JP4035035B2

JP4035035B2 - Nozzle for supplying processing liquid to substrate and substrate processing apparatus

Info

Publication number: JP4035035B2
Application number: JP2002350674A
Authority: JP
Inventors: 永二山下
Original assignee: Screen Holdings Co Ltd; Dainippon Screen Manufacturing Co Ltd
Current assignee: Screen Holdings Co Ltd; Dainippon Screen Manufacturing Co Ltd
Priority date: 2002-12-03
Filing date: 2002-12-03
Publication date: 2008-01-16
Anticipated expiration: 2022-12-03
Also published as: JP2004186357A

Description

【０００１】
【発明の属する技術分野】
この発明は、液晶表示装置用ガラス基板、半導体ウエハ、フォトマスク用ガラス基板、光ディスク用基板等の基板の表面へ洗浄液、現像液、エッチング液、剥離液等の処理液を供給する処理液供給装置の処理液供給用ノズル、ならびに、前記した各種基板の表面へ洗浄液、現像液、エッチング液、剥離液等の処理液を供給して基板を処理する基板処理装置に関する。
【０００２】
【従来の技術】
例えば、液晶表示装置用ガラス基板等の基板を回転支持板上に水平姿勢で保持して鉛直軸回りに回転させながら、基板の表面へ洗浄液等の処理液を供給し、基板に対して洗浄等の処理を施す基板処理装置においては、基板の直上位置へノズルを移動させ、そのノズルの吐出口から処理液を吐出して、回転する基板の表面へ処理液を供給するようにしている。この場合、従来の装置では、図１０に示すように、ノズル５に形成された液流路７への処理液の供給は、ノズル５の上方に配設された処理液供給管８を通して行われている（例えば、特許文献１参照。）。
【０００３】
【特許文献１】
特開２００２−１７７８５５号公報（第６頁、第９頁、図２、図５、図９（ｃ））
【０００４】
【発明が解決しようとする課題】
しかしながら、図１０に示したように、ノズル５の上方からノズル５の液流路７へ処理液が供給される場合には、ノズル５への処理液の供給を停止した時にノズル５の吐出口６から処理液が垂れる、といったことが起こる。この液垂れの現象は、特に純水やフッ酸などように低粘度の処理液が使用される場合に顕著である。このような液垂れが発生すると、基板の処理の均一性に影響を及ぼすことになる。
【０００５】
この発明は、以上のような事情に鑑みてなされたものであり、吐出口からの液垂れを生じることがない基板への処理液供給用ノズルを提供すること、ならびに、処理液供給用ノズルの吐出口からの液垂れを防止して基板の処理の均一性を確保することができる基板処理装置を提供することを目的とする。
【０００６】
【課題を解決するための手段】
請求項１に係る発明は、前向きに吐出口が形設されるとともに、内部に前記吐出口に連通する液流路が形成され、上方に配設された処理液供給管から前記液流路へ処理液が供給されて、水平姿勢に保持された基板の表面へ処理液を吐出する基板への処理液供給用ノズルにおいて、前記処理液供給管に連通する接続孔と、この接続孔に連通し、吐出口より下方位置に形成された液溜め路と、この液溜め路の内径より細径に形成され、液溜め路と前記吐出口とを流路接続する吐出経路と、を有することを特徴とする。
【０００７】
請求項２に係る発明は、請求項１記載のノズルにおいて、前記液溜め路が横方向に延設されるとともに、前記吐出口が複数個、液溜め路に沿った方向に並列して設けられ、液溜め路と各吐出口とが各別に吐出経路によってそれぞれ流路接続されたことを特徴とする。
【０００８】
請求項３に係る発明は、請求項１または請求項２記載のノズルにおいて、前記吐出経路が、前記液溜め路から上方向に延びる連絡路と、この連絡路の内径より細径に形成され連絡路の上端部から横方向に延びて前記吐出口に連通する吐出路とから構成されたことを特徴とする。
【０００９】
請求項４に係る発明は、請求項２記載のノズルにおいて、前記液溜め路が、平行に並んで前後に一対設けられ、前方側の液溜め路と各吐出口とを各別に流路接続する各吐出経路が、液溜め路から上方向に延びる連絡路と、この連絡路の内径より細径に形成され連絡路の上端部から横方向に延びて吐出口に連通する吐出路とからそれぞれ構成されるとともに、後方側の液溜め路と各吐出口とを各別に流路接続する各吐出経路が、液溜め路から上方向に延び、かつ、前方側の液溜め路から上方向に延びる連絡路に対して前向きに傾斜した連絡路と、この連絡路の内径より細径に形成され連絡路の上端部から横方向に延びて吐出口に連通する吐出路とからそれぞれ構成されたことを特徴とする。
【００１０】
請求項５に係る発明は、請求項４記載のノズルにおいて、前方側の液溜め路に流路接続された各吐出口と後方側の液溜め路に流路接続された各吐出口とがそれぞれ交互に配置されたことを特徴とする。
【００１１】
請求項６に係る発明は、請求項１ないし請求項５のいずれかに記載のノズルにおいて、壁面から前向きに突出した短管状突出部が形設され、その短管状突出部の先端面に前記吐出口が設けられたことを特徴とする。
【００１２】
請求項７に係る発明は、請求項６記載のノズルにおいて、前記吐出経路の吐出口付近が前方下向きに傾斜するように配置され、前記短管状突出部の前端部下部が水平方向に欠切されたことを特徴とする。
【００１３】
請求項８に係る発明は、基板を水平姿勢に保持する基板保持手段と、この基板保持手段に保持された基板の表面へ処理液を供給する処理液供給手段とを備え、処理液によって基板を処理する基板処理装置において、前記処理液供給手段として、請求項１ないし請求項７のいずれかに記載の基板への処理液供給用ノズルを配設したことを特徴とする。
【００１４】
請求項１に係る発明の基板への処理液供給用ノズルにおいては、処理液供給管を通って供給される処理液は、接続孔を通って液溜め路に流入し、液溜め路から吐出経路を通って吐出口へ送られ、吐出口から吐出されて、水平姿勢に保持された基板の表面へ供給される。そして、処理液の供給が停止された時、吐出口が液溜め路より上方に位置しているため、重力の作用によって処理液が吐出口から流出することはない。さらに、吐出口に流路接続する吐出経路の内径は、液溜め路の内径より細くされているので、吐出経路を満たした処理液が吐出口から流出して液垂れを生じる、といった恐れもない。
【００１５】
請求項２に係る発明のノズルでは、横方向に延設された液溜め路に沿った方向に複数個の吐出口が並列して設けられていることにより、処理液の供給量を多くしなくても、基板の表面上の広い範囲にわたって処理液を供給することができる。そして、液溜め路と各吐出口とは、液溜め路の内径より細径の吐出経路によってそれぞれ個別に流路接続されているので、上記したように吐出口からの液垂れを生じることがない。
【００１６】
請求項３に係る発明のノズルでは、液溜め路と吐出口とを流路接続する吐出経路が、液溜め路から上方向に延びる連絡路と、この連絡路の上端部から横方向に延びる吐出路とから構成されているので、処理液の供給が停止された時に、連絡路を満たした処理液が、重力の作用により吐出路を通って吐出口から流出することはない。また、吐出口に連通する吐出路の内径が連絡路の内径より細くされているので、吐出路を満たした処理液が吐出口から流出して液垂れを生じる心配も無い。
【００１７】
請求項４に係る発明のノズルでは、横方向に延設された各液溜め路に沿った方向にそれぞれ複数個の吐出口が並列して設けられていることにより、処理液の供給量を多くしなくても、基板の表面上の広い範囲にわたって処理液を供給することができる。そして、前方側の液溜め路と各吐出口および後方側の液溜め路と各吐出口とはそれぞれ、液溜め路の内径より細径の吐出経路によってそれぞれ個別に流路接続されているので、上記したように吐出口からの液垂れを生じることがない。さらに、液溜め路と吐出口とを流路接続する吐出経路が、液溜め路から上方向に延びる連絡路と、この連絡路の上端部から横方向に延びる吐出路とから構成されているので、処理液の供給が停止された時に、連絡路を満たした処理液が、重力の作用により吐出路を通って吐出口から流出することはない。また、吐出口に連通する吐出路の内径が連絡路の内径より細くされているので、吐出路を満たした処理液が吐出口から流出して液垂れを生じる心配も無い。
【００１８】
また、平行に並んで前後に設けられた一対の液溜め路のうちの後方側の液溜め路から上方向に延びる連絡路が、前方側の液溜め路から上方向に延びる連絡路に対して前向きに傾斜しているので、前方側の液溜め路に流路接続した吐出口の位置（吐出口からの処理液の吐出位置）と後方側の液溜め路に流路接続した吐出口の位置（吐出口からの処理液の吐出位置）とを前後方向においてずらさなくても、前方側の液溜め路に流路接続した吐出路の長さと後方側の液溜め路に流路接続した吐出路の長さとを同等程度にすることが可能である。このように、前方側の液溜め路に流路接続した吐出口と後方側の液溜め路に流路接続した吐出口とにおける位置ずれを無くしもしくは小さくするとともに、前方側の液溜め路に流路接続した吐出路の長さと後方側の液溜め路に流路接続した吐出路の長さとを同等程度にすることにより、各吐出口から基板の表面へ供給される処理液の吐出状態が均一化される。
【００１９】
請求項５に係る発明のノズルでは、前方側の液溜め路に流路接続された各吐出口と後方側の液溜め路に流路接続された各吐出口とがそれぞれ交互に配置されることにより、横方向に並列した複数の吐出口から基板表面への処理液の供給状態が均等化される。
【００２０】
請求項６に係る発明のノズルでは、壁面から前向きに突出した短管状突出部の先端面に吐出口が設けられていることにより、吐出口から吐出される処理液が壁面に付着する心配が無くなる。
【００２１】
請求項７に係る発明のノズルでは、吐出経路の吐出口付近を前方下向きに傾斜させるように配置することにより、吐出口から吐出された処理液が基板の表面に当たる時の処理液と基板表面とのなす角度を適切に調整することが可能になる。一方、吐出経路の吐出口付近を前方下向きに傾斜させることにより、処理液の供給が停止された時に吐出口から処理液が流出して液垂れを生じる可能性が出てくるが、短管状突出部の前端部下部が水平方向に欠切されていることにより、吐出口での液切れが良好となるので、液垂れを生じる可能性が無くなる。
【００２２】
請求項８に係る発明の基板処理装置においては、上記したような作用を奏する処理液供給用ノズルを備えているので、基板保持手段に水平姿勢で保持された基板の表面へ処理液供給用ノズルの吐出口から処理液が吐出されて、処理液による基板の処理が行われる。そして、基板の処理が終了して、処理液の供給が停止された時には、処理液が吐出口から流出して液垂れを生じる、といったことが起こらない。したがって、液垂れが原因で基板の処理が不均一になる心配は無い。
【００２３】
【発明の実施の形態】
以下、この発明の好適な実施形態について図１ないし図９を参照しながら説明する。
【００２４】
図１ないし図６は、この発明の実施形態の１例を示し、図１は、基板への処理液供給用ノズルの正面図であり、図２は、その平面図であり、図３は、その左側面図であり、図４は、図１のIV−IV矢視断面図であり、図５は、図１のＶ−Ｖ矢視断面図であり、図６は、図１のVI−VI矢視断面図である。なお、図２は、ノズルの上面で切断した状態の平面図を示し、図３は、ノズル保持板を除去した状態のノズルを図示し、また、図５および図６では、処理液供給管の図示を省略している。また、図７は、この発明に係る基板処理装置の要部の構成の１例を示す概略図である。
【００２５】
基板処理装置は、図７に示すように、液晶表示装置用ガラス基板等の基板１を水平姿勢に吸着保持するスピンチャック２を備え、スピンチャック２は、回転自在に支持されており、図示しないスピンモータによって鉛直軸回りに回転させられるようになっている。また、基板処理装置は、保持板１２によって片持ち式に水平姿勢に保持されたノズル１０を備え、このノズル１０に、処理液、例えば洗浄液の供給装置（図示せず）に流路接続された２本の処理液供給管１４、１４（図３および図４参照）が上方から接続されている。図示していないが、保持板１２は、水平面内において旋回可能な支持アームに支持され、支持アームはノズル移動機構に取着されている。そして、ノズル１０は、ノズル移動機構によって支持アームを旋回させることにより、スピンチャック２に保持された基板１の上方位置と基板１の側方の退避位置との間を往復移動し、ノズル移動機構によって支持アームを昇降させることにより、基板１の表面に近接し基板１の表面から上方へ離間するようになっている。
【００２６】
ノズル１０は、横長の直方体形状をなし内部に液流路が形成された本体ブロック１６を有し、本体ブロック１６の前壁面には、その中央より僅かに上方の位置に複数の短管状突出部１８ａ、１８ｂが、横方向に並列しそれぞれ壁面から前向きに突出するように形設されている。そして、各短管状突出部１８ａ、１８ｂの先端面にそれぞれ吐出口２０ａ、２０ｂが前向きに設けられている。このように、本体ブロック１６の前壁面から前向きに突出した短管状突出部１８ａ、１８ｂの先端面に吐出口２０ａ、２０ｂを設けるようにすると、吐出口２０ａ、２０ｂから吐出される洗浄液が前壁面に付着する心配が無くなるので好ましい。各部の寸法の１例を示すと、短管状突出部１８ａ、１８ｂの各突出長さは、どちらも５ｍｍであり、短管状突出部１８ａ、１８ｂの外径が４ｍｍで、吐出口２０ａ、２０ｂの口径が２ｍｍである。
【００２７】
本体ブロック１６の液流路は、縦方向に穿設され一対の処理液供給管１４、１４がそれぞれ連通接続される一対の接続孔２２、２２と、この各接続孔２２、２２の下端部にそれぞれ連通し本体ブロック１６の下部において横方向に延設された一対の液溜め路２４ａ、２４ｂと、この各液溜め路２４ａ、２４ｂと各吐出口２０ａ、２０ｂとをそれぞれ流路接続する吐出経路とで形成されている。一対の液溜め路２４ａ、２４ｂは、互いに平行に並んで前後に配置されている。吐出経路は、液溜め路２４ａ、２４ｂから上方向に延びる連絡路２６ａ、２６ｂと、この連絡路２６ａ、２６ｂの上端部から横方向に延びて吐出口２０ａ、２０ｂに連通する吐出路２８ａ、２８ｂとで形成されている。そして、前方側の液溜め路２４ａと各吐出口２０ａとは、各別に吐出経路（連絡路２６ａおよび吐出路２８ａ）によってそれぞれ流路接続され、また、後方側の液溜め路２４ｂと各吐出口２０ｂとは、各別に吐出経路（連絡路２６ｂおよび吐出路２８ｂ）によってそれぞれ流路接続されている。
【００２８】
液溜め路２４ａ、２４ｂは、吐出口２０ａ、２０ｂより下方位置に形成されており、液溜め路２４ａ、２４ｂの両端部は、円板栓３０によってそれぞれ閉塞されている。また、連絡路２６ａ、２６ｂは、液溜め路２４ａ、２４ｂの内径より細径に形成されており、前方側の液溜め路２４ａから上方向に延びる連絡路２６ａの上端部は、円板栓３２によって閉塞されている。そして、吐出口２０ａ、２０ｂに連通する吐出路２８ａ、２８ｂは、連絡路２６ａ、２６ｂの内径よりさらに細径に形成されている。各路の内径寸法の１例を示すと、液溜め路２４ａ、２４ｂの内径が８ｍｍで、連絡路２６ａ、２６ｂの内径が４ｍｍで、吐出路２８ａ、２８ｂの内径（吐出口２０ａ、２０ｂの口径）が２ｍｍである。
【００２９】
また、後方側の液溜め路２４ｂから上方向に延びる各連絡路２６ｂは、前方側の液溜め路２４ａから上方向に延びる各連絡路２６ａに対して前向きに傾斜するように形成されている。これにより、図５および図６に示すように、前方側の液溜め路２４ａに流路接続した吐出口２０ａが設けられた短管状突出部１８ａの突出長さに比べて、後方側の液溜め路２４ｂに流路接続した吐出口２０ｂが設けられた短管状突出部１８ｂの突出長さを若干短くするだけで、前方側の液溜め路２４ａに流路接続した吐出路２８ａの長さａと後方側の液溜め路２４ｂに流路接続した吐出路２８ｂの長さｂとが同等になっている。吐出路２８ａ、２８ｂの長さａ、ｂの寸法例を示すと、９ｍｍ〜１２ｍｍである。
【００３０】
上記した構成を有するノズル１０においては、処理液供給管１４、１４を通って供給される洗浄液は、接続孔２２、２２を通って液溜め路２４ａ、２４ｂに流入し、液溜め路２４ａ、２４ｂから吐出経路（連絡路２６ａ、２６ｂおよび吐出路２８ａ、２８ｂ）を通って吐出口２０ａ、２０ｂへ送られ、吐出口２０ａ、２０ｂから吐出されて、水平姿勢に保持された基板の表面へ供給される。そして、このノズル１０には、複数個の吐出口２０ａ、２０ｂが横方向に並列して設けられているので、ノズル１０への洗浄液の供給量を多くしなくても、基板の表面上の広い範囲にわたって洗浄液を供給することができる。また、前方側の液溜め路２４ａに流路接続した吐出口２０ａと後方側の液溜め路２４ｂに流路接続した吐出口２０ｂとにおける位置ずれが無く、かつ、前方側の液溜め路２４ａに流路接続した吐出路２８ａと後方側の液溜め路２４ｂに流路接続した吐出路２８ｂとが同等程度の長さであるため、吐出口２０ａおよび吐出口２０ｂからそれぞれ基板の表面へ供給される洗浄液の吐出状態が均一になる。さらに、前方側の液溜め路２４ａに流路接続された各吐出口２０ａと後方側の液溜め路２４ｂに流路接続された各吐出口２０ｂとがそれぞれ交互に配置されているので、横方向に並列した複数の吐出口２０ａ、２０ｂから基板表面への洗浄液の供給状態が均等になる。
【００３１】
そして、処理液供給管１４からの洗浄液の供給が停止された時は、吐出口２０ａ、２０ｂが液溜め路２４ａ、２４ｂより上方に位置しているため、重力の作用によって洗浄液が吐出口２０ａ、２０ｂから流出することがない。さらに、吐出口２０ａ、２０ｂに流路接続する吐出経路（連絡路２６ａ、２６ｂおよび吐出路２８ａ、２８ｂ）の内径が液溜め路２４ａ、２４ｂの内径より細くされており、しかも、吐出口２０ａ、２０ｂに連通する吐出路２８ａ、２８ｂの内径が連絡路２６ａ、２６ｂの内径より細くされているので、吐出経路を満たした洗浄液が吐出口２０ａ、２０ｂから流出して液垂れを生じる心配も無くなる。
【００３２】
なお、保持板１２によりノズル１０を、例えば鉛直面から２５°〜３０°程度だけ前方側へ傾けるようにして保持し、図８および図９に示すように吐出路２８ａ、２８ｂが前方下向きに傾斜するように配置するようにしてもよい。このようにすると、吐出口２０ａ、２０ｂから吐出された洗浄液が基板の表面に当たる時の洗浄液と基板表面とのなす角度を適切に調整することが可能になる。一方、吐出路２８ａ、２８ｂを前方下向きに傾斜させると、洗浄液の供給が停止された時に吐出口２０ａ、２０ｂから洗浄液が流出しやすくなり、液垂れを生じる可能性が出てくる。この不都合を解消するためには、短管状突出部１８ａ、１８ｂの前端部下部を、吐出路２８ａ、２８ｂの先端下部に到達する程度まで水平方向に欠り切いて、短管状突出部１８ａ、１８ｂに欠切平坦面３４ａ、３４ｂを形成するようにするとよい。このようにすると、吐出口２０ａ、２０ｂでの液切れが良好となるので、液垂れを生じる可能性が無くなる。
【００３３】
なお、上記した実施形態では、吐出経路を、液溜め路２４ａ、２４ｂから上方向に延びる連絡路２６ａ、２６ｂと、この連絡路２６ａ、２６ｂの上端部から横方向に延びて吐出口２０ａ、２０ｂに連通する吐出路２８ａ、２８ｂとで形成するようにしたが、吐出口が液溜め路より上方に位置し、かつ、吐出経路の内径が液溜め路の内径より細く形成されておれば、吐出経路の形態は特に限定されない。また、上記実施形態では、一対の液溜め路２４ａ、２４ｂを平行に並べて前後に配置するようにしたが、単一の液溜め路だけを設けるようにしてもよい。さらに、上記実施形態では、液溜め路２４ａ、２４ｂを横方向に延設し、複数個の吐出口２０ａ、２０ｂを横方向に並列して設けるようにしているが、単一の吐出口を有するノズルについても、この発明は適用し得るものである。
【００３４】
また、上記した実施形態では、洗浄液を基板の表面へ供給するノズルを例にして説明したが、この発明は、洗浄液供給用ノズルに限らず、現像液、エッチング液、剥離液等の他の処理液を供給するためのノズルについても同様に適用し得るものである。
【００３５】
【発明の効果】
請求項１に係る発明の基板への処理液供給用ノズルを使用すると、吐出口からの液垂れを防止することができ、基板の処理の均一性を保持することができる。
【００３６】
請求項２に係る発明のノズルでは、処理液の供給量を多くしなくても、基板の表面上の広い範囲にわたって処理液を供給することができ、各吐出口からの液垂れも防止される。
【００３７】
請求項３に係る発明のノズルでは、吐出口からの液垂れもより確実に防止することができる。
【００３８】
請求項４に係る発明のノズルでは、処理液の供給量を多くしなくても、基板の表面上の広い範囲にわたって処理液を供給することができ、各吐出口からの液垂れも確実に防止される。また、前方側の液溜め路に流路接続した吐出口の位置と後方側の液溜め路に流路接続した吐出口の位置とを前後方向においてずらさなくても、前方側の液溜め路に流路接続した吐出路の長さと後方側の液溜め路に流路接続した吐出路の長さとを同等程度にすることが可能であり、各吐出口から基板の表面へ供給される処理液の吐出状態を均一化することが可能になる。
【００３９】
請求項５に係る発明のノズルでは、横方向に並列した複数の吐出口から基板表面への処理液の供給状態を均等化することができる。
【００４０】
請求項６に係る発明のノズルでは、吐出口から吐出される処理液が壁面に付着する心配を無くすことができる。
【００４１】
請求項７に係る発明のノズルでは、吐出口から吐出された処理液が基板の表面に当たる時の処理液と基板表面とのなす角度を適切に調整することが可能になり、液垂れを生じる可能性も無くすことができる。
【００４２】
請求項８に係る発明の基板処理装置を使用すると、処理液供給用ノズルの吐出口からの液垂れを防止することができるので、基板の処理の均一性を確保することができる。
【図面の簡単な説明】
【図１】この発明の実施形態の１例を示し、基板への処理液供給用ノズルの正面図である。
【図２】図１に示したノズルの平面図である。
【図３】図１に示したノズルの左側面図である。
【図４】図１のIV−IV矢視断面図である。
【図５】図１のＶ−Ｖ矢視断面図である。
【図６】図１のVI−VI矢視断面図である。
【図７】この発明に係る基板処理装置の要部の構成の１例を示す概略図である。
【図８】図１に示したノズルの変形例を示し、ノズルの一部である短管状突出部の拡大斜視図である。
【図９】同じく、図１に示したノズルの変形例を示し、ノズルの一部である短管状突出部の拡大斜視図である。
【図１０】従来の処理液供給用ノズルの１例を示す側面図である。
【符号の説明】
１基板
２スピンチャック
１０ノズル
１２保持板
１４処理液供給管
１６本体ブロック
１８ａ、１８ｂ短管状突出部
２０ａ、２０ｂ吐出口
２２接続孔
２４ａ、２４ｂ液溜め路
２６ａ、２６ｂ連絡路
２８ａ、２８ｂ吐出路
３０、３２円板栓
３４ａ、３４ｂ欠切平坦面[0001]
BACKGROUND OF THE INVENTION
The present invention relates to a processing liquid supply apparatus for supplying a processing liquid such as a cleaning liquid, a developing liquid, an etching liquid or a peeling liquid to the surface of a substrate such as a glass substrate for a liquid crystal display device, a semiconductor wafer, a glass substrate for a photomask, or an optical disk substrate And a substrate processing apparatus for processing a substrate by supplying a processing solution such as a cleaning solution, a developing solution, an etching solution, and a stripping solution to the surfaces of the various substrates described above.
[0002]
[Prior art]
For example, while holding a substrate such as a glass substrate for a liquid crystal display device in a horizontal position on a rotation support plate and rotating it around a vertical axis, a processing solution such as a cleaning solution is supplied to the surface of the substrate to clean the substrate. In the substrate processing apparatus that performs the above processing, the nozzle is moved to a position immediately above the substrate, the processing liquid is discharged from the discharge port of the nozzle, and the processing liquid is supplied to the surface of the rotating substrate. In this case, in the conventional apparatus, as shown in FIG. 10, the treatment liquid is supplied to the liquid flow path 7 formed in the nozzle 5 through the treatment liquid supply pipe 8 disposed above the nozzle 5. (For example, refer to Patent Document 1).
[0003]
[Patent Document 1]
JP 2002-177855 A (6th page, 9th page, FIG. 2, FIG. 5, FIG. 9 (c))
[0004]
[Problems to be solved by the invention]
However, as shown in FIG. 10, when the processing liquid is supplied from above the nozzle 5 to the liquid flow path 7 of the nozzle 5, the discharge port of the nozzle 5 is stopped when the supply of the processing liquid to the nozzle 5 is stopped. The processing liquid drips from 6. This dripping phenomenon is particularly noticeable when a low-viscosity treatment liquid such as pure water or hydrofluoric acid is used. When such dripping occurs, the uniformity of the processing of the substrate is affected.
[0005]
The present invention has been made in view of the circumstances as described above, and provides a nozzle for supplying a processing liquid to a substrate that does not cause liquid dripping from a discharge port. It is an object of the present invention to provide a substrate processing apparatus that can prevent liquid dripping from a discharge port and ensure the uniformity of substrate processing.
[0006]
[Means for Solving the Problems]
According to the first aspect of the present invention, a discharge port is formed in a forward direction, a liquid flow path communicating with the discharge port is formed therein, and a treatment liquid supply pipe disposed above is connected to the liquid flow path. In a processing liquid supply nozzle to a substrate that is supplied with the processing liquid and discharges the processing liquid to the surface of the substrate held in a horizontal posture, a connection hole that communicates with the processing liquid supply pipe, and a communication hole that communicates with the connection hole A liquid reservoir path formed at a position below the discharge port; and a discharge path that is formed with a diameter smaller than the inner diameter of the liquid reservoir path and connects the liquid reservoir path and the discharge port. And
[0007]
According to a second aspect of the present invention, in the nozzle according to the first aspect, the liquid reservoir path extends in the lateral direction, and a plurality of the discharge ports are provided in parallel in the direction along the liquid reservoir path. The liquid reservoir path and each discharge port are connected to each other by a discharge path.
[0008]
According to a third aspect of the present invention, in the nozzle according to the first or second aspect, the discharge path is formed with a communication path extending upward from the liquid reservoir path and having a diameter smaller than the inner diameter of the communication path. A discharge path that extends in a lateral direction from an upper end portion of the path and communicates with the discharge port is characterized in that the discharge path is formed.
[0009]
According to a fourth aspect of the present invention, in the nozzle according to the second aspect, a pair of the liquid reservoir paths are provided in front and rear in parallel, and the liquid reservoir path on the front side and each discharge port are connected to each other by a flow path. Each discharge path is composed of a communication path extending upward from the liquid storage path, and a discharge path that is formed with a diameter smaller than the inner diameter of the communication path and extends laterally from the upper end of the communication path and communicates with the discharge port. In addition, each discharge path that connects the liquid reservoir path on the rear side to each discharge port separately extends from the liquid reservoir path and extends upward from the liquid reservoir path on the front side. The connecting path is inclined forward with respect to the path, and the discharge path is formed with a diameter smaller than the inner diameter of the connecting path and extends laterally from the upper end of the connecting path and communicates with the discharge port. And
[0010]
The invention according to claim 5 is the nozzle according to claim 4, wherein each discharge port connected to the front liquid reservoir and each discharge port connected to the rear liquid reservoir are respectively connected. It is characterized by being arranged alternately.
[0011]
According to a sixth aspect of the present invention, in the nozzle according to any one of the first to fifth aspects, a short tubular projecting portion projecting forward from the wall surface is formed, and the discharge is formed on a distal end surface of the short tubular projecting portion. An outlet is provided.
[0012]
According to a seventh aspect of the present invention, in the nozzle according to the sixth aspect, the vicinity of the discharge port of the discharge path is disposed so as to be inclined forward and downward, and the lower portion of the front end portion of the short tubular projecting portion is cut off in the horizontal direction. It is characterized by that.
[0013]
The invention according to claim 8 includes substrate holding means for holding the substrate in a horizontal position and processing liquid supply means for supplying the processing liquid to the surface of the substrate held by the substrate holding means, and the substrate is held by the processing liquid. In a substrate processing apparatus for processing, a processing liquid supply nozzle to the substrate according to any one of claims 1 to 7 is provided as the processing liquid supply means.
[0014]
In the processing liquid supply nozzle to the substrate according to the first aspect of the present invention, the processing liquid supplied through the processing liquid supply pipe flows into the liquid storage path through the connection hole, and is discharged from the liquid storage path. Then, it is sent to the discharge port, discharged from the discharge port, and supplied to the surface of the substrate held in a horizontal posture. When the supply of the processing liquid is stopped, the discharge port is located above the liquid reservoir path, so that the processing liquid does not flow out of the discharge port due to the action of gravity. Furthermore, since the inner diameter of the discharge path connected to the discharge port is made thinner than the inner diameter of the liquid reservoir path, there is no fear that the processing liquid filling the discharge path will flow out of the discharge port and cause dripping. .
[0015]
In the nozzle according to the second aspect of the present invention, the plurality of discharge ports are provided in parallel in the direction along the liquid reservoir path extending in the lateral direction, so that the supply amount of the processing liquid is not increased. However, the processing liquid can be supplied over a wide range on the surface of the substrate. Since the liquid reservoir and each discharge port are individually connected to each other by a discharge path having a diameter smaller than the inner diameter of the liquid reservoir, no liquid dripping occurs from the discharge port as described above. .
[0016]
In the nozzle according to the third aspect of the present invention, the discharge path that connects the liquid reservoir path and the discharge port to the flow path includes a communication path that extends upward from the liquid reservoir path, and a discharge that extends laterally from the upper end of the communication path. Therefore, when the supply of the processing liquid is stopped, the processing liquid that fills the communication path does not flow out of the discharge port through the discharge path due to the action of gravity. In addition, since the inner diameter of the discharge path communicating with the discharge port is made smaller than the inner diameter of the communication path, there is no fear that the processing liquid filling the discharge path flows out of the discharge port and causes dripping.
[0017]
In the nozzle according to the fourth aspect of the present invention, a plurality of discharge ports are provided in parallel in the direction along each liquid reservoir path extending in the lateral direction, thereby increasing the supply amount of the processing liquid. Even if not, the treatment liquid can be supplied over a wide range on the surface of the substrate. And, since the liquid reservoir path on the front side and each discharge port and the liquid reservoir path on the rear side and each discharge outlet are individually connected to each other by a discharge path having a diameter smaller than the inner diameter of the liquid reservoir path, As described above, liquid dripping from the discharge port does not occur. Further, the discharge path that connects the liquid reservoir path and the discharge port is composed of a communication path that extends upward from the liquid reservoir path and a discharge path that extends laterally from the upper end of the communication path. When the supply of the processing liquid is stopped, the processing liquid that fills the communication path does not flow out of the discharge port through the discharge path due to the action of gravity. In addition, since the inner diameter of the discharge path communicating with the discharge port is made smaller than the inner diameter of the communication path, there is no fear that the processing liquid filling the discharge path flows out of the discharge port and causes dripping.
[0018]
Further, the communication path extending upward from the rear liquid storage path of the pair of liquid storage paths provided in front and rear in parallel with respect to the communication path extending upward from the front liquid storage path Since it is inclined forward, the position of the discharge port connected to the front liquid reservoir (the discharge position of the processing liquid from the discharge port) and the position of the discharge port connected to the rear liquid reservoir The length of the discharge path connected to the front-side liquid storage path and the discharge path connected to the rear-side liquid storage path without shifting the (discharging position of the processing liquid from the discharge port) in the front-rear direction. It is possible to make the length of the same level. As described above, the displacement between the discharge port connected to the front liquid reservoir and the discharge port connected to the rear liquid reservoir is eliminated or reduced, and the flow is allowed to flow to the front liquid reservoir. By making the length of the discharge path connected to the path and the length of the discharge path connected to the liquid storage path on the rear side equivalent, the discharge state of the processing liquid supplied from each discharge port to the surface of the substrate is uniform. It becomes.
[0019]
In the nozzle according to the fifth aspect of the present invention, the discharge ports connected to the front-side liquid reservoir and the discharge ports connected to the rear-side liquid reservoir are alternately arranged. Thus, the supply state of the processing liquid from the plurality of discharge ports arranged in parallel in the horizontal direction to the substrate surface is equalized.
[0020]
In the nozzle according to the sixth aspect of the present invention, since the discharge port is provided at the distal end surface of the short tubular projecting portion protruding forward from the wall surface, there is no fear that the processing liquid discharged from the discharge port adheres to the wall surface. .
[0021]
In the nozzle of the invention according to claim 7, by disposing the vicinity of the discharge port of the discharge path so as to be inclined forward and downward, the processing liquid and the substrate surface when the processing liquid discharged from the discharge port hits the surface of the substrate It is possible to appropriately adjust the angle between the two. On the other hand, by inclining the vicinity of the discharge port of the discharge path forward and downward, there is a possibility that the processing liquid flows out from the discharge port when the supply of the processing liquid is stopped, and dripping occurs. Since the lower part of the front end portion of the part is cut out in the horizontal direction, the liquid breakage at the discharge port becomes good, so that there is no possibility of dripping.
[0022]
In the substrate processing apparatus according to the eighth aspect of the present invention, since the processing liquid supply nozzle having the above-described action is provided, the processing liquid supply nozzle is applied to the surface of the substrate held in a horizontal posture by the substrate holding means. The processing liquid is discharged from the discharge port, and the substrate is processed by the processing liquid. When the processing of the substrate is completed and the supply of the processing liquid is stopped, the processing liquid does not flow out of the discharge port and cause dripping. Therefore, there is no fear that the processing of the substrate becomes non-uniform due to dripping.
[0023]
DETAILED DESCRIPTION OF THE INVENTION
A preferred embodiment of the present invention will be described below with reference to FIGS.
[0024]
1 to 6 show an example of an embodiment of the present invention. FIG. 1 is a front view of a processing liquid supply nozzle to a substrate, FIG. 2 is a plan view thereof, and FIG. 4 is a cross-sectional view taken along arrow IV-IV in FIG. 1, FIG. 5 is a cross-sectional view taken along arrow V-V in FIG. 1, and FIG. It is VI sectional drawing. 2 shows a plan view of the nozzle cut at the upper surface, FIG. 3 shows the nozzle with the nozzle holding plate removed, and FIGS. 5 and 6 show the treatment liquid supply pipe. The illustration is omitted. FIG. 7 is a schematic view showing an example of the configuration of the main part of the substrate processing apparatus according to the present invention.
[0025]
As shown in FIG. 7, the substrate processing apparatus includes a spin chuck 2 that sucks and holds a substrate 1 such as a glass substrate for a liquid crystal display device in a horizontal posture, and the spin chuck 2 is rotatably supported and is not shown. It can be rotated around the vertical axis by a spin motor. Further, the substrate processing apparatus includes a nozzle 10 that is held in a cantilevered horizontal posture by a holding plate 12, and a flow path connection is made to the nozzle 10 with a processing liquid, for example, a cleaning liquid supply device (not shown). Two treatment liquid supply pipes 14 and 14 (see FIGS. 3 and 4) are connected from above. Although not shown, the holding plate 12 is supported by a support arm that can turn in a horizontal plane, and the support arm is attached to a nozzle moving mechanism. The nozzle 10 reciprocates between the upper position of the substrate 1 held by the spin chuck 2 and the side retracted position of the substrate 1 by rotating the support arm by the nozzle moving mechanism, and the nozzle moving mechanism. Thus, the support arm is moved up and down to approach the surface of the substrate 1 and to be separated upward from the surface of the substrate 1.
[0026]
The nozzle 10 has a main body block 16 having a horizontally long rectangular parallelepiped shape and having a liquid flow path formed therein, and a plurality of short tubular projecting portions at a position slightly above the center of the front wall surface of the main body block 16. 18a and 18b are formed so as to be juxtaposed in the lateral direction and project forward from the wall surface. Discharge ports 20a and 20b are provided forward on the distal end surfaces of the short tubular projecting portions 18a and 18b, respectively. As described above, when the discharge ports 20a and 20b are provided at the front end surfaces of the short tubular protrusions 18a and 18b protruding forward from the front wall surface of the main body block 16, the cleaning liquid discharged from the discharge ports 20a and 20b is transferred to the front wall surface. This is preferable because there is no fear of adhering to the surface. As an example of the dimensions of each part, the lengths of the short tubular projecting portions 18a and 18b are both 5 mm, the outer diameters of the short tubular projecting portions 18a and 18b are 4 mm, and the discharge ports 20a and 20b The diameter is 2 mm.
[0027]
The liquid flow path of the main body block 16 is formed in a pair of connection holes 22, 22 that are formed in the vertical direction and are connected to the pair of processing liquid supply pipes 14, 14, and lower ends of the connection holes 22, 22. A pair of liquid reservoir paths 24a and 24b extending in the lateral direction at the lower part of the communicating main body block 16, and discharge paths for connecting the liquid reservoir paths 24a and 24b and the discharge ports 20a and 20b, respectively. And is formed. The pair of liquid reservoir paths 24a and 24b are arranged in front and back in parallel with each other. The discharge paths include communication paths 26a and 26b that extend upward from the liquid storage paths 24a and 24b, and discharge paths 28a and 28b that extend laterally from the upper ends of the communication paths 26a and 26b and communicate with the discharge ports 20a and 20b. And is formed. The front-side liquid storage path 24a and each discharge port 20a are connected to each other by discharge paths (communication path 26a and discharge path 28a), respectively, and the rear-side liquid storage path 24b and each discharge port are connected to each other. 20b is connected to each other by a discharge path (communication path 26b and discharge path 28b).
[0028]
The liquid reservoir paths 24a and 24b are formed at positions below the discharge ports 20a and 20b, and both ends of the liquid reservoir paths 24a and 24b are respectively closed by the disk stoppers 30. The communication paths 26a and 26b are formed to have a diameter smaller than the inner diameters of the liquid reservoir paths 24a and 24b, and the upper end portion of the communication path 26a extending upward from the liquid reservoir path 24a on the front side is a disc plug 32. It is blocked by The discharge passages 28a and 28b communicating with the discharge ports 20a and 20b are formed with a smaller diameter than the inner diameters of the communication passages 26a and 26b. An example of the inner diameter of each path is as follows. The inner diameters of the liquid storage paths 24a and 24b are 8 mm, the inner diameters of the communication paths 26a and 26b are 4 mm, and the inner diameters of the discharge paths 28a and 28b (the diameters of the discharge ports 20a and 20b). ) Is 2 mm.
[0029]
Each communication path 26b extending upward from the rear-side liquid reservoir path 24b is formed to be inclined forward with respect to each communication path 26a extending upward from the front-side liquid reservoir path 24a. As a result, as shown in FIGS. 5 and 6, the liquid reservoir on the rear side is larger than the protruding length of the short tubular protruding portion 18a provided with the discharge port 20a connected to the liquid reservoir path 24a on the front side. The length a of the discharge path 28a connected to the front side liquid reservoir path 24a and the length a of the short tubular protrusion 18b provided with the discharge port 20b connected to the path 24b is slightly shortened. The length b of the discharge path 28b connected to the rear liquid reservoir path 24b is equal. A dimension example of the lengths a and b of the discharge passages 28a and 28b is 9 mm to 12 mm.
[0030]
In the nozzle 10 having the above-described configuration, the cleaning liquid supplied through the processing liquid supply pipes 14 and 14 flows into the liquid storage paths 24a and 24b through the connection holes 22 and 22, and the liquid storage paths 24a and 24b. Is sent to the discharge ports 20a and 20b through the discharge paths (the communication paths 26a and 26b and the discharge paths 28a and 28b), discharged from the discharge ports 20a and 20b, and supplied to the surface of the substrate held in a horizontal posture. The Since the nozzle 10 is provided with a plurality of discharge ports 20a and 20b arranged in parallel in the horizontal direction, a wide area on the surface of the substrate can be obtained without increasing the amount of cleaning liquid supplied to the nozzle 10. A cleaning liquid can be supplied over a range. Further, there is no positional deviation between the discharge port 20a connected to the front side liquid storage path 24a and the discharge port 20b connected to the rear side liquid storage path 24b, and the front side liquid storage path 24a Since the discharge path 28a connected to the flow path and the discharge path 28b connected to the liquid reservoir path 24b on the rear side have the same length, they are supplied from the discharge port 20a and the discharge port 20b to the surface of the substrate, respectively. The discharge state of the cleaning liquid becomes uniform. Further, since the discharge ports 20a connected to the front liquid reservoir passage 24a and the discharge ports 20b connected to the rear liquid storage passage 24b are alternately arranged, the horizontal direction The supply state of the cleaning liquid from the plurality of discharge ports 20a and 20b arranged in parallel to the substrate surface becomes uniform.
[0031]
When the supply of the cleaning liquid from the processing liquid supply pipe 14 is stopped, the discharge ports 20a and 20b are located above the liquid reservoir paths 24a and 24b, so that the cleaning liquid is discharged from the discharge ports 20a and 20a by the action of gravity. It does not flow out of 20b. Furthermore, the inner diameters of the discharge paths (communication paths 26a, 26b and discharge paths 28a, 28b) connected to the discharge ports 20a, 20b are made smaller than the inner diameters of the liquid reservoir paths 24a, 24b, and the discharge ports 20a, 20b, Since the inner diameters of the discharge paths 28a and 28b communicating with 20b are made smaller than the inner diameters of the communication paths 26a and 26b, there is no fear that the cleaning liquid that fills the discharge paths flows out of the discharge ports 20a and 20b and causes dripping.
[0032]
The nozzle 10 is held by the holding plate 12 so as to be inclined forward by, for example, about 25 ° to 30 ° from the vertical plane, and the discharge passages 28a and 28b are inclined forward and downward as shown in FIGS. You may make it arrange | position so. This makes it possible to appropriately adjust the angle formed between the cleaning liquid and the substrate surface when the cleaning liquid discharged from the discharge ports 20a and 20b hits the surface of the substrate. On the other hand, if the discharge passages 28a and 28b are inclined forward and downward, the cleaning liquid is likely to flow out from the discharge ports 20a and 20b when the supply of the cleaning liquid is stopped, which may cause liquid dripping. In order to solve this inconvenience, the lower portions of the front end portions of the short tubular projecting portions 18a and 18b are cut off in the horizontal direction to the extent that they reach the lower end portions of the discharge passages 28a and 28b, thereby forming the short tubular projecting portions 18a and 18b. It is preferable to form notched flat surfaces 34a and 34b. In this case, since the liquid drainage at the discharge ports 20a and 20b is good, there is no possibility of dripping.
[0033]
In the above-described embodiment, the discharge path includes the communication paths 26a and 26b extending upward from the liquid storage paths 24a and 24b, and the discharge ports 20a and 20b extending laterally from the upper ends of the communication paths 26a and 26b. However, if the discharge port is located above the liquid reservoir path and the inner diameter of the discharge path is narrower than the inner diameter of the liquid reservoir path, the discharge path 28a and 28b communicate with each other. The form of the route is not particularly limited. In the above-described embodiment, the pair of liquid reservoir paths 24a and 24b are arranged in parallel and arranged at the front and rear, but only a single liquid reservoir path may be provided. Further, in the above-described embodiment, the liquid reservoir paths 24a and 24b are extended in the horizontal direction and the plurality of discharge ports 20a and 20b are provided in parallel in the horizontal direction, but have a single discharge port. The present invention can also be applied to nozzles.
[0034]
In the above-described embodiment, the nozzle for supplying the cleaning liquid to the surface of the substrate has been described as an example. However, the present invention is not limited to the nozzle for supplying the cleaning liquid. The same applies to a nozzle for supplying a liquid.
[0035]
【The invention's effect】
When the processing liquid supply nozzle to the substrate of the invention according to claim 1 is used, liquid dripping from the discharge port can be prevented, and the uniformity of the processing of the substrate can be maintained.
[0036]
In the nozzle of the invention according to claim 2, the processing liquid can be supplied over a wide range on the surface of the substrate without increasing the supply amount of the processing liquid, and liquid dripping from each discharge port is also prevented. .
[0037]
In the nozzle according to the third aspect of the present invention, liquid dripping from the discharge port can be prevented more reliably.
[0038]
In the nozzle according to the fourth aspect of the present invention, the processing liquid can be supplied over a wide range on the surface of the substrate without increasing the supply amount of the processing liquid, and liquid dripping from each discharge port is surely prevented. Is done. In addition, the position of the discharge port connected to the fluid reservoir on the front side and the position of the discharge port connected to the fluid reservoir on the rear side need not be shifted in the front-rear direction. The length of the discharge path connected to the flow path and the length of the discharge path connected to the liquid storage path on the rear side can be made comparable, and the length of the treatment liquid supplied to the surface of the substrate from each discharge port It becomes possible to make the discharge state uniform.
[0039]
In the nozzle according to the fifth aspect, the supply state of the processing liquid from the plurality of discharge ports arranged in parallel in the lateral direction to the substrate surface can be equalized.
[0040]
In the nozzle according to the sixth aspect, it is possible to eliminate the concern that the processing liquid discharged from the discharge port adheres to the wall surface.
[0041]
In the nozzle of the invention according to claim 7, it becomes possible to appropriately adjust the angle formed between the processing liquid and the substrate surface when the processing liquid discharged from the discharge port hits the surface of the substrate, and liquid dripping may occur. Sex can be lost.
[0042]
When the substrate processing apparatus according to the eighth aspect of the present invention is used, liquid dripping from the discharge port of the processing liquid supply nozzle can be prevented, so that the uniformity of substrate processing can be ensured.
[Brief description of the drawings]
FIG. 1 shows an example of an embodiment of the present invention, and is a front view of a nozzle for supplying a processing liquid to a substrate.
FIG. 2 is a plan view of the nozzle shown in FIG.
3 is a left side view of the nozzle shown in FIG. 1. FIG.
4 is a cross-sectional view taken along the line IV-IV in FIG. 1;
5 is a cross-sectional view taken along arrow VV in FIG. 1;
6 is a cross-sectional view taken along the line VI-VI in FIG. 1;
FIG. 7 is a schematic view showing an example of a configuration of a main part of the substrate processing apparatus according to the present invention.
FIG. 8 is an enlarged perspective view of a short tubular protrusion that is a part of the nozzle, showing a modification of the nozzle shown in FIG. 1;
FIG. 9 is an enlarged perspective view of a short tubular protrusion that is a part of the nozzle, similarly showing a modification of the nozzle shown in FIG. 1;
FIG. 10 is a side view showing an example of a conventional treatment liquid supply nozzle.
[Explanation of symbols]
DESCRIPTION OF SYMBOLS 1 Substrate 2 Spin chuck 10 Nozzle 12 Holding plate 14 Process liquid supply pipe 16 Main body blocks 18a, 18b Short tubular protrusions 20a, 20b Discharge port 22 Connection holes 24a, 24b Liquid reservoir paths 26a, 26b Communication paths 28a, 28b Discharge path 30 , 32 Disc stoppers 34a, 34b Flat surface notched

Claims

A discharge port is formed in a forward direction, and a liquid flow path communicating with the discharge port is formed inside. A processing liquid is supplied from a processing liquid supply pipe disposed above to the liquid flow path, In the nozzle for supplying the processing liquid to the substrate for discharging the processing liquid to the surface of the substrate held in the posture,
A connection hole communicating with the processing liquid supply pipe;
A liquid reservoir path communicating with the connection hole and formed at a position below the discharge port;
A discharge path that is formed with a diameter smaller than the inner diameter of the liquid storage path, and connects the liquid storage path and the discharge port;
A nozzle for supplying a processing solution to a substrate, comprising:

The liquid reservoir path extends in the lateral direction, and a plurality of the discharge ports are provided in parallel in the direction along the liquid reservoir path, and the liquid reservoir path and each discharge port are separately provided by a discharge path, respectively. 2. A nozzle for supplying a processing solution to a substrate according to claim 1, which is connected to a flow path.

The discharge path includes a communication path that extends upward from the liquid reservoir path, and a discharge path that is formed with a diameter smaller than the inner diameter of the communication path and that extends laterally from the upper end of the communication path and communicates with the discharge port. A nozzle for supplying a processing liquid to the substrate according to claim 1 or claim 2 configured.

A pair of the liquid reservoir paths are provided in front and back in parallel,
Each discharge path that connects the liquid reservoir path on the front side and each discharge port separately from each other is formed with a communication path extending upward from the liquid reservoir path, and a diameter smaller than the inner diameter of this communication path. Each comprising a discharge passage extending in a lateral direction from the portion and communicating with the discharge port,
Each discharge path that connects the liquid reservoir path on the rear side and each discharge port separately from each other extends to the communication path that extends upward from the liquid reservoir path and extends upward from the liquid reservoir path on the front side 3. The substrate according to claim 2, comprising a connecting path inclined forward and a discharge path formed to have a diameter smaller than the inner diameter of the connecting path and extending laterally from the upper end of the connecting path and communicating with the discharge port. Nozzle for processing liquid supply.

5. The process liquid supply to the substrate according to claim 4, wherein each discharge port connected to the front side liquid storage channel and each discharge port connected to the rear side liquid storage channel are alternately arranged. Nozzle.

6. A process liquid supply to a substrate according to claim 1, wherein a short tubular projecting portion projecting forward from the wall surface is formed, and the discharge port is provided at a distal end surface of the short tubular projecting portion. Nozzle.

The nozzle for supplying a processing liquid to a substrate according to claim 6, wherein the vicinity of the discharge port of the discharge path is arranged so as to be inclined forward and downward, and the lower portion of the front end portion of the short tubular protrusion is cut off in the horizontal direction.

Substrate holding means for holding the substrate in a horizontal position;
A processing liquid supply means for supplying a processing liquid to the surface of the substrate held by the substrate holding means;
In a substrate processing apparatus for processing a substrate with a processing liquid,
8. A substrate processing apparatus comprising: a processing liquid supply nozzle for a substrate according to claim 1 as the processing liquid supply means.