JP3579275B2 - Method for producing benzoic acid derivative - Google Patents
Method for producing benzoic acid derivative Download PDFInfo
- Publication number
- JP3579275B2 JP3579275B2 JP36680598A JP36680598A JP3579275B2 JP 3579275 B2 JP3579275 B2 JP 3579275B2 JP 36680598 A JP36680598 A JP 36680598A JP 36680598 A JP36680598 A JP 36680598A JP 3579275 B2 JP3579275 B2 JP 3579275B2
- Authority
- JP
- Japan
- Prior art keywords
- group
- trifluoromethyl
- bis
- general formula
- benzoic acid
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
- 238000004519 manufacturing process Methods 0.000 title claims description 23
- IOHPVZBSOKLVMN-UHFFFAOYSA-N 2-(2-phenylethyl)benzoic acid Chemical compound OC(=O)C1=CC=CC=C1CCC1=CC=CC=C1 IOHPVZBSOKLVMN-UHFFFAOYSA-N 0.000 title claims description 14
- XYFCBTPGUUZFHI-UHFFFAOYSA-N Phosphine Chemical compound P XYFCBTPGUUZFHI-UHFFFAOYSA-N 0.000 claims description 36
- RIOQSEWOXXDEQQ-UHFFFAOYSA-N triphenylphosphine Chemical compound C1=CC=CC=C1P(C=1C=CC=CC=1)C1=CC=CC=C1 RIOQSEWOXXDEQQ-UHFFFAOYSA-N 0.000 claims description 36
- 125000002023 trifluoromethyl group Chemical group FC(F)(F)* 0.000 claims description 34
- KDLHZDBZIXYQEI-UHFFFAOYSA-N Palladium Chemical compound [Pd] KDLHZDBZIXYQEI-UHFFFAOYSA-N 0.000 claims description 33
- -1 bis (trifluoromethyl) phenyl group Chemical group 0.000 claims description 32
- 125000004432 carbon atom Chemical group C* 0.000 claims description 30
- 150000001875 compounds Chemical class 0.000 claims description 27
- 125000003118 aryl group Chemical group 0.000 claims description 25
- 229910000073 phosphorus hydride Inorganic materials 0.000 claims description 19
- 125000000217 alkyl group Chemical group 0.000 claims description 18
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims description 18
- 150000001491 aromatic compounds Chemical class 0.000 claims description 17
- WPYMKLBDIGXBTP-UHFFFAOYSA-N benzoic acid Chemical compound OC(=O)C1=CC=CC=C1 WPYMKLBDIGXBTP-UHFFFAOYSA-N 0.000 claims description 16
- 229910052763 palladium Inorganic materials 0.000 claims description 16
- GDTBXPJZTBHREO-UHFFFAOYSA-N bromine Substances BrBr GDTBXPJZTBHREO-UHFFFAOYSA-N 0.000 claims description 13
- 229910052794 bromium Inorganic materials 0.000 claims description 13
- 229910052736 halogen Inorganic materials 0.000 claims description 13
- 150000002367 halogens Chemical group 0.000 claims description 13
- ZCYVEMRRCGMTRW-UHFFFAOYSA-N 7553-56-2 Chemical compound [I] ZCYVEMRRCGMTRW-UHFFFAOYSA-N 0.000 claims description 11
- WKBOTKDWSSQWDR-UHFFFAOYSA-N Bromine atom Chemical compound [Br] WKBOTKDWSSQWDR-UHFFFAOYSA-N 0.000 claims description 11
- UGFAIRIUMAVXCW-UHFFFAOYSA-N Carbon monoxide Chemical compound [O+]#[C-] UGFAIRIUMAVXCW-UHFFFAOYSA-N 0.000 claims description 11
- 229910002091 carbon monoxide Inorganic materials 0.000 claims description 11
- 239000003054 catalyst Substances 0.000 claims description 11
- 229910052740 iodine Inorganic materials 0.000 claims description 11
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 claims description 11
- 239000011630 iodine Substances 0.000 claims description 10
- 238000000034 method Methods 0.000 claims description 10
- 229910052801 chlorine Inorganic materials 0.000 claims description 9
- 239000003446 ligand Substances 0.000 claims description 9
- CSVCVIHEBDJTCJ-UHFFFAOYSA-N 1-bromo-3,5-bis(trifluoromethyl)benzene Chemical compound FC(F)(F)C1=CC(Br)=CC(C(F)(F)F)=C1 CSVCVIHEBDJTCJ-UHFFFAOYSA-N 0.000 claims description 8
- HVFQJWGYVXKLTE-UHFFFAOYSA-N 3,5-bis(trifluoromethyl)benzoic acid Chemical compound OC(=O)C1=CC(C(F)(F)F)=CC(C(F)(F)F)=C1 HVFQJWGYVXKLTE-UHFFFAOYSA-N 0.000 claims description 8
- 239000005711 Benzoic acid Substances 0.000 claims description 8
- ZAMOUSCENKQFHK-UHFFFAOYSA-N Chlorine atom Chemical compound [Cl] ZAMOUSCENKQFHK-UHFFFAOYSA-N 0.000 claims description 8
- PXGOKWXKJXAPGV-UHFFFAOYSA-N Fluorine Chemical compound FF PXGOKWXKJXAPGV-UHFFFAOYSA-N 0.000 claims description 8
- 235000010233 benzoic acid Nutrition 0.000 claims description 8
- 239000000460 chlorine Substances 0.000 claims description 8
- 229910052731 fluorine Inorganic materials 0.000 claims description 8
- 239000011737 fluorine Substances 0.000 claims description 8
- 125000003545 alkoxy group Chemical group 0.000 claims description 7
- 229910052739 hydrogen Inorganic materials 0.000 claims description 7
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 claims description 7
- 125000004453 alkoxycarbonyl group Chemical group 0.000 claims description 6
- 125000001495 ethyl group Chemical group [H]C([H])([H])C([H])([H])* 0.000 claims description 6
- 239000001257 hydrogen Substances 0.000 claims description 6
- 125000000040 m-tolyl group Chemical group [H]C1=C([H])C(*)=C([H])C(=C1[H])C([H])([H])[H] 0.000 claims description 5
- 125000003261 o-tolyl group Chemical group [H]C1=C([H])C(*)=C(C([H])=C1[H])C([H])([H])[H] 0.000 claims description 5
- 125000001037 p-tolyl group Chemical group [H]C1=C([H])C(=C([H])C([H])=C1*)C([H])([H])[H] 0.000 claims description 5
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 claims description 4
- 125000002777 acetyl group Chemical group [H]C([H])([H])C(*)=O 0.000 claims description 4
- 125000005227 alkyl sulfonate group Chemical group 0.000 claims description 4
- 125000005228 aryl sulfonate group Chemical group 0.000 claims description 4
- 150000001558 benzoic acid derivatives Chemical class 0.000 claims description 4
- 229910052799 carbon Inorganic materials 0.000 claims description 4
- 125000004093 cyano group Chemical group *C#N 0.000 claims description 4
- 125000000449 nitro group Chemical group [O-][N+](*)=O 0.000 claims description 4
- 125000002827 triflate group Chemical group FC(S(=O)(=O)O*)(F)F 0.000 claims description 4
- 125000000876 trifluoromethoxy group Chemical group FC(F)(F)O* 0.000 claims description 4
- 239000002253 acid Substances 0.000 claims description 3
- VDPIZIZDKPFXLI-UHFFFAOYSA-N 1-iodo-3,5-bis(trifluoromethyl)benzene Chemical compound FC(F)(F)C1=CC(I)=CC(C(F)(F)F)=C1 VDPIZIZDKPFXLI-UHFFFAOYSA-N 0.000 claims description 2
- 150000002431 hydrogen Chemical class 0.000 claims description 2
- 150000002440 hydroxy compounds Chemical class 0.000 claims description 2
- 150000001721 carbon Chemical group 0.000 claims 2
- 238000006243 chemical reaction Methods 0.000 description 30
- ZMANZCXQSJIPKH-UHFFFAOYSA-N Triethylamine Chemical compound CCN(CC)CC ZMANZCXQSJIPKH-UHFFFAOYSA-N 0.000 description 21
- WYURNTSHIVDZCO-UHFFFAOYSA-N Tetrahydrofuran Chemical compound C1CCOC1 WYURNTSHIVDZCO-UHFFFAOYSA-N 0.000 description 18
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 description 18
- 239000002904 solvent Substances 0.000 description 16
- UHOVQNZJYSORNB-UHFFFAOYSA-N Benzene Chemical compound C1=CC=CC=C1 UHOVQNZJYSORNB-UHFFFAOYSA-N 0.000 description 12
- YLQBMQCUIZJEEH-UHFFFAOYSA-N tetrahydrofuran Natural products C=1C=COC=1 YLQBMQCUIZJEEH-UHFFFAOYSA-N 0.000 description 9
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 8
- IAZDPXIOMUYVGZ-UHFFFAOYSA-N Dimethylsulphoxide Chemical compound CS(C)=O IAZDPXIOMUYVGZ-UHFFFAOYSA-N 0.000 description 8
- ZMXDDKWLCZADIW-UHFFFAOYSA-N N,N-Dimethylformamide Chemical compound CN(C)C=O ZMXDDKWLCZADIW-UHFFFAOYSA-N 0.000 description 8
- JUJWROOIHBZHMG-UHFFFAOYSA-N Pyridine Chemical compound C1=CC=NC=C1 JUJWROOIHBZHMG-UHFFFAOYSA-N 0.000 description 8
- 230000007423 decrease Effects 0.000 description 8
- VLKZOEOYAKHREP-UHFFFAOYSA-N n-Hexane Chemical compound CCCCCC VLKZOEOYAKHREP-UHFFFAOYSA-N 0.000 description 8
- MUJIDPITZJWBSW-UHFFFAOYSA-N palladium(2+) Chemical compound [Pd+2] MUJIDPITZJWBSW-UHFFFAOYSA-N 0.000 description 8
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 7
- ZWEHNKRNPOVVGH-UHFFFAOYSA-N 2-Butanone Chemical compound CCC(C)=O ZWEHNKRNPOVVGH-UHFFFAOYSA-N 0.000 description 6
- CSCPPACGZOOCGX-UHFFFAOYSA-N Acetone Chemical compound CC(C)=O CSCPPACGZOOCGX-UHFFFAOYSA-N 0.000 description 6
- WEVYAHXRMPXWCK-UHFFFAOYSA-N Acetonitrile Chemical compound CC#N WEVYAHXRMPXWCK-UHFFFAOYSA-N 0.000 description 6
- RTZKZFJDLAIYFH-UHFFFAOYSA-N Diethyl ether Chemical compound CCOCC RTZKZFJDLAIYFH-UHFFFAOYSA-N 0.000 description 6
- OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical compound OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 description 6
- SJRJJKPEHAURKC-UHFFFAOYSA-N N-Methylmorpholine Chemical compound CN1CCOCC1 SJRJJKPEHAURKC-UHFFFAOYSA-N 0.000 description 6
- KWYUFKZDYYNOTN-UHFFFAOYSA-M Potassium hydroxide Chemical compound [OH-].[K+] KWYUFKZDYYNOTN-UHFFFAOYSA-M 0.000 description 6
- HEMHJVSKTPXQMS-UHFFFAOYSA-M Sodium hydroxide Chemical compound [OH-].[Na+] HEMHJVSKTPXQMS-UHFFFAOYSA-M 0.000 description 6
- 229910001220 stainless steel Inorganic materials 0.000 description 6
- 239000010935 stainless steel Substances 0.000 description 6
- 150000002941 palladium compounds Chemical class 0.000 description 5
- 125000001424 substituent group Chemical group 0.000 description 5
- QGZKDVFQNNGYKY-UHFFFAOYSA-N Ammonia Chemical compound N QGZKDVFQNNGYKY-UHFFFAOYSA-N 0.000 description 4
- XTHFKEDIFFGKHM-UHFFFAOYSA-N Dimethoxyethane Chemical compound COCCOC XTHFKEDIFFGKHM-UHFFFAOYSA-N 0.000 description 4
- FXHOOIRPVKKKFG-UHFFFAOYSA-N N,N-Dimethylacetamide Chemical compound CN(C)C(C)=O FXHOOIRPVKKKFG-UHFFFAOYSA-N 0.000 description 4
- JLTDJTHDQAWBAV-UHFFFAOYSA-N N,N-dimethylaniline Chemical compound CN(C)C1=CC=CC=C1 JLTDJTHDQAWBAV-UHFFFAOYSA-N 0.000 description 4
- IMNFDUFMRHMDMM-UHFFFAOYSA-N N-Heptane Chemical compound CCCCCCC IMNFDUFMRHMDMM-UHFFFAOYSA-N 0.000 description 4
- OFBQJSOFQDEBGM-UHFFFAOYSA-N Pentane Chemical compound CCCCC OFBQJSOFQDEBGM-UHFFFAOYSA-N 0.000 description 4
- CDBYLPFSWZWCQE-UHFFFAOYSA-L Sodium Carbonate Chemical compound [Na+].[Na+].[O-]C([O-])=O CDBYLPFSWZWCQE-UHFFFAOYSA-L 0.000 description 4
- GGSUCNLOZRCGPQ-UHFFFAOYSA-N diethylaniline Chemical compound CCN(CC)C1=CC=CC=C1 GGSUCNLOZRCGPQ-UHFFFAOYSA-N 0.000 description 4
- 229910052751 metal Inorganic materials 0.000 description 4
- 239000002184 metal Substances 0.000 description 4
- 125000004108 n-butyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 description 4
- 229910052757 nitrogen Inorganic materials 0.000 description 4
- YJVFFLUZDVXJQI-UHFFFAOYSA-L palladium(ii) acetate Chemical compound [Pd+2].CC([O-])=O.CC([O-])=O YJVFFLUZDVXJQI-UHFFFAOYSA-L 0.000 description 4
- BWHMMNNQKKPAPP-UHFFFAOYSA-L potassium carbonate Chemical compound [K+].[K+].[O-]C([O-])=O BWHMMNNQKKPAPP-UHFFFAOYSA-L 0.000 description 4
- 239000000047 product Substances 0.000 description 4
- UMJSCPRVCHMLSP-UHFFFAOYSA-N pyridine Natural products COC1=CC=CN=C1 UMJSCPRVCHMLSP-UHFFFAOYSA-N 0.000 description 4
- 238000003756 stirring Methods 0.000 description 4
- 150000003512 tertiary amines Chemical class 0.000 description 4
- LVEYOSJUKRVCCF-UHFFFAOYSA-N 1,3-bis(diphenylphosphino)propane Chemical compound C=1C=CC=CC=1P(C=1C=CC=CC=1)CCCP(C=1C=CC=CC=1)C1=CC=CC=C1 LVEYOSJUKRVCCF-UHFFFAOYSA-N 0.000 description 3
- UFJRJAOQYVMWEZ-UHFFFAOYSA-N 2,3-bis(trifluoromethyl)benzoic acid Chemical compound OC(=O)C1=CC=CC(C(F)(F)F)=C1C(F)(F)F UFJRJAOQYVMWEZ-UHFFFAOYSA-N 0.000 description 3
- QTBSBXVTEAMEQO-UHFFFAOYSA-N Acetic acid Chemical compound CC(O)=O QTBSBXVTEAMEQO-UHFFFAOYSA-N 0.000 description 3
- KFZMGEQAYNKOFK-UHFFFAOYSA-N Isopropanol Chemical compound CC(C)O KFZMGEQAYNKOFK-UHFFFAOYSA-N 0.000 description 3
- LRHPLDYGYMQRHN-UHFFFAOYSA-N N-Butanol Chemical compound CCCCO LRHPLDYGYMQRHN-UHFFFAOYSA-N 0.000 description 3
- DKGAVHZHDRPRBM-UHFFFAOYSA-N Tert-Butanol Chemical compound CC(C)(C)O DKGAVHZHDRPRBM-UHFFFAOYSA-N 0.000 description 3
- 150000002148 esters Chemical class 0.000 description 3
- 238000010438 heat treatment Methods 0.000 description 3
- 125000001449 isopropyl group Chemical group [H]C([H])([H])C([H])(*)C([H])([H])[H] 0.000 description 3
- 239000000203 mixture Substances 0.000 description 3
- 239000012044 organic layer Substances 0.000 description 3
- 239000002244 precipitate Substances 0.000 description 3
- 238000002360 preparation method Methods 0.000 description 3
- 239000002994 raw material Substances 0.000 description 3
- 239000013558 reference substance Substances 0.000 description 3
- 239000007787 solid Substances 0.000 description 3
- 239000000126 substance Substances 0.000 description 3
- KZPYGQFFRCFCPP-UHFFFAOYSA-N 1,1'-bis(diphenylphosphino)ferrocene Chemical compound [Fe+2].C1=CC=C[C-]1P(C=1C=CC=CC=1)C1=CC=CC=C1.C1=CC=C[C-]1P(C=1C=CC=CC=1)C1=CC=CC=C1 KZPYGQFFRCFCPP-UHFFFAOYSA-N 0.000 description 2
- RYHBNJHYFVUHQT-UHFFFAOYSA-N 1,4-Dioxane Chemical compound C1COCCO1 RYHBNJHYFVUHQT-UHFFFAOYSA-N 0.000 description 2
- KBPLFHHGFOOTCA-UHFFFAOYSA-N 1-Octanol Chemical compound CCCCCCCCO KBPLFHHGFOOTCA-UHFFFAOYSA-N 0.000 description 2
- OSTIALFVJOFNPP-UHFFFAOYSA-N 1-bromo-4-chloro-2-(trifluoromethyl)benzene Chemical compound FC(F)(F)C1=CC(Cl)=CC=C1Br OSTIALFVJOFNPP-UHFFFAOYSA-N 0.000 description 2
- BBMCTIGTTCKYKF-UHFFFAOYSA-N 1-heptanol Chemical compound CCCCCCCO BBMCTIGTTCKYKF-UHFFFAOYSA-N 0.000 description 2
- 238000005160 1H NMR spectroscopy Methods 0.000 description 2
- JJFOBACUIRKUPN-UHFFFAOYSA-N 2-bromoethoxybenzene Chemical compound BrCCOC1=CC=CC=C1 JJFOBACUIRKUPN-UHFFFAOYSA-N 0.000 description 2
- WMPPDTMATNBGJN-UHFFFAOYSA-N 2-phenylethylbromide Chemical compound BrCCC1=CC=CC=C1 WMPPDTMATNBGJN-UHFFFAOYSA-N 0.000 description 2
- BCJVBDBJSMFBRW-UHFFFAOYSA-N 4-diphenylphosphanylbutyl(diphenyl)phosphane Chemical compound C=1C=CC=CC=1P(C=1C=CC=CC=1)CCCCP(C=1C=CC=CC=1)C1=CC=CC=C1 BCJVBDBJSMFBRW-UHFFFAOYSA-N 0.000 description 2
- VHUUQVKOLVNVRT-UHFFFAOYSA-N Ammonium hydroxide Chemical compound [NH4+].[OH-] VHUUQVKOLVNVRT-UHFFFAOYSA-N 0.000 description 2
- NTIZESTWPVYFNL-UHFFFAOYSA-N Methyl isobutyl ketone Chemical compound CC(C)CC(C)=O NTIZESTWPVYFNL-UHFFFAOYSA-N 0.000 description 2
- UIHCLUNTQKBZGK-UHFFFAOYSA-N Methyl isobutyl ketone Natural products CCC(C)C(C)=O UIHCLUNTQKBZGK-UHFFFAOYSA-N 0.000 description 2
- AMQJEAYHLZJPGS-UHFFFAOYSA-N N-Pentanol Chemical compound CCCCCO AMQJEAYHLZJPGS-UHFFFAOYSA-N 0.000 description 2
- CTQNGGLPUBDAKN-UHFFFAOYSA-N O-Xylene Chemical compound CC1=CC=CC=C1C CTQNGGLPUBDAKN-UHFFFAOYSA-N 0.000 description 2
- VMHLLURERBWHNL-UHFFFAOYSA-M Sodium acetate Chemical compound [Na+].CC([O-])=O VMHLLURERBWHNL-UHFFFAOYSA-M 0.000 description 2
- NINIDFKCEFEMDL-UHFFFAOYSA-N Sulfur Chemical compound [S] NINIDFKCEFEMDL-UHFFFAOYSA-N 0.000 description 2
- 150000001242 acetic acid derivatives Chemical class 0.000 description 2
- 239000003905 agrochemical Substances 0.000 description 2
- 150000001338 aliphatic hydrocarbons Chemical class 0.000 description 2
- 150000001408 amides Chemical class 0.000 description 2
- 150000004945 aromatic hydrocarbons Chemical class 0.000 description 2
- 230000015572 biosynthetic process Effects 0.000 description 2
- 125000001246 bromo group Chemical group Br* 0.000 description 2
- QARVLSVVCXYDNA-UHFFFAOYSA-N bromobenzene Chemical compound BrC1=CC=CC=C1 QARVLSVVCXYDNA-UHFFFAOYSA-N 0.000 description 2
- BTANRVKWQNVYAZ-UHFFFAOYSA-N butan-2-ol Chemical compound CCC(C)O BTANRVKWQNVYAZ-UHFFFAOYSA-N 0.000 description 2
- 125000003178 carboxy group Chemical group [H]OC(*)=O 0.000 description 2
- 238000001816 cooling Methods 0.000 description 2
- 239000012043 crude product Substances 0.000 description 2
- 239000013078 crystal Substances 0.000 description 2
- MWKFXSUHUHTGQN-UHFFFAOYSA-N decan-1-ol Chemical compound CCCCCCCCCCO MWKFXSUHUHTGQN-UHFFFAOYSA-N 0.000 description 2
- 238000000354 decomposition reaction Methods 0.000 description 2
- 239000003814 drug Substances 0.000 description 2
- 150000002170 ethers Chemical class 0.000 description 2
- 125000001301 ethoxy group Chemical group [H]C([H])([H])C([H])([H])O* 0.000 description 2
- 125000003754 ethoxycarbonyl group Chemical group C(=O)(OCC)* 0.000 description 2
- 238000001914 filtration Methods 0.000 description 2
- ZSIAUFGUXNUGDI-UHFFFAOYSA-N hexan-1-ol Chemical compound CCCCCCO ZSIAUFGUXNUGDI-UHFFFAOYSA-N 0.000 description 2
- 150000007529 inorganic bases Chemical class 0.000 description 2
- 239000000543 intermediate Substances 0.000 description 2
- PNDPGZBMCMUPRI-UHFFFAOYSA-N iodine Chemical compound II PNDPGZBMCMUPRI-UHFFFAOYSA-N 0.000 description 2
- ZXEKIIBDNHEJCQ-UHFFFAOYSA-N isobutanol Chemical compound CC(C)CO ZXEKIIBDNHEJCQ-UHFFFAOYSA-N 0.000 description 2
- 150000002576 ketones Chemical class 0.000 description 2
- 239000007788 liquid Substances 0.000 description 2
- 239000008204 material by function Substances 0.000 description 2
- 238000002844 melting Methods 0.000 description 2
- 230000008018 melting Effects 0.000 description 2
- VUZPPFZMUPKLLV-UHFFFAOYSA-N methane;hydrate Chemical compound C.O VUZPPFZMUPKLLV-UHFFFAOYSA-N 0.000 description 2
- 125000000956 methoxy group Chemical group [H]C([H])([H])O* 0.000 description 2
- 125000001160 methoxycarbonyl group Chemical group [H]C([H])([H])OC(*)=O 0.000 description 2
- 125000004123 n-propyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])* 0.000 description 2
- 150000002825 nitriles Chemical class 0.000 description 2
- ZWRUINPWMLAQRD-UHFFFAOYSA-N nonan-1-ol Chemical compound CCCCCCCCCO ZWRUINPWMLAQRD-UHFFFAOYSA-N 0.000 description 2
- TVMXDCGIABBOFY-UHFFFAOYSA-N octane Chemical compound CCCCCCCC TVMXDCGIABBOFY-UHFFFAOYSA-N 0.000 description 2
- 238000012805 post-processing Methods 0.000 description 2
- SCVFZCLFOSHCOH-UHFFFAOYSA-M potassium acetate Chemical compound [K+].CC([O-])=O SCVFZCLFOSHCOH-UHFFFAOYSA-M 0.000 description 2
- 229910000027 potassium carbonate Inorganic materials 0.000 description 2
- BDERNNFJNOPAEC-UHFFFAOYSA-N propan-1-ol Chemical compound CCCO BDERNNFJNOPAEC-UHFFFAOYSA-N 0.000 description 2
- 230000036632 reaction speed Effects 0.000 description 2
- 238000011084 recovery Methods 0.000 description 2
- 239000001632 sodium acetate Substances 0.000 description 2
- 235000017281 sodium acetate Nutrition 0.000 description 2
- 229910000029 sodium carbonate Inorganic materials 0.000 description 2
- 239000007858 starting material Substances 0.000 description 2
- 238000000967 suction filtration Methods 0.000 description 2
- HXJUTPCZVOIRIF-UHFFFAOYSA-N sulfolane Chemical compound O=S1(=O)CCCC1 HXJUTPCZVOIRIF-UHFFFAOYSA-N 0.000 description 2
- 229910052717 sulfur Inorganic materials 0.000 description 2
- 239000011593 sulfur Substances 0.000 description 2
- 238000003786 synthesis reaction Methods 0.000 description 2
- VPYJNCGUESNPMV-UHFFFAOYSA-N triallylamine Chemical compound C=CCN(CC=C)CC=C VPYJNCGUESNPMV-UHFFFAOYSA-N 0.000 description 2
- IMFACGCPASFAPR-UHFFFAOYSA-N tributylamine Chemical compound CCCCN(CCCC)CCCC IMFACGCPASFAPR-UHFFFAOYSA-N 0.000 description 2
- TUQOTMZNTHZOKS-UHFFFAOYSA-N tributylphosphine Chemical compound CCCCP(CCCC)CCCC TUQOTMZNTHZOKS-UHFFFAOYSA-N 0.000 description 2
- YFTHZRPMJXBUME-UHFFFAOYSA-N tripropylamine Chemical compound CCCN(CCC)CCC YFTHZRPMJXBUME-UHFFFAOYSA-N 0.000 description 2
- COIOYMYWGDAQPM-UHFFFAOYSA-N tris(2-methylphenyl)phosphane Chemical compound CC1=CC=CC=C1P(C=1C(=CC=CC=1)C)C1=CC=CC=C1C COIOYMYWGDAQPM-UHFFFAOYSA-N 0.000 description 2
- LFNXCUNDYSYVJY-UHFFFAOYSA-N tris(3-methylphenyl)phosphane Chemical compound CC1=CC=CC(P(C=2C=C(C)C=CC=2)C=2C=C(C)C=CC=2)=C1 LFNXCUNDYSYVJY-UHFFFAOYSA-N 0.000 description 2
- WXAZIUYTQHYBFW-UHFFFAOYSA-N tris(4-methylphenyl)phosphane Chemical compound C1=CC(C)=CC=C1P(C=1C=CC(C)=CC=1)C1=CC=C(C)C=C1 WXAZIUYTQHYBFW-UHFFFAOYSA-N 0.000 description 2
- 239000008096 xylene Substances 0.000 description 2
- GETTZEONDQJALK-UHFFFAOYSA-N (trifluoromethyl)benzene Chemical compound FC(F)(F)C1=CC=CC=C1 GETTZEONDQJALK-UHFFFAOYSA-N 0.000 description 1
- QFMZQPDHXULLKC-UHFFFAOYSA-N 1,2-bis(diphenylphosphino)ethane Chemical compound C=1C=CC=CC=1P(C=1C=CC=CC=1)CCP(C=1C=CC=CC=1)C1=CC=CC=C1 QFMZQPDHXULLKC-UHFFFAOYSA-N 0.000 description 1
- OZEVVXUSTAMOBK-UHFFFAOYSA-N 1,2-dibromo-3-(trifluoromethyl)benzene Chemical compound FC(F)(F)C1=CC=CC(Br)=C1Br OZEVVXUSTAMOBK-UHFFFAOYSA-N 0.000 description 1
- OQKLUAYVNVRWJV-UHFFFAOYSA-N 1-(2-bromophenyl)-3,5-bis(trifluoromethyl)benzene Chemical compound FC(F)(F)c1cc(cc(c1)C(F)(F)F)-c1ccccc1Br OQKLUAYVNVRWJV-UHFFFAOYSA-N 0.000 description 1
- SKTRRGURWFCEJD-UHFFFAOYSA-N 1-bromo-2-[2-(trifluoromethyl)phenyl]benzene Chemical compound FC(F)(F)C1=CC=CC=C1C1=CC=CC=C1Br SKTRRGURWFCEJD-UHFFFAOYSA-N 0.000 description 1
- FICFIRHDRNUFNI-UHFFFAOYSA-N 1-bromo-2-[3-(trifluoromethyl)phenyl]benzene Chemical compound FC(F)(F)C1=CC=CC(C=2C(=CC=CC=2)Br)=C1 FICFIRHDRNUFNI-UHFFFAOYSA-N 0.000 description 1
- ISNRIDMBTQIKJT-UHFFFAOYSA-N 1-bromo-2-[4-(trifluoromethyl)phenyl]benzene Chemical compound C1=CC(C(F)(F)F)=CC=C1C1=CC=CC=C1Br ISNRIDMBTQIKJT-UHFFFAOYSA-N 0.000 description 1
- MELPJUZERZSMMI-UHFFFAOYSA-N 1-bromo-2-chloro-3,5-bis(trifluoromethyl)benzene Chemical class FC(F)(F)C1=CC(Br)=C(Cl)C(C(F)(F)F)=C1 MELPJUZERZSMMI-UHFFFAOYSA-N 0.000 description 1
- DWTJMEQXGJMZMM-UHFFFAOYSA-N 1-bromo-2-chloro-3-(trifluoromethyl)benzene Chemical compound FC(F)(F)C1=CC=CC(Br)=C1Cl DWTJMEQXGJMZMM-UHFFFAOYSA-N 0.000 description 1
- RVTIHGGJJMXISV-UHFFFAOYSA-N 1-bromo-2-chloro-4-(trifluoromethyl)benzene Chemical compound FC(F)(F)C1=CC=C(Br)C(Cl)=C1 RVTIHGGJJMXISV-UHFFFAOYSA-N 0.000 description 1
- QBELEDRHMPMKHP-UHFFFAOYSA-N 1-bromo-2-chlorobenzene Chemical compound ClC1=CC=CC=C1Br QBELEDRHMPMKHP-UHFFFAOYSA-N 0.000 description 1
- VPXCYIIXCVJZKZ-UHFFFAOYSA-N 1-bromo-2-fluoro-3-(trifluoromethyl)benzene Chemical compound FC1=C(Br)C=CC=C1C(F)(F)F VPXCYIIXCVJZKZ-UHFFFAOYSA-N 0.000 description 1
- QSSXJPIWXQTSIX-UHFFFAOYSA-N 1-bromo-2-methylbenzene Chemical compound CC1=CC=CC=C1Br QSSXJPIWXQTSIX-UHFFFAOYSA-N 0.000 description 1
- KTADSLDAUJLZGL-UHFFFAOYSA-N 1-bromo-2-phenylbenzene Chemical compound BrC1=CC=CC=C1C1=CC=CC=C1 KTADSLDAUJLZGL-UHFFFAOYSA-N 0.000 description 1
- LECYCYNAEJDSIL-UHFFFAOYSA-N 1-bromo-2-propan-2-ylbenzene Chemical compound CC(C)C1=CC=CC=C1Br LECYCYNAEJDSIL-UHFFFAOYSA-N 0.000 description 1
- NNMBNYHMJRJUBC-UHFFFAOYSA-N 1-bromo-3-(trifluoromethyl)benzene Chemical compound FC(F)(F)C1=CC=CC(Br)=C1 NNMBNYHMJRJUBC-UHFFFAOYSA-N 0.000 description 1
- JRGGUPZKKTVKOV-UHFFFAOYSA-N 1-bromo-3-chlorobenzene Chemical compound ClC1=CC=CC(Br)=C1 JRGGUPZKKTVKOV-UHFFFAOYSA-N 0.000 description 1
- LIGBGEJPUQBLTG-UHFFFAOYSA-N 1-bromo-3-fluoro-5-(trifluoromethyl)benzene Chemical compound FC1=CC(Br)=CC(C(F)(F)F)=C1 LIGBGEJPUQBLTG-UHFFFAOYSA-N 0.000 description 1
- WJIFKOVZNJTSGO-UHFFFAOYSA-N 1-bromo-3-methylbenzene Chemical compound CC1=CC=CC(Br)=C1 WJIFKOVZNJTSGO-UHFFFAOYSA-N 0.000 description 1
- GBSGGFCCQZUXNB-UHFFFAOYSA-N 1-bromo-3-propan-2-ylbenzene Chemical compound CC(C)C1=CC=CC(Br)=C1 GBSGGFCCQZUXNB-UHFFFAOYSA-N 0.000 description 1
- JYWJZIQSPRFCDB-UHFFFAOYSA-N 1-bromo-3-propan-2-yloxybenzene Chemical compound CC(C)OC1=CC=CC(Br)=C1 JYWJZIQSPRFCDB-UHFFFAOYSA-N 0.000 description 1
- NHDODQWIKUYWMW-UHFFFAOYSA-N 1-bromo-4-chlorobenzene Chemical compound ClC1=CC=C(Br)C=C1 NHDODQWIKUYWMW-UHFFFAOYSA-N 0.000 description 1
- WVUYYXUATWMVIT-UHFFFAOYSA-N 1-bromo-4-ethoxybenzene Chemical compound CCOC1=CC=C(Br)C=C1 WVUYYXUATWMVIT-UHFFFAOYSA-N 0.000 description 1
- URFPRAHGGBYNPW-UHFFFAOYSA-N 1-bromo-4-ethylbenzene Chemical compound CCC1=CC=C(Br)C=C1 URFPRAHGGBYNPW-UHFFFAOYSA-N 0.000 description 1
- AIDVAZGOACECLJ-UHFFFAOYSA-N 1-bromo-4-fluoro-2-(trifluoromethyl)benzene Chemical compound FC1=CC=C(Br)C(C(F)(F)F)=C1 AIDVAZGOACECLJ-UHFFFAOYSA-N 0.000 description 1
- ZBTMRBYMKUEVEU-UHFFFAOYSA-N 1-bromo-4-methylbenzene Chemical compound CC1=CC=C(Br)C=C1 ZBTMRBYMKUEVEU-UHFFFAOYSA-N 0.000 description 1
- MOZHUOIQYVYEPN-UHFFFAOYSA-N 1-bromo-4-propan-2-ylbenzene Chemical compound CC(C)C1=CC=C(Br)C=C1 MOZHUOIQYVYEPN-UHFFFAOYSA-N 0.000 description 1
- MPAOOLLBWUEXOM-UHFFFAOYSA-N 1-bromo-4-propan-2-yloxybenzene Chemical compound CC(C)OC1=CC=C(Br)C=C1 MPAOOLLBWUEXOM-UHFFFAOYSA-N 0.000 description 1
- FBRJYBGLCHWYOE-UHFFFAOYSA-N 2-(trifluoromethyl)benzoic acid Chemical class OC(=O)C1=CC=CC=C1C(F)(F)F FBRJYBGLCHWYOE-UHFFFAOYSA-N 0.000 description 1
- GMUWNTUONIQRFP-UHFFFAOYSA-N 2-bromo-1-chloro-3-(trifluoromethyl)benzene Chemical compound FC(F)(F)C1=CC=CC(Cl)=C1Br GMUWNTUONIQRFP-UHFFFAOYSA-N 0.000 description 1
- APSISOSWYXCEQX-UHFFFAOYSA-N 2-bromo-1-chloro-4-(trifluoromethyl)benzene Chemical compound FC(F)(F)C1=CC=C(Cl)C(Br)=C1 APSISOSWYXCEQX-UHFFFAOYSA-N 0.000 description 1
- UERAGXKMOXUWPC-UHFFFAOYSA-N 2-bromo-1-fluoro-3-(trifluoromethyl)benzene Chemical compound FC1=CC=CC(C(F)(F)F)=C1Br UERAGXKMOXUWPC-UHFFFAOYSA-N 0.000 description 1
- OVAPNNLCWKZQOY-UHFFFAOYSA-N 2-chloro-3,5-bis(trifluoromethyl)benzoic acid Chemical compound OC(=O)C1=CC(C(F)(F)F)=CC(C(F)(F)F)=C1Cl OVAPNNLCWKZQOY-UHFFFAOYSA-N 0.000 description 1
- HVFQJWGYVXKLTE-UHFFFAOYSA-M 3,5-bis(trifluoromethyl)benzoate Chemical compound [O-]C(=O)C1=CC(C(F)(F)F)=CC(C(F)(F)F)=C1 HVFQJWGYVXKLTE-UHFFFAOYSA-M 0.000 description 1
- FWXAUDSWDBGCMN-UHFFFAOYSA-N 3-diphenylphosphanylbutan-2-yl(diphenyl)phosphane Chemical compound C=1C=CC=CC=1P(C=1C=CC=CC=1)C(C)C(C)P(C=1C=CC=CC=1)C1=CC=CC=C1 FWXAUDSWDBGCMN-UHFFFAOYSA-N 0.000 description 1
- FQXQBFUUVCDIRK-UHFFFAOYSA-N 3-trifluoromethylbenzoic acid Chemical compound OC(=O)C1=CC=CC(C(F)(F)F)=C1 FQXQBFUUVCDIRK-UHFFFAOYSA-N 0.000 description 1
- XGOCKBMEZPNDPJ-UHFFFAOYSA-N 4-bromo-1-chloro-2-(trifluoromethyl)benzene Chemical compound FC(F)(F)C1=CC(Br)=CC=C1Cl XGOCKBMEZPNDPJ-UHFFFAOYSA-N 0.000 description 1
- AJLIJYGWAXPEOK-UHFFFAOYSA-N 4-bromo-1-fluoro-2-(trifluoromethyl)benzene Chemical compound FC1=CC=C(Br)C=C1C(F)(F)F AJLIJYGWAXPEOK-UHFFFAOYSA-N 0.000 description 1
- QJPJQTDYNZXKQF-UHFFFAOYSA-N 4-bromoanisole Chemical compound COC1=CC=C(Br)C=C1 QJPJQTDYNZXKQF-UHFFFAOYSA-N 0.000 description 1
- QBLISOIWPZSVIK-UHFFFAOYSA-N 4-bromobutoxybenzene Chemical compound BrCCCCOC1=CC=CC=C1 QBLISOIWPZSVIK-UHFFFAOYSA-N 0.000 description 1
- XPBQQAHIVODAIC-UHFFFAOYSA-N 4-bromobutylbenzene Chemical compound BrCCCCC1=CC=CC=C1 XPBQQAHIVODAIC-UHFFFAOYSA-N 0.000 description 1
- 125000004199 4-trifluoromethylphenyl group Chemical group [H]C1=C([H])C(=C([H])C([H])=C1*)C(F)(F)F 0.000 description 1
- ZRMJJOYUPRUART-UHFFFAOYSA-N C1=CC=C(C(=C1)C2=C(C=CC(=C2)C(F)(F)F)C(F)(F)F)Br Chemical compound C1=CC=C(C(=C1)C2=C(C=CC(=C2)C(F)(F)F)C(F)(F)F)Br ZRMJJOYUPRUART-UHFFFAOYSA-N 0.000 description 1
- 239000004215 Carbon black (E152) Substances 0.000 description 1
- VEXZGXHMUGYJMC-UHFFFAOYSA-M Chloride anion Chemical compound [Cl-] VEXZGXHMUGYJMC-UHFFFAOYSA-M 0.000 description 1
- NZBKKVFNPXHCQG-UHFFFAOYSA-N FC(C1=C(C=CC(=C1)C(F)(F)F)C1=C(C=CC=C1)Br)(F)F Chemical compound FC(C1=C(C=CC(=C1)C(F)(F)F)C1=C(C=CC=C1)Br)(F)F NZBKKVFNPXHCQG-UHFFFAOYSA-N 0.000 description 1
- QHECRCQQHOQWDP-UHFFFAOYSA-N FC(C1=C(C=CC=C1C(F)(F)F)C1=C(C=CC=C1)Br)(F)F Chemical compound FC(C1=C(C=CC=C1C(F)(F)F)C1=C(C=CC=C1)Br)(F)F QHECRCQQHOQWDP-UHFFFAOYSA-N 0.000 description 1
- VJCPBCAKBMWACG-UHFFFAOYSA-N FC(C=1C=C(C=CC1C(F)(F)F)C1=C(C=CC=C1)Br)(F)F Chemical compound FC(C=1C=C(C=CC1C(F)(F)F)C1=C(C=CC=C1)Br)(F)F VJCPBCAKBMWACG-UHFFFAOYSA-N 0.000 description 1
- 238000003747 Grignard reaction Methods 0.000 description 1
- CSNNHWWHGAXBCP-UHFFFAOYSA-L Magnesium sulfate Chemical compound [Mg+2].[O-][S+2]([O-])([O-])[O-] CSNNHWWHGAXBCP-UHFFFAOYSA-L 0.000 description 1
- 238000005481 NMR spectroscopy Methods 0.000 description 1
- ZLMJMSJWJFRBEC-UHFFFAOYSA-N Potassium Chemical compound [K] ZLMJMSJWJFRBEC-UHFFFAOYSA-N 0.000 description 1
- FAPWRFPIFSIZLT-UHFFFAOYSA-M Sodium chloride Chemical class [Na+].[Cl-] FAPWRFPIFSIZLT-UHFFFAOYSA-M 0.000 description 1
- WLYPBMBWKYALCG-UHFFFAOYSA-N [2,4-bis(trifluoromethyl)phenyl]boronic acid Chemical group OB(O)C1=CC=C(C(F)(F)F)C=C1C(F)(F)F WLYPBMBWKYALCG-UHFFFAOYSA-N 0.000 description 1
- 150000001298 alcohols Chemical class 0.000 description 1
- 125000002947 alkylene group Chemical group 0.000 description 1
- 229910021529 ammonia Inorganic materials 0.000 description 1
- 244000309464 bull Species 0.000 description 1
- 239000006227 byproduct Substances 0.000 description 1
- 125000002837 carbocyclic group Chemical group 0.000 description 1
- 150000001732 carboxylic acid derivatives Chemical class 0.000 description 1
- 125000001309 chloro group Chemical group Cl* 0.000 description 1
- 238000005695 dehalogenation reaction Methods 0.000 description 1
- 238000004821 distillation Methods 0.000 description 1
- 238000001035 drying Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 238000000605 extraction Methods 0.000 description 1
- 239000000706 filtrate Substances 0.000 description 1
- 239000007789 gas Substances 0.000 description 1
- 150000004820 halides Chemical class 0.000 description 1
- 125000005843 halogen group Chemical group 0.000 description 1
- 125000000623 heterocyclic group Chemical group 0.000 description 1
- 229930195733 hydrocarbon Natural products 0.000 description 1
- 150000002430 hydrocarbons Chemical class 0.000 description 1
- 239000004615 ingredient Substances 0.000 description 1
- 229940035429 isobutyl alcohol Drugs 0.000 description 1
- 125000000959 isobutyl group Chemical group [H]C([H])([H])C([H])(C([H])([H])[H])C([H])([H])* 0.000 description 1
- 238000002955 isolation Methods 0.000 description 1
- 229960004592 isopropanol Drugs 0.000 description 1
- UJNZOIKQAUQOCN-UHFFFAOYSA-N methyl(diphenyl)phosphane Chemical compound C=1C=CC=CC=1P(C)C1=CC=CC=C1 UJNZOIKQAUQOCN-UHFFFAOYSA-N 0.000 description 1
- 125000003136 n-heptyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 description 1
- 125000001280 n-hexyl group Chemical group C(CCCCC)* 0.000 description 1
- 125000000740 n-pentyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 description 1
- 125000003506 n-propoxy group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])O* 0.000 description 1
- 125000001624 naphthyl group Chemical group 0.000 description 1
- 229910000510 noble metal Inorganic materials 0.000 description 1
- 125000000962 organic group Chemical group 0.000 description 1
- 239000003960 organic solvent Substances 0.000 description 1
- BSCHIACBONPEOB-UHFFFAOYSA-N oxolane;hydrate Chemical compound O.C1CCOC1 BSCHIACBONPEOB-UHFFFAOYSA-N 0.000 description 1
- PIBWKRNGBLPSSY-UHFFFAOYSA-L palladium(II) chloride Chemical compound Cl[Pd]Cl PIBWKRNGBLPSSY-UHFFFAOYSA-L 0.000 description 1
- INIOZDBICVTGEO-UHFFFAOYSA-L palladium(ii) bromide Chemical compound Br[Pd]Br INIOZDBICVTGEO-UHFFFAOYSA-L 0.000 description 1
- QJPQVXSHYBGQGM-UHFFFAOYSA-N palladium;triphenylphosphane Chemical compound [Pd].C1=CC=CC=C1P(C=1C=CC=CC=1)C1=CC=CC=C1.C1=CC=CC=C1P(C=1C=CC=CC=1)C1=CC=CC=C1 QJPQVXSHYBGQGM-UHFFFAOYSA-N 0.000 description 1
- 239000011591 potassium Substances 0.000 description 1
- 229910052700 potassium Inorganic materials 0.000 description 1
- 235000011056 potassium acetate Nutrition 0.000 description 1
- 238000001556 precipitation Methods 0.000 description 1
- 125000004076 pyridyl group Chemical group 0.000 description 1
- 125000005493 quinolyl group Chemical group 0.000 description 1
- 239000000376 reactant Substances 0.000 description 1
- 238000001953 recrystallisation Methods 0.000 description 1
- 125000002914 sec-butyl group Chemical group [H]C([H])([H])C([H])([H])C([H])(*)C([H])([H])[H] 0.000 description 1
- 238000007086 side reaction Methods 0.000 description 1
- 238000003860 storage Methods 0.000 description 1
- QAOWNCQODCNURD-UHFFFAOYSA-N sulfuric acid Substances OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 description 1
- 125000000999 tert-butyl group Chemical group [H]C([H])([H])C(*)(C([H])([H])[H])C([H])([H])[H] 0.000 description 1
- 125000003944 tolyl group Chemical group 0.000 description 1
Classifications
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02P—CLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
- Y02P20/00—Technologies relating to chemical industry
- Y02P20/50—Improvements relating to the production of bulk chemicals
- Y02P20/52—Improvements relating to the production of bulk chemicals using catalysts, e.g. selective catalysts
Landscapes
- Catalysts (AREA)
- Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
- Low-Molecular Organic Synthesis Reactions Using Catalysts (AREA)
Description
本発明は、医薬品、農薬、各種機能材料などの製造中間体として有用な安息香酸または安息香酸エステル類の製造法に関する。
【0001】
【従来技術】
芳香族ハロゲン化物に一酸化炭素を挿入する反応により安息香酸誘導体が得られることは従来から知られている。
【0002】
特開昭64−47号公報には、環上に塩素原子を有する有機塩化物をパラジウム化合物及びホスフィン化合物を触媒とし、塩基の存在下、一酸化炭素と150℃〜300℃の反応温度で反応させてカルボン酸の得られることが開示され、ホスフィン化合物としてビス(ジフェニルフォスフィノ)ブタンが例示されている。
【0003】
ビス(トリフルオロメチル)安息香酸類を製造する方法としては、3,5−ビス(トリフルオロメチル)ブロモベンゼンを出発原料とし、グリニャール反応により、3,5−ビス(トリフルオロメチル)安息香酸を製造する方法が知られている[Bull.Soc.Chim.France.,(1962),587−93]。
【0004】
また、特開平9−67297号公報には、3,5−ビス(トリフルオロメチル)ブロモベンゼンと一酸化炭素と水またはメタノールとを、酢酸パラジウムとトリフェニルホスフィンからなる触媒およびトリエチルアミンの存在下、反応させて3,5−ビス(トリフルオロメチル)安息香酸類およびそのエステル類の得られることが記載されている。
【0005】
【発明が解決しようとする課題】
特開平9−67297号公報の方法によると選択率、収率共に比較的良好な結果が得られるが反応途中でパラジウム触媒が触媒不活性なパラジウム黒として析出し実質的な触媒濃度が低下するため比較的多量のパラジウム化合物を使用する必要があった。また、ベンゼン環上にトリフルオロメチル基を有する場合、副反応として脱ハロゲン化反応が進行し、目的とする安息香酸の収率を低下させ、またそれによる副生成物が生成物の精製を困難にしていた。
【0006】
【課題を解決するための手段】
本発明者らは、かかる問題点に鑑み、ビス(トリフルオロメチル)安息香酸類を工業的に容易に、かつ、大量に製造することができる方法について、鋭意検討を行った結果、ハロゲノ−ビス(トリフルオロメチル)ベンゼンと、一酸化炭素および水またはアルコール類とを塩基の存在下反応させることによりビス(トリフルオロメチル)安息香酸類を製造する際に、触媒として特定の触媒を使用することで収率と選択率が顕著に向上し、また、他の貴金属触媒を用いた場合に起こりやすい金属の析出を著しく減らすことができることを見出し、本発明に到達した。
【0007】
すなわち、本発明は、一般式(1)
Ar−X (1)
(式中、Arはアリール基、Xはハロゲン(フッ素、塩素、臭素またはヨウ素)、トリフルオロメタンスルホネート基、炭素数1〜4のアルキルスルホネート基、置換または非置換アリールスルホネート基を表す)で表される芳香族化合物を触媒と塩基の存在下一酸化炭素と一般式(2)
R1OH (2)
(式中、R1は水素、アリール基または炭素数1〜10のアルキル基を表す)で表されるヒドロキシ化合物を反応させることからなる一般式(3)
【0008】
【化5】
(式中、Ar、R1は前記に同じ)で表される安息香酸誘導体を製造する方法であって、触媒として一般式(4)、
【0009】
【化6】
(式中、Ar1、Ar2はそれぞれ独立にアリール基を表し、Lはそれぞれ独立にホスフィン配位子を表す。)で表されるパラジウム錯化合物を用いる安息香酸誘導体の製造方法である。
【0010】
以下、本発明を詳細に説明する。
【0011】
本発明に使用する一般式(1)で表される芳香族化合物は、Xで表される基以外の部分が本発明の方法において不活性なものであればよく、置換基を有することもある芳香族基にハロゲン、トリフルオロメタンスルホネート基、炭素数1〜4のアルキルスルホネート基、置換または非置換アリールスルホネート基が結合した化合物である。原料の入手が容易なハロゲン化物の方が実用上は好ましい。ハロゲンはフッ素、塩素、臭素またはヨウ素であり、臭素またはヨウ素がより好ましい。
【0012】
芳香族基としては、フェニル基、ナフチル基などの炭素環式基、ピリジル基、キノリル基などの複素環式基であってもよく、置換基を有することもあるが、Ar(アリール基)としては一般式(5)
【0013】
【化7】
(式中、R2はそれぞれ独立にトリフルオロメチル基、トリフルオロメチルオキシ基、ハロゲン(フッ素、塩素、臭素またはヨウ素)を表す)、ニトロ基、アセチル基、シアノ基、炭素数1〜4のアルキル基、炭素数1〜4のアルコキシ基、炭素数2〜5のアルコキシカルボニル基を表し、nは0または1〜5の整数を表す。)で表されるアリール基であるのが好ましい。炭素数1〜4のアルキル基としては、例えば、メチル基、エチル基、n−プロピル基、i−プロピル基、n−ブチル基、炭素数1〜4のアルコキシ基としては、例えば、メトキシ基、エトキシ基、n−プロポキシ基、i−プロポキシ基、炭素数2〜5のアルコキシカルボニル基としては、例えば、メトキシカルボニル基、エトキシカルボニル基、n−プロポキシカルボニル基、i−プロポキシカルボニル基を挙げることができる。
【0014】
一般式(1)で表される芳香族化合物としては、Rとして上に例示したアルキル基、アルコキシ基、ハロゲン(Xとは異なる)、またはトリフルオロメチル基を有し、Xとして臭素またはヨウ素原子を有するものがより好ましい。アルキル基を有するものとしては具体的には、2−、3−または4−ブロモトルエン、2−、3−または4−ブロモエチルベンゼン、2−、3−または4−ブロモ−イソプロピルベンゼンなど、2−、3−または4−ブロモn−ブチルベンゼンなどが例示でき、2−、3−または4−ブロモメトキシベンゼン、2−、3−または4−ブロモエトキシベンゼン、2−、3−または4−ブロモn−プロポキシベンゼン、2−、3−または4−ブロモイソプロポキシベンゼン、2−、3−または4−ブロモn−ブトキシベンゼンなど、2−、3−または4−ブロモクロロベンゼンなどまたはこれらの臭素がヨウ素に置換した化合物が例示できるがこれらに限られない。
【0015】
さらに、一般式(1)で表される芳香族化合物としては、ハロゲノ−(トリフルオロメチル)ベンゼン、ハロゲノ−ビス(トリフルオロメチル)ベンゼン、あるいはこれらの化合物のベンゼン環上水素がハロゲン原子で置換した化合物は好ましい。
【0016】
具体的には、トリフルオロメチル基を1個有する、2−トリフルオロメチルフェニルブロモベンゼン、3−トリフルオロメチルフェニルブロモベンゼン、4−トリフルオロメチルフェニルブロモベンゼン、トリフルオロメチル基を2個有する、2,3−ビス(トリフルオロメチル)フェニルブロモベンゼン、2,4−ビス(トリフルオロメチル)フェニルブロモベンゼン、2,5−ビス(トリフルオロメチル)フェニルブロモベンゼン、2,6−ビス(トリフルオロメチル)フェニルブロモベンゼン、3,4−ビス(トリフルオロメチル)フェニルブロモベンゼン、3,5−ビス(トリフルオロメチル)フェニルブロモベンゼンまたはこれらの臭素がヨウ素に置換した化合物が例示できるがこれらに限られない。
【0017】
さらに、X以外にハロゲンを有する芳香族化合物としては、2−クロロ−3−(トリフルオロメチル)ブロモベンゼン、2−フルオロ−3−(トリフルオロメチル)ブロモベンゼン、2−フルオロ−4−(トリフルオロメチル)ブロモベンゼン、3−フルオロ−5−(トリフルオロメチル)ブロモベンゼン、2−ブロモ−6−(トリフルオロメチル)ブロモベンゼン、4−クロロ−2−(トリフルオロメチル)ブロモベンゼン、4−フルオロ−2−(トリフルオロメチル)ブロモベンゼン、2−クロロ−6−(トリフルオロメチル)ブロモベンゼン、4−フルオロ−3−(トリフルオロメチル)ブロモベンゼン、1−クロロ−4−(トリフルオロメチル)ブロモベンゼン、2−フルオロ−6−(トリフルオロメチル)ブロモベンゼン、2−フルオロ−5−(トリフルオロメチル)ブロモベンゼン、2−クロロ−4−(トリフルオロメチル)ブロモベンゼン、4−クロロ−3−(トリフルオロメチル)ブロモベンゼン、4−クロロ−2−(トリフルオロメチル)ブロモベンゼンなどまたはこれらの臭素がヨウ素に置換した化合物が例示できるがこれらに限られない。
【0018】
これらのうち、生成物の有用性の顕著なことから3,5−ビス(トリフルオロメチル)ブロモベンゼンまたは3,5−ビス(トリフルオロメチル)ヨードベンゼン、あるいはこれらのベンゼン核の水素がハロゲンで置換した2−クロロ−3,5−ビス(トリフルオロメチル)ブロモベンゼンなどがさらに好ましい。この場合、前2者を出発原料として用いると3,5−ビス(トリフルオロメチル)安息香酸またはそのエステルが得られ、後者からは2−クロロ−3,5−ビス(トリフルオロメチル)安息香酸またはそのエステルが得られる。
【0019】
一般式(1)で表される芳香族化合物に本発明の方法を適用すると、一般に芳香環に結合したハロゲンまたはトリフルオロメタンスルホネート基、炭素数1〜4のアルキルスルホネート基、置換または非置換アリールスルホネート基などのみがカルボキシル基に変換し、Rで表される置換基は変化しない生成物が得られる。複数の異なるハロゲンを芳香環に有する化合物では、一般にヨウ素、臭素、塩素、フッ素の順に優先的に反応するが、置換基の環上での位置および種類により異なることもある。
【0020】
一般式(2)
R1OH (2)
(式中、R1は水素または炭素数1〜10のアルキル基を表す)で表されるヒドロキシ化合物は、炭素数1〜10の直鎖または分岐鎖を有するアルキル基、具体的には、例えば、メチル基、エチル基、n−プロピル基、iso−プロピル基、n−ブチル基、iso−ブチル基、sec−ブチル基、tert−ブチル基、n−ペンチル基、n−ヘキシル基、n−ヘプチル基、n−オクチル基、n−ノニル基、n−デシル基などを有するアルコール類や水を挙げることができる。したがって、本発明における一般式(2)で表されるヒドロキシ化合物を具体的に示すと、例えば、水、メタノール、エタノール、n−プロピルアルコール、iso−プロピルアルコール、n−ブチルアルコール、iso−ブチルアルコール、sec−ブチルアルコール、tert−ブチルアルコール、n−ペンチルアルコール、n−ヘキシルアルコール、n−ヘプチルアルコール、n−オクチルアルコール、n−ノニルアルコール、n−デシルアルコールなどを挙げることができる。
【0021】
本発明における水またはアルコール類の使用量は、一般式(1)で示される芳香族化合物1モルに対して1モル以上であればよいが、一般式(1)で示される芳香族化合物をより転化率よく反応させるため、および、溶媒として機能させるために、やや過剰に添加するのが好ましい。
【0022】
本発明における塩基としては、トリエチルアミン、トリプロピルアミン、トリブチルアミン、トリアリルアミン、N,N−ジメチルアニリン、N,N−ジエチルアニリン、ピリジン、N−メチルモルホリンなどの第三アミン類、酢酸ナトリウム、酢酸カリウムなどの酢酸塩、あるいは、水酸化ナトリウム、水酸化カリウム、炭酸ナトリウム、炭酸カリウムなどの無機塩基などを挙げることができる。
【0023】
また、本発明における塩基の使用量は、通常、一般式(1)で示される芳香族化合物1モルに対して1.0〜10.0モル、好ましくは1.0〜5.0モル、さらに好ましくは1.0〜3.0モル使用するのがよい。1.0モルより少ない場合には、反応が充分に進行せず、収率低下の原因となり、経済的に不利となり、また、未反応の一般式(1)で示される芳香族化合物の除去あるいは回収のために後処理工程に負荷がかかるため、好ましくない。また、10.0モルより多く使用しても、目的とする安息香酸エステル類の収量にほとんど変化はなく、過剰に添加した塩基が、未反応のまま、多量に残るだけであり、経済的に不利となり、また、未反応の塩基の除去のために後処理工程に負荷がかかるため、好ましくない。
【0024】
本発明の触媒は、一般式(4)
【0025】
【化8】
(式中、Ar1、Ar2はそれぞれ独立にアリール基を表し、Lはホスフィン配位子を表す。)で表されるパラジウム錯化合物である。
【0026】
一般式(4)のAr1またはAr2で表されるアリール基はそれぞれ独立に一般式(5)
【0027】
【化9】
(式中、R2はそれぞれ独立にトリフルオロメチル基、トリフルオロメチルオキシ基、ハロゲン(フッ素、塩素、臭素またはヨウ素)を表す)、ニトロ基、アセチル基、シアノ基、炭素数1〜4のアルキル基、炭素数1〜4のアルコキシ基、炭素数2〜5のアルコキシカルボニル基を表し、nは0または1〜5の整数を表す。)で表されるアリール基である。
【0028】
炭素数1〜4のアルキル基としては、例えば、メチル基、エチル基、n−プロピル基、i−プロピル基)、炭素数1〜4のアルコキシ基としては、例えば、メトキシ基、エトキシ基、n−プロポキシ基、i−プロポキシ基、炭素数2〜5のアルコキシカルボニル基としては、例えば、メトキシカルボニル基、エトキシカルボニル基、n−プロポキシカルボニル基、i−プロポキシカルボニル基を挙げることができる。
【0029】
一般式(4)で表されるパラジウム錯化合物において一般式(5)で表されるアリール基としては、Ar1、Ar2共にフェニル基、o−、m−、p−トリル基などの炭化水素系のアルキル基を有するフェニル基を始め、トリフルオロメチル基を1個有する、2−トリフルオロメチルフェニル基、3−トリフルオロメチルフェニル基、4−トリフルオロメチルフェニル基、トリフルオロメチル基を2個有する、2,3−ビス(トリフルオロメチル)フェニル基、2,4−ビス(トリフルオロメチル)フェニル基、2,5−ビス(トリフルオロメチル)フェニル基、2,6−ビス(トリフルオロメチル)フェニル基、3,4−ビス(トリフルオロメチル)フェニル基、3,5−ビス(トリフルオロメチル)フェニル基などが好ましい基として挙げられる。
【0030】
さらに、これらのうち、一般式(4)で表される錯化合物のAr1で表されるアリール基がビス(トリフルオロメチル)フェニル基であるのものが好ましく、一方、Ar2で表されるアリール基がフェニル基、トリフルオロメチルフェニル基またはビス(トリフルオロメチル)フェニル基であるものが好ましく、3−トリフルオロメチルフェニル基または3,5−ビス(トリフルオロメチル)フェニル基であるのがより好ましい。
【0031】
一般式(4)で表されるパラジウム錯化合物においてLで表されるホスフィン配位子は、特に限定されないが、一般式(6)、
P(R3)3 (6)
(R3はそれぞれ独立に置換基を有することもあるフェニル基(アリール基)、炭素数1〜6のアルキル基を表す。)で表されるホスフィン配位子である。ここで、R3はそれぞれ独立にフェニル基、o−トリル基、m−トリル基、p−トリル基、メチル基、エチル基、n−ブチル基などから選ばれた基であることが好ましい。また、Lで表されるホスフィン配位子は、トリフェニルホスフィン、トリ−o−トリルホスフィン、トリ−m−トリルホスフィン、トリ−p−トリルホスフィンまたはトリ−n−ブチルホスフィンなどが好ましく、トリフェニルホスフィンは特に好ましい。
【0032】
本発明に使用するのに好適な一般式(4)で表されるパラジウム化合物としては、
【0033】
【化10】
(Tolはo−、m−またはp−トリル基を表す)などが例示できる。
【0034】
本発明に使用するパラジウム錯化合物は結晶性であり、多くの有機溶媒に溶解し、安定である。また、室温において空気中で安定である。このような物理的、化学的性質を有するために単離操作が容易であるので高純度の物質が得られやすく、保存も容易であるので工業的な使用においても取り扱い易いという特徴がある。
【0035】
本発明のに使用するパラジウム錯化合物の製造方法は特に限定されないが、文献(J. Am. Chem. Soc., Vol.117, No.15, 4305(1995))に記載された方法や以下に例示的に示す方法を採用できる。密閉できる容器に一般式(7)
Ar−COOH (7)
(式中、Arは前記に同じ)で表される安息香酸と一般式(1)
Ar−X (1)
(式中、Arは前記に同じ、但し、一般式(7)のArと同時に同じである必要はない)で表される芳香族化合物、溶媒、パラジウム化合物、ホスフィン配位子となるホスフィン、塩基性物質を仕込む。溶媒としては、融点が低い場合には一般式(1)で表される芳香族化合物が使える他、例えば、ペンタン、ヘキサン、ヘプタン、オクタンなどの脂肪族炭化水素類、ベンゼン、トルエン、キシレンなどの芳香族炭化水素類、ジエチルエーテル、ジオキサン、テトラヒドロフラン(THF)、エチレングリコールジメチルエーテルなどのエーテル類、アセトン、メチルエチルケトン、メチルイソブチルケトンなどのケトン類、アセトニトリルなどのニトリル類、ピリジンなどの第三アミン類、N,N−ジメチルホルムアミド(DMF)、N,N−ジメチルアセトアミド(DMAc)などの酸アミド類、ジメチルスルホキシド(DMSO)、スルホランなどの含硫黄化合物、水などを使うことができる。
【0036】
塩基性物質としては、アンモニア、トリエチルアミン、トリプロピルアミン、トリブチルアミン、トリアリルアミン、N,N−ジメチルアニリン、N,N−ジエチルアニリン、ピリジン、N−メチルモルホリンなどの第三アミン類、酢酸ナトリウム、酢酸カリウムなどの酢酸塩、あるいは、水酸化ナトリウム、水酸化カリウム、炭酸ナトリウム、炭酸カリウムなどの無機塩基などを挙げることができる。
【0037】
パラジウム化合物としては、酢酸パラジウム、塩化パラジウム、臭化パラジウムなどが好適である。
【0038】
原料各物質の使用比率は特に限定されないが、パラジウムを有効に利用するために、一般式(1)で表される芳香族化合物と一般式(7)で表される安息香酸はそれぞれ1当量以上用い、ホスフィンは2当量以上使用するのが好ましい。他の溶媒等は適宜の量を使用すればよい。
【0039】
容器は加圧してもしなくてもよく、攪拌してもしなくてもよい。仕込んだ原料などは通常は50〜150℃程度に加熱して反応の進行を速める。所定の時間が経過した後、容器を冷却して内容物を取り出す。内容物に適宜抽出溶媒を加え固形分を分離して、揮発成分を留去すれば目的とする一般式(4)で表される錯化合物が得られる。必要に応じて再結晶により精製することができる。
【0040】
本発明の反応は、無溶媒で行っても溶媒中で行ってもよい。溶媒を使用する場合、溶媒としては、例えば、ペンタン、ヘキサン、ヘプタン、オクタンなどの脂肪族炭化水素類、ベンゼン、トルエン、キシレンなどの芳香族炭化水素類、ジエチルエーテル、ジオキサン、テトラヒドロフラン(THF)、エチレングリコールジメチルエーテルなどのエーテル類、アセトン、メチルエチルケトン、メチルイソブチルケトンなどのケトン類、アセトニトリルなどのニトリル類、ピリジンなどの第三アミン類、N,N−ジメチルホルムアミド(DMF)、N,N−ジメチルアセトアミド(DMAc)などの酸アミド類、ジメチルスルホキシド(DMSO)、スルホランなどの含硫黄化合物など、通常使用されるものを使用することができる。しかしながら、溶媒を使用した場合、反応系全体の容量が増大し、より大規模な反応装置が必要となったり、1バッチ当たりの生産量が減少したりする。本発明においては反応剤として水またはアルコール類を使用しており、これらが溶媒としても機能できることから、特に他の溶媒を使用する必要はない。
【0041】
本発明の方法におけるパラジウム錯化合物の使用量は、一般式(1)で表される芳香族化合物1モルに対して通常金属として0.00001〜0.5モル、好ましくは0.00005〜0.1モル、より好ましくは0.0001〜0.1モルである。0.00001モルよりも少ないと反応の進行が遅く実用的でないので好ましくなく、また、0.5モルよりも多いことは反応の点では問題はないが経済的に不利であるので好ましくない。
【0042】
また、反応系に、一般式(6)
P(R3)3 (6)
(式中、R3はそれぞれ独立にアリール基、炭素数1〜6のアルキル基を表す。)または、一般式(8)
(R4)2P−Q−P(R4)2 (8)
(式中、R4はそれぞれ独立にアリール基、炭素数1〜6のアルキル基を表し、Qは二価の有機基を表す。)で表されるホスフィンを別途添加することは好ましい。ここで、R3、R4はそれぞれ独立にフェニル基、o−トリル基、m−トリル基、p−トリル基、メチル基、エチル基、n−ブチル基などから選ばれた基であることが好ましい。また、Qとしては、−(CH2)m−(mは2〜8の整数)で表されるアルキレン基などである。
【0043】
したがって、ホスフィンとしては、トリフェニルホスフィン、トリ−o−トリルホスフィン、トリ−m−トリルホスフィン、トリ−p−トリルホスフィン、メチルジフェニルホスフィン、トリ−n−ブチルホスフィン、1,1’−ビス(ジフェニルホスフィノ)フェロセン(dppf)、1,4−ビス(ジフェニルホスフィノ)ブタン(dppb)、1,3−ビス(ジフェニルホスフィノ)プロパン(dppp)または1,2−ビス(ジフェニルホスフィノ)エタン(dppe)などが好ましく、トリフェニルホスフィン、dppbは特に好ましい。
【0044】
本発明の方法で、パラジウム錯化合物とは別に反応系に添加するホスフィン類は、パラジウム金属1モルに対し、0.1モル〜100モルであり、50モル以下が好ましく、20モル以下であるのがより好ましい。100モルよりも多く使用しても、反応速度、収率などにはほとんど変化はなく、経済的に不利なだけであり、好ましくない。
【0045】
本発明において、一般式(4)で表されるパラジウム錯化合物の他にホスフィン類を反応系に共存させることは、パラジウム錯化合物の使用量を減らすことに効果があり、また、反応途中においてパラジウム金属が析出し触媒の実効濃度を下げるという好ましくない現象の発現を低減させるという点においても効果を有する。
【0046】
また、本発明における塩基の使用量は、通常、一般式(1)で示される芳香族化合物1モルに対して10.0〜1.0モル、好ましくは5.0〜1.0モル、さらに好ましくは3.0〜1.0モル使用するのがよい。この範囲より少ない場合には、反応が充分に進行せず、収率低下の原因となり、経済的に不利となり、また、未反応の一般式(1)で示される芳香族ハロゲン化物の除去あるいは回収のために後処理工程に負荷がかかるため、好ましくない。また、この範囲より多く使用しても、目的とする安息香酸エステル類の収量にほとんど変化はなく、過剰に添加した塩基が、未反応のまま、多量に残るだけであり、経済的に不利となり、また、未反応の塩基の除去のために後処理工程に負荷がかかるため、好ましくない。
【0047】
次に、本発明の製造方法の実施について述べる。一般式(1)で示される芳香族化合物、水またはアルコール類、パラジウム錯化合物および塩基、さらに必要であれば溶媒および/またはホスフィンを反応器に仕込んだ後、反応器を密閉し、系内を一酸化炭素で置換し、常圧下あるいは加圧下で反応を行う。一酸化炭素圧は、通常、常圧〜30kg/cm2、好ましくは1〜20kg/cm2、さらに好ましくは2〜10kg/cm2とするのがよい。この範囲より低い場合には、反応が充分に進行せず、収率低下の原因となり、経済的に不利となる、あるいは、反応速度が低下して反応終了までに長時間を要するなどの問題を生ずる場合があり、好ましくない。また、この範囲より高くしても、反応速度や目的とする一般式(3)で示される安息香酸または安息香酸エステル類の収量にほとんど変化はなく、また、反応装置の安全性などの問題が生じるため、好ましくない。
【0048】
また、本発明における反応温度は、通常、30℃〜200℃、好ましくは50℃〜180℃、さらに好ましくは60℃〜150℃とするのがよい。この範囲より低い温度の場合には、反応が充分に進行せず、収率低下の原因となり、経済的に不利となる、あるいは、反応速度が低下して反応終了までに長時間を要するなどの問題を生ずる場合があり、好ましくない。また、この範囲より高い温度の場合には、反応中に分解などが起こる場合があり、収率低下の原因となり、経済的に不利となり、また、分解生成物などの除去のために後処理工程に負荷がかかるため、好ましくない。
【0049】
【実施例】
次に、本発明が製法について実施例を挙げて詳細に説明するが、本発明はこれらに限定されるものではない。
【0050】
〔調製例1〕[3,5−ビス(トリフルオロメチル)ベンゾアト]3’,5’−ビス(トリフルオロメチル)フェニルビス(トリフェニルホスフィン)パラジウム(II)の合成
容量500mlのステンレス製オートクレーブに3,5−ビス(トリフルオロメチル)ブロモベンゼン65.3g、テトラヒドロフラン100ml、酢酸パラジウム50.0g、トリフェニルホスフィン175.5g、3,5−ビス(トリフルオロメチル)安息香酸57.6g、25%アンモニア水60.8gを仕込んだ。窒素置換を2回行い、窒素圧を3kg/cm2として攪拌を始めると内温が約50℃に上昇した。その後油浴温度を120℃に設定し加熱を開始した。約2時間後、内温が95.6℃に達した時点で油浴を外し冷却した。反応液に水200mlおよびトルエン600mlを加え、氷冷下、数十分間攪拌した。得られた処理液を吸引濾過し、濾液の有機層を分液した後、飽和食塩水で2回洗浄し、無水硫酸マグネシウムで乾燥後揮発成分を留去濃縮した。濃縮初期に析出した固体を濾別し、さらに濃縮した後,n−ヘキサンを加え冷却し析出した固体を濾別し粗生成物187.5gを得た。粗生成物をトルエンから再結晶し淡黄色結晶143.0gを得た。
【0051】
[3,5−ビス(トリフルオロメチル)ベンゾアト]3’,5’−ビス(トリフルオロメチル)フェニルビス(トリフェニルホスフィン)パラジウム(II)
融点:168−170℃(decomp.)
IR(KBr:cm−1):3060,2926,1637,1437,1321,1277,1173,1127,748,697,518
1H−NMR(基準物質:TMS 溶媒:CDCl3):
δppm 6.97(s,1H),7.09(s,2H),7.20−7.32(m,18H),7.40−7.50(m,12H),7.53(s,2H),7.62(s,1H)
31P−NMR(基準物質:85%H3PO4 溶媒:CDCl3):δppm 25.73(s)
【0052】
〔調製例2〕[3,5−ビス(トリフルオロメチル)ベンゾアト]3’−トリフルオロメチルフェニルビス(トリフェニルホスフィン)パラジウム(II)の合成容量500mlのステンレス製オートクレーブに、3−トリフルオロメチルブロモベンゼン25.0g、テトラヒドロフラン75ml、酢酸パラジウム25g、トリフェニルホスフィン87.3g、25%アンモニア水38g、3,5−ビス(トリフルオロメチル)安息香酸57.5gを仕込み、調製例1と同様な操作を行って目的とする[3,5−ビス(トリフルオロメチル)ベンゾアト]3’−トリフルオロメチルフェニルビス(トリフェニルホスフィン)パラジウム(II)が32.3g得られた。
【0053】
[3,5−ビス(トリフルオロメチル)ベンゾアト]3’−トリフルオロメチルフェニルビス(トリフェニルホスフィン)パラジウム(II)
1H−NMR(基準物質:TMS 溶媒:CDCl3):
δppm 6.47(dd,J=7.3,7.8Hz,1H),6.77(d,J=7.3Hz,1H),6.80(brs,1H),6.95(d,J=7.8Hz,1H),7.24−7.30(m,18H),7.40−7.46(m,12H)
【0054】
[実施例1]
容量500mlのステンレス製オートクレーブに、3,5−ビス(トリフルオロメチル)ブロモベンゼン200g、トリエチルアミン145g、およびテトラヒドロフラン100mlを混合し、さらに[3,5−ビス(トリフルオロメチル)ベンゾアト]3’,5’−ビス(トリフルオロメチル)フェニルビス(トリフェニルホスフィン)パラジウム(II)2.87g、トリフェニルホスフィン1.79gおよび水100gを加えた。反応器を密閉したのち、撹拌を開始し窒素置換3回、更に一酸化炭素置換3回を行った。一酸化炭素初期圧を4kg/cm2に設定し加熱を始めた。1時間後内温が100℃に達した時点で内圧を8kg/cm2に調整した。反応中は内温100℃、内圧8kg/cm2を保った。
【0055】
12.5時間後、加温を停止し反応器を冷却。内温が50℃以下になった時点で内部ガスをパージし、内圧を常圧まで降下させた後、窒素置換を3回行って反応を終了した。
【0056】
反応液を1000mlビーカーに移液し撹拌しつつ、氷冷下濃硫酸55gを分液ロートより滴下した。滴下終了後、テトラヒドロフラン50ml、および水100mlを加え、しばらく撹拌した後、得られた溶液を分液ロートに移液し、有機層を分液した。
【0057】
2000ml三つ口フラスコに撹拌機、滴下ロート及びコンデンサー付きト字管を取り付け、500mlの温水を加えた。油浴を用いて温水の温度を85℃に保ち、そこへ滴下ロートを用いて上記の有機層を滴下した。添加開始後、しばらくしてテトラヒドロフラン−水の混合物が留出してくるので、添加量と留出量のバランスを保ちつつ浴温等を調整した。全量添加終了後、テトラヒドロフランの留出が停止し、液温および蒸気温度が上昇を開始した時点で油浴を外し室温まで冷却した。生成した沈殿を吸引濾過した後、得られた結晶を水、次いでトルエンで洗浄した。減圧乾燥後、目的とする3,5−ビス(トリフルオロメチル)安息香酸128.9gを得た。
【0058】
[実施例2]
容量500mlのステンレス製オートクレーブに、3,5−ビス(トリフルオロメチル)ブロモベンゼン200gおよびトリエチルアミン145gを混合し、さらに[3,5−ビス(トリフルオロメチル)ベンゾアト]3’,5’−ビス(トリフルオロメチル)フェニルビス(トリフェニルホスフィン)パラジウム(II)1.43g、トリフェニルホスフィン0.45gおよび水100gを加えた。その後、実施例1と同様の操作を行って、3,5−ビス(トリフルオロメチル)安息香酸130gを得た。
【0059】
[実施例3]
容量500mlのステンレス製オートクレーブに、3,5−ビス(トリフルオロメチル)ブロモベンゼン150g、トリエチルアミン114.0gおよびトルエン75gを混合し、さらに[3,5−ビス(トリフルオロメチル)ベンゾアト]3’,5’−ビス(トリフルオロメチル)フェニルビス(トリフェニルホスフィン)パラジウム(II)2.71gおよび水200gを加えた。その後、実施例1と同様の操作を行って、3,5−ビス(トリフルオロメチル)安息香酸84.0gを得た。
【0060】
[実施例4]
容量500mlのステンレス製オートクレーブに、3−トリフルオロメチルブロモベンゼン154gおよびトリエチルアミン145gを混合し、さらに[3,5−ビス(トリフルオロメチル)ベンゾアト]3’,5’−ビス(トリフルオロメチル)フェニルビス(トリフェニルホスフィン)パラジウム(II)3.77g、トリフェニルホスフィン0.898gおよび水100gを加えた。その後、実施例1と同様の操作を行って、3−トリフルオロメチル安息香酸119gを得た。
【0061】
【発明の効果】
医薬品、農薬、各種機能材料などの製造中間体として有用な化合物である安息香酸類誘導体、トリフルオロメチル安息香酸誘導体類を容易に、かつ、効率よく製造することができる。The present invention relates to a method for producing benzoic acid or benzoic esters useful as intermediates for producing pharmaceuticals, agricultural chemicals, various functional materials and the like.
[0001]
[Prior art]
It is conventionally known that a benzoic acid derivative can be obtained by a reaction of inserting carbon monoxide into an aromatic halide.
[0002]
JP-A-64-47 discloses that an organic chloride having a chlorine atom on a ring is reacted with carbon monoxide at a reaction temperature of 150 ° C. to 300 ° C. in the presence of a base using a palladium compound and a phosphine compound as catalysts. It is disclosed that a carboxylic acid can be obtained by the reaction, and bis (diphenylphosphino) butane is exemplified as a phosphine compound.
[0003]
As a method for producing bis (trifluoromethyl) benzoic acid, 3,5-bis (trifluoromethyl) bromobenzene is used as a starting material to produce 3,5-bis (trifluoromethyl) benzoic acid by a Grignard reaction. Is known [Bull. Soc. Chim. France. , (1962), 587-93].
[0004]
Japanese Patent Application Laid-Open No. 9-67297 discloses that 3,5-bis (trifluoromethyl) bromobenzene, carbon monoxide and water or methanol are prepared in the presence of a catalyst comprising palladium acetate and triphenylphosphine and triethylamine. It is described that 3,5-bis (trifluoromethyl) benzoic acid and its ester can be obtained by reacting.
[0005]
[Problems to be solved by the invention]
According to the method disclosed in Japanese Patent Application Laid-Open No. 9-67297, relatively good results can be obtained in both selectivity and yield. However, during the reaction, the palladium catalyst precipitates as inactive palladium black and the actual catalyst concentration decreases. A relatively large amount of palladium compound had to be used. Further, when a trifluoromethyl group is present on the benzene ring, the dehalogenation reaction proceeds as a side reaction, lowering the yield of the target benzoic acid, and the resulting by-products make it difficult to purify the product. I was
[0006]
[Means for Solving the Problems]
In view of the above problems, the present inventors have conducted intensive studies on a method capable of industrially producing bis (trifluoromethyl) benzoic acids easily and in large quantities. As a result, halogeno-bis ( When a bis (trifluoromethyl) benzoic acid is produced by reacting trifluoromethyl) benzene with carbon monoxide and water or an alcohol in the presence of a base, a specific catalyst is used as a catalyst. The present inventors have found that the selectivity and selectivity are remarkably improved, and that the precipitation of metal which is likely to occur when another noble metal catalyst is used can be significantly reduced, and the present invention has been achieved.
[0007]
That is, the present invention relates to the general formula (1)
Ar-X (1)
(Wherein, Ar represents an aryl group, X represents a halogen (fluorine, chlorine, bromine, or iodine), a trifluoromethanesulfonate group, an alkylsulfonate group having 1 to 4 carbon atoms, or a substituted or unsubstituted arylsulfonate group). An aromatic compound is prepared by reacting carbon monoxide with a general formula (2) in the presence of a catalyst and a base.
R 1 OH (2)
(Where R 1 Represents a hydrogen, an aryl group or an alkyl group having 1 to 10 carbon atoms).
[0008]
Embedded image
(Where Ar, R 1 Is the same as described above), which is a method for producing a benzoic acid derivative represented by the following general formula (4):
[0009]
Embedded image
(Wherein, Ar 1 , Ar 2 Each independently represents an aryl group, and L each independently represents a phosphine ligand. This is a method for producing a benzoic acid derivative using a palladium complex compound represented by the following formula:
[0010]
Hereinafter, the present invention will be described in detail.
[0011]
The aromatic compound represented by the general formula (1) used in the present invention may have a substituent other than the group represented by X as long as it is inactive in the method of the present invention. A compound in which a halogen, a trifluoromethanesulfonate group, an alkylsulfonate group having 1 to 4 carbon atoms, or a substituted or unsubstituted arylsulfonate group is bonded to an aromatic group. Practically preferred are halides whose raw materials are easily available. Halogen is fluorine, chlorine, bromine or iodine, with bromine or iodine being more preferred.
[0012]
The aromatic group may be a carbocyclic group such as a phenyl group or a naphthyl group, or a heterocyclic group such as a pyridyl group or a quinolyl group, and may have a substituent. Is the general formula (5)
[0013]
Embedded image
(Where R 2 Each independently represents a trifluoromethyl group, a trifluoromethyloxy group, a halogen (fluorine, chlorine, bromine or iodine), a nitro group, an acetyl group, a cyano group, an alkyl group having 1 to 4 carbon atoms, and 1 carbon atom Represents an alkoxy group having from 4 to 4 or an alkoxycarbonyl group having from 2 to 5 carbon atoms, and n represents 0 or an integer from 1 to 5. ) Is preferred. As an alkyl group having 1 to 4 carbon atoms, for example, a methyl group, an ethyl group, an n-propyl group, an i-propyl group, n-butyl group, and as an alkoxy group having 1 to 4 carbon atoms, for example, a methoxy group, Examples of the ethoxy group, n-propoxy group, i-propoxy group, and alkoxycarbonyl group having 2 to 5 carbon atoms include a methoxycarbonyl group, an ethoxycarbonyl group, an n-propoxycarbonyl group, and an i-propoxycarbonyl group. it can.
[0014]
The aromatic compound represented by the general formula (1) has an alkyl group, an alkoxy group, a halogen (different from X) or a trifluoromethyl group exemplified above as R, and X is a bromine or iodine atom. Are more preferable. Specific examples of those having an alkyl group include 2-, 3- or 4-bromotoluene, 2-, 3- or 4-bromoethylbenzene, 2-, 3- or 4-bromo-isopropylbenzene, and the like. , 3- or 4-bromon-butylbenzene, and the like, and 2-, 3- or 4-bromomethoxybenzene, 2-, 3- or 4-bromoethoxybenzene, 2-, 3- or 4-bromon. -Propoxybenzene, 2-, 3- or 4-bromoisopropoxybenzene, 2-, 3- or 4-bromo n-butoxybenzene, 2-, 3- or 4-bromochlorobenzene or the like or a bromine thereof is converted to iodine. A substituted compound can be exemplified, but the compound is not limited thereto.
[0015]
Further, as the aromatic compound represented by the general formula (1), halogeno- (trifluoromethyl) benzene, halogeno-bis (trifluoromethyl) benzene, or hydrogen on the benzene ring of these compounds is substituted by a halogen atom. The compounds mentioned are preferred.
[0016]
Specifically, having one trifluoromethyl group, 2-trifluoromethylphenylbromobenzene, 3-trifluoromethylphenylbromobenzene, 4-trifluoromethylphenylbromobenzene, having two trifluoromethyl groups, 2,3-bis (trifluoromethyl) phenylbromobenzene, 2,4-bis (trifluoromethyl) phenylbromobenzene, 2,5-bis (trifluoromethyl) phenylbromobenzene, 2,6-bis (trifluoro Examples thereof include methyl) phenylbromobenzene, 3,4-bis (trifluoromethyl) phenylbromobenzene, 3,5-bis (trifluoromethyl) phenylbromobenzene, and compounds in which bromine is substituted by iodine. I can't.
[0017]
Further, as the aromatic compound having a halogen other than X, 2-chloro-3- (trifluoromethyl) bromobenzene, 2-fluoro-3- (trifluoromethyl) bromobenzene, 2-fluoro-4- (tri (Fluoromethyl) bromobenzene, 3-fluoro-5- (trifluoromethyl) bromobenzene, 2-bromo-6- (trifluoromethyl) bromobenzene, 4-chloro-2- (trifluoromethyl) bromobenzene, 4- Fluoro-2- (trifluoromethyl) bromobenzene, 2-chloro-6- (trifluoromethyl) bromobenzene, 4-fluoro-3- (trifluoromethyl) bromobenzene, 1-chloro-4- (trifluoromethyl ) Bromobenzene, 2-fluoro-6- (trifluoromethyl) bromobenzene, Oro-5- (trifluoromethyl) bromobenzene, 2-chloro-4- (trifluoromethyl) bromobenzene, 4-chloro-3- (trifluoromethyl) bromobenzene, 4-chloro-2- (trifluoromethyl ) Bromobenzene and the like or compounds in which bromine is substituted with iodine can be exemplified, but not limited thereto.
[0018]
Of these, 3,5-bis (trifluoromethyl) bromobenzene or 3,5-bis (trifluoromethyl) iodobenzene, or hydrogen of these benzene nuclei is halogen because of the remarkable usefulness of the product Substituted 2-chloro-3,5-bis (trifluoromethyl) bromobenzene and the like are more preferred. In this case, when the former two are used as starting materials, 3,5-bis (trifluoromethyl) benzoic acid or its ester is obtained, and from the latter, 2-chloro-3,5-bis (trifluoromethyl) benzoic acid is obtained. Or its ester is obtained.
[0019]
When the method of the present invention is applied to the aromatic compound represented by the general formula (1), generally, a halogen or a trifluoromethanesulfonate group bonded to an aromatic ring, an alkylsulfonate group having 1 to 4 carbon atoms, a substituted or unsubstituted arylsulfonate Only a group or the like is converted into a carboxyl group, and a product in which the substituent represented by R is not changed is obtained. Compounds having a plurality of different halogens on an aromatic ring generally react preferentially in the order of iodine, bromine, chlorine, and fluorine, but may differ depending on the position and type of substituent on the ring.
[0020]
General formula (2)
R 1 OH (2)
(Where R 1 Represents hydrogen or an alkyl group having 1 to 10 carbon atoms), an alkyl group having a linear or branched chain having 1 to 10 carbon atoms, specifically, for example, a methyl group, an ethyl group , N-propyl group, iso-propyl group, n-butyl group, iso-butyl group, sec-butyl group, tert-butyl group, n-pentyl group, n-hexyl group, n-heptyl group, n-octyl group , An n-nonyl group, an alcohol having an n-decyl group, and the like. Therefore, specific examples of the hydroxy compound represented by the general formula (2) in the present invention include, for example, water, methanol, ethanol, n-propyl alcohol, iso-propyl alcohol, n-butyl alcohol, and iso-butyl alcohol. , Sec-butyl alcohol, tert-butyl alcohol, n-pentyl alcohol, n-hexyl alcohol, n-heptyl alcohol, n-octyl alcohol, n-nonyl alcohol, n-decyl alcohol and the like.
[0021]
The amount of water or alcohol used in the present invention may be 1 mol or more per 1 mol of the aromatic compound represented by the general formula (1). It is preferable to add a slightly excessive amount in order to cause a reaction at a high conversion rate and to function as a solvent.
[0022]
Examples of the base in the present invention include tertiary amines such as triethylamine, tripropylamine, tributylamine, triallylamine, N, N-dimethylaniline, N, N-diethylaniline, pyridine, N-methylmorpholine, sodium acetate, and acetic acid. Examples thereof include acetates such as potassium, and inorganic bases such as sodium hydroxide, potassium hydroxide, sodium carbonate, and potassium carbonate.
[0023]
The amount of the base used in the present invention is usually 1.0 to 10.0 mol, preferably 1.0 to 5.0 mol, per 1 mol of the aromatic compound represented by the general formula (1), and more preferably 1.0 to 5.0 mol. Preferably, it is used in an amount of 1.0 to 3.0 mol. When the amount is less than 1.0 mol, the reaction does not proceed sufficiently, which causes a decrease in yield, and is economically disadvantageous. Further, the removal of unreacted aromatic compound represented by the general formula (1) or It is not preferable because a load is applied to the post-processing step for recovery. Further, even if it is used in an amount of more than 10.0 mol, there is almost no change in the yield of the target benzoic acid esters, and only a large amount of the excessively added base remains unreacted, which is economical. It is not preferable because it is disadvantageous and a load is applied to a post-treatment step for removing unreacted base.
[0024]
The catalyst of the present invention has the general formula (4)
[0025]
Embedded image
(Wherein, Ar 1 , Ar 2 Each independently represents an aryl group, and L represents a phosphine ligand. ) Is a palladium complex compound represented by
[0026]
Ar of the general formula (4) 1 Or Ar 2 The aryl groups represented by are each independently represented by the general formula (5)
[0027]
Embedded image
(Where R 2 Each independently represents a trifluoromethyl group, a trifluoromethyloxy group, a halogen (fluorine, chlorine, bromine or iodine), a nitro group, an acetyl group, a cyano group, an alkyl group having 1 to 4 carbon atoms, and 1 carbon atom Represents an alkoxy group having from 4 to 4 or an alkoxycarbonyl group having from 2 to 5 carbon atoms, and n represents 0 or an integer from 1 to 5. ) Is an aryl group.
[0028]
Examples of the alkyl group having 1 to 4 carbon atoms include a methyl group, an ethyl group, an n-propyl group and an i-propyl group), and examples of the alkoxy group having 1 to 4 carbon atoms include a methoxy group, an ethoxy group, Examples of the -propoxy group, i-propoxy group, and alkoxycarbonyl group having 2 to 5 carbon atoms include a methoxycarbonyl group, an ethoxycarbonyl group, an n-propoxycarbonyl group, and an i-propoxycarbonyl group.
[0029]
The aryl group represented by the general formula (5) in the palladium complex compound represented by the general formula (4) may be Ar 1 , Ar 2 Both include a phenyl group having a hydrocarbon-based alkyl group such as a phenyl group, o-, m-, and p-tolyl group, and a 2-trifluoromethylphenyl group and a 3-trifluoro group having one trifluoromethyl group. 2,3-bis (trifluoromethyl) phenyl, 2,4-bis (trifluoromethyl) phenyl, 2,5 having two methylphenyl, 4-trifluoromethylphenyl, and trifluoromethyl groups -Bis (trifluoromethyl) phenyl group, 2,6-bis (trifluoromethyl) phenyl group, 3,4-bis (trifluoromethyl) phenyl group, 3,5-bis (trifluoromethyl) phenyl group and the like. Preferred groups are mentioned.
[0030]
Further, among these, Ar of the complex compound represented by the general formula (4) 1 The aryl group represented by is preferably a bis (trifluoromethyl) phenyl group. 2 The aryl group represented by is preferably a phenyl group, a trifluoromethylphenyl group or a bis (trifluoromethyl) phenyl group, and a 3-trifluoromethylphenyl group or a 3,5-bis (trifluoromethyl) phenyl group Is more preferable.
[0031]
The phosphine ligand represented by L in the palladium complex compound represented by the general formula (4) is not particularly limited.
P (R 3 ) 3 (6)
(R 3 Represents a phenyl group (aryl group) which may have a substituent independently, and an alkyl group having 1 to 6 carbon atoms. ) Is a phosphine ligand represented by Where R 3 Is preferably a group independently selected from a phenyl group, an o-tolyl group, an m-tolyl group, a p-tolyl group, a methyl group, an ethyl group, and an n-butyl group. The phosphine ligand represented by L is preferably triphenylphosphine, tri-o-tolylphosphine, tri-m-tolylphosphine, tri-p-tolylphosphine, tri-n-butylphosphine, or the like. Phosphine is particularly preferred.
[0032]
Palladium compounds represented by the general formula (4) suitable for use in the present invention include:
[0033]
Embedded image
(Tol represents an o-, m- or p-tolyl group) and the like.
[0034]
The palladium complex compound used in the present invention is crystalline, is soluble in many organic solvents, and is stable. It is stable in air at room temperature. Because of these physical and chemical properties, the isolation operation is easy, so that a high-purity substance is easily obtained, and storage is also easy, so that it is easy to handle even in industrial use.
[0035]
The method for producing the palladium complex compound used in the present invention is not particularly limited, but the method described in the literature (J. Am. Chem. Soc., Vol. 117, No. 15, 4305 (1995)) and the method described below can be used. An exemplary method can be employed. General formula (7) in a sealable container
Ar-COOH (7)
(Wherein Ar is the same as described above) and benzoic acid represented by the general formula (1)
Ar-X (1)
(Wherein, Ar is the same as described above, but it is not necessary to be the same at the same time as Ar in the general formula (7)), a solvent, a palladium compound, phosphine serving as a phosphine ligand, and a base Ingredients are charged. As the solvent, when the melting point is low, an aromatic compound represented by the general formula (1) can be used. In addition, for example, aliphatic hydrocarbons such as pentane, hexane, heptane, and octane; benzene, toluene, and xylene; Aromatic hydrocarbons, ethers such as diethyl ether, dioxane, tetrahydrofuran (THF) and ethylene glycol dimethyl ether; ketones such as acetone, methyl ethyl ketone and methyl isobutyl ketone; nitriles such as acetonitrile; tertiary amines such as pyridine; Acid amides such as N, N-dimethylformamide (DMF) and N, N-dimethylacetamide (DMAc), sulfur-containing compounds such as dimethylsulfoxide (DMSO) and sulfolane, and water can be used.
[0036]
Examples of the basic substance include tertiary amines such as ammonia, triethylamine, tripropylamine, tributylamine, triallylamine, N, N-dimethylaniline, N, N-diethylaniline, pyridine and N-methylmorpholine, sodium acetate, Examples thereof include acetates such as potassium acetate, and inorganic bases such as sodium hydroxide, potassium hydroxide, sodium carbonate, and potassium carbonate.
[0037]
As the palladium compound, palladium acetate, palladium chloride, palladium bromide and the like are suitable.
[0038]
The ratio of each raw material used is not particularly limited, but in order to effectively use palladium, the aromatic compound represented by the general formula (1) and the benzoic acid represented by the general formula (7) each have at least 1 equivalent. The phosphine used is preferably used in an amount of 2 equivalents or more. Other solvents and the like may be used in appropriate amounts.
[0039]
The container may or may not be pressurized and may or may not be agitated. The charged raw materials and the like are usually heated to about 50 to 150 ° C. to speed up the progress of the reaction. After a predetermined time has elapsed, the container is cooled and the contents are taken out. An extraction solvent is appropriately added to the contents to separate a solid content, and a volatile component is distilled off to obtain a desired complex compound represented by the general formula (4). If necessary, it can be purified by recrystallization.
[0040]
The reaction of the present invention may be performed without a solvent or in a solvent. When a solvent is used, examples of the solvent include aliphatic hydrocarbons such as pentane, hexane, heptane, and octane; aromatic hydrocarbons such as benzene, toluene, and xylene; diethyl ether, dioxane, and tetrahydrofuran (THF); Ethers such as ethylene glycol dimethyl ether, ketones such as acetone, methyl ethyl ketone and methyl isobutyl ketone, nitriles such as acetonitrile, tertiary amines such as pyridine, N, N-dimethylformamide (DMF), N, N-dimethylacetamide Commonly used compounds such as acid amides such as (DMAc) and sulfur-containing compounds such as dimethylsulfoxide (DMSO) and sulfolane can be used. However, when a solvent is used, the volume of the entire reaction system increases, a larger-scale reactor is required, and the production amount per batch decreases. In the present invention, water or alcohol is used as a reactant, and since these can also function as a solvent, it is not particularly necessary to use another solvent.
[0041]
The amount of the palladium complex compound used in the method of the present invention is usually 0.00001 to 0.5 mol, preferably 0.00005 to 0.5 mol as a metal per 1 mol of the aromatic compound represented by the general formula (1). It is 1 mol, more preferably 0.0001 to 0.1 mol. If the amount is less than 0.00001 mol, the progress of the reaction is slow, which is not practical because it is not practical. On the other hand, if it is more than 0.5 mol, there is no problem in terms of the reaction, but it is economically disadvantageous, so it is not preferable.
[0042]
In addition, a general formula (6) is added to the reaction system.
P (R 3 ) 3 (6)
(Where R 3 Each independently represents an aryl group or an alkyl group having 1 to 6 carbon atoms. ) Or general formula (8)
(R 4 ) 2 PQP (R 4 ) 2 (8)
(Where R 4 Each independently represents an aryl group or an alkyl group having 1 to 6 carbon atoms, and Q represents a divalent organic group. It is preferable to separately add the phosphine represented by ()). Where R 3 , R 4 Is preferably a group independently selected from a phenyl group, an o-tolyl group, an m-tolyl group, a p-tolyl group, a methyl group, an ethyl group, and an n-butyl group. Q is-(CH 2 ) m And an alkylene group represented by-(m is an integer of 2 to 8).
[0043]
Therefore, phosphine includes triphenylphosphine, tri-o-tolylphosphine, tri-m-tolylphosphine, tri-p-tolylphosphine, methyldiphenylphosphine, tri-n-butylphosphine, 1,1′-bis (diphenyl Phosphino) ferrocene (dppf), 1,4-bis (diphenylphosphino) butane (dppb), 1,3-bis (diphenylphosphino) propane (dppp) or 1,2-bis (diphenylphosphino) ethane ( dppe) is preferred, and triphenylphosphine and dppb are particularly preferred.
[0044]
In the method of the present invention, the phosphine added to the reaction system separately from the palladium complex compound is 0.1 mol to 100 mol, preferably 50 mol or less, more preferably 20 mol or less, based on 1 mol of palladium metal. Is more preferred. Even if it is used more than 100 moles, there is almost no change in the reaction rate, the yield and the like, and it is only economically disadvantageous and is not preferable.
[0045]
In the present invention, coexistence of a phosphine in the reaction system in addition to the palladium complex compound represented by the general formula (4) is effective in reducing the amount of the palladium complex compound used. This is also effective in reducing the occurrence of undesirable phenomena in which the metal precipitates and lowers the effective concentration of the catalyst.
[0046]
The amount of the base used in the present invention is usually 10.0 to 1.0 mol, preferably 5.0 to 1.0 mol, and more preferably 5.0 to 1.0 mol, per 1 mol of the aromatic compound represented by the general formula (1). Preferably 3.0 to 1.0 mol is used. If the amount is less than this range, the reaction does not proceed sufficiently, which causes a decrease in yield and is economically disadvantageous. Further, removal or recovery of unreacted aromatic halide represented by the general formula (1) Therefore, a load is applied to the post-processing step, which is not preferable. In addition, even if the amount is larger than this range, the yield of the target benzoic acid esters hardly changes, and the base added in excess remains unreacted and remains in a large amount, which is economically disadvantageous. In addition, it is not preferable because the removal of unreacted base places a burden on the post-treatment step.
[0047]
Next, implementation of the manufacturing method of the present invention will be described. After charging the aromatic compound represented by the general formula (1), water or alcohols, a palladium complex compound and a base, and if necessary, a solvent and / or phosphine into the reactor, the reactor is closed, and the inside of the system is cooled. The reaction is carried out under normal pressure or under pressure after substituting with carbon monoxide. The carbon monoxide pressure is usually from normal pressure to 30 kg / cm. 2 , Preferably 1 to 20 kg / cm 2 , More preferably 2 to 10 kg / cm 2 It is better to do. When the temperature is lower than this range, the reaction does not proceed sufficiently and causes a decrease in the yield, which is economically disadvantageous, or a problem that the reaction speed is reduced and it takes a long time to complete the reaction. May occur, which is not preferred. In addition, even if it is higher than this range, there is almost no change in the reaction rate or the yield of the target benzoic acid or benzoic acid ester represented by the general formula (3), and there are problems such as safety of the reaction apparatus. It is not preferable because it occurs.
[0048]
Further, the reaction temperature in the present invention is usually 30 ° C to 200 ° C, preferably 50 ° C to 180 ° C, and more preferably 60 ° C to 150 ° C. When the temperature is lower than this range, the reaction does not proceed sufficiently and causes a decrease in yield, which is economically disadvantageous, or the reaction speed decreases and it takes a long time to complete the reaction. This may cause problems and is not preferred. If the temperature is higher than this range, decomposition or the like may occur during the reaction, which causes a decrease in yield, which is economically disadvantageous, and a post-treatment step for removing decomposition products. Is not preferred because of the load on the
[0049]
【Example】
Next, the present invention will be described in detail with reference to examples of the production method, but the present invention is not limited thereto.
[0050]
[Preparation Example 1] Synthesis of [3,5-bis (trifluoromethyl) benzoato] 3 ', 5'-bis (trifluoromethyl) phenylbis (triphenylphosphine) palladium (II)
In a stainless steel autoclave having a capacity of 500 ml, 65.3 g of 3,5-bis (trifluoromethyl) bromobenzene, 100 ml of tetrahydrofuran, 50.0 g of palladium acetate, 175.5 g of triphenylphosphine, and 3,5-bis (trifluoromethyl) benzoate. 57.6 g of acid and 60.8 g of 25% aqueous ammonia were charged. Nitrogen replacement is performed twice, and nitrogen pressure is 3 kg / cm. 2 When the stirring was started, the internal temperature rose to about 50 ° C. Thereafter, the oil bath temperature was set to 120 ° C., and heating was started. About 2 hours later, when the internal temperature reached 95.6 ° C., the oil bath was removed and the system was cooled. 200 ml of water and 600 ml of toluene were added to the reaction solution, and the mixture was stirred for several minutes under ice cooling. The obtained treatment liquid was subjected to suction filtration, the organic layer of the filtrate was separated, washed twice with a saturated saline solution, dried over anhydrous magnesium sulfate, and concentrated by distilling off volatile components. The solid precipitated in the initial stage of concentration was separated by filtration and further concentrated. After adding n-hexane, the mixture was cooled and the precipitated solid was separated by filtration to obtain 187.5 g of a crude product. The crude product was recrystallized from toluene to obtain 143.0 g of pale yellow crystals.
[0051]
[3,5-bis (trifluoromethyl) benzoato] 3 ', 5'-bis (trifluoromethyl) phenylbis (triphenylphosphine) palladium (II)
Melting point: 168-170 ° C (decomp.)
IR (KBr: cm-1): 3060, 2926, 1637, 1437, 1321, 1277, 1173, 1127, 748, 697, 518
1 H-NMR (reference substance: TMS solvent: CDCl 3 ):
δ ppm 6.97 (s, 1H), 7.09 (s, 2H), 7.20-7.32 (m, 18H), 7.40-7.50 (m, 12H), 7.53 (s , 2H), 7.62 (s, 1H)
31 P-NMR (reference substance: 85% H 3 PO 4 Solvent: CDCl 3 ): Δ ppm 25.73 (s)
[0052]
Preparation Example 2 Synthesis of [3,5-bis (trifluoromethyl) benzoato] 3′-trifluoromethylphenylbis (triphenylphosphine) palladium (II) In a stainless steel autoclave having a capacity of 500 ml, 3-trifluoromethyl was added. As in Preparation Example 1, 25.0 g of bromobenzene, 75 ml of tetrahydrofuran, 25 g of palladium acetate, 87.3 g of triphenylphosphine, 38 g of 25% aqueous ammonia, and 57.5 g of 3,5-bis (trifluoromethyl) benzoic acid were charged. By performing the operation, 32.3 g of the objective [3,5-bis (trifluoromethyl) benzoato] 3'-trifluoromethylphenylbis (triphenylphosphine) palladium (II) was obtained.
[0053]
[3,5-bis (trifluoromethyl) benzoato] 3'-trifluoromethylphenylbis (triphenylphosphine) palladium (II)
1 H-NMR (reference substance: TMS solvent: CDCl 3 ):
δ ppm 6.47 (dd, J = 7.3, 7.8 Hz, 1H), 6.77 (d, J = 7.3 Hz, 1H), 6.80 (brs, 1H), 6.95 (d, J = 7.8 Hz, 1H), 7.24-7.30 (m, 18H), 7.40-7.46 (m, 12H)
[0054]
[Example 1]
In a stainless steel autoclave having a capacity of 500 ml, 200 g of 3,5-bis (trifluoromethyl) bromobenzene, 145 g of triethylamine and 100 ml of tetrahydrofuran were mixed, and [3,5-bis (trifluoromethyl) benzoato] 3 ', 5 was further added. 2.87 g of '-bis (trifluoromethyl) phenylbis (triphenylphosphine) palladium (II), 1.79 g of triphenylphosphine and 100 g of water were added. After the reactor was sealed, stirring was started, and nitrogen replacement and carbon monoxide replacement were performed three times. Initial pressure of carbon monoxide is 4kg / cm 2 And started heating. One hour later, when the internal temperature reaches 100 ° C., the internal pressure is increased to 8 kg / cm. 2 Was adjusted to During the reaction, internal temperature 100 ° C, internal pressure 8kg / cm 2 Kept.
[0055]
After 12.5 hours, heating was stopped and the reactor was cooled. When the internal temperature became 50 ° C. or lower, the internal gas was purged, the internal pressure was reduced to normal pressure, and nitrogen replacement was performed three times to complete the reaction.
[0056]
The reaction solution was transferred to a 1000 ml beaker, and while stirring, 55 g of concentrated sulfuric acid was added dropwise from a separating funnel under ice cooling. After completion of the dropwise addition, 50 ml of tetrahydrofuran and 100 ml of water were added, and after stirring for a while, the obtained solution was transferred to a separating funnel, and the organic layer was separated.
[0057]
A stirrer, a dropping funnel and a T-shaped tube with a condenser were attached to a 2000 ml three-necked flask, and 500 ml of warm water was added. The temperature of the hot water was kept at 85 ° C. using an oil bath, and the above-mentioned organic layer was added dropwise thereto using a dropping funnel. Since a mixture of tetrahydrofuran-water distills out after a short time from the start of the addition, the bath temperature and the like were adjusted while maintaining the balance between the addition amount and the distillate amount. After the addition of the whole amount, the distillation of tetrahydrofuran was stopped, and when the liquid temperature and the vapor temperature started to rise, the oil bath was removed and the system was cooled to room temperature. After suction filtration of the formed precipitate, the obtained crystals were washed with water and then with toluene. After drying under reduced pressure, 128.9 g of the desired 3,5-bis (trifluoromethyl) benzoic acid was obtained.
[0058]
[Example 2]
200 g of 3,5-bis (trifluoromethyl) bromobenzene and 145 g of triethylamine were mixed in a 500 ml stainless steel autoclave, and [3,5-bis (trifluoromethyl) benzoato] 3 ′, 5′-bis ( 1.43 g of (trifluoromethyl) phenylbis (triphenylphosphine) palladium (II), 0.45 g of triphenylphosphine and 100 g of water were added. Thereafter, the same operation as in Example 1 was performed to obtain 130 g of 3,5-bis (trifluoromethyl) benzoic acid.
[0059]
[Example 3]
In a stainless steel autoclave having a capacity of 500 ml, 150 g of 3,5-bis (trifluoromethyl) bromobenzene, 114.0 g of triethylamine and 75 g of toluene were mixed, and [3,5-bis (trifluoromethyl) benzoato] 3 ′, 2.71 g of 5'-bis (trifluoromethyl) phenylbis (triphenylphosphine) palladium (II) and 200 g of water were added. Thereafter, the same operation as in Example 1 was performed to obtain 84.0 g of 3,5-bis (trifluoromethyl) benzoic acid.
[0060]
[Example 4]
In a 500 ml stainless steel autoclave, 154 g of 3-trifluoromethylbromobenzene and 145 g of triethylamine were mixed, and [3,5-bis (trifluoromethyl) benzoato] 3 ′, 5′-bis (trifluoromethyl) phenyl was further added. 3.77 g of bis (triphenylphosphine) palladium (II), 0.898 g of triphenylphosphine and 100 g of water were added. Thereafter, the same operation as in Example 1 was performed to obtain 119 g of 3-trifluoromethylbenzoic acid.
[0061]
【The invention's effect】
Benzoic acid derivatives and trifluoromethylbenzoic acid derivatives, which are compounds useful as intermediates for producing pharmaceuticals, agricultural chemicals, various functional materials, and the like, can be produced easily and efficiently.
Claims (13)
Ar−X (1)
(式中、Arはアリール基、Xはハロゲン(フッ素、塩素、臭素またはヨウ素)、トリフルオロメタンスルホネート基、炭素数1〜4のアルキルスルホネート基、置換または非置換アリールスルホネート基を表す)で表される芳香族化合物を触媒と塩基の存在下一酸化炭素と一般式(2)
R1OH (2)
(式中、R1は水素、アリール基または炭素数1〜10のアルキル基を表す)で表されるヒドロキシ化合物を反応させることからなる一般式(3)
Ar-X (1)
(Wherein, Ar represents an aryl group, X represents a halogen (fluorine, chlorine, bromine, or iodine), a trifluoromethanesulfonate group, an alkylsulfonate group having 1 to 4 carbon atoms, or a substituted or unsubstituted arylsulfonate group). An aromatic compound is prepared by reacting carbon monoxide with a general formula (2) in the presence of a catalyst and a base.
R 1 OH (2)
(Wherein, R 1 represents hydrogen, an aryl group or an alkyl group having 1 to 10 carbon atoms).
R1OH (2)
(式中、R1は水素または炭素数1〜10のアルキル基を表す)で表されるヒドロキシ化合物が水である請求項1乃至3の何れかに記載の安息香酸の製造方法。General formula (2)
R 1 OH (2)
The method for producing benzoic acid according to any one of claims 1 to 3, wherein the hydroxy compound represented by (wherein R 1 represents hydrogen or an alkyl group having 1 to 10 carbon atoms) is water.
P(R3)3 (6)
(R3はそれぞれ独立にアリール基、炭素数1〜6のアルキル基を表す。)で表されるホスフィン配位子である請求項1乃至6の何れかに記載の安息香酸誘導体の製造方法。The phosphine ligand represented by L in the general formula (4) is represented by the general formula (6):
P (R 3 ) 3 (6)
(R 3 each independently represents an aryl group represents. An alkyl group having 1 to 6 carbon atoms) method for producing benzoic acid derivatives according to any one of claims 1 to 6 is a phosphine ligand represented by.
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