕著になった。平均繊維長が20μmの比較例3の場合では、30μm細線クシ型パターン間の耐電食性が低下した。   On the other hand, in the comparative example 1 which does not contain a silica filler essential, the thermal expansion coefficient increased compared with the Example. In addition, when the silica fiber was excessively added (Comparative Example 2) and when the crosslinked rubber component was used (Comparative Example 4), the amount of powder falling off of the insulating resin adhesive sheet became remarkable. In the case of the comparative example 3 whose average fiber length is 20 micrometers, the electrolytic corrosion resistance between 30 micrometers fine wire comb type | mold patterns fell.

Claims (2)

キャリアフィルム上に半硬化状態の樹脂組成物からなる半硬化膜が形成されてなり、
前記樹脂組成物が、エポキシ樹脂、硬化剤、無機充填剤、ゴム成分、及びシリカファイバーを含有し、
前記ゴム成分が、重量平均分子量30万以上の線状ゴム成分であり、
前記シリカファイバーの平均繊維長が3〜10μm、平均繊維径が0.1〜1.0μmであり、
前記樹脂組成物の固形分中の含有量として、エポキシ樹脂の含有量が2.0〜15.0質量%、無機充填剤の含有量が10〜80質量%、シリカファイバーの含有量が0.5〜5.0質量%、ゴム成分の含有量が無機充填剤を除いた樹脂組成物の固形分中10〜60質量%である絶縁樹脂接着シート。
A semi-cured film made of a semi-cured resin composition is formed on the carrier film,
The resin composition contains an epoxy resin, a curing agent, an inorganic filler, a rubber component, and silica fiber,
The rubber component is a linear rubber component having a weight average molecular weight of 300,000 or more,
The average fiber length of the silica fiber is 3 to 10 μm, the average fiber diameter is 0.1 to 1.0 μm,
As content in solid content of the said resin composition, content of an epoxy resin is 2.0-15.0 mass%, content of an inorganic filler is 10-80 mass%, and content of silica fiber is 0. 5 to 5.0% by mass , and an insulating resin adhesive sheet in which the content of the rubber component is 10 to 60% by mass in the solid content of the resin composition excluding the inorganic filler .
外層回路と内層回路とが絶縁樹脂層を介して電気的に接続されてなり、
前記絶縁樹脂層が、請求項1に記載の絶縁樹脂接着シートを単独で、又は積層した状態で硬化させて形成された多層プリント配線板。
The outer layer circuit and the inner layer circuit are electrically connected via an insulating resin layer,
A multilayer printed wiring board in which the insulating resin layer is formed by curing the insulating resin adhesive sheet according to claim 1 alone or in a laminated state.
JP2008123398A 2008-05-09 2008-05-09 Insulating resin adhesive sheet and multilayer printed wiring board Expired - Fee Related JP5109791B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2008123398A JP5109791B2 (en) 2008-05-09 2008-05-09 Insulating resin adhesive sheet and multilayer printed wiring board

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2008123398A JP5109791B2 (en) 2008-05-09 2008-05-09 Insulating resin adhesive sheet and multilayer printed wiring board

Publications (2)

Publication Number Publication Date
JP2009272532A JP2009272532A (en) 2009-11-19
JP5109791B2 true JP5109791B2 (en) 2012-12-26

Family

ID=41438814

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2008123398A Expired - Fee Related JP5109791B2 (en) 2008-05-09 2008-05-09 Insulating resin adhesive sheet and multilayer printed wiring board

Country Status (1)

Country Link
JP (1) JP5109791B2 (en)

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2001119152A (en) * 1999-10-22 2001-04-27 Hitachi Chem Co Ltd Insulating resin with copper foil and production method of multilayer printed wiring board
JP2007126498A (en) * 2005-11-01 2007-05-24 Hitachi Chem Co Ltd Method for producing insulating resin adhesive sheet and method for producing printed wiring board using insulating resin adhesive sheet
JP2007281281A (en) * 2006-04-10 2007-10-25 Hitachi Chem Co Ltd Metal foil with adhesion auxiliary agent, metal coated laminate using this, and printed wiring board

Also Published As

Publication number Publication date
JP2009272532A (en) 2009-11-19

Similar Documents

Publication Publication Date Title
CN100358398C (en) Copper foil with extremely thin adhesive layer and method for producing the copper foil with extremely thin adhesive layer
JP4957552B2 (en) Manufacturing method of prepreg with carrier for printed wiring board, prepreg with carrier for printed wiring board, manufacturing method of thin double-sided board for printed wiring board, thin double-sided board for printed wiring board, and manufacturing method of multilayer printed wiring board
CN103562436B (en) Undercoating layer for plating process, laminated board for wiring board and its manufacturing method, multilayer wiring board and its manufacturing method
KR20080044175A (en) Adhesive composition and adhesive sheet, coverlay film using same
CN100489048C (en) Binder composition for semiconductor device and binder sheet for semiconductor device
CN102640576A (en) Resin composition for use in formation of bonding layer in multilayer flexible printed circuit board, resin varnish, resin-coated copper foil, manufacturing method for resin-coated copper foil for use in manufacturing of multilayer flexible printed circuit board
KR20100059790A (en) Insulating resin composition for multilayer printed wiring board, insulating resin sheet with base material, multilayer printed wiring board, and semiconductor device
KR20070089053A (en) Thermosetting Resin Compositions, Wet-Stage Resin Films, and Multi-Layer Build-up Substrates
JP2007305963A (en) Substrate for mounting semiconductor element with stress relaxation layer and its manufacturing method
KR20040030588A (en) A Thermosetting Adhesive Film, and an Adhesive Structure Based on the Use Thereof
JP2009007424A (en) Adhesive composition, and adhesive sheet and coverlay film using the same
JP2012097197A (en) Flame-retardant adhesive composition and adhesive sheet and coverlay film using the same
JP2012241147A (en) Flame retardant adhesive composition, adhesive sheet and cover lay film using the same
CN103748672A (en) Substrate, method for producing same, heat-releasing substrate, and heat-releasing module
JP2012097195A (en) Flame-retardant adhesive composition and adhesive sheet and coverlay film using the same
JP5097349B2 (en) Epoxy resin composition and epoxy resin varnish, bonding sheet and coverlay film using the same
JP5682554B2 (en) Metal support flexible substrate and metal support carrier tape for tape automated bonding using the same, metal support flexible circuit substrate for LED mounting, and metal support flexible circuit substrate laminated with copper foil for circuit formation
JP5109791B2 (en) Insulating resin adhesive sheet and multilayer printed wiring board
JP2000301534A (en) Prepreg, metal-clad laminated board, and printed wiring board using prepreg and laminated board
JP2014185330A (en) Resin composition, primer layer for plating process, primer layer for plating process supported by substrate, cured primer layer for plating process, laminate for wiring board, method of producing laminate for wiring board, multilayer wiring board, and method of producing multilayer wiring board
JP6295708B2 (en) Resin composition, primer layer for plating process, primer layer for plating process with support, primer layer for post-curing plating process, laminated board for wiring board, method for producing laminated board for wiring board, multilayer wiring board, and multilayer wiring board Manufacturing method
JP4691401B2 (en) Adhesive composition for semiconductor device and adhesive sheet for semiconductor device
JP2010126642A (en) Adhesive composition preservable at ordinary temperaturer and adhesive sheet and coverlay film using the same
US20120305291A1 (en) Primer layer for plating process, laminate for wiring board and method for manufacture thereof, multilayer wiring board and method for manufacture thereof
JP6610612B2 (en) Resin sheet with support

Legal Events

Date Code Title Description
A621 Written request for application examination

Free format text: JAPANESE INTERMEDIATE CODE: A621

Effective date: 20110302

A131 Notification of reasons for refusal

Free format text: JAPANESE INTERMEDIATE CODE: A131

Effective date: 20120410

A977 Report on retrieval

Free format text: JAPANESE INTERMEDIATE CODE: A971007

Effective date: 20120412

A521 Request for written amendment filed

Free format text: JAPANESE INTERMEDIATE CODE: A523

Effective date: 20120529

TRDD Decision of grant or rejection written
A01 Written decision to grant a patent or to grant a registration (utility model)

Free format text: JAPANESE INTERMEDIATE CODE: A01

Effective date: 20120911

A01 Written decision to grant a patent or to grant a registration (utility model)

Free format text: JAPANESE INTERMEDIATE CODE: A01

A61 First payment of annual fees (during grant procedure)

Free format text: JAPANESE INTERMEDIATE CODE: A61

Effective date: 20120924

FPAY Renewal fee payment (event date is renewal date of database)

Free format text: PAYMENT UNTIL: 20151019

Year of fee payment: 3

R151 Written notification of patent or utility model registration

Ref document number: 5109791

Country of ref document: JP

Free format text: JAPANESE INTERMEDIATE CODE: R151

FPAY Renewal fee payment (event date is renewal date of database)

Free format text: PAYMENT UNTIL: 20151019

Year of fee payment: 3

S531 Written request for registration of change of domicile

Free format text: JAPANESE INTERMEDIATE CODE: R313531

S533 Written request for registration of change of name

Free format text: JAPANESE INTERMEDIATE CODE: R313533

FPAY Renewal fee payment (event date is renewal date of database)

Free format text: PAYMENT UNTIL: 20151019

Year of fee payment: 3

R350 Written notification of registration of transfer

Free format text: JAPANESE INTERMEDIATE CODE: R350

S531 Written request for registration of change of domicile

Free format text: JAPANESE INTERMEDIATE CODE: R313531

S533 Written request for registration of change of name

Free format text: JAPANESE INTERMEDIATE CODE: R313533

R350 Written notification of registration of transfer

Free format text: JAPANESE INTERMEDIATE CODE: R350

S801 Written request for registration of abandonment of right

Free format text: JAPANESE INTERMEDIATE CODE: R311801

R360 Written notification for declining of transfer of rights

Free format text: JAPANESE INTERMEDIATE CODE: R360

LAPS Cancellation because of no payment of annual fees
R360 Written notification for declining of transfer of rights

Free format text: JAPANESE INTERMEDIATE CODE: R360

R371 Transfer withdrawn

Free format text: JAPANESE INTERMEDIATE CODE: R371

S801 Written request for registration of abandonment of right

Free format text: JAPANESE INTERMEDIATE CODE: R311801

R371 Transfer withdrawn

Free format text: JAPANESE INTERMEDIATE CODE: R371