JP5099577B2 - Heat resistant resin varnish, heat resistant resin film, and heat resistant resin composite - Google Patents
Heat resistant resin varnish, heat resistant resin film, and heat resistant resin composite Download PDFInfo
- Publication number
- JP5099577B2 JP5099577B2 JP2006184960A JP2006184960A JP5099577B2 JP 5099577 B2 JP5099577 B2 JP 5099577B2 JP 2006184960 A JP2006184960 A JP 2006184960A JP 2006184960 A JP2006184960 A JP 2006184960A JP 5099577 B2 JP5099577 B2 JP 5099577B2
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- JP
- Japan
- Prior art keywords
- resistant resin
- heat
- varnish
- heat resistant
- resin
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
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- 229920006015 heat resistant resin Polymers 0.000 title claims description 75
- 239000002966 varnish Substances 0.000 title claims description 61
- 239000000805 composite resin Substances 0.000 title claims description 7
- 229920005989 resin Polymers 0.000 claims description 54
- 239000011347 resin Substances 0.000 claims description 54
- 229920005575 poly(amic acid) Polymers 0.000 claims description 34
- IQPQWNKOIGAROB-UHFFFAOYSA-N isocyanate group Chemical group [N-]=C=O IQPQWNKOIGAROB-UHFFFAOYSA-N 0.000 claims description 20
- 239000002981 blocking agent Substances 0.000 claims description 13
- 239000000463 material Substances 0.000 claims description 10
- 229920002312 polyamide-imide Polymers 0.000 description 49
- 239000004962 Polyamide-imide Substances 0.000 description 46
- SECXISVLQFMRJM-UHFFFAOYSA-N N-Methylpyrrolidone Chemical compound CN1CCCC1=O SECXISVLQFMRJM-UHFFFAOYSA-N 0.000 description 26
- 229920001721 polyimide Polymers 0.000 description 26
- 239000009719 polyimide resin Substances 0.000 description 22
- 238000002156 mixing Methods 0.000 description 18
- 230000000052 comparative effect Effects 0.000 description 17
- -1 2- (3,4-dicarboxyphenyl) -2- (3-carboxyphenyl) propane anhydride Chemical class 0.000 description 12
- OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical compound OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 description 12
- 238000000576 coating method Methods 0.000 description 10
- 239000002904 solvent Substances 0.000 description 10
- 239000011248 coating agent Substances 0.000 description 9
- 239000002184 metal Substances 0.000 description 9
- 229910052751 metal Inorganic materials 0.000 description 9
- 238000000034 method Methods 0.000 description 9
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- 238000013329 compounding Methods 0.000 description 7
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- 239000000758 substrate Substances 0.000 description 7
- GTDPSWPPOUPBNX-UHFFFAOYSA-N ac1mqpva Chemical compound CC12C(=O)OC(=O)C1(C)C1(C)C2(C)C(=O)OC1=O GTDPSWPPOUPBNX-UHFFFAOYSA-N 0.000 description 6
- SRPWOOOHEPICQU-UHFFFAOYSA-N trimellitic anhydride Chemical compound OC(=O)C1=CC=C2C(=O)OC(=O)C2=C1 SRPWOOOHEPICQU-UHFFFAOYSA-N 0.000 description 6
- 238000010438 heat treatment Methods 0.000 description 5
- 238000007789 sealing Methods 0.000 description 5
- 239000007787 solid Substances 0.000 description 5
- 150000003628 tricarboxylic acids Chemical class 0.000 description 5
- 239000004642 Polyimide Substances 0.000 description 4
- 238000006243 chemical reaction Methods 0.000 description 4
- 238000001816 cooling Methods 0.000 description 4
- 150000004985 diamines Chemical class 0.000 description 4
- VLDPXPPHXDGHEW-UHFFFAOYSA-N 1-chloro-2-dichlorophosphoryloxybenzene Chemical compound ClC1=CC=CC=C1OP(Cl)(Cl)=O VLDPXPPHXDGHEW-UHFFFAOYSA-N 0.000 description 3
- RTZKZFJDLAIYFH-UHFFFAOYSA-N Diethyl ether Chemical compound CCOCC RTZKZFJDLAIYFH-UHFFFAOYSA-N 0.000 description 3
- 150000007513 acids Chemical class 0.000 description 3
- 150000001298 alcohols Chemical class 0.000 description 3
- 238000010790 dilution Methods 0.000 description 3
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- 239000002243 precursor Substances 0.000 description 3
- 125000006158 tetracarboxylic acid group Chemical group 0.000 description 3
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- UENRXLSRMCSUSN-UHFFFAOYSA-N 3,5-diaminobenzoic acid Chemical compound NC1=CC(N)=CC(C(O)=O)=C1 UENRXLSRMCSUSN-UHFFFAOYSA-N 0.000 description 2
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- UITKHKNFVCYWNG-UHFFFAOYSA-N 4-(3,4-dicarboxybenzoyl)phthalic acid Chemical compound C1=C(C(O)=O)C(C(=O)O)=CC=C1C(=O)C1=CC=C(C(O)=O)C(C(O)=O)=C1 UITKHKNFVCYWNG-UHFFFAOYSA-N 0.000 description 2
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- ZHBXLZQQVCDGPA-UHFFFAOYSA-N 5-[(1,3-dioxo-2-benzofuran-5-yl)sulfonyl]-2-benzofuran-1,3-dione Chemical compound C1=C2C(=O)OC(=O)C2=CC(S(=O)(=O)C=2C=C3C(=O)OC(C3=CC=2)=O)=C1 ZHBXLZQQVCDGPA-UHFFFAOYSA-N 0.000 description 2
- IAZDPXIOMUYVGZ-UHFFFAOYSA-N Dimethylsulphoxide Chemical compound CS(C)=O IAZDPXIOMUYVGZ-UHFFFAOYSA-N 0.000 description 2
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 2
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- ZMXDDKWLCZADIW-UHFFFAOYSA-N N,N-Dimethylformamide Chemical compound CN(C)C=O ZMXDDKWLCZADIW-UHFFFAOYSA-N 0.000 description 2
- LRHPLDYGYMQRHN-UHFFFAOYSA-N N-Butanol Chemical compound CCCCO LRHPLDYGYMQRHN-UHFFFAOYSA-N 0.000 description 2
- UCKMPCXJQFINFW-UHFFFAOYSA-N Sulphide Chemical compound [S-2] UCKMPCXJQFINFW-UHFFFAOYSA-N 0.000 description 2
- KKEYFWRCBNTPAC-UHFFFAOYSA-N Terephthalic acid Chemical compound OC(=O)C1=CC=C(C(O)=O)C=C1 KKEYFWRCBNTPAC-UHFFFAOYSA-N 0.000 description 2
- WNLRTRBMVRJNCN-UHFFFAOYSA-N adipic acid Chemical compound OC(=O)CCCCC(O)=O WNLRTRBMVRJNCN-UHFFFAOYSA-N 0.000 description 2
- 125000002723 alicyclic group Chemical group 0.000 description 2
- 125000001931 aliphatic group Chemical group 0.000 description 2
- 125000003118 aryl group Chemical group 0.000 description 2
- QMKYBPDZANOJGF-UHFFFAOYSA-N benzene-1,3,5-tricarboxylic acid Chemical compound OC(=O)C1=CC(C(O)=O)=CC(C(O)=O)=C1 QMKYBPDZANOJGF-UHFFFAOYSA-N 0.000 description 2
- 230000015572 biosynthetic process Effects 0.000 description 2
- PAFZNILMFXTMIY-UHFFFAOYSA-N cyclohexylamine Chemical compound NC1CCCCC1 PAFZNILMFXTMIY-UHFFFAOYSA-N 0.000 description 2
- 230000007423 decrease Effects 0.000 description 2
- 238000007865 diluting Methods 0.000 description 2
- NIHNNTQXNPWCJQ-UHFFFAOYSA-N fluorene Chemical compound C1=CC=C2CC3=CC=CC=C3C2=C1 NIHNNTQXNPWCJQ-UHFFFAOYSA-N 0.000 description 2
- 238000001879 gelation Methods 0.000 description 2
- 125000005462 imide group Chemical group 0.000 description 2
- 238000009413 insulation Methods 0.000 description 2
- QQVIHTHCMHWDBS-UHFFFAOYSA-N isophthalic acid Chemical compound OC(=O)C1=CC=CC(C(O)=O)=C1 QQVIHTHCMHWDBS-UHFFFAOYSA-N 0.000 description 2
- AMXOYNBUYSYVKV-UHFFFAOYSA-M lithium bromide Chemical compound [Li+].[Br-] AMXOYNBUYSYVKV-UHFFFAOYSA-M 0.000 description 2
- 238000005259 measurement Methods 0.000 description 2
- VNWKTOKETHGBQD-UHFFFAOYSA-N methane Chemical compound C VNWKTOKETHGBQD-UHFFFAOYSA-N 0.000 description 2
- 150000002989 phenols Chemical class 0.000 description 2
- ZUOUZKKEUPVFJK-UHFFFAOYSA-N phenylbenzene Natural products C1=CC=CC=C1C1=CC=CC=C1 ZUOUZKKEUPVFJK-UHFFFAOYSA-N 0.000 description 2
- 230000000704 physical effect Effects 0.000 description 2
- 239000002798 polar solvent Substances 0.000 description 2
- 239000005056 polyisocyanate Substances 0.000 description 2
- 229920001228 polyisocyanate Polymers 0.000 description 2
- 238000002360 preparation method Methods 0.000 description 2
- CYIDZMCFTVVTJO-UHFFFAOYSA-N pyromellitic acid Chemical compound OC(=O)C1=CC(C(O)=O)=C(C(O)=O)C=C1C(O)=O CYIDZMCFTVVTJO-UHFFFAOYSA-N 0.000 description 2
- 230000009257 reactivity Effects 0.000 description 2
- CXMXRPHRNRROMY-UHFFFAOYSA-N sebacic acid Chemical compound OC(=O)CCCCCCCCC(O)=O CXMXRPHRNRROMY-UHFFFAOYSA-N 0.000 description 2
- 239000000243 solution Substances 0.000 description 2
- 239000000126 substance Substances 0.000 description 2
- PMTMAFAPLCGXGK-JMTMCXQRSA-N (15Z)-12-oxophyto-10,15-dienoic acid Chemical compound CC\C=C/C[C@H]1[C@@H](CCCCCCCC(O)=O)C=CC1=O PMTMAFAPLCGXGK-JMTMCXQRSA-N 0.000 description 1
- NSGXIBWMJZWTPY-UHFFFAOYSA-N 1,1,1,3,3,3-hexafluoropropane Chemical compound FC(F)(F)CC(F)(F)F NSGXIBWMJZWTPY-UHFFFAOYSA-N 0.000 description 1
- FKTHNVSLHLHISI-UHFFFAOYSA-N 1,2-bis(isocyanatomethyl)benzene Chemical compound O=C=NCC1=CC=CC=C1CN=C=O FKTHNVSLHLHISI-UHFFFAOYSA-N 0.000 description 1
- ZTNJGMFHJYGMDR-UHFFFAOYSA-N 1,2-diisocyanatoethane Chemical compound O=C=NCCN=C=O ZTNJGMFHJYGMDR-UHFFFAOYSA-N 0.000 description 1
- VGHSXKTVMPXHNG-UHFFFAOYSA-N 1,3-diisocyanatobenzene Chemical compound O=C=NC1=CC=CC(N=C=O)=C1 VGHSXKTVMPXHNG-UHFFFAOYSA-N 0.000 description 1
- WZCQRUWWHSTZEM-UHFFFAOYSA-N 1,3-phenylenediamine Chemical compound NC1=CC=CC(N)=C1 WZCQRUWWHSTZEM-UHFFFAOYSA-N 0.000 description 1
- ALQLPWJFHRMHIU-UHFFFAOYSA-N 1,4-diisocyanatobenzene Chemical compound O=C=NC1=CC=C(N=C=O)C=C1 ALQLPWJFHRMHIU-UHFFFAOYSA-N 0.000 description 1
- CDMDQYCEEKCBGR-UHFFFAOYSA-N 1,4-diisocyanatocyclohexane Chemical compound O=C=NC1CCC(N=C=O)CC1 CDMDQYCEEKCBGR-UHFFFAOYSA-N 0.000 description 1
- CBCKQZAAMUWICA-UHFFFAOYSA-N 1,4-phenylenediamine Chemical compound NC1=CC=C(N)C=C1 CBCKQZAAMUWICA-UHFFFAOYSA-N 0.000 description 1
- SBJCUZQNHOLYMD-UHFFFAOYSA-N 1,5-Naphthalene diisocyanate Chemical compound C1=CC=C2C(N=C=O)=CC=CC2=C1N=C=O SBJCUZQNHOLYMD-UHFFFAOYSA-N 0.000 description 1
- 229940008841 1,6-hexamethylene diisocyanate Drugs 0.000 description 1
- LFSYUSUFCBOHGU-UHFFFAOYSA-N 1-isocyanato-2-[(4-isocyanatophenyl)methyl]benzene Chemical compound C1=CC(N=C=O)=CC=C1CC1=CC=CC=C1N=C=O LFSYUSUFCBOHGU-UHFFFAOYSA-N 0.000 description 1
- RDMFEHLCCOQUMH-UHFFFAOYSA-N 2,4'-Diphenyldiamine Chemical group C1=CC(N)=CC=C1C1=CC=CC=C1N RDMFEHLCCOQUMH-UHFFFAOYSA-N 0.000 description 1
- VOZKAJLKRJDJLL-UHFFFAOYSA-N 2,4-diaminotoluene Chemical compound CC1=CC=C(N)C=C1N VOZKAJLKRJDJLL-UHFFFAOYSA-N 0.000 description 1
- 229940075142 2,5-diaminotoluene Drugs 0.000 description 1
- SBASXUCJHJRPEV-UHFFFAOYSA-N 2-(2-methoxyethoxy)ethanol Chemical compound COCCOCCO SBASXUCJHJRPEV-UHFFFAOYSA-N 0.000 description 1
- XNWFRZJHXBZDAG-UHFFFAOYSA-N 2-METHOXYETHANOL Chemical compound COCCO XNWFRZJHXBZDAG-UHFFFAOYSA-N 0.000 description 1
- ZGDMDBHLKNQPSD-UHFFFAOYSA-N 2-amino-5-(4-amino-3-hydroxyphenyl)phenol Chemical group C1=C(O)C(N)=CC=C1C1=CC=C(N)C(O)=C1 ZGDMDBHLKNQPSD-UHFFFAOYSA-N 0.000 description 1
- ZNQVEEAIQZEUHB-UHFFFAOYSA-N 2-ethoxyethanol Chemical compound CCOCCO ZNQVEEAIQZEUHB-UHFFFAOYSA-N 0.000 description 1
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- 238000007796 conventional method Methods 0.000 description 1
- 239000013256 coordination polymer Substances 0.000 description 1
- 239000007822 coupling agent Substances 0.000 description 1
- 238000005336 cracking Methods 0.000 description 1
- 229930003836 cresol Natural products 0.000 description 1
- HPXRVTGHNJAIIH-UHFFFAOYSA-N cyclohexanol Chemical compound OC1CCCCC1 HPXRVTGHNJAIIH-UHFFFAOYSA-N 0.000 description 1
- STZIXLPVKZUAMV-UHFFFAOYSA-N cyclopentane-1,1,2,2-tetracarboxylic acid Chemical compound OC(=O)C1(C(O)=O)CCCC1(C(O)=O)C(O)=O STZIXLPVKZUAMV-UHFFFAOYSA-N 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 125000005442 diisocyanate group Chemical group 0.000 description 1
- 239000003085 diluting agent Substances 0.000 description 1
- 125000000118 dimethyl group Chemical group [H]C([H])([H])* 0.000 description 1
- AIJZIRPGCQPZSL-UHFFFAOYSA-N ethylenetetracarboxylic acid Chemical compound OC(=O)C(C(O)=O)=C(C(O)=O)C(O)=O AIJZIRPGCQPZSL-UHFFFAOYSA-N 0.000 description 1
- 238000011156 evaluation Methods 0.000 description 1
- 238000013213 extrapolation Methods 0.000 description 1
- 239000000945 filler Substances 0.000 description 1
- 239000011521 glass Substances 0.000 description 1
- 125000000623 heterocyclic group Chemical group 0.000 description 1
- RRAMGCGOFNQTLD-UHFFFAOYSA-N hexamethylene diisocyanate Chemical compound O=C=NCCCCCCN=C=O RRAMGCGOFNQTLD-UHFFFAOYSA-N 0.000 description 1
- 239000011810 insulating material Substances 0.000 description 1
- NIMLQBUJDJZYEJ-UHFFFAOYSA-N isophorone diisocyanate Chemical compound CC1(C)CC(N=C=O)CC(C)(CN=C=O)C1 NIMLQBUJDJZYEJ-UHFFFAOYSA-N 0.000 description 1
- 239000000314 lubricant Substances 0.000 description 1
- 229940018564 m-phenylenediamine Drugs 0.000 description 1
- 150000001247 metal acetylides Chemical class 0.000 description 1
- 150000002739 metals Chemical class 0.000 description 1
- WRYWBRATLBWSSG-UHFFFAOYSA-N naphthalene-1,2,4-tricarboxylic acid Chemical compound C1=CC=CC2=C(C(O)=O)C(C(=O)O)=CC(C(O)=O)=C21 WRYWBRATLBWSSG-UHFFFAOYSA-N 0.000 description 1
- OBKARQMATMRWQZ-UHFFFAOYSA-N naphthalene-1,2,5,6-tetracarboxylic acid Chemical compound OC(=O)C1=C(C(O)=O)C=CC2=C(C(O)=O)C(C(=O)O)=CC=C21 OBKARQMATMRWQZ-UHFFFAOYSA-N 0.000 description 1
- CYPRBDCCNAZGDN-UHFFFAOYSA-N naphthalene-1,6,7-tricarboxylic acid Chemical compound C1=CC(C(O)=O)=C2C=C(C(O)=O)C(C(=O)O)=CC2=C1 CYPRBDCCNAZGDN-UHFFFAOYSA-N 0.000 description 1
- DOBFTMLCEYUAQC-UHFFFAOYSA-N naphthalene-2,3,6,7-tetracarboxylic acid Chemical compound OC(=O)C1=C(C(O)=O)C=C2C=C(C(O)=O)C(C(=O)O)=CC2=C1 DOBFTMLCEYUAQC-UHFFFAOYSA-N 0.000 description 1
- BTHGHFBUGBTINV-UHFFFAOYSA-N naphthalene-2,3,6-tricarboxylic acid Chemical compound C1=C(C(O)=O)C(C(O)=O)=CC2=CC(C(=O)O)=CC=C21 BTHGHFBUGBTINV-UHFFFAOYSA-N 0.000 description 1
- 150000004767 nitrides Chemical class 0.000 description 1
- 229910052757 nitrogen Inorganic materials 0.000 description 1
- 239000012299 nitrogen atmosphere Substances 0.000 description 1
- WVDDGKGOMKODPV-ZQBYOMGUSA-N phenyl(114C)methanol Chemical compound O[14CH2]C1=CC=CC=C1 WVDDGKGOMKODPV-ZQBYOMGUSA-N 0.000 description 1
- 229920000573 polyethylene Polymers 0.000 description 1
- 229920000642 polymer Polymers 0.000 description 1
- 229920001296 polysiloxane Polymers 0.000 description 1
- 229920002223 polystyrene Polymers 0.000 description 1
- 238000012545 processing Methods 0.000 description 1
- BDERNNFJNOPAEC-UHFFFAOYSA-N propan-1-ol Chemical compound CCCO BDERNNFJNOPAEC-UHFFFAOYSA-N 0.000 description 1
- WGYKZJWCGVVSQN-UHFFFAOYSA-N propylamine Chemical group CCCN WGYKZJWCGVVSQN-UHFFFAOYSA-N 0.000 description 1
- VHNQIURBCCNWDN-UHFFFAOYSA-N pyridine-2,6-diamine Chemical compound NC1=CC=CC(N)=N1 VHNQIURBCCNWDN-UHFFFAOYSA-N 0.000 description 1
- 230000003014 reinforcing effect Effects 0.000 description 1
- 239000011342 resin composition Substances 0.000 description 1
- 238000006798 ring closing metathesis reaction Methods 0.000 description 1
- 239000000523 sample Substances 0.000 description 1
- 239000004065 semiconductor Substances 0.000 description 1
- 238000000926 separation method Methods 0.000 description 1
- 230000000087 stabilizing effect Effects 0.000 description 1
- 238000003860 storage Methods 0.000 description 1
- 150000003462 sulfoxides Chemical class 0.000 description 1
- 238000003786 synthesis reaction Methods 0.000 description 1
- DVKJHBMWWAPEIU-UHFFFAOYSA-N toluene 2,4-diisocyanate Chemical compound CC1=CC=C(N=C=O)C=C1N=C=O DVKJHBMWWAPEIU-UHFFFAOYSA-N 0.000 description 1
- RUELTTOHQODFPA-UHFFFAOYSA-N toluene 2,6-diisocyanate Chemical compound CC1=C(N=C=O)C=CC=C1N=C=O RUELTTOHQODFPA-UHFFFAOYSA-N 0.000 description 1
- 150000003739 xylenols Chemical class 0.000 description 1
Images
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- Compositions Of Macromolecular Compounds (AREA)
- Organic Insulating Materials (AREA)
- Insulating Bodies (AREA)
- Paints Or Removers (AREA)
- Macromolecular Compounds Obtained By Forming Nitrogen-Containing Linkages In General (AREA)
Description
本発明は、低価格で、かつ靭性に優れた硬化物を形成する耐熱性樹脂ワニス、並びに、この耐熱性樹脂ワニスを用いて形成される耐熱樹脂フィルム、及び耐熱樹脂複合体に関する。 The present invention relates to a heat resistant resin varnish that forms a cured product that is inexpensive and excellent in toughness, a heat resistant resin film that is formed using the heat resistant resin varnish, and a heat resistant resin composite.
自動車用の高出力モーター等に使用される絶縁電線の絶縁被覆、小型化・省電力化が求められている各種電気機器やフレキシブルプリント配線板に使用される絶縁フィルム等については、近年、高い耐熱性とともに、より高い伸びと強度、すなわちより優れた靭性が求められている。 Insulation coatings for insulated wires used for high-power motors for automobiles, etc., and various types of electrical equipment and flexible printed wiring boards for which miniaturization and power saving are required have recently been highly heat resistant. Along with the properties, higher elongation and strength, that is, better toughness is required.
例えば、高出力モーターでは、小型化、高効率化(高出力化)を高占積率により達成するため、コイルにプレス加工を加えたり、モーターのステータコアスロットへの絶縁電線の挿入本数を増やしたり、コイルを形成する絶縁電線の断面形状を、円形状から六角形状や矩形状等にする加工が考えられているが、これらの場合は、加工に伴う絶縁被覆の割れ等を防ぐために優れた靭性を有する絶縁材料が求められる。また、携帯電話やプリンタ等の駆動部分に使用される耐熱樹脂フィルムには、高い耐熱性とともに、屈曲等の駆動に耐える優れた靭性等の機械的特性が求められる。 For example, in a high-power motor, to achieve downsizing and high efficiency (high output) with a high space factor, the coil is pressed or the number of insulated wires inserted into the stator core slot of the motor is increased. It is considered to change the cross-sectional shape of the insulated wire forming the coil from a circular shape to a hexagonal shape, a rectangular shape, etc., but in these cases, excellent toughness to prevent cracking of the insulation coating accompanying the processing There is a need for insulating materials having Further, a heat-resistant resin film used for a driving part of a mobile phone or a printer is required to have high heat resistance and mechanical properties such as excellent toughness that can withstand driving such as bending.
高い耐熱性とともに優れた靭性を有する耐熱樹脂材料としては、ポリイミド樹脂が知られている。しかし、ポリイミド樹脂は高価である。そこで、低価格であって、加工性に優れた高靭性耐熱樹脂材料が求められている。 A polyimide resin is known as a heat-resistant resin material having high heat resistance and excellent toughness. However, polyimide resin is expensive. Therefore, there is a demand for a high-toughness heat-resistant resin material that is inexpensive and excellent in workability.
ポリイミド樹脂よりも低価格でかつ加工性に優れた耐熱樹脂材料としては、ポリアミドイミド樹脂とポリイミド樹脂との混合物が提案されており、例えば、特開2005−78934号公報(特許文献1)や特開2005−302597号公報(特許文献2)等に記載されている。
しかし、特許文献1の段落0010において、「一般的にポリアミドイミドワニスとポリアミド酸(ポリイミド樹脂の前駆体)ワニスは単純に混合させることが困難であるが、混合しながら60〜80℃に加熱し、室温まで冷却することによりその混合物は安定化する。」と記載されているように、ポリアミドイミド樹脂とポリアミド酸を普通に混合すると、高粘度化(ゲル化)して塗装困難となる問題が生じる。この問題を防ぐためには、加熱混合した後冷却して安定化させる等の煩雑な工程を設ける必要があり、またこのような工程を設けても実際には混合が困難となる場合が多い。 However, in paragraph 0010 of Patent Document 1, “In general, it is difficult to simply mix the polyamideimide varnish and the polyamic acid (polyimide resin precursor) varnish, but the mixture is heated to 60 to 80 ° C. while mixing. , The mixture is stabilized by cooling to room temperature. ”As described in the article, when the polyamideimide resin and the polyamic acid are normally mixed, there is a problem that the coating becomes difficult due to high viscosity (gelation). Arise. In order to prevent this problem, it is necessary to provide a complicated process such as cooling and stabilizing after heating and mixing, and even if such a process is provided, mixing is often difficult in practice.
本発明は上記の問題点に鑑みてなされたもので、加熱、冷却等の煩雑な工程を設けなくても高粘度化せず、導体線等の基材上への塗布が容易であるとともに、ポリイミド樹脂を用いた場合に匹敵する優れた強度と伸び(靭性)を有する硬化物を形成でき、さらにポリイミド樹脂ワニスと比べて低価格である耐熱性樹脂ワニスを提供することを課題とする。本発明はさらに、該耐熱性樹脂ワニスの硬化物よりなり、優れた靭性を有する耐熱樹脂フィルム、及び該耐熱樹脂フィルムを構成要素とする耐熱樹脂複合体を提供する。 The present invention was made in view of the above problems, and does not increase in viscosity without providing complicated steps such as heating and cooling, and is easy to apply on a substrate such as a conductor wire, It is an object of the present invention to provide a heat-resistant resin varnish that can form a cured product having excellent strength and elongation (toughness) comparable to that when a polyimide resin is used, and that is less expensive than a polyimide resin varnish. The present invention further provides a heat-resistant resin film made of a cured product of the heat-resistant resin varnish and having excellent toughness, and a heat-resistant resin composite comprising the heat-resistant resin film as a constituent element.
本発明者は、鋭意研究を行った結果、ポリアミドイミド樹脂の分子末端イソシアネート官能基をブロック剤で封止した後にポリアミド酸と混合することにより、混合に伴う高粘度化(ゲル化)が抑制でき、塗布が可能な低粘度の混合物を、加熱、冷却等を行わずに得ることができることを見いだした。本発明者はさらに、このようにして得られた混合物を焼き付けして得られる硬化物は、ポリイミド樹脂に近い又はポリイミド樹脂に匹敵する優れた靭性を有することを見出し、本発明を完成した。 As a result of intensive studies, the present inventors have been able to suppress the increase in viscosity (gelation) associated with mixing by sealing the molecular terminal isocyanate functional group of the polyamideimide resin with a blocking agent and then mixing with polyamic acid. It has been found that a low-viscosity mixture that can be applied can be obtained without heating and cooling. The inventor further found that the cured product obtained by baking the mixture thus obtained has excellent toughness close to or comparable to the polyimide resin, and completed the present invention.
すなわち本発明は、分子末端イソシアネート官能基をブロック剤で封止したポリアミドイミド樹脂、及びポリアミド酸を含有することを特徴とする耐熱性樹脂ワニスを提供する(請求項1)。 That is, this invention provides the heat resistant resin varnish characterized by containing the polyamidoimide resin which sealed the molecular terminal isocyanate functional group with the blocking agent, and polyamic acid (Claim 1).
ここで使用できるポリアミドイミド樹脂は、例えば、有機溶媒中で、トリカルボン酸無水物と、1分子中に2個以上のイソシアネート基を有する多価イソシアネート類とを直接反応させる方法により、あるいは、極性溶媒中で、トリカルボン酸無水物と1分子中に2個以上のアミン基を有する多価アミン類を先に反応させて先ずイミド結合を導入し、次いで1分子中に2個以上のイソシアネート基を有する多価ソシアネート類でアミド化する方法等により製造することができる。 The polyamideimide resin that can be used here is, for example, a method in which a tricarboxylic acid anhydride and a polyvalent isocyanate having two or more isocyanate groups in one molecule are directly reacted in an organic solvent, or a polar solvent. Among them, a tricarboxylic acid anhydride and a polyvalent amine having two or more amine groups in one molecule are reacted first to introduce an imide bond first, and then two or more isocyanate groups in one molecule. It can be produced by a method such as amidation with polyvalent socyanates.
トリカルボン酸無水物としては、例えば、トリメリット酸無水物(TMA)、2−(3,4−ジカルボキシフェニル)−2−(3−カルボキシフェニル)プロパン無水物、(3,4−ジカルボキシフェニル)(3−カルボキシフェニル)メタン無水物、(3,4−ジカルボキシフェニル)(3−カルボキシフェニル)エーテル無水物、3,3’,4−トリカルボキシベンゾフェノン無水物、1,2,4−ブタントリカルボン酸無水物、2,3,5−ナフタレントリカルボン酸無水物、2,3,6−ナフタレントリカルボン酸無水物、1,2,4−ナフタレントリカルボン酸無水物、2,2’,3−ビフェニルトリカルボン酸無水物等から選ばれる少なくとも1種を挙げることができる。耐熱性、コストの観点から、TMAを用いることが好ましい。 Examples of the tricarboxylic acid anhydride include trimellitic acid anhydride (TMA), 2- (3,4-dicarboxyphenyl) -2- (3-carboxyphenyl) propane anhydride, and (3,4-dicarboxyphenyl). ) (3-carboxyphenyl) methane anhydride, (3,4-dicarboxyphenyl) (3-carboxyphenyl) ether anhydride, 3,3 ′, 4-tricarboxybenzophenone anhydride, 1,2,4-butane Tricarboxylic acid anhydride, 2,3,5-naphthalene tricarboxylic acid anhydride, 2,3,6-naphthalene tricarboxylic acid anhydride, 1,2,4-naphthalene tricarboxylic acid anhydride, 2,2 ′, 3-biphenyl tricarboxylic acid The at least 1 sort (s) chosen from an acid anhydride etc. can be mentioned. From the viewpoint of heat resistance and cost, it is preferable to use TMA.
必要に応じて、上記のトリカルボン酸無水物以外の多塩基酸、又はその機能誘導体を併用することができる。多塩基酸としては、トリメシン酸、トリス(2−カルボキシエチル)イソシアヌレート等の3塩基酸、テレフタル酸、イソフタル酸、コハク酸、アジピン酸、セバシン酸、ドデカンジカルボン酸等の2塩基酸、1,2,3,4−ブタンテトラカルボン酸、シクロペンタンテトラカルボン酸、エチレンテトラカルボン酸等の脂肪族系及び脂環族系4塩基酸、ピロメリット酸、3,3’,4,4’−ベンゾフェノンテトラカルボン酸、ビス(3,4−ジカルボキシフェニル)エーテル、2,3,6,7−ナフタレンテトラカルボン酸、1,2,5,6−ナフタレンテトラカルボン酸、2,2’−ビス(3,4−ジカルボキシフェニル)プロパン、2,2’,3,3’−ジフェニルテトラカルボン酸、ビス(3,4−ジカルボキシフェニル)スルホン、ビス(3,4−ジカルボキシフェニル)メタン等の芳香族4塩基酸等から選ばれる少なくとも1種を挙げることができる。 If necessary, a polybasic acid other than the tricarboxylic acid anhydride or a functional derivative thereof can be used in combination. Examples of polybasic acids include tribasic acids such as trimesic acid and tris (2-carboxyethyl) isocyanurate, dibasic acids such as terephthalic acid, isophthalic acid, succinic acid, adipic acid, sebacic acid and dodecanedicarboxylic acid, Aliphatic and alicyclic tetrabasic acids such as 2,3,4-butanetetracarboxylic acid, cyclopentanetetracarboxylic acid, ethylenetetracarboxylic acid, pyromellitic acid, 3,3 ′, 4,4′-benzophenone Tetracarboxylic acid, bis (3,4-dicarboxyphenyl) ether, 2,3,6,7-naphthalenetetracarboxylic acid, 1,2,5,6-naphthalenetetracarboxylic acid, 2,2′-bis (3 , 4-Dicarboxyphenyl) propane, 2,2 ′, 3,3′-diphenyltetracarboxylic acid, bis (3,4-dicarboxyphenyl) sulfo It can include at least one selected from bis (3,4-carboxyphenyl) and aromatic 4-basic acid such as methane.
1分子中に2個以上のイソシアネート基を有する多価イソシアネート類としては、脂肪族、脂環族、芳香脂肪族、芳香族、及び複素環ポリイソシアネートを挙げることができ、より具体的な例としては、エチレンジイソシアネート、1,4−テトラメチレンジイソシアネート、1,6−ヘキサメチレンジイソシアネート、1,12−ドデカンジイソシアネート、シクロブテン−1,3−ジイソシアネート、シクロヘキサン−1,3−ジイソシアネート、シクロヘキサン−1,4−ジイソシアネート、イソホロンジイソシアネート、1,3−フェニレンジイソシアネート、1,4−フェニレンジイソシアネート、2,4−トリレンジイソシアネート、2,6−トリレンジイソシアネート、ジフェニルメタン−2,4’−ジイソシアネート、ジフェニルメタン−4,4’−ジイソシアネート(MDI)、ジフェニルエーテル−4,4’−ジイソシアネート、キシリレンジイソシアネート、ナフタレン−1,5−ジイソシアネート、1−メトキシベンゼン−2,4−ジイソシアネート、1−メトキシベンゼン−2,4−ジイソシアネート、ジフェニルスルホン−4,4’−ジイソシアネート、及びこれらのジイソシアネート類を多量化して得られる1分子中に3個以上のイソシアネート基を有する化合物、ポリフェニルメチレンポリイソシアネート等から選ばれる少なくとも1種を挙げることができる。 Examples of the polyvalent isocyanate having two or more isocyanate groups in one molecule include aliphatic, alicyclic, araliphatic, aromatic, and heterocyclic polyisocyanates. As a more specific example, Are ethylene diisocyanate, 1,4-tetramethylene diisocyanate, 1,6-hexamethylene diisocyanate, 1,12-dodecane diisocyanate, cyclobutene-1,3-diisocyanate, cyclohexane-1,3-diisocyanate, cyclohexane-1,4- Diisocyanate, isophorone diisocyanate, 1,3-phenylene diisocyanate, 1,4-phenylene diisocyanate, 2,4-tolylene diisocyanate, 2,6-tolylene diisocyanate, diphenylmethane-2,4'-diisocyanate, diph Nylmethane-4,4′-diisocyanate (MDI), diphenyl ether-4,4′-diisocyanate, xylylene diisocyanate, naphthalene-1,5-diisocyanate, 1-methoxybenzene-2,4-diisocyanate, 1-methoxybenzene-2 , 4-diisocyanate, diphenylsulfone-4,4′-diisocyanate, at least selected from compounds having three or more isocyanate groups in one molecule obtained by multiplying these diisocyanates, polyphenylmethylene polyisocyanate, and the like. One type can be mentioned.
トリカルボン酸無水物又はその機能誘導体、必要に応じて併用される多塩基酸又はその機能誘導体と、1分子中に2個以上のイソシアネート基を有する多価イソシアネート類とを反応させる際は、有機溶媒中で行うことが好ましく、有機溶媒の例としては、N−メチル−2−ピロリドン(NM2P)、N,N’−ジメチルホルムアミド、N,N−ジメチルアセトアミド、ジメチルスルホキシド等が挙げられる。反応性や合成される樹脂の性能の観点から、NM2Pを合成溶媒とすることが好ましい。 When a tricarboxylic acid anhydride or a functional derivative thereof, a polybasic acid used in combination as necessary or a functional derivative thereof and a polyvalent isocyanate having two or more isocyanate groups in one molecule are reacted, an organic solvent The organic solvent is preferably used in the organic solvent, and examples of the organic solvent include N-methyl-2-pyrrolidone (NM2P), N, N′-dimethylformamide, N, N-dimethylacetamide, dimethyl sulfoxide and the like. From the viewpoint of reactivity and the performance of the synthesized resin, it is preferable to use NM2P as a synthesis solvent.
ポリアミドイミド樹脂は、例えば、TMAとMDIを、NM2P溶剤中で等モル反応させることによって製造することができる。前記ポリアミドイミド樹脂としては、その数平均分子量(以下、数平均分子量を、分子量と言うことがある。)が10000以上であるものが好ましい。分子量が10000未満であると、ポリアミドイミド分子鎖同士、あるいはポリアミドイミド分子鎖とポリイミド分子鎖間の絡み合いが不十分となる結果、耐熱性樹脂ワニスを焼き付けして得られる耐熱樹脂フィルムの靱性が低下する傾向がある。請求項2は、この好ましい態様に該当する。このポリアミドイミド樹脂としては、市販のポリアミドイミド樹脂ワニス(例えば、田岡化学工業社製 商品名:AE2等)を用いることも可能である。なお、ここで数平均分子量は、GPCによりポリスチレン換算で測定した値である。以下においても同じである。 The polyamideimide resin can be produced, for example, by reacting TMA and MDI in an equimolar amount in an NM2P solvent. The polyamideimide resin preferably has a number average molecular weight (hereinafter, the number average molecular weight is sometimes referred to as molecular weight) of 10,000 or more. When the molecular weight is less than 10,000, the entanglement between the polyamideimide molecular chains or between the polyamideimide molecular chains and the polyimide molecular chains becomes insufficient, resulting in a decrease in toughness of the heat resistant resin film obtained by baking the heat resistant resin varnish. Tend to. Claim 2 corresponds to this preferable mode. As this polyamide-imide resin, a commercially available polyamide-imide resin varnish (for example, trade name: AE2 manufactured by Taoka Chemical Industry Co., Ltd.) can be used. Here, the number average molecular weight is a value measured by GPC in terms of polystyrene. The same applies to the following.
ポリアミド酸は、例えば、極性溶媒中でテトラカルボン酸二無水物とジアミンを低温で反応させることにより製造することができる。 Polyamic acid can be produced, for example, by reacting tetracarboxylic dianhydride and diamine at a low temperature in a polar solvent.
ここで使用可能なテトラカルボン酸二無水物としては、例えば、3,3’,4,4’−ビフェニルテトラカルボン酸二無水物(BPDA)、3,3’,4,4’−ベンゾフェノンテトラカルボン酸二無水物(BTDA)、3,3’,4,4’−ビフェニルエーテルテトラカルボン酸二無水物(OPDA)、3,3’,4,4’−ジフェニルスルホンテトラカルボン酸二無水物(DSDA)、ビシクロ(2,2,2)−オクト−7−エン−2,3,5,6−テトラカルボン酸二無水物(BCD)、1,2,4,5−シクロヘキサンテトラカルボン酸二無水物(H−PMDA)、ピロメリット酸二無水物(PMDA)、2,2−ビス(3,4−ジカルボンキシフェニル)ヘキサフルオロプロパン二無水物(6FDA)、5−(2,5−ジオキソテトラヒドロフリル)−3−メチル−3−シクロヘキセン−1,2−ジカルボン酸無水物(CP)等から選ばれる少なくとも1種を挙げることができる。 Examples of tetracarboxylic dianhydrides that can be used here include 3,3 ′, 4,4′-biphenyltetracarboxylic dianhydride (BPDA), and 3,3 ′, 4,4′-benzophenone tetracarboxylic acid. Acid dianhydride (BTDA), 3,3 ′, 4,4′-biphenyl ether tetracarboxylic dianhydride (OPDA), 3,3 ′, 4,4′-diphenylsulfone tetracarboxylic dianhydride (DSDA) ), Bicyclo (2,2,2) -oct-7-ene-2,3,5,6-tetracarboxylic dianhydride (BCD), 1,2,4,5-cyclohexanetetracarboxylic dianhydride (H-PMDA), pyromellitic dianhydride (PMDA), 2,2-bis (3,4-dicarbonoxyphenyl) hexafluoropropane dianhydride (6FDA), 5- (2,5-dioxote Rahidorofuriru) methyl-3-cyclohexene-1,2-dicarboxylic anhydride (CP) can include at least one selected from the like.
ここで使用可能なジアミンとしては、p−フェニレンジアミン、m−フェニレンジアミン、シリコーンジアミン、ビス(3−アミノプロピル)エーテルエタン、3,3’−ジアミノ−4,4’ジヒドロキシジフェニルスルホン(SO2−HOAB)、4,4’ジアミノ−3,3’ジヒドロキシビフェニル(HOAB)、2,2−ビス〔4−(4−アミノフェノキシ)フェニル〕ヘキサフルオロプロパン(HOCF3AB)、シロキサンジアミン、ビス(3−アミノプロピル)エーテルエタン、N,N−ビス(3−アミノプロピル)エーテル、1,4−ビス(3−アミノプロピル)ピペラジン、イソホロンジアミン、1,3’−ビス(アミノメチル)シクロヘキサン、3,3’−ジメチル−4,4’−ジアミノジシクロヘキシルメタン、4,4’−メチレンビス(シクロヘキシルアミン)、4,4’−ジアミノジフェニルエーテル(DDE)、3,4’−ジアミノジフェニルエーテル(m−DDE)、3,3’−ジアミノジフェニルエーテル、4,4’−ジアミノ−ジフェニルスルホン(p−DDS)、3,4’−ジアミノ−ジフェニルスルホン、3,3’−ジアミノ−ジフェニルスルホン、2,4’−ジアミノジフェニルエーテル、1,3−ビス(4−アミノフェノキシ)ベンゼン(m−TPE)、1,3−ビス(3−アミノフェノキシ)ベンゼン(APB)、2,2−ビス〔4−(4−アミノフェノキシ)フェニル〕プロパン(BAPP)、2,2−ビス〔4−(4−アミノフェノキシ)フェニル〕ヘキサフルオロプロパン(HF−BAPP)、ビス〔4−(4−アミノフェノキシ)フェニル〕スルホン(p−BAPS)、ビス〔4−(3−アミノフェノキシ)フェニル〕スルホン(m−BAPS)、4,4’ビス(4−アミノフェノキシ)ビフェニル(BAPB)、1,4−ビス(4−アミノフェノキシ)ベンゼン(p−TPE)、4,4’−ジアミノジフェニルスルフィド(ASD)、3,4’−ジアミノジフェニルスルフィド、3,3’−ジアミノジフェニルスルフィド、3,3’ジアミノ−4,4’ジヒドロキシジフェニルスルホン、2,4−ジアミノトルエン(DAT)、2,5−ジアミノトルエン,3,5−ジアミノ安息香酸(DABz),2,6−ジアミノピリジン(DAPy)、4,4’ジアミノ−3,3’ジメトキシビフェニル(CH3OAB)、4,4’ジアミノ−3,3’ジメチルビフェニル(CH3AB)、9,9’−ビス(4−アミノフェニル)フルオレン(FDA)等から選ばれる少なくとも1種を挙げることができる。 Examples of diamines that can be used here include p-phenylenediamine, m-phenylenediamine, silicone diamine, bis (3-aminopropyl) etherethane, 3,3′-diamino-4,4′dihydroxydiphenylsulfone (SO 2 —). HOAB), 4,4′diamino-3,3′dihydroxybiphenyl (HOAB), 2,2-bis [4- (4-aminophenoxy) phenyl] hexafluoropropane (HOCF 3 AB), siloxane diamine, bis (3 -Aminopropyl) ether ethane, N, N-bis (3-aminopropyl) ether, 1,4-bis (3-aminopropyl) piperazine, isophoronediamine, 1,3'-bis (aminomethyl) cyclohexane, 3, 3'-dimethyl-4,4'-diaminodicyclohexylmethane, 4,4'-methyl Bis (cyclohexylamine), 4,4′-diaminodiphenyl ether (DDE), 3,4′-diaminodiphenyl ether (m-DDE), 3,3′-diaminodiphenyl ether, 4,4′-diamino-diphenylsulfone (p- DDS), 3,4′-diamino-diphenylsulfone, 3,3′-diamino-diphenylsulfone, 2,4′-diaminodiphenyl ether, 1,3-bis (4-aminophenoxy) benzene (m-TPE), 1 , 3-bis (3-aminophenoxy) benzene (APB), 2,2-bis [4- (4-aminophenoxy) phenyl] propane (BAPP), 2,2-bis [4- (4-aminophenoxy) Phenyl] hexafluoropropane (HF-BAPP), bis [4- (4-aminophenoxy) phenyl] sulfur (P-BAPS), bis [4- (3-aminophenoxy) phenyl] sulfone (m-BAPS), 4,4′bis (4-aminophenoxy) biphenyl (BAPB), 1,4-bis (4- Aminophenoxy) benzene (p-TPE), 4,4′-diaminodiphenyl sulfide (ASD), 3,4′-diaminodiphenyl sulfide, 3,3′-diaminodiphenyl sulfide, 3,3′diamino-4,4 ′ Dihydroxydiphenylsulfone, 2,4-diaminotoluene (DAT), 2,5-diaminotoluene, 3,5-diaminobenzoic acid (DABz), 2,6-diaminopyridine (DAPy), 4,4′diamino-3, 3 'dimethoxy-biphenyl (CH 3 OAB), 4, 4'diamino-3,3'-dimethyl biphenyl (CH 3 AB), 9,9'-bis ( - it can include at least one selected from aminophenyl) fluorene (FDA) and the like.
テトラカルボン酸二無水物とジアミンとを反応させる際においては、有機溶媒中で行うことが好ましく、有機溶媒の例としては、NM2P、N,N’−ジメチルホルムアミド、N,N−ジメチルアセトアミド、ジメチルスルホキシド等が挙げられる。反応性や合成される樹脂の性能の観点から、NM2Pを用いることが好ましい。 When reacting tetracarboxylic dianhydride and diamine, it is preferably carried out in an organic solvent. Examples of the organic solvent include NM2P, N, N′-dimethylformamide, N, N-dimethylacetamide, dimethyl Examples thereof include sulfoxide. From the viewpoint of reactivity and the performance of the synthesized resin, it is preferable to use NM2P.
一般的には、PMDAとDDEの、NM2P中おける等モル反応により製造したポリイミド樹脂が最も安価で使い勝手が良く、広く使用されている。ポリアミド酸としては、数平均分子量が、30000以上であるものが好ましい。このポリアミド酸としては、市販のポリアミド酸ワニス(例えばI.S.T.社製 商品名:Pyre ML等)を用いることも可能である。 In general, a polyimide resin produced by an equimolar reaction between PMDA and DDE in NM2P is the cheapest, easy to use and widely used. As the polyamic acid, those having a number average molecular weight of 30000 or more are preferable. As this polyamic acid, it is also possible to use a commercially available polyamic acid varnish (for example, product name: Pyre ML manufactured by IST Co., Ltd.).
本発明の耐熱性樹脂ワニスには、必要に応じて、その他の配合剤を添加してもよい。一例として、ポリエチレン等の潤滑剤、カップリング剤等の密着向上剤や、金属、半導体、及びその酸化物、窒化物、炭化物や、カーボンブラック等のフィラー等が挙げられる。 You may add another compounding agent to the heat resistant resin varnish of this invention as needed. Examples include lubricants such as polyethylene, adhesion improvers such as coupling agents, metals, semiconductors and oxides, nitrides, carbides thereof, fillers such as carbon black, and the like.
本発明は、その分子末端イソシアネート官能基を、ブロック剤で処理、封止したポリアミドイミド樹脂を用いることを特徴とする。封止の処理をせず単純にポリアミド酸(ポリイミド樹脂ワニス等)とポリアミドイミド樹脂とを混合したときには、ポリアミド酸量が全樹脂量(ポリアミド酸とポリアミドイミド樹脂との合計)の20重量%以上になると、混合物が著しく高粘度となり被覆塗装が困難になるのに対し、この封止の処理を施せば、ポリイミド樹脂ワニス(ポリアミド酸)とポリアミドイミド樹脂との反応が抑制されて、混合による粘度の上昇を防ぐことが可能となる。 The present invention is characterized by using a polyamide-imide resin whose molecular terminal isocyanate functional group is treated and sealed with a blocking agent. When polyamic acid (polyimide resin varnish, etc.) and polyamideimide resin are simply mixed without sealing, the amount of polyamic acid is 20% by weight or more of the total resin amount (total of polyamic acid and polyamideimide resin) In this case, the mixture becomes remarkably high in viscosity and coating coating becomes difficult. On the other hand, if this sealing process is performed, the reaction between the polyimide resin varnish (polyamic acid) and the polyamideimide resin is suppressed, and the viscosity due to mixing is reduced. Can be prevented.
ポリアミドイミド樹脂の分子末端イソシアネート官能基をブロック剤で封止することは、特開平6−65540号公報においても提案されている。しかし、これは、絶縁電線表面の潤滑性を改良する手段としての提案であり、ポリシロキサン官能基を有するポリマーを対象とするので、本発明における課題解決手段とは異なるものである。 Sealing the molecular terminal isocyanate functional group of the polyamide-imide resin with a blocking agent is also proposed in JP-A-6-65540. However, this is a proposal as means for improving the lubricity of the surface of the insulated wire, and is intended for a polymer having a polysiloxane functional group, which is different from the problem solving means in the present invention.
ブロック剤としては、アルコール類、フェノール類を挙げることができる。アルコール類としては、メタノール、エタノール、プロパノール、ブタノール、メチルセロソルブ、エチルセロソルブ、メチルカルビトール、ベンジルアルコール、シクロヘキサノール等が挙げられ、フェノール類としては、フェノール、クレゾール、キシレノール等が挙げられる。ワニス焼き付け後の硬化物の物性の観点からアルコール類が好ましい。 Examples of the blocking agent include alcohols and phenols. Examples of alcohols include methanol, ethanol, propanol, butanol, methyl cellosolve, ethyl cellosolve, methyl carbitol, benzyl alcohol, and cyclohexanol. Examples of phenols include phenol, cresol, and xylenol. Alcohols are preferred from the viewpoint of the physical properties of the cured product after varnish baking.
所定量のポリアミドイミド樹脂とブロック剤とを、例えば、約70℃にて2時間程度攪拌混合すると、末端イソシアネート官能基がブロック剤で封止されたポリアミドイミド樹脂を得ることができる。 For example, when a predetermined amount of the polyamideimide resin and the blocking agent are stirred and mixed at about 70 ° C. for about 2 hours, a polyamideimide resin in which the terminal isocyanate functional groups are sealed with the blocking agent can be obtained.
本発明の耐熱性樹脂ワニスは、前記のようにして得られた分子末端イソシアネート官能基をブロック剤で封止したポリアミドイミド樹脂とポリアミド酸を混合することにより得ることができる。前記のように、混合による粘度上昇は抑制されている。又、本発明の耐熱性樹脂ワニスは優れた靭性を有する硬化物を与え、ポリアミド酸の配合比が50wt%以上の場合は、高価なポリイミド樹脂ワニスより得られた硬化物と同等の靭性を示し、ポリアミド酸の配合比が50wt%未満の場合においても、ポリイミド樹脂ワニスより得られた硬化物の靭性とポリアミドイミド樹脂のみのワニスより得られた硬化物の靭性とを、配合比率に基づき按分して得られる靭性の予測値をはるかに上回る、良好な靭性を示す。 The heat resistant resin varnish of the present invention can be obtained by mixing a polyamido acid and a polyamidoimide resin obtained by sealing the molecular terminal isocyanate functional group obtained as described above with a blocking agent. As described above, an increase in viscosity due to mixing is suppressed. Moreover, the heat resistant resin varnish of the present invention gives a cured product having excellent toughness. When the blending ratio of the polyamic acid is 50 wt% or more, it exhibits the same toughness as the cured product obtained from the expensive polyimide resin varnish. Even when the blending ratio of the polyamic acid is less than 50 wt%, the toughness of the cured product obtained from the polyimide resin varnish and the toughness of the cured product obtained from the varnish of only the polyamideimide resin are apportioned based on the blending ratio. It exhibits good toughness far exceeding the predicted value of toughness.
分子末端イソシアネート官能基をブロック剤で封止したポリアミドイミド樹脂とポリアミド酸との配合比は、ポリアミド酸の含有量が、両者の合計含有量に対し、5〜50wt%であることが好ましい(請求項3)。 The compounding ratio of the polyamidoimide resin in which the molecular terminal isocyanate functional group is sealed with a blocking agent and the polyamic acid is preferably 5 to 50 wt% with respect to the total content of the polyamic acid. Item 3).
ポリアミド酸の配合比率が、5wt%より小さいと、得られた耐熱性樹脂ワニスの硬化物の靭性が不十分になる傾向があり、逆に、50wt%より大きくなっても、更なる靭性の向上はほとんど見られず、逆に材料コストの上昇を招く。 If the blending ratio of the polyamic acid is less than 5 wt%, the toughness of the cured product of the obtained heat-resistant resin varnish tends to be insufficient, and conversely, even if it exceeds 50 wt%, the toughness is further improved. Is rarely seen, and conversely increases the material cost.
ポリアミドイミド樹脂とポリアミド酸を含有する本発明の耐熱性樹脂ワニスは、その粘度が、200000mPa・s(30℃、B型粘度計)以下であることが好ましい(請求項4)。200000mPa・sを超えると、基材への均一な被覆塗装が困難となる。又は、均一塗装の実現のために溶剤希釈が必要となり、コスト上昇を招く。また、NM2P等の溶剤は吸湿性が高いため、ポリイミド前駆体の加水分解が生じやすくなり、ワニスの安定性が低下する。加えて、溶剤希釈によってワニスの固形分が低下するため、厚膜のフィルムを得にくくなり、好ましくない。より好ましい粘度は、1000〜100000mPa・sの範囲である。 The heat-resistant resin varnish of the present invention containing a polyamideimide resin and a polyamic acid preferably has a viscosity of 200000 mPa · s (30 ° C., B-type viscometer) or less. If it exceeds 200,000 mPa · s, uniform coating on the substrate becomes difficult. Alternatively, solvent dilution is required to achieve uniform coating, which increases costs. Further, since a solvent such as NM2P has high hygroscopicity, the polyimide precursor is easily hydrolyzed, and the stability of the varnish is lowered. In addition, since the solid content of the varnish decreases due to solvent dilution, it is difficult to obtain a thick film, which is not preferable. A more preferable viscosity is in the range of 1000 to 100,000 mPa · s.
本発明は、前記耐熱性樹脂ワニスに加えて、この耐熱性樹脂ワニスを焼き付け処理した硬化物からなり、膜状又はチューブ状であることを特徴とする耐熱樹脂フィルムを提供する(請求項5)。 The present invention provides a heat-resistant resin film comprising a cured product obtained by baking the heat-resistant resin varnish in addition to the heat-resistant resin varnish and having a film shape or a tube shape (Claim 5). .
耐熱性樹脂ワニスの焼き付け処理は、例えば、耐熱性樹脂ワニスを基材上に塗布し、基材上に塗膜を形成した後、該塗膜を加熱して、耐熱性樹脂ワニスを硬化させる方法で行われる。この焼き付け処理により硬化物が得られるが、この際、ポリアミド酸が熱イミド化反応しイミド環が形成される。従って、焼き付け処理の温度は、イミド環の形成に要する以上の温度である。基材上への耐熱性樹脂ワニスの塗布、焼き付けは常法により行うことができる。耐熱性樹脂ワニスの塗布、焼き付け処理を2回以上繰り返してもよい。 The heat-resistant resin varnish is baked by, for example, applying a heat-resistant resin varnish on a substrate, forming a coating film on the substrate, and then heating the coating film to cure the heat-resistant resin varnish. Done in A cured product is obtained by this baking treatment. At this time, the polyamic acid undergoes a thermal imidization reaction to form an imide ring. Therefore, the baking temperature is higher than that required for forming an imide ring. Application and baking of the heat-resistant resin varnish on the substrate can be carried out by conventional methods. The application of the heat-resistant resin varnish and the baking process may be repeated twice or more.
ここで用いられる基材としては、金属棒、金属線、金属板等の金属基材や、プラスチック板、プラスチック棒、ガラス板等が挙げられる。基材上に本発明の耐熱樹脂フィルムを形成した場合は、該耐熱樹脂フィルムを、該基材から剥離して使用することができる。一方、そのまま、すなわち、該耐熱樹脂フィルムが該基材上に接合し一体化した状態で使用することもできるし、剥離した後他の基材と一体化して使用することもできる。これらの場合は、基材及び耐熱樹脂フィルムを有することを特徴とする耐熱樹脂複合体となるが、本発明は、この耐熱樹脂複合体も提供するものである(請求項6)。 As a base material used here, metal base materials, such as a metal rod, a metal wire, and a metal plate, a plastic plate, a plastic rod, a glass plate, etc. are mentioned. When the heat resistant resin film of the present invention is formed on a substrate, the heat resistant resin film can be peeled off from the substrate and used. On the other hand, the heat-resistant resin film can be used as it is, that is, in a state where the heat-resistant resin film is bonded and integrated on the base material, or can be used after being peeled and integrated with another base material. In these cases, the heat-resistant resin composite is characterized by having a base material and a heat-resistant resin film. The present invention also provides this heat-resistant resin composite (claim 6).
本発明の耐熱樹脂フィルムの形態は、膜状(平板状)に限定されず、チューブ状(管状)のフィルムも本発明の耐熱樹脂フィルムに含まれる。例えば、金属棒、金属線、プラスチック棒等の上に、本発明の耐熱性樹脂ワニスを塗布して形成された耐熱樹脂フィルムは、チューブ状である。 The form of the heat resistant resin film of the present invention is not limited to a film shape (flat plate shape), and a tube-shaped (tubular) film is also included in the heat resistant resin film of the present invention. For example, the heat resistant resin film formed by applying the heat resistant resin varnish of the present invention on a metal rod, metal wire, plastic rod or the like has a tube shape.
前記耐熱性樹脂ワニスによる硬化物は、耐熱性に優れるとともに優れた強度と伸び、すなわち高い靱性を有しているので、この耐熱性樹脂ワニスの硬化物からなる本発明の耐熱樹脂フィルムも、耐熱性に優れるとともに、高い強度と伸びすなわち優れた靱性を有し、駆動による破損等が抑制され優れた機械的物性を示し、各種電気機器の駆動部や絶縁皮膜等に好適に用いられる。 Since the cured product of the heat resistant resin varnish has excellent heat resistance and excellent strength and elongation, that is, high toughness, the heat resistant resin film of the present invention comprising the cured product of the heat resistant resin varnish is also heat resistant. In addition to being excellent in properties, it has high strength and elongation, ie, excellent toughness, exhibits excellent mechanical properties by suppressing breakage due to driving, etc., and is suitably used for driving parts and insulating films of various electric devices.
本発明の耐熱性樹脂ワニスは、低価格であるとともに、このワニスに高温イミド化反応を施して得られる硬化物は、ポリイミド樹脂に匹敵する強度と伸び、すなわち優れた靭性を有している。また、この耐熱性樹脂ワニスは、高粘度化の問題もないので塗装(耐熱樹脂フィルムの形成)が容易である。 The heat-resistant resin varnish of the present invention is inexpensive and a cured product obtained by subjecting the varnish to a high temperature imidization reaction has strength and elongation comparable to polyimide resin, that is, excellent toughness. Moreover, since this heat resistant resin varnish does not have a problem of increasing viscosity, it can be easily applied (formation of a heat resistant resin film).
本発明の耐熱樹脂フィルムは、優れた強度と伸びすなわち高い靱性を有するので、駆動による破損等が抑制されるものであり、該耐熱樹脂フィルム単独で、又本発明の耐熱樹脂複合体との構成要素として、各種電気機器の駆動部や絶縁皮膜等に好適に用いられる。 The heat-resistant resin film of the present invention has excellent strength and elongation, that is, high toughness, so that damage due to driving is suppressed. The heat-resistant resin film alone or the structure of the heat-resistant resin composite of the present invention As an element, it is used suitably for the drive part of various electric equipment, an insulating film, etc.
次に、本発明を実施するための最良の形態を以下に実施例に基づき説明するが、本発明の範囲はこの実施例のみに限定されるものではない。 Next, the best mode for carrying out the present invention will be described based on examples, but the scope of the present invention is not limited to these examples.
実施例1〜6
(耐熱性樹脂ワニスの作製)
分子量16500、固形分27%、粘度3600mPa・sのポリアミドイミド樹脂ワニス(田岡化学工業社製 商品名:AE2)600gに、ブロック剤として、メタノール3gを加え、70℃で2時間反応させて、末端イソシアネート官能基が封止されたポリアミドイミド樹脂603gを得た。
Examples 1-6
(Preparation of heat-resistant resin varnish)
A molecular weight of 16500, a solid content of 27%, and a viscosity of 3600 mPa · s, a polyamideimide resin varnish (trade name: AE2 manufactured by Taoka Chemical Industry Co., Ltd.) (600 g) was added with 3 g of methanol as a blocking agent and reacted at 70 ° C. for 2 hours. As a result, 603 g of a polyamideimide resin having an isocyanate functional group sealed therein was obtained.
なお、樹脂ワニスの樹脂の分子量は、樹脂ワニスをNMPで希釈した1wt%溶液を用い、GPC(東ソー製、HLC−8220GPC)により求めた。キャリア溶媒は、NM2PにLiBrを溶解したものを用いた。 The resin molecular weight of the resin varnish was determined by GPC (HLC-8220 GPC, manufactured by Tosoh Corporation) using a 1 wt% solution obtained by diluting the resin varnish with NMP. As the carrier solvent, a solution obtained by dissolving LiBr in NM2P was used.
このようにして得られたポリアミドイミド樹脂(末端イソシアネート官能基が封止されている。)と、分子量35000、粘度4200mPa・sのポリイミド樹脂ワニス(I.S.T.社製のポリアミド酸のワニス 商品名:Pyre m.l.)を、焼き付け後のポリアミドイミド樹脂と(ポリアミド酸の閉環により形成された)ポリイミド樹脂の重量比が、表1のPAI、PIの行に示す各数値の比(PAI:PI)となるような配合比率で、25℃で2時間混合して、ポリアミドイミド樹脂とポリアミド酸の配合比率が異なる6種の耐熱性樹脂ワニスを得た。 The polyamideimide resin thus obtained (with the terminal isocyanate functional group sealed) and a polyimide resin varnish having a molecular weight of 35000 and a viscosity of 4200 mPa · s (a polyamic acid varnish manufactured by IST Co., Ltd.) The weight ratio of the polyamideimide resin after baking and the polyimide resin (formed by ring closure of the polyamic acid) is the ratio of the numerical values shown in the rows of PAI and PI in Table 1 ( PAI: PI) was mixed at 25 ° C. for 2 hours to obtain 6 types of heat-resistant resin varnishes having different mixing ratios of polyamideimide resin and polyamic acid.
(耐熱性樹脂ワニスの粘度の測定)
ポリアミドイミド樹脂とポリアミド酸の配合比率(重量比)が50:50の場合(実施例6の配合比率)について、このようにして得られた混合後の耐熱性樹脂ワニスの粘度を、B型粘度計(ローターNo.3、回転数12rpm)を用いて測定したところ、6210mPa・s(測定温度:30℃)であり、塗装可能とされる粘度(200000mPa・s)を下回り、十分塗装可能な粘度であった。
(Measurement of viscosity of heat-resistant resin varnish)
When the blending ratio (weight ratio) of the polyamideimide resin and the polyamic acid is 50:50 (the blending ratio of Example 6), the viscosity of the heat-resistant resin varnish after mixing thus obtained is the B-type viscosity. It was 6210 mPa · s (measurement temperature: 30 ° C.) when measured using a meter (rotor No. 3, rotation speed: 12 rpm), which is below the viscosity at which coating is possible (200000 mPa · s) and can be applied sufficiently. Met.
一方、前記と同じポリアミドイミド樹脂ワニス、ポリイミド樹脂ワニスを用い、末端イソシアネート官能基の封止を施さないまま、50:50の重量比で同様に混合して、その粘度を測定したところ、結果は533000mPa・sであり、塗装可能とされる粘度(200000mPa・s)を大きく上回るものであった。尚、ワニスの粘度が200000mPa・s以上であっても、溶剤で希釈すれば塗装可能となるが、高価な溶剤を使用するため高コストとなる。また、NM2P等の希釈溶剤は吸湿性が高いため、ポリイミド前駆体の加水分解を生じやすくなり、ワニスの安定性が低下する。加えて、溶剤希釈によってワニスの固形分が低下するため、厚膜のフィルムを得ることが困難となり、フィルムの用途が制限される。 On the other hand, using the same polyamideimide resin varnish and polyimide resin varnish as described above, the mixture was similarly mixed at a weight ratio of 50:50 without blocking the terminal isocyanate functional group, and the viscosity was measured. It was 533,000 mPa · s, which greatly exceeded the viscosity (200000 mPa · s) that can be applied. Even if the viscosity of the varnish is 200,000 mPa · s or more, it can be coated by diluting with a solvent, but it is expensive because an expensive solvent is used. In addition, since a diluent solvent such as NM2P has high hygroscopicity, the polyimide precursor is easily hydrolyzed, and the stability of the varnish is lowered. In addition, since the solid content of the varnish is reduced by solvent dilution, it is difficult to obtain a thick film, and the use of the film is limited.
(耐熱樹脂フィルムの作製)
得られた耐熱性樹脂ワニスを、径1.0mmの金属線の外周に塗布し、焼き付け炉を用いて焼き付けした後、金属線から取りはずして厚さ32〜34μmのチューブ状フィルム(耐熱樹脂フィルム)を得た。
(Preparation of heat-resistant resin film)
The obtained heat-resistant resin varnish was applied to the outer periphery of a metal wire having a diameter of 1.0 mm, baked using a baking furnace, and then removed from the metal wire to form a tubular film having a thickness of 32 to 34 μm (heat-resistant resin film) Got.
(耐熱樹脂フィルムの物性評価)
得られたチューブ状のフィルムを用いて、表1に示す項目につき下記に示す方法で測定、評価した。結果を表1に併せて示す。
(Physical property evaluation of heat-resistant resin film)
Using the obtained tubular film, the items shown in Table 1 were measured and evaluated by the methods shown below. The results are also shown in Table 1.
1.破断強度、破断伸び:引っ張り試験機(島津製作所製、AG−IS)を用い、チューブ状フィルムをチャック間距離20mmにセットし、10mm/分の速度で引っ張り、破断したときの強度と伸びを測定した。 1. Breaking strength, breaking elongation: Using a tensile tester (manufactured by Shimadzu Corp., AG-IS), set the tube-shaped film at a distance between chucks of 20 mm, pull at a speed of 10 mm / min, and measure the strength and elongation when broken. did.
2.耐熱性:動的粘弾性測定装置(セイコーインスツルメンツ製,DMS6100)を用い、窒素雰囲気中、昇温速度10℃/分で測定を行い、樹脂の軟化温度(動的貯蔵弾性率が低下する外挿温度)を評価した。 2. Heat resistance: measured using a dynamic viscoelasticity measuring device (Seiko Instruments, DMS6100) in a nitrogen atmosphere at a heating rate of 10 ° C./min, and the softening temperature of the resin (extrapolation that reduces the dynamic storage modulus) Temperature).
実施例7〜12
TMAとMDIをNM2P中で反応させて得られたポリアミドイミド樹脂ワニス(分子量22000、固形分23%、粘度4300mPa・s)600gに、ブロック剤として、メタノール3gを加え、70℃で2時間反応させて、末端イソシアネート官能基が封止されたポリアミドイミド樹脂603gを得た。この末端イソシアネート官能基が封止されたポリアミドイミド樹脂を用いた以外は、実施例1〜6と同様な方法によりチューブ状フィルム(耐熱樹脂フィルム)を作製し、同じ項目について測定、評価を行った。結果を表2に示す。
Examples 7-12
To 600 g of polyamideimide resin varnish (molecular weight 22000, solid content 23%, viscosity 4300 mPa · s) obtained by reacting TMA and MDI in NM2P, add 3 g of methanol as a blocking agent, and react at 70 ° C. for 2 hours. Thus, 603 g of a polyamideimide resin in which the terminal isocyanate functional group was sealed was obtained. A tubular film (heat-resistant resin film) was produced by the same method as in Examples 1 to 6 except that this polyamide-imide resin with the terminal isocyanate functional group sealed was used, and the same items were measured and evaluated. . The results are shown in Table 2.
実施例13〜18
TMAとMDIをNM2P中で反応させて得られたポリアミドイミド樹脂ワニス(分子量5500、固形分30%)600gに、ブロック剤として、メタノール3gを加え、70℃で2時間反応させて、末端イソシアネート官能基が封止されたポリアミドイミド樹脂603gを得た。この末端イソシアネート官能基が封止されたポリアミドイミド樹脂を用いた以外は、実施例1〜6と同様な方法によりチューブ状フィルム(耐熱樹脂フィルム)を作製し、同じ項目について測定、評価を行った。結果を、表3に示す。
Examples 13-18
To the polyamideimide resin varnish (molecular weight 5500, solid content 30%) 600 g obtained by reacting TMA and MDI in NM2P, 3 g of methanol was added as a blocking agent and reacted at 70 ° C. for 2 hours to obtain a terminal isocyanate function. As a result, 603 g of a polyamideimide resin whose group was sealed was obtained. A tubular film (heat-resistant resin film) was produced by the same method as in Examples 1 to 6 except that this polyamide-imide resin with the terminal isocyanate functional group sealed was used, and the same items were measured and evaluated. . The results are shown in Table 3.
比較例1、2
実施例1〜6に用いたものと同一のポリアミドイミド樹脂(比較例1)又はポリイミド樹脂ワニス(比較例2)の一方のみを用いて、実施例1〜6と同様な方法によりチューブ状フィルム(耐熱樹脂フィルム)を作製し、同じ項目について測定、評価を行った。これらを比較例1、2として結果を表1に併せて示す。
Comparative Examples 1 and 2
Using only one of the same polyamideimide resin (Comparative Example 1) or polyimide resin varnish (Comparative Example 2) as used in Examples 1 to 6, a tubular film ( Heat resistant resin film) was prepared, and the same items were measured and evaluated. These are Comparative Examples 1 and 2, and the results are also shown in Table 1.
比較例3
実施例7〜12に用いたものと同一のポリアミドイミド樹脂を用い、ポリイミド樹脂ワニスを用いないで、実施例1〜6と同様な手法によりチューブ状フィルム(耐熱樹脂フィルム)を作製し、同じ項目について測定、評価を行った。これらを比較例3として結果を表2に併せて示す。
Comparative Example 3
Using the same polyamide imide resin as used in Examples 7 to 12 and without using a polyimide resin varnish, a tube-like film (heat-resistant resin film) was produced in the same manner as in Examples 1 to 6, and the same items were used. Was measured and evaluated. These are referred to as Comparative Example 3 and the results are also shown in Table 2.
比較例4
実施例13〜18に用いたものと同一のポリアミドイミド樹脂を用い、ポリイミド樹脂ワニスを用いないで、実施例1〜6と同様な手法によりチューブ状フィルム(耐熱樹脂フィルム)を作製し、同じ項目について測定、評価を行った。結果を表3に併せて示す。
Comparative Example 4
Using the same polyamide imide resin as used in Examples 13 to 18 and without using a polyimide resin varnish, a tube-like film (heat-resistant resin film) was prepared in the same manner as in Examples 1 to 6, and the same items were used. Was measured and evaluated. The results are also shown in Table 3.
なお、表1、表2、表3において、PAIはポリアミドイミド樹脂を示し、また、PIはポリイミド樹脂を示す。 In Tables 1, 2, and 3, PAI indicates a polyamideimide resin, and PI indicates a polyimide resin.
表1、表2は、分子量が10000以上のポリアミドイミド樹脂を用いた場合の(実施例及び比較例)の結果を示す。表1、表2より明らかなように、各実施例で得られた耐熱樹脂フィルムは、ポリアミドイミド樹脂のみを用いて得られた耐熱樹脂フィルム(比較例1、比較例3)と比べて、耐熱性が優れている。又、破断強度及び/又は破断伸びにおいて優れており、靭性も優れている。 Tables 1 and 2 show the results (Examples and Comparative Examples) when using a polyamideimide resin having a molecular weight of 10,000 or more. As is clear from Tables 1 and 2, the heat-resistant resin films obtained in the respective examples are more heat-resistant than the heat-resistant resin films obtained by using only the polyamideimide resin (Comparative Example 1 and Comparative Example 3). The property is excellent. Moreover, it is excellent in breaking strength and / or breaking elongation, and is excellent in toughness.
表3は、分子量が10000未満のポリアミドイミド樹脂を用いた場合の実施例(及び比較例)の結果を示す。この結果と、表1、表2に示される結果との比較より明らかなように、分子量が10000未満のポリアミドイミド樹脂を用いた場合は、分子量が10000以上のポリアミドイミド樹脂を用いた場合と比べて、靭性、特に破断伸びが低く、ポリアミドイミド樹脂の分子量は10000以上が好ましいことが示されている。 Table 3 shows the results of Examples (and Comparative Examples) when a polyamideimide resin having a molecular weight of less than 10,000 is used. As is clear from the comparison between this result and the results shown in Tables 1 and 2, when a polyamideimide resin having a molecular weight of less than 10,000 is used, compared to using a polyamideimide resin having a molecular weight of 10,000 or more. The toughness, particularly the elongation at break, is low, and the molecular weight of the polyamideimide resin is preferably 10,000 or more.
しかし、分子量が10000未満のポリアミドイミド樹脂を用いた場合であっても、各実施例で得られた耐熱樹脂フィルムは、ポリアミドイミド樹脂のみを用いて得られた耐熱樹脂フィルム(比較例4)と比べて、破断強度及び/又は破断伸びにおいて優れており、従って靭性も優れている。 However, even when a polyamideimide resin having a molecular weight of less than 10,000 is used, the heat resistant resin film obtained in each example is the same as the heat resistant resin film obtained by using only the polyamideimide resin (Comparative Example 4). In comparison, it is excellent in breaking strength and / or elongation at break, and therefore has excellent toughness.
表1、表2に示された結果をもとに、ポリアミド酸(ポリイミド樹脂ワニス)の配合比と、破断強度及び破断伸びとの関係を、図1〜図4に示す。図1〜図4中の横軸は、ポリアミド酸の配合比を表し(図中ではPI(wt%)と表す。)、縦軸は破断強度(単位MPa)又は破断伸び(%)を表す。 Based on the results shown in Tables 1 and 2, the relationship between the blending ratio of the polyamic acid (polyimide resin varnish), the breaking strength and the breaking elongation is shown in FIGS. The horizontal axis in FIGS. 1 to 4 represents the compounding ratio of polyamic acid (in the drawings, PI (wt%)), and the vertical axis represents breaking strength (unit MPa) or breaking elongation (%).
図1〜図4に示すように、ポリアミド酸を50wt%程度配合すれば、ポリアミド酸単体(100wt%:比較例1)の示す値と比べ、何ら遜色のない優れた破断強度及び破断伸びが得られている。さらに、50wt%以下においても、配合比率よりの按分により予測される値(図中の点線で示される。)をはるかに上回る、良好な値を示している。 As shown in FIGS. 1 to 4, when about 50 wt% of polyamic acid is blended, excellent breaking strength and breaking elongation comparable to the values shown for polyamic acid alone (100 wt%: Comparative Example 1) are obtained. It has been. Furthermore, even at 50 wt% or less, a good value far exceeding the value (indicated by a dotted line in the figure) predicted by apportioning from the blending ratio is shown.
得られた耐熱樹脂フィルムを走査型プローブ顕微鏡で分析したところ、海島構造が確認され、この海島の分離構造が、本発明による高靱性化を発揮させているものと推測された。その模式構造を図5に示す。 When the obtained heat-resistant resin film was analyzed with a scanning probe microscope, a sea-island structure was confirmed, and it was speculated that this sea-island separation structure exhibited high toughness according to the present invention. The schematic structure is shown in FIG.
すなわち、図5に示すように、延伸時には、海相(ポリイミドがリッチな相)が大きく変形して破断伸びを向上させ、また、島相(ポリアミドイミドがリッチな相)が補強効果を示して、破断強度を向上させているものと推測される。 That is, as shown in FIG. 5, at the time of stretching, the sea phase (polyimide-rich phase) is greatly deformed to improve elongation at break, and the island phase (polyamideimide-rich phase) exhibits a reinforcing effect. It is presumed that the breaking strength is improved.
Claims (3)
Priority Applications (7)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2006184960A JP5099577B2 (en) | 2006-07-04 | 2006-07-04 | Heat resistant resin varnish, heat resistant resin film, and heat resistant resin composite |
| US12/307,310 US20090277666A1 (en) | 2006-07-04 | 2007-06-28 | Heat-resistant resin varnish, heat-resistant resin films, heat-resistant resin composites, and insulated wire |
| KR1020087031926A KR20090031876A (en) | 2006-07-04 | 2007-06-28 | Heat resistant resin varnish, heat resistant resin film, heat resistant resin composite, and insulated wire |
| PCT/JP2007/063026 WO2008004491A1 (en) | 2006-07-04 | 2007-06-28 | Heat-resistant resin varnish, heat-resistant resin films, heat-resistant resin composites, and insulated wire |
| CN2007800252424A CN101484532B (en) | 2006-07-04 | 2007-06-28 | Heat-resistant resin varnish, heat-resistant resin films, heat-resistant resin composites, and insulated wire |
| SG2011047586A SG173327A1 (en) | 2006-07-04 | 2007-06-28 | Heat-resistant resin varnish, heat-resistant resin films, heat-resistant resin composites, and insulated wire |
| TW096123726A TWI400274B (en) | 2006-07-04 | 2007-06-29 | Heat-resistant resin varnish, heat-resistant resin composition, heat-resistant resin complex, and insulated wire |
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| JP2006184960A JP5099577B2 (en) | 2006-07-04 | 2006-07-04 | Heat resistant resin varnish, heat resistant resin film, and heat resistant resin composite |
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| JP2008013635A JP2008013635A (en) | 2008-01-24 |
| JP5099577B2 true JP5099577B2 (en) | 2012-12-19 |
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| WO2013073397A1 (en) | 2011-11-16 | 2013-05-23 | 住友電気工業株式会社 | Insulating varnish and insulated electrical wire using same |
| CN109293920B (en) * | 2018-09-25 | 2021-02-09 | 住井科技(深圳)有限公司 | Resin composition and insulated wire using same |
| CN109801745B (en) * | 2019-01-31 | 2020-06-30 | 苏州巨峰电气绝缘系统股份有限公司 | Electromagnetic wire for new energy automobile driving motor and preparation method thereof |
| JP7546259B2 (en) * | 2021-02-26 | 2024-09-06 | 東特塗料株式会社 | Resin varnish for forming insulating layer |
| CN114456705B (en) * | 2022-03-10 | 2023-03-17 | 南通博联材料科技有限公司 | Preparation method and application of polyamide acid varnish |
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| JPS5968108A (en) * | 1982-10-08 | 1984-04-18 | 日立化成工業株式会社 | Insulated wire |
| JPS5880326A (en) * | 1981-11-06 | 1983-05-14 | Hitachi Chem Co Ltd | Production of polyamide-imide resin |
| JPH02115265A (en) * | 1988-10-24 | 1990-04-27 | Toyobo Co Ltd | Heat-resistant film and its laminate |
| JP3118033B2 (en) * | 1990-08-23 | 2000-12-18 | 三井化学株式会社 | Polyamideimide resin and method for producing the same |
| JP2000256467A (en) * | 1999-03-08 | 2000-09-19 | Hitachi Chem Co Ltd | Synthesis of polymer, resin composition, and production of molded article |
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