JP3486345B2 - Semiconductor light emitting device - Google Patents
Semiconductor light emitting deviceInfo
- Publication number
- JP3486345B2 JP3486345B2 JP19902098A JP19902098A JP3486345B2 JP 3486345 B2 JP3486345 B2 JP 3486345B2 JP 19902098 A JP19902098 A JP 19902098A JP 19902098 A JP19902098 A JP 19902098A JP 3486345 B2 JP3486345 B2 JP 3486345B2
- Authority
- JP
- Japan
- Prior art keywords
- light emitting
- phosphor
- emitting device
- led
- semiconductor light
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
Classifications
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10H—INORGANIC LIGHT-EMITTING SEMICONDUCTOR DEVICES HAVING POTENTIAL BARRIERS
- H10H20/00—Individual inorganic light-emitting semiconductor devices having potential barriers, e.g. light-emitting diodes [LED]
- H10H20/80—Constructional details
- H10H20/85—Packages
- H10H20/851—Wavelength conversion means
- H10H20/8511—Wavelength conversion means characterised by their material, e.g. binder
- H10H20/8512—Wavelength conversion materials
- H10H20/8513—Wavelength conversion materials having two or more wavelength conversion materials
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10H—INORGANIC LIGHT-EMITTING SEMICONDUCTOR DEVICES HAVING POTENTIAL BARRIERS
- H10H20/00—Individual inorganic light-emitting semiconductor devices having potential barriers, e.g. light-emitting diodes [LED]
- H10H20/80—Constructional details
- H10H20/85—Packages
- H10H20/851—Wavelength conversion means
- H10H20/8516—Wavelength conversion means having a non-uniform spatial arrangement or non-uniform concentration, e.g. patterned wavelength conversion layer or wavelength conversion layer with a concentration gradient
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
- H01L2224/01—Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
- H01L2224/26—Layer connectors, e.g. plate connectors, solder or adhesive layers; Manufacturing methods related thereto
- H01L2224/31—Structure, shape, material or disposition of the layer connectors after the connecting process
- H01L2224/32—Structure, shape, material or disposition of the layer connectors after the connecting process of an individual layer connector
- H01L2224/321—Disposition
- H01L2224/32151—Disposition the layer connector connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive
- H01L2224/32221—Disposition the layer connector connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked
- H01L2224/32245—Disposition the layer connector connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked the item being metallic
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
- H01L2224/01—Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
- H01L2224/42—Wire connectors; Manufacturing methods related thereto
- H01L2224/47—Structure, shape, material or disposition of the wire connectors after the connecting process
- H01L2224/48—Structure, shape, material or disposition of the wire connectors after the connecting process of an individual wire connector
- H01L2224/4805—Shape
- H01L2224/4809—Loop shape
- H01L2224/48091—Arched
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
- H01L2224/01—Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
- H01L2224/42—Wire connectors; Manufacturing methods related thereto
- H01L2224/47—Structure, shape, material or disposition of the wire connectors after the connecting process
- H01L2224/48—Structure, shape, material or disposition of the wire connectors after the connecting process of an individual wire connector
- H01L2224/481—Disposition
- H01L2224/48151—Connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive
- H01L2224/48221—Connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked
- H01L2224/48245—Connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked the item being metallic
- H01L2224/48247—Connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked the item being metallic connecting the wire to a bond pad of the item
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
- H01L2224/73—Means for bonding being of different types provided for in two or more of groups H01L2224/10, H01L2224/18, H01L2224/26, H01L2224/34, H01L2224/42, H01L2224/50, H01L2224/63, H01L2224/71
- H01L2224/732—Location after the connecting process
- H01L2224/73251—Location after the connecting process on different surfaces
- H01L2224/73265—Layer and wire connectors
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/30—Technical effects
- H01L2924/301—Electrical effects
- H01L2924/3025—Electromagnetic shielding
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10H—INORGANIC LIGHT-EMITTING SEMICONDUCTOR DEVICES HAVING POTENTIAL BARRIERS
- H10H20/00—Individual inorganic light-emitting semiconductor devices having potential barriers, e.g. light-emitting diodes [LED]
- H10H20/80—Constructional details
- H10H20/81—Bodies
- H10H20/813—Bodies having a plurality of light-emitting regions, e.g. multi-junction LEDs or light-emitting devices having photoluminescent regions within the bodies
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10H—INORGANIC LIGHT-EMITTING SEMICONDUCTOR DEVICES HAVING POTENTIAL BARRIERS
- H10H20/00—Individual inorganic light-emitting semiconductor devices having potential barriers, e.g. light-emitting diodes [LED]
- H10H20/80—Constructional details
- H10H20/85—Packages
- H10H20/8506—Containers
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10H—INORGANIC LIGHT-EMITTING SEMICONDUCTOR DEVICES HAVING POTENTIAL BARRIERS
- H10H20/00—Individual inorganic light-emitting semiconductor devices having potential barriers, e.g. light-emitting diodes [LED]
- H10H20/80—Constructional details
- H10H20/85—Packages
- H10H20/851—Wavelength conversion means
- H10H20/8515—Wavelength conversion means not being in contact with the bodies
Landscapes
- Led Device Packages (AREA)
- Led Devices (AREA)
Description
【0001】[0001]
【発明の属する技術分野】本発明は半導体発光装置に関
し、特にLED(light emitting diode:発光ダイオー
ド)などの半導体発光素子と複数種類の蛍光体との組み
合わせにより発光する半導体発光装置に関する。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a semiconductor light emitting device, and more particularly to a semiconductor light emitting device that emits light by combining a semiconductor light emitting element such as an LED (light emitting diode) and a plurality of types of phosphors.
【0002】[0002]
【従来の技術】半導体発光素子と蛍光体とを組み合わせ
た半導体発光装置は、その組み合わせや種類を選択する
ことにより発光色を自由に変化させることができるた
め、新しい光源として注目されている。すなわち、半導
体発光素子から放出される1次光を蛍光体により波長変
換して2次光として取り出すことにより、得られる波長
の選択の自由度を大幅に拡げることができる。2. Description of the Related Art A semiconductor light emitting device in which a semiconductor light emitting element and a phosphor are combined is capable of freely changing the emission color by selecting the combination and type of the semiconductor light emitting device. That is, by converting the wavelength of the primary light emitted from the semiconductor light emitting element by the phosphor and extracting it as secondary light, the degree of freedom in selecting the obtained wavelength can be greatly expanded.
【0003】[0003]
【発明が解決しようとする課題】しかし、本発明者の試
作検討の結果、半導体発光素子と複数の種類の蛍光体と
を組み合わせた従来の半導体発光装置では以下に詳述す
る問題があることが分かった。However, as a result of trial and study conducted by the present inventor, the conventional semiconductor light emitting device in which a semiconductor light emitting element and a plurality of types of phosphors are combined has the following problems. Do you get it.
【0004】図9は、従来の半導体発光装置の概略構成
を表す断面図である。すなわち、同図の半導体発光装置
は、リードフレーム102に形成された凹状のカップ部
の底面にLEDチップ101がマウントされ、ワイア1
06、107により配線され、蛍光体111〜113が
塗布されている。ここで、LED101は、紫外光領域
で発光するものであり、蛍光体は、その紫外光を吸収し
て赤色の光を放出する、赤色(R)蛍光体111、緑色
の光を放出する緑色(G)蛍光体112、青色の光を放
出する青色(B)蛍光体の混合物である。図9に示した
半導体発光装置は、このように、LED101からの紫
外光を波長変換してRGBからなる白色光を得ることが
できる。FIG. 9 is a sectional view showing a schematic structure of a conventional semiconductor light emitting device. That is, in the semiconductor light emitting device of the same figure, the LED chip 101 is mounted on the bottom surface of the concave cup portion formed on the lead frame 102, and the wire 1
Wiring is made by 06 and 107, and phosphors 111 to 113 are applied. Here, the LED 101 emits light in the ultraviolet region, and the phosphor absorbs the ultraviolet light and emits red light, and the red (R) phosphor 111 emits green light and the green light ( G) Phosphor 112, a mixture of blue (B) phosphor that emits blue light. In this way, the semiconductor light emitting device shown in FIG. 9 can obtain the white light of RGB by wavelength-converting the ultraviolet light from the LED 101.
【0005】しかし、本発明者が図9に示したような半
導体発光装置を試作・評価したところ、混合斑すなわち
発光の「むら」を引き起こしてしまうという問題がある
ことが分かった。具体的には、例えば、図9の半導体発
光装置を光の取り出し方向から眺めた場合に、発光部の
中央すなわちLED101の垂直上方付近と、それより
も端の周辺部分とでは、発光色が異なるという問題が発
見された。However, when the present inventor prototyped and evaluated the semiconductor light emitting device as shown in FIG. 9, it was found that there was a problem that mixed spots, that is, "unevenness" of light emission was caused. Specifically, for example, when the semiconductor light emitting device of FIG. 9 is viewed from the light extraction direction, the emission color is different between the center of the light emitting portion, that is, near the vertically upper portion of the LED 101, and the peripheral portion at the end thereof. The problem was discovered.
【0006】本発明者はさらに詳細な検討を行った結
果、このような発光の「むら」は、RGBそれぞれの蛍
光体の比重や粒径の違いによるものであり、その塗布お
よび溶解させた樹脂の硬化の工程で発生することを見出
した。さらに、この現象にはLEDチップ101の存在
による蛍光体塗布面の段差が大きく影響を及ぼしている
ことを知得するに至った。As a result of further detailed study by the present inventor, such "unevenness" of light emission is due to the difference in specific gravity and particle size of the phosphors of RGB, and the resin applied and dissolved. It was found that this occurs in the curing process of. Further, it has been found that the step on the phosphor coated surface due to the presence of the LED chip 101 has a great influence on this phenomenon.
【0007】すなわち、図9から分かるように、LED
101の上部に塗布される蛍光体層と、LED101の
周囲のカップ部に塗布される蛍光体層とでは、その塗布
厚が大幅に異なる。LED101の厚みは、通常100
〜200μmであり、その上に塗布される蛍光体の塗布
厚は、数10μmである場合が多い。つまり、LEDの
上部と、LEDの周囲のカップ部では、蛍光体の塗布厚
が数倍も異なる。That is, as can be seen from FIG.
The phosphor layer coated on the upper part of 101 and the phosphor layer coated on the cup portion around the LED 101 have significantly different coating thicknesses. The thickness of the LED 101 is usually 100
˜200 μm, and the coating thickness of the phosphor applied thereon is often several tens of μm. In other words, the coating thickness of the phosphor differs several times between the upper part of the LED and the cup part around the LED.
【0008】塗布厚が異なると、塗布した蛍光体と溶媒
との混合物が乾燥、硬化するまでの時間が異なり、蛍光
体の比重の差などによってRGBの蛍光体粒子の偏析の
状態が異なる。ここで、蛍光体の粒径と比重について代
表的な値を挙げると、赤色(R)蛍光体の粒径は約6μ
m、比重は約6.4である。また、緑色(G)蛍光体の
粒径は約3μm、比重は約3.8であり、青色(B)蛍
光体の粒径は約4μm、比重は約4.2である。このよ
うに粒径や比重が異なる複数の蛍光体粒子を溶媒に混合
して塗布した場合には、塗布厚によって、蛍光体粒子の
偏析の状態が異なる。When the coating thickness is different, the time until the mixture of the coated phosphor and the solvent is dried and cured is different, and the segregation state of the RGB phosphor particles is different due to the difference in the specific gravity of the phosphor. Here, as a typical value of the particle size and specific gravity of the phosphor, the particle size of the red (R) phosphor is about 6 μm.
m, specific gravity is about 6.4. The green (G) phosphor has a particle size of about 3 μm and a specific gravity of about 3.8, and the blue (B) phosphor has a particle size of about 4 μm and a specific gravity of about 4.2. When a plurality of phosphor particles having different particle diameters and specific gravities are mixed and applied in a solvent as described above, the segregation state of the phosphor particles varies depending on the coating thickness.
【0009】例えば、塗布厚が厚い部分においては、比
重の大きい蛍光体粒子がより顕著に下方に偏析する。そ
の結果として、LED101の上部とその周囲とでは、
蛍光体の混合状態が異なり、発光色のバランスが異なる
ために、発光の「むら」が生ずることとなる。For example, in a portion having a large coating thickness, phosphor particles having a large specific gravity segregate more significantly downward. As a result, in the upper part of the LED 101 and its surroundings,
Since the mixed state of the phosphors is different and the balance of emission colors is different, "unevenness" of light emission occurs.
【0010】図9をみても、LEDチップをマウントし
たことによる段差の存在により、LEDチップ上部と周
辺で蛍光体粒子の比重の違いにより混合比が異なってし
まい、その結果として、LEDからの発光を変換した直
上方向の光と横方向に向かい反射版で反射した光とで
は、その発光色に違いがあることは容易に見てとれる。
本発明は、かかる独自の課題の認識に基づいてなされた
ものである。すなわち、その目的は、蛍光体の塗布厚を
均一にすることにより発光の「むら」を解消することが
できる半導体発光装置を提供することにある。As shown in FIG. 9, due to the existence of the step due to mounting the LED chip, the mixing ratio is different between the upper part and the peripheral part of the LED chip due to the difference in the specific gravity of the phosphor particles, and as a result, the light emitted from the LED is emitted. It is easy to see that there is a difference in the emission color between the light converted directly above and the light reflected laterally in the reflection plate.
The present invention has been made based on the recognition of such unique problems. That is, an object of the invention is to provide a semiconductor light emitting device capable of eliminating "unevenness" in light emission by making the coating thickness of the phosphor uniform.
【0011】[0011]
【課題を解決するための手段】本発明は、複数種類の蛍
光体を発光素子の周辺に塗布する場合に、それぞれの蛍
光体の比重や粒径の違いにより発生する混合斑を防ぐも
のであり、その構造として実装部材の上に埋め込まれた
形で発光素子をマウントし、このようにして得られた実
質的に平坦な面に複数の蛍光体を塗布する構造としたこ
とを特徴とする。このようにすれば、蛍光体の均一混
合、あるいは均一層上の塗布が可能になり色斑の無い発
光を実現することができる。Means for Solving the Problems The present invention is intended to prevent mixing unevenness caused by the difference in specific gravity and particle size of phosphors when a plurality of kinds of phosphors are applied to the periphery of a light emitting element. The structure is characterized in that the light emitting element is mounted so as to be embedded on the mounting member, and a plurality of phosphors are applied to the substantially flat surface thus obtained. By doing so, it is possible to uniformly mix the phosphors or apply them on a uniform layer, and it is possible to realize light emission without color spots.
【0012】すなわち、本発明の半導体発光装置は、実
装部材と、前記実装部材にマウントされた発光素子と、
前記発光素子から放出される1次光を吸収して前記1次
光とは異なる波長を有する2次光を放出する蛍光体と、
を備えた半導体発光装置であって、前記蛍光体は、実質
的に平坦な面の上において一定の厚みを有するように形
成されていることを特徴とする。That is, the semiconductor light emitting device of the present invention comprises a mounting member, a light emitting element mounted on the mounting member,
A phosphor that absorbs primary light emitted from the light emitting device and emits secondary light having a wavelength different from that of the primary light;
In the semiconductor light emitting device, the phosphor is formed so as to have a constant thickness on a substantially flat surface.
【0013】または、本発明の半導体発光装置は、実装
部材と、前記実装部材にマウントされた発光素子と、前
記発光素子から放出される1次光を吸収して前記1次光
とは異なる波長を有する2次光を放出する蛍光体と、を
備えた半導体発光装置であって、前記実装部材は、前記
蛍光体が塗布される主面に凹部を有し、前記発光素子
は、前記実装部材の前記凹部に埋め込まれるようにマウ
ントされ、前記実装部材の前記主面と前記発光素子の上
面とは、実質的に同一の平面内に設けられることにより
実質的に平坦な塗布面を構成し、前記蛍光体は、前記塗
布面に一定の厚みを有するように塗布されていることを
特徴とする。Alternatively, in the semiconductor light emitting device of the present invention, the mounting member, the light emitting element mounted on the mounting member, the primary light emitted from the light emitting element, and a wavelength different from the primary light are absorbed. And a phosphor that emits secondary light, the mounting member having a recess on a main surface on which the phosphor is applied, and the light emitting element is the mounting member. Of the mounting member is mounted so as to be embedded in the recess, and the main surface of the mounting member and the upper surface of the light emitting element form a substantially flat coating surface by being provided in substantially the same plane, The phosphor is applied to the application surface so as to have a constant thickness.
【0014】ここで、前記蛍光体は、互いに比重が異な
る2種類以上の蛍光体を含むことを特徴とする。Here, the phosphor includes two or more kinds of phosphors having specific gravities different from each other.
【0015】また、前記2種類以上の蛍光体は、それぞ
れの種類毎に層状に形成されて積層されていることを特
徴とする。Further, the two or more kinds of phosphors are formed and laminated in layers for each kind.
【0016】または、本発明の半導体発光装置は、発光
素子と、前記発光素子から放出される1次光を吸収して
前記1次光とは異なる第1の波長の光を放出する第1の
蛍光体と、前記発光素子から放出される1次光を吸収し
て前記1次光とは異なる第2の波長の光を放出する第2
の蛍光体と、を備えた半導体発光装置であって、前記第
1の蛍光体は、前記発光素子の光放出面の第1の領域の
上に設けられ、前記第2の蛍光体は、前記発光素子の光
放出面の前記第1の領域とは異なる第2の領域の上に設
けられていることを特徴とする。Alternatively, the semiconductor light emitting device of the present invention includes a light emitting element and a first light emitting element that absorbs primary light emitted from the light emitting element and emits light having a first wavelength different from the primary light. A phosphor and a second that absorbs primary light emitted from the light emitting element and emits light of a second wavelength different from the primary light
And a second phosphor, wherein the first phosphor is provided on a first region of a light emitting surface of the light emitting element, and the second phosphor is It is characterized in that it is provided on a second area different from the first area on the light emitting surface of the light emitting element.
【0017】[0017]
【発明の実施の形態】以下、図面を参照しつつ本発明の
実施の形態について説明する。BEST MODE FOR CARRYING OUT THE INVENTION Embodiments of the present invention will be described below with reference to the drawings.
【0018】図1は、本発明の第1の実施の形態にかか
る半導体発光装置の要部構成を表す概略断面図である。
同図において、11はLEDチップであり、12はその
LEDをマウントするリードフレームである。13は赤
色(R)蛍光体、14は緑色(G)蛍光体、15は青色
(B)蛍光体であり、LED11からの光を吸収してそ
れぞれの波長帯の2次光を放出するものである。16,
17はLEDに駆動電流を供給するためのワイアであ
り、それぞれLEDの電極とリードフレームのリード部
にボンディングされている。FIG. 1 is a schematic cross-sectional view showing the structure of a main part of a semiconductor light emitting device according to a first embodiment of the present invention.
In the figure, 11 is an LED chip, and 12 is a lead frame for mounting the LED. 13 is a red (R) phosphor, 14 is a green (G) phosphor, and 15 is a blue (B) phosphor, which absorbs the light from the LED 11 and emits secondary light in each wavelength band. is there. 16,
Reference numeral 17 is a wire for supplying a drive current to the LED, which is bonded to the electrode of the LED and the lead portion of the lead frame, respectively.
【0019】本発明の半導体発光装置が従来例と異なる
点は、リードフレーム12に凹部12Aが設けられ、L
EDチップ11がこの凹部12Aの内部に埋め込む形で
マウントされている点にある。本発明によれば、LED
11による段差が発生しないため、LEDの周囲の蛍光
体の塗布厚を一定にすることができる。その結果とし
て、蛍光体の偏析の状態を均一にすることができ、図9
に関して前述したような発光の「むら」を解消すること
ができる。The semiconductor light emitting device of the present invention is different from the conventional example in that the lead frame 12 is provided with a recess 12A, and
The ED chip 11 is mounted so as to be embedded in the recess 12A. According to the invention, an LED
Since the step due to 11 is not generated, the coating thickness of the phosphor around the LED can be made constant. As a result, it is possible to make the segregation state of the phosphor uniform, as shown in FIG.
With respect to the above-mentioned "unevenness" of light emission, it can be eliminated.
【0020】また、本実施形態においては、RGB蛍光
体のそれぞれを層状に形成している。すなわち、第1層
としてR蛍光体13からなる層が設けられ、第2層とし
てG蛍光体14からなる層が設けられ、第3層としてB
蛍光体15からなる層が設けられている。本発明によれ
ば、LED11の周囲において、蛍光体の塗布厚を均一
にすることができるので、このような3層構造も確実且
つ容易に実現することができる。Further, in this embodiment, each of the RGB phosphors is formed into a layer. That is, a layer made of the R phosphor 13 is provided as the first layer, a layer made of the G phosphor 14 is provided as the second layer, and a B layer is used as the third layer.
A layer made of the phosphor 15 is provided. According to the present invention, the coating thickness of the phosphor can be made uniform around the LED 11, so that such a three-layer structure can be realized reliably and easily.
【0021】図1の半導体発光装置の製造方法は以下の
如くである。すなわち、LEDチップ11をフレーム1
2にマウントした後に、R蛍光体13を含んだ樹脂を塗
布して硬化させ、次にG蛍光体14を含んだ樹脂を塗布
して硬化させ、次にB蛍光体15を含んだ樹脂を塗布し
て硬化させて作成する。ここで、塗布する蛍光体の量や
順序については、それぞれの蛍光体の変換効率や塗布領
域内部での散乱を考慮して適宜決定することができる。The method of manufacturing the semiconductor light emitting device of FIG. 1 is as follows. That is, the LED chip 11 is attached to the frame 1
After mounting on 2, the resin containing the R phosphor 13 is applied and cured, then the resin containing the G phosphor 14 is applied and cured, and then the resin containing the B phosphor 15 is applied. Then, it is cured and created. Here, the amount and order of the phosphors to be applied can be appropriately determined in consideration of the conversion efficiency of each phosphor and the scattering inside the application region.
【0022】ここで、LED11の平面形状は通常、一
辺が400〜500μmの正方形状であるが、リードフ
レームの加工精度や、LED11をマウントする際の誤
差などを考慮すると、リードフレーム12の凹部12A
の開口寸法は、LED11の寸法の一割増し、40〜5
0μm程度大きめに形成することが望ましい。この場合
には、LEDの両側に隙間が生ずるが、この程度の寸法
であれば、塗布むらによる悪影響が生ずる心配はない。Here, the planar shape of the LED 11 is usually a square shape with one side of 400 to 500 μm, but in consideration of the processing accuracy of the lead frame, the error in mounting the LED 11, and the like, the recess 12A of the lead frame 12 is taken into consideration.
The opening size is 40% to 5
It is desirable to form a large size of about 0 μm. In this case, a gap is formed on both sides of the LED, but with such a size, there is no risk of adverse effects due to uneven coating.
【0023】かくして得られた半導体発光装置に、ワイ
ア16、17を介してバイアス電流を供給したところ、
LEDの上方からみて色斑の無い均一な白色発光が得ら
れた。また本半導体発光装置では指向角に対する色純度
も良く、この点でも従来構造の装置よりも優れているこ
とが分かった。When a bias current was supplied to the thus obtained semiconductor light emitting device through the wires 16 and 17,
Uniform white light emission without color spots was obtained when viewed from above the LED. Further, it was found that the present semiconductor light emitting device has a good color purity with respect to the directional angle, and is also superior to the device having the conventional structure in this respect.
【0024】図2は、図1の半導体発光装置に搭載され
るLEDの構成を例示する概略断面図である。図中30
1はサファイア基板、302はn型GaNコンタクト
層、303はn型AlGaNクラッド層、304はIn
GaN活性層、305はp型AlGaNクラッド層、3
06はp型GaNコンタクト層、307はp側電極、3
08はn側電極である。図2のLEDは、青色から紫外
線領域の波長帯において極めて高い強度の発光を得るこ
とができるので、蛍光体と組み合わせて用いるのに好適
である。FIG. 2 is a schematic sectional view illustrating the configuration of an LED mounted on the semiconductor light emitting device of FIG. 30 in the figure
1 is a sapphire substrate, 302 is an n-type GaN contact layer, 303 is an n-type AlGaN cladding layer, and 304 is In.
GaN active layer, 305 is p-type AlGaN cladding layer, 3
06 is a p-type GaN contact layer, 307 is a p-side electrode, 3
Reference numeral 08 is an n-side electrode. The LED of FIG. 2 can emit light of extremely high intensity in the wavelength range of blue to ultraviolet, and is therefore suitable for use in combination with a phosphor.
【0025】なお、図示したLEDは、n側電極308
の形成面とp側電極307の形成面との間に段差部を有
するが、この段差の高さはせいぜい数μm以下に過ぎ
ず、蛍光体の偏析状態に影響を与えることはない。The illustrated LED has an n-side electrode 308.
Although there is a stepped portion between the surface on which the p-side electrode 307 is formed and the surface on which the p-side electrode 307 is formed, the height of the stepped portion is at most several μm or less and does not affect the segregation state of the phosphor.
【0026】本発明において用いることができる発光素
子は、蛍光体を励起するのに十分な特性(発光波長、発
光強度など)を有すれば良く、図2のLEDに限られる
ものではない。積層構造および材料を適宜種々変形して
作成可能である。例えば、基板301はサファイアに限
定されず、その他にも、例えば、スピネル、MgO、S
cAlMgO4、LaSrGaO4、(LaSr)(Al
Ta)O3などの絶縁性基板や、SiCSi、GaA
s、GaNなどの導電性基板も同様に用いてそれぞれの
効果を得ることができる。ここで、ScAlMgO4基
板の場合には、(0001)面、(LaSr)(AlT
a)O3基板の場合には(111)面を用いることが望
ましい。The light emitting device that can be used in the present invention is not limited to the LED shown in FIG. 2 as long as it has sufficient characteristics (emission wavelength, emission intensity, etc.) to excite the phosphor. It can be produced by appropriately modifying the laminated structure and materials. For example, the substrate 301 is not limited to sapphire, but other materials such as spinel, MgO, and S can be used.
cAlMgO 4 , LaSrGaO 4 , (LaSr) (Al
Insulating substrate such as Ta) O 3 or SiCSi, GaA
The same effects can be obtained by using a conductive substrate such as s or GaN in the same manner. Here, in the case of the ScAlMgO 4 substrate, the (0001) plane, (LaSr) (AlT
a) In the case of an O 3 substrate, it is desirable to use the (111) plane.
【0027】また、窒化物半導体として用いることがで
きる材料しては、BxInyAlzGa(1-x-y-z)N(O≦
x≦1、O≦y≦1、O≦z≦1)なる化学式で表され
るあらゆる組成のIII−V族化合物半導体を挙げること
ができ、さらに、V族元素としては、Nに加えてリン
(P)や砒素(As)などを含有する混晶も含むもので
も良い。さらに、これらの窒化物半導体以外のIII−V
族化合物半導体、II−VI族化合物半導体、或いはSi
Cなども同様に用いることができる。As a material which can be used as the nitride semiconductor, B x In y Al z Ga (1-xyz) N (O≤
x ≦ 1, O ≦ y ≦ 1, O ≦ z ≦ 1), which may be III-V group compound semiconductors of any composition represented by chemical formulas. Further, as the V group element, phosphorus can be used in addition to N. A mixed crystal containing (P) or arsenic (As) may also be included. Furthermore, III-V other than these nitride semiconductors
Group compound semiconductor, II-VI group compound semiconductor, or Si
C and the like can be used as well.
【0028】次に、本発明の第2の実施の形態について
説明する。図3は、本発明の第2の実施の形態にかかる
半導体発光装置を表す概略断面図である。同図において
は、図1と同様の部分については同一の符号を付した。
本実施形態の半導体発光装置は、RGB蛍光体13〜1
5を樹脂に一緒に混合して塗布、硬化させた点で第1実
施形態と異なる。すなわち、本実施形態においては、蛍
光体13〜15が、ランダムに混合されている。Next, a second embodiment of the present invention will be described. FIG. 3 is a schematic sectional view showing a semiconductor light emitting device according to the second embodiment of the present invention. In the figure, the same parts as those in FIG. 1 are designated by the same reference numerals.
The semiconductor light emitting device of the present embodiment has RGB phosphors 13 to 1
This is different from the first embodiment in that 5 is mixed with resin and applied and cured. That is, in this embodiment, the phosphors 13 to 15 are randomly mixed.
【0029】図9に関して前述したように、従来の半導
体発光装置では、LEDによる段差の存在により、発光
の「むら」が多く発生してしまったのに対して、本実施
形態によればLED11をリードフレーム12に埋め込
んで段差を実質的になくしているために、蛍光体をラン
ダムに混合した場合においても発光の「むら」を解消で
きる。このように蛍光体をランダムに混合する場合は、
図1に例示したように層状に塗布するよりも容易に製造
することができる。As described above with reference to FIG. 9, in the conventional semiconductor light emitting device, a lot of "unevenness" in light emission occurs due to the presence of the step difference due to the LED, whereas in the present embodiment, the LED 11 is used. Since it is embedded in the lead frame 12 to substantially eliminate the step, the "unevenness" of light emission can be eliminated even when the phosphors are randomly mixed. When randomly mixing phosphors in this way,
It can be manufactured more easily than when applied in layers as illustrated in FIG.
【0030】かくして得られた半導体発光装置にバイア
ス電流を供給したところ、LED11の上方から観察し
て色斑の無い均一な白色発光が得られた。つまり、本発
明によれば、従来と同様にRGB蛍光体を混合して塗布
しても発光「むら」の無い均一な発光を得ることができ
る。また、本装置では指向角に対する色純度も良く、こ
の点でも従来構造の装置よりも優れていることがわかっ
た。When a bias current was supplied to the thus obtained semiconductor light emitting device, uniform white light emission without color spots was observed when observed from above the LED 11. That is, according to the present invention, it is possible to obtain uniform light emission without "unevenness" of light emission even if the RGB phosphors are mixed and applied as in the conventional case. It was also found that this device has a good color purity with respect to the directivity angle, and is superior to the device having the conventional structure also in this respect.
【0031】次に、本発明の第3の実施の形態について
説明する。図4は、本発明の第3の実施の形態にかかる
半導体発光装置を表す概略断面図である。本実施形態の
半導体発光装置は、発光素子をマウントする実装部材と
して、前述したリードフレームの代わりに基板22が用
いられている点が異なる。すなわち、基板22には凹状
のカップ部が形成され、その底面には凹部22Aが設け
られている。LED11は、この凹部22Aに埋め込ま
れるようにマウントされ、ワイア16、17により配線
されている。Next, a third embodiment of the present invention will be described. FIG. 4 is a schematic sectional view showing a semiconductor light emitting device according to a third embodiment of the present invention. The semiconductor light emitting device of this embodiment is different in that the substrate 22 is used instead of the above-described lead frame as a mounting member for mounting the light emitting element. That is, a concave cup portion is formed on the substrate 22, and a concave portion 22A is provided on the bottom surface thereof. The LED 11 is mounted so as to be embedded in the recess 22A and is wired by the wires 16 and 17.
【0032】そして、実質的に平坦な面とされたカップ
部の底面とLED11の上面とに蛍光体13〜15が塗
布されている。Then, the phosphors 13 to 15 are applied to the bottom surface of the cup portion which is a substantially flat surface and the top surface of the LED 11.
【0033】本実施形態においても、蛍光体の塗布面は
段差を有せず、実質的に平坦な面とされているので、図
9に関して前述したような偏析状態のむらが生ずること
はない。その結果として、均一な発光を得ることができ
る。Also in this embodiment, since the coated surface of the phosphor has no step and is a substantially flat surface, the uneven segregation described above with reference to FIG. 9 does not occur. As a result, uniform light emission can be obtained.
【0034】なお、図4においては、RGB蛍光体13
〜15を一緒に混合してランダムに塗布した例を表した
が、図1に例示したように、各蛍光体13〜15を層状
に塗布しても良い。In FIG. 4, the RGB phosphor 13 is used.
1 to 15 are mixed together and applied randomly, but as illustrated in FIG. 1, the phosphors 13 to 15 may be applied in layers.
【0035】次に、本発明の第4の実施の形態について
説明する。図5は、本発明の第4の実施の形態にかかる
半導体発光装置を表す概略断面図である。本実施形態の
半導体発光装置も、前述した第3実施形態と同様に基板
22にLED11がマウントされている。しかし、本実
施形態においては、基板22のカップ部が樹脂25によ
り埋め込まれている点が異なる。すなわち、基板22に
は凹状のカップ部が形成され、その底面には凹部22A
が設けられている。このカップ部は、樹脂25により埋
め込まれ、この樹脂25の表面に蛍光体13〜15が塗
布されている。Next, a fourth embodiment of the present invention will be described. FIG. 5 is a schematic sectional view showing a semiconductor light emitting device according to the fourth embodiment of the present invention. Also in the semiconductor light emitting device of this embodiment, the LED 11 is mounted on the substrate 22 as in the third embodiment described above. However, this embodiment is different in that the cup portion of the substrate 22 is filled with the resin 25. That is, a concave cup portion is formed on the substrate 22, and a concave portion 22A is formed on the bottom surface thereof.
Is provided. The cup portion is embedded with resin 25, and the phosphors 13 to 15 are applied to the surface of the resin 25.
【0036】本実施形態においても、蛍光体の塗布面す
なわち樹脂25の表面は段差を有せず、実質的に平坦な
面とされているので、図9に関して前述したような偏析
状態のむらが生ずることはない。その結果として、均一
な発光を得ることができる。また、本実施形態によれ
ば、LED11が樹脂25により封止されているので、
水分や各種の腐食性雰囲気の侵入によるLEDの劣化や
故障を防ぐことができる。その結果として、半導体発光
装置の信頼性を向上することができる。Also in this embodiment, since the coated surface of the phosphor, that is, the surface of the resin 25 is a substantially flat surface without a step, the uneven segregation described above with reference to FIG. 9 occurs. There is no such thing. As a result, uniform light emission can be obtained. Further, according to the present embodiment, since the LED 11 is sealed with the resin 25,
It is possible to prevent deterioration or failure of the LED due to intrusion of water or various corrosive atmospheres. As a result, the reliability of the semiconductor light emitting device can be improved.
【0037】なお、図5においては、RGB蛍光体13
〜15を一緒に混合してランダムに塗布した例を表した
が、図1に例示したように、各蛍光体13〜15を層状
に塗布しても良い。また、図5においては、LED11
を基板22に埋込みマウントした例を示したが、本実施
形態はこれに限定されず、基板22に凹部22Aを形成
せずに、カップ部底面の平坦なマウント面にLED11
をマウントしても良い。In FIG. 5, the RGB phosphor 13 is used.
1 to 15 are mixed together and applied randomly, but as illustrated in FIG. 1, the phosphors 13 to 15 may be applied in layers. In addition, in FIG.
However, the present embodiment is not limited to this, and the recessed portion 22A is not formed in the substrate 22, and the LED 11 is mounted on the flat mount surface on the bottom surface of the cup portion.
May be mounted.
【0038】次に、本発明の第5の実施の形態について
説明する。図6は、本発明の第5の実施の形態にかかる
半導体発光装置を表す概略断面図である。同図において
も、前述した第1実施形態及び第2実施形態と同様の構
造部分については同一の符号を付した。図中30は、L
ED11から放出される1次光に対して透明な樹脂によ
り形成されたレンズである。Next, a fifth embodiment of the present invention will be described. FIG. 6 is a schematic sectional view showing a semiconductor light emitting device according to the fifth embodiment of the present invention. Also in the figure, the same reference numerals are given to the same structural parts as those of the above-described first and second embodiments. In the figure, 30 is L
The lens is made of a resin that is transparent to the primary light emitted from the ED 11.
【0039】本実施形態においては、LED11をリー
ドフレーム12上に埋め込みマウントした後に透明樹脂
のレンズ30を形成し、その表面にRGB蛍光体を塗布
した点に特徴を有する。レンズ30の表面は段差を有し
ないので、蛍光体を塗布した場合に、図9に関して前述
したような偏析状態のむらが生ずることはない。その結
果として、均一な発光を得ることができる。The present embodiment is characterized in that the LED 11 is embedded and mounted on the lead frame 12, the lens 30 made of a transparent resin is formed, and the RGB phosphor is applied to the surface thereof. Since the surface of the lens 30 does not have a step, the unevenness of the segregation state as described above with reference to FIG. 9 does not occur when the phosphor is applied. As a result, uniform light emission can be obtained.
【0040】さらに、本実施形態によれば、レンズ30
を設けたことによりさらに指向角が広くなり、表示用や
照明等の用途に広く適用することが可能となる。また、
図6にはリードフレームを用いた場合の構造を例示した
が、平面基板上へのマウントによって集積化すればその
用途は格段に広がり本発明の利点をさらに引き出すこと
ができる。Further, according to this embodiment, the lens 30
By providing the above, the directional angle can be further widened, and it can be widely applied to applications such as display and illumination. Also,
FIG. 6 exemplifies a structure using a lead frame, but if it is integrated by mounting on a flat substrate, its application will be greatly expanded and the advantages of the present invention can be further brought out.
【0041】なお、図6においては、LED11をリー
ドフレーム12に埋込みマウントした例を示したが、本
実施形態はこれに限定されず、リードフレーム12に凹
部を形成せずに、平坦なマウント面にLED11をマウ
ントしても良い。Although FIG. 6 shows an example in which the LED 11 is mounted by being embedded in the lead frame 12, the present embodiment is not limited to this, and a flat mount surface is formed without forming a recess in the lead frame 12. The LED 11 may be mounted on.
【0042】また、蛍光体13〜15も、図6に示した
ように層状に塗布せずに、溶媒中にRGB蛍光体13〜
15を一緒に混合してランダムになるように塗布しても
良い。Further, the phosphors 13 to 15 are not applied in layers as shown in FIG.
You may mix 15 together and apply it at random.
【0043】次に、本発明の第6の実施の形態について
説明する。図7は、本発明の第6の実施の形態にかかる
半導体発光装置を表す概略断面図である。同図において
も、前述した第1、第2実施形態と同様の部分について
は、同一の符号を付した。図中60は発光部が3つの領
域に分かれたLEDである。本実施形態は、LED60
の3分割された発光領域のそれぞれの上部にRGB蛍光
体13〜15を分けて塗布した点に特徴を有する。つま
り、LED60は、遮光板62によって、3つの領域に
分割され、それぞれの領域にRGB蛍光体13〜15の
いずれかが塗布されている。塗布されたそれぞれの蛍光
体は、LED60からの1次光を吸収して、それぞれの
発光波長の2次光を放出する。Next, a sixth embodiment of the present invention will be described. FIG. 7 is a schematic sectional view showing a semiconductor light emitting device according to a sixth embodiment of the present invention. Also in this figure, the same parts as those in the first and second embodiments described above are designated by the same reference numerals. Reference numeral 60 in the figure denotes an LED in which the light emitting portion is divided into three regions. In this embodiment, the LED 60
It is characterized in that the RGB phosphors 13 to 15 are separately applied onto the respective three divided light emitting regions. That is, the LED 60 is divided into three regions by the light shielding plate 62, and one of the RGB phosphors 13 to 15 is applied to each region. Each of the applied phosphors absorbs the primary light from the LED 60 and emits the secondary light of each emission wavelength.
【0044】本実施形態によれば、1つの半導体発光装
置においてRGBそれぞれの発光を別々に取り出すこと
が可能となり、または、それらの混合色も自由に表現で
きるようになる。According to this embodiment, it is possible to separately take out the emitted light of each of RGB in one semiconductor light emitting device, or it is possible to freely express a mixed color thereof.
【0045】図8は、第6の実施形態において用いるこ
とができるLEDを表す概略断面図である。同図におい
ては、前述した図3と同様の構造部分については同一の
符号を付した。図中701は、n型GaN基板である。
この導電性基板上へ素子を作成することによってLED
の上下面に電極をそれぞれ形成することができる。発光
領域の分離は、p型GaNコンタクト層306からn型
GaN層302まで貫通するようにエッチングすること
により行う。その後、p型GaNコンタクト層306の
上にp側電極307を形成し、n型GaN基板701の
裏面には共通のn側電極308を作成して、本素子が完
成する。FIG. 8 is a schematic sectional view showing an LED that can be used in the sixth embodiment. In the figure, the same reference numerals are given to the same structural parts as those in FIG. 3 described above. In the figure, 701 is an n-type GaN substrate.
LED by creating elements on this conductive substrate
Electrodes can be formed on the upper and lower surfaces, respectively. The light emitting region is separated by etching so as to penetrate from the p-type GaN contact layer 306 to the n-type GaN layer 302. After that, a p-side electrode 307 is formed on the p-type GaN contact layer 306, and a common n-side electrode 308 is formed on the back surface of the n-type GaN substrate 701 to complete the present device.
【0046】なお、図7の半導体発光装置においては、
遮光板62を設けることにより、隣接する他の領域から
の蛍光体の励起を防いでいる。図示した以外にも、発光
領域同士の間隔を広くしたり、励起光に対して吸収する
ような材質あるいは吸収材を含んだ樹脂を用いて蛍光体
を分離するようにしても良い。本実施形態においても、
色斑のない均一な発光を得ることができる。In the semiconductor light emitting device of FIG. 7,
By providing the light shielding plate 62, excitation of the phosphor from other adjacent regions is prevented. Other than the one shown in the figure, the spacing between the light emitting regions may be widened, or the phosphor may be separated using a material that absorbs the excitation light or a resin containing an absorber. Also in this embodiment,
It is possible to obtain uniform light emission without color spots.
【0047】以上、具体例を参照しつつ本発明の実施の
形態について説明した。しかし、本発明のこれらの具体
例に限定されるものではない。例えば、各実施形態で用
いた発光素子は、窒化物半導体を用いたLED以外に
も、蛍光体の励起のために十分な波長と発光強度を有す
る他の材料系の発光素子でもよい。また、各実施形態に
おいては蛍光体としてRGBの3種の蛍光体を用いた場
合を例示したが、種類の異なる2種類以上の組み合わせ
において本発明は有効である。例えば、青色の2次光を
放出する蛍光体と黄色の2次光を放出する蛍光体とを組
み合わせて白色光を得る場合においても本発明を同様に
適用して同様の効果を得ることができる。その他本発明
の要旨を逸脱しない範囲で種々変形して実施可能であ
る。The embodiments of the present invention have been described above with reference to specific examples. However, the present invention is not limited to these specific examples. For example, the light-emitting element used in each embodiment may be a light-emitting element of another material system having a wavelength and emission intensity sufficient for exciting a phosphor, in addition to the LED using a nitride semiconductor. Further, in each embodiment, the case where three kinds of phosphors of RGB are used as the phosphors is illustrated, but the present invention is effective in a combination of two or more kinds of different kinds. For example, even when white light is obtained by combining a phosphor that emits blue secondary light and a phosphor that emits yellow secondary light, the present invention can be similarly applied and similar effects can be obtained. . Other various modifications are possible without departing from the scope of the present invention.
【0048】[0048]
【発明の効果】本発明によれば、リードフレームなどの
実装部材に対して、LEDなどの発光素子を埋め込まれ
た形でマウントすることにより、蛍光体の塗布面を実質
的に平坦な面とし、この平坦面に蛍光体を塗布すること
により、塗布厚を均一にし、蛍光体粒子の比重や粒径の
違いにより発生する偏析の状態を均一にすることによっ
て、発光の「むら」を解消することができる。According to the present invention, by mounting a light emitting element such as an LED on a mounting member such as a lead frame in an embedded form, the phosphor coated surface is made substantially flat. By applying the phosphor on this flat surface, the coating thickness is made uniform, and the segregation state caused by the difference in the specific gravity and particle size of the phosphor particles is made uniform, thereby eliminating the "unevenness" of light emission. be able to.
【0049】また、本発明によれば、半導体発光装置の
色純度を高めることができ、さらに、色純度の指向性も
向上させることができる。Further, according to the present invention, the color purity of the semiconductor light emitting device can be increased, and the directivity of the color purity can be improved.
【0050】さらに、本発明によれば、単一の蛍光体を
用いる場合にも、偏析状態を均一にすることにより、2
次光の強度むらを解消して均一な発光を得ることができ
るという効果が得られる。Furthermore, according to the present invention, even when a single phosphor is used, the segregation state is made uniform, so that
The effect that the uneven intensity of the next light can be eliminated and uniform light emission can be obtained is obtained.
【図1】本発明の第1の実施の形態にかかる半導体発光
装置の要部構成を表す概略断面図である。FIG. 1 is a schematic cross-sectional view showing a main configuration of a semiconductor light emitting device according to a first embodiment of the present invention.
【図2】図1の半導体発光装置に搭載されるLEDの構
成を例示する概略断面図である。FIG. 2 is a schematic cross-sectional view illustrating the configuration of an LED mounted on the semiconductor light emitting device of FIG.
【図3】本発明の第2の実施の形態にかかる半導体発光
装置を表す概略断面図である。FIG. 3 is a schematic sectional view showing a semiconductor light emitting device according to a second embodiment of the invention.
【図4】本発明の第3の実施の形態にかかる半導体発光
装置を表す概略断面図である。FIG. 4 is a schematic sectional view showing a semiconductor light emitting device according to a third embodiment of the invention.
【図5】本発明の第4の実施の形態にかかる半導体発光
装置を表す概略断面図である。FIG. 5 is a schematic sectional view showing a semiconductor light emitting device according to a fourth embodiment of the present invention.
【図6】本発明の第5の実施の形態にかかる半導体発光
装置を表す概略断面図である。FIG. 6 is a schematic cross-sectional view showing a semiconductor light emitting device according to a fifth embodiment of the present invention.
【図7】本発明の第6の実施の形態にかかる半導体発光
装置を表す概略断面図である。FIG. 7 is a schematic sectional view showing a semiconductor light emitting device according to a sixth embodiment of the present invention.
【図8】第6の実施形態において用いることができるL
EDを表す概略断面図である。FIG. 8 is an L that can be used in the sixth embodiment.
It is a schematic sectional drawing showing ED.
【図9】従来の半導体発光装置の概略構成を表す断面図
である。FIG. 9 is a cross-sectional view showing a schematic configuration of a conventional semiconductor light emitting device.
11、60、101 LEDチップ 12、102 リードフレーム 13、111 赤色(R)蛍光体 14、112 緑色(G)蛍光体 15、113 青色(B)蛍光体 16、106 n側金ワイヤ 17、107 p側金ワイヤ 22 基板 25 樹脂 30 レンズ 62 遮光板 301 サファイア基板 302 n型GaNコンタクト層 303 n型AlGaNクラッド層 304 InGaN活性層 305 p型AlGaNクラッド層 306 p型GaNコンタクト層 307 p側電極 308 n側電極 701 GaN基板 11, 60, 101 LED chips 12,102 Lead frame 13,111 Red (R) phosphor 14,112 Green (G) phosphor 15,113 Blue (B) phosphor 16, 106 n-side gold wire 17, 107 p side gold wire 22 Substrate 25 resin 30 lenses 62 light shield 301 Sapphire substrate 302 n-type GaN contact layer 303 n-type AlGaN cladding layer 304 InGaN active layer 305 p-type AlGaN cladding layer 306 p-type GaN contact layer 307 p-side electrode 308 n-side electrode 701 GaN substrate
───────────────────────────────────────────────────── フロントページの続き (56)参考文献 特開 平10−107325(JP,A) 特開 平7−15046(JP,A) 特開 平11−40858(JP,A) 登録実用新案3048368(JP,U) (58)調査した分野(Int.Cl.7,DB名) H01L 33/00 ─────────────────────────────────────────────────── ─── Continuation of the front page (56) Reference JP 10-107325 (JP, A) JP 7-15046 (JP, A) JP 11-40858 (JP, A) Registered utility model 3048368 ( JP, U) (58) Fields investigated (Int.Cl. 7 , DB name) H01L 33/00
Claims (3)
た発光素子と、前記発光素子から放出される1次光を吸
収して前記1次光とは異なる波長を有する2次光を放出
する蛍光体と、を備えた半導体発光装置であって、 前記実装部材は、前記蛍光体が塗布される主面に凹部を
有し、 前記発光素子は、前記実装部材の前記凹部に埋め込まれ
るようにマウントされ、 前記実装部材の前記主面と前記発光素子の上面とは、実
質的に同一の平面内に設けられることにより実質的に平
坦な塗布面を構成し、 前記蛍光体は、互いに比重が異なる2種類以上の蛍光体
を含み、前記塗布面に一定の厚みを有するように塗布さ
れていることを特徴とする半導体発光装置。1. A mounting member, a light emitting element mounted on the mounting member, primary light emitted from the light emitting element, and secondary light having a wavelength different from that of the primary light is emitted. And a phosphor, wherein the mounting member has a recess on a main surface on which the phosphor is applied, and the light emitting element is embedded in the recess of the mounting member. Mounted, the main surface of the mounting member and the upper surface of the light-emitting element constitute a substantially flat coating surface by being provided in substantially the same plane, the phosphor has a specific gravity relative to each other. A semiconductor light emitting device comprising two or more different types of phosphors, which are applied to the application surface so as to have a constant thickness.
類毎に層状に形成されて積層されていることを特徴とす
る請求項1記載の半導体発光装置。2. The semiconductor light emitting device according to claim 1, wherein the two or more kinds of phosphors are formed and laminated in layers for each kind.
布されていることを特徴とする請求項1または請求項2
記載の半導体発光装置。3. The phosphor according to claim 1 or 2, wherein the phosphor is directly coated on the coating surface.
The semiconductor light-emitting device described.
Priority Applications (1)
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|---|---|---|---|
| JP19902098A JP3486345B2 (en) | 1998-07-14 | 1998-07-14 | Semiconductor light emitting device |
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| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP19902098A JP3486345B2 (en) | 1998-07-14 | 1998-07-14 | Semiconductor light emitting device |
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| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2003301289A Division JP3871668B2 (en) | 2003-08-26 | 2003-08-26 | Semiconductor light emitting device |
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| Publication Number | Publication Date |
|---|---|
| JP2000031532A JP2000031532A (en) | 2000-01-28 |
| JP3486345B2 true JP3486345B2 (en) | 2004-01-13 |
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| JP19902098A Expired - Fee Related JP3486345B2 (en) | 1998-07-14 | 1998-07-14 | Semiconductor light emitting device |
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